A lithographic machine calibration mechanism

By using the combination structure of the base plate, top plate, support ball, and screws in the lithography machine calibration mechanism, the lithography quality problem caused by lens focal length drift in the lithography machine is solved, enabling rapid and accurate adjustment of the standard plate and improving the calibration accuracy and efficiency of the lithography machine.

CN119439638BActive Publication Date: 2025-11-28SHANGHAI CONGGUANG SEMICON TECH CO LTD
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Patent Information

Application Number
CN202411492120.8
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-10-24
Publication Date
2025-11-28
Estimated Expiration
2044-10-24

AI Technical Summary

Technical Problem

During operation, the focal length of the lithography machine lens may drift due to factors such as equipment movement and temperature changes, affecting the lithography quality. Existing technologies make it difficult to quickly and accurately adjust the standard plate to the focal plane of the lithography machine lens.

Method used

The standard plate is adjusted by a combination of an adjusting base plate, an adjusting top plate, a support ball, a first adjusting screw, a second adjusting screw, a tension spring assembly, a lifting block, and a support plate. The standard plate can be adjusted to pitch, height, and rotation by three-point support through the screws and the support ball, and can be quickly and accurately adjusted to the focal plane of the lithography machine lens.

Benefits of technology

It enables rapid and accurate adjustment of the lithography machine standard plate, improves lithography quality, and enhances the calibration accuracy and efficiency of the lithography machine.

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Abstract

The application provides a photoetching machine calibration mechanism, which comprises an adjusting bottom plate, an adjusting top plate, a supporting ball, a first adjusting screw, a second adjusting screw, a tension spring assembly, a lifting block and a support plate for placing a standard plate; the adjusting top plate is located above the adjusting bottom plate, the supporting ball is clamped between the adjusting bottom plate and the adjusting top plate, the adjusting top plate is provided with a first threaded hole and a second threaded hole, the adjusting bottom plate is provided with a first limiting groove and a second limiting groove at positions corresponding to the first threaded hole and the second threaded hole, the first adjusting screw is arranged in the first threaded hole and abuts against the first limiting groove, the second adjusting screw is arranged in the second threaded hole and abuts against the second limiting groove, and the adjusting top plate is connected with the adjusting bottom plate through the tension spring assembly; the lifting block is vertically installed on the adjusting top plate, and the support plate is rotatably installed on the lifting block. The standard plate can be quickly and accurately adjusted to the focal plane of the photoetching machine lens.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing, and particularly relates to a photoetcher calibration mechanism. BACKGROUND

[0002] During the operation of a photoetcher, the photoetcher lens will be affected by factors such as device movement, temperature changes of the device and the environment, so that the focal length of the photoetcher lens changes, i.e. the photoetcher lens drifts, and then the photoetching quality is affected.

[0003] By regularly calibrating the photoetcher lens, the influence of the lens drift on the photoetching quality can be reduced. During the calibration of the photoetcher lens, a standard plate located at the focal plane of the lens is generally used as a reference to test the drift of the lens compared with the originally set standard position, and then the lens is compensated according to the drift. Therefore, during the calibration of the photoetcher lens, a photoetcher calibration mechanism capable of adjusting the standard plate is urgently needed to quickly and accurately adjust the standard plate to the focal plane of the photoetcher lens. SUMMARY

[0004] (I) Technical problems to be solved

[0005] In view of the problems in the prior art, the present application at least solves the problems to some extent. Therefore, the purpose of the present application is to provide a photoetcher calibration mechanism capable of quickly and accurately adjusting a standard plate to the focal plane of a photoetcher lens.

[0006] (II) Technical solutions

[0007] In order to achieve the above purpose, the main technical solutions adopted by the present application include:

[0008] The present application provides a photoetcher calibration mechanism, which comprises an adjusting bottom plate, an adjusting top plate, a supporting ball, a first adjusting screw, a second adjusting screw, a tension spring assembly, a lifting block and a supporting plate for placing a standard plate.

[0009] The adjusting top plate is located above the adjusting bottom plate, the supporting ball is arranged at a fixed position between the adjusting bottom plate and the adjusting top plate, the adjusting top plate is provided with a first threaded hole and a second threaded hole, the adjusting bottom plate is provided with a first limiting groove at a position corresponding to the first threaded hole and a second limiting groove at a position corresponding to the second threaded hole, the first adjusting screw is arranged in the first threaded hole and abuts against the first limiting groove, the second adjusting screw is arranged in the second threaded hole and abuts against the second limiting groove, and the adjusting top plate is connected with the adjusting bottom plate through the tension spring assembly; the first adjusting screw, the second adjusting screw and the supporting ball are arranged in a triangular shape, and the distance between the first adjusting screw and the supporting ball is equal to the distance between the second adjusting screw and the supporting ball; the first adjusting screw and the second adjusting screw are screwed, and the adjusting top plate performs a pitching action around the supporting ball; the lifting block is vertically installed on the adjusting top plate in a lifting manner, and the supporting plate is rotatably installed on the lifting block in a direction perpendicular to the adjusting top plate.

[0010] Optionally, the photoetching machine calibration mechanism further comprises a self-centering locking screw, the adjusting top plate is provided with a mounting hole, the adjusting bottom plate is provided with a threaded groove at a position corresponding to the mounting hole, and the self-centering locking screw can be arranged in the mounting hole and be threadedly connected to the threaded groove; the mounting hole has an annular stepped surface, the self-centering locking screw has an annular limiting surface, the self-centering locking screw is arranged in the mounting hole, the limiting surface abuts against the stepped surface in the up-down direction, and the self-centering locking screw is prevented from continuing to move downward along the mounting hole; the limiting surface and the stepped surface are curved surfaces on a spherical body with matched shapes.

[0011] Optionally, the self-centering locking screw is located on a side away from the supporting ball of the first adjusting screw and the second adjusting screw.

[0012] Optionally, the first adjusting screw, the second adjusting screw and the supporting ball are arranged in a right-angled triangular shape.

[0013] Optionally, the first adjusting screw and the second adjusting screw each comprise a screwing part, a stud and a limiting part connected in sequence from top to bottom, the screwing part is in a cylindrical shape, the diameter of the screwing part is greater than the diameter of the stud, the limiting part is in a spherical shape, and the shapes of the first limiting groove and the second limiting groove are matched with the shape of the limiting part.

[0014] Optionally, the tension spring assembly comprises a first tension spring, a second tension spring and a third tension spring, the first tension spring and the second tension spring are located on a straight line where the first adjusting screw and the second adjusting screw are located, and the triangle shape surrounded by the first tension spring, the second tension spring and the third tension spring is the same as the triangle shape surrounded by the first adjusting screw, the second adjusting screw and the supporting ball.

[0015] Optionally, the adjusting top plate has a mounting shaft with a first shaft section and a second shaft section connected in sequence from top to bottom, the diameter of the first shaft section is smaller than that of the second shaft section, and a thread is formed on the outer surface of the second shaft section; the lifting block has a shaft hole with a first hole section and a second hole section connected in sequence from top to bottom, the diameter of the first hole section is smaller than that of the second hole section, and a thread is formed on the inner surface of the second hole section; the mounting shaft is inserted into the shaft hole, the second hole section is threadedly connected with the second shaft section, and the first shaft section is inserted into the first hole section to form a clearance fit.

[0016] Optionally, the lifting block has a rotating shaft, and the support plate has a slot hole into which the rotating shaft is inserted to form a clearance fit.

[0017] Optionally, the support plate has a first fastening screw and a second fastening screw arranged in a direction perpendicular to the rotating shaft, and the first fastening screw and the second fastening screw are arranged perpendicularly; the first fastening screw and the second fastening screw are screwed to lock and fix the support plate on the lifting block.

[0018] (Three) beneficial effects

[0019] The beneficial effects of the present application are:

[0020] The photoetching machine calibration device provided by the present application has the following beneficial effects: the adjusting top plate and the adjusting bottom plate are connected together through the first adjusting screw, the second adjusting screw and the support ball, and the adjusting top plate and the adjusting bottom plate are pulled tightly by the spring assembly, so that the tension of the spring and the supporting force of the adjusting screw are coupled to each other; the first adjusting screw and the second adjusting screw are screwed to adjust the pitch of the standard plate, the lifting block is used to adjust the up-and-down movement of the standard plate, and the rotating support plate is used to adjust the rotation of the standard plate, so that the standard plate can be quickly and accurately adjusted to the focal plane of the lens of the photoetching machine. BRIEF DESCRIPTION OF DRAWINGS

[0021] The present application is described with the help of the following drawings:

[0022] Figure 1 is a sectional view of the photoetching machine calibration device according to the specific embodiment of the present application;

[0023] Figure 2 is a sectional view of the adjusting top plate according to the specific embodiment of the present application;

[0024] Figure 3 is a top view of the adjusting bottom plate according to the specific embodiment of the present application;

[0025] Figure 4This is a side view of a self-centering locking screw according to a specific embodiment of the present invention.

[0026] [Attached image labels]

[0027] 1: Adjust the base plate;

[0028] 11: First limiting groove; 12: Second limiting groove; 13: First insert; 14: Threaded groove;

[0029] 2: Adjust the top plate;

[0030] 21: First threaded hole; 23: Second insert; 24: Mounting hole; 25: Stepped surface; 26: Mounting shaft; 27: First shaft section; 28: Second shaft section;

[0031] 3: Support ball;

[0032] 4: First adjusting screw;

[0033] 41: Tightening part; 42: Stud; 43: Limiting part; 45: Third tension spring;

[0034] 6: Lifting block;

[0035] 61: Rotation axis;

[0036] 7: Support plate;

[0037] 71: First set screw;

[0038] 8: Self-centering locking screw;

[0039] 81: Limiting surface;

[0040] 9: Standard plate. Detailed Implementation

[0041] To better explain and facilitate understanding of the present invention, a detailed description of the invention is provided below with reference to the accompanying drawings and specific embodiments. It should be noted that the directional terms such as "upper" and "lower" mentioned herein refer to... Figure 1 The orientation is used as a reference.

[0042] like Figures 1 to 4 As shown, the present invention provides a lithography machine calibration device, which includes an adjusting base plate 1, an adjusting top plate 2, a support ball 3, a first adjusting screw 4, a second adjusting screw, a tension spring assembly, a lifting block 6, and a support plate 7 for placing a standard plate 9.

[0043] The adjusting top plate 2 is located above the adjusting bottom plate 1, the supporting ball 3 is clamped between the adjusting bottom plate 1 and the adjusting top plate 2 in a fixed position, the adjusting top plate 2 is provided with a first threaded hole 21 and a second threaded hole, the adjusting bottom plate 1 is provided with a first limiting groove 11 at a position corresponding to the first threaded hole 21, and is provided with a second limiting groove 12 at a position corresponding to the second threaded hole, the first adjusting screw 4 is threaded in the first threaded hole 21 and abuts against the first limiting groove 11, the second adjusting screw is threaded in the second threaded hole and abuts against the second limiting groove 12, and the adjusting top plate 2 is connected with the adjusting bottom plate 1 through the tension spring assembly; the first adjusting screw 4, the second adjusting screw and the supporting ball 3 are in triangular distribution, the distance between the first adjusting screw 4 and the supporting ball 3 is equal to the distance between the second adjusting screw and the supporting ball 3; and the first adjusting screw 4 and the second adjusting screw are screwed, and the adjusting top plate 2 performs pitching action around the supporting ball 3.

[0044] The lifting block 6 is vertically installed on the adjusting top plate 2, and the supporting plate 7 is rotatably installed on the lifting block 6.

[0045] The lithography machine calibration device is provided as above, the first adjusting screw 4, the second adjusting screw and the supporting ball 3 form three-point support between the adjusting top plate 2 and the adjusting bottom plate 1, and the tension spring assembly is arranged between the adjusting top plate 2 and the adjusting bottom plate 1 to pull the adjusting top plate 2 and the adjusting bottom plate 1 tightly, so that the tension spring assembly is pulled tightly while being pulled tightly by the adjusting screw and the supporting ball 3, the pulling force of the tension spring and the supporting force of the adjusting screw are coupled with each other to connect the adjusting top plate 2 and the adjusting bottom plate 1 together; the first adjusting screw 4 and the second adjusting screw are screwed to realize pitching adjustment of the standard plate 9, the lifting block 6 is used to realize up-down lifting adjustment of the standard plate 9, and the supporting plate 7 is rotated to realize rotation adjustment of the standard plate 9, so that the standard plate 9 can be quickly and accurately adjusted to the focal plane of the lens of the lithography machine.

[0046] In the embodiment, the standard plate 9 can be a mask or a wafer.

[0047] Preferably, the first adjusting screw 4, the second adjusting screw and the supporting ball 3 are in right-angled triangular distribution, so that the pitching adjustment of the standard plate 9 is more convenient, and the standard plate 9 can be more quickly adjusted to the focal plane of the lens of the lithography machine.

[0048] Preferably, the adjusting bottom plate 1 is provided with a first curved groove in the shape of a spherical cap at a position corresponding to the supporting ball 3, the adjusting top plate 2 is provided with a second curved groove in the shape of a spherical cap at a position corresponding to the supporting ball 3, the bottom of the supporting ball 3 is placed in the first curved groove, and the top of the supporting ball 3 is placed in the second curved groove.

[0049] Further preferably, in the embodiment, the adjusting bottom plate 1 is provided with a first insert 13 corresponding to the position of the support ball 3, the adjusting top plate 2 is provided with a second insert 23 corresponding to the position of the support ball 3, the first insert 13 is provided with a first curved groove, and the second insert 23 is provided with a second curved groove. In this way, the insert of different materials can be selected to contact the support ball 3 to increase the contact strength.

[0050] Preferably, the first adjusting screw 4 and the second adjusting screw each include a screwing portion 41, a stud 42 and a limiting portion 43 connected in sequence from top to bottom, the screwing portion 41 is in a cylindrical shape, the diameter of the screwing portion 41 is greater than the diameter of the stud 42, the limiting portion 43 is in a spherical shape, and the shapes of the first limiting groove 11 and the second limiting groove 12 are adapted to the shape of the limiting portion 43. In this way, the adjusting screw is convenient to screw, and the spherical limiting portion 43 is easy to cooperate with the limiting groove.

[0051] Further, in the embodiment, the diameter of the limiting portion 43 is smaller than the diameter of the stud 42, and the limiting portion 43 is in clearance fit with the limiting groove (including the first limiting groove 11 and the second limiting groove 12).

[0052] Preferably, the tension spring assembly includes a first tension spring, a second tension spring and a third tension spring 45, the first tension spring and the second tension spring are located on a straight line where the first adjusting screw 4 and the second adjusting screw are located, the triangle shape surrounded by the first tension spring, the second tension spring and the third tension spring 45 is the same as the triangle shape surrounded by the first adjusting screw 4, the second adjusting screw and the support ball 3, the first end of the first tension spring, the first end of the second tension spring and the first end of the third tension spring 45 are connected with the adjusting bottom plate 1, and the second end of the first tension spring, the second end of the second tension spring and the second end of the third tension spring 45 are connected with the adjusting top plate 2. In this way, the coupling effect of the tension of the tension spring and the supporting force of the adjusting screw is stronger.

[0053] Preferably, the photolithography machine calibration mechanism further includes a self-centering locking screw 8, the adjusting top plate 2 is provided with a mounting hole 24, the adjusting bottom plate 1 is provided with a threaded groove 14 corresponding to the position of the mounting hole 24, and the self-centering locking screw 8 can be threaded into the mounting hole 24 and the threaded groove 14; the mounting hole 24 has an annular stepped surface 25, the self-centering locking screw 8 has an annular limiting surface 81, the self-centering locking screw 8 is threaded into the mounting hole 24, the limiting surface 81 abuts with the stepped surface 25 in the up-down direction, and the self-centering locking screw 8 is prevented from continuing to move downward along the mounting hole 24; the limiting surface 81 and the stepped surface 25 are curved surfaces on spherical bodies with matching shapes. In this way, after the pitch adjustment, the self-centering locking screw 8 is used to realize the locking and fixing of the adjusting top plate 2 at a specific pitch angle, and since the limiting surface 81 and the stepped surface 25 are in spherical surface contact, the self-centering effect can be realized, and the locking error can be avoided.

[0054] Further, in the embodiment, the self-centering locking screws 8 are two, and both of the self-centering locking screws 8 are located on the side of the adjusting screws (including the first adjusting screw 4 and the second adjusting screw) away from the support ball 3.

[0055] Preferably, the adjusting top plate 2 has a mounting shaft 26, the mounting shaft 26 has a first shaft segment 27 and a second shaft segment 28 connected in sequence from top to bottom, the diameter of the first shaft segment 27 is smaller than the diameter of the second shaft segment 28, and the outer surface of the second shaft segment 28 is provided with threads; the lifting block 6 is provided with a shaft hole, the shaft hole has a first hole part and a second hole part connected in sequence from top to bottom, the diameter of the first hole part is smaller than the diameter of the second hole part, and the inner surface of the second hole part is provided with threads; the mounting shaft 26 is inserted into the shaft hole, the second hole part is threadedly connected with the second shaft segment 28, and the first shaft segment 27 is inserted into the first hole part to form a clearance fit. In this way, rotating the lifting block 6 can convert the rotary motion into the up-and-down linear motion through the screw transmission to realize the lifting adjustment of the standard plate 9; the first shaft segment 27 is in the shaft hole fit with the first hole part, which can prevent the lifting block 6 from tilting due to the thread clearance during the lifting adjustment of the standard plate 9.

[0056] Further preferably, the second hole part and the second shaft segment 28 are connected by using a fine thread with a pitch of 0.4-0.6 mm. Specifically, in the embodiment, the second hole part and the second shaft segment 28 are connected by using a fine thread with a pitch of 0.5 mm. In this way, the lifting distance of each 10° rotation is 0.013 mm, which can meet the adjustment accuracy of 0.02 mm of the lifting accuracy.

[0057] Preferably, the lifting block 6 has a rotating shaft 61, the support plate 7 is provided with a slot hole, and the rotating shaft 61 is inserted into the slot hole to form a clearance fit. In this way, the rotation of the support plate 7 around the rotating shaft 61 can be realized, that is, the rotary adjustment of the standard plate 9 can be realized.

[0058] Further preferably, the rotating shaft 61 and the slot hole form a clearance fit of 0.01-0.03 mm. Specifically, in the embodiment, the rotating shaft 61 and the slot hole form a clearance fit of 0.02 mm.

[0059] Further preferably, the support plate 7 is provided with two sets of tight screws along the direction perpendicular to the rotating shaft 61, that is, the first tight screw 71 and the second tight screw, and the first tight screw 71 and the second tight screw are arranged perpendicularly; and the first tight screw 71 and the second tight screw are screwed to lock and fix the support plate 7 on the lifting block 6. In this way, after the rotary adjustment of the standard plate 9, the support plate 7 can be locked and fixed by the first tight screw 71 and the second tight screw.

[0060] The working principle of the photoetching machine calibration device provided by the application is as follows: first, the pitch adjusting plate 2 is pitch adjusted by adjusting the first adjusting screw 4 and the second adjusting screw in sequence, then the lifting block 6 is rotated to convert the rotary motion into linear lifting motion through thread transmission, and lifting adjustment is performed, and finally the rotary adjusting plate 7 is rotated to realize rotary adjustment.

[0061] In the present application, unless specifically defined and limited otherwise, the terms "mounting", "connected", "connection", "fixed", and the like should be interpreted broadly, for example, can be fixed connection, can also be detachable connection, or integrated; can be mechanical connection, can also be electrical connection; can be directly connected, can also be indirectly connected through an intermediate medium; can be the internal communication of two elements or the interaction relationship of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0062] In the present application, unless specifically defined and limited otherwise, the first feature is "on" or "under" the second feature, which can be direct contact between the first and second features, or indirect contact between the first and second features through an intermediate medium. Moreover, the first feature is "above", "over" and "on" the second feature, which can be directly above or obliquely above the second feature, or only indicates that the first feature is higher than the second feature in horizontal height. The first feature is "below", "under" and "under" the second feature, which can be directly below or obliquely below the second feature, or only indicates that the first feature is lower than the second feature in horizontal height.

[0063] In the description of the present application, the description of the terms "one embodiment", "some embodiments", "embodiment", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In the present application, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine the different embodiments or examples described in the present application and the features of the different embodiments or examples without contradiction.

[0064] Although the embodiments of the present application have been shown and described above, it should be understood that the above embodiments are exemplary and cannot be understood as limiting the present application, and those skilled in the art can modify, modify, replace and modify the above embodiments within the scope of the present application.

Claims

1. A lithography machine calibration mechanism, characterized in that, It includes an adjusting base plate (1), an adjusting top plate (2), a support ball (3), a first adjusting screw (4), a second adjusting screw, a tension spring assembly, a lifting block (6), a self-centering locking screw (8), and a support plate (7) for placing a standard plate (9); The top plate (2) is located above the bottom plate (1). The support ball (3) is fixed between the bottom plate (1) and the top plate (2). The top plate (2) has a first threaded hole (21) and a second threaded hole. The bottom plate (1) has a first limiting groove (11) corresponding to the first threaded hole (21) and a second limiting groove (12) corresponding to the second threaded hole. The first adjusting screw (4) passes through the first threaded hole (21) and abuts against the first limiting groove (11). The second adjusting screw passes through the second threaded hole and abuts against the second limiting groove (12). The top plate (2) is connected to the adjusting base plate (1) via a tension spring assembly; the first adjusting screw (4), the second adjusting screw, and the support ball (3) are arranged in a triangle, and the distance between the first adjusting screw (4) and the support ball (3) is equal to the distance between the second adjusting screw and the support ball (3); by turning the first adjusting screw (4) and the second adjusting screw, the adjusting top plate (2) pitches around the support ball (3); the lifting block (6) is mounted on the adjusting top plate (2) in a direction perpendicular to the adjusting top plate (2), and the support plate (7) is mounted on the lifting block (6) in a direction perpendicular to the adjusting top plate (2); The top plate (2) is provided with a mounting hole (24), and the bottom plate (1) is provided with a threaded groove (14) corresponding to the mounting hole (24). The self-centering locking screw (8) can pass through the mounting hole (24) and be threaded into the threaded groove (14). The mounting hole (24) has an annular stepped surface (25), and the self-centering locking screw (8) has an annular limiting surface (81). The self-centering locking screw (8) passes through the mounting hole (24), and the limiting surface (81) and the stepped surface (25) abut against each other in the vertical direction to prevent the self-centering locking screw (8) from moving further down along the mounting hole (24). The limiting surface (81) and the stepped surface (25) are curved surfaces on a sphere with a matching shape. The adjusting top plate (2) has a mounting shaft (26), which has a first shaft section (27) and a second shaft section (28) connected from top to bottom. The diameter of the first shaft section (27) is smaller than the diameter of the second shaft section (28), and the outer surface of the second shaft section (28) is threaded. The lifting block (6) has a shaft hole, which has a first hole and a second hole connected from top to bottom. The diameter of the first hole is smaller than the diameter of the second hole, and the inner surface of the second hole is threaded. The mounting shaft (26) is inserted into the shaft hole, the second hole is threadedly connected to the second shaft section (28), and the first shaft section (27) is inserted into the first hole to form a clearance fit.

2. The lithography machine calibration mechanism according to claim 1, characterized in that, The self-centering locking screw (8) is located on the side of the first adjusting screw (4) and the second adjusting screw away from the support ball (3).

3. The lithography machine calibration mechanism according to claim 1, characterized in that, The first adjusting screw (4), the second adjusting screw, and the support ball (3) are arranged in a right-angled triangle.

4. The lithography machine calibration mechanism according to claim 1, characterized in that, Both the first adjusting screw (4) and the second adjusting screw include a screwing part (41), a stud (42) and a limiting part (43) connected from top to bottom. The screwing part (41) is cylindrical and the diameter of the screwing part (41) is larger than the diameter of the stud (42). The limiting part (43) is spherical and the shapes of the first limiting groove (11) and the second limiting groove (12) are adapted to the shape of the limiting part (43).

5. The lithography machine calibration mechanism according to claim 1, characterized in that, The tension spring assembly includes a first tension spring, a second tension spring, and a third tension spring (45). The first tension spring and the second tension spring are both located on the straight line where the first adjusting screw (4) and the second adjusting screw are located. The triangular shape formed by the first tension spring, the second tension spring, and the third tension spring (45) is the same as the triangular shape formed by the first adjusting screw (4), the second adjusting screw, and the support ball (3).

6. The lithography machine calibration mechanism according to claim 1, characterized in that, The lifting block (6) has a rotating shaft (61), and the support plate (7) has a slot. The rotating shaft (61) is inserted into the slot to form a clearance fit.

7. The lithography machine calibration mechanism according to claim 6, characterized in that, A first set screw (71) and a second set screw are provided on the support plate (7) in a direction perpendicular to the rotation axis (61). The first set screw (71) and the second set screw are set vertically. Tighten the first set screw (71) and the second set screw to lock the support plate (7) onto the lifting block (6).

Citation Information

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