Evaporation source and evaporation device

Abstract

The invention provides an evaporation source and an evaporation device, and belongs to the technical field of evaporation, the evaporation source comprises a crucible and a crucible cover plate arranged on the crucible, the crucible is internally provided with a containing cavity and a plurality of partition plates located in the containing cavity, and the partition plates divide the containing cavity into a plurality of evaporation grooves; the flow guide part is arranged in the evaporation tank, the flow guide part covers an opening of the evaporation tank from the top of the evaporation tank, the flow guide part comprises a plurality of plate bodies located on different planes, a plurality of flow guide openings are formed in at least one plate body in the plurality of plate bodies, and the flow guide openings penetrate through the at least one plate body. According to the evaporation source and the evaporation device provided by the invention, impurity particles evaporated on the substrate can be reduced, and the performance and yield of products are improved.

Description

Technical Field

[0001] The present application relates to the field of evaporation technology, and in particular to an evaporation source and an evaporation device. Background Art

[0002] OLED (Organic Light-Emitting Diode) display devices have fast response time, large viewing angle, high contrast, light weight, and low power consumption. They are one of the hottest research areas of display devices at present, and due to their unique flexibility, their application range is becoming more and more extensive. In the process of preparing OLED display devices, each layer of organic light-emitting material needs to be evenly evaporated onto the substrate, that is, the substrate is placed under a magnetic plate to be flattened by magnetic adsorption, and an evaporation source is placed under the substrate. Then, the material in the evaporation source is melted and evaporated or vaporized by heating with a coil, and then sprayed out through a nozzle, so that the light-emitting material is evenly attached to the substrate to form a high-quality film layer.

[0003] However, impurity particles generated by partial ashing, deterioration and other effects during material evaporation will also be ejected through the nozzle and evaporated onto the substrate, thus affecting the performance and yield of the product. Summary of the invention

[0004] The present application provides an evaporation source and an evaporation device, aiming to reduce impurity particles evaporated onto a substrate and improve product performance and yield.

[0005] In a first aspect, an embodiment of the present application provides an evaporation source, comprising: A crucible and a crucible cover plate arranged on the crucible, wherein the crucible has a containing cavity and a plurality of partition plates located in the containing cavity, and the plurality of partition plates divide the containing cavity into a plurality of evaporation tanks; The guide part is arranged in the evaporation tank, and the guide part covers the opening of the evaporation tank from the top of the evaporation tank. The guide part includes a plurality of plates located in different planes, and at least one of the plurality of plates is provided with a plurality of guide ports, and the guide ports are arranged through the at least one plate.

[0006] Optionally, the guide portion includes a first plate body, second plates located at both ends of the first plate body in the length direction, and third plates located at both sides of the second plate body in the length direction, and the first plate body, the second plate body and the third plate body are connected to each other; The first plate is parallel to the bottom wall of the crucible, the second plate is perpendicular to the first plate, the third plate is inclined toward the inner wall of the crucible, and a plurality of guide ports are provided on the third plate, and the guide ports pass through the third plate.

[0007] Optionally, an opening ratio of the plurality of guide openings on the at least one plate is greater than or equal to 5%.

[0008] Optionally, sizes of the guide openings on the guide portion in each of the evaporation tanks are different.

[0009] Optionally, a size of the guide port on the guide portion in the evaporation tank is inversely proportional to a distance between the evaporation tank and a heating device of the evaporation source.

[0010] Optionally, a plurality of mounting parts are provided on the inner wall of the crucible and the partition plate, and the guide part is detachably connected to the evaporation tank via the plurality of mounting parts.

[0011] Optionally, the material of the guide part includes titanium alloy and stainless steel.

[0012] Optionally, the shape of the guide port includes circular, square or polygonal.

[0013] Optionally, the evaporation source further comprises: A rectifying plate is arranged in the crucible and is located above the plurality of evaporation tanks. The rectifying plate is provided with a plurality of through holes penetrating the rectifying plate.

[0014] A second aspect of the embodiments of the present application provides an evaporation device, comprising an evaporation source as provided in the first aspect of the embodiments of the present application.

[0015] Beneficial effects: The present application provides an evaporation source and an evaporation device. A crucible and a crucible cover are provided. The interior of the crucible has a containing cavity and a plurality of partition plates located in the containing cavity. The plurality of partition plates divide the containing cavity into a plurality of evaporation tanks. A guide portion is provided in the evaporation tank. The guide portion covers the opening of the evaporation tank from the top of the evaporation tank. The guide portion includes a plurality of plate bodies located in different planes. A plurality of guide ports are provided on at least one of the plurality of plate bodies. The plurality of plate bodies located in different planes of the guide portion can be more advantageous. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the description of the embodiments of the present application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0017] Figure 1 It is a structural schematic diagram of an evaporation source proposed in one embodiment of the present application; Figure 2This is a schematic structural diagram of a flow guide portion in an evaporation source proposed in one embodiment of the present application; Figure 3 is a front view of a flow guide portion in an evaporation source proposed in one embodiment of the present application; Figure 4 It is a side view of a guide portion in an evaporation source proposed in one embodiment of the present application; Figure 5 It is a top view of a guide portion in an evaporation source proposed in one embodiment of the present application.

[0018] Explanation of the reference numerals: 10, crucible; 11, containing chamber; 12, partition plate; 13, evaporation tank; 20, crucible cover plate; 21, nozzle; 30, guide part; 31, guide port; 32, first plate body; 33, second plate body; 34, third plate body; 40, rectifying plate. DETAILED DESCRIPTION

[0019] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0020] Reference Figure 1 As shown, an evaporation source disclosed in an embodiment of the present application includes a crucible 10 , a crucible cover plate 20 and a flow guide portion 30 .

[0021] Specifically, the crucible 10 is a container for placing the evaporation material, so the crucible 10 has a receiving chamber 11 inside, and a plurality of partition plates 12 are arranged in the receiving chamber 11, and the plurality of partition plates 12 divide the receiving chamber 11 into a plurality of evaporation tanks 13. In the embodiment of the present application, the crucible 10 is generally rectangular as a whole, and the receiving chamber 11 inside it is also rectangular, and the plurality of partition plates 12 are arranged at intervals along the length direction of the receiving chamber 11, so as to divide the receiving chamber 11 into a plurality of evaporation tanks 13 in the length direction of the receiving chamber 11, and when the evaporation process is performed, the evaporation material will be placed in each evaporation tank 13. It can be understood that the evaporation source also includes a heating device, and the crucible 10 can be heated by the heating device, so that the evaporation material in each evaporation tank 13 is heated and evaporated.

[0022] Reference Figure 1 As shown, the crucible cover plate 20 is disposed at the opening of the crucible 10, and the crucible cover plate 20 can close the opening of the crucible 10. At the same time, a plurality of nozzles 21 are disposed on the crucible cover plate 20, and the evaporated deposition material can be sprayed out through the nozzles 21 and evaporated onto the substrate.

[0023] However, impurity particles generated by partial ashing, deterioration and other effects during material evaporation may also be ejected through the nozzle 21 and evaporated onto the substrate, thereby affecting the performance and yield of the product.

[0024] For this purpose, refer to Figure 1 and Figure 2 As shown, in the embodiment of the present application, a guide portion 30 is provided in each evaporation tank 13. The guide portion 30 includes a plurality of plates located in different planes, and these plates are interconnected to form a cover-like structure, so that the guide portion 30 covers the opening of the evaporation tank 13 from the top of the evaporation tank 13. At the same time, at least one of the plurality of plates is provided with a plurality of guide ports 31, and the guide ports 31 are arranged through the plate. That is, after the evaporation material in the evaporation tank 13 evaporates or vaporizes, it will first flow to the position of the guide plate, contact with each plate of the guide plate, and then enter the position of the crucible cover plate 20 from the position of the guide port 31, and finally be sprayed out by the nozzle 21.

[0025] In this process, since the multiple plates of the guide part 30 are located in different planes and the evaporation material will contact each plate, it can be more conducive to the adsorption and rebound of impurity particles generated during evaporation, making it difficult for the impurity particles to flow out of the evaporation tank 13 through the guide part 30, thereby reducing the impurity particles evaporated onto the substrate and improving the performance and yield of the product.

[0026] In the embodiment of the present application, the opening ratio of the plurality of guide ports 31 on at least one plate is greater than or equal to 5%, so as to ensure that the evaporation material can normally flow out of the evaporation tank 13 through the guide portion 30 .

[0027] The material of the flow guide 30 may be the same as that of the crucible 10. For example, the material of the flow guide 30 may be titanium alloy or stainless steel.

[0028] The shape of the guide port 31 can be set according to the size requirements. For example, the shape of the guide port 31 can be circular, square or polygonal.

[0029] At the same time, a plurality of mounting parts are provided on the inner wall of the crucible 10 and the partition plate 12, and the guide part 30 can be installed in the evaporation tank 13 through the plurality of mounting parts. Exemplarily, the mounting parts can be strip-shaped protrusions on the side wall of the crucible 10 and the strip-shaped protrusions provided on the partition plate 12. It can be understood that these strip-shaped protrusions are at the same height. When the evaporation source is used, the guide part 30 is placed in the evaporation tank 13, and its position is limited by these strip-shaped protrusions. Moreover, such a design can make the removal of the guide part 30 more convenient.

[0030] In addition, refer to Figure 1As shown, in the embodiment of the present application, the evaporation source also includes a rectifying plate 40 disposed in the crucible 10, the rectifying plate 40 is located above the plurality of evaporation slots 13, and the rectifying plate 40 is provided with a plurality of through holes penetrating the rectifying plate 40. The rectifying plate 40 and the area above the evaporation slots 13 in the crucible 10 together form a rectifying chamber. The vaporized evaporation material in the evaporation slots 13 enters the rectifying chamber through the guide portion 30, converges and mixes in the rectifying chamber, and can balance the temperature and pressure of the vaporized evaporation material, making the temperature and pressure uniform, and then enters the nozzle 21 through the through holes on the rectifying plate 40.

[0031] In an optional embodiment, referring to Figure 2 As shown, the embodiment of the present application further provides an evaporation source, in which the guide portion 30 includes a first plate body 32 , a second plate body 33 and a third plate body 34 .

[0032] Specifically, refer to Figure 1 and Figure 2 As shown, the first plate 32 is arranged along the length direction of the evaporation tank 13, and the first plate 32 is parallel to the bottom wall of the crucible 10; Figure 2 and Figure 4 As shown; there are two second plates 33, the two second plates 33 are respectively located at both ends of the length direction of the first plate 32, and the second plate 33 is perpendicular to the first plate 32; refer to Figure 2 , Figure 3 and Figure 5 As shown, two third plates 34 are provided, and the two third plates 34 are respectively located on both sides of the length direction of the first plate 32. The third plate 34 is connected to the first plate 32 and the two second plates 33 at the same time, so that the guide part 30 is enclosed to form a cover-like structure.

[0033] At the same time, refer to Figure 1 and Figure 4 As shown, in this embodiment, the third plate 34 is inclined toward the inner wall of the crucible 10, that is, the third plate 34 extends from the first plate 32 toward the inner wall of the crucible 10 and toward the bottom of the crucible 10. The third plate 34 is provided with a plurality of guide ports 31 penetrating the third plate 34, and the evaporated deposition material can flow out of the evaporation tank 13 through the guide ports 31.

[0034] Since the third plate 34 is arranged toward the inner wall of the crucible 10, the evaporated evaporation material will contact the inner wall of the crucible 10 when flowing out, so that the impurity particles flowing out of the evaporation tank 13 can be further adsorbed and rebounded on the inner wall of the crucible 10, thereby better reducing the impurity particles entering the nozzle 21 and improving the yield and performance of the product.

[0035] In the related art, since the heating device of the evaporation source heats from the outside to the inside, the temperature of the material inside the crucible 10 may be uneven, resulting in inconsistent evaporation amounts of the material in different evaporation tanks 13 in the crucible 10. Among them, the material in the evaporation tank 13 close to the heating device will be converted into gas first and then evaporated, resulting in residual material in the evaporation tank 13 far from the heating device, forming an "island effect", causing material waste, and at the same time affecting the stability of the evaporated film layer. The difference in material evaporation rate will also lead to uneven substrate film layer and reduce device performance.

[0036] To this end, in the embodiment of the present application, the size of the guide opening 31 on the guide portion 30 can be adjusted so that the evaporation rate of the materials in different evaporation tanks 13 remains roughly the same. That is, in the embodiment of the present application, the size of the guide opening 31 on the guide portion 30 in each evaporation tank 13 is different.

[0037] Specifically, the size of the guide opening 31 on the guide portion 30 in the evaporation tank 13 is inversely proportional to the distance between the evaporation tank 13 and the heating device. For example, the size of the guide opening 31 on the guide portion 30 in the evaporation tank 13 closer to the heating device will be slightly smaller, while the size of the guide opening 31 on the guide portion 30 in the evaporation tank 13 farther from the heating device will be slightly larger, so that the evaporation rate of the evaporation material in the two evaporation tanks 13 can be kept roughly the same, and the formation of the "island effect" can be avoided, thereby reducing the waste of evaporation materials.

[0038] Based on the same inventive concept, an embodiment of the present application discloses an evaporation device, including any evaporation source as described above in the embodiment of the present application.

[0039] It should be noted that the various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0040] It should also be noted that, in this article, the orientation or position relationship indicated by the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc. is based on the orientation or position relationship shown in the drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application. In addition, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is any such actual relationship or order between these entities or operations, nor can they be understood as indicating or implying relative importance. Moreover, the terms "include", "comprise" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or terminal device including a series of elements includes not only those elements, but also includes other elements not explicitly listed, or also includes elements inherent to such process, method, article or terminal device. Without more restrictions, an element defined by the phrase "comprising a ..." does not exclude the existence of other identical elements in the process, method, article or terminal device comprising the element.

[0041] The technical solution provided by the present application is described in detail above. The principle and implementation method of the present application are described in this article using specific examples. The description of the above embodiments is only used to help understand the present application, and the content of this specification should not be understood as limiting the present application. At the same time, for those of ordinary skill in the art, according to the present application, there will be different forms of changes in the specific implementation methods and application scopes. It is not necessary and impossible to list all the implementation methods here, and the obvious changes or modifications derived therefrom are still within the scope of protection of the present application.

Claims

1. An evaporation source, characterized in that: include: A crucible and a crucible cover plate arranged on the crucible, wherein the crucible has a containing cavity and a plurality of partition plates located in the containing cavity, and the plurality of partition plates divide the containing cavity into a plurality of evaporation tanks; The guide part is arranged in the evaporation tank, and the guide part covers the opening of the evaporation tank from the top of the evaporation tank. The guide part includes a plurality of plates located in different planes, and at least one of the plurality of plates is provided with a plurality of guide ports, and the guide ports are arranged through the at least one plate.

2. The evaporation source according to claim 1, characterized in that: The guide part includes a first plate body, a second plate body located at both ends of the first plate body in the length direction, and a third plate body located at both sides of the second plate body in the length direction, and the first plate body, the second plate body and the third plate body are connected to each other; The first plate is parallel to the bottom wall of the crucible, the second plate is perpendicular to the first plate, the third plate is inclined toward the inner wall of the crucible, and a plurality of guide ports are provided on the third plate, and the guide ports pass through the third plate.

3. The evaporation source according to claim 1, characterized in that: An opening ratio of the plurality of guide ports on the at least one plate body is greater than or equal to 5%.

4. The evaporation source according to claim 1, characterized in that: The sizes of the guide openings on the guide parts in each evaporation tank are different.

5. The evaporation source according to claim 4, characterized in that: The size of the guide port on the guide portion in the evaporation tank is inversely proportional to the distance between the evaporation tank and the heating device of the evaporation source.

6. The evaporation source according to any one of claims 1 to 5, characterized in that: A plurality of mounting parts are provided on the inner wall of the crucible and the partition plate, and the guide part is detachably connected to the evaporation tank through the plurality of mounting parts.

7. The evaporation source according to any one of claims 1 to 5, characterized in that: The material of the guide part includes titanium alloy and stainless steel.

8. The evaporation source according to any one of claims 1 to 5, characterized in that: The shape of the guide port includes circular, square or polygonal.

9. The evaporation source according to any one of claims 1 to 5, characterized in that: The evaporation source also includes: A rectifying plate is arranged in the crucible and is located above the plurality of evaporation tanks. The rectifying plate is provided with a plurality of through holes penetrating the rectifying plate.

10. A vapor deposition device, characterized in that: The method comprises the evaporation source as described in any one of claims 1 to 9.

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