Full-automatic polishing and etching equipment

Abstract

The invention discloses full-automatic polishing and etching equipment, and relates to the technical field of automatic glass etching equipment. Comprising a feeding station, a first cleaning station, an alkali polishing station, a second cleaning station and a discharging station which are sequentially distributed in the first direction. Each of the first cleaning station, the alkali polishing station and the second cleaning station comprises a plurality of functional tanks; the plurality of functional tanks are all provided with bubbling assemblies and liquid circulation assemblies, and a throwing mechanism is arranged in the functional tank of the alkali polishing station; the glass basket is used for loading glass; the transferring assembly is used for driving the glass to move along a first direction and a vertical direction; the glass basket comprises two side plates, limiting rods and a first connecting rod, the limiting rods and the first connecting rod are arranged between the two side plates, the two sides of the glass are limited between the limiting rods, the bottom of the glass abuts against the first connecting rod, and a plurality of limiting grooves are distributed in the limiting rods in the second direction; according to the technical scheme provided by the invention, the etching efficiency and the etching quality of the glass can be effectively improved.

Description

Technical Field

[0001] The present application relates to the technical field of automatic glass etching equipment, and in particular to a fully automatic polishing and etching equipment. Background Art

[0002] Glass has excellent chemical resistance, heat resistance, biocompatibility, large optical transition range, and low light absorption, and is an important material for various applications. At present, the development trend of mobile phones and LCDs is towards thinning and lightness. In order to comply with this development trend, the thickness of single glass panels is gradually becoming thinner. Glass panel thinning is generally achieved through the following two methods: the first is to directly manufacture thin glass panels, which is a complex process with high cost and huge expense; the second method is to thin the produced glass substrate to obtain a thin glass panel of the target thickness.

[0003] Traditional chemical thinning is achieved by etching with an etching liquid, which is generally divided into spray-type and immersion-type liquid thinning. In spray-type etching, the liquid spray trajectory cannot be accurately controlled, so there is more etching liquid at the intersection of the spray ranges of each spray gun. The etching liquid at this part of the glass panel has a large impact force and thins faster, while the etching liquid at other parts or edges is less and thins slower. At the same time, after the etching liquid is sprayed onto the glass panel, the etching liquid has different flow strengths at different parts of the glass panel due to different scouring intensities, resulting in uneven thickness on the same piece of glass.

[0004] The throwing type etching alleviates the above problems to a certain extent, but it also has the problem of uneven etching. The main reason is that the traditional throwing type etching equipment needs to fix part of the position of the glass, and the fixed position will cause etching dead angles. After etching, the glass clamping part will form a step structure with other positions, causing uneven etching. The patent document of our company's previous application with the patent number "CN116375353B" discloses "a glass liquid throwing device and production line" (application 1), which realizes the up and down floating of the glass during the forward etching of the glass. The glass does not have a fixed clamping position, so as to achieve the effect of uniform etching, but it is found in actual application that it exposes the following problems:

[0005] First, it is difficult to adjust the process parameters of the etching process. Since it uses a long-segment linkage method to achieve the up and down floating of the glass, the alkali polishing tank needs to be designed to be very long and accommodate a large amount of alkali polishing liquid. When the alkali polishing liquid is partially contaminated, the entire alkali polishing tank will be affected. At this time, it takes a lot of time and energy to make adjustments; secondly, during the etching process, when the temperature needs to be adjusted, due to the large base amount of liquid, it takes a long time to introduce a higher temperature etching solution to circulate throughout the alkali polishing tank, that is, it takes a long time to reach a uniform temperature. At the same time, the design requirements for the liquid circulation pipeline are high, and it is necessary to consider introducing heated etching solution from multiple inlets to ensure that the liquid in the alkali polishing tank can quickly reach the ideal temperature.

[0006] Second, the upper limit of the etching speed is low, and it is difficult to further increase the etching speed; the etching efficiency is strongly correlated with the etching temperature. The long-segment structural design and the large number of liquid bases make it difficult for Application 1 to maintain a constant high temperature in actual applications. It is necessary to consider the input of heated alkaline polishing liquid at multiple points, and whether the temperature of each section can reach the equilibrium temperature quickly after the input.

[0007] Third, it consumes energy and raw materials. It takes a lot of energy to maintain the temperature of a large tank for a long time. When some pollution appears in the tank, the entire tank is affected and the entire tank needs to be treated. Summary of the invention

[0008] The purpose of this application is to provide a fully automated polishing and etching device to solve at least one of the above technical problems.

[0009] In order to solve the above technical problems, the present application provides a fully automated polishing and etching equipment, including a loading station, a first cleaning station, an alkali polishing station, a second cleaning station and a unloading station sequentially distributed along a first direction;

[0010] The first cleaning station, the alkali polishing station and the second cleaning station all include a plurality of functional tanks;

[0011] Several of the functional tanks are provided with bubbling components and liquid circulation components, and a polishing mechanism is provided in the functional tank of the alkali polishing station;

[0012] A material conveying mechanism is provided at the loading station and the unloading station respectively;

[0013] Also included is a glass basket for loading glass and a transfer assembly for driving the glass to move along a first direction and a vertical direction;

[0014] The glass basket comprises two side plates, a limiting rod and a first connecting rod arranged between the two side plates, the two sides of the glass are limited between the limiting rods, the bottom of the glass abuts against the first connecting rod, and the limiting rod has a plurality of limiting grooves distributed along a second direction; the first direction and the second direction are perpendicular to each other;

[0015] A hook portion is formed on the side plate, and the transfer assembly is suitable for transferring the glass basket through the hook portion;

[0016] The throwing mechanism is suitable for acting on the bottom of the glass to make the glass reciprocate along the vertical direction.

[0017] Preferably, the throwing mechanism further comprises a throwing module and a first rotation drive assembly, and the throwing module is provided with at least two groups, and each group of the throwing module is suitable for cooperating with one of the glass baskets to throw the glass;

[0018] The throwing module comprises a base, a mounting seat, a connecting block and a throwing rod;

[0019] The mounting seats are provided with two and are arranged on the base opposite to each other, the connecting block is rotatably arranged on the mounting seat, the first rotation driving assembly is used to drive the connecting block to rotate around a first axis, the throwing rod is arranged between the connecting blocks of the two mounting seats, and the axis of the throwing rod does not coincide with the first axis;

[0020] The first axis, the axis of the throwing rod and the second direction are parallel.

[0021] Preferably, the loading and unloading mechanism comprises a conveyor belt assembly extending along a first direction;

[0022] The conveyor belt assemblies are provided with at least two groups and are arranged side by side along the second direction.

[0023] Preferably, the transfer assembly includes an upper slide rail, a lower slide rail, a mounting frame, a lateral movement module, a lifting drive module, a lifting cantilever and a lifting claw module;

[0024] The upper slide rail and the lower slide rail are distributed in the vertical direction and extend in the first direction, and a rack extending in the first direction is provided on one side of the upper slide rail or the lower slide rail; the mounting frame is suitable for being slidably arranged on the upper slide rail and the lower slide rail in the first direction;

[0025] The lateral movement module is arranged on the mounting frame, and comprises a second rotating driving member, and a first gear arranged at a driving end of the second rotating driving member, wherein the first gear is meshed with the rack;

[0026] The lifting drive module is arranged on the mounting frame and is suitable for driving the lifting cantilever to lift and lower. The lifting claw modules are provided in plurality and are arranged at intervals along the second direction. Two adjacent lifting claw modules act on one glass basket.

[0027] The lifting claw module includes a main body portion fixedly connected to the lifting cantilever and a plurality of claw body portions extending away from the lifting cantilever. A positioning rod extending along a second direction is provided on the claw body portion, and the positioning rod is suitable for cooperating with the hook body portion to lift the glass basket.

[0028] Preferably, a blocking module is further provided on the loading station and the unloading station, and the blocking module comprises a safety lifting door, a limit frame and a lifting driving member for driving the safety lifting door to lift;

[0029] The limiters are arranged on both sides of the safety lifting door, and the safety lifting door is suitable for extending into or moving out of the moving path of the glass basket along the vertical direction.

[0030] Preferably, a first waist-shaped hole is formed on the side plate along the first direction;

[0031] Two ends of the limiting rod can be adjusted and fixed to the first waist-shaped hole.

[0032] Preferably, the functional slot includes a main slot and a secondary slot;

[0033] The throwing mechanism is arranged in the main tank, and an overflow tank connected to the main tank is arranged on the side wall at the upper end of the main tank; the liquid circulation assembly includes a circulating water pump, an overflow pipe, a circulating water inlet pipe and a circulating pipe;

[0034] One end of the overflow pipe is connected to the overflow tank, and the other end is connected to the auxiliary tank;

[0035] The circulation pipe is arranged in the main tank and below the throwing rod. One end of the circulation water inlet pipe is connected to the circulation pipe, and the other end is connected to the auxiliary tank. The circulation water pump is used to provide liquid circulation power.

[0036] A heating module is provided on the auxiliary tank, and the heating module is suitable for heating the liquid in the auxiliary tank.

[0037] Preferably, the bubbling assembly comprises a bubbler and a bubbling tube connected to the bubbler, wherein the bubbling tube is arranged below the throwing rod and above the circulation tube;

[0038] A porous filter plate is provided between the bubbling tube and the circulation tube.

[0039] Preferably, a cover plate is provided at the upper end of the main groove, and the cover plate shell is rotatably disposed on the main groove and is suitable for covering the upper end of the main groove.

[0040] Preferably, the transfer components are provided with at least two;

[0041] The first cleaning station includes at least two hot water washing function tanks and the hot water washing function tanks are used to implement hot water cleaning;

[0042] The alkali polishing station comprises at least two alkali polishing functional slots, and the functional slots are used to implement alkali etching;

[0043] The second cleaning station includes at least two hot water washing function tanks and one cold water washing function tank, and the two function tanks close to the material unloading function are the cold water washing function tank and the hot water washing function tank respectively along the material conveying direction.

[0044] Compared with the prior art, the beneficial effects of the present application are as follows: when etching the glass in the present solution, under the action of the throwing mechanism, the glass reciprocates in the vertical direction within the limited range of the glass basket, and it does not have an absolute fixed position, so there is no problem of a step structure on the glass clamping fixed position in the traditional etching equipment, which effectively improves the overall etching uniformity of the glass and improves the etching quality; in addition, the present solution is a multi-slot design, which can realize simultaneous etching and cleaning of multiple stations at the same time, effectively improves the etching efficiency and increases production capacity, and the etching of a single station is more convenient for the staff to make real-time adjustments, and the etching temperature is more controllable. Since the problem of etching temperature uniformity is resolved, it can be raised to a higher temperature for etching, that is, compared with application 1, the etching temperature is higher and the etching efficiency is higher; further, when a contamination problem occurs in a single slot body, only the single slot body needs to be adjusted in a timely manner, and other slot bodies can continue to work normally without the need to shut down the entire equipment for maintenance, which greatly improves both production capacity and resource conservation. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0046] Figure 1 It is a schematic diagram of the overall structure of one embodiment of the present application;

[0047] Figure 2 It is a schematic diagram of the overall structure of one embodiment of the present application;

[0048] Figure 3 It is a schematic diagram of the overall structure of one embodiment of the present application;

[0049] Figure 4 It is a schematic diagram of the overall structure of one embodiment of the present application;

[0050] Figure 5 It is a structural schematic diagram of a transfer assembly in one embodiment of the present application;

[0051] Figure 6 yes Figure 5 A schematic diagram of the structure of part A in the middle;

[0052] Figure 7 It is a material conveying mechanism in one embodiment of the present application;

[0053] Figure 8 It is a material conveying mechanism in one embodiment of the present application;

[0054] Fig. 9 It is a structural schematic diagram of a functional slot in one embodiment of the present application;

[0055] Fig.10 It is a structural schematic diagram of a functional slot in one embodiment of the present application;

[0056] Fig.11 It is a structural schematic diagram of a functional slot in one embodiment of the present application;

[0057] Fig.12 It is a structural schematic diagram of a throwing mechanism of one embodiment of the present application;

[0058] Fig.13 It is a structural schematic diagram of a throwing mechanism of one embodiment of the present application;

[0059] Fig.14 yes Fig.13 A schematic diagram of the structure of part B in the middle;

[0060] Fig.15 This is a structural schematic diagram of a glass basket according to one embodiment of the present application;

[0061] Fig.16 yes Fig.15 A schematic diagram of the structure enlargement of the C part;

[0062] Fig.17 It is a schematic diagram of the structure of a bubbling tube in one embodiment of the present application;

[0063] Fig.18 This is a schematic diagram of the structure of a circulation pipe in one embodiment of the present application;

[0064] Among them: 11, loading station; 12, first cleaning station; 13, alkali polishing station; 14, second cleaning station; 15, unloading station; 16, casing; 17, exhaust hole; 181, cold water washing function tank; 182, hot water washing function tank; 21, bubbling tube; 22, main tank; 221, overflow tank; 2211, overflow grid hole; 222, cover plate; 23, auxiliary tank; 24, heating module; 31, circulating water pump; 32, overflow pipe; 33, circulating water inlet pipe; 34, circulating pipe; 41, first rotary drive assembly; 411, first rotary drive member; 412, umbrella gear; 413, transmission shaft; 42, throwing module; 421, base; 422, mounting seat; 423, connecting block; 424, throwing rod; 43, porous filter plate; 50, material conveyor Conveying mechanism; 51, transmission belt; 52, third rotating drive member; 60, blocking module; 61, limiting frame; 62, safety lifting door; 63, lifting drive member; 70, glass basket; 71, side plate; 711, hook body; 712, first waist-shaped hole; 713, second waist-shaped hole; 72, limiting rod; 721, limiting groove; 73, first connecting rod; 731, supporting part; 80, conveying assembly; 81, upper slide rail; 82, lower slide rail; 83, lateral movement module; 831, second rotating drive member; 832, first gear; 84, rack; 85, lifting drive module; 851, fourth rotating drive member; 852, screw rod assembly; 86, lifting claw module; 861, main body; 862, claw body; 8621, positioning rod; 87, in-position sensor;

[0065] C1, first direction; C2, second direction. DETAILED DESCRIPTION

[0066] The following will disclose multiple embodiments of the present application with drawings. For the purpose of clear description, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the present application. In other words, in some embodiments of the present application, these practical details are not necessary. In addition, in order to simplify the drawings, some conventional structures and components will be depicted in a simple schematic manner in the drawings.

[0067] It should be noted that all directional indications such as up, down, left, right, front, back... in the embodiments of the present application are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture as shown in the accompanying drawings. If the specific posture changes, the directional indication will also change accordingly.

[0068] In addition, in the present application, the descriptions of "first", "second", etc. are only used for descriptive purposes, and do not specifically refer to the order or sequence, nor are they used to limit the present application. They are only used to distinguish components or operations described with the same technical terms, and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In addition, the technical solutions between the various embodiments can be combined with each other, but they must be based on the ability of ordinary technicians in the field to implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present application.

[0069] In order to further understand the content, features and effects of the invention of this application, the following embodiments are given as examples and described in detail with reference to the accompanying drawings:

[0070] Example

[0071] Traditional chemical thinning is achieved by etching with an etching liquid, which is generally divided into spray-type and immersion-type liquid thinning. In spray-type etching, the liquid spray trajectory cannot be accurately controlled, so there is more etching liquid at the intersection of the spray ranges of each spray gun. The etching liquid at this part of the glass panel has a large impact force and thins faster, while the etching liquid at other parts or edges is less and thins slower. At the same time, after the etching liquid is sprayed onto the glass panel, the etching liquid has different flow strengths at different parts of the glass panel due to different scouring intensities, resulting in uneven thickness on the same piece of glass.

[0072] The throwing type etching alleviates the above problems to a certain extent, but it also has the problem of uneven etching. The main reason is that the traditional throwing type etching equipment needs to fix part of the position of the glass, and the fixed position will cause etching dead angles. After etching, the glass clamping part will form a step structure with other positions, causing uneven etching. The patent document of our company's previous application with the patent number "CN116375353B" discloses "a glass liquid throwing device and production line" (application 1), which realizes the up and down floating of the glass during the forward etching of the glass. The glass does not have a fixed clamping position, so as to achieve the effect of uniform etching, but it is found in actual application that it exposes the following problems:

[0073] First, it is difficult to adjust the process parameters of the etching process. Since it uses a long-segment linkage method to achieve the up and down floating of the glass, the alkali polishing tank needs to be designed to be very long and accommodate a large amount of alkali polishing liquid. When the alkali polishing liquid is partially contaminated, the entire alkali polishing tank will be affected. At this time, it takes a lot of time and energy to make adjustments; secondly, during the etching process, when the temperature needs to be adjusted, due to the large base amount of liquid, it takes a long time to introduce a higher temperature etching solution to circulate throughout the alkali polishing tank, that is, it takes a long time to reach a uniform temperature. At the same time, the design requirements for the liquid circulation pipeline are high, and it is necessary to consider introducing heated etching solution from multiple inlets to ensure that the liquid in the alkali polishing tank can quickly reach the ideal temperature.

[0074] Second, the upper limit of the etching speed is low, and it is difficult to further increase the etching speed; the etching efficiency is strongly correlated with the etching temperature. The long-segment structural design and the large number of liquid bases make it difficult for Application 1 to maintain a constant high temperature in actual applications. It is necessary to consider the input of heated alkaline polishing liquid at multiple points, and whether the temperature of each section can reach the equilibrium temperature quickly after the input.

[0075] Third, it consumes energy and raw materials. It takes a long time to maintain the temperature of a large tank body, which consumes a lot of energy. When some pollution appears in the tank body, the entire tank body is affected. At this time, the entire tank body needs to be treated. In order to solve the above technical problems, this embodiment provides the following technical solutions:

[0076] For details, see Figure 1-18 , this embodiment provides a fully automated polishing and etching equipment, including a loading station 11, a first cleaning station 12, an alkali polishing station 13, a second cleaning station 14 and a unloading station 15 which are sequentially distributed along a first direction;

[0077] It is understandable that the glass to be etched is automatically loaded by the loading station 11, and then enters the first cleaning station 12 for preliminary cleaning to ensure the cleanliness of the glass surface, which can effectively improve the subsequent etching quality, while reducing the contamination of impurities to the etching solution in the subsequent alkali polishing station 13, thereby improving the etching quality.

[0078] Specifically, the first cleaning station 12, the alkali polishing station 13 and the second cleaning station 14 each include a plurality of functional tanks;

[0079] In the above scheme, the functional tanks in the first cleaning station 12 and the second cleaning station 14 are understood to be loaded with pure water for cleaning, while the functional tank in the alkali polishing station 13 is loaded with a chemical solution for etching.

[0080] Specifically, several functional tanks are provided with bubbling components and liquid circulation components, and a polishing mechanism is provided in the functional tank of the alkali polishing station 13;

[0081] Specifically, a material conveying mechanism 50 is provided at the loading station 11 and the unloading station 15 respectively;

[0082] Also included is a glass basket 70 for loading glass and a transfer assembly 80 for driving the glass to move along a first direction and a vertical direction;

[0083] In the above scheme, the glass is loaded in the glass basket 70, and the glass basket 70 provides a good and stable placement point for the glass. At the same time, multiple glasses can be transported and etched at one time, thereby improving the production capacity. The loading station 11 and the unloading station 15 are both provided with a material conveying mechanism 50, which can automatically convey the glass to a designated position. Taking loading as an example, after the material conveying mechanism on the loading station 11 conveys the glass basket 70 loaded with the glass to a designated position, the transfer assembly 80 further transfers the glass basket 70.

[0084] For details, see Fig.15 The glass basket 70 includes two side plates 71, a limiting rod 72 and a first connecting rod 73 disposed between the two side plates 71, both sides of the glass are limited between the limiting rods 72, the bottom of the glass abuts against the first connecting rod 73, and the limiting rod 72 has a plurality of limiting grooves 721 distributed along the second direction; the first direction and the second direction are perpendicular to each other;

[0085] It is understandable that, in some embodiments, a plurality of limit rods 72 are provided and are arranged opposite to each other, such as Fig.15 As shown in the figure, three limiting rods 72 are respectively provided on both sides, the glass is limited between the limiting rods 72, and its bottom is supported by the first connecting rod 73 to achieve the limitation of the three sides of the glass; it can be further understood that the limiting rod 72 limits the glass through the limiting groove 721 formed thereon, and each limiting groove 721 can limit one glass, so that multiple glasses can be effectively separated and the stability of their limitation can be ensured at the same time.

[0086] In one embodiment, a first waist-shaped hole 712 is formed along a direction on the side plate 71, and both ends of the limiting rod 72 can be adjusted on the first waist-shaped hole 712; it can be understood that when etching glass of different sizes, the relative position of the limiting rod 72 in the first direction can be adjusted to achieve the limitation of glass of different sizes, thereby improving the compatibility of the etching equipment.

[0087] For details, see Figure 15-16 A second waist-shaped hole 713 is formed on the side plate 71 along the first direction, and both ends of the first connecting rod 73 can be adjustably arranged on the second waist-shaped hole 713; it can be understood that the position of the first connecting rod 73 can also be adjusted along the first direction, so as to achieve better support for the glass and make the force on the bottom support of the glass more uniform.

[0088] For further information, see Fig.16 A supporting portion 731 is formed on the side of the first connecting rod 73 close to the glass; the cross-section of the supporting portion 731 may be umbrella-shaped; it is understandable that the present solution further optimizes the structure of the first connecting rod 73, which aims to increase the bearing area of ​​the first connecting rod 73 on the glass, thereby improving the supporting stability, increasing the contact area, reducing the pressure during contact, and reducing the risk of wear on the glass during bearing.

[0089] The two side panels 71 are connected by a limiting rod 72 and a first connecting rod 73, and the three cooperate to form a main structure for loading glass; further, in some embodiments, a reinforcing connecting rod may be further added, which is also used to connect the two side panels 71, and its main function is to further increase the main structural strength of the glass basket 70.

[0090] Specifically, a hook portion 711 is formed on the side plate 71, and the transfer assembly 80 is suitable for transferring the glass basket 70 through the hook portion 711;

[0091] In the above scheme, taking loading as an example, after the material conveying mechanism 50 conveys the glass basket 70 to the designated position, the transfer assembly 80 first descends, then moves along the first direction to enter under the hook body 711, and then moves upward to lift the glass basket 70 through the hook body 711; in unloading, the transfer assembly 80 first places the glass basket 70 on the material conveying mechanism 50 of the unloading station 15, then further moves downward to leave the hook body 711, then moves along the first direction to separate from the longitudinal projection of the hook body 711 to achieve staggering, and then moves upward.

[0092] Specifically, the throwing mechanism is suitable for acting on the bottom of the glass to make the glass reciprocate in the vertical direction;

[0093] In the above scheme, when the transfer component 80 drives the glass basket 70 to move above the functional groove, the glass basket 70 can enter the functional groove by driving it downward. When it enters the functional groove of the cleaning station, the glass is limited by the limit rod 72. Therefore, under the action of the throwing mechanism, the glass on the glass basket 70 can move up and down. The bubbling component and the liquid circulation component can be used to fully clean the glass. Compared with the traditional etching equipment, the glass in this scheme has an up and down floating process during cleaning, and there is no absolutely fixed cleaning dead angle. Therefore, each position of the glass is cleaned more late, which is more conducive to promoting the subsequent etching quality. Similarly, after the glass is cleaned for the first time, the transfer component 80 transfers the glass basket 70 to the functional groove of the alkali polishing station 13 for etching. The glass on the glass basket 70 can be completely immersed in the etching liquid. With the cooperation of the bubbling component and the liquid circulation component, the etching liquid in the functional groove of the alkali polishing station 13 presents a more uniform state, thereby improving the uniformity of etching the glass. It can be further understood that when the glass in the present solution is etched, under the action of the throwing mechanism, the glass reciprocates in the vertical direction within the limited range of the glass basket 70, and it does not have an absolute fixed position. Therefore, there is no problem of a step structure on the glass clamping and fixing position in the traditional etching equipment, which effectively improves the overall etching uniformity of the glass and improves the etching quality; in addition, the present solution is a multi-slot design, which can realize simultaneous etching and cleaning of multiple stations at the same time, effectively improves the etching efficiency and improves the production capacity, and the etching of a single station is more convenient for the staff to make real-time adjustments, and the etching temperature is more controllable. Since the problem of etching temperature uniformity is resolved, it can be increased to a higher temperature for etching, that is, compared with application 1, the etching temperature is higher and the etching efficiency is higher; further, when a contamination problem occurs in a single slot body, only the single slot body needs to be adjusted in time, and other slot bodies can continue to work normally without the need to shut down the entire equipment for maintenance, which greatly improves both production capacity and resource saving.

[0094] For details, see Figure 12-14 The throwing mechanism further includes a throwing module 42 and a first rotation drive assembly 41. The throwing module 42 is provided with at least two groups, and each group of the throwing module 42 is suitable for cooperating with a glass basket 70 to throw the glass;

[0095] It is understandable that in this solution, one functional slot can accommodate multiple glass baskets 70. It is understandable that when loading and unloading, the transfer assembly 80 can transfer multiple glass baskets 70 at the same time, thereby improving etching efficiency.

[0096] like Fig.12 As shown in FIG. , in this embodiment, one functional slot accommodates two glass baskets 70;

[0097] Specifically, the throwing module 42 includes a base 421, a mounting seat 422, a connecting block 423 and a throwing rod 424;

[0098] Further, two mounting seats 422 are provided and are arranged on the base 421 opposite to each other, the connecting block 423 is rotatably arranged on the mounting seat 422, the first rotation driving assembly 41 is used to drive the connecting block 423 to rotate around the first axis, the throwing rod 424 is arranged between the connecting blocks 423 of the two mounting seats 422, and the axis of the throwing rod 424 does not coincide with the first axis;

[0099] Wherein, the first axis and the axis of the throwing rod 424 are parallel to the second direction;

[0100] In one embodiment, the first direction and the second direction are perpendicular to each other.

[0101] In the above scheme, the first rotation driving assembly 41 can drive the connection block 423 to rotate, and the rotation of the connection block 423 further drives the throwing rod 424 to rotate. Since the rotation axis of the connection block 423, that is, the first axis, does not coincide with the axis of the throwing rod 424, the throwing rod 424 rotates around the first axis. It can be understood that when the throwing rod 424 rotates to a high position, it will drive the glass to move upward, and when the throwing rod 424 further rotates into a low position, the glass will follow it to move downward under the action of gravity. When 24 is further rotated to the bottom of the first connecting rod 73, it is not the throwing rod 424 but the first connecting rod 73 that supports the glass. Then the throwing rod 424 reaches the high position again by rotating to promote the upward movement of the glass. The above process is repeated to promote the reciprocating up and down movement of the glass. It can be understood that this solution realizes the up and down throwing of the glass through the simple rotation action of the throwing rod 424, thereby improving the etching uniformity of the glass. Compared with application 1, the throwing speed of the glass can be independently controlled, and the specific etching process is more controllable.

[0102] For details, see Fig.13 In some embodiments, the first rotary drive assembly 41 includes a first rotary drive member 411, a gear set and a transmission shaft 413. The gear set includes a plurality of bevel gears 412 and spur gears. The first rotary drive member 411 realizes rotation transmission through the cooperation of a plurality of transmission shafts 413, bevel gears 412 and spur gears. The rotation transmission method is a relatively mature technology in the prior art, so this scheme does not further elaborate on the specific principles and connection methods, but it should be understood that it does not affect the technical personnel in this field to understand the overall scheme.

[0103] It can be further understood that when the functional slots in the alkali polishing station 13 simultaneously polish the glasses in multiple glass baskets 70, the synchronous action of the two polishing stations can be achieved by sharing the transmission shaft 413 and cooperating with the corresponding gear sets, that is, the glasses on the two glass baskets 70 in the same alkali polishing functional slot can be lifted and lowered synchronously, thereby ensuring the uniformity of glass etching and reducing the setting of the driving mechanism. For details, see Fig.13 As shown in , it includes two alkali polishing stations 13 , but it uses a driving mechanism, which can be understood as a driving motor, cooperating with a gear set and a transmission shaft 413 to achieve synchronous rotation of the two throwing rods 424 in the two alkali polishing stations 13 .

[0104] For details, see Figure 4-5 The loading and unloading mechanism includes a conveyor belt assembly extending along a first direction;

[0105] Furthermore, the conveyor belt assembly is provided with at least two groups, and is arranged side by side along the second direction;

[0106] Furthermore, the conveyor belt assembly includes a transmission belt 51 and a third rotating driving member 52. The glass basket 70 can be placed on the transmission belt 51. The third rotating driving member 52 drives the transmission belt 51 to move and then drives the glass basket 70 to move, so as to achieve loading or unloading. In this solution, multiple conveyor belt assemblies can be provided at the same time to transport multiple glass baskets 70, thereby improving the loading efficiency; it can be further understood that the subsequent transfer assembly 80 can also realize the loading of multiple glass baskets 70 at the same time when loading, and the functional slot can accommodate multiple glass baskets 70.

[0107] Furthermore, it is preferred that two glass baskets 70 are loaded at one time, and the functional slot can accommodate two glass baskets 70 at one time.

[0108] For details, see Figure 4-6 , the delivery assembly includes an upper slide rail 81, a lower slide rail 82, a mounting frame, a lateral movement module 83, a lifting drive module 85, a lifting cantilever and a lifting claw module 86;

[0109] Specifically, the upper slide rail 81 and the lower slide rail 82 are distributed along the vertical direction and extend along the first direction, and a rack 84 extending along the first direction is provided on one side of the upper slide rail 81 or the lower slide rail 82; the mounting frame is suitable for sliding along the first direction on the upper slide rail 81 and the lower slide rail 82;

[0110] Furthermore, the lateral movement module 83 is disposed on the mounting frame, and includes a second rotation driving member 831, a first gear 832 disposed at a driving end of the second rotation driving member 831, and the first gear 832 is meshed with the rack 84;

[0111] In the above scheme, the upper slide rail 81 and the lower slide rail 82 support and limit the mounting frame, so that the mounting frame can move smoothly and stably along the first direction. When the mounting frame needs to move in the first direction, the second rotating driving member 831 drives the first gear 832 to rotate, and the first gear 832 meshes with the rack 84, and then the mounting frame moves along the first direction under the cooperation of the two. In this scheme, the rack 84 and the first gear 832 are used to cooperate to realize the movement of the transfer assembly 80. Compared with other driving modes, the driving mode is more suitable for the specific needs of this scheme, which can make the glass basket 70 fall to the corresponding position more accurately, so that the throwing mechanism can better throw the glass. In addition, the design of upper and lower double slide rails is also used in this scheme, so that the mounting frame is more stable during the movement process, thereby ensuring the stability of the glass during the transfer process.

[0112] Specifically, the lifting drive module 85 is disposed on the mounting frame and is suitable for driving the lifting cantilever to lift and lower. A plurality of lifting claw modules 86 are provided and spaced apart along the second direction. Two adjacent lifting claw modules 86 act on one glass basket 70.

[0113] In the above solution, taking two glass baskets 70 as an example, three lifting claw modules 86 can be provided, wherein two lifting claw modules 86 are located at both sides, and one lifting claw module 86 is located in the middle, so as to realize two lifting stations for lifting two glass baskets 70. Similarly, multiple glass baskets 70 are also applicable.

[0114] For details, see Figure 6 The lifting claw module 86 includes a main body 861 fixedly connected to the lifting cantilever and a plurality of claw bodies 862 extending away from the lifting cantilever. A positioning rod 8621 extending along the second direction is provided on the claw body 862. The positioning rod 8621 is suitable for cooperating with the hook body 711 to lift the glass basket 70.

[0115] In the above solution, the lifting drive module 85 drives the lifting cantilever to descend, and then the first gear 832 rotates along the first direction to approach the glass basket 70 and enter under the hook body 711, and the lifting module drives the lifting cantilever to rise again. At this time, the positioning rod 8621 can extend into the hook body 711. As the lifting drive module 85 further drives the lifting cantilever to rise, the lifting claw module 86 drives the glass basket 70 to rise, thereby lifting the glass basket 70, and then can further drive the glass basket 70 to move along the first direction.

[0116] Specifically, in some embodiments, the lifting drive module 85 includes a fourth rotary drive member 851 and a screw assembly 852; the screw assembly 852 is connected to the lifting cantilever; it is understandable that the fourth rotary drive member 851 drives the screw assembly 852 to move, and the screw assembly 852 drives the lifting cantilever to move in the vertical direction; it should be noted that the screw assembly 852 is a relatively mature technology in the prior art, which can convert circumferential rotational motion into its axial motion, thereby realizing the lifting drive of the lifting cantilever, and this application will not further elaborate on this.

[0117] For details, see Figure 5 In some embodiments, a position sensor 87 is further provided on the mounting frame; it is understandable that the sensor is used to detect whether the glass basket 70 has risen to a suitable position to avoid collision during the lateral movement and improve the safety of the working process.

[0118] Specifically, in order to further ensure the stability and orderliness of loading and unloading, this embodiment provides the following technical solutions:

[0119] For details, see Figure 7-8 A blocking module 60 is also provided on the loading station 11 and the unloading station 15. The blocking module 60 includes a safety lifting door 62, a limit frame 61, and a lifting driving member 63 for driving the safety lifting door 62 to lift;

[0120] Furthermore, the limit frame 61 is arranged on both sides of the safety lifting door 62, and the safety lifting door 62 is suitable for extending into or moving out of the moving path of the glass basket 70 along the vertical direction;

[0121] In the above scheme, the lifting drive 63 can drive the lifting safety door to move up and down. When it is necessary to block the glass basket 70 from loading, the lifting drive 63 drives the lifting safety door to move down and enter the moving path of the glass basket 70 to block the further movement of the glass basket 70. When normal loading can be performed, the lifting drive 63 drives the lifting safety door to move up and out of the moving path of the glass basket 70, so that the glass basket 70 can be normally loaded along the first direction. The limiting frame 61 limits the lifting safety door to make its lifting action more stable.

[0122] Specifically, it also includes a casing 16, which forms an accommodating space for accommodating the above-mentioned mechanism.

[0123] In some embodiments, the housing 16 is provided with through holes for achieving the flow of airflow within the housing 16;

[0124] Furthermore, the housing 16 is made of PP material, which has sufficient strength and corrosion resistance, thereby extending the service life of the equipment.

[0125] Furthermore, the limiting frame 61 can be fixed to the inner wall of the housing 16 .

[0126] For details, see Figure 9-11 , the functional slot includes a main slot 22 and a secondary slot 23;

[0127] Specifically, the throwing mechanism is provided in the main tank 22, and an overflow tank 221 connected to the main tank 22 is provided on the side wall at the upper end of the main tank 22; the liquid circulation assembly includes a circulating water pump 31, an overflow pipe 32, a circulating water inlet pipe 33 and a circulating pipe 34;

[0128] Further, one end of the overflow pipe 32 is connected to the overflow tank 221, and the other end is connected to the auxiliary tank 23;

[0129] Specifically, the circulation pipe 34 is arranged in the main tank 22 and below the throwing rod 424. One end of the circulation water inlet pipe 33 is connected to the circulation pipe 34, and the other end is connected to the auxiliary tank 23. The circulation water pump 31 is used to provide liquid circulation power.

[0130] In the above scheme, taking the functional tank in the alkali polishing station 13 as an example, the auxiliary tank 23 is loaded with etching liquid, and the etching liquid is introduced into the circulation pipe 34 located at the bottom of the main tank 22 through the circulation water inlet pipe 33. The specific structure of the circulation pipe 34 can be seen in Fig.17 As shown, in one embodiment, the circulation pipe 34 has two water inlets and is formed by multiple rows of tube bodies arranged side by side. Through holes are formed on the tube bodies, and the etching liquid flows out into the main tank 22 through the through holes; as the etching liquid in the main tank 22 gradually increases, the etching liquid above the main tank 22 overflows into the overflow tank 221, and the etching liquid in the overflow tank 221 flows back to the auxiliary tank 23 through the overflow pipe 32 to realize liquid circulation, wherein the circulating water pump 31 provides circulation power, and the working principle of the water pump is not further described in this scheme.

[0131] Furthermore, a heating module 24 is provided on the auxiliary tank 23, and the heating module 24 is suitable for heating the liquid in the auxiliary tank 23;

[0132] In the alkaline polishing station 13, in order to improve the etching efficiency, it is necessary to ensure that the etching liquid has a sufficient temperature; in this solution, the etching liquid in the sub-tank 23 is heated by the heating module 24 and then introduced into the main tank 22; compared with application 1, this method can achieve a higher etching temperature for the etching liquid in the main tank 22, thereby improving the etching efficiency; in addition, compared with the method of directly heating at the bottom of application 1, this solution heats the etching liquid in the sub-tank 23 and then introduces it into the main tank 22, which can make the temperature of the etching liquid in the main tank 22 more uniform, which can be more conducive to improving the uniformity of etching and improving the etching quality.

[0133] Specifically, an overflow grid hole 2211 is provided on the side wall of the main groove 22 near the top, that is, the liquid in the main groove 22 flows out into the overflow groove 221 through the overflow grid hole 2211 .

[0134] Furthermore, in some embodiments, an overflow plate (not shown) detachably disposed on the main tank 22 is also included, and an overflow grid hole 2211 is also disposed on the overflow plate; it is understandable that the overflow plate is assembled at the position where the overflow grid hole 2211 is located in the main tank 22 and closes the overflow grid hole 2211 in the main tank 22, and the height of the overflow grid hole 2211 of the assembled overflow plate is higher than the height of the overflow grid hole 2211 in the original main tank 22;

[0135] In the above scheme, when the height of the glass to be etched is relatively high, such as changing the horizontally placed glass to be placed vertically, the original liquid level height may not be able to cover the entire main body of the glass; this scheme can effectively solve this problem by adding a detachable overflow plate. The height of the overflow grid hole 2211 of the added overflow plate is increased, so the liquid level height is also increased accordingly, so that the position that was originally not covered can be covered, thereby effectively solving the above problem.

[0136] Specifically, the bubbling assembly includes a bubbler and a bubbling tube 21 connected to the bubbler. The bubbling tube 21 is arranged below the throwing rod 424 and above the circulation tube 34. The bubbling tube 21 can be seen in Fig.18 A plurality of through holes are formed on the bubbling tube 21 .

[0137] Furthermore, a porous filter plate 43 is provided between the bubbling tube 21 and the circulation tube 34;

[0138] In the above scheme, the main tank 22 in this scheme is provided with a circulation pipe 34, a porous filter plate 43 and a bubbling tube 21 from bottom to top; the liquid in the sub-tank 23 is introduced into the main tank 22 through the circulation pipe 34, and it will first pass through the filtering effect of the porous filter plate 43 to prevent some impurities from entering the upper layer of the porous filter plate 43, thereby ensuring the cleanliness of the glass etching environment, and the bubbling tube 21 placed on the porous filter plate 43 promotes the rapid mixing of the current liquid environment, which can improve the cleaning efficiency and quality in the cleaning station, and can improve the etching efficiency, etching uniformity and etching quality in the alkali polishing station 13.

[0139] Specifically, a cover plate 222 is provided at the upper end of the main groove 22, and the cover plate 222 is rotatably disposed on the main groove 22 and is suitable for covering the upper end of the main groove 22;

[0140] In the above scheme, during the etching process, the etching liquid may splash to a certain extent. At this time, the cover plate 222 can be closed on the main tank 22 and opened after cleaning or etching is completed. This can avoid the problem of etching liquid splashing and corroding the equipment, effectively protect the equipment, and extend the service life of the equipment.

[0141] It can be understood that compared with application 1, this solution can realize the closed operation of a single functional slot, which not only avoids the splashing of etching liquid, but also forms a relatively closed cavity, which is conducive to maintaining temperature and is more beneficial in avoiding energy loss. It can effectively reduce energy loss, and at the same time, the etching temperature in the functional slot is maintained more stably, thereby improving the etching quality.

[0142] Specifically, in one embodiment, at least two transfer assemblies 80 are provided;

[0143] Further, the first cleaning station 12 includes at least two hot water washing function tanks 182 and the hot water washing function tanks 182 are used to implement hot water cleaning;

[0144] Furthermore, the alkali polishing station 13 includes at least two alkali polishing functional slots, and the functional slots are used to implement alkali etching;

[0145] Furthermore, the second cleaning station 14 includes at least two hot water washing function tanks 182 and one cold water washing function tank 181, and the two function tanks close to the material unloading function are the cold water washing function tank 181 and the hot water washing function tank 182 in sequence along the material conveying direction;

[0146] In one embodiment, the first cleaning station 12 is provided with two hot water washing function tanks 182, the alkali polishing station 13 is provided with seven alkali polishing function tanks, and the second cleaning station 14 is provided with two hot water washing function tanks 182, one cold water washing function tank 181, and one hot water washing function tank 182 in sequence along the glass transfer direction;

[0147] In the above scheme, the present scheme transfers the glass basket 70 by setting at least two groups of transfer components 80. The cooperation of multiple groups of transfer components 80 can effectively improve the transfer efficiency; and the number of functional slots in different stations is further adjusted according to the length of time the glass spends in different functional slots. That is, as described above, two hot water washing functional slots 182 are set in the first cleaning station 12. When the transfer component 80 transfers the glass basket 70 to the station, the glass is first washed with hot water. One of them can clean the outer surface of the glass, reduce impurities, and improve the uniformity of subsequent etching. At the same time, it can also reduce the pollution of the functional slots in the subsequent alkali polishing station 13. Further, the glass can be preheated first to gradually increase the temperature of the glass. In one embodiment, the working temperature of the hot water washing functional slot 182 is 55°C, and the working temperature of the functional slot in the alkali polishing station 13 is 120°C. The present scheme first raises the glass to a suitable temperature, and then further raises it to a higher temperature, which can avoid directly placing the glass in the 120°C etching solution, resulting in the temperature inside and outside the glass. The problem of thermal stress caused by excessive difference can effectively reduce the occurrence of glass deformation or cracking. In addition, this method can better control the etching temperature of the glass to ensure the stability and consistency of the etching process. After the glass is alkali-polished, the transfer component 80 transfers it to the hot water washing function tank 182 of the second cleaning station 14, and then transfers it to the cold water washing function tank 181 after another hot water washing (the cold water washing function tank 181 here is loaded with pure water at room temperature). It can be understood that in the cleaning process after alkali polishing, this scheme further adopts a gradient cooling method, first adopts a temperature between room temperature and etching temperature to avoid sudden cooling of the glass, and better cleaning can be achieved at 55°C, and then further cleaning is carried out with cold water. The secondary cleaning further improves the cleaning quality and ensures the cleanliness of the glass surface. The glass after cold water washing is then transferred to the last hot water washing function tank 182 for a third hot water washing, which allows the glass itself to heat up to a certain temperature, which can be beneficial to the subsequent evaporation of water and improve production efficiency.

[0148] The above description is only a preferred embodiment of the present application and does not constitute any form of limitation to the present application. Any simple modification, equivalent changes and modifications made to the above embodiments based on the technical essence of the present application are within the scope of the technical solution of the present application.

Claims

1. A fully automated etching equipment for glass etching, characterized by: It includes a loading station, a first cleaning station, an alkali polishing station, a second cleaning station and an unloading station which are sequentially distributed along a first direction; The first cleaning station, the alkali polishing station and the second cleaning station all include a plurality of functional tanks; Several of the functional tanks are provided with bubbling components and liquid circulation components, and a polishing mechanism is provided in the functional tank of the alkali polishing station; A material conveying mechanism is provided at the loading station and the unloading station respectively; Also included is a glass basket for loading glass and a transfer assembly for driving the glass to move along a first direction and a vertical direction; The glass basket comprises two side plates, a limiting rod and a first connecting rod arranged between the two side plates, the two sides of the glass are limited between the limiting rods, the bottom of the glass abuts against the first connecting rod, and the limiting rod has a plurality of limiting grooves distributed along a second direction; the first direction and the second direction are perpendicular to each other; A hook portion is formed on the side plate, and the transfer assembly is suitable for transferring the glass basket through the hook portion; The throwing mechanism is suitable for acting on the bottom of the glass to make the glass reciprocate along the vertical direction.

2. The fully automated polishing and etching equipment according to claim 1, characterized in that: The throwing mechanism further comprises a throwing module and a first rotation drive assembly, wherein the throwing module is provided with at least two groups, and each group of the throwing modules is suitable for cooperating with one of the glass baskets to throw the glass; The throwing module comprises a base, a mounting seat, a connecting block and a throwing rod; The mounting seats are provided with two and are arranged on the base opposite to each other, the connecting block is rotatably arranged on the mounting seat, the first rotation driving assembly is used to drive the connecting block to rotate around a first axis, the throwing rod is arranged between the connecting blocks of the two mounting seats, and the axis of the throwing rod does not coincide with the first axis; The first axis, the axis of the throwing rod and the second direction are parallel.

3. The fully automated polishing and etching equipment according to claim 2, characterized in that: The loading and unloading mechanism includes a conveyor belt assembly extending along a first direction; The conveyor belt assemblies are provided with at least two groups and are arranged side by side along the second direction.

4. The fully automated polishing and etching equipment according to claim 3, characterized in that: The transfer assembly includes an upper slide rail, a lower slide rail, a mounting frame, a lateral movement module, a lifting drive module, a lifting cantilever and a lifting claw module; The upper slide rail and the lower slide rail are distributed in the vertical direction and extend in the first direction, and a rack extending in the first direction is provided on one side of the upper slide rail or the lower slide rail; the mounting frame is suitable for being slidably arranged on the upper slide rail and the lower slide rail in the first direction; The lateral movement module is arranged on the mounting frame, and comprises a second rotating driving member, and a first gear arranged at a driving end of the second rotating driving member, wherein the first gear is meshed with the rack; The lifting drive module is arranged on the mounting frame and is suitable for driving the lifting cantilever to lift and lower. The lifting claw modules are provided in plurality and are arranged at intervals along the second direction. Two adjacent lifting claw modules act on one glass basket. The lifting claw module includes a main body portion fixedly connected to the lifting cantilever and a plurality of claw body portions extending away from the lifting cantilever. A positioning rod extending along a second direction is provided on the claw body portion, and the positioning rod is suitable for cooperating with the hook body portion to lift the glass basket.

5. The fully automated polishing and etching equipment according to claim 3, characterized in that: A blocking module is also provided on the loading station and the unloading station, and the blocking module includes a safety lifting door, a limit frame and a lifting driving member for driving the safety lifting door to lift; The limiters are arranged on both sides of the safety lifting door, and the safety lifting door is suitable for extending into or moving out of the moving path of the glass basket along the vertical direction.

6. The fully automated polishing and etching equipment according to claim 2, characterized in that: A first waist-shaped hole is formed on the side plate along a first direction; Two ends of the limiting rod can be adjusted and fixed to the first waist-shaped hole.

7. The fully automated polishing and etching equipment according to any one of claims 2 to 6, characterized in that: The functional slots include a main slot and a secondary slot; The throwing mechanism is arranged in the main tank, and an overflow tank connected to the main tank is arranged on the side wall at the upper end of the main tank; the liquid circulation assembly includes a circulating water pump, an overflow pipe, a circulating water inlet pipe and a circulating pipe; One end of the overflow pipe is connected to the overflow tank, and the other end is connected to the auxiliary tank; The circulation pipe is arranged in the main tank and below the throwing rod. One end of the circulation water inlet pipe is connected to the circulation pipe, and the other end is connected to the auxiliary tank. The circulation water pump is used to provide liquid circulation power. A heating module is provided on the auxiliary tank, and the heating module is suitable for heating the liquid in the auxiliary tank.

8. The fully automated polishing and etching equipment according to claim 7, characterized in that: The bubbling assembly comprises a bubbler and a bubbling tube connected to the bubbler, wherein the bubbling tube is arranged below the throwing rod and above the circulation tube; A porous filter plate is provided between the bubbling tube and the circulation tube.

9. The fully automated polishing and etching equipment according to claim 7, characterized in that: A cover plate is provided at the upper end of the main groove, and the cover plate shell is rotatably arranged on the main groove and is suitable for covering the upper end of the main groove.

10. The fully automated polishing and etching equipment according to claim 7, characterized in that: The transfer components are provided with at least two; The first cleaning station includes at least two hot water washing function tanks and the hot water washing function tanks are used to implement hot water cleaning; The alkali polishing station comprises at least two alkali polishing functional slots, and the functional slots are used to implement alkali etching; The second cleaning station includes at least two hot water washing function tanks and one cold water washing function tank, and the two function tanks close to the material unloading function are the cold water washing function tank and the hot water washing function tank respectively along the material conveying direction.

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