A dual ultrasonic alkaline cleaning device and method for tungsten wire surface treatment

By using a dual ultrasonic alkali cleaning device in the surface treatment of tungsten wire, combined with electrolysis and ultrasonic technology, the problem of inability to effectively remove impurities on the surface of tungsten wire and low treatment efficiency in the prior art is solved, and more efficient surface cleaning and production efficiency are achieved.

CN119753804APending Publication Date: 2025-04-04HENAN HENGXING SCI & TECH CO LTD
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Patent Information

Application Number
CN202411986314.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-31
Publication Date
2025-04-04

AI Technical Summary

Technical Problem

Existing electrolytic oil removal and chemical oil removal technologies cannot effectively remove impurities in the surface treatment of tungsten wires, and the treatment efficiency is low.

Method used

Using a dual ultrasonic alkali cleaning device, ultrasonic waves are emitted into the solution while electrolyzing in the alkaline solution, vacuum holes and bubbles formed by ultrasonic waves are used to generate shock waves to impact and peel off the oil stain on the surface of the tungsten wire.

Benefits of technology

It significantly improves the effect and efficiency of the surface treatment of tungsten wire, and can more thoroughly remove oil and impurities on the surface of tungsten wire, avoids oxidation and impurities recombination, and improves production efficiency.

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Abstract

The present invention belongs to the technical field of tungsten wire drawing production, and specifically relates to a dual ultrasonic alkaline cleaning device and method for tungsten wire surface treatment, comprising two cleaning tanks connected end to end, a storage tank is arranged below each cleaning tank, and a circulation pipeline is arranged between each cleaning tank and the corresponding storage tank; two first partitions are arranged in each cleaning tank, two overflow plates are arranged between the two first partitions, and multiple overflow tanks are opened on the upper side of each overflow plate, an ultrasonic device is arranged between the two overflow plates, and at least two plates are fixedly arranged between the two overflow plates, and the plates in the two cleaning tanks are respectively connected to the positive and negative poles of the power supply, and the plates are located above the ultrasonic device, and the ultrasonic device is used to emit ultrasonic waves to the solution in the cleaning tank. The present invention achieves the purpose of cleaning the surface of the tungsten wire by emitting ultrasonic waves into the solution while electrolyzing the tungsten wire in an alkaline solution, and effectively improves the effect and efficiency of the surface treatment of the tungsten wire.
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Description

Technical Field

[0001] The invention belongs to the technical field of tungsten wire drawing production, and in particular relates to a double ultrasonic alkali cleaning device and method for tungsten wire surface treatment. Background Art

[0002] In the process of producing electroplated brass wire by drawing tungsten wire, it is necessary to perform surface treatment before electroplating to remove graphite emulsion impurities, oil stains and oxide scale on the surface of tungsten wire left in the previous process. At present, chemical degreasing method is mostly used. Chemical degreasing uses the saponification and emulsification of alkaline solution on the surface of tungsten wire to degreasing, but its treatment effect is not good. On the basis of chemical degreasing, electrode plates are added to the solution for electrolytic degreasing. In addition to the above effects, it also has electrochemical effects. During electrolytic degreasing, whether the part is used as cathode or anode, a large amount of gas is precipitated on the surface. These gases are easily adsorbed on the surface of the oil film, tearing the oil film into small oil droplets and bringing them to the liquid surface. At the same time, the gas stirs the solution, so that the solution near the surface of the part is constantly updated, accelerating the degreasing process of the part. Compared with chemical degreasing, electrolytic degreasing has a faster degreasing speed and more thorough degreasing. However, with the improvement of process, the efficiency and effect of electrolytic degreasing still cannot meet the production requirements. Summary of the invention

[0003] The present invention aims to solve the problem that the existing surface treatment of tungsten wire by electrolytic degreasing and chemical degreasing is still unable to effectively remove impurities on the surface of tungsten wire and has low treatment efficiency. A dual ultrasonic alkaline cleaning device and method for surface treatment of tungsten wire is provided. The device and method emit ultrasonic waves into the solution while electrolyzing the tungsten wire in an alkaline solution, and utilizes vacuum cavities formed when high-frequency ultrasonic waves propagate in the solution to absorb gas in the solution to form bubbles, and then utilizes shock waves formed by bursting bubbles under pressure to impact and peel off oil stains on the surface of the tungsten wire, thereby achieving the purpose of cleaning the surface and effectively improving the effect and efficiency of surface treatment of the tungsten wire.

[0004] In order to achieve the above object, the technical solution of the present invention is: A dual ultrasonic alkali cleaning device for tungsten wire surface treatment comprises two cleaning tanks connected end to end, a storage tank is arranged below each cleaning tank, a circulation pipeline is arranged between each cleaning tank and the corresponding storage tank, and the circulation pipeline is used to circulate the solution between the storage tank and the cleaning tank.

[0005] Two first partitions are arranged in each of the cleaning tanks, two overflow plates are arranged between the two first partitions, a plurality of overflow grooves are opened on the upper side of each overflow plate, an ultrasonic device is arranged between the two overflow plates, at least two pole plates are fixedly arranged between the two overflow plates, the pole plates in the two cleaning tanks are respectively connected to the positive pole and the negative pole of the power supply, the pole plates are located above the ultrasonic device, the ultrasonic device is used to emit ultrasonic waves to the solution in the cleaning tank, the positive and negative poles are used to electrolytically degrease the surface of the tungsten wire by using the positive and negative poles, and the ultrasonic equipment is used to accelerate the surface treatment efficiency of the tungsten wire and ensure the surface treatment effect.

[0006] Preferably, second partitions are provided at both ends of each cleaning tank, the two first partitions are located between the two second partitions, and strip holes are provided on the first partition and the second partition, and the tungsten wire passes through the strip holes to reach the area where the solution is located.

[0007] A rotating shaft is arranged between the adjacent first partition plate and the second partition plate, and a plurality of guide wheels are rotatably sleeved on the rotating shaft. The guide wheels correspond to a plurality of overflow grooves one by one, and the tungsten wire is guided, lifted and transported by the guide wheels.

[0008] A plurality of limit plates are fixedly arranged on the opposite side of the two overflow plates, and a through groove is opened on the upper side of each of the limit plates. The through grooves correspond to the overflow grooves one by one, and the overflow grooves cover the corresponding through grooves. The solution overflows from the through grooves and then is discharged through the overflow groove, effectively extending and ensuring that the solution immerses the tungsten wire.

[0009] Preferably, there is a gap between the ultrasonic device and the inner bottom surface of the cleaning tank, and there is a gap between the electrode plate and the ultrasonic device, so as to ensure the diffusion of current and ultrasonic waves in the solution and the contact with the solution.

[0010] Preferably, the circulation pipeline includes an inlet pipe, an outlet pipe and an overflow pipe, the inner diameter of the inlet pipe is larger than that of the outlet pipe, one end of the inlet pipe is connected to the lower part of the storage tank, and the other end is connected to between two overflow plates in the corresponding cleaning tank, one end of the outlet pipe is connected to the upper part of the storage tank, and the other end is connected to between two overflow plates in the corresponding cleaning tank, one end of the overflow pipe is connected to the upper part of the storage tank, and the other end is connected to between the adjacent first partition and the overflow plate in the corresponding cleaning tank, the solution enters the cleaning tank from the inlet pipe and flows back to the storage tank from the outlet pipe, because the liquid inlet amount is greater than the liquid outlet amount, the solution overflows from the overflow tank and flows into the storage tank through the overflow pipe.

[0011] Preferably, a delivery pump and a filter are provided on the liquid inlet pipe, and the filter is located at one side of the outlet end of the delivery pump. The delivery pump is used to ensure liquid circulation, and the filter is used to separate impurities in the solution.

[0012] The liquid outlet pipes are all provided with valves for adjusting the flow rate of the liquid outlet pipes, thereby achieving liquid level control of the solution in the cleaning tank through valve adjustment.

[0013] Preferably, the electrode plate adopts a mesh plate structure, the electrode plate in one of the two cleaning tanks is an anode plate, and the electrode plate in the other cleaning tank is a cathode plate. The electrode plates in each cleaning tank are arranged at intervals from each other, effectively increasing the contact area between the electrode plate and the solution and ensuring the electrolysis effect.

[0014] A double ultrasonic alkali cleaning method for tungsten wire surface treatment is implemented by the above-mentioned double ultrasonic alkali cleaning device for tungsten wire surface treatment, comprising the following steps: Step 1: The tungsten wire passes through the cleaning tank through the strip hole, and the distance between two adjacent tungsten wires is set to 8-12mm; Step 2, starting the delivery pump, and the alkaline solution circulates between the cleaning tank and the storage tank through the circulation pipeline; The level of alkaline solution in the cleaning tank should be at least 0.5 cm higher than the tungsten wire; Step 3: Power the plates and adjust the current density in the cleaning tank to 5-20A / dm 2 ; At the same time, the ultrasonic device is powered on, the current is controlled at 1.5-3A, and 30-40KHZ ultrasonic waves are emitted into the alkaline solution; The controlled line speed is 24.5-25.5m / min.

[0015] Preferably, the alkaline solution in step 2 is a sodium hydroxide solution with a concentration of 30-100 g / L and a pH value of 10-14. The cleaning tank between the two overflow plates is heated to keep the temperature of the alkaline solution in the cleaning tank at 50-70°C.

[0016] Through the above technical solution, the beneficial effects of the present invention are: 1. The present invention provides two groups of cleaning tanks to perform surface treatment on the tungsten wire, thereby effectively ensuring the surface treatment effect of the tungsten wire. After the tungsten wire is treated in the previous cleaning tank, it directly enters the next cleaning tank to avoid oxidation. On this basis, it is treated again to avoid the treated tungsten wire surface from contacting with the air again and then oxidizing, and to avoid impurities such as oil and graphite emulsion from combining with the tungsten wire again to increase the difficulty of treatment and affect the efficiency of the tungsten wire surface treatment.

[0017] 2. The present invention places the electrode plates in the alkaline solution and places the electrode plates in two cleaning tanks as the cathode plate and the anode plate of the electrolysis reaction, and then uses the solution and the tungsten wire to form an electrolysis circuit, which effectively ensures the electrolysis effect and effectively increases the contact area between the tungsten wire and the solution to ensure the electrolysis effect.

[0018] 3. The present invention uses a grid plate structure electrode to electrolyze the surface of the tungsten wire, thereby further increasing the contact area between the electrode and the solution and improving the electrolytic treatment effect.

[0019] 4. The present invention sets an ultrasonic device in the cleaning tank, and then uses ultrasonic waves to propagate in the solution, which can form cavities inside the solution. The cavities are in a vacuum state, and the gas in the solution enters the vacuum cavities to form bubbles. When the bubbles are formed, they burst under the action of pressure to generate a strong shock wave, which is used to impact and peel off the oil stains and impurities on the surface of the tungsten wire, thereby effectively improving the cleaning effect of the tungsten wire surface.

[0020] 5. The present invention provides two cleaning tanks connected in sequence to continuously treat the surface of the tungsten wire, thereby effectively ensuring the treatment effect of the surface of the tungsten wire. After the surface of the tungsten wire is roughly treated by the first cleaning tank, most of the oil stains on the surface are cleaned off, and the remaining part is in a loose state. When the tungsten wire leaves the first cleaning tank, it directly enters the second cleaning tank. The electrolysis, ultrasound and alkaline solution in the second cleaning tank ensure that the surface of the tungsten wire is thoroughly cleaned, so that the surface treatment quality of the tungsten wire is better, avoiding the problem of subsequent nickel plating on the surface of the tungsten wire, and improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a structural schematic diagram of the present invention.

[0022] Figure 2 It is a structural schematic diagram of the connection between the cleaning tank and the storage tank of the present invention.

[0023] Figure 3 It is a schematic diagram of the cross-sectional structure of the cleaning tank of the present invention.

[0024] Figure 4 The structural diagram of the positional relationship between the electrode plate and the ultrasonic device of the present invention is shown in FIG. Figure 1 .

[0025] Figure 5 The structural diagram of the positional relationship between the electrode plate and the ultrasonic device of the present invention is shown in FIG. Figure 2 .

[0026] Figure 6 The structural diagram of the positional relationship between the electrode plate and the ultrasonic device of the present invention is shown in FIG. Figure 3 .

[0027] Figure 7 The structure diagram of the connection between the overflow plate and the limit plate of the present invention is shown in FIG. Figure 1 .

[0028] Figure 8 The structure diagram of the connection between the overflow plate and the limit plate of the present invention is shown in FIG. Figure 2 .

[0029] Fig. 9 The structure diagram of the connection between the overflow plate and the limit plate of the present invention is shown in FIG. Figure 3 .

[0030] The numbers in the accompanying drawings are: 1 is a cleaning tank, 2 is a storage tank, 3 is a first partition, 4 is an overflow plate, 5 is an overflow tank, 6 is an ultrasonic device, 7 is a plate, 8 is a second partition, 9 is a strip hole, 10 is a limit plate, 11 is a through groove, 12 is a liquid inlet pipe, 13 is a liquid outlet pipe, 14 is an overflow pipe, 15 is a delivery pump, and 16 is a filter. DETAILED DESCRIPTION

[0031] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments: like Figures 1 to 9 As shown, the present embodiment provides a dual ultrasonic alkaline cleaning device for tungsten wire surface treatment, comprising two cleaning tanks 1 connected end to end, a storage tank 2 is arranged below each of the cleaning tanks 1, an alkaline solution with a pH value of 10-14 is arranged in the storage tank 2, the concentration of the alkaline solution is 30-100g / L, and the temperature is maintained at 50-70°C, specifically, the alkaline solution is a sodium hydroxide solution prepared by mixing sodium hydroxide and pure water, the alkaline solution can saponify and emulsify the oil on the surface of the tungsten wire, absorb it, and in the process, part of the impurities such as graphite emulsion or oxide skin on the surface of the tungsten wire falls off, a circulation pipeline is arranged between each cleaning tank 1 and the corresponding storage tank 2, a delivery pump 15 and a filter 16 are arranged on the circulation pipeline, in actual use, the delivery pump 15 allows the solution to circulate between the storage tank 2 and the cleaning tank 1 through the circulation pipeline, on the one hand, to ensure effective contact between the solution and the tungsten wire, and in the process, the impurities therein are removed by the filter 16, to ensure the reaction effect of the solution delivered to the cleaning tank 1 with the oil on the surface of the tungsten wire.

[0032] Two first partitions 3 are arranged in each of the cleaning tanks 1, and two overflow plates 4 are arranged between the two first partitions 3. The two overflow plates 4 and the side walls of the cleaning tank 1 together form an electrolytic reaction space. The adjacent first partitions 3 and overflow plates 4 cooperate with the inner wall of the cleaning tank 1 to form an overflow space, that is, the two overflow spaces are located at the two ends of the corresponding electrolytic reaction space. The space between the two first partitions 3 of each cleaning tank 1 is divided into overflow space-electrolytic reaction space-overflow space in sequence. A plurality of overflow grooves 5 are opened on the upper side of each overflow plate 4. When the solution level in the electrolytic reaction space rises to a certain height, it flows from the overflow grooves 5 at both ends to the overflow space.

[0033] The circulation pipeline includes an inlet pipe 12, an outlet pipe 13 and an overflow pipe 14. The inner diameter of the inlet pipe 12 is larger than that of the outlet pipe 13. One end of the inlet pipe 12 is connected to the lower part of the storage tank 2, and the other end is connected to the two overflow plates 4 in the corresponding cleaning tank 1, that is, the inlet pipe 12 connects the storage tank 2 with the electrolytic reaction space. A delivery pump 15 and a filter 16 are provided on the inlet pipe 12. The filter 16 is located on the outlet side of the delivery pump 15. The filter 16 adopts a precision chemical liquid filter of model JF-2004. The solution in the storage tank 2 is delivered to the filter 16 through the delivery pump 15. After the solid impurities are separated out by the filter 16, it is delivered to the cleaning tank 1 through the inlet pipe 12, that is, delivered to the electrolytic reaction space. One end of the outlet pipe 13 is connected to the upper part of the storage tank 2, and the other end is connected to the corresponding cleaning tank 1. Between the two overflow plates 4 in the washing tank 1, that is, the liquid outlet pipe 13 connects the storage tank 2 and the electrolytic reaction space, and the solution in the electrolytic reaction space flows back to the storage tank 2 through the liquid outlet pipe 13. Since the diameter of the liquid inlet pipe 12 is larger than the inner diameter of the liquid outlet pipe 13, the solution level in the electrolytic reaction space gradually rises and contacts the tungsten wire passing through the electrolytic reaction space, reacts with the oil on the surface of the tungsten wire, and at the same time, during the circulation process, the impurities on the surface of the tungsten wire are washed away. When the solution level rises to the height of the overflow tank 5, it flows out of the electrolytic reaction space from the overflow tank 5 and enters the overflow space. One end of the overflow pipe 14 is connected to the upper part of the storage tank 2, and the other end is connected to the adjacent first partition plate 3 and the overflow plate 4 in the corresponding washing tank 1, that is, the overflow pipe 14 connects the storage tank 2 and the overflow space, and the solution in the overflow space flows into the storage tank 2 through the overflow pipe 14.

[0034] The liquid outlet pipe 13 is provided with a valve for adjusting the flow rate of the liquid outlet pipe 13. By adjusting the valve opening, the liquid level in the electrolytic reaction space is adjusted to ensure that the tungsten wire is immersed in the solution.

[0035] A plurality of limit plates 10 are fixedly provided on the opposite side of the two overflow plates 4, and a through groove 11 is opened on the upper side of each of the limit plates 10. The through groove 11 corresponds to the overflow groove 5 one by one, and the overflow groove 5 covers the corresponding through groove 11. When the solution level in the electrolysis reaction space rises to the bottom of the through groove 11, it flows out to the overflow groove 5 through the through groove 11, and then enters the overflow space. The limit plate 10 is fixedly connected to the corresponding overflow plate 4 by bolts, and the limit plate with different sizes of through groove 11 can be replaced according to needs, so as to adjust the flow rate of the solution flowing out of the electrolysis reaction space from the through groove 11. On the other hand, the through groove 11 ensures that the tungsten wire is aligned with the middle of the overflow groove 5 to guide the tungsten wire.

[0036] At least two electrode plates 7 are fixedly arranged between the two overflow plates 4. The electrode plates in each cleaning tank 1 are arranged at intervals, and the distance between two adjacent electrode plates in the same cleaning tank 1 is at least 2 cm. The difference between the current when the current enters the cleaning tank 1 and the current on the electrode plate 7 is reduced by the multiple electrode plates 7, thereby further ensuring the uniform current distribution in the cleaning tank 1 and the electrolytic cleaning effect on the surface of the tungsten wire. The electrode plates 7 in the two cleaning tanks 1 are respectively connected to the positive and negative electrodes of the power supply, and then the electrode plates as the positive and negative electrodes are connected to the tungsten wire through the solution, and the electrode plates are electrically connected to the power supply, thereby forming a current loop, and the power supply is supplied to the electrode plates. The surface of the tungsten wire is electrolyzed by electricity. Under the electrolysis conditions, the polarization of the electrode will reduce the surface tension of the oil and the solution, and the wettability of the solution to the surface of the tungsten wire will increase, which will reduce the adhesion between the oil film and the metal. The oil is easy to peel off and disperse into the solution for emulsification and removal. At the same time, under the action of electrolysis, a large amount of gas is precipitated on the surface of the tungsten wire. These gases are adsorbed on the surface of the oil film, tearing the oil film into small oil droplets and bringing them to the liquid surface, so that the oil on the surface of the tungsten wire is separated from the tungsten wire. At the same time, the gas stirs the solution, so that the solution near the surface of the tungsten wire is continuously updated, accelerating the degreasing process. In the actual electrolysis process, the electrolysis current density is guaranteed to be 5-20A / dm 2 .

[0037] An ultrasonic device 6 is arranged between the two overflow plates 4. The ultrasonic device 6 adopts an X6 type ultrasonic generator produced by Zhangjiagang Huawei Electronics Co., Ltd. The ultrasonic device 6 is used to emit ultrasonic waves to the solution in the cleaning tank 1. Ultrasonic waves are high-frequency sound waves with a frequency greater than 20KHZ. When propagating in the solution, cavities can be formed inside the solution. The cavities are in a vacuum state. The gas in the solution will enter the vacuum cavities to form bubbles. When the bubbles are formed, the bubbles burst under the action of pressure to produce a strong shock wave. Ultrasonic degreasing uses the "cavitation" effect to impact and peel off the oil on the metal surface to achieve the purpose of cleaning the surface. In actual use, the ultrasonic current is controlled at 1.5A-3A, and the ultrasonic frequency is controlled at 30KHZ-40KHZ.

[0038] The electrode plate 7 is located above the ultrasonic device 6, and there is a gap between the electrode plate 7 and the ultrasonic device 6. The electrode plate 7 adopts a mesh plate structure. The electrode plate 7 in one of the two cleaning tanks 1 is an anode plate, and the electrode plate 7 in the other cleaning tank 1 is a cathode plate. There is a gap between the ultrasonic device 6 and the inner bottom surface of the cleaning tank 1, which ensures the diffusion of the ultrasonic wave emitted by the ultrasonic device 6 in the solution and ensures sufficient and effective contact between the electrode plate and the solution.

[0039] An electric heating tube (not shown in the figure) is arranged between the two overflow plates 4 in each cleaning tank 1, which is used to heat the alkaline solution in the cleaning tank 1 to maintain its temperature at 50-70°C. The electric heating tube is arranged around the ultrasonic device 6, and there is a gap between the electrolytic heat tube and the ultrasonic device. The electrolytic heat tube is located below the electrode plate, and an anti-corrosion layer is arranged on the outside of the electrolytic heat tube, and the anti-corrosion layer is made of titanium.

[0040] Second partitions 8 are provided at both ends of each cleaning tank 1. The two first partitions 3 are located between the two second partitions 8. The first partitions 3 and the second partitions 8 are both provided with strip holes 9 for the tungsten wire to pass through.

[0041] A rotating shaft is arranged between the adjacent first partition plate 3 and the second partition plate 8, and a plurality of wire wheels are rotatably sleeved on the rotating shaft. The wire wheels correspond one to one with the plurality of overflow grooves 5, that is, the tungsten wire passes through the overflow space, the electrolytic reaction space, and the overflow space and then passes through the wire wheel again, which effectively ensures the height of the tungsten wire and the spacing between the plurality of tungsten wires, and avoids interference between adjacent tungsten wires.

[0042] A tungsten wire surface treatment method is implemented by the above-mentioned dual ultrasonic alkali cleaning device for tungsten wire surface treatment, comprising the following steps: Step 1: The tungsten wire passes through the cleaning tank through the strip hole, and the distance between two adjacent tungsten wires is set to 8-12mm; Preferably, the distance between two adjacent tungsten wires in step 1 is 10 mm; Step 2, starting the delivery pump, and the alkaline solution circulates between the cleaning tank and the storage tank through the circulation pipeline; The level of alkaline solution in the cleaning tank should be at least 0.5 cm higher than the tungsten wire; In the step 2, the alkaline solution is a sodium hydroxide solution with a concentration of 30-100 g / L and a pH value of 10-14. The cleaning tank between the two overflow plates 4 is heated to a temperature of 50-70° C.; Step 3: Power the plates and adjust the current density in the cleaning tank to 5-20A / dm 2 ,; At the same time, the ultrasonic device is powered on, the current is controlled at 1.5-3A, and 30-40KHZ ultrasonic waves are emitted into the alkaline solution; Control line speed to 24.5-25.5m / min; Preferably, in step three, the line speed is controlled to be 25 m / min.

[0043] When in use, the tungsten wire is arranged as follows: the tungsten wire passes through the strip hole 9 on the second partition 8 to reach the wire wheel, and the spacing between multiple parallel tungsten wires is ensured by the wire wheel. Then the tungsten wire passes through the strip hole 9 on the first partition 3 to enter the overflow space, passes through the overflow groove 5 on the overflow plate 4 and the through groove 11 on the limit plate 10 to enter the electrolytic reaction space, passes through another overflow plate 4 to reach another overflow space, and then passes through the wire wheel again to ensure the spacing between the tungsten wires. At this time, the tungsten wire passes through a cleaning tank 1, and then passes through another cleaning tank 1 again (the same as the above process).

[0044] Tungsten wire surface treatment: The delivery pump 15 delivers the alkaline solution in the storage tank 2 to the electrolytic reaction space through the filter 16 and the liquid inlet pipe 12, and then the solution flows back to the storage tank 2 from the liquid outlet pipe 13. Since the inner diameter of the liquid outlet pipe 13 is smaller than the inner diameter of the liquid inlet pipe 12, the liquid level in the electrolytic reaction space gradually increases. When the liquid level reaches the position of the through groove 11, the solution flows from the through groove 11 to the overflow space through the overflow groove 5. At this time, the solution immerses the tungsten wire. Correspondingly, if the solution cannot completely immerse the tungsten wire, the liquid level height can be further adjusted by adjusting the valve opening on the liquid outlet pipe 13 (that is, the flow rate of the liquid inlet pipe 12 at this time). The liquid outflow rate in the electrolytic reaction space is the flow rate of the liquid outlet pipe 13 and the solution flow rate from the bottom of the plurality of through slots 11 to the liquid surface. If the flow rate of the liquid outlet pipe 13 is reduced, the liquid level rises again, and the flow rate of the solution discharged from the through slots 11 increases, the circulation and dynamic balance of the solution in the electrolytic reaction space are still maintained), ensuring that the tungsten wire is immersed in the solution. Subsequently, the electrode plate 7 and the ultrasonic device 6 are powered on synchronously to perform surface treatment on the transported tungsten wire, wherein the impurity part of the grease is absorbed by the solution, and the remaining solid impurities are separated by the filter 16 as the solution circulates, effectively ensuring the effect and efficiency of the tungsten wire surface treatment.

[0045] The embodiments described above are only preferred embodiments of the present invention and are not intended to limit the scope of implementation of the present invention. Therefore, any equivalent changes or modifications made according to the structures, features and principles described in the patent scope of the present invention should be included in the scope of the patent application of the present invention.

Claims

1. A dual ultrasonic alkaline cleaning device for tungsten wire surface treatment, characterized in that: It comprises two cleaning tanks (1) connected end to end, a storage tank (2) is arranged below each cleaning tank (1), and a circulation pipeline is arranged between each cleaning tank (1) and the corresponding storage tank (2); Two first partitions (3) are arranged in each of the cleaning tanks (1), two overflow plates (4) are arranged between the two first partitions (3), a plurality of overflow grooves (5) are opened on the upper side of each of the overflow plates (4), an ultrasonic device (6) is arranged between the two overflow plates (4), at least two pole plates (7) are fixedly arranged between the two overflow plates (4), the pole plates (7) in the two cleaning tanks (1) are respectively connected to the positive pole and the negative pole of the power supply, the pole plates (7) are located above the ultrasonic device (6), and the ultrasonic device (6) is used to emit ultrasonic waves to the solution in the cleaning tank (1).

2. A dual ultrasonic alkaline cleaning device for tungsten wire surface treatment according to claim 1, characterized in that: Each cleaning tank (1) is provided with a second partition plate (8) at both ends, the two first partition plates (3) are located between the two second partition plates (8), and the first partition plates (3) and the second partition plates (8) are both provided with strip-shaped holes (9); A rotating shaft is provided between adjacent first baffles (3) and second baffles (8), and a plurality of guide wheels are rotatably sleeved on the rotating shaft, and the guide wheels correspond one to one with the plurality of overflow grooves (4); A plurality of limit plates (10) are fixedly arranged on opposite sides of the two overflow plates (4), and a through groove (11) is provided on the upper side of each limit plate (10), the through grooves (11) correspond one to one with the overflow grooves (5), and the overflow grooves (5) cover the corresponding through grooves (11).

3. The double ultrasonic alkali cleaning device for tungsten wire surface treatment according to claim 1, characterized in that: There is a gap between the ultrasonic device (6) and the inner bottom surface of the cleaning tank (1), and there is a gap between the electrode plate (7) and the ultrasonic device (6).

4. The dual ultrasonic alkaline cleaning device for tungsten wire surface treatment according to claim 1, characterized in that: The circulation pipeline comprises a liquid inlet pipe (12), a liquid outlet pipe (13) and an overflow pipe (14); the inner diameter of the liquid inlet pipe (12) is larger than that of the liquid outlet pipe (13); one end of the liquid inlet pipe (12) is connected to the lower part of the storage tank (2), and the other end is connected to between two overflow plates (4) in the corresponding cleaning tank (1); one end of the liquid outlet pipe (13) is connected to the upper part of the storage tank (2), and the other end is connected to between the two overflow plates (4) in the corresponding cleaning tank (1); one end of the overflow pipe (14) is connected to the upper part of the storage tank (2), and the other end is connected to between the adjacent first partition plate (3) and the overflow plate (4) in the corresponding cleaning tank (1).

5. The dual ultrasonic alkali cleaning device for tungsten wire surface treatment according to claim 4, characterized in that: The liquid inlet pipe (12) is provided with a delivery pump (15) and a filter (16), and the filter (16) is located on one side of the outlet end of the delivery pump (15); The liquid outlet pipe (13) is provided with a valve for adjusting the flow rate of the liquid outlet pipe (13).

6. The dual ultrasonic alkaline cleaning device for tungsten wire surface treatment according to claim 1, characterized in that: The electrode plate (7) adopts a mesh plate structure; the electrode plate (7) in one of the two cleaning tanks (1) is an anode plate, and the electrode plate (7) in the other cleaning tank (1) is a cathode plate; the electrode plates in each cleaning tank (1) are arranged at intervals from each other.

7. A double ultrasonic alkaline cleaning method for tungsten wire surface treatment, characterized in that: The method is realized by a dual ultrasonic alkaline cleaning device for tungsten wire surface treatment as claimed in any one of claims 2 to 6, comprising the following steps: Step 1: The tungsten wire passes through the cleaning tank through the strip hole, and the distance between two adjacent tungsten wires is set to 8-12mm; Step 2, starting the delivery pump, and the alkaline solution circulates between the cleaning tank and the storage tank through the circulation pipeline; The level of alkaline solution in the cleaning tank should be at least 0.5 cm higher than the tungsten wire; Step 3: Power the plates and adjust the current density in the cleaning tank to 5-20A / dm 2 ; At the same time, the ultrasonic device is powered on, the current is controlled at 1.5-3A, and 30-40KHZ ultrasonic waves are emitted into the alkaline solution; The controlled line speed is 24.5-25.5m / min.

8. A double ultrasonic alkali cleaning method for tungsten wire surface treatment according to claim 7, characterized in that: In the step 1, the distance between two adjacent tungsten wires is 10 mm.

9. A double ultrasonic alkali cleaning method for tungsten wire surface treatment according to claim 7, characterized in that: The alkaline solution in step 2 is a sodium hydroxide solution with a concentration of 30-100 g / L and a pH value of 10-14. The cleaning tank between the two overflow plates is heated to keep the temperature of the alkaline solution in the cleaning tank at 50-70°C.

10. A double ultrasonic alkali cleaning method for tungsten wire surface treatment according to claim 7, characterized in that: In step 3, the line speed is controlled to be 25 m / min.