Imaging System of Exposure Equipment, Adjustment Method and Device of Imaging System

Abstract

The present application discloses an imaging system of an exposure device, an adjustment method and device for the imaging system, relating to the technical field of exposure devices. The imaging system includes: at least one imaging branch, and the imaging branch includes: a first reflector, a second reflector and a wedge mirror; the first reflector is installed below the imaging component based on a preset first inclination angle, and is used for changing the light from the vertical direction to the horizontal direction; the second reflector is installed on the reflection side of the first reflector based on a preset second inclination angle, and is used for changing the light reflected by the first reflector to the inclined direction; the wedge mirror is installed below the second reflector based on a preset wedge mirror thickness, and is used for projecting the light reflected by the second reflector onto the focal plane. The present application is used to solve the problems in the prior art that the exposure time of the exposure device is long and there are stitching marks in the exposure area, and realizes one-time exposure of the exposure device and solves the problem of stitching marks existing in the exposure area.

Description

Technical Field

[0001] This application relates to the technical field of exposure equipment, and in particular to an imaging system of an exposure equipment, an adjustment method and device for the imaging system. Background Art

[0002] A digital micromirror device (Digital Micromirror Device, abbreviated as DMD) and an imaging component are installed in an exposure machine. After the laser is homogenized, it is irradiated onto the DMD, and after being reflected by the DMD, it passes through the imaging component and exposes a pattern on a substrate. Existing exposure machines include multiple groups of DMDs and imaging components, that is, there are multiple imaging lenses, and corresponding patterns are obtained by exposing once with multiple groups of lenses or exposing multiple times with multiple groups of lenses.

[0003] To save exposure time and shorten the width of the exposure machine equipment, the exposure machine arranges the original row of imaging lenses into a multi-row staggered arrangement. For the staggered imaging lenses, the exposure start times of each imaging lens are different, that is, each imaging lens is non-synchronously exposed. In the case of non-synchronous exposure, on one side of the splicing of some substrates is the cured substance that has been reflected, and on the other side is the photosensitive substance that has not reacted, resulting in partial overlap of the exposure areas corresponding to different imaging lenses and generating splicing marks. Summary of the Invention

[0004] The applicant of this application aims at the above problems and technical requirements, and proposes an imaging system of an exposure equipment, an adjustment method and device for the imaging system, to solve the problems of long exposure time and splicing marks in the exposure area of the existing exposure equipment, and to achieve one-time exposure of the exposure equipment and solve the problem of splicing marks in the exposure area.

[0005] An embodiment of this application provides an imaging system of an exposure equipment. The exposure equipment includes: at least two exposure components. The exposure lens component includes: a digital micromirror device and an imaging component. The exposure components are arranged in a staggered manner. The imaging system includes: at least one imaging branch. The imaging branch includes: a first reflector, a second reflector and a wedge prism;

[0006] The first reflector is installed below the imaging component based on a preset first tilt angle, and is used to change the light passing through the imaging component from the vertical direction to the horizontal direction, and project the changed light onto the second reflector;

[0007] The second reflector is installed on the reflection side of the first reflector based on a preset second tilt angle, and is used to change the light reflected by the first reflector to an inclined direction, and project the changed light onto the wedge prism;

[0008] The wedge-shaped mirror is installed below the second mirror based on a preset thickness of the wedge-shaped mirror, and is configured to project the light reflected by the second mirror onto the focal plane;

[0009] Wherein, the first tilt angle, the second tilt angle, the thickness of the wedge-shaped mirror, the installation position of the first mirror, the installation position of the second mirror, and the installation position of the wedge-shaped mirror are obtained by pre-adjusting the imaging system based on an adjustment target;

[0010] Wherein, the adjustment target includes: the spot centers of the misaligned distributed exposure components correspond to a central axis in the horizontal direction within the imaging plane, and the stitching difference between any two adjacent spot images on the central axis belongs to a preset difference range.

[0011] According to the imaging system of an exposure device according to an embodiment of the present application, at least one of the imaging branches includes: two of the imaging branches.

[0012] According to the imaging system of an exposure device according to an embodiment of the present application, the first mirror, the second mirror, and the wedge-shaped mirror are combined into an optical element, and the optical element includes: a first reflecting surface, a second reflecting surface, and a wedge-shaped transmissive body.

[0013] An embodiment of the present application further provides a method for adjusting an imaging system, which is applied to the imaging system of the exposure device as described in any one of the above, and the method includes:

[0014] Obtain the central position corresponding to each spot center of the exposure component;

[0015] Based on a plurality of the central positions, adjust the distance between the first mirror and the second mirror so that the spot centers of the misaligned distributed exposure components correspond to a central axis in the horizontal direction within the imaging plane;

[0016] Obtain the tilt degree of the focal plane after imaging of each exposure component, and the focal plane height corresponding to each exposure component;

[0017] Based on the tilt degree and the focal plane height, adjust the installation position of the wedge-shaped mirror in the horizontal direction and the installation height of the exposure component so that the focal plane heights corresponding to the spot centers of each exposure component are the same and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction;

[0018] Analyze the spot image obtained based on the imaging system, and determine the stitching difference between any two adjacent spot images on the central axis;

[0019] Adjust the installation position of the exposure component in the horizontal direction based on the splicing difference until the splicing difference falls within a preset difference range.

[0020] According to an adjustment method of an imaging system according to an embodiment of the present application, based on a plurality of the central positions, adjust the distance between the first mirror and the second mirror so that the light spot centers of the exposure components arranged in a staggered manner correspond to a central axis in the horizontal direction in the imaging plane, including:

[0021] Adjust the reflection angle and the distance between the first mirror and the second mirror so that the coordinate values of the central positions corresponding to the light spot centers of each exposure plane are the same in the horizontal direction, so that the light spot centers of the exposure components arranged in a staggered manner correspond to a central axis in the horizontal direction in the imaging plane, and the installation positions of a plurality of the second mirrors corresponding to the exposure components arranged in a staggered manner are not on the same axis; wherein, the reflection angle includes: the first reflection angle of the first mirror and / or the second reflection angle of the second mirror.

[0022] According to an adjustment method of an imaging system according to an embodiment of the present application, based on the inclination and the focal plane height, adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component so that the focal plane heights corresponding to the light spot centers of each exposure component are the same and parallel to the horizontal plane, including:

[0023] Based on the inclination, adjust the installation position of the wedge mirror in the horizontal direction so that the imaged focal plane is parallel to the horizontal plane;

[0024] Based on the focal plane height, adjust the installation height of the exposure component so that the projected focal plane heights of each exposure component are the same.

[0025] According to an adjustment method of an imaging system according to an embodiment of the present application, after adjusting the installation position of the wedge mirror in the horizontal direction based on the inclination, further include:

[0026] Adjust the tilt angle of the digital micromirror device in the vertical direction so that the imaged focal plane is parallel to the horizontal plane.

[0027] According to an adjustment method of an imaging system according to an embodiment of the present application, before adjusting the reflection angle and the distance between the first mirror and the second mirror so that the light spot centers of the exposure components arranged in a staggered manner correspond to a central axis in the horizontal direction in the imaging plane, further include:

[0028] Adjust the reflection angle so that the light rays passing through the two imaging branches do not interfere before reaching the focal plane, and determine the first adjustment range corresponding to the first reflection angle, the second adjustment range corresponding to the second reflection angle, and the mapping relationship between the first reflection angle and the second reflection angle based on the adjustment process.

[0029] A method for adjusting an imaging system according to an embodiment of the present application, wherein the first adjustment range includes: 35° to 55°, and the second adjustment range includes: 25° to 45°;

[0030] And / or, the first tilt angle is obtained based on the first preset range, and the second tilt angle is obtained based on the first tilt angle, the mapping relationship, and the second adjustment range.

[0031] An embodiment of the present application further provides an adjustment device for an imaging system, the device includes:

[0032] A first acquisition module, configured to acquire the central position corresponding to the center of each light spot of the exposure component;

[0033] A first adjustment module, configured to adjust the distance between the first mirror and the second mirror based on a plurality of the central positions, so that the centers of the light spots of the exposure components distributed in a staggered manner correspond to a central axis in the horizontal direction in the imaging plane;

[0034] A second acquisition module, configured to acquire the focal plane tilt of each exposure component after imaging, and the focal plane height corresponding to each exposure component;

[0035] A second adjustment module, configured to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component based on the tilt and the focal plane height, so that the focal plane heights corresponding to the centers of the light spots of each exposure component are the same and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction;

[0036] An analysis module, configured to analyze the light spot image obtained based on the imaging system, and determine the splicing difference between any two adjacent light spot images on the central axis;

[0037] A third adjustment module, configured to adjust the installation position of the exposure component in the horizontal direction based on the splicing difference until the splicing difference belongs to a preset difference range.

[0038] An embodiment of the present application further provides an electronic device, including a memory, a processor, and a computer program stored on the memory and executable on the processor, and when the processor executes the program, the steps of the method for adjusting the imaging system described in any one of the above are implemented.

[0039] An embodiment of the present application further provides a non-transitory computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of the method for adjusting the imaging system described in any one of the above are implemented.

[0040] The imaging system, adjustment method and device of an exposure device provided by an embodiment of the present application. The imaging system includes: at least one imaging branch, and the imaging branch includes: a first reflector, a second reflector and a wedge prism; by pre-adjusting the imaging system based on an adjustment target, the obtained imaging system is determined by a first tilt angle, a second tilt angle, the thickness of the wedge prism, the installation position of the first reflector, the installation position of the second reflector, and the installation position of the wedge prism. The imaging branch is used to project the light rays emitted by multiple imaging components onto the focal plane simultaneously, ensuring that the start exposure times of the multiple imaging components are the same, achieving synchronous exposure, and finally obtaining the corresponding pattern through one exposure, reducing the exposure duration; at the same time, in the present application, the light spot centers of the imaging components distributed in a staggered arrangement are corresponding to a central axis in the horizontal direction within the imaging plane through the imaging branch, and the splicing difference between any two adjacent light spot images on the central axis belongs to a preset difference range, solving the problem of splicing marks in the exposure area when the imaging components distributed in a staggered arrangement are exposed in the prior art, and improving the exposure effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following-described drawings are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0042] Figure 1 It is a schematic diagram of the staggered arrangement provided by an embodiment of the present application;

[0043] Figure 2 It is a schematic diagram of the exposure process of the exposure device provided by an embodiment of the present application;

[0044] Figure 3 It is a schematic diagram of the light spot image corresponding to the existing exposure device provided by an embodiment of the present application;

[0045] Figure 4 It is a schematic diagram of the structure of the imaging system provided by an embodiment of the present application;

[0046] Figure 5 It is one of the schematic diagrams of the light rays changing from the vertical direction to the horizontal direction provided by an embodiment of the present application;

[0047] Figure 6 It is another schematic diagram of the light rays changing from the vertical direction to the horizontal direction provided by an embodiment of the present application;

[0048] Figure 7 It is a schematic diagram of the structure of the optical element provided by an embodiment of the present application;

[0049] Figure 8 It is a schematic flowchart of an adjustment method for an imaging system provided by an embodiment of the present application;

[0050] Figure 9 It is a schematic diagram of a spot image corresponding to an exposure device of the present application provided by an embodiment of the present application;

[0051] Figure 10 It is a schematic diagram of focal plane tilt provided by an embodiment of the present application;

[0052] Figure 11 It is a schematic structural diagram of an adjustment device for an imaging system provided by an embodiment of the present application;

[0053] Figure 12 It is a schematic structural diagram of an electronic device provided by an embodiment of the present application. Detailed implementation manners

[0054] To make the objectives, technical solutions, and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Apparently, the described embodiments are some, but not all, of the embodiments of the present application. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present application without creative efforts shall fall within the protection scope of the present invention.

[0055] To be able to clearly illustrate the further description of the present application with respect to the prior art:

[0056] Illustrate by taking a two-row distribution as an example:

[0057] Figure 1 The imaging lens is a deranged distribution. The exposure start time of imaging lens 2 is later than that of imaging lens 1, and this process increases the time of the exposure process.

[0058] Moreover, the imaging lens adopts a double telecentric system, and its principle will inevitably cause the spot size of the actual light output of the imaging optical path to be larger than the theoretical spot size. In the case of non-synchronous exposure, on one side of the splicing of some substrates is the cured substance that has reacted, and on the other side is the photosensitive substance that has not reacted, and the combination of the two is poor, resulting in splicing marks. For details, please refer to Figure 2 .

[0059] In Figure 2 , the leftmost image represents the theoretical pattern, A represents the theoretical exposure pattern of imaging lens 2, and B represents the theoretical exposure pattern of imaging lens 1.

[0060] In Figure 2Among them, the middle image shows that at time t1, the imaging lens 1 first reaches the set position for exposure, and the actual exposure area is larger than the theoretical exposure area. The area on the right side of the dashed line represents the theoretical exposure area.

[0061] In Figure 2 Among them, the rightmost image shows that at time t2, the imaging lens 2 reaches the set position for exposure. At this time, the photoresist in a part of the exposure area of the imaging lens 2 has reacted, and the photoresist in a part of the area has not reacted, and the difference between the two produces a stitching mark. For example, a is the reaction position that has been exposed and cured by the optical lens 1, and b is the position that has not been exposed and reacted by the optical lens 1.

[0062] The spot images of the static projection diagrams of the two-way DMD optical paths of the existing exposure equipment are schematically shown through Figure 3 In Figure 3 It is schematically shown by taking 6-way optical paths as an example.

[0063] The embodiment of the present application provides an imaging system of an exposure device. The exposure device includes: at least two exposure components. The exposure lens component includes: a digital micromirror device and an imaging component, and the exposure components are arranged in a staggered manner. As Figure 4 shown, the imaging system includes: at least one imaging branch 40. The imaging branch 40 includes: a first reflector 401, a second reflector 402, and a wedge mirror 403.

[0064] In Figure 4 It is schematically shown by taking two branches as an example. In Figure 4 It also includes: a digital micromirror device 404 and an imaging component 405. Of course, this is only for illustration and is not used to limit the protection scope of the present application. For some other descriptions in the embodiments of the present application, they are also for illustration and are not used to limit the protection scope of the present application, and will not be described one by one hereafter.

[0065] The first reflector 401 is installed below the imaging component based on a preset first tilt angle, and is used to change the light passing through the imaging component from the vertical direction to the horizontal direction, and project the changed light onto the second reflector 402; the second reflector 402 is installed on the reflection side of the first reflector 401 based on a preset second tilt angle, and is used to change the light reflected by the first reflector 401 to an inclined direction, and project the changed light onto the wedge mirror 403; the wedge mirror 403 is installed below the second reflector 402 based on a preset wedge mirror thickness, and is used to project the light reflected by the second reflector 402 onto the focal plane.

[0066] Among them, the first tilt angle, the second tilt angle, the wedge mirror thickness, the installation position of the first reflector, the installation position of the second reflector, and the installation position of the wedge mirror are obtained by pre-adjusting the imaging system based on the adjustment target.

[0067] Among them, the adjustment targets include: the spot center of the misaligned exposure component corresponds to a horizontal central axis in the imaging plane, and the splicing difference between any two adjacent spot images on the central axis belongs to a preset difference range.

[0068] Among them, the first mirror 401 changes the light of the imaging component from the vertical direction to the lateral direction. Here, the lateral direction is not necessarily the horizontal direction. The range within a preset angle with the horizontal direction as the reference benchmark is defined as the lateral direction. Of course, after the light of the imaging component is changed from the vertical direction to the lateral direction by the first mirror 401, the pipeline can be projected onto the focal plane through the second mirror 402 and the wedge mirror 403. For details, reference can be made to Figure 5 and Figure 6 .

[0069] Among them, this application includes two horizontal and vertical directions. One is the horizontal and vertical directions corresponding to the spatial rectangular coordinate, and the exposure component is based on this; the other is the horizontal and vertical directions in the plane coordinate system in the imaging plane. In this coordinate system, the vertical direction is the moving direction of the plate during exposure, and the horizontal direction is the direction perpendicular to the moving direction of the plate. The two can share a coordinate system or establish corresponding coordinate systems respectively.

[0070] Among them, the installation angles of the first mirror 401, the second mirror 402, and the wedge mirror 403 are based on the spatial rectangular coordinate system.

[0071] The imaging system of the exposure device provided by the embodiment of this application includes: at least one imaging branch 40, and the imaging branch 40 includes: a first mirror 401, a second mirror 402, and a wedge mirror 403; by pre-adjusting the imaging system based on the adjustment target, the obtained imaging system with the first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first mirror, the installation position of the second mirror, and the installation position of the wedge mirror, using the imaging branch to project the light emitted by multiple imaging components onto the focal plane at the same time to ensure that the start exposure times of multiple imaging components are the same, realizing synchronous exposure, and finally obtaining the corresponding pattern through one exposure, reducing the exposure duration; at the same time, in this application, the spot centers of the misaligned imaging components are corresponding to a horizontal central axis in the imaging plane through the imaging branch 10, and the splicing difference between any two adjacent spot images on the central axis belongs to the preset difference range, solving the problem of splicing marks in the exposure area when the misaligned imaging components are exposed in the prior art, and improving the exposure effect.

[0072] In a specific embodiment, it is an imaging branch 40. By changing the spot center of one row of exposure components through an imaging branch 40, the spot centers of the exposure components in two rows are made to correspond to a central axis in the horizontal direction within the imaging plane.

[0073] In another specific embodiment, the imaging branch is two imaging branches 40. By using the two imaging branches 40 to reflect simultaneously, the spot centers of the exposure components in two rows are made to correspond to a central axis in the horizontal direction within the imaging plane. At this time, the central axis is in the middle of the two rows of exposure components, as Figure 9 shown. The focal plane tilt angle corresponding to each imaging branch 40 is smaller, and the focal plane adjustment is simpler than that of a single imaging branch.

[0074] In addition, in this application, a reflecting mirror and a wedge mirror are used to combine the light of two DMDs. Since the light combining process does not include concave lenses and convex lenses, the spot size remains unchanged, and it is the same as the exposure pattern of existing exposure equipment.

[0075] In a specific embodiment, a first reflecting mirror, a second reflecting mirror, and a wedge mirror are combined into an optical element. The optical element includes: a first reflecting surface, a second reflecting surface, and a wedge transmissive body.

[0076] Among them, as Figure 7 shown, the mirror surface corresponding to AB is the first reflecting surface, the mirror surface corresponding to DE is the second reflecting surface, and BCD is the wedge transmissive body.

[0077] Specifically, the first reflecting surface realizes the function of the first reflecting mirror, the second reflecting surface realizes the function of the second reflecting mirror, and the wedge transmissive body realizes the function of the wedge mirror.

[0078] This application uses an integrally formed optical element to realize the functions of light combination and focal plane adjustment, with good stability, simple adjustment operation, and the integrally formed method effectively reduces the number of debugging times and shortens the adjustment duration.

[0079] The embodiment of this application also provides an adjustment method for an imaging system. This method is used to adjust the imaging system of the exposure equipment described in any of the above embodiments, as Figure 8 shown. This method includes:

[0080] Step 801, obtain the central position corresponding to each spot center of the exposure components.

[0081] Step 802, based on multiple central positions, adjust the distance between the first reflecting mirror and the second reflecting mirror so that the spot centers of the exposure components with staggered distribution correspond to a central axis in the horizontal direction within the imaging plane.

[0082] Step 803: Obtain the focal plane tilt after imaging for each exposure component, and the focal plane height corresponding to each exposure component respectively.

[0083] Step 804: Based on the tilt and the focal plane height, adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component, so that the focal plane heights corresponding to the spot centers of each exposure component are the same and parallel to the horizontal plane.

[0084] Wherein, the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction.

[0085] Step 805: Analyze the spot image obtained based on the imaging system, and determine the splicing difference between any two adjacent spot images on the central axis.

[0086] Step 806: Based on the splicing difference, adjust the installation position of the exposure component in the horizontal direction until the splicing difference falls within a preset difference range.

[0087] In this application, with the central position as a reference, the distance between the first reflector and the second reflector is adjusted so that the staggered distribution corresponds to a central axis in the horizontal direction; and with the focal plane tilt and the focal plane height as references, the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component are adjusted so that the focal plane heights corresponding to the spots of each exposure component in each row distribution are the same and parallel to the horizontal plane; and the spot image is analyzed, and the installation position of the exposure component in the horizontal direction is adjusted so that the splicing difference between any two adjacent spot images on the central axis falls within a preset difference range, so that the finally obtained imaging system can obtain the corresponding pattern through one exposure, reducing the exposure duration, and solving the problem of splicing marks in the exposure area when the imaging components with staggered distribution are exposed in the prior art, and improving the exposure effect.

[0088] For Figure 7 , in the above adjustment method, adjusting the reflection angle and the distance between the first reflector and the second reflector means adjusting the distance between the first reflecting surface and the second reflecting surface. The reflection angle means the first reflection angle of the first reflecting surface and / or the second reflection angle of the second reflecting surface. Adjusting the installation position of the wedge mirror in the horizontal direction means adjusting the installation position of the wedge body in the horizontal direction.

[0089] In a specific embodiment, based on multiple central positions, the specific implementation of adjusting the distance between the first reflector and the second reflector so that the spot centers of the exposure components with staggered distribution correspond to a central axis in the horizontal direction in the imaging plane includes:

[0090] Adjust the distance between the first mirror and the second mirror so that the coordinate values of the central positions corresponding to the light spot centers of each exposure plane in the horizontal direction within the imaging plane are the same, so that the light spot centers of the exposure components with a staggered arrangement correspond to a central axis in the horizontal direction within the imaging plane.

[0091] Specifically, after the first mirror and the second mirror are schematically installed, debugging is carried out. Among them, the reflection angles of a number of first mirrors and second mirrors corresponding to the exposure components with a staggered arrangement are both 45°. The light emitted by the exposure components is changed from the vertical direction to the horizontal direction after passing through the first mirror, and is changed from the horizontal direction to the vertical direction after passing through the second mirror. Here, the vertical direction and the horizontal direction are both the horizontal direction and the vertical direction corresponding to the space rectangular coordinates. Subsequently, by adjusting the distance between the first mirror and the second mirror, the coordinate values of the light spot centers of each exposure component in the horizontal direction within the imaging plane are made the same.

[0092] In another specific implementation, based on multiple central positions, the specific implementation of adjusting the distance between the first mirror and the second mirror so that the light spot centers of the exposure components with a staggered arrangement correspond to a central axis in the horizontal direction within the imaging plane includes:

[0093] Adjust the distance and the reflection angle between the first mirror and the second mirror so that the coordinate values of the central positions corresponding to the light spot centers of each exposure plane in the horizontal direction within the imaging plane are the same, so that the staggered arrangement corresponds to a central axis in the horizontal direction within the imaging plane. At the same time, the installation positions of a number of second mirrors corresponding to the exposure components with a staggered arrangement are not on the same axis.

[0094] Among them, the reflection angle includes: the first reflection angle of the first mirror and / or the second reflection angle of the second mirror.

[0095] Specifically, after the first mirror and the second mirror are schematically installed, debugging is carried out. By adjusting the distance and the reflection angle between the first mirror and the second mirror, the staggered arrangement corresponds to a central axis in the horizontal direction within the imaging plane. At the same time, the installation positions of a number of second mirrors corresponding to the exposure components with a staggered arrangement are not on the same axis. As Figure 4 shown, the first reflection angle of the first mirror 401 of two exposure components is 45°, changing the light from the vertical direction to the horizontal direction; the second reflection angle of the second mirror 402 is 40°, so that the light is changed from the horizontal direction to the inclined direction.

[0096] By adjusting the reflection angle, the installation positions of the second reflectors corresponding to a plurality of exposure components are not on the same axis. If the reflection angle is not adjusted and is 45° for all, the second reflectors of each exposure component will be installed on the same axis, which is likely to cause the two reflectors to collide during installation and make the installation difficult. Therefore, by adjusting the reflection angle, the light is incident obliquely to facilitate the installation.

[0097] Among them, by Figure 9 It is shown that the spot image of the static projection after passing through the imaging system of the present application is on a central axis in the horizontal direction.

[0098] Next, taking two imaging branches as an example for illustration:

[0099] Place the camera with a charge-coupled device (CCD) image sensor at the spot position, measure the first center point coordinates of the first row distribution and the second center point coordinates of the second row distribution; adjust the reflection angle so that the coordinate values of the first center line coordinates and the second center point coordinates in the horizontal direction are the same. Adjust the distance between the first reflector and the second reflector so that the coordinate values of the first center coordinate and the second center coordinate in the vertical direction are the same, and finally make the two row distributions correspond to the central axis of a horizontal line.

[0100] In a specific embodiment, based on the inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component so that the focal plane height corresponding to each row distribution is the same and parallel to the horizontal plane specifically includes:

[0101] Based on the inclination, adjust the installation position of the wedge mirror in the horizontal direction so that the focal plane after imaging is parallel to the horizontal plane; based on the focal plane height, adjust the installation height so that the focal plane height corresponding to each row distribution is the same.

[0102] Specifically, since the second reflector will change the light from the horizontal direction to the inclined direction, this behavior will cause the focal plane of the spot to tilt (for a specific illustration, see Figure 10 ), affecting the image quality of the imaging. Therefore, an optical path difference is achieved by the light passing through different thicknesses of glass before and after the wedge mirror to compensate for the focal plane tilt. Among them, the longer the distance the light passes through the glass, the shorter the optical path.

[0103] Next, taking two imaging branches as an example for illustration:

[0104] Use a CCD camera to measure the inclination corresponding to each row distribution, adjust the installation position of the wedge mirror in the horizontal direction, that is, by changing the thickness of the wedge mirror, compensate for the inclination values of different focal planes so that each focal plane is parallel to the horizontal plane; and make the heights of each focal plane the same by adjusting the installation angle.

[0105] However, in the actual adjustment process, by changing the thickness of the wedge mirror to compensate for the tilt values of different focal planes, there is still a certain error and the effect of being parallel to the horizontal plane cannot be achieved. However, the error can be reduced to within 0.5 mm.

[0106] In a specific embodiment, based on the tilt, after adjusting the installation position of the wedge mirror in the horizontal direction, the tilt angle of the digital micromirror device in the vertical direction is adjusted so that the focal plane after imaging is parallel to the horizontal plane.

[0107] Specifically, the effect of only adjusting the thickness of the wedge mirror is poor. Therefore, the tilt angle of the digital micromirror device in the vertical direction is further adjusted to further compensate for the tilt values of different focal planes, reduce the error, and achieve the effect of making each focal plane parallel to the horizontal plane.

[0108] However, in the actual adjustment process, there may be a certain error, but the error can be reduced to within 0.1 mm, and the effect of being absolutely parallel to the horizontal plane cannot be achieved. However, it will not have any impact on the use of the exposure device.

[0109] In a specific embodiment, before adjusting the reflection angle and the distance between the first mirror and the second mirror so that the light spot centers of the misaligned exposure components correspond to a central axis in the horizontal direction in the imaging plane, the reflection angle is adjusted so that the light rays passing through the two imaging branches do not interfere before reaching the focal plane, and based on the adjustment process, a first adjustment range corresponding to the first reflection angle, a second adjustment range corresponding to the second reflection angle, and the mapping relationship between the first reflection angle and the second reflection angle are determined.

[0110] In a specific embodiment, the first adjustment range includes: 35° to 55°, and the second adjustment range includes: 25° to 45°.

[0111] In a specific embodiment, the first tilt angle is obtained based on the first preset range; the second tilt angle is obtained based on the first tilt angle, the mapping relationship, and the second adjustment range.

[0112] Specifically, the first reflection angle of the first mirror belongs to 35° to 55°, changing the light ray from the vertical direction to the horizontal direction; the second mirror is reduced by 5° to 10° on the basis of being parallel to the first mirror, and the second reflection angle belongs to 25° to 45°. By adjusting the incident angle of the second mirror, the light spot can be adjusted to move back and forth in the exposure plane to compensate for the deviation between the actual position and the theoretical position of the light spot caused by system errors.

[0113] For example, as Figure 4As shown, the first reflection angle of the first mirror 401 is 45°, which changes the light from the vertical direction to the horizontal direction; the second reflection angle of the second mirror 402 is 40°, which reduces by 5° based on the first reflection angle, and changes the horizontal light emitted from the first mirror to an inclined direction. As Figure 5 As shown, the first reflection angle of the first mirror 401 is 38.4°, which changes the light from the vertical direction to a horizontal direction that is inclined upward; the second reflection angle of the second mirror is 33.4°, which reduces by 5° based on the first reflection angle, and changes the horizontal light emitted from the first mirror to an inclined direction. As Figure 6 As shown, the first reflection angle of the first mirror 401 is 51.93°, which changes the light from the vertical direction to a horizontal direction that is inclined downward. The second reflection accuracy of the second mirror is 46.85°, which reduces by 5.08° based on the first reflection angle, and changes the horizontal light emitted from the first mirror to an inclined direction. Moreover, in the process of the above three embodiments, it is necessary to ensure that the light of the two imaging lenses does not interfere.

[0114] Specifically, the wedge mirror realizes the optical path difference of the focal plane in the horizontal direction through the angle of the wedge angle and the thickness of the wedge mirror, and is used to solve the problem of the inclination of the front focal plane in the horizontal direction caused by different first and second reflection angles. Specifically, different focal plane inclination values can be compensated by adjusting the thickness of the wedge mirror or moving it left and right in the horizontal direction.

[0115] The imaging branch of this application does not pass through any concave lenses and convex lenses, which can ensure that the spot size remains unchanged. When the exposure distribution remains unchanged, the stitching marks are eliminated. Moreover, the staggered exposure of the staggered optical path is directly formed into a central axis for one-time exposure, saving the exposure duration. In addition, the structure of this application is simple, the materials are easy to obtain, the installation is simple, and the debugging is convenient, improving the user experience.

[0116] The embodiment of this application also provides an adjustment device for an imaging system. The specific implementation of this device can refer to the description in the adjustment method of the imaging system, and the repeated parts will not be elaborated. As Figure 11 As shown, this device includes:

[0117] A first acquisition module 1101, which is used to acquire the central position corresponding to the center of each spot of the exposure component;

[0118] A first adjustment module 1102, which is used to adjust the distance between the first mirror and the second mirror based on multiple central positions, so that the centers of the spots of the exposure components with a staggered distribution correspond to a central axis in the horizontal direction within the imaging plane;

[0119] A second acquisition module 1103, which is used to acquire the focal plane inclination degree after imaging of each exposure component, and the focal plane height corresponding to each exposure component respectively;

[0120] The second adjustment module 1104 is configured to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component based on the tilt and the focal plane height, so that the focal plane heights corresponding to the light spot centers of each exposure component are the same and parallel to the horizontal plane, where the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction;

[0121] The analysis module 1105 is configured to analyze the light spot image obtained based on the imaging system and determine the stitching difference between any two adjacent light spot images on the central axis;

[0122] The third adjustment module 1106 is configured to adjust the installation position of the exposure component in the horizontal direction based on the stitching difference until the stitching difference belongs to a preset difference range.

[0123] In a specific embodiment, the first adjustment module 1102 is configured to adjust the reflection angle and the distance between the first mirror and the second mirror, so that the coordinate values of the central positions corresponding to the light spot centers of each exposure plane in the horizontal direction are the same, so that the light spot centers of the exposure components distributed in a staggered manner correspond to a central axis in the horizontal direction in the imaging plane, and the installation positions of a plurality of second mirrors corresponding to the exposure components distributed in a staggered manner are not on the same axis.

[0124] Wherein, the reflection angle includes: the first reflection angle of the first mirror and / or the second reflection angle of the second mirror.

[0125] In a specific embodiment, the second adjustment module 1104 is configured to adjust the installation position of the wedge mirror in the horizontal direction based on the tilt, so that the imaged focal plane is parallel to the horizontal plane; and adjust the installation height of the exposure component based on the focal plane height, so that the projected focal plane heights of each exposure component are the same.

[0126] In a specific embodiment, the second adjustment module 1104 is further configured to adjust the tilt angle of the digital micromirror device in the vertical direction, so that the imaged focal plane is parallel to the horizontal plane.

[0127] In a specific embodiment, the first adjustment module 1102 is further configured to adjust the reflection angle so that the light rays passing through the two imaging branches do not interfere before reaching the focal plane, and determine the first adjustment range corresponding to the first reflection angle, the second adjustment range corresponding to the second reflection angle, and the mapping relationship between the first reflection angle and the second reflection angle based on the adjustment process.

[0128] In a specific embodiment, the first adjustment range includes: 35° to 55°, and the second adjustment range includes: 25° to 45°;

[0129] And / or, the first tilt angle is obtained based on a first preset range, and the second tilt angle is obtained based on the first tilt angle, a mapping relationship, and a second adjustment range.

[0130] Figure 12 An example of a schematic diagram of the physical structure of an electronic device is shown as Figure 12 shown. The electronic device may include: a processor 1201, a communications interface 1202, a memory 1203, and a communication bus 1204. Among them, the processor 1201, the communications interface 1202, and the memory 1203 communicate with each other through the communication bus 1204. The processor 1201 may call logic instructions in the memory 1203 to execute an adjustment method for an imaging system. The method includes: obtaining the central position corresponding to the center of each light spot of an exposure component; based on a plurality of central positions, adjusting the distance between a first mirror and a second mirror so that the centers of the light spots of the exposure components distributed in a staggered manner correspond to a central axis in the horizontal direction in the imaging plane; obtaining the tilt degree of the focal plane after imaging of each exposure component, and the focal plane height corresponding to each exposure component respectively; based on the tilt degree and the focal plane height, adjusting the installation position of a wedge mirror in the horizontal direction and the installation height of the exposure component so that the focal plane heights corresponding to the centers of the light spots of each exposure component are the same and parallel to the horizontal plane, where the installation height includes: the installation height of a digital micromirror device in the vertical direction and / or the installation height of an imaging component in the vertical direction; analyzing a light spot image obtained based on the imaging system to determine a splicing difference between any two adjacent light spot images on the central axis; based on the splicing difference, adjusting the installation position of the exposure component in the horizontal direction until the splicing difference belongs to a preset difference range.

[0131] In addition, when the logic instructions in the above-mentioned memory 1203 can be implemented in the form of a software functional unit and sold or used as an independent product, they can be stored in a computer-readable storage medium. Based on such an understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or a part of this technical solution, can be embodied in the form of a software product. The computer software product is stored in a storage medium and includes several instructions for causing a computer device (which may be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the methods described in various embodiments of the present invention. The foregoing storage medium includes: various media such as a USB flash drive, a mobile hard disk, a read-only memory (ROM, Read-Only Memory), a random access memory (RAM, Random Access Memory), a magnetic disk, or an optical disc that can store program codes.

[0132] On the other hand, the present invention also provides a computer program product, which includes a computer program stored on a non-transitory computer-readable storage medium. The computer program includes program instructions. When the program instructions are executed by a computer, the computer can execute the adjustment method of the imaging system provided by the above-mentioned various methods. The method includes: obtaining the central position corresponding to each light spot center of the exposure component; based on a plurality of central positions, adjusting the distance between the first mirror and the second mirror so that the light spot centers of the exposure components with a staggered distribution correspond to a central axis in the horizontal direction in the imaging plane; obtaining the focal plane inclination degree after imaging of each exposure component and the focal plane height corresponding to each exposure component respectively; based on the inclination degree and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component so that the focal plane heights corresponding to the light spot centers of each exposure component are consistent and parallel to the horizontal plane, where the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction; analyzing the light spot image obtained based on the imaging system to determine the splicing difference between any two adjacent light spot images on the central axis; based on the splicing difference, adjusting the installation position of the exposure component in the horizontal direction until the splicing difference falls within a preset difference range.

[0133] On another aspect, the present invention also provides a non-transitory computer-readable storage medium, on which a computer program is stored. When the computer program is executed by a processor, it is configured to execute the adjustment method of the imaging system provided by the above-mentioned various embodiments. The method includes: obtaining the central position corresponding to each light spot center of the exposure component; based on a plurality of central positions, adjusting the distance between the first mirror and the second mirror so that the light spot centers of the exposure components with a staggered distribution correspond to a central axis in the horizontal direction in the imaging plane; obtaining the focal plane inclination degree after imaging of each exposure component and the focal plane height corresponding to each exposure component respectively; based on the inclination degree and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure component so that the focal plane heights corresponding to the light spot centers of each exposure component are consistent and parallel to the horizontal plane, where the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging component in the vertical direction; analyzing the light spot image obtained based on the imaging system to determine the splicing difference between any two adjacent light spot images on the central axis; based on the splicing difference, adjusting the installation position of the exposure component in the horizontal direction until the splicing difference falls within a preset difference range.

[0134] The device embodiments described above are merely illustrative, wherein the units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, they may be located in one place, or they may be distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the scheme of this embodiment. Those of ordinary skill in the art may understand and implement it without creative effort.

[0135] Through the description of the above implementation methods, those skilled in the art can clearly understand that each implementation method can be implemented by means of software plus a necessary general hardware platform, and of course, it can also be implemented by hardware. Based on this understanding, the above technical solution is essentially or the part that contributes to the prior art can be embodied in the form of a software product, and the computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, a disk, an optical disk, etc., including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) to execute the methods described in each embodiment or some parts of the embodiments.

[0136] Finally, it should be noted that the above is only the preferred implementation of the present application, and the present application is not limited to the above embodiments. It is understood that other improvements and changes directly derived or associated by those skilled in the art without departing from the spirit and concept of the present application should be considered to be included in the scope of protection of the present application.

Claims

1. An imaging system of an exposure device, the exposure device comprising: At least two exposure components, the exposure components include: a digital micromirror device and an imaging component, the exposure components are arranged in a staggered manner, characterized in that the imaging system includes: at least one imaging branch, the imaging branch includes: a first reflector, a second reflector and a wedge mirror; The first reflector is installed below the imaging component based on a preset first tilt angle, and is used to transform the light passing through the imaging component from a vertical direction to a horizontal direction, and project the transformed light onto the second reflector; The second reflector is installed on the reflective side of the first reflector based on a preset second tilt angle, and is used to transform the light reflected by the first reflector into an inclined direction, and project the transformed light onto the wedge mirror; The wedge mirror is installed below the second reflector based on a preset wedge mirror thickness, and is used to project the light reflected by the second reflector onto a focal plane; The first tilt angle, the second tilt angle, the thickness of the wedge mirror, the installation position of the first reflector, the installation position of the second reflector, and the installation position of the wedge mirror are obtained by pre-adjusting the imaging system based on an adjustment target; Wherein, the adjustment target includes: the spot centers of the staggered exposure components correspond to a horizontal central axis in the imaging plane, and the stitching difference between any two adjacent spot images on the central axis belongs to a preset difference range.

2. The imaging system of the exposure device according to claim 1, characterized in that: The at least one imaging branch includes: two imaging branches.

3. The imaging system of the exposure device according to claim 1, characterized in that: The first reflector, the second reflector and the wedge-shaped mirror are combined into an optical element, and the optical element includes: a first reflective surface, a second reflective surface and a wedge-shaped transmissive body.

4. A method for adjusting an imaging system, characterized in that: An imaging system applied to an exposure device according to any one of claims 1 to 3, wherein the method comprises: Obtaining the center position corresponding to each light spot center of the exposure component; Based on the plurality of center positions, adjusting the distance between the first reflector and the second reflector so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane; Obtaining the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component; Based on the focal plane inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction; Analyze the spot image obtained based on the imaging system to determine the stitching difference between any two adjacent spot images on the central axis; Based on the stitching difference, the installation position of the exposure assembly in the horizontal direction is adjusted until the stitching difference falls within a preset difference range.

5. The imaging system adjustment method according to claim 4, characterized in that: Based on the plurality of center positions, adjusting the distance between the first reflector and the second reflector so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane, comprising: Adjust the reflection angle and the distance between the first reflector and the second reflector so that the coordinate values ​​of the center position corresponding to the center of the light spot of each exposure plane are consistent in the horizontal direction, so that the center of the light spot of the staggered exposure assembly corresponds to a central axis in the horizontal direction in the imaging plane, and the installation positions of the plurality of second reflectors corresponding to the staggered exposure assembly are not on the same axis; wherein the reflection angle includes: a first reflection angle of the first reflector and / or a second reflection angle of the second reflector.

6. The imaging system adjustment method according to claim 4, characterized in that: Based on the focal plane inclination and the focal plane height, adjusting the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, including: Based on the inclination of the focal plane, adjusting the installation position of the wedge mirror in the horizontal direction so that the focal plane after imaging is parallel to the horizontal plane; Based on the focal plane height, the installation height of the exposure assembly is adjusted to make the projection focal plane height of each exposure assembly consistent.

7. The imaging system adjustment method according to claim 6, characterized in that: After adjusting the installation position of the wedge mirror in the horizontal direction based on the focal plane inclination, the method further includes: The tilt angle of the digital micromirror device in the vertical direction is adjusted so that the focal plane after imaging is parallel to the horizontal plane.

8. The imaging system adjustment method according to claim 5, characterized in that: The reflection angle and the distance between the first reflector and the second reflector are adjusted so that the center of the light spot of the staggered exposure components is in front of a central axis corresponding to a horizontal direction in the imaging plane, and further includes: The reflection angle is adjusted so that the light passing through the two imaging branches does not interfere before reaching the focal plane, and based on the adjustment process, a first adjustment range corresponding to the first reflection angle, a second adjustment range corresponding to the second reflection angle, and a mapping relationship between the first reflection angle and the second reflection angle are determined.

9. The imaging system adjustment method according to claim 8, characterized in that: The first adjustment range includes: 35°~55°, and the second adjustment range includes: 25°~45°; And / or, the first tilt angle is obtained based on the first adjustment range, and the second tilt angle is obtained based on the first tilt angle, the mapping relationship and the second adjustment range.

10. An adjustment device for an imaging system, characterized in that: Used to implement the adjustment method of the imaging system according to any one of claims 4 to 9, the device comprises: A first acquisition module, used for acquiring a center position corresponding to each light spot center of the exposure component; A first adjustment module is used to adjust the distance between the first reflector and the second reflector based on the plurality of center positions so that the spot centers of the staggered exposure components correspond to a horizontal center axis in the imaging plane; A second acquisition module is used to acquire the focal plane inclination of each exposure component after imaging, and the focal plane height corresponding to each exposure component; A second adjustment module is used to adjust the installation position of the wedge mirror in the horizontal direction and the installation height of the exposure assembly based on the focal plane inclination and the focal plane height, so that the focal plane height corresponding to the center of the light spot of each exposure assembly is consistent and parallel to the horizontal plane, wherein the installation height includes: the installation height of the digital micromirror device in the vertical direction and / or the installation height of the imaging assembly in the vertical direction; An analysis module, used for analyzing the spot image obtained based on the imaging system, and determining the splicing difference between any two adjacent spot images on the central axis; The third adjustment module is used to adjust the installation position of the exposure assembly in the horizontal direction based on the stitching difference until the stitching difference falls within a preset difference range.

Images