Metal plate and method for manufacturing same, and method for manufacturing metal mask

Abstract

The invention provides a metal plate, a method for manufacturing the same, and a method for manufacturing a metal mask. Provided are: a long metal plate having high homogeneity over a larger range; a method for producing the metal plate; a metal mask obtained from the metal plate; and a method for producing the metal mask. Provided is a long metal plate for manufacturing a metal mask, the metal plate being characterized in that when the difference in elongation (En) per unit length (L0) in the longitudinal direction corresponding to an arbitrary position (n) in the width direction of the metal plate is measured at each of a plurality of arbitrary positions in the longitudinal direction, the difference in elongation (En) per unit length (L0) in the width direction of the metal plate is measured at the plurality of arbitrary positions, and the difference in elongation (En) per unit length (L0) in the width direction of the metal plate is measured at the plurality of arbitrary positions. The difference in the elongation difference rate (En) in the central portion in the width direction is 9.0 * 10 <-6 > or less, and the central portion is an 80% portion in the width direction of the metal plate excluding two 10% side portions in the width direction.

Description

Technical Field

[0001] The present invention relates to a metal plate and a method for manufacturing the same, and a method for manufacturing a metal mask. Background Art

[0002] In recent years, display devices used in portable devices such as smartphones and tablet PCs have been required to be highly refined, for example, to have a pixel density of 500 ppi or more. In addition, the demand for ultra-high definition (UHD) is also increasing in portable devices, in which case the pixel density of the display device is preferably 800 ppi or more.

[0003] Among display devices, organic EL display devices have attracted attention due to their good responsiveness, low power consumption, and high contrast. As a method for forming pixels of an organic EL display device, there is a known method of forming pixels in a desired pattern using a metal mask having through holes arranged in a desired pattern. Specifically, first, the metal mask is brought into close contact with a substrate for an organic EL display device, and then the closely attached metal mask and substrate are put into a vapor deposition device together to perform a vapor deposition process of vapor-depositing an organic material on the substrate. Thus, pixels containing organic materials can be formed on the substrate in a pattern corresponding to the pattern of the through holes of the metal mask.

[0004] As a method for manufacturing a metal mask, there is known a method for forming a through hole on a metal plate by etching using a photolithography technique. For example, first, a first resist pattern is formed on the first surface of the metal plate by an exposure and development process, and a second resist pattern is formed on the second surface of the metal plate by an exposure and development process. Next, the area on the first surface of the metal plate that is not covered by the first resist pattern is etched to form a first recess on the first surface of the metal plate. Thereafter, the area on the second surface of the metal plate that is not covered by the second resist pattern is etched to form a second recess on the second surface of the metal plate. At this time, etching is performed in a manner that the first recess and the second recess are interconnected, thereby being able to form a through hole that penetrates the metal plate (for example, refer to patent document 1).

[0005] Patent Document 1: Japanese Patent Application Publication No. 2014-148743

[0006] The metal plate used to make the metal mask is made, for example, by rolling a base material made of an iron alloy containing nickel. The thinner the metal plate is rolled, the higher the dimensional accuracy of the through holes of the obtained metal mask is. However, on the other hand, a lot of corrugations appear on the metal plate due to rolling. If such corrugations appear, the dimensional accuracy of the through holes formed in the metal plate may be reduced.

[0007] Therefore, from the viewpoint of ensuring the quality of the metal plate, the evaluation of the corrugation shape of the metal plate is important. On the other hand, the metal plate obtained by rolling is very long. Therefore, from the viewpoint of ensuring the quality of the metal plate as a whole, the evaluation of the corrugation shape of the metal plate is preferably implemented in a larger range.

[0008] However, conventional measuring devices for evaluating the corrugation of metal plates are devices that perform single-piece measurement on a measurement sample cut out of a metal plate. Therefore, it is difficult to evaluate the corrugation of a metal plate over a large area. In addition, in a long metal plate, there are parts where the corrugation is almost invisible, and there are also parts where the corrugation is visible. Therefore, even if a result that the corrugation is less is obtained in a single-piece measurement, it is only a local result, and it cannot be said that the corrugation is less throughout the entire long metal plate.

[0009] In addition, when an etching process using photolithography is performed on a roll of metal plate, if the measurement sample is cut from the middle of the roll of metal plate, the roll itself is cut, which greatly affects the etching process. Therefore, in this case, the measurement sample is cut from the end of the roll of metal plate. Therefore, in the conventional single-piece measurement device, it is difficult to evaluate the corrugation shape of a wide range including the middle of the roll of metal plate. Summary of the invention

[0010] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a long metal plate having high homogeneity over a wider range, a method for manufacturing the same, and a method for manufacturing a metal mask using the metal plate.

[0011] The metal plate of one embodiment of the present disclosure is a long metal plate used to manufacture a metal mask, wherein:

[0012] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction,

[0013] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0014] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

[0015] The metal plate of one embodiment of the present disclosure is a long metal plate used to manufacture a metal mask, wherein:

[0016] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction,

[0017] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0018] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction.

[0019] The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

[0020] A method for manufacturing a metal plate according to an embodiment of the present disclosure is a method for manufacturing a long metal plate for manufacturing a metal mask, wherein:

[0021] The method for manufacturing a metal plate comprises a rolling step of rolling a base material to obtain a long metal plate.

[0022] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction of the metal plate,

[0023] The difference in the elongation difference En at the plurality of positions is 9.0×10 -6 the following.

[0024] A method for manufacturing a metal plate according to an embodiment of the present disclosure is a method for manufacturing a long metal plate for manufacturing a metal mask, wherein:

[0025] The method for manufacturing a metal plate comprises a rolling step of rolling a base material to obtain a long metal plate.

[0026] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction of the metal plate,

[0027] The difference in the elongation difference En at the plurality of positions is 9.0×10 -6 the following,

[0028] The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

[0029] A method for manufacturing a metal mask according to one embodiment of the present disclosure includes:

[0030] A rolling process in which a base material is rolled to prepare a long metal plate; and

[0031] an etching step of forming the metal mask by etching the metal plate,

[0032] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction of the metal plate,

[0033] The difference in the elongation difference En at the plurality of positions is 9.0×10 -6 the following.

[0034] A method for manufacturing a metal mask according to one embodiment of the present disclosure includes:

[0035] A rolling process in which a base material is rolled to prepare a long metal plate; and

[0036] an etching step of forming the metal mask by etching the metal plate,

[0037] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction of the metal plate,

[0038] The difference in the elongation difference En at the plurality of positions is 9.0×10 -6 the following,

[0039] The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

[0040] According to the present invention, it is possible to provide a long metal plate having high homogeneity over a wider range, a method for manufacturing the same, and a method for manufacturing a metal mask using the metal plate. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] Figure 1A This is a schematic perspective view showing an example of the long metal plate of the present disclosure.

[0042] Figure 1B yes Figure 1A An enlarged view of the area Sk of the long metal plate.

[0043] Figure 1C yes Figure 1B A cross-sectional view of a metal plate in the length direction.

[0044] Figure 1D It is a bird's-eye view Figure 1B Top view of the metal plate.

[0045] Figure 1E It shows that the length of each position n in the width direction is measured along the length direction. Figure 1D Conceptual diagram of the relationship between the surface and length of a metal plate.

[0046] Figure 1F It is used to illustrate Figure 1B A graph of the differential elongation En of a metal plate at each position n in the width direction.

[0047] Figure 1G This graph displays the elongation differential distribution of a long metal plate at any number of positions in the longitudinal direction by overlapping each other.

[0048] Figure 1H This is a schematic perspective view showing another example of the long metal plate of the present disclosure.

[0049] Figure 2A This is a partially enlarged view showing an example of a long metal plate having a corrugated shape.

[0050] Figure 2B This is a partial enlarged view of the exposure process of a long metal plate.

[0051] Figure 2C This is a partial enlarged view of the etching process of a long metal plate.

[0052] Figure 2D FIG. 1 is a top view of a metal mask reflecting deformation caused by the corrugated shape.

[0053] Figure 2E This is a plan view showing a state in which tension in the longitudinal direction is applied to the metal mask.

[0054] Figure 3A This is a schematic perspective view showing an example of a metal plate measuring device according to the present disclosure.

[0055] Figure 3B This is a schematic cross-sectional view showing one embodiment of the first to third steps.

[0056] Figure 3C A flowchart showing one aspect of a method for measuring a metal plate is shown.

[0057] Figure 4A This is a schematic cross-sectional view showing one embodiment of a rolling process.

[0058] Figure 4B This is a schematic cross-sectional view showing one embodiment of the annealing step.

[0059] Figure 5A This is a schematic top view showing a metal mask according to one embodiment of the present disclosure.

[0060] Figure 5B This is a schematic perspective view showing one embodiment of the perforated region as viewed from the second surface side.

[0061] Figure 5C yes Figure 5B A cross-sectional view of section II is shown.

[0062] Figure 5D This is a schematic perspective view showing one embodiment of the perforated region as viewed from the second surface side.

[0063] Fig. 6A This is a schematic diagram for explaining an example of a method for manufacturing a metal mask.

[0064] Figure 6B This is a diagram showing an example of a process of forming a resist film on a metal plate.

[0065] Figure 6C This is a diagram showing an example of a process of patterning a resist film.

[0066] Fig.6D This is a diagram showing an example of the first surface etching step.

[0067] Fig. 6E This is a diagram showing an example of the second surface etching step.

[0068] Figure 7 is a schematic diagram showing a metal mask device according to one embodiment of the present disclosure.

[0069] Figure 8 : is a cross-sectional view which shows the vapor deposition device which concerns on one embodiment of this disclosure. DETAILED DESCRIPTION

[0070] Hereinafter, one embodiment of the present disclosure will be described with reference to the accompanying drawings. In addition, in the drawings attached to this specification, for the sake of convenience of illustration and understanding, the scale and aspect ratio of the drawings may be appropriately changed and exaggerated relative to the scale and aspect ratio of the actual objects.

[0071] Unless otherwise specified in the present specification and / or the drawings, the following explanations shall be given.

[0072] The terms indicating a substance that serves as a basis for a certain structure may not be distinguished only by the difference in name. For example, the terms such as "substrate", "base material", "plate", "sheet" or "film" belong to the above description.

[0073] The terms and / or numerical values ​​indicating the shape and / or geometric conditions do not need to be limited to the strict meaning, and can also be interpreted as including the range of the degree that the same function can be expected. For example, "parallel" and / or "orthogonal" belong to the above terms. In addition, "length value" and / or "angle value" belong to the above numerical values.

[0074] When expressing that a certain structure is "above", "below", "upper side", "lower side", "above" or "below" another structure, it can also include a method in which a certain structure is directly connected to another structure, and a method in which other structures are included between a certain structure and another structure. In other words, the method in which other structures are included between a certain structure and another structure can also be expressed as a certain structure being indirectly connected to another structure. In addition, expressions such as "above", "upper side" or "above" can be replaced with expressions such as "below", "lower side" or "below". In other words, the up and down directions can also be reversed.

[0075] When the same parts and / or parts having the same functions are marked with the same reference numerals or similar reference numerals, repeated descriptions are sometimes omitted. In addition, the dimensional ratios of the drawings are sometimes different from the actual ratios. In addition, a part of the structure of the embodiment is sometimes omitted from the drawings.

[0076] In the range that no contradiction occurs, one or more modes of the embodiment and one or more modes of the modified example may be combined together. In addition, in the range that no contradiction occurs, one or more modes of the embodiment may be combined with each other. In addition, in the range that no contradiction occurs, one or more modes of the modified example may be combined with each other.

[0077] When a plurality of steps are disclosed in a method such as a manufacturing method, other steps that are not disclosed may be performed between the disclosed steps. In addition, the order of the steps is not limited within the scope of not causing contradiction.

[0078] Numerical ranges expressed by symbols such as “to” and / or “-” include numerical values ​​placed before and after the symbols such as “to” and / or “-”. For example, a numerical range expressed as “34 to 38 mass %” is the same as a numerical range expressed as “34 mass % or more and 38 mass % or less”.

[0079] For the numerical values ​​described in this disclosure, the numerical range can be limited by combining any one of multiple upper limit candidate values ​​and any one of multiple lower limit candidate values. In addition, even if not specifically mentioned, the numerical range can be defined by combining any two of multiple upper limit candidate values, and the numerical range can be defined by combining any two of multiple lower limit candidate values.

[0080] An embodiment of the present disclosure is described in the following paragraphs. An embodiment of the present disclosure is an example of an embodiment of the present disclosure. The present disclosure is not limited to the embodiment of the present disclosure.

[0081] The metal plate disclosed in the present invention is a long metal plate for manufacturing a metal mask. The metal mask can be used for various purposes. There is no particular limitation. For example, the metal mask of the present invention can be used as such a metal mask: it is used to pattern an organic material on a substrate in a desired pattern in the manufacture of an organic EL display device. The metal mask is also called a vapor deposition mask. In addition, the metal mask disclosed in the present invention can achieve a high pixel density composition. In the organic EL display device that can be manufactured, in addition to displays such as smartphones or televisions, it also includes a device for displaying or projecting images and videos for expressing virtual reality (VR) and augmented reality (AR).

[0082] A first aspect of the present disclosure is a metal plate which is a long metal plate used for manufacturing a metal mask, wherein:

[0083] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction,

[0084] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0085] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

[0086] A second aspect of the present disclosure is a metal plate which is a long metal plate used for manufacturing a metal mask, wherein:

[0087] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction,

[0088] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0089] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction.

[0090] The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

[0091] A third aspect of the present disclosure is the metal plate of the first aspect or the second aspect, wherein at the plurality of positions, the maximum value of the elongation difference En of the center portion in the width direction is 2.5×10 --5 the following.

[0092] A fourth aspect of the present disclosure is the metal plate according to any one of the first to third aspects, wherein the metal plate is in a roll shape.

[0093] A fifth aspect of the present disclosure is the metal plate according to any one of the first to fourth aspects, wherein the length of the metal plate in the longitudinal direction is 50 m to 800 m.

[0094] A sixth aspect of the present disclosure is the metal plate according to any one of the first to fifth aspects, wherein the thickness of the metal plate is 50 μm or less.

[0095] A seventh aspect of the present disclosure is a method for manufacturing a long metal plate for manufacturing a metal mask, wherein:

[0096] The method for manufacturing a metal plate comprises a rolling step of rolling a base material to obtain a long metal plate.

[0097] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction of the metal plate,

[0098] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0099] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

[0100] An eighth aspect of the present disclosure is a method for manufacturing a long metal plate for manufacturing a metal mask, wherein:

[0101] The method for manufacturing a metal plate comprises a rolling step of rolling a base material to obtain a long metal plate.

[0102] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction of the metal plate,

[0103] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0104] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction.

[0105] The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

[0106] A ninth aspect of the present disclosure is a method for manufacturing a metal mask, wherein:

[0107] The method for manufacturing the metal mask comprises:

[0108] A rolling process in which a base material is rolled to prepare a long metal plate; and

[0109] an etching step of forming the metal mask by etching the metal plate,

[0110] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction of the metal plate,

[0111] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0112] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

[0113] A tenth aspect of the present disclosure is a method for manufacturing a metal mask, wherein:

[0114] The method for manufacturing the metal mask comprises:

[0115] A rolling process in which a base material is rolled to prepare a long metal plate; and

[0116] an etching step of forming the metal mask by etching the metal plate,

[0117] When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction of the metal plate,

[0118] At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following,

[0119] The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction.

[0120] The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

[0121] exist Figure 1A 1 is a perspective view showing an example of a long metal plate 100 according to one embodiment of the present disclosure. Figure 1A 2 shows a method in which the long metal plate 100 is stretched, but the long metal plate 100 may be wound into a roll.

[0122] The length of the long metal plate 100 in the width direction D1 is preferably 200 mm or more, and may be 300 mm or more, 350 mm or more, 400 mm or more, 450 mm or more, or 500 mm or more. In addition, the length of the long metal plate 100 in the width direction D1 is preferably 800 mm or less, and may be 750 mm or less, 700 mm or less, 650 mm or less, 600 mm or less, or 550 mm or less. The length of the long metal plate 100 in the width direction D1 is preferably 300 mm to 800 mm, and may be 350 mm to 750 mm, 400 mm to 700 mm, or 450 mm to 650 mm.

[0123] The total length of the long metal plate 100 in the length direction D2 is preferably 50m or more, and may be 100m or more, 150m or more, 200m or more, 300m or more, 400m or more, or 500m or more. The total length of the long metal plate 100 in the length direction D2 is preferably 1200m or less, and may be 1000m or less, 800m or less, 700m or less, or 600m or less. The total length of the long metal plate 100 in the length direction D2 is preferably 50m to 1200m, and may be 50m to 1000m, 50m to 800m, or 100m to 800m.

[0124] The thickness of the long metal plate 100 is preferably 100 μm or less, and may be 50 μm or less, 45 μm or less, 40 μm or less, 35 μm or less, 30 μm or less, 25 μm or less, or 20 μm or less. The thickness of the long metal plate 100 is preferably 2.5 μm or more, and may be 5 μm or more, 10 μm or more, or 15 μm or more. The thickness of the long metal plate 100 is preferably 2.5 to 100 μm, and may be 5 to 50 μm, or 10 to 40 μm. By reducing the thickness, the porous region 22 of the metal mask 20 described later can be made thinner, thereby having a tendency to suppress the following situation: the evaporation material 98 adheres to the second wall surface 36 of the second recess 35 during the evaporation process. By increasing the thickness, there is a tendency for the strength of the metal mask 20 to be further improved. Thus, for example, there is a tendency to further suppress the deformation or fracture of the porous region 22.

[0125] It should be noted that, when reducing the thickness, it is conceivable to increase the rolling ratio in the rolling process in the method for manufacturing the long metal plate 100. However, if the rolling ratio is simply increased, the degree of non-uniformity of deformation due to rolling tends to increase, and the corrugated shape described later tends to occur.

[0126] The material constituting the long metal plate 100 is not particularly limited, and examples thereof include iron alloys containing nickel, iron alloys containing chromium such as stainless steel, nickel, and nickel-cobalt alloys.

[0127] Among them, an iron alloy containing nickel is preferred. By using an iron alloy containing nickel, the thermal expansion coefficient of the metal mask 20 obtained by the long metal plate 100 can be set to a value equivalent to the thermal expansion coefficient of the frame 15 or the thermal expansion coefficient of the substrate 92 (see Figure 8 ). Thus, during the vapor deposition process, the occurrence of positional deviation caused by the difference in the size change of the metal mask 20, the frame 15, and the substrate 92 can be suppressed. Therefore, the reduction in the dimensional accuracy and positional accuracy of the vapor deposition material 98 attached to the substrate 92 caused by the positional deviation can be suppressed.

[0128] There is no particular limitation on the nickel-containing iron alloy, and examples thereof include: a super Invar alloy material containing cobalt in addition to 30% by mass to 34% by mass of nickel; an Invar alloy material containing 34% by mass to 38% by mass of nickel; a low thermal expansion Fe-Ni plated alloy containing 48% by mass to 54% by mass of nickel; and an iron alloy containing 30% by mass to 54% by mass of nickel.

[0129] Figure 1B yes Figure 1AThe enlarged view of the region Sk of the long metal plate 100. The region Sk is an arbitrary portion in the length direction D2 of the long metal plate 100. The region Sk is a region surrounded by two sides 131 parallel to the width direction D1 of the long metal plate 100 and two side edges 130. The interval between the two sides 131 is the unit length L0 in the length direction D2. Hereinafter, the portion of the long metal plate 100 corresponding to the region Sk is also referred to as "metal plate 100k".

[0130] like Figure 1B As shown, the long metal plate 100 has a corrugated shape at least partially. The corrugated shape is caused by the following reasons: the length of the metal plate 100k in the region Sk in the length direction D2 is different depending on its position in the width direction D1. The degree of the corrugated shape can be evaluated by the elongation difference En. "Region Sk" represents the range of measuring the elongation difference En of the present disclosure once. In addition, "unit length L0" represents the length in the length direction D2 when measuring the elongation difference En of the present disclosure.

[0131] In addition, from the viewpoint of evaluating the influence of the elongation difference En in the metal mask 20, the unit length L0 may be a length that is substantially the same as the length in the longitudinal direction of the metal mask 20. When the unit length L0 is the same as the length in the longitudinal direction of the metal mask 20, it may preferably be 1000 mm or more and 1800 mm or less, and may be 980 mm, 1280 mm, or 1648 mm, for example. In addition, the unit length L0 refers to the length when the metal plate 100k is viewed from above.

[0132] Figure 1C yes Figure 1B A cross-sectional view of a metal plate 100k in the length direction D2. Figure 1C The sectional views (a) to (d) are taken along Figure 1B The cross-sectional views are the aa line, the bb line, the cc line and the dd line of the embodiment of the present invention. The aa line, the bb line, the cc line and the dd line are all parallel to the length direction D2.

[0133] exist Figure 1C In the illustrated embodiment, the wave is largest in the cross-sectional view (d) passing through the portion close to the side edge 130. Also, from the comparison of the cross-sectional views (b) to (d), it can be seen that the wave gradually becomes smaller as it approaches the center from the side edge 130 in the width direction D1. In addition, from the comparison of the cross-sectional view (b) and the cross-sectional view (a), it can be seen that the wave is slightly larger in the cross-sectional view (a).

[0134] In the present disclosure, the differential elongation En per unit length L0 in the longitudinal direction D2 corresponding to an arbitrary position n in the width direction D1 of the metal plate 100k is measured. That is, the differential elongation En is measured based on the cross-sectional views at an arbitrary position n in the width direction D1 such as the cross-sectional views (a) to (d).

[0135] For example, in Figure 1C In (a) to (d), two waves represented by periods La to Ld and heights Ha to Hd are shown in unit length L0 as an example. The number of waves per unit length L0 is not particularly limited and may be one or three or more.

[0136] Figure 1D It is a bird's-eye view Figure 1B When viewed from the top, the metal plate 100k with a unit length L0 actually has Figure 1C Therefore, the length on the surface of the metal plate 100k along the corrugated shape is longer than the unit length L0.

[0137] Figure 1E It shows that the length of each position n in the width direction is measured along the length direction D2 Figure 1D A conceptual diagram of the relationship between the length of the first surface 110 of the metal plate 100k. Figure 1E The length Ln on the surface of the metal plate 100k along the corrugated shape is measured in the longitudinal direction D2 at a position n in the width direction. The length Ln on the surface of the metal plate 100k along the corrugated shape can be said to be the length of the metal plate 100k in the longitudinal direction D2 when the metal plate 100k is stretched in the longitudinal direction D2 to make the waves flat.

[0138] Here, the “differential elongation” in the present disclosure refers to a value obtained by the following formula from the minimum value L(min) of Ln and the difference ΔLn between L(min) and Ln.

[0139] Elongation difference at position n En = ΔLn / L (min)

[0140] For example, consider a sample of a metal plate 100k with a width of 500mm and a length of 1280mm (unit length L0). When the surface of the sample is measured along the length direction D2, the minimum value L (min) is 1280.1352mm at a position +75mm from the center. At this time, at a position +0mm from the center, L is 1280.1612mm and ΔL is 26.0μm. Under this premise, the elongation difference En at the position +0mm from the center is calculated to be 2.0×10 -5 (=26.0μm / 1281.1352mm).

[0141] It should be noted that the above examples are numerical illustrations for explaining the elongation difference of the present disclosure, and have nothing to do with the embodiments of the metal plate and the like of the present disclosure.

[0142] Figure 1F A graph showing the elongation difference En at each position n in the width direction D1 of the metal plate 100k is shown. Figure 1F In FIG. 1 , the horizontal axis represents the position in the width direction D1 of the metal plate 100k. Figure 1F In FIG. 1 , regarding the metal plate 100 k having a width of 500 mm, the center position in the width direction D1 is set to 0 mm (0%) on the horizontal axis, and the side edge 130 is represented by a coordinate of ±250 mm (±50%). Figure 1F Points a to d in the figure represent the positions of the aa line, the bb line, the cc line, and the dd line in the width direction D1, respectively. Figure 1F , it is possible to graphically show the change in the elongation difference En in the width direction D1 of the metal plate 100k. Figure 1F As shown, in the present disclosure, a graph indicating changes in the differential elongation En in the width direction D1 of the metal plate 100 k or data indicating the changes is also referred to as “differential elongation distribution”.

[0143] In addition, point a is located at the center of the width direction D1 of the metal plate 100k (0 mm [0%]). Point d is located on the side edge 130 side of the width direction D1 of the metal plate 100k (-225 mm [-45%]). In addition, point b and point c are located at the inner points (-75 mm [-15%], -150 mm [-30%]) that divide the space between point a and point d into three equal parts.

[0144] In the present disclosure, the range of ±40% from the center position in the width direction D1 is referred to as the central portion 140, and the range from the end of the central portion 140 to the side edge 130 is referred to as the side portion 150. That is, the central portion 140 is the portion other than the two side portions 150 occupying 10% of the width direction D1 of the long metal plate 100, and the central portion 140 is the portion occupying 80% of the width direction D1. In addition, the vertical axis represents the elongation difference En at an arbitrary position n in the width direction D1 of the metal plate 100k.

[0145] As a tendency of the elongation difference distribution, such as Figure 1FAs shown, the maximum value of the elongation difference En appears near the central portion 140 in the width direction of the long metal plate 100 (point a). In addition, the minimum value of the elongation difference En appears at a position slightly away from the central portion 140 in the width direction of the long metal plate 100 toward the side edge 130 (point b). In addition, as it moves from point b toward the side edge 130 in the width direction D1, the elongation difference En increases (point c), and the value of the elongation difference En becomes the maximum at the side edge 130 in the width direction D1 (point d). However, the shape of the elongation difference distribution is not limited to this.

[0146] Figure 1G It is measured at any number of positions along the length direction D2 Figure 1F The elongation differential distribution shown in FIG. 1 is a graph showing the elongation differential distribution at multiple locations by overlapping them. Figure 1G As shown, the elongation difference distributions at multiple locations have slightly different shapes.

[0147] in addition, Figure 1F and Figure 1G The width of the metal plate 100k of 500 mm is merely an example, and the metal plate 100k may be set to a wider width or a narrower width.

[0148] If the elongation differential distribution of the long metal plate 100 differs depending on the position in the length direction D2, the shape of the obtained metal mask 20 will be biased when the metal mask 20 is cut out from each position of the long metal plate 100. Therefore, it is preferable that the elongation differential distribution based on the position in the length direction D2 is the same or the difference is small.

[0149] Below, use Figure 2A to Figure 2E Let's explain this in more detail. Figure 2A to Figure 2E FIG. 1 partially shows the process of manufacturing the metal mask device 10 from the long metal plate 100. Figure 2A to Figure 2C 2 shows an enlarged view of an arbitrary region of the long metal plate 100 .

[0150] First, if Figure 2A As shown, a long metal sheet 100 is envisaged that has a corrugated shape at least in part. Figure 2B FIG. 1 is a schematic diagram of a process of forming a first resist pattern 53c on the first surface 110 of a long metal plate 100 and forming a second resist pattern 53d on the second surface 120 and performing exposure. In this process, the exposure mask is brought into close contact with the first resist pattern 53c and the second resist pattern 53d on the long metal plate 100 by vacuum adsorption or the like. As a result, the corrugated shape of the long metal plate 100 is compressed, and the long metal plate 100 becomes approximately flat. In this flat state, the long metal plate 100 is exposed to the light. Figure 2BA predetermined resist pattern is formed so as to define the outer shape of the metal mask 20 at the portion indicated by the dotted line.

[0151] Then, in Figure 2C 1 shows a schematic perspective view of an etching process performed via a resist pattern. In this process, the exposure mask is removed from the long metal plate 100, and the corrugated shape is restored to Figure 2A Therefore, Figure 2C As shown, the outer shape 27 of the metal mask 20 obtained by the etching process also has a shape reflecting the corrugated shape. Specifically, the outer shape 27 of the metal mask 20 is likely to bend toward the side having a larger corrugated shape (the side close to the side edge 130).

[0152] Through Figure 2C As shown in FIG. 1 , etching is performed in a state where the corrugated shape is restored, thereby Figure 2D As shown, the metal mask 20 reflecting the deformation caused by the corrugated shape is obtained. Specifically, the metal mask 20 is easily bent toward the side having a larger corrugated shape (the side close to the side edge 130).

[0153] By reflecting the deformation caused by the corrugated shape in this way, the dimensions of the obtained metal mask 20 vary. Figure 5A As shown in FIG. 1 , this variation can be evaluated by the total pitch mark 28. Such a variation is a major factor that reduces the positional accuracy of the through-hole 25. Therefore, it is preferable to suppress the dimensional variation of the obtained metal mask 20.

[0154] In addition, if Figure 1F As shown in FIG. 1 , the side portion 150 is a portion where the elongation difference En is relatively high. Figure 2B and Figure 2C As shown, the metal mask 20 may also be formed in the central portion 140 .

[0155] Finally, in Figure 2E FIG. 2 shows a schematic diagram of the metal mask 20 before being tensioned and set on the frame 15. Figure 2E As shown, the metal mask 20 is tensioned on the frame 15 by a clamp 86 or the like to give tension in the longitudinal direction D2. Thus, the metal mask 20 is tensioned on the frame 15 in a flat state. However, the greater the difference in shape between each metal mask 20, the more it is necessary to finely adjust the tension and ensure the hole position accuracy for each metal mask 20. Therefore, even if the metal mask 20 has a corrugated shape, it is preferable to suppress the deviation of the corrugated shape.

[0156] Therefore, the present disclosure stipulates that when the elongation difference En is measured at any plurality of positions in the length direction D2 of the long metal plate 100, the difference in the elongation difference En in the central portion in the width direction at the plurality of positions (areas Sk) is 9.0×10 -6 the following.

[0157] As a result, the elongation difference En at any position n in the width direction D1 becomes the same value in a wide range in the length direction D2 of the long metal plate 100, and the difference in shape becomes smaller no matter where the metal mask 20 is cut from the long metal plate 100, thereby improving the uniformity of quality. Therefore, the deviation in the quality of the obtained metal mask 20 can be suppressed.

[0158] like Figure 1G As shown, the "difference in elongation difference En" in the present disclosure refers to the difference between the minimum and maximum values ​​of the elongation difference En at the same position n in the distribution of elongation difference at different positions. -6 "Below" means that at any position n in the width direction D1, the difference in elongation difference En is 9.0×10 -6 Furthermore, “arbitrary multiple positions in the longitudinal direction D2” refers to multiple positions randomly selected in the longitudinal direction D2 of the long metal plate 100 , and may also include a case where the elongation difference distribution is measured over the entire long metal plate 100 .

[0159] As an example, the number of selections at this time can be determined according to the length of the long metal plate 100. For example, when the length of the long metal plate 100 is 600 m, the number of selections can be 6 or more (1 location / 100 m).

[0160] From this point of view, the selection number relative to the length of the long metal plate 100 can be preferably 0.1 place / 100m or more, 0.3 place / 100m or more, 0.5 place / 100m or more, 0.7 place / 100m or more, 1 place / 100m or more, 2 places / 100m or more, 3 places / 100m or more, 4 places / 100m or more, 5 places / 100m or more, and 10 places / 100m or more.

[0161] In addition, the selected number relative to the length of the long metal plate 100 can preferably be less than 100 places / 100m, less than 90 places / 100m, less than 80 places / 100m, less than 70 places / 100m, less than 60 places / 100m, less than 50 places / 100m, less than 40 places / 100m, less than 30 places / 100m, and less than 20 places / 100m.

[0162] The selection number can also be determined by a combination of any one of the above-mentioned multiple lower limit candidate values ​​and any one of the above-mentioned multiple upper limit candidate values. As such an example, the range of the selection number can preferably be 0.1 place / 100m or more and 100 places / 100m or less, 0.3 place / 100m or more and 90 places / 100m or less, 0.5 place / 100m or more and 80 places / 100m or less, 0.7 place / 100m or more and 70 places / 100m or less, 1 place / 100m or more and 60 places / 100m or less, 2 places / 100m or more and 50 places / 100m or less, 3 places / 100m or more and 40 places / 100m or less, 4 places / 100m or more and 30 places / 100m or less, 5 places / 100m or more and 20 places / 100m or less.

[0163] The difference in the elongation difference En at the center portion 140 in the width direction can be 9.0×10 -6 Below, 8.0×10 -6 Below, 7.0×10 -6 Below, 6.0×10 -6 Below, 5.0×10 -6 Below, 4.0×10 -6 Below, 3.0×10 -6 the following.

[0164] The lower limit of the difference in the elongation difference En at the center portion 140 in the width direction is not particularly limited, and the smaller the difference, the better. As an example, the difference in the elongation difference En may be 0 or more, 1.0×10 -8 Above, 2.5×10 -8 Above, 5.0×10 -8 Above, 7.5×10 -8 Above, 1.0×10 -7 Above, 2.5×10 -7 Above, 5.0×10 -7 above.

[0165] The range of the difference in the elongation difference En at the center portion 140 in the width direction may also be determined by a combination of any one of the plurality of lower limit candidate values ​​and any one of the plurality of upper limit candidate values. As such an example, the range of the difference in the elongation difference En at the center portion may preferably be greater than 0 and less than 9.0×10 -6 Below, 1.0×10 -8 Above and 8.0×10 -6 Below, 2.5×10 -8 Above and 7.0×10 -6 Below, 5.0×10 -8 Above and 6.0×10 -6 Below, 7.5×10-8 Above and 5.0×10 -6 Below, 1.0×10 -7 Above and 4.0×10 -6 the following.

[0166] By setting the difference in the elongation difference En in the central portion 140 in the width direction within the above range, the homogeneity in the longitudinal direction D2 tends to be further improved, particularly in the central portion 140 that is easily used in the manufacture of the metal mask 20 .

[0167] In addition, at multiple positions in the length direction D2 of the long metal plate 100, the maximum value of the elongation difference En of the central portion 140 in the width direction may be preferably 2.5×10 --5 Below, 2.0×10 --5 Below, 1.5×10 --5 Below, 1.0×10 --5 In addition, the position where the elongation difference En becomes the maximum in the central part 140 in the width direction is not particularly limited. As an example, Figure 1G In the example shown, the position may be located at point a (0 mm [0%]) or at the boundary between the central portion 140 and the side portion 150 (±200 mm [±40%]).

[0168] It should be noted that the “maximum value of the differential elongation En” is the maximum value of the differential elongation En at each of the plurality of positions in the longitudinal direction D2 of the long metal plate 100 and in the central portion 140. For example, the “maximum value of the differential elongation En” is 2.5×10 --5 “Below” means that the maximum value of the elongation difference En at the central portion 140 at multiple positions in the longitudinal direction D2 of the long metal plate 100 is 2.5×10 --5 In other words, when the maximum value of the elongation difference En is 0.10% at the central portion 140 of a certain position in the longitudinal direction D2 of the long metal plate 100 and 1.2% at other positions, it is called "the maximum value of the elongation difference En is 2.5×10 -5 the following".

[0169] The lower limit of the maximum value of the elongation difference En of the center portion 140 in the width direction is not particularly limited, and the smaller the value, the better. As an example, the elongation difference En may be 0 or more, 1.0×10 -8 Above, 2.5×10 -8 Above, 5.0×10 -8 Above, 7.5×10 -8 Above, 1.0×10 -7 Above, 2.5×10 -7 Above, 5.0×10-7 above.

[0170] The range of the maximum value of the difference in elongation En of the central portion 140 in the width direction may also be determined by a combination of any one of the plurality of candidate values ​​of the lower limit and any one of the plurality of candidate values ​​of the upper limit. As such an example, the maximum value of the difference in elongation En of the central portion 140 in the width direction may preferably be greater than or equal to 0 and less than 2.5×10 -5 Below, 1.0×10 -8 Above and 2.0×10 -5 Below, 2.5×10 -8 Above and 1.5×10 -5 Below, 5.0×10 -8 Above and 1.0×10 -5 Below, 7.5×10 -8 Above and 1.0×10 -5 the following.

[0171] It should be noted that the differential elongation En of the present disclosure is a value obtained by measuring the elongated metal plate 100 without cutting it, as described in detail below by a measuring device. That is, the differential elongation En of the present disclosure is the differential elongation En in the long metal plate 100, not the differential elongation of the metal plate after cutting. Therefore, for example, even if the differential elongation of the central part of a metal plate obtained by cutting the long metal plate 100 is 2.5×10 --5 However, if the elongation difference of other parts of the long metal plate 100 before cutting is unknown, the maximum value of the elongation difference En of the long metal plate 100 as a whole is 2.5×10 --5 The following assumption is also not valid.

[0172] Next, a method for measuring the elongation difference En at any number of positions in the length direction is described. First, conventional devices for measuring the corrugation shape of metal plates measure the measurement sample (metal plate 100k) cut from the long metal plate 100 in a single-piece manner. Therefore, it is not possible to evaluate the corrugation shape of the long metal plate 100 over a wide range.

[0173] In addition, when an etching process using photolithography is performed on a roll of the long metal plate 100, if a measurement sample is cut out from the middle portion of the roll of the long metal plate 100, the roll itself will be cut, which has a significant impact on the etching process. Therefore, in this case, the measurement sample is cut out from the end of the roll of the long metal plate 100. Therefore, in the conventional single-piece measurement device, it is impossible to evaluate a wide range of corrugation shapes including the middle portion of the roll of the long metal plate 100.

[0174] Regarding the solution to this problem, Figure 3AA perspective view showing an example of a measuring device for a long metal plate 100 of the present disclosure is shown in FIG. Figure 3B The process of the measuring method of the long metal plate 100 is shown and described. The measuring device 200 of the metal plate disclosed in the present invention comprises: a conveying mechanism 210, which conveys the long metal plate 100 in the length direction D2; a sensor 220, which measures the surface shape of the first surface 110 of the long metal plate 100; a workbench 230, which contacts the second surface 120 of the long metal plate 100 located at a position opposite to the first surface 110 when measuring using the sensor 220; and a control unit 240.

[0175] The control unit 240 controls the conveying mechanism 210 , the sensor 220 , and other later-described tension adjustment mechanisms 250 , lifting mechanisms (not shown), and the like, thereby repeatedly executing the first step S1 , the second step S2 , and the third step S3 .

[0176] The details of the process will be described later. In the first process S1, the long metal plate 100 is conveyed by the conveying mechanism 210 in a state where the long metal plate 100 is not in contact with the workbench 230. In the second process S2, the conveying of the long metal plate 100 is stopped, and the second surface 120 of the long metal plate 100 whose conveying is stopped is brought into contact with the workbench 230. In the third process S3, the surface shape of the first surface 110 of the long metal plate 100 is measured by the sensor 220 in a state where the second surface 120 of the long metal plate 100 is brought into contact with the workbench 230. Thus, the surface shape of the metal plate can be continuously measured over a wider range.

[0177] The conveying mechanism 210 conveys the long metal plate 100 in the length direction D2. The conveying mechanism 210 may include, for example, a first roller 211 for delivering the long metal plate 100 and a second roller 212 for winding the long metal plate 100. According to instructions from the control unit 240, the long metal plate 100 is delivered from the first roller 211 and the long metal plate 100 is wound onto the second roller 212, thereby the conveying mechanism 210 can convey the long metal plate 100 along the length direction D2 or stop conveying the long metal plate 100.

[0178] The conveying mechanism 210 may also include a first auxiliary roller 251 and a second auxiliary roller 252 between the first roller 211 and the second roller 212. The first auxiliary roller 251 and the second auxiliary roller 252 may support the long metal plate 100 between the first roller 211 and the second roller 212, or assist in the conveying of the long metal plate 100 in sending out or winding up. In addition, the conveying mechanism 210 is not limited to the rollers shown in FIG. 1 , and may also include other rollers that facilitate conveying.

[0179] The sensor 220 measures the surface shape of the first surface 110 of the long metal plate 100. The surface state measured by the sensor 220 may include information related to the height of the surface of the first surface 110 of the long metal plate 100. Information related to the height is also called "height distribution". The height distribution may be data that three-dimensionally represents the surface shape of the first surface 110 of the long metal plate 100, for example, it may include corresponding positions in the plane of the width direction D1 and the length direction D2 of the long metal plate 100, and information related to the height of the surface of the long metal plate 100 in the height direction D3 relative to each position.

[0180] In this way, the corrugated shape on the surface of the first surface 110 can be represented by the height distribution obtained by the sensor 220. In addition, based on such a height distribution, the elongation difference in the width direction D1, the length direction D2 or other arbitrary directions can be calculated. That is, the elongation difference distribution at an arbitrary position can be obtained by the height distribution at that position.

[0181] The sensor 220 is not particularly limited as long as it can measure the surface shape of the first surface 110 of the long metal plate 100, and examples thereof include an optical displacement meter and a press-type displacement meter. By measuring the distance between the sensor 220 and the first surface 110, the height distribution can be measured.

[0182] As a displacement meter of the optical system, a conventionally known displacement meter can be used, but as an example, a triangular distance method and a white coaxial confocal method can be cited. In the triangular distance method, light having a focusing position that differs for each wavelength is irradiated onto the object, and the height of the object is measured by the imaging position of the reflected light of the light irradiated onto the object. In the white coaxial confocal method, the height of the object is measured by detecting the wavelength position of the maximum light amount based on the received light spectrum.

[0183] At least one of the sensor 220 and the workbench 230 may also be configured to be movable relative to each other. Figure 3AThe device structure shown is configured as follows: the workbench 230 is stationary, and the sensor 220 can move relative to the workbench 230. Specifically, the sensor 220 can also be configured to be movable in the width direction D1 through the first moving mechanism 221. In addition, the first moving mechanism 221 can also be configured to be movable in the length direction D2 through the second moving mechanism 222. Thus, the sensor 220 can also move on the plane of the width direction D1 and the length direction D2. At this time, the first moving mechanism 221 and the second moving mechanism 222 can also have a mechanism for obtaining the coordinates of the width direction D1 and the length direction D2, respectively. Thus, when the information related to the height is measured by the sensor 220, the value of the height can also be recorded in correspondence with the coordinates in the plane formed by the width direction D1 and the length direction D2. There is no particular limitation as a mechanism for obtaining coordinates, and for example, an encoder and a laser interferometer can be listed. In addition, in addition to this, the first moving mechanism 221 can also be configured to enable the sensor 220 to move in the height direction D3. Thus, the sensor 220 can move not only in the planar direction but also in the height direction D3. Alternatively, the sensor 220 may be fixed and the stage 230 may be movable in the height direction D3.

[0184] Alternatively, the workbench 230 may be moved in the width direction D1 and the length direction D2, thereby measuring information related to the height of the surface of the first surface 110 of the long metal plate 100 while relatively moving the sensor 220 and the long metal plate 100 in the width direction D1 and the length direction D2. At this time, in addition to the workbench 230, the conveying mechanism may also move relatively. In addition, in this case, the measuring device 200 may also have a mechanism for driving and controlling the workbench 230 while obtaining the coordinates in the width direction D1 and the length direction D2. Thus, the coordinates of the position where the height is measured by the sensor 220 in the directions D1 and D2 may also be recorded. Here, the mechanism for obtaining the coordinates is not particularly limited, and examples thereof include encoders and laser interferometers.

[0185] As described above, the plane coordinates of the width direction D1 and the length direction D2 and the information related to the height of the long metal plate 100 at each coordinate position can be measured while the sensor 220 and the worktable 230 are relatively moved, and they are recorded in correspondence. Then, the predetermined area of ​​the long metal plate 100 on the worktable 230 is repeatedly measured at a certain interval, and the long metal plate 100 is intermittently moved and the measurement is repeatedly performed over the length direction of the long metal plate 100, thereby obtaining a three-dimensional profile as a surface shape over any position of the long metal plate 100.

[0186] The control unit 240 repeatedly executes the first step S1 , the second step S2 , and the third step S3 . Figure 3B One embodiment of the flow of the first step S1 , the second step S2 , and the third step S3 is shown. Figure 3B It is a schematic cross-sectional view in the plane of the longitudinal direction D2 and the height direction D3.

[0187] like Figure 3B As shown, in the first step S1, the control unit 240 drives and controls the conveying mechanism 210 so that the long metal plate 100 is conveyed without contacting the worktable 230. Specifically, the control unit 240 rotates the first roller 211 for delivering the long metal plate 100 and the second roller 212 for winding the long metal plate 100 in the feeding direction F1. Thus, the long metal plate 100 is conveyed in the length direction D2.

[0188] In addition, if Figure 3B As shown in FIG. 2 , the control unit 240 may also rotate the first auxiliary roller 251 and the second auxiliary roller 252 for assisting the conveyance of the long metal plate 100 in the feeding direction F1. Figure 3B In the illustrated example, the first auxiliary roller 251 and the second auxiliary roller 252 are rollers constituting the conveying mechanism 210 , and are also rollers constituting the tension adjustment mechanism 250 described later.

[0189] In the first step S1, the control unit 240 can adjust the tension applied to the long metal plate 100 between the first roller 211 and the second roller 212 by controlling the rotation speed of the first roller 211 and the second roller 212, and control it in a manner to avoid the long metal plate 100 from bending and contacting the workbench 230.

[0190] In the second step S2, the control unit 240 stops the conveying mechanism 210 to convey the long metal plate 100, and makes the second surface 120 of the long metal plate 100 that has stopped conveying contact with the workbench 230. Specifically, the control unit 240 can reduce the tension of the long metal plate 100 by using the tension adjustment mechanism 250 described later after stopping the conveying of the long metal plate 100, so that the long metal plate 100 is bent, and the bent long metal plate 100 is brought into contact with the workbench 230.

[0191] Alternatively or in addition thereto, a lifting mechanism (not shown) may be used to relatively move the long metal plate 100 and the work table 230 up and down in the height direction D3 so that the bent long metal plate 100 contacts the work table 230 .

[0192] In the third step S3, the surface shape of the first surface 110 of the long metal plate 100 is measured by the sensor 220 while the second surface 120 of the long metal plate 100 is in contact with the workbench 230. Specifically, the control unit 240 may drive and control the first moving mechanism 221 and the second moving mechanism 222 to move the sensor 220 to any position in the plane of the length direction D2 and the width direction D1. The sensor 220 may also measure the height of the long metal plate 100 at each position in the plane of the length direction D2 and the width direction D1 while moving, thereby obtaining a height distribution.

[0193] Next, the hardware structure of the control unit 240 is described. The control unit 240 may be composed of a microcontroller (MCU) or a general-purpose computer that also has input devices such as a keyboard and output devices such as a display. When the control unit 240 is a microcontroller, an information input and output device may also be connected to the input and output interface of the microcontroller.

[0194] In particular, the control unit 240 may be electrically connected to the conveying mechanism 210, the sensor 220, the first moving mechanism 221, the second moving mechanism 222, the tension adjustment mechanism 250, and the lifting mechanism (not shown). Figure 3A In the figure, the parts other than the connection between the control unit 240 and the rollers constituting the conveying mechanism 210, the first moving mechanism 221, and the second moving mechanism 222 are omitted from the figure. However, since the control unit 240 controls the measuring device 200, even if not specifically shown in the figure, all the components of the measuring device 200 that are electrically controlled may be connected to the control unit 240 by wire or wirelessly. For example, in Figure 3A In the example of , although the connection between the sensor 220 and the control unit 240 is not shown, it can be understood that the sensor 220 and the control unit 240 are connected via the first moving mechanism 221 and the second moving mechanism 222.

[0195] The measuring device 200 of the present disclosure may also include a tension adjustment mechanism 250. The tension adjustment mechanism 250 is not particularly limited as long as it can adjust the tension in the length direction D2 of the long metal plate 100. In this case, the control unit 240 may adjust the tension of the long metal plate 100 using the tension adjustment mechanism 250 in the first step S1 so that the long metal plate 100 does not contact the workbench 230, and transport the long metal plate 100 using the conveying mechanism 210. In addition, the control unit 240 may stop the conveyance of the long metal plate 100, and adjust the tension of the long metal plate 100 using the tension adjustment mechanism 250 so that the long metal plate 100 contacts the workbench 230.

[0196] exist Figure 3A and Figure 3B, a method of using a first auxiliary roller 251 and a second auxiliary roller 252 is shown as one method of the tension adjustment mechanism 250. In the second step S2, the control unit 240 stops the conveying of the long metal plate 100 by the conveying mechanism 210, and makes the second surface 120 of the long metal plate 100 whose conveyance has stopped contact with the workbench 230.

[0197] At this time, Figure 3B In the manner shown, after stopping the conveying mechanism 210, the control unit 240 slightly rotates the first roller 211 and the first auxiliary roller 251 of the tension adjustment mechanism 250 in the feeding direction F1 and stops. At this time, the control unit 240 fixes the second auxiliary roller 252 so as not to rotate. As a result, the long metal plate 100 between the first auxiliary roller 251 and the second auxiliary roller 252 is bent by the length conveyed by the first auxiliary roller 251. The second surface 120 of the bent long metal plate 100 contacts the workbench 230.

[0198] Next, the measuring method of the long metal plate 100 is described. The measuring method of the long metal plate 100 disclosed in the present invention uses the above-mentioned measuring device and repeatedly performs the first step S1, the second step S2 and the third step S3. As a result, the surface shape of the metal plate can be continuously measured over a wider range. In addition, it is not necessary to measure the measurement sample cut from the metal plate in a single piece as in the past, so the influence of the deformation of the metal plate caused by cutting can also be eliminated.

[0199] In addition, hereinafter, the operation of repeatedly conveying the long metal plate 100 and stopping it will also be referred to as intermittent operation.

[0200] Figure 3C A flow chart showing one method of measuring a metal plate is shown. Figure 3C As shown, in the metal plate measuring method of the present disclosure, in the first step S1 , the long metal plate 100 is conveyed by the conveying mechanism 210 in a state where the long metal plate 100 is not in contact with the work table 230 .

[0201] At this time, the conveying mechanism 210 may perform an intermittent operation of conveying the long metal plate 100 in the length direction D2 by a distance less than one workbench 230. Thus, the surface shape of a continuous range in the length direction D2 can be measured.

[0202] In addition, the conveying mechanism 210 may also perform an intermittent operation of conveying the long metal plate 100 in the length direction D2 for a distance greater than one workbench 230. Thus, the surface shape of a non-continuous range in the length direction D2 can be measured. For example, by performing an intermittent operation of repeatedly conveying and stopping every 5 m, the surface shape of the long metal plate 100 can be measured every 5 m.

[0203] In the metal plate measuring method of the present disclosure, in the second step S2 , the conveyance of the long metal plate 100 is stopped, and the second surface 120 of the long metal plate 100 whose conveyance has been stopped is brought into contact with the stage 230 .

[0204] At this time, as described above, the second surface 120 of the long metal plate 100 is brought into contact with the workbench 230 using the tension adjustment mechanism 250 or the lifting mechanism (not shown). In the present disclosure, it is preferred to measure the surface shape without applying tension to the long metal plate 100. Thus, the influence of the tension based on the conveying mechanism 210 on the surface shape measurement can be eliminated. Therefore, in the second step S2, it is preferred to bring the second surface 120 of the long metal plate 100 in a bent state into contact with the workbench 230. Alternatively, the long metal plate 100 whose second surface is in contact with the workbench 230 does not bend on the workbench 230, but bends between the first auxiliary roller 251 and the workbench 230, and between the second auxiliary roller 252 and the workbench 230.

[0205] In the third step S3, the surface shape of the first surface 110 of the long metal plate 100 is measured by the sensor 220 while the second surface 120 of the long metal plate 100 is in contact with the workbench 230. The measurement intervals in the length direction D2 and the width direction D1 are not particularly limited and can be appropriately determined according to the desired measurement accuracy, for example, can be set to about 1 to 50 mm.

[0206] It should be noted that, in the above description, the case where the surface shape of the first surface 110 of the long metal plate 100 is measured is described, but if the surface of the measurement object is reversed, the surface shape of the second surface 120 can of course be measured.

[0207] In the fourth step S4, the control unit 240 may confirm whether the preset range has been measured, and if the measurement of the preset range is completed, the measurement operation is completed, and if not, the first step S1 to the third step S3 are further repeated.

[0208] Next, the manufacturing method of the metal plate disclosed in the present invention is described. The manufacturing method of the metal plate disclosed in the present invention is a manufacturing method of a metal plate having the above-mentioned difference in elongation difference En, which includes a rolling process of rolling a base material to obtain a long metal plate 100, and may also include a slitting process of cutting off both ends of the long metal plate 100 and an annealing process of heat-treating the long metal plate 100 as required.

[0209] The rolling process is a process of rolling the base material 55 to obtain the long metal plate 100. The rolling method is not particularly limited, and for example, a method of rolling using a pair of rollers 56a and 56b that roll the base material 55 in the thickness direction can be cited. The base material 55 is not particularly limited, and for example, an iron alloy containing nickel can be cited.

[0210] Figure 4A A schematic cross-sectional view of the rolling process is shown. First, the base material 55 is conveyed relative to the rollers 56a and 56b in the direction D4. The base material 55 is rolled by a pair of rollers 56a and 56b. As a result, the thickness of the base material 55 is reduced, and the base material 55 is elongated along the conveying direction. Thus, a long metal plate 100 is obtained. The long metal plate 100 can also be formed into a winding body 62 by winding it on the core 61.

[0211] It should be noted that Figure 4A The rolling process is merely an overview, and the specific configuration and steps for implementing the rolling process are not particularly limited. For example, the rolling process may also include: a hot rolling process in which the base material 55 is processed at a temperature above the recrystallization temperature of the Invar alloy material; or a cold rolling process in which the base material is processed at a temperature below the recrystallization temperature of the Invar alloy material. Figure 4A In the figure, the right direction of the paper is shown as a conveying direction of the mother material 55, but the conveying direction of the mother material during rolling is not limited to this, and the left direction of the paper can also be conveyed. In addition, the mother material 55 can also be conveyed back and forth between the rollers 56a and 56b, and rolling is implemented in the process.

[0212] In addition, in the rolling process, rolling to a desired thickness may be performed once, or rolling to a desired thickness may be performed by performing a plurality of rolling processes at a predetermined rolling rate. In addition, rolling oil or the like may be used as needed during rolling.

[0213] From the perspective of adjusting the elongation difference En at any multiple positions in the length direction of the long metal plate 100 disclosed in the present invention, the difference in the elongation difference En in the width direction as a whole, the difference in the elongation difference En in the central part 140 in the width direction, etc., the uniformity of the extrusion pressure variation and the uniformity of the extrusion pressure distribution can be adjusted.

[0214] From the viewpoint of obtaining a long metal plate 100 with suppressed corrugation, it is preferred that the extrusion force does not change and is fixed. However, the base material has a harder metal structure in some parts, or the thickness is thicker in some parts. Therefore, the extrusion force applied to the rollers rolling the base material varies as the base material passes. In order to suppress such fluctuations in the extrusion force, methods such as increasing the number of rollers or providing an adjustment mechanism for keeping the extrusion force fixed can be cited. Thus, by ensuring the uniformity of the fluctuations in the extrusion force, there is a tendency for the corrugation shape to be suppressed.

[0215] In addition, from the viewpoint of obtaining a long metal plate 100 with suppressed corrugation, it is preferred that the extrusion force applied by the roller to the base material is uniform in the width direction, and the extrusion force does not differ depending on the location where the roller contacts the base material. However, the base material has a harder metal structure in some parts, or is thicker in some parts. Therefore, the extrusion force applied to the roller rolling the base material may become uneven in the width direction. In order to suppress such uneven extrusion force, a method of providing an adjustment mechanism at both ends of the roller for maintaining the extrusion force fixed can be cited. Thus, by ensuring the uniformity of the extrusion force distribution, there is a tendency for the corrugation shape to be suppressed.

[0216] In addition, in the rolling process, a control system such as the following may also be used: it analyzes the shape of the metal plate during rolling, and controls the extrusion force or extrusion position of the working roll on the metal plate according to the results of the analysis. It should be noted that various control parameters can be set by those skilled in the art as needed. For example, it is also possible to detect the shape of the metal plate in real time, and adjust the offset of the working roll according to its shape to an amount that makes the tolerance of the surface shape of the plate fall within a specified range, thereby suppressing the corrugation during rolling and making the shape more uniform. In addition, the offset of the working roll refers to the offset from the center position of the working roll located above and below the metal plate being rolled. For example, it is also possible to control the warping of the plate by staggering the working rolls located above and below the metal plate, thereby eliminating the shape of the metal plate.

[0217] In addition, in order to further improve the accuracy of the shape uniformization control, from the perspective of improving the accuracy of real-time detection of the shape of the metal plate, the thickness gauge can also be made more accurate. In addition, it is also possible to set a plurality of thickness measurement points in the width direction, measure the thickness of the side parts in addition to the central part, and control the extrusion force and extrusion position based on the information. In addition, since it is necessary to perform rolling by the work roll with a specified offset amount on a specific part of the metal plate transported in a certain direction, the plate speed gauge can also be made more accurate.

[0218] The slitting process is a process of cutting off the two ends of the long metal plate 100. In this way, cracks that may be generated at the two ends of the long metal plate 100 due to rolling can be removed. By implementing such a slitting process, the breakage of the long metal plate 100 generated from the crack as the starting point, that is, the so-called plate cracking, is suppressed. In addition, the slitting process may include: cutting off the two ends of the long metal plate 100 in the width direction over a predetermined range, thereby adjusting the width of the long metal plate 100 to a desired width.

[0219] For example, the base material 55 may be rolled to produce a long metal plate 100 having a full width exceeding 500 mm, for example, a full width of 700 mm, and then the two ends of the long metal plate 100 in the width direction may be cut to produce a long metal plate 100 having a width of 500 mm. At this time, the two ends of the long metal plate 100 may be cut evenly by 100 mm, or may be cut unevenly so that the total width of the cut pieces is 200 mm.

[0220] For example, when there is a region with a relatively large elongation difference at one end of the long metal plate 100, the one end of the long metal plate 100 having a full width of 700 mm may be cut more than the other end. In addition, when a region with a small elongation difference is offset from the center to one end of the long metal plate 100, both ends may be cut so that the portion with a small elongation difference becomes the central portion 140 of the 700 mm wide long metal plate 100 after the slitting process.

[0221] The annealing step is a step of heat treating the long metal plate 100. In this way, the residual stress (internal stress) accumulated in the long metal plate 100 due to rolling is removed. The heat treatment method is not particularly limited, for example, Figure 4B As shown, the long metal plate 100 can be transported in the direction D5 in a roll-to-roll manner while the long metal plate 100 is heat treated using the annealing device 57 during the process. In addition, at this time, the long metal plate 100 can also be stretched in the transport direction (length direction D2) while being heat treated. In addition, in addition to this, the heat treatment can also be performed in a batch manner when the long metal plate 100 is wound around the core 61.

[0222] The annealing process can be carried out in a non-reducing atmosphere or an inert gas atmosphere. Here, a non-reducing atmosphere refers to an atmosphere that does not substantially contain reducing gases such as hydrogen. "Substantially free of reducing gases" means that the concentration of reducing gases such as hydrogen is less than 4%. In addition, an inert gas atmosphere refers to an atmosphere in which an inert gas such as argon, helium, and nitrogen exists in an amount of more than 90%. By carrying out the annealing process in a non-reducing atmosphere or an inert gas atmosphere, the generation of nickel hydroxide and the like on the first surface 110 and the second surface 120 of the long metal plate 100 can be suppressed.

[0223] The processing conditions of the annealing step can be appropriately set according to the thickness of the long metal plate 100, the rolling ratio, etc. For example, the processing conditions of the annealing step can be 500°C and 60 seconds.

[0224] The rolling process, the slitting process and the annealing process may be repeated multiple times. In addition, at this time, these processes may be performed in different orders. According to the manufacturing method of the metal plate disclosed in the present invention, there is a tendency to obtain a long metal plate 100 with high homogeneity over a wider range.

[0225] The metal mask of the present disclosure is described. In addition, in this specification and the drawings, unless otherwise specified, an example of a metal mask used in manufacturing an organic EL display device and an example of a method for manufacturing the metal mask are described as one embodiment of the present invention.

[0226] The metal mask 20 of the present disclosure includes a hole region 22 and a peripheral region 23. The hole region 22 is a region where a plurality of through holes 25 are formed. In addition, the peripheral region 23 is a region located around the hole region 22.

[0227] Figure 5A A top view of the second surface 20b side of the metal mask 20 of one embodiment of the present disclosure is shown. As shown in Fig. 1, the metal mask 20 may also have a substantially rectangular outline when viewed from above. In addition, in the present disclosure, "viewed from above" means observing the metal mask 20 from a surface along the plate surface of the metal mask 20.

[0228] Figure 5B An example of a perspective view of the perforated region 22 as viewed from the second surface 20b side is shown. Figure 5C Shows Figure 5B A cross-sectional view of section II is shown. Figure 5B and Figure 5C This is an example in which the second wall surfaces 36 of the second recessed portions 35 of the adjacent through holes 25 merge with each other on the second surface 20 b .

[0229] like Figure 5B and Figure 5C As shown in the figure, the through hole 25 has a first recessed portion 30 formed on the first surface 20a, a second recessed portion 35 formed on the second surface 20b, and a circumferential connecting portion 41 connecting the first recessed portion 30 and the second recessed portion 35. The through hole 25 is formed by connecting the first recessed portion 30 on the first surface 20a side and the second recessed portion 35 on the second surface 20b side. Moreover, the portion where the first recessed portion 30 and the second recessed portion 35 are connected is the connecting portion 41. The first wall surface 31 of the first recessed portion 30 and the second wall surface 36 of the second recessed portion 35 are connected via the circumferential connecting portion 41.

[0230] The area of ​​the first recessed portion 30 when viewed from above may also gradually decrease from the first surface 20a toward the second surface 20b. In addition, the area of ​​the second recessed portion 35 when viewed from above may also gradually decrease from the second surface 20b toward the first surface 20a. In addition, the first recessed portion 30 may also be configured as a recessed portion having a smaller diameter than the second recessed portion 35.

[0231] In addition, the direction in which the wall surface of the through hole 25 expands changes discontinuously at the connection portion 41. Usually, at the connection portion 41, the opening area of ​​the through hole 25 in a plan view becomes the smallest.

[0232] in addition, Figure 5D Another example of a perspective view of the perforated region 22 as viewed from the second surface 20b side is shown. Figure 5D This is an example in which the second wall surfaces 36 of the second recessed portions 35 of the adjacent through holes 25 do not merge with each other on the second surface 20 b .

[0233] The metal mask 20 of the present disclosure has a first surface 20a and a second surface 20b as the front and back surfaces. In the present disclosure, the first surface 20a and the second surface 20b of the metal mask 20 are distinguished by the diameter of the through hole 25 in the front and back surfaces of the hole area 22. Specifically, Figure 5D As shown, the first surface 20a refers to the surface where the opening area of ​​the through hole 25 is smaller in the hole area 22, and the second surface 20b refers to the surface where the range S3 of the through hole 25 is larger. Figure 5B , 5C As shown in the figure, in the second surface 20b, when the second wall surfaces 36 of the second recessed portions 35 of the adjacent through holes 25 merge, the range S3 closed by the ridges 33 surrounding one through hole 25 can also be regarded as the opening of the through hole 25. In this case, the range closed by the ridges 33 becomes the opening area.

[0234] In addition, from the perspective of the vapor deposition process, the first surface 20a may be a surface of the metal mask 20 that faces the substrate 92 when the metal mask device 10 is accommodated in the vapor deposition device 90 (see Figure 8 ). In addition, the second surface 20b may be a surface of the metal mask 20 located on the side of the crucible 94 holding the evaporation material 98 when the metal mask device 10 is accommodated in the evaporation device 90 (see Figure 8 ).

[0235] In the metal mask 20 of the present disclosure, one porous region 22 may also be configured to correspond to one organic EL display device. Figure 5A As shown in FIG. 1 , the metal mask 20 may include a plurality of perforated regions 22 arranged in a row at predetermined intervals along the length direction D7. In addition, the metal mask 20 may include a plurality of rows of perforated regions 22 in the width direction D6. Figure 5A In the embodiment, the peripheral region 23 is located around each of the hole regions 22. By using such a metal mask 20, a plurality of organic EL display devices can be vapor-deposited on a substrate 92 to be described later.

[0236] The hole region 22 of the metal mask 20 may have a total pitch mark 28. The total pitch mark 28 is a mark provided for evaluating the positional accuracy between the plurality of through holes 25 in the metal mask 20, and the like.

[0237] For example, the total spacing mark 28 may be arranged near the corner of each perforated area 22 and outside the perforated area 22 (i.e., the surrounding area 23), or may be arranged inside the perforated area 22. The total spacing mark 28 may also be formed as a concave shape by half etching at a desired position on the first surface 20a or the second surface 20b in the first surface etching process or the second surface etching process described later. Alternatively, a through hole extending from the first surface 20a to the second surface 20b may be formed and used as the total spacing mark 28. In addition, in Figure 5A In FIG. 1 , an example is shown in which the planar shape of the total pitch mark 28 is a circle, but the present invention is not limited to this and may be any shape such as a rectangle.

[0238] also, Figure 5A The “distance TP” shown is the distance between the total pitch marks 28 and is the distance between both ends of the perforated region 22 arranged in the longitudinal direction D7 .

[0239] As described later, the metal mask 20 of the present disclosure is obtained by the method for manufacturing a metal mask according to one embodiment of the present disclosure, and thus the positional accuracy and dimensional accuracy of the through-holes 25 tend to be improved.

[0240] Next, a method for manufacturing a metal mask according to an embodiment of the present disclosure will be described.

[0241] The method for manufacturing a metal mask according to an embodiment of the present disclosure comprises: a preparation step of preparing a long metal plate 100 having a first surface 110 and a second surface 120 located on the opposite side of the first surface 110; and an etching step of forming the metal mask 20 by etching the long metal plate 100. As the long metal plate 100, the long metal plate 100 described above is used.

[0242] In addition, a method of manufacturing the metal mask 20 by etching will be described below, but the metal mask 20 may be formed by etching or by laser processing.

[0243] Main reference Figure 6A to Figure 6E A method for manufacturing the metal mask 20 according to one embodiment of the present disclosure will be described. Fig. 6A 1 is a schematic diagram showing a manufacturing apparatus 70 for manufacturing a metal mask 20 using a long metal plate 100 and its processing sequence. Fig. 6A, an example of continuously supplying the long metal plate 100 from the resist film forming device 71 to the stripping device 74 is shown. However, the manufacturing method of the metal mask 20 disclosed in the present invention is not limited to this, and for example, the long metal plate 100 may be wound up to form a winding body each time it passes through the processing based on each device. In addition, when supplying the long metal plate 100 to each device, the long metal plate 100 may be unwound from the winding body for supply.

[0244] Hereinafter, each step of the method for manufacturing the metal mask 20 will be described in detail.

[0245] First, a long metal plate 100 having a desired thickness is prepared (preparation step). The long metal plate 100 may also be in the form of a winding body 62 wound around a core 61. There is no particular limitation on the method for making the long metal plate 100 having a desired thickness, and examples thereof include the above-mentioned rolling method, plating film forming method, and the like.

[0246] Next, using the resist film forming apparatus 71, resist films 53a and 53b are formed on the first surface 110 and the second surface 120 of the long metal plate 100 ( Figure 6B Specifically, the resist films 53a and 53b may be formed by pasting a dry film resist on the first surface 110 and the second surface 120. In addition, the resist films 53a and 53b may be formed by applying a coating liquid containing a photosensitive resist material to the first surface 110 and the second surface 120 and drying the coating liquid.

[0247] There is no particular limitation on the dry film resist or the coating liquid, and conventionally known materials can be used. In addition, the resist films 53a and 53b formed in this way can be negative resists or positive resists. Among them, negative resists are preferably used.

[0248] The thickness of the resist films 53a and 53b may preferably be 15 μm or less, 10 μm or less, 6 μm or less, or 4 μm or less. In addition, the thickness of the resist films 53a and 53b may preferably be 1 μm or more, 3 μm or more, 5 μm or more, or 7 μm or more. The range of the thickness of the resist films 53a and 53b may also be determined by a combination of any one of the above-mentioned multiple upper limit candidate values ​​and any one of the above-mentioned multiple lower limit candidate values.

[0249] Next, the resist films 53a and 53b are exposed and developed using the exposure and development device 72. Figure 6CAs shown, a first resist pattern 53c can be formed on the first surface 110, and a second resist pattern 53d can be formed on the second surface 120. For example, when a negative resist film is used, a photomask that prevents light from penetrating the region to be removed in the resist film can be arranged on the resist film, and the resist film can be exposed through the photomask, and then the resist film can be developed.

[0250] Next, the long metal plate 100 is etched using the first resist pattern 53c and the second resist pattern 53d as masks using the etching device 73 (etching step). The etching step may include a first surface etching step and a second surface etching step.

[0251] Fig.6D A schematic diagram showing an example of the first surface etching process in the porous region 22 is shown. In the first surface etching process, an etching liquid is used to etch the area not covered by the first resist pattern 53c in the first surface 110. At this time, the second surface 120 may also be covered with a resin or the like that is resistant to the etching liquid.

[0252] The etching liquid causes the first surface 110 not covered by the first resist pattern 53c to be eroded ( Fig.6D ). Thus, a plurality of first recesses 30 are formed on the first surface 110. It should be noted that the etching of the long metal plate 100 can also be performed isotropically from the hole of the resist pattern toward various directions. Therefore, the cross-sectional areas of the first recesses 30 and the second recesses 35 at various positions along the thickness direction of the metal mask 20 become a shape that gradually decreases as it moves in the thickness direction from the surface.

[0253] exist Fig. 6E 2 shows a schematic diagram showing an example of the second surface etching process in the porous region 22. In the second surface etching process, an etching liquid is used to etch the area of ​​the second surface 120 that is not covered by the second resist pattern 53d. At this time, the film or the like covering the second surface 120 in the first surface etching process may be peeled off in advance. In addition, the first surface 110 may also be covered with a resin 54 or the like that is resistant to the etching liquid.

[0254] The etching liquid causes the second surface 120 not covered by the second resist pattern 53d to be eroded ( Fig. 6E ). Thus, the second recess 35 is formed on the second surface 120. Furthermore, the first recess 30 and the second recess 35 are communicated with each other, thereby forming the through hole 25.

[0255] The etching liquid is not particularly limited as long as it is a conventionally known etching liquid, and examples thereof include an etching liquid containing a ferric chloride solution and hydrochloric acid.

[0256] In the second side etching process, if Fig. 6E As shown in the figure, etching may be performed until adjacent second recesses 35 are connected to each other. At the portion where adjacent second recesses 35 are connected, adjacent second recesses 35 merge to form a ridge 33. In addition, the ridge 33 is separated from the second resist pattern 53d, and at the top of the ridge 33, the erosion based on etching also advances in the thickness direction of the long metal plate 100. Thus, the second resist pattern 53d is peeled off from the long metal plate 100. In addition, the second surface 120 may be partially left between the adjacent second recesses 35.

[0257] Furthermore, the resin 54 or the like resistant to the resist pattern or the etching solution is peeled off from the long metal plate 100 using the peeling device 74. Then, the following separation step is performed: the long metal plate 100 is cut into pieces using the separation device 75, thereby separating the metal mask 20 composed of a single metal plate from the long metal plate 100. In this way, the metal mask 20 can be obtained.

[0258] According to such a method of manufacturing the metal mask 20 , since the above-mentioned metal plate 100 is used, there is a tendency that a metal mask having excellent positional accuracy and dimensional accuracy of the through holes can be obtained.

[0259] The metal mask device 10 according to one embodiment of the present disclosure includes a frame 15 and the metal mask 20 provided on the frame 15. The metal mask 20 may be provided on the frame 15 so that the second surface 20b contacts the frame 15. Figure 7 FIG. 2 shows a top view of the metal mask device 10 viewed from the first surface 20a side of the metal mask 20. Figure 8 A cross-sectional view showing a vapor deposition device is shown.

[0260] The metal mask device 10 of the present disclosure can also install multiple metal masks 20 ( Figure 7 In this case, the plurality of metal masks 20 may be arranged in the width direction D1 intersecting the length direction D2 of the metal mask 20. In addition, each metal mask 20 may be fixed to the frame 15 at both ends 23a of the metal mask 20 in the length direction D2.

[0261] The method of fixing to the frame 15 is not particularly limited, and examples thereof include welding and the like.

[0262] The metal mask device 10 may also include a component that is fixed to the frame 15 and partially overlaps the metal mask 20 in the thickness direction of the metal mask 20. Examples of such a component are not particularly limited, and include, for example, a component that extends in a direction intersecting the length direction of the metal mask 20 and supports the metal mask 20, and a component that overlaps the gap between two adjacent metal masks.

[0263] Next, refer to Figure 8 A method of manufacturing an organic EL display device using the metal mask 20 of the present disclosure will be described. The organic EL display device may include a substrate 92 and a vapor deposition layer including a vapor deposition material 98 provided in a pattern in a stacked state.

[0264] The method for manufacturing the organic EL display device according to one embodiment of the present disclosure is not particularly limited, and includes, for example, a vapor deposition step of vapor-depositing the vapor deposition material 98 onto a substrate such as the substrate 92 using the metal mask 20 .

[0265] In the vapor deposition process, first, the metal mask device 10 is arranged so that the metal mask 20 and the substrate 92 face each other. Figure 8 As shown in FIG. 1 , the first surface 20a of the metal mask 20 may be opposed to the substrate 92. Here, the substrate 92 is a vapor deposition object such as a glass substrate.

[0266] like Figure 8 As shown, when the metal mask device 10 is stored in the evaporation device 90, the surface of the metal mask 20 facing the substrate 92 is the first surface 20a, and the surface of the metal mask 20 located on the crucible 94 side holding the evaporation material 98 is the second surface 20b. In the evaporation device 90, the metal mask 20 is arranged on the surface of the substrate 92 on the crucible 94 side. Here, the metal mask 20 and the substrate 92 can also be closely attached by magnetic force.

[0267] In the evaporation device 90, a crucible 94 for storing the evaporation material 98 and a heater 96 for heating the crucible 94 may be arranged below the metal mask device 10. Here, as an example, the evaporation material 98 may also be an organic light-emitting material. The evaporation material 98 in the crucible 94 is vaporized or sublimated by the heating from the heater 96. The vaporized or sublimated evaporation material 98 is attached to the substrate 92 through the through hole 25 of the metal mask 20. Thus, the evaporation material 98 is formed on the surface of the substrate 92 in a desired pattern corresponding to the position of the through hole 25 of the metal mask 20. In addition, in the evaporation process, the interior of the evaporation device 90 may also be a vacuum atmosphere.

[0268] When different types of deposition materials are to be deposited according to pixels such as RGB, different metal masks 20 may be used according to the colors of the deposition materials 98 and the deposition materials 98 may be formed into films on the surface of the substrate 92. For example, the deposition materials 98 for red, the deposition materials 98 for green, and the deposition materials 98 for blue may be sequentially deposited on the substrate 92. In addition, the metal mask 20 (metal mask device 10) and the substrate 92 may be relatively moved little by little along the arrangement direction of the through holes 25 (the aforementioned one direction), and the deposition materials 98 for red, the deposition materials 98 for green, and the deposition materials 98 for blue may be sequentially deposited.

[0269] In addition, the method for manufacturing an organic EL display device may include various steps in addition to the vapor deposition step of vapor-depositing the vapor deposition material 98 on a substrate such as a substrate 92 using a metal mask 20. For example, the method for manufacturing an organic EL display device may include a step of forming a first electrode on a substrate. The vapor deposition layer is formed on the first electrode. In addition, the method for manufacturing an organic EL display device may include a step of forming a second electrode on the vapor deposition layer. In addition, the method for manufacturing an organic EL display device may include a sealing step of sealing the first electrode, the vapor deposition layer, and the second electrode provided on the substrate 92.

[0270] The vapor deposition layer formed on the substrate 92 or the like using the metal mask 20 is not limited to the light-emitting layer formed by vapor deposition of the above-mentioned organic light-emitting material, but may also include other layers. For example, the vapor deposition layer may include a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer, etc. in order from the first electrode side. In this case, the vapor deposition process using the metal mask 20 corresponding to each layer may also be implemented separately.

[0271] According to the method for manufacturing an organic EL display device of the present disclosure, since the above-mentioned metal mask 20 is used, there is a tendency that an organic EL display device having excellent pixel size accuracy and position accuracy can be obtained.

[0272] In addition, various changes can be made to the above-mentioned embodiment. Below, the modified example is described with reference to the accompanying drawings as needed. In the following description and the accompanying drawings used in the following description, for the parts that can be constructed in the same way as the above-mentioned embodiment, the same reference numerals as those used for the corresponding parts in the above-mentioned embodiment are used, and repeated descriptions are omitted. In addition, in the case where it is obvious that the effects obtained in the above-mentioned embodiment can also be obtained in the modified example, its description is sometimes omitted.

[0273] As a modified example, Figure 1H , a perspective view showing another example of the long metal plate 100 of the present disclosure is shown. When the elongation difference En of the long metal plate 100 in the modified example is measured at a specific position in the longitudinal direction D2, the difference in the elongation difference En is 9.0×10 -6 the following.

[0274] Right now, Figure 1A The method shown is to measure the elongation difference En at any position in the length direction D2, and on the contrary, Figure 1HThe method shown in the figure is different in that the position for measuring the elongation difference En is determined, and the other structures are the same. The specific position in the length direction D2 in the modified example includes: the two ends 160 in the length direction of the long metal plate 100; and one or more parts 170 that divide the long metal plate 100 in the length direction D2.

[0275] exist Figure 1H , two parts 170 are shown to divide the long metal plate 100 into three parts in the length direction D2. Figure 1H The total length of the long metal plate 100 shown is 600 m, one end is set to 0 m, and the elongation difference En is measured at the positions of 0 m, 200 m, 400 m, and 600 m.

[0276] In addition, the unit length L0 is, for example, a measurement range having a width of 1280 mm. "Measuring the elongation difference En at a specific position in the length direction D2" means: as long as the measurement range includes positions such as 0 m, 200 m, 400 m and 600 m. For example, if the range of 200 m ± 0.64 m from one end is measured, it can be said that the elongation difference En is measured at a position 200 m away from one end. In addition, if the range of 0 m to 1.28 m from one end, or 598.72 m to 600 m from one end is measured, it can be said that the elongation difference En is measured at a position 0 m or 600 m away from one end.

[0277] The portion 170 is located at a position that evenly divides the long metal plate 100 into one or more portions in the length direction D2 . The number of the portions 170 can be determined according to the length of the long metal plate 100 .

[0278] The number of parts 170 can be set to the same degree as the above-mentioned selected number, for example, it can be 1 place / 100m or more and 100 places / 100m or less, 3 places / 100m or more and 90 places / 100m or less, 5 places / 100m or more and 80 places / 100m or less, 7 places / 100m or more and 70 places / 100m or less, 10 places / 100m or more and 60 places / 100m or less, 15 places / 100m or more and 50 places / 100m or less, or 20 places / 100m or more and 40 places / 100m or less.

[0279] Even in such a long metal plate 100 , the homogeneity is high over a wider range.

[0280] The manufacturing method of the metal plate of the modified example is the same as that described above, including a rolling process for rolling the base material to obtain a long metal plate 100. If necessary, it may also include a slitting process for cutting off both ends of the long metal plate 100 and an annealing process for heat treating the long metal plate 100.

[0281] In addition, the manufacturing method of the metal mask of the modified example is the same as that described above, and comprises: a preparation step of preparing a long metal plate 100 having a first surface 110 and a second surface 120 located on the opposite side of the first surface 110; and an etching step of forming the above-mentioned metal mask 20 by etching the long metal plate 100.

[0282] Hereinafter, the present invention will be described in more detail using Examples and Comparative Examples. The present invention is not limited to the following Examples at all.

[0283] (1st winding body and 1st sample)

[0284] First, a base material made of an Invar alloy material is subjected to the above-mentioned rolling step, slitting step, and annealing step, thereby manufacturing a plurality of coils formed by winding a long metal plate.

[0285] Specifically, first, a first rolling process is performed in which a first hot rolling process and a first cold rolling process are performed in sequence, then a first slitting process is performed in which both ends of the long metal plate in the width direction are cut off by 3 to 5 mm respectively, and then a first annealing process is performed in which the long metal plate is continuously annealed at 500°C for 60 seconds.

[0286] Furthermore, the long metal plate that has undergone the first annealing process is subjected to a second rolling process including a second cold rolling process, followed by a second slitting process in which both ends of the long metal plate in the width direction are cut off by 3 to 5 mm respectively, and then a second annealing process in which the long metal plate is continuously annealed at 500°C for 60 seconds is carried out.

[0287] Thus, a 600 mm wide long metal plate 100 having a desired thickness is obtained. Then, the following slitting process is performed: both ends of the long metal plate 100 in the width direction are cut off over a predetermined range, thereby finally adjusting the width of the long metal plate 100 to the desired width, specifically, to 500 mm.

[0288] It should be noted that, regarding the cold rolling process, the cold rolling process is performed while the long metal plate 100 is cooled using rolling oil. After the cold rolling process, a cleaning process of cleaning the long metal plate with a hydrocarbon-based cleaning agent is performed. After the cleaning process, the above-mentioned slitting process, annealing process and slitting process are implemented. Then, the end portion of the coil is cut off, thereby obtaining a first sample consisting of a long metal plate with a width of 500 mm and a length of 600 m.

[0289] Next, use Figure 3A to Figure 3C The device and method shown in the figure continuously measure the height position of the surface of the first sample to obtain the height distribution of the long metal plate 100. Then, based on the height distribution, the distribution of the elongation difference En under the unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is obtained. In addition, the measurement interval of the height distribution is set to an interval of 2 mm in the width direction D1 and an interval of 10 mm in the longitudinal direction D2.

[0290] In addition, the unit length L0 is set to 1280 mm. In addition, the measurement of the elongation difference En is performed in the range of 0m to 1.28m, the range of 200m±0.64m, the range of 400m±0.64m, and the range of 598.72m to 600m from one end. In addition, the unit length L0 (1280m) is the unit length when assuming a metal mask of a larger product size.

[0291] (Second to fifth winding bodies and second to fifth samples)

[0292] The second to fifth wound bodies were manufactured from a base material made of an Invar material in the same manner as the first wound body. Furthermore, the elongation differences of samples taken out from the second to fifth wound bodies were measured in the same manner as the first wound body.

[0293] In the second wound body, pressure adjustment is performed in the hot rolling step and the cold rolling step so that the pressing force applied to the center portion of the metal plate does not substantially change in accordance with the passage of the base material.

[0294] In the third coil, the pressure is adjusted so that the variation of the pressing force applied to the center of the metal plate in accordance with the passage of the base material is more suppressed than when the second coil is manufactured. In addition, the thickness of the center of the metal plate is detected in real time, and the offset amount and direction of the work rolls located above and below the metal plate are adjusted according to the thickness.

[0295] In the fourth wound body, as in the case of manufacturing the second wound body, the variation of the extrusion force applied to the center of the metal plate in accordance with the passage of the base material is suppressed, and further, the pressure is adjusted so that the extrusion force applied to the base material is relatively uniform in the width direction. That is, the pressure is adjusted in such a way that the variation of the extrusion force applied to the center of the metal plate is suppressed, and the variation of the extrusion force applied to the side is also suppressed.

[0296] In the fifth coil, the variation of the extrusion force applied to the center of the metal plate in accordance with the passage of the base material is suppressed as in the case of manufacturing the second coil, and further, the pressure is adjusted so that the uniformity of the extrusion force applied to the base material in the width direction is further improved than in the case of manufacturing the fourth coil. Thus, the pressure is adjusted in such a way that the variation of the extrusion force applied to the center of the metal plate is suppressed, and the variation of the extrusion force applied to the side is also suppressed. In addition, at this time, the thickness of the center and side of the metal plate is detected in real time, and the offset amount and direction of the work rolls located above and below the metal plate are adjusted according to the thickness.

[0297] In addition, by further suppressing the change in the extrusion force corresponding to the passage of the base material compared to the manufacturing of the second wound body, the overall elongation difference of the central portion can be suppressed to be small in the manufacturing of the third wound body, and the maximum value of the elongation difference of the central portion is also small. However, the overall elongation difference of the central portion of the third wound body obtained in this way is suppressed to be small, while the difference in the overall elongation difference En in the width direction is greater than that of the second wound body.

[0298] It can be seen from this that if the operation of suppressing the overall elongation difference to be small is performed, it is not simply that the difference in the overall elongation difference En in the width direction is also reduced. As a reason for this, it can be considered that: from a microscopic point of view, the thickness of the original base material also varies. Therefore, even if the variation of the extrusion force is made uniform, the difference in the overall elongation difference En in the width direction may become larger due to the deviation in the thickness of the base material. However, the reason is not limited to this.

[0299] In addition, as described above, in the comparison between the second winding body and the third winding body, the result is that the difference in the overall elongation difference En in the width direction of the third winding body is larger than that of the second winding body. However, the comparison between the second winding body and the third winding body does not mean that the suppression of the variation of the extrusion force does not contribute to the reduction of the difference in the elongation difference En. From the comparison between the first winding body and the second winding body, it can be seen that the suppression of the variation of the extrusion force contributes to the reduction of the difference in the elongation difference En.

[0300] (Metal Mask)

[0301] Using the above-mentioned method for manufacturing a metal mask, metal masks 20 were manufactured from the long metal plates 100 of the first to fifth windings. That is, through holes 25 were formed to obtain metal masks 20. Here, a metal mask 20 was manufactured with a size of 67 mm in the width direction D1 and a distance of 1280 mm between the two ends of the holed region 22 arranged in the length direction D2. For 100 metal masks 20 obtained from different locations in the length direction D2 of the first to fifth windings, the following was calculated: Figure 5AThe distance between the total pitch marks 28 as shown, that is, the total pitch (TP), is calculated, and its standard deviation is calculated. Then, the deviation (3σ) of the total pitch is calculated.

[0302] Table 1 shows the maximum value of the difference in elongation difference En at a plurality of positions in the coil of the long metal plate 100 , the maximum value of the elongation difference at the center portion 140 in the coil of the long metal plate 100 , and the deviation (3σ).

[0303] [Table 1]

[0304]

[0305] In addition, the metal mask 20 in which the distance between the two ends of the perforated area 22 arranged in the length direction D2 is set to 980 mm is also produced in the same manner as above, and the total pitch (TP) as the distance between the total pitch marks 28 is calculated, and its standard deviation is calculated. Then, the deviation (3σ) of the total pitch is calculated. At this time, the deviation (3σ) of the total pitch of Comparative Example 1 is 12.5 μm. The unit length L0 of 980 mm is the length in the case of a metal mask assuming a conventional product size. It can be seen from this that in the case of a metal mask assuming a large product size (for example, unit length L0 = 1280 mm), the deviation (3σ) becomes larger.

[0306] In addition, an attempt was made to randomly cut out metal plates from the wound body for measurement. As a result, metal plates with higher values ​​of elongation differential and metal plates with lower values ​​of elongation differential were obtained from the wound body of Comparative Example 1. In this way, although a metal plate with a locally lower value of elongation differential can be obtained from the wound body of Comparative Example 1, the deviation of the elongation differential is still large from the perspective of the wound body as a whole, and the homogeneity of the product cannot be ensured. It can be seen from this that even if the elongation differential is locally evaluated in a shorter area, the deviation of the elongation differential in the long metal plate cannot be evaluated, and thus the homogeneity of the product cannot be evaluated.

[0307] Industrial Applicability

[0308] The present invention has industrial applicability as a long metal plate for manufacturing a metal mask.

[0309] Description of symbols

[0310] 10…metal mask device; 15…frame; 20…metal mask; 20a…first surface; 20b…second surface; 22…perforated region; 23…peripheral region; 23a…end portion; 25…through hole; 27…outer shape; 28…total pitch mark; 30…first concave portion; 31…first wall surface; 33…edge portion; 35…second concave portion; 36…second wall surface; 41…connecting portion; 53a…resist film; 53b…resist film; 53c…first resist pattern; 53d…second resist pattern; 54…resin; 55…parent material; 56a…roller; 56b…roller; 57…annealing device; 61…core; 62…winding body; 70…manufacturing device; 71…resist film forming device; 72…exposure and developing device; 73…etching device; 74…peeling device; 75…separating device; 86…clamp; 90…evaporation device; 92…substrate; 94…crucible; 96…heater; 98…evaporation material; 100…long metal plate; 100k…metal plate; 110…first surface; 120…second surface; 130…side edge; 140…central part; 150…side part; 160…end parts; 170…part; 200…measuring device; 210…conveying mechanism; 211…first roller; 212…second roller; 220…sensor; 221…first moving mechanism; 222…second moving mechanism; 230…workbench; 240…control unit; 250…tension adjustment mechanism; 251…first auxiliary roller; 252…second auxiliary roller.

Claims

1. A metal plate, which is a long metal plate for making a metal mask, wherein: When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction, At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following, The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

2. A metal plate, which is a long metal plate for making a metal mask, wherein: When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction, At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following, The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction. The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

3. The metal plate according to claim 1 or 2, wherein: At the plurality of positions, the maximum value of the elongation difference En in the central portion in the width direction is 2.5×10 --5 the following.

4. The metal plate according to claim 1 or 2, wherein: The metal plate is in a roll shape.

5. The metal plate according to claim 1 or 2, wherein: The length of the metal plate in the longitudinal direction is 50m to 800m.

6. The metal plate according to claim 1 or 2, wherein: The thickness of the metal plate is 50 μm or less.

7. A method for manufacturing a metal plate, which is a method for manufacturing a long metal plate for manufacturing a metal mask, wherein: The method for manufacturing a metal plate comprises a rolling step of rolling a base material to obtain a long metal plate. When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction of the metal plate, At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following, The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

8. A method for manufacturing a metal plate, which is a method for manufacturing a long metal plate for manufacturing a metal mask, wherein: The method for manufacturing a metal plate comprises a rolling step of rolling a base material to obtain a long metal plate. When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction of the metal plate, At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following, The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction. The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

9. A method for manufacturing a metal mask, wherein: The method for manufacturing the metal mask comprises: A rolling process in which a base material is rolled to prepare a long metal plate; and an etching step of forming the metal mask by etching the metal plate, When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at arbitrary positions in the longitudinal direction of the metal plate, At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following, The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions in the width direction that account for 10%.

10. A method for manufacturing a metal mask, wherein: The method for manufacturing the metal mask comprises: A rolling process in which a base material is rolled to prepare a long metal plate; and an etching step of forming the metal mask by etching the metal plate, When the elongation difference En per unit length L0 in the longitudinal direction corresponding to an arbitrary position n in the width direction of the metal plate is measured at a plurality of positions in the longitudinal direction of the metal plate, At the plurality of positions, the difference in the elongation difference En of the central portion in the width direction is 9.0×10 -6 the following, The central portion is a portion of the metal plate that accounts for 80% in the width direction, excluding two side portions that account for 10% in the width direction. The plurality of positions include: both ends of the metal plate in the length direction; and one or more portions that divide the metal plate in the length direction.

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