Electron beam welding method for HCM copper target material

Abstract

The invention relates to an electron beam welding method for an HCM copper target material, which comprises the following steps of: assembling and fixing a pot-shaped copper target material main body and an annular target material edge, and then carrying out electron beam welding treatment on an assembling part to obtain the HCM copper target material, and the linear speed of the electron beam welding treatment is 14-16 mm / s. The pot-shaped copper target material body and the annular target material edge are welded and fixed through electron beam welding treatment, the integrated forming effect can be achieved, compared with integrated punch forming, the welding strength is guaranteed, meanwhile, the welding appearance can meet the standard requirement, and batch production is easy to achieve.

Description

Technical Field

[0001] The invention relates to the technical field of electron beam welding, and in particular to an electron beam welding method for a HCM copper target material. Background Art

[0002] HCM copper targets have high purity, high electrical conductivity, good thermal conductivity and excellent mechanical strength, so they are widely used in semiconductor manufacturing, flat panel displays and new energy fields. At present, special-shaped targets are mainly mass-produced by one-piece stamping or electron beam welding. One-piece stamping can improve production efficiency, reduce processing steps, thereby reducing costs, and usually has good structural integrity and consistency. However, it requires complex mold design and is not suitable for HCM copper target production. Electron beam welding has the advantages of high energy density, good weld appearance, good material compatibility and a wide range of welding process parameter adjustment. It is suitable for use in HCM copper target welding production.

[0003] CN110257783A discloses a low-cost preparation method of a titanium-silicon alloy target material, comprising: mixing: uniformly mixing sponge titanium and crystalline silicon in proportion; electrode pressing: pressing the mixed raw materials into electrode rods, and then heating the electrode rods; primary consumable smelting: welding the heated electrode rods, and then performing a first vacuum consumable smelting to obtain a titanium-silicon alloy primary ingot; welding: flattening the two ends of the titanium-silicon alloy primary ingot, combining the titanium-silicon alloy primary ingots and welding them by vacuum electron beam welding technology to obtain electrode material; secondary consumable smelting: performing a second vacuum consumable smelting on the electrode material to obtain a titanium-silicon alloy secondary ingot; and processing the titanium-silicon alloy secondary ingot. CN1880000A discloses electron beam welding of sputtering target plates, including providing a sputtering target material strip or powder on at least one predetermined boundary line between at least two sputtering target plates that have not yet been positioned and are located on a support surface; arranging the at least two sputtering target plates in parallel in a manner that the edges of the at least two sputtering target plates are adjacent to each other and form at least one boundary line on the sputtering target material strip or powder; exhausting the gas in the electron beam welding chamber; preheating the at least two sputtering target plates and the sputtering target material strip or powder to a preheating temperature lower than the temperature at which the at least two sputtering target plates begin to melt, undergo a change in physical state, or substantially undergo decomposition; and welding the at least two sputtering target plates arranged in parallel into a large sputtering target. The above method adopts the electron beam welding method for welding production, but the parameters and process steps adopted are not suitable for welding production of HCM copper targets. Summary of the invention

[0004] In view of the shortcomings of the prior art, the object of the present invention is to provide an electron beam welding method for HCM copper target material, which achieves an integrated molding effect while ensuring that the welding strength and welding appearance can meet the standard requirements.

[0005] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0006] The present invention provides an electron beam welding method for a HCM copper target material, the electron beam welding method comprising the following steps:

[0007] Assembling and fixing the pot-shaped copper target body and the annular target edge, and then performing electron beam welding on the assembly portion to obtain the HCM copper target;

[0008] The line speed of the electron beam welding process is 14-16 mm / s.

[0009] The electron beam welding method of the HCM copper target provided by the present invention adopts electron beam welding to weld and fix the pot-shaped copper target body and the edge of the annular target, so as to achieve the effect of one-piece molding. Compared with one-piece stamping molding, while ensuring the welding strength, the welding appearance can also meet the standard requirements, and it is easy to realize mass production.

[0010] The line speed of the electron beam welding process is 14-16 mm / s, for example, it can be 14 mm / s, 14.5 mm / s, 15 mm / s, 15.5 mm / s or 16 mm / s, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0011] The present invention can effectively improve welding quality, ensure uniform weld formation, reduce welding defects such as pores, cracks, and lack of fusion by controlling the line speed of electron beam welding processing within a reasonable range, and at the same time optimize the molten pool depth and molten pool width, thereby improving process stability and repeatability.

[0012] Preferably, the assembly and fixation is such that the edge of the annular target is sleeved on the peripheral side wall of the opening of the pot-shaped copper target body.

[0013] Preferably, a peripheral side wall of the opening of the pot-shaped copper target body is provided with a clamping groove along the circumferential direction, and the clamping groove is used to clamp the edge of the annular target.

[0014] The arrangement of the clamping groove can achieve preliminary fixation of the edge of the annular target material before the electron beam welding process, thereby preventing the edge of the annular target material from sliding down along the pot-shaped copper target material body.

[0015] Preferably, the beam current of the electron beam welding process is 20-75 mA, for example, 20 mA, 30 mA, 40 mA, 60 mA, 65 mA or 75 mA, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0016] Preferably, the welding diameter of the electron beam welding process is 397-407 mm, for example, 397 mm, 400 mm, 403 mm, 405 mm or 407 mm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0017] Preferably, the focusing current of the electron beam welding process is 515-700 mA, for example, it can be 515 mA, 530 mA, 560 mA, 600 mA, 655 mA, 670 mA or 700 mA, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0018] Preferably, the actual time of the electron beam welding process is 88-90 s, for example, 88 s, 88.5 s, 89 s, 89.5 s or 90 s, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0019] Preferably, the beam rise time of the electron beam welding process is 14-16s, for example, 14s, 14.5s, 15s, 15.5s or 16s, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0020] Preferably, the beam fall time of the electron beam welding process is 24-26s, for example, 24s, 24.5s, 25s, 25.5s or 26s, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0021] As a preferred technical solution of the electron beam welding method described in the present invention, the electron beam welding method comprises the following steps:

[0022] The pot-shaped copper target body and the edge of the annular target are assembled and fixed, so that the edge of the annular target is sleeved on the outer side wall of the opening of the pot-shaped copper target body, and the outer side wall of the opening of the pot-shaped copper target body is provided with a slot along the circumferential direction, and the slot is used to clamp the edge of the annular target; then the assembly part is subjected to electron beam welding, and the line speed of the electron beam welding process is 14-16mm / s, the beam current is 20-75mA, the welding diameter is 397-407mm, the focusing current is 515-700mA, the beam rise time is 14-16s, the beam fall time is 24-26s, and the actual time is 88-90s to obtain the HCM copper target.

[0023] Compared with the prior art, the present invention has the following beneficial effects:

[0024] The electron beam welding method of the HCM copper target provided by the present invention uses electron beam welding to weld and fix the pot-shaped copper target body and the edge of the annular target, and controls the line speed of the electron beam welding process within a reasonable range, so as to achieve the effect of one-piece forming, effectively improve the welding quality, ensure uniform weld formation, reduce welding defects such as pores, cracks, and unfused welds, optimize the molten pool depth and molten pool width, and improve the stability and repeatability of the process. Compared with one-piece stamping, the electron beam welding method provided by the present invention ensures welding strength, and the welding appearance can also meet standard requirements, and it is easy to realize mass production. DETAILED DESCRIPTION

[0025] The technical solution of the present invention is further described below by specific implementation methods. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0026] Example 1

[0027] This embodiment provides an electron beam welding method for a HCM copper target, the electron beam welding method comprising the following steps:

[0028] The pot-shaped copper target body and the edge of the annular target are assembled and fixed, so that the edge of the annular target is sleeved on the outer side wall of the opening of the pot-shaped copper target body, and the outer side wall of the opening of the pot-shaped copper target body is provided with a slot along the circumferential direction, and the slot is used to clamp the edge of the annular target; then the assembly part is subjected to electron beam welding, and the linear speed of the electron beam welding is 15 mm / s, the beam current is 40 mA, the welding diameter is 407 mm, the focusing current is 515 mA, the beam rise time is 15 s, the beam fall time is 25 s, and the actual time is 90 s to obtain the HCM copper target.

[0029] The welding strength between the pot-shaped copper target body and the annular target edge in this embodiment was tested, and the welding strength can reach 50 MPa; visually, the weld between the pot-shaped copper target body and the annular target edge is uniformly formed and has a good appearance.

[0030] Example 2

[0031] This embodiment provides an electron beam welding method for a HCM copper target, the electron beam welding method comprising the following steps:

[0032] The pot-shaped copper target body and the edge of the annular target are assembled and fixed, so that the edge of the annular target is sleeved on the outer side wall of the opening of the pot-shaped copper target body, and the outer side wall of the opening of the pot-shaped copper target body is provided with a slot along the circumferential direction, and the slot is used to clamp the edge of the annular target; then the assembly part is subjected to electron beam welding, and the linear speed of the electron beam welding is 14 mm / s, the beam current is 20 mA, the welding diameter is 397 mm, the focusing current is 670 mA, the beam rise time is 14 s, the beam fall time is 24 s, and the actual time is 88 s to obtain the HCM copper target.

[0033] The welding strength between the pot-shaped copper target body and the annular target edge in this embodiment was tested, and the welding strength could reach 47 MPa. Visual observation showed that the weld between the pot-shaped copper target body and the annular target edge was uniform and had a good appearance.

[0034] Example 3

[0035] This embodiment provides an electron beam welding method for a HCM copper target, the electron beam welding method comprising the following steps:

[0036] The pot-shaped copper target body and the edge of the annular target are assembled and fixed, so that the edge of the annular target is sleeved on the outer side wall of the opening of the pot-shaped copper target body, and the outer side wall of the opening of the pot-shaped copper target body is provided with a slot along the circumferential direction, and the slot is used to clamp the edge of the annular target; then the assembly is subjected to electron beam welding, and the line speed of the electron beam welding is 16 mm / s, the beam current is 75 mA, the welding diameter is 397 mm, the focusing current is 700 mA, the beam rise time is 16 s, the beam fall time is 26 s, and the actual time is 90 s to obtain the HCM copper target.

[0037] The welding strength between the pot-shaped copper target body and the annular target edge in this embodiment was tested, and the welding strength could reach 48 MPa; visual observation showed that the weld between the pot-shaped copper target body and the annular target edge was uniform and had a good appearance.

[0038] Example 4

[0039] This embodiment provides an electron beam welding method for a HCM copper target, which is different from Embodiment 1 in that, except that the beam current of the electron beam welding process is adjusted to 15 mA, the rest is the same as Embodiment 1.

[0040] In this embodiment, due to the low beam current, the weld will be poorly formed and the welding strength will decrease. The welding strength between the pot-shaped copper target body and the edge of the annular target was tested and the welding strength was 42 MPa.

[0041] Example 5

[0042] This embodiment provides an electron beam welding method for a HCM copper target, which is different from Embodiment 1 in that, except for adjusting the beam current of the electron beam welding process to 80 mA, the rest is the same as Embodiment 1.

[0043] In this embodiment, due to the excessively high beam current, uneven penetration depth, poor weld formation and increased welding defects will result. The welding strength between the pot-shaped copper target body and the edge of the annular target is tested and the welding strength is 45 MPa.

[0044] Example 6

[0045] This embodiment provides an electron beam welding method for a HCM copper target. The difference from Embodiment 1 is that no slot is provided on the outer side wall of the opening of the pot-shaped copper target body, and the rest is the same as Embodiment 1.

[0046] In this embodiment, since the outer side wall of the opening of the pot-shaped copper target body is not provided with a slot, the assembly effect of the outer side wall of the opening of the pot-shaped copper target body and the edge of the annular target will be reduced, thereby affecting the welding strength. The welding strength between the pot-shaped copper target body and the edge of the annular target is tested, and the welding strength is 43MPa.

[0047] Example 7

[0048] This embodiment provides an electron beam welding method for a HCM copper target, which is different from Embodiment 1 in that, except for adjusting the focusing current of the electron beam welding process to 500 mA, the rest is the same as Embodiment 1.

[0049] In this embodiment, since the focusing current is too low, the weld penetration depth is insufficient, the weld formation is poor and welding defects are increased. The welding strength between the pot-shaped copper target body and the edge of the annular target is tested, and the welding strength is 44MPa.

[0050] Example 8

[0051] This embodiment provides an electron beam welding method for a HCM copper target, which is different from Embodiment 1 in that, except for adjusting the focusing current of the electron beam welding process to 720 mA, the rest is the same as Embodiment 1.

[0052] In this embodiment, since the focusing current is too high, the weld penetration will be too large, the weld shape will be poor and welding defects will increase. The welding strength between the pot-shaped copper target body and the edge of the annular target is tested, and the welding strength is 46MPa.

[0053] Comparative Example 1

[0054] This comparative example provides an electron beam welding method for a HCM copper target, which is different from Example 1 in that, except for adjusting the linear speed of the electron beam welding process to 12 mm / s, the rest is the same as Example 1.

[0055] In this comparative example, due to the low line speed, the weld surface will be concave and the molten pool will be unstable. The welding strength between the pot-shaped copper target body and the edge of the annular target was tested, and the welding strength was 40 MPa.

[0056] Comparative Example 2

[0057] This comparative example provides an electron beam welding method for a HCM copper target, which is different from Example 1 in that, except for adjusting the linear speed of the electron beam welding process to 18 mm / s, the rest is the same as Example 1.

[0058] In this comparative example, due to the excessively high line speed, incomplete penetration defects will occur and pores will appear in the weld. The welding strength between the pot-shaped copper target body and the edge of the annular target is tested, and the welding strength is 36 MPa.

[0059] In summary, the electron beam welding method of the HCM copper target provided by the present invention uses electron beam welding to weld and fix the pot-shaped copper target body and the edge of the annular target, and controls the line speed of the electron beam welding process within a reasonable range, which can achieve the effect of one-piece molding, and effectively improve the welding quality, ensure uniform weld formation, reduce welding defects such as pores, cracks, and unfused welds, optimize the molten pool depth and molten pool width, and improve the stability and repeatability of the process. Compared with one-piece stamping, the electron beam welding method provided by the present invention ensures that the welding strength is met, and the welding appearance can also meet the standard requirements, and it is easy to achieve mass production.

[0060] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. An electron beam welding method for HCM copper target, characterized in that: The electron beam welding method comprises the following steps: Assembling and fixing the pot-shaped copper target body and the annular target edge, and then performing electron beam welding on the assembly portion to obtain the HCM copper target; The line speed of the electron beam welding process is 14-16 mm / s.

2. The electron beam welding method according to claim 1, characterized in that: The assembly and fixing is to make the edge of the annular target material sleeved on the peripheral side wall of the opening of the pot-shaped copper target material body.

3. The electron beam welding method according to claim 2, characterized in that: A clamping groove is provided on the outer side wall of the opening of the pot-shaped copper target body along the circumferential direction, and the clamping groove is used to clamp the edge of the annular target.

4. The electron beam welding method according to any one of claims 1 to 3, characterized in that: The beam current of the electron beam welding process is 20-75 mA.

5. The electron beam welding method according to any one of claims 1 to 4, characterized in that: The welding diameter of the electron beam welding process is 397-407 mm.

6. The electron beam welding method according to any one of claims 1 to 5, characterized in that: The focusing current of the electron beam welding process is 515-700 mA.

7. The electron beam welding method according to any one of claims 1 to 6, characterized in that: The actual time of the electron beam welding process is 88-90 s.

8. The electron beam welding method according to any one of claims 1 to 7, characterized in that: The beam rise time of the electron beam welding process is 14-16s.

9. The electron beam welding method according to any one of claims 1 to 8, characterized in that: The beam fall time of the electron beam welding process is 24-26s.

10. The electron beam welding method according to claim 1, characterized in that: The electron beam welding method comprises the following steps: The pot-shaped copper target body and the edge of the annular target are assembled and fixed, so that the edge of the annular target is sleeved on the outer side wall of the opening of the pot-shaped copper target body, and the outer side wall of the opening of the pot-shaped copper target body is provided with a slot along the circumferential direction, and the slot is used to clamp the edge of the annular target; then the assembly part is subjected to electron beam welding, and the line speed of the electron beam welding process is 14-16mm / s, the beam current is 20-75mA, the welding diameter is 397-407mm, the focusing current is 515-700mA, the beam rise time is 14-16s, the beam fall time is 24-26s, and the actual time is 88-90s to obtain the HCM copper target.