Photocurable composition, cured product of photocurable composition and light emitting display device
By using a photocurable composition containing an aromatic monomer and a photopolymerization initiator, the problem of reducing brightness caused by the difference in refractive index between the inorganic layer and the resin layer is solved, and the formation of a cured film with a high refractive index and a high transmittance is achieved, and the brightness of the display device is improved.
Patent Information
- Application Number
- CN202380055315.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2022-07-26
- Filing Date
- 2023-07-21
- Publication Date
- 2025-03-11
AI Technical Summary
In light emitting display devices such as organic EL displays, the brightness is affected by the difference in refractive index between the inorganic layer and the resin layer, resulting in a decrease in light extraction efficiency, making it difficult to form a cured film with high refractive index and high transmittance.
A photocurable composition is provided, including an aromatic monomer and a photopolymerization initiator, capable of forming a cured film with a high refractive index at a wavelength of 486 nm and having a high transmittance. The composition can be used for inkjet device coating and is suitable for the formation of light extraction layers.
It is realized that the light extraction rate is improved in a light emitting display device such as an organic EL display, and the brightness is enhanced, and a cured film with a high refractive index and a high transmittance is formed.
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Abstract
Description
Technical Field
[0001] The present disclosure relates to a photocurable composition, a cured product of the photocurable composition, and a light-emitting display device. Background Art
[0002] Various technical means have been proposed for materials used to constitute next-generation displays such as organic electroluminescent (hereinafter also referred to as "organic EL") displays from the perspective of improving optical properties. For example, Patent Document 1 discloses a curable ink composition comprising: at least one aromatic (meth) acrylate, at least one multifunctional (meth) acrylate having a heteroaromatic group, a condensed aromatic group, a heteroalkylene group, or a group containing both a heteroalkylene group and an aromatic group, and a photoinitiator; the ink composition can be inkjet printed, has a viscosity of 30 centipoise or less at a temperature of room temperature to 35°C, does not contain a solvent, and when the ink composition is printed and cured, has a refractive index of 1.55 or more and is optically transparent. Patent Document 2 discloses an ultraviolet curable resin composition comprising a photopolymerizable component (A) and a photopolymerization initiator (B), has a refractive index of 1.53 or more, and has a viscosity of 30 mP·s or less at a temperature of at least one of 25°C or 40°C.
[0003] Prior art literature
[0004] Patent Literature
[0005] Patent Document 1: Japanese Patent Application No. 2020-506251
[0006] Patent Document 2: Japanese Patent Application Publication No. 2021-55051 Summary of the invention
[0007] In light-emitting display devices such as organic EL displays, high brightness has become a topic. The main reason for the reduction in brightness is that the light extraction efficiency is reduced due to the phenomenon of total reflection of light from the light-emitting layer at the interface with a refractive index difference. For the reduction in brightness, the influence of the refractive index difference between the inorganic layer composed of a silicon nitride film (refractive index 1.9) or indium tin oxide (refractive index 2.1) and the resin layer composed of a polarizer or an optical adhesive (refractive index less than 1.55) is large. Therefore, in order to improve the light extraction rate at the interface between the inorganic layer and the resin layer, a light extraction layer with a high refractive index (for example, a refractive index of 1.55 or more) is sometimes provided between the inorganic layer and the resin layer. In order to form a light extraction layer, it is useful to be coated with an inkjet device and to form a cured film with a high refractive index (for example, 1.55 or more) and a high transmittance.
[0008] The main object of the present disclosure is to provide a photocurable composition that can be applied by an inkjet device and can form a cured film having a high refractive index at a wavelength of 486 nm and a high transmittance.
[0009] One aspect of the present disclosure relates to the following [1] to
[18] .
[0010] [1] A photocurable composition comprising an aromatic monomer and a photopolymerization initiator, wherein the aromatic monomer has a first group comprising a naphthalene skeleton, an anthracene skeleton or a biphenyl skeleton and a second group comprising at least one selected from a (meth)acryloyl group and a vinyl (thio)ether group, the first group being bonded to the second group via an oxygen atom, an alkylene group or a (poly)oxyalkylene group, or being directly bonded to the second group, and the refractive index of the cured film at a wavelength of 486 nm is 1.55 or more.
[0011] [2] The photocurable composition according to [1], wherein the content of the aromatic monomer is 50% by mass or more based on the total amount of the photocurable composition.
[0012] [3] The photocurable composition according to [1] or [2], further comprising a diaryl sulfide compound.
[0013] [4] The photocurable composition according to [3], wherein the diaryl sulfide compound has at least one selected from the group consisting of a hydroxyl group, a mercapto group, a (meth)acryloyl group, and a vinyl (thio)ether group.
[0014] [5] The photocurable composition according to [3] or [4], wherein the content of the diaryl sulfide compound is 20% by mass or more based on the total amount of the photocurable composition.
[0015] [6] The photocurable composition according to any one of [1] to [5], further comprising a nitroxide radical compound.
[0016] [7] The photocurable composition according to [6], wherein the nitroxide radical compound has at least one selected from the group consisting of a hydroxyl group, a mercapto group, a (meth)acryloyl group, and a vinyl (thio)ether group.
[0017] [8] The photocurable composition according to [6] or [7], wherein the content of the nitroxide radical compound is 0.05 mass % or more and 0.60 mass % or less, based on the total amount of the photocurable composition.
[0018] [9] The photocurable composition according to any one of [1] to [8], further comprising a reactive diluent, wherein the reactive diluent has at least one polymerizable functional group selected from a (meth)acryloyl group and a vinyl (thio)ether group, and the viscosity of the reactive diluent at 25°C is not more than 10 mPa·s.
[0019]
[10] The photocurable composition according to any one of [1] to [9], wherein the content of the compound having one (meth)acryloyl group and one vinyl (thio)ether group is 50% by mass or more based on the total amount of the photocurable composition.
[0020]
[11] The photocurable composition according to any one of [1] to
[10] , wherein the photopolymerization initiator is a compound having one phosphorus atom and three aromatic groups.
[0021]
[12] The photocurable composition according to any one of [1] to
[11] , comprising a compound having a fluorine group.
[0022]
[13] The photocurable composition according to
[12] , wherein the content of the compound having a fluorine group is 0.1% by mass or more and 5% by mass or less, based on the total mass of the photocurable composition.
[0023]
[14] A photocurable composition according to any one of [1] to
[13] , wherein the photocurable composition is a liquid at 23°C, and the number of particles in the liquid having a particle size of 1 μm or more contained in the photocurable composition at 23°C is not more than 10 particles / ml.
[0024]
[15] The photocurable composition according to any one of [1] to
[14] , wherein the viscosity of the photocurable composition at 25°C after being stored at 40°C for 120 hours is 30 mPa·s or less.
[0025]
[16] The photocurable composition according to any one of [1] to
[15] , which is a photocurable composition that can be applied using an inkjet device.
[0026]
[17] A cured product of the photocurable composition according to any one of [1] to
[16] .
[0027]
[18] A light-emitting display device comprising a cured product of the photocurable composition according to any one of [1] to
[16] .
[0028]
[19] The light-emitting display device according to
[18] , which is an organic EL display.
[0029] According to the present disclosure, it is possible to provide a photocurable composition that can be applied using an inkjet device and can form a cured film having a high refractive index at a wavelength of 486 nm and a high transmittance. BRIEF DESCRIPTION OF THE DRAWINGS
[0030] Figure 1 This is a schematic cross-sectional view showing one embodiment of a laminate including a light extraction layer. DETAILED DESCRIPTION
[0031] The following is a detailed description of the embodiments of the present disclosure. It should be noted that the present invention is not limited to the embodiments described below. The numerical range "above A" refers to A and the range exceeding A. The numerical range "below A" refers to A and the range less than A. In the numerical ranges recorded in stages in this specification, the upper limit or lower limit of the numerical range of a certain stage can be arbitrarily combined with the upper limit or lower limit of the numerical range of other stages. In the numerical ranges recorded in this specification, the upper limit or lower limit of the numerical range can be replaced by the value shown in the embodiment. "A or B" can include either A and B, or both. Unless otherwise specified, the materials exemplified in this specification can be used alone or in combination of two or more. When there are multiple substances equivalent to each component in the composition, unless otherwise specified, the content of each component in the composition refers to the total amount of the multiple substances present in the composition.
[0032] In this specification, "(meth)acryloyl" means methacryloyl or acryloyl. In this specification, "vinyl (thio)ether" means vinyl ether (-O-CH=CH2) or vinyl thioether (-S-CH=CH2). In this specification, "(poly)oxyalkylene" means oxyalkylene or polyoxyalkylene. Oxyalkylene refers to a group formed by direct bonding of an oxy group (-O-) and an alkylene group. Polyoxyalkylene refers to a group formed by two or more alkylene groups connected by an oxy group.
[0033] [Photocurable composition]
[0034] One embodiment of the present disclosure is a photocurable composition that can be applied using an inkjet device. The photocurable composition includes an aromatic monomer and a photopolymerization initiator.
[0035] <Aromatic Monomer>
[0036] The aromatic monomer has a first group including a naphthalene skeleton, anthracene skeleton or biphenyl skeleton and a second group including at least one selected from a (meth)acryloyl group and a vinyl (thio)ether group. The aromatic monomer may be a compound having one first group in the molecule.
[0037] The aromatic monomer may have one or more second groups in the molecule. The number of second groups may be one or more, may be three or less, or may be two or less. The number of second groups may be 1 to 2, or may be one. When the number of second groups is one, in addition to obtaining a photocurable composition with a lower viscosity at 25°C, the storage stability of the photocurable composition is further improved. When the aromatic monomer contains multiple second groups in the molecule, the multiple second groups present may be groups of the same type or groups of different types.
[0038] The first group is bonded to the second group via an oxygen atom (—O—), an alkylene group, or a (poly)oxyalkylene group, or is directly bonded to the second group.
[0039] The number of carbon atoms of the alkylene group may be, for example, 1 or more, 6 or less, 5 or less, 4 or less, 3 or less, or 2 or less. Examples of the alkylene group include methylene, ethylene, n-propylene, isopropylene, n-butylene, isobutylene, sec-butylene, tert-butylene, n-pentylene, isopentylene, sec-pentylene, tert-pentylene, n-hexylene, isohexylene, sec-hexylene, and tert-hexylene.
[0040] The (poly)oxyalkylene group may be, for example, a (poly)oxymethylene group, a (poly)oxyethylene group, a (poly)oxypropylene group, a (poly)oxybutylene group, a (poly)oxypentylene group or a (poly)oxyhexylene group.
[0041] The aromatic monomer may be a compound represented by the following formula (1) in which the first group includes a naphthalene skeleton and the second group includes a (meth)acryloyl group.
[0042]
[0043] In formula (1), n1 represents an integer of 1 to 8. n1 is 1 or more, and may be 7 or less, 6 or less, 5 or less, 3 or less, or 2 or less. n1 may be 1. When n1 is 1, in addition to obtaining a photocurable composition having a lower viscosity at 25° C., the storage stability of the photocurable composition is further improved.
[0044] Z 1 represents a single bond, an oxygen atom, an alkylene group, or a (poly)oxyalkylene group. 1 It can be bonded to any position of the naphthalene ring. 1 It can be an oxygen atom (-O-) or an oxyalkylene group (*1-Z 1a -O-*2). Here, *1 represents the bonding site to the naphthalene ring, and *2 represents the bonding site to the (meth)acryloyl group. 1a Z represents an alkylene group. 1a The alkylene group represented may be a methylene group (-CH2-).
[0045] R 1 represents a hydrogen atom or a methyl group. When n1 is 2 or more, the plurality of substituents bonded to the naphthalene ring may be groups of the same type or groups of different types.
[0046] The aromatic monomer may be a compound represented by the following formula (2) in which the first group includes an anthracene skeleton and the second group includes a (meth)acryloyl group.
[0047]
[0048] n2 represents an integer of 1 to 10. n2 is 1 or more, and may be 8 or less, 6 or less, 4 or less, 3 or less, or 2 or less.
[0049] Z 2 represents a single bond, an oxygen atom, an alkylene group or a (poly)oxyalkylene group. 2 It may be bonded to any position of the anthracene ring, for example, it may be bonded to the 1-position, 2-position or 9-position of the anthracene ring. 2 It can be an oxygen atom (-O-) or an oxyalkylene group (*1-Z 2a -O-*2). Here, *1 represents the bonding site to the anthracene ring, and *2 represents the bonding site to the (meth)acryloyl group. 1a Z represents an alkylene group. 2a The alkylene group represented may be a methylene group (-CH2-).
[0050] R 2 represents a hydrogen atom or a methyl group. When n2 is 2 or more, the plurality of substituents bonded to the anthracene ring may be groups of the same type or groups of different types.
[0051] The aromatic monomer may be a compound represented by the following formula (3) in which the first group includes a biphenyl skeleton and the second group includes a (meth)acryloyl group.
[0052]
[0053] n3 and n4 each independently represent an integer of 1 to 10. n3 and n4 are 1 or more, and each independently may be 8 or less, 6 or less, 4 or less, 3 or less, or 2 or less, and may be 1.
[0054] Z 3 and Z 4 Each independently represents a single bond, an oxygen atom, an alkylene group or a (poly)oxyalkylene group. 3 and Z 4 It can be bonded to any position of the benzene ring. 3 and Z 4 For example, it can be (poly)oxyalkylene (*3-OZ 5-O-*4). Here, *3 represents the bonding site to the benzene ring, and *4 represents the bonding site to the (meth)acryloyl group. 5 It may be an ethylene group (-CH2-CH2-).
[0055] R 3 and R 4 Each independently represents a hydrogen atom or a methyl group. When n3 and n4 are 2 or more, the plurality of substituents bonded to the benzene ring may be groups of the same type or groups of different types.
[0056] The aromatic monomer in which the first group includes a biphenyl skeleton and the second group includes a (meth)acryloyl group may be a compound represented by the following formula (3a).
[0057]
[0058] In formula (3a), Z 3 and R 3 With Z in formula (3) 3 and R 3 Same meaning.
[0059] The aromatic monomer may include one or more aromatic monomers whose first group includes a naphthalene skeleton, an aromatic monomer whose first group includes a naphthalene skeleton, an aromatic monomer whose first group includes an anthracene skeleton, or an aromatic monomer whose first group includes a biphenyl skeleton.
[0060] At least a part of the hydrogen atoms on the aromatic ring contained in the naphthalene skeleton, the anthracene skeleton and the biphenyl skeleton may be substituted with a substituent (other substituent) other than the second group and the group connecting the second group to the first group. Examples of the other substituent include an alkyl group, an alkoxy group, a sulfanyl group, a hydroxyl group, a thiol group, a chloro group, a bromo group, a fluoro group, and an amino group.
[0061] Examples of the aromatic monomer include naphthyl (meth)acrylate, naphthyl di(meth)acrylate, naphthyl methyl (meth)acrylate, naphthyl ethyl (meth)acrylate, anthracene (meth)acrylate, anthracene di(meth)acrylate, anthracene methyl (meth)acrylate, anthracene ethyl (meth)acrylate, (o-, m- or p-)phenylphenol (meth)acrylate, (o-, m- or p-)phenylphenol (meth)acrylate, methoxylated (o-, m- or p-)phenylphenol (meth)acrylate, and ethoxylated (o-, m- or p-)phenylphenol (meth)acrylate.
[0062] Based on the total amount of the photocurable composition, the content of the aromatic monomer can be 50% by mass or more, 60% by mass or more, 70% by mass or more, 80% by mass or more, 90% by mass or more, or 99% by mass or less, 95% by mass or less, or 90% by mass or less.
[0063] The content of the aromatic monomer containing a naphthalene skeleton in the first group can be 50 parts by mass or more, 60 parts by mass or more, 70 parts by mass or more, 80 parts by mass or more, 90 parts by mass or more, or 95 parts by mass or less, and can be 100 parts by mass or less, 99 parts by mass or less, 90 parts by mass or less, or 80 parts by mass or less, relative to 100 parts by mass of the total mass of the aromatic monomer.
[0064] The content of the aromatic monomer having one second group (monofunctional aromatic monomer) can be 50 parts by mass or more, 60 parts by mass or more, 70 parts by mass or more, 80 parts by mass or more, 90 parts by mass or more, or 95 parts by mass or more, or can be 100 parts by mass or less, 99 parts by mass or less, 90 parts by mass or less, or 80 parts by mass or less, relative to 100 parts by mass of the total mass of the aromatic monomer (100 parts by mass), If the content of the monofunctional aromatic monomer is within the above range, in addition to obtaining a photocurable composition with a lower viscosity at 25° C., the storage stability of the photocurable composition is further improved.
[0065] <Photopolymerization Initiator>
[0066] As the photopolymerization initiator, a photopolymerization initiator capable of polymerizing the above-mentioned aromatic monomer can be used.
[0067] Examples of the photopolymerization initiator include:
[0068] Benzophenone and its derivatives;
[0069] Benzil and its derivatives;
[0070] Anthraquinone and its derivatives;
[0071] Benzoin-type photopolymerization initiators such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal;
[0072] Acetophenone type photopolymerization initiators such as diethoxyacetophenone and 4-tert-butyltrichloroacetophenone;
[0073] 2-Dimethylaminoethyl benzoate;
[0074] p-Dimethylaminoethyl benzoate;
[0075] Diphenyl disulfide;
[0076] Thioxanthone and its derivatives;
[0077] Camphorquinone type photopolymerization initiators such as camphorquinone, 7,7-dimethyl-2,3-dioxabicyclo[2.2.1]heptane-1-carboxylic acid, 7,7-dimethyl-2,3-dioxabicyclo[2.2.1]heptane-1-carboxy-2-bromoethyl ester, 7,7-dimethyl-2,3-dioxabicyclo[2.2.1]heptane-1-carboxy-2-methyl ester, and 7,7-dimethyl-2,3-dioxabicyclo[2.2.1]heptane-1-carboxylic acid chloride;
[0078] α-Aminoalkylphenone type photopolymerization initiators such as 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1-one and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone;
[0079] Acylphosphine oxide type photopolymerization initiators such as benzoyldiphenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, benzoyldiethoxyphosphine oxide, 2,4,6-trimethylbenzoyldimethoxyphenylphosphine oxide, 2,4,6-trimethylbenzoyldiethoxyphenylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;
[0080] Methyl phenylglyoxylate;
[0081] Oxy-phenyl-acetic acid 2-[2-oxo-2-phenyl-acetoxy-ethoxy]-ethyl ester;
[0082] Oxy-phenyl-acetic acid 2-[2-hydroxy-ethoxy]-ethyl ester, etc.
[0083] The photopolymerization initiator may be a compound having one phosphorus atom and three aromatic groups, or may be an acylphosphine oxide type photopolymerization initiator having one phosphorus atom and three aromatic groups. When these photopolymerization initiators are included, in addition to better inkjet ejection stability, it becomes easier to obtain a cured film with a higher transmittance, and there is also a tendency that a cured film with a higher refractive index is easily obtained.
[0084] The aryl group may be, for example, a substituted or unsubstituted phenyl group. The substituted phenyl group may be a group in which at least one hydrogen atom in the benzene ring is replaced by an alkyl group (e.g., a methyl group). The substituted phenyl group may be a group in which 1 to 3 or 3 hydrogen atoms in the benzene ring are replaced by an alkyl group, and may be a 2,4,6-trimethylphenyl group.
[0085] As the acylphosphine oxide type photopolymerization initiator having one phosphorus atom and three aromatic groups, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, etc. can be mentioned. As 2,4,6-trimethylbenzoyldiphenylphosphine oxide, "Omnirad TPO H" manufactured by IGM Resins BV can be mentioned. As bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, "Omnirad 819" manufactured by IGM Resins BV can be mentioned.
[0086] Based on the total amount of the photocurable composition, the content of the photopolymerization initiator may be 0.05% by mass or more, 0.5% by mass or more, 1% by mass or more, or 2% by mass or more. Based on the total amount of the photocurable composition, the content of the photopolymerization initiator may be 10% by mass or less, 8% by mass or less, or 5% by mass or less. Based on the total amount of the photocurable composition, the content of the photopolymerization initiator may be 0.05-10% by mass, 0.05-8% by mass, 0.05-5% by mass, 0.5-10% by mass, 0.5-8% by mass, 0.5-5% by mass, 1-10% by mass, 1-8% by mass, 1-5% by mass, 2-10% by mass, 2-8% by mass, or 2-5% by mass.
[0087] <Other ingredients>
[0088] The photocurable composition may contain components (other components) other than the aromatic monomer and the photopolymerization initiator, or may not contain other components. The photocurable composition may contain, as other components, at least one selected from the group consisting of diaryl sulfide compounds, fluorine-containing compounds, nitroxide free radical compounds, reactive diluents, and stabilizers.
[0089] <Diaryl sulfide compound>
[0090] The diaryl sulfide compound is a compound containing two aryl groups and a sulfide bond (-S-) bonding the two aryl groups. When the photocurable composition contains the diaryl sulfide compound, a cured film having a higher refractive index is easily obtained.
[0091] The diaryl sulfide compound may be of the formula: Ar 1 -S-Ar 2 The compound represented by Ar 1 and Ar 2 Each independently represents an aryl group. 1 and Ar 2 The diaryl sulfide compounds may be used alone or in combination of two or more.
[0092] The aryl group may be, for example, a substituted or unsubstituted phenyl group. The substituent in the substituted phenyl group may be, for example, a hydroxyl group or a mercapto group, or may be a polymerizable functional group such as a (meth)acryloyl group or a vinyl (thio)ether group.
[0093] The diaryl sulfide compound may have at least one selected from the group consisting of a hydroxyl group, a mercapto group, a (meth)acryloyl group, and a vinyl (thio)ether group.
[0094] The diaryl sulfide compound may be, for example, a compound represented by the following formula (4).
[0095]
[0096] In formula (4), m1 and m2 each independently represent an integer of 1 to 5. 5 and R 6 Each independently represents a hydroxyl group, a mercapto group, a (meth)acryloyl group or a vinyl (thio)ether group. 5 and R 6 When multiple exist, multiple R 5 and R 6 They may be groups of the same type or groups of different types.
[0097] The diaryl sulfide compound may be a compound represented by the following formula (4a).
[0098]
[0099] In formula (4a), R 5 and R 6 With R in formula (4) 5 and R 6 Same meaning.
[0100] The content of the diaryl sulfide compound may be 1% by mass or more, 5% by mass or more, 10% by mass or more, 15% by mass or more, 20% by mass or more, 25% by mass or more, 30% by mass or more, or 35% by mass or more, based on the total amount of the photocurable composition. By adjusting the content of the diaryl sulfide compound within the above numerical range, a photocurable composition having a lower viscosity at 25° C. and better inkjet ejection stability can be obtained, and there is a tendency that a cured film having a higher refractive index can be easily obtained. The content of the diaryl sulfide compound may be 50% by mass or less, 45% by mass or less, 40% by mass or less, 35% by mass or less, 30% by mass or less, 25% by mass or less, 20% by mass or less, or 15% by mass or less, based on the total amount of the photocurable composition. By adjusting the content of the diaryl sulfide compound within the above numerical range, there is a tendency that a cured film having a higher transmittance can be easily obtained.
[0101] <Fluorinated compounds>
[0102] The photocurable compound preferably contains a compound having a fluorine group (hereinafter also referred to as a "fluorine-containing compound"). As a result, the surface free energy of the sealant becomes lower, not only the ejection property of the inkjet device is further improved, but also it becomes easier to follow fine unevenness, and there is a tendency that the flatness of the coating film is further improved. If the flatness becomes good, there is a tendency that the generation of pinholes is further suppressed, and the generation of display defects is further suppressed.
[0103] When the photocurable compound includes a fluorine-containing compound, the content of the fluorine-containing compound can be, for example, 0.1% by mass or more, preferably 0.5% by mass or more, and more preferably 1% by mass or more, based on the total amount of the photocurable compound. When the photocurable compound contains a fluorine-containing compound, from the perspective of suppressing the reduction of the refractive index and further improving the flatness, the content of the fluorine-containing compound is preferably 5% by mass or less, and more preferably 2% by mass or less, based on the total amount of the photocurable compound. The content of the fluorine-containing compound can be, for example, 0.1% by mass or more and 2% by mass or less.
[0104] The number of fluorine groups in the fluorine-containing compound may be, for example, 1 or more, preferably 2 or more, more preferably 3 or more. The number of fluorine groups in the fluorine-containing compound is not particularly limited, and may be, for example, 40 or less, preferably 30 or less.
[0105] The content of fluorine atoms can be, for example, 1% by mass or more relative to the total amount of fluorine-containing compounds, preferably 2% by mass or more, more preferably 5% by mass or more. Utilizing fluorine-containing compounds that satisfy such a content range can more significantly bring into play the above-mentioned effect. In addition, the content of fluorine atoms can be, for example, 75% by mass or less relative to the total amount of fluorine-containing compounds, preferably 70% by mass or less, more preferably 65% by mass or less.
[0106] The fluorine-containing compound may have a radical polymerizable group. The radical polymerizable group may be, for example, a (meth)acryloyl group. The number of radical polymerizable groups possessed by the fluorine-containing compound may be one or more. From the viewpoint of becoming easy to obtain a cured body with a lower glass transition temperature, the number of radical polymerizable groups possessed by the fluorine-containing compound may be one. From the viewpoint of becoming easy to obtain a cured body with a higher glass transition temperature, the number of radical polymerizable groups possessed by the fluorine-containing compound may be two or more. The upper limit of the number of radical polymerizable groups possessed by the fluorine-containing compound is not particularly limited. The number of radical polymerizable groups possessed by the fluorine-containing compound may be, for example, four or less, preferably three or less, more preferably two or less, from the viewpoint of becoming easy to obtain a cured body with better flexibility.
[0107] Examples of the fluorine-containing compound include 2,2,2-trifluoroethyl (meth)acrylate, 2,2,3,3-tetrafluoropropyl (meth)acrylate, 1H,1H,5H-octafluoropentyl (meth)acrylate, 1H,1H,2H,2H-tridecafluorooctyl (meth)acrylate, and 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9-hexafluoro-1,10-decane di(meth)acrylate.
[0108] <Nitrogen oxide radical compounds>
[0109] The nitroxide free radical compound is a stable free radical compound (RNO·) containing a disubstituted NO· atomic group (N-oxyl group). When the photocurable composition contains the nitroxide free radical compound, the number of particles in the liquid with a particle size of 1 μm or more contained in the photocurable composition becomes smaller, and as a result, it becomes easier to suppress nozzle clogging. Furthermore, when the photocurable composition contains the nitroxide free radical compound, the inkjet ejection stability becomes more excellent.
[0110] The nitroxide radical compound may further contain at least one selected from the group consisting of a hydroxyl group, a mercapto group, a (meth)acryloyl group, and a vinyl (thio)ether group.
[0111] Examples of the nitroxide radical compound include 2,2,6,6-tetramethylpiperidin-1-oxyl (TEMPO), 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-oxyl (TEMPOL), 4-acetoxy-2,2,6,6-tetramethylpiperidin-1-oxyl (TEMPO-acetate), 4-acetylamino-2,2,6,6-tetramethylpiperidin-1-oxyl (acetylamino-TEMPO), and 4-(meth)acryloyloxy-2,2,6,6-tetramethylpiperidin-1-oxyl (TEMPO-(meth)acrylate).
[0112] The nitroxide radical compound may be, for example, a compound represented by the following formula (5).
[0113]
[0114] In the formula, X independently represents an alkyl group. The alkyl group represented by X may be, for example, an alkyl group having 1 to 6 or 1 to 3 carbon atoms, or may be a methyl group. Y represents a hydrogen atom, a hydroxyl group, a mercapto group, a (meth)acryloyl group, or a vinyl (thio)ether group.
[0115] The content of the nitroxide radical compound may be 0.05 mass % or more, 0.10 mass % or more, 0.15 mass % or more, or 0.20 mass % or more, based on the total amount of the photocurable composition. The content of the nitroxide radical compound may be 1.5 mass % or less, 1.0 mass % or less, 0.60 mass % or less, or 0.50 mass % or less, based on the total amount of the photocurable composition. The content of the nitroxide free radical compound can be 0.05 mass% or more and 1.5 mass% or less, 0.05 mass% or more and 1.0 mass% or less, 0.05 mass% or more and 0.60 mass% or less, 0.05 mass% or more and 0.50 mass% or less, 0.10 mass% or more and 1.5 mass% or less, 0.10 mass% or more and 1.0 mass% or less, 0.10 mass% or more and 0.50 mass% or less, 0.15 mass% or more and 1.5 mass% or less, 0.15 mass% or more and 1.0 mass% or less, 0.15 mass% or more and 0.50 mass% or less, 0.20 mass% or more and 1.5 mass% or less, 0.20 mass% or more and 1.0 mass% or less, or 0.20 mass% or more and 0.50 mass% or less.
[0116] <Reactive diluent>
[0117] The reactive diluent is a compound added for the purpose of adjusting the viscosity of the photocurable composition. When the photocurable composition contains a reactive diluent, a photocurable composition with a lower viscosity at 25° C. can be obtained, and a cured film with a higher transmittance can be easily formed. Furthermore, when the photocurable composition contains a reactive diluent, the inkjet ejection stability becomes more excellent.
[0118] The reactive diluent may have at least one polymerizable functional group selected from (meth)acryloyl and vinyl (thio)ether groups. The reactive diluent may also have one or more polymerizable functional groups in the molecule. The total number of polymerizable functional groups in the reactive diluent may be more than one, may be less than two, and for example, may be one.
[0119] The viscosity of the reactive diluent at 25°C may be 10 mPa·s or less, 8 mPa·s or less, 6 mPa·s or less, 4 mPa·s or less, or 3 mPa·s or less. The viscosity of the reactive diluent at 25°C may be, for example, more than 0 mPa·s or more than 1 mPa·s. The viscosity of the reactive diluent at 25°C is measured using a cone-plate viscometer (e.g., manufactured by Eikon Seiki Co., Ltd., HBDV3T, cone-plate: CPA-40Z) at 25°C and 50 rpm.
[0120] The reactive diluent may be a compound having the above-mentioned polymerizable functional group and having a viscosity of 10 mPa·s or less at 25° C. Examples of the reactive diluent include phenyl (meth)acrylate, methylphenyl (meth)acrylate, ethylphenyl (meth)acrylate, benzyl (meth)acrylate, phenoxyethyl methacrylate, and 2-(2-hydroxyethoxy)ethyl (meth)acrylate.
[0121] The content of the reactive diluent may be 1 mass % or more, 3 mass % or more, 5 mass % or more, or 8 mass % or less, and 20 mass % or less, 15 mass % or less, or 12 mass % or less, based on the total amount of the photocurable composition.
[0122] <Stabilizer>
[0123] The stabilizer is, for example, a polymerization inhibitor. The stabilizer is preferably a stabilizer other than a stabilizer corresponding to a nitroxide free radical compound. Examples of the stabilizer include quinone, hydroquinone, methoquinone, tert-butyl hydroquinone, 4-tert-butyl catechol, dibutylhydroxytoluene, and phenothiazine.
[0124] The content of the stabilizer may be, for example, 0.05 mass % or more, 0.10 mass % or more, 0.15 mass % or more, 0.20 mass % or more, or 0.25 mass % or more, based on the total amount of the photocurable composition. The content of the stabilizer may be 1.5 mass % or less, 1.0 mass % or less, 0.50 mass % or less, or 0.40 mass % or less, based on the total amount of the photocurable composition.
[0125] <Content of Monofunctional Monomer>
[0126] Based on the total amount of the photocurable composition, the content of the compound having one (meth) acryloyl group and a vinyl (thio) ether group (hereinafter also referred to as "monofunctional monomer") contained in the photocurable composition can be 50% by mass or more, 60% by mass or more, 70% by mass or more, 80% by mass or more, 90% by mass or more, or 99% by mass or less, 95% by mass or less, 90% by mass or less, 85% by mass or less, or 80% by mass or less. Based on the total amount of the photocurable composition, the content of the monofunctional monomer can be 50% by mass or more and 100% by mass or less, 60% by mass or more and 100% by mass or less, 70% by mass or more and 100% by mass or less, 80% by mass or more, 90% by mass or more and 100% by mass or less, or 95% by mass or more and 100% by mass or less. If the content of the monofunctional monomer is within the above range, in addition to obtaining a photocurable composition having a lower viscosity at 25°C, the storage stability of the photocurable composition is further improved.
[0127] <Content of other ingredients>
[0128] Based on the total mass of the photocurable composition, the content of components other than the aromatic monomer, diaryl sulfide compound, fluorine-containing compound, nitroxide free radical compound, stabilizer, reactive diluent and photopolymerization initiator in the photocurable composition can be 0 mass % to 5 mass %, 0 mass % to 3 mass % or 0 mass % to 1 mass %, and can be 0 mass %.
[0129] <Refractive Index>
[0130] The refractive index of the cured film of the photocurable composition at a wavelength of 486 nm is 1.55 or more. The refractive index is measured under the conditions described in the Examples described below.
[0131] The refractive index may be 1.56 or more, 1.58 or more, 1.60 or more, 1.62 or more, 1.64 or more, 1.66 or more, or 1.68 or more, and may be less than 1.90, 1.85 or less, 1.80 or less, 1.75 or less, or 1.70 or less. The refractive index may be 1.55 or more and less than 1.90, 1.60 or more and 1.80 or less, 1.60 or more and 1.75 or less, 1.60 or more and 1.70 or less, 1.62 or more and 1.80 or less, 1.62 or more and 1.75 or less, 1.62 or more and 1.70 or less, 1.64 or more and 1.80 or less, 1.64 or more and 1.75 or less, 1.64 or more and 1.70 or less, 1.66 or more and 1.80 or less, 1.66 or more and 1.75 or less, 1.66 or more and 1.70 or less, 1.68 or more and 1.80 or less, 1.68 or more and 1.75 or less, or 1.68 or more and 1.70 or less.
[0132] The refractive index can be adjusted within the above range by, for example, controlling the type and amount of the aromatic monomer used in the photocurable composition, using a diaryl sulfide compound in the photocurable composition and controlling the amount used, or any combination thereof.
[0133] <Number of particles in liquid>
[0134] The photocurable composition may be liquid at 23°C, and may be liquid at 23°C and normal pressure. The number of particles in the liquid having a particle size of 1 μm or more contained in the photocurable composition at 23°C may be 10 particles / ml or less, 8 particles / ml or less, 6 particles / ml or less, 4 particles / ml or less, 2 particles / ml or less, or 1 particle / ml or less. The number of particles in the liquid may be, for example, 0 to 10 particles / ml. If the number of particles in the liquid having a particle size of 1 μm or more contained in the photocurable composition at 23°C is within the above range, it becomes easy to suppress poor inkjet due to nozzle clogging.
[0135] The number of particles in the photocurable composition was measured using a liquid particle counter (KS-42B manufactured by Rion Corporation) at 23° C. The detailed measurement conditions are as described in the examples described below.
[0136] The number of particles in the photocurable composition can be adjusted by using a nitroxide radical compound, for example.
[0137] <Viscosity>
[0138] The viscosity of the photocurable composition at 25° C. may be, for example, 45 mPa·s or less, 40 mPa·s or less, 35 mPa·s or less, or 30 mPa·s or less. The viscosity of the photocurable composition at 25° C. may be, for example, 5 mPa·s or more, 10 mPa·s or more, 15 mPa·s or more, 20 mPa·s or more, or 25 mPa·s or more.
[0139] The viscosity of the photocurable composition at 25°C after being stored at 40°C for 120 hours may be, for example, 50 mPa·s or less, 40 mPa·s or less, 30 mPa·s or less, or 25 mPa·s or less. The viscosity of the photocurable composition at 25°C after being stored at 40°C for 120 hours may be, for example, 5 mPa·s or more, 10 mPa·s or more, 15 mPa·s or more, 20 mPa·s or more, or 25 mPa·s or more.
[0140] The viscosity is measured at 25° C. and 50 rpm using a cone-plate viscometer (for example, HB DV3T manufactured by Eiko Seiki Co., Ltd., cone-plate: CPA-40Z).
[0141] <Method for producing photocurable composition>
[0142] The photocurable composition can be produced, for example, by a method including a mixing step of mixing an aromatic monomer, a photopolymerization initiator, and, if necessary, other components, and a filtration step of filtering the obtained mixture.
[0143] The mixing step may be performed while heating the components. The temperature during mixing in the mixing step may be, for example, 45° C. or more or 55° C. or more, 75° C. or less or 65° C. or less. The stirring speed during mixing may be, for example, 50 rpm or more or 100 rpm or more, 300 rpm or less or 200 rpm or less.
[0144] <Application of Photocurable Composition>
[0145] The photocurable composition of the present embodiment can be suitably used for forming a light extraction layer (light extraction film), for example.
[0146] [cured material]
[0147] One embodiment of the present disclosure is a cured product of the above-mentioned photocurable composition. The cured product may be a cured film formed by curing a coating film of the photocurable composition. The film thickness of the cured film may be, for example, 10 to 30 μm.
[0148] The cured product may be a polymer containing a polymerizable monomer containing an aromatic monomer. The polymerizable monomer may further contain a compound containing a polymerizable functional group in addition to the aromatic monomer. The compound containing a polymerizable functional group may, for example, contain a compound having a polymerizable functional group such as a (meth)acryloyl group and a vinyl (thio)ether group (e.g., a diaryl sulfide, a fluorinated compound, a reactive diluent, or a nitroxide free radical compound).
[0149] The cured product can be used as a constituent material for a light emitting display device such as a light extraction layer (light extraction film), for example. Figure 1 FIG. 1 is a schematic cross-sectional view showing one embodiment of a laminate used in an optical component of a light-emitting display device. Figure 1 As shown, in the laminate 10, the light extraction layer 1 is disposed between the first layer 2 containing a material having a high refractive index exceeding 1.80 and the second layer 3 containing a material having a low refractive index less than 1.55. By disposing the light extraction layer 1 between the first layer 2 and the second layer 3 having different refractive indices, the decrease in light extraction efficiency associated with the total reflection phenomenon of light from the light-emitting layer at the interface having a refractive index difference is suppressed, and as a result, the brightness improvement effect can be exerted. The first layer 2 containing a material having a high refractive index can be, for example, an inorganic layer composed of a silicon nitride film (refractive index 1.9) or an indium tin oxide (ITO) layer (refractive index 2.1). The second layer 3 containing a material having a low refractive index can be, for example, a resin layer composed of a polarizer or an optical adhesive (refractive index less than 1.55).
[0150] The cured product can be manufactured by a method including a coating film forming step of forming a coating film of the photocurable composition and a light irradiation step of irradiating the coating film with light. The coating film can be formed using an inkjet device. The inkjet device can use a known inkjet device (for example, DMP2850 manufactured by Fujifilm Corporation).
[0151] The conditions of light irradiation in the light irradiation step can be appropriately set according to the type of photopolymerization initiator, etc. The irradiation light can include light with a wavelength of 395 nm. There is no particular limitation on the light source, and for example, an LED lamp (for example, UV-LED LIGHT SOURCE H-4MLH200-V1 manufactured by HOYA Corporation) can be used. The conditions of light irradiation can be, for example, a cumulative light amount of 2000 mJ / cm at a wavelength of 395 nm. 2 ~4000mJ / cm 2The light irradiation may be performed under an inert gas atmosphere. Examples of the inert gas include nitrogen.
[0152] [Luminous display device]
[0153] One embodiment of the present disclosure is a light-emitting display device including a cured product of the above-mentioned photocurable composition. The light-emitting display device may be an organic EL display. The light-emitting display device may include a light extraction layer including a cured product of the above-mentioned photocurable composition.
[0154] Example
[0155] The present disclosure will be specifically described below using examples, but the present disclosure is not limited to the following examples.
[0156] <Preparation of Photocurable Compositions Described in Examples 1 to 28 and Comparative Examples 1 to 3>
[0157] The photocurable compositions described in Examples 1 to 28 and Comparative Examples 1 to 3 were prepared using the aromatic monomers, diaryl sulfide compounds, fluorine-containing compounds, nitroxide radical compounds, reactive diluents, photopolymerization initiators, and stabilizers listed in Tables 1 to 7. The specific steps are as follows.
[0158] Aromatic monomers, diaryl sulfide compounds, fluorine-containing compounds, nitroxide radical compounds, reactive diluents, photopolymerization initiators, and stabilizers were weighed as described in Tables 1 to 7, and stirred for 1 hour at 150 rpm and 60° C. using a stirrer (Three-one-motor) to obtain a mixture. The mixture was filtered using a PTFE membrane filter having a pore size of 0.45 μm to obtain a photocurable composition.
[0159] The data of the compounds used this time are described below.
[0160] [Aromatic Monomers]
[0161] Naphthyl acrylate: Fujifilm Wako Pure Chemical Industries, Ltd.
[0162] ·Naphthyl diacrylate (Ac-N): AIR WATER PERFORMANCE CHEMICAL
[0163] · Light Acrylate NMT-A: Kyoeisha Chemical Co., Ltd.
[0164] ·Anthracene methyl methacrylate (9-anthracenylmethyl methacrylate): Tokyo Chemical Industry Co., Ltd.
[0165] · Acrylic acid ethoxylated o-phenylphenol ester (A-LEN-10): Shin-Nakamura Chemical Industry Co., Ltd.
[0166] [Diaryl sulfide compounds]
[0167] ·Bis(4-hydroxyphenyl)sulfide: Tokyo Chemical Industry Co., Ltd.
[0168] ·Bis(4-mercaptophenyl)sulfide: Tokyo Chemical Industry Co., Ltd.
[0169] ·Bis(4-methacryloylthiophenyl)sulfide: Tokyo Chemical Industry Co., Ltd.
[0170] Bis(4-vinylthiophenyl)sulfide: Alpha Chemistry
[0171] [Fluorinated compounds]
[0172] ·2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9-hexafluoro-1,10-decane diacrylate (LINC-162A): Kyoeisha Chemical Co., Ltd.
[0173] ·1H,1H,2H,2H-tridecafluorooctyl acrylate (Viscoat 13F): Osaka Organic Chemical Industry Co., Ltd.
[0174] [Nitrogen oxide free radical compounds]
[0175] ·2,2,6,6-Tetramethylpiperidin-1-oxyl (TEMPO): Sigma-Aldrich
[0176] ·4-Hydroxy-2,2,6,6-tetramethylpiperidin-1-oxyl (TEMPOL): Sigma-Aldrich
[0177] · 4-Methacryloyloxy-2,2,6,6-tetramethylpiperidin-1-oxyl (TEMPO-methacrylate): Sigma-Aldrich
[0178] [Stabilizer]
[0179] · p-Methoxyphenol (quinone): Seiko Chemical Co., Ltd.
[0180] [Reactive diluent]
[0181] Benzyl acrylate (Viscoat #160): Osaka Organic Chemical Industry Co., Ltd.
[0182] Benzyl methacrylate (Light Ester BZ): Kyoeisha Chemical Co., Ltd.
[0183] · Phenoxyethyl methacrylate (Light Ester PO): Kyoeisha Chemical Co., Ltd.
[0184] ·2-(2-vinyloxyethoxy)ethyl methacrylate (VEEM): Nippon Shokubai Co., Ltd.
[0185] [Photopolymerization initiator]
[0186] 2,4,6-Trimethylbenzoyldiphenylphosphine oxide (Omnirad TPO H): IGM Resins
[0187] ·Bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide) (Omnirad 819): IGM Resins
[0188] Omnirad 651 (2,2-dimethoxy-2-phenylacetophenone): IGM Resins
[0189] <Evaluation>
[0190] [Viscosity and its change over time (storage stability)]
[0191] The viscosity of the photocurable composition was measured using a cone and plate viscometer (HB DV3T, cone and plate: CPA-40Z, manufactured by Eikon Seiki Co., Ltd.) at 25°C and 50 rpm. The viscosity of the photocurable composition aged at 40°C for 120 hours was similarly measured at 25°C and 50 rpm.
[0192] [Number of particles]
[0193] The number of particles in the photocurable composition was counted using a particle counter (Rion, KS-42B) at 23°C. The measurement conditions were as follows: solvent: acetone for electronics (Fujifilm Wako Pure Chemical Industries, Ltd.), sample suction speed: 10 ml / min, sample suction volume: 100 ml, waste liquid discharge speed: 100 ml / min, waste liquid discharge times: 3 times. The cumulative value of the number of particles larger than 1 μm per 1 ml of the sample was set as the number of particles larger than 1 μm (pieces / ml).
[0194] [Inkjet ejection stability]
[0195] The photocurable composition was filled in the inkjet cartridge of the inkjet device (manufactured by Fujifilm Corporation, DMP2850, 16 nozzles), and the initial ejection speed was 6.5 (±0.1) m / s, and the ejection temperature was 35°C. After ejection for 30 minutes, the ejection state of all 16 nozzles was confirmed, and the proportion of nozzles with ejection failure was calculated. The presence or absence of ejection failure was obtained by measuring the number of nozzles that did not have any flying deflection (more than 5°), reduced ejection speed (less than 6.0 m / s), or non-ejection.
[0196] [Curing film production]
[0197] Using an inkjet device (manufactured by Fujifilm Corporation, DMP2850), a photocurable composition was dripped onto a 35 mm square area at a discharge temperature of 35°C so that the film thickness became 10 μm, and then the film was left to stand under a yellow light in an air atmosphere (23°C, 40% RH) in a clean room (class 1000). Next, in a nitrogen atmosphere, an LED lamp emitting light at a wavelength of 395 nm (manufactured by HOYA Corporation, UV-LED LIGHT SOURCE H-4MLH200-V1) was used to illuminate the photosensitive film at a wavelength of 395 nm with a cumulative light amount of 3000 mJ / cm 2 The cured film is obtained by irradiating light under the conditions of
[0198] [Refractive index]
[0199] The refractive index of the cured film at a wavelength of 486 nm was measured using a spectroscopic ellipsometer (SE-2000 manufactured by HORIBA Corporation).
[0200] [Transmittance]
[0201] The spectral transmittance of the cured film at 400 nm was measured using an ultraviolet-visible spectrophotometer (“UV-2550” manufactured by Shimadzu Corporation) to determine the transparency.
[0202] <Evaluation of Flatness>
[0203] On a 70mm×70mm×0.7mmt substrate (alkali-free glass (Eagle XG manufactured by Corning)), a groove of 25μm×25μm×3μmt was made by etching with a space of 10μm in the front, back, left and right. Next, a 200nm SiN film was formed on the substrate provided with the groove by a plasma CVD method. Next, an inkjet ejection device (MID500B manufactured by Musashiengineering, a solvent-based nozzle "MID nozzle") was used to pattern-coat the resin composition in a manner of 15mm×15mm×8μmt. It should be noted that before pattern coating, the substrate was cleaned with acetone and isopropyl alcohol, respectively, and then cleaned for 5 minutes using a UV ozone cleaning device UV-208 manufactured by Technovision. After pattern coating, the film was placed in a nitrogen atmosphere at a temperature of 23°C and a relative humidity of 50% for 4 minutes. In the nitrogen atmosphere, an LED lamp emitting light at a wavelength of 395 nm (UV-LED LIGHT SOURCE H-4MLH200-V1 manufactured by HOYA) was used to generate a cumulative light intensity of 1500 mJ / cm 2 The resin composition is photocured under conditions.
[0204] Next, the thickness of the cured film was measured in a direction perpendicular to the direction of head movement using a stylus profilometer (DektakXT manufactured by BRUKER). The difference between the maximum thickness and the minimum thickness in a plane obtained by removing 2 mm from the edge of the cured film was used as the evaluation result of flatness.
[0205] [Table 1]
[0206]
[0207] [Table 2]
[0208]
[0209] [Table 3]
[0210]
[0211] [Table 4]
[0212]
[0213] [Table 5]
[0214]
[0215] [Table 6]
[0216]
[0217] [Table 7]
[0218]
[0219] Explanation of symbols
[0220] 1...light extraction layer, 2...first layer, 3...second layer, 10...laminated body
Claims
1. A photocurable composition comprising an aromatic monomer and a photopolymerization initiator, The aromatic monomer has a first group including a naphthalene skeleton, an anthracene skeleton or a biphenyl skeleton and a second group including at least one selected from a (meth)acryloyl group and a vinyl (thio)ether group, The first group is bonded to the second group via an oxygen atom, an alkylene group or a (poly)oxyalkylene group, or is directly bonded to the second group, The refractive index of the cured film at a wavelength of 486 nm is 1.55 or more.
2. The photocurable composition according to claim 1, wherein The content of the aromatic monomer is 50% by mass or more based on the total amount of the photocurable composition.
3. The photocurable composition according to claim 1 or 2, wherein Further included is a diaryl sulfide compound.
4. The photocurable composition according to claim 3, wherein The diaryl sulfide compound has at least one selected from the group consisting of a hydroxyl group, a mercapto group, a (meth)acryloyl group, and a vinyl (thio)ether group.
5. The photocurable composition according to claim 3, wherein The content of the diaryl sulfide compound is 20% by mass or more based on the total amount of the photocurable composition.
6. The photocurable composition according to claim 1 or 2, wherein Further comprising a nitroxide radical compound.
7. The photocurable composition according to claim 6, wherein The nitroxide radical compound has at least one selected from the group consisting of a hydroxyl group, a mercapto group, a (meth)acryloyl group, and a vinyl (thio)ether group.
8. The photocurable composition according to claim 6, wherein The content of the nitroxide radical compound is 0.05 mass % or more and 0.60 mass % or less based on the total amount of the photocurable composition.
9. The photocurable composition according to claim 1 or 2, wherein further comprising a reactive diluent, The reactive diluent has at least one polymerizable functional group selected from a (meth)acryloyl group and a vinyl (thio)ether group, The reactive diluent has a viscosity of 10 mPa·s or less at 25° C.
10. The photocurable composition according to claim 1 or 2, wherein The content of the compound having one (meth)acryloyl group and a vinyl (thio)ether group is 50% by mass or more based on the total amount of the photocurable composition.
11. The photocurable composition according to claim 1 or 2, wherein The photopolymerization initiator is a compound having one phosphorus atom and three aromatic groups.
12. The photocurable composition according to claim 1 or 2, wherein Compounds having a fluorine group are included.
13. The photocurable composition according to claim 12, wherein The content of the compound having a fluorine group is 0.1% by mass or more and 5% by mass or less based on the total mass of the photocurable composition.
14. The photocurable composition according to claim 1 or 2, wherein The photocurable composition is liquid at 23°C. The number of particles in the liquid having a particle size of 1 μm or more contained in the photocurable composition at 23° C. is 10 particles / ml or less.
15. The photocurable composition according to claim 1 or 2, wherein The photocurable composition has a viscosity at 25° C. of 30 mPa·s or less after being stored in a 40° C. environment for 120 hours.
16. The photocurable composition according to claim 1 or 2, which is a photocurable composition that can be applied by an inkjet device.
17. A cured product of the photocurable composition according to claim 1 or 2.
18. A light-emitting display device comprising a cured product of the photocurable composition according to claim 1 or 2.
19. The light emitting display device according to claim 18, which is an organic EL display.
Citation Information
Patent Citations
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