Cavity-based process fluid dispensing device

Abstract

The invention provides a processing fluid distribution device based on a cavity, the cavity comprises a supply cavity and a processing cavity, the processing fluid distribution device comprises a main pipeline, a processing branch, a backflow branch and a pressure control module, one end of the main pipeline is connected with the supply cavity, and the other end of the main pipeline is connected with the processing branch and the backflow branch; one end of the treatment branch is connected with the treatment cavity, and the other end of the treatment branch is connected with the main pipeline; one end of the backflow branch is connected with the supply cavity, and the other end is connected with the main pipeline; the pressure control module comprises a pressure measuring piece and a flow control unit, and the flow control unit adjusts the flow of the backflow branch through the main pipeline pressure measured by the pressure measuring piece so as to keep the flow of the main pipeline constant. According to the treatment fluid distribution device, the flow in the main pipeline can be kept constant, and the temperature of the treatment fluid can be controlled easily.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a chamber-based processing fluid distribution device. Background Art

[0002] Semiconductor equipment, especially wet process equipment, needs to supply various processing fluids into the processing chamber during use. In order to control the temperature of the processing fluid, a heater needs to be installed on the pipeline.

[0003] In the prior art, the heater is installed in the main line. In order to maintain the supply of processing fluid in each processing chamber to reach the set value, the amount of processing fluid in the main line is adjusted according to the number of open processing chambers. When the flow rate of the processing fluid in the main line changes suddenly, the heater often fails to heat the temperature of the processing fluid in the main line to the target temperature, making the temperature of the processing fluid difficult to control. Summary of the invention

[0004] Embodiments of the present application provide a chamber-based process fluid distribution device that can control the temperature of the process fluid at least to a certain extent.

[0005] On the one hand, the present application provides a cavity-based processing fluid distribution device, wherein the cavity includes a supply chamber and a processing chamber, including: a main line, a processing branch, a reflux branch and a pressure control module, wherein one end of the main line is connected to the supply chamber, and the other end is respectively connected to the processing branch and the reflux branch; one end of the processing branch is connected to the processing chamber, and the other end is connected to the main line, and a switch valve is provided on the processing branch; one end of the reflux branch is connected to the supply chamber, and the other end is connected to the main line; the processing fluid distribution device also includes a pressure control module, and the pressure control module includes a pressure measuring device and a flow control unit, and the flow control unit adjusts the flow of the reflux branch through the main line pressure measured by the pressure measuring device to keep the main line flow constant.

[0006] Specifically, the pressure measuring component is arranged on the main pipe.

[0007] Specifically, the pressure measuring component is arranged on the processing branch, and the processing fluid flows through the pressure measuring component on the processing branch to the switch valve and then enters the processing chamber.

[0008] Specifically, the processing branch further includes a processing branch regulating valve, and the processing branch regulating valve is arranged between the pressure measuring component and the processing chamber.

[0009] Specifically, the pressure measuring device is arranged on the reflux branch, and a reflux branch regulating valve is also provided on the reflux branch. The flow control unit adjusts the flow of the reflux branch through the reflux branch regulating valve. The processing fluid passes through the pressure measuring device on the reflux branch and flows to the reflux branch regulating valve before entering the supply chamber.

[0010] Specifically, a reflux branch regulating valve is further provided on the reflux branch, and the flow control unit regulates the flow of the reflux branch through the reflux branch regulating valve, and the reflux branch regulating valve is a fluid-driven valve.

[0011] Specifically, the flow control unit includes: a first shell, in which a first inlet channel and a first outlet channel that are interconnected are provided; a first magnetic part, which is arranged outside the first shell; a second magnetic component, which is arranged in the first shell, and the second magnetic component is electrically connected to the pressure measuring component, and the magnetism of the second magnetic component changes according to the change of the main line pressure to perform a movement close to or away from the first magnetic part; a first valve stem, one end of the first valve stem is connected to the second magnetic component; a first valve block, which is connected to the other end of the first valve stem and is arranged at the connection between the first inlet channel and the first outlet channel, wherein the first valve block approaches or moves away from the connection with the movement of the second magnetic component to change the opening of the connection between the first inlet channel and the first outlet channel.

[0012] Specifically, the fluid-driven valve includes: a second shell, a second inlet channel and a second outlet channel connected to each other are provided in the second shell, and an adjusting chamber is also provided in the second shell, and the adjusting chamber is connected to the first outlet channel; an elastic membrane, isolating the adjusting chamber from the second inlet channel; a fixed block, arranged in the adjusting chamber and located on the elastic membrane; a second valve stem, one end of the second valve stem passes through the elastic membrane to connect the fixed block; a second valve block, connected to the other end of the second valve stem, and arranged at the connection point of the second inlet channel and the second outlet channel, wherein the adjusting chamber expands or contracts with the fluid in the first outlet channel, so that the second valve block is close to or away from the connection point of the two inlet channels and the second outlet channel, so as to change the opening of the connection point of the second inlet channel and the second outlet channel.

[0013] On the other hand, the present application provides a cavity-based processing fluid distribution method, which is performed by any of the processing fluid distribution devices described above, including: obtaining the main line pressure; adjusting the flow of the reflux branch according to the main line pressure to keep the flow of the main line constant.

[0014] Specifically, before the step of obtaining the main line pressure, it also includes: opening the processing branch to the maximum flow and obtaining the maximum flow; if the maximum flow is less than the flow setting value, reducing the flow of the return branch until the maximum flow is greater than or equal to the flow setting value, and the main line pressure reaches the main line setting pressure.

[0015] The treatment fluid distribution device of the present application includes a main line and a treatment branch and a reflux branch connected to the main line. The treatment branch is connected to the treatment chamber. A reflux branch regulating valve is provided on the reflux branch. The flow control unit adjusts the reflux branch regulating valve according to the main line pressure obtained from the pressure measuring device, so as to adjust the pressure of the reflux branch when the flow in the treatment branch changes, thereby maintaining the pressure in the main line stable, so as to stabilize the pressure of the treatment fluid in the main line, and further stabilize the pressure of the treatment fluid. When the pressure of the treatment fluid in the main line is stable, the heating effect of the heater on the treatment fluid in the main line will also be stable, and the temperature of the fluid will not be affected by the sudden change of the flow of the treatment fluid.

[0016] Other features and advantages of the present application will become apparent from the following detailed description, or may be learned in part by the practice of the present application.

[0017] It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The drawings herein are incorporated into the specification and constitute a part of the specification, showing embodiments consistent with the present application, and together with the specification, are used to explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. In the drawings:

[0019] Figure 1 A schematic diagram of a chamber-based treatment fluid distribution device according to an embodiment of the present application is shown;

[0020] Figure 2 A schematic diagram of a chamber-based treatment fluid distribution device according to an embodiment of the present application is shown;

[0021] Figure 3 A schematic diagram of a chamber-based treatment fluid distribution device according to an embodiment of the present application is shown;

[0022] Figure 4 A schematic diagram of the structure of a fluid control unit according to an embodiment of the present application is shown;

[0023] Figure 5 A schematic diagram of the structure of a reflux branch regulating valve according to an embodiment of the present application is shown;

[0024] Figure 6 A flow chart of a chamber-based treatment fluid distribution method according to an embodiment of the present application is shown;

[0025] Figure 7 A flow chart of a chamber-based treatment fluid distribution method according to an embodiment of the present application is shown. DETAILED DESCRIPTION

[0026] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in a variety of forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this application will be more comprehensive and complete and fully convey the concept of the example embodiments to those skilled in the art.

[0027] In addition, described feature, structure or characteristic can be combined in one or more embodiments in any suitable manner. In the following description, many specific details are provided so as to provide a full understanding of the embodiments of the present application. However, it will be appreciated by those skilled in the art that the technical scheme of the present application can be put into practice without one or more of the specific details, or other methods, components, devices, steps, etc. can be adopted. In other cases, known methods, devices, realizations or operations are not shown or described in detail to avoid blurring the various aspects of the present application.

[0028] Please refer to Figures 1 to 3 The present application provides a chamber-based processing fluid distribution device for distributing processing fluid used in a semiconductor manufacturing process.

[0029] like Figure 1As shown, the chamber includes a supply chamber 1 storing a treatment fluid and a treatment chamber, and the treatment fluid distribution device based on the chamber includes a main line 2 connected to the supply chamber 1, and a treatment branch 3 and a reflux branch 4 connected to the main line 2. Specifically, one end of the main line 2 is connected to the supply chamber 1, and the other end of the main line 2 is respectively connected to the treatment branch 3 and the reflux branch 4. A heating element 21 is provided on the main line 2, and a switch valve 33 is provided on the treatment branch 3. The treatment branch 3 is connected to the treatment chamber for treating semiconductors, and the treatment branch 3 guides the treatment fluid in the main line 2 to the treatment chamber to treat the semiconductor. The reflux branch 4 is connected to the supply chamber 1, and a reflux branch regulating valve 41 is provided on the reflux branch 4. The reflux branch 4 recovers the treatment fluid in the main line 2 that does not flow to the treatment branch 3 to the supply chamber 1. The processing fluid distribution device also includes a pressure control module, which includes a flow control unit 5 and a pressure measuring device 7 for measuring the pressure of the main line 2. One end of the flow control unit 5 is connected to the pressure measuring device 7, and the other end is connected to the reflux branch regulating valve 41. The reflux branch regulating valve 41 is adjusted according to the pressure of the main line 2 measured by the pressure measuring device 7, so as to keep the pressure of the main line 2 unchanged by adjusting the pressure between the reflux branch regulating valve 41 and the supply chamber 1, thereby avoiding the opening or closing of the processing branch 3 affecting the pressure of the main line 2, and further avoiding the change of the pressure of the main line 2 causing the flow rate of the processing fluid provided by the supply chamber 1 to the main line 2 to change, so as to keep the temperature of the processing fluid in the main line 2 constant.

[0030] Need to explain, Figure 1 The pressure measuring device 7 is directly arranged on the main pipeline 2, and the pressure measuring device 7 and the flow control unit 5 can be connected by a pipeline or by communication; the flow control unit 5 and the reflux branch regulating valve 41 can be connected by a pipeline or by communication.

[0031] Among them, the treatment fluid is a liquid or gas that needs to be temperature controlled. For example, the liquid can be a cleaning liquid, an electroplating liquid, etc., the gas can be nitrogen or other gases, and the supply chamber 1 can be a liquid supply tank. The heating method of the heating element 21 can be electric heating or electromagnetic heating, etc. The switch valve 33 can be a manual switch valve or an electric switch valve, etc. Since the treatment fluid flows from the main line 2 into the reflux branch 4, passes through the reflux branch regulating valve 41 and then flows into the supply chamber 1, therefore, the end of the reflux branch 4 connected to the main line 2 and the reflux branch regulating valve 41 are used as the upstream of the reflux branch regulating valve 41, and the reflux branch regulating valve 41 and the end of the reflux branch 4 connected to the supply chamber 1 are used as the downstream of the reflux branch regulating valve 41.

[0032] like Figure 1 As shown, in one implementation of the embodiment of the present application, the pressure measuring component 7 can be arranged on the main pipe 2, and the main pipe 2 is also provided with a pump 22 and a main pipe flow meter 23.

[0033] In this embodiment, if the switch valve 33 on the processing branch 3 is opened, the pressure of the main line 2 is reduced, and the flow control unit 5 obtains that the signal transmitted by the pressure measuring component 7 becomes smaller, then the flow control unit 5 reduces the opening of the reflux branch regulating valve 41 to reduce the pressure downstream of the reflux branch regulating valve 41, thereby increasing the pressure upstream of the reflux branch regulating valve 41, and the reflux branch regulating valve 41 is connected to the main line 2 upstream, so the pressure of the main line 2 is increased, and the pressure of the main line 2 is restored. On the other hand, since the switch valve 33 is changed from closed to open, the flow of the processing branch 3 is increased, but The opening of the reflux branch regulating valve 41 is reduced, so the flow in the reflux branch 4 is reduced, and then the flow in the main line 2 is constant; if the switch valve 33 on the processing branch 3 is closed, the pressure in the main line 2 increases, and the signal of the pressure measuring component 7 obtained by the flow control unit 5 becomes larger, then the flow control unit 5 increases the opening of the reflux branch regulating valve 41 to increase the pressure downstream of the reflux branch regulating valve 41, thereby reducing the pressure upstream of the reflux branch regulating valve 41, and the upstream of the reflux branch regulating valve 41 is connected to the main line 2, so the pressure of the main line 2 is reduced, and the pressure of the main line 2 is restored. In this embodiment, since the pressure of the main line 2 remains stable, the pressure in the processing branch 3 without adjusting the switch valve 33 can also remain stable, and then the flow in the processing branch 3 can also remain stable. On the other hand, since the switch valve 33 is opened and closed, the flow in the processing branch 3 is reduced, but the opening of the reflux branch regulating valve 41 is increased, so the flow in the reflux branch 4 increases, and then the flow in the main line 2 is constant.

[0034] In one implementation of the present application, Figure 2 As shown, the pressure measuring device 7 can be arranged on the reflux branch 4, upstream of the reflux branch regulating valve 41. Since the upstream of the reflux branch regulating valve 41 is connected to the main line 2, the pressure upstream of the reflux branch regulating valve 41 is equal to the pressure of the main line 2. The pressure measuring device 7 arranged upstream of the reflux branch regulating valve 41 can measure the pressure of the main line 2.

[0035] In this embodiment, if the switch valve 33 on the processing branch 3 changes from closed to open, the pressure upstream of the reflux branch regulating valve 41 decreases, and the signal of the pressure measuring component 7 obtained by the flow control unit 5 becomes smaller, then the flow control unit 5 reduces the opening of the reflux branch regulating valve 41 to reduce the pressure downstream of the reflux branch regulating valve 41, thereby increasing the pressure upstream of the reflux branch regulating valve 41, and restoring the pressure upstream of the reflux branch regulating valve 41, so that the pressure of the main line 2 remains unchanged. On the other hand, since the switch valve 33 changes from closed to open, the flow of the processing branch 3 is increased, but the opening of the reflux branch regulating valve 41 is reduced, so the flow in the reflux branch 4 is reduced, and then the flow of the main line 2 is reduced. If the switch valve 33 on the processing branch 3 is opened to closed, the pressure upstream of the return branch regulating valve 41 increases, and the signal of the pressure measuring component 7 obtained by the flow control unit 5 becomes larger, then the flow control unit 5 increases the opening of the return branch regulating valve 41 to increase the pressure downstream of the return branch regulating valve 41, thereby reducing the pressure upstream of the return branch regulating valve 41, and restoring the pressure upstream of the return branch regulating valve 41, so that the pressure of the main line 2 remains unchanged. On the other hand, since the switch valve 33 is opened to closed, the flow of the processing branch 3 is reduced, but the opening of the return branch regulating valve 41 is increased, so the flow in the return branch 4 increases, and then the flow of the main line 2 is constant. In this embodiment, since the pressure of the main line 2 remains stable, the pressure in the processing branch 3 where the switch valve 33 is not adjusted can also remain stable.

[0036] In one implementation of the present application, the pressure measuring element 7 may be arranged on the processing branch 3, such as Figure 3 As shown, the section between the end of the processing branch 3 connected to the main line 2 and the switch valve 33 can be regarded as the upstream of the switch valve 33, and the section between the switch valve 33 and the end of the processing branch 3 connected to the processing chamber can be regarded as the upstream of the switch valve 33, and the pressure measuring device 7 can be arranged upstream of the switch valve 33. Accordingly, the section of the processing branch 3 between the switch valve 33 and the processing chamber can be regarded as the downstream of the switch valve 33. There can be multiple processing branches 3, and the pressure measuring device 7 can be arranged on any processing branch 3. Since the upstream of each switch valve 33 is connected to the main line 2, the upstream of each switch valve 33 is connected, and the pressure upstream of each switch valve 33 is equal to the pressure of the main line 2. The pressure measuring device 7 arranged upstream of any switch valve 33 can measure the pressure of the main line 2.

[0037] In this embodiment, if the switch valve 33 on the processing branch 3 changes from closed to open, the pressure downstream of the switch valve 33 increases and the pressure upstream of the switch valve 33 decreases, then the signal of the pressure measuring element 7 obtained by the flow control unit 5 becomes smaller, and the flow control unit 5 reduces the opening of the reflux branch regulating valve 41 to reduce the pressure downstream of the reflux branch regulating valve 41, thereby increasing the pressure upstream of the reflux branch regulating valve 41. Therefore, the pressure upstream of the switch valve 33 increases, so that the pressure upstream of the switch valve 33 is restored, and the pressure of the main line 2 is kept unchanged. On the other hand, since the switch valve 33 changes from closed to open, the flow of the processing branch 3 is increased, but the opening of the reflux branch regulating valve 41 is reduced, so the flow in the reflux branch 4 is reduced, and then the flow of the main line 2 The amount is constant; if the switch valve 33 on the processing branch 3 changes from open to closed, the pressure downstream of the switch valve 33 decreases, and the pressure upstream of the switch valve 33 increases, then the signal of the pressure measuring component 7 obtained by the flow control unit 5 becomes larger, and the flow control unit 5 increases the opening of the reflux branch regulating valve 41 to increase the pressure downstream of the reflux branch regulating valve 41, thereby reducing the pressure upstream of the reflux branch regulating valve 41. Therefore, the pressure upstream of the switch valve 33 decreases, and the pressure upstream of the switch valve 33 is restored, thus keeping the pressure of the main line 2 unchanged. On the other hand, since the switch valve 33 changes from open to closed, the flow of the processing branch 3 is reduced, but the opening of the reflux branch regulating valve 41 is increased, so the flow in the reflux branch 4 increases, and then the flow of the main line 2 is constant.

[0038] In other implementations of the embodiment of the present application, when there are multiple processing branches 3, the pressure measuring element 7 can be arranged on multiple processing branches 3. For example, the pressure measuring element 7 can be arranged on each processing branch 3. In other implementations of the embodiment of the present application, there can be only one processing branch 3.

[0039] In one implementation of the embodiment of the present application, the processing branch 3 may also be provided with a processing branch flowmeter 31 and a processing branch regulating valve 32. When the pressure measuring component 7 is provided upstream of the switch valve 33 of the processing branch 3, the processing branch flowmeter 31 may be provided at any position of the processing branch 3, and the processing branch regulating valve 32 may be provided between the pressure measuring component 7 and the switch valve 33 or downstream of the switch valve 33. The processing branch regulating valve 32 may be a manual regulating valve or an electric regulating valve, etc.

[0040] In this embodiment, the opening adjustment of the processing branch regulating valve 32 will also affect the signal of changing the pressure measuring device 7. Specifically, if the processing branch regulating valve 32 on the processing branch 3 increases its opening, the pressure at the pressure measuring device 7 decreases, and the flow control unit 5 reduces the opening of the reflux branch regulating valve 41 to reduce the pressure downstream of the reflux branch regulating valve 41, thereby increasing the pressure upstream of the reflux branch regulating valve 41. Therefore, the pressure at the pressure measuring device 7 increases, so that the pressure at the pressure measuring device 7 is restored, and the pressure of the main line 2 is kept unchanged; if the processing branch regulating valve 32 on the processing branch 3 reduces its opening, the pressure at the pressure measuring device 7 increases, and the flow control unit 5 increases the opening of the reflux branch regulating valve 41 to increase the pressure downstream of the reflux branch regulating valve 41, thereby reducing the pressure upstream of the reflux branch regulating valve 41. Therefore, the pressure at the pressure measuring device 7 decreases, so that the pressure at the pressure measuring device 7 is restored, and the pressure of the main line 2 is kept unchanged.

[0041] In one embodiment of the present application, the pressure measuring element 7 may be a pressure gauge or a pressure sensor, etc., which converts the pressure signal into an electrical signal. The flow control unit 5 may convert the electrical signal of the pressure measuring element 7 into a fluid signal, and the electrical signal may be a current signal or a voltage signal. For example, the current may be low when the pressure is low and the current may be high when the pressure is high.

[0042] like Figure 4As shown, the flow control unit 5 includes a first shell 51, a first magnetic member 52 is disposed outside the first shell 51, a second magnetic component 53 with the same magnetic properties as the first magnetic member 52 is disposed inside the first shell 51, and a through hole is provided between the first magnetic member 52 and the second magnetic component 53 so that the first magnetic member 52 and the second magnetic component 53 interact with each other. A holding space is provided in the first shell 51 for the second magnetic component 53 to move close to or away from the first magnetic member 52, that is, the holding space is used to hold the second magnetic component 53, and the size of the holding space in the direction of movement of the second magnetic component 53 close to or away from the first magnetic member 52 is greater than the size of the second magnetic component 53, and the repulsive force between the first magnetic member 52 and the second magnetic component 53 is increased or decreased by controlling the second magnetic component 53 to move away from or close to the first magnetic member 52. The first shell 51 is also provided with a first inlet channel 511 and a first outlet channel 512 that are interconnected outside the holding space, and a first inlet that is connected to the first inlet channel 511 is provided on the surface of the first shell 51, and a first outlet that is connected to the first outlet channel 512 is provided on the surface of the first shell 51. The flow control unit 5 also includes a first valve stem 54 and a first valve block 55 connected to each other. The first valve block 55 is connected to the second magnetic component 53 through the first valve stem 54. The first valve block 55 is arranged at the connection point between the first inlet channel 511 and the first outlet channel 512. The second magnetic component 53 drives the first valve block 55 to move through the first valve stem 54 to change the connection size between the first inlet channel 511 and the first outlet channel 512 blocked by the first valve block 55. Furthermore, a spring 56 is sleeved on one end of the first valve stem 54 connected to the second magnetic component 53. One end of the spring 56 abuts against the second magnetic component 53, and the other end of the spring 56 abuts against the inner wall of the accommodating space. Figure 1 As shown, the processing fluid distribution device also includes a control fluid source 6, which can be a gas source or a liquid source. The control fluid source 6 can be connected to the first inlet through a pressure regulating valve 8 to provide the control fluid to the first inlet.

[0043] Specifically, continue to refer to Figure 4 If the repulsive force between the first magnetic part 52 and the second magnetic component 53 increases, the repulsive force pushes the second magnetic component 53 to squeeze the spring 56, and the second magnetic component 53 drives the first valve block 55 to block the connection between the first inlet channel 511 and the first outlet channel 512 to reduce the opening, thereby reducing the control fluid flow out of the flow control unit 5; if the repulsive force between the first magnetic part 52 and the second magnetic component 53 decreases, the spring 56 resets and pushes the second magnetic component 53 toward the first magnetic part 52, so as to drive the first valve block 55 to open the connection between the first inlet channel 511 and the first outlet channel 512 to increase the opening, thereby increasing the control fluid flow out of the flow control unit 5.

[0044] In a specific embodiment, the first magnetic component 52 is a magnet, and the second magnetic component 53 includes an iron core and a coil sleeved outside the iron core, and generates magnetism through electromagnetism, and the strength of the electric signal passed into the coil is controlled to control the strength of the magnetism of the second magnetic component 53. In other embodiments of the embodiments of the present application, the second magnetic component 53 can be a magnet, the first magnetic component 52 is an electromagnetic induction component, or both the first magnetic component 52 and the second magnetic component 53 are electromagnetic induction components.

[0045] Accordingly, the reflux branch regulating valve 41 is a fluid driven valve, such as Figure 5 As shown, the reflux branch regulating valve 41 includes a second housing 411, in which a second inlet channel 4112 and a second outlet channel 4113 are connected to each other, and a second inlet connected to the second inlet channel 4112 and a second outlet connected to the second outlet channel 4113 are provided on the surface of the second housing 411. A regulating chamber 4111 is also provided in the second housing 411, in which a fixing block 413 is provided, and the regulating chamber 4111 is isolated from the second inlet channel 4112 by an elastic membrane 412, and the fixing block 413 is provided on the elastic membrane 412. A second valve stem 414 is also provided in the second inlet channel 4112, and the fixing block 413 passes through the elastic membrane 412 and is connected to one end of the second valve stem 414, and the other end of the second valve stem 414 is connected to a second valve block 415, and the second valve block 415 is provided at the connecting point between the second inlet channel 4112 and the second outlet channel 4113. The regulating chamber 4111 is connected to the first outlet. The regulating chamber 4111 expands or contracts as the control fluid flows out of the first outlet, causing the elastic membrane 412 to enter or move away from the second inlet channel 4112 to push or retract the second valve stem 414, thereby driving the second valve block 415 to block or open the connection between the second inlet channel 4112 and the second outlet channel 4113 to adjust the connection opening between the second inlet channel 4112 and the second outlet channel 4113.

[0046] Specifically, if the pressure in the main line 2 remains unchanged, the elastic membrane 412 in the reflux branch regulating valve 41 maintains its shape, and the inside of the reflux branch regulating valve 41 reaches equilibrium; if the pressure in the main line 2 decreases, the current obtained by the flow control unit 5 electrically connected to the pressure measuring device 7 weakens, and the control fluid flowing to the reflux branch regulating valve 41 through the flow control unit 5 increases. The pressure from the regulating chamber 4111 on the elastic membrane 412 increases and causes deformation, and the connection opening between the second inlet channel 4112 and the second outlet channel 4113 decreases to restore the pressure in the main line 2. At the same time, the connection opening is reduced to increase the pressure in the second inlet channel 4112, and the elastic membrane 412 is deformed. The pressure on both sides of the membrane 412 is the same, and a new balance is reached inside the reflux branch regulating valve 41; if the pressure in the main line 2 increases, the current obtained by the flow control unit 5 electrically connected to the pressure measuring device 7 increases, and the control fluid flowing to the reflux branch regulating valve 41 through the flow control unit 5 is reduced, and the pressure from the regulating chamber 4111 received by the elastic membrane 412 becomes smaller, and the connection opening between the second inlet channel 4112 and the second outlet channel 4113 increases to restore the flow of the main line 2. At the same time, the increase in the connection opening reduces the pressure in the second inlet channel 4112, and the pressure on both sides of the elastic membrane 412 is the same, and a new balance is reached inside the reflux branch regulating valve 41.

[0047] In other implementations of the embodiments of the present application, the flow control unit 5 may be an electrical proportional valve, and the return branch regulating valve 41 may be a back pressure valve. In other implementations of the embodiments of the present application, the flow control unit 5 may convert the measurement signal into an electrical signal or other signal, and the return branch regulating valve 41 may be an electric valve, a manual valve, or other valves.

[0048] The present application also provides a method for distributing a processing fluid, which is performed by the processing fluid distribution device described in any of the above embodiments, and specifically, can be performed by the fluid control unit 5 in the processing fluid distribution device, and is used to distribute the processing fluid used in the semiconductor manufacturing process. Figure 6 As shown, the treatment fluid distribution method includes at least steps S1 to S2, which are described in detail as follows:

[0049] S1: Get the pressure of main line 2.

[0050] The pressure change of the main line 2 can be measured by the pressure measuring device 7. When the pressure measuring device 7 is set in the main line 2, the pressure change of the main line 2 can be directly measured. When the pressure measuring device 7 is set in the processing branch 3, the pressure change of the main line 2 can be measured by measuring the pressure upstream of the switch valve 33 and upstream of the processing branch regulating valve 32. When the pressure measuring device 7 is set in the reflux branch 4, the pressure change of the main line 2 can be measured by measuring the pressure upstream of the reflux branch regulating valve 41.

[0051] In one implementation of the present application, Figure 7 As shown, before obtaining the pressure of the main line 2, the following steps are included:

[0052] S110: Open processing branch 3 to the maximum flow rate, and obtain the maximum flow rate of processing branch 3.

[0053] Specifically, all the processing branches 3 may be opened to the maximum flow rate, or the processing branch 3 to be used may be opened to the maximum flow rate.

[0054] S120: If the maximum flow is less than the flow setting value of the processing branch 3, the flow of the return branch 4 is reduced until the maximum flow of the processing branch 3 is greater than or equal to the flow setting value of the processing branch 3, and the pressure of the main line 2 reaches the main line setting pressure.

[0055] The flow setting value is a flow value that can meet the working requirements of the treatment branch 3. The main line set pressure can make the treatment fluid in the main line 2 reach a set temperature when passing through the heating element 21, and the set temperature is a temperature that can meet the working requirements of the treatment fluid.

[0056] Specifically, the flow rate of the reflux branch 4 can be reduced until half of the maximum flow rate in the processing branch 3 is equal to the flow setting value of the processing branch 3, and the pressure of the main line 2 reaches the main line setting pressure, that is, when the processing branch regulating valve 32 reaches half of the opening, the flow rate in the processing branch 3 is equal to the flow setting value, thereby enabling the flow rate in the processing branch 3 to be flexibly adjusted.

[0057] exist Figure 7 In the implementation mode, the flow rate of the reflux branch 4 is reduced and the pressure of the main line 2 is increased to increase the pressure of the processing branch 3, thereby increasing the flow rate of the processing branch 3, so that the flow rate in the processing branch 3 can reach the flow setting value of the processing branch 3, and the pressure in the main line 2 can reach the main line set pressure, so that the initial state of the cavity-based processing fluid distribution method meets the working requirements, thereby enabling the subsequent state of maintaining the constant pressure of the main line 2 to meet the working requirements.

[0058] Combined with reference Figure 6 and Figure 7 After step S1 or after steps S110, S120, and S1, step S2 is performed: the flow of the reflux branch 4 is adjusted according to the main line pressure to keep the flow of the main line 2 constant.

[0059] Specifically, when a pressure change in the main line 2 is detected, the reflux branch regulating valve 41 is adjusted to change the pressure upstream of the reflux branch regulating valve 41 by changing the pressure downstream of the reflux branch regulating valve 41, thereby keeping the pressure of the main line 2 unchanged and further keeping the flow of the main line 2 unchanged.

[0060] Those skilled in the art will readily appreciate other embodiments of the present application after considering the specification and practicing the embodiments disclosed herein. The present application is intended to cover any variations, uses or adaptations of the present application, which follow the general principles of the present application and include common knowledge or customary technical means in the art that are not disclosed in the present application.

[0061] It should be understood that the present application is not limited to the precise structures that have been described above and shown in the drawings, and that various modifications and changes may be made without departing from the scope thereof. The scope of the present application is limited only by the appended claims.

Claims

1. A chamber-based processing fluid distribution device, the chamber comprising a supply chamber and a processing chamber, characterized in that: It includes a main line, a processing branch, a reflux branch and a pressure control module, wherein one end of the main line is connected to the supply chamber, and the other end is respectively connected to the processing branch and the reflux branch; one end of the processing branch is connected to the processing chamber, and the other end is connected to the main line, and a switch valve is provided on the processing branch; one end of the reflux branch is connected to the supply chamber, and the other end is connected to the main line; the pressure control module includes a pressure measuring device and a flow control unit, and the flow control unit adjusts the flow of the reflux branch through the main line pressure measured by the pressure measuring device to keep the main line flow constant.

2. The chamber-based treatment fluid distribution device according to claim 1, characterized in that: The pressure measuring element is arranged on the main pipe.

3. The chamber-based treatment fluid distribution device according to claim 1, characterized in that: The pressure measuring element is arranged on the processing branch, and the processing fluid flows through the pressure measuring element on the processing branch to the switch valve and then enters the processing chamber.

4. The chamber-based treatment fluid distribution device according to claim 3, characterized in that: The processing branch further includes a processing branch regulating valve, and the processing branch regulating valve is arranged between the pressure measuring component and the processing chamber.

5. The chamber-based treatment fluid distribution device according to claim 1, characterized in that: The pressure measuring device is arranged on the reflux branch, and a reflux branch regulating valve is also provided on the reflux branch. The flow control unit adjusts the flow of the reflux branch through the reflux branch regulating valve. The processing fluid flows through the pressure measuring device on the reflux branch to the reflux branch regulating valve and then enters the supply chamber.

6. The chamber-based treatment fluid distribution device according to claim 1, characterized in that: The reflux branch is also provided with a reflux branch regulating valve, and the flow control unit regulates the flow of the reflux branch through the reflux branch regulating valve, and the reflux branch regulating valve is a fluid-driven valve.

7. The chamber-based treatment fluid distribution device according to claim 6, characterized in that: The flow control unit comprises: A first shell, wherein a first inlet channel and a first outlet channel are provided in the first shell; A first magnetic member, disposed outside the first shell; a second magnetic component, disposed in the first housing, the second magnetic component being electrically connected to the pressure measuring component, the magnetism of the second magnetic component changing according to the change of the main line pressure to execute a movement close to or away from the first magnetic component; a first valve stem, one end of which is connected to the second magnetic component; A first valve block is connected to the other end of the first valve stem and is disposed at the connection point between the first inlet channel and the first outlet channel, wherein the first valve block approaches or moves away from the connection point as the second magnetic component moves to change the opening of the connection point between the first inlet channel and the first outlet channel.

8. The chamber-based treatment fluid distribution device according to claim 7, characterized in that: The fluid-actuated valve comprises: a second shell, wherein a second inlet channel and a second outlet channel are provided in the second shell and are communicated with each other, and an adjusting chamber is also provided in the second shell, and the adjusting chamber is communicated with the first outlet channel; an elastic membrane, isolating the regulating chamber from the second inlet channel; A fixing block, arranged in the adjusting cavity and located on the elastic membrane; a second valve stem, one end of which passes through the elastic membrane and is connected to the fixing block; A second valve block is connected to the other end of the second valve stem and is disposed at the connection point between the second inlet channel and the second outlet channel, wherein the regulating chamber expands or contracts with the fluid in the first outlet channel so that the second valve block is moved closer to or farther away from the connection point between the second inlet channel and the second outlet channel to change the opening of the connection point between the second inlet channel and the second outlet channel.

9. A chamber-based treatment fluid distribution method, performed by the treatment fluid distribution device according to any one of claims 1 to 8, characterized in that: include: Get the main line pressure; The flow rate of the return branch is adjusted according to the pressure of the main line to keep the flow rate of the main line constant.

10. The chamber-based treatment fluid distribution method according to claim 9, characterized in that: Before the step of obtaining the main line pressure, it also includes: opening the processing branch to the maximum flow and obtaining the maximum flow; if the maximum flow is less than the flow setting value, reducing the flow of the return branch until the maximum flow is greater than or equal to the flow setting value, and the main line pressure reaches the main line setting pressure.

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