Plasma jet generating device and contact lens care device

Abstract

The invention aims to provide a plasma jet generating device capable of improving processing efficiency, which comprises a plasma jet array, and the plasma jet array comprises a plurality of plasma jet sources arranged in an array. Due to the fact that the multiple plasma jet sources are arranged in the array mode, the processing area can be increased corresponding to the cross sectional area of the plasma jet array, and the processing efficiency is improved.

Description

Technical Field

[0001] The invention relates to a plasma jet generating device and a contact lens nursing device. Background Art

[0002] In recent years, plasma technology has been widely used in many fields including material surface modification. Most of the existing plasma material surface modification devices use dielectric barrier discharge (DBD) to generate plasma. When the applied voltage is high enough, a filamentary discharge channel will be formed between the two electrodes to generate plasma. However, the processing area of ​​a single plasma jet is usually only a few square millimeters. The small processing range seriously limits the application of plasma jet sources in surface treatment. Summary of the invention

[0003] In view of the above problems existing in the prior art, an object of the present invention is to provide a plasma jet generating device capable of improving processing efficiency.

[0004] To achieve the above object, the present invention provides a plasma jet generating device, comprising a plasma jet array, wherein the plasma jet array comprises a plurality of plasma jet sources arranged in an array.

[0005] The use of a plasma jet array including a plurality of plasma jet sources arranged in an array can process a large area of ​​a contact lens, thereby improving the care efficiency.

[0006] As a possible implementation manner, the plurality of plasma jet sources include a first plasma jet source and a plurality of second plasma jet sources, and the plurality of second plasma jet sources are arranged around the first plasma jet source.

[0007] As a possible implementation, the first plasma jet source is a single DBD structure, and the second plasma jet source is a double DBD structure.

[0008] The structure of a plasma jet source with a single DBD structure in the center and multiple plasma jet sources with double DBD structures in the periphery can generate uniform plasma and improve the care effect; the discharge plasma jet is a soft glow discharge mode to avoid wire arc discharge.

[0009] As a possible implementation, the plasma jet source includes a cannula, a through tube, and a needle electrode, wherein the needle electrode is inserted into the cannula, and the cannula is inserted into the through tube, with a first gap therebetween.

[0010] With the above structure, good discharge can be generated.

[0011] As a possible implementation, both ends of the insert tube of the first plasma jet source are open, and one end of the insert tube of the second plasma jet source is open and the other end is closed.

[0012] By adopting the above structure, a plasma jet source with a single DBD structure in the center and multiple plasma jet sources with double DBD structure in the periphery can be formed, which can produce uniform plasma and improve the care effect; the discharge plasma jet is a soft glow discharge mode to avoid wire arc discharge.

[0013] As a possible implementation manner, the plurality of second plasma jet sources are arranged in a regular polygon, the second plasma jet sources are located at the vertices of the regular polygon, and the first plasma jet source is located at the center of the regular polygon.

[0014] With the above structure, multiple plasma jet sources are partially regular polygonal. Under such a design, when a larger area of ​​jet plasma is needed, multiple such sub-arrays can be arranged together with basically no gaps in the middle. Therefore, this regular polygonal structure is very conducive to flexible adjustment of the arrangement structure in practical applications.

[0015] As a possible implementation manner, the regular polygon is a square, a regular pentagon, a regular hexagon or a regular octagon.

[0016] As a possible implementation manner, the plurality of second plasma jet sources are arranged in one or more circles.

[0017] The cross-sectional size of the array of plasma jets is larger than the size of a single contact lens.

[0018] In this way, the contact lenses can be well treated.

[0019] A grounding ring is sleeved on the periphery of the plasma jet array, the grounding ring is connected to a grounding wire, and the distance from the grounding ring to the lower end of the plasma jet array is 4-7 mm.

[0020] In this way, the distance from the grounding ring to the lower end of the plasma jet array is 4-7 mm, and good discharge characteristics can be obtained.

[0021] As a possible implementation, the cannula and the through tube are quartz tubes, and the needle electrode is made of copper or aluminum.

[0022] As a possible implementation, the discharger includes a cavity, the plasma jet source is installed in the cavity, and the cavity has an inlet channel for providing working gas to the plasma jet source, and the inlet channel is configured to allow the working gas to flow upward and then turn back and flow downward into the plasma jet source.

[0023] With the above structure, since the working gas flows upward and then returns downward to flow into the plasma jet source, it is possible to prevent flashback during the discharge process. On the one hand, the discharge mode is stabilized to prevent the discharge from transforming into arc discharge due to thermal instability, resulting in uneven surface of the treated material; on the other hand, corrosion of the discharge electrode is prevented to increase the service life of the device.

[0024] As a possible implementation, the plasma jet source includes a cannula, a through tube and a needle electrode, the needle electrode is inserted into the cannula from above, the cannula is inserted into the through tube from above, and a first gap is provided between the two, and the air inlet passage is configured so that the working gas flows upward and then turns back and flows downward into the upper port of the through tube.

[0025] As a possible implementation manner, at least a portion of the gas inlet channel is formed by an outer wall of the plasma jet source, and the working gas flows upward along the outer wall and then turns back and flows downward into the plasma jet source.

[0026] As a possible implementation, the plasma jet source has a through pipe with an inner cavity for the working gas to flow, and at least a portion of the air inlet channel is formed by an outer wall of the through pipe. The working gas flows upward along the outer wall and then turns back and flows downward into the upper port of the through pipe.

[0027] The above structure can be easily processed.

[0028] As a possible implementation, a first hole and a second hole are provided on the cavity, the first hole is used to accommodate the through pipes of the multiple plasma jet sources, the second hole constitutes at least a part of the air inlet channel, and the side of the second hole is connected to the side of the first hole.

[0029] The above structure can be easily processed.

[0030] As a possible implementation manner, a second gap is provided between the through pipe and the bottom wall of the first hole, and the working gas flows downward into the through pipe through the second gap.

[0031] As a possible implementation, the peripheral wall of the first hole has a fitting portion, the shape of which matches the outer wall of the through tube, so that the outer wall of the through tube fits into the fitting portion to close a portion of the connection between the first hole and the second hole.

[0032] As a possible implementation manner, a plurality of third holes are provided on the cavity, and the third holes are communicated with the bottom wall of the second hole, and are used to accommodate the insert tube of the plasma jet source.

[0033] As a possible implementation, a fourth hole is provided on the cavity, and the fourth hole is cross-connected with the second hole to form at least a part of the air intake passage, and the working gas turns upward from the fourth hole and flows into the second hole. In addition, the second hole is opened on the upper surface or the lower surface of the cavity.

[0034] The above structure can be easily processed.

[0035] As a possible implementation manner, the discharger has a virtual ground potential guiding directional plasma jet structure.

[0036] The use of a virtual ground potential to guide the directional plasma jet structure can produce uniform one-dimensional discharge, reduce the randomness and dispersion of the discharge in space, and effectively improve material properties.

[0037] In addition, the consistency of large-area material processing effects can be ensured, thereby solving the problem of inconsistent modification effects when processing large-area materials.

[0038] As a possible implementation method, the virtual ground potential guided directional plasma jet structure refers to that a grounding ring is wrapped around the through pipe sleeve of multiple array-arranged plasma jet sources, and the grounding ring is connected to the output end of the high-voltage power supply through a first capacitor, and the output end of the high-voltage power supply is connected to the ground of the mains through a second capacitor.

[0039] As a possible implementation manner, the capacity of the second capacitor is smaller than the capacity of the first capacitor.

[0040] The present specification also provides a contact lens care device, which includes: a gas supply unit and a plasma generating unit, wherein the gas supply unit is used to provide working gas to the plasma generating unit, including a gas storage mechanism and a switch valve; the plasma generating unit is used to generate plasma, including a power supply, a control mechanism, a radio frequency inverter driver, a radio frequency pulse transformer, and a discharger. Here, the discharger can be a plasma jet generating device of any of the above structures, or a device of other structures.

[0041] Thus, the present specification provides a contact lens care device that can use plasma to care for contact lenses, which can improve the care effect and efficiency compared with the water washing method in the prior art.

[0042] As a possible implementation, it also includes a motion unit, which includes a motor controller, a motor, a moving mechanism and a workbench. The workbench is used to configure contact lenses. The motor can drive the moving mechanism to generate movement so that the workbench and the discharger move relative to each other. The motor controller is used to control the motor.

[0043] With the above structure, the contact lens on the workbench can be placed in a suitable position by the motion unit to perform good plasma care.

[0044] As a possible implementation, the RF inverter driver can generate a dual-frequency pulse envelope drive signal including a high-frequency fundamental wave signal and a low-frequency pulse signal.

[0045] In the above manner, since a dual-frequency pulse envelope driving signal is generated, the discharge is driven by the high-frequency fundamental signal, and the continuous wave single ignition failure defect is suppressed by the low-frequency pulse signal.

[0046] Here, the pulse width and pulse frequency of the dual-frequency pulse envelope driving signal can be modulated so that the operator can set them to generate good discharge and plasma.

[0047] As a possible implementation, a temperature detection mechanism is further included, which is used to detect the power of the pulse power amplifier, and the power is used to calculate the temperature of the plasma generated by the plasma generating unit.

[0048] By adopting the above structure, the temperature of the plasma is calculated according to the power of the pulse power amplifier, so that the temperature of the plasma can be accurately obtained, which solves the technical problem that the plasma temperature is difficult to accurately detect in the prior art.

[0049] As a possible implementation, the temperature detection mechanism is disposed in the pulse power amplifier.

[0050] With the above structure, the temperature detection mechanism is built into the pulse power amplifier, that is, the temperature detection mechanism is integrated in the pulse power amplifier, so it can be easily and accurately detected.

[0051] As a possible implementation manner, a display screen is further included, on which the temperature of the plasma is displayed.

[0052] By adopting the above structure, the operator can know the temperature of the plasma in real time, for example, the operator can deal with abnormal temperature problems in advance.

[0053] As a possible implementation, the control mechanism further includes a temperature detection mechanism for detecting the temperature of the plasma. When it is detected that the temperature of the plasma is lower than a first temperature threshold, the control mechanism stops the motor.

[0054] When the detected temperature is too low, the discharger does not work. Therefore, when the temperature of the plasma is detected to be lower than the first temperature threshold, the motor is stopped to prevent the motor from idling and doing useless work. The temperature detection mechanism here can be a temperature detection mechanism that obtains the temperature of the plasma through the power of a pulse power amplifier.

[0055] As a possible implementation, the control mechanism further includes a temperature detection mechanism for detecting the temperature of the plasma. When it is detected that the temperature of the plasma is higher than a second temperature threshold, the control mechanism stops the discharge of the discharger.

[0056] When the temperature of the plasma is too high, the contact lens may be easily deformed, etc. Therefore, when it is detected that the temperature of the plasma is higher than the second temperature threshold, the discharger is stopped to prevent the contact lens from being deformed, burned or damaged by high temperature.

[0057] As a possible implementation, the gas supply unit further includes a flow measurement mechanism, and the flow measurement mechanism is used to detect the flow of the working gas provided to the plasma generating unit.

[0058] When it is detected that the flow rate of the working gas is lower than a first flow rate threshold or higher than a second flow rate threshold, the control mechanism stops the discharger from discharging.

[0059] When the flow rate of the working gas is too low, the contact lens may be easily burned due to excessive temperature. Therefore, with the above structure, when it is detected that the flow rate of the working gas is lower than the first flow rate threshold, the control mechanism stops the discharger from discharging, thereby preventing the contact lens from being burned.

[0060] In addition, when the working gas flow is too high, the contact lens may be easily blown up due to the strong airflow. Therefore, an if structure is adopted, when it is detected that the flow of the working gas is higher than the second flow threshold, the control mechanism stops the discharge of the discharger, thereby preventing the contact lens from being blown away and deviating from the optimal care position, thereby reducing the care effect.

[0061] As a possible implementation, the workstation table has a plurality of workstations.

[0062] With the above structure, since the work station table has a plurality of work stations, a plurality of contact lenses can be placed on the work station table at one time, thereby improving the nursing efficiency.

[0063] As a possible implementation, the moving mechanism can enable the workstation to move two-dimensionally in a horizontal direction.

[0064] With this structure, the contact lens can be moved in two horizontal directions, so that it can be easily placed in a position suitable for care.

[0065] As a possible implementation, when a plurality of contact lenses are arranged on the work table, the control mechanism moves the work table and the discharger relative to each other, and performs plasma treatment on the plurality of contact lenses one by one.

[0066] In the above manner, since the control mechanism moves the work station and the discharger relative to each other, and plasma care is performed on the multiple contact lenses one by one, the operator can place and care for multiple contact lenses at one time, thereby improving the care efficiency.

[0067] As a possible implementation, the control mechanism causes the plurality of contact lenses to be cared for one by one for a first time, and then to be cared for one by one for a second time, wherein the second time is shorter than the first time.

[0068] With the above structure, after completing the basic care (first-time care), a quick "re-sweep" (secondary care) can be performed to improve the care effect.

[0069] As a possible implementation, it further includes a box, the discharger is arranged in the box, and the motion unit can move the workstation between the inside and the outside of the box.

[0070] By adopting the above structure, the workstation table can be automatically moved outside the box, so that it is convenient for the operator to take and place the contact lenses.

[0071] As a possible implementation, an operating mechanism for an operator to operate is also included, and the operating mechanism is a touch screen.

[0072] With the above structure, the operator can freely set the settings.

[0073] As a possible implementation, there is a dual-frequency pulse low-temperature plasma jet contact lens care device.

[0074] By adopting the above-mentioned various structures of the present invention, it is possible to effectively care for (clean) the corneal reshaping lens.

[0075] In addition, the dual-frequency pulse low-temperature plasma jet corneal reshaping lens care device can sterilize and disinfect the lens surface through a low-temperature plasma jet. The water contact angle after treatment is significantly reduced, and the purpose of low-temperature plasma sterilization is achieved at the same time, which effectively reduces the time of lens care and improves care efficiency.

[0076] As a possible implementation manner, the working gas is argon.

[0077] In addition, the working gas may be a single gas or a mixture thereof, or may be air, a gaseous compound or a gaseous organic substance. BRIEF DESCRIPTION OF THE DRAWINGS

[0078] The various technical features of the present application and the relationship between them are further explained below with reference to the accompanying drawings. The accompanying drawings are exemplary, and some technical features are not shown in actual proportion. In addition, some drawings may omit technical features that are commonly used in the technical field to which the present application belongs and are not essential for understanding and implementing the present application, or additional technical features that are not essential for understanding and implementing the present application may be shown. In other words, the combination of the various technical features shown in the accompanying drawings is not used to limit the present application. In addition, throughout the present application, the same figure numbers refer to the same content. The specific description of the drawings is as follows:

[0079] Figure 1 is a schematic structural diagram of a contact lens care device according to a specific embodiment of the present invention;

[0080] Figure 2 is a schematic diagram of a contact lens care device according to a specific embodiment of the present invention;

[0081] Figure 3(a)-Figure 3(d) 3(a) and 3(b) are three-dimensional views in different representations, FIG. 3(c) is a top view, and FIG. 3(d) is a schematic diagram of a single plasma jet source;

[0082] Figure 4(a)-Figure 4(f) 4(a) is a perspective view, FIG4(b) is a top view, FIG4(c) is a cross-sectional view along line AA in FIG4(b), FIG4(d) is a bottom view, FIG4(e) is a partial enlarged view in FIG4(b), and FIG4(f) uses arrow lines to indicate the flow path of the working gas based on FIG4(c), and uses dotted lines to schematically indicate the plasma jet array 100;

[0083] Figure 5 Schematic diagram of the front shell of the plasma jet generating device according to a specific embodiment of the present invention, wherein (a) is a stereoscopic view, (b) is a rear view, and (c) is a top view;

[0084] Figure 6 It is a three-dimensional schematic diagram of the rear shell of the plasma jet generating device according to a specific embodiment of the present invention;

[0085] Figure 7 It is a three-dimensional schematic diagram of a fixing member of a plasma jet generating device according to a specific embodiment of the present invention;

[0086] Figure 8 is a stereoscopic diagram of the front shell and the rear shell assembled together;

[0087] Fig. 9(a), (b), (c), and (d) show several other implementations based on FIG. 4(d).

[0088] Fig.10 The photographs are comparisons of before and after treatment of orthokeratology lenses using the device according to a specific embodiment of the present invention, wherein (a) is before treatment and (b) is after treatment.

[0089] Description of reference numerals:

[0090] Among them, 1 is an operating mechanism, 2 is a discharger, 3 is a flow measurement mechanism, 4 is a work station, 5 is a moving mechanism, 6 is a control mechanism, 7 is a motor controller, 8 is a power supply, 9 is a switch valve, 10 is a flow control valve, 11 is a radio frequency inverter driver, 12 is a pulse power amplifier, 13 is a radio frequency pulse transformer, 14 is a gas storage mechanism, 15 is a pressure reducing valve, 16 is a box, 17 is a fan, 18 is a motor, 21 is an air supply unit, 22 is a plasma generating unit, and 23 is a motion unit; 100 is a plasma jet array, 101-106 are plasma jet sources of a dual DBD electrode structure; 107 is a single DBD electrode The plasma jet source of the electrode structure is as follows: 107-1 is a needle electrode; 107-2 is an insertion tube; 107-3 is a through tube; 200 is a cavity: 201 is a insertion tube hole; 202 is an upper air inlet hole; 203 is an air inlet hole; 204 is a through tube hole; 205 is a threaded hole; 3 is a front shell: 301 is a through tube hole; 302 is a wiring hole; 303 is an air inlet hole; 304 is a threaded hole; 305 is a threaded hole; 306 is a threaded hole; 400 is a rear shell: 401 is a high-voltage wiring hole; 402 is a grounding wire hole; 403 is a threaded hole; 404 is a threaded hole; 405 is a threaded hole; 5 is a fixing part: 501 is a threaded hole; 502 is a threaded hole. DETAILED DESCRIPTION

[0091] Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0092] The specific embodiment of the present invention provides a contact lens care device, such as Figure 1 , Figure 2 The contact lens care device 1000 shown is a dual-frequency pulse low-temperature plasma jet contact lens care device. In addition, in this embodiment, the plasma care for orthokeratology lenses is used as an example for description. Figure 1 , Figure 2 As shown, the contact lens care device 1000 includes an air supply unit 21, a plasma generating unit 22 and a motion unit 23 ( Figure 2), wherein the gas supply unit 21 is used to provide working gas to the plasma generating unit 22; the plasma generating unit 22 is used to generate plasma so that the contact lens can be cared for by the plasma; the motion unit 23 is used to displace the contact lens so as to move it to a care station for plasma care.

[0093] In this embodiment, the gas supply unit 21 includes a gas storage mechanism 14, a pressure reducing valve 15, a switch valve 9, a flow regulating valve 10, and a flow measuring mechanism 3; the plasma generating unit 22 includes a power supply 8, a control mechanism 6, a radio frequency inverter driver 11, a radio frequency pulse transformer 13, a discharger 2 (plasma jet generating device), and an operating mechanism 1; the motion unit 23 includes a motor controller 7, a motor 18, a moving mechanism 5, and a work station 4.

[0094] Each mechanism in the gas supply unit is connected by a gas pipeline; the gas storage mechanism 14 is used to store the working gas at a certain pressure, and the pressure reducing valve 15 is arranged on the gas storage mechanism 14, and is used to reduce the pressure of the working gas in the gas storage mechanism 14 and release it; one end of the switch valve 9 is connected to the pressure reducing valve 15, and the other end is connected to the flow regulating valve 10, the input end of the flow measuring mechanism 3 is connected to the flow regulating valve 10, and the output end is connected to the discharger 2. When supplying gas, the working gas is released from the gas storage mechanism 14 through the pressure reducing valve 15, and then supplied to the discharger 2 of the plasma generating unit 22 through the switch valve 9, the flow regulating valve 10, and the flow measuring mechanism 3.

[0095] In addition, the contact lens care device 1000 also includes a box body 16, which is in the shape of a rectangular parallelepiped. The mechanisms of the air supply unit 21, the plasma generating unit 22 and the motion unit 23 (except the air storage mechanism) are basically arranged on the box body 16, thereby being assembled into one.

[0096] In addition, refer to Figure 1 A fan 17 is provided on the rear surface of the box 16. The fan 17 has two upper and lower fans, one of which can be used to blow air into the box 16 and the other can be used to exhaust air out of the box 16. Thus, the box 16 can be cooled by air circulation, so that the various mechanisms in the box 16 can work well. On the other hand, ozone generated in the box 16 can also be exhausted. In addition, since the fan 17 is provided on the rear surface of the box 16, it can be prevented that the exhausted ozone makes the operator feel uncomfortable.

[0097] The structures of the gas supply unit 21 , the plasma generating unit 22 and the moving unit 23 are described in more detail below.

[0098] <Air supply unit>

[0099] In this embodiment, the working gas is, for example, argon. In this case, the gas storage mechanism 14 is, for example, an argon gas cylinder. The argon gas in the argon gas cylinder can be, for example, 99.999% high-purity gas. The pressure reducing valve 15 can be a dedicated argon gas valve.

[0100] The switch valve 9 can be a solenoid valve, which is convenient for long-term standby and gas saving. In addition, for example, when the plasma temperature is abnormal, the control mechanism 6 can close the switch valve 9, which can stop the discharge synchronously.

[0101] The flow control valve 10 is used to adjust the flow rate of the working gas according to the instruction of the control mechanism 6 .

[0102] The flow measurement mechanism 3 can be a mass flow meter, which can be powered by a 24V DC power supply and is used to detect the flow of the working gas. The flow measurement mechanism 3 is electrically connected to the control mechanism 6. When the gas flow detected by the flow measurement mechanism 3 is too low or too high, the control mechanism 6 stops the discharge.

[0103] <Plasma Generating Unit>

[0104] The various mechanisms of the plasma generating unit are electrically connected, wherein the input end of the RF inverter driver 11 is connected to the pulse power amplifier 12 , and the output end is connected to the control mechanism 6 ; the input end of the RF pulse transformer 13 is connected to the pulse power amplifier 12 , and the output end is connected to the discharger 2 .

[0105] The radio frequency inverter driver 11 and the pulse power amplifier 12 are both electrically connected to the control mechanism 6 .

[0106] The power supply 8 may be a 24V DC power supply. The control mechanism 6 may be a PLC program controller.

[0107] The RF inverter driver 11 is placed in a shielded metal shell, which contains a 24V to 15VDC module and an STM32 microcontroller. The STM32 microcontroller generates a dual-frequency pulse envelope drive signal in which both the pulse width and the pulse frequency can be modulated. The microcontroller and the control mechanism 6 can be connected via a serial port line, and the output port is connected to the pulse power amplifier 12 in two lines.

[0108] The pulse power amplifier 12 is placed in a shielded metal shell and powered by a 24V DC power supply; a floating gate inverter direct drive technology is used to generate a 24V dual-frequency pulse envelope; the signal input port is connected to the RF inverter driver; and the power output port drives the RF pulse amplifier.

[0109] In addition, the pulse power amplifier 12 is built with a temperature detection mechanism 12a for analyzing the power consumed by the discharger 2 for generating the plasma jet. The temperature of the plasma jet is calibrated in advance according to the power value, so that the plasma temperature can be obtained according to the power (current or voltage). Therefore, this embodiment can solve the technical problem that the plasma temperature is difficult to accurately detect. Under the control of the control mechanism 6, the temperature can be displayed on the display screen of the operating mechanism 1. In addition, the function of obtaining the plasma temperature according to the power can be set on the pulse power amplifier 12 side, and can also be set on the control mechanism 6 side.

[0110] The RF pulse transformer 13 is driven by the pulse power amplifier 12, and can be made of an amorphous nano-magnetic core with a turn ratio of 200 times, to generate a RF pulse high voltage (e.g., about 8000V) to drive the discharger 2, so that the discharger 2 discharges in the working gas environment to generate plasma. The internal virtual floating ground terminal, ground wire high voltage capacitor, and high voltage insulating sleeve of the RF pulse transformer 13 have all been integrated and do not need to be reconfigured.

[0111] <Motion Unit>

[0112] The operating mechanism 1 and the motor controller 7 of the motion unit 23 are electrically connected to the control mechanism 6. The moving mechanism 5 is driven by the motor 18; the motor controller 7 is electrically connected to the motor 18, and the motor controller 7 can be integrated on the motor 18. The workstation 4 is installed on the moving mechanism 5 and is driven by the moving mechanism 5 to move.

[0113] When the contact lenses are subjected to plasma care, the control mechanism 6 sends a command to the motor controller 7, which drives the motor 18 to activate the moving mechanism 5, thereby moving the work station 4 to move the contact lenses that need to be plasma-treated to the care position (specifically, directly below the discharger 2 in the present embodiment), so that these contact lenses are bombarded by the plasma jet generated by the discharger 2 in turn, and plasma care is performed to remove pollutants and oxide layers on the lens surface, thereby activating the lens surface.

[0114] In this embodiment, the work station 4 has a plurality of work stations for placing contact lenses, so that a plurality of contact lenses can be placed simultaneously on the work station 4. As a specific example, the work station 4 has 8 work stations, and the 8 work stations are arranged in a manner of "2 rows, 4 in each row", so that the work station 4 can place a maximum of 8 contact lenses simultaneously.

[0115] In this embodiment, when plasma treatment is performed, the moving mechanism 5 moves the work table 4, and the plurality of contact lenses placed thereon are sequentially moved to the treatment position at a certain time interval to perform plasma treatment.

[0116] In this embodiment, the motor 18 includes a motor 18A and a motor 18B, which are used to respectively enable the moving mechanism 5 to generate a forward and backward movement and a left and right movement (i.e., a two-dimensional movement in a horizontal plane), and the corresponding motor controller 7 includes a motor controller 7A and a motor controller 7B, which respectively control the motor 18A and the motor 18B. When no distinction is made, they are collectively referred to as the motor 18 and the motor controller 7.

[0117] In addition, if Figure 1 , Figure 2 As shown, the operating mechanism 1 is placed on the front surface of the box 16 and is electrically connected to the control mechanism 6. The operator can set multiple microwave pulse discharge parameters on the operating mechanism 1, such as the frequency and pulse width of the driving signal, the pulse duty cycle, the nursing time, etc. In this embodiment, the operating mechanism 1 is a touch screen.

[0118] <Action>

[0119] In this embodiment, when the contact lens care device 1000 is turned on, the main switch (not shown) is turned on first. After a certain startup time, the operator can click the "eject" button on the operating mechanism 1. Under the control of the control mechanism 6, the work station 4 is slowly moved out of the box. The operator puts the lenses to be processed into multiple work stations in the work station 4 in turn. After that, the work station to be processed is selected on the operating mechanism 1, and the following parameters are set, for example: the pulse switching frequency is initially set to 4kHz (stable and unchanged), the pulse duty cycle is initially set to 50% (adjustable), the microwave drive pulse frequency is initially set to 42kHz (adjustable), and the microwave pulse width time is initially set to 8kns (adjustable).

[0120] After the setting is completed, the operator clicks the "Start" button on the operating mechanism 1, and the motor 7 drives the moving mechanism 5 to slowly move the contact lens to be processed to the bottom of the discharger 2. The contact lens is 25mm away from the discharger, and the discharge begins; the care time for each lens can be set to 20s. After 20s, the motor 7 moves the workstation 4 to switch to the next contact lens for care. When all the contact lenses on the workstation 4 have completed a 20s care (called the first care), the motor 7 moves the workstation 4 to perform another care for each lens (called the second care), and the time for this care can be set to 1 second. In this way, the total care time for each lens is 21 seconds.

[0121] The distance between the contact lens and the discharger 2 can be freely set according to the situation, for example, within the range of 15mm-30mm, or within the range of 25±2mm. In addition, the first care time and the second care time of each contact lens can be freely set, for example, the first care time can be set within the range of more than 10 seconds and less than 30 seconds, and the second care time can be set to 1-2 seconds. In addition, when there is only one contact lens on the work station 4, the second care can be omitted.

[0122] In addition, when the flow measurement mechanism 3 detects that the gas flow rate is lower than, for example, 1L / min (the first flow rate threshold) or higher than, for example, 1.8L / min (the second flow rate threshold), the discharge is stopped, and at the same time, a prompt will be displayed on the display screen of the operating mechanism 1, such as displaying red font "Gas flow rate is too low / high, the plasma has been automatically shut down! Please increase / decrease the opening of the gas cylinder valve and the flow valve". The operator clicks the "Reset" button on the touch screen, and the control mechanism 6 controls the motor to return the work station 4 to the initial position before the start of the processing. Then the operator can adjust the gas flow rate. After the flow rate is normal and the discharge is restored, the contact lens can be processed again.

[0123] When the gas flow rate is too low (e.g., lower than 1 L / min), the contact lens may be easily burned due to excessive temperature. When the gas flow rate is too high (e.g., higher than 1.8 L / min), the contact lens may be easily blown up due to the strong airflow, causing it to deviate from the desired position or even fall off the workstation 4. Therefore, in this embodiment, when the gas flow rate is detected to be lower than 1 L / min (the first flow rate threshold) or higher than 1.8 L / min (the second flow rate threshold), the discharge is stopped and the plasma generation is stopped, so that safe and reliable plasma care can be performed. The flow rate threshold here is set by the technician according to the parameters of the discharger 2, etc.

[0124] The temperature detection mechanism is controlled by the control mechanism 6, and the temperature of the plasma jet is calibrated in advance according to the power value, so that the temperature of the plasma can be obtained according to the power value. When the temperature is detected to be within 10-30 degrees, it works normally. If it is lower than 10 degrees (the first temperature threshold), it means that the discharger 2 is not discharged, and no processing is performed, so that the motor 7 and the like are not operated to prevent idling; if it is greater than 30 degrees (the second temperature threshold), the discharge is stopped to prevent the contact lens from being deformed by high temperature.

[0125] After the lens care is completed, the discharge stops at the same time, the lens is taken out, "reset" is clicked, the work station 4 returns to the initial position, the power supply 8 is turned off, and the whole care process is completed.

[0126] The contact lens care device 1000 of this embodiment can be used to more thoroughly remove tear protein on the contact lens. The radio frequency inverter driver 11 (STM32 single chip microcomputer) generates a dual-frequency pulse envelope drive signal with a low frequency pulse of 4kHz and a high frequency pulse of 40-50MHz (or 30-50MHz, modulatable), which is directly driven by the pulse power amplifier 12 to generate a 24V dual-frequency pulse envelope signal, which acts on the radio frequency pulse transformer 13 to generate radio frequency pulse high voltage, and then drives the discharger 2 to generate a large amount of uniform plasma to act on the surface of the object, so as to achieve the purpose of removing protein and sterilizing.

[0127] Here, the high frequency is a high-frequency fundamental signal of 40-50MHz, which is the driving high-voltage radio frequency wave for generating discharge. The specific frequency value depends on the specific discharger structure and can be determined in combination with the discharger debugging. The pulse width of the high-frequency signal can adjust the intensity (shape, density and temperature) of the discharge plasma. The low-frequency pulse frequency is fixed at a specified value (for example, 4kHz). The purpose is to ignite, for example, 4000 times per second, to avoid the defect of single ignition failure of continuous wave. The duty cycle of the low-frequency pulse is based on the detection of excessively high plasma temperature, and the use of pulse discharge to reduce the plasma jet temperature to a suitable operating temperature.

[0128] In addition, the contact lens care device 1000 of this embodiment can reduce the water contact angle of the lens and increase the wettability of the lens. The radio frequency pulse high voltage drives the discharger 2 to generate uniform plasma, and the charged particles are accelerated by the bias voltage to bombard the lens surface, which can effectively remove the pollutants and oxide layer on the lens surface and activate the lens surface; the water droplets on the lens surface treated by plasma will collapse on the mirror surface, indicating that the water contact angle on the lens surface is small and has good wettability, and at the same time indicates the low adhesion of the contaminated lipids, which can improve the safety and comfort of wearing.

[0129] In the above description, the motion unit moves the work station 4 to take care of each contact lens in turn. However, the discharger 2 can also be moved to take care of each contact lens in turn. That is to say, as long as the work station 4 and the discharger 2 move relative to each other, each contact lens can be taken care of in turn.

[0130] <Embodiment of plasma jet generating device>

[0131] A plasma jet generating device is also provided in a specific embodiment of the present invention, and its structure can be combined with the discharger in the above embodiment.

[0132] The plasma jet generating device is described below.

[0133] In recent years, low-temperature plasma technology has been widely used in many fields including material surface modification. Compared with other material surface modification technologies, low-temperature plasma technology has the advantages of simple operation, fast processing speed, good modification effect, low environmental pollution, and low energy consumption. It has great application prospects and practical value in material surface modification. Domestic and foreign studies have shown that dielectric barrier discharge plasma is rich in high-energy active components. These high-energy active components interact with the surface of materials and can cause a series of physical and chemical reactions, which change the chemical composition and physical form of the materials, such as improving the hydrophilicity, adhesion, biocompatibility and electrical properties of the materials.

[0134] Most of the existing plasma material surface modification devices use dielectric barrier discharge (DBD) to generate plasma. When the applied voltage is high enough, a filamentary discharge channel will be formed between the two electrodes to generate low-temperature plasma. The low-temperature plasma has a low temperature and will not damage the surface of the material during surface modification. The plasma treatment only acts on the outermost layers of molecules on the surface of the material and will not affect the bulk properties of the material. For example, a Chinese patent with publication number CN101925246A discloses a method for generating a low-temperature plasma that can be directly touched by the human body, and a low-temperature plasma generating device is used to generate a low-temperature plasma that can be directly touched by the human body. However, the processing area of ​​a single plasma jet is usually only a few square millimeters, and the small processing range seriously limits the application of plasma jets in surface treatment. Based on this, in order to expand the scale of plasma, it is possible to consider designing a plasma jet array that expands on one-dimensional and two-dimensional scales. For example, a plasma feather array is generated by using a microsecond pulse to excite a plasma spray gun array device; an AC power supply is used to excite a plasma spray gun device to generate a plasma feather array. However, there are still some defects and deficiencies in application, such as high jet gas temperature, short jet length, random and dispersed discharge distribution, inability to guarantee uniformity of material treatment effect, and poor discharge tempering stability. In addition, the device has a limited treatment range and limited treatment uniformity, and cannot guarantee continuous and large-area treatment of materials.

[0135] In response to the above-mentioned technical problems existing in the device, a specific embodiment of the present invention proposes a plasma jet generating device to solve problems such as small processing area and low efficiency, single function, limited application scope, and poor processing effect in the field of material surface modification.

[0136] Reference Figure 3(a) to Figure 8 This embodiment provides a plasma jet generating device 2A, which is a DBD (Dielectric Barrier Discharge) structure low-temperature plasma jet generating device, including a plasma jet array 100, a cavity 200, a front shell 300, a rear shell 400 and a fixing member 500. The front shell 300 and the rear shell 400 are assembled together to form a complete shell ( Figure 8 ), the fixing member 500 is used to fix the front shell 300 and the rear shell 400 on the object structure (such as the box in the above embodiment), the cavity 200 is installed in the front shell 300 and the rear shell 400, and the plasma jet array 100 is installed in the cavity 200.

[0137] The plasma jet array 100 includes a plurality of plasma jet sources with a DBD structure arranged in an array. The plurality of plasma jet sources include a plasma jet source 107 with a single DBD electrode structure and plasma jet sources 101 - 106 with a double DBD electrode structure.

[0138] The plasma jet source 107 of the single DBD electrode structure is composed of a cannula 107-2, a through tube 107-3, and a needle electrode 107-1. The through tube 107-3 has a hollow inner cavity and is open at both ends. The cannula 107-2, which is hollow and open at both ends, is inserted into the through tube 107-3, which is open at both ends. There is a gap between the two (i.e., between the outer wall of the cannula and the inner wall of the through tube) for the flow of working gas. The needle electrode in the cannula 107-2 is connected to a power source, and the working gas is input from the upper port of the through tube 107-3. The cannula 107-2 can be a capillary tube with a small diameter, so as to facilitate the configuration of the needle electrode 107-1 and the action of the working gas.

[0139] Compared with the plasma jet source 107 with a single DBD electrode structure, the plasma jet sources 101 to 106 with a double DBD electrode structure have one end of the cannula (the end with the electrode inserted) open and the other end closed. The other structures are the same.

[0140] The needle electrodes of the multiple plasma jet sources in the plasma jet array 100 are connected to a high voltage power supply (high voltage radio frequency power supply), and the working gas is connected to the through tube. When the working gas is introduced, the voltage is gradually increased, and the tip of the cannula begins to ignite, generating a corona. As the voltage increases, the plasma begins to expand downward along the through tube until it is ejected from the lower port of the through tube 107-3, forming a uniform plasma. In addition, in this embodiment, the cross-sectional size of the plasma jet array 100 is roughly equivalent to the size of a single contact lens. In order to ensure that the plasma jet array 100 can completely cover a single contact lens when caring for the lens, the cross-sectional size of the plasma jet array 100 is preferably larger than the size of a single contact lens.

[0141] Since a single DBD electrode structure plasma jet source 107 is used to surround multiple dual DBD electrode structure plasma jet sources 106, it is possible to ensure that multiple plasma jet sources can discharge to avoid uneven discharge; the discharge plasma jet is a soft glow discharge mode to avoid wire arc discharge. The plasma jet array 100 of this embodiment has a dual DBD electrode structure plasma jet array, and the discharge is uniform and efficient.

[0142] In this embodiment, the multiple plasma jet sources in the plasma jet array 100 include one plasma jet source 107 with a single DBD electrode structure and six plasma jet sources 101-106 with a double DBD electrode structure. The six plasma jet sources 101-106 with a double DBD electrode structure are arranged in a regular hexagon, and the one plasma jet source 107 with a single DBD electrode structure is located at the center of the regular hexagon.

[0143] Reference Figure 3(a)-Figure 3(d) A grounding ring 108 is provided around the periphery of the plasma jet sources 101-107, and the grounding ring 108 is connected to a grounding wire (not shown). The position of the grounding ring 108 is reasonably set, for example, in this embodiment, the distance from the grounding ring 108 to the lower end of the through pipe can be 4-7 mm, so that good discharge characteristics can be obtained.

[0144] According to the present embodiment, the discharge mode of the peripheral multiple plasma jet sources 101-106 is double DBD discharge, the discharge mode of the central plasma jet source 107 is single DBD discharge, and the virtual ground potential is used to guide the directional plasma jet structure, which can produce uniform one-dimensional discharge, reduce the randomness and dispersion of the discharge in space, effectively improve the material properties, and ensure the consistency of large-area material processing effects, thereby solving the problem of inconsistent modification effects when processing large-area materials.

[0145] The virtual ground potential here refers to Figure 3(a)-Figure 3(d) The virtual ground circuit is connected to an insulated wire ring (grounding ring), which is sleeved on the lower end of the outer periphery of the quartz tube assembly formed by the plasma jet sources 101-107. This ring is connected to an output end of the high-voltage power supply through a high-voltage capacitor such as 20pF. This output end of the high-voltage power supply is also connected to the ground of the mains through a capacitor such as 1nF.

[0146] The plasma jet generating device of this embodiment is based on dual-frequency pulse high-voltage excitation gas discharge to generate highly ionized and highly active particles that continuously bombard the surface of the material, which can destroy the original chemical bonds and introduce new polar groups, thereby increasing the polarity of the material surface and improving the hydrophilicity of the material surface.

[0147] Here, the "dual frequency pulse" has been explained in the description of the plasma generating unit of the above embodiment, and will not be described in detail here. In addition, in this embodiment, the frequency of the high frequency fundamental wave signal is adjustable between 30-50 MHz, and the frequency of the low frequency pulse signal is fixed at, for example, 4 kHz. In addition, the RF pulse high voltage range can be 2 kV to 10 kV.

[0148] Reference Figure 4(a)-Figure 4(f)As shown, the cavity 200 is a cuboid with a length, width and height of 50 mm, 20 mm and 50 mm respectively. Seven holes 201 (six holes at the periphery and one hole at the center) arranged in a regular hexagonal pattern are opened on the upper surface of the cavity 200, and a regular hexagonal hole 204 is opened on the lower surface. The holes 201 are connected to the holes 201 up and down, and the positions of the holes 201 correspond to the vertices of the regular hexagons of the holes 204. Each hole 201 can embed the plug of the plasma jet array 100, and accordingly, the through pipes of the plasma jet sources 101-106 of the double DBD electrode structure are arranged at the vertices of the regular hexagons of the holes 204. In addition, the vertices of the regular hexagons of the holes 204 are not sharp corners, but have chamfers to form a fitting portion 204a, so that they can match and fit with the outer wall shape of the cylindrical through pipes of the plasma jet sources 101-106. In addition, the through pipes of the plasma jet sources 101-106 do not contact the bottom surface of the hole 204 (it can be understood that since the bottom end of the hole 204 is open, its bottom surface is located at the upper end), and maintain a certain distance from the bottom surface. In addition, the lower ends of the through pipes of the plasma jet sources 101-107 extend out of the hole 204.

[0149] By adopting the regular hexagonal layout of this embodiment, multiple dielectric barrier discharge structures can be connected in series according to the width of the material to be processed. The reason for adopting this regular hexagonal structure is that if this regular hexagonal jet array is used as a subarray, when a larger area of ​​jet plasma is required, multiple such subarrays can be arranged together with basically no gaps in the middle. Therefore, this regular hexagonal structure is very conducive to flexible adjustment of the arrangement structure in practical applications. In addition, as other embodiments, other regular polygonal layouts can also be adopted, such as squares, regular pentagons, regular octagons, etc.

[0150] Fig. 9 Several other embodiments are shown based on FIG. 4( d ). Fig. 9 In (a), there is a plasma jet source in the center and four plasma jet sources arranged in a square at the periphery. Accordingly, the cavity 200 is provided with a square hole 204A and five holes 201A. Among the five holes 201A, one is located in the center and four are located at the vertices of the square. Fig. 9 In (b), there is a central plasma jet source and eight peripheral plasma jet sources arranged in a regular octagon. Correspondingly, a regular octagonal hole 204B and nine holes 201B are provided on the cavity 200. Among the nine holes 201B, one is located in the center and eight are located at the vertices of the regular octagon.

[0151] exist Fig. 9In (c), the same as the above-mentioned embodiment is that there is a central plasma jet source and six peripheral plasma jet sources arranged in a regular hexagon, but the difference is that a circular hole 204C is formed on the cavity 200 to accommodate the through pipes of multiple plasma jet sources.

[0152] exist Fig. 9 In (d), different from the above-mentioned embodiment, there is a central plasma jet source and 18 peripheral plasma jet sources, and the 18 plasma jet sources are arranged in two circles, the 6 plasma jet sources in the inner circle are arranged in a regular hexagon, and the 12 plasma jet sources in the outer circle are arranged in a regular dodecagon. Accordingly, a circular hole as described above is formed on the cavity 200 (such as Fig. 9 (d)) or a regular dodecagonal hole to accommodate a through pipe of multiple plasma jet sources.

[0153] In addition, refer to Figure 4(a)-Figure 4(f) An upper air inlet hole 202 with an outer diameter of, for example, 3 mm and a depth of 26 mm is opened downward from the upper surface of the cavity 200, and the upper end of the upper air inlet hole 202 is sealed (blocked) with insulating glue or the like; an air inlet hole 203 with an outer diameter of, for example, 3 mm and a depth of 25 mm is opened from a side surface of the cavity 200, and the upper air inlet hole 202 and the air inlet hole 203 are cross-connected to form an air inlet channel, and the working gas enters the cavity from the air inlet hole 203, and turns and flows upward from the air inlet hole 203 into the upper air inlet hole 202. The side of the upper air inlet 202 is connected to a vertex of the regular hexagon of the hole 204 (part of the material of the upper part of the fitting portion 204a located here is removed and opened), but when the hole 204 is provided with a through pipe of the plasma jet source 101-106, due to the obstruction of the outer wall of the through pipe, the working gas needs to flow upward along the outer wall of the through pipe to the gap between the through pipe and the bottom wall of the hole 204 before entering the hole 204. Afterwards, the working gas flows downward into all the plasma jet sources 101-107, that is, into the upper port of the through pipe.

[0154] Here, it can be understood that the outer wall of the through-tube can be regarded as the outer wall of the plasma jet sources 101 - 106 , and the outer wall of the through-tube of one of the peripheral plasma jet sources 101 - 106 constitutes a part of the inlet channel for guiding the flow of the working gas.

[0155] With such a structure, since the air inlet hole is set at a specified distance (about 5 mm in this embodiment) below the air inlet at the upper end of the through tube, the working gas first passes through the air inlet channel to the top of the quartz through tube, and then disperses and returns downward to enter the through tube evenly, preventing the flashback during the discharge process. On the one hand, the discharge mode is stabilized to prevent the discharge from being converted to arc discharge due to thermal instability, resulting in uneven surface of the treated material; on the other hand, the corrosion of the discharge electrode is prevented to increase the service life of the device. In addition, the cavity 200 is connected to the shell through the threaded hole 205.

[0156] In the above description, an upper air inlet hole 202 is provided on the upper surface of the cavity 200, which is cross-connected with the air inlet hole 203 to form an air inlet passage. However, as another embodiment, the upper air inlet hole 202 may be omitted, and a lower air inlet hole is provided on the lower surface of the cavity 200, the side of which is connected with the hole 204, and the lower air inlet hole is further extended upward from the bottom to the bottom after being connected with the air inlet hole 203. When in use, the lower port of the lower air inlet hole is closed. In this way, an air inlet passage can also be formed. In addition, when such a lower air inlet hole is formed, the lower port of the lower air inlet hole may not be closed, the air inlet hole 203 may be omitted, and the air pipe may be connected to the lower port of the lower air inlet hole.

[0157] Reference Figure 5 As shown, the front shell 300 is provided with a regular hexagonal hole 301 to allow the plasma jet array 100 to be embedded; the front shell 300 is provided with a wiring hole 302 to facilitate the lead-out of the grounding wire; the right side of the front shell 300 is provided with an air inlet hole 303, which is connected to the air inlet hole 203; the front shell 300 is symmetrically provided with two threaded holes 304 connected to the threaded hole 205; the front shell 300 is symmetrically provided with two threaded holes 305 connected to the rear shell.

[0158] Reference Figure 6 As shown, the rear shell 400 is provided with a high-voltage wiring hole 401, a grounding wire hole 402 and threaded holes 403-405. The outlet wires of the multiple needle electrodes are led out from the high-voltage wiring hole 401 to connect to the high-voltage power supply; the grounding wire led out from the wiring hole 302 of the front shell 300 is led out from the grounding wire hole 402 to ground; the high-voltage wiring hole 401 and the grounding wire hole 402 are separated by a specified distance (for example, more than 35 mm), which can effectively avoid high-voltage breakdown; the rear shell 400 is provided with threaded holes 403, 405 and Figure 3(a)-Figure 3(d) The threaded holes 305 and 306 of the front shell are connected; the rear shell 400 has a threaded hole 404 connected to the fixing member.

[0159] Reference Figure 7 As shown, the fixing member 500 is provided with embedded threaded holes 501 and 502 , wherein the threaded hole 501 is connected to the threaded hole 405 of the rear housing 400 , and the threaded hole 502 is connected to the object structure.

[0160] Reference Fig.10As shown, there are comparison photographs of the orthokeratology lens before and after treatment using the device of the specific embodiment of the present invention, wherein (a) is before treatment, (b) is after treatment, and the treatment time is 20s. It can be seen that the hydrophilicity of the orthokeratology lens is significantly improved after treatment (i.e., plasma care).

[0161] In addition, in this embodiment, the cavity 200, the front shell 300, the rear shell 400 and the fixing member 500 are made of plastic, such as polytetrafluoroethylene, and the screws used in the threaded holes are all plastic screws.

[0162] In addition, the cannula and the through tube of the plasma jet source 101-107 can be quartz tubes, the length of the cannula can be 65-75mm, the outer diameter can be 1.8-2.2mm, and the wall thickness can be 0.3-0.6mm; the length of the through tube can be 45-55mm, the outer diameter can be 2.8-4.2mm, and the wall thickness can be 0.3-0.8mm; a part of the cannula is exposed above the through tube, and the size of the exposed part can be 9-19mm; the length of a single needle electrode can be 75-85mm, and multiple needle electrodes are connected by welding points; the needle electrode is a high-voltage electrode, and the material can be copper, aluminum and other conductive materials. Good characteristics can be obtained by setting the size, size relationship and other parameters of these components (including the exposed length of the cannula).

[0163] In addition, the working gas may be a single gas or a mixture thereof, or may be air, a gaseous compound or a gaseous organic substance.

[0164] The plasma jet array generation device of this embodiment has the characteristics of high efficiency, universality, stability, uniformity, etc., which has high application value for material surface modification. In addition, the double DBD low-temperature plasma jet array generation device also has the advantages of simple structure, good stability, low cost, safety and environmental protection.

[0165] In addition, the present embodiment has a simple structure, and the device is placed in an open atmospheric environment, without relying on an expensive vacuum chamber.

[0166] In the above description, regarding the layout of multiple plasma jet sources, the peripheral dual DBD electrode structure plasma jet sources 101-106 are arranged in a regular polygon, which can help to flexibly adjust the arrangement structure. However, the present invention is not limited to this, and multiple plasma jet sources with a dual DBD electrode structure can be arranged in other ways around the plasma jet source with a single DBD electrode structure, such as a circle. In addition, in the above description, the peripheral dual DBD electrode structure plasma jet sources 101-106 form a "circle", however, the present invention is not limited to this, and "multiple circles" of dual DBD electrode structure plasma jet sources can also be arranged around the plasma jet source with a single DBD electrode structure.

[0167] In addition, in the above description, a single plasma jet source has a through pipe, an insertion pipe, and an electrode, however, from the viewpoint of being able to generate plasma, the present invention is not limited thereto, and other structures may be adopted.

[0168] In addition, in the above description, the cavity 200 is a single component of an integrated structure, however, the present invention is not limited thereto, and a split structure may also be adopted.

[0169] In addition, it can be understood that, under the premise of no contradiction, the contents described in this embodiment can be combined with the contact lens care device of the above embodiment.

[0170] The device described in this specification is not limited to the care of orthokeratology lenses, but can also be used to care for other corneal contact lenses and scleral contact lenses, such as ordinary contact lenses (commonly known as soft contact lenses), hard corneal contact lenses, etc.

[0171] The preferred embodiments of the present invention disclosed above are only used to help explain the present invention. The preferred embodiments do not describe all the details in detail, nor do they limit the invention to only specific implementation methods. Obviously, many modifications and changes can be made according to the content of this specification. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the present invention, so that those skilled in the art can well understand and use the present invention. The present invention is limited only by the claims and their full scope and equivalents.

[0172] The term "comprising" used throughout this application should not be interpreted as being limited to the contents listed thereafter; it does not exclude other structural elements or steps. Therefore, it should be interpreted as specifying the existence of the mentioned technical features, integral bodies, steps or components, but does not exclude the existence or addition of one or more other technical features, integral bodies, steps or components and groups thereof.

[0173] It can be understood that those skilled in the art can combine the features mentioned in one or more embodiments mentioned in the entire application with the features in other embodiments in any appropriate manner to implement the application.

[0174] Note that the above are only preferred embodiments of the present application and the technical principles used. Those skilled in the art will understand that the present application is not limited to the specific embodiments herein, and that various obvious changes, readjustments and substitutions can be made by those skilled in the art without departing from the protection scope of the present application. Therefore, although the present application is described in more detail through the above embodiments, the present application is not limited to the above embodiments, and may also include more other equivalent embodiments without departing from the technical concept of the present application, all of which belong to the protection scope of the present application.

Claims

1. A plasma jet generating device, characterized in that: The invention comprises a plasma jet array, wherein the plasma jet array comprises a plurality of plasma jet sources arranged in an array.

2. The plasma jet generating device according to claim 1, characterized in that: The plurality of plasma jet sources include a first plasma jet source and a plurality of second plasma jet sources, and the plurality of second plasma jet sources are arranged around the first plasma jet source.

3. The plasma jet generating device according to claim 2, characterized in that: The first plasma jet source is a single DBD structure, and the second plasma jet source is a double DBD structure.

4. The plasma jet generating device according to any one of claims 1 to 3, characterized in that: The plasma jet source comprises a cannula, a through tube and a needle electrode, wherein the needle electrode is inserted into the cannula, and the cannula is inserted into the through tube, with a first gap therebetween.

5. The plasma jet generating device according to claim 4 as referred to claim 2 or 3, characterized in that: The cannula of the first plasma jet source is open at both ends, The insert tube of the second plasma jet source is open at one end and closed at the other end.

6. The plasma jet generating device according to claim 2 or 3, characterized in that: The plurality of second plasma jet sources are arranged in a regular polygon, and the second plasma jet sources are located at the vertices of the regular polygon. The first plasma jet source is located at the center of the regular polygon.

7. The plasma jet generating device according to claim 6, characterized in that: The regular polygon is a square, a regular pentagon, a regular hexagon or a regular octagon.

8. The plasma jet generating device according to any one of claims 1 to 3, characterized in that: The plurality of second plasma jet sources are arranged in one or more circles.

9. The plasma jet generating device according to any one of claims 1 to 3, characterized in that: The cross-sectional size of the array of plasma jets is larger than the size of a single contact lens.

10. The plasma jet generating device according to any one of claims 1 to 3, characterized in that: A grounding ring is sleeved on the periphery of the plasma jet array, and the grounding ring is connected to a grounding wire. The distance from the grounding ring to the lower end of the plasma jet array is 4-7 mm.

11. The plasma jet generating device according to claim 4, characterized in that: The cannula and the through tube are quartz tubes, and the needle electrode is made of copper or aluminum.

12. The plasma jet generating device according to any one of claims 1 to 3, characterized in that: It also includes a cavity, on which the plasma jet source is installed, and in which there is an air inlet channel for supplying working gas to the plasma jet source, wherein the air inlet channel is configured to allow the working gas to flow upward and then turn back and flow downward into the plasma jet source.

13. The plasma jet generating device according to claim 12, characterized in that: The plasma jet source comprises a cannula, a through tube and a needle electrode, wherein the needle electrode is inserted into the cannula from above, and the cannula is inserted into the through tube from above, with a first gap therebetween. The air intake passage is configured to allow the working gas to flow upward and then turn back and flow downward into the upper port of the through pipe.

14. The plasma jet generating device according to claim 12, characterized in that: At least a portion of the gas inlet passage is formed by an outer wall of the plasma jet source, and the working gas flows upward along the outer wall and then turns back and flows downward into the plasma jet source.

15. The plasma jet generating device according to claim 13, characterized in that: At least a portion of the air inlet passage is formed by the outer wall of the through pipe, and the working gas flows upward along the outer wall and then turns back and flows downward into the upper port of the through pipe.

16. The plasma jet generating device according to claim 15, characterized in that: A first hole and a second hole are provided on the cavity, wherein the first hole is used to accommodate the through pipes of a plurality of plasma jet sources arranged in an array, and the second hole constitutes at least a part of the air inlet channel. The side of the second hole is connected to the side of the first hole.

17. The plasma jet generating device according to claim 16, characterized in that: A second gap is defined between the through pipe and the bottom wall of the first hole, and the working gas flows downwardly into the through pipe through the second gap.

18. The plasma jet generating device according to claim 16, characterized in that: The peripheral wall of the first hole has a fitting portion, the shape of which matches the outer wall of the through tube, so that the outer wall of the through tube fits on the fitting portion to close a part of the connection between the first hole and the second hole.

19. The plasma jet generating device according to claim 16, characterized in that: A plurality of third holes are provided on the cavity, and the third holes are communicated with the bottom wall of the second hole and are used to accommodate the insert tube of the plasma jet source.

20. The plasma jet generating device according to claim 16, characterized in that: A fourth hole is provided on the cavity, and the fourth hole is cross-connected with the second hole to form at least a part of the air intake passage. The working gas turns upward from the fourth hole and flows into the second hole. The second hole is opened on the upper surface or the lower surface of the cavity.

21. The plasma jet generating device according to any one of claims 1 to 3, characterized in that: The invention has a structure for guiding the directional plasma jet with a virtual ground potential.

22. The plasma jet generating device according to claim 21, characterized in that: The virtual ground potential guided directional plasma jet structure means that a grounding ring is arranged on the outer sleeve of a through pipe for the flow of working gas of a plurality of array-arranged plasma jet sources, and the grounding ring is connected to the output end of a high-voltage power supply through a first capacitor, and the output end of the high-voltage power supply is connected to the ground of the mains through a second capacitor.

23. The plasma jet generating device according to claim 22, characterized in that: The capacity of the second capacitor is smaller than the capacity of the first capacitor.

24. A contact lens care device, characterized in that: A plasma jet generating device comprising the plasma jet generating device according to any one of claims 1 to 23.

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