Internal reflection immersion grating and manufacturing method thereof

Abstract

The present invention relates to the field of grating manufacturing technology, and in particular to an internal reflection immersion grating and a manufacturing method thereof, wherein the manufacturing method comprises: forming a first initial solidified layer on a first grating surface of a first immersion dielectric body, and forming a second initial solidified layer on a second grating surface of a second immersion dielectric body; using a stamping surface to align and stamp the first initial solidified layer to form a first solidified layer having a grating; forming a high reflection film on a surface of the first solidified layer away from the first immersion dielectric body; aligning a side of the second immersion dielectric body formed with the second initial solidified layer with a side of the first solidified layer having the high reflection film and stamping to form a second solidified layer connecting the second immersion dielectric body and the high reflection film; one of the first immersion dielectric body and the second immersion dielectric body is a prism, and the other is a planar substrate. The present invention is at least conducive to reducing the difficulty of manufacturing the internal reflection immersion grating and realizing the protection of the grating.

Description

Technical Field

[0001] The invention belongs to the technical field of grating manufacturing, and in particular relates to an internal reflection type immersion grating and a manufacturing method thereof. Background Art

[0002] The immersion grating consists of a grating and a prism. The grating is located at the bottom of the prism. The incident light is incident on the prism surface, refracted into the prism, and diffracted on the grating. The diffracted light leaves the prism surface after being refracted by the prism. Since the diffraction occurs inside the medium with a high refractive index (inside the prism), the optical path difference and the character dispersion increase proportionally. When the immersion grating is used in the spectrometer, it can not only achieve high spectral resolution, but also reduce the focal length of the collimation system, thereby greatly reducing the size of the spectrometer. With the gradual improvement of spectral resolution and the demand for miniaturization of grating-type imaging spectrometers, immersion gratings are gradually being used in high-precision remote sensing atmospheric monitoring imaging spectrometers.

[0003] Related technologies reported the use of ion beam etching to prepare a trapezoidal grating on a quartz substrate, and then bonding the trapezoidal grating to a quartz prism to form an immersion grating, and also reported the use of wet etching <100> The step grating is prepared from a flat single crystal silicon with a crystal orientation, and then bonded to a silicon prism, and a reflective film is plated on the grating. The above-mentioned immersion gratings are all made by bonding the original engraved grating to the prism. The original engraved grating has a long production cycle, high cost and cannot be produced in batches in a reproducible manner. In order to further reduce the production difficulty and cost of the immersion grating and ensure that the performance of the immersion grating does not deteriorate, it is urgent to develop a method for rapid preparation of the immersion grating and grating protection. Summary of the invention

[0004] In view of this, the present invention aims to provide an internal reflection type immersion grating and a method for manufacturing the same, which at least helps to reduce the difficulty of the manufacturing process of the internal reflection type immersion grating and achieve protection of the grating.

[0005] To achieve the above object, the technical solution created by the present invention is implemented as follows:

[0006] The invention provides a method for manufacturing an internal reflection immersion grating, comprising: providing a grating master, the embossing surface of the grating master having a microstructure for forming a grating; providing a first immersion dielectric body and a second immersion dielectric body, forming a first initial solidified layer on a first grating surface of the first immersion dielectric body, and forming a second initial solidified layer on a second grating surface of the second immersion dielectric body; using the embossing surface to align and emboss the first initial solidified layer to form a first solidified layer having a grating; forming a high reflection film on a surface of the first solidified layer away from the first immersion dielectric body; aligning a side of the second immersion dielectric body formed with the second initial solidified layer with a side of the first solidified layer having the high reflection film and embossing to form a second solidified layer connecting the second immersion dielectric body and the high reflection film; one of the first immersion dielectric body and the second immersion dielectric body is a prism, and the other is a planar substrate.

[0007] Furthermore, providing a grating master includes: providing a master substrate, and forming a microstructure on a side surface of the master substrate; a method of forming the microstructure includes at least one of mechanical scratching, ion beam etching, electron beam exposure, laser direct writing or wet etching.

[0008] Furthermore, the material of the first initial solidified layer and the material of the second initial solidified layer both include epoxy resin.

[0009] Furthermore, the step of forming a first solidified layer includes: using a stamping surface to perform alignment stamping on a side of the first initial solidified layer away from the first immersion medium body to form a grating on the first initial solidified layer, and curing the first initial solidified layer before removing the grating master to form a first solidified layer with a grating, and then removing the grating master; the step of forming a second solidified layer includes: aligning the side of the second immersion medium body formed with the second initial solidified layer with the side of the first solidified layer with a high reflective film and stamping, and performing a curing operation after the stamping is completed to convert the second initial solidified layer into a second solidified layer.

[0010] Furthermore, before using the stamping surface to perform alignment stamping on the first initial solidified layer, the method further includes: forming an anti-sticking film layer on the stamping surface.

[0011] Furthermore, the anti-sticking film layer includes a silicone oil film and an aluminum film stacked in sequence along a direction away from the grating master.

[0012] Furthermore, the high reflective film includes at least one of a gold film, a silver film and an aluminum film.

[0013] Furthermore, the method for forming the high reflective film includes at least one of ion beam sputtering, electron beam evaporation or magnetron sputtering.

[0014] Furthermore, the method for manufacturing an internal reflection immersion grating also includes: coating an anti-reflection film on the incident surface of the prism.

[0015] Another aspect of the invention provides an internal reflection immersion grating, comprising: a first immersion dielectric body, the first immersion dielectric body having a first grating surface; a first solidified layer, a high reflection film, a second solidified layer and a second immersion dielectric body stacked in sequence on the first grating surface; wherein a side of the first solidified layer away from the first immersion dielectric body has a grating, and a side of the second solidified layer away from the second immersion dielectric body corresponds to the grating; one of the first immersion dielectric body and the second immersion dielectric body is a prism, and the other is a planar substrate.

[0016] Compared with the prior art, the invention can achieve the following beneficial effects: the embodiment of the invention first provides a grating master, transfers and embosses the microstructure of the grating master onto the first initial solidified layer coated on the first immersion medium body to obtain the first solidified layer formed with a grating, and then forms a high-reflectivity film, i.e., a high-reflection film, on the grating, and aligns and embosses the grating formed with the high-reflection film with the second immersion medium body coated with the second initial solidified layer to form an internal reflection immersion grating. The manufacturing method has low process difficulty, low process cost and simple preparation steps, which is conducive to reducing the process difficulty of batch preparation of internal reflection immersion gratings, and the formed grating is sealed by the first immersion medium body, the first solidified layer, the second immersion medium body and the second solidified layer, which is conducive to improving the service life of the grating. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The drawings constituting part of the present invention are used to provide a further understanding of the present invention. The exemplary embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation on the present invention. In the drawings:

[0018] Figure 1 A schematic diagram of the structure of the grating master described in the embodiment of the present invention;

[0019] Figure 2 A schematic structural diagram of a first immersion medium body having a first initial solidified layer and a second immersion medium body having a second initial solidified layer according to an embodiment of the present invention;

[0020] Figure 3 A schematic diagram of the structure after forming an anti-reflection film and a high-reflection film in the method for manufacturing an internal reflection immersion grating according to an embodiment of the present invention;

[0021] Figure 4 A schematic diagram of the structure of an internal reflection immersion grating according to an embodiment of the present invention;

[0022] Figure 5 A graph showing the relationship between the incident wavelength and the diffraction efficiency of the internal reflection immersion grating described in the embodiment of the present invention.

[0023] Explanation of the reference numerals: 1. grating master; 11. microstructure; 2. first immersion dielectric body; 41. first initial solidified layer; 3. second immersion dielectric body; 42. second initial solidified layer; 6. anti-reflection film; 51. first solidified layer; 7. high-reflection film; 52. second solidified layer. DETAILED DESCRIPTION

[0024] After analysis, it was found that there are currently two main methods for making immersion gratings. The first method is to directly process the relief grating on the surface of the prism (immersion medium). The second method is to process the prism (immersion medium) and the grating separately and finally bond them together.

[0025] The first method is to directly process the grating on the bottom surface of the prism, or to prepare the relief grating on the surface of the cubic immersion dielectric material, and then cut the cubic immersion dielectric material into a prism. Since the immersion dielectric material must be directionally etched and directionally formed according to high-precision specifications, and the relief grating surface lacks protection during the prism forming process, the manufacturing process of directly processing the relief grating on the surface of the immersion dielectric material to make the immersion grating is more difficult, which is not conducive to the rapid batch production of immersion gratings.

[0026] The second method is to prepare a relief grating on the front of the immersion medium plane substrate by photolithography, ion beam etching, chemical corrosion or single-point diamond cutting, and then glue the back of the immersion medium plane substrate to the prism. Compared with the first method, this method avoids directly processing the grating on the prism, but the production process of forming a relief grating on the immersion medium plane substrate still includes multiple processes such as coating, gluing, exposure and etching. In other words, the grating production process is still complicated and not conducive to mass production, and the production cost is high. In addition, the relief grating is in contact with the outside world for a long time, and there is a risk of grating damage and performance degradation. Therefore, it is necessary to explore a method for rapid preparation of immersion gratings with low cost and high yield, and to ensure that the formed grating has a long service life.

[0027] To solve the above problems, an embodiment of the present invention provides a method for manufacturing an internal reflection immersion grating, which can reduce the manufacturing period and difficulty of the internal reflection immersion grating and increase the service life of the grating while ensuring the diffraction efficiency of the internal reflection immersion grating.

[0028] In order to make the purpose, technical solution and advantages of the invention more clear, the invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the invention and do not constitute a limitation of the invention.

[0029] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0030] In the description of the invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the invention, unless otherwise specified, the meaning of "multiple" is two or more.

[0031] In the description of the invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the invention can be understood according to specific circumstances.

[0032] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments.

[0033] refer to Figures 1 to 4 The present invention provides a method for manufacturing an internal reflection immersion grating, comprising: referring to Figure 1 , providing a grating master 1, the grating master 1 has a microstructure 11 for forming a grating on its embossing surface; Figure 2 , providing a first immersion dielectric body 2 and a second immersion dielectric body 3, forming a first initial solidified layer 41 on a first grating surface of the first immersion dielectric body 2, and forming a second initial solidified layer 42 on a second grating surface of the second immersion dielectric body 3; referring to Figures 2 to 3 , using the imprinting surface to perform alignment imprinting on the first initial solidified layer 41 to form a first solidified layer 51 having a grating; forming a high reflection film 7 on the surface of the first solidified layer 51 away from the first immersion medium body 2; referring to Figure 4, align the side of the second immersion medium body 3 formed with the second initial solidified layer 42 with the side of the first solidified layer 51 having the high reflective film 7 and perform embossing to form a second solidified layer 52 connecting the second immersion medium body 3 and the high reflective film 7; one of the first immersion medium body 2 and the second immersion medium body 3 is a prism, and the other is a planar substrate.

[0034] It should be noted that the drawings provided in the embodiments of the present invention are all illustrated by taking the first immersion medium body 2 as a prism and the second immersion medium body 3 as a planar substrate as an example. In other embodiments of the present invention, the first immersion medium body 2 may also be a planar substrate and the second immersion medium body 3 may be a prism.

[0035] In the method for manufacturing an internal reflection immersion grating provided in an embodiment of the present invention, the function of the grating master 1 is to provide the geometric morphology of the grating. Specifically, the grating master 1 has an embossing surface with a microstructure 11 on the embossing surface, and the shape of the microstructure 11 corresponds to the shape of the grating to be formed subsequently.

[0036] In some embodiments of the present invention, the microstructure 11 may include a plurality of grating grooves, and the grating grooves may be rectangular grooves or triangular grooves; in other embodiments of the present invention, the grating grooves may be grooves of other shapes, as long as the grating can be formed by embossing the grating grooves.

[0037] In the method for manufacturing an internal reflection immersion grating provided in an embodiment of the present invention, the prism is the main body of the internal reflection immersion grating, and both the incident light and the diffracted light propagate inside it. The flat substrate is the protective backplane of the grating. The grating is used to improve the diffraction dispersion and distribute the reflected energy flow to a specific diffraction order. The high reflection film 7 is used to improve the diffraction efficiency of the grating.

[0038] Furthermore, providing the grating master 1 includes: providing a master substrate, and forming a microstructure 11 on one side surface of the master substrate; the way of forming the microstructure 11 includes at least one of mechanical scratching, ion beam etching, electron beam exposure, laser direct writing or wet etching.

[0039] Furthermore, the material of the first initial solidified layer 41 and the material of the second initial solidified layer 42 both include epoxy resin, and the formed grating is an epoxy resin grating.

[0040] In some embodiments of the present invention, the material of the first initial solidified layer 41 or the material of the second initial solidified layer 42 also includes epoxy resin and refractive index matching liquid. It should be noted that the initial solidified layer (the first initial solidified layer or the second initial solidified layer) with the refractive index matching liquid is the initial solidified layer in contact with the prism, the refractive index matching liquid is used to reduce the interface reflection between the prism and the solidified layer (the first solidified layer or the second solidified layer), and the epoxy resin is used to undertake the replication transfer of the microstructure 11 of the grating master 1 and to bond the planar substrate and the prism together.

[0041] In some embodiments of the present invention, the first initial solidified layer 41 and the second initial solidified layer 42 may be formed by coating.

[0042] Furthermore, the step of forming the first solidified layer 51 includes: using a stamping surface to perform alignment stamping on the side of the first initial solidified layer 41 away from the first immersion medium body 2 to form a grating on the first initial solidified layer 41, and curing the first initial solidified layer 41 before removing the grating master 1 to form the first solidified layer 51 with the grating, and then removing the grating master 1; the step of forming the second solidified layer 52 includes: aligning the side of the second immersion medium body 3 formed with the second initial solidified layer 42 with the side of the first solidified layer 51 with the high reflection film 7 and stamping, and performing a curing operation after the stamping is completed to convert the second initial solidified layer 42 into the second solidified layer 52, and the second solidified layer 52 bonds the first immersion medium body 2 and the second immersion medium body 3 together to achieve the sealing of the grating, that is, the plane substrate serves as a protective plate for the grating.

[0043] In some embodiments of the present invention, after forming the second solidified layer 52, the method further includes: applying sealant to the side gaps at the connection between the first solidified layer 51 and the first immersion medium body 2, the side gaps at the connection between the second solidified layer 52 and the second immersion medium body 3, the side gaps at the connection between the high reflection film 7 and the second solidified layer 52, and the side gaps at the connection between the high reflection film 7 and the first solidified layer 51. This is beneficial to improving the structural stability of the internal reflection immersion grating and extending the service life of the internal reflection immersion grating.

[0044] In some examples, the curing operation may be a high temperature curing process.

[0045] In other embodiments of the present invention, ultraviolet curing UV glue may also be used as the first initial curing layer 41 and the second initial curing layer 42, and the curing operation may be a UV radiation curing process.

[0046] Furthermore, before using the stamping surface to perform alignment stamping on the first initial solidified layer 41, the method further includes: forming an anti-sticking film layer on the stamping surface. The anti-sticking film layer prevents the structure of the grating from being damaged when the grating master is removed from the first solidified layer.

[0047] Further, the anti-adhesive film layer includes a silicone oil film and an aluminum film stacked in sequence in a direction away from the grating master 1. It should be noted that after peeling off the grating master, the silicone oil film and the aluminum film need to be removed, and the aluminum film is helpful to avoid the unremoved oil film between the subsequently formed high-reflection film and the grating.

[0048] Furthermore, the high reflection film 7 includes at least one of a gold film, a silver film and an aluminum film.

[0049] In some embodiments of the present invention, the high reflective film may also be a multilayer dielectric film, which may be composed of dozens or even hundreds of layers of alternating high refractive index dielectric material layers and low refractive index dielectric material layers. In some examples, the film system structure of the multilayer dielectric film may be (HL) P , L represents a low refractive index dielectric material, such as SiO2, H represents a high refractive index dielectric material, such as HfO2, and P is the number of repeated periods.

[0050] Furthermore, the method for forming the high reflective film 7 includes at least one of ion beam sputtering, electron beam evaporation or magnetron sputtering.

[0051] For further reference, Figure 3 The method for manufacturing the internal reflection immersion grating further includes: coating an anti-reflection film 6 on the incident surface of the prism. The anti-reflection film 6 is used to increase the transmittance of the working wavelength to the incident surface of the prism and reduce the interface reflection of the incident surface of the prism.

[0052] A specific embodiment of the present invention is further described below.

[0053] Example 1: A near-infrared internal reflection immersion grating with a working band in the range of 1000nm to 2500nm is manufactured. The grating line density can be 90gr / mm, the working level is -1 level, the first immersion medium body 2 and the second immersion medium body 3 can be made of quartz material, and the incident angle of the light incident on the surface where the grating is located in the prism can be 24.7°. The manufacturing method of the internal reflection immersion grating is as follows:

[0054] Step 1, preparing triangular grating grooves with a period of 11.11 μm and a blaze angle of 2.8° on a master substrate by photolithography to obtain a grating master 1;

[0055] Step 2, placing the grating master 1 obtained in step 1 into a thermal evaporation vacuum coating machine, and sequentially evaporating a silicone oil film and an aluminum film on the microstructure 11 of the grating master, wherein the thickness of the silicone oil film can be in the range of 10nm to 20nm, and the thickness of the aluminum film can be 100nm;

[0056] Step 3, ultrasonically clean the quartz prism and the 1 mm thick quartz flat substrate, place them in an oven, and bake and dry them at 100° C. for 30 minutes, wherein the bottom surface area of ​​the prism used to form the grating is the same as the area of ​​the surface of the flat substrate that subsequently faces the prism;

[0057] Step 4, 4-methylimidazole and epoxy resin glue are mixed in a ratio of 1:10 to form a solidified layer, the solidified layers are respectively used as the first initial solidified layer 41 and the second initial solidified layer 42, and the solidified layers are coated on the bottom surface of the prism in step 3 and the surface of one side of the planar substrate. The thickness of the solidified layers on the bottom surface of the prism and the surface of the planar substrate can be in the range of 4.8 μm to 5.2 μm, preferably 5 μm;

[0058] Step 5, align and emboss the grating master 1 obtained in step 2 and the prism with the solidified layer obtained in step 4, apply pressure to squeeze out the excess solidified layer, obtain a very thin and uniform solidified layer, then place it in an oven, bake it at 70°C for 5 hours for solidification, and cool it to room temperature and take it out;

[0059] Step 6, separating the grating master plate 1 and the prism along the grating line direction, at which time an aluminum grating microstructure is formed on the bottom surface of the prism;

[0060] Step 7, placing the prism with aluminum grating microstructure obtained in step 6 in a NaOH solution with a mass concentration of 10 g / L and letting it stand, taking out the prism after the aluminum film is completely dissolved and disappearing, and drying it with high-purity nitrogen gas to obtain a prism with epoxy resin grating;

[0061] Step 8, coating a gold film (high reflective film 7) on the epoxy resin grating in step 7 by electron beam evaporation assisted deposition, and the thickness of the gold film may be 100 nm;

[0062] Step 9, aligning and stamping the prism coated with the high-reflection film 7 with the solidified layer formed on the flat substrate in step 4, and repeating the solidification operation in step 5;

[0063] Step 10: The prism and the flat substrate bonded together in step 9 are not separated, and the excess solidified layer overflowing from the edge is removed with a blade or an organic solvent, thereby finally forming an internal reflection immersion grating.

[0064] Another aspect of the present invention provides an internal reflection type immersion grating. The internal reflection type immersion grating can be formed by using the manufacturing method of the internal reflection type immersion grating provided in the above embodiment.

[0065] refer to Figure 4 The internal reflection immersion grating includes: a first immersion dielectric body 2, the first immersion dielectric body 2 having a first grating surface; a first solidified layer 51, a high reflection film 7, a second solidified layer 52 and a second immersion dielectric body 3 stacked in sequence on the first grating surface; wherein the first solidified layer 51 has a grating on a side away from the first immersion dielectric body 2, and the second solidified layer 52 corresponds to the grating on a side away from the second immersion dielectric body 3; one of the first immersion dielectric body 2 and the second immersion dielectric body 3 is a prism, and the other is a planar substrate.

[0066] The grating in the internal reflection immersion grating provided by the embodiment of the present invention is formed on the prism, and the grating is sandwiched between the first solidified layer 51 and the second solidified layer 52, that is, sandwiched between the immersion medium that plays a protective role. Therefore, the internal reflection immersion grating has high stability, which is beneficial to avoid damage to the structure of the grating caused by external stress, and is beneficial to prolonging the service life of the grating. The solidified layer and the flat substrate formed on the side of the grating away from the prism will not affect the structural morphology of the grating. Figure 5 The internal reflection immersion grating provided by the embodiment of the present invention can have a maximum diffraction efficiency higher than 90% within the working band, and the internal reflection immersion grating has a simple structure and a low manufacturing process difficulty, which is conducive to reducing the difficulty of mass production of internal reflection immersion gratings.

[0067] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the disclosure of the present invention can be performed in parallel, sequentially or in different orders, as long as the desired results of the technical solution disclosed in the present invention can be achieved, and this document does not limit this.

[0068] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A method for manufacturing an internal reflection immersion grating, characterized in that: include: Providing a grating master, wherein the embossing surface of the grating master has a microstructure for forming a grating; providing a first immersion dielectric body and a second immersion dielectric body, forming a first initial solidified layer on a first grating surface of the first immersion dielectric body, and forming a second initial solidified layer on a second grating surface of the second immersion dielectric body; Using the stamping surface to perform alignment stamping on the first initial solidified layer to form a first solidified layer having a grating; forming a high reflective film on a surface of the first solidified layer away from the first immersion medium body; Aligning the side of the second immersion medium body formed with the second initial solidified layer with the side of the first solidified layer having the high reflective film and performing embossing to form a second solidified layer connecting the second immersion medium body and the high reflective film; One of the first immersion medium body and the second immersion medium body is a prism, and the other is a planar substrate; The step of forming the first solidified layer comprises: using the stamping surface to perform alignment stamping on the side of the first initial solidified layer away from the first immersion medium body to form the grating on the first initial solidified layer, curing the first initial solidified layer before removing the grating master to form the first solidified layer having the grating, and then removing the grating master; The step of forming the second solidified layer comprises: aligning the side of the second immersion medium body formed with the second initial solidified layer with the side of the first solidified layer having the high reflective film and performing imprinting, and performing a curing operation after the imprinting is completed, so that the second initial solidified layer is converted into the second solidified layer; The material of the first initial solidified layer or the material of the second initial solidified layer includes epoxy resin and refractive index matching liquid, and the initial solidified layer with the refractive index matching liquid is the initial solidified layer in contact with the prism.

2. The method for manufacturing an internal reflection immersion grating according to claim 1, characterized in that: Providing the grating master comprises: Providing a motherboard substrate, and forming the microstructure on one side surface of the motherboard substrate; The microstructure is formed by at least one of mechanical scribing, ion beam etching, electron beam exposure, laser direct writing or wet etching.

3. The method for manufacturing an internal reflection immersion grating according to claim 1, characterized in that: The material of the first initial solidified layer and the material of the second initial solidified layer both include epoxy resin.

4. The method for manufacturing an internal reflection immersion grating according to claim 1, characterized in that: Before using the stamping surface to align and stamp the first initial solidified layer, the method further includes: An anti-adhesive film layer is formed on the stamping surface.

5. The method for manufacturing an internal reflection immersion grating according to claim 4, characterized in that: The anti-sticking film layer includes a silicone oil film and an aluminum film stacked in sequence in a direction away from the grating master.

6. The method for manufacturing an internal reflection immersion grating according to claim 1, characterized in that: The high reflective film includes at least one of a gold film, a silver film, and an aluminum film.

7. The method for manufacturing an internal reflection immersion grating according to claim 1, characterized in that: The method for forming the high reflective film includes at least one of ion beam sputtering, electron beam evaporation or magnetron sputtering.

8. The method for manufacturing an internal reflection immersion grating according to claim 1, characterized in that: The method for manufacturing an internal reflection immersion grating further comprises: An anti-reflection film is coated on the incident surface of the prism.

9. An internal reflection type immersion grating, wherein the internal reflection type immersion grating is formed by the internal reflection type immersion grating manufacturing method according to any one of claims 1 to 8, characterized in that: The internal reflection immersion grating comprises: a first immersion dielectric body having a first grating surface; A first solidified layer, a high reflective film, a second solidified layer, and a second immersion medium body are sequentially stacked on the first grating surface; Wherein, a side of the first solidified layer away from the first immersion medium body has a grating, and a side of the second solidified layer away from the second immersion medium body corresponds to the grating; One of the first immersion medium body and the second immersion medium body is a prism, and the other is a planar substrate.

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