Upper electrode assembly and semiconductor process equipment

Abstract

The embodiment of the invention provides an upper electrode assembly and semiconductor process equipment, and relates to the technical field of semiconductor process, the upper electrode assembly comprises a central electrode, an edge electrode, a first driving device and a second driving device; the central electrode is sleeved with the edge electrode, the first driving device is in driving connection with the central electrode to drive the central electrode to ascend and descend, and the second driving device is in driving connection with the edge electrode to drive the edge electrode to ascend and descend. The upper electrode assembly has the function of independently adjusting the distance between the central electrode and the lower electrode and the distance between the edge electrode and the lower electrode.

Description

Technical Field

[0001] The present application relates to the field of semiconductor process technology, and in particular to an upper electrode assembly and semiconductor process equipment. Background Art

[0002] Semiconductor process equipment includes a cavity, an upper electrode and a lower electrode. In the process of implementing semiconductor processes using semiconductor process equipment, it is sometimes necessary to adjust the distance between the upper electrode and the lower electrode to change the process parameters. The related art generally uses an adjustment bracket to raise the upper electrode as a whole to adjust the distance between the upper electrode and the lower electrode. In this way, it is necessary to prepare adjustment brackets of different heights, and it is necessary to lift the upper electrode as a whole. It can be seen that the related art has the problem of being inconvenient to adjust the distance between the upper electrode and the lower electrode. Summary of the invention

[0003] The embodiments of the present application provide an upper electrode assembly and semiconductor process equipment to solve the problems existing in the background technology.

[0004] In a first aspect, an embodiment of the present application provides an upper electrode assembly.

[0005] The upper electrode assembly provided in the embodiment of the present application includes: a center electrode, an edge electrode, a first driving device and a second driving device; the edge electrode is arranged outside the center electrode, the first driving device is connected to the center electrode to drive the center electrode to rise and fall, and the second driving device is connected to the edge electrode to drive the edge electrode to rise and fall.

[0006] Optionally, the upper electrode assembly includes a base; the first driving device includes a first rotation driver and a first rotation shaft, the first rotation driver is drivingly connected to the first rotation shaft, the first rotation shaft is limited to the base along the vertical direction, and the first rotation shaft is threadedly connected to the center electrode along the vertical direction.

[0007] Optionally, the first driving device also includes a first ring gear and at least two first gears, the first rotation driver is drivingly connected to the first ring gear, each of the first gears is meshed with the first ring gear, the number of the first gears is equal to the number of the first rotating shafts, and the first gears are connected to the first rotating shafts one by one.

[0008] Optionally, the base includes a pressing plate and a bearing plate, the first ring gear is arranged on the bearing plate and pressed under the pressing plate; the first rotating shaft is limited between the pressing plate and the bearing plate along the vertical direction.

[0009] Optionally, the top end of the first rotating shaft abuts against the pressing plate, and the first rotating shaft is provided with a first abutting surface, and the first abutting surface abuts against the supporting plate.

[0010] Optionally, the carrier plate is a cooling tray.

[0011] Optionally, the first gear is provided with a first through hole, the top of the first rotating shaft is passed through the first through hole, and the first gear is connected to the first rotating shaft via a first circumferential limiter.

[0012] Optionally, the upper electrode assembly also includes an air intake structure and a center adjustment ring; the air intake structure is located between the substrate and the center electrode in the vertical direction, the air intake structure includes a spray plate, and the center adjustment ring is sleeved outside the spray plate; the first rotating shaft is threadedly connected to the center adjustment ring, and the center adjustment ring is connected to the center electrode.

[0013] Optionally, a first protrusion is provided on one side of the center adjustment ring close to the first rotating shaft, and the first rotating shaft is threadedly connected to the first protrusion.

[0014] Optionally, the first rotating shaft passes through the air intake structure; the upper electrode assembly also includes a first telescopic sleeve, which is sleeved outside the first rotating shaft, one end of the first telescopic sleeve is connected to the center adjustment ring, and the other end is connected to the air intake structure.

[0015] Optionally, the second driving device includes a second rotary driver, a second rotary shaft, a second ring gear and at least two second gears, the second rotary driver is drivingly connected to the second ring gear, each of the second gears is meshed with the second ring gear, the second gears are connected to the second rotary shaft one by one, the second rotary shaft is limited to the base in the vertical direction, and the second rotary shaft is threadedly connected to the edge electrode in the vertical direction.

[0016] Optionally, the second ring gear is disposed on the bearing plate and pressed under the pressing plate, and the second ring gear is sleeved outside the first ring gear.

[0017] In a second aspect, an embodiment of the present application provides a semiconductor process equipment.

[0018] The semiconductor process equipment provided by the embodiments of the present application includes any one of the upper electrode assemblies provided by the embodiments of the present application.

[0019] Optionally, the semiconductor process equipment also includes a cavity, a cavity cover and a lower electrode; the cavity cover is arranged on the cavity, the upper electrode assembly is arranged on the cavity cover, the center electrode, the edge electrode and the lower electrode are all arranged in the cavity, and the lower electrode is respectively opposite to the center electrode.

[0020] Optionally, the cavity cover is provided with a through hole, the supporting plate of the upper electrode assembly is supported on the cavity cover, and the supporting plate covers the through hole, and the air intake structure of the upper electrode assembly is arranged on both sides of the cavity cover opposite to the supporting plate.

[0021] At least one of the above technical solutions adopted in the embodiments of the present application can achieve the following beneficial effects:

[0022] In the embodiment of the present application, since the first driving device is connected to the driving of the center electrode, the first driving device can be used to drive the center electrode to rise and fall, so as to adjust the distance between the center electrode and the lower electrode. Since the second driving device is connected to the driving of the edge electrode, the second driving device can be used to drive the edge electrode to rise and fall, so as to adjust the distance between the edge electrode and the lower electrode. In addition, the first driving device and the second driving device can be used to achieve the effect of differentially adjusting the distance between the center electrode and the lower electrode, and the distance between the edge electrode and the lower electrode according to the requirements, so that the process parameters of the semiconductor process equipment equipped with the upper electrode assembly can better match the process requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the related technologies, the drawings required for use in the embodiments or the related technical descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0024] Figure 1 A schematic diagram of an upper electrode assembly provided in an embodiment of the present application;

[0025] Figure 2 for Figure 1 A partial schematic diagram of the upper electrode assembly shown in FIG.

[0026] Figure 3 for Figure 1 A partial schematic diagram of the upper electrode assembly shown in FIG.

[0027] Figure 4 for Figure 1 A top view of the upper electrode assembly shown in FIG.

[0028] Figure 5 for Figure 1A top view of the upper electrode assembly shown in , which shows the situation where the pressure plate is hidden;

[0029] Figure 6 A schematic diagram of a semiconductor process equipment provided in an embodiment of the present application.

[0030] Description of reference numerals:

[0031] 10-semiconductor process equipment; 100-upper electrode assembly; 110-center electrode; 120-edge electrode; 130-first drive device; 131-first rotary drive; 132-first rotary shaft; 133-first ring gear; 134-first gear; 135-first circumferential stopper; 140-second drive device; 141-second rotary drive; 142-second rotary shaft; 143-second ring gear; 144-second gear ;145-second circumferential limiter;150-base;151-pressing plate;152-carrying plate;160-air inlet structure;161-spraying plate;162-air inlet plate;171-center adjustment ring;1711-first protrusion;172-edge adjustment ring;1721-second protrusion;181-first telescopic sleeve;182-second telescopic sleeve;210-cavity;220-cavity cover;300-lower electrode;400-plasma confinement ring. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical solution and advantages of the present application clearer, the technical solution of the present application will be clearly and completely described below in combination with the specific embodiments of the present application and the corresponding drawings. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present application.

[0033] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0034] In addition, although the terms used in this application are selected from well-known and commonly used terms, some terms mentioned in the specification of this application may be selected by the applicant at his or her discretion, and their detailed meanings are explained in the relevant parts of the description of this article.

[0035] Furthermore, it is required that the present application be understood not only by the actual terms used but also by the meanings connoted by each term.

[0036] The technical solutions provided by various embodiments of the present application are described in detail below in conjunction with the accompanying drawings.

[0037] The present application embodiment provides an upper electrode assembly. Figures 1 to 6 The upper electrode assembly 100 provided in the embodiment of the present application includes: a central electrode 110, an edge electrode 120, a first driving device 130 and a second driving device 140.

[0038] The edge electrode 120 is sleeved outside the central electrode 110, and the first driving device 130 is drivingly connected to the central electrode 110 to drive the central electrode 110 to rise and fall. The second driving device 140 is drivingly connected to the edge electrode 120 to drive the edge electrode 120 to rise and fall. It should be noted that the central electrode 110 and the edge electrode 120 can be set with reference to the upper electrode in the related art. In other words, the central electrode 110 and the edge electrode 120 are equivalent to the upper electrode in the related art, which is obtained by "segmenting" the upper electrode.

[0039] In this way, in the embodiment of the present application, since the first driving device 130 is drivingly connected to the center electrode 110, the first driving device 130 can be used to drive the center electrode 110 to rise and fall, so as to adjust the distance between the center electrode 110 and the lower electrode 300. Since the second driving device 140 is drivingly connected to the edge electrode 120, the second driving device 140 can be used to drive the edge electrode 120 to rise and fall, so as to adjust the distance between the edge electrode 120 and the lower electrode 300. In addition, the first driving device 130 and the second driving device 140 can be used to achieve the effect of differentially adjusting the distance between the center electrode 110 and the lower electrode 300 and the distance between the edge electrode 120 and the lower electrode 300 according to the requirements, so that the process parameters of the semiconductor process equipment 10 equipped with the upper electrode assembly 100 can be better matched with the process requirements.

[0040] refer to Figure 1In some embodiments, the upper electrode assembly 100 includes a base 150. The first driving device 130 includes a first rotary driver 131 and a first rotary shaft 132. The first rotary driver 131 is drivingly connected to the first rotary shaft 132, the first rotary shaft 132 is limited to the base 150 in the vertical direction, and the first rotary shaft 132 is threadedly connected to the center electrode 110 in the vertical direction. It should be noted that the first rotary shaft 132 can be directly threadedly connected to the center electrode 110. Alternatively, the first rotary shaft 132 can be indirectly threadedly connected to the center electrode 110 through an adapter structure. For example, the center electrode 110 is provided with an adapter plate, and the first rotary shaft 132 is threadedly connected to the adapter plate, so that the first rotary shaft 132 drives the adapter plate to drive the center electrode 110 to rise and fall.

[0041] Exemplarily, the first rotary driver 131 may be a rotary motor, a pneumatic motor or a hydraulic motor, etc. Exemplarily, the first rotary driver 131 may be directly connected to the first rotary shaft 132 to drive the first rotary shaft 132 to rotate. Exemplarily, the first rotary driver 131 may be drivingly connected to the first rotary shaft 132 through a gear transmission mechanism to drive the first rotary shaft 132 to rotate. In this way, during the process of the first rotary driver 131 driving the first rotary shaft 132 to rotate, the center electrode 110 threadedly connected to the first rotary shaft 132 may move along the axial direction of the first rotary shaft 132. Thus, the effect of using the first rotary driver 131 to drive the center electrode 110 to be lifted and lowered can be achieved.

[0042] refer to Figure 5 In some embodiments, the first driving device 130 further includes a first ring gear 133 and at least two first gears 134. The first rotary driver 131 is drivingly connected to the first ring gear 133. Exemplarily, the first power output shaft of the first rotary driver 131 may be drivingly connected to the first transmission gear, and the first transmission gear may mesh with the first ring gear 133, so that the first rotary driver 131 may be used to drive the first ring gear 133 to rotate.

[0043] Furthermore, each first gear 134 is meshed with the first ring gear 133, the number of the first gears 134 is equal to the number of the first rotating shafts 132, and the first gears 134 are connected to the first rotating shafts 132 in a one-to-one correspondence. In this way, when the first rotating driver 131 drives the first ring gear 133 to rotate, the rotating first ring gear 133 can drive the first rotating shaft 132 connected to the first gear 134 to rotate synchronously, and then drive the center electrode 110 threadedly connected to the first rotating shaft 132 to rise and fall, so as to adjust the distance between the center electrode 110 and the lower electrode 300.

[0044] refer to Figure 2 and Figure 3In some embodiments, the base 150 includes a pressing plate 151 and a bearing plate 152. The first ring gear 133 is disposed on the bearing plate 152 and is pressed under the pressing plate 151. In other words, the first ring gear 133 is sandwiched between the bearing plate 152 and the pressing plate 151 in the vertical direction. Exemplarily, the bearing plate 152 may be a cooling plate. For example, the bearing plate 152 may be a water-cooled plate. The first ring gear 133 may be carried on the cooling plate and is pressed under the pressing plate 151.

[0045] refer to Figures 2 to 5 In some embodiments, the first rotating shaft 132 is limited between the pressing plate 151 and the bearing plate 152 in the vertical direction. For example, the top end of the first rotating shaft 132 can be abutted against the pressing plate 151, the first rotating shaft 132 is provided with a first abutting surface, and the first abutting surface is supported on the bearing plate 152, so that the first rotating shaft 132 is limited between the pressing plate 151 and the bearing plate 152 in the vertical direction. For example, the first gear 134 can be clamped between the pressing plate 151 and the bearing plate 152, so that the first rotating shaft 132 connected to the first gear 134 is limited between the pressing plate 151 and the bearing plate 152 in the vertical direction.

[0046] refer to Figure 3 In some embodiments, the first gear 134 is provided with a first through hole, the top of the first rotating shaft 132 is penetrated through the first through hole, and the first gear 134 and the first rotating shaft 132 are connected through a first circumferential stopper 135. Exemplarily, the first circumferential stopper 135 may include a pin or a key. In this way, the first gear 134 and the first rotating shaft 132 can be connected by the first circumferential stopper 135, so that the first gear 134 and the first rotating shaft 132 can rotate synchronously.

[0047] refer to Figure 1 and Figure 2 In some embodiments, the upper electrode assembly 100 further includes an air intake structure 160 and a center adjustment ring 171. The air intake structure 160 is located between the substrate 150 and the center electrode 110 in the vertical direction, and the air intake structure 160 includes a spray plate 161. It should be noted that the air intake structure 160 can deliver process gas to the spray plate 161, and the center electrode 110 and the edge electrode 120 are provided with a plurality of small holes, so that the process gas output through the spray plate 161 can be delivered to the process chamber through the center electrode 110 and the edge electrode 120. It should also be noted that the specific structure of the air intake structure 160, and how to set small holes on the center electrode 110 and the edge electrode 120 for passing the process gas, can refer to the relevant technology, and therefore, it will not be described in detail here.

[0048] refer to Figure 1 and Figure 2, the center adjustment ring 171 is sleeved outside the spray plate 161. The first rotating shaft 132 is threadedly connected to the center adjustment ring 171, and the center adjustment ring 171 is connected to the center electrode 110. In other words, the first rotating shaft 132 is indirectly threadedly connected to the center electrode 110 through the center adjustment ring 171, so that the center adjustment ring 171 is driven to rise and fall by the rotating first rotating shaft 132, thereby driving the center electrode 110 connected to the center adjustment ring 171 to rise and fall.

[0049] refer to Figure 2 In some embodiments, a first protrusion 1711 is provided on one side of the center adjustment ring 171 close to the first rotation axis 132, and the first rotation axis 132 is threadedly connected to the first protrusion 1711. In this way, by providing the first protrusion 1711 on one side of the center adjustment ring 171 close to the first rotation axis 132, the thread height of the threaded connection portion between the center adjustment ring 171 and the first rotation axis 132 can be increased, so as to improve the lifting range of the center electrode 110.

[0050] refer to Figure 2 In some embodiments, the first rotating shaft 132 is disposed through the air intake structure 160. Exemplarily, the air intake structure 160 includes an air intake disk 162, which is used to deliver process gas to the spray disk 161. The air intake disk 162 is provided with a through hole, and the first rotating shaft 132 is disposed through the through hole of the air intake disk 162.

[0051] In some embodiments, the upper electrode assembly 100 further includes a first telescopic sleeve 181. Exemplarily, the first telescopic sleeve 181 may be a first bellows. The first telescopic sleeve 181 is sleeved outside the first rotating shaft 132, one end of the first telescopic sleeve 181 is connected to the center adjustment ring 171, and the other end is connected to the air intake structure 160. Exemplarily, the end of the first telescopic sleeve 181 close to the air intake structure 160 may be connected to the air intake disk 162. In this way, the first telescopic sleeve 181 may be used to seal the end of the first rotating shaft 132.

[0052] For example, the number of the first gears 134 may be 2, 3, 4, etc. Of course, in some embodiments, when the number of the first gear 134 and the first rotating shaft 132 is one, the center electrode 110 threadedly connected to the first rotating shaft 132 may be driven to rise and fall by driving the first rotating shaft 132 to rotate, so as to adjust the distance between the center electrode 110 and the lower electrode 300.

[0053] It should be noted that, in other embodiments, the first driving device 130 may also be a first linear drive. Exemplarily, the first linear drive may be a device capable of outputting a linear driving force, such as a linear motor, a cylinder, or a hydraulic cylinder. Exemplarily, the first linear drive may also include: a device capable of outputting a rotational driving force, such as a rotary motor, a pneumatic motor, or a hydraulic motor, and a transmission mechanism capable of converting a rotational motion into a linear motion, such as a gear rack mechanism.

[0054] refer to Figure 5 In some embodiments, the second driving device 140 includes a second rotation driver 141 and a second rotation shaft 142. The second rotation driver 141 is drivingly connected to the second rotation shaft 142. The second rotation shaft 142 is vertically limited to the base 150, and the second rotation shaft 142 is vertically threadedly connected to the edge electrode 120.

[0055] Exemplarily, the second rotary driver 141 may be a rotary motor, a pneumatic motor or a hydraulic motor, etc. Exemplarily, the second rotary driver 141 may be directly connected to the second rotary shaft 142 to drive the second rotary shaft 142 to rotate. Exemplarily, the second rotary driver 141 may be drivingly connected to the second rotary shaft 142 through a gear transmission mechanism to drive the second rotary shaft 142 to rotate. Furthermore, in the process of the second rotary driver 141 driving the second rotary shaft 142 to rotate, the edge electrode 120 threadedly connected to the second rotary shaft 142 may move along the axial direction of the second rotary shaft 142. Thus, the effect of using the second rotary driver 141 to drive the edge electrode 120 to be raised and lowered can be achieved.

[0056] Further, the second driving device 140 may also include a second ring gear 143 and at least two second gears 144. The second rotary driver 141 is drivingly connected to the second ring gear 143. Exemplarily, the second power output shaft of the second rotary driver 141 may be drivingly connected to the second transmission gear, and the second transmission gear may be meshed with the second ring gear 143, so that the second rotary driver 141 can be used to drive the second ring gear 143 to rotate. Each second gear 144 is meshed with the second ring gear 143, and the second gears 144 are connected to the second rotating shaft 142 in a one-to-one correspondence. Then, the second rotary driver 141 can be used to drive the second rotating shaft 142 to rotate.

[0057] In some embodiments, when the upper electrode assembly 100 includes a substrate 150, and the substrate 150 includes a pressing plate 151 and a bearing plate 152, the second ring gear 143 may be disposed on the bearing plate 152 and pressed under the pressing plate 151, and the second ring gear 143 is sleeved outside the first ring gear 133. In other words, the second ring gear 143 is sleeved outside the first ring gear 133, and the second ring gear 143 is sandwiched between the bearing plate 152 and the pressing plate 151 in the vertical direction. Exemplarily, the bearing plate 152 may be a cooling plate. For example, the bearing plate 152 may be a water-cooled plate. The second ring gear 143 may be carried on the cooling plate and pressed under the pressing plate 151.

[0058] refer to Figures 2 to 5 In some embodiments, the second rotating shaft 142 is limited between the pressing plate 151 and the bearing plate 152 in the vertical direction. For example, the top end of the second rotating shaft 142 can be abutted against the pressing plate 151, the second rotating shaft 142 is provided with a second abutting surface, and the second abutting surface is supported on the bearing plate 152, so that the second rotating shaft 142 is limited between the pressing plate 151 and the bearing plate 152 in the vertical direction. For example, the second gear 144 can be clamped between the pressing plate 151 and the bearing plate 152, so that the second rotating shaft 142 connected to the second gear 144 is limited between the pressing plate 151 and the bearing plate 152 in the vertical direction.

[0059] refer to Figure 3 In some embodiments, the second gear 144 is provided with a second through hole, the top of the second rotating shaft 142 is penetrated through the second through hole, and the second gear 144 and the second rotating shaft 142 are connected through a second circumferential stopper 145. Exemplarily, the second circumferential stopper 145 may include a pin or a key. In this way, the second gear 144 and the second rotating shaft 142 can be connected by the second circumferential stopper 145, so that the second gear 144 and the second rotating shaft 142 can rotate synchronously.

[0060] refer to Figure 2 In some embodiments, the upper electrode assembly 100 includes an air intake structure 160, a center adjustment ring 171, and an edge adjustment ring 172. The air intake structure 160 is located between the substrate 150 and the center electrode 110 in the vertical direction, and the air intake structure 160 includes a spray plate 161. The center adjustment ring 171 is sleeved outside the spray plate 161, and the edge adjustment ring 172 is sleeved outside the center adjustment ring 171.

[0061] The second rotating shaft 142 is threadedly connected to the edge adjustment ring 172, and the edge adjustment ring 172 is connected to the edge electrode 120. In other words, the second rotating shaft 142 is indirectly threadedly connected to the edge electrode 120 through the edge adjustment ring 172, so that the edge adjustment ring 172 is driven to rise and fall by the rotating second rotating shaft 142, thereby driving the edge electrode 120 connected to the edge adjustment ring 172 to rise and fall.

[0062] refer to Figure 2 In some embodiments, a second protrusion 1721 is provided on one side of the edge adjustment ring 172 close to the second rotation axis 142, and the second rotation axis 142 is threadedly connected to the second protrusion 1721. In this way, by providing the second protrusion 1721 on one side of the edge adjustment ring 172 close to the second rotation axis 142, the thread height of the threaded connection portion between the edge adjustment ring 172 and the second rotation axis 142 can be increased, so as to improve the lifting range of the edge electrode 120.

[0063] refer to Figure 2 In some embodiments, the second rotating shaft 142 is disposed through the air intake structure 160. Exemplarily, the air intake structure 160 includes an air intake disk 162, which is used to deliver process gas to the spray disk 161. The air intake disk 162 is provided with a through hole, and the second rotating shaft 142 is disposed through the through hole of the air intake disk 162.

[0064] In some embodiments, the upper electrode assembly 100 further includes a second telescopic sleeve 182. For example, the second telescopic sleeve 182 may be a second bellows. The second telescopic sleeve 182 is sleeved outside the second rotating shaft 142, one end of the second telescopic sleeve 182 is connected to the edge adjustment ring 172, and the other end is connected to the air intake structure 160. For example, the end of the second telescopic sleeve 182 close to the air intake structure 160 may be connected to the air intake disk 162. In this way, the second telescopic sleeve 182 may be used to seal the end of the second rotating shaft 142.

[0065] For example, the number of the second gears 144 may be 2, 3, 4, etc. Of course, in some embodiments, when the number of the second gear 144 and the second rotating shaft 142 is one, the edge electrode 120 threadedly connected to the second rotating shaft 142 may be driven to rise and fall by driving the second rotating shaft 142 to rotate, so as to adjust the distance between the edge electrode 120 and the lower electrode 300.

[0066] It should be noted that, in other embodiments, the second driving device 140 may also be a second linear drive. Exemplarily, the second linear drive may be a device capable of outputting a linear driving force, such as a linear motor, a cylinder, or a hydraulic cylinder. Exemplarily, the second linear drive may also include: a device capable of outputting a rotary driving force, such as a rotary motor, a pneumatic motor, or a hydraulic motor, and a transmission mechanism capable of converting a rotary motion into a linear motion, such as a gear rack mechanism.

[0067] In some embodiments, the first rotating shaft 132, the first gear 134 or the first ring gear 133 is provided with a first scale indicator, and the base 150 is provided with a first scale line accordingly, so that the rotation angle of the first rotating shaft 132 can be determined based on the first scale indicator and the first scale line, and then the lifting amount of the center electrode 110 can be determined. The second rotating shaft 142, the second gear 144 or the second ring gear 143 is provided with a second scale indicator, and the base 150 is provided with a corresponding second scale line, so that the rotation angle of the second rotating shaft 142 can be determined based on the second scale indicator and the second scale line, and then the lifting amount of the edge electrode 120 can be determined.

[0068] The present application embodiment provides a semiconductor process equipment. Figure 6 The semiconductor process equipment 10 provided in the embodiment of the present application includes any one of the upper electrode assemblies 100 provided in the embodiment of the present application.

[0069] In some embodiments, the semiconductor process equipment 10 further includes: a chamber 210, a chamber cover 220 and a lower electrode 300. The chamber cover 220 is disposed on the chamber 210, and the upper electrode assembly 100 is disposed on the chamber cover 220. The central electrode 110, the edge electrode 120 and the lower electrode 300 are all disposed in the chamber 210. The lower electrodes 300 are respectively opposite to the central electrodes 110.

[0070] In some embodiments, the cavity cover 220 is provided with a through hole, the supporting plate 152 of the upper electrode assembly 100 is supported on the cavity cover 220, and the supporting plate 152 covers the through hole, and the air intake structure 160 of the upper electrode assembly 100 is arranged on both sides of the cavity cover 220 opposite to the supporting plate 152.

[0071] In some embodiments, the semiconductor processing equipment 10 further includes a plasma confinement ring 400 . The plasma confinement ring 400 is disposed around the edge electrode 120 .

[0072] In this way, in an embodiment of the present application, the center electrode 110 and the edge electrode 120 included in the upper electrode assembly 100 of the semiconductor process equipment 10 can be driven to rise and fall by the first drive device 130 and the second drive device 140 respectively, so as to facilitate differentiated adjustment of the distance between the center electrode 110 and the lower electrode 300, and the distance between the edge electrode 120 and the lower electrode 300 according to needs, so that the process parameters of the semiconductor process equipment 10 equipped with the upper electrode assembly 100 can be better matched with the process requirements.

[0073] It should also be noted that, in the case where the semiconductor process equipment 10 is a dielectric etching equipment, for example, in the dielectric etching process, it is often necessary to use the edge electrode 120 to confine the plasma, and thus, the edge electrode 120 can be driven to move in the direction close to the lower electrode 300. In the process of film transmission, the center electrode 110 and the edge electrode 120 can be lifted up to the initial position to achieve film transmission. After the dielectric etching equipment runs for a certain process time, the center electrode 110 and the edge electrode 120 will have different degrees of consumption, and the corresponding relationship between the consumption of the center electrode 110 and the edge electrode 120 and the process time can be established respectively, so that after a certain period of time, the center electrode 110 and the edge electrode 120 are respectively moved by a preset distance toward the lower electrode 300.

[0074] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0075] Although the embodiments of the present application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the embodiments of the present application, and the scope of the embodiments of the present application is defined by the appended claims and their equivalents.

Claims

1. An upper electrode assembly (100), characterized in that: include: A central electrode (110), an edge electrode (120), a first driving device (130) and a second driving device (140); The edge electrode (120) is sleeved outside the central electrode (110); the first driving device (130) is drivingly connected to the central electrode (110) to drive the central electrode (110) to rise and fall; and the second driving device (140) is drivingly connected to the edge electrode (120) to drive the edge electrode (120) to rise and fall.

2. The upper electrode assembly (100) according to claim 1, characterized in that: The upper electrode assembly (100) comprises a substrate (150); The first driving device (130) comprises a first rotating driver (131) and a first rotating shaft (132), wherein the first rotating driver (131) is drivingly connected to the first rotating shaft (132), the first rotating shaft (132) is vertically limited to the base body (150), and the first rotating shaft (132) is vertically threadedly connected to the center electrode (110).

3. The upper electrode assembly (100) according to claim 2, characterized in that: The first driving device (130) further comprises a first ring gear (133) and at least two first gears (134); the first rotation driver (131) is drivingly connected to the first ring gear (133); each of the first gears (134) is meshed with the first ring gear (133); the number of the first gears (134) is equal to the number of the first rotating shafts (132); and the first gears (134) are connected to the first rotating shafts (132) in a one-to-one correspondence.

4. The upper electrode assembly (100) according to claim 3, characterized in that: The base (150) comprises a pressing plate (151) and a bearing plate (152); the first ring gear (133) is arranged on the bearing plate (152) and pressed under the pressing plate (151); the first rotating shaft (132) is located between the pressing plate (151) and the bearing plate (152) along the vertical direction.

5. The upper electrode assembly (100) according to claim 4, characterized in that: The top end of the first rotating shaft (132) abuts against the pressing plate (151), and the first rotating shaft (132) is provided with a first abutting surface, and the first abutting surface abuts against the carrying plate (152).

6. The upper electrode assembly (100) according to claim 4, characterized in that: The carrying plate (152) is a cooling plate.

7. The upper electrode assembly (100) according to claim 3, characterized in that: The first gear (134) is provided with a first through hole, the top of the first rotating shaft (132) is penetrated through the first through hole, and the first gear (134) and the first rotating shaft (132) are connected via a first circumferential stopper (135).

8. The upper electrode assembly (100) according to claim 2, characterized in that: The upper electrode assembly (100) further comprises an air intake structure (160) and a center adjustment ring (171); the air intake structure (160) is located between the substrate (150) and the center electrode (110) in a vertical direction, the air intake structure (160) comprises a spray plate (161), and the center adjustment ring (171) is sleeved outside the spray plate (161); the first rotating shaft (132) is threadedly connected to the center adjustment ring (171), and the center adjustment ring (171) is connected to the center electrode (110).

9. The upper electrode assembly (100) according to claim 8, characterized in that: A first protrusion (1711) is provided on one side of the center adjustment ring (171) close to the first rotating shaft (132), and the first rotating shaft (132) is threadedly connected to the first protrusion (1711).

10. The upper electrode assembly (100) according to claim 8, characterized in that: The first rotating shaft (132) is inserted into the air intake structure (160); the upper electrode assembly (100) further comprises a first telescopic sleeve (181), the first telescopic sleeve (181) is sleeved outside the first rotating shaft (132), one end of the first telescopic sleeve (181) is connected to the central adjustment ring (171), and the other end is connected to the air intake structure (160).

11. The upper electrode assembly (100) according to claim 4, characterized in that: The second driving device (140) comprises a second rotating driver (141), a second rotating shaft (142), a second ring gear (143) and at least two second gears (144); the second rotating driver (141) is drivingly connected to the second ring gear (143); each of the second gears (144) is meshed with the second ring gear (143); the second gears (144) are connected to the second rotating shaft (142) one by one; the second rotating shaft (142) is limited to the base (150) in the vertical direction; and the second rotating shaft (142) is threadedly connected to the edge electrode (120) in the vertical direction.

12. The upper electrode assembly (100) according to claim 11, characterized in that: The second ring gear (143) is arranged on the bearing plate (152) and is pressed under the pressing plate (151). The second ring gear (143) is sleeved outside the first ring gear (133).

13. A semiconductor process equipment, characterized in that: The upper electrode assembly (100) comprises any one of claims 1 to 12.

14. The semiconductor process equipment according to claim 13, characterized in that: The semiconductor process equipment further comprises a chamber (210), a chamber cover (220) and a lower electrode (300); The cavity cover (220) is covered on the cavity body (210), the upper electrode assembly (100) is arranged on the cavity cover (220), the central electrode (110), the edge electrode (120) and the lower electrode (300) are all arranged in the cavity body (210), and the lower electrode (300) is respectively opposite to the central electrode (110).

15. The semiconductor process equipment according to claim 14, characterized in that: The cavity cover (220) is provided with a through hole, the supporting plate (152) of the upper electrode assembly (100) is supported on the cavity cover (220), and the supporting plate (152) covers the through hole, and the air intake structure (160) of the upper electrode assembly (100) and the supporting plate (152) are arranged on two sides of the cavity cover (220) opposite to each other.

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