Device and method for polishing inner wall of nickel-titanium shape memory alloy thin tube

Abstract

The invention relates to a device and method for polishing the inner wall of a nickel-titanium shape memory alloy thin tube. The device comprises a strip-shaped polishing assembly, a first winding machine and a second winding machine. The polishing assembly is provided with a polishing rope, a base, a base cover, a supporting assembly, a pressure assembly used for applying pressure to the supporting assembly, and a first infiltration assembly and a second infiltration assembly which are used for infiltrating the polishing rope. A fixing hole used for fixing a nickel-titanium shape memory alloy thin tube to be polished is horizontally and axially formed in the supporting assembly, and the first infiltration assembly and the second infiltration assembly are fixedly connected to the two axial ends of the base correspondingly. Nondestructive polishing of the nickel-titanium shape memory alloy thin tube can be achieved through the three steps of acid medium pre-polishing, polishing solution fine polishing and deionized water cleaning. According to the method, the inner wall of the nickel-titanium shape memory alloy thin tube can be efficiently polished under the condition that the shape and the memory characteristic of the nickel-titanium shape memory alloy thin tube are stable.

Description

Technical Field

[0001] The invention relates to the technical field of material processing, and in particular to a device and method for polishing the inner wall of a nickel-titanium shape memory alloy tube. Background Art

[0002] Shape memory alloy is an alloy material that can completely eliminate the apparent plastic deformation that occurs at a lower temperature through the martensite phase and restore its original shape before deformation after heating. Nickel-titanium shape memory alloy has become an indispensable material in many high-tech fields due to its excellent shape memory effect, superelasticity, corrosion resistance and biocompatibility. Nickel-titanium shape memory alloy capillary is a nickel-titanium shape memory alloy tube with an outer diameter ranging from 0.2mm to 9.0mm, a wall thickness ranging from 0.025mm to 2mm, and a length ranging from 0.5m to 2m. It is widely used in medical implants, aerospace precision components, precision mechanical parts and other fields.

[0003] However, during the manufacturing process, the inner wall of the nickel-titanium shape memory alloy tube often has defects such as oxide scale and tiny scratches, which will affect the mechanical properties and biocompatibility of the material, and further affect the performance and safety of the final product. Therefore, it is necessary to polish the inner wall of the nickel-titanium shape memory alloy tube.

[0004] Traditional polishing methods, such as manual polishing, sandblasting polishing or rigid tool polishing, are difficult to ensure polishing efficiency while taking into account the fine structure and shape memory characteristics of the pipe, and are prone to causing bending, deformation or even damage to the pipe. Summary of the invention

[0005] Based on this, it is necessary to provide a device and method for polishing the inner wall of a nickel-titanium shape memory alloy tube in response to the above-mentioned technical problems, which can efficiently realize the polishing of the inner wall of the nickel-titanium shape memory alloy tube while ensuring the stability of the shape and memory characteristics of the nickel-titanium shape memory alloy tube.

[0006] In a first aspect, the present invention provides an inner wall polishing device for a nickel-titanium shape memory alloy capillary, comprising a strip-shaped polishing assembly for axially fixing the nickel-titanium shape memory alloy capillary to be polished and polishing the nickel-titanium shape memory alloy capillary to be polished, and a first winding machine and a second winding machine located on both axial sides of the polishing assembly;

[0007] The polishing assembly is provided with a polishing rope, a base, a base cover, a support assembly, a pressure assembly for applying pressure to the support assembly, and a first infiltration assembly and a second infiltration assembly for infiltrating the polishing rope;

[0008] The base cover is located above the base and is axially hinged with the base. A pressure groove axially penetrating the base cover is provided at the bottom of the base cover, and a support groove axially penetrating the base is provided at the top of the base. The pressure groove is connected with the support groove. The pressure assembly is assembled in the pressure groove, and the support assembly is installed in the support groove.

[0009] A fixing hole for fixing the nickel-titanium shape memory alloy thin tube to be polished is arranged horizontally and axially inside the support component, and the first infiltration component and the second infiltration component are fixedly connected to the axial ends of the base respectively;

[0010] One end of the polishing rope is connected to the first winding machine, and the other end is connected to the second winding machine after horizontally passing through the first wetting component, the nickel-titanium shape memory alloy tube and the second wetting component in sequence when used to polish the nickel-titanium shape memory alloy tube to be polished.

[0011] In one embodiment, the support assembly includes an upper support pad and a lower support pad attached to the lower portion of the upper support pad, the lower support pad is assembled in the support groove, the bottom of the upper support pad and the top of the lower support pad are both provided with fixing grooves, and the fixing grooves of the upper support pad and the lower support pad are aligned and attached to form a fixing hole;

[0012] The fixed groove includes a first groove section, a second groove section and a third groove section which are connected in sequence. The second groove section is located between the first groove section and the third groove section. The second groove section is semi-cylindrical, and the first groove section and the third groove section are semi-conical. The tops of the first groove section and the third groove section are respectively flush with the two end faces of the second groove section.

[0013] In one embodiment, the first infiltration assembly and the second infiltration assembly are both provided with an infiltration tank, a medium storage box, a medium delivery pipe, a medium infiltration pipe, a medium downflow pipe, and a medium filtering assembly for filtering the polishing rope;

[0014] The medium storage box is located below the infiltration tank, the medium storage box is fixedly connected to the base, and a medium delivery pump is arranged inside the medium storage box;

[0015] The medium infiltration pipe is located inside the infiltration tank, the axis of the medium infiltration pipe is collinear with the axis of the fixed tank, one end of the medium delivery pipe passes through the bottom of the infiltration tank and is radially connected to the medium infiltration pipe, and the other end of the medium delivery pipe is connected to the medium delivery pump;

[0016] One end of the medium downflow pipe is connected to the bottom of the infiltration tank, and the other end of the medium downflow pipe is connected to the medium storage box;

[0017] The medium filtering assembly is arranged at one end of the medium infiltration pipe away from the base and is fixedly connected to the inner wall of the infiltration tank.

[0018] In one embodiment, the media filter assembly is provided with a lower polishing rope clamping substrate, a lower polishing rope clamping gasket, an upper polishing rope clamping substrate, an upper polishing rope clamping gasket and a weight;

[0019] The lower polishing rope clamping substrate is horizontally fixedly connected to the inner wall of the infiltration tank, and the top surface of the lower polishing rope clamping substrate is coplanar with the axis of the medium infiltration tube;

[0020] A rectangular groove is provided on the top of the lower polishing rope clamping substrate and the bottom of the upper polishing rope clamping substrate. The thickness of the lower polishing rope clamping gasket and the upper polishing rope clamping gasket are the same and the depth is equal to the rectangular groove. The lower polishing rope clamping gasket is embedded in the rectangular groove of the lower polishing rope clamping substrate, and the upper polishing rope clamping gasket is embedded in the rectangular groove of the upper polishing rope clamping substrate.

[0021] The center line of the top surface of the rectangular parallelepiped groove in the width direction is colinear with the axis of the medium infiltration tube, and the upper polishing rope clamping substrate is hinged to the lower polishing rope clamping substrate along a vertical side wall in the width direction of the rectangular parallelepiped groove;

[0022] A weighting groove is provided on the top of the upper polishing rope clamping base plate, and a weight is assembled in the weighting groove;

[0023] The side walls of the infiltration grooves located at both ends of the medium infiltration tube are provided with U-shaped wire clamping grooves, and the bottom of the U-shaped wire clamping grooves is lower than the axis of the medium infiltration tube.

[0024] In one embodiment, the pressure assembly includes a press and a pressure sensor for detecting the pressure between the upper support pad and the press, the press is fixedly connected to the top of the upper support pad, and the pressure sensor is electrically connected to the press.

[0025] In one embodiment, the first winding machine and the second winding machine have the same winding direction;

[0026] The first winding machine and the second winding machine are both provided with a main body, a wire drum, a guide wheel and a positioning wheel, the wire drum, the guide wheel and the positioning wheel are all fixedly connected to the same vertical side wall of the main body, and the wire drum, the guide wheel and the positioning wheel rotate in the same direction and are perpendicular to the lower polishing rope clamping substrate;

[0027] The guide wheel is arranged between the wire drum and the positioning wheel, and the wire outlet direction of the positioning wheel is colinear with the axis of the medium infiltration pipe.

[0028] In one embodiment, the polishing assembly is further provided with a reamer and a guide wire, the reamer includes a conical portion and a cylindrical portion, the diameter of the cylindrical portion is the same as the diameter of the bottom surface of the conical portion, and the cylindrical portion is connected to the bottom surface of the conical portion;

[0029] The cone angle of the cone portion is twice the angle between the generatrix of the first slot segment and / or the third slot segment and the axis;

[0030] The guide wire is a nickel-titanium shape memory alloy wire, and the diameter of the guide wire is 0.1 mm to 0.5 mm.

[0031] In one embodiment, the polishing rope is a flexible rope, the diameter of the polishing rope is 1.1 to 2 times the diameter of the nickel-titanium shape memory alloy tube to be polished, and the length of the polishing rope is 100m to 1000m.

[0032] In a second aspect, the present invention also provides a method for polishing the inner wall of a nickel-titanium shape memory alloy capillary. The inner wall of the nickel-titanium shape memory alloy capillary is polished using three sets of the above-mentioned inner wall polishing devices for the nickel-titanium shape memory alloy capillary, and the method comprises the following steps:

[0033] S1, pre-polishing: installing the nickel-titanium shape memory alloy capillary tube to be polished in the inner wall polishing device of the first set of nickel-titanium shape memory alloy capillary tubes and then installing the polishing rope, starting the medium delivery pump, the first winding machine and the second winding machine to pre-polish the nickel-titanium shape memory alloy capillary tube to be polished;

[0034] S2, fine polishing: installing the nickel-titanium shape memory alloy capillary tube pre-polished in step S1 in a second set of nickel-titanium shape memory alloy capillary tube inner wall polishing devices and then installing a polishing rope, starting a medium delivery pump, a first winding machine and a second winding machine to perform fine polishing on the nickel-titanium shape memory alloy capillary tube to be polished;

[0035] S3, cleaning: install the nickel-titanium shape memory alloy tube that has been finely polished in step S3 in the inner wall polishing device of the third set of nickel-titanium shape memory alloy tubes, then install the polishing rope, start the medium delivery pump, the first winding machine and the second winding machine to clean the nickel-titanium shape memory alloy tube to be polished.

[0036] In one embodiment, the polishing rope of the inner wall polishing device of the first set of nickel-titanium shape memory alloy capillary tubes is a flexible acid-resistant polishing rope, and the polishing ropes of the inner wall polishing device of the second set of nickel-titanium shape memory alloy capillary tubes and the inner wall polishing device of the third set of nickel-titanium shape memory alloy capillary tubes are flexible non-acid-resistant polishing ropes;

[0037] The medium storage box of the first set of nickel-titanium shape memory alloy tube inner wall polishing devices stores acidic medium liquid, the medium storage box of the second set of nickel-titanium shape memory alloy tube inner wall polishing devices stores chromium oxide or aluminum oxide polishing liquid, and the medium storage box of the third set of nickel-titanium shape memory alloy tube inner wall polishing devices stores deionized water.

[0038] The beneficial effects of the present invention are:

[0039] (1) The device of the present invention can fix the nickel-titanium shape memory alloy tube as a whole in the axial fixing hole through the support component and the pressure component, so that during the polishing process, the nickel-titanium shape memory alloy tube will not bend or deform.

[0040] (2) In the present invention, a flexible polishing rope is used as a polishing medium, which can avoid rigid damage to the nickel-titanium shape memory alloy tube during the polishing process, avoid deformation or damage to the tube, and maintain the shape, size and performance of the tube.

[0041] (3) The present invention polishes the nickel-titanium shape memory alloy tube through three steps of acidic medium pre-polishing, chromium oxide or aluminum oxide polishing liquid fine polishing and deionized water cleaning, which can effectively remove oxide scale, scratches and other defects on the inner wall of the nickel-titanium shape memory alloy tube, significantly improve the surface finish and surface quality, and meet the stringent requirements of high-end applications on material surface quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Figure 1 It is a schematic diagram of the overall structure of the inner wall polishing device of the nickel-titanium shape memory alloy capillary provided in an embodiment of the present invention;

[0043] Figure 2 It is a schematic structural diagram of a polishing assembly provided in an embodiment of the present invention;

[0044] Figure 3 for Figure 1 Schematic diagram of the cross-section structure along the AA plane;

[0045] Figure 4 for Figure 2 An enlarged schematic diagram of point B;

[0046] Figure 5 It is a schematic diagram of the structure of a support assembly provided in an embodiment of the present invention;

[0047] Figure 6 for Figure 5 An enlarged schematic diagram of point C;

[0048] Figure 7 It is a schematic structural diagram of a lower support pad provided in an embodiment of the present invention;

[0049] Figure 8 for Figure 7 An enlarged schematic diagram of point D;

[0050] Fig. 9 A schematic diagram of the structure of a first infiltration component or a second infiltration component provided in an embodiment of the present invention;

[0051] Fig.10 It is a schematic diagram of the assembly relationship of the infiltration tank, the medium infiltration tube and the filter assembly provided in an embodiment of the present invention;

[0052] Fig.11 for Fig.10 An enlarged schematic diagram of point E;

[0053] Fig.12It is a schematic diagram of the overall structure of the first winding machine or the second winding machine provided in an embodiment of the present invention.

[0054] Description of reference numerals: 100, polishing assembly; 110, polishing rope; 120, base; 121, pressure tank; 130, base cover; 140, support assembly; 141, support tank; 142, fixing hole; 143, upper support pad; 144, lower support pad; 145, first tank section; 146, second tank section; 147, third tank section; 150, press; 160, first infiltration assembly; 161, infiltration tank; 162, medium storage box; 163, medium delivery pipe; 164, medium delivery pipe; 165, medium delivery pipe; 166, medium delivery pipe; 167, medium delivery pipe; 168, medium delivery pipe; 169, medium delivery pipe; 170, medium delivery pipe; 171, medium delivery pipe; 172, medium delivery pipe; 173, medium delivery pipe; 174, medium delivery pipe; 175, medium delivery pipe; 176, medium delivery pipe; 177, medium delivery pipe; 178, medium delivery pipe; 179, medium delivery pipe; 180, medium delivery pipe; 181, medium delivery pipe; 182, medium delivery pipe; 183, medium delivery pipe; 184, medium delivery pipe; 185, medium delivery pipe; 186, medium delivery pipe; 187, medium delivery pipe; 188, medium delivery pipe; 189, medium delivery pipe; 190, medium delivery pipe; 191, medium delivery pipe; 192, medium delivery pipe; 193, medium delivery pipe; 194, medium delivery pipe; 195, medium delivery pipe 4. Medium infiltration tube; 165. Medium downflow tube; 166. Medium filtering assembly; 170. Second infiltration assembly; 171. Lower polishing rope clamping substrate; 172. Lower polishing rope clamping gasket; 173. Upper polishing rope clamping substrate; 174. Upper polishing rope clamping gasket; 175. Weighting groove; 176. Weight; 177. U-shaped wire clamping groove; 200. First winding machine; 210. Main body; 220. Wire drum; 230. Guide wheel; 240. Positioning wheel; 300. Second winding machine. DETAILED DESCRIPTION

[0055] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0056] It should be noted that in the description of the present invention, “upper”, “lower”, “top”, “bottom”, orientation or position relationship is based on the attached Figure 1 Regarding the orientation or positional relationship shown, it should be understood that these orientation terms are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0057] In one embodiment, Figure 1 As shown, the inner wall polishing device of the nickel-titanium shape memory alloy tube of this embodiment includes a strip polishing component 100 for axially fixing the nickel-titanium shape memory alloy tube to be polished and polishing the nickel-titanium shape memory alloy tube to be polished, and a first winding machine 200 and a second winding machine 300 located on both axial sides of the polishing component 100.

[0058] Specifically, the polishing assembly 100, the first winding machine 200 and the second winding machine 300 are arranged in a straight line and fixed on the same plane.

[0059] like Figure 2 , Figure 3 and Figure 4As shown, the polishing assembly 100 is provided with a polishing rope 110 , a base 120 , a base cover 130 , a support assembly 140 , a pressure assembly for applying pressure to the support assembly 140 , and a first infiltration assembly 160 and a second infiltration assembly 170 for infiltrating the polishing rope 110 .

[0060] The base cover 130 is located above the base 120 and is axially hinged to the base 120. A pressure groove 121 axially penetrating the base cover 130 is provided at the bottom of the base cover 130. A support groove 141 axially penetrating the base 120 is provided at the top of the base 120. The pressure groove 121 is connected to the support groove 141. The pressure assembly is assembled in the pressure groove 121, and the support assembly 140 is installed in the support groove 141.

[0061] In this embodiment, the length of the base 120 and the base cover 130 are both 0.5m to 2m, and the base cover 130 is connected to the base 120 by a hinge on one side of the length direction of the top surface of the base 120, and the base cover 130 can be flipped up at the other long side after the hinge. The pressure groove 121 and the support groove 141 are both rectangular. Specifically, the width of the support groove 141 is 50mm to 100mm, and the depth is 15mm to 20mm.

[0062] like Figure 5 and Figure 6 As shown, a fixing hole 142 for fixing the nickel-titanium shape memory alloy tube to be polished is arranged horizontally and axially inside the support component 140, and the first infiltration component 160 and the second infiltration component 170 are fixedly connected to the two axial ends of the base 120 respectively.

[0063] One end of the polishing rope 110 is connected to the first winding machine 200, and the other end is connected to the second winding machine 300 after horizontally passing through the first wetting component 160, the nickel-titanium shape memory alloy tube and the second wetting component 170 in sequence when used to polish the nickel-titanium shape memory alloy tube to be polished.

[0064] It should be noted that the nickel-titanium shape memory alloy tube to be polished is fixed in a horizontal position by the polishing assembly 100, and the polishing rope 110 between the first winding machine 200 and the second winding machine 300 passes through the tube and slides in the tube in a horizontal direction, so as to polish the inside of the tube.

[0065] The nickel-titanium shape memory alloy tube is fixed as a whole in the axial fixing hole 142 by the support component 140 and the pressure component, so that the nickel-titanium shape memory alloy tube will not bend or deform during the polishing process.

[0066] Specifically, the polishing rope 110 is a flexible rope, the diameter of the polishing rope 110 is 1.1 to 2 times the diameter of the nickel-titanium shape memory alloy thin tube to be polished, and the length of the polishing rope 110 is 100m to 1000m. Using the flexible polishing rope 110 as a polishing medium can avoid rigid damage to the nickel-titanium shape memory alloy thin tube during the polishing process, avoid deformation or damage to the tube, and maintain the shape, size and performance stability of the tube.

[0067] In one embodiment, the support assembly 140 includes an upper support pad 143 and a lower support pad 144 fitted under the upper support pad 143, the lower support pad 144 is assembled in the support groove 141, and the bottom of the upper support pad 143 and the top of the lower support pad 144 are both provided with fixing grooves, and the fixing grooves of the upper support pad 143 and the lower support pad 144 are aligned and fitted to form a fixing hole 142.

[0068] Specifically, the geometric shape and size of the lower support pad 144 are exactly the same as those of the support groove 141 on the base 120, and the bottom surface of the lower support pad 144 is bonded to the surface of the support groove 141 by a connecting glue. The upper support pad 143 and the lower support pad 144 have the same horizontal size and are made of hard rubber.

[0069] like Figure 7 and Figure 8 As shown, the fixed groove includes a first groove section 145, a second groove section 146 and a third groove section 147 which are connected in sequence, the second groove section 146 is located between the first groove section 145 and the third groove section 147, the second groove section 146 is semi-cylindrical, the first groove section 145 and the third groove section 147 are semi-conical, and the tops of the first groove section 145 and the third groove section 147 are respectively flush with the two end surfaces of the second groove section 146.

[0070] The radius of the second groove section 146 is equal to the radius of the nickel-titanium shape memory alloy thin tube to be polished, and the center angle of the arc of the diameter surface of the second groove section 146 is 175° to 179°. The radius of the top surface arc of the first groove section 145 and the third groove section 147 is the same as the radius of the tube to be polished, and the center angle of the arc is the same as the center angle of the arc of the diameter surface of the second groove section 146. The bottom surface diameter is 1.5 to 5 times the top surface diameter, and the angle between the generatrix and the bottom surface is 30 to 45°.

[0071] In one embodiment, if Fig. 9 , Fig.10 and Fig.11 As shown, the first infiltration assembly 160 and the second infiltration assembly 170 are both provided with an infiltration tank 161 , a medium storage box 162 , a medium delivery pipe 163 , a medium infiltration pipe 164 , a medium downflow pipe 165 and a medium filtering assembly 166 for filtering the polishing rope 110 .

[0072] The medium storage box 162 is located below the infiltration tank 161 , and is fixedly connected to the base 120 . A medium delivery pump is disposed inside the medium storage box 162 . One side wall of the medium storage box 162 is fixedly connected to the base 120 .

[0073] The medium infiltration pipe 164 is located inside the infiltration tank 161, and the axis of the medium infiltration pipe 164 is colinear with the axis of the fixed tank. One end of the medium delivery pipe 163 passes through the bottom of the infiltration tank 161 and is radially connected to the medium infiltration pipe 164, and the other end of the medium delivery pipe 163 is connected to the medium delivery pump; one end of the medium downflow pipe 165 is connected to the bottom of the infiltration tank 161, and the other end of the medium downflow pipe 165 is connected to the medium storage box 162; the medium filter assembly 166 is arranged at one end of the medium infiltration pipe 164 away from the base 120, and is fixedly connected to the inner wall of the infiltration tank 161. The vertical height of the infiltration tank 161 is greater than the top surface height of the base 120.

[0074] In this embodiment, the infiltration tank 161, the medium storage box 162, the medium delivery pipe 163, the medium infiltration pipe 164 and the medium downflow pipe 165 are all made of stainless steel, and their function is to hold the infiltration medium. During infiltration, the medium delivery pump is turned on, and the infiltration medium rises from the medium storage box 162 through the medium delivery pipe 163 to the cut-off infiltration pipe to infiltrate the polishing rope 110 passing through the medium infiltration pipe 164. After the polishing rope 110 absorbs the infiltration medium, the excess infiltration medium flows out from the medium infiltration pipe 164 into the infiltration tank 161, and then returns to the medium storage box 162 through the medium downflow pipe 165.

[0075] In one embodiment, the media filter assembly 166 is provided with a lower polishing rope 110 clamping substrate, a lower polishing rope 110 clamping gasket, an upper polishing rope 110 clamping substrate, an upper polishing rope 110 clamping gasket and a weight 176.

[0076] The lower polishing rope 110 clamping substrate is horizontally fixedly connected to the inner wall of the infiltration tank 161, and the top surface of the lower polishing rope 110 clamping substrate is coplanar with the axis of the medium infiltration tube 164; the top of the lower polishing rope 110 clamping substrate and the bottom of the upper polishing rope 110 clamping substrate are both provided with rectangular grooves, the thickness of the lower polishing rope 110 clamping gasket and the upper polishing rope 110 clamping gasket are the same and equal to the depth of the rectangular groove, the lower polishing rope 110 clamping gasket is embedded in the rectangular groove of the lower polishing rope 110 clamping substrate, and the upper polishing rope 110 clamping gasket is embedded in the rectangular groove of the upper polishing rope 110 clamping substrate; the center line of the top surface of the rectangular groove along the width direction is colinear with the axis of the medium infiltration tube 164, and the upper polishing rope 110 clamping substrate is hinged to the lower polishing rope 110 clamping substrate through a vertical side wall along the width direction of the rectangular groove.

[0077] The function of the medium filter assembly 166 is mainly to filter the infiltration medium on the polishing rope 110 and enter the infiltration tank 161 when the polishing rope 110 leaves the infiltration tank 161. In this embodiment, the material of the lower polishing rope 110 clamping gasket and the upper polishing rope 110 clamping gasket are both acid-resistant rubber materials. The shape and size of the lower polishing rope 110 clamping gasket and the upper polishing rope 110 clamping gasket are the same as the rectangular groove, so that the gasket can completely fill the rectangular groove.

[0078] The top of the upper polishing rope 110 clamping the substrate is provided with a weight groove 175, and the weight 176 is installed in the weight groove 175; the side walls of the infiltration groove 161 at both ends of the medium infiltration tube 164 are provided with U-shaped wire clamping grooves 177, and the bottom of the U-shaped wire clamping groove 177 is lower than the axis of the medium infiltration tube 164. The width of the U-shaped wire clamping groove 177 is 7-9 mm, and the height is 10-20 mm.

[0079] The function of the weight groove 175 is to place the weight 176. The function of the weight 176 is to apply vertical pressure to the upper polishing rope 110 clamping gasket by clamping the substrate with the upper polishing rope 110, thereby giving a downward force to the polishing rope 110. In this embodiment, the weight of the weight 176 is 50 to 1000 g.

[0080] In one embodiment, the pressure assembly includes a press 150 and a pressure sensor for detecting the pressure between the upper support pad 143 and the press 150 . The press 150 is fixedly connected to the top of the upper support pad 143 , and the pressure sensor is electrically connected to the press 150 .

[0081] In this embodiment, the function of the press machine 150 is to drive the upper support pad 143 to move up and down along the height direction, so as to apply a certain pressure to the pipe to fix the pipe during the polishing process.

[0082] In one embodiment, if Fig.12 As shown, the first winding machine 200 and the second winding machine 300 have the same winding direction; the first winding machine 200 and the second winding machine 300 are both provided with a main body 210, a wire drum 220, a guide wheel 230 and a positioning wheel 240, the wire drum 220, the guide wheel 230 and the positioning wheel 240 are all fixedly connected to the same vertical side wall of the main body 210, the rotation direction of the wire drum 220, the guide wheel 230 and the positioning wheel 240 is the same and is perpendicular to the lower polishing rope 110 clamping the substrate; the guide wheel 230 is arranged between the wire drum 220 and the positioning wheel 240, and the wire outlet direction of the positioning wheel 240 is colinear with the axis of the medium infiltration tube 164.

[0083] Specifically, the first winding machine 200 and the second winding machine 300 in this embodiment are both active pay-off and take-up machines, which can accurately control the pay-off and take-up speeds and can adjust the tension, thereby achieving stable movement of the polishing rope 110 during the polishing process. The guide wheel 230 mainly acts as a guide wire, and the positioning wheel 240 acts to position the outlet or inlet direction of the winding machine so that the inlet and outlet directions coincide with the axis of the fixing hole 142.

[0084] In one embodiment, the polishing assembly 100 is also provided with a reamer and a guide wire, the reamer includes a conical portion and a cylindrical portion, the diameter of the cylindrical portion is the same as the diameter of the bottom surface of the conical portion, and the cylindrical portion is connected to the bottom surface of the conical portion; the cone angle of the conical portion is twice the angle between the generatrix of the first groove segment 145 and / or the third groove segment 147 and the axis; the guide wire is a nickel-titanium shape memory alloy wire, and the diameter of the guide wire is 0.1 mm to 0.5 mm.

[0085] Specifically, the reamer is made of stainless steel, and its function is to expand the two ends of the nickel-titanium shape memory alloy thin tube to be polished, so as to facilitate the subsequent penetration of the polishing rope 110 and reduce the resistance of the polishing rope 110 when entering the tube during the polishing process. The nickel-titanium shape memory alloy wire is in a straight line under the use environment and can show good superelasticity, so as to guide the polishing rope 110 in the nickel-titanium shape memory alloy thin tube to be polished.

[0086] Based on the same invention, the present invention also provides a method for polishing the inner wall of a nickel-titanium shape memory alloy capillary tube. The inner wall of the nickel-titanium shape memory alloy capillary tube is polished using three sets of the inner wall polishing devices of any one of the above embodiments.

[0087] Specifically, the polishing rope 110 of the first set of nickel-titanium shape memory alloy capillary inner wall polishing devices is a flexible acid-resistant polishing rope 110, and the polishing ropes 110 of the second set of nickel-titanium shape memory alloy capillary inner wall polishing devices and the third set of nickel-titanium shape memory alloy capillary inner wall polishing devices are flexible non-acid-resistant polishing ropes 110;

[0088] The medium storage box 162 of the first set of nickel-titanium shape memory alloy capillary inner wall polishing devices stores acidic medium liquid, the medium storage box 162 of the second set of nickel-titanium shape memory alloy capillary inner wall polishing devices stores chromium oxide or aluminum oxide polishing liquid, and the medium storage box 162 of the third set of nickel-titanium shape memory alloy capillary inner wall polishing devices stores deionized water.

[0089] The inner wall polishing method of the nickel-titanium shape memory alloy capillary tube of this embodiment comprises the following steps:

[0090] S1. Pre-polishing: After installing the nickel-titanium shape memory alloy tube to be polished in the inner wall polishing device of the first set of nickel-titanium shape memory alloy tubes, install the polishing rope 110, start the medium delivery pump, the first winding machine 200 and the second winding machine 300 to pre-polish the nickel-titanium shape memory alloy tube to be polished.

[0091] Specifically, the process of installing the nickel-titanium shape memory alloy thin tube to be polished and the polishing rope 110 is as follows: open the base cover 130, put the tube to be polished into the groove of the lower support pad 144, ensure that the two end surfaces of the tube are aligned with the left and right end surfaces of the base 120, and close the base cover 130. Start the press 150, control it to drive the upper support pad 143 to move downward until the pressure stress detected by the pressure sensor is 10-50MPa, close the press 150, and keep it at this position to maintain pressure; insert the tip of the reamer evenly into the left side of the tube, at this time the diameter of the left end of the tube gradually increases until the reamer can no longer be inserted, remove the reamer, and continue to use the same method to insert the right side of the tube until it can no longer be inserted, and remove the reamer. The polishing rope 110 is wound on the reel 220 of the first winding machine 200, and the first winding machine 200 leads the polishing rope 110. At this time, the first winding machine 200 is used as a pay-off machine. The polishing rope 110 is led out from the upper right corner of the reel 220, and is wound around the guide wheel 230 from the lower right corner of the guide wheel 230, and is led out from the upper right corner of the guide wheel 230, and then is wound around the positioning wheel 240 from the lower left corner of the positioning wheel 240, and is led out from the upper end of the positioning wheel 240. The upper polishing rope 110 clamping substrate is lifted, and the polishing rope 110 led out of the first winding machine 200 is passed between the upper polishing rope 110 clamping gasket and the lower polishing rope 110 clamping gasket. The polishing rope 110 continues to pass through the medium conveying pipe 163 of the first infiltration assembly 160, and after passing through, one end of the guide wire and the head of the polishing rope 110 are knotted, and the knot size formed after knotting is smaller than the inner diameter size of the pipe. Pass the other end of the guide wire through the pipe, pull the end of the guide wire through until the polishing rope 110 is pulled out of the pipe, and untie the binding knot between the polishing rope 110 and the guide wire. Pass the polishing rope 110 through the medium delivery pipe 163 of the second immersion assembly 170, lift the upper polishing rope 110 clamping substrate of the second immersion assembly 170, pass the polishing rope 110 drawn out of the first winding machine 200 between the upper polishing rope 110 clamping substrate and the lower polishing rope 110 clamping substrate, put down the upper polishing rope 110 clamping substrate, and put the pressure weight 176 in the pressure groove 175 above the upper polishing rope 110 clamping substrate. In the reverse direction, introduce the polishing rope 110 onto the wire drum 220 of the second winding machine 300.

[0092] During the pre-polishing process of step S1, the first winding machine 200 and the second winding machine 300 rotate one circle in the forward and reverse directions respectively, and the rotation speed is 20-50 m / min. When rotating in the reverse direction, the weight 176 on the second immersion component 170 is replaced on the first immersion component 160. Polishing in the forward and reverse directions twice can make the polishing effect more uniform.

[0093] When the pre-polishing is completed, the press machine 150 is controlled to move upward until the sensor shows that the pressure is 0, and the base cover 130 is opened to remove the pipe.

[0094] The role of pre-polishing is to use an acidic medium to corrode and loosen the scale on the inner wall of the pipe, and under the physical squeezing of the acid-resistant rope, the scale and slight scratches on the inner wall of the pipe are effectively removed, and a preliminary polishing effect is achieved. In addition, the precise control of the winding machine ensures the uniform movement of the polishing rope 110 in the pipe, avoiding partial over-polishing or under-polishing of the pipe.

[0095] S2, fine polishing: install the nickel-titanium shape memory alloy tube pre-polished in step S1 in the inner wall polishing device of the second set of nickel-titanium shape memory alloy tubes, then install the polishing rope 110, start the medium delivery pump, the first winding machine 200 and the second winding machine 300 to fine polish the nickel-titanium shape memory alloy tube to be polished.

[0096] Specifically, the fine polishing process of installing the nickel-titanium shape memory alloy tube and the polishing rope 110 and starting the device is the same as in step S1. The difference is that the first winding machine 200 and the second winding machine 300 of the fine polishing only rotate in one direction.

[0097] The purpose of step S2 is to pass the chromium oxide and aluminum oxide polishing liquid through the inside of the pipe at a certain speed and pressure through the flexible rope, and further improve the smoothness and surface quality through the friction between the polishing liquid and the inner wall of the pipe.

[0098] S3, cleaning: install the nickel-titanium shape memory alloy tube that has been finely polished in step S3 in the inner wall polishing device of the third set of nickel-titanium shape memory alloy tubes, then install the polishing rope 110, start the medium delivery pump, the first winding machine 200 and the second winding machine 300 to clean the nickel-titanium shape memory alloy tube to be polished.

[0099] Specifically, the installation of the nickel-titanium shape memory alloy tube and the polishing rope 110 in the fine polishing step, and the cleaning process after starting the device are the same as in step S2.

[0100] The purpose of step S3 is that the flexible polishing rope 110 passes through the inside of the pipe at a certain speed and pressure, aiming to remove the polishing liquid and tiny particles remaining inside the pipe, and at the same time play a slight polishing role to optimize the polishing effects of the first two steps.

[0101] The specific composition and ratio of the acidic medium liquid are hydrofluoric acid: nitric acid: distilled water of 1-2:1-3:3-5. The specific material of the flexible acid-resistant polishing rope 110 can be polytetrafluoroethylene or polypropylene fiber, and the material of the flexible non-acid-resistant polishing rope 110 can be flexible materials such as cotton and linen. The particle size of the chromium oxide and aluminum oxide polishing powder is 10μm to 40μm.

[0102] It should also be noted that after each step of polishing, the polishing effect can be evaluated by visual inspection, surface roughness measuring instrument or electron microscope, etc. According to the test results, polishing parameters such as the ratio of polishing liquid, the movement speed of polishing rope 1104 and the specifications of polishing rope 110 can be adjusted to ensure that the predetermined polishing effect and quality requirements are achieved.

[0103] The inner wall polishing method of the nickel-titanium shape memory alloy tube in the present embodiment polishes the nickel-titanium shape memory alloy tube through three steps of pre-polishing with acidic medium, fine polishing with chromium oxide or aluminum oxide polishing liquid, and cleaning with deionized water. The method can effectively remove defects such as oxide scale and scratches on the inner wall of the nickel-titanium shape memory alloy tube, significantly improve the surface finish and surface quality, and meet the stringent requirements of high-end applications on material surface quality.

[0104] The above-mentioned embodiments only express several implementation methods of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the present invention. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the attached claims.

Claims

1. A device for polishing the inner wall of a nickel-titanium shape memory alloy tube, characterized in that: It comprises a strip-shaped polishing assembly (100) for axially fixing a nickel-titanium shape memory alloy thin tube to be polished and polishing the nickel-titanium shape memory alloy thin tube to be polished, and a first winding machine (200) and a second winding machine (300) located on both axial sides of the polishing assembly (100); The polishing assembly (100) is provided with a polishing rope (110), a base (120), a base cover (130), a support assembly (140), a pressure assembly for applying pressure to the support assembly (140), and a first wetting assembly (160) and a second wetting assembly (170) for wetting the polishing rope (110); The base cover (130) is located above the base (120) and is axially hinged to the base (120); a pressure groove (121) axially penetrating the base cover (130) is provided at the bottom of the base cover (130); a support groove (141) axially penetrating the base (120) is provided at the top of the base (120); the pressure groove (121) is communicated with the support groove (141); the pressure assembly is assembled in the pressure groove (121); and the support assembly (140) is installed in the support groove (141); A fixing hole (142) for fixing the nickel-titanium shape memory alloy thin tube to be polished is arranged horizontally and axially inside the support component (140); the first infiltration component (160) and the second infiltration component (170) are respectively fixedly connected to the two axial ends of the base (120); One end of the polishing rope (110) is connected to the first winding machine (200), and the other end is used to horizontally pass through the first wetting component (160), the nickel-titanium shape memory alloy tube and the second wetting component (170) in sequence when polishing the nickel-titanium shape memory alloy tube to be polished, and then connected to the second winding machine (300).

2. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to claim 1, characterized in that: The support assembly (140) comprises an upper support pad (143) and a lower support pad (144) fitted below the upper support pad (143); the lower support pad (144) is assembled in the support groove (141); the bottom of the upper support pad (143) and the top of the lower support pad (144) are both provided with fixing grooves; the fixing grooves of the upper support pad (143) and the lower support pad (144) are aligned and fitted to form a fixing hole (142); The fixed groove comprises a first groove section (145), a second groove section (146) and a third groove section (147) which are connected in sequence, the second groove section (146) is located between the first groove section (145) and the third groove section (147), the second groove section (146) is semi-cylindrical, the first groove section (145) and the third groove section (147) are semi-truncated cone-shaped, and the tops of the first groove section (145) and the third groove section (147) are respectively flush with two end surfaces of the second groove section (146).

3. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to claim 2, characterized in that: The first infiltration assembly (160) and the second infiltration assembly (170) are both provided with an infiltration tank (161), a medium storage box (162), a medium delivery pipe (163), a medium infiltration pipe (164), a medium downflow pipe (165), and a medium filtering assembly (166) for filtering the medium of the polishing rope (110); The medium storage box (162) is located below the infiltration tank (161), the medium storage box (162) is fixedly connected to the base (120), and a medium delivery pump is arranged inside the medium storage box (162); The medium infiltration pipe (164) is located inside the infiltration tank (161), the axis of the medium infiltration pipe (164) is colinear with the axis of the fixed tank, one end of the medium delivery pipe (163) passes through the bottom of the infiltration tank (161) and is radially connected to the medium infiltration pipe (164), and the other end of the medium delivery pipe (163) is connected to the medium delivery pump; One end of the medium downflow pipe (165) is in communication with the bottom of the infiltration tank (161), and the other end of the medium downflow pipe (165) is in communication with the medium storage box (162); The medium filtering assembly (166) is arranged at one end of the medium infiltration tube (164) away from the base (120), and is fixedly connected to the inner wall of the infiltration tank (161).

4. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to claim 3, characterized in that: The medium filter assembly (166) is provided with a lower polishing rope (110) clamping substrate, a lower polishing rope (110) clamping gasket, an upper polishing rope (110) clamping substrate, an upper polishing rope (110) clamping gasket and a weight (176); The lower polishing rope (110) clamps the substrate and is horizontally fixedly connected to the inner wall of the infiltration tank (161), and the top surface of the substrate clamped by the lower polishing rope (110) is coplanar with the axis of the medium infiltration tube (164); A rectangular parallelepiped groove is provided at the top of the lower polishing rope (110) clamping substrate and at the bottom of the upper polishing rope (110) clamping substrate. The thickness of the lower polishing rope (110) clamping gasket and the upper polishing rope (110) clamping gasket are the same and equal to the depth of the rectangular parallelepiped groove. The lower polishing rope (110) clamping gasket is embedded in the rectangular parallelepiped groove of the lower polishing rope (110) clamping substrate, and the upper polishing rope (110) clamping gasket is embedded in the rectangular parallelepiped groove of the upper polishing rope (110) clamping substrate. The center line of the top surface of the rectangular parallelepiped groove in the width direction is colinear with the axis of the medium infiltration tube (164), and the upper polishing rope (110) clamping substrate is hingedly connected to the lower polishing rope (110) clamping substrate along a vertical side wall in the width direction of the rectangular parallelepiped groove; A weight groove (175) is provided on the top of the upper polishing rope (110) clamping the substrate, and the weight (176) is mounted in the weight groove (175); The side walls of the infiltration groove (161) located at both ends of the medium infiltration tube (164) are provided with U-shaped wire clamping grooves (177), and the bottom of the U-shaped wire clamping groove (177) is lower than the axis of the medium infiltration tube (164).

5. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to claim 4, characterized in that: The pressure assembly comprises a press (150) and a pressure sensor for detecting the pressure between the upper support pad (143) and the press (150), wherein the press (150) is fixedly connected to the top of the upper support pad (143), and the pressure sensor is electrically connected to the press (150).

6. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to claim 5, characterized in that: The first winding machine (200) and the second winding machine (300) have the same winding direction; The first winding machine (200) and the second winding machine (300) are both provided with a main body (210), a wire drum (220), a guide wheel (230) and a positioning wheel (240); the wire drum (220), the guide wheel (230) and the positioning wheel (240) are all fixedly connected to the same vertical side wall of the main body (210); the wire drum (220), the guide wheel (230) and the positioning wheel (240) rotate in the same direction and are perpendicular to the lower polishing rope (110) clamping substrate; The guide wheel (230) is disposed between the wire drum (220) and the positioning wheel (240), and the wire outlet direction of the positioning wheel (240) is colinear with the axis of the medium infiltration tube (164).

7. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to any one of claims 2 to 6, characterized in that: The polishing assembly (100) is further provided with a reamer and a guide wire, the reamer comprising a conical portion and a cylindrical portion, the diameter of the cylindrical portion being the same as the diameter of the bottom surface of the conical portion, and the cylindrical portion being connected to the bottom surface of the conical portion; The cone angle of the cone portion is twice the angle between the generatrix of the first slot section (145) and / or the third slot section (147) and the axis; The guide wire is a nickel-titanium shape memory alloy wire, and the diameter of the guide wire is 0.1 mm to 0.5 mm.

8. The inner wall polishing device of the nickel-titanium shape memory alloy capillary tube according to claim 7, characterized in that: The polishing rope (110) is a flexible rope, the diameter of the polishing rope (110) is 1.1 to 2 times the diameter of the nickel-titanium shape memory alloy tube to be polished, and the length of the polishing rope (110) is 100m to 1000m.

9. A method for polishing the inner wall of a nickel-titanium shape memory alloy tube, characterized in that: The inner wall of the nickel-titanium shape memory alloy capillary tube is polished using three sets of inner wall polishing devices for the nickel-titanium shape memory alloy capillary tube according to any one of claims 1 to 8, and the method comprises the following steps: S1, pre-polishing: installing the nickel-titanium shape memory alloy tube to be polished in the first set of nickel-titanium shape memory alloy tube inner wall polishing devices, installing a polishing rope (110), starting a medium delivery pump, a first winding machine (200) and a second winding machine (300) to pre-polish the nickel-titanium shape memory alloy tube to be polished; S2, fine polishing: installing the nickel-titanium shape memory alloy capillary tube pre-polished in step S1 in a second set of nickel-titanium shape memory alloy capillary tube inner wall polishing devices and then installing a polishing rope (110), starting a medium delivery pump, a first winding machine (200) and a second winding machine (300) to fine polish the nickel-titanium shape memory alloy capillary tube to be polished; S3, cleaning: installing the nickel-titanium shape memory alloy tube that has been finely polished in step S3 in a third set of nickel-titanium shape memory alloy tube inner wall polishing devices, then installing the polishing rope (110), starting the medium delivery pump, the first winding machine (200) and the second winding machine (300) to clean the nickel-titanium shape memory alloy tube to be polished.

10. The inner wall polishing method of the nickel-titanium shape memory alloy capillary tube according to claim 9, characterized in that: The polishing rope (110) of the first set of nickel-titanium shape memory alloy capillary inner wall polishing devices is a flexible acid-resistant polishing rope (110), and the polishing ropes (110) of the second set of nickel-titanium shape memory alloy capillary inner wall polishing devices and the third set of nickel-titanium shape memory alloy capillary inner wall polishing devices are flexible non-acid-resistant polishing ropes (110); The medium storage box (162) of the first set of nickel-titanium shape memory alloy capillary inner wall polishing devices stores acidic medium liquid, the medium storage box (162) of the second set of nickel-titanium shape memory alloy capillary inner wall polishing devices stores chromium oxide or aluminum oxide polishing liquid, and the medium storage box (162) of the third set of nickel-titanium shape memory alloy capillary inner wall polishing devices stores deionized water.

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