Adjustable positioning device for reaction chamber and method of use thereof

Abstract

The present invention proposes an adjustable positioning device for a reaction chamber and a method for using the device. The device comprises: an upper cover, a reaction chamber sleeved within the upper chamber, the upper cover disposed on the bottom surface of the upper chamber and connected to the upper chamber; a first slot and a second slot disposed opposite each other to receive a stopper; the first slot being formed on the inner annular surface of the upper cover, and the second slot being formed on the outer annular surface of the reaction chamber; a preset gap formed between the inner annular surface of the first slot and the outer annular surface of the second slot; at least two stoppers, movable along the first and second slots; an adjustment hole disposed corresponding to the stopper, disposed on the upper surface of the upper cover and connected to the first slot, radially extending and containing an adjustment member; an adjustment member for radially adjusting the stopper, disposed corresponding to and connected to the stopper; a maintenance window disposed on the upper chamber; and a positioning hole. By improving the structure of the reaction chamber and adding stops on all sides, the present invention allows maintenance personnel to quickly open the chamber for maintenance inside the process chamber by adjusting the position of the caliper, thereby shortening PM time.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor equipment, and in particular relates to an adjustable positioning device for a reaction chamber and a method of using the same. Background Art

[0002] In semiconductor manufacturing equipment, etching can only take place when the wafer is in the process chamber. A typical etching process chamber primarily consists of a reaction chamber, vacuum and pressure control systems, radio frequency (RF) system, electrostatic chuck and wafer temperature control systems, gas flow control system, etch endpoint detection system, conveyor system, and system software. Inductively coupled plasma (ICP) etching involves placing one or more coils connected to an RF power source on or around the reaction chamber, which is typically positioned and fixed above the process chamber. Semiconductor equipment requires regular preventive maintenance (PM).

[0003] During PM, the reaction chamber may need to be dismantled to maintain the interior of the process chamber. The specific steps include dismantling the upper chamber, removing the adapter 6 between the reaction chamber and the process chamber, removing the reaction chamber, and maintaining the interior of the process chamber. This requires opening the reaction chamber housing (upper chamber) and dismantling the reaction chamber separately, which takes a long time and, therefore, increases the PM duration. Summary of the Invention

[0004] The present invention aims to provide an adjustable positioning device for a reaction chamber and its use method. By improving the reaction chamber mounting structure and adding adjustable fixing and limiting structures, the device can shorten the time required to open the process chamber during PM. The technical solution adopted is as follows:

[0005] An adjustable positioning device for a reaction chamber, comprising an upper cover 1 and a reaction chamber 2 sleeved in the upper chamber, wherein the upper cover 1 is arranged on the bottom surface of the upper chamber and communicates with the upper chamber, and further comprising:

[0006] The first groove 11 and the second groove 21 are arranged opposite to each other to receive the stopper 4; the first groove 11 is formed on the inner annular surface of the upper cover 1, and the second groove 21 is formed on the outer annular surface of the reaction chamber 2; a preset gap is formed between the inner annular surface of the first groove 11 and the outer annular surface of the second groove 21;

[0007] The stopper 4 is used to connect the upper cover 1 and the reaction chamber 2, and the number of the stopper 4 is at least 2; the stopper 4 can move along the first groove 11 and the second groove 21;

[0008] An adjustment hole 12 is provided corresponding to the stopper 4, is opened on the upper surface of the upper cover 1 and communicates with the first groove 11, extends radially, and has the adjustment member 5 placed therein;

[0009] The adjusting member 5 is used to adjust the stopper 4 in the radial direction and is arranged corresponding to the stopper 4 and connected to the stopper 4; a maintenance window is provided on the upper cavity;

[0010] And positioning holes 13 are provided on the upper cover 1 for receiving and positioning screws. When the screws are engaged with the mounting holes on the corresponding stoppers 4, the upper cover 1, the reaction chamber 2 and the corresponding stoppers 4 are connected as one.

[0011] Preferably, the stopper 4 includes a metal block 41 and a non-metal block 42 connected to the metal block 41 ; the metal block 41 is arranged toward the first slot 11 and has the mounting hole thereon, and the non-metal block 42 is arranged toward the second slot 22 .

[0012] Preferably, the non-metal block 42 is ULTEM 1000.

[0013] Preferably, the dovetail groove on the metal block 41 and the dovetail tenon on the non-metal block 42 are adapted to each other.

[0014] Preferably, the adjusting member 5 is threadedly connected to the stopper 4 .

[0015] Preferably, the upper cover 1 is connected to the process chamber 3 via an adapter 6 .

[0016] Preferably, a hinge structure is provided between the outer wall of the upper chamber and the outer wall of the process chamber.

[0017] A method for using an adjustable positioning device for a reaction chamber, based on the adjustable positioning device for a reaction chamber, when the process chamber 3 needs to be maintained, specifically includes the following steps:

[0018] Step 1: Connecting the upper cover 1 and the reaction chamber 2, specifically including:

[0019] Step 1A: Move the adjusting member 5 radially, and the adjusting member 5 drives the stopper 4 to move along the first groove 11;

[0020] When a portion of the stopper 4 is located in the No. 1 slot 11 and the other portion is located in the No. 2 slot 21 , place the screw in the corresponding positioning hole 13 and screw it into the corresponding stopper 4 ;

[0021] Step 1B, repeat step 1A until all the blocks 4 are fixed;

[0022] Step 2: Remove the upper chamber, and the reaction chamber 2 moves synchronously with the upper chamber and the upper cover 1.

[0023] Preferably, the process further includes steps for when the reaction chamber 2 needs to be maintained, specifically including:

[0024] Move the adjusting member 5 in the radial direction, and the adjusting member 5 drives the stopper 4 to move along the first groove 11;

[0025] When the stopper 4 is separated from the second slot 21;

[0026] When all the stoppers 4 are separated from the second groove 21 , the upper chamber is removed and the reaction chamber 2 remains stationary.

[0027] Compared with the prior art, the advantages of the present invention are:

[0028] 1. When the process chamber needs to be maintained: when removing the upper chamber, the reaction chamber can be removed together with it.

[0029] 2. When the reaction chamber needs to be maintained: During the removal of the upper chamber, the reaction chamber remains stationary. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 A cross-sectional view of a semiconductor process equipment in one direction;

[0031] Figure 2 A cross-sectional view of the semiconductor process equipment in another direction;

[0032] Figure 3 A state diagram of the adjustable positioning device for the reaction chamber when maintenance of the process chamber is required;

[0033] Figure 4 A state diagram of the adjustable positioning device for the reaction chamber when maintenance of the reaction chamber is required;

[0034] Figure 5 is a cross-sectional view of a non-end surface of the stopper;

[0035] Figure 6 This is a structural diagram of the stopper.

[0036] Among them, 1-upper cover, 11-number one slot, 12-adjustment hole, 13-positioning hole;

[0037] 2-reaction chamber, 21-slot No. 2,

[0038] 3-process chamber, 31-film transfer port, 4-stopper, 41-metal block, 42-non-metal block, 5-adjustment part,

[0039] 6-Adapter. DETAILED DESCRIPTION

[0040] The following is a more detailed description of the adjustable positioning device for a reaction chamber and its method of use, with reference to schematic diagrams. Preferred embodiments of the present invention are shown, and it should be understood that those skilled in the art may modify the present invention described herein while still achieving the beneficial effects of the present invention. Therefore, the following description should be understood as a general guide for those skilled in the art and not as a limitation of the present invention.

[0041] The utility model discloses an adjustable positioning device for a reaction chamber, namely, fixed blocks are added around the reaction chamber.

[0042] The present invention takes into account that PM maintenance of the equipment must be quick and swift, and conventional installation methods are time-consuming and labor-intensive. Therefore, by adding limiting calipers (blocks 4) around the periphery, maintenance personnel can quickly open the cavity to maintain the inside of the process chamber by adjusting the position of the calipers, thereby shortening the PM time.

[0043] The present invention can be used to fix the reaction chamber on the inductively coupled plasma equipment in the field of etching equipment. It is mainly used for opening the PM cavity. When the upper cavity is opened, the reaction chamber can be opened together with the upper cavity, and there is no need to open the upper cavity and then disassemble the reaction chamber separately.

[0044] like Figures 1 to 6 An adjustable positioning device for a reaction chamber, the device specifically comprising: an upper cover 1, a reaction chamber 2 sleeved in the upper chamber, the upper cover 1 being arranged on the bottom surface of the upper chamber and communicating with the upper chamber, and further comprising:

[0045] The first groove 11 and the second groove 21 are arranged opposite to each other to receive the stopper 4; the first groove 11 is formed on the inner annular surface of the upper cover 1, and the second groove 21 is formed on the outer annular surface of the reaction chamber 2; a preset gap is formed between the inner annular surface of the first groove 11 and the outer annular surface of the second groove 21;

[0046] The stopper 4 is used to connect the upper cover 1 and the reaction chamber 2, and the number of the stopper 4 is at least 2; the stopper 4 can move along the No. 1 groove 11 and the No. 2 groove 21, that is, there is a small gap between the stopper 4 and the No. 1 groove 11 and the No. 2 groove 21.

[0047] Among them, the number of blocks 4 is designed for the following reasons:

[0048] Since there is a gap between the non-metallic block 42 and the second slot 21, if there is only one stopper, the reaction chamber is likely to shake when the upper chamber drives the reaction chamber to move together.

[0049] Therefore, the number of blocks 4 is increased along the circumference, and multiple blocks 4 together form a ring to surround the reaction chamber 2, thereby increasing the stability of the reaction chamber 2 and ensuring that the reaction chamber moves smoothly with the upper chamber.

[0050] In this embodiment, the number of baffles 4 is 4 and is evenly distributed along the circumference. In other embodiments, the number of baffles 4 is 3 or 5 to N.

[0051] The adjustment hole 12 is provided corresponding to the stopper 4, is opened on the upper surface of the upper cover 1 and communicates with the first groove 11, extends radially, and the adjustment member 5 is placed therein;

[0052] like Figure 1 As shown, the adjustment hole 12 is shown; the adjustment hole 12 is Figure 2 Not shown in .

[0053] An adjusting member 5 is used for adjusting the stopper 4 in the radial direction and is provided corresponding to the stopper 4 and is connected to the stopper 4;

[0054] A maintenance window is provided on the side of the upper cavity, a shielding door is provided on the maintenance window, and the shielding door is hinged to the outer wall of the upper cavity.

[0055] And positioning holes 13 are provided on the upper cover 1 for receiving (placing) screws. When the screws are engaged with the mounting holes on the corresponding stoppers 4, the upper cover 1, the reaction chamber 2 and the corresponding stoppers 4 are connected as one.

[0056] That is, the positioning hole 13 is a clear hole and a through hole, and the mounting hole on the stopper 4 is a threaded hole.

[0057] The screw passes through the positioning hole 13, the end face of the screw covers the positioning hole 13 and presses against the upper surface of the upper cover 1, and the screw is threadedly connected to the mounting hole on the stopper 4. At this time, the upper cover 1, the reaction chamber 2 and the corresponding stopper 4 are connected into one.

[0058] The reason why the positioning hole 13 is a smooth hole is that if the positioning hole 13 is a threaded hole, the mounting hole on the block 4 is also a threaded hole, and the installation accuracy cannot be achieved, that is, the process of screwing the screw into the positioning hole 13 and the mounting hole in turn cannot proceed smoothly.

[0059] The upper cover 1 is connected to the bottom surface of the upper cavity through fasteners.

[0060] like Figures 5 and 6 As shown, the stopper 4 includes a metal block 41 and a non-metal block 42 connected to the metal block 41 ; the metal block 41 is arranged toward the first slot 11 and has a mounting hole thereon, and the non-metal block 42 is arranged toward the second slot 22 .

[0061] The dovetail groove on the metal block 41 is adapted to the dovetail tenon on the non-metal block 42 .

[0062] That is, when the process chamber 3 needs to be maintained, the metal block 41 is used to be fastened to the upper cover, and the non-metal block 42 is used to contact the reaction chamber to fix the reaction chamber.

[0063] When the process chamber needs maintenance, the non-metallic block 42 prevents damage to the chamber during opening and closing, or to the chamber wall caused by metal expansion. That is, the block 4 is entirely metal, and when the reaction chamber 2 moves synchronously with the upper chamber, metal collisions with the reaction chamber may occur.

[0064] like Figure 6 As shown, the adjusting member 5 is threadedly connected to the stopper 4. The second threaded hole on the metal block 41 is used to connect the adjusting member 5, and the remaining two threaded holes are mounting holes for threaded engagement with the fasteners (screws) in the positioning holes 13.

[0065] As known in the prior art, the upper cover is connected to the process chamber 3 via an adapter 6. Specifically, the adapter 6 is detachably disposed in the process chamber 3 and is adsorbed on the upper cover.

[0066] In this embodiment, a hinge structure is provided between the outer wall of the upper chamber and the outer wall of the process chamber. Therefore, when the upper chamber is manually opened, the upper chamber is flipped open to one side around the hinge axis in the hinge structure.

[0067] Installation method of the adjustable positioning device for the reaction chamber:

[0068] Step 1: Install the stopper 4 in the No. 1 slot 11.

[0069] Specifically, the stopper 4 is assembled in advance and then placed into the No. 1 slot 11 .

[0070] Assembly method of stopper 4: Push non-metallic block 42 from one end of metal block 41 toward the other end of metal block 41 along the circumferential direction. Figure 6 As shown by the arrow in .

[0071] When the non-metal block 42 moves along the circumference, the dovetail tenon on it fits into the dovetail groove in the metal block 41 .

[0072] Step 2: Install the adjusting part 5.

[0073] Step 3: Install the reaction chamber 2.

[0074] If it is necessary to open the reaction chamber with the reaction chamber, it is only necessary to open the shielding door on the side of the upper chamber, adjust the adjustment piece on the upper cover, so that the stopper 4 is embedded in the reaction chamber and fixed, and then the reaction chamber can be opened.

[0075] On the contrary, the reaction chamber can be retained on the process chamber and only the upper chamber can be removed.

[0076] The working principle of the adjustable positioning device for the reaction chamber:

[0077] (1) When process chamber 3 needs to be maintained, specifically including:

[0078] Step 1: Connecting the upper cover 1 and the reaction chamber 2, specifically including:

[0079] Step 1A: Move the adjusting member 5 radially, and the adjusting member 5 drives the stopper 4 to move along the first groove 11;

[0080] When a part of the stopper 4 is located in the first groove 11 and the other part is located in the second groove 21, as shown in FIG. Figure 3 shown.

[0081] At this point, place the screws in the corresponding positioning holes 13 and screw them into the corresponding stoppers 4;

[0082] Step 1B, repeat step 1A until all the blocks 4 are fixed;

[0083] Step 2: Remove the upper chamber, and the reaction chamber 2 moves synchronously with the upper chamber and the upper cover 1.

[0084] Step 3: Remove adapter 6.

[0085] (2) When the reaction chamber 2 needs to be maintained, it specifically includes:

[0086] Move the adjusting member 5 in the radial direction, and the adjusting member 5 drives the stopper 4 to move along the first groove 11;

[0087] When the stopper 4 is separated from the second slot 21, as shown in FIG. Figure 4 shown.

[0088] When all the stoppers 4 are separated from the second groove 21 , the upper chamber is removed and the reaction chamber 2 remains stationary.

[0089] Figures 3 and 4 In the figure, the non-end surface portion of the stopper 4 is shown.

[0090] In addition, there are two main ways of opening the cavity in existing equipment: motor vertical lifting and manual backward flip opening.

[0091] The motor vertical lifting type often uses a hook to hang the reaction chamber to achieve rapid chamber opening;

[0092] Most of the flip-top chambers require the reaction chamber to be removed separately after flipping the cover.

[0093] This invention can be applied to both motor lifting type and manual flip type.

[0094] Among them, when the motor is lifting, before removing the upper cavity, the hinge shaft on the hinge structure needs to be removed first.

[0095] The above description is merely a preferred embodiment of the present invention and does not limit the present invention in any way. Any person skilled in the art who, without departing from the scope of the present invention, makes any equivalent substitution, modification, or other changes to the technical solution and technical content disclosed in the present invention shall be deemed to be within the scope of the present invention and still fall within the scope of protection of the present invention.

Claims

1. An adjustable positioning device for a reaction chamber, comprising an upper cover (1) and a reaction chamber (2) sleeved in the upper chamber, wherein the upper cover (1) is arranged on the bottom surface of the upper chamber and communicates with the upper chamber, and is characterized in that: Also includes: The first groove (11) and the second groove (21) are arranged opposite to each other to receive the stopper (4); the first groove (11) is provided on the inner annular surface of the upper cover (1), and the second groove (21) is provided on the outer annular surface of the reaction chamber (2); a preset gap is formed between the inner annular surface of the first groove (11) and the outer annular surface of the second groove (21); The stopper (4) is used to connect the upper cover (1) and the reaction chamber (2), and the number of the stopper is at least two; the stopper (4) can move along the first groove (11) and the second groove (21); An adjusting hole (12) is provided corresponding to the stopper (4), is opened on the upper surface of the upper cover (1) and is connected to the first groove (11), extends in the radial direction, and an adjusting member (5) is placed therein; The adjusting member (5) is used to adjust the stopper (4) in the radial direction, and is arranged corresponding to the stopper (4) and connected to the stopper (4); a maintenance window is provided on the upper cavity; and a positioning hole (13) provided on the upper cover (1) for receiving a screw. When the screw is engaged with the mounting hole on the corresponding stopper (4), the upper cover (1), the reaction chamber (2) and the corresponding stopper (4) are connected as one.

2. The adjustable positioning device for a reaction chamber according to claim 1, characterized in that: The stopper (4) includes a metal block (41) and a non-metal block (42) connected to the metal block (41); the metal block (41) is arranged toward the first slot (11) and has the mounting hole formed thereon, and the non-metal block (42) is arranged toward the second slot (22).

3. The adjustable positioning device for a reaction chamber according to claim 2, characterized in that: The non-metallic block (42) is ULTEM 1000.

4. The adjustable positioning device for a reaction chamber according to claim 2, characterized in that: The dovetail groove on the metal block (41) is adapted to the dovetail tenon on the non-metal block (42).

5. The adjustable positioning device for a reaction chamber according to claim 1, characterized in that: The adjusting member (5) is threadedly connected to the stopper (4).

6. The adjustable positioning device for a reaction chamber according to claim 1, characterized in that: The upper cover (1) is connected to the process chamber (3) via an adapter (6).

7. The adjustable positioning device for a reaction chamber according to claim 6, characterized in that: A hinge structure is provided between the outer wall of the upper chamber and the outer wall of the process chamber.

8. A method for using an adjustable positioning device for a reaction chamber, based on the adjustable positioning device for a reaction chamber according to any one of claims 1 to 7, characterized in that: When the process chamber (3) needs to be maintained, the steps include: Step 1: Connecting the upper cover (1) and the reaction chamber (2), specifically comprising: Step 1A, moving the adjusting member (5) in the radial direction, the adjusting member (5) drives the stopper (4) to move along the first groove (11); When a portion of the stopper (4) is located in the first slot (11) and the other portion is located in the second slot (21), a screw is placed in the corresponding positioning hole (13) and screwed into the corresponding stopper (4); Step 1B, repeat step 1A until all the stops (4) are fixed; Step 2: Remove the upper chamber, and the reaction chamber (2) moves synchronously with the upper chamber and the upper cover (1).

9. The method for using the adjustable positioning device for a reaction chamber according to claim 8, characterized in that: The method also includes steps when the reaction chamber (2) needs to be maintained, specifically including: The adjusting member (5) is moved radially, and the adjusting member (5) drives the stopper (4) to move along the first groove (11); When all the stoppers (4) are separated from the second groove (21), the upper chamber is removed and the reaction chamber (2) remains stationary.

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