An optical lens for lithography projection and a lithography projection device having the same

Abstract

The application discloses an optical lens for photolithography projection and a photolithography projection device with the same. The lens has lenses with optical power, which are sequentially arranged from an object side to an image side as a first lens to a tenth lens. The object side optical axis positions of the first lens, the third lens, the fourth lens and the fifth lens are in convex structures, and the image side optical axis positions thereof are in concave structures. The second lens and the ninth lens are biconvex lenses. The object side optical axis positions of the sixth lens, the seventh lens, the eighth lens and the tenth lens are in concave structures, and the image side optical axis positions thereof are in convex structures. The thicknesses of the second lens and the fifth lens satisfy the expression: 2.75<Th2 / Th5<4.1, or 25mm<Th2-Th5<31mm. The thicknesses of the ninth lens and the sixth lens satisfy the expression: 2.75<Th9 / Th6<4.1, or 25mm<Th9-Th6<31mm. The above lens can achieve good photolithography effect.

Description

Technical Field

[0001] The present invention relates to the field of photolithography, and in particular to an optical lens for photolithography projection and a photolithography projection device having the same. Background Art

[0002] With the development of projection lithography, the performance of projection imaging optical systems has gradually improved, and projection imaging optical systems have become applicable to a variety of fields such as circuit manufacturing. Projection lithography can also be used in larger-area, higher-yield technologies such as semiconductors, solar cells, liquid crystal displays, and printed circuit boards.

[0003] However, existing technologies, such as U.S. Patent No. US6879383B2 (issued on April 12, 2005), use a refractive-reflective structure, resulting in large overall dimensions and stringent requirements for optical glass materials. In particular, the processing and inspection of large-aperture concave reflectors requires very strict technology. Consequently, these systems are inferior to fully refractive systems in terms of field of view, working distance, calibration requirements, and manufacturing costs.

[0004] Chinese patent number CN98113037.2 (publication date: July 23, 2003) is a double-Gaussian optical system with telecentric image plane. Because the patent uses two bonding surfaces, the lens adhesive will undergo significant deformation or even denaturation in high-yield projection lithography equipment, resulting in reduced optical imaging performance and shortened service life of the projection lens, which does not meet the requirements of lithography technology.

[0005] In the actual production process of many substrates, substrates manufactured by different equipment will have slight differences in pattern size and magnification. At the same time, during various physical and chemical processing, the substrate will slightly expand or contract, which will also cause changes in the substrate pattern size. The pattern size changes of different substrates are also different. Therefore, in the production process of many substrates, especially when multi-layer substrates require inter-layer positioning, in order to improve positioning accuracy and wiring density, it is necessary to adjust the projection magnification of the projection imaging optical system according to the actual substrate pattern size or magnification changes.

[0006] The disclosure of the above background technology content is only used to assist in understanding the inventive concept and technical solution of the present invention. It does not necessarily belong to the prior art of this patent application, nor does it necessarily provide technical guidance. In the absence of clear evidence that the above content has been disclosed before the filing date of this patent application, the above background technology should not be used to evaluate the novelty and creativity of this application. Summary of the Invention

[0007] The purpose of the present invention is to provide an optical lens which is economical, has good optical properties and a large field of view, and can provide a high imaging resolution for a projection lithography projection device.

[0008] In order to achieve the above object, the technical solution adopted by the present invention is as follows:

[0009] An optical lens for photolithographic projection, wherein the lens has ten lenses with optical power, which are arranged in order from the object side to the image side: a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, and a tenth lens, wherein:

[0010] The object-side optical axes of the first lens, the third lens, the fourth lens, and the fifth lens are convex, and the image-side optical axes are concave.

[0011] The object-side optical axis positions of the second lens and the ninth lens are convex, and the image-side optical axis positions are convex;

[0012] The object-side optical axes of the sixth lens, the seventh lens, the eighth lens, and the tenth lens are concave, and the image-side optical axes are convex.

[0013] The first lens and the second lens constitute a first lens group, which has positive optical power; the third lens constitutes a second lens group, which has positive optical power; the fourth lens and the fifth lens constitute a third lens group, which has negative optical power; the sixth lens and the seventh lens constitute a fourth lens group, which has negative optical power; the eighth lens constitutes a fifth lens group, which has positive optical power; the ninth lens and the tenth lens constitute a sixth lens group, which has positive optical power.

[0014] Furthermore, according to any one of the above technical solutions or a combination of multiple technical solutions, the focal length of the lens assembly satisfies the following expression:

[0015] 0.3 <F1 / L<0.6,0.3<F6 / L<0.6;比例值超过上限可能会引起共轭距离(物方到像方的距离)太长,光学镜头变长,导致设备臃肿庞大,比例值超过下限可能会导致像散像差变大,影响镜头的光学性能。

[0016] 0.15 <F2 / L<0.5,0.15<F5 / L<0.5;比例值超过上限可能会导致像散像差变大,破坏镜头多种像差的平衡关系,比例值超过下限可能会导致球差像差尤其是高级球差像差变大,影响镜头的光学性能。

[0017] 0.1<-F3 / L<0.7, 0.1<-F4 / L<0.7; a ratio value exceeding the upper limit may cause the spherical aberration and field curvature aberration to become larger; a ratio value exceeding the lower limit may cause the astigmatism aberration to become larger, resulting in a decrease in the optical performance of the lens.

[0018] Among them, F1 is the combined focal length of the first lens group, F2 is the focal length of the second lens group, F3 is the combined focal length of the third lens group, F4 is the combined focal length of the fourth lens group, F5 is the focal length of the fifth lens group, F6 is the combined focal length of the sixth lens group, and L is the distance between the object and image sides.

[0019] Furthermore, based on any one of the technical solutions or the combination of multiple technical solutions described above, the first lens has a negative optical power, which satisfies the following expression: 0.1<-f2 / f1<0.4, wherein f1 is the focal length of the first lens, and f2 is the focal length of the second lens; if the ratio value exceeds the upper limit, the astigmatism aberration may be increased; if the ratio value exceeds the lower limit, the astigmatism aberration may be insufficiently compensated and the field curvature may be increased, thereby affecting the optical performance of the lens.

[0020] The fourth lens has positive focal power, and the fifth lens has negative focal power, which satisfies the following expression: 0.2<-f5 / f4<0.8, where f4 is the focal length of the fourth lens, and f5 is the focal length of the fifth lens; if the ratio value exceeds the upper limit, the spherical aberration and the field curvature aberration may become larger; if the ratio value exceeds the lower limit, the spherical aberration and the field curvature aberration may be insufficiently compensated, resulting in a decrease in the optical performance of the lens.

[0021] The sixth lens has negative refractive power, and the seventh lens has positive refractive power, which satisfies the following expression: 0.2<-f6 / f7<0.8, where f6 is the focal length of the sixth lens, and f7 is the focal length of the seventh lens;

[0022] The tenth lens has negative optical power, which satisfies the following expression: 0.1<-f9 / f10<0.4, where f9 is the focal length of the ninth lens, and f10 is the focal length of the tenth lens.

[0023] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the first lens and the second lens satisfy the following expression: 0.05<|(r12-r21)| / (r12+r21)<0.8, where r12 is the radius of curvature of the image-side curved surface of the first lens, and r21 is the radius of curvature of the object-side curved surface of the second lens; if the ratio value exceeds the upper limit, astigmatism and chromatic aberration may become larger; if the ratio value exceeds the lower limit, astigmatism and chromatic aberration may be insufficiently compensated, thereby reducing the optical performance of the lens over a wide spectral range.

[0024] The fourth lens and the fifth lens satisfy the following expression: 0.0<|(r42-r51)| / (r42+r51)<0.5, where r42 is the curvature radius of the image-side curved surface of the fourth lens, and r51 is the curvature radius of the object-side curved surface of the fifth lens. If the ratio value exceeds the upper limit, spherical aberration, especially higher-order spherical aberration and chromatic aberration, may be increased; if the ratio value exceeds the lower limit, spherical aberration, especially higher-order spherical aberration and chromatic aberration, may be insufficiently compensated, thereby reducing the optical performance of the lens over a wide spectral range.

[0025] The sixth lens and the seventh lens satisfy the following expression: 0.0<|(r71-r62)| / |(r71+r62)|<0.5, where r71 is the curvature radius of the object-side curved surface of the seventh lens, and r62 is the curvature radius of the image-side curved surface of the sixth lens. A ratio value exceeding an upper limit may cause spherical aberration, especially higher-order spherical aberration and chromatic aberration, to increase; a ratio value exceeding a lower limit may cause insufficient compensation for spherical aberration, especially higher-order spherical aberration and chromatic aberration, thereby reducing the optical performance of the lens over a wide spectral range.

[0026] The ninth lens and the tenth lens satisfy the following expression: 0.05<|(r101-r92)| / |(r101+r92)|<0.8, where r92 is the curvature radius of the image-side curved surface of the ninth lens, and r101 is the curvature radius of the object-side curved surface of the tenth lens. A ratio value exceeding an upper limit may cause increased astigmatism and chromatic aberration. A ratio value exceeding a lower limit may cause insufficient compensation for astigmatism and chromatic aberration, thereby reducing the optical performance of the lens over a wide spectral range.

[0027] Furthermore, based on any one of the above technical solutions or a combination of multiple technical solutions, the third lens satisfies the following expression: 0.65 <r31 / d31<1.3,其中,r31为第三透镜的物方曲面的曲率半径,d31为第三透镜的物方曲面的通光口径;比例值超过上限可能会导致球差尤其是高级球差变大;比例值超过下限可能会像散像差和场曲像差变大,降低镜头的光学性能。

[0028] The fourth lens satisfies the following expression: 0.6 <r41 / d41<1.2,其中,r41为第四透镜的物方曲面的曲率半径,d41为第四透镜的物方曲面的通光口径;比例值超过上限可能会导致球差尤其是高级球差变大;比例值超过下限可能会像散像差和场曲像差变大,降低镜头的光学性能。

[0029] The fifth lens satisfies the following expression: 0.68 < r52 / d52 < 1.4, where r52 is the curvature radius of the image-side curve surface of the fifth lens, and d52 is the clear aperture of the image-side curve surface of the fifth lens; the ratio exceeding the upper limit can cause the spherical aberration, especially the higher-order spherical aberration and the chromatic aberration to be large; the ratio exceeding the lower limit can cause the compensation of the spherical aberration, especially the higher-order spherical aberration and the chromatic aberration to be insufficient, reducing the optical performance of the lens.

[0030] The sixth lens satisfies the following expression: 0.68 < r61 / d61 < 1.4, where r61 is the curvature radius of the object-side curve surface of the sixth lens, and d61 is the clear aperture of the object-side curve surface of the sixth lens;

[0031] The seventh lens satisfies the following expression: 0.6 < r72 / d72 < 1.2, where r72 is the curvature radius of the image-side curve surface of the seventh lens, and d72 is the clear aperture of the image-side curve surface of the seventh lens;

[0032] The eighth lens satisfies the following expression: 0.65 < r82 / d82 < 1.3, where r82 is the curvature radius of the image-side curve surface of the eighth lens, and d82 is the clear aperture of the image-side curve surface of the eighth lens.

[0033] Further, any one of the technical solutions or the combination of the technical solutions described above, the optical lens used for photolithography projection satisfies the following expression:

[0034] 18 < vd4-vd5 < 50, 18 < vd7-vd6 < 50, where vd4 is the dispersion coefficient of the fourth lens, vd5 is the dispersion coefficient of the fifth lens, vd6 is the dispersion coefficient of the sixth lens, and vd7 is the dispersion coefficient of the seventh lens. The ratio exceeding the upper limit can cause the chromatic aberration, especially the higher-order chromatic aberration to be large; the ratio exceeding the lower limit can cause the compensation of the chromatic aberration, especially the higher-order chromatic aberration to be insufficient, reducing the wide-spectrum optical performance of the lens.

[0035] Further, any one of the technical solutions or the combination of the technical solutions described above, the optical lens used for photolithography projection satisfies the following expression: 0.002 < NA x Hy / L < 0.008, where NA is the image-side numerical aperture of the lens, Hy is the image height corresponding to the maximum field angle of the lens, and L is the distance between the object side and the image side. The ratio exceeding the upper limit can cause the astigmatism and the field curvature to be large, reducing the optical performance of the lens; the ratio exceeding the lower limit can cause the conjugate distance (the distance from the object side to the image side) to be too long, the optical lens to be too long, and the equipment to be too bulky.

[0036] Further, any one of the above technical solutions or a combination of the above technical solutions, thicknesses of the second lens and the ninth lens are greater than or equal to thicknesses of other lenses, and thicknesses of the fifth lens and the sixth lens are less than or equal to thicknesses of other lenses.

[0037] The thicknesses of the second lens and the fifth lens satisfy an expression: 2.75 < Th2 / Th5 < 4.1, or 25 < Th2-Th5 < 31, where Th2 is the thickness of the second lens, and Th5 is the thickness of the fifth lens.

[0038] The thicknesses of the ninth lens and the sixth lens satisfy an expression: 2.75 < Th9 / Th6 < 4.1, or 25 < Th9-Th6 < 31, where Th6 is the thickness of the sixth lens, and Th9 is the thickness of the ninth lens.

[0039] According to another aspect of the present application, there is provided a photolithography projection device, comprising a light source and an optical lens as described above, a position of an object side of the optical lens is configured to place an optical mask, and a position of an image side of the optical lens is configured to place a substrate to be projected, which is coated with a photosensitive material.

[0040] Further, any one of the above technical solutions or a combination of the above technical solutions, the first lens and the second lens of the optical lens form a first lens group, and the ninth lens and the tenth lens of the optical lens form a sixth lens group.

[0041] The projection magnification of the photolithography projection device is adjusted by moving the first lens group and / or the sixth lens group within a range of 2 mm along the direction of the optical axis.

[0042] Further, any one of the above technical solutions or a combination of the above technical solutions, the photolithography projection device provided by the present application has different topographic features of the photosensitive material remaining after exposure and development when the substrate is exposed by selecting different wavelengths of the light source.

[0043] The technical solutions provided by the present application have the following beneficial effects:

[0044] a. The optical lens does not contain aspherical lenses, which greatly reduces the difficulty and cost of processing, detection and adjustment;

[0045] b. The optical lens does not contain lenses that are glued together, which avoids deformation of the lenses and reduces the optical imaging performance;

[0046] c. The optical lens can effectively correct various aberrations, expand the size of the image field, improve the imaging resolution, and conveniently and effectively adjust the projection magnification. BRIEF DESCRIPTION OF DRAWINGS

[0047] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments recorded in this application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0048] Figure 1 A schematic diagram of the lens arrangement of the optical lens provided in the first embodiment of the present invention;

[0049] Figure 2 An aberration characteristic curve of the optical lens provided in the first embodiment of the present invention at an object-side image height of 0 mm, wherein the abscissa PY represents the ordinate value of the light ray on the entrance pupil, the ordinate EY represents the offset distance in the Y direction between the intersection point of the light ray on the image plane and the ideal image point, the abscissa PX represents the abscissa value of the light ray on the entrance pupil, and the ordinate EX represents the offset distance in the X direction between the intersection point of the light ray on the image plane and the ideal image point;

[0050] Figure 3 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention at an object-side image height of -45 mm;

[0051] Figure 4 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention at an object-side image height of -70 mm;

[0052] Figure 5 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention at an object-side image height of -100 mm;

[0053] Figure 6 A schematic diagram of the lens arrangement of an optical lens provided in a second embodiment of the present invention;

[0054] Figure 7 An aberration characteristic curve of the optical lens provided in the second embodiment of the present invention at an object-side image height of 0 mm, wherein the abscissa PY represents the ordinate value of the light ray on the entrance pupil, the ordinate EY represents the offset distance in the Y direction between the intersection point of the light ray on the image plane and the ideal image point, the abscissa PX represents the abscissa value of the light ray on the entrance pupil, and the ordinate EX represents the offset distance in the X direction between the intersection point of the light ray on the image plane and the ideal image point;

[0055] Figure 8 The aberration characteristic curve of the optical lens provided in the second embodiment of the present invention at an object-side image height of -45 mm;

[0056] Figure 9 The aberration characteristic curve of the optical lens provided in the second embodiment of the present invention at an object-side image height of -70 mm;

[0057] Figure 10 The aberration characteristic curve of the optical lens provided in the second embodiment of the present invention at an object-side image height of -100 mm;

[0058] Figure 11 A schematic diagram of the lens arrangement of an optical lens provided in a third embodiment of the present invention;

[0059] Figure 12 An aberration characteristic curve of the optical lens provided in the third embodiment of the present invention at an object-side image height of 0 mm, wherein the abscissa PY represents the ordinate value of the light ray on the entrance pupil, the ordinate EY represents the offset distance in the Y direction between the intersection point of the light ray on the image plane and the ideal image point, the abscissa PX represents the abscissa value of the light ray on the entrance pupil, and the ordinate EX represents the offset distance in the X direction between the intersection point of the light ray on the image plane and the ideal image point;

[0060] Figure 13 The aberration characteristic curve of the optical lens provided in the third embodiment of the present invention at an object-side image height of -45 mm;

[0061] Figure 14 The aberration characteristic curve of the optical lens provided in the third embodiment of the present invention at an object-side image height of -70 mm;

[0062] Figure 15 The aberration characteristic curve of the optical lens provided in the third embodiment of the present invention at an object-side image height of -100 mm;

[0063] Figure 16 The aberration characteristic curve of the second embodiment when the sixth lens group is moved 1 mm along the optical axis and the object side image height is 0 mm is shown;

[0064] Figure 17 The aberration characteristic curve of the second embodiment when the sixth lens group is moved 1 mm along the optical axis and the object image height is -45 mm.

[0065] Figure 18 The aberration characteristic curve of the second embodiment when the sixth lens group is moved 1 mm along the optical axis and the object image height is -70 mm is shown.

[0066] Figure 19 The aberration characteristic curve of the second embodiment when the sixth lens group is moved 1 mm along the optical axis and the object image height is at -100 mm is shown;

[0067] Figure 20 The aberration characteristic curve of the third embodiment when the sixth lens group is moved 1 mm along the optical axis and the object image height is 0 mm is shown;

[0068] Figure 21The aberration characteristic curve of the third embodiment when the sixth lens group is moved 1 mm along the optical axis and the object image height is -45 mm.

[0069] Figure 22 The aberration characteristic curve of the third embodiment when the sixth lens group is moved 1 mm along the optical axis and the object image height is -70 mm.

[0070] Figure 23 The aberration characteristic curve is shown in FIG. 1 , when the sixth lens group is moved 1 mm along the optical axis and the object image height is at -100 mm, based on the third embodiment. DETAILED DESCRIPTION

[0071] In order to enable those skilled in the art to better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0072] It should be noted that the terms "first", "second", etc. in the description and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, apparatus, product or device that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0073] See also Figure 1 、 Figure 6 and Figure 11 , which are lens arrangement diagrams of three embodiments, respectively. Symbol P1 represents the object side, P2 represents the imaging surface of the image side, L1 represents the first lens, L2 represents the second lens, L3 represents the third lens, L4 represents the fourth lens, L5 represents the fifth lens, L6 represents the sixth lens, L7 represents the seventh lens, L8 represents the eighth lens, L9 represents the ninth lens, and L10 represents the tenth lens. Lenses L1 to L10 are arranged in sequence from the object side to the imaging surface P2, and an aperture AS is provided on the image side of the fifth lens L5, that is, on the object side of the sixth lens L6.

[0074] Figure 1 、 Figure 6 、 Figure 11In the figure, symbol G1 denotes a first lens group consisting of a first lens L1 and a second lens L2, which has positive focal power; symbol G2 denotes a second lens group consisting of a third lens, which has positive focal power; symbol G3 denotes a third lens group consisting of a fourth lens L4 and a fifth lens L5, which has negative focal power; symbol G4 denotes a fourth lens group consisting of a sixth lens and a seventh lens, which has negative focal power; symbol G5 denotes a fifth lens group consisting of an eighth lens, which has positive focal power; symbol G6 denotes a sixth lens group consisting of a ninth lens and a tenth lens, which has positive focal power.

[0075] The optical parameters in the following embodiments of the present invention include: Th2 is the thickness of the second lens, Th5 is the thickness of the fifth lens, Th6 is the thickness of the sixth lens, and Th9 is the thickness of the ninth lens; F1 is the combined focal length of the first lens group G1, F2 is the focal length of the second lens group G2 (i.e., the focal length of the third lens L3), F3 is the combined focal length of the third lens group G3, F4 is the combined focal length of the fourth lens group G4, F5 is the focal length of the fifth lens group G5 (i.e., the focal length of the eighth lens L8), F6 is the combined focal length of the sixth lens group G6, and L is the distance between the object side and the image side. f1 is the focal length of the first lens, f2 is the focal length of the second lens, f4 is the focal length of the fourth lens, f5 is the focal length of the fifth lens, f6 is the focal length of the sixth lens, f7 is the focal length of the seventh lens, f9 is the focal length of the ninth lens, and f10 is the focal length of the tenth lens; r12 is the curvature radius of the image-side curved surface of the first lens, r21 is the curvature radius of the object-side curved surface of the second lens, r42 is the curvature radius of the image-side curved surface of the fourth lens, r51 is the curvature radius of the object-side curved surface of the fifth lens, r71 is the curvature radius of the object-side curved surface of the seventh lens, and r62 is the curvature radius of the first lens. The curvature radius of the image side surface of the sixth lens, r92 is the curvature radius of the image side surface of the ninth lens, r101 is the curvature radius of the object side surface of the tenth lens; r31 is the curvature radius of the object side surface of the third lens, d31 is the clear aperture of the object side surface of the third lens, r41 is the curvature radius of the object side surface of the fourth lens, d41 is the clear aperture of the object side surface of the fourth lens, r52 is the curvature radius of the image side surface of the fifth lens, d52 is the clear aperture of the image side surface of the fifth lens, r61 is the curvature radius of the object side surface of the sixth lens, d61 is The clear aperture of the object-side surface of the sixth lens, r72 is the curvature radius of the image-side surface of the seventh lens, d72 is the clear aperture of the image-side surface of the seventh lens, r82 is the curvature radius of the image-side surface of the eighth lens, d82 is the clear aperture of the image-side surface of the eighth lens; vd4 is the chromatic aberration coefficient of the fourth lens, vd5 is the chromatic aberration coefficient of the fifth lens, vd6 is the chromatic aberration coefficient of the sixth lens, and vd7 is the chromatic aberration coefficient of the seventh lens; NA is the image-side numerical aperture of the lens, Hy is the image height corresponding to the maximum field of view of the lens, and L is the distance between the object and image sides.

[0076] The optical lens of the present application satisfies the following conditions: 2.75<Th2 / Th5<4.1, 2.75<Th9 / Th6<4.1, or, 25mm<Th2-Th5<31mm, 25mm<Th9-Th6<31mm;

[0077] 0.3<F1 / L<0.6, 0.3<F6 / L<0.6, 0.15<F2 / L<0.5, 0.15<F5 / L<0.5, 0.1<-F3 / L<0.7, 0.1<-F4 / L<0.7, especially satisfying: 0.35<F1 / L<0.52, 0.35<F6 / L<0.52, 0.19<F2 / L<0.39, 0.19<F5 / L<0.39, 0.15<-F3 / L<0.55, 0.15<-F4 / L<0.55;

[0078] 0.1<-f2 / f1<0.4, 0.2<-f5 / f4<0.8, 0.2<-f6 / f7<0.8, 0.1<-f9 / f10<0.4, especially satisfying: 0.16<-f2 / f1<0.295, 0.22<-f5 / f4<0.65, 0.22<-f6 / f7<0.65, 0.16<-f9 / f10<0.295;

[0079] 0.05<|(r12-r21)| / (r12+r21)<0.8, 0.05<|(r101-r92)| / |(r101+r92)|<0.8, especially satisfying: 0.11<|(r12-r21)| / (r12+r21)<0.65, 0.11<|(r101-r92)| / |(r101+r92)|<0.65;

[0080] 0.0<|(r42-r51)| / (r42+r51)<0.5, 0.0<|(r71-r62)| / |(r71+r62)|<0.5, especially satisfying: 0.0<|(r42-r51)| / (r42+r51)<0.35, 0.0<|(r71-r62)| / |(r71+r62)|<0.35;

[0081] 0.65 < r31 / d31 < 1.3, 0.6 < r41 / d41 < 1.2, 0.68 < r52 / d52 < 1.4, 0.68 < r61 / d61 < 1.4, 0.6 < r72 / d72 < 1.2, 0.65 < r82 / d82 < 1.3, especially satisfying: 0.7 < r31 / d31 < 1.15, 0.7 < r82 / d82 < 1.15, 0.6 < r41 / d41 < 0.85, 0.8 < r52 / d52 < 1, 0.8 < r61 / d61 < 1, 0.6 < r72 / d72 < 0.85;

[0082] 18 < vd4-vd5 < 50, 18 < vd7-vd6 < 50, especially satisfying: 20 < vd4-vd5 < 29, 20 < vd7-vd6 < 29;

[0083] 0.002 < NA x Hy / L < 0.008, especially satisfying: 0.003 < NA x Hy / L < 0.005.

[0084] First embodiment

[0085] In the present embodiment, an optical lens for photolithography projection is provided, the lens has ten pieces of lenses with optical power, and all are spherical surfaces, which are first lens, second lens, third lens, fourth lens, fifth lens, sixth lens, seventh lens, eighth lens, ninth lens and tenth lens arranged in the order of object side to image side:

[0086] The object side optical axis position of the first lens, third lens, fourth lens and fifth lens is convex structure, and the image side optical axis position is concave structure;

[0087] The object side optical axis position of the second lens and ninth lens is convex structure, and the image side optical axis position is convex structure;

[0088] The object side optical axis position of the sixth lens, seventh lens, eighth lens and tenth lens is concave structure, and the image side optical axis position is convex structure;

[0089] In a specific numerical embodiment, the optical parameters of each lens and diaphragm are shown in Table 1:

[0090] Table 1 Optical parameter table of first embodiment

[0091]

[0092]

[0093] In the table, the radius of curvature is infinite, which means that the corresponding surface is a plane.

[0094] It can be determined from Table 1 that the second lens, the third lens, the eighth lens, and the ninth lens have the largest thicknesses, and the fifth lens and the sixth lens have the smallest thicknesses.

[0095] The optical lens of this embodiment has a NA of 0.04. NA is the image-side numerical aperture of the lens, a dimensionless parameter calculated using the formula NA = n × sin(θ), where n is the refractive index and θ is the angle between the light and the optical axis. A larger NA value indicates a wider angle of light that the optical system can collect or transmit, thereby providing higher resolution and clearer images. The maximum field of view of the optical lens of this embodiment corresponds to an image height of 100 mm, and the distance between the object and image sides is 1000 mm.

[0096] In a specific numerical embodiment, the calculation results of the optical parameter relationship of the lens are shown in Table 2:

[0097] Table 2 Calculation results of the lens optical parameter relationship formula of the first embodiment

[0098] (1) F1 / L 0.41 (2) -f2 / f1 0.20 (3) -f5 / f4 0.41 (4) F2 / L 0.28 (5) -F3 / L 0.25 (6) |(r12-r21)| / (r12+r21) 0.16 (7) |(r42-r51)| / (r42+r51) 0.30 (8) r31 / d31 0.74 (9) r41 / d41 0.70 (10) r52 / d52 0.86 (11) vd4-vd5 27.97 (12) NA×Hy / L 0.004

[0099] In this embodiment, the calculated value is rounded off.

[0100] Figures 2 to 5 The aberration characteristic curves for this embodiment at object-side image heights of 0mm, -45mm, -70mm, and -100mm are shown. The solid line represents the aberration curve for a wavelength of 365nm (i-line), and the dashed line represents the aberration curve for a wavelength of 405nm (h-line). It can be seen that the MTF performance of the lens at wavelengths of 365nm (i-line) and 405nm (h-line) is very similar, indicating excellent wide-spectrum performance.

[0101] Second embodiment

[0102] like Figure 6 As shown, the arrangement order of the lenses and the concave-convex state of the curved surfaces of the lenses in this embodiment are the same as those in the first embodiment. In a specific numerical embodiment, the optical parameters of the lenses and the aperture are shown in Table 3:

[0103] Table 3 Optical parameters of the second embodiment

[0104]

[0105] The curvature radius in the table is infinite, indicating that the corresponding surface is a plane.

[0106] It can be determined from Table 3 that the second lens and the ninth lens have the largest thickness, and the fifth lens and the sixth lens have the smallest thickness.

[0107] The NA of the optical lens of this embodiment is 0.04, the image height corresponding to the maximum field angle is 100 mm, and the distance between the object space and the image space is 1000 mm.

[0108] In a specific numerical embodiment, the calculation results of the optical parameter relationship of the lens are shown in Table 4:

[0109] Table 4 Calculation results of the lens optical parameter relationship formula of the second embodiment

[0110] (1) F1 / L 0.48 (2) -f2 / f1 0.269 (3) -f5 / f4 0.57 (4) F2 / L 0.32 (5) -F3 / L 0.4675 (6) |(r12-r21)| / (r12+r21) 0.53 (7) |(r42-r51)| / (r42+r51) 0.01 (8) r31 / d31 0.97 (9) r41 / d41 0.77 (10) r52 / d52 0.92 (11) vd4-vd5 24.38 (12) NA×Hy / L 0.004

[0111] In this embodiment, the calculated value is rounded off.

[0112] Figures 7 to 10 The aberration characteristic curves for this embodiment at object-side image heights of 0mm, -45mm, -70mm, and -100mm are shown. The solid line represents the aberration curve for a wavelength of 365nm (i-line), and the dashed line represents the aberration curve for a wavelength of 405nm (h-line). It can be seen that the MTF performance of the lens at wavelengths of 365nm (i-line) and 405nm (h-line) is very similar, indicating excellent wide-spectrum performance.

[0113] Third embodiment

[0114] like Figure 11 As shown, in this embodiment, the arrangement order of the lenses of the optical lens and the concave-convex state of the curved surface of each lens are the same as those of the first embodiment. In a specific numerical embodiment, the optical parameters of each lens and aperture are shown in Table 5:

[0115] Table 5 Optical parameters of the third embodiment

[0116]

[0117]

[0118] The curvature radius in the table is infinite, indicating that the corresponding surface is a plane.

[0119] It can be determined from Table 5 that the second lens and the ninth lens have the largest thicknesses, and the fifth lens and the sixth lens have the smallest thicknesses.

[0120] The NA of the optical lens of this embodiment is 0.04, where NA is the image-side numerical aperture of the lens, which is a dimensionless parameter. The image height corresponding to the maximum field angle of the optical lens is 100 mm, and the distance between the object side and the image side is 1000 mm.

[0121] In a specific numerical embodiment, the calculation results of the optical parameter relationship of the lens are shown in Table 6:

[0122] Table 6 Calculation results of the lens optical parameter relationship formula of the third embodiment

[0123] (1) F1 / L 0.42 (2) -f2 / f1 0.214 (3) -f5 / f4 0.49 (4) F2 / L 0.28 (5) -F3 / L 0.2845 (6) |(r12-r21)| / (r12+r21) 0.22 (7) |(r42-r51)| / (r42+r51) 0.24 (8) r31 / d31 0.75 (9) r41 / d41 0.77 (10) r52 / d52 0.92 (11) vd4-vd5 22.47 (12) NA×Hy / L 0.004

[0124] In this embodiment, the calculated value is rounded off.

[0125] Figures 12 to 15 The aberration characteristic curves for this embodiment at object-side image heights of 0mm, -45mm, -70mm, and -100mm are shown. The solid line represents the aberration curve for a wavelength of 365nm (i-line), and the dashed line represents the aberration curve for a wavelength of 405nm (h-line). It can be seen that the MTF performance of the lens at wavelengths of 365nm (i-line) and 405nm (h-line) is very similar, indicating excellent wide-spectrum performance.

[0126] An embodiment of the present invention also provides a photolithography projection device, including a light source and the optical lens as described above, wherein the object side position of the optical lens is configured to place an optical mask, and the image side position of the optical lens is configured to place a substrate coated with a photosensitive material to be projected.

[0127] The first and second lenses of the optical lens system form a first lens group, while the ninth and tenth lenses form a sixth lens group. The projection magnification of the lithographic projection apparatus is adjusted by moving the first and / or sixth lens groups within a 2 mm range along the optical axis. Taking the sixth lens group of the second embodiment as an example, the projection magnification change characteristic data corresponding to the movement amount is shown in Table 7:

[0128] Table 7. Magnification change data obtained by moving the sixth lens group of the second embodiment.

[0129]

[0130] Taking the movement amount as 1mm as an example, the aberration characteristic curves when the object image height is 0mm, -45mm, -70mm, and -100mm are as follows: Figures 16 to 19 As shown in the figure, it can be seen that the aberration characteristic curve changes very little when the sixth lens group is moved by 1mm and can be ignored. The same magnification change and optical performance are achieved when the first lens group is moved within a range of 2mm.

[0131] Taking the sixth lens group of the third embodiment as an example, the projection magnification change characteristic data corresponding to its movement amount is shown in Table 8:

[0132] Table 8: Magnification change data obtained by moving the sixth lens group of the third embodiment

[0133]

[0134] Taking the movement amount as 1mm as an example, the aberration characteristic curves when the object image height is 0mm, -45mm, -70mm, and -100mm are as follows: Figures 20 to 23 As shown in the figure, it can be seen that the aberration characteristic curve changes very little when the sixth lens group is moved by 1mm and can be ignored. The same magnification change and optical performance are achieved when the first lens group is moved within a range of 2mm.

[0135] The lithography projection device provided by the embodiment of the present invention adjusts the opening width of the lithography area of ​​the photosensitive material on the substrate by selecting the filter wavelength range of the lens of the optical lens and selecting light sources of different wavelengths. The lithography projection device of the present invention includes a wide-spectrum light source, a homogenizing lens group, and a condenser lens group, wherein the homogenizing lens group uses a compound eye integrator or a square rod integrator for homogenization. The homogenizing lens group homogenizes the light beam emitted by the wide-spectrum light source and projects it onto the mask after passing through the condenser. The mask contains the pattern to be projected and imaged. The exit pupil position of the light beam emitted by the condenser coincides with the entrance pupil position of the projection imaging optical system, and the mask position coincides with the object position of the projection imaging optical system. The optical lens includes a wavelength selection filter. By selecting different wavelength filters, different characteristic spectral line regions are selected, which are suitable for photosensitive materials with different characteristics, or different photosensitive resin curing sections, upper opening sections, vertical sections, and lower opening sections are constructed. Different exposure wavelengths have different depths of action on the photosensitive resin, and the upper and lower widths of the opening can be controlled, that is, the exposure wavelength can be selected to adjust the opening shape.

[0136] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply the existence of any such actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of other identical elements in the process, method, article, or device comprising the element.

[0137] The above is only a specific implementation method of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. An optical lens for lithographic projection, characterized in that: The lens has ten lenses with optical powers, which are the first lens, the second lens, the third lens, the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens and the tenth lens arranged in sequence from the object side to the image side, where: The object-side optical axis positions of the first lens, the third lens, the fourth lens and the fifth lens are convex structures, and their image-side optical axis positions are concave structures; The object-side optical axis positions of the second lens and the ninth lens are convex structures, and their image-side optical axis positions are convex structures; The object-side optical axis positions of the sixth lens, the seventh lens, the eighth lens and the tenth lens are concave structures, and their image-side optical axis positions are convex structures; The fourth lens and the seventh lens have positive optical powers, and the first lens, the fifth lens, the sixth lens and the tenth lens have negative optical powers; The first lens and the second lens form the first lens group, which has a positive optical power; the third lens constitutes the second lens group, which has a positive optical power; the fourth lens and the fifth lens form the third lens group, which has a negative optical power; the sixth lens and the seventh lens form the fourth lens group, which has a negative optical power; the eighth lens constitutes the fifth lens group, which has a positive optical power; the ninth lens and the tenth lens form the sixth lens group, which has a positive optical power; The focal length of the optical lens satisfies the following expressions: 0.1 < -f2 / f1 < 0.4, 0.2 < -f5 / f4 < 0.8, 0.2 < -f6 / f7 < 0.8, 0.1 < -f / f10 < 0.4, 0.3 < F1 / L < 0.6, 0.3 < F6 / L < 0.6; 0.15 < F2 / L < 0.5, 0.15 < F5 / L < 0.5; 0.1 < -F3 / L < 0.7, 0.1 < -F4 / L < 0.7; where, f1 is the focal length of the first lens, f2 is the focal length of the second lens, f4 is the focal length of the fourth lens, f5 is the focal length of the fifth lens, f6 is the focal length of the sixth lens, f7 is the focal length of the seventh lens, f9 is the focal length of the ninth lens, f10 is the focal length of the tenth lens, F1 is the combined focal length of the first lens group, F2 is the focal length of the second lens group, F3 is the combined focal length of the third lens group, F4 is the combined focal length of the fourth lens group, F5 is the focal length of the fifth lens group, F6 is the combined focal length of the sixth lens group, and L is the distance between the object side and the image side; The lens curvature radii of the optical lens satisfy: 0.05 < |(r12 - r21)| / (r12 + r21) < 0.8, 0.0 < |(r42 - r51)| / (r42 + r51) < 0.5, 0.0 < |(r71 - r62)| / |(r71 + r62)| < 0.5, 0.05 < |(r101 - r92)| / |(r101 + r92)| < 0.8, where r12 is the curvature radius of the image-side surface of the first lens, r21 is the curvature radius of the object-side surface of the second lens; r42 is the curvature radius of the image-side surface of the fourth lens, r51 is the curvature radius of the object-side surface of the fifth lens; r71 is the curvature radius of the object-side surface of the seventh lens, r62 is the curvature radius of the image-side surface of the sixth lens; r92 is the curvature radius of the image-side surface of the ninth lens, r101 is the curvature radius of the object-side surface of the tenth lens.

2. The optical lens for lithographic projection according to claim 1, characterized in that: The third lens satisfies the following expression: 0.65 < r31 / d31 < 1.3, where r31 is the curvature radius of the object-side surface of the third lens, d31 is the clear aperture of the object-side surface of the third lens; The fourth lens satisfies the following expression: 0.6 < r41 / d41 < 1.2, where r41 is the curvature radius of the object-side surface of the fourth lens, d41 is the clear aperture of the object-side surface of the fourth lens; The fifth lens satisfies the following expression: 0.68 < r52 / d52 < 1.4, where r52 is the curvature radius of the image-side surface of the fifth lens, d52 is the clear aperture of the image-side surface of the fifth lens.

3. The optical lens for lithographic projection according to claim 2, characterized in that: The sixth lens satisfies the following expression: 0.68 < r61 / d61 < 1.4, where r61 is the curvature radius of the object-side surface of the sixth lens, d61 is the clear aperture of the object-side surface of the sixth lens; The seventh lens satisfies the following expression: 0.6 < r72 / d72 < 1.2, where r72 is the curvature radius of the image-side surface of the seventh lens, d72 is the clear aperture of the image-side surface of the seventh lens; The eighth lens satisfies the following expression: 0.65 < r82 / d82 < 1.3, where r82 is the curvature radius of the image-side surface of the eighth lens, d82 is the clear aperture of the image-side surface of the eighth lens.

4. The optical lens for lithographic projection according to claim 1, characterized in that: It satisfies the following expression: 18 < vd4 - vd5 < 50, 18 < vd7 - vd6 < 50, where vd4 is the dispersion coefficient of the fourth lens, vd5 is the dispersion coefficient of the fifth lens, vd6 is the dispersion coefficient of the sixth lens, vd7 is the dispersion coefficient of the seventh lens.

5. The optical lens for lithographic projection according to claim 1, characterized in that: It satisfies the following expression: 0.002 < NA × Hy / L < 0.008, where NA is the image-side numerical aperture of the lens, Hy is the image height corresponding to the maximum field angle of the lens, L is the distance between the object side and the image side.

6. The optical lens for lithographic projection according to any one of claims 1 to 5, characterized in that: The thicknesses of the second lens and the ninth lens are greater than or equal to those of the other lenses, and the thicknesses of the fifth lens and the sixth lens are less than or equal to those of the other lenses.

7. The optical lens for lithographic projection according to claim 6, characterized in that: The thicknesses of the second lens and the fifth lens satisfy the expression: 2.75 < Th2 / Th5 < 4.1, or 25 mm < Th2 - Th5 < 31 mm, where Th2 is the thickness of the second lens and Th5 is the thickness of the fifth lens; The thicknesses of the ninth lens and the sixth lens satisfy the expression: 2.75 < Th9 / Th6 < 4.1, or 25 mm < Th9 - Th6 < 31 mm, where Th6 is the thickness of the sixth lens and Th9 is the thickness of the ninth lens.

8. A lithographic projection apparatus, characterized in that: Comprising a light source and an optical lens as described in any one of claims 1 to 7, the object side position of the optical lens is configured to place an optical mask, and the image side position of the optical lens is configured to place a substrate coated with a photosensitive material to be projected.

9. The lithographic projection apparatus according to claim 8, wherein: The first lens and the second lens of the optical lens form a first lens group, and its ninth lens and tenth lens form a sixth lens group; 10. The lithographic projection apparatus according to claim 8, wherein: By moving the first lens group and / or the sixth lens group within a range of 2 mm along the optical axis direction to adjust the projection magnification of the lithographic projection apparatus. When exposing by selecting different wavelengths of the light source, after exposure and development of the photosensitive material on the substrate, the cured residual photosensitive material has different morphological characteristics.

Images