Novel photoelectric display mode and component adopting display mode

By laying a self-luminous display sheet on the loadable object body, the problem of high space and cost in the projection screen equipment in the prior art is solved, and the effect of saving space and cost and improving aesthetics is achieved.

CN119497505APending Publication Date: 2025-02-21GUANGXI QUANTUM TONGDA TECH CO LTD
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Patent Information

Application Number
CN202311101502.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2023-08-15
Filing Date
2023-08-30
Publication Date
2025-02-21

AI Technical Summary

Technical Problem

The prior art uses the installation of projection screens and other equipment to display pictures and play videos, which leads to a lot of costs, takes up a lot of space, and affects the beauty of the space.

Method used

The self-luminescent display sheet is laid on the loadable body. The self-luminescent display sheet consists of a flexible decorative surface layer, a display material layer and a flexible base layer. The display material layer uses a perovskite film, a single crystal silicon film or a polycrystalline silicon film. As a display layer.

Benefits of technology

It achieves space and expense savings, while improving the sense of art and technology. The self-luminous display sheet can display pictures and videos, and has decorative functions, which are suitable for various carriageable subjects.

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Abstract

The invention discloses a novel photoelectric display mode, which is characterized in that a self-luminous display sheet is laid on a loading main body for luminous display, and the self-luminous display sheet is a flexible sheet and comprises a flexible decorative surface layer, a display material layer and a flexible substrate layer from outside to inside, and the display material layer takes a perovskite thin film, a single / multi-silicon thin film or a polycrystalline silicon thin film as a display layer. According to the novel photoelectric display mode, the space and the cost can be saved, the artistic sense and the science and technology sense are improved, the Ti-doped ITO thin film layer, the CuSCN thin film layer and the IGZO thin film layer are grown in the flexible substrate layer of the self-luminous display sheet in the modes of magnetron sputtering, spin coating and the like to clamp the metal halide perovskite thin film layer, and the self-luminous display sheet has the advantages that the metal halide perovskite thin film layer is formed; according to the formed sheet, the personalized display function is added on the basis of retaining the original decoration function, the displayed color gamut is wide, the contrast ratio is high, vivid and rich color patterns can be displayed, and the display requirement in a decoration scene is met.
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Description

Technical Field

[0001] The present invention relates to the field of display technology, and in particular to a novel photoelectric display method and a component using the display method. Background Art

[0002] At present, in daily life and offices, displays and projection screens are often used for meetings, watching movies, and playing advertisements. Therefore, it is necessary to purchase display or projection screen cloth and other equipment and place or install them in the location where the display is required. In the exterior walls of buildings, pictures and videos are also played by installing projection screens. Outdoor billboards are also equipped with projection screens for advertising. In the interior of the car, display screens are installed to watch movies and play navigation routes. The existing display method takes up space, is expensive, and affects the aesthetics of the space. Summary of the invention

[0003] The purpose of the present invention is to overcome the technical problems of high cost and space occupation caused by the above-mentioned prior art of displaying pictures and playing videos by installing equipment such as projection screens, and to provide a new photoelectric display method. Displaying pictures and videos in this way can save space and cost, while enhancing the sense of art and technology.

[0004] To achieve the above object, the present invention adopts the following technical solution:

[0005] A novel photoelectric display method, which uses a self-luminous display sheet to be laid on a loadable body, the self-luminous display sheet is a flexible sheet, which includes a flexible decorative surface layer, a display material layer and a flexible base layer from the outside to the inside, and the display material layer uses a perovskite film, a single crystal silicon film or a polycrystalline silicon film as the display layer.

[0006] Furthermore, the self-luminous display sheet includes:

[0007] A flexible base layer;

[0008] ITO thin film layer: arranged on the flexible substrate layer;

[0009] Display material layer: including a hole transport layer, a perovskite thin film display layer, and an electron transport layer, wherein the display material layer is disposed on the ITO thin film layer, the hole transport layer is provided with a P electrode, and the electron transport layer is provided with an N electrode;

[0010] Flexible decorative surface;

[0011] The flexible decorative surface layer and the flexible base layer are both low-temperature curing molding layers.

[0012] Furthermore, the ITO thin film layer is a Ti-doped ITO thin film layer, the hole transport layer is a CuSCN thin film layer, and the electron transport layer is an IGZO thin film layer; the hole transport layer of the display material layer is fixed on the ITO thin film layer; or, the electron transport layer of the display material layer is fixed on the ITO thin film layer.

[0013] Furthermore, the perovskite thin film display layer is a metal halide perovskite thin film layer.

[0014] Furthermore, the low-temperature curing molding layer is an inorganic powder composite curing molding layer, and the inorganic powder composite curing molding layer is formed by curing inorganic powder and adding high molecular polymer at a temperature of 80 to 300°C.

[0015] Furthermore, the method for preparing the self-luminous display sheet comprises the following steps:

[0016] Prepare low-temperature curing molding slurry: take 100 parts of inorganic powder, add 10-30 parts of acrylic polymer emulsion and / or redispersible latex powder, and then add water to mix;

[0017] Preparation of a flexible base layer: coating a low-temperature curing molding slurry on a molding carrier, and curing the slurry at a temperature of 80 to 300° C. to obtain a flexible base layer;

[0018] Preparing an ITO thin film layer: forming the ITO thin film layer on the flexible substrate layer;

[0019] The display material layer is formed on the ITO thin film layer: the hole transport layer, the perovskite thin film display layer, and the electron transport layer are sequentially formed on the ITO thin film layer; or, the electron transport layer, the perovskite thin film display layer, and the hole transport layer are sequentially formed on the ITO thin film layer, and a P electrode is provided on the hole transport layer and an N electrode is provided on the electron transport layer.

[0020] Furthermore, the method for forming the ITO thin film layer on the flexible substrate layer is:

[0021] In the magnetron sputtering equipment, an ITO target material is installed at target position A and a Ti target material is installed at target position B; then, vacuum is drawn, and argon gas is introduced, the gas pressure in the sputtering chamber of the magnetron sputtering equipment is adjusted, the sputtering power, time and temperature are set, and the ITO target material and the Ti target material are sputtered simultaneously to obtain a Ti-doped ITO film on the flexible substrate layer.

[0022] Furthermore, the method for forming the display material layer on the ITO thin film layer adopts the following method 1 or method 2:

[0023] Method 1: forming the hole transport layer, the perovskite thin film display layer, and the electron transport layer on the flexible substrate layer in sequence:

[0024] A CuSCN precursor solution is prepared, and then the CuSCN precursor solution is filtered, the flexible substrate layer with the ITO thin film layer is preheated, and then the atomized CuSCN glue is evenly sprayed on the ITO thin film layer, and the flexible substrate layer is driven to rotate to form a CuSCN thin film, and then heated and sputtered P electrode;

[0025] The PbI2 powder is dissolved in a mixed solvent of DMF and DMSO to prepare a PbI2 solution, and then the PbI2 solution is spin-coated onto the CuSCN film, and after drying, a PbI2 film is formed; and then the film is immersed in a precursor solution formed by dissolving the prepared FAI and MAI in IPA to form a metal halide perovskite film display layer;

[0026] An IGZO thin film layer is formed on the metal halide perovskite thin film display layer by magnetron sputtering, and then an N electrode is sputtered;

[0027] Method 2: forming the electron transport layer, the perovskite thin film display layer, and the hole transport layer on the flexible substrate layer in sequence:

[0028] Preheating the flexible substrate layer with the ITO thin film layer, forming an IGZO thin film layer by magnetron sputtering, and then sputtering an N electrode;

[0029] The PbI2 powder is dissolved in a mixed solvent of DMF and DMSO to prepare a PbI2 solution, and then the PbI2 solution is spin-coated onto the IGZO thin film layer, and after drying, a PbI2 thin film is formed; and then the PbI2 thin film is immersed in a precursor solution formed by dissolving the prepared FAI and MAI in IPA to form a metal halide perovskite thin film display layer;

[0030] A CuSCN precursor solution is prepared, and then the CuSCN precursor solution is filtered, and then the atomized CuSCN glue is evenly sprayed on the metal halide perovskite thin film display layer, and the flexible substrate layer is driven to rotate to form a CuSCN thin film, and then heated and sputtered P electrode.

[0031] Furthermore, a pattern is printed or sprayed on the surface of the flexible decorative surface layer.

[0032] The present invention also discloses a component adopting the above-mentioned new photoelectric display method, characterized in that: the component includes a load-bearing body, the surface of the load-bearing body is paved with the self-luminous display sheet, and the load-bearing body includes building interior walls, building exterior walls, floors, ceilings, desktops, cabinet surfaces, electronic parts housings, mechanical parts housings, automobile outer shells, automobile interior accessories, and outdoor billboards.

[0033] Compared with the prior art, the present invention has the following beneficial effects:

[0034] 1. The display method of the present invention is to use self-luminous display sheets to lay on the loadable body. The self-luminous display sheets have the function of power-on display and can serve as a display and projection screen cloth, and also have the function of decoration. One-time laying realizes the dual functions of decoration and display, saving space while reducing costs and manpower.

[0035] 2. After the self-luminous display sheet of the present invention is powered on and connected to the control system, it can display corresponding patterns and videos according to the instructions input by the control system. It can be applied to buildings and other load-bearing bodies to play a role in personalized decoration. The shell used for electromechanical products also has corresponding information display and interactive functions, which is a first in the field of flexible decorative materials.

[0036] 3. The self-luminous display sheet of the present invention is endowed with display function by the innovation of the material itself. It is based on a flexible substrate layer, and an ITO thin film layer is added by magnetron sputtering technology. After being composited with the flexible substrate layer, the flexible substrate layer becomes a conductive substrate. Then, a luminescent material layer formed by a hole transport layer and an electron transport layer sandwiching a perovskite thin film display layer is generated on the conductive substrate by spin coating and magnetron sputtering. Driven by an external circuit, electrons and holes are respectively injected into the perovskite thin film display layer through the electron transport layer and the hole transport layer. Subsequently, electrons and holes meet in the perovskite layer to generate photons by radiation recombination, thereby realizing the display of various patterns and videos.

[0037] 4. The self-luminous display sheet of the present invention grows a Ti-doped ITO thin film layer, a CuSCN thin film layer, and an IGZO thin film layer in the modified inorganic powder composite solidification molding layer by magnetron sputtering, spin coating, etc. to sandwich the metal halide perovskite thin film display layer. The formed flexible sheet has a wide color gamut and high contrast, and can display vivid and rich color patterns to meet the display needs in decorative scenes. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, a brief introduction is given to the drawings required for describing the embodiments.

[0039] Figure 1 It is a schematic structural diagram of the self-luminous display sheet of embodiment 1;

[0040] Figure 2 It is a schematic structural diagram of the self-luminous display sheet of Example 2;

[0041] Figure 3 This is the color gamut diagram of the self-luminous display sheet. DETAILED DESCRIPTION

[0042] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0043] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0044] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0045] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0046] In the present invention, unless otherwise clearly specified and limited, the terms "including" or "having" are intended to specify the existence of features, quantities, steps, operations, elements, parts or combinations thereof, but are not used to exclude the existence or possible addition of one or more other features, quantities, steps, operations, elements, parts or combinations thereof.

[0047] In the present invention, the term "low temperature curing forming layer" refers to a base layer or decorative surface layer that is cured and formed at a temperature between room temperature and 300°C after being coated with a slurry having a curing temperature between room temperature and 300°C. The slurry having a curing temperature between room temperature and 300°C may be, for example, a resin slurry, an inorganic powder composite slurry, or the like.

[0048] The novel photoelectric display method of the present invention is to use a self-luminous display sheet to be laid on a loadable body. After the power supply and control system are turned on, the self-luminous display sheet can display pictures and videos according to the instructions of the control system. The self-luminous display sheet is provided with a perovskite film, a single crystal silicon film or a polycrystalline silicon film as a display layer. The present invention is further described in detail below by taking the self-luminous display sheet as an example in which a perovskite film is provided as a display layer.

[0049] Example 1

[0050] A new type of photoelectric display method, which uses a self-luminous display sheet to be laid on a loadable body. The self-luminous display sheet is a flexible sheet, which includes a flexible decorative surface layer, a display material layer and a flexible substrate layer from the outside to the inside, and the display material layer uses a perovskite film as the display layer. For details, please refer to Figure 1 , the self-luminous display sheet comprises:

[0051] A flexible base layer 10;

[0052] ITO thin film layer 20: disposed on the flexible substrate layer 10;

[0053] A hole transport layer 31, a perovskite thin film display layer 41, and an electron transport layer 51 are sequentially arranged on the ITO thin film layer 20, wherein the hole transport layer is provided with a P electrode, and the electron transport layer is provided with an N electrode. The hole transport layer, the perovskite thin film display layer, and the electron transport layer constitute a display material layer.

[0054] Specifically, the ITO thin film layer is a Ti-doped ITO thin film layer, the perovskite thin film display layer is a metal halide perovskite thin film display layer, the hole transport layer is a CuSCN thin film layer, and the electron transport layer is an IGZO thin film layer.

[0055] A flexible decorative surface layer is further arranged on the display material.

[0056] The flexible base layer and the flexible decorative surface layer are low temperature curing forming layers, and the low temperature curing forming layer is an inorganic powder composite curing forming layer, and the inorganic powder composite curing forming layer is formed by adding inorganic powder to a high molecular polymer and curing at a temperature of 80 to 300° C. The inorganic powder composite curing forming layer is preferably a modified inorganic powder composite curing forming layer.

[0057] The method for preparing the self-luminous display sheet comprises the following steps:

[0058] S10, preparing a flexible base layer:

[0059] The invention is made of 6-30% cement, 0.5-4% latex powder, 10-40% acrylic polymer emulsion, 0-3% pigment and the rest inorganic powder. The inorganic powder is selected from one or more of waste building cement block powder, waste powder from stone factory, coal slag powder, waste powder from ceramic factory and sand. The inorganic powder is modified by a surfactant coupling agent, and the amount of the surfactant coupling agent is 0.3-2% of the total mass of the inorganic powder. The surfactant coupling agent can be selected from one or more of rare earth coupling agent, aluminate coupling agent or titanate coupling agent. The modification method of the inorganic powder is as follows: after heating the inorganic powder to 80-110°C, the surfactant coupling agent is added and stirred evenly, and the modified inorganic powder is obtained after drying.

[0060] The flexible substrate preparation step comprises:

[0061] After the raw materials are mixed, 10-30% of water based on the total weight of the raw materials is added and stirred evenly to obtain slurry; the slurry is coated on a molding device and solidified at a temperature of 80-300°C to form.

[0062] S20, preparing ITO thin film layer:

[0063] A flexible substrate layer is prepared on the flexible substrate layer using a magnetron oil injection device: after turning on the magnetron sputtering device, the flexible substrate layer is placed on the substrate table, an ITO target is installed at target position A, and a Ti target is installed at target position B; target A is 80-100 mm away from the flexible substrate layer, and target B is 50-70 mm away from the flexible substrate layer, then vacuum is applied, and argon gas is introduced, the gas pressure in the sputtering chamber of the magnetron sputtering device is adjusted to 1 Pa, the sputtering power is set to 120 W, the time is 5 min, and the temperature is 110°C, and the ITO target and the Ti target are sputtered simultaneously to obtain a Ti-doped ITO film on the flexible substrate layer.

[0064] S30, forming the display material layer on the ITO thin film layer:

[0065] The hole transport layer 31, the perovskite thin film display layer 41, and the electron transport layer 51 are sequentially formed on the ITO thin film layer; and a P electrode is provided on the hole transport layer, and an N electrode is provided on the electron transport layer:

[0066] Dissolve CuSCN in dipropyl sulfide to prepare a CuSCN precursor solution with a concentration of 5 g / L, stir evenly and filter using a nano-scale filter membrane;

[0067] Preheating the flexible substrate layer with the ITO thin film layer at a temperature of 50-60° C., then spin-coating the atomized CuSCN glue on the ITO thin film layer, and driving the flexible substrate layer to rotate to form a CuSCN thin film, the spin coating parameters are 3000 rpm, 30 seconds, and then heating and sputtering the P electrode;

[0068] The PbI2 (lead iodide) powder was dissolved in a mixed solvent of DMF (NN dimethylamide) and DMSO (dimethyl sulfoxide) to prepare a PbI2 solution with a concentration of 1 mol / L. The PbI2 solution was then spin-coated onto the CuSCN film at 5000 rpm for 30 seconds and dried at 100°C for 30 minutes to form a PbI2 film. The film was then immersed in a 0.05 mol / L precursor solution formed by dissolving the prepared FAI (formamidine iodide) and MAI (methylammonium iodide) in IPA (isopropyl alcohol) to form a metal halide perovskite thin film display layer FA. x MA 1-x PbI3;

[0069] An IGZO thin film layer is formed on the metal halide perovskite thin film display layer by magnetron sputtering, the thickness of the IGZO thin film layer is 40-50nm, and then an N electrode is sputtered;

[0070] Then the P electrode and N electrode are exposed by etching.

[0071] S40, preparing a flexible decorative surface layer 60 on the display material layer:

[0072] The modified inorganic powder is mixed with 6-30% cement, 0.5-4% latex powder, 10-40% acrylic polymer emulsion and 0-3% pigment to form a raw material; 10-30% water of the total weight of the raw materials is added, stirred evenly to obtain slurry; the slurry is coated on a molding device and solidified at a temperature of 80-300°C to form a slurry.

[0073] Exemplarily, patterns may also be printed on the flexible decorative surface layer.

[0074] Exemplarily, after the pattern is printed on the flexible decorative surface layer, a layer of finishing layer is sprayed on top of the pattern by passing through an atomizing device.

[0075] The self-luminous display sheet of this embodiment can be used on various components, including building interior walls, building exterior walls, floors, ceilings, desktops, cabinets, electronic parts housings, mechanical parts housings, automobile outer shells, and automobile interior decoration parts.

[0076] Example 2

[0077] A new type of photoelectric display method, which uses a self-luminous display sheet to be laid on a loadable body. The self-luminous display sheet is a flexible sheet, which includes a flexible decorative surface layer, a display material layer and a flexible substrate layer from the outside to the inside, and the display material layer uses a perovskite film as the display layer. For details, please refer to Figure 2 , the self-luminous display sheet comprises:

[0078] A flexible base layer 10;

[0079] ITO thin film layer 20: disposed on the flexible substrate layer 10;

[0080] An electron transport layer 51, a perovskite thin film display layer 41, and a hole transport layer 31 are sequentially arranged on the ITO thin film layer. The hole transport layer is provided with a P electrode, and the electron transport layer is provided with an N electrode. The hole transport layer, the perovskite thin film display layer, and the electron transport layer constitute a display material layer.

[0081] Specifically, the ITO thin film layer is a Ti-doped ITO thin film layer, the perovskite thin film display layer is a metal halide perovskite thin film layer, the hole transport layer is a CuSCN thin film layer, and the electron transport layer is an IGZO thin film layer.

[0082] A flexible decorative surface layer is further arranged on the display material layer.

[0083] The flexible base layer and the flexible decorative surface layer are both low temperature curing molding layers. The low temperature curing molding layer is an inorganic powder composite curing molding layer, which is formed by curing inorganic powder and adding high molecular polymer at a temperature of 80 to 300° C. The inorganic powder composite curing molding layer is preferably a modified inorganic powder composite curing molding layer.

[0084] The method for preparing the self-luminous display sheet of this embodiment comprises the following steps:

[0085] S10, preparing a flexible base layer:

[0086] The invention is made of 6-30% cement, 0.5-4% latex powder, 10-40% acrylic polymer emulsion, 0-3% pigment and the rest inorganic powder. The inorganic powder is selected from one or more of waste building cement block powder, waste powder from stone factory, coal slag powder, waste powder from ceramic factory and sand. The inorganic powder is modified by a surfactant coupling agent, and the amount of the surfactant coupling agent is 0.3-2% of the total mass of the inorganic powder. The surfactant coupling agent can be selected from one or more of rare earth coupling agent, aluminate coupling agent or titanate coupling agent. The modification method of the inorganic powder is as follows: after heating the inorganic powder to 80-110°C, the surfactant coupling agent is added and stirred evenly, and the modified inorganic powder is obtained after drying.

[0087] The flexible substrate preparation step comprises:

[0088] After the raw materials are mixed, 10-30% of water based on the total weight of the raw materials is added and stirred evenly to obtain slurry; the slurry is coated on a molding device and solidified at a temperature of 80-300°C to form.

[0089] S20, preparing ITO thin film layer:

[0090] A flexible substrate layer is prepared on the flexible substrate layer using a magnetron oil injection device: after turning on the magnetron sputtering device, the flexible substrate layer is placed on the substrate table, an ITO target is installed at target position A, and a Ti target is installed at target position B; target A is 80-100 mm away from the flexible substrate layer, and target B is 50-70 mm away from the flexible substrate layer, then vacuum is applied, and argon gas is introduced, the gas pressure in the sputtering chamber of the magnetron sputtering device is adjusted to 1 Pa, the sputtering power is set to 120 W, the time is 5 min, and the temperature is 110°C, and the ITO target and the Ti target are sputtered simultaneously to obtain a Ti-doped ITO film on the flexible substrate layer.

[0091] S30, forming the display material layer on the ITO thin film layer:

[0092] The electron transport layer, the perovskite thin film display layer, and the hole transport layer are sequentially formed on the ITO thin film layer; and a P electrode is provided on the hole transport layer, and an N electrode is provided on the electron transport layer:

[0093] Generating an IGZO thin film layer on the Ti-doped ITO thin film layer by magnetron sputtering, the IGZO thin film layer having a thickness of 40-50 nm, and then sputtering an N electrode;

[0094] The PbI2 (lead iodide) powder was dissolved in a mixed solvent of DMF (NN dimethylamide) and DMSO (dimethyl sulfoxide) to prepare a PbI2 solution with a concentration of 1 mol / L. The PbI2 solution was then spin-coated onto the IGZO thin film layer at 5000 rpm for 30 seconds and dried at 100°C for 30 minutes to form a PbI2 thin film. The thin film was then immersed in a 0.05 mol / L precursor solution formed by dissolving the prepared FAI (formamidine iodide) and MAI (methylammonium iodide) in IPA (isopropyl alcohol) to form a metal halide perovskite thin film display layer FA. x MA 1-x PbI3;

[0095] Dissolve CuSCN in dipropyl sulfide to prepare a CuSCN precursor solution with a concentration of 5g / L, stir evenly and filter with a nano-scale filter membrane; then preheat the flexible substrate layer with the Ti-doped ITO thin film layer, the IGZO thin film layer, and the metal halide perovskite thin film display layer at a preheating temperature of 50-60°C, then spin-coat the atomized CuSCN glue on the metal halide perovskite thin film display layer, and drive the flexible substrate layer to rotate to form a CuSCN thin film, the spin coating parameters are 3000rpm, 30s, and then heat and sputter the P electrode;

[0096] Then the P electrode and N electrode are exposed by etching.

[0097] S40, preparing a flexible decorative surface layer on the display material layer:

[0098] The modified inorganic powder is mixed with 6-30% cement, 0.5-4% latex powder, 10-40% acrylic polymer emulsion and 0-3% pigment to form a raw material; 10-30% water of the total weight of the raw materials is added, stirred evenly to obtain slurry; the slurry is coated on a molding device and solidified at a temperature of 80-300°C to form a slurry.

[0099] Exemplarily, patterns may also be printed on the flexible decorative surface layer.

[0100] Exemplarily, after the pattern is printed on the flexible decorative surface layer, a layer of finishing layer is sprayed on top of the pattern by passing through an atomizing device.

[0101] The self-luminous display sheet of this embodiment can be used on various components, including building interior walls, building exterior walls, floors, ceilings, desktops, cabinets, electronic parts housings, mechanical parts housings, automobile outer shells, and automobile interior decoration parts.

[0102] Comparative Example 1

[0103] The difference from Example 1 is that a GaN perovskite thin film display layer is used to replace the metal halide perovskite thin film display layer.

[0104] Performance Test:

[0105] (I) Color gamut detection

[0106] Color gamut is an important yardstick for judging the color display range of a device. The ITU-R BT.709 color gamut of Example 1, Example 2 and Comparative Example 1 was tested. The results are shown in the attached figure. Figure 3 shown.

[0107] In the attached Figure 3In the figure, the outermost conformal curve is the spectrum curve, which contains all the colors in nature. Triangle ① is the color gamut of Example 1, triangle ② is the color gamut of Example 2, and triangle ③ is the color gamut of Example 1.

[0108] By the attached Figure 3 It can be seen that the color gamut of the sample in Example 1 is the widest, the color gamut of the sample in Example 2 is second, and the color gamut of the sample in Comparative Example 1 is obviously narrower than that of Example 1 and Example 2. Figure 3 The color gamut diagram shows that the self-luminous display sheet of the present invention has the same display function as the existing display, and adopts the modified inorganic powder composite solidified molding layer as the base layer of the flexible decorative panel, and cooperates with the light-emitting device containing the perovskite thin film display layer. The modified inorganic powder composite solidified molding layer can be used as the basis of the flexible decorative panel, giving the flexible decorative panel the function of displaying pictures and videos according to the instructions of the control background.

[0109] (II) Contrast detection

[0110] Contrast is another important performance indicator of display devices, which reflects the grayscale contrast between the bright and dark parts in the same frame of image. The samples of Example 1, Example 2 and Comparative Example 1 were powered on and connected to the control system to display the screen. First, a full white screen was displayed and the brightness value was measured. Then, a full black screen was displayed and the brightness value was measured. Then, the brightness value of the full white screen was compared with the brightness value of the full black screen to obtain the contrast. The results are shown in Table 1 below:

[0111] Table 1 Contrast test results

[0112] sample Example 1 Example 2 Comparative Example 1 Contrast 134 128 97

[0113] As can be seen from Table 1, the contrast ratios of Examples 1 and 2 are significantly better than that of Comparative Example 1. The contrast ratio of the self-luminous display sheet of the present invention reaches the contrast ratio level of ordinary displays, and can display vivid and rich color patterns to meet the display requirements in decorative scenes.

[0114] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0115] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present invention. A person skilled in the art may change, modify, replace and vary the above embodiments within the scope of the present invention.

Claims

1. A new photoelectric display method, characterized in that: A self-luminous display sheet is laid on the loadable body. The self-luminous display sheet is a flexible sheet, which includes a flexible decorative surface layer, a display material layer and a flexible base layer from the outside to the inside. The display material layer uses a perovskite film, a single crystal silicon film or a polycrystalline silicon film as a display layer.

2. The novel optoelectronic display method according to claim 1 is characterized in that: The self-luminous display sheet comprises: A flexible base layer; ITO thin film layer: arranged on the flexible substrate layer; Display material layer: including a hole transport layer, a perovskite thin film display layer, and an electron transport layer, wherein the display material layer is disposed on the ITO thin film layer, the hole transport layer is provided with a P electrode, and the electron transport layer is provided with an N electrode; Flexible decorative surface; The flexible decorative surface layer and the flexible base layer are both low-temperature curing molding layers.

3. The novel optoelectronic display method according to claim 1 is characterized in that: The ITO thin film layer is a Ti-doped ITO thin film layer, the hole transport layer is a CuSCN thin film layer, and the electron transport layer is an IGZO thin film layer; the hole transport layer of the display material layer is fixed on the ITO thin film layer; or, the electron transport layer of the display material layer is fixed on the ITO thin film layer.

4. The novel optoelectronic display method according to claim 1 is characterized in that: The perovskite thin film display layer is a metal halide perovskite thin film layer.

5. The novel optoelectronic display method according to claim 2 is characterized in that: The low-temperature solidification molding layer is an inorganic powder composite solidification molding layer, and the inorganic powder composite solidification molding layer is formed by adding inorganic powder to a high molecular polymer and solidifying at a temperature of 80 to 300°C.

6. The novel optoelectronic display method according to claim 1, characterized in that: The method for preparing the self-luminous display sheet comprises the following steps: Prepare low-temperature curing molding slurry: take 100 parts of inorganic powder, add 10-30 parts of acrylic polymer emulsion and / or redispersible latex powder, and then add water to mix; Preparation of a flexible base layer: coating a low-temperature curing molding slurry on a molding carrier, and curing the slurry at a temperature of 80 to 300° C. to obtain a flexible base layer; Preparing an ITO thin film layer: forming the ITO thin film layer on the flexible substrate layer; The display material layer is formed on the ITO thin film layer: the hole transport layer, the perovskite thin film display layer, and the electron transport layer are sequentially formed on the ITO thin film layer; or, the electron transport layer, the perovskite thin film display layer, and the hole transport layer are sequentially formed on the ITO thin film layer, and a P electrode is provided on the hole transport layer and an N electrode is provided on the electron transport layer.

7. The novel optoelectronic display method according to claim 6, characterized in that: The method for forming the ITO thin film layer on the flexible substrate layer is: In the magnetron sputtering equipment, ITO target is installed at target position A, and Ti target is installed at target position B; Then, the device is evacuated and argon gas is introduced. The gas pressure in the sputtering chamber of the magnetron sputtering device is adjusted. The sputtering power, time and temperature are set. The ITO target and the Ti target are sputtered simultaneously to obtain a Ti-doped ITO film on the flexible substrate layer.

8. The novel optoelectronic display method according to claim 6, characterized in that: The method for forming the display material layer on the ITO thin film layer adopts the following method 1 or method 2: Method 1: forming the hole transport layer, the perovskite thin film display layer, and the electron transport layer on the flexible substrate layer in sequence: A CuSCN precursor solution is prepared, and then the CuSCN precursor solution is filtered, the flexible substrate layer with the ITO thin film layer is preheated, and then the atomized CuSCN glue is evenly sprayed on the ITO thin film layer, and the flexible substrate layer is driven to rotate to form a CuSCN thin film, and then heated and sputtered P electrode; The PbI2 powder is dissolved in a mixed solvent of DMF and DMSO to prepare a PbI2 solution, and then the PbI2 solution is spin-coated onto the CuSCN film, and after drying, a PbI2 film is formed; and then the film is immersed in a precursor solution formed by dissolving the prepared FAI and MAI in IPA to form a metal halide perovskite film display layer; An IGZO thin film layer is formed on the metal halide perovskite thin film display layer by magnetron sputtering, and then an N electrode is sputtered; Method 2: forming the electron transport layer, the perovskite thin film display layer, and the hole transport layer on the flexible substrate layer in sequence: Preheating the flexible substrate layer with the ITO thin film layer, forming an IGZO thin film layer by magnetron sputtering, and then sputtering an N electrode; The PbI2 powder is dissolved in a mixed solvent of DMF and DMSO to prepare a PbI2 solution, and then the PbI2 solution is spin-coated onto the IGZO thin film layer, and after drying, a PbI2 thin film is formed; and then the PbI2 thin film is immersed in a precursor solution formed by dissolving the prepared FAI and MAI in IPA to form a metal halide perovskite thin film display layer; A CuSCN precursor solution is prepared, and then the CuSCN precursor solution is filtered, and then the atomized CuSCN glue is evenly sprayed on the metal halide perovskite thin film display layer, and the flexible substrate layer is driven to rotate to form a CuSCN thin film, and then heated and sputtered P electrode.

9. The novel optoelectronic display method according to claim 1 is characterized in that: The surface of the flexible decorative surface layer is printed or sprayed with patterns.

10. A component using the novel optoelectronic display method according to any one of claims 1 to 9, characterized in that: The component includes a load-bearing body, the surface of which is paved with the self-luminous display sheet. The load-bearing body includes building interior walls, building exterior walls, floors, ceilings, desktops, cabinet surfaces, electronic parts housings, mechanical parts housings, automobile outer shells, automobile interior accessories, and outdoor billboards.