Plasma cleaning machine air inlet device based on semiconductor

Abstract

The invention discloses a plasma cleaning machine air inlet device based on a semiconductor, and relates to the technical field of cleaning machines. The plasma cleaning machine air inlet device based on the semiconductor comprises an air storage tank, an air inlet pipeline, a filter seat, a filter screen main body, a scraping strip, a driving unit and electrostatic adsorption equipment. According to the plasma cleaning machine air inlet device based on the semiconductor, a traditional filtering structure is improved, the filter screen body is convenient to disassemble and assemble in the filtering base and easy to maintain, meanwhile, the design of the scraping strip and the driving unit is adopted, air pressure in the air inlet pipeline is conveniently converted into power for driving the bearing frame and the scraping strip to rotate, and the air inlet efficiency is improved. And the cleaned impurities are absorbed through the pollution discharge notch and the electrostatic adsorption equipment, so that the filter screen main body is prevented from being blocked, the stress of the filter screen main body is constant, and the filter screen main body is long in service life, not easy to damage, good in filtering effect and low in maintenance frequency.

Description

Technical Field

[0001] The invention relates to the technical field of cleaning machines, and in particular to an air intake device for a semiconductor-based plasma cleaning machine. Background Art

[0002] The semiconductor-based plasma cleaning machine air intake device is an important component of the plasma cleaning machine. It is responsible for introducing specific working gas into the reaction chamber of the plasma cleaning machine to generate plasma, thereby realizing processes such as surface cleaning, activation, etching or cross-linking.

[0003] The air intake device introduces the working gas into the reaction chamber of the plasma cleaning machine through a pipeline. In the reaction chamber, by applying sufficient energy, the introduced gas molecules or atoms are partially ionized to form plasma. The air intake device can accurately control the introduction of the gas, thereby generating a stable plasma. In order to ensure that the gas introduced into the plasma has high purity, a filtering structure is usually required to remove impurities and pollutants in the gas, such as moisture, dust, particulate matter, etc., so as to ensure the stability and cleaning effect of the plasma. However, the current filtering structure usually adopts a fixed structure. When the impurity content in the gas is high, the impurity particles are easy to block the filtering structure, resulting in unstable intake pressure. At the same time, the pressure on the filter increases, reducing the life of the filter. If the filter is damaged by excessive pressure, the filtering structure loses its filtering effect, resulting in poor cleaning effect of the semiconductor. Therefore, the maintenance frequency of the filtering structure in the prior art is high and cannot meet the use requirements. In view of the shortcomings of the prior art, the present invention provides an air intake device for a plasma cleaning machine based on a semiconductor to solve the above problems. Summary of the invention

[0005] In view of the deficiencies in the prior art, the present invention provides an air intake device for a plasma cleaning machine based on a semiconductor. The traditional filtering structure is improved through the design of a gas storage tank, an air intake pipe, a filter seat, a filter body, a scraper, a drive unit and an electrostatic adsorption device. The filter body is convenient to disassemble and assemble inside the filter seat and is easy to maintain. At the same time, the design of the scraper and the drive unit facilitates the conversion of the gas pressure inside the air intake pipe into a power to drive the carrier frame and the scraper to rotate, thereby driving the scraper to continuously clean the filter body. The cleaned impurities are then absorbed through the sewage discharge slot and the electrostatic adsorption device, thereby ensuring that the filter body will not be blocked and that the force on the filter body is constant. The filter body has a long service life, is not easily damaged, has a good filtering effect, and has a low maintenance frequency, thereby meeting the use requirements.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: an air intake device for a semiconductor-based plasma cleaning machine, comprising an air storage tank, an air intake pipeline, a filter seat, a filter body, a scraper bar, a drive unit and an electrostatic adsorption device; The gas storage tank is used to store gas; a pressure reducing valve and a flow controller are provided at the outlet of the gas storage tank. When the gas is released from the high-pressure gas cylinder, the pressure is first reduced by the pressure reducing valve to reduce the high-pressure gas to a pressure range suitable for the plasma cleaning machine; then, the gas is precisely adjusted by the flow controller to ensure that the gas flow entering the air intake pipe and the plasma cleaning machine is stable and controllable; The air intake pipeline is arranged between the air storage tank and the cleaning machine; the air intake pipeline is a transmission channel between the air storage tank and the plasma cleaning machine; The filter seat is arranged on the air inlet pipe; the filter body is arranged inside the filter seat, and a support frame is arranged outside the filter body, the support frame is used to support the filter body and a drainage slot is arranged on the support frame; the filter seat is used to provide support and position limiting for the filter body to ensure the convenience of installation of the filter body, and the drainage slot is used to provide a collection space for impurities on the filter body; The scraper bar is arranged inside the filter seat; the driving unit is arranged on the air intake pipe and the filter seat, and the driving unit is used to drive the scraper bar to clean the impurities from the filter body; The electrostatic adsorption device is arranged inside the filter seat and aligned with the position of the sewage discharge slot. The electrostatic adsorption device is used to adsorb and collect impurities cleaned by the scraper bar to the sewage discharge slot.

[0007] Preferably, the driving unit comprises: A power seat, arranged on the air intake pipe; A turbine, disposed inside the power seat; A first bevel gear, disposed on the rotating shaft of the turbine; A second bevel gear is disposed on a side surface of the power seat and meshes with the first bevel gear; A first pulley, disposed on the rotating shaft of the second bevel gear; A main shaft is arranged on the filter seat, and a plurality of bearing frames for supporting the scraper strip are arranged on the main shaft; A second pulley is disposed on the main shaft; A belt is arranged on the first pulley and the second pulley.

[0008] Preferably, the electrostatic adsorption device is provided with a mounting base, the filter seat is provided with a positioning seat, and the mounting base is movably snap-connected in the positioning seat.

[0009] Preferably, a locking mechanism is provided on the mounting base, and the locking mechanism is used to lock the position of the positioning seat, and the locking mechanism includes: A movable platform, arranged on the mounting base; The locking rod is arranged on the movable platform, the positioning seat is provided with a locking hole, and the locking rod is movably inserted in the locking hole.

[0010] Preferably, a guide rod is provided inside the mounting base, and the guide rod is used to provide support for the movable platform, and a spring is fixedly connected between the two groups of movable platforms.

[0011] Preferably, a filter holder is fixedly connected inside the filter seat, and the filter holder is used to clamp and limit the support frame.

[0012] Preferably, the top of the filter seat is provided with an opening, and a sealing cover is movably engaged in the top opening of the filter seat.

[0013] Preferably, a sealing gasket is movably engaged between the sealing cover and the top opening of the filter seat.

[0014] Preferably, the filter holder is provided with a first notch corresponding to the position of the filter body.

[0015] Preferably, the filter holder is provided with a second slot corresponding to the position of the sewage discharge slot.

[0016] The present invention discloses an air intake device for a semiconductor-based plasma cleaning machine, which has the following beneficial effects: 1. The semiconductor-based plasma cleaning machine air intake device improves the traditional filtering structure through the design of the gas storage tank, the air intake pipe, the filter seat, the filter body, the scraper, the drive unit and the electrostatic adsorption device. The filter body is convenient to disassemble and assemble inside the filter seat and is easy to maintain. At the same time, the design of the scraper and the drive unit facilitates the conversion of the gas pressure inside the air intake pipe into the power to drive the carrier and the scraper to rotate, thereby driving the scraper to continuously clean the filter body. The cleaned impurities are then absorbed by the sewage discharge slot and the electrostatic adsorption device to ensure that the filter body will not be blocked and the force on the filter body is constant. The filter body has a long service life, is not easily damaged, has a good filtering effect, and has a low maintenance frequency, which meets the use requirements.

[0017] 2. The semiconductor-based plasma cleaning machine air intake device does not require additional power and equipment drive during the operation of the scraper, ensuring stable and reliable operation of the device and a compact structure between the drive unit and the scraper for easy use.

[0018] 3. The semiconductor-based plasma cleaning machine air intake device makes it easy to disassemble and assemble the electrostatic adsorption device through the design of the mounting base and the positioning seat, so that the electrostatic adsorption device is easy to clean, thereby removing the impurities adsorbed by the electrostatic adsorption device. The design of the locking mechanism makes it easy to install and lock the electrostatic adsorption device, thereby ensuring the stable installation of the electrostatic adsorption device. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0020] Figure 1 This is a first viewing angle of the overall structural diagram of the present invention; Figure 2 The second viewing angle of the overall structural diagram of the present invention; Figure 3 It is a cross-sectional view of the present invention; Figure 4 It is a structural schematic diagram of the drive unit of the present invention; Figure 5 It is a schematic diagram of the internal structure of the filter seat of the present invention; Figure 6 It is a disassembly schematic diagram of the filter body of the present invention; Figure 7 It is a disassembly schematic diagram of the electrostatic adsorption device of the present invention; Figure 8 It is a structural schematic diagram of the locking mechanism of the present invention.

[0021] In the figure: 1. gas storage tank; 2. air intake pipe; 3. filter seat; 31. filter card seat; 32. cover; 321. sealing gasket; 33. positioning seat; 331. locking hole; 4. filter body; 41. support frame; 411. sewage discharge slot; 5. scraper; 51. carrier; 6. drive unit; 61. power seat; 62. turbine; 63. first bevel gear; 64. second bevel gear; 65. first pulley; 66. main shaft; 67. second pulley; 68. belt; 7. electrostatic adsorption device; 71. mounting base; 8. locking mechanism; 81. movable table; 82. locking rod; 83. guide rod; 84. spring. DETAILED DESCRIPTION

[0022] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention are clearly and completely described. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0023] The embodiment of the present application provides an air intake device for a plasma cleaning machine based on a semiconductor, which solves the problem that the current air intake device filter structure usually adopts a fixed structure. When the impurity content in the gas is relatively high, the impurity particles are easy to clog the filter structure, resulting in unstable intake pressure. At the same time, the pressure on the filter increases, reducing the life of the filter. If the filter is damaged by excessive pressure, the filter structure loses its filtering effect, resulting in poor cleaning effect of the semiconductor. Therefore, the prior art has a high maintenance frequency for the filter structure and cannot meet the use requirements.

[0024] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0025] Embodiment 1: The embodiment of the present invention discloses an air intake device for a semiconductor-based plasma cleaning machine. Figure 1-8 As shown, it includes an air storage tank 1, an air intake pipe 2, a filter seat 3, a filter body 4, a scraper 5, a drive unit 6 and an electrostatic adsorption device 7; The gas storage tank 1 is used to store gas; a pressure reducing valve and a flow controller are provided at the outlet of the gas storage tank 1. When the gas is released from the high-pressure gas cylinder, the pressure is first reduced by the pressure reducing valve to reduce the high-pressure gas to a pressure range suitable for the plasma cleaning machine; then, the gas is precisely adjusted by the flow controller to ensure that the gas flow entering the air inlet pipe 2 and the plasma cleaning machine is stable and controllable; The air inlet pipe 2 is arranged between the gas storage tank 1 and the cleaning machine; the air inlet pipe 2 is a transmission channel between the gas storage tank 1 and the plasma cleaning machine; The filter seat 3 is arranged on the air intake pipe 2; the filter body 4 is arranged inside the filter seat 3, and a support frame 41 is arranged outside the filter body 4, the support frame 41 is used to support the filter body 4, and a drainage slot 411 is opened on the support frame 41; the filter seat 3 is used to provide support and limit for the filter body 4 to ensure the convenience of installation of the filter body 4, and the drainage slot 411 is used to provide a collection space for impurities on the filter body 4; A filter holder 31 is fixedly connected to the inside of the filter seat 3, and the filter holder 31 is used to clamp and limit the support frame 41; an opening is provided at the top of the filter seat 3, and a cover 32 is movably clamped in the top opening of the filter seat 3; the design of the filter holder 31 makes it convenient to install and position the support frame 41 and the filter body 4, and the design of the cover 32 makes it convenient to disassemble and assemble the support frame 41 and the filter body 4, and easy to inspect, replace and maintain.

[0026] A sealing gasket 321 is movably connected between the sealing cover 32 and the top opening of the filter seat 3. The sealing gasket 321 is designed so that the sealing cover 32 and the top opening of the filter seat 3 are tightly connected and have good sealing performance. The sealing cover 32 and the top opening of the filter seat 3 are fixed by bolts. The filter holder 31 is provided with a first notch corresponding to the position of the filter body 4 , and the filter holder 31 is provided with a second notch corresponding to the position of the sewage discharge notch 411 .

[0027] The scraper bar 5 is arranged inside the filter seat 3; the driving unit 6 is arranged on the air intake pipe 2 and the filter seat 3, and the driving unit 6 is used to drive the scraper bar 5 to clean the impurities from the filter body 4; The electrostatic adsorption device 7 is disposed inside the filter seat 3 and aligned with the position of the sewage discharge slot 411 . The electrostatic adsorption device 7 is used to adsorb and collect impurities cleaned by the scraper bar 5 to the sewage discharge slot 411 .

[0028] The drive unit 6 comprises: The power seat 61 is arranged on the air intake pipe 2; The turbine 62 is disposed inside the power base 61; A first bevel gear 63 is disposed on the rotating shaft of the turbine 62; The second bevel gear 64 is disposed on the side of the power seat 61 and meshes with the first bevel gear 63; A first pulley 65 is disposed on the rotating shaft of the second bevel gear 64; A main shaft 66 is disposed on the filter seat 3, and a plurality of supporting frames 51 for supporting the scraper strip 5 are disposed on the main shaft 66; A second pulley 67 is disposed on the main shaft 66; The belt 68 is disposed on the first pulley 65 and the second pulley 67 .

[0029] The device is designed with a driving unit 6, so that the driving unit 6 can easily convert the gas pressure inside the air intake duct 2 into the power to drive the carrier 51 and the scraper 5 to rotate, so that the scraper 5 does not need to provide additional power and equipment drive during operation, ensuring that the device operates stably and reliably, and ensuring that the structure between the driving unit 6 and the scraper 5 is compact and easy to use; When the airflow passes through the air intake duct 2, the airflow passes through the power seat 61, and when passing through the inside of the power seat 61, it generates thrust on the turbine 62, and the turbine 62 drives the first bevel gear 63 to rotate, the first bevel gear 63 drives the second bevel gear 64 to rotate, the second bevel gear 64 drives the first pulley 65 to rotate, the first pulley 65 drives the belt 68 to rotate, the belt 68 drives the second pulley 67 to rotate, the second pulley 67 drives the main shaft 66 to rotate, the main shaft 66 drives the carrier 51 to rotate, and the carrier 51 further drives the multiple groups of scrapers 5 to rotate; When the airflow passes through the air intake pipe 2 and the power seat 61 and enters the interior of the filter seat 3, it is also filtered by the filter body 4. Figure 6 As shown, the filter body 4 is supported by a support frame 41 disposed outside thereof, and two groups of filter bodies 4 with different mesh diameters are disposed on the support frame 41. The airflow first passes through the filter body 4 with a larger mesh number, and then passes through the filter body 4 with a smaller mesh number. The filter body 4 with a larger mesh number will not cause blockage. Therefore, the scraper 5 and the drive unit 6 can clean the filter body 4 with a smaller mesh number to avoid blockage. When the scraper bar 5 scrapes off the impurities on the filter body 4 , the impurities move along with the scraper bar 5 , and when the impurities move to the position of the sewage discharge slot 411 , they are adsorbed and collected by the electrostatic adsorption device 7 .

[0030] Embodiment 2: The embodiment of the present invention discloses an air intake device for a semiconductor-based plasma cleaning machine. Figure 1-8 As shown, it includes an air storage tank 1, an air intake pipe 2, a filter seat 3, a filter body 4, a scraper 5, a drive unit 6 and an electrostatic adsorption device 7; The gas storage tank 1 is used to store gas; a pressure reducing valve and a flow controller are provided at the outlet of the gas storage tank 1. When the gas is released from the high-pressure gas cylinder, the pressure is first reduced by the pressure reducing valve to reduce the high-pressure gas to a pressure range suitable for the plasma cleaning machine; then, the gas is precisely adjusted by the flow controller to ensure that the gas flow entering the air inlet pipe 2 and the plasma cleaning machine is stable and controllable; The air inlet pipe 2 is arranged between the gas storage tank 1 and the cleaning machine; the air inlet pipe 2 is a transmission channel between the gas storage tank 1 and the plasma cleaning machine; The filter seat 3 is arranged on the air intake pipe 2; the filter body 4 is arranged inside the filter seat 3, and a support frame 41 is arranged outside the filter body 4, the support frame 41 is used to support the filter body 4, and a drainage slot 411 is opened on the support frame 41; the filter seat 3 is used to provide support and limit for the filter body 4 to ensure the convenience of installation of the filter body 4, and the drainage slot 411 is used to provide a collection space for impurities on the filter body 4; The scraper bar 5 is arranged inside the filter seat 3; the driving unit 6 is arranged on the air intake pipe 2 and the filter seat 3, and the driving unit 6 is used to drive the scraper bar 5 to clean the impurities from the filter body 4; The electrostatic adsorption device 7 is disposed inside the filter seat 3 and aligned with the position of the sewage discharge slot 411 . The electrostatic adsorption device 7 is used to adsorb and collect impurities cleaned by the scraper bar 5 to the sewage discharge slot 411 .

[0031] The electrostatic adsorption device 7 is provided with a mounting base 71, and the filter seat 3 is provided with a positioning seat 33. The mounting base 71 is movably connected to the positioning seat 33. The design of the mounting base 71 and the positioning seat 33 makes it easy to disassemble and assemble the electrostatic adsorption device 7, so that the electrostatic adsorption device 7 is easy to clean, so as to remove the impurities adsorbed by the electrostatic adsorption device 7. The mounting base 71 is provided with a locking mechanism 8, which is used to lock the position of the positioning seat 33. The locking mechanism 8 includes: A movable platform 81 is disposed on the mounting base 71; The locking rod 82 is disposed on the movable platform 81 . The positioning seat 33 is provided with a locking hole 331 . The locking rod 82 is movably inserted into the locking hole 331 .

[0032] A guide rod 83 is provided inside the mounting base 71 , and the guide rod 83 is used to provide support for the movable platform 81 . A spring 84 is fixedly connected between the two sets of movable platforms 81 .

[0033] The semiconductor-based plasma cleaning machine air intake device facilitates the installation and locking of the electrostatic adsorption device 7 through the design of the locking mechanism 8, thereby ensuring the stable installation of the electrostatic adsorption device 7; When installing the electrostatic adsorption device 7, first pull the two groups of movable platforms 81 so that the movable platforms 81 drive the locking rod 82 to move while squeezing the spring 84. At this time, align the electrostatic adsorption device 7 with the inner part of the positioning seat 33 and snap-fit ​​the mounting base 71 to the positioning seat 33. After the snap-fit ​​is complete, release the movable platform 81. At this time, the spring 84 resets and pushes the movable platform 81 and the locking rod 82 to move, so that the locking rod 82 is inserted into the locking hole 331, thereby realizing the rapid installation of the electrostatic adsorption device 7 and ensuring the convenient installation of the electrostatic adsorption device 7. When the electrostatic adsorption device 7 is disassembled for maintenance, the disassembly process is the opposite of the above-mentioned installation process, which is easy to operate.

[0034] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0035] The above shows and describes the basic principles and main features of the present invention and the advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention to be protected. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. An air intake device for a semiconductor-based plasma cleaning machine, characterized in that: include: Gas tank (1); An air intake pipe (2) is arranged between the air storage tank (1) and the cleaning machine; A filter seat (3) is arranged on the air intake pipe (2); A filter body (4) is arranged inside the filter seat (3); a support frame (41) is provided outside the filter body (4); the support frame (41) is used to support the filter body (4); and a sewage discharge slot (411) is provided on the support frame (41); A scraper strip (5) is arranged inside the filter seat (3); A drive unit (6) is arranged on the air intake duct (2) and the filter seat (3), and the drive unit (6) is used to drive the scraper (5) to clean impurities from the filter body (4); The electrostatic adsorption device (7) is arranged inside the filter seat (3) and aligned with the position of the sewage discharge slot (411), and the electrostatic adsorption device (7) is used to adsorb and collect impurities cleaned by the scraper (5) to the sewage discharge slot (411).

2. The semiconductor-based plasma cleaning machine air intake device according to claim 1, characterized in that: The driving unit (6) comprises: A power seat (61) is arranged on the air intake pipe (2); A turbine (62) is arranged inside the power seat (61); A first bevel gear (63) is arranged on the rotating shaft of the turbine (62); A second bevel gear (64) is disposed on a side surface of the power seat (61) and meshes with the first bevel gear (63); A first pulley (65) is arranged on the rotating shaft of the second bevel gear (64); A main shaft (66) is arranged on the filter seat (3), and a plurality of groups of supporting frames (51) for supporting the scraper strip (5) are arranged on the main shaft (66); A second pulley (67) is arranged on the main shaft (66); A belt (68) is arranged on the first pulley (65) and the second pulley (67).

3. The semiconductor-based plasma cleaning machine air intake device according to claim 1, characterized in that: The electrostatic adsorption device (7) is provided with a mounting base (71), the filter seat (3) is provided with a positioning seat (33), and the mounting base (71) is movably engaged in the positioning seat (33).

4. The semiconductor-based plasma cleaning machine air intake device according to claim 3, characterized in that: The mounting base (71) is provided with a locking mechanism (8), the locking mechanism (8) being used to lock the position of the positioning seat (33), the locking mechanism (8) comprising: A movable platform (81) is arranged on the mounting base (71); The locking rod (82) is arranged on the movable platform (81), and the positioning seat (33) is provided with a locking hole (331), and the locking rod (82) is movably inserted into the locking hole (331).

5. The semiconductor-based plasma cleaning machine air intake device according to claim 4, characterized in that: A guide rod (83) is provided inside the mounting base (71), and the guide rod (83) is used to provide support for the movable platform (81). A spring (84) is fixedly connected between the two groups of movable platforms (81).

6. The semiconductor-based plasma cleaning machine air intake device according to claim 1, characterized in that: A filter screen holder (31) is fixedly connected to the interior of the filter seat (3), and the filter screen holder (31) is used to clamp and limit the support frame (41).

7. The semiconductor-based plasma cleaning machine air intake device according to claim 1, characterized in that: An opening is provided at the top of the filter seat (3), and a sealing cover (32) is movably engaged in the top opening of the filter seat (3).

8. The semiconductor-based plasma cleaning machine air intake device according to claim 7, characterized in that: A sealing gasket (321) is movably clamped between the sealing cover (32) and the top opening of the filter seat (3).

9. The semiconductor-based plasma cleaning machine air intake device according to claim 6, characterized in that: The filter holder (31) is provided with a first notch corresponding to the position of the filter body (4).

10. The semiconductor-based plasma cleaning machine air intake device according to claim 9, characterized in that: The filter holder (31) is provided with a second notch corresponding to the position of the sewage discharge notch (411).

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