A zirconium-yttrium alloy target and a method for manufacturing the same
By performing a single melting process and multiple eutectic turning operations on the zirconium raw material, combined with hot rolling and hot isostatic pressing, the problems of density and compositional uniformity of zirconium-yttrium alloy targets were solved, thereby improving the quality and bonding strength of sputtered films.
CN119640071BActive Publication Date: 2026-06-02XIANDAO THIN FILM MATERIALS GUANGDONG CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- XIANDAO THIN FILM MATERIALS GUANGDONG CO LTD
- Filing Date
- 2024-12-13
- Publication Date
- 2026-06-02
AI Technical Summary
Technical Problem
Existing technologies make it difficult to prepare zirconium-yttrium alloy targets with high density and high compositional uniformity, resulting in microparticle splashing and poor coating quality during sputtering.
Method used
By performing a single smelting process on zirconium raw materials to remove internal gases, and then repeatedly flipping the zirconium ingot or performing eutectic operations to make the zirconium and yttrium distribution more uniform, combined with hot rolling and hot isostatic pressing, zirconium-yttrium alloy sputtering targets are prepared.
Benefits of technology
This improved the density and compositional uniformity of the zirconium-yttrium alloy target, thereby enhancing the quality and bonding strength of the sputtered film.
✦ Generated by Eureka AI based on patent content.
Abstract
This application belongs to the field of target material production technology and discloses a method for preparing zirconium-yttrium alloy targets. First, zirconium is melted and cooled to obtain a zirconium ingot. Then, the zirconium ingot is flipped over and melted a second time. At the same time, metallic yttrium is added to the molten zirconium ingot to melt it to obtain a primary eutectic. Then, the primary eutectic is cooled to room temperature within 85 minutes to obtain a primary eutectic body. The primary eutectic body is then flipped over and melted a third time to obtain a secondary eutectic. Then, the primary eutectic is cooled to room temperature within 70 minutes to obtain a secondary eutectic body. Finally, the secondary eutectic body is machined, hot rolled, and hot isostatically pressed to obtain a zirconium-yttrium alloy target. This application improves the uniformity of zirconium and yttrium distribution by repeatedly flipping the zirconium ingot or eutectic body and remelting it. In addition, this application also discloses a zirconium-yttrium alloy target.
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