Glass cleaning agent as well as preparation method and application thereof

Abstract

The invention provides a glass cleaning agent and a preparation method and application thereof, and relates to the technical field of cleaning agents, the glass cleaning agent comprises the following components by mass: 5-15% of a surfactant, 5-15% of a corrosion inhibitor, 5-10% of a chelating agent, 2-8% of an organic solvent, and the balance of water; wherein the surface active agent is an anionic surface active agent; and the corrosion inhibitor is an alkyl-substituted biphenyl corrosion inhibitor. The glass cleaning agent provided by the invention provides a brand-new and efficient cleaning solution for the semiconductor industry due to the excellent cleaning effect, no corrosion to semiconductor precise sensitive devices and excellent semiconductor material protection performance.

Description

Technical Field

[0001] The present invention relates to the technical field of cleaning agents, and in particular to a glass cleaning agent and a preparation method and application thereof. Background Art

[0002] Glass cleaning agents play a vital role in the semiconductor industry and are key materials to ensure the cleanliness and quality of glass surfaces during semiconductor manufacturing. These cleaning agents are designed specifically for semiconductor manufacturing environments, with high purity and precise chemical composition, and are designed to effectively remove various contaminants on the glass surface, including dust, grease, metal ions, organic residues, etc.

[0003] Glass components in semiconductor production, such as wafers, optical components, and packaging materials, have extremely high requirements for cleanliness. Any tiny contamination may cause device performance degradation or failure. Therefore, glass cleaners must not only have strong cleaning capabilities, but also be non-corrosive to semiconductor materials and not cause any damage to devices.

[0004] In addition, the semiconductor industry also requires glass cleaners to have good stability, low volatility, low residue, and environmental friendliness. Cleaning agents should remain stable during storage and use, and not easily deteriorate; low volatility to reduce harm to the production environment and operators; minimal residue after cleaning to avoid interference with subsequent processes; at the same time, the production and use of cleaning agents should comply with environmental standards to reduce the impact on the environment.

[0005] With the continuous advancement of semiconductor technology, the requirements for glass cleaning agents are also increasing. In modern semiconductor manufacturing, cleaning agents must not only meet basic cleaning needs, but also avoid affecting delicate and sensitive semiconductor materials near the glass. Therefore, there is an urgent need for a glass cleaning agent that is low in toxicity, low in corrosiveness, high in cleaning power, and environmentally friendly and suitable for the semiconductor industry. Summary of the invention

[0006] The purpose of the present invention is to provide a glass cleaning agent and its preparation method and application. By compounding anionic surfactants and alkyl-substituted biphenyl corrosion inhibitors, the glass cleaning agent provided by the present invention has excellent cleaning effect, non-corrosiveness to semiconductor precision sensitive devices and excellent semiconductor material protection performance, providing a new and efficient cleaning solution for the semiconductor industry. .

[0007] In order to achieve the above object, the present invention adopts the following technical solutions: The present invention provides a glass cleaning liquid, which comprises the following components by mass percentage: Surfactant 5-15%, corrosion inhibitor 5-15%, chelating agent 5-10% and organic solvent 2-8%, the rest is water; Wherein, the surfactant is an anionic surfactant; The corrosion inhibitor is an alkyl-substituted biphenyl corrosion inhibitor.

[0008] Furthermore, on the basis of the above technical solution, the anionic surfactant includes one or more of sodium fatty acid methyl ester sulfonate, sodium α-olefin sulfonate, sodium fatty alcohol sulfate, fatty acid sulfonalkyl ester, and fatty acid sulfonalkyl amide.

[0009] Furthermore, based on the above technical solution, the alkyl-substituted biphenyl corrosion inhibitor includes one or more of N-alkyl-N'-phenylbenzidine, N,N'-dialkylbenzidine, N-alkyl-N'-substituted phenylbenzidine, N,N'-dialkylbenzidine diamine, and sodium N-alkyl-N'-phenylbenzidine sulfonate.

[0010] Further, on the basis of the above technical solution, the chelating agent includes one or more of sodium gluconate, disodium ethylenediaminetetraacetate, tetrasodium glutamate diacetate, tetrasodium iminodisuccinate, trisodium methylglycine diacetate, and trisodium EDDS.

[0011] Furthermore, based on the above technical solution, the organic solvent includes at least one of ethanol or acetone.

[0012] Furthermore, based on the above technical solution, the mass ratio of the surfactant to the corrosion inhibitor is 1:(1-1.5).

[0013] The present invention also provides a method for preparing the glass cleaning liquid as described above, comprising the following steps: The surfactant, the corrosion inhibitor, the chelating agent, the organic solvent and water are mixed in proportion to obtain a glass cleaning liquid.

[0014] Further, based on the above technical solution, the mixing temperature is 20-30°C; the mixing time is 4-6h; and the stirring rate is 50-70r / min.

[0015] The present invention also provides an application of the above-mentioned glass cleaning liquid or the glass cleaning liquid prepared by the above-mentioned preparation method of the glass cleaning liquid.

[0016] Furthermore, based on the above technical solution, the glass cleaning liquid is suitable for the semiconductor industry, optoelectronics industry, aerospace industry or precision machinery manufacturing industry.

[0017] The present invention provides a glass cleaning agent and a preparation method and application thereof, and the beneficial effects are as follows: 1. The present invention adds anionic surfactants to the glass cleaning liquid. The lipophilic groups in the molecular structure can effectively adsorb and decompose stains, while the hydrophilic groups help remove stains from the surface, thereby showing a strong decontamination ability. In addition to the strong decontamination ability, these anionic surfactants also show excellent environmentally friendly properties. They can be easily decomposed by microorganisms, and have low toxicity and little impact on the human body and the environment. This feature greatly reduces the pollution and damage to the environment, making these surfactants highly respected in the field of environmental protection. Even in the face of complex and changeable environmental conditions, such as temperature fluctuations, changes in pH, etc., these anionic surfactants can still maintain stable performance, ensuring that the cleaning effect is not interfered with by external factors, providing users with reliable cleaning guarantees, and in line with the current development trend of green and environmental protection.

[0018] 2. The present invention adds alkyl-substituted biphenyl corrosion inhibitors to the glass cleaning liquid because the covalent bonds between the carbon atoms and hydrogen atoms in the alkyl group are electron cloud shared, and due to the existence of the hyperconjugation effect, the alkyl group can provide electron cloud density to adjacent atoms or molecular parts; and the conjugated structure between the two benzene rings can also increase the density of the electron cloud; when the alkyl group is connected to the benzene ring containing the conjugated structure, the electronic effects of the two will be superimposed on each other, so that the alkyl-substituted biphenyl corrosion inhibitor molecules have negatively charged sites, thereby enhancing the adsorption of positively charged impurities (such as metal ions, dust, etc.) on the glass, and significantly improving the cleaning effect of the glass; and the alkyl-substituted biphenyl corrosion inhibitor can also form stable coordination bonds with positively charged atoms (such as metal atoms, vacancies, etc.) on the surface of the semiconductor material near the glass, thereby better protecting the semiconductor material.

[0019] 3. The present invention enhances the overall corrosion inhibition effect by compounding anionic surfactants and alkyl-substituted biphenyl corrosion inhibitors, effectively blocking the penetration and diffusion of corrosive media in the cleaning solution. In addition, the intermolecular interactions in the compound system (such as electrostatic attraction, van der Waals force, etc.) may also promote the formation and stability of the protective film, further enhancing the corrosion inhibition effect. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical scheme and advantages of the present invention clearer, the technical scheme in the embodiment of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present invention. The process parameters of the following embodiments that do not specify specific conditions are usually based on conventional conditions.

[0021] The endpoints and any values ​​of the ranges disclosed in the present invention are not limited to the precise ranges or values, and these ranges or values ​​should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of each range, the endpoint values ​​of each range and the individual point values, and the individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be regarded as specifically disclosed in the present invention.

[0022] According to a first aspect of the present invention, there is provided a glass cleaning liquid, comprising the following components by mass percentage: Surfactant 5-15% (for example 6%, 7%, 8%, 9%, 10%, 11%, 12%, 13%, 14%, etc.), corrosion inhibitor 5-15% (for example 6%, 7%, 8%, 9%, 10%, 11%, 12%, 13%, 14%, etc.), chelating agent 5-10% (for example 6%, 7%, 8%, 9%, etc.) and organic solvent 2-8% (for example 3%, 4%, 5%, 6%, 7%, etc.), and the rest is water.

[0023] As an optional embodiment of the present invention, the surfactant is an anionic surfactant.

[0024] Specifically, the surfactant commonly used in existing glass cleaning agents is a non-ionic surfactant. When the non-ionic surfactant is dissolved in water, it relies on hydrogen bonds to dissolve the entire molecule. When the system temperature rises, the hydrogen bonds break, the non-ionic surfactant dehydrates, the solubility decreases, and it precipitates from the solution, becomes turbid, and greatly reduces the decontamination ability of the cleaning agent; since the non-ionic surfactant has an oleophilic end, it may adhere to the surface of the sample after precipitation to form new dirt. The present invention uses an anionic surfactant to avoid the generation of dirt.

[0025] Anionic surfactants can dissociate into anions in water and have strong decontamination ability, which can effectively break down stains and remove them from the surface of the sample. In addition, anionic surfactants also have good foaming properties and stability, which can provide long-lasting foam during the cleaning process, helping to better clean the sample.

[0026] As an optional embodiment of the present invention, the anionic surfactant includes one or more of sodium fatty acid methyl ester sulfonate, sodium α-olefin sulfonate, sodium fatty alcohol sulfate, fatty acid sulfonalkyl ester, and fatty acid sulfonalkyl amide.

[0027] Specifically, the lipophilic groups in the molecular structure of the above-mentioned anionic surfactants can effectively adsorb and decompose stains, while the hydrophilic groups help remove stains from the surface, thereby demonstrating a strong decontamination ability. In addition to their strong decontamination ability, these anionic surfactants also exhibit excellent environmental friendliness. They can be easily decomposed by microorganisms, and have low toxicity and little impact on the human body and the environment. This feature greatly reduces pollution and damage to the environment, making these surfactants highly respected in the field of environmental protection. Even in the face of complex and changeable environmental conditions, such as temperature fluctuations, changes in pH, etc., these anionic surfactants can still maintain stable performance, ensuring that the cleaning effect is not interfered with by external factors, providing users with reliable cleaning guarantees, and in line with the current development trend of green and environmental protection.

[0028] As an optional embodiment of the present invention, the alkyl-substituted biphenyl corrosion inhibitor includes one or more of N-alkyl-N'-phenylbenzidine, N,N'-dialkylbenzidine, N-alkyl-N'-substituted phenylbenzidine, N,N'-dialkylbenzidine diamine, and sodium N-alkyl-N'-phenylbenzidine sulfonate.

[0029] Specifically, the present invention limits the corrosion inhibitor to an alkyl-substituted biphenyl corrosion inhibitor because the covalent bond between the carbon atom and the hydrogen atom in the alkyl group is electron cloud shared, and due to the existence of the hyperconjugation effect, the alkyl group can provide electron cloud density to adjacent atoms or molecular parts; and the conjugated structure between the two benzene rings can also increase the density of the electron cloud; when the alkyl group is connected to the benzene ring containing the conjugated structure, the electronic effects of the two will be superimposed on each other, so that the alkyl-substituted biphenyl corrosion inhibitor molecule has a negatively charged site inside, thereby enhancing the adsorption of positively charged impurities (such as metal ions, dust, etc.) on the glass, and significantly improving the cleaning effect of the glass; and the alkyl-substituted biphenyl corrosion inhibitor can also form a stable coordination bond with the positively charged atoms (such as metal atoms, vacancies, etc.) on the surface of the semiconductor material near the glass, thereby better protecting the semiconductor material.

[0030] Furthermore, the above-mentioned anionic surfactant contains a strongly adsorbable functional group (such as sulfonate or sulfate), which can form a dense adsorption layer on the surface of the semiconductor material, effectively blocking the direct contact between the corrosive medium in the cleaning solution and the semiconductor material, thereby reducing the corrosion rate. The alkyl-substituted biphenyl corrosion inhibitor forms a stable coordination bond with the positively charged atoms on the surface of the semiconductor material. The formation of this coordination bond can firmly adsorb the corrosion inhibitor molecules on the surface of the material to form a protective film. When anionic surfactants and alkyl-substituted biphenyl corrosion inhibitors are used in combination, their corrosion inhibition mechanisms can complement each other, thereby enhancing the overall corrosion inhibition effect. After the two are combined, a denser and more uniform protective film can be formed on the surface of the semiconductor material at the same time, effectively blocking the penetration and diffusion of the corrosive medium in the cleaning solution. In addition, the molecular interactions in the compound system (such as electrostatic attraction, van der Waals force, etc.) may also promote the formation and stability of the protective film, further enhancing the corrosion inhibition effect.

[0031] As an optional embodiment of the present invention, the chelating agent includes one or more of sodium gluconate, disodium ethylenediaminetetraacetate, tetrasodium glutamate diacetate, tetrasodium iminodisuccinate, trisodium methylglycine diacetate, and trisodium EDDS.

[0032] Specifically, the application of the above-mentioned chelating agents in glass cleaning agents for the semiconductor industry has many advantages, including strong chelating ability, easy biodegradation, wide pH value applicability, mildness, and environmental friendliness. These advantages make these chelating agents important ingredients in glass cleaning agents for the semiconductor industry, helping to improve cleaning efficiency, protect the surface of semiconductor materials, and reduce the impact on the environment, specifically: Sodium Gluconate: Sodium gluconate is a surfactant with excellent decontamination and cleaning properties, and is relatively mild and environmentally friendly. It will not damage the surface of semiconductor materials, nor will it pollute the environment; sodium gluconate can effectively decompose dirt, remove stains, and make the surface of semiconductor glass cleaner.

[0033] Ethylenediaminetetraacetic acid disodium (EDTA-2Na): EDTA-2Na can form stable complexes with a variety of metal ions and effectively remove metal ion pollutants on the surface of semiconductor glass; EDTA-2Na has good solubility and can quickly dissolve various solid impurities and oil stains to improve cleaning efficiency; EDTA-2Na can maintain stable chelating properties under a variety of pH values ​​and temperature conditions and is suitable for cleaning different types of semiconductor glass.

[0034] Tetrasodium Glutamate Diacetate (GLDA): GLDA is a biodegradable chelating agent that will not cause long-term pollution to the environment. GLDA has a strong chelating ability for common metal ions such as calcium and magnesium ions, and can effectively remove metal ion pollutants on the surface of semiconductor glass. The mild nature of GLDA prevents it from causing damage to the surface of semiconductor materials.

[0035] Tetrasodium iminodisuccinate (IDS) IDS can be used in combination with a variety of surfactants to significantly enhance the product's decontamination ability, especially for rust and iron sulfide dirt. IDS is easily biodegradable, green and environmentally friendly, and non-toxic and harmless to the ecosystem. IDS has excellent stability to hydrogen peroxide and is suitable for semiconductor glass cleaning processes that require hydrogen peroxide as an oxidant.

[0036] Trisodium Methylglycinate Diacetate (MGDA): MGDA can form stable complexes with a variety of metal ions and effectively remove metal ion pollutants on the surface of semiconductor glass. MGDA is a biodegradable chelating agent that will not cause long-term pollution to the environment. MGDA can maintain stable chelating properties over a wide pH range and is suitable for cleaning different types of semiconductor glass.

[0037] Trisodium EDDS: Trisodium EDDS has high selectivity for copper ions and iron ions and can chelate transition metal ions well in hard water systems. Trisodium EDDS is a phosphorus-free chelating agent that is easily biodegradable and will not cause long-term pollution to the environment. Trisodium EDDS can also remain stable in concentrated alkaline solutions and is suitable for semiconductor glass cleaning processes that require high temperature or alkaline conditions.

[0038] As an optional embodiment of the present invention, the organic solvent includes at least one of ethanol or acetone.

[0039] Specifically, since oil stains usually contain grease, hydrocarbon compounds and other organic substances that are difficult to dissolve in water, traditional water-based cleaners are often difficult to completely remove. At this time, organic solvents become an ideal choice for dealing with such stains due to their excellent solubility and penetration.

[0040] As an optional embodiment of the present invention, the mass ratio of the surfactant to the corrosion inhibitor is 1:(1-1.5) (such as 1:1, 1:1.1, 1:1.2, 1:1.3, 1:1.4, etc.).

[0041] Specifically, the reason for limiting the mass ratio of surfactant to corrosion inhibitor to 1:(1-1.5) is: When anionic surfactants are used in combination with alkyl-substituted biphenyl corrosion inhibitors, the negative charge of the corrosion inhibitor will enhance the adsorption of the anionic surfactant to a certain extent. Specifically, after the negatively charged sites in the corrosion inhibitor molecules form stable coordination bonds with the positively charged atoms in the semiconductor material, the sites in the corrosion inhibitor molecules that originally had a lower electron cloud density will be relatively more electron-deficient, thereby showing a positive charge tendency, and thus interacting with the polar groups of the anionic surfactant molecules, such as electrostatic attraction, dipole-dipole interaction or van der Waals force, etc. This interaction can attract and fix more anionic surfactant molecules on the surface of the semiconductor material, thereby forming a more dense and uniform protective film. This protective film can effectively block the penetration and diffusion of corrosive media in the cleaning solution, further reducing the corrosion rate of semiconductor materials.

[0042] According to a second aspect of the present invention, there is provided a method for preparing the glass cleaning liquid as described above, comprising the following steps: The surfactant, the corrosion inhibitor, the chelating agent, the organic solvent and water are mixed in proportion to obtain a glass cleaning liquid.

[0043] As an optional embodiment of the present invention, the mixing temperature is 20-30° C.; the mixing time is 4-6 h; and the stirring rate is 50-70 r / min.

[0044] According to a third aspect of the present invention, there is also provided an application of the above-mentioned glass cleaning liquid or the glass cleaning liquid prepared by the above-mentioned preparation method of the glass cleaning liquid.

[0045] As an optional embodiment of the present invention, the glass cleaning liquid is suitable for the semiconductor industry, optoelectronics industry, aerospace industry or precision machinery manufacturing industry.

[0046] The present invention will be further described in detail below with reference to specific embodiments and comparative examples.

[0047] Example 1 10% sodium fatty acid methyl ester sulfonate, 10% N,N'-dialkylbenzidine, 6% disodium ethylenediaminetetraacetate, 5% ethanol and water are stirred and mixed, wherein the mixing temperature is 25°C; the mixing time is 5 hours; the stirring rate is 60r / min, to obtain a glass cleaning agent; The mass ratio of sodium fatty acid methyl ester sulfonate to N,N'-dialkylbenzidine is 1:1.

[0048] Example 2 10% sodium α-olefin sulfonate, 15% N-alkyl-N'-phenylbenzidine, 10% tetrasodium glutamate diacetate, 4% acetone and water were stirred and mixed, wherein the mixing temperature was 22° C., the mixing time was 6 hours, and the stirring rate was 70 r / min, to obtain a glass cleaning agent; The mass ratio of sodium α-olefin sulfonate to N-alkyl-N'-phenylbenzidine is 1:1.5.

[0049] Example 3 5% sodium fatty alcohol sulfate, 7% sodium N-alkyl-N'-phenylbenzidine sulfonate, 5% tetrasodium iminodisuccinate, 6% acetone and water were stirred and mixed, wherein the mixing temperature was 20°C; the mixing time was 4 hours; the stirring rate was 50 r / min, to obtain a glass cleaning agent; The mass ratio of sodium fatty alcohol sulfate to sodium N-alkyl-N'-phenylbenzidine sulfonate is 1:1.4.

[0050] Example 4 10% fatty acid sulfonalkyl ester, 12% N,N'-dialkylbenzenediamine, 10% trisodium methylglycine diacetate, 2% ethanol and water are stirred and mixed, wherein the mixing temperature is 25°C; the mixing time is 6 hours; the stirring rate is 60 r / min, to obtain a glass cleaning agent; The mass ratio of fatty acid sulfonalkyl ester to N,N'-dialkylbenzenediamine is 1:1.2.

[0051] Example 5 12% fatty acid sulfonylamide, 12% N-alkyl-N'-substituted phenylbenzidine, 10% EDDS trisodium, 8% ethanol and water were stirred and mixed, wherein the mixing temperature was 30°C; the mixing time was 4 hours; the stirring rate was 70 r / min, to obtain a glass cleaning agent; The mass ratio of fatty acid sulfonalkylamide to N-alkyl-N'-substituted phenylbenzidine is 1:1.

[0052] Example 6 10% sodium fatty acid methyl ester sulfonate, 10% N,N'-dialkylbenzidine, 7% disodium ethylenediaminetetraacetate, 5% ethanol and water are stirred and mixed, wherein the mixing temperature is 30°C; the mixing time is 5 hours; the stirring rate is 60 r / min, to obtain a glass cleaning agent; The mass ratio of sodium fatty acid methyl ester sulfonate to N,N'-dialkylbenzidine is 1:1.

[0053] Example 7 8% sodium fatty alcohol sulfate, 12% N-alkyl-N'-phenylbenzidine, 10% sodium gluconate, 8% ethanol and water were stirred and mixed, wherein the mixing temperature was 30°C; the mixing time was 6 hours; the stirring rate was 70 r / min, to obtain a glass cleaning agent; The mass ratio of sodium fatty alcohol sulfate to N-alkyl-N'-phenylbenzidine is 1:1.5.

[0054] Example 8 10% fatty acid sulfonalkyl ester, 10% sodium N-alkyl-N'-phenylbenzidine sulfonate, 5% disodium ethylenediaminetetraacetic acid, 2% acetone and water are stirred and mixed, wherein the mixing temperature is 20°C; the mixing time is 4 hours; the stirring rate is 50 r / min, to obtain a glass cleaning agent; The mass ratio of fatty acid sulfonalkyl ester to sodium N-alkyl-N'-phenylbenzidine sulfonate is 1:1.

[0055] Comparative Example 1 The difference between this comparative example and Example 1 is that the surfactant used is a nonionic surfactant, specifically an ethoxylated alcohol ether special surfactant, model Tomadol 91-8 produced by Evonik, and the remaining steps and technical parameters are the same as those of Example 1.

[0056] Comparative Example 2 The difference between this comparative example and Example 1 is that the corrosion inhibitor used is an imidazoline quaternary ammonium salt corrosion inhibitor, specifically sodium dodecyl sulfate, and the remaining steps and technical parameters are the same as those in Example 1.

[0057] Comparative Example 3 The difference between this comparative example and Example 1 is that the corrosion inhibitor used is a biphenyl corrosion inhibitor without alkyl group, specifically biphenyl gemini corrosion inhibitor (BDMA), and the remaining steps and technical parameters are the same as those in Example 1.

[0058] Performance Testing (1) Cleanliness yield rate: After cleaning, the surface cleanliness of the glass sample was tested using a German SITA surface cleanliness meter (10 points were taken, the diameter of each point was 1 mm, and the average value of the 10 points was tested). If the average value of RFU (relative fluorescence unit) obtained by the test was ≤50RFU, the cleanliness was qualified, otherwise it was unqualified; yield rate (the number of glasses with an average value of RFU ≤50 / the total number of glasses input) × 100%; the results are shown in Table 1.

[0059] (2) The glass cleaning agents prepared in Examples 1-8 and Comparative Examples 1-3 were used to clean glass components on a semiconductor workpiece. The main material of the semiconductor workpiece was nickel. After 24 hours of treatment, the corrosion and discoloration of the tungsten surface were observed. The results are shown in Table 1.

[0060] Table 1 As shown in Table 1, compared with Example 1, since the surfactant used in Comparative Example 1 is a non-ionic surfactant, when the non-ionic surfactant is used as a cleaning agent to clean glass devices in the semiconductor industry, the high temperature of the entire system causes the hydrogen bonds of the non-ionic surfactant to break, thereby making the cleaning solution turbid, reducing the decontamination ability, affecting the cleaning effect of the glass surface, and causing slight corrosion to the surface of the semiconductor material.

[0061] As shown in Table 1, compared with Example 1, since the corrosion inhibitor used in Comparative Example 2 is an imidazoline quaternary ammonium salt corrosion inhibitor, and the imidazoline quaternary ammonium salt corrosion inhibitor is positively charged due to the presence of quaternary ammonium salt ions, it is unable to adsorb positively charged impurities on the glass surface, so the cleaning effect is relatively poor compared with Example 1.

[0062] As shown in Table 1, compared with Example 1, since the corrosion inhibitor used in Comparative Example 3 is a biphenyl corrosion inhibitor without alkyl groups, the absence of alkyl groups leads to a decrease in the electron cloud density between molecules, which in turn affects the electronegativity of the corrosion inhibitor, and ultimately affects the adsorption of positively charged impurities on the glass surface. Therefore, the cleaning effect is slightly worse than that of Example 1.

[0063] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A glass cleaning liquid, characterized in that: In terms of mass percentage, it includes the following components: Surfactant 5-15%, corrosion inhibitor 5-15%, chelating agent 5-10% and organic solvent 2-8%, the rest is water; Wherein, the surfactant is an anionic surfactant; The corrosion inhibitor is an alkyl-substituted biphenyl corrosion inhibitor.

2. The glass cleaning liquid according to claim 1, characterized in that: The anionic surfactant includes one or more of sodium fatty acid methyl ester sulfonate, sodium α-olefin sulfonate, sodium fatty alcohol sulfate, fatty acid sulfonalkyl ester, and fatty acid sulfonalkyl amide.

3. The glass cleaning liquid according to claim 1, characterized in that: The alkyl-substituted biphenyl corrosion inhibitor includes one or more of N-alkyl-N'-phenylbenzidine, N,N'-dialkylbenzidine, N-alkyl-N'-substituted phenylbenzidine, N,N'-dialkylbenzidine diamine, and sodium N-alkyl-N'-phenylbenzidine sulfonate.

4. The glass cleaning liquid according to claim 1, characterized in that: The chelating agent includes one or more of sodium gluconate, disodium ethylenediaminetetraacetate, tetrasodium glutamate diacetate, tetrasodium iminodisuccinate, trisodium methylglycine diacetate, and trisodium EDDS.

5. The glass cleaning liquid according to claim 1, characterized in that: The organic solvent includes at least one of ethanol or acetone.

6. The glass cleaning liquid according to claim 1, characterized in that: The mass ratio of the surfactant to the corrosion inhibitor is 1:(1-1.5).

7. A method for preparing a glass cleaning liquid according to any one of claims 1 to 6, characterized in that: The steps include: The surfactant, the corrosion inhibitor, the chelating agent, the organic solvent and water are mixed in proportion to obtain a glass cleaning liquid.

8. The method for preparing glass cleaning liquid according to claim 7, characterized in that: The mixing temperature is 20-30° C.; the mixing time is 4-6 hours; and the stirring rate is 50-70 r / min.

9. Use of a glass cleaning liquid as claimed in any one of claims 1 to 6 or a glass cleaning liquid prepared by the preparation method of the glass cleaning liquid as claimed in any one of claims 7 to 8.

10. The use of the glass cleaning liquid according to claim 9, characterized in that: The glass cleaning liquid is suitable for the semiconductor industry, optoelectronics industry, aerospace industry or precision machinery manufacturing industry.

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