Cylindrical reflector machining device and method

Abstract

The invention discloses a cylindrical reflector machining device and method, and relates to the technical field of optical element machining, the device comprises a connecting plate and a plurality of machining units arranged on the lower surface of the connecting plate, and each machining unit comprises a constant-pressure supply part, a passive deformation part, a clamping part and a polishing part which are sequentially arranged from top to bottom; the constant-pressure supply component is used for providing constant pressure for the polishing piece, so that the polishing piece keeps the constant pressure in the machining process of the to-be-machined piece, the clamping piece is used for clamping and fixing the passive deformation piece and the polishing piece, and the passive deformation piece is used for controlling the position of the machining unit relative to the connecting plate. The connecting plate is arranged and rotates in the machining process, then the connecting plate drives the constant-pressure supply part, the passive deformation part, the clamping part and the polishing part below the connecting plate, the polishing part can have more freedom degrees in the machining process, the actual machining track has randomness, homogenization of surface high-frequency errors is better facilitated, and therefore the ultra-smooth surface is obtained.

Description

Technical Field

[0001] The present invention relates to the technical field of optical element processing, and in particular to a cylindrical reflector processing device and method. Background Art

[0002] Cylindrical mirrors are specially shaped mirrors, whose surface shape is a part of a cylinder or a cylinder, and have unique optical properties. Unlike traditional plane mirrors or spherical mirrors, cylindrical mirrors are curved in only one direction and remain straight in the other direction. Therefore, cylindrical mirrors can focus or scatter light in one direction, forming a focal line instead of a focal point. This feature makes cylindrical mirrors widely used in laser systems, synchrotron radiation sources and optoelectronic devices.

[0003] At present, the processing of cylindrical reflectors mostly relies on traditional cylindrical polishing machines. This type of polishing equipment mainly controls the movement of the swing shaft through a motor. The swing shaft drives the cylindrical polishing grinding disc connected below to swing along the sagittal direction and reciprocate orthogonally along the meridian direction. The curvature radius of the cylindrical polishing grinding disc is basically the same as the curvature radius of the cylindrical reflector to be processed. Through CNC processing technology, local mirror surfaces in different areas are processed and orthogonal reciprocating motion is performed in a local range, so as to achieve the surface fit of the cylindrical polishing grinding disc and the cylindrical element, and achieve uniform material removal. However, due to its relatively fixed motion trajectory, this processing method is prone to medium and high frequency band errors.

[0004] In addition, when the cylindrical polishing disc has defects or uneven surfaces, this fixed motion trajectory will copy the defects of the cylindrical polishing disc surface to the surface of the cylindrical reflector to be processed, or cause uneven pressure on individual positions of the mirror surface. Due to the certainty of the disc processing path, the medium and high frequency errors of the cylindrical reflector are relatively large, and it is impossible to achieve an ultra-smooth surface, thereby reducing the final processing accuracy.

[0005] In summary, it is difficult to obtain a cylindrical reflector with an ultra-smooth surface using existing optical processing methods. Summary of the invention

[0006] The purpose of the present invention is to provide a cylindrical reflector processing device and method, so as to improve the processing accuracy of the cylindrical reflector, make it have an ultra-smooth surface, simple structure and high processing efficiency.

[0007] In order to solve the above technical problems, an embodiment of the present invention provides a cylindrical reflector processing device, including a connecting plate and a plurality of processing units arranged on the lower surface of the connecting plate, the processing units including a constant pressure supply component, a passive deformation component, a clamping component and a polishing component arranged in sequence from top to bottom, the constant pressure supply component is used to provide a constant pressure to the polishing component so that the polishing component maintains a constant pressure on the workpiece during processing, the clamping component is used to clamp and fix the passive deformation component and the polishing component, and the passive deformation component is used to control the position of the processing unit relative to the connecting plate.

[0008] Among them, it also includes a controller arranged on the upper surface of the connecting plate and connected to the passive deformation member, which is used to control the position change strategy of the processing unit relative to the connecting plate during the processing of the workpiece to be processed.

[0009] Among them, it also includes a memory arranged in the controller, which is used to store various strategies for changing the position of the processing unit relative to the connecting plate during the processing of the workpiece to be processed. The controller is connected to the memory and is used to obtain the strategy for changing the position of the processing unit relative to the connecting plate from the memory.

[0010] Wherein, the polishing piece comprises a grinding disc, a flexible layer and a polishing layer which are connected in sequence, the grinding disc and the flexible layer are bonded by a first glue layer, and the flexible layer and the polishing layer are bonded by a second glue layer.

[0011] Wherein, it also includes a connecting piece arranged above the connecting plate, the connecting piece is a columnar connecting piece or a flange connecting piece, the columnar connecting piece is clamped or bolted to the connecting plate, and the flange connecting piece is flange-connected to the connecting plate.

[0012] Wherein, the plurality of processing units are evenly distributed in the circumferential direction on the lower surface of the connecting plate, and the number of the processing units is greater than or equal to 3.

[0013] Wherein, it also includes a display connected to the controller and the passive deformation member, which is used to display the position change strategy of the processing unit relative to the connecting plate currently executed by the passive deformation member.

[0014] Among them, it also includes an eccentric structure of the grinding disc arranged under the connecting plate and an eccentric motor connected to the eccentric structure of the grinding disc. Multiple processing units are arranged on the eccentric output mechanism of the eccentric structure of the grinding disc. The eccentric motor is connected to the controller to obtain the control instructions of the controller and drive the rotation state of the eccentric structure of the grinding disc, so as to control the relative position of the eccentric output mechanism relative to the connecting plate, and then control the relative position of the processing unit relative to the connecting plate.

[0015] In addition, the embodiment of the present application further provides a cylindrical reflector processing method, which uses the cylindrical reflector processing device described above, including:

[0016] S1: placing the workpiece to be processed under the processing unit of the cylindrical reflector processing device;

[0017] S2: Connecting the interface of the polishing mechanism of the machine tool or the robot arm to the connecting plate of the cylindrical reflector processing device;

[0018] S3: applying a constant pressure to the processing unit through a constant pressure supply component of the cylindrical reflector processing device, so that a constant pressure is maintained between the processing unit and the workpiece to be processed;

[0019] S4: driving the connecting plate to move, so that the polishing member of the processing unit swings along the sagittal direction of the workpiece to be processed and reciprocates along the meridian orthogonal direction;

[0020] S5: Control the processing unit to switch the position at the bottom of the connecting plate.

[0021] Wherein, the S5 further includes:

[0022] The position switching strategy of the processing unit at the bottom of the connecting plate is switched regularly or irregularly.

[0023] The cylindrical reflector processing device and method provided by the embodiments of the present invention have the following advantages compared with the prior art:

[0024] The cylindrical reflector processing device and method provided by the embodiment of the present invention, by setting a connecting plate, rotates during the processing, and then the connecting plate drives the constant pressure supply component, passive deformation component, clamping component and polishing component below. During processing, the polishing component can have more degrees of freedom, so that the actual processing trajectory has randomness, which is more conducive to the averaging of high-frequency surface errors, thereby obtaining an ultra-smooth surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0026] Figure 1 A schematic structural diagram of an embodiment of a cylindrical reflector processing device provided by the present invention;

[0027] Figure 2 A schematic diagram of the position structure of an embodiment of a cylindrical reflector processing device provided by the present invention;

[0028] Figure 3 A schematic diagram of position switching of an embodiment of a cylindrical reflector processing device provided by the present invention;

[0029] Figure 4 A schematic flow chart of the steps of an embodiment of a cylindrical reflector processing method provided by the present invention;

[0030] Among them, there are connecting flange-10, connecting plate-20, constant pressure supply component-30, passive deformation component-40, clamping component-50, grinding disc-60, flexible layer-70, and polishing layer-80. DETAILED DESCRIPTION

[0031] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0032] Please refer to Figure 1-Figure 4 , Figure 1 A schematic structural diagram of an embodiment of a cylindrical reflector processing device provided by the present invention; Figure 2 A schematic diagram of the position structure of an embodiment of a cylindrical reflector processing device provided by the present invention; Figure 3 A schematic diagram of position switching of an embodiment of a cylindrical reflector processing device provided by the present invention; Figure 4 A schematic flow chart of the steps of an embodiment of a method for processing a cylindrical reflector provided by the present invention.

[0033] In a specific embodiment, the cylindrical reflector processing device includes a connecting plate 20 and a plurality of processing units arranged on the lower surface of the connecting plate 20. The processing units include a constant pressure supply component 30, a passive deformation component 40, a clamping component 50 and a polishing component arranged in sequence from top to bottom. The constant pressure supply component 30 is used to provide a constant pressure to the polishing component so that the polishing component maintains a constant pressure on the workpiece during processing. The clamping component 50 is used to clamp and fix the passive deformation component 40 and the polishing component. The passive deformation component 40 is used to control the position of the processing unit relative to the connecting plate 20.

[0034] By setting up a connecting plate 20, which rotates during the processing, the connecting plate 20 then drives the constant pressure supply component 30, the passive deformation component 40, the clamping component 50 and the polishing component below. During processing, the polishing component can have more degrees of freedom, making the actual processing trajectory random, which is more conducive to the averaging of high-frequency surface errors, thereby obtaining an ultra-smooth surface.

[0035] In order to further improve the precise control of the processing unit in the present application, in one embodiment, the cylindrical reflector processing device also includes a controller arranged on the upper surface of the connecting plate 20 and connected to the passive deformation member 40, which is used to control the position change strategy of the processing unit relative to the connecting plate 20 during the processing of the workpiece to be processed.

[0036] By setting up a controller, the position change strategy of the processing unit relative to the connecting plate 20 during the processing of the workpiece to be processed can be actively controlled to improve the control accuracy and control reliability of the processing.

[0037] The structure of the controller is not limited in the present application. Pure mechanical control may be adopted, such as controlling the counterclockwise or clockwise movement of the processing unit in the circumferential direction of the connecting plate 20 through air pressure or hydraulic pressure, etc., or an electronic mechanism, such as a stepper motor, may be adopted to control the corresponding processing unit to move clockwise or counterclockwise along a preset path in an undirected manner according to a certain pattern or rule, or other structures may be adopted for control, etc.

[0038] In order to further improve the convenience and efficiency of control, in one embodiment, the cylindrical reflector processing device also includes a memory arranged in the controller, which is used to store a plurality of position change strategies of the processing unit relative to the connecting plate 20 during the processing of the workpiece to be processed. The controller is connected to the memory and is used to obtain the position change strategy of the processing unit relative to the connecting plate 20 from the memory.

[0039] By setting up a memory to store the corresponding position change strategy, full automatic control can be achieved in subsequent execution without the need for manual operation throughout the process, thereby improving the degree of automation, efficiency and accuracy of processing.

[0040] The memory in the present application may store a plurality of pre-set path modes, such as one clockwise circle followed by one counterclockwise circle, or two clockwise circles followed by one counterclockwise circle, or other change modes, such as phase change, etc. The staff may select one of the working modes before processing, or may customize the input of the self-set mode, or may optimize after comparing different modes, etc.

[0041] In the present application, a polishing part is used to perform the polishing operation, and the structure of the polishing part is not limited. In one embodiment, the polishing part includes a grinding wheel 60, a flexible layer 70 and a polishing layer 80 connected in sequence, the grinding wheel 60 and the flexible layer 70 are bonded by a first glue layer, and the flexible layer 70 and the polishing layer 80 are bonded by a second glue layer.

[0042] The grinding disc 60, the flexible layer 70 and the polishing layer 80 are formed into a whole through the glue layer. The grinding disc 60 can be connected to the mechanical structure, and the flexible layer 70 is used as a transition. The polishing layer 80 is connected with the glue layer, so that even if it is damaged, it can be directly replaced without replacing the grinding disc 60, etc., and the replacement cost is low.

[0043] The present application includes but is not limited to the above-mentioned polishing parts.

[0044] In the present application, since it is necessary to control the movement of the connecting plate 20, in order to facilitate installation, in one embodiment, the cylindrical reflector processing device also includes a connecting piece arranged above the connecting plate 20, and the connecting piece is a cylindrical connecting piece or a flange connecting piece, and the cylindrical connecting piece is clamped or bolted to the connecting plate 20, and the flange connecting piece is flange-connected to the connecting plate 20.

[0045] By providing a connector, during the processing, a robot arm or a machine tool or other components can be connected via the connector, which facilitates the installation of the entire device. There is no need to directly provide a mounting hole on the connecting plate 20, thereby reducing the difficulty of installation.

[0046] If the upper end of the connecting flange 10 is connected to a polishing mechanism such as a robot arm / machine tool, the connecting flange 10 is coaxial with the connecting plate 20 and connected by screws.

[0047] In the present application, processing units are used for processing operations, and there is no limitation on the distribution and number of the processing units. In one embodiment, a plurality of the processing units are evenly distributed circumferentially on the lower surface of the connecting plate 20, and the number of the processing units is greater than or equal to 3.

[0048] In order to further improve the management of the processing process, in one embodiment, the cylindrical reflector processing device also includes a display connected to the controller and the passive deformation member 40, which is used to display the position change strategy of the processing unit relative to the connecting plate 20 currently executed by the passive deformation member 40.

[0049] By using a display to display the position change strategy of the processing unit relative to the connecting plate 20 currently executed by the passive deformation member 40, the staff can obtain the current work progress and work mode parameters, thereby improving management efficiency.

[0050] In addition, the parameters and operation procedures of the previous operation as well as the parameters and operation procedures of the subsequent operation can also be displayed, so that the staff can set the next parameters during the operation of the equipment.

[0051] In the present application, a controller is used to control the relative position of the processing unit to the connecting plate 20. In order to further improve the control accuracy of the processing unit, in one embodiment, the cylindrical reflector processing device also includes an eccentric structure of a grinding disc 60 arranged under the connecting plate 20 and an eccentric motor connected to the eccentric structure of the grinding disc. Multiple processing units are arranged on the eccentric output mechanism of the eccentric structure of the grinding disc. The eccentric motor is connected to the controller to obtain the control instruction of the controller and drive the rotation state of the eccentric structure of the grinding disc, so as to control the relative position of the eccentric output mechanism relative to the connecting plate 20, and then control the relative position of the processing unit relative to the connecting plate 20.

[0052] By setting an eccentric structure of the grinding disc and an eccentric motor connected to the eccentric structure of the grinding disc, the rotation state of the eccentric structure of the grinding disc can be driven by the eccentric motor, thereby controlling the relative position of the eccentric output mechanism with respect to the connecting plate 20, and further controlling the relative position of the processing unit with respect to the connecting plate 20, thereby realizing the switching of the position of the processing unit.

[0053] In addition, a planetary gear structure or other structures may be used for position switching.

[0054] In addition, the embodiment of the present application further provides a cylindrical reflector processing method, which uses the cylindrical reflector processing device described above, including:

[0055] S1: placing the workpiece to be processed under the processing unit of the cylindrical reflector processing device;

[0056] S2: Connecting the interface of the polishing mechanism of the machine tool or the mechanical arm to the connecting plate 20 of the cylindrical reflector processing device;

[0057] S3: applying a constant pressure to the processing unit through the constant pressure supply component 30 of the cylindrical reflector processing device, so that a constant pressure is maintained between the processing unit and the workpiece to be processed;

[0058] S4: driving the connecting plate 20 to move, so that the polishing member of the processing unit swings along the sagittal direction and reciprocates along the meridian orthogonal direction on the workpiece to be processed;

[0059] S5: Control the processing unit to switch the position at the bottom of the connecting plate 20.

[0060] Since the cylindrical reflector processing method adopts the above-mentioned cylindrical reflector processing device, it has the same beneficial effects, and this application will not elaborate on it.

[0061] In the present application, the position of the processing unit needs to be switched at the bottom of the connecting plate 20, and no limitation is imposed on the position, control structure, and control method of the processing unit.

[0062] In order to improve the processing accuracy, in one embodiment, the S5 further includes:

[0063] The position switching strategy of the processing unit at the bottom of the connecting plate 20 is switched regularly or irregularly.

[0064] By switching the position switching strategy of the processing unit at the bottom of the connecting plate 20 at regular or irregular intervals, the randomness of the position control of the processing unit can be achieved, thereby improving the control accuracy.

[0065] It should be pointed out that the polishing device and polishing method mentioned above in the present application are mainly aimed at the fine polishing stage. At this time, the cylindrical reflector already has a very high surface accuracy, so there will be no small protrusions on the curved surface, and the height difference of the uneven surface is at the nanometer level, which will not cause any impact on the clamping parts during the processing.

[0066] After polishing, the diameter of the small particles produced is also at the nanometer level, which cannot be directly distinguished by the human eye. Therefore, there is no need for blowing out with a fan or static pressure adsorption. Only simple cleaning with clean water or alcohol is required.

[0067] The passive deformation part 40 controls the free displacement of multiple small-diameter cylindrical polishing grinding discs 60. During the displacement control, constant pressure control is still maintained. At this time, polishing freedom will be generated within the overall polishing working surface, that is, the internal freedom will be increased, thereby improving the polishing efficiency and polishing quality. There are many control methods, such as control through the eccentric structure of the grinding disc under the drive of the motor, or simultaneous control by the planetary gear structure.

[0068] In the process of position switching of the processing unit in this application, a corresponding grinding disc device control program is required, but only the circumferential position is replaced, and the diagonal position cannot be directly replaced, and the position replacement is carried out simultaneously, without any order, whether it is clockwise or counterclockwise, the effect is the same, such as Figure 3 As shown, the counterclockwise direction is from the initial position ABCD to DABC, and the clockwise direction is from the initial position ABCD to BAD-C, but both sequences allow the grinding disc 60 to swing along the sagittal direction and move orthogonally in the meridian direction while obtaining movement along the vertical direction, so that the processing path of the entire grinding disc 60 is random. The state of the passive deformation member 40 can be detected, for example, the pressure during the processing and the physical coordinates of the processing position can be directly displayed on the passive deformation member 40.

[0069] Figure 2 and Figure 3In the arrows in FIG. 1 , the arrows between different positions represent the position switching of the polishing parts corresponding to different processing units, such as Figure 2 and Figure 3 In the figure, the position switching is performed clockwise, and the arrows in the same position represent the swing in the sagittal direction and the orthogonal motion in the meridian direction.

[0070] therefore, Figure 2 and Figure 3 The arrow in the figure represents the running direction of the polishing part.

[0071] In one embodiment, the cylindrical reflector processing device includes a connecting flange 10, a constant pressure supply component 30, a passive deformation component 40, a small-caliber adaptive flexible cylindrical polishing grinding disc 60, a clamping component 50, a flexible layer 70, a polishing layer 80, etc.

[0072] By connecting the flange 10, the constant pressure supply device, the high-freedom passive deformation device, etc., a plurality of small-diameter cylindrical polishing grinding discs 60 are combined, and the high-freedom passive deformation device is used to give sufficient adjustment, so that the polishing grinding disc 60 can swing along the sagittal direction and reciprocate orthogonally in the meridian direction, and can also rotate around the vertical direction, such as Figure 2 As shown, this can add one more degree of freedom, greatly improving the randomness of the motion trajectory of the cylindrical polishing grinding wheel 60 during mirror processing, and the relative position of the cylindrical polishing grinding wheel 60 on the mirror surface can change with the processing process. Figure 3 As shown, the relative position of the cylindrical polishing disc 60 on the mirror surface changes from ABCD to DABC, so that while the cylindrical polishing disc 60 is basically consistent with the element surface, it can also have a certain degree of random movement, and this movement mode has a good smoothing effect, which is very conducive to smoothing the surface roughness of the cylindrical reflector. In addition, under the action of the flexible cylindrical polishing layer 80, it is also easier to obtain an ultra-smooth surface, thereby greatly improving the processing accuracy of the cylindrical reflector.

[0073] The upper end of the connecting flange 10 is connected to a polishing mechanism such as a robotic arm / machine tool, the connecting flange 10 is coaxial with the connecting plate 20 and connected by screws, the connecting plate 20 is connected to the constant pressure supply component 30 by screws, the constant pressure supply component 30 is threadedly connected to the upper end of the passive deformation component 40, the lower end of the passive deformation component 40 is connected to the grinding disc 60 by a dedicated clamping portion, and the grinding disc 60 and the flexible layer 70, as well as the flexible layer 70 and the polishing layer 80 are bonded by glue.

[0074] The ultra-smooth polishing process is:

[0075] The cylindrical reflector to be processed is placed under the polishing grinding disc 60, and the connecting flange 10 is connected to the interface of the machine tool / mechanical arm polishing mechanism by screws;

[0076] The connecting flange 10 drives the connecting plate 20, so that the cylindrical polishing grinding disc 60 can swing along the sagittal direction and reciprocate along the meridian orthogonal direction, and can also rotate around the vertical direction. Each small-diameter cylindrical polishing grinding disc 60 can be freely exchanged, and its movement path has a certain randomness. Each cylindrical polishing grinding disc 60 can randomly process different local areas on the surface of the optical element;

[0077] By applying pressure to the constant pressure supply component 30, the polishing layer 80 is brought into contact with the surface to be processed, and through the action of the high-freedom passive deformation member 40, the polishing layer 80 and the cylindrical optical element are closely matched and pressure controlled.

[0078] The connecting plate 20 below is connected through the connecting flange 10, and is driven to rotate during the processing. The connecting plate 20 then drives the constant pressure supply device, the high-freedom passive deformation device and the cylindrical controllable flexible grinding wheel 60 below. During processing, the controllable flexible cylindrical polishing grinding wheel 60 can have more degrees of freedom, so that the actual processing trajectory has randomness, which is more conducive to the homogenization of high-frequency errors on the surface, thereby obtaining an ultra-smooth surface, providing a solid foundation for the high-precision manufacturing of cylindrical reflectors.

[0079] To summarize, the cylindrical reflector processing device and method provided by the embodiments of the present invention, by setting a connecting plate, the connecting flange is connected to the connecting plate below, and the connecting plate is driven to rotate during the processing process, and then the connecting plate drives the constant pressure supply component, passive deformation component, clamping component and polishing component below. During processing, the polishing component can have more degrees of freedom, so that the actual processing trajectory has randomness, which is more conducive to the averaging of high-frequency surface errors, thereby obtaining an ultra-smooth surface.

[0080] The cylindrical reflector processing device and method provided by the present invention are introduced in detail above. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method and core idea of ​​the present invention. It should be pointed out that for ordinary technicians in this technical field, without departing from the principle of the present invention, several improvements and modifications can be made to the present invention, and these improvements and modifications also fall within the scope of protection of the claims of the present invention.

Claims

1. A cylindrical reflector processing device, characterized in that: It includes a connecting plate and multiple processing units arranged on the lower surface of the connecting plate. The processing units include a constant pressure supply component, a passive deformation component, a clamping component and a polishing component which are arranged in sequence from top to bottom. The constant pressure supply component is used to provide constant pressure to the polishing component so that the polishing component maintains a constant pressure on the workpiece during processing. The clamping component is used to clamp and fix the passive deformation component and the polishing component. The passive deformation component is used to control the position of the processing unit relative to the connecting plate.

2. The cylindrical reflector processing device according to claim 1, characterized in that: It also includes a controller disposed on the upper surface of the connecting plate and connected to the passive deformation member, and is used to control a position change strategy of the processing unit relative to the connecting plate during processing of the workpiece to be processed.

3. The cylindrical reflector processing device according to claim 2, characterized in that: It also includes a memory arranged in the controller, which is used to store various strategies for changing the position of the processing unit relative to the connecting plate during the processing of the workpiece to be processed. The controller is connected to the memory and is used to obtain the strategy for changing the position of the processing unit relative to the connecting plate from the memory.

4. The cylindrical reflector processing device according to claim 3, characterized in that: The polishing member comprises a grinding disc, a flexible layer and a polishing layer which are connected in sequence. The grinding disc and the flexible layer are bonded by a first glue layer, and the flexible layer and the polishing layer are bonded by a second glue layer.

5. The cylindrical reflector processing device according to claim 4, characterized in that: It also includes a connecting piece arranged above the connecting plate, wherein the connecting piece is a columnar connecting piece or a flange connecting piece, the columnar connecting piece is clamped or bolted to the connecting plate, and the flange connecting piece is flange-connected to the connecting plate.

6. The cylindrical reflector processing device according to claim 5, characterized in that: The plurality of processing units are evenly distributed in the circumferential direction on the lower surface of the connecting plate, and the number of the processing units is greater than or equal to 3.

7. The cylindrical reflector processing device according to claim 6, characterized in that: It also includes a display connected to the controller and the passive deformation member, which is used to display the position change strategy of the processing unit relative to the connecting plate currently executed by the passive deformation member.

8. The cylindrical reflector processing device according to claim 7, characterized in that: It also includes an eccentric structure of the grinding disc arranged below the connecting plate and an eccentric motor connected to the eccentric structure of the grinding disc. Multiple processing units are arranged on the eccentric output mechanism of the eccentric structure of the grinding disc. The eccentric motor is connected to the controller to obtain control instructions from the controller and drive the rotation state of the eccentric structure of the grinding disc, thereby controlling the relative position of the eccentric output mechanism relative to the connecting plate, and further controlling the relative position of the processing unit relative to the connecting plate.

9. A method for processing a cylindrical reflector, characterized in that: The cylindrical reflector processing device according to any one of claims 1 to 8 comprises: S1: placing the workpiece to be processed under the processing unit of the cylindrical reflector processing device; S2: Connecting the interface of the polishing mechanism of the machine tool or the robot arm to the connecting plate of the cylindrical reflector processing device; S3: applying a constant pressure to the processing unit through a constant pressure supply component of the cylindrical reflector processing device, so that a constant pressure is maintained between the processing unit and the workpiece to be processed; S4: driving the connecting plate to move, so that the polishing member of the processing unit swings along the sagittal direction of the workpiece to be processed and reciprocates along the meridian orthogonal direction; S5: Control the processing unit to switch the position at the bottom of the connecting plate.

10. The cylindrical reflector processing method according to claim 9, characterized in that: The S5 further includes: The position switching strategy of the processing unit at the bottom of the connecting plate is switched regularly or irregularly.

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