Radio frequency inductively coupled plasma uniformity regulation and control device

By designing a radio frequency inductively coupled plasma uniformity control device, the problem that plasma uniformity in large-area flat panel displays is affected by electromagnetic standing waves, and the plasma uniformity control and efficiency improvement of processing technology is achieved.

CN119729986APending Publication Date: 2025-03-28DALIAN UNIV OF TECH
10 Cites 1 Cited by

Patent Information

Application Number
CN202510115790.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-24
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

In a rectangular chamber of a large area flat panel display, the standing wave of electromagnetic waves will destroy the uniformity of the plasma, affect the uniformity and efficiency of the processing process, and lead to inconsistent product performance.

Method used

A radio frequency inductively coupled plasma uniformity control device is designed, including a discharge chamber, a quartz dielectric window, a radio frequency coil pair and a double cavity shielding cover. By changing the geometric shape of the radio frequency coil, the number of turns of the coil, the coil spacing, etc., the spatial distribution of the electromagnetic field is affected, and a shielding device is added between the double coils to reduce mutual induction.

Benefits of technology

It significantly improves the uniformity of plasma, improves the uniformity and efficiency of processing technology, and ensures the consistency of product performance.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

The invention discloses a radio frequency inductive coupling plasma uniformity regulation and control device, and relates to the technical field of radio frequency plasmas, and the device comprises a discharge chamber, a quartz dielectric window, a radio frequency coil pair and a double-cavity shielding cover. The quartz dielectric window is arranged on the upper surface of the discharge chamber; the radio frequency coil pair is arranged on the upper surface of the quartz dielectric window; the double-cavity shielding cover is arranged on the upper surface of the quartz dielectric window, and two cavities are formed by the double-cavity shielding cover and the upper surface of the quartz dielectric window; the radio frequency coil pair is arranged on the upper surface of the quartz dielectric window, and two radio frequency coils in the radio frequency coil pair are respectively arranged in different cavities; according to the invention, the double-cavity shielding cover is arranged to shield the two radio frequency coils in the radio frequency coil pair, and the position relation of the two radio frequency coils in the radio frequency coil pair is adjusted at the same time, so that the uniformity of the radio frequency inductive coupling plasma can be regulated and controlled.
Need to check novelty before this filing date? Find Prior Art