Optoelectronic component with transmissive regions between emission regions with uniform (sub) pixel hole layout

Abstract

The invention relates to a display panel. The display panel comprises at least one display part and at least one signal exchange part. The display section includes a display section (sub-) pixel arrangement including a plurality of emission areas, each emission area corresponding to a (sub-) pixel. The signal exchange section includes a signal exchange section (sub-) pixel arrangement including at least one transmissive region and a plurality of emission regions, each emission region corresponding to a (sub-) pixel. The signal exchange portion (sub-) pixel arrangement adapts to the transmissive region by changing a lateral extent of an active region layer corresponding to at least one (sub-) pixel therein such that at least one of a size, a shape, a configuration, and an orientation of the lateral extent of the active region layer is changed, and a first one of the active region layers is positioned at an end of an intersection of the lateral extent of the remaining one of the active region layers.

Description

[0001] Related patent applications

[0002] This application claims priority to U.S. Provisional Patent Application No. 63 / 390,256, filed July 18, 2022, the contents of which are incorporated herein by reference in their entirety. Technical Field

[0003] This disclosure relates to layered semiconductor devices, and in some non-limiting examples to layered optoelectronic devices having a plurality of sub-pixel emitting regions and a plurality of electromagnetic radiation (EM) transmission regions, each sub-pixel including a first electrode and a second electrode separated by a semiconductor layer, wherein at least one of these electrodes, at least one particulate structure, a conductive coating electrically coupled thereto, and at least one of the transmission regions can be patterned by depositing a patterned coating, which can act as and may be at least one of nucleation inhibition coatings. Background Technology

[0004] In optoelectronic devices such as organic light-emitting diodes (OLEDs), at least one semiconductive layer, including an emitting layer, may be disposed between a pair of electrodes (such as an anode and a cathode). The anode and cathode may be electrically coupled to a power source and generate holes and electrons, respectively, which migrate toward each other through the at least one semiconductive layer. When a pair of holes and electrons combine, the emitting layer may emit EM radiation in the form of photons.

[0005] OLED display panels (such as active-matrix OLED (AMOLED) panels) may include multiple pixels, each pixel further including multiple (including but not limited to one of three and four) sub-pixels. In some non-limiting examples, the various sub-pixels of a pixel may be characterized by at least one of three and four different colors (including but not limited to R (red), G (green), and B (blue)). Each (sub)pixel may have an associated emission region comprising an associated pair of electrodes and a stack of at least one semiconductive layer between these electrodes. In some non-limiting examples, each sub-pixel of a pixel may emit EM radiation, including but not limited to photons, having an associated wavelength spectrum characterized by a given color (including but not limited to one of R (red), G (green), B (blue), and W (white)). In some non-limiting examples, the (sub)pixel may be selectively driven by driving circuitry including at least one thin-film transistor (TFT) structure electrically coupled to conductive metal lines within a substrate, and in some non-limiting examples, electrodes and at least one semiconductive layer are deposited on the substrate. In some non-limiting examples, the various coatings (layers) of such panels may be formed by vacuum-based deposition processes.

[0006] In AMOLED panels, a sub-pixel emits EM radiation when a voltage is applied between its anode and cathode. The emission of EM radiation from each sub-pixel in such a panel can be controlled by controlling the voltage applied between the anode and cathode. In cases where a common cathode is provided across multiple sub-pixels, the voltage across the anode and cathode in each sub-pixel can be controlled by modulating the voltage of the anode. In some non-limiting examples, adjacent anodes may be spaced apart laterally and upwards, and at least one non-emitting region may be provided between them.

[0007] In some non-limiting examples, at least one of various layers, including but not limited to an anode, a cathode, and at least one semiconducting layer therebetween (“active region layer”), can be deposited by depositing a corresponding constituent active region layer material. In some non-limiting examples, some of the at least one semiconducting layer can be arranged in a desired pattern via vapor deposition of the corresponding active region layer material using a fine metal mask (FMM) having orifices corresponding to the desired locations where the active region layer material is to be deposited. In some non-limiting examples, multiple active region layers can be arranged in a similar pattern, including but not limited to depositing their respective active region layer materials in their respective deposition stages using a common FMM.

[0008] When the layouts of the various active region layers are different, a given emission region can be defined by covering the layout of each of its active region layers and selecting their intersections, such that the emission region corresponds to the lateral orientation of the device, wherein each active region layer overlaps.

[0009] In some applications, there may be an objective to make at least a portion of a display panel substantially transparent while still being able to emit light from it. In some non-limiting examples, the substantially transparent portion may be able to exchange EM radiation passing through it, including but not limited to EM signals. In some non-limiting examples, such a portion of the display panel may be referred to as its signal exchange portion. In some non-limiting examples, the signal exchange portion of the display panel may include at least one (EM signal) transmission area and at least one (EM signal) emission area. In some non-limiting examples, at least one emission area may correspond to a (sub)pixel of the display panel.

[0010] Chinese Patent Application No. 112054048, filed on September 17, 2020, by Hefei Visionox Technology Co., Ltd. and entitled "Light-transmitting display module, display panel and preparation method thereof," discloses a light-transmitting display module, a display panel, and a method for manufacturing the same. The light-transmitting display module includes: a pixel defining layer comprising an isolation structure and pixel openings formed by the isolation structure in a surrounding pattern; a nucleation suppression layer positioned on the side of the pixel defining layer away from the substrate and comprising a plurality of suppression units, wherein a first orthographic projection of the suppression units on the pixel defining layer covers at least a portion of the isolation structure, and at least a portion of the suppression units is discontinuously arranged; and a first common electrode positioned on the side of the pixel defining layer away from the substrate, wherein a second orthographic projection of the first common electrode on the pixel defining layer covers at least a portion of the area excluding the first orthographic projection. In the light-transmitting display module provided by the embodiment of the present invention, the light transmittance of the light-transmitting display module can be improved without affecting the normal display of the light-transmitting display module, and the photosensitive component can be conveniently integrated on one side of the light-transmitting display module below the screen.

[0011] Chinese Patent Application No. 112103318, filed on September 17, 2020, by Hefei Visionox Co., Ltd. and entitled "Display panel, preparation method, display panel and display device", discloses a display panel, a method for manufacturing a display panel, and a display device. The display panel comprises a first display area and a second display area, the first display area having a higher transmittance than the second display area. The display panel includes: a substrate; a pixel defining layer positioned on the substrate and including an isolation structure and a pixel opening formed by the outer shell of the isolation structure; a nucleation suppression layer including a first suppression unit in the pixel opening covered by a first orthographic projection of a transition display area onto the pixel defining layer; and a common electrode including a first common electrode and a second common electrode, the second common electrode being formed in the second display area and the transition display area, and the second orthographic projection of the first common electrode onto the pixel defining layer covering at least a portion of the area other than the first orthographic projection in the first display area and the transition display area. At least a portion of the display panel may be light-transmitting and displayable, and photosensitive components may be conveniently integrated beneath the screen.

[0012] In some non-limiting examples, at least one transmissive region may be distributed within at least one emitting region. Since emitting regions typically include layers, coatings, and / or components that attenuate or suppress EM radiation transmission through such regions, in some non-limiting examples, transmissive regions may typically be located in non-emitting regions of the display panel, which may substantially lack such layers, coatings, and / or components.

[0013] In some non-limiting examples, the display panel may include: at least one display portion including a display portion (sub)pixel arrangement comprising a plurality of emitting regions, each emitting region corresponding to a (sub)pixel; and at least one signal exchange portion including a signal exchange portion (sub)pixel arrangement comprising at least one transmissive region and a plurality of emitting regions, each emitting region corresponding to a (sub)pixel. The signal exchange portion (sub)pixel arrangement is adapted to the at least one transmissive region by differing from the display portion (sub)pixel arrangement in at least one feature, the at least one feature being selected from at least one of the size, shape, configuration and orientation of the at least one (sub)pixel, pixel density, and the spacing of the (sub)pixels.

[0014] In some non-limiting examples, the aperture of the FMM used to deposit the at least one semiconductive layer therebetween in the display portion can be adjusted to accommodate the introduction of the at least one transmission region in the signal exchange portion.

[0015] In some non-limiting examples, there may be an objective to provide at least one transmissive region in the signal exchange portion of the display panel, while also providing at least one emitting region in that portion of the display panel to maintain pixel density, including but not limited to, such that the aperture of the FMM for depositing at least one semiconductive layer therebetween remains substantially unchanged in the signal exchange portion and the display portion of the display panel (which substantially does not have at least one such transmissive region). Attached Figure Description

[0016] Examples of this disclosure will now be described with reference to the following figures, wherein the same reference numerals in the different figures indicate at least one of the following: the same elements and, in some non-limiting examples, similar elements and corresponding elements, and wherein:

[0017] Figure 1 The following is a simplified block diagram of an example device in the longitudinal orientation according to the example in this disclosure, which has multiple layers in the lateral orientation, the layers being formed by selectively depositing a patterned coating in a first portion of the lateral orientation and subsequently depositing a closed coating of deposited material in a second portion thereof;

[0018] Figure 2 Based on the examples in this disclosure Figure 1 A simplified diagram of an example type of device viewed longitudinally, in which a closed coating of deposited material in the second part forms the second electrode of the optoelectronic device;

[0019] Figure 3 This is a schematic diagram showing an example cross-sectional view of an example display panel according to an example of the present disclosure, the example display panel having multiple layers, the multiple layers including at least one hole through which at least one electromagnetic signal can be exchanged;

[0020] Figures 4A to 4B This is a schematic diagram illustrating the arrangement of corresponding example (sub)pixels in a plan view according to the examples of this disclosure;

[0021] Figure 4C The signal switching area is shown in a plan view. Figure 4A A schematic diagram of at least one segment filled by an example (sub)pixel arrangement;

[0022] Figures 4D to 4H This is a schematic diagram illustrating the arrangement of corresponding example (sub)pixels in a plan view according to the examples of this disclosure;

[0023] Figure 4I The signal switching area is shown in a plan view. Figure 6 A schematic diagram of at least one segment filled by an example (sub)pixel arrangement of G;

[0024] Figure 4J This is a schematic diagram illustrating an example (sub)pixel arrangement in plan view according to an example of this disclosure;

[0025] Figures 4K to 4M This is a schematic diagram illustrating an example (sub)pixel arrangement in plan view according to an example of this disclosure;

[0026] Figure 4N The signal switching section is shown in a plan view. Figure 4E and Figure 4F A schematic diagram of at least one segment filled with alternating example (sub) pixel arrangements;

[0027] Figures 40 to 4W This is a schematic diagram illustrating the arrangement of corresponding example (sub)pixels in a plan view according to the examples of this disclosure;

[0028] Figure 5 This is a schematic diagram of a corresponding example segment of the arrangement of (sub)pixels in each of the signal exchange section, transition area and display section, according to an example of the present disclosure;

[0029] Figure 6 This illustrates an example of a method for use in accordance with this disclosure. Figure 1 A schematic diagram illustrating an example process of depositing a patterned coating on the exposed surface of the lower layer in an example type of device;

[0030] Figure 7 It is shown that it is used in including Figure 3 A schematic diagram of an example process of depositing deposition material in a second portion of the exposed layer surface of a patterned coating, wherein the patterned coating is a nucleation inhibition coating (NIC);

[0031] Figure 8A It is shown in sectional view Figure 1 A schematic diagram of an example type of device;

[0032] Figure 8B This is shown in the supplementary floor plan. Figure 8A Schematic diagram of the device;

[0033] Figures 9A to 9B This is a schematic diagram illustrating various potential behaviors of a patterned coating according to various examples of the present disclosure, the patterned coating being located in Figure 1 The deposition interface between the device and the deposited layer in an example type;

[0034] Figures 10A to 10H Based on the examples in this disclosure Figure 1 The simplified block diagram of the device, viewed from the cross-section, illustrates various examples of possible interactions between the granular patterned coating and the granular structure.

[0035] Figure 11 It is a schematic diagram illustrating an example according to this disclosure. Figure 2 Example cross-sectional view of the device type, and additional example deposition steps;

[0036] Figure 12 This is a schematic diagram illustrating an example stage of an example process for manufacturing an OLED device according to an example of an example type of example according to the examples in this disclosure, the example type having sub-pixel regions having a second electrode of another thickness;

[0037] Figure 13 This is a schematic diagram showing an example cross-sectional view of an example type of OLED device according to an example of the present disclosure, wherein the second electrode is coupled to the auxiliary electrode;

[0038] Figure 14 This is a schematic diagram showing an example cross-sectional view of an example type of OLED device according to the examples in this disclosure, which has a separator and a shielding area, such as a recess, in its non-emitting region;

[0039] Figures 15A to 15BThis is a schematic diagram illustrating an example cross-sectional view of an example OLED device having separators and shielding areas (such as holes) in a non-emitting region according to various examples in this disclosure;

[0040] Figure 16 This illustrates an example energy distribution of the energy states of surface-adsorbed atoms adsorbed onto a surface according to an example in this disclosure;

[0041] Figure 17 This is a schematic diagram illustrating the formation of a membrane core according to an example in this disclosure; and

[0042] Figure 18 It is a block diagram of an example computer device within a computing and communication environment that can be used to implement devices and methods according to representative examples of this disclosure.

[0043] In this disclosure, an icon symbol appended with at least one of at least a numerical value (including, but not limited to, at least one of a superscript and a subscript) and at least one letter character (including, but not limited to, in lowercase) can be considered to refer to at least one specific instance and subset of the feature (element) described by the icon symbol. As indicated by the context, indexing an icon symbol without indexing at least one of the appended value and the character can generally refer to the feature described by the icon symbol and at least one of the set of all instances described by it. Similarly, an icon symbol can use the letter "x" to replace a number. As indicated by the context, indexing such an icon symbol can generally refer to the feature described by the icon symbol, wherein the character "x" is replaced by a number and the set of all instances described by it.

[0044] In this disclosure, for purposes of illustration and not limitation, specific details are set forth to provide a thorough understanding of the disclosure, including but not limited to specific architectures, interfaces, and technologies. In some instances, detailed descriptions of well-known systems, techniques, components, devices, circuits, methods, and applications are omitted to avoid obscuring the description of the disclosure with unnecessary detail.

[0045] Furthermore, it should be understood that the block diagrams reproduced herein may represent conceptual views of exemplary components embodying the principles of this technology.

[0046] Accordingly, system and method components have been represented in the drawings by conventional symbols where appropriate, with only those specific details relevant to an understanding of the examples of the present disclosure shown so that the disclosure is not obscured with details that would be apparent to one of ordinary skill in the art having the benefit of the description herein.

[0047] Any of the accompanying drawings provided herein may not be drawn to scale and may not be considered as limiting this disclosure in any way.

[0048] In some examples, any features shown in dashed outlines may be considered optional. Summary of the Invention

[0049] The purpose of this disclosure is to eliminate or mitigate at least one disadvantage of the prior art. This disclosure discloses a display panel including at least one display portion and at least one signal exchange portion. The at least one display portion includes a display portion (sub)pixel arrangement. The display portion (sub)pixel arrangement includes a plurality of emitting regions, each emitting region corresponding to a (sub)pixel, and the lateral orientation of each emitting region is defined by the intersection of the lateral orientations of a plurality of active region layers. The at least one signal exchange portion includes a signal exchange portion (sub)pixel arrangement. The signal exchange portion (sub)pixel arrangement includes at least one transmissive region and a plurality of emitting regions, each emitting region corresponding to a (sub)pixel. The signal exchange portion (sub)pixel arrangement adapts to the at least one transmissive region by changing the lateral extent of at least a first active region layer in the active region layers corresponding to the at least one (sub)pixel, such that: at least one of the size, shape, configuration, and orientation of the lateral extent of the first active region layer is changed, and the first active region layer is positioned at the end of the intersection of the lateral extents of the remaining active region layers.

[0050] According to a broad aspect, a display panel is disclosed, comprising: at least one display portion including a display portion (sub)pixel arrangement including a plurality of emission regions, each emission region corresponding to a (sub)pixel, the lateral orientation of each emission region being defined by an intersection of the lateral orientations of a plurality of active region layers; and at least one signal exchange portion including a signal exchange portion (sub)pixel arrangement including at least one transmissive region and a plurality of emission regions, each emission region corresponding to a (sub)pixel, wherein the signal exchange portion (sub)pixel arrangement adapts to the at least one transmissive region by changing the lateral extent of at least a first active region layer in the active region layers corresponding to the at least one (sub)pixel, such that: at least one of the size, shape, configuration, and orientation of the lateral extent of the first active region layer in the active region layers is changed, and the first active region layer in the active region layers is positioned at the end of an intersection of the lateral extents of the remaining active region layers in the active region layers.

[0051] In some non-limiting examples, the size of the lateral extent of the first active region layer in these active region layers can be reduced.

[0052] In some non-limiting examples, the shape of the lateral extent of the first active region layer in these active region layers can be one of rectangle, circle, and triangle.

[0053] In some non-limiting examples, the orientation of the lateral extent of the first active region layer in these active region layers can be rotated by a non-zero angle.

[0054] In some non-limiting examples, the non-zero angle can be one of approximately 45°, 90°, and 180°.

[0055] In some non-limiting examples, the intersection of the lateral extents of the remaining active region layers in these active region layers may correspond to the intersection of the lateral extents of the plurality of active region layers in the display portion (sub)pixel arrangement.

[0056] In some non-limiting examples, the plurality of active region layers may include: a first electrode, a second electrode, and at least one semiconductive layer extending therebetween.

[0057] In some non-limiting examples, the first electrode may extend between the substrate and the second electrode of the display panel.

[0058] In some non-limiting examples, the first active region layer in these active region layers may be selected from either the first electrode or the second electrode.

[0059] In some non-limiting examples, the lateral extent of the first active region layer in the active region layer of the display portion may substantially bisect the intersection of the lateral extents of the remaining active region layers.

[0060] In some non-limiting examples, at least one of the plurality of active region layers can be formed by depositing the corresponding emission region material.

[0061] In some non-limiting examples, depositing material corresponding to the emission region may include employing at least one fine metal mask (FMM) having a plurality of holes, each hole corresponding to a lateral extent of the active region layer corresponding to a respective (sub)pixel.

[0062] In some non-limiting examples, the at least one FMM can be used to deposit corresponding emitter region material for the corresponding active region layer in the remaining active region layer in the active region layer of the signal switching section.

[0063] In some non-limiting examples, the arrangement of the signal exchange portion (sub)pixels may differ from that of the display portion (sub)pixels due to differences in at least one of the dimensions, shape, configuration, and orientation of the lateral extent of the first electrode between the signal exchange portion and the display portion.

[0064] In some non-limiting examples, by changing the opening of the pixel defining layer, at least one of the size, shape, configuration, and orientation of the lateral extent of the first electrode can be varied between the signal exchange portion and the display portion, the layer surface of the first electrode being exposed through the opening.

[0065] In some non-limiting examples, at least one of the dimensions, shape, configuration, and orientation of the lateral extent of at least one semiconductive layer may be substantially the same between the signal exchange portion and the display portion.

[0066] In some non-limiting examples, the size, shape, configuration, and orientation of the lateral extent of the at least one semiconductive layer are substantially the same between the signal exchange portion and the display portion. Detailed Implementation

[0067] Layered devices

[0068] This disclosure relates generally to a layered semiconductor device 100, and more specifically to an optoelectronic device 200. The optoelectronic device 200 can generally encompass any device 100 that converts electrical signals into EM radiation in the form of photons and performs the reverse conversion. Non-limiting examples of the optoelectronic device 200 include organic light-emitting diodes (OLEDs).

[0069] Those skilled in the art will understand that while this disclosure relates to optoelectronic device 200, its principles can be applied in some non-limiting examples to any panel having multiple layers, including but not limited to at least one layer of conductive deposited material 731, which is included as a thin film, and in some non-limiting examples, electromagnetic signals can partially and completely pass through (including but not limited to) one of the multiple layers at a non-zero angle relative to the plane of at least one of these layers.

[0070] Now go to Figure 1 This figure may show a cross-sectional view of an example layered semiconductor device 100. In some non-limiting examples, such as Figure 2 As shown in more detail below, device 100 may include multiple layers deposited on substrate 10.

[0071] A lateral axis, designated as the X-axis, may be shown along with a longitudinal axis, designated as the Z-axis. A second lateral axis, designated as the Y-axis, may be shown substantially transverse to both the X-axis and the Z-axis. At least one of the lateral axes may define a lateral orientation of device 100. The longitudinal axis may define a longitudinal orientation of device 100.

[0072] The layer of device 100 may extend in a lateral orientation substantially parallel to the plane defined by the lateral axis. Those skilled in the art will understand that, in some non-limiting examples, Figure 1The substantially flat representation shown may be an abstraction for purposes of illustration. In some non-limiting examples, there may be localized substantially flat layers of varying thickness and size across the lateral extent of device 100, including, in some non-limiting examples, the substantial complete absence of at least one layer separated by uneven transition regions (including lateral gaps and even discontinuities).

[0073] Thus, while for illustrative purposes the device 100 may be shown as a substantially layered structure of substantially parallel planar layers in its longitudinal orientation, such device 100 may be locally shown with different topography to define features, each of which may exhibit the layered profile in question substantially in the longitudinal orientation.

[0074] In some non-limiting examples, the lateral orientation of the exposed layer surface 11 of the device 100 may include a first portion 101 and a second portion 102. In some non-limiting examples, the second portion 102 may include a portion of the exposed layer surface 11 of the device 100 located outside the first portion 101.

[0075] like Figure 1 As shown, the layer of device 100 may include a substrate 10 and a patterned coating 110 disposed on at least a portion of the exposed layer surface 11 in its laterally oriented direction. In some non-limiting examples, the patterned coating 110 may be confined in a first portion 101 in its lateral range, and the deposited layer 130 may be disposed as a sealing coating 140 on the exposed layer surface 11 of device 100 in a second portion 102 in its laterally oriented direction.

[0076] In some non-limiting examples, at least one particulate structure 150 may be disposed as a discontinuous layer 160 on the exposed surface 11 of the patterned coating 110. In some non-limiting examples, although not shown, at least one of the patterned coating 110, the deposited layer 130, and at least one particulate structure 150 may be deposited on a layer other than the substrate 10 (below layer 910). Figure 9A The underlying layer 910 may include, but is not limited to, an intermediary layer between the substrate 10 and at least one of the patterned coating 110, the deposited layer 130, and at least one particulate structure 150. In some non-limiting examples, the underlying layer 910 may include at least one of an orientation layer and an organic support layer.

[0077] In some non-limiting examples, at least one of the patterned coating 110, the deposited layer 130, and at least one particulate structure 150 may be covered by at least one overlay 170.

[0078] In some non-limiting examples, such an overlay 170 may include at least one of an encapsulation layer and an optical coating. Non-limiting examples of an encapsulation layer include a glass cover, barrier film, barrier adhesive, barrier coating, encapsulation layer, and thin-film encapsulation (TFE) layer provided to encapsulate device 100. Non-limiting examples of an optical coating include at least one of optical and structural coatings and at least one component thereof, including but not limited to polarizers, color filters, anti-reflective coatings, anti-glare coatings, cover glass, and optically clear adhesives (OCAs).

[0079] In some non-limiting examples, at least one of the substantially thin patterned coating 110 in the first portion 101 and the deposited layer 130 in the second portion 102 may provide a substantially flat surface on which the overcoat 170 may be deposited. In some non-limiting examples, providing such a substantially flat surface for coating such an overcoat 170 may increase its adhesion to such surfaces.

[0080] In some non-limiting examples, the optical coating can be used to modulate the optical properties of EM radiation transmitted, emitted, and absorbed by the device 100, including but not limited to plasmon modes. In some non-limiting examples, the optical coating can be used as at least one of an optical filter, a refractive index matching coating, an optical external coupling coating, a scattering layer, a diffraction grating, and portions thereof.

[0081] In some non-limiting examples, the optical coating can be used to modulate at least one optical microcavity effect in device 100 by adjusting, but not limited to, at least one of the total optical path length and its refractive index. At least one optical property of device 100 can be affected by adjusting at least one optical microcavity effect (including, but not limited to, output EM radiation) (including, but not limited to, at least one of its intensity's angular dependence and its wavelength shift). In some non-limiting examples, the optical coating may be a non-electric component, i.e., the optical coating may not be configured to conduct and transmit at least one of current during normal device operation.

[0082] In some non-limiting examples, the optical coating may be formed of any deposited material 731, and in some non-limiting examples, any mechanism for depositing the deposited layer 130 as described herein may be employed.

[0083] optoelectronic devices

[0084] Figure 2 This is a simplified block diagram of the longitudinal orientation of an example optoelectronic device 200 according to the present disclosure. In some non-limiting examples, the example optoelectronic device may be an electroluminescent device 200. In some non-limiting examples, the device 200 may be an OLED.

[0085] Device 200 may include a substrate 10 on which a front panel 201 comprising multiple layers, the multiple layers being a first electrode 220, at least one semiconducting layer 230, and a second electrode 240. In some non-limiting examples, the front panel 201 may provide a mechanism for at least one of: emitting EM radiation (including but not limited to photons) and manipulating the emitted EM radiation.

[0086] In some non-limiting examples, various coatings on such devices 200 can be formed by vacuum-based deposition processes.

[0087] In some non-limiting examples, the second electrode 240 may extend partially over the patterned coating 110 in the transition region 245.

[0088] In some non-limiting examples, the deposition layer 130 may be composed of at least one granular structure 150 of a discontinuous layer 160 of a material (deposition material 731) thereof. d A patterned coating 110 that can act as a particle structure in the transition region 245 p The patterned coating 110 extends partially above it. In some non-limiting examples, such a discontinuous layer 160 may form at least a portion of the second electrode 240.

[0089] In some non-limiting examples, device 200 may be electrically coupled to a power source. When coupled in this way, device 200 may emit EM radiation (including, but not limited to, photons) as described herein.

[0090] substrate

[0091] In some non-limiting examples, substrate 10 may include a bottom substrate 215. In some non-limiting examples, the bottom substrate 215 may be formed of a material suitable for its use, including, but not limited to, at least one of: inorganic materials, including, but not limited to, at least one of: Si, glass, metals (including, but not limited to, metal foil), sapphire, and other inorganic materials; and organic materials, including, but not limited to, polymers, including, but not limited to, at least one of: polyimide and Si-based polymers. In some non-limiting examples, the bottom substrate 215 may be one of: rigid or flexible. In some non-limiting examples, substrate 10 may be defined by at least one flat surface. In some non-limiting examples, substrate 10 may have at least one exposed layer surface 11 of the remaining front panel 201 components of the support device 200, including, but not limited to, at least one of a first electrode 220, at least one semiconductive layer 230, and a second electrode 240.

[0092] In some non-limiting examples, such a surface may be at least one of an organic surface and an inorganic surface.

[0093] In some non-limiting examples, in addition to the bottom substrate 215, the substrate 10 may also include at least one of the following supported on the exposed layer surface 11 of the bottom substrate 215: at least one of organic and inorganic layers (not shown and not specifically described herein).

[0094] In some non-limiting examples, such an additional layer may include at least one organic layer, which may be at least one of the following: including, replacing and supplementing at least one of the semiconductive layers 230.

[0095] In some non-limiting examples, such an additional layer may include at least one inorganic layer, which may include at least one electrode, which in some non-limiting examples may be at least one of the following: including, replacing and supplementing at least one of the first electrode 220 and the second electrode 240.

[0096] Backplane and the TFT structure contained therein

[0097] In some non-limiting examples, such an additional layer may include a backplane 202. In some non-limiting examples, the backplane 202 may include at least one of the following: power supply circuitry and switching elements for driving the device 200, including but not limited to at least one of the following: at least one electronic thin-film transistor (TFT) structure 206 and at least one component thereof which may be formed by a photolithography process.

[0098] In some non-limiting examples, the backplane 202 of substrate 10 may include at least one electronic device, including but not limited to optoelectronic components, including but not limited to transistors, resistors, and capacitors, such as those components that can support device 200 as one of active matrix and passive matrix devices 200. In some non-limiting examples, such a structure may be a TFT structure 206.

[0099] Non-limiting examples of TFT structure 206 include one of the following: top gate, bottom gate, n-type, and p-type TFT structures 206. In some non-limiting examples, TFT structure 206 may incorporate one of the following: amorphous Si (a-Si), indium gallium zinc oxide (IGZO), and low-temperature polycrystalline Si (LTPS).

[0100] First electrode

[0101] The first electrode 220 may be deposited above the substrate 10. In some non-limiting examples, the first electrode 220 may be electrically coupled to at least one of a power supply terminal and ground. In some non-limiting examples, the first electrode 220 may be coupled by at least one driving circuit, which in some non-limiting examples may incorporate at least one TFT structure 206 in the backplane 202 of the substrate 10.

[0102] In some non-limiting examples, the first electrode 220 may include one of an anode and a cathode. In some non-limiting examples, the first electrode 220 may be an anode.

[0103] In some non-limiting examples, the first electrode 220 can be formed by depositing at least one thin conductive film over a portion of the substrate 10. In some non-limiting examples, a plurality of first electrodes 220 arranged spatially and laterally upward on the substrate 10 may be present. In some non-limiting examples, at least one of these at least one first electrode 220 may be deposited over a portion of the TFT insulating layer 207 arranged spatially and laterally. If so, in some non-limiting examples, at least one of such at least one first electrode 220 may extend through an opening in the corresponding TFT insulating layer 207 to be electrically coupled to the electrodes of the TFT structure 206 in the backplane 202.

[0104] In some non-limiting examples, at least one of the first electrode 220 and at least one of its thin films may comprise a variety of materials, including but not limited to at least one metallic material, including but not limited to at least one of magnesium (Mg), aluminum (Al), calcium (Ca), zinc (Zn), silver (Ag), cadmium (Cd), barium (Ba) and ytterbium (Yb), including but not limited to alloys comprising any of such materials, at least one metal oxide, including but not limited to TCO, including but not limited to ternary compositions, such as but not limited to at least one of FTO, IZO and ITO, in different proportions, including but not limited to combinations of any number of them in at least one layer, wherein any at least one layer may be, but is not limited to, a thin film.

[0105] Second electrode

[0106] The second electrode 240 may be deposited over at least one semiconductive layer 230. In some non-limiting examples, the second electrode 240 may be electrically coupled to at least one of a power supply terminal and ground. In some non-limiting examples, the second electrode 240 may be coupled by at least one driving circuit, which in some non-limiting examples may incorporate at least one TFT structure 206 in the backplane 202 of the substrate 10.

[0107] In some non-limiting examples, the second electrode 240 may include one of an anode and a cathode. In some non-limiting examples, the second electrode 240 may be a cathode.

[0108] In some non-limiting examples, the second electrode 240 can be formed by depositing a deposition layer 130 (as at least one thin film in some non-limiting examples) over at least one semiconductive layer 230 (a portion thereof). In some non-limiting examples, a plurality of second electrodes 240 may be present, arranged in a spatial manner laterally facing upward on at least one semiconductive layer 230.

[0109] In some non-limiting examples, at least one second electrode 240 may comprise a variety of materials, including but not limited to: at least one metallic material, including but not limited to at least one of Mg, Al, Ca, Zn, Ag, Cd, Ba, and Yb, including but not limited to alloys comprising at least one of any of such materials; at least one metal oxide, including but not limited to TCO, including but not limited to ternary compositions, such as but not limited to at least one of FTO, IZO, and ITO, including but not limited to zinc oxide (ZnO) in different proportions and other oxides comprising at least one of In and Zn in at least one layer; and at least one non-metallic material, wherein any at least one may be, but is not limited to, a thin conductive film. In some non-limiting examples, for Mg:Ag alloys, such alloy composition may be in the range of about 1:9 to 9:1 by volume.

[0110] In some non-limiting examples, the deposition of the second electrode 240 may be performed using either an open-mask or maskless deposition process.

[0111] In some non-limiting examples, the second electrode 240 may comprise multiple such coatings. In some non-limiting examples, such coatings may be different coatings disposed on top of each other.

[0112] In some non-limiting examples, the second electrode 240 may comprise a Yb / Ag bilayer coating. In some non-limiting examples, this bilayer coating may be formed by depositing a Yb coating followed by an Ag coating. In some non-limiting examples, the thickness of this Ag coating may exceed the thickness of the Yb coating.

[0113] In some non-limiting examples, the second electrode 240 may be a multi-coated electrode 240 comprising one of the following: a metal coating and an oxide coating.

[0114] In some non-limiting examples, the second electrode 240 may comprise fullerene and Mg.

[0115] In some non-limiting examples, such a coating can be formed by depositing a fullerene coating followed by a Mg coating. In some non-limiting examples, the fullerene can be dispersed within the Mg coating to form a fullerene-containing Mg alloy coating. Non-limiting examples of such coatings are described in at least one of the following: U.S. Patent Application Publication No. 2015 / 0287846, published October 8, 2015, and PCT International Application No. PCT / IB2017 / 054970, filed August 15, 2017, and published as WO2018 / 033860 on February 22, 2018.

[0116] Semiconducting layer

[0117] In some non-limiting examples, at least one semiconductive layer 230 may include multiple layers 231, 233, 235, 237, and 239. In some non-limiting examples, any one of these layers may be in the form of a thin film and arranged in a stacked configuration, which may include but is not limited to at least one of a hole injection layer (HIL) 231, a hole transport layer (HTL) 233, an emission layer (EML) 235, an electron transport layer (ETL) 237, and an electron injection layer (EIL) 239.

[0118] In some non-limiting examples, the at least one semiconductive layer 230 may form a "tandem" structure including a plurality of EMLs 235. In some non-limiting examples, such a tandem structure may further include at least one charge generation layer (CGL).

[0119] Those skilled in the relevant art will readily understand that the structure of the device 200 may be changed by one of omitting and combining at least one of the semiconductor layers 231 , 233 , 235 , 237 , 239 .

[0120] In some non-limiting examples, any of layers 231, 233, 235, 237, and 239 of at least one semiconducting layer 230 may include any number of sublayers. In some non-limiting examples, any of such layers 231, 233, 235, 237, and 239 (including, but not limited to, their sublayers) may contain mixtures and compositional gradients. In some non-limiting examples, although not shown, device 200 may include at least one layer comprising either an inorganic material or an organometallic material, and is not necessarily limited to a device 200 composed solely of organic materials. As a non-limiting example, device 200 may include at least one quantum dot (QD).

[0121] In some non-limiting examples, HIL 231 may be formed using a hole injection material that facilitates hole injection at the anode.

[0122] In some non-limiting examples, the HTL 233 may be formed using a hole transport material, which, in some non-limiting examples, may exhibit high hole mobility.

[0123] In some non-limiting examples, the ETL 237 may be formed using an electron transport material, which in some non-limiting examples may exhibit high electron mobility.

[0124] In some non-limiting examples, the EIL 239 can be formed using an electron injection material, which, in some non-limiting examples, can facilitate electron injection by the cathode.

[0125] In some non-limiting examples, as an example, at least one EML 235 can be formed by doping the host material with at least one emitter material. In some non-limiting examples, the emitter material can be at least one of a fluorescent emitter material, a phosphorescent emitter material, and a thermally activated delayed fluorescence (TADF) emitter material.

[0126] In some non-limiting examples, the emitter material may be one of an R (red) emitter material, a G (green) emitter material, and a B (blue) emitter material, that is, an emitter material that promotes the emission of R (red), G (green), and B (blue) EM radiation, respectively.

[0127] In some non-limiting examples, device 200 may be an OLED, wherein at least one semiconducting layer 230 may include at least one EML 235 interposed between conductive thin film electrodes 220, 240, whereby, when a potential difference is applied between them, holes may be injected into at least one semiconducting layer 230 via the anode and electrons may be injected into at least one semiconducting layer 230 via the cathode to migrate toward at least one EML 235 and combine to emit EM radiation in the form of photons.

[0128] In some non-limiting examples, device 200 may be an electroluminescent QD device 200, wherein at least one semiconducting layer 230 may include an active layer having at least one QD. When current is supplied to the first electrode 220 and the second electrode 240 by a power source, EM radiation (including, but not limited to, in the form of photons) may be emitted from the active layer comprising at least one semiconducting layer 230 between them.

[0129] In some non-limiting examples, including cases where device 200 includes an illumination panel, the entire lateral orientation of device 200 may correspond to a single emitting element. Thus, Figure 2The substantially planar cross-sectional profile shown may extend substantially along the entire lateral orientation of device 200, such that EM radiation is emitted from the device substantially along the entire lateral extent of device 200. In some non-limiting examples, such a single emitting element may be driven by a single drive circuit of device 200.

[0130] In some non-limiting examples, including where the device 200 includes a display module, the lateral orientation of the device 200 may be subdivided into a plurality of emission regions 210 of the device 200, wherein in each emission region 210, the longitudinal orientation of the device structure 200 is such that EM radiation is emitted from it when energized.

[0131] Those skilled in the art will readily understand that the structure of the device 200 can be altered by introducing at least one additional layer (not shown) at a suitable location within the stack of at least one semiconducting layer 230, the additional layer including, but not limited to, at least one of: a hole blocking layer (HBL) (not shown), an electron blocking layer (EBL) (not shown), a charge transport layer (CTL) (not shown), and a charge injection layer (CIL) (not shown).

[0132] In some non-limiting examples, the patterned coating 110 may be formed simultaneously with at least one semiconductive layer 230. In some non-limiting examples, at least one material used to form the patterned coating 110 may also be used to form at least one semiconductive layer 230. In some non-limiting examples, the ETL 237 of at least one semiconductive layer 230 may be a patterned coating 110 that may be deposited in a first portion 101 and a second portion 102 during the deposition of at least one semiconductive layer 230. EIL 239 may then be selectively deposited in the emission region 210 of the second portion 102 above the ETL 237, such that the exposed surface 11 of the ETL 237 in the first portion 101 may be substantially free of EIL 239. The exposed surface 11 of the EIL 239 in the emission region 210 and the exposed surface of the ETL 237 serving as the patterned coating 110 may then be exposed to the vapor flux 732 of the deposited material 731. Figure 7 ), to form a sealing coating 140 of deposited layer 130 on EIL 239 in second part 102, and to form deposited material 731 on EIL 237 in first part 101. Figure 7 The discontinuous layer 160. In such a non-limiting example, several stages for manufacturing the device 200 can be reduced.

[0133] Display panels and user equipment

[0134] Now go to Figure 3, which shows a cross-sectional view of an example layered optoelectronic device 200, such as a display panel 300. In some non-limiting examples, the display panel 300 may include a plurality of layers deposited on a substrate 10, culminating in an outermost layer forming a face 301 of the display panel. In some non-limiting examples, the display panel 300 may be a version of the device 200.

[0135] The surface 301 of the display panel 300 may extend substantially along a plane defined by a lateral axis across its lateral orientation.

[0136] In some non-limiting examples, surface 301, and indeed the entire display panel 300, may serve as the surface of user equipment 310, through which at least one EM signal 331 may be exchanged at a non-zero angle relative to the plane of surface 301. In some non-limiting examples, user equipment 310 may be a computing device 310 such as, but not limited to, smartphones, tablets, laptops, e-readers, and some other electronic devices 310 such as monitors, televisions, and smart devices 310, including but not limited to automotive displays, windshields, home appliances, and medical, commercial, and industrial devices 310.

[0137] In some non-limiting examples, face 301 may correspond to, and in some non-limiting examples, mate with, at least one of body 320 and an opening 321 therein within which at least one display lower member 330 may be received.

[0138] In some non-limiting examples, at least one display lower component 330 may be formed with the display panel 300 on its surface opposite to the surface 301, including but not limited to at least one of the following: integrally formed, and formed as an assembly module.

[0139] In some non-limiting examples, at least one hole 322 may be formed in the display panel 300 to allow at least one EM signal 331 to be exchanged through the surface 301 of the display panel 300 at a non-zero angle with the plane defined by the lateral axes (including but not limited to the accompanying layers) of the various layers of the display panel 300 (including but not limited to the surface 301 of the display panel 300).

[0140] In some non-limiting examples, at least one aperture 322 may be understood to include the absence or reduction of at least one of the thickness and capacity of a substantially opaque coating originally disposed across the display panel 300. In some non-limiting examples, at least one aperture 322 may be embodied as a (signal) transmission region 25x as described herein.

[0141] However, at least one aperture 322 is provided, through which at least one EM signal 331 can pass, such that it passes through surface 301. Therefore, at least one EM signal 331 can be considered to exclude any EM radiation that can extend along the plane defined by the lateral axis, including but not limited to any current that can be conducted laterally across at least one particle structure 150 through the display panel 300.

[0142] Furthermore, those skilled in the art will understand that at least one EM signal 331 can be distinguished from the EM radiation itself, including but not limited to the current and electric field generated therefrom, because at least one EM signal 331 can convey some information content, including but not limited to an identifier, by which at least one EM signal 331 can be distinguished from other EM signals 331, either alone or together with any of the other EM signals 331. In some non-limiting examples, this information content can be conveyed by specifying, changing, and / or modulating at least one of the wavelength, frequency, phase, timing, bandwidth, resistance, capacitance, impedance, conductance, and / or other characteristics of at least one EM signal 331.

[0143] In some non-limiting examples, at least one EM signal 331 passing through at least one aperture 322 of the display panel 300 may include at least one photon, and in some non-limiting examples, may have a wavelength spectrum that is non-limitingly located within at least one of the visible spectrum, the IR spectrum, and the NIR spectrum. In some non-limiting examples, at least one EM signal 331 passing through at least one aperture 322 of the display panel 300 may have a wavelength located within at least one of the IR and NIR spectra.

[0144] In some non-limiting examples, at least one EM signal 331 passing through at least one hole 322 of the display panel 300 may include ambient light incident thereon.

[0145] In some non-limiting examples, the at least one EM signal 331 exchanged through the at least one hole 322 of the display panel 300 may be at least one of: transmitted and received by the at least one display lower member 330 .

[0146] In some non-limiting examples, at least one display lower component 330 may have a size of at least a single signal transmission region 25x, but may be located not only under multiple of them, but also under at least one emission region 210 extending between them. Similarly, in some non-limiting examples, at least one display lower component 330 may have a size of at least a single hole in at least one aperture 322.

[0147] In some non-limiting examples, at least one under-display component 330 may include a receiver adapted to receive and process at least one received EM signal 331 passing through at least one aperture 322 from outside the user equipment 310. r Non-limiting examples of such receivers include under-display cameras (UDCs) and sensors, including but not limited to IR sensors / detectors, NIR sensors / detectors, LIDAR sensing modules, fingerprint sensing modules, optical sensing modules, IR (proximity) sensing modules, iris recognition sensing modules, and facial recognition sensing modules, including but not limited to portions thereof.

[0148] In some non-limiting examples, at least one under-display component 330 may include a transmitter adapted to transmit at least one transmit EM signal 331 through at least one aperture 322 from outside the user equipment 310. t Non-limiting examples of such transmitters include EM radiation sources, including but not limited to built-in flashlights, IR transmitters, NIR transmitters, LIDAR sensing modules, fingerprint sensing modules, optical sensing modules, IR (proximity sensing modules, iris recognition sensing modules, and facial recognition sensing modules, including but not limited to portions thereof).

[0149] In some non-limiting examples, at least one receives an EM signal 331. r It may include at least one transmitted EM signal 331 t At least one segment, wherein the at least one segment is one of the following: reflected by an outer surface and otherwise returned to user equipment 310 (including but not limited to user 30).

[0150] In some non-limiting examples, at least one EM signal 331 passing through at least one hole 322 of the display panel 300 outside the user equipment 310 (including, but not limited to, those transmitted EM signals 331 emitted by at least one under-display component 330 that may include a transmitter) t It can emit and receive EM signals 331 from the display panel 300. r Transmitted back to at least one display lower component 330, which may include a receiver, via at least one aperture 322 of the display panel 300.

[0151] In some non-limiting examples, the under-display component 330 may include an IR emitter and an IR sensor. In some non-limiting examples, such an under-display component 330 may include at least one of the following as a part, component, and module: a dot projector, a time-of-flight (ToF) sensor module (which may operate as a direct ToF and indirect ToF sensor), a vertical-cavity surface-emitting laser (VCSEL), a flood illuminator, an NIR imager, folded optics, and a diffraction grating.

[0152] In some non-limiting examples, a plurality of under-display components 330 may be present within user equipment 310, the first of which may include a transmitter for transmitting at least one transmit EM signal 331 passing through at least one aperture 322 from outside user equipment 310. t The second of these may include a receiver for receiving at least one received EM signal 331. r In some non-limiting examples, such a transmitter and receiver can be embodied in a single display component 330.

[0153] In some non-limiting examples, the display panel 300 may include at least one signal exchange portion 303 and at least one display portion 307. The at least one signal exchange portion 303 may include at least one transmissive area 25x( Figure 2 ) and at least one (light) emitting region 210.

[0154] In some non-limiting examples, at least one display portion 307 may include a plurality of emission regions 210, which, in some non-limiting examples, are arranged in a lateral pattern. In some non-limiting examples, the emission regions 210 in at least one display portion 307 may correspond to (sub)pixels 1215 / 260 of the display panel 300. Figure 12 ).

[0155] In some non-limiting examples, at least one signal exchange portion 303 may include at least one emitting region 210 and at least one signal transmission region 25x. In some non-limiting examples, at least one emitting region 210 in at least one signal exchange portion 303 may correspond to (sub)pixels 1215 / 260 of display panel 300, and in some non-limiting examples, may be arranged in a lateral pattern similar to (but not limited to) that in at least one display portion 307.

[0156] In some non-limiting examples, at least one display portion 307 may be adjacent to at least one signal exchange portion 303, and in some non-limiting examples, it may be separated by the at least one signal exchange portion.

[0157] In some non-limiting examples, at least one signal exchange portion 303 may be positioned near the end of the display panel 300, including but not limited to at least one of the edges and corners thereof. In some non-limiting examples, at least one signal exchange portion 303 may be positioned substantially centrally located in the lateral orientation of the display panel 300.

[0158] In some non-limiting examples, at least one display portion 307 may substantially surround at least one signal exchange portion 303, including but not limited to being combined with at least one other display portion 307.

[0159] In some non-limiting examples, at least one signal exchange portion 303 may be positioned near the end and configured such that at least one display portion 307 does not completely surround at least one signal exchange portion 303.

[0160] In some non-limiting examples, the pixel density of at least one emission region 210 of at least one signal exchange portion 303 may be substantially the same as the pixel density of at least one emission region 210 of at least one display portion 307 adjacent to at least one signal exchange portion 303, at least in the region substantially adjacent to the at least one signal exchange portion 303. In some non-limiting examples, the pixel density of the display panel 300 may be substantially uniform across the display panel. In at least some applications, there may be scenarios where at least one signal exchange portion 303 and at least one display portion 307 are required to have substantially the same pixel density, including but not limited to, such that the resolution of the display panel 300 is substantially the same across both at least one signal exchange portion 303 and at least one display portion 307 of the display panel.

[0161] Those skilled in the art will understand that a scenario exists where the layout of (sub)pixels 1215 / 260 in the signal exchange portion 303 of the display panel 300 is somewhat similar to the layout of these (sub)pixels in the display portion 307 of the display panel 300, including but not limited to the size, shape, (color) order, and configuration of the (sub)pixels 1215 / 260, and wherein the spacing (“spacing”) between adjacent (sub)pixels 1215 / 260 in the signal exchange portion 303 is one of the following: the same as the spacing of these (sub)pixels in the display portion 307, or an integer multiple thereof.

[0162] That said, the examples in this disclosure may be applicable in scenarios where the layout of (sub)pixels 1215 / 260 in the signal exchange section 303 may be substantially different from the layout of these (sub)pixels in the display section 307 of the display panel 300.

[0163] In some non-limiting examples, the display panel 300 may further include at least one transition region between at least one signal exchange portion 303 and at least one display portion 307, wherein the configuration of at least one of the emitting region 210 and the signal transmission region 25x therein is the configuration of at least one of the signal exchange portion 303 and at least one display portion 307. In some non-limiting examples, such a transition region may be omitted, such that the emitting region 210 may be provided with a substantially continuous repeating pattern across both the at least one signal exchange portion 303 and the at least one display portion 307.

[0164] In some non-limiting examples, at least one signal exchange portion 303 may have a polygonal profile, including but not limited to at least one of a substantially square configuration and a rectangular configuration.

[0165] In some non-limiting examples, at least one signal exchange portion 303 may have a curved profile, including but not limited to at least one of a substantially circular configuration, an oval configuration, and an elliptical configuration.

[0166] In some non-limiting examples, at least one signal transmission region 25x in the signal exchange section 303 may be configured to allow an EM signal having a wavelength (range) corresponding to the IR spectrum to pass through its entire cross-section.

[0167] In some non-limiting examples, at least one signal exchange section 303 may have a reduced number of backplane components, including but not limited to having virtually no backplane components, including but not limited to TFT structure 206, including but not limited to metal traces, capacitors and other EM radiation absorbing elements, including but not limited to opaque elements, the presence of which would otherwise interfere with the capture of EM radiation by at least one display under-display component 330, including but not limited to the capture of images by a camera.

[0168] In some non-limiting examples, user equipment 310 may house at least one transmitter for transmitting at least one transmit EM signal 331 through at least one first signal transmission region 25x. t The at least one first transmission region is located in the first signal exchange portion 303 outside the surface 301 and substantially corresponds to the first signal exchange portion in some non-limiting examples. In some non-limiting examples, the user equipment 310 may accommodate at least one receiver for receiving at least one received EM signal 331 from outside the surface 301 via at least one second signal transmission region 25x. r The at least one second transmission region is located in the second signal exchange section 303 and substantially corresponds to the second signal exchange section in some non-limiting examples. In some non-limiting examples, at least one receiving EM signal 331 rmay be associated with at least one transmitted EM signal 331 reflected from an external surface (including but not limited to user 30) t The same applies, including but not limited to, biometric authentication used for users.

[0169] In some non-limiting examples, at least one of a transmitter and at least one receiver may be arranged behind a corresponding at least one signal switching section 303, such that the IR signal may be at least one of the following: transmitted and received through at least one signal switching section 303 of the display panel 300, respectively. In some non-limiting examples, both the at least one transmitter and at least one receiver may be arranged behind a single signal switching section 303, and in some non-limiting examples, the single signal switching section may extend along at least one configuration axis such that the single signal switching section extends across both the at least one transmitter and the at least one receiver.

[0170] In some non-limiting examples, the display panel 300 may also include a non-display portion (not shown), which in some non-limiting examples may have substantially no emission area 210. In some non-limiting examples, the user equipment 310 may house a lower display component 330 disposed within the non-display portion, including but not limited to a camera.

[0171] In some non-limiting examples, the non-display portion may be arranged adjacent to a plurality of signal exchange portions 303 corresponding to a plurality of display components 330 (including, but not limited to, transmitters and receivers), and in some non-limiting examples, it may be arranged between the plurality of signal exchange portions.

[0172] In some non-limiting examples, the non-display portion may include a through-hole portion (not shown) that may be arranged to overlap with the camera. In some non-limiting examples, the display panel 300 may be substantially free of at least one of layers, coatings, and components that would otherwise be present in at least one of at least one signal exchange portion 303 and at least one display portion 307, including, but not limited to, components of at least one of the back panel 202 and the front panel 201, the presence of which could otherwise interfere with the camera's image capture. In some non-limiting examples, the overlay 170 of the display panel 300 (including, but not limited to, at least one of a polarizer and a cover glass and a glass cover) may substantially extend across at least one signal exchange portion 303, at least one display portion 307, and the non-display portion, such that it substantially extends across the display panel 300. In some non-limiting examples, the through-hole portion may be substantially free of a polarizer to enhance the transmission of EM radiation through it.

[0173] In some non-limiting examples, the non-display portion may include a non-through-hole portion, which in some non-limiting examples may be laterally arranged between the through-hole portion and the adjacent signal exchange portion 303. In some non-limiting examples, the non-through-hole portion may surround at least a portion of the periphery of the through-hole portion. In some non-limiting examples, the user equipment 310 may include, in a portion of the user equipment 310 corresponding to the non-through-hole portion of the display panel 300, at least one of the following: modules, components, and sensors.

[0174] In some non-limiting examples, the emitting region 210 in at least one signal exchange portion 303 may be electrically coupled to at least one TFT structure located in a non-via portion of the non-display portion. That is, in some non-limiting examples, the TFT structure 206 for actuating at least one sub-pixel 1215 / 260 in the signal exchange portion 303 may be repositioned outside the at least one signal exchange portion 303 and within the non-via portion of the display panel 300, such that substantially high transmission of EM radiation in at least one of the IR and NIR spectra may be directed through the non-emitting region 211 within the at least one signal exchange portion 303. In some non-limiting examples, the TFT structure 206 in the non-via portion may be electrically coupled to the sub-pixel 1215 / 260 in the at least one signal exchange portion 303 via conductive traces. In some non-limiting examples, at least one of the transmitter and receiver may be arranged to approach the non-via portion in a lateral orientation, such that the distance traveled by current between the TFT structure 206 and its associated sub-pixel 1215 / 260 may be reduced.

[0175] Launch area

[0176] In some non-limiting examples, including where the OLED device 200 may comprise a display module, the lateral orientation of the device 200 may be subdivided into a plurality of emitting regions 210 of the device 200, wherein within each of the emitting regions 210, the longitudinal orientation of the device 200 structure may be such that EM radiation is emitted therefrom when energized.

[0177] In some non-limiting examples, each emitting region 210 may have an associated pair of electrodes 220, 240 (one of which may act as an anode and the other as a cathode) and at least one semiconducting layer 230 between them. Such emitting regions 210 may emit EM radiation at a given wavelength spectrum and may correspond to one of pixel 1215 and its sub-pixels 260. In some non-limiting examples, multiple sub-pixels 260, each corresponding to EM radiation of different wavelengths (ranges) and emitting such EM radiation, may collectively form pixel 1215.

[0178] In some non-limiting examples, the wavelength spectrum may correspond to (but is not limited to) colors in the visible spectrum. Due to the different wavelengths (ranges) involved, the EM radiation of a first wavelength (range) emitted by the first sub-pixel 260 of pixel 1215 may be performed differently from the EM radiation of a second wavelength (range) emitted by the second sub-pixel 260 of the same pixel.

[0179] In some non-limiting examples, the active region 208 of each emission region 210 may be defined in the longitudinal direction by the first electrode 220 and the second electrode 240, and in the lateral direction by the presence of each of the first electrode 220, the second electrode 240 and at least one semiconducting layer 230 therebetween, i.e., the first electrode 220, the second electrode 240 and at least one semiconducting layer 230 therebetween laterally overlap.

[0180] Those skilled in the art will understand that the lateral orientation of the emission region 210, and therefore the lateral boundary of the active region 208, may not correspond to the entire lateral orientation of at least one of the first electrode 220, the second electrode 240, and at least one semiconductive layer 230 therebetween. Instead, in some non-limiting examples, since at least one semiconductive layer 230 may extend at least beyond the lateral orientation of at least one of the first electrode 220 and the second electrode 240, the lateral orientation of the emission region 210 may substantially not exceed the lateral extent of either the first electrode 220 or the second electrode 240. In some non-limiting examples, at least one of the following is true: some portions of the first electrode 220 may be covered by the PDL 209, and some portions of the second electrode 240 may not be disposed on at least one semiconductive layer 230, such that in at least one scenario, the emission region 210 can be laterally constrained.

[0181] In some non-limiting examples, at least one of the various emission region layers can be deposited by deposition of the corresponding material constituting the emission region layer.

[0182] In some non-limiting examples, some of the semiconducting layers in at least one semiconducting layer 230 can be arranged in a desired pattern via vapor deposition of the corresponding emitter region layer material using a fine metal mask (FMM) having holes corresponding to the desired locations where emitter region layer material is to be deposited. In some non-limiting examples, multiple emitter region layers can be arranged in a similar pattern, including, but not limited to, by depositing their respective emitter region layer materials in their respective deposition stages using an FMM.

[0183] In some non-limiting examples, as discussed herein, the emission region layer material corresponding to at least one of the first electrode 220 and the second electrode 240 (including, but not limited to, the second electrode 240) can be deposited by pre-depositing a patterned coating 110 by patterning the material using FMM vapor deposition, the fine metal mask having holes corresponding to the desired locations where the patterned coating 110 is to be deposited, and then depositing the emission region layer material using either an open mask or a maskless deposition process.

[0184] In some non-limiting examples, the patterned coating 110 may be adapted to influence the tendency of the vapor flux 732 of the deposited material 731 (from which the emission region layer material may be composed) to be deposited on the surface of the exposed layer, including but not limited to the initial adhesion probability of the deposited material 731, which does not exceed the initial adhesion probability of the deposited material 731 on the surface of the exposed layer 11 of at least one semiconductive layer 230.

[0185] In some non-limiting examples, the first electrode 220 may be disposed on the exposed layer surface 11 of the device 200, and in some non-limiting examples, disposed within at least a portion of the lateral orientation of the emission region 210. In some non-limiting examples, at least within the lateral orientation of the emission region 210 of the (sub)pixels 1215 / 260, the exposed layer surface 11 may include a TFT insulating layer 207 constituting various TFT structures 206 for driving circuitry corresponding to the emission region 210 of a single display (sub)pixel 1215 / 260 during the deposition of the first electrode 220.

[0186] In some non-limiting examples, the TFT insulating layer 207 may be formed with openings extending therethrough to allow the first electrode 220 to be electrically coupled to TFT electrodes including, but not limited to, the TFT drain electrode.

[0187] A person skilled in the relevant art will appreciate that the driving circuit may include multiple TFT structures 206. Figure 2 For the sake of simplicity, only one TFT structure 206 may be shown, but those skilled in the art will understand that such TFT structure 206 may represent at least one of the following: a plurality of such TFT structures constituting a driving circuit and at least one of its components.

[0188] In some non-limiting examples, the end of the first electrode 220 may be covered by at least one PDL 209, such that a portion of at least one PDL 209 may be inserted between the first electrode 220 and at least one semiconductive layer 230, such that such end of the first electrode 220 may be located outside the active region 208 of the associated emission region 210.

[0189] In some non-limiting examples, portions of the second electrode 240 may not be directly disposed on at least one semiconductive layer 230, thereby allowing the emission region 210 to be laterally constrained.

[0190] In some non-limiting examples, at least one semiconductive layer 230 (including, but not limited to, at least one of layers 231, 233, 235, 237, 239) may be deposited on the exposed layer surface 11 of the device 200, including at least a portion of the lateral orientation of such emission regions 210 of the (sub)pixels 1215 / 260. In some non-limiting examples, at least within the lateral orientation of the emission regions 210 of the (sub)pixels 1215 / 260, such exposed layer surface 11 may include a first electrode 220 when depositing such at least one semiconductive layer 230.

[0191] In some non-limiting examples, at least one semiconductive layer 230 may also extend beyond the lateral orientation of the emission region 210 of the (sub)pixel 1215 / 260 and at least partially within the lateral orientation of the surrounding non-emission region 211. In some non-limiting examples, such exposed layer surfaces 11 of such surrounding non-emission regions 211 may include PDL 209 when at least one semiconductive layer 230 is deposited.

[0192] In some non-limiting examples, the second electrode 240 may be disposed above the exposed layer surface 11 of the device 200, including at least a portion of the lateral orientation of the emission region 210 of the (sub)pixels 1215 / 260. In some non-limiting examples, at least within the lateral orientation of the emission region 210 of the (sub)pixels 1215 / 260, such exposed layer surface 11 may include at least one semiconductive layer 230 when the second electrode 220 is deposited.

[0193] In some non-limiting examples, the second electrode 240 may also extend beyond the lateral orientation of the emission region 210 of the (sub)pixels 1215 / 260 and at least partially within the lateral orientation of the surrounding non-emission region 211. In some non-limiting examples, the exposed layer surface 11 of such surrounding non-emission region 211 may include PDL 209 during the deposition of the second electrode 240.

[0194] In some non-limiting examples, the second electrode 240 may extend over most of the lateral orientation of the surrounding non-emission region 211, including but not limited to substantially all of it.

[0195] In some non-limiting examples, the respective emitting regions 210 of device 200 may be laterally patterned. In some non-limiting examples, the pattern may extend along a first lateral direction. In some non-limiting examples, the pattern may also extend along a second lateral direction, which in some non-limiting examples may extend at an angle relative to the first lateral direction. In some non-limiting examples, the second lateral direction may be substantially perpendicular to the first lateral direction. In some non-limiting examples, the pattern may have a plurality of elements arranged in such a pattern, each element being characterized by at least one of the following, including but not limited to: the wavelength of the EM radiation emitted by its emitting region 210, the shape of such emitting regions 210, their dimensions (along at least one of the first lateral direction and the second lateral direction), their orientation (relative to at least one of the first lateral direction and the second lateral direction), and their spacing from previous elements in the pattern (relative to at least one of the first lateral direction and the second lateral direction). In some non-limiting examples, the pattern may be repeated in at least one of the first lateral direction and the second lateral direction.

[0196] In some non-limiting examples, each individual emission region 210 of device 200 may be associated with and driven by a corresponding driving circuit within the backplane 202 of device 200, the corresponding driving circuit being used to drive the OLED structure for the associated emission region 210. In some non-limiting examples, including but not limited to, where the emission regions 210 may be arranged in a regular pattern extending in both a first (row) lateral direction and a second (column) lateral direction, signal lines corresponding to each row of emission regions 210 extending in the first lateral direction and signal lines corresponding to each column of emission regions 210 extending in the second lateral direction may exist in the backplane 202. In this non-limiting configuration, the signal on the row select line can activate the corresponding gate of the switch TFT structure 206 electrically coupled thereto, and the signal on the data line can activate the corresponding source of the switch TFT structure 206 electrically coupled thereto, such that the signal on the row select line / data line pair can be electrically coupled to and activate the anode of the OLED structure of the emission region 210 associated with such pair through the positive terminal of the power supply, thereby causing photons to be emitted from it, and its cathode is electrically coupled to the negative terminal of the power supply.

[0197] In some non-limiting examples, a single display pixel 1215 may include three sub-pixels 260, which in some non-limiting examples may correspond to a single sub-pixel 260 of each of three colors, including but not limited to at least one of the following: R (red) sub-pixel 260 R G (green) subpixel 260 G And B (blue) subpixel 260 BIn some non-limiting examples, a single display pixel 1215 may include four sub-pixels 260, each sub-pixel corresponding to a single sub-pixel 260 of each of the two colors (including, but not limited to, R (red) sub-pixel 260). R And B (blue) subpixel 260 B And the two sub-pixels 260 of the third color (including but not limited to G (green) sub-pixel 260) G In some non-limiting examples, a single display pixel 1215 may include four sub-pixels 260, which in some non-limiting examples may correspond to a single sub-pixel 260 of each of the three colors, including but not limited to at least one of the following: R (red) sub-pixel 260 R G (green) subpixel 260 G And B (blue) subpixel 260 B And the fourth W (white) sub-pixel 260 W .

[0198] In some non-limiting examples, the emission spectrum of the EM radiation emitted by a given (sub)pixel 1215 / 260 may correspond to a color that can represent (sub)pixel 1215 / 260. In some non-limiting examples, the wavelength of the EM radiation may not correspond to such a color, but further processing may be performed in a manner obvious to those skilled in the art to convert the wavelength to such a corresponding wavelength.

[0199] In some non-limiting examples, the emission spectrum of the EM radiation emitted by a given (sub)pixel 1215 / 260 (corresponding to a color that can represent (sub)pixel 1215 / 260) may be associated with at least one of the following: the structure and composition of at least one semiconductive layer 230 (including but not limited to at least one EML 235) extending between its first electrode 220 and second electrode 240. In some non-limiting examples, at least one EML 235 of at least one semiconductive layer 230 may be adjusted to promote the emission of EM radiation having an emission spectrum corresponding to a color that can represent (sub)pixel 1215 / 260. In some non-limiting examples, R (red) subpixel 260 R EML 235 may include R (red) EML material, including but not limited to a host material doped with R (red) emitter material. In some non-limiting examples, G (green) subpixel 260 G The EML 235 may include a G (green) EML material, including but not limited to a host material doped with a G (green) emitter material. In some non-limiting examples, the B (blue) subpixel 260 B EML 235 may include B (blue) EML material, including but not limited to a host material doped with B (blue) emitter material.

[0200] In some non-limiting examples, at least one of at least one semiconductive layer 230 (including but not limited to HIL 231, HTL 233, EML 235, ETL 237 and EIL 239) may be selected to have at least one characteristic in the longitudinal orientation (including but not limited to its presence, absence, thickness, composition and order) to facilitate the emission of EM radiation from it, the EM radiation having a wavelength spectrum corresponding to a color that can represent a given sub-pixel 260, the color including but not limited to at least one of R (red), G (green) and B (blue).

[0201] In some non-limiting examples, according to the additive color model, the emission of EM radiation having wavelength spectra corresponding to a variety of colors selected from R (red), G (green), and B (blue) can promote the emission of EM radiation having wavelength spectra corresponding to different colors, including but not limited to W (white) (red + green + blue), Y (yellow) (red + green), C (cyan) (green + blue), and M (magenta) (blue + red).

[0202] In some non-limiting examples, the exposed layer surface 11 of device 100 may be exposed to the vapor flux 732 of the deposited material 731, including but not limited to one of open mask and maskless deposition processes.

[0203] In some non-limiting examples, at least one semiconductive layer 230 may be deposited over the exposed layer surface 11 of the device 200 in at least a portion of the emission region 210, and in some non-limiting examples, the exposed layer surface includes a first electrode 220.

[0204] In some non-limiting examples, the exposed layer surface 11 of device 200 (which may include at least one semiconductive layer 230 in some non-limiting examples) may be exposed to the vapor flux 612 of patterned material 611, including but not limited to the use of a shadow mask 615 to form a patterned coating 110 in the first portion 101. Figure 6 Regardless of whether a shadow mask 615 is used, the patterned coating 110 can be substantially confined to the signal transmission area 25x in its lateral orientation.

[0205] In some non-limiting examples, the lateral orientation of at least one emission region 210 may extend across and include associated at least one TFT structure 206 for driving the emission region 210 along data and scan lines (not shown), which, in some non-limiting examples, may be formed of at least one of Cu and TCO.

[0206] In some non-limiting examples, (sub)pixels 1215 / 260 may be arranged side-by-side. In some non-limiting examples, the (color) order of the sub-pixels 260 of the first pixel 1215 may be the same as the (color) order of the sub-pixels 260 of the second pixel 1215. In some non-limiting examples, the (color) order of the sub-pixels 260 of the first pixel 1215 may be different from the (color) order of the sub-pixels 260 of the second pixel 1215.

[0207] In some non-limiting examples, the sub-pixels 260 of adjacent pixels 1215 may be aligned in at least one of row arrangement, column arrangement and array arrangement.

[0208] In some non-limiting examples, the first at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215 may include a sub-pixel 260 of the same and different colors.

[0209] In some non-limiting examples, a first at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215 may be aligned with at least one of a second at least one and a third at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215.

[0210] In some non-limiting examples, the first at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215 may be one of the following: offset or misaligned with at least one of the second at least one and the third at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215.

[0211] In some non-limiting examples, the sub-pixels 260 of the adjacent pixels 1215 of such first at least one sub-pixel, second at least one sub-pixel and third at least one sub-pixel in at least one row and column may be arranged such that the corresponding sub-pixels 260 of each of the first at least one sub-pixel, second at least one sub-pixel and third at least one sub-pixel in at least one row and column may have the same color.

[0212] In some non-limiting examples, the sub-pixels 260 of the adjacent pixels 1215 of such first at least one sub-pixel, second at least one sub-pixel and third at least one sub-pixel in at least one row and column may be arranged such that the corresponding sub-pixels 260 of each of the first at least one sub-pixel, second at least one sub-pixel and third at least one sub-pixel in at least one row and column may have different colors.

[0213] In some non-limiting examples, in at least one signal transmission region 25x of the display panel 300, at least one signal transmission region 25x may be disposed between a plurality of emission regions 210. In some non-limiting examples, at least one signal transmission region 25x may be disposed between adjacent (sub)pixels 1215 / 260. In some non-limiting examples, adjacent sub-pixels 260 surrounding at least one signal transmission region 25x may form part of the same pixel 1215. In some non-limiting examples, adjacent sub-pixels 260 surrounding at least one signal transmission region 25x may be associated with different pixels 1215.

[0214] In some non-limiting examples, regions of the closed coating 140 that may substantially lack a second electrode material (“cathode-free regions”), including but not limited to at least one signal transmission region 25x, may exhibit photoelectronic properties different from other regions (including but not limited to at least one emission region 210). In some non-limiting examples, such cathode-free regions may, however, include some second electrode material, including but not limited to the form of at least one particulate structure 150 and a discontinuous layer 160 of at least one instance of such particulate structure 150.

[0215] In some non-limiting examples, this can be achieved by laser ablation of the second electrode material. However, in some non-limiting examples, laser ablation can produce a cloud of debris that can affect the vapor deposition process.

[0216] In some non-limiting examples, this can be achieved by using an FMM to set a patterned coating 110 (which in some non-limiting examples may be a nucleation inhibition coating (NIC)) in a certain pattern on the exposed surface 11 of at least one semiconductive layer 230, and then depositing a deposition material 731 for forming the second electrode 240 on the exposed surface.

[0217] In some non-limiting examples, the patterned coating 110 may be adapted to influence the tendency of the vapor flux 732 of the deposited material 731 to be deposited on the surface of the exposed layer, including but not limited to the initial adhesion probability of the deposited material 731, which does not exceed the initial adhesion probability of the deposited material 731 on the surface of the exposed layer 11 of at least one semiconductive layer 230.

[0218] In some non-limiting examples, the patterned coating 110 may be deposited corresponding to a pattern of the first portion 101 of at least some of the signal transmission regions 25x that is laterally oriented (including but not limited to).

[0219] In some non-limiting examples, the patterned coating 110 may be deposited in multiple stages, each stage using different FMMs that define different patterns within the first part 101, the multiple stages respectively corresponding to different subsets of the signal transmission region 25x.

[0220] In some non-limiting examples, after depositing the patterned coating 110 (all stages), the display panel 300 may be subjected to a vapor flux 732 of the deposited material 731 in one of an aperture mask and a maskless deposition process to form a second electrode 240 for each of the emission regions 210 corresponding to the (sub)pixels 1215 / 260 in at least the second portion 102 of the lateral orientation but not in the first portion 101 of the lateral orientation.

[0221] In some non-limiting examples, although not shown, the overlay 170 may be disposed on at least one of the second electrode 240 and the patterned coating 110. In some non-limiting examples, although not shown, the overlay 170 may be deposited at least partially across the lateral extent of the optoelectronic device 200, in some non-limiting examples covering the second electrode 240 in the second portion 102, and in some non-limiting examples at least partially covering at least one particulate structure 150 and forming an interface with the patterned coating 110 at its exposed layer surface 11 in the first portion 101.

[0222] FMM

[0223] In this disclosure, each of the various active region layers of device 100, including but not limited to at least one of at least one of the at least one semiconducting layer 230 therebetween, can be formed by depositing a corresponding constituent active region layer material in a desired pattern during a fabrication process. In some non-limiting examples, such deposition can occur in combination with a shadow mask during the deposition process, and in some non-limiting examples, the shadow mask can be an FMM having apertures to achieve such a desired pattern by masking and / or preventing the deposition of active region layer material on certain portions of the surface of the underlying material exposed thereto.

[0224] In this disclosure, references to (sub)pixels 1215 / 260 in the (sub)pixel arrangement, or as illustrated in the accompanying drawings, generally refer to the laterally overlapping regions of the corresponding deposited first electrode 220, second electrode 240, and at least one semiconductive layer 230 therebetween in a planar view. Those skilled in the art will understand that in some non-limiting examples, at least one (but not all) of the first electrode 220, second electrode 240, and at least one semiconductive layer 230 therebetween may extend laterally beyond such regions.

[0225] In some non-limiting examples, the arrangement of at least one emission region 210 of at least one signal switching portion 303 may be substantially the same as the arrangement of at least one emission region 210 of at least one display portion 307 adjacent to at least one of the at least one signal switching portion, at least in the region adjacent to and substantially close to at least one of the at least one signal switching portion 303. In some non-limiting examples, the (sub)pixel layout in at least one signal switching portion 303 may be substantially the same as the (sub)pixel layout of at least one display portion 307.

[0226] In this disclosure, the term "transmissive area" refers to a region of the display panel 300, including but not limited to at least one transmissive area 25x, which may be configured to allow a larger portion of the EM radiation incident on the display panel 300 to be transmitted through it, compared to another region of the display panel 300 that is not a transmissive area 25x.

[0227] In some non-limiting examples, at least one transmission region 25x may be formed of and / or from a transparent conductive material, such as at least one transparent conductive oxide (TCO), including but not limited to ITO, IZO and / or IGZO.

[0228] In some non-limiting examples, including but not limited to, in the case where the display panel 300 includes an OLED display device, at least one emitting region 210 may emit EM radiation, including but not limited to, in the form of at least one photon. In some non-limiting examples, a given emitting region 210 may correspond to at least one of pixel 1215 and sub-pixels 260 of such pixel 1215. In some non-limiting examples, pixel 1215 may include a plurality of sub-pixels 260, each sub-pixel being configured to emit EM radiation, including but not limited to, in the form of photons, having a given wavelength range, and these plurality of (sub)pixels in some non-limiting examples correspond to corresponding colors, including but not limited to R (red), G (green), and B (blue).

[0229] In some non-limiting examples, at least one of the size and shape (“geometry”) of the (sub)pixels 1215 / 260 of a given color may be substantially the same or different across multiple pixels 1215.

[0230] In some non-limiting examples, at least one of the dimensions and geometry of the (sub)pixels 1215 / 260 of the first color may be substantially the same as or different from the dimensions and geometry of the (sub)pixels 1215 / 260 of the second and third colors.

[0231] In some non-limiting examples, the relative geometry of at least one of the (sub)pixels 1215 / 260 of the first color, the second color, and the third color, and at least one of the wavelength range emitted by these (sub)pixels, may be selected taking into account how to visually process various wavelengths and the presence of engineering constraints (including but not limited to power consumption, device reliability, and / or device lifetime).

[0232] Those skilled in the art will understand that the specific arrangement of (sub)pixels 1215 / 260 can vary depending on the design of the display panel 300. In some non-limiting examples, subpixels 1215 / 260 can be arranged according to known arrangement schemes, including but not limited to RGB side-by-side, diamond, and / or

[0233] In some non-limiting examples, (sub)pixels 1215 / 260 may be arranged side-by-side. In some non-limiting examples, the (color) order of the sub-pixels 260 of the first pixel 1215 may be the same as the (color) order of the sub-pixels 260 of the second pixel 1215. In some non-limiting examples, the (color) order of the sub-pixels 260 of the first pixel 1215 may be different from the (color) order of the sub-pixels 260 of the second pixel 1215.

[0234] In some non-limiting examples, the sub-pixels 260 of adjacent pixels 1215 may be aligned in at least one of row arrangement, column arrangement and array arrangement.

[0235] In some non-limiting examples, the first at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215 may include a sub-pixel 260 of the same or different color.

[0236] In some non-limiting examples, a first at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215 may be aligned with at least one of a second at least one and a third at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel.

[0237] In some non-limiting examples, at least one first sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215 may be offset or misaligned with at least one of the second and third at least one sub-pixel in the row and column of the aligned sub-pixel 260 of the adjacent pixel 1215.

[0238] In some non-limiting examples, the sub-pixels 260 of the adjacent pixels 1215 of such first at least one sub-pixel, second at least one sub-pixel and / or third at least one sub-pixel in the row and column can be arranged such that the corresponding sub-pixels 260 of each of the first at least one sub-pixel, second at least one sub-pixel and / or third at least one sub-pixel in the row and column can have a common color.

[0239] In some non-limiting examples, the sub-pixels 260 of the adjacent pixels 1215 of such first at least one sub-pixel, second at least one sub-pixel and / or third at least one sub-pixel in the row and column can be arranged such that the corresponding sub-pixels 260 of each of the first at least one sub-pixel, second at least one sub-pixel and / or third at least one sub-pixel in the row and column can have different colors.

[0240] In some non-limiting examples, in at least one signal exchange section 303, at least one transmission region 25x may be disposed between multiple emission regions 210. In some non-limiting examples, at least one transmission region 25x may be disposed between adjacent (sub)pixels 1215 / 260. In some non-limiting examples, adjacent sub-pixels 260 surrounding at least one transmission region 25x may form part of a common pixel 1215. In some non-limiting examples, adjacent sub-pixels 260 surrounding at least one transmission region 25x may be associated with different pixels 1215.

[0241] Refer again Figure 3 The surface 301 of the display panel 300 may extend substantially along a plane defined by a lateral axis across its lateral orientation. In some non-limiting examples, the surface 301, and indeed the display panel 300 itself, may serve as the surface of the user device 310, through which at least one EM signal 331 may be exchanged at an angle relative to the plane of the surface 301. In some non-limiting examples, the user device 310 may be a computing device such as, but not limited to, a smartphone, tablet, laptop, and / or e-reader, and / or some other electronic device such as a monitor, television, and / or smart device, including but not limited to automotive displays and / or windshields, home appliances, and / or medical, commercial, and / or industrial devices.

[0242] In some non-limiting examples, surface 301 may correspond to and / or match opening 321 in body 320 and / or therein, in which at least one display lower component 330 may be accommodated.

[0243] In some non-limiting examples, at least one lower display component 330 may be integrally formed with the display panel 300 on its surface opposite to the surface 301, or formed as an assembly module. In some non-limiting examples, at least one lower display component 330 may be formed on the surface of the substrate 10 of the display panel 300 opposite to the surface 301.

[0244] In some non-limiting examples, at least one hole may be formed in the display panel 300 to allow at least one EM signal 331 to be exchanged through the surface 301 of the display panel 300 at an angle to the plane defined by the lateral axes of the layers of the display panel 300 (including but not limited to the surface 301 of the display panel 300) or accompanying layers. In some non-limiting examples, at least one EM signal 331 may be exchanged between at least one under-display component 330 and an external object 30 (including but not limited to the user of the user device 310).

[0245] In some non-limiting examples, at least one aperture may correspond to at least one transmission region 25x of at least one signal exchange portion 303. In some non-limiting examples, a given signal exchange portion 303 may include a plurality of at least one aperture.

[0246] In some non-limiting examples, at least one hole can be understood as including the absence of a substantially opaque coating that was originally set across the display panel 300, and / or a reduction in thickness and / or opacity.

[0247] In other words, at least one EM signal 331 can pass through the at least one aperture, such that it passes through surface 301. Therefore, at least one EM signal 331 can be considered to exclude any EM radiation that can extend along the plane defined by the lateral axis, including but not limited to any current that can be conducted laterally across the display panel 300 across the deposition layer 130.

[0248] Furthermore, those skilled in the art will understand that at least one EM signal 331 can be distinguished from the EM radiation itself, including but not limited to the current and / or electric field generated therefrom, because at least one EM signal 331 can convey some information content, including but not limited to an identifier, by which at least one EM signal 331 can be distinguished from other EM signals 331, either alone or together with other EM signals 331. In some non-limiting examples, this information content can be conveyed by specifying, changing, and / or adjusting at least one of the wavelength, frequency, phase, timing, bandwidth, and / or other characteristics of at least one EM signal 331.

[0249] In some non-limiting examples, at least one EM signal 331 passing through at least one hole of the display panel 300 may include at least one photon, and in some non-limiting examples, may have a wavelength spectrum that is non-limitingly located within at least one of the visible spectrum, IR spectrum and NIR spectrum.

[0250] In some non-limiting examples, at least one EM signal 331 passing through at least one hole in the display panel 300 may include ambient light incident thereon.

[0251] In some non-limiting examples, at least one EM signal 331 exchanged through at least one hole of the display panel 300 may be transmitted and / or received by at least one display under component 330.

[0252] In some non-limiting examples, at least one display lower component 330 may have a size larger than a single light-transmitting region 25x, but may be located not only below the plurality of light-transmitting regions 25x, but also below at least one emitting region 210 extending therebetween. Similarly, in some non-limiting examples, at least one display lower component 330 may have a size larger than a single aperture in at least one hole.

[0253] In some non-limiting examples, at least one under-display component 330 may include a receiver adapted to receive and process at least one EM signal 331 passing through at least one aperture from outside the user equipment 310. Non-limiting examples of such a receiver include under-display cameras (UDCs) and / or sensors, including but not limited to IR sensors, NIR sensors, LIDAR sensing modules, fingerprint sensing modules, optical sensing modules, IR (proximity) sensing modules, iris recognition sensing modules, and / or facial recognition sensing modules.

[0254] In some non-limiting examples, at least one under-display component 330 may include a transmitter adapted to transmit at least one EM signal 331 passing through at least one aperture from outside the user equipment 310. Non-limiting examples of such transmitters include EM radiation sources, including but not limited to built-in flash, IR transmitter and / or NIR transmitter and / or LIDAR sensing module, fingerprint sensing module, optical sensing module, IR (proximity) sensing module, iris recognition sensing module and / or facial recognition sensing module.

[0255] In some non-limiting examples, at least one EM signal 331 (including, but not limited to, EM signals emitted by at least one display under-display component 330 including a transmitter) passing through at least one hole of the display panel 300 outside the user device 310 may be emitted from the display panel 300 and transmitted back to at least one display under-display component 330 including a receiver through at least one hole of the display panel 300.

[0256] In some non-limiting examples, multiple under-display components 330 may be present within the user device 310, wherein a first component includes a transmitter for transmitting at least one EM signal 331 through at least one aperture outside the user device 310, and a second component includes a receiver for receiving at least one EM signal 331. In some non-limiting examples, such a transmitter and receiver may be embodied in a single common component within at least one under-display component 330.

[0257] In some non-limiting examples, at least one display under-display component 330 may not emit EM signal 331, and the display panel 300 may include optoelectronic devices, including but not limited to light-emitting devices, including but not limited to OLED devices that emit at least one EM signal 331.

[0258] In some non-limiting examples, object 30 may present a surface for reflecting at least one EM signal 331. In some non-limiting examples, at least one EM signal 331 may be light reflected off the surface of object 30, which, as a non-limiting example, may be ambient light.

[0259] Pixel arrangement with transmissive regions that maintain pixel density

[0260] Now go to Figure 4A As a non-limiting example, a plan view is shown of an example (sub)pixel arrangement 400a for the application of a signal exchange portion 303 across a display panel 300.

[0261] In some non-limiting examples, the pixel density of the signal exchange portion 303 of the display panel 300 may be substantially the same as the pixel density of the display portion 307 of the display panel 300.

[0262] In some non-limiting examples, at least one of the size, shape, and configuration of the (sub)pixels 1215 / 260 in the signal exchange portion 303 of the display panel 300 may differ from the size, shape, and configuration of the display portion 307 of the display panel 300 (including, but not limited to, size reduction) in order to provide space in the signal exchange portion 303 for accommodating the addition of the transmission region 25x, including, but not limited to, maximizing the aperture ratio of the transmission region 25x.

[0263] Those skilled in the art will readily understand that changing at least one of the size, shape, and orientation of the emission region 210 of the (sub)pixels 1215 / 260 between the signal exchange section 303 and the display section 307 of the display panel 300 can change the aperture ratio between these (sub)pixels in some non-limiting examples, although the pixel density between these (sub)pixels may remain unchanged.

[0264] In some non-limiting examples, the aperture ratio of all emission areas 210 of the (sub)pixels 1215 / 260 in the signal exchange section 303 of the display panel 300 may be no more than one of about 20%, 15% and 10%.

[0265] In some non-limiting examples, the aperture ratio of the transmissive region 25x in the signal exchange portion 303 of the display panel 300 may be no more than one of about 50%, 45%, 40%, 35%, 33%, 30%, and 25%, and this aperture ratio may be the sum of the aperture ratios of all transmissive regions 25x present in such a portion. In some non-limiting examples, the aperture ratio of the transmissive region 25x may be at least one of about 5%, 10%, and 15%.

[0266] In some non-limiting examples, the aperture ratio of all emitting regions 210 of the (sub)pixels 1215 / 260 in the signal exchange section 303 of the display panel 300 (which may be the sum of the aperture ratios of all (sub)pixels 1215 / 260 (including but not limited to the first sub-pixel 2601, the second sub-pixel 2602 and the third sub-pixel 2603) present in such section may be between about 5% and 10%, and the aperture ratio of the transmissive region 25x therein may be between about 30% and 50%.

[0267] In some non-limiting examples, the aperture ratio of all emitting regions 210 of the (sub)pixels 1215 / 260 in the signal exchange section 303 of the display panel 300 (which may be the sum of the aperture ratios of all (sub)pixels 1215 / 260 (including but not limited to the first sub-pixel 2601, the second sub-pixel 2602 and the third sub-pixel 2603) present in such section may be between about 6% and 9%, and the aperture ratio of the transmissive region 25x therein may be between about 35% and 45%.

[0268] In some non-limiting examples, the total combined aperture ratio of all emitting areas 210 and transmissive areas 25x of the (sub)pixels 1215 / 260 in the signal exchange portion 303 of the display panel 300 may be no more than one of about 60%, 55%, 50%, 45%, and 40%. In some non-limiting examples, the total combined aperture ratio of all emitting areas 210 and transmissive areas 25x of the (sub)pixels 1215 / 260 in the signal exchange portion 303 of the display panel 300 may be one of about 30%-60%, 35%-60%, 40%-60%, 35%-55%, 40%-50%, 45%-55%, and 45%-50%.

[0269] In some non-limiting examples, the size of at least one transmission region 25x may be at least about 10 μm. In some non-limiting examples, the size of at least one transmission region 25x may be one of about 10 μm-150 μm, 10 μm-130 μm, 15 μm-100 μm, 20 μm-80 μm, 20 μm-65 μm, 25 μm-60 μm, and 30 μm-50 μm.

[0270] In some non-limiting examples, the apparent or visual perception difference between the signal exchange section 303 and the display section 307 as a result of this change in aperture ratio can be reduced by at least one measure, including but not limited to:

[0271] ● Maintain a relative ratio between at least one of the aperture ratio, size, and shape of the emission region 210 of (sub)pixels 1215 / 260 between the signal exchange section 303 and the display section 307 of the display panel 300;

[0272] ● Modify at least one characteristic of at least one of the (sub)pixels 1215 / 260 in at least one of the signal exchange section 303 and display section 307 of the display panel 300, such at least one characteristic including but not limited to: the intensity of emitted radiation and the current density; and

[0273] ● At least one of the signal exchange portion 303 and the display portion 307 around the display panel 300 and / or at least one transition region is established between the signal exchange portion and the display portion, each transition region having at least one of the following: intermediate aperture ratio, size, shape, orientation and pitch, so as to disperse the apparent or visually perceived difference between the signal exchange portion and the display portion by the increased lateral orientation across the display panel 300.

[0274] Pixels with four sub-pixels in a 1:2:1 ratio

[0275] In some non-limiting examples, the (sub)pixel arrangement 400a may include a single transmission region 25x (including but not limited to 250). Figure 4A The image contains multiple emission regions 210, which in some non-limiting examples may correspond to four sub-pixels 260 of pixel 1215. In some non-limiting examples, the transmissive region 25x may be located within and surrounded by the emission regions 210 corresponding to the four sub-pixels 260.

[0276] In some non-limiting examples, the (sub)pixel arrangement 400a may be defined by a first configuration axis 440 and a second configuration axis 445, both of which may be located in the lateral plane of the display panel 300 and intersect at an intersection point. In some non-limiting examples, the first configuration axis 440 may be substantially orthogonal to the second configuration axis 445.

[0277] In some non-limiting examples, the transmission region 25x may be centered in a plan view around the intersection of the first configuration axis 440 and the second configuration axis 445.

[0278] In some non-limiting examples, the lateral extent of the transmission region 25x may be defined by a closed transmission boundary or perimeter 415 of the transmission region. In some non-limiting examples, the transmission boundary 415 may be symmetrical about at least one of the first configuration axis 440 and the second configuration axis 445. In some non-limiting examples, as shown, the transmission boundary 415 may be symmetrical about both the first configuration axis 440 and the second configuration axis 445.

[0279] In some non-limiting examples, the transmission region 250 may have a substantially quadrilateral transmission boundary 415 comprising and defined by a plurality of linear transmission boundary segments 411-414. In some non-limiting examples, at least one of the transmission boundary segments 411, 413 may be substantially parallel to the first configuration axis 440. In some non-limiting examples, both of such transmission boundary segments 411, 413 may be substantially parallel to the first configuration axis 440. In some non-limiting examples, at least one of the transmission boundary segments 412, 414 may be substantially parallel to the second configuration axis 445. In some non-limiting examples, both of such transmission boundary segments 412, 414 may be substantially parallel to the second configuration axis 445.

[0280] In some non-limiting examples, none of the transmission boundary segments 411-414 may be parallel to each other.

[0281] In some non-restrictive examples, such as Figure 4A As shown, each of the transmission boundary segments 411-414 may have substantially equal lengths.

[0282] In some non-limiting examples, none of the transmission boundary segments 411-414 may have substantially equal lengths.

[0283] Now go to Figure 4BAs a non-limiting example, a plan view is provided to illustrate an example (sub)pixel arrangement 400b that can be used across the signal exchange section 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400b differs from the (sub)pixel arrangement 400a in that the transmissive area 25x (and the (sub)pixels 1215 / 260) exhibit substantially rounded corners.

[0284] As discussed herein, and without being bound by any particular theory, it may be assumed that when the closed boundary of the transmission region 25x includes at least one non-linear segment and / or curved segment, the EM signal incident upon it and transmitted through it may exhibit a less distinctive and / or more uniform diffraction pattern that helps to mitigate interference caused by the diffraction pattern.

[0285] In some non-limiting examples, a plurality of transmission boundary segments 411-414 may be coupled by at least one substantially curved transmission boundary segment 416-419 and may extend between the at least one substantially curved transmission boundary segment. Thus, in some non-limiting examples, the respective endpoints of the linear transmission boundary segments 411-414 may be coupled to the endpoints of the curved transmission boundary segments 416-419.

[0286] In some non-limiting examples, at least one of the curved transmission boundary segments 416-419 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may be associated with constraints during the manufacturing process, may be one of about 8 μm and 10 μm.

[0287] In the (sub)pixel arrangement 400a, in some non-limiting examples, four subpixels 260 may correspond to a first subpixel 2601, a pair of second subpixels 2602, and a third subpixel 2603. In some non-limiting examples, the first subpixel 2601 may correspond to the R (red) color, the second subpixel 2602 may correspond to the G (green) color, and the third subpixel 2603 may correspond to the B (blue) color.

[0288] In some non-limiting examples, the pair of second sub-pixels 2602 may be positioned symmetrical about at least one of the first configuration axis 440 and the second configuration axis 445 (in some non-limiting examples, the first configuration axis 440), and the transmission region 25x is positioned between the pair of second sub-pixels. In some non-limiting examples, the first sub-pixel 2601 and the third sub-pixel 2603 may be positioned symmetrical about at least one of the first configuration axis 440 and the second configuration axis 445 (in some non-limiting examples, the second configuration axis 445), and the transmission region 25x is positioned between the first sub-pixel and the third sub-pixel.

[0289] In some non-limiting examples, at least one of the emission regions 210 may have a substantially quadrilateral boundary or profile comprising and defined by a plurality of line segments.

[0290] In some non-limiting examples, the transmissive region 25x may be positioned between a pair of second sub-pixels 2602 corresponding to a common pixel 1215. In some non-limiting examples, the transmissive region 25x may be positioned between a second sub-pixel 2602 corresponding to a first pixel 1215 and another second sub-pixel 2602 corresponding to a second pixel 1215. In some non-limiting examples, the spacing between such a transmissive region 25x and the first and second sub-pixels 2602 may be substantially the same as the spacing between such a transmissive region 25x and the second sub-pixel 2602.

[0291] In some non-limiting examples, the transmissive region 25x may be positioned between a first sub-pixel 2601 and a third sub-pixel 2603 corresponding to a common pixel 1215. In some non-limiting examples, the transmissive region 25x may be positioned between the first sub-pixel 2601 corresponding to the first pixel 1215 and the third sub-pixel 2603 corresponding to the second pixel 1215. In some non-limiting examples, the spacing between such a transmissive region 25x and the first sub-pixel 2601 may be substantially the same as the spacing between such a transmissive region 25x and the third sub-pixel 2603.

[0292] In some non-limiting examples, a given transmission region 25x may be located both between the first sub-pixel 2601 and the third sub-pixel 2603 and between the two second sub-pixels 2602.

[0293] In some non-limiting examples, the lateral extent of the first sub-pixel 2601 may be defined by a closed first sub-pixel boundary 455. As shown, in some non-limiting examples, the first sub-pixel boundary 455 may include a plurality of substantially linear first sub-pixel segments 451-454. In some non-limiting examples, at least one of the first sub-pixel segments 452, 454 may be substantially parallel to, close to, and in some non-limiting examples adjacent to at least one of the corresponding at least one of the transmission boundary segments 412, 414 of the transmission region 25x.

[0294] In some non-limiting examples, as shown in the figure, with respect to the first sub-pixel 2601, the first sub-pixel segment 454 may be close to and / or adjacent to the corresponding transmission boundary segment 412 in some non-limiting examples.

[0295] In some non-limiting examples, at least one first sub-pixel segment 454 and a corresponding at least one transmission boundary segment 412 adjacent to the at least one first sub-pixel segment may be separated by a minimum distance. In some non-limiting examples, such a minimum distance, which may be associated with constraints during the manufacturing process, may be one of approximately 5 μm, 6 μm, 8 μm, 10 μm, 11 μm, and 12 μm. In some non-limiting examples, such a minimum distance may be one of approximately 5 μm-15 μm, 6 μm-12 μm, and 8 μm-10 μm.

[0296] In some non-restrictive examples, such as in Figure 4B As shown, a plurality of linear first subpixel segments 451-454 may be coupled by at least one substantially curved first subpixel segment 456-459 and may extend between the at least one substantially curved first subpixel segment. Thus, in some non-limiting examples, the respective endpoints of the linear first subpixel segments 451-454 may be coupled to the endpoints of the curved first subpixel segments 456-459.

[0297] In some non-limiting examples, at least one of the curved first sub-pixel segments 456-459 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may be associated with constraints during the manufacturing process, may be one of approximately 8 μm and 10 μm.

[0298] In some non-limiting examples, the lateral extent of one of the second sub-pixels in the second sub-pixel 2602 may be defined by a closed second sub-pixel boundary 465 of that second sub-pixel. As shown, in some non-limiting examples, the second sub-pixel boundary 465 may include a plurality of substantially linear second sub-pixel segments 461-464. In some non-limiting examples, at least one of the second sub-pixel segments 461, 463 may be substantially parallel to, close to, and in some non-limiting examples adjacent to at least one of the corresponding at least one of the transmission boundary segments 411, 413 of the transmission region 25x.

[0299] In some non-limiting examples, as shown in the figure, regarding the second sub-pixel 260 2a The second sub-pixel segment 463 may be close to and / or adjacent to the corresponding transmission boundary segment 411 in some non-limiting examples.

[0300] In some non-limiting examples, as shown in the figure, regarding the second sub-pixel 260 2b The second sub-pixel segment 461 may be close to and / or adjacent to the corresponding transmission boundary segment 413 in some non-limiting examples.

[0301] In some non-limiting examples, at least one second sub-pixel segment 463 and at least one corresponding transmission boundary segment 411 of the transmission region 25x adjacent to the at least one second sub-pixel segment can be separated by a minimum distance. In some non-limiting examples, at least one second sub-pixel segment 461 and at least one corresponding transmission boundary segment 413 of the transmission region 25x adjacent to the at least one second sub-pixel segment can be separated by a minimum distance. In some non-limiting examples, such a minimum distance, which may be related to constraints in the manufacturing process, can be one of about 5 μm, 6 μm, 8 μm, 10 μm, 11 μm, and 12 μm. In some non-limiting examples, such a minimum distance can be one of about 5 μm-15 μm, 6 μm-12 μm, and 8 μm-10 μm.

[0302] In some non-restrictive examples, such as in Figure 4B As shown, a plurality of linear second subpixel segments 461-464 may be coupled by at least one substantially curved second subpixel segment 466-469 and may extend between the at least one substantially curved second subpixel segment. Thus, in some non-limiting examples, the respective endpoints of the linear second subpixel segments 461-464 may be coupled to the endpoints of the curved second subpixel segments 466-469.

[0303] In some non-limiting examples, at least one of the curved second sub-pixel segments 466-469 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may be associated with constraints during the manufacturing process, may be one of approximately 8 μm and 10 μm.

[0304] In some non-limiting examples, the lateral extent of the third sub-pixel 2603 may be defined by a closed third sub-pixel boundary 475. As shown, in some non-limiting examples, the third sub-pixel boundary 475 may include a plurality of substantially linear third sub-pixel segments 471-474. In some non-limiting examples, at least one of the third sub-pixel segments 472, 474 may be substantially parallel to, close to, and in some non-limiting examples adjacent to at least one of the corresponding at least one of the transmission boundary segments 412, 414 of the transmission region 25x.

[0305] In some non-limiting examples, as shown in the figure, with respect to the third sub-pixel 2603, the third sub-pixel segment 472 may be close to and / or adjacent to the corresponding transmission boundary segment 414 in some non-limiting examples.

[0306] In some non-limiting examples, at least one third sub-pixel segment 472 and at least one corresponding transmission boundary segment 414 of the transmission region 25x adjacent to the at least one second sub-pixel segment may be separated by a minimum distance. In some non-limiting examples, such a minimum distance, which may be related to constraints during the manufacturing process, may be one of approximately 5 μm, 6 μm, 8 μm, 10 μm, 11 μm, and 12 μm. In some non-limiting examples, such a minimum distance may be one of approximately 5 μm-15 μm, 6 μm-12 μm, and 8 μm-10 μm.

[0307] In some non-restrictive examples, such as in Figure 4B As shown, a plurality of linear third subpixel segments 471-474 may be coupled by at least one substantially curved third subpixel segment 476-479 and may extend between the at least one substantially curved third subpixel segment. Thus, in some non-limiting examples, the respective endpoints of the linear third subpixel segments 471-474 may be coupled to the endpoints of the curved third subpixel segments 476-479.

[0308] In some non-limiting examples, at least one of the curved third sub-pixel segments 476-479 may have a minimum radius of curvature. In some non-limiting examples, such a minimum radius of curvature, which may be associated with constraints during the manufacturing process, may be one of approximately 8 μm and 10 μm.

[0309] Therefore, the (sub)pixel arrangements 400a and 400b maintain a high aperture ratio and high sub-pixel density for the (sub)pixels 1215 / 260, while providing a transmissive region 25x within the (sub)pixel arrangement, which has an area that allows the exchange of EM signals 331 through the signal exchange portion 303 of the display panel 300.

[0310] In some non-limiting examples, most of the transmission boundary segments 411-414 may be substantially parallel to the adjacent sub-pixel boundary segments 451-454, 461-464, and 471-474.

[0311] In some non-limiting examples, the (sub)pixel arrangement 400a may be configured such that a plurality of (including but not limited to four) connected contour segments 431-434 may define contours 430, 436, 437, 438, which in some non-limiting examples may resemble quadrilaterals or boxes 430. Each connected contour segment begins at an initial point (including but not limited to the centroid of the first emission region) located near and / or within the first emission region 210 and terminates at an endpoint (including but not limited to the centroid of the second emission region) located near and / or within the second emission region 210, wherein the first and second emission regions 210 are associated with a pair of subpixels 260, including but not limited to not crossing the transmission region 25x.

[0312] In some non-limiting examples, the first emission region 210 and the second emission region 210 may be substantially adjacent to each other, such that the corresponding contour segments 431-434 may extend laterally across at least a portion of the first emission region 210 and at least a portion of the second emission region 210 without anything in between.

[0313] In some non-limiting examples, the first emission region 210 and the second emission region 210 may be spaced apart such that corresponding contour segments 431-434 may extend laterally across at least a portion of the first emission region 210 and at least a portion of the second emission region 210, and the region extends therebetween.

[0314] In some non-limiting examples, the positions of the first sub-pixel 2601, the pair of second sub-pixels 2602, and the third sub-pixel 2603 can be such that contours 430, 436, 437, and 438 can define at least one of a square, a rectangle, a parallelogram, and a trapezoid. In some non-limiting examples, the positions of the first sub-pixel 2601, the pair of second sub-pixels 2602, and the third sub-pixel 2603 can be such that none of the contour segments 431-434 can have substantially equal lengths. In some non-limiting examples, the positions of the first sub-pixel 2601, the pair of second sub-pixels 2602, and the third sub-pixel 2603 can be such that at least two of the contour segments 431-434 can have substantially equal lengths. In some non-limiting examples, the positions of the first sub-pixel 2601, the pair of second sub-pixels 2602, and the third sub-pixel 2603 can be such that none of the contour segments 431-434 can be parallel to each other.

[0315] In some non-limiting examples, contours 430, 436, 437, and 438 may enclose at least one transmission region 25x. In some non-limiting examples, contour segments 431-434 of contours 430, 436, 437, and 438 may surround, and in some non-limiting examples, avoid crossing the transmission region 25x.

[0316] Now go to Figure 4C The diagram shows the signal exchange section 303 of the display panel 300, in which the (sub)pixel arrangement 400a repeats across its lateral orientation. It can be seen that multiple adjacent contours 430, 436, 437, 438 (including but not limited to four adjacent boxes 430) can be combined to define a unit cell 435, each contour having a line segment passing through the centroid of a common (sub)pixel 1215 / 260. Although the unit cell 435 is shown in the figure... b It may have a B (blue) sub-pixel 2603 as a common (sub)pixel 1215 / 260, but those skilled in the art will understand that in some non-limiting examples, the common (sub)pixel 1215 / 260 may equally be an R (red) sub-pixel 2601 (unit cell 435). r ) or one of the G (green) sub-pixels 2602 (unit cell 435) ga Or 435 gb In some non-restrictive examples, it can be considered as 435 ga (A vertically or horizontally flipped version or a version that has been rotated substantially approximately 90° in either a clockwise or counterclockwise direction). Regardless of the color of the common (sub)pixels 1215 / 260, in some non-limiting examples, adjacent unit cells 435 will have common (sub)pixels 1215 / 260 of the same color.

[0317] Those skilled in the art will understand that, in some non-limiting examples, unit cell 435 may constitute a repeating unit of the array of (sub)pixels 1215 / 260 in signal exchange section 303. In some non-limiting examples, unit cell 435 may be a repeating unit of the smallest size.

[0318] Those skilled in the art will understand that, in some non-limiting examples, regardless of whether unit cell 435 has a common (sub)pixel 1215 / 260, the common (sub)pixel is R (red) subpixel 2601 (unit cell 435). r ) or one of the G (green) sub-pixels 2602 (unit cell 435) ga Or 435 gb ) or B (blue) sub-pixel 2603 (unit cell 435) b ), the same pixel layout can be regarded as a repetition of unit cell 435.

[0319] Those skilled in the art will understand that, in some non-limiting examples, the same pixel layout can be considered to have a given color (including but not limited to R (red) (unit cell 435)). rThe repetition of unit cell 435 of the common (sub)pixel 1215 / 260, and having another color (including but not limited to B (blue) (unit cell 435) b ) and G (green) (unit 435) g The common (sub)pixels 1215 / 260 of the unit cell 435 are repeated, despite the lateral offset.

[0320] In some non-limiting examples, at least one contour 430, 436, 437, 438 of the unit cell 435 may enclose at least one transmissive region 25x. In some non-limiting examples, each of the contours 430, 436, 437, 438 of the unit cell 435 may enclose at least one transmissive region 25x.

[0321] In some non-limiting examples, unit cell 435 may include a plurality of contours 430, 436, 437, 438 having substantially similar shapes and sizes. In some non-limiting examples, unit cell 435 may include contours 430, 436, 437, 438, wherein at least one of the shapes and sizes of none of them is substantially equal.

[0322] Now go to Figure 4D As a non-limiting example, a plan view is shown of an example (sub)pixel arrangement 400d that can be used across the signal exchange section 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400d differs from the (sub)pixel arrangement 400a in that the transmission region 25x (in the clockwise or counterclockwise direction) has been rotated by approximately 45°.

[0323] Therefore, the parallelism between at least one of the linear transmission boundary segments 411-414 and the linear first sub-pixel segments 451-454, the linear second sub-pixel segments 461-464, and the linear third sub-pixel segments 471-474 may not be maintained.

[0324] In some non-limiting examples, the first configuration axis 440 and the second configuration axis 445 can be considered to have been rotated by approximately 45° each (in either the clockwise or counterclockwise direction).

[0325] In this case, in some non-limiting examples, the parallelism between at least one of the first configuration axis 440 and the second configuration axis 445 and the linear transmission boundary segments 411-414 can be maintained. However, in this case, the parallelism between at least one of the first configuration axis 440 and the second configuration axis 445 and at least one of the linear first sub-pixel segments 451-454, the linear second sub-pixel segments 461-464, and the linear third sub-pixel segments 471-474 is not considered to be maintained.

[0326] In some non-limiting examples, at least one of the profile segments 431-434 (including, but not limited to, at least one of the profile segments 432 and 434) may be substantially parallel to the first configuration axis 440. In some non-limiting examples, at least one of the profile segments 431-434 (including, but not limited to, at least one of the profile segments 431 and 433) may be substantially parallel to the second configuration axis 440.

[0327] Now go to Figure 4E As a non-limiting example, a plan view is provided to illustrate an example (sub)pixel arrangement 400e for the application of a signal exchange portion 303 across a display panel 300. It can be seen that the (sub)pixel arrangement 400e differs from the (sub)pixel arrangement 400d in that at least one of the transmission boundary segments 411, 413 may have a first length, and at least one of the transmission boundary segments 412, 414 may have a second length different from the first length.

[0328] Now go to Figure 4F As a non-limiting example, a plan view is shown of an example (sub)pixel arrangement 400f that can be used across the signal exchange section 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400f differs from the (sub)pixel arrangement 400e in that the transmission region 25x (in the clockwise or counterclockwise direction) has been rotated by approximately 90°.

[0329] Now go to Figure 4G As a non-limiting example, a plan view is provided showing an example (sub)pixel arrangement 400g that can be used across the signal exchange section 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400g differs from the (sub)pixel arrangement 400a in that at least one of the first sub-pixel 2601, the second sub-pixel 2602, and the third sub-pixel 2603 has been rotated by approximately 45° (in a clockwise or counterclockwise direction).

[0330] Therefore, the parallelism between at least one of the linear transmission boundary segments 411-414 and the linear first sub-pixel segments 451-454, the linear second sub-pixel segments 461-464, and the linear third sub-pixel segments 471-474 may not be maintained.

[0331] In some non-limiting examples, it can be assumed that at least one of the first configuration axis 440 and the second configuration axis 445 maintains a parallel relationship with at least one of the linear first sub-pixel segments 451-454, the linear second sub-pixel segments 461-464, and the linear third sub-pixel segments 471-474. However, in this case, the parallel relationship between at least one of the first configuration axis 440 and the second configuration axis 445 and the linear transmission boundary segments 411-414 may not be maintained.

[0332] Now go to Figure 4H As a non-limiting example, a plan view is provided showing an example (sub)pixel arrangement 400h that can be applied across the signal exchange portion 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400h differs from the (sub)pixel arrangement 400g in that at least one of the linear first sub-pixel segments 451-454, the linear second sub-pixel segments 461-464, and the linear third sub-pixel segments 471-474 (in the figure, the linear second sub-pixel segments 461-464) does not all have substantially equal lengths, and in some non-limiting examples, they can be coupled by at least one of at least one of the at least one curved first sub-pixel segments 456-459, at least one curved second sub-pixel segment 466-469, and at least one curved third sub-pixel segment 476-479 (in the figure, each of them) and can extend between them.

[0333] In some non-limiting examples, at least one of the first sub-pixel segments 451-454 (including but not limited to segments 451 and 453) may have a first length, and at least one of the first sub-pixel segments 451-454 (including but not limited to segments 452 and 454) may have a second length different from the first length.

[0334] In some non-limiting examples, at least one of the second sub-pixel segments 461-464 (including but not limited to segments 461 and 463) may have a first length, and at least one of the second sub-pixel segments 461-464 (including but not limited to segments 462 and 464) may have a second length different from the first length.

[0335] In some non-limiting examples, at least one of the third sub-pixel segments 471-474 (including but not limited to segments 471 and 473) may have a first length, and at least one of the third sub-pixel segments 471-474 (including but not limited to segments 472 and 474) may have a second length different from the first length.

[0336] Now transferred to Figure 4I The diagram shows the signal exchange section 303 of the display panel 300, in which (sub)pixel arrangements 400g repeat across their lateral orientation.

[0337] Now go to Figure 4JAs a non-limiting example, a plan view is shown of an example (sub)pixel arrangement 400j that can be applied across the signal exchange portion 303 of the display panel 300. While in some non-limiting examples, at least one of the dimensions, shapes, and orientations of the emission regions 210 corresponding to at least one (sub)pixel 1215 / 260 in the signal exchange portion 303 of the display panel 300 may be substantially the same as at least one of the dimensions, shapes, and orientations of the emission regions 210 corresponding to at least one (sub)pixel 1215 / 260 in the display portion 307 of the display panel 300, including as described herein, in the context of at least (sub)pixel arrangement 400a, in some non-limiting examples, at least one of the dimensions, shapes, and orientations of the emission regions 210 corresponding to at least one (sub)pixel 1215 / 260 in the signal exchange portion 303 of the display panel 300 may differ from at least one of the dimensions, shapes, and orientations of the emission regions 210 corresponding to at least one (sub)pixel 1215 / 260 in the display portion 307 of the display panel 300.

[0338] In the (sub)pixel arrangement 400j, the first subpixel 2601 can be shown as having an emission region 210 in the signal exchange section 303, the emission region having an example size, shape and orientation indicated by the signal exchange first subpixel outline 455, and can be compared and contrasted with the example size, shape and orientation of the corresponding emission region 210 in the display section 307, indicated by the display first subpixel outline 450 superimposed on the signal exchange first subpixel outline. Similarly, the second sub-pixel 2602 may be shown as having an emission region 210 in the signal exchange portion 303, the emission region having an example size, shape, and orientation indicated by the signal exchange second sub-pixel outline 465, and may be compared and contrasted with the example size, shape, and orientation of the corresponding emission region 210 in the display portion 307 indicated by the display second sub-pixel outline 460 superimposed on the signal exchange second sub-pixel outline; and the third sub-pixel 2603 may be shown as having an emission region 210 in the signal exchange portion 303, the emission region having an example size, shape, and orientation indicated by the signal exchange third sub-pixel outline 475, and may be compared and contrasted with the example size, shape, and orientation of the corresponding emission region 210 in the display portion 307 indicated by the display third sub-pixel outline 470 superimposed on the signal exchange third sub-pixel outline.

[0339] In some non-limiting examples, as shown, the signal-exchange first subpixel contour 455 may be entirely within the corresponding display first subpixel contour 450 superimposed thereon. In some non-limiting examples, as shown, the signal-exchange second subpixel contour 465 may be entirely within the corresponding display second subpixel contour 460 superimposed thereon. In some non-limiting examples, as shown, the signal-exchange third subpixel contour 475 may be entirely within the corresponding display third subpixel contour 470 superimposed thereon.

[0340] Those skilled in the art will understand that, in at least some applications, there may be requirements that the signal exchange first sub-pixel profile 455, the second sub-pixel profile 465, and the third sub-pixel profile 475 in the signal exchange section 303 are each completely located within the corresponding display first sub-pixel profile 450, the second sub-pixel profile 460, and the third sub-pixel profile 470 in the display section 307 (including but not limited to) so as to maintain a substantially constant (sub)pixel density between the signal exchange section 303 and the display section 307.

[0341] In some non-limiting examples, as shown, by having the signal exchange first sub-pixel profile 455, the second sub-pixel profile 465, and the third sub-pixel profile 475 completely located within the corresponding display first sub-pixel profile 450, the second sub-pixel profile 460, and the third sub-pixel profile 470, it is permissible to use an FMM with a uniform aperture design spanning the entire display panel 300 (including but not limited to both the signal exchange portion 303 and the display portion 307) for at least one of the layers that include and define the emission region 210 (including but not limited to the first electrode 220, the second electrode 240, and at least one semiconducting layer 230 therebetween) across the entire display panel 300.

[0342] In some non-limiting examples, at least one of the dimensions, shape, configuration, and orientation of the lateral extent of at least one semiconductive layer 230 may be substantially the same between the signal exchange portion 303 and the display portion 307.

[0343] In some non-limiting examples, while at least one of the layers including and defining the emission region 210 (including but not limited to the first electrode 220, the second electrode 240 and at least one semiconductive layer 230 therebetween) can be deposited using a uniform FMM (“uniform layer”), in some non-limiting examples, at least one of the layers including and defining the emission region 210 (including but not limited to the first electrode 200, the second electrode 240 and at least one semiconductive layer 230 therebetween) (“non-uniform layer”) can be deposited using an FMM (“non-uniform FMM”) having a different aperture design than that between the signal exchange portion 303 and the display portion 307.

[0344] In some non-limiting examples, the arrangement of the signal exchange portion (sub)pixels may differ from that of the display portion (sub)pixels due to differences in at least one of the dimensions, shape, configuration, and orientation of the lateral extent of the first electrode 220 between the signal exchange portion 303 and the display portion 307.

[0345] In some non-limiting examples, by changing the opening of PDL 209, at least one of the size, shape, configuration, and orientation of the lateral extent of the first electrode 220 can be varied between the signal exchange portion 303 and the display portion 307, through which the layer surface of the first electrode 220 is exposed.

[0346] In some non-limiting examples, the aperture design of such a non-uniform FMM in the signal exchange section 303 may correspond to the corresponding signal exchange first sub-pixel profile 455, second sub-pixel profile 465 and / or third sub-pixel profile 475.

[0347] Those skilled in the art will understand that, in at least some applications, there may be a requirement for the ability to use a uniform FMM with a uniform aperture design across the entire display panel 300, including but not limited to, for ease of manufacturing the display panel 300.

[0348] As a non-limiting example, such a uniform FMM can be used to uniformly deposit material for forming at least a portion of at least one semiconductive layer 230 across the signal exchange portion 303 and the display portion 307 in a pattern that displays a first subpixel profile 450, a second subpixel profile 460, and a third subpixel profile 470.

[0349] In this case, only a portion of the display stack (defined by the aperture of the uniform FMM) corresponding to the exchange of the first, second, or third sub-pixel of the corresponding signal can be used for emission purposes, while the rest of the display stack remains inactive.

[0350] In some non-limiting examples, at least one transmissive region 25x may overlap with a portion of the inactive display stack while still maintaining a minimum spacing distance between at least one transmissive boundary segment 411-414 and at least one of the corresponding at least one of the first sub-pixel segments 451-454, at least one second sub-pixel segment 461-464, and at least one third sub-pixel segment 471-474.

[0351] As a non-limiting example, such a uniform FMM can be used to uniformly deposit a material for forming a first electrode 220 (and, in some non-limiting examples, at least one semiconductive layer 230) across the signal exchange portion 303 and the display portion 307 in a pattern that displays a first sub-pixel profile 450, a second sub-pixel profile 460, and a third sub-pixel profile 470, while using a material having corresponding signal exchange first sub-pixel profiles 455, second sub-pixel profiles 465, and third sub-pixel profiles 475 (and, in some non-limiting examples, corresponding to the display portion 307) in the signal exchange portion 303. The FMM with non-uniform aperture design (corresponding to the first sub-pixel profile 450, the second sub-pixel profile 460, and the third sub-pixel profile 470) in the display portion 307 is used to pattern the material (deposited material 731) deposited to form the second electrode 240, in order to control the deposition pattern of the patterned coating 110 that is suitable for influencing the tendency of the vapor flux 732 of the deposited material 731 to be deposited thereon, including but not limited to, the initial adhesion probability of the deposition of the deposited material 731 not exceeding the initial adhesion probability of the deposition of the deposited material 731 on the exposed surface 11 of at least one semiconductive layer 230.

[0352] In some non-limiting examples, at least one aperture of a non-uniform FMM in signal exchange section 303 may extend beyond a corresponding aperture of a uniform FMM, such that the intersection of at least one aperture of such a non-uniform FMM with a corresponding at least one aperture of at least one uniform FMM may result in corresponding signal exchange first sub-pixel profile 455, second sub-pixel profile 465, and third sub-pixel profile 475.

[0353] Those skilled in the art will understand that, in either case, the lateral orientation of the emission region 210 can be limited to a lateral range substantially not exceeding the intersection of the first electrode 220 and the second electrode 240, i.e., a smaller area defined by the holes in the non-uniform FMM corresponding to the signal exchange first sub-pixel profile 455, the second sub-pixel profile 465, and the third sub-pixel profile 475.

[0354] Those skilled in the art will understand that in at least some applications, there may be a requirement to reduce the size of the emission area 210, including but not limited to increasing the size of the transmissive area 25x within the contours 430, 436, 437, 438 defined by the first sub-pixel 2601, the second sub-pixel 2602, and the third sub-pixel 2603, while simultaneously increasing the overall transparency level through the display panel 300.

[0355] In some non-limiting examples, as shown, the signal-exchanged first subpixel contour 455 can be centered within the display first subpixel contour 450 superimposed thereon. In some non-limiting examples, as shown, the signal-exchanged second subpixel contour 465 can be centered within the display second subpixel contour 460 superimposed thereon. In some non-limiting examples, the signal-exchanged third subpixel contour 475 can be centered within the display third subpixel contour 470 superimposed thereon.

[0356] Those skilled in the art will understand that, in at least some applications, there may be requirements for the signal exchange first sub-pixel profile 455, the second sub-pixel profile 465, and the third sub-pixel profile 475 to be centered (including, but not limited to) within the corresponding display first sub-pixel profile 450, the second sub-pixel profile 460, and the third sub-pixel profile 470, so as to maintain a substantially constant (sub)pixel pitch between the signal exchange portion 303 and the display portion 307.

[0357] In some non-limiting examples, as shown, the signal-exchanged first subpixel contour 455 may have at least one vertex located on the boundary of the display first subpixel contour 450 superimposed thereon. In some non-limiting examples, as shown, the signal-exchanged second subpixel contour 465 may have at least one vertex located on the boundary of the display second subpixel contour 460 superimposed thereon. In some non-limiting examples, as shown, the signal-exchanged third subpixel contour 475 may have at least one vertex located on the boundary of the display third subpixel contour 470 superimposed thereon.

[0358] In some non-limiting examples, as shown, the signal-exchanged first subpixel contour 455 may have a size, shape, and orientation that may differ from at least one of the corresponding sizes, shapes, and orientations of the displayed first subpixel contour 460. In some non-limiting examples, as shown, the signal-exchanged second subpixel contour 465 may have a size, shape, and orientation that may differ from at least one of the corresponding sizes, shapes, and orientations of the displayed second subpixel contour 460. In some non-limiting examples, as shown, the signal-exchanged third subpixel contour 475 may have a size, shape, and orientation that may differ from at least one of the corresponding sizes, shapes, and orientations of the displayed third subpixel contour 470.

[0359] In some non-limiting examples, the size of at least one emission region 210 of the first sub-pixel 2601 in the signal exchange portion 303 of the display panel 300 (including but not limited to) may exceed the size of the corresponding at least one emission region 210 of the second sub-pixel 2602. In some non-limiting examples, the size of at least one emission region 210 of the third sub-pixel 2603 may exceed the size of the corresponding at least one emission region 210 of the first sub-pixel 2601.

[0360] As shown in (sub)pixel arrangement 400j, in some non-limiting examples, the size of at least one emitting region 210 of at least one (sub)pixel 1215 / 260 in the signal exchange portion 303 of the display panel 300 may alternatively and / or similarly be reduced relative to the size of the corresponding emitting region 210 of the corresponding (sub)pixel 1215 / 260 in the display portion of the display panel 300, such that at least one emitting region 210 of at least one (sub)pixel 1215 / 260 in the signal exchange portion 303 of the display panel 300 is reduced. The diagonal range can be a straight line segment in length that is substantially equal to the boundary of the corresponding emission area 210 of the corresponding (sub)pixel 1215 / 260 in the display portion 307 of the display panel 300, such that when superimposed as shown, at least one emission area 210 of at least one (sub)pixel 1215 / 260 in the signal exchange portion 303 of the display panel 300 can be regarded as being substantially surrounded by the side of the corresponding emission area 210 of the corresponding (sub)pixel 1215 / 260 in the display portion 307 of the display panel 300.

[0361] In some non-limiting examples, the length of at least one of the linear first sub-pixel segments 451-454 (including but not limited to) in the (sub)pixel arrangement 400j may be about 11.6 μm. In some non-limiting examples, the length of at least one of the linear second sub-pixel segments 461-464 (including but not limited to) in the (sub)pixel arrangement 400j may be about 8.7 μm. In some non-limiting examples, the length of at least one of the linear third sub-pixel segments 471-474 (including but not limited to) in the (sub)pixel arrangement 400j may be about 14.5 μm.

[0362] As shown in (sub)pixel arrangement 400j, in some non-limiting examples, the orientation of the emission region 210 of (sub)pixels 1215 / 260 in the signal exchange portion 303 of the display panel 300 can be rotated substantially about 45° (in a clockwise or counterclockwise direction) relative to the emission region 210 of (sub)pixels 1215 / 260 in the display portion of the display panel 300.

[0363] In some non-limiting examples, rotating and reducing the size of at least one emission region 210 of at least one (sub)pixel 1215 / 260 in the signal exchange portion 303 of the display panel 300 relative to the corresponding emission region 210 of the corresponding (sub)pixel 1215 / 260 in the display portion 307 of the display panel 300 can provide spacing between a plurality of adjacent (sub)pixels 1215 / 260 in the signal exchange portion 303 of the display panel 300, such that at least one transmissive region 25x can be introduced between these plurality of adjacent (sub)pixels without changing the pixel density between the signal exchange portion 303 and the display portion 307 of the display panel 300.

[0364] In some non-limiting examples, (including but not limited to) the pixel density exhibited by the signal exchange portion 303 of the display panel 300 in the (sub)pixel arrangement 400j may be at least one of about 300 pixels per inch, 350 pixels per inch, and 400 pixels per inch. In some non-limiting examples, (including but not limited to) the pixel density exhibited by the signal exchange portion 303 of the display panel 300 in the (sub)pixel arrangement 400j may be about 430 pixels per inch.

[0365] Now go to Figure 4KAs a non-limiting example, a plan view is provided showing an example (sub)pixel arrangement 400k that can be used across the signal exchange portion 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400k differs from the (sub)pixel arrangement 400j in that each of the signal exchange first sub-pixel contour 455, second sub-pixel contour 465, and third sub-pixel contour 475 is substantially parallel to (opposite to being substantially rotated about 45° (in a clockwise or counterclockwise direction)) the orientation of the corresponding display first sub-pixel contour 450, second sub-pixel contour 460, and third sub-pixel contour 470, and each is positioned at its respective end to maximize the dimensions of the contours 430, 436, 437, and 438 therebetween.

[0366] Therefore, the size of at least one transmission region 25x disposed therein can be significantly increased.

[0367] In some non-limiting examples, as shown, the transmission boundary 415 of at least one transmission region 25x may encroach on the perimeter of at least one of the first display subpixel contour 450, the second display subpixel contour 460, and the third display subpixel contour 470, while maintaining the minimum distance between at least one of the closest first subpixel segments of the first subpixel segments 451-454, the closest second subpixel segments of the second subpixel segments 461-464, and the closest third subpixel segments of the third subpixel segments 471-474.

[0368] In some non-limiting examples, the transmission boundary 415 of at least one transmission region 25x may overlap with the inactive portion of the display stack (defined by the aperture of a uniform FMM), corresponding to the corresponding signal exchange first sub-pixel, second sub-pixel, and / or third sub-pixel.

[0369] In some non-limiting examples, as shown, at least one of the signal-exchange first subpixel contour 455, second subpixel contour 465, and third subpixel contour 475 may have a configuration including a portion thereof that substantially matches the corresponding portion of the configuration of the corresponding at least one display first subpixel contour 450, second subpixel contour 460, and third subpixel contour 470, such that there is no gap between the at least one signal-exchange first subpixel contour 455, second subpixel contour 465, and third subpixel contour 475 and the corresponding at least one display first subpixel contour 450, second subpixel contour 460, and third subpixel contour 470 at their respective ends.

[0370] Those skilled in the art will understand that, in some non-limiting examples, positioning the signal-exchange first sub-pixel contour 455, the second sub-pixel contour 465, and / or the third sub-pixel contour 475 at the respective ends of the corresponding display first sub-pixel contour 450, the second sub-pixel contour 460, and the third sub-pixel contour 470 can cause the sub-pixels 260 in the signal-exchange portion 303 to substantially fit into the same area that will be occupied by the corresponding sub-pixels 260 in the display portion. Therefore, in some non-limiting examples, at least one of the spacing and pixel density of the sub-pixels 260 in the signal-exchange portion 303 can be substantially the same as at least one corresponding of the spacing and pixel density of the corresponding sub-pixels 260 in the display portion.

[0371] In contrast, although the subpixel density of subpixels 260 in signal exchange section 303 can be substantially the same as the corresponding subpixel density of corresponding subpixels 260 in display section, in some non-limiting examples, the subpixel spacing of subpixels 260 in signal exchange section 303 can be different from the corresponding subpixel spacing of corresponding subpixels 260 in display section (especially if the subpixel spacing is taken from the corresponding centroid of each subpixel 260).

[0372] Now go to Figure 4L As a non-limiting example, a plan view is provided to illustrate an example (sub)pixel arrangement 400l for the application of a signal exchange portion 303 across a display panel 300. It can be seen that the difference between (sub)pixel arrangement 400l and (sub)pixel arrangement 400k is that each of the signal exchange first sub-pixel contour 4551, second sub-pixel contour 4651, and third sub-pixel contour 4751 has a substantially elliptical configuration, while each continues to be co-located at the respective ends of the corresponding display first sub-pixel contour 450, second sub-pixel contour 460, and third sub-pixel contour 470.

[0373] In some non-limiting examples, at least one of the corresponding first subpixel contour 450, second subpixel contour 460 and third subpixel contour 470 may have a configuration that exchanges a different configuration of the first subpixel contour 4551, second subpixel contour 4651 and third subpixel contour 4751 with at least one corresponding signal, including but not limited to a quadrilateral configuration, as shown in the figure.

[0374] In some non-limiting examples, at least one of the corresponding first subpixel contour 450, second subpixel contour 460 and third subpixel contour 470 may have a configuration similar to that of the first subpixel contour 4551, second subpixel contour 4651 and third subpixel contour 4751 exchanged with at least one corresponding signal.

[0375] Now go to Figure 4MAs a non-limiting example, a plan view is shown of an example (sub)pixel arrangement 400m that can be used across the signal exchange portion 303 of the display panel 300. It can be seen that the (sub)pixel arrangement 400m differs from the (sub)pixel arrangement 400l in that each of the signal exchange first sub-pixel contour 4552, second sub-pixel contour 4652, and third sub-pixel contour 4752 has a substantially triangular configuration, while each continues to be commonly positioned at the respective ends of the corresponding display first sub-pixel contour 450, second sub-pixel contour 460, and third sub-pixel contour 470.

[0376] In some non-limiting examples, as shown, at least one of the signal-exchange first subpixel contour 4552, second subpixel contour 4652, and third subpixel contour 4752 may have a configuration including a portion thereof that substantially matches the corresponding portion of the configuration of the corresponding at least one display first subpixel contour 450, second subpixel contour 460, and third subpixel contour 470, such that there is no gap between the at least one signal-exchange first subpixel contour 4552, second subpixel contour 4652, and third subpixel contour 4752 and the corresponding at least one display first subpixel contour 450, second subpixel contour 460, and third subpixel contour 470 at their respective ends.

[0377] In some non-limiting examples, as shown, the signal exchange of at least one of the first sub-pixel contour 4552, the second sub-pixel contour 4652, and the third sub-pixel contour 4752 can substantially bisect at least one corresponding display first sub-pixel contour 450, the second sub-pixel contour 460, and the third sub-pixel contour 470, such that the two sides of the signal exchange of at least one of the first sub-pixel contour 4552, the second sub-pixel contour 4652, and the third sub-pixel contour 4752 are substantially equivalent to the two sides of the corresponding at least one of the display first sub-pixel contour 450, the second sub-pixel contour 460, and the third sub-pixel contour 470, and the third side 455 of the signal exchange of at least one of the first sub-pixel contour 4552, the second sub-pixel contour 4652, and the third sub-pixel contour 4752 is also substantially equal to the two sides of the corresponding at least one of the display first sub-pixel contour 450, the second sub-pixel contour 460, and the third sub-pixel contour 4752. 2d 465 2d 475 2d Extending along the diagonal of at least one of the corresponding vertices of the first subpixel contour 450, the second subpixel contour 460 and the third subpixel contour 470, with both sides extending between the corresponding vertices.

[0378] exist Figure 4NThe image shows a signal exchange portion 303 of a display panel 300, in which alternating instances of (sub)pixel arrangements 400e and 400f are repeated across their lateral orientations (some features have been omitted from this image, including but not limited to, linear second sub-pixel segments 461-464 of different lengths and the interpolation of rounded sub-pixel segments between the linear sub-pixel segments).

[0379] In some non-limiting examples, the transmission regions 25x may be regularly spaced along at least one configuration axis 440, 445.

[0380] In some non-limiting examples, the first transmission region 250 is separated by the first sub-pixel 2601. a With the second transmission region 250 b They may be spaced apart (including, but not limited to, by a first spacing distance as indicated by arrow 481, which in some non-limiting examples may be substantially about 57.66 μm.

[0381] In some non-limiting examples, the second transmission region 250 is separated by the second sub-pixel 2602. b With the third transmission region 250 c A second spacing distance may be spaced (including, but not limited to, that indicated by arrow 482), which in some non-limiting examples may be substantially about 59.11 μm.

[0382] In some non-limiting examples, the third transmission region 250 is separated by the third sub-pixel 2603. c With the fourth transmission region 250 d A third spacing distance may be spaced (including, but not limited to, that indicated by arrow 483), which in some non-limiting examples may be substantially about 60.56 μm.

[0383] In some non-limiting examples, the distance (including but not limited to) between the center of the first sub-pixel 2601 and the center of the third sub-pixel 2603 adjacent to the first sub-pixel, as indicated by any of the dashed lines in dashed line 484, can be substantially about 59.11 μm.

[0384] In some non-limiting examples, the third interval distance (including, but not limited to, as shown by arrow 483) may exceed the first interval distance (including, but not limited to, as shown by arrow 481).

[0385] In some non-limiting examples, the array of transmission regions 25x may be arranged such that the distance between adjacent transmission regions 25x in such an array may alternate along at least one configuration axis 440, 445 between a first spacing distance as indicated by arrow 481 and a third spacing distance as indicated by arrow 483.

[0386] In some non-limiting examples, the transmission regions 25x may be irregularly spaced along at least one configuration axis 440, 445.

[0387] In some non-limiting examples, the area of ​​each transmission region is 25x (including but not limited to) in Figure 4N In the example, it can be approximately 597.9 square μm.

[0388] In some non-limiting examples, the transmission region 25x (including but not limited to) is in Figure 4N In the example, it can occupy approximately 34.2% of the area enclosed by the dashed line 484.

[0389] In some non-limiting examples, the transmission region 25x may include a plurality of transmission region subsets 25x arranged in an alternating manner. l and 25x r In some non-restricted examples, the first subset is 25x. l The transmission region 25x and the second subset 25x r There may be no difference between the 25x transmission regions.

[0390] In some unrestricted examples, the first subset is 25x l The size, shape, and orientation of the transmission region 25x may differ from the second subset 25x. r The size, shape, and orientation of the transmission region 25x, including but not limited to maximizing the aperture ratio of at least one of the transmission region 25x and the emission region 210. In some non-limiting examples, when in Figure 4N When viewed in a planar view within the publicly available field of view, the first subset is 25x. l The transmission region 25x can be oriented to the left, while the second subset 25x r The 25x transmission area can be oriented to the right.

[0391] In some unrestricted examples, the first subset is 25x l 25x r The transmission region 25x can correspond to the corresponding aperture of the first FMM, and the second subset 25x l 25x r The transmission area 25x can correspond to the corresponding hole of the second FMM.

[0392] In some non-limiting examples, the transmission region 25x can be divided into multiple subsets 25x. l 25x r This is to achieve the maximum number and / or minimum spacing of holes for a given FMM, including but not limited to maintaining the threshold structural integrity of the FMM.

[0393] In some non-limiting examples, the transmission boundary 415 may have a shape other than a quadrilateral shape or a quadrilateral shape with rounded corners (a (rounded) quadrilateral), such as shown in some of these non-limiting examples, including but not limited to (rounded) polygons (including but not limited to one of (rounded) triangles, circles, ovals and stars).

[0394] In some non-limiting examples, the signal exchange sub-pixel contours 455, 4551, 4552, 4553, 465, 4651, 4652, 475, 4751, 4752, 4753 of the emission region 210 of at least one of the first sub-pixel 2601, the second sub-pixel 2602, and the third sub-pixel 2603 may have shapes other than (circular) quadrilaterals, such as those shown in some non-limiting examples herein, including but not limited to (circular) polygons (including but not limited to (circular) triangles 4552, 4652, 4752), circles (4551, 4651, 4751), ellipses, oval shapes, and stars.

[0395] In some non-limiting examples, the shape of the transmission boundary 415 and the shape of at least one signal exchange subpixel profile 455, 4551, 4552, 4553, 465, 4651, 4652, 475, 4751, 4752, 4753 can be complementary, because at least a portion of the signal exchange subpixel profile 455, 4551, 4552, 4553, 465, 4651, 4652, 475, 4751, 4752, 4753 can maintain a substantially constant interval with the corresponding portion of the transmission boundary 415, so as to increase the proportion of panel area in the signal exchange portion 303 of the display panel 300 used for transmitting and / or emitting EM radiation, thereby increasing the aperture ratio of the transmission region 25x and / or the emission region 210, respectively.

[0396] Now go to Figure 4O The diagram illustrates the signal exchange portion 303 of a display panel 300, wherein an example (sub)pixel arrangement 400o repeats across its lateral orientation. In the (sub)pixel arrangement 400o, the rectangular transmission boundary 415 may be replaced by a circular transmission boundary 4151.

[0397] In some non-limiting examples, the emission region 210 of the third sub-pixel 2603 may have a substantially star-shaped signal-exchange third sub-pixel profile 4753, which in some non-limiting examples may be formed by connecting multiple (including but not limited to four) curved vertices (including but not limited to concave portions (including but not limited to quarters) of curved peripheries (including but not limited to one of circular, oval and elliptical shapes).

[0398] In some non-limiting examples, replacing the polygonal subpixel contour with a star-shaped subpixel contour for at least one subpixel 260 may facilitate an increase in the aperture ratio of the subpixel 260, including but not limited to the case where the transmission region 25x has a transmission boundary that is one of a circle, an oval, and an ellipse.

[0399] In some non-limiting examples, the radius of curvature of the curved periphery of the star-shaped signal exchange third sub-pixel profile 4753 may be substantially equal to the radius of curvature of the transmission boundary 25x that defines a circle, an oval, and an ellipse that approximates the star-shaped signal exchange third sub-pixel profile, so as to maintain a substantially constant spacing between the transmission boundary 4151 and the curved periphery of the third sub-pixel boundary 4753. In some non-limiting examples, this spacing may be at least one of about 8 μm, 10 μm, 11 μm, and 12 μm.

[0400] By comparison, at least one instance of the signal-exchange first sub-pixel profile 455 in the (sub)pixel arrangement 400o is shown superimposed on a corresponding example of the display first sub-pixel profile 450. In some non-limiting examples, the lateral extent of the signal-exchange first sub-pixel profile 455 may not overlap with either the lateral extent of the display first sub-pixel profile 450 or the lateral extent of at least one transmissive region 251. In some non-limiting examples, the lateral extent of the display first sub-pixel profile 450 may overlap with the lateral extent of at least one transmissive region 251.

[0401] By comparison, at least one instance of the signal-exchange second sub-pixel profile 465 in the (sub)pixel arrangement 400o is shown superimposed on a corresponding example of the display second sub-pixel profile 460. In some non-limiting examples, the lateral extent of the signal-exchange second sub-pixel profile 465 may not overlap with either the lateral extent of the display second sub-pixel profile 460 or the lateral extent of at least one transmissive region 251. In some non-limiting examples, the lateral extent of the display second sub-pixel profile 460 may not overlap with the lateral extent of at least one transmissive region 251.

[0402] By comparison, at least one instance of the star-shaped signal-exchange third sub-pixel profile 4753 in the (sub)pixel arrangement 400o is shown superimposed on an example of the corresponding display third sub-pixel profile 470. In some non-limiting examples, the vertices of the star-shaped signal-exchange third sub-pixel profile 4753 may extend beyond the lateral extent of such display third sub-pixel profile 470. In some non-limiting examples, the lateral extent of the display third sub-pixel profile 470 may overlap with the lateral extent of at least one transmissive region 251. However, due to its shape, in some non-limiting examples, the lateral extent of the star-shaped signal-exchange third sub-pixel profile 4753 may not overlap with the lateral extent of at least one transmissive region 251.

[0403] Now go to Figure 4P The diagram illustrates the signal exchange portion 303 of a display panel 300, wherein an example (sub)pixel arrangement 400p is repeated across its lateral orientation. The (sub)pixel arrangement 400p differs from the (sub)pixel arrangement 400o in that the emission region 210 of the first sub-pixel 2601 may also have a substantially star-shaped signal exchange first sub-pixel profile 4553, which in some non-limiting examples may be formed by connecting multiple (including but not limited to four) curved vertices (including but not limited to curved peripheries (including but not limited to concave portions of circular, oval, and elliptical shapes, including but not limited to quarters)).

[0404] In doing so, in some non-limiting examples, the aperture ratio of (sub)pixels 1215 / 260 can be increased. Although not shown, in some non-limiting examples, the aperture ratio of (sub)pixels 1215 / 260 can be further increased by exchanging at least one of the signals of the second sub-pixel outline 465 with a substantially star-shaped second sub-pixel outline replacement signal.

[0405] By comparison, at least one instance of the star-shaped signal-exchange first sub-pixel profile 4553 in the (sub)pixel arrangement 400p is shown superimposed on a corresponding example of the display first sub-pixel profile 450. In some non-limiting examples, the vertices of the star-shaped signal-exchange first sub-pixel profile 4553 may extend beyond the lateral extent of such display first sub-pixel profile 450. In some non-limiting examples, the lateral extent of the display first sub-pixel profile 450 may overlap with the lateral extent of at least one transmissive region 251. However, due to its shape, in some non-limiting examples, the lateral extent of the star-shaped signal-exchange first sub-pixel profile 4553 may not overlap with the lateral extent of at least one transmissive region 251.

[0406] Now go to Figure 4QThe diagram shows the signal exchange section 303 of the display panel 300, in which an example (sub)pixel arrangement 400q is repeated across its lateral orientation. The difference between (sub)pixel arrangement 400q and (sub)pixel arrangement 400j is that the rectangular transmission area 250 has been composed of multiple subsets 252 of the elliptical transmission area 252. l 252 r Alternative. In some non-restrictive examples, when in Figure 4Q When viewed in a planar view within the publicly available field of view, the first subset 252 l The transmission region 252 can be oriented to the left, while the second subset 252 r The transmission region 252 can be oriented to the right.

[0407] Now go to Figure 4R The diagram shows the signal exchange section 303 of the display panel 300, in which an example (sub)pixel arrangement 400r repeats across its lateral orientation. The difference between (sub)pixel arrangement 400r and (sub)pixel arrangement 400q is that the rectangular signal exchange of the third sub-pixel 2603 and the third sub-pixel outline 475 have been changed by... Figure 4O The star-shaped signal of the third sub-pixel 2603 shown is replaced by the third sub-pixel outline 4753.

[0408] Pixels with three sub-pixels in a 1:1:1 ratio

[0409] Now go to Figure 4S The diagram shows the signal exchange portion 303 of the display panel 300, in which an example (sub)pixel arrangement 400s is repeated across its lateral orientation. The (sub)pixel arrangement 400s differs from the (sub)pixel arrangement 400q in that the corresponding rectangular signal exchange subpixel outlines 455, 465, and 475 of the first subpixel 2601, the second subpixel 2602, and the third subpixel 2603 are replaced by circular signal exchange subpixel outlines 4551, 4651, and 4751, respectively.

[0410] Additionally, the subpixel configuration of pixel 1215 has been changed from a quadrilateral 4-subpixel (RGB in a 1:2:1 ratio) configuration to a triangular 3-subpixel (RGB in a 1:1:1 ratio) Δ configuration, as shown by the dashed outline 436, each triangular 3-subpixel Δ configuration enclosing an elliptical transmission region 252. In some non-limiting examples, the dashed outline 436 may include multiple connected outline segments, each connecting outline segment starting at an initial point located near but not within the first emission region 210, and terminating at an endpoint located near but not within the second emission region 210, wherein the first and second emission regions 210 are associated with a pair of subpixels 260, including but not limited to those not crossing the transmission region 25x. In some non-limiting examples, the area of ​​the second subpixel 2602 may be increased to compensate for the reduction in the number of second subpixels 2602 in this 3-subpixel configuration relative to the number of second subpixels 2602 in the 4-subpixel configuration.

[0411] In some non-limiting examples, the transmission region 252 may include a plurality of transmission region subsets 252 arranged alternately. a 252 b and 252 c In some non-restricted examples, it is possible to use the first subset 252. a Transmission region 252, second subset 252 b Transmission region 252 and third subset 252 c There is no difference between the transmission regions 252.

[0412] Those skilled in the art will understand that, in some non-limiting examples, the (sub)pixel arrangement 400s can be understood as including a first row of alternating series of first sub-pixels 2601, second sub-pixels 2602 and third sub-pixels 2603 and a second row of similar alternating series laterally offset by about 1.5 sub-pixel pitches, wherein the (subset of alternating series) rows of the transmission region 252 are disposed therebetween.

[0413] Now go to Figure 4T The diagram shows the signal exchange section 303 of the display panel 300, in which an example (sub)pixel arrangement 400t repeats across its lateral orientation. The difference between (sub)pixel arrangement 400t and (sub)pixel arrangement 400s is that the elliptical transmission region 252 (a subset) has been composed of multiple subsets 253 of the substantially triangular transmission region 253. a 253 b 253 c Replacement.

[0414] In some non-limiting examples, there may be scenarios where a substantially triangular transmission region 253 is required, including but not limited to subpixels 260 of pixel 1215 in a triangular 3-pixel Δ configuration, such as arranged in (sub)pixel arrangement 400t, so that (including but not limited to) the aperture ratio of the substantially elliptical transmission region 252 relative to the (sub)pixel arrangement 400s substantially increases the aperture ratio of the transmission region 253.

[0415] In some non-limiting examples, such as those shown in the figure, the vertices of the triangle may be truncated, resulting in a substantially hexagonal configuration around the perimeter, wherein three elongated straight line segments are coupled by three truncated straight line segments and extend between these three truncated straight line segments. Although not shown, in some non-limiting examples, the vertices of the triangle may be present. Although not shown, in some non-limiting examples, the three elongated straight line segments may be coupled by three substantially curved segments and extend between these three substantially curved segments.

[0416] Although not shown, in some non-limiting examples, the aperture ratio of the transmission region 253 can be increased by replacing the corresponding substantially circular signal exchange subpixel contours 4551, 4651, 4751 of the first subpixel 2601, the second subpixel 2602, and the third subpixel 2603 with triangular signal exchange subpixel contours 4552, 4652, 4752, respectively.

[0417] Now go to Figure 4U The diagram shows the signal exchange portion 303 of the display panel 300, in which an example (sub)pixel arrangement 400u is repeated across its lateral orientation. The difference between (sub)pixel arrangement 400u and (sub)pixel arrangement 400t is that the corresponding circular signal exchange subpixel outlines 4551, 4651, and 4751 of the first subpixel 2601, the second subpixel 2602, and the third subpixel 2603 are replaced by triangular signal exchange subpixel outlines 4552, 4652, and 4752, respectively.

[0418] By comparison, at least one instance of the triangular signal-exchange first sub-pixel profile 4552 in the (sub)pixel arrangement 400u is shown superimposed on an example of the corresponding display first sub-pixel profile 4501. In some non-limiting examples, the lateral extent of the triangular signal-exchange first sub-pixel profile 4552 may neither overlap with the lateral extent of the corresponding display first sub-pixel profile 4501 nor with at least one transmissive region 254. a 254 b 254 c The lateral extent of any (subset) of the first subpixel outline 4501 overlaps with the lateral extent of at least one transmissive region 254. In some non-limiting examples, the lateral extent of the first subpixel outline 4501 may overlap with at least one transmissive region 254. a 254b 254 c The lateral extents of at least one of the subsets overlap.

[0419] By comparison, at least one instance of the triangular signal-exchange second sub-pixel profile 4652 in the (sub)pixel arrangement 400u is shown as superimposed on an example of the corresponding display second sub-pixel profile 4601. In some non-limiting examples, the lateral extent of the triangular signal-exchange second sub-pixel profile 4652 may neither overlap with the lateral extent of the corresponding display second sub-pixel profile 4601 nor with at least one transmissive region 254. a 254 b 254 c The lateral extent of any (subset) of the second subpixel contour 4601 overlaps with that of at least one transmissive region 254. In some non-limiting examples, the lateral extent of the second subpixel contour 4601 may overlap with at least one transmissive region 254. a 254 b 254 c The lateral extents of at least one of the subsets overlap.

[0420] By comparison, at least one instance of the triangular signal-exchange third sub-pixel profile 4752 in the (sub)pixel arrangement 400u is shown as superimposed on an example of the corresponding display third sub-pixel profile 4701. In some non-limiting examples, the lateral extent of the triangular signal-exchange third sub-pixel profile 4752 may neither overlap with the lateral extent of the corresponding display third sub-pixel profile 4701 nor with at least one transmissive region 254. a 254 b 254 c The lateral extent of any (subset) overlaps with that of the third subpixel contour 4701. In some non-limiting examples, the lateral extent of the third subpixel contour 4701 may overlap with at least one transmissive region 254. a 254 b 254 c The lateral extents of at least one of the subsets overlap.

[0421] In some non-limiting examples, as shown in the figure, each of the triangular first signal exchange sub-pixel contour 4552, second signal exchange sub-pixel contour 4652, and third signal exchange sub-pixel contour 4752 can be jointly positioned at the corresponding extreme values ​​of its corresponding first display sub-pixel contour 4501, second display sub-pixel contour 4601, and third display sub-pixel contour 4701, so that the transmission region 254 disposed therebetween... b Maximize the size of at least one subset of (a subset of).

[0422] In some non-limiting examples, as shown in the figure, the transmission region 254b The transmission boundary 415 may encroach on the perimeter of at least one of the first display sub-pixel contour 4501, the second display sub-pixel contour 4601, and the third display sub-pixel contour 4701, while maintaining the minimum distance between at least one of the closest first sub-pixel segments among the first sub-pixel segments 451-454, the closest second sub-pixel segments among the second sub-pixel segments 461-464, and the closest third sub-pixel segments among the third sub-pixel segments 471-474.

[0423] Although not shown, in some non-limiting examples, the transmission region 254 a 254 c Another subset of the subset can also be expanded, including but not limited to, expanding to the transmission region 254. b The degree of a subset of, or an expansion to an intermediate degree in between.

[0424] Now go to Figure 4V The diagram illustrates a signal exchange portion 303 of a display panel 300, wherein an example (sub)pixel arrangement 400v repeats across its lateral orientation. In some non-limiting examples, the (sub)pixel arrangement 400v includes a first three sub-pixels 260 pixels 1215 positioned substantially in a conventional RGB configuration, but one sub-pixel of the sub-pixels 260 (in the figure, a third sub-pixel 2603) is laterally moved to one side; and a second three sub-pixels 260 pixels 1215, wherein the corresponding sub-pixels 260 are laterally moved to their opposite side, such that a transmissive region 250 can be inserted between the instances of the moved sub-pixels 260. In some non-limiting examples, a substantially quadrilateral shape of contour 438 enclosing each pixel 1215 may exist. In some non-limiting examples, the transmissive region 250 may overlap with the boundary of contour 438.

[0425] Now go to Figure 4W The diagram illustrates a signal exchange portion 303 of a display panel 300, wherein an example (sub)pixel arrangement 400w repeats across its lateral orientation. In some non-limiting examples, the (sub)pixel arrangement 400w comprises an alternating array of subpixel groups 2605 and transmissive regions 25x. In some non-limiting examples, the subpixel groups 2605 and transmissive regions 25x may be arranged in a substantially checkerboard configuration. In some non-limiting examples, at least one of the subpixel groups 2605 and transmissive regions 25x may define a substantially rectangular configuration.

[0426] In some non-limiting examples, subpixel group 2605 may include each of a plurality of first subpixels 2601, second subpixels 2602, and third subpixels 2603. In some non-limiting examples, subpixel group 2605 may include each of two first subpixels 2601 and third subpixels 2603 and each of four second subpixels 2602, such that subpixel group 2605 can be considered as an equivalent of two 4-subpixel 260 (RGB in a 1:2:1 ratio) pixels 1215.

[0427] In some non-limiting examples, each of the plurality of second sub-pixels 2602 may have substantially the same size and configuration. In some non-limiting examples, each of the plurality of second sub-pixels 2602 may have a substantially rectangular configuration with a major axis and a minor axis. In some non-limiting examples, the plurality of second sub-pixels 2602 may be aligned along the sub-pixel group axis 2606 of the sub-pixel group 2605. In some non-limiting examples, the sub-pixel group axis 2606 may be substantially parallel to the sub-pixel group 2605. In some non-limiting examples, the sub-pixel group axis 2606 may be substantially parallel to the minor axis of the second sub-pixel 2602.

[0428] In some non-limiting examples, each second sub-pixel in the plurality of first sub-pixels 2601 may have substantially the same size and configuration. In some non-limiting examples, a first first sub-pixel in the first sub-pixel 2601 may be disposed substantially parallel to one side of the plurality of second sub-pixels 2602 along the sub-pixel group axis 2606 and toward one end of the sub-pixel group 2605, and a second first sub-pixel in the first sub-pixel 2601 may be disposed on the opposite side of the plurality of second sub-pixels 2602 and toward the opposite end of the sub-pixel group 2605 in the direction of the sub-pixel group axis 2606. In some non-limiting examples, the configuration of the second first sub-pixel in the first sub-pixel 2601 may be rotated 180° relative to the configuration of the first first sub-pixel in the first sub-pixel 2601.

[0429] In some non-limiting examples, each of the second sub-pixels in the plurality of third sub-pixels 2603 may have substantially the same size and configuration. In some non-limiting examples, a first third sub-pixel in the third sub-pixel 2603 may be disposed substantially parallel to the sub-pixel group axis 2606 on one side of the plurality of second sub-pixels 2602 and directed toward one end of the sub-pixel group 2605 in the direction of the sub-pixel group axis 2606; and a second third sub-pixel in the third sub-pixel 2603 may be disposed on the opposite side of the plurality of second sub-pixels 2602 and directed toward the opposite end of the sub-pixel group 2605 in the direction of the sub-pixel group axis 2606. In some non-limiting examples, a first third sub-pixel in the third sub-pixel 2603 may be disposed on the same side as the plurality of second sub-pixels 2602 and directed toward the opposite end of the sub-pixel group 2605 relative to a first first sub-pixel in the first sub-pixel 2601. In some non-limiting examples, the configuration of the second third sub-pixel in the third sub-pixel 2603 may be rotated 180° relative to the configuration of the first third sub-pixel in the third sub-pixel 2603.

[0430] In some non-limiting examples, the aperture ratio of the emission region 210 in the signal exchange section 303 of the display panel 300, in some non-limiting examples, considering the aperture ratios of all the emission regions 210 of the first sub-pixel 2601, the second sub-pixel 2602, and the third sub-pixel 2603, may be at least one of about 20%, 15%, 10%, and 8%.

[0431] In some non-limiting examples, the aperture ratio of the transmissive region 25x in the signal exchange portion 303 of the display panel 300 may be at least one of about 50%, 45%, 40%, 35%, 33%, 30%, and 25%.

[0432] In some non-limiting examples, the sum of the aperture ratios of the emitting region 210 and the transmissive region 25x in the signal exchange portion 303 of the display panel 300 may be one of approximately 30%-60%, 35%-60%, 40%-60%, 35%-55%, 40%-50%, 45%-55%, and 45%-50%.

[0433] In some non-limiting examples, in the signal exchange section 303 of the display panel 300, the aperture ratio of the emitting region 210 may be between about 5% and 10%, and the aperture ratio of the transmissive region 25x may be between about 30% and 50%. In some non-limiting examples, in the signal exchange section 303 of the display panel 300, the aperture ratio of the emitting region 210 may be between about 6% and 9%, and the aperture ratio of the transmissive region 25x may be between about 35% and 45%.

[0434] Transition area

[0435] In some non-limiting examples, one measure for reducing apparent or visually perceived differences between the aperture ratios of the emission regions 210, such as in the signal exchange portion 303 of the display panel 300 and the display portion 307, may include establishing at least one transition region 500 around at least one of the signal exchange portion 303 and the display portion 307 of the display panel 300 and / or between the signal exchange portion and the display portion. Figure 5 Each transition region has at least one of the aperture ratio, size, shape, and orientation of the emission region 210, so that the increased lateral orientation across the display panel 300 disperses this apparent or visually perceived difference between the signal exchange portion and the display portion.

[0436] In some non-limiting examples, such a transition region 500 may be introduced, wherein the signal exchange portion 303 is characterized by a pixel density substantially equal to that of the display portion 307, wherein at least one of the size, shape, and configuration of the (sub)pixels 1215 / 260 in the signal exchange portion is reduced to accommodate the introduction of the transmissive region 25x therein.

[0437] In some non-limiting examples, at least one transition region 500 may be arranged along the periphery or boundary of at least one of the signal exchange portion 303 and the display portion 307, including but not limited to surrounding the at least one.

[0438] Now go to Figure 5 The diagram shows a segment 303a of the signal exchange section 303, a segment 307a of the display section 307, and a segment 500a of at least one transition region 500 extending laterally between them. It will be understood that between the shown display section segment 307a and transition region segment 500a, other portions of the display panel 300 may exist, which may include at least one of the following: segments of the same display section 307, at least one segment of a different display section 307, segments of the same transition region 500, and at least one different transition region 500.

[0439] In some non-limiting examples, the pixel density of (sub)pixels 1215 / 260 in signal exchange section 303 may be the same as that in transition region 500 and display section 307. However, based on a comparison between signal exchange section segment 303a and transition region segment 500a and display section segment 307a, in some non-limiting examples, at least one of the size, shape, configuration, and spacing of these (sub)pixels in transition region 500 may be changed relative to at least one of the corresponding size, shape, configuration, and spacing of (sub)pixels 1215 / 260 in display section 307, including but not limited to reducing the size; and in some non-limiting examples, at least one of the size, shape, configuration, and spacing of these (sub)pixels in signal exchange section 303 may be changed relative to at least one of the corresponding size, shape, configuration, and spacing of (sub)pixels 1215 / 260 in transition region 500, including but not limited to reducing the size.

[0440] Therefore, interpolating at least one transition region 500 between the signal exchange section 303 and the display section 307 can help reduce the apparent or visually perceived differences between pixel densities in the signal exchange section 303 and the display section 307.

[0441] Subpixels 260 are shown in each segment 303a, 500a, 307a as having a substantially square shape, with different sizes from the third subpixel 2603 (largest) to the first subpixel 2601 and then to the second subpixel 2602 (smallest), and in a four-subpixel (RGB in a 1:2:1 ratio) pixel 1215 frame configuration, for illustrative purposes only, and the examples discussed herein, including but not limited to those in the (sub)pixel arrangement 300 (with or without omitted (sub)pixels 1215 / 260 and / or the transmissive region 25x), should not be considered to in any way limit any of the size, shape, configuration, orientation, pixel density, and spacing of the (sub)pixels 1215 / 260 in the signal exchange section 303, the transition region 500, or the display section 307.

[0442] The transmissive region 25x is shown in each segment as having a substantially circular shape and substantially uniform size and orientation for illustrative purposes only, and the examples discussed herein, including but not limited to any of these sub-pixel configurations having or not having omitted sub-pixels 1215 / 260 and / or transmissive regions 25x in the sub-pixel arrangement 300, should not be considered as limiting in any way any of the size, shape, configuration, orientation, pixel density, and spacing of the sub-pixels 1215 / 260 in the signal exchange section 303, transition region 500, or display section 307.

[0443] Although in this disclosure, the transmissive region 25x has been shown as a discrete feature between the emitting regions 210 arranged in the signal exchange portion 303 of the display panel 300, in some non-limiting examples, although not shown, at least one transmissive region 25x may be formed continuously such that the at least one transmissive region extends laterally across and substantially around the plurality of emitting regions 210.

[0444] In some non-limiting examples, the transmission region 25x may be configured to omit or reduce the presence of at least one of the various active region layers (including, but not limited to, the anode, cathode, and at least one semiconducting layer 230 therebetween) to enhance the transmission of external EM radiation through it. In some non-limiting examples, the average layer thickness of the second electrode 240 in the transmission region 25x may not exceed the average layer thickness of another region of the display panel 300. In some non-limiting examples, the average layer thickness of the second electrode 240 in the transmission region 25x may not exceed the average layer thickness of the second electrode in the emission region 210. In some non-limiting examples, the transmission region 25x may be substantially free of the sealing coating 140 for the active region layer material (“second electrode material”) used to form the second electrode 240.

[0445] Non-launch area

[0446] In some non-limiting examples, various emitting regions 210 of the device 200 may be substantially surrounded and separated by at least one non-emitting region 211 in at least one lateral direction, wherein at least one of the structures and configurations of the device 200 shown along the longitudinal orientation may vary to substantially suppress EM radiation emitted therefrom.

[0447] In some non-limiting examples, non-emission region 211 may include those regions that are substantially without emission region 210 in a lateral orientation.

[0448] In some non-limiting examples, the longitudinal topology of various layers of at least one semiconductive layer 230 may be varied to define at least one emission region 210 surrounded by at least one non-emission region 211 (at least in one lateral direction).

[0449] In some non-limiting examples, the emission region 210 corresponding to a single display (sub)pixel 1215 / 260 can be understood as having a lateral orientation and being surrounded by at least one non-emission region 211 in at least one lateral direction.

[0450] Now, a non-limiting example of a specific implementation of the longitudinal orientation of a device 200 applied to an emission region 210 corresponding to a single display (sub)pixel 1215 / 260 of display 200 will be described. Although features of this specific implementation are shown as specific to emission region 210, those skilled in the art will understand that in some non-limiting examples, more than one emission region 210 may cover common features.

[0451] In some non-limiting examples, the lateral orientation of the surrounding non-emission region 211 can be characterized by the presence of the corresponding PDL 209.

[0452] In some non-limiting examples, the thickness of the PDL 209 may increase from a minimum at the end covering the first electrode 220 to a maximum beyond the lateral extent of the first electrode 220. In some non-limiting examples, the thickness variation of at least one PDL 209 may define a valley shape centered on the emission region 210. In some non-limiting examples, the valley shape may constrain the field of view (FOV) of the EM radiation emitted by the emission region 210.

[0453] While the PDL 209 is generally shown herein as having a linearly sloping surface to form a valley-shaped configuration defining the emission region 210 surrounded therearound, those skilled in the art will understand that in some non-limiting examples, at least one of the shape, aspect ratio, thickness, width, and configuration of such a PDL 209 may vary. In some non-limiting examples, the PDL 209 may be formed having either substantially steep portions or more gently sloping portions. In some non-limiting examples, such a PDL 209 may be configured to extend substantially vertically away from the surface on which it is deposited, which may cover at least one edge of the first electrode 220. In some non-limiting examples, such a PDL 209 may be configured to deposit at least one semiconductive layer 230 thereon by solution processing techniques (including, but not limited to, printing, including, but not limited to, inkjet printing).

[0454] In some non-limiting examples, PDL 209 may be deposited substantially over TFT insulating layer 207, although, as shown, in some non-limiting examples, PDL 209 may also extend over at least a portion (including but not limited to its outer edge) of the deposited first electrode 220.

[0455] In some non-limiting examples, the lateral extent of at least one of the non-emission regions 211 may be at least the lateral extent of the emission region 210 interposed between them, and in some non-limiting examples exceed that lateral extent, including but not limited to multiples thereof.

[0456] In some non-limiting examples, the thickness of at least one PDL 209 in at least one signal transmission region 25x, (in some non-limiting examples) the thickness of at least one non-emissive region 211 ((these non-emissive regions are placed between adjacent emissive regions 210, in some non-limiting examples, at least in regions laterally spaced therefrom) and (in some non-limiting examples; although not shown) the thickness of the TFT insulating layer 207 may all be reduced in order to increase at least one of the transmittance and transmittance angle relative to and through the layer of the display panel 300 to facilitate the transmission of EM radiation through it.

[0457] Patterning

[0458] In some non-restrictive examples, see reference. Figure 1 In some non-limiting examples, the patterned coating 110 containing patterned material 611 (which may be NIC material in some non-limiting examples) may be disposed as a sealing coating 140 on the exposed layer surface 11 of the lower layer 910 (including but not limited to substrate 10) of device 100. In some non-limiting examples, the lateral extent is limited by selective deposition (including but not limited to the use of a shadow mask 615, such as but not limited to a fine metal mask (FMM), including but not limited to the first portion 101).

[0459] Therefore, in some non-limiting examples, in the second part 102 of device 100, the exposed surface 11 of the lower layer 910 of device 100 may be substantially without the closed coating 140 of patterned coating 110.

[0460] In some non-restrictive examples, see reference. Figure 1 In some non-limiting examples, the patterned coating 110 containing patterned material 611 (which may be NIC material in some non-limiting examples) may be disposed as a sealing coating 140 on the exposed layer surface 11 of the lower layer 910 (including but not limited to substrate 10) of device 100. In some non-limiting examples, the lateral extent is limited by selective deposition (including but not limited to the use of a shadow mask 615, such as but not limited to an FMM, including but not limited to the first portion 101).

[0461] Therefore, in some non-limiting examples, in the second part 102 of device 100, the exposed surface 11 of the lower layer 910 of device 100 may be substantially without the closed coating 140 of patterned coating 110.

[0462] Patterned coating

[0463] The patterned coating 110 may include a patterned material 611. In some non-limiting examples, the patterned material 611 may include a NIC material. In some non-limiting examples, the patterned coating 110 may include a sealing coating 140 of the patterned material 611.

[0464] The patterned coating 110 provides an exposed layer surface 11 having a substantially low tendency to deposit the deposited material 731 to be deposited on the exposed layer surface after such surface is exposed to a vapor flux 732 of the deposited material 731 (including, but not limited to, a substantially low initial adhesion probability (in some non-limiting examples, under the conditions confirmed in the dual QCM technique described by Walker et al.)). In some non-limiting examples, this substantially low tendency may be significantly less than the tendency to deposit the deposited material 731 to be deposited on the exposed layer surface 11 of the lower layer 910 of the device 100 (on which the patterned coating 110 has been deposited).

[0465] Due to the properties of at least one of the patterned coating 110 and the patterned material 611 for the deposition of the deposited material 731 (including, but not limited to, a low initial adhesion probability) (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100), the exposed surface 11 of the first portion 101 of the patterned coating 110 may be substantially free of the sealing coating 140 of the deposited material 731.

[0466] In some non-limiting examples, exposing device 100 to a vapor flux 732 of deposited material 731 may result in a sealing coating 140 of deposited material 731 being formed in the second portion 102, wherein the exposed surface 11 of the lower layer 910 may be substantially free of the sealing coating 140 of patterned coating 110.

[0467] In some non-limiting examples, the patterned coating 110 may be a NIC that provides high deposition (patterning) contrast relative to subsequent deposition of the deposited material 731, such that the deposited material 731 does not tend to deposit as a closed coating 140 in some non-limiting examples, where the patterned coating 110 has already been deposited.

[0468] In some non-limiting examples, there may be scenarios where a patterned coating 110 is required to induce the formation of at least one discontinuous layer 160 of particulate structure 150 when the patterned coating 110 in the first portion 101 is subjected to a vapor flux 732 of the deposited material 731. In at least some applications, the properties of the patterned coating 110 may allow a closed coating 140 of the deposited material 731 to be formed in a second portion 102, which may be substantially free of the patterned coating 110, while a discontinuous layer 160 of at least one particulate structure 150 having only at least one characteristic may be formed on the patterned coating 110 in the first portion 101.

[0469] For the purpose of simplifying the discussion, in this disclosure, the patterned coating 110 may be designated as a particulate structure patterned coating 110, with regard to the deposition of the patterned coating 110 to serve as a substrate for depositing at least one particulate structure 150 thereon. p In contrast, with regard to the fact that the patterned coating 110 is deposited in the first portion 101 to substantially prevent the formation of the sealing coating 140 of the deposited layer 130 in such the first portion 101, thereby confining the deposition of the sealing coating 140 of the deposited layer 130 to the second portion 102, this patterned coating 110 can be designated as a non-particulate patterned coating 110. n Those skilled in the art will understand that, in some non-limiting examples, the patterned coating 110 can serve as a granular structure patterned coating 110. p Non-particulate patterned coating 110 n Both.

[0470] In some non-limiting examples, the following scenario may exist: a discontinuous layer 160 of at least one particulate structure 150 of the deposited material 731 needs to be formed in the second part 102 (in some non-limiting examples, the deposited material may be one of metals and metal alloys (metal / alloy), including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg), while depositing a closed coating 140 of the deposited material 731 having a thickness not limited to one of about 100 nm, 50 nm, 25 nm and 15 nm. In some non-limiting examples, the amount of deposited material 731 deposited in the first portion 101 as a discontinuous layer 160 of at least one particulate structure 150 may correspond to one of about 1%-50%, 2-25%, 5-20%, and 7-10% of the amount of deposited material 731 deposited in the second portion 102 as a sealing coating 140. As a non-limiting example, the sealing coating may correspond to a thickness not exceeding one of at least one of about 100 nm, 75 nm, 50 nm, 25 nm, and 15 nm.

[0471] In some non-limiting examples, the patterned coating 110 may be patterned, the pattern being defined by at least one area of ​​a closed coating 140 in which there may be substantially no patterned coating 110.

[0472] In some non-limiting examples, the at least one region may separate the patterned coating 110 into a plurality of discrete segments. In some non-limiting examples, the plurality of discrete segments of the patterned coating 110 may be physically spaced apart from each other in their lateral orientation. In some non-limiting examples, the plurality of discrete segments of the patterned coating 110 may be arranged in a regular structure (including, but not limited to, an array (matrix)) such that, in some non-limiting examples, the discrete segments of the patterned coating 110 may repeat a pattern construction.

[0473] In some non-limiting examples, at least one of the plurality of discrete segments of the patterned coating 110 may each correspond to an emission region 210. In some non-limiting examples, the aperture ratio of the emission region 210 may be no more than one of about 50%, 40%, 30%, and 20%.

[0474] In some non-limiting examples, the patterned coating 110 may be formed as a single monolithic coating.

[0475] Properties of patterned coatings / materials

[0476] composition

[0477] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 may include at least one of fluorine (F) atoms and silicon (Si) atoms. As a non-limiting example, the patterned material 611 used to form the patterned coating 110 may be a compound containing at least one of F and Si.

[0478] In some non-limiting examples, the patterning material 611 may include a compound containing F. In some non-limiting examples, the patterning material 611 may include a compound containing F and carbon atoms. In some non-limiting examples, the patterning material 611 may include a compound containing F and C, wherein the atomic ratio of F to C corresponds to an F / C quotient of at least one of about 0.5, 0.7, 1, 1.5, 2, and 2.5.

[0479] In some non-limiting examples, the atomic ratio of F to C can be determined by counting the F atoms present in the compound structure, and for C atoms, only counting the sp atoms present in the compound structure. 3The hybrid C atoms are counted. In some non-limiting examples, the patterned material 611 may include a compound comprising F and C portions as part of its molecular substructure, wherein the ratio of F to C atoms corresponds to an F / C quotient of at least one of about 1, 1.5, and 2.

[0480] In some non-limiting examples, the patterned material 611 may include an organic-inorganic hybrid material.

[0481] In some non-limiting examples, the patterned material 611 may include oligomers.

[0482] In some non-limiting examples, the patterning material 611 may include a compound having a molecular structure comprising a backbone and at least one functional group bonded to the backbone. In some non-limiting examples, the backbone may be an inorganic portion, and the at least one functional group may be an organic portion.

[0483] In some non-limiting examples, the compound may have a molecular structure including a siloxane group. In some non-limiting examples, the siloxane group may be one of a straight-chain siloxane group, a branched siloxane group, and a cyclic siloxane group. In some non-limiting examples, the main chain may include a siloxane group. In some non-limiting examples, the main chain may include a siloxane group and at least one functional group containing F. In some non-limiting examples, the at least one functional group containing F may be a fluoroalkyl group. In some non-limiting examples, such compounds may include fluorosiloxanes, including but not limited to Example Material 6 and Example Material 9 (discussed below).

[0484] In some non-limiting examples, the compound may have a molecular structure including a silsesquioxane group. In some non-limiting examples, the silsesquioxane group may be a POSS. In some non-limiting examples, the main chain may include a silsesquioxane group. In some non-limiting examples, the main chain may include a silsesquioxane group and at least one functional group containing F. In some non-limiting examples, the at least one functional group containing F may be a fluoroalkyl group. In some non-limiting examples, such compounds may include fluoro-silsesquioxanes and fluoro-POSS, including but not limited to Example Material 8 (discussed below).

[0485] In some non-limiting examples, the compound may have a molecular structure comprising at least one of a substituted aryl group, an unsubstituted aryl group, a substituted heteroaryl group, and an unsubstituted heteroaryl group. In some non-limiting examples, the aryl group may be at least one of phenyl and naphthyl. In some non-limiting examples, at least one C atom of the aryl group may be substituted with a heteroatom (as a non-limiting example, at least one of O, N, and S) to derive a heteroaryl group. In some non-limiting examples, the main chain may comprise at least one of a substituted aryl group, an unsubstituted aryl group, a substituted heteroaryl group, and an unsubstituted heteroaryl group. In some non-limiting examples, the main chain may comprise at least one of a substituted aryl group, an unsubstituted aryl group, a substituted heteroaryl group, and an unsubstituted heteroaryl group, and at least one functional group containing F. In some non-limiting examples, at least one functional group containing F may be a fluoroalkyl group.

[0486] In some non-limiting examples, the compound may have a molecular structure comprising at least one of a substituted hydrocarbon group, an unsubstituted hydrocarbon group, a straight-chain hydrocarbon group, a branched hydrocarbon group, and a cyclic hydrocarbon group. In some non-limiting examples, at least one C atom of the hydrocarbon group may be substituted with a heteroatom, which includes, but is not limited to, at least one of O, N, and S.

[0487] In some non-limiting examples, the compound may have a molecular structure including a phosphazene group. In some non-limiting examples, the phosphazene group may be at least one of a straight-chain phosphazene group, a branched phosphazene group, and a cyclic phosphazene group. In some non-limiting examples, the main chain may include a phosphazene group. In some non-limiting examples, the main chain may include a phosphazene group and at least one functional group containing F. In some non-limiting examples, the at least one functional group containing F may be a fluoroalkyl group. Non-limiting examples of such compounds include fluorophosphazenes. A non-limiting example of such a compound is Example Material 4 (discussed below).

[0488] In some non-limiting examples, the compound may be a fluoropolymer. In some non-limiting examples, the compound may be a block copolymer containing F. In some non-limiting examples, the compound may be an oligomer. In some non-limiting examples, the oligomer may be a fluorinated oligomer. In some non-limiting examples, the compound may be a block oligomer containing F. Non-limiting examples of at least one of the fluoropolymers and fluorinated oligomers are those having the molecular structure of at least one of Example Material 3, Example Material 5, and Example Material 7 (discussed herein).

[0489] In some non-limiting examples, the compound may be a metal complex. In some non-limiting examples, the metal complex may be an organometallic complex. In some non-limiting examples, the organometallic complex may contain F. In some non-limiting examples, the organometallic complex may include at least one ligand containing F. In some non-limiting examples, the at least one ligand containing F may include a fluoroalkyl group.

[0490] In some non-limiting examples, the patterned material 611 may include a variety of different materials.

[0491] Initial sticking probability

[0492] In some non-limiting examples, the initial adhesion probability of the patterned material 611 can be determined by depositing such material as at least one of a film or coating, and in an environment similar to the deposition of the patterned coating 110 within the device 100, having a sufficient thickness to mitigate / reduce any effect on the degree of intermolecular interaction with the underlying layer 910 when deposited on the surface. In some non-limiting examples, the initial adhesion probability can be measured on films / coatings with thicknesses of at least about 20 nm, 25 nm, 30 nm, 50 nm, 60 nm, and 100 nm.

[0493] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have an initial adhesion probability to the deposition of the deposited material 731 of no more than one of about 0.3, 0.2, 0.15, 0.1, 0.08, 0.05, 0.03, 0.02, 0.01, 0.008, 0.005, 0.003, 0.001, 0.0008, 0.0005, 0.0003, and 0.0001.

[0494] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have an initial adhesion probability for the deposition of at least one of Ag and Mg, not exceeding one of about 0.3, 0.2, 0.15, 0.1, 0.08, 0.05, 0.03, 0.02, 0.01, 0.008, 0.005, 0.003, 0.001, 0.0008, 0.0005, 0.0003, and 0.0001.

[0495] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a polarity of about 0.15-0.0001, 0.1-0.0003, 0.08-0.0005, or 0.08-0.0008. 0.05-0.001, 0.03-0.0001, 0.03-0.0003, 0.03-0.0005, 0.03-0.0008, 0.03-0.001, 0.03-0.005, 0.03-0.008, 0.03-0.01, 0.02-0.0001, 0.02-0.0003, 0.02-0.0005, 0.02-0.0 008, 0.02-0.001, 0.02-0.005, 0.02-0.008, 0.02-0.01, 0.01-0.0001, 0.01-0.0003, 0.01-0.0005, 0.01-0.0008, 0.01-0.001, 0.01-0.005, 0.01-0.008, 0.008-0.0001, 0.008- The initial adhesion probability of the deposition of the depositional material 731 is one of the following values: 0.0003, 0.008-0.0005, 0.008-0.0008, 0.008-0.001, 0.008-0.005, 0.005-0.0001, 0.005-0.0003, 0.005-0.0005, 0.005-0.0008, and 0.005-0.001.

[0496] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have an initial adhesion probability for the deposition of the various deposited materials 731 not exceeding a threshold. In some non-limiting examples, such a threshold may be one of about 0.3, 0.2, 0.18, 0.15, 0.13, 0.1, 0.08, 0.05, 0.03, 0.02, 0.01, 0.008, 0.005, 0.003, and 0.001.

[0497] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have an initial adhesion probability of no more than such a threshold for the deposition of a plurality of deposition materials 731 selected from at least one of Ag, Mg, Yb, Cd, and Zn. In some non-limiting examples, the patterned coating 110 may exhibit an initial adhesion probability of no more than such a threshold for the deposition of a plurality of deposition materials 731 selected from at least one of Ag, Mg, and Yb.

[0498] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may exhibit an initial adhesion probability for the deposition of the first deposited material 731 equal to, but not limited to, a first threshold, and an initial adhesion probability for the deposition of the second deposited material 731 equal to, but not limited to, a second threshold, lower than a second threshold. In some non-limiting examples, the first deposited material 731 may be Ag, and the second deposited material 731 may be Mg. In some non-limiting examples, the first deposited material 731 may be Ag, and the second deposited material may be Yb. In some non-limiting examples, the first deposited material 731 may be Yb, and the second deposited material 731 may be Mg. In some non-limiting examples, the first threshold may exceed the second threshold.

[0499] In some non-limiting examples, there may be a scenario where a patterned coating 110 is required to induce the formation of at least one discontinuous layer 160 of particulate structure 150 when the patterned coating 110 is subjected to a vapor flux 732 of the deposited material 731. In some non-limiting examples, the patterned coating 110 may exhibit a substantially low initial adhesion probability, such that a closed coating 140 of the deposited material 731 may be formed in a second portion 102, which may be substantially free of the patterned coating 110, while a discontinuous layer 160 of at least one particulate structure 150 having at least one characteristic may be formed on the patterned coating 110 in the first portion 101. In some non-limiting examples, there may be a scenario where a discontinuous layer 160 of at least one particulate structure 150 of deposited material 731 needs to be formed in the second portion 102 (in some non-limiting examples, the deposited material may be one of a metal and a metal alloy), while simultaneously depositing a sealing coating 140 of deposited material 731 having a thickness, for example, not exceeding one of about 100 nm, 50 nm, 25 nm, and 15 nm. In some non-limiting examples, the amount of deposited material 731 deposited in the first portion 101 as the discontinuous layer 160 of at least one particulate structure 150 may correspond to one of about 1%-50%, 2-25%, 5-20%, and 7-10% of the amount of deposited material 731 deposited in the second portion 102 as the sealing coating 140, and in some non-limiting examples, the sealing coating may correspond to a thickness not exceeding one of at least one of about 100 nm, 75 nm, 50 nm, 25 nm, and 15 nm.

[0500] In some non-limiting examples, there may be a positive correlation between the initial adhesion probability of the deposition of the deposited material 731 on at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) and the average layer thickness of the deposited material 731 thereon.

[0501] Transmittance

[0502] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a transmittance of at least a threshold transmittance value for EM radiation after being subjected to a vapor flux 732 of the deposited material 731, including but not limited to Ag.

[0503] In some non-limiting examples, this transmittance can be measured under typical conditions suitable for depositing electrodes of optoelectronic device 200 (in some non-limiting examples, which may be the cathode of organic light-emitting diode (OLED) device 200) after at least one of the patterned coating 110 and patterned material 611 formed as a thin film is exposed to a vapor flux 732 of deposited material 731 (including but not limited to at least one of metals and alloys, including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg)).

[0504] In some non-limiting examples, the conditions under which the exposed layer surface 11 is subjected to a vapor flux 732 of the deposited material 731 (including, but not limited to, at least one of metals and alloys, including, but not limited to, at least one of Yb, Ag, Mg and Ag-containing materials (including, but not limited to, MgAg)) may include: maintaining a vacuum pressure at a reference pressure, including, but not limited to, about 10 -4 To and 10 -5 One of the deposited materials 731 (including, but not limited to, at least one of metals and alloys, including, but not limited to, at least one of Yb, Ag, Mg and Ag-containing materials (including, but not limited to, MgAg)) has a vapor flux 732 that is substantially consistent with a reference deposition rate, which includes, but is not limited to, about 1 angstrom. / second, which can be monitored using QCM in some non-limiting examples; the vapor flux 732 of the deposited material 731 is directed to the exposed layer surface 11 at an angle substantially close to the plane perpendicular to the exposed layer surface 11; the exposed layer surface 11 is subjected to the vapor flux 732 of the deposited material 731 (including but not limited to at least one of metals and alloys, including but not limited to Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg)) until a reference average layer thickness of including but not limited to about 15 nm is reached; and upon reaching such a reference average layer thickness, the exposed layer surface 11 is not further subjected to the vapor flux of the deposited material 731 (including but not limited to at least one of metals and alloys, including but not limited to Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg)).

[0505] In some non-limiting examples, the exposed layer surface 11 subjected to a vapor flux 732 of the deposited material 731 (including but not limited to at least one of Yb, Ag, Mg, and Ag-containing materials (including but not limited to MgAg)) may be substantially at room temperature (e.g., about 25°C). In some non-limiting examples, the exposed layer surface 11 subjected to a vapor flux 732 of the deposited material 731 (including but not limited to at least one of metals and alloys, including but not limited to Yb, Ag, Mg, and Ag-containing materials (including but not limited to MgAg)) may be positioned about 65 cm away from the evaporation source, through which the deposited material 731 (including but not limited to at least one of metals and alloys, including but not limited to Yb, Ag, Mg, and Ag-containing materials (including but not limited to MgAg)) evaporates.

[0506] In some non-limiting examples, the threshold transmittance value can be measured at a wavelength in the visible spectrum, which may be at least about 460 nm, 500 nm, 550 nm, and 600 nm. In some non-limiting examples, the threshold transmittance value can be measured at a wavelength in at least one of the IR and NIR spectra. In some non-limiting examples, the threshold transmittance value can be measured at a wavelength, which may be about 700 nm, 900 nm, and 1000 nm. In some non-limiting examples, the threshold transmittance value may be expressed as a percentage of the incident EM power that can be transmitted through the sample. In some non-limiting examples, the threshold transmittance value may be at least about 60%, 65%, 70%, 75%, 80%, 85%, and 90%.

[0507] Those skilled in the art will understand that high transmittance generally indicates the absence of a sealing coating 140 containing deposited material 731 (including, but not limited to, at least one of Yb, Ag, Mg, and Ag-containing materials (including, but not limited to, MgAg)). On the other hand, low transmittance generally indicates the presence of a sealing coating 140 containing deposited material 731 (including, but not limited to, Yb, Ag, Mg, and Ag-containing materials (including, but not limited to, MgAg)) because the metal film (especially when formed as a sealing coating 140) can exhibit high absorption of EM radiation.

[0508] A series of samples were fabricated to measure the transmittance of the example material and to visually observe whether an Ag-sealing coating 140 was formed on the exposed surface 11 of this example material. This was achieved by depositing an example material coating approximately 50 nm thick on a glass substrate 10, followed by subjecting the exposed surface 11 of the coating to approximately... Each sample was prepared by applying an Ag vapor flux of 732 at a rate up to approximately 15 nm to a reference layer thickness. Each sample was then visually analyzed, and the transmittance through each sample was measured.

[0509] The molecular structures of the example materials used in the samples in this article are listed in Table 1 below:

[0510] Table 1

[0511]

[0512]

[0513]

[0514]

[0515] Those skilled in the art will understand that a sample having little to no deposited material 731 (including, but not limited to, at least one of metals and alloys, including, but not limited to, at least one of Yb, Ag, Mg, and Ag-containing materials (including, but not limited to, MgAg)) can be substantially transparent, while a sample having a large amount of at least one of metals and alloys deposited thereon (including, but not limited to, as a sealing coating 140) can exhibit significantly reduced transmittance in some non-limiting examples. Therefore, the performance of various example coatings as patterned coating 110 can be evaluated by measuring the transmittance through the sample, which can be inversely correlated with at least one of the amount of deposited material 731 deposited thereon and the average layer thickness, including, but not limited to, at least one of metals and alloys, including, but not limited to, in the form of at least one of Yb, Ag, Mg, and Ag-containing materials (including, but not limited to, MgAg), because metal films (including, but not limited to, when formed as sealing coating 140) can exhibit high absorption of EM radiation.

[0516] The presence of a substantially closed coating 140, in which a deposited material 731 in the form of Ag has been formed, was visually confirmed in the samples, and the presence of such a closed coating 140 in these samples was further confirmed by measuring the transmittance through the samples, which showed a transmittance of no more than about 50% at a wavelength of about 460 nm.

[0517] Furthermore, for samples in which the formation of a sealing coating 140 of deposited material 731 (in the form of Ag) was confirmed to be absent, the absence of such a sealing coating 140 in these samples was further confirmed by measuring the EM transmittance through it, which showed a transmittance of at least about 70% (EM radiation at a wavelength of about 460 nm).

[0518] The results are summarized in Table 2 below:

[0519] Table 2

[0520]

[0521]

[0522] Based on the foregoing, it was found that the materials used in the first 7 samples (HT211 to Example Material 2) in Tables 1 and 2, as well as Example Material 9, may have reduced applicability in some scenarios for suppressing the deposition of Deposition Material 731 thereon, including but not limited to at least one of metals and alloys, including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg).

[0523] On the other hand, it has been found that Example Materials 3 to Example Materials 8 may be suitable in some scenarios as patterned coatings 110 for suppressing the deposition of deposited material 731 thereon, including but not limited to at least one of metals and alloys, including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg).

[0524] Sedimentation contrast

[0525] In some non-limiting examples, when deposited on substrate 10, the material (including but not limited to patterned material 611) that can be used as a given at least one of metals and alloys (including but not limited to at least one of Mg, Ag and MgAg) may have substantially high deposition contrast.

[0526] In some non-limiting examples, if substrate 10 tends to act as nucleation promoting coating (NPC) 920 ( Figure 9A The coated portion (first portion 101) and the uncoated portion (second portion 102) are coated with a material (including but not limited to patterned material 611) that may act as a NIC to prevent the deposition of the deposited material 731. The deposited material includes but is not limited to at least one of metals and alloys (including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg)). The coated portion (first portion 101) and the uncoated portion (second portion 102) may tend to have at least one of different initial adhesion probabilities and nucleation rates, such that the deposited material 731 deposited thereon may tend to have different average film thicknesses.

[0527] As used herein, in this scenario, the quotient of the average film thickness of the deposited material 731 in the second portion 102 divided by the average film thickness of the deposited material in the first portion 101 is generally referred to as the deposition contrast. Therefore, if the deposition contrast is substantially high, the average film thickness of the deposited material 731 in the second portion 102 can be substantially greater than the average film thickness of the deposited material 731 in the first portion 101.

[0528] In some non-limiting examples, when deposited on substrate 10, the material of the NIC that can be used as a given deposition material 731 (including, but not limited to, patterning material 611) may have substantially high deposition contrast.

[0529] In some non-limiting examples, there may be a negative correlation between the initial adhesion probability of the deposition of the deposition material 731 and its deposition contrast of at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100), i.e., a low initial adhesion probability may be highly correlated with a high deposition contrast.

[0530] In some non-limiting examples, if the deposition contrast is substantially high, then little or no deposition of material 731 may occur in the first part 101 when the deposition of material 731 is sufficient to form its sealing coating 140 in the second part 102.

[0531] In some non-limiting examples, if the deposition contrast is substantially low, a discontinuous layer 160 of at least one particulate structure 150 of the deposition material 731 deposited in the first portion 101 may be present when the deposition of the deposition material 731 is sufficient to form a closed coating 140 in the second portion 102.

[0532] In some non-limiting examples, when the average layer thickness of the sealing coating 140 of the deposited material 731 in the second portion 102 is substantially small (including but not limited to not exceeding one of about 100 nm, 50 nm, 25 nm and 15 nm, including but not limited to forming nanoparticles (NPs) in the first portion 101), there may be scenarios where it is necessary to form at least one discontinuous layer 160 of at least one particulate structure 150 of the deposited material 731 in the first portion 101, wherein such NPs are required to absorb EM radiation, including but not limited to protecting the underlying layer 910 from EM radiation with a wavelength not exceeding about 460 nm.

[0533] In some non-limiting examples, in such scenarios, a deposition contrast of approximately 2-100, 4-50, 5-20, and 10-15 may be applicable.

[0534] In some non-limiting examples, materials with substantially low deposition contrast relative to the deposition of deposition material 731 (including, but not limited to, patterned material 611) may have reduced applicability in some scenarios where substantially high deposition contrast is required, including, but not limited to, scenarios where the average layer thickness of deposition material 731 in the first part 101 is large, including, but not limited to, at least one of about 95 nm, 45 nm, 20 nm, 10 nm and 8 nm.

[0535] In some non-limiting examples, materials with substantially low deposition contrast relative to the deposition of deposition material 731 (including, but not limited to, patterned material 611) may have reduced applicability in some scenarios requiring substantially high deposition contrast (including, but not limited to, scenarios where at least one of the sealing coating 140 and high-density particulate structure 150 is substantially absent in the first part 101, including, but not limited to, scenarios where the average layer thickness of deposition material 731 in the second part 102 is large (including, but not limited to, at least one of about 95 nm, 45 nm, 20 nm, 10 nm and 8 nm), including, but not limited to, scenarios where there is substantially no absorption of EM radiation in at least one of the visible spectrum and NIR spectrum (including, but not limited to, scenarios where increased transparency to EM radiation with a wavelength of at least about 460 nm is required).

[0536] In some non-limiting examples, when the average layer thickness of the sealing coating 140 of the deposited material 731 in the second part 102 is substantially high (including, but not limited to, at least about 95 nm, 45 nm, 20 nm, 10 nm, and 8 nm), materials with substantially low deposition contrast relative to the deposition of the deposited material 731 (including, but not limited to, patterned material 611) may be suitable in some scenarios where at least one of the discontinuous layer 160 of the granular structure 150 of the deposited material 731 in the first part 101 and a low-density granular structure is required. In some non-limiting examples, when the average layer thickness of the deposited material 731 in the second part 102 is substantially high, including, but not limited to, at least about 95 nm, 45 nm, 20 nm, 10 nm, and 8 nm, in some scenarios, a deposition contrast between about 2-100, 4-50, 5-20, and 10-15 may be suitable.

[0537] In some non-limiting examples, if a material (including but not limited to patterned material 611) has a substantially high initial adhesion probability to the deposition of at least one of metals and alloys (including but not limited to at least one of Mg, Ag and MgAg), such a material may tend to have a substantially low deposition contrast.

[0538] Surface energy

[0539] In some non-limiting examples, such as those relating to the materials used herein, characteristic surface energy may generally refer to the surface energy measured from such material.

[0540] In some non-limiting examples, characteristic surface energy can be measured from a surface formed by a material deposited (coated) in the form of a thin film.

[0541] Various methods and theories for determining the surface energy of solids are known.

[0542] In some non-limiting examples, the surface energy can be calculated (derived) based on a series of contact angle measurements, wherein various liquids can be brought into contact with the solid surface to measure the contact angle between the liquid-gas interface and the surface. In some non-limiting examples, the surface energy of the solid surface can be equal to the surface tension of the liquid having the highest surface tension that fully wets the surface.

[0543] In some non-limiting examples, the critical surface tension of the surface can be determined according to the Zissman method, as further detailed in WAZisman, Advances in Chemistry 43 (1964), pp. 1-51.

[0544] In some non-limiting examples, the characteristic surface energy of the material (including but not limited to patterned material 611) in the coating (including but not limited to patterned coating 110) can be determined by depositing the material as a substantially pure coating (e.g., a coating formed of substantially pure material) on the substrate 10 and measuring its contact angle with a suitable series of probe liquids.

[0545] In some non-limiting examples, the Zissman diagram can be used to determine what will result in complete wetting of the surface (i.e., a contact angle θ of 0°). c The highest surface tension value.

[0546] The materials suitable for providing the patterned coating 110 typically have low surface energy when deposited as a thin film (coating) on ​​a surface. In some non-limiting examples, materials with low surface energy may exhibit low intermolecular forces.

[0547] Without wishing to be bound by any particular theory, it is now assumed that materials with substantially high surface energy are applicable, at least in some applications requiring high-temperature reliability.

[0548] Without wishing to be bound by any particular theory, the inventors have now discovered that a patterned coating 110 comprising a material that exhibits substantially high surface energy when deposited as a thin film can, in some non-limiting examples, form a discontinuous layer 160 of at least one particulate structure 150 of the deposited material 731 in a first portion 101 and a closed coating 140 of the deposited material 731 in a second portion 102, including but not limited to cases where the thickness of the closed coating (as a non-limiting example) is no more than one of about 100 nm, 75 nm, 50 nm, 25 nm, and 15 nm.

[0549] In some non-limiting examples, a series of samples were fabricated to measure the critical surface tension of surfaces formed from various materials. The measurement results are summarized in Table 3:

[0550] Table 3

[0551]

[0552]

[0553] Based on the aforementioned measurements of the critical surface tension in Table 3 and previous observations regarding one of the substantially closed coatings 140 containing and without Ag in the form of deposited material 731, it has been found that materials forming substantially low surface energy surfaces when deposited as coatings (including but not limited to patterned coatings 110) (in some non-limiting examples, materials with a critical surface tension between about 13 dynes / cm and 20 dynes / cm and between about 13 dynes / cm and 19 dynes / cm) are suitable for forming patterned coatings 110 to inhibit the deposition of deposited material 731 (including but not limited to at least one of Yb, Ag, Mg, and Ag-containing materials (including but not limited to MgAg) thereon).

[0554] Without wishing to be bound by any particular theory, it can be assumed that materials forming surfaces with a surface energy of less than (as a non-limiting example) about 13 dynes / cm may be less suitable as patterning materials 611 in some scenarios because such materials may exhibit at least one of substantially poor adhesion to layers surrounding such materials, low melting point, and low sublimation temperature.

[0555] In some non-limiting examples, when deposited as a thin film (coating) on ​​the exposed layer surface 11, the material (including, but not limited to, patterned material 611, which may tend to act as deposited material 731 (including, but not limited to, at least one of metals and alloys, including, but not limited to, Mg, Ag and Ag-containing materials (including, but not limited to, MgAg)) may tend to exhibit substantially low surface energy)

[0556] In some non-limiting examples, when deposited as a thin film (coating) on ​​the exposed layer surface 11, the material (including, but not limited to, the patterned material 611) may tend to exhibit substantially low surface energy.

[0557] In some non-limiting examples, materials with substantially low surface energy (including, but not limited to, patterned material 611) may tend to exhibit substantially low intermolecular forces.

[0558] In some non-limiting examples, there may be scenarios where a patterned material 611 with a substantially low surface energy that is not excessively low may be required.

[0559] In some non-limiting examples, materials with substantially high surface energy (including but not limited to patterned material 611) may be suitable for some scenarios where optical techniques are used to detect films of such materials.

[0560] Without wishing to be bound by any particular theory, it may be assumed that, in some non-limiting examples, materials with substantially high surface energy (including but not limited to patterned material 611) may be suitable for some scenarios requiring substantially high temperature reliability.

[0561] In some non-limiting examples, when the average layer thickness of the continuous coating 140 of at least one of the metals and alloys in the second part 102 is substantially low (including but not limited to not exceeding one of about 100 nm, 50 nm, 25 nm and 15 nm), a material with substantially high surface energy (including but not limited to patterned material 611) that can be used as a NIC of at least one of the metals and alloys (including but not limited to Mg, Ag and Ag-containing materials (including but not limited to MgAg)) may be suitable in some scenarios where a discontinuous layer 160 of the particulate structure 150 of at least one of the metals and alloys in the first part 101 is required.

[0562] In some non-limiting examples, when the average layer thickness of the closed coating 140 of the deposited material 731 in the second part 102 is substantially high (including but not limited to at least one of about 95 nm, 45 nm, 20 nm, 10 nm and 8 nm), a material with substantially low surface energy (which can be used as a NIC of the deposited material 731, including but not limited to patterned material 611, the deposited material including but not limited to at least one of metals and alloys, including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg)) may be suitable in some scenarios where one of the discontinuous layer 160 of the particulate structure 150 of the deposited material 731 in the first part 101 and a low-density particulate structure is required.

[0563] In some non-limiting examples, the surface of at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within a device 100 containing the compound described herein) may exhibit a surface energy not exceeding one of about 24 dynes / cm, 22 dynes / cm, 20 dynes / cm, 18 dynes / cm, 16 dynes / cm, 15 dynes / cm, 13 dynes / cm, 12 dynes / cm and 11 dynes / cm.

[0564] In some non-limiting examples, and in various non-limiting examples, the surface values ​​herein may correspond to such values ​​measured at approximately normal temperature and pressure (NTP), which may correspond to a temperature of 20°C and an absolute pressure of 1 atm.

[0565] In some non-limiting examples, the surface energy may be at least one of about 6 dynes / cm, 7 dynes / cm and 8 dynes / cm.

[0566] In some non-limiting examples, the surface energy may be one of about 10 dynes / cm to 20 dynes / cm and 13 dynes / cm to 19 dynes / cm.

[0567] temperature

[0568] Glass transition temperature

[0569] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a glass transition temperature of at least one of about 300°C, 150°C, and 130°C, and not exceeding one of about 30°C, 0°C, -30°C, and -50°C.

[0570] Sublimation temperature

[0571] In some non-limiting examples, materials with substantially low intermolecular forces (including, but not limited to, patterned material 611) may tend to exhibit substantially low sublimation temperatures.

[0572] In some non-limiting examples, materials with substantially low sublimation temperatures (including, but not limited to, patterned material 611) may have reduced applicability for manufacturing processes that may require substantially precise control of the average layer thickness of the deposited material film.

[0573] In some non-limiting examples, materials with sublimation temperatures not exceeding one of about 140°C, 120°C, 110°C, 100°C, and 90°C (including but not limited to patterned material 611) may tend to encounter constraints on at least one of the deposition rate and average layer thickness of the film, which includes such materials that can be deposited using known deposition methods (including but not limited to vacuum thermal evaporation).

[0574] In some non-limiting examples, materials with substantially high sublimation temperatures (including, but not limited to, patterned material 611) may be suitable for some scenarios where substantially high precision is required in controlling the average layer thickness of films comprising such materials.

[0575] In some non-limiting examples, the patterning material may have a sublimation temperature between about 100°C-320°C, 120°C-300°C, 140°C-280°C, and 150°C-250°C. In some non-limiting examples, such a sublimation temperature may allow the patterning material 611 to be deposited substantially easily as a coating using PVD.

[0576] In some non-limiting examples, materials with substantially low intermolecular forces may exhibit substantially low sublimation temperatures.

[0577] In some non-limiting examples, materials with substantially low sublimation temperatures (including, but not limited to, patterned material 611) may have reduced applicability to manufacturing processes that may require substantially precise control of the average layer thickness of the closed coating 140.

[0578] In some non-limiting examples, materials with sublimation temperatures not exceeding one of about 140°C, 120°C, 110°C, 100°C, and 90°C (including but not limited to patterned material 611) may tend to encounter constraints on at least one of the deposition rate and average layer thickness of the film, which includes such materials that can be deposited using known deposition methods (including but not limited to vacuum thermal evaporation).

[0579] In some non-limiting examples, materials with substantially high sublimation temperatures (including, but not limited to, patterned material 611) may be suitable for some scenarios where substantially high precision is required in controlling the average layer thickness of films comprising such materials.

[0580] The sublimation temperature of a material (including, but not limited to, patterned material 611) can be determined using a variety of methods readily apparent to those skilled in the art, including, but not limited to, by sublimation in an evaporation source under substantially high vacuum (in some non-limiting examples, at approximately 10 °C). -4 Heating material in a crucible (including, but not limited to, a container) and by determining the achievable temperature, to perform at least one of the following:

[0581] ● Observe when the material begins to deposit onto the exposed layer surface 11 on the QCM installed at a fixed distance from the crucible;

[0582] ●Observe the specific deposition rate on the exposed layer surface 11 of the QCM mounted at a fixed distance from the crucible. In some non-limiting examples, for as well as

[0583] ● The threshold vapor pressure of the material is reached, which in some non-limiting examples is approximately 10. -4 To and 10 -5 One of the entrusted ones.

[0584] In some non-limiting examples, in order to determine the sublimation temperature, the QCM can be installed at a distance of approximately 65 cm from the crucible.

[0585] In some non-limiting examples, the patterned material 611 may have a sublimation temperature between about 100℃-320℃, 100℃-300℃, 120℃-300℃, 100℃-250℃, 140℃-280℃, 120℃-230℃, 130℃-220℃, 140℃-210℃, 140℃-200℃, 150℃-250℃ and 140℃-190℃.

[0586] Melting point

[0587] In some non-limiting examples, materials with substantially low intermolecular forces (including, but not limited to, patterned material 611) may tend to exhibit substantially low melting points.

[0588] In some non-limiting examples, materials with substantially low melting points (including, but not limited to, patterned material 611) may have reduced applicability in some scenarios where significant temperature reliability is required for temperatures not exceeding one of about 60°C, 80°C, and 100°C, in some non-limiting examples, because of the change in the physical properties of such materials at operating temperatures close to their melting points.

[0589] In some non-limiting examples, materials with a melting point of about 120°C may have reduced applicability in some scenarios where substantially high temperature reliability (including, but not limited to, at least about 100°C) is required.

[0590] In some non-limiting examples, materials with substantially high melting points (including, but not limited to, patterned material 611) may be suitable for some scenarios where substantially high temperature reliability is required.

[0591] In some non-limiting examples, at least one of the patterned coating 110 and its compounds may have a melting temperature of at least one of about 90°C, 100°C, 110°C, 120°C, 140°C, 150°C and 180°C.

[0592] Cohesive energy

[0593] According to Young's equation (Equation 13), the cohesive energy (fracture toughness / cohesive strength) of a material tends to be proportional to its surface energy (see Young, Thomas (1805) "An essay on the cohesion of fluids", Philosophical Transactions of the Royal Society of London, 95:65-87).

[0594] According to Lindemann’s criteria, the cohesive energy of a material may tend to be proportional to its melting temperature (see Nanda, KK, Sahu, SN and Behera, SN (2002), “Liquid-drop model for the size-dependent melting of low-dimensional systems” Phys. Rev. A. 66(1): 013208).

[0595] In some non-limiting examples, materials with substantially low intermolecular forces (including, but not limited to, patterned material 611) may tend to exhibit substantially low cohesive energy.

[0596] In some non-limiting examples, materials with substantially low cohesive energy (including, but not limited to, patterned material 611) may have reduced applicability in some scenarios requiring significant fracture toughness (including, but not limited to, devices 100 that may tend to withstand at least one of shear and bending stresses during at least one of manufacturing and use), because such materials may tend to crack (fracture) in such scenarios. In some non-limiting examples, materials with cohesive energy not exceeding about 30 dynes / cm (including, but not limited to, patterned material 611) may have reduced applicability in some scenarios of devices 100 fabricated on flexible substrate 10.

[0597] In some non-limiting examples, materials with substantially high cohesive energy (including but not limited to patterned material 611) may be suitable for some scenarios where substantially high reliability is required under at least one of shear stress and bending stress, including but not limited to devices 100 fabricated on flexible substrate 10.

[0598] In some non-limiting examples, materials with substantially low but not excessively low surface energy (including, but not limited to, patterned material 611) may be suitable for some scenarios where significant reliability is required under at least one of shear and bending stresses, including, but not limited to, devices 100 fabricated on flexible substrate 10.

[0599] Optical / bandgap

[0600] In this disclosure, semiconductor materials can be described as materials that typically exhibit a band gap. In some non-limiting examples, the band gap may be formed between the highest occupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO) of the semiconductor material. Semiconductor materials may therefore tend to exhibit conductivity substantially no greater than that of conductive materials (including, but not limited to, at least one of metals and alloys), but substantially at least as large as that of insulating materials (including, but not limited to, glass). In some non-limiting examples, the semiconductor material may include organic semiconductor materials. In some non-limiting examples, the semiconductor material may include inorganic semiconductor materials.

[0601] In some non-limiting examples, including but not limited to the optical bandgap of patterned material 611, the optical bandgap may tend to correspond to the HOMO-LUMO bandgap of that material.

[0602] In some non-limiting examples, materials with substantially large / wide optical (HOMO-LUMO bandgap) (including but not limited to patterned material 611) may tend to exhibit substantially weak, including but not limited to, photoluminescence in at least one of the deep blue region of the visible spectrum, the near-UV spectrum, the visible spectrum, and the NIR spectrum.

[0603] In some non-limiting examples, materials with substantially small HOMO-LUMO band gaps may be applicable in some scenarios where optical techniques are used to detect films of materials.

[0604] In some non-limiting examples, the optical bandgap of the patterned material 611 may be wider than the photon energy of the EM radiation emitted by the source, such that the patterned material 611 does not undergo photoexcitation when subjected to such EM radiation.

[0605] Refractive index and extinction coefficient

[0606] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a low refractive index.

[0607] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a refractive index of no more than one of about 1.55, 1.5, 1.45, 1.43, 1.4, 1.39, 1.37, 1.35, 1.32 and 1.3 for EM radiation at a wavelength of 550 nm.

[0608] In some non-limiting examples, the refractive index of the patterned coating 110 may not exceed about 1.7. In some non-limiting examples, the refractive index of the patterned coating 110 may not exceed one of about 1.6, 1.5, 1.4, and 1.3. In some non-limiting examples, the refractive index of the patterned coating 110 may be one of about 1.2-1.6, 1.2-1.5, and 1.25-1.45. As further described in the various non-limiting examples above, the patterned coating 110 exhibiting a substantially low refractive index may be suitable in some scenarios for enhancing (including but not limited to) at least one of the optical properties and performance of the device 100 by enhancing external coupling of EM radiation emitted by the optoelectronic device 200.

[0609] Without being bound by any particular theory, it has been observed that providing a patterned coating 110 with a substantially low refractive index can (at least in some devices 100) increase the transmittance of external EM radiation through its second portion 102. In some non-limiting examples, when the patterned coating 110 has a substantially low refractive index relative to a similarly constructed device 100 in which such a low-refractive-index patterned coating 110 is not provided, a device 100, including an air gap, may exhibit substantially high transmittance when arranged near the patterned coating 110.

[0610] In some non-limiting examples, a series of samples were fabricated to measure the refractive index of coatings formed from some of the various example materials at a wavelength of 550 nm. The measurement results are summarized in Table 4 below:

[0611] Table 4

[0612] Material Refractive index HT211 1.76 HT01 1.80 TAZ 1.69 Balq 1.69 Liq 1.64 Example Material 2 1.72 Example Material 3 1.37 Example Material 5 1.38 Example Material 7 1.3 Example Material 8 1.37

[0613] Based on the aforementioned measurements of refractive index in Table 4, and previous observations in Table 4 regarding one of the substantially closed coatings 140 with and without Ag, it has been found that materials forming low-refractive-index coatings (in some non-limiting examples, materials with a refractive index not exceeding one of about 1.4 and 1.38) may be suitable in some scenarios where patterned coatings 110 are formed to substantially suppress the deposition of deposited materials 731 (including, but not limited to, at least one of metals and alloys, including, but not limited to, at least one of Yb, Ag, Mg, and Ag-containing materials (including, but not limited to, MgAg)) thereon.

[0614] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a low refractive index.

[0615] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have a refractive index of no more than one of about 1.55, 1.5, 1.45, 1.43, 1.4, 1.39, 1.37, 1.35, 1.32 and 1.3 for EM radiation at a wavelength of 550 nm.

[0616] In some non-limiting examples, the patterned coating 110 may be at least one of being substantially transparent and EM radiation transmissive.

[0617] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have an extinction coefficient of no more than about 0.01 for photons at wavelengths of at least about 600 nm, 500 nm, 460 nm, 420 nm and 410 nm.

[0618] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may have an extinction coefficient of at least about 0.05, 0.1, 0.2 and 0.5 for EM radiation at wavelengths not exceeding one of about 400 nm, 390 nm, 380 nm and 370 nm.

[0619] In this way, at least one of the patterned coating 110 and the patterned material 611 (when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) can absorb EM radiation in the UVA spectrum incident on the device 100, thereby reducing the possibility that EM radiation in the UVA spectrum may impose constraints on at least one of device performance, device stability, device reliability, and device lifetime.

[0620] In some non-limiting examples, the patterned coating 110 may exhibit an extinction coefficient of no more than one of about 0.1, 0.08, 0.05, 0.03 and 0.01 in the visible spectrum.

[0621] Photoluminescence, absorption and other optical effects

[0622] In some non-limiting examples, photoluminescence of at least one of the coatings and materials can be observed via a photoexcitation process. During photoexcitation, at least one of the coatings and materials can be subjected to EM radiation emitted by a light source (including but not limited to a UV lamp).

[0623] When the emitted EM radiation is absorbed by at least one of the coating and the material, electrons in the at least one of the coating and the material can be temporarily excited. After excitation, one or more relaxation processes may occur, including but not limited to at least one of fluorescence and phosphorescence, wherein the EM radiation may be emitted from at least one of the coating and the material.

[0624] During this process, EM radiation emitted from at least one of the coating and the material can be detected, for example, by a photodetector to characterize the photoluminescence properties of at least one of the coating and the material.

[0625] As used herein, the wavelength of photoluminescence associated with at least one of the coatings and materials can generally refer to the wavelength of EM radiation emitted by at least one of such coatings and materials due to the relaxation of electrons from an excited state. As will be understood by those skilled in the art, the wavelength of light emitted by at least one of the coatings and materials due to a photoexcitation process may, in some non-limiting examples, be longer than the wavelength of the radiation used to induce photoexcitation. Various techniques known in the art can be used to detect photoluminescence, including but not limited to fluorescence microscopy.

[0626] In some non-limiting examples, the optical bandgap of various coatings / materials may correspond to the bandgap of the coating / material from which one of the EM radiation is absorbed and emitted during the photoexcitation process.

[0627] In some non-limiting examples, photoluminescence can be detected by subjecting the coating / material to EM radiation with a wavelength corresponding to the UV spectrum (in some non-limiting examples, such as one of UVA and UVB). In some non-limiting examples, the EM radiation used to induce photoexcitation may have a wavelength of about 365 nm.

[0628] In some non-limiting examples, the patterned material 611 may not exhibit photoluminescence at any wavelength corresponding to the visible spectrum.

[0629] In some non-limiting examples, the patterned material 611 may not exhibit photoluminescence when subjected to EM radiation having a wavelength of at least about 300 nm, 320 nm, 350 nm and 365 nm.

[0630] As used herein, at least one of the photoluminescent coatings and materials may be at least one of the coatings and materials that exhibit photoluminescence at a certain wavelength when irradiated with excitation radiation of a certain wavelength. In some non-limiting examples, at least one of the photoluminescent coatings and materials may exhibit photoluminescence at wavelengths exceeding about 365 nm when irradiated with excitation radiation of a wavelength of 365 nm, which is the wavelength of radiation sources commonly used in fluorescence microscopy.

[0631] At least one of the photoluminescent coatings and materials can be detected on the substrate 10 using standard optical techniques (including, but not limited to, fluorescence microscopy), which can determine the presence of at least one of the coatings and materials.

[0632] In some non-limiting examples, the coating (including, but not limited to, patterned coating 110) may exhibit photoluminescence by including materials that exhibit photoluminescence.

[0633] In some non-limiting examples, the presence of such patterned coating 110 can be detected (observed) using conventional characterization techniques such as fluorescence microscopy when depositing the patterned coating 110.

[0634] In some non-limiting examples, the coating (including, but not limited to, patterned coating 110) may exhibit photoluminescence at wavelengths corresponding to at least one of the UV spectrum and the visible spectrum, including, but not limited to, by comprising a material exhibiting photoluminescence. In some non-limiting examples, photoluminescence may occur at wavelengths (ranges) corresponding to the UV spectrum (including, but not limited to, one of the UVA spectrum and the UVB spectrum). In some non-limiting examples, photoluminescence may occur at wavelengths (ranges) corresponding to the visible spectrum. In some non-limiting examples, photoluminescence may occur at wavelengths (ranges) corresponding to one of deep blue and near-UV.

[0635] In some non-limiting examples, the material of the patterned coating 110 may exhibit photoluminescence in at least one of the following: conjugated bonds, aryl moieties, electron-donating / electron-withdrawing groups, and heavy metal complexes.

[0636] In some non-limiting examples, a coating (including but not limited to patterned coating 110) consisting of a material (including but not limited to patterned material 611) having substantially weak to no photoluminescence (absorption) in a wavelength range of at least about 365 nm and 460 nm may tend not to act as either a photoluminescent coating or an absorbing coating, and may be suitable for some scenarios where substantially high transparency is required in at least one of the visible spectrum and the NIR spectrum.

[0637] In some non-limiting examples, this material may tend to exhibit substantially low photoluminescence when subjected to EM radiation with a wavelength of approximately 365 nm, which is the wavelength of radiation sources commonly used in fluorescence microscopy. The presence of such materials (including, but not limited to, patterned material 611), particularly when deposited as a thin film in some non-limiting examples, can reduce applicability in scenarios requiring typical optical detection techniques (including, but not limited to, fluorescence microscopy). This may impose constraints on some scenarios where such materials can be selectively deposited, for example, on portions of substrate 10 via an FMM, as there may be scenarios where the presence of such material needs to be determined after material deposition.

[0638] In some non-limiting examples, materials having substantially low to no absorption at wavelengths of at least about 365 nm and 460 nm may be suitable for some scenarios where substantially high transparency is required in at least one of the visible and NIR spectra.

[0639] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (in some non-limiting examples, when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may not substantially attenuate the EM radiation passing through it in at least the visible spectrum.

[0640] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 (when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) may substantially not attenuate the EM radiation passing through it in at least one of the IR and NIR spectra.

[0641] In this way, at least one of the patterned coating 110 and the patterned material 611 (when deposited as at least one of some form of film and coating and under conditions similar to the deposition of the patterned coating 110 within the device 100) can absorb EM radiation in the UVA spectrum incident on the device 100, thereby reducing the possibility that EM radiation in the UVA spectrum may impose constraints on at least one of device performance, device stability, device reliability, and device lifetime.

[0642] In some non-limiting examples, the patterned coating 110 may serve as an optical coating.

[0643] In some non-limiting examples, the patterned coating 110 may modify at least one of at least one property and at least one characteristic of the EM radiation (including, but not limited to, photon forms) emitted by the device 100. In some non-limiting examples, the patterned coating 110 may exhibit a degree of haze, resulting in the scattering of the emitted EM radiation. In some non-limiting examples, the patterned coating 110 may include a crystalline material for scattering EM radiation transmitted through it. In some non-limiting examples, such scattering of EM radiation may be beneficial for enhancing external coupling of EM radiation from the device 100. In some non-limiting examples, the patterned coating 110 may initially be deposited as a substantially amorphous (including, but not limited to, substantially amorphous) coating, and subsequently, after its deposition, the patterned coating 110 may become crystalline and subsequently used for optical coupling.

[0644] In some non-limiting examples, the patterned material 611 may exhibit insignificant, including but not limited to, no, absorption when subjected to EM radiation having a wavelength of at least about 300 nm, 320 nm, 350 nm and 365 nm.

[0645] In some non-limiting examples, the patterned coating 110 may not exhibit any significant EM radiation absorption at any wavelength corresponding to the visible spectrum.

[0646] Average layer thickness

[0647] In some non-limiting examples, the average layer thickness of the patterned coating 110 may be no more than one of about 10 nm, 8 nm, 7 nm, 6 nm and 5 nm.

[0648] weight

[0649] Without being bound by any particular theory, it can be assumed that for compounds suitable for forming surfaces with substantially low surface energy, there may be scenarios where, in at least some applications, the molecular weight of such compounds is required to be one of approximately 800 g / mol-3,000 g / mol, 900 g / mol-2,000 g / mol, 900 g / mol-1,800 g / mol, and 900 g / mol-1,600 g / mol.

[0650] In some non-limiting examples, the molecular weight of at least one patterning material 611 compound may not exceed about 5,000 g / mol. In some non-limiting examples, the molecular weight of the compound may not exceed one of about 4,500 g / mol, 4,000 g / mol, 3,800 g / mol, and 3,500 g / mol.

[0651] In some non-limiting examples, the molecular weight of at least one patterning material 611 compound may be at least about 800 g / mol. In some non-limiting examples, the molecular weight of the compound may be at least one of at least about 1,500 g / mol, 1,700 g / mol, 2,000 g / mol, 2,200 g / mol, and 2,500 g / mol.

[0652] In some non-limiting examples, the molecular weight of the compound may be one of about 800 g / mol-3,000 g / mol, 900 g / mol-2,000 g / mol, 900 g / mol-1,800 g / mol, and 900 g / mol-1,600 g / mol.

[0653] In some non-limiting examples, the percentage of the molar weight of this compound attributable to the presence of F atoms may be one of approximately 40%-90%, 45%-85%, 50%-80%, 55%-75%, and 60%-75%. In some non-limiting examples, F atoms may constitute the majority of the molar weight of this compound.

[0654] Interrelationships between patterned coating properties

[0655] Without being bound by any particular theory, it can be assumed that an exposed layer surface 11 exhibiting a low initial adhesion probability relative to the deposited material 731 (including, but not limited to, at least one of metals and alloys, including but not limited to, Yb, Ag, Mg, and Ag-containing materials (including but not limited to MgAg)) can exhibit high transmittance. Without being bound by any particular theory, it can be assumed that an exposed layer surface 11 exhibiting a high adhesion probability relative to the deposited material 731 (including, but not limited to, at least one of metals and alloys, including but not limited to, Yb, Ag, Mg, and Ag-containing materials (including but not limited to MgAg)) can exhibit low transmittance.

[0656] In some non-limiting examples, if the material has substantially high surface energy, then the material including but not limited to patterned material 611 may tend to have substantially high initial adhesion probability relative to the deposition of the deposited material, including but not limited to at least one of metals and alloys, including but not limited to at least one of Yb, Ag, Mg and Ag-containing materials (including but not limited to MgAg).

[0657] In some non-limiting examples, patterned material 611 with substantially low surface tension that is not excessively low may be suitable for some scenarios requiring substantially high melting points, including but not limited to about 15 dynes / cm to 22 dynes / cm.

[0658] In some non-limiting examples, materials with substantially low but not excessively low surface tension (including, but not limited to, patterned material 611) may be suitable for some scenarios requiring substantially high sublimation temperatures.

[0659] In some non-limiting examples, coatings (including, but not limited to, patterned coating 110, which consists of materials (including, but not limited to, patterned material 611)) with substantially low surface energy and substantially high sublimation temperature) may be suitable in some scenarios where substantially high precision is required in controlling the average layer thickness of films including such materials.

[0660] Without wishing to be bound by any particular theory, it may be assumed that a material forming an exposed layer surface 11 with a surface energy not exceeding (in some non-limiting examples) about 13 dynes / cm may not be well-suited as a patterning material 611 in some scenarios, because such a material may exhibit at least one of substantially low adhesion to layers surrounding it, substantially low melting point, and substantially low sublimation temperature.

[0661] In some non-limiting examples, the patterned coating 110, having substantially low surface energy and substantially high melting point, may be suitable for some scenarios requiring high temperature reliability. In some non-limiting examples, considering that a single material with low surface energy may tend to exhibit a low melting point, achieving this combination from a single material may be challenging.

[0662] Without wishing to be bound by any particular theory, it may be assumed that such compounds (including, but not limited to, at least one patterning material 611) can exhibit at least one property that may be suitable in certain circumstances for forming at least one of coatings and layers having at least one of the following: substantially high melting point, in some non-limiting examples, at least 100°C; substantially low surface energy; and substantially amorphous structure, in some non-limiting examples, when deposited using a vacuum-based thermal evaporation process.

[0663] In some non-limiting examples, coatings (including, but not limited to, patterned coating 110) having substantially low surface energy, substantially high cohesive energy, and substantially high melting point may be suitable for scenarios requiring substantially high reliability under various conditions. In some non-limiting examples, considering that a single material having substantially low surface energy may tend to exhibit substantially low cohesive energy and substantially low melting point, achieving such a combination from a single material may be challenging.

[0664] In some non-limiting examples, materials with substantially low surface energy and substantially high cohesive energy (including, but not limited to, patterned material 611) may be suitable for scenarios requiring substantially high reliability under at least one of shear stress and bending stress. In some non-limiting examples, considering that films formed substantially from a single material with substantially low surface energy may tend to exhibit substantially low cohesive energy, achieving such a combination from a single material may be challenging.

[0665] In some non-limiting examples, materials with substantially low surface energy (including, but not limited to, patterned material 611) may tend to exhibit at least one of substantially large optical band gap and substantially wide optical band gap. In some non-limiting examples, the optical band gap of materials including, but not limited to, patterned material 611 may tend to correspond to the HOMO-LUMO band gap of that material.

[0666] Typically, materials with low surface energy can exhibit an optical bandgap that is large or wide, which, as a non-limiting example, may correspond to the HOMO-LUMO bandgap of the material.

[0667] It has now been found that patterned coatings 110 formed from compounds exhibiting substantially low surface energy can also exhibit substantially low refractive index.

[0668] In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 611 may exhibit a surface energy of no more than about 25 dynes / cm and a refractive index of no more than about 1.45. In some non-limiting examples, at least one of the patterned coating 110 and the patterned material 711 may comprise a material exhibiting a surface energy of no more than about 20 dynes / cm and a refractive index of no more than about 1.4.

[0669] In some non-limiting examples, materials with substantially low surface energy (including, but not limited to, patterned material 611) may be suitable for some scenarios where substantially weak to no photoluminescence and absorption are required in a wavelength range of at least about 365 nm and 460 nm.

[0670] In some non-limiting examples, materials (including, but not limited to, patterned material 611) having at least one of a substantially large optical band gap (and HOMO-LUMO band gap) and a substantially wide optical band gap (and HOMO-LUMO band gap) may tend to exhibit substantially weak to no photoluminescence in at least one of the deep blue region of the visible spectrum, the near-UV spectrum, the visible spectrum, and the NIR spectrum.

[0671] Without wishing to be bound by any particular theory, it can be assumed that for compounds suitable for forming surfaces with substantially low surface energy, there may be targets where, in at least some applications, such compounds have a molecular weight of one of about 1,500 g / mol-5,000 g / mol, 1,500 g / mol-4,500 g / mol, 1,700 g / mol-4,500 g / mol, 2,000 g / mol-4,000 g / mol, 2,200 g / mol-4,000 g / mol, and 2,500 g / mol-3,800 g / mol.

[0672] At least some materials having at least one of a large and a wide optical bandgap and a HOMO-LUMO bandgap may exhibit substantially weak to no photoluminescence in at least one of the visible spectrum, its deep B (blue) region, and the near-UV spectrum. In some non-limiting examples, materials having a substantially small HOMO-LUMO bandgap may be suitable for applications using optical techniques to detect films of materials. In some non-limiting examples, materials with higher surface energy may be suitable for applications using optical techniques to detect films of materials.

[0673] In some non-limiting examples, materials with substantially large HOMO-LUMO band gaps may be suitable for some scenarios where weak to no photoluminescence or absorption is required in the wavelength range of at least about 365 nm and 460 nm.

[0674] Doping

[0675] In some non-limiting examples, the patterned coating 110 may exhibit (including, but not limited to) at least one nucleation site for the deposited material 731 due to at least one of the patterned material 611 used and the deposition environment.

[0676] In some non-limiting examples, the patterned coating 110 may be doped (including, but not limited to, with at least one of covering and supplementing with another material, which may act as at least one of seed crystals or heterogeneous material to serve as such nucleation sites for the deposited material 731. In some non-limiting examples, such another material may include NPC 920 material. In some non-limiting examples, such another material may include at least one of organic materials (in some non-limiting examples, polycyclic aromatic compounds) and materials containing at least one of non-metallic elements (including, but not limited to, at least one of O, S, N, and C, which may be contaminants in at least one of the source material, the equipment used for deposition, and the vacuum chamber environment). In some non-limiting examples, such another material may be deposited as a single layer of a small fraction of its thickness to avoid forming its sealing coating 140. Instead, the monomers of such another material may tend to be spaced apart in a laterally oriented manner to form discrete nucleation sites for the deposited material.

[0677] Various patterned materials

[0678] In some non-limiting examples, a patterned coating 110 of a single patterned material 611 is formed relative to the deposition of a deposited material 731, which includes, but is not limited to, at least one of a given metal and a given alloy, including, but not limited to, Yb, Ag, Mg and Ag-containing materials (including, but not limited to, MgAg), satisfying constraints of at least one material property selected from at least one of the following: initial adhesion probability, transmittance, deposition contrast, surface energy, glass transition temperature, melting point, sublimation temperature, evaporation temperature, cohesive energy, optical band gap, photoluminescence, refractive index, extinction coefficient, absorption, other optical effects, average layer thickness, molecular weight, and composition. For a given scenario, the substantially complex interrelationships between these various material properties may present challenges.

[0679] In some non-limiting examples, the patterned coating 110 may include a variety of materials. In some non-limiting examples, the patterned coating 110 may include a first material and a second material.

[0680] In some non-limiting examples, when deposited as a thin film, at least one of a variety of materials of the patterned coating 110 can be used as the NIC.

[0681] In some non-limiting examples, at least one of the various materials of the patterned coating 110 can be used as a NIC when deposited as a thin film, and another material of the patterned coating forms an NPC 920 when deposited as a thin film. In some non-limiting examples, a first material can form an NPC 920 when deposited as a thin film, and a second material can form a NIC when deposited as a thin film. In some non-limiting examples, the presence of the first material in the patterned coating 110 can lead to an increased initial adhesion probability of the patterned coating compared to a case where the patterned coating 110 is formed by the second material and substantially without the first material.

[0682] In some non-limiting examples, at least one of the materials of the patterned coating 110 may be adapted to form a surface with low surface energy when deposited as a thin film. In some non-limiting examples, when deposited as a thin film, the first material may be adapted to form a surface with a lower surface energy than that provided by a thin film including the second material.

[0683] In some non-limiting examples, the patterned coating 110 may exhibit photoluminescence by including, but not limited to, a material that exhibits photoluminescence.

[0684] In some non-limiting examples, the first material may exhibit photoluminescence at wavelengths corresponding to the visible spectrum, and the second material may not exhibit significant photoluminescence at wavelengths corresponding to the visible spectrum.

[0685] In some non-limiting examples, the second material may exhibit substantially no photoluminescence at any wavelength corresponding to the visible spectrum. In some non-limiting examples, the second material may not exhibit photoluminescence when subjected to EM radiation having a wavelength of at least one of about 300 nm, 320 nm, 350 nm, and 365 nm. In some non-limiting examples, the second material may exhibit minimal to undetectable absorption when subjected to such EM radiation.

[0686] In some non-limiting examples, the second optical bandgap of the second material may be wider than the photon energy of the EM radiation emitted by the source, such that the second material does not undergo photoexcitation when subjected to such EM radiation. However, in some non-limiting examples, the patterned coating 110 containing such a second material may still exhibit photoluminescence when subjected to EM radiation due to the photoluminescence exhibited by the first material. In some non-limiting examples, the presence of the patterned coating 110 can be detected using conventional characterization techniques such as fluorescence microscopy when depositing the patterned coating 110.

[0687] In some non-limiting examples, the first material may have a first optical bandgap, and the second material may have a second optical bandgap. In some non-limiting examples, the second optical bandgap may exceed the first optical bandgap. In some non-limiting examples, the difference between the first and second optical bandgap may exceed one of about 0.3 eV, 0.5 eV, 0.7 eV, 1 eV, 1.3 eV, 1.5 eV, 1.7 eV, 2 eV, 2.5 eV, and 3 eV.

[0688] In some non-limiting examples, the first optical bandgap may be no more than one of about 4.1 eV, 3.5 eV, and 3.4 eV. In some non-limiting examples, the second optical bandgap may exceed one of about 3.4 eV, 3.5 eV, 4.1 eV, 5 eV, and 6.2 eV.

[0689] In some non-limiting examples, at least one of the first optical bandgap and the second optical bandgap may correspond to the HOMO-LUMO bandgap.

[0690] In some non-limiting examples, the optical bandgap of at least one of various coatings and materials (including, but not limited to, at least one of a first optical bandgap and a second optical bandgap) may correspond to the bandgap of at least one of the coatings and materials from which EM radiation is absorbed and emitted during the photoexcitation process.

[0691] In some non-limiting examples, the concentration (including but not limited to weight) of the first material in the patterned coating 110 may not exceed the concentration of the second material in the patterned coating 110. In some non-limiting examples, the patterned coating 110 may include at least about 0.1 wt%, 0.2 wt%, 0.5 wt%, 0.8 wt%, 1 wt%, 3 wt%, 5 wt%, 8 wt%, 10 wt%, 15 wt%, and 20 wt% of the first material. In some non-limiting examples, the patterned coating 110 may include no more than about 50 wt%, 40 wt%, 30 wt%, 25 wt%, 20 wt%, 15 wt%, 10 wt%, 8 wt%, 5 wt%, 3 wt%, and 1 wt% of the first material. In some non-limiting examples, the remainder of the patterned coating 110 may consist substantially of the second material. In some non-limiting examples, the patterned coating 110 may include additional materials, including but not limited to at least one of a third and a fourth material.

[0692] In some non-limiting examples, at least one of the materials of the patterned coating 110 (including, but not limited to, the first material and the second material) may include at least one of F and Si. As a non-limiting example, at least one of the first material and the second material may include at least one of F and Si. In some other non-limiting examples, the first material may include at least one of F and Si, and the second material may include at least one of F and Si. In some non-limiting examples, both the first material and the second material may include F. In some non-limiting examples, both the first material and the second material may include Si. In some non-limiting examples, each of the first material and the second material may include at least one of F and Si.

[0693] In some non-limiting examples, at least one of the first and second materials may include both F and Si. In some non-limiting examples, one of the first and second materials may not include at least one of F and Si. In some non-limiting examples, the second material may include at least one of F and Si, and the first material may not include at least one of F and Si.

[0694] In some non-limiting examples, at least one of the materials of the patterned coating 110 (which may be, for example, at least one of a first material and a second material) may include F, and at least one of the other materials of the patterned coating 110 may include sp. 2 Carbon. In some non-limiting examples, at least one of the materials of the patterned coating 110 (including, but not limited to, at least one of the first and second materials) may include F, and at least one of the other materials of the patterned coating 110 may include sp. 3 Carbon. In some non-limiting examples, at least one of the materials of the patterned coating 110 (including, but not limited to, at least one of the first and second materials) may include F and sp. 3 Car...

Claims

1. A display panel, comprising: at least one display portion, the at least one display portion comprising a display portion (sub)pixel arrangement, the display portion (sub)pixel arrangement comprising a plurality of emission areas, each emission area corresponding to a (sub)pixel, the lateral orientation of each emission area being defined by an intersection of lateral orientations of a plurality of active area layers; as well as at least one signal exchange section, the at least one signal exchange section comprising a signal exchange section (sub) pixel arrangement, the signal exchange section (sub) pixel arrangement comprising at least one transmission area and a plurality of emission areas, each emission area corresponding to a (sub) pixel, wherein the signal exchange portion (sub) pixel arrangement is adapted to the at least one transmissive region by changing the lateral extent of at least a first of the active region layers corresponding to at least one (sub) pixel therein, such that: At least one of the size, shape, configuration and orientation of the lateral extent of the first of the active region layers is changed, and The first of the active region layers is positioned at an end of an intersection of lateral extents of the remaining of the active region layers. 2 . The display panel according to claim 1 , wherein the size of the lateral extent of the first of the active region layers is reduced. 3 . The display panel according to claim 1 , wherein the shape of the lateral extent of the first of the active region layers is one of a rectangle, a circle, and a triangle. 4 . The display panel of claim 1 , wherein the orientation of the lateral extent of the first of the active region layers is rotated by a non-zero angle. The display panel of claim 1 , wherein the non-zero angle is one of approximately 45°, 90°, and 180°.

6. A display panel according to claim 1, wherein the intersection of the lateral extents of the remaining active area layers in the active area layers corresponds to the intersection of the lateral extents of the multiple active area layers in the display portion (sub)pixel arrangement.

7. The display panel according to claim 1, wherein the plurality of active region layers comprises: A first electrode, a second electrode, and at least one semiconducting layer extending therebetween. 8 . The display panel according to claim 7 , wherein the first electrode extends between a substrate of the display panel and the second electrode. 9 . The display panel according to claim 7 , wherein the first of the active region layers is selected from one of the first electrode and the second electrode.

10. The display panel of claim 1, wherein the lateral extent of the first of the active region layers in the display portion substantially bisects the intersection of the lateral extents of the remaining of the active region layers. 11 . The display panel according to claim 1 , wherein at least one active region layer among the plurality of active region layers is formed by depositing a corresponding emission region material.

12. The display panel according to claim 11, wherein depositing the corresponding emission area material comprises using at least one fine metal mask (FMM), the at least one FMM having a plurality of holes, each hole corresponding to the lateral extent of the active area layer corresponding to a corresponding (sub) pixel. 13 . The display panel of claim 12 , wherein the at least one FMM is used to deposit corresponding emission region materials for corresponding ones of the remaining ones of the active region layers in the signal exchange portion.

14. A display panel according to claim 1, wherein the signal exchange part (sub) pixel arrangement is different from the display part (sub) pixel arrangement due to a difference between the signal exchange part and the display part in at least one of the size, shape, configuration and orientation of the lateral range of the first electrode.

15. A display panel according to claim 14, wherein at least one of the size, shape, configuration and orientation of the lateral range of the first electrode is changed between the signal exchange part and the display part by changing the opening of the pixel defining layer, and the layer surface of the first electrode is exposed through the opening.

16. The display panel of claim 14, wherein at least one of a size, shape, configuration, and orientation of a lateral extent of at least one semiconductive layer is substantially the same between the signal exchange portion and the display portion.

17. The display panel of claim 16, wherein the size, shape, configuration and orientation of the lateral extent of the at least one semiconductive layer are substantially the same between the signal exchange portion and the display portion.

Images