A semiconductor cleaning tank leakage detection device

Abstract

The present invention relates to the technical field of water leakage detection, and specifically to a water leakage detection device for a semiconductor cleaning tank; the device comprises a detection tank and a liquid inlet pipe and a liquid outlet pipe connected to the outer wall of the detection tank; the liquid inlet pipe is arranged away from the bottom wall of the detection tank; the liquid outlet pipe is arranged close to the bottom wall of the detection tank; the specification of the detection tank is larger than the cleaning tank body; the detection liquid is filled in the detection tank; a detection plate is arranged just above the center of the detection tank; the shape and specification of the detection plate are adapted to the cross-section of the inner wall of the cleaning tank body; the present invention moves the detection plate downward into the inner side of the cleaning tank body, thereby increasing the gas pressure inside the cleaning tank body, and observes the generation of detection liquid bubbles around the cleaning tank body, thereby quickly completing the water leakage detection of the semiconductor cleaning tank. Compared with the existing detection method of loading the cleaning tank body with detection liquid, the detection method of the present invention is more convenient and quick.

Description

Technical Field

[0001] The invention relates to the technical field of water leakage detection, in particular to a water leakage detection device for a semiconductor cleaning tank. Background Art

[0002] As a vital equipment in the semiconductor production line, the semiconductor cleaning tank has the main responsibility of performing delicate cleaning on the wafers during the complex wafer processing process to remove tiny impurities and residues generated in key steps such as lithography, etching, and ion implantation. These cleaning processes usually involve a variety of chemical reagents, including acid, alkaline solutions, and organic solvents, which are particularly effective in removing specific types of contaminants. During the cleaning process, it is crucial to maintain the sealing of the cleaning tank, because this is not only to prevent these toxic or corrosive chemical solvents from leaking into the production environment and avoiding potential health risks to operators, but also to prevent chemicals from polluting the surrounding environment and ensure compliance with strict environmental protection standards.

[0003] Therefore, after the semiconductor cleaning tank is processed, it is necessary to conduct a leakage test on the semiconductor cleaning tank to ensure that the sealing of the semiconductor cleaning tank is guaranteed before use. The specific detection steps are: after placing the semiconductor cleaning tank on the detection rack, inject liquid into the semiconductor cleaning tank, and after the liquid level approaches the upper port of the semiconductor cleaning tank, observe the leakage of the outside of the semiconductor cleaning tank. When there is no leakage on the outside of the semiconductor cleaning tank for a period of time, it means that the leakage test is qualified. Workers also need to pour out the liquid in the semiconductor cleaning tank. It is not difficult to find that the existing semiconductor cleaning tank leakage detection process involves the steps of injecting and pouring out the detection liquid, which makes the detection inconvenient and affects the detection efficiency. Summary of the invention

[0004] In order to make up for the shortcomings of the prior art, the present invention proposes a semiconductor cleaning tank leakage detection device. The present invention moves the detection plate downward into the inside of the cleaning tank body to increase the gas pressure inside the cleaning tank body, and observes the generation of detection liquid bubbles around the cleaning tank body, thereby quickly completing the semiconductor cleaning tank leakage detection. Compared with the existing detection method of loading the cleaning tank body with detection liquid, the detection method of the present invention is more convenient and quicker.

[0005] The technical solution adopted by the present invention to solve its technical problems is: a semiconductor cleaning tank water leakage detection device described in the present invention includes a detection pool and a liquid inlet pipe and a liquid outlet pipe connected to the outer wall of the detection pool; the liquid inlet pipe is arranged away from the bottom wall of the detection pool; the liquid outlet pipe is arranged close to the bottom wall of the detection pool; the specifications of the detection pool are larger than the cleaning tank body; the detection pool is filled with detection liquid; a detection plate is arranged directly above the center of the detection pool; the shape and specifications of the detection plate are adapted to the cross-section of the inner wall of the cleaning tank body; the detection plate is movably sealed with the inner wall of the cleaning tank body; an electric push rod is fixedly connected above the detection plate; the electric push rod is fixedly connected to the rear side of the detection pool through an L-shaped frame; the electric push rod can drive the detection plate into the inner side of the cleaning tank body.

[0006] Preferably, four guide plates are fixedly connected to the lower surface of the detection plate; the upper end of the guide plate is close to the corresponding edge of the detection plate; the lower end of the guide plate is inclined toward the center position below the detection plate; the width of the guide plate in the lateral direction is greater than the width of the guide plate in the front-to-back direction; and the guide plate is elastic.

[0007] Preferably, a storage groove is provided through the upper and lower parts of the detection plate; a collection bag is fixedly connected to the storage groove; and the collection bag is made of a flexible material.

[0008] Preferably, the upper port of the detection pool is fixedly connected to the span bar; the length direction of the span bar is consistent with the front-to-back direction of the detection pool; the two span bars are parallel to each other; the distance between the two span bars is the same as the width of the detection plate; and the detection plate is located between the two span bars after moving downward.

[0009] Preferably, the outer wall of the span bar is fixedly connected to the partition bar; the partition bars on the two span bars are distributed in an inverted figure eight shape; and the cleaning tank body moves away from the test piece under the guidance of the partition bars as the level of the detection liquid rises.

[0010] Preferably, the bottom wall of the detection pool is fixedly connected to the detection seat; the detection seat is located directly below the detection plate; the upper surface of the detection seat is fixedly connected to the support groove; the support groove is slidably connected to a support block; the lower end of the support block is connected to the wall of the support groove by a spring; the upper end surface of the support block is flush with the liquid level in the detection pool; the upper end of the support block can support the downward-moving part to be tested.

[0011] Preferably, the cross-section of the detection seat is larger than the cross-section of the detection plate; a reinforcement groove is provided on the upper surface of the detection seat; the reinforcement strip is connected to the reinforcement groove in a sliding seal; the support block and the support groove are connected in a sliding seal; the bottom of the support groove and the bottom of the reinforcement groove are connected through an air hole; and the reinforcement strip can contact the outer wall of the test piece after moving upward.

[0012] Preferably, the upper end of the reinforcing strip is fixedly connected to the oblique strip; the oblique strip is arranged obliquely; and the upper end of the oblique strip is arranged away from the center of the detection seat.

[0013] The beneficial effects of the present invention are as follows:

[0014] 1. The present invention moves the detection plate downward into the inner side of the cleaning tank body, thereby increasing the gas pressure inside the cleaning tank body, and observes the generation of detection liquid bubbles around the cleaning tank body, thereby quickly completing the water leakage detection of the semiconductor cleaning tank. Compared with the existing detection method of loading the cleaning tank body with detection liquid, the detection method of the present invention is more convenient and faster.

[0015] 2. The present invention uses the guidance of the guide plate to allow the cleaning tank body to automatically move to the bottom of the detection plate without the control of workers, thereby preparing for the detection plate to enter the inside of the cleaning tank body, thereby improving the convenience of water leakage detection in the semiconductor cleaning tank.

[0016] 3. In the present invention, the cleaning tank body close to the piece to be tested moves upward and contacts with the partition bar as the detection liquid moves upward. The partition bar guides the upper end of the cleaning tank body on both sides of the piece to be tested, so that the cleaning tank body is away from the piece to be tested under the guidance of the partition bar. After the other cleaning tank bodies are away from the piece to be tested, an observation space is formed with the piece to be tested, which makes it convenient for the detection personnel to observe the bubble generation in the liquid around the piece to be tested, thereby improving the accuracy of water leakage detection.

[0017] 4. In the present invention, after the plurality of reinforcing strips move to the outer wall of the cleaning tank body and contact the outer wall of the cleaning tank body, the reinforcing strips limit and support the circumferential outer wall of the cleaning tank body to be tested, thereby reinforcing the circumferential outer wall of the cleaning tank body to be tested. In this way, when the air pressure inside the cleaning tank body increases, the circumferential outer wall of the cleaning tank body is not easily deformed, thereby ensuring the sealing effect between the inner wall of the cleaning tank body and the detection plate, thereby further improving the accuracy of water leakage detection in the semiconductor cleaning tank. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The present invention is further described below in conjunction with the accompanying drawings and implementation modes.

[0019] Figure 1 It is a schematic diagram of the semiconductor cleaning tank for detecting the present invention;

[0020] Figure 2 yes Figure 1 The enlarged view of point A in the middle;

[0021] Figure 3 is a stereogram of the present invention;

[0022] Figure 4 is a cross-sectional view of the present invention in the front direction;

[0023] Figure 5 yes Figure 4 The enlarged view of point B in the middle;

[0024] Figure 6 yes Figure 4 Enlarged view of point C in the middle;

[0025] Figure 7 is a cross-sectional view of the present invention in the lateral direction;

[0026] Figure 8 It is a three-dimensional diagram of the detection seat of the present invention;

[0027] Fig. 9 It is a position diagram of the guide plate of the present invention.

[0028] In the figure: detection pool 1, liquid inlet pipe 11, liquid outlet pipe 12, detection liquid 13, cleaning tank body 2, detection plate 3, electric push rod 31, L-shaped frame 32, guide plate 33, storage tank 34, collecting bag 35, cross bar 4, spacer bar 41, detection seat 5, support groove 51, support block 52, spring 53, reinforcement groove 54, reinforcement bar 55, air hole 56, oblique bar 57. DETAILED DESCRIPTION

[0029] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further explained below in conjunction with specific implementation methods.

[0030] like Figures 1 to 9 As shown, the present invention includes the following embodiments:

[0031] Embodiment 1: A semiconductor cleaning tank leakage detection device comprises a detection tank 1 and a liquid inlet pipe 11 and a liquid outlet pipe 12 connected on the outer wall of the detection tank 1; the liquid inlet pipe 11 is arranged away from the bottom wall of the detection tank 1; the liquid outlet pipe 12 is arranged close to the bottom wall of the detection tank 1; the specification of the detection tank 1 is larger than the cleaning tank body 2; the detection tank 1 is filled with a detection liquid 13; a detection plate 3 is provided at the position directly above the center of the detection tank 1; the shape and specification of the detection plate 3 are adapted to the cross-section of the inner wall of the cleaning tank body 2; the detection plate 3 is movably sealed with the inner wall of the cleaning tank body 2; an electric push rod 31 is fixedly connected above the detection plate 3; the electric push rod 31 is fixedly connected to the rear side of the detection tank 1 through an L-shaped frame 32; the electric push rod 31 can drive the detection plate 3 to enter the inner side of the cleaning tank body 2.

[0032] The staff forms the cleaning tank body 2 after punching, bending and welding the sheet material. The cleaning tank body 2, as a box-shaped container, needs to be tested for water leakage. Specifically, the processed cleaning tank body 2 is moved to one side of the detection tank 1, and then the detection liquid 13 is injected into the detection tank 1 along the liquid inlet pipe 11 while the liquid outlet pipe 12 is closed. Then, multiple cleaning tank bodies 2 are placed as much as possible inside the detection tank 1, and then the detection liquid 13 is continuously injected into the detection tank 1. The upper port of the cleaning tank body 2 rises as the liquid level in the detection tank 1 rises until the upper port of the detection tank moves up to the limit position without exceeding the upper port of the detection tank 1, and then the detection liquid 13 of the liquid inlet pipe 11 is stopped from entering. The detection liquid 13 can be a liquid such as hydraulic oil or water, and the cleaning tank body 2 can float on the liquid surface in the detection tank 1.

[0033] As the staff pushes, the cleaning tank body 2 will move toward the bottom of the detection plate 3. After the cleaning tank body 2 moves to the bottom of the detection plate 3, the electric push rod 31 will extend. During the extension of the electric push rod 31, the detection plate 3 will be driven to move downward. During the downward movement of the detection plate 3, it will approach the cleaning tank body 2 to be detected. The detection plate 3 will enter the inner side of the cleaning tank body 2 along the upper port of the cleaning tank body 2. As the detection plate 3 continues to move downward, the detection plate 3 will push the gas inside the cleaning tank body 2 inside the cleaning tank body 2, so that the cleaning tank The main body 2 moves downward after the detection plate 3 moves downward. The cleaning tank main body 2 will gradually sink into the liquid surface during the downward movement. When the upper port of the cleaning tank main body 2 is not lower than the liquid surface of the detection liquid 13, the cleaning tank main body 2 is controlled to move downward to the limit position. The buoyancy of the cleaning tank main body 2 will increase during the downward movement of the cleaning tank main body 2. In order to make the cleaning tank main body 2 overcome the buoyancy and move downward, the detection plate 3 will move close to the inner bottom wall of the cleaning tank main body 2. The detection plate 3 and the inner wall of the cleaning tank main body 2 are movably sealed and cooperated, so that the gas in the cleaning tank main body 2 is further compressed.

[0034] The gas pressure inside the cleaning tank body 2 is increased, so that the cleaning tank body 2 is immersed in the detection liquid 13 as much as possible. After the cleaning tank body 2 removes the part of the upper port and the other parts fall into the detection liquid 13, the extension of the electric push rod 31 is stopped, and then the detection liquid 13 around the outside of the cleaning tank body 2 is observed. If the cleaning tank body 2 leaks, the gas inside the cleaning tank body 2 will flow out to the outside of the cleaning tank body 2 along the leakage point, and the gas inside the cleaning tank body 2 passes through the leakage point into the detection liquid 13 to form bubbles. In this way, when the staff observes the appearance of bubbles in the detection liquid 13 outside the cleaning tank body 2, it means that the leakage detection of the cleaning tank body 2 is unqualified;

[0035] As the gas inside the cleaning tank body 2 leaks, the cleaning tank body 2 will start to move up. In this way, the staff can determine whether the semiconductor cleaning tank water leakage test is qualified by judging whether the cleaning tank body 2 generates bubbles or moves up. After completing the water leakage detection and judgment of the cleaning tank body 2, the electric push rod 31 is controlled to shorten, and the electric push rod 31 will drive the detection plate 3 to move up. During the upward movement of the detection plate 3, the cleaning tank body 2 will be driven to move up. After moving up, the cleaning tank body 2 floats on the surface of the detection liquid 13. As the detection plate 3 continues to move up, under the action of the gravity of the cleaning tank body 2 itself, the detection plate 3 moves up smoothly and separates from the cleaning tank body 2, completing the water leakage detection of the current cleaning tank body 2. Subsequently, after the cleaning tank body 2 that has been tested is removed, the next cleaning tank body 2 to be tested is moved to just below the detection plate 3, and the detection plate 3 is controlled to move down again, and this process is repeated.

[0036] The present invention moves the detection plate 3 downward into the inner side of the cleaning tank body 2 to increase the gas pressure inside the cleaning tank body 2, and observes the bubble generation of the detection liquid 13 around the cleaning tank body 2, thereby quickly completing the water leakage detection of the semiconductor cleaning tank. Compared with the existing detection method of loading the detection liquid 13 into the cleaning tank body 2, the detection method of the present invention is more convenient and faster.

[0037] Embodiment 2: Four guide plates 33 are fixedly connected to the lower surface of the detection plate 3; the upper end of the guide plate 33 is close to the corresponding edge of the detection plate 3; the lower end of the guide plate 33 is inclined toward the center position below the detection plate 3; the width of the guide plate 33 in the lateral direction is greater than the width of the guide plate 33 in the front-to-back direction; the guide plate 33 is elastic.

[0038] After the cleaning tank body 2 moves along the liquid level of the detection liquid 13 in the detection pool 1, the cleaning tank body 2 moves to the position directly below the detection plate 3, and then the cleaning tank body 2 is released, and the electric push rod 31 is controlled to drive the detection plate 3 to move downward. The lower surface of the detection plate 3 is fixedly connected to the guide plates 33 in four directions. The four guide plates 33 move downward as the detection plate 3 moves downward, and the lower ends of the four guide plates 33 are all facing the center of the lower surface of the detection plate 3. As the detection plate 3 moves downward, the lower ends of the four guide plates 33 will enter the inner side of the cleaning tank body 2 to be tested, and the cleaning tank body 2 to be tested deviates from the position directly below the detection plate 3 as the liquid level of the detection liquid 13 fluctuates, but as the guide plates 33 move ... As the plate 33 moves downward, the guide plate 33 will contact the upper end of the cleaning tank body 2, and the guide plate 33 will squeeze the upper end of the cleaning tank body 2, so that the cleaning tank body 2 floats under the detection plate 3 toward the bottom of the detection plate 3. As the guide plate 33 moves downward more, the cleaning tank body 2 will be located directly under the detection plate 3, so that the detection plate 3 can smoothly enter the inner side of the cleaning tank body 2. In this embodiment, the cleaning tank body 2 is guided by the guide plate 33 to automatically move to the bottom of the detection plate 3 without the control of the worker, thereby preparing for the detection plate 3 to enter the inner side of the cleaning tank body 2, thereby improving the convenience of water leakage detection in the semiconductor cleaning tank.

[0039] Embodiment 3: The detection plate 3 is provided with a storage groove 34 running through the upper and lower parts; a collection bag 35 is fixedly connected in the storage groove 34; the collection bag 35 is made of a flexible material.

[0040] The collecting bag 35 in the initial state has a certain gravity, so that the collecting bag 35 droops downward in the storage tank 34. As the detection plate 3 moves downward, the detection plate 3 will enter the inner side of the cleaning tank body 2 along the upper port of the cleaning tank body 2. The edge of the detection plate 3 and the inner wall of the cleaning tank body 2 are movably sealed. As the detection plate 3 continues to move downward, the gas in the cleaning tank body 2 will enter the storage tank 34 along the lower port of the storage tank 34. The gas in the storage tank 34 will cause the collecting bag 35 in the storage tank 34 to bulge upward. After the collecting bag 35 bulges upward, since the collecting bag 35 is made of flexible material, the flexible bag The detection plate 3 can no longer swell further. After the gas inside the cleaning tank body 2 enters the inside of the collecting bag 35 along the lower port of the storage tank 34, the detection plate 3 can further enter the inside of the cleaning tank body 2. As the detection plate 3 moves downward again, the cleaning tank body 2 will move downward smoothly with the downward movement of the detection plate 3. Compared with the original detection plate 3 being located at the inside of the cleaning tank body 2 near the notch, the stability of the cleaning tank body 2 as the detection plate 3 moves downward is improved, avoiding the situation where the detection plate 3 enters the inside of the cleaning tank body 2 too shallowly, causing the detection plate 3 to be separated from the inside of the cleaning tank body 2, so that the water leakage detection of the semiconductor cleaning tank can be carried out smoothly.

[0041] When the detection plate 3 moves upward and away from the cleaning tank body 2, the space of the cleaning tank body 2 below the detection plate 3 expands to generate negative pressure, so that the gas in the collection bag 35 flows back to the inside of the cleaning tank body 2 along the storage tank 34, and the collection bag 35 bulges downward in the storage tank 34, and then the detection plate 3 moves upward and away from the cleaning tank body 2;

[0042] After the collecting bag 35 in this embodiment bulges upward, it can provide a prompt to the inspector, so as to judge the sealing effect between the inspection plate 3 and the inner wall of the cleaning tank body 2 to be inspected.

[0043] Embodiment 4: The upper port of the detection pool 1 is fixedly connected to the span bar 4; the length direction of the span bar 4 is consistent with the front-to-back direction of the detection pool 1; the two span bars 4 are parallel to each other; the distance between the two span bars 4 is the same as the width of the detection plate 3; the detection plate 3 is located between the two span bars 4 after moving downward.

[0044] In this embodiment, the outer wall of the span bar 4 is fixedly connected to the spacer bar 41; the spacer bars 41 on the two span bars 4 are distributed in an inverted figure eight shape; as the level of the detection liquid 13 rises, the cleaning tank body 2 is guided by the spacer bars 41 away from the test piece.

[0045] As the electric push rod 31 extends and moves downward, the detection plate 3 that moves downward will enter between the two cross bars 4. As the detection plate 3 continues to move downward, the detection plate 3 will enter the inner side of the cleaning tank body 2 to be tested. As the detection plate 3 continues to move downward, the cleaning tank body 2 to be tested will move downward as the detection plate 3 moves downward. In the process that the cleaning tank body 2 to be tested approaches the inner bottom wall of the detection pool 1, the cleaning tank body 2 to be tested will enter the detection liquid 13, so that the liquid level of the detection liquid 13 in the detection pool 1 will rise. In the process that the liquid level of the detection liquid 13 rises, other cleaning tank bodies 2 will be driven to move upward. The cleaning tank body 2 close to the workpiece to be tested moves upward and contacts with the partition bar 41 as the detection liquid 13 moves upward. The partition bar 41 guides the upper end of the cleaning tank body 2 on both sides of the workpiece to be tested, so that the cleaning tank body 2 is guided away from the workpiece to be tested by the partition bar 41.

[0046] After the other cleaning tank bodies 2 are away from the workpiece to be tested, an observation space is formed with the workpiece to be tested, which makes it convenient for the test personnel to observe the bubble generation in the liquid around the workpiece to be tested, so that the accuracy of water leakage detection is improved; for the leaking cleaning tank body 2, the detection plate 3 will squeeze the gas in the cleaning tank body 2 to be tested along the leakage point to form bubbles. After the detection is completed, the detection plate 3 will move up. The moved up detection plate 3 will drive the cleaning tank body 2 to be tested to move up under the action of negative pressure. After the cleaning tank body 2 moves up, it is blocked and limited by the two cross bars 4, so that the cleaning tank body 2 to be tested cannot continue to move up. In this way, the detection plate 3 can better move out of the leaking cleaning tank body 2 to be tested, so that the water leakage detection of the semiconductor cleaning tank is smoother.

[0047] Embodiment 5: The inner bottom wall of the detection pool 1 is fixedly connected to the detection seat 5; the detection seat 5 is located directly below the detection plate 3; the upper surface of the detection seat 5 is fixedly connected to the support groove 51; the support groove 51 is slidably connected to the support block 52; the lower end of the support block 52 is connected to the groove wall of the support groove 51 by a spring 53; the upper end surface of the support block 52 is flush with the liquid level in the detection pool 1; the upper end of the support block 52 can support the downward moving part to be tested.

[0048] In this embodiment, the cross-section of the detection seat 5 is larger than the cross-section of the detection plate 3; a reinforcement groove 54 is provided on the upper surface of the detection seat 5; a reinforcement strip 55 is slidingly and sealedly connected inside the reinforcement groove 54; the support block 52 is slidingly and sealedly connected to the support groove 51; the bottom of the support groove 51 and the bottom of the reinforcement groove 54 are connected through an air hole 56; the reinforcement strip 55 can contact the lateral outer wall of the test piece after moving upward.

[0049] In this embodiment, the upper end of the reinforcing strip 55 is fixedly connected to the oblique strip 57 ; the oblique strip 57 is arranged obliquely; and the upper end of the oblique strip 57 is arranged away from the center of the detection seat 5 .

[0050] When the cleaning tank body 2 moves along the liquid level of the detection liquid 13 in the detection tank 1, the lower end of the cleaning tank body 2 is higher than the upper end of the support block 52. Therefore, the cleaning tank body 2 will not interfere with the upper end of the support block 52 during the movement of the cleaning tank body 2 along the liquid level of the detection liquid 13 in the detection tank 1. In this way, the cleaning tank body 2 can smoothly float to the bottom of the detection plate 3. Then the control system will control the detection plate 3 to move downward. After the detection plate 3 moves downward, it can push the cleaning tank body 2 to be tested to move downward and contact the upper end surface of the support block 52. The cleaning tank body 2 to be tested is in an upright state under the support of the upper end surface of the support block 52. In this way, the detection plate 3 can more smoothly enter the inner side of the cleaning tank body 2 along the upper port of the cleaning tank body 2.

[0051] As the detection plate 3 continues to move downward, the detection plate 3 will drive the cleaning tank body 2 to approach the inner bottom wall of the detection pool 1, and the spring 53 will transmit the elastic force to the support block 52. The upper end of the support block 52 provides support for the cleaning tank body 2 to be tested, so that the detection plate 3 needs to overcome more resistance to push the cleaning tank body 2 to be tested downward. In this way, the detection plate 3 will be closer to the inner bottom wall of the cleaning tank body 2 to be tested, so that the gas pressure inside the cleaning tank body 2 to be tested is further increased. After the pressure inside the cleaning tank body 2 to be tested is further increased, the test precision and accuracy of the cleaning tank body 2 are improved. It can be understood that there is no leakage in the cleaning tank body 2 under a larger air pressure, indicating that the anti-leakage performance of the cleaning tank body 2 is excellent;

[0052] As the cleaning tank body 2 to be tested moves downward, the cleaning tank body 2 to be tested will push the support block 52 to move downward. During the downward movement of the support block 52, the spring 53 will be squeezed. During the downward movement of the support block 52, the liquid medium in the support groove 51 will enter the reinforcing groove 54 along the air hole 56, thereby pushing the reinforcing bar 55 in the reinforcing groove 54 to move upward. During the upward movement of the reinforcing bar 55, the inclined bar 57 will be driven to move upward. The upper end of the inclined bar 57 is away from the center of the detection seat 5. Therefore, the inclined bar 57 can play a guiding role during the upward movement. Under the guidance of the inclined bar 57, the reinforcing bar 55 moves upward and contacts the outer wall of the cleaning tank body 2 to be tested. On the one hand, the reinforcing bar 55 and the inclined bar 57 play a role in cleaning The position of the washing tank body 2 is adjusted in the horizontal direction. On the other hand, the reinforcing strips 55 can support the outer wall of the washing tank body 2. There are multiple reinforcing strips 55. After the multiple reinforcing strips 55 move to the outer wall of the washing tank body 2 and contact the outer wall of the washing tank body 2, the reinforcing strips 55 limit and support the circumferential outer wall of the washing tank body 2 to be tested, and play a role in reinforcing the circumferential outer wall of the washing tank body 2 to be tested. In this way, when the air pressure inside the washing tank body 2 increases, the circumferential outer wall of the washing tank body 2 is not easy to deform, thereby ensuring the sealing effect of the inner wall of the washing tank body 2 and the detection plate 3, so that the accuracy of water leakage detection in the semiconductor washing tank is further improved.

[0053] Embodiment 6: The height of the upper surface of the detection plate 3 is set to decrease as it moves away from the electric push rod 31; droplets are not likely to remain on the upper surface of the detection plate 3.

[0054] In the description of the present invention, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate directions or positional relationships based on the attached Figure 1 The orientation or positional relationship shown is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation. Therefore, it cannot be understood as limiting the scope of protection of the present invention. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0055] The above shows and describes the basic principles, main features and advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. A semiconductor cleaning tank leakage detection device, comprising a detection tank and a liquid inlet pipe and a liquid outlet pipe connected to the outer wall of the detection tank; the liquid inlet pipe is arranged away from the bottom wall of the detection tank; the liquid outlet pipe is arranged close to the bottom wall of the detection tank; the specification of the detection tank is larger than the cleaning tank body; the detection tank is filled with detection liquid; characterized in that: A detection plate is provided at the center of the detection pool; the shape and specification of the detection plate are adapted to the cross-section of the inner wall of the cleaning tank body; the detection plate is movably sealed with the inner wall of the cleaning tank body; an electric push rod is fixedly connected to the top of the detection plate; the electric push rod is fixedly connected to the rear side of the detection pool through an L-shaped frame; the electric push rod can drive the detection plate into the inner side of the cleaning tank body; Four guide plates are fixedly connected to the lower surface of the detection plate; the upper end of the guide plate is close to the corresponding edge of the detection plate; the lower end of the guide plate is inclined toward the center position below the detection plate; the width of the guide plate in the lateral direction is greater than the width of the guide plate in the front-back direction; the guide plate is elastic; The detection plate is provided with a storage groove running through the upper and lower parts; a collection bag is fixedly connected in the storage groove; the collection bag is made of a flexible material; The inner bottom wall of the detection pool is fixedly connected to the detection seat; the upper surface of the detection seat is fixedly connected to the support groove; a reinforcement groove is provided on the upper surface of the detection seat; the reinforcement strip is connected to the reinforcement groove with a sliding seal; the support block and the support groove are connected with a sliding seal; the lower end of the support block is connected to the wall of the support groove by a spring; the bottom of the support groove and the bottom of the reinforcement groove are connected by an air hole, and the upper end of the reinforcement strip is fixedly connected to the oblique strip.

2. A semiconductor cleaning tank water leakage detection device according to claim 1, characterized in that: The upper port of the detection pool is fixedly connected to the span bar; the length direction of the span bar is consistent with the front-to-back direction of the detection pool; the two span bars are parallel to each other; the distance between the two span bars is the same as the width of the detection plate; the detection plate is located between the two span bars after moving down.

3. A semiconductor cleaning tank water leakage detection device according to claim 2, characterized in that: The outer wall of the span bar is fixedly connected to the partition bar; the partition bars on the two span bars are distributed in an inverted eight-shaped shape; and the cleaning tank body moves away from the test piece under the guidance of the partition bar as the level of the test liquid rises.

4. A semiconductor cleaning tank water leakage detection device according to claim 1, characterized in that: The detection seat is located directly below the detection plate; the support block is slidably connected in the support groove; the lower end of the support block is connected to the wall of the support groove through a spring; the upper end surface of the support block is flush with the liquid level in the detection pool; the upper end of the support block can support the downward moving part to be tested.

5. A semiconductor cleaning tank water leakage detection device according to claim 4, characterized in that: The cross section of the detection seat is larger than the cross section of the detection plate; and the reinforcing strip can contact the outer wall of the to-be-tested object after moving upward.

6. A semiconductor cleaning tank water leakage detection device according to claim 5, characterized in that: The inclined strip is arranged obliquely; and the upper end of the inclined strip is arranged away from the center of the detection seat.

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