Fuse structure

By increasing the contact area between the electrode and the contact structure and setting a fuse zone on the fuse, the problems of weak flow capacity and poor current stability of the fuse structure in the prior art are solved, and a more stable and reliable fuse effect is achieved.

CN119786491APending Publication Date: 2025-04-08MAXSCEND SEMICONDUCTOR LAKEVIEW CO LTD
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Patent Information

Application Number
CN202411995584.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-31
Publication Date
2025-04-08

AI Technical Summary

Technical Problem

The fuse structure in the prior art has weak flow capacity and poor current stability, which leads to unstable fuse time and affects the reliability of fuse.

Method used

By increasing the contact area between the electrode and the contact structure, the flow capacity of the fuse structure is improved, and a fuse zone is set on the fuse to ensure that the fuse occurs in a specific area, thereby improving the stability and reliability of the fuse time.

Benefits of technology

The flow capacity and current stability of the fuse structure are improved, the stability and reliability of the fuse time are ensured, and the overall performance of the fuse structure is improved.

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Abstract

The invention discloses a fuse structure, and belongs to the technical field of semiconductors. The fuse structure comprises two electrodes which are distributed at an interval along a first direction; the fuse wire extends along the first direction and is connected between the two electrodes; the two contact structures are positioned on one side of the thickness direction of the electrodes and are correspondingly contacted with the two electrodes respectively; wherein the ratio of the contact area of the contact structure and the corresponding electrode to the first target surface area is larger than or equal to the target ratio, the first target surface area is the surface area of the side, close to the contact structure, of the corresponding electrode, and the ratio of the second target surface area to the contact area of the contact structure and the corresponding electrode is larger than or equal to 100%. The second target surface area is the surface area of the contact structure close to one side of the corresponding electrode, and the thickness direction is perpendicular to the first direction. According to the fuse structure, the through-current capability of the fuse structure can be improved, the stability of the fusing time is improved, and thus the fusing reliability is improved.
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Description

Technical Field

[0001] The present application belongs to the field of semiconductor technology, and in particular, relates to a fuse structure. Background Art

[0002] As the level of integrated circuit design improves, the chip design process becomes more and more complex, which will inevitably bring more defects to the chip and reduce the chip yield. In order to improve the chip yield, redundancy technology is also constantly developing, and fuse structures are widely used in redundant circuits to improve chip failure problems.

[0003] However, the current carrying capacity of the fuse structure in the related art is weak and the current stability is poor, which leads to unstable fusing time of the fuse structure and affects the reliability of fusing of the fuse structure. Summary of the invention

[0004] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a fuse structure that can improve the current carrying capacity of the fuse structure, improve the stability of the fusing time, and thus improve the reliability of the fusing.

[0005] The present application provides a fuse structure, comprising:

[0006] Two electrodes are spaced apart and distributed along a first direction;

[0007] a fuse extending along the first direction and connected between the two electrodes;

[0008] Two contact structures are located on one side of the electrode in the thickness direction and are in contact with the two electrodes respectively;

[0009] Among them, the ratio of the contact area between the contact structure and the corresponding electrode to the first target surface area is greater than or equal to the target ratio, the first target surface area is the surface area of ​​the corresponding electrode close to the contact structure, the ratio of the second target surface area to the contact area between the contact structure and the corresponding electrode is greater than or equal to 100%, the second target surface area is the surface area of ​​the contact structure close to the corresponding electrode, and the thickness direction is perpendicular to the first direction.

[0010] According to one embodiment of the present application, the width of the contact structure along the second direction is greater than or equal to the width of the corresponding electrode along the second direction; the second direction is perpendicular to the first direction and the thickness direction respectively; each of the two opposite sides of the contact structure along the second direction is flush with or exceeds the same side of the corresponding electrode.

[0011] According to an embodiment of the present application, the distances between two opposite sides of the contact structure along the second direction and two corresponding sides of the corresponding electrode along the second direction are equal.

[0012] According to one embodiment of the present application, a side of the contact structure facing away from the fuse is flush with a side of the corresponding electrode facing away from the fuse or exceeds a side of the corresponding electrode facing away from the fuse; a side of the contact structure close to the fuse is flush with a side of the corresponding electrode close to the fuse or spaced apart from the fuse along the first direction.

[0013] According to one embodiment of the present application, the contact structure includes at least one contact distributed along the first direction, each contact is in contact with the corresponding electrode; the two electrodes include a cathode and an anode, the contact structure corresponding to the cathode includes at least two contacts, and the contact structure corresponding to the anode includes at least one contact.

[0014] According to an embodiment of the present application, the contact is located at a center point of an orthographic projection of a plane where the electrode is located, and the center point of the electrode and the fuse are located on the same straight line.

[0015] According to one embodiment of the present application, the target ratio is greater than or equal to 80%.

[0016] According to an embodiment of the present application, the fuse includes a fusing region, and a width of the fusing region of the fuse is smaller than a body width of the fuse.

[0017] According to an embodiment of the present application, the distance between the fusing region and the two electrodes is respectively greater than or equal to one quarter of the length of the fuse.

[0018] According to one embodiment of the present application, the length of the fuse is L, the main body width of the fuse is W, the width of the fuse zone of the fuse is 17W / 30-23W / 30, and the length of the fuse zone of the fuse is L / 4-L / 2; the two electrodes include a cathode and an anode, the widths of the cathode and the anode are 5W / 2-7W / 2 respectively, the length of the cathode is 4W-5W, and the length of the anode is 2W-3W.

[0019] The above one or more technical solutions in the embodiments of the present application have at least one of the following technical effects:

[0020] By increasing the contact area between the electrode and the corresponding contact structure, the ratio of the contact area between the electrode and the corresponding contact structure to the surface area of ​​the electrode on the side close to the corresponding contact structure is greater than or equal to a target ratio, so as to improve the current carrying capacity of the fuse structure and improve the stability of the current flowing through the fuse structure, thereby improving the stability of the fusing time of the fuse in the fuse structure, and further improving the reliability of the fusing of the fuse structure;

[0021] Furthermore, by setting a fusing zone on the fuse, the width of the fusing zone of the fuse is smaller than the width of the fuse body, so that the fuse is blown in the fusing zone, thereby improving the stability of the fuse blowing position and further improving the fusing reliability of the fuse structure.

[0022] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0024] Figure 1 is a structural schematic diagram of a fuse structure provided in an embodiment of the present application;

[0025] Figure 2 It is a cross-sectional schematic diagram of a fuse structure provided in an embodiment of the present application. DETAILED DESCRIPTION

[0026] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be understood as limiting the present application.

[0027] The fuse structure provided by the embodiments of the present application is described below with reference to the accompanying drawings.

[0028] Figure 1 A schematic diagram of the structure of the fuse structure provided in the embodiment of the present application, Figure 2 It is a cross-sectional schematic diagram of a fuse structure provided in an embodiment of the present application.

[0029] like Figure 1 As shown, the fuse structure provided in the embodiment of the present application includes two electrodes, a fuse 2 and two contact structures.

[0030] The two electrodes are spaced apart along the first direction X. For example, the two electrodes may be a cathode 11 and an anode 12. When the fuse structure is working, the anode 12 may be used to connect a programming voltage, and the cathode 11 may be used to be grounded.

[0031] The fuse 2 extends along the first direction X and is connected between the two electrodes. Figure 1 As shown, the cathode 11, the fuse 2 and the anode 12 are connected in sequence along the first direction X.

[0032] The two contact structures are located on one side of the thickness direction H of the electrode and are in contact with the two electrodes respectively. The ratio of the contact area between the contact structure and the corresponding electrode to the first target surface area is greater than or equal to the target ratio, the target surface area is the surface area of ​​the corresponding electrode close to the contact structure, the ratio of the second target surface area to the contact area between the contact structure and the corresponding electrode is greater than or equal to 100%, the second target surface area is the surface area of ​​the contact structure close to the corresponding electrode, and the thickness direction H is perpendicular to the first direction X.

[0033] For example, the two contact structures may be a cathode contact structure 31 and an anode contact structure 32. The cathode contact structure 31 is located on one side of the thickness direction H of the cathode 11 and contacts the cathode 11. The anode contact structure 32 is located on one side of the thickness direction H of the anode 12 and contacts the anode 12.

[0034] The ratio of the contact area between the cathode contact structure 31 and the cathode 11 to the upper surface area of ​​the cathode 11 (i.e., the surface area of ​​the cathode 11 on the side close to the cathode contact structure 31) is greater than or equal to the target ratio, that is, the ratio of the contact area between the cathode contact structure 31 and the cathode 11 to the upper surface area of ​​the cathode 11 is a first ratio, and the first ratio is greater than or equal to the target ratio.

[0035] The ratio of the contact area between the anode contact structure 32 and the anode 12 to the upper surface area of ​​the anode 12 (i.e., the surface area of ​​the anode 12 on the side close to the cathode contact structure 31) is greater than or equal to the target ratio, that is, the ratio of the contact area between the anode contact structure 32 and the anode 12 to the upper surface area of ​​the anode 12 is a second ratio, and the second ratio is greater than or equal to the target ratio. The first ratio and the second ratio may be the same or different.

[0036] The ratio of the surface area of ​​the cathode contact structure 31 close to the cathode 11 (i.e., the lower surface area of ​​the cathode contact structure 31) to the contact area between the cathode contact structure 31 and the cathode 11 is greater than or equal to 100%, that is, the cathode contact structure 31 can be located inside the cathode 11 or can be arranged beyond the cathode 11. The ratio of the surface area of ​​the anode contact structure 32 close to the anode 12 (i.e., the lower surface area of ​​the anode contact structure 32) to the contact area between the anode contact structure 32 and the anode 11 is greater than or equal to 100%, that is, the anode contact structure 32 can be located inside the anode 12 or can be arranged beyond the anode 12.

[0037] In some embodiments, Figure 2As shown, the fuse structure may include an insulating layer 104, a conductive layer 105, and an isolation structure 102. The insulating layer 104 may be used for shallow trench isolation, and the material of the insulating layer 104 may include oxide. The conductive layer 105 is located on one side of the insulating layer 104 along the thickness direction H. The isolation structure 102 is located on opposite sides of the conductive layer 105 along the second direction Y. The material of the isolation structure 102 may include silicon nitride, etc.

[0038] The conductive layer 105 may include a polysilicon layer 103 and a silicide layer 101. The polysilicon layer 103 is located on one side of the insulating layer 104 along the thickness direction H. The polysilicon layer 103 may be P-type doped or N-type doped, and the doping ions of the polysilicon layer 103 may include boron or arsenic. The silicide layer 101 is located on the side of the polysilicon layer 103 away from the insulating layer 104. The material of the silicide layer 101 may include self-aligned silicide, such as cobalt silicide.

[0039] The fuse structure may include a cathode region, an anode region, and a fuse region between the cathode region and the anode region. The conductive layer 105 in the cathode region constitutes a cathode 11, the conductive layer 105 in the anode region constitutes an anode 12, and the conductive layer 105 in the fuse region constitutes a fuse 2. The cathode contact structure 31 is located in the cathode region, the cathode contact structure 31 is located on the side of the conductive layer 105 away from the insulating layer 104, and is connected to the conductive layer 105 (i.e., cathode 11) in the cathode region. The anode contact structure 32 is located in the anode region, the anode contact structure 32 is located on the side of the conductive layer 105 away from the insulating layer 104, and is connected to the conductive layer 105 (i.e., anode 12) in the anode region.

[0040] During the operation of the fuse structure, the anode 12 is connected to the working voltage, the cathode 11 is grounded, the cathode 11 and the anode 12 have different potentials, and there is a voltage difference between the cathode 11 and the anode 12. When the current flows through the conductive layer 105 (i.e., fuse 2) of the fuse region of the fuse structure, since the resistivity of the silicide layer 101 is greater than the resistivity of the polysilicon layer 103, the current is mainly concentrated in the polysilicon layer 103, and electromigration occurs in the polysilicon layer 103. A large number of silicon atoms in the polysilicon layer 103 flow with the electrons to form holes in the fuse 2. The holes in the fuse 2 show a high resistance state, which prevents the migration of silicon atoms and electrons, and finally shows a permanent circuit break. The resistance of the fuse 2 changes before and after the fuse is blown, and the resistance after the fuse is blown is much higher than the resistance before the fuse is blown. The fuse structure uses the difference in the resistance of the fuse 2 before and after the fuse is blown to realize the storage of circuit data.

[0041] In the related art, the cathode contact structure and the anode contact structure in the fuse structure are small in size, the cathode contact structure is located inside the cathode, and the contact area between the cathode contact structure and the cathode is small, and the anode contact structure is located inside the anode, and the contact area between the anode contact structure and the anode is small. The current carrying capacity of the fuse structure is weak, and the current stability is poor, the melting time is unstable, and the melting reliability is low.

[0042] In the present embodiment, the sizes of the cathode contact structure 31 and the anode contact structure 32 are increased, thereby increasing the contact area between the cathode 11 and the cathode contact structure 31, so that the ratio of the contact area between the cathode 11 and the cathode contact structure 31 to the upper surface area of ​​the cathode 11 (i.e., the surface area of ​​the cathode 11 on the side close to the cathode contact structure 31) is greater than or equal to a first ratio, and the contact area between the anode 11 and the anode contact structure 32 is increased, so that the ratio of the contact area between the anode 11 and the anode contact structure 32 to the upper surface area of ​​the anode 11 (i.e., the surface area of ​​the anode 12 on the side close to the cathode contact structure 31) is greater than or equal to a second ratio, so as to improve the current carrying capacity of the fuse structure and improve the stability of the current flowing through the fuse structure, thereby improving the stability of the blowing time of the fuse 2 in the fuse structure, and further improving the reliability of the blowing of the fuse structure.

[0043] In some embodiments, the target ratio is greater than or equal to 80%, that is, the ratio of the contact area between the contact structure and the corresponding electrode to the surface area of ​​the corresponding electrode close to the contact structure is greater than or equal to 80%, that is, the ratio of the contact area between the contact structure and the corresponding electrode to the surface area of ​​the corresponding electrode close to the contact structure is 80%-100%. When the ratio of the contact area between the contact structure and the corresponding electrode to the surface area of ​​the corresponding electrode close to the contact structure is 100%, the contact structure completely covers the corresponding electrode.

[0044] For example, the ratio of the contact area between the cathode contact structure 31 and the cathode 11 to the upper surface area of ​​the cathode 11 may be 80%-100%, and the ratio of the contact area between the anode contact structure 32 and the anode 12 to the upper surface area of ​​the anode 12 may be 80%-100%.

[0045] During the operation of the fuse structure, electrons are emitted from the cathode 11 to the anode 12. The ratio of the contact area between the cathode contact structure 31 and the cathode 11 to the upper surface area of ​​the cathode 11 is at least 80%, which can improve the ability and stability of the cathode 11 to emit electrons and increase the current. The ratio of the contact area between the anode contact structure 32 and the anode 12 to the upper surface area of ​​the anode 12 is at least 80%, which can improve the current carrying capacity and current stability of the fuse structure, thereby improving the stability of the blowing time of the fuse 2, and further improving the reliability of the fuse structure. It should be noted that the larger the target ratio, the better the effect of improving the reliability of the fuse structure.

[0046] In some embodiments, the width of the contact structure along the second direction Y is greater than or equal to the width of the corresponding electrode along the second direction Y. The second direction Y is perpendicular to the first direction X and the thickness direction H. Each of the two opposite sides of the contact structure along the second direction Y is flush with or exceeds the same side of the corresponding electrode.

[0047] The contact structure includes a first side and a second side on opposite sides along the second direction Y, and the electrode includes a first side and a second side on opposite sides along the second direction Y. The first side of the contact structure and the first side of the electrode are located on the same side, and the second side of the contact structure and the second side of the electrode are located on the same side.

[0048] The first side of the contact structure may be arranged flush with the first side of the corresponding electrode, or the first side of the contact structure may extend beyond the first side of the corresponding electrode. The second side of the contact structure may be arranged flush with the second side of the corresponding electrode, or the second side of the contact structure may extend beyond the second side of the corresponding electrode.

[0049] For example, the width of the cathode contact structure 31 along the second direction Y is greater than or equal to the width of the cathode 11 along the second direction Y. When the width of the cathode contact structure 31 along the second direction Y is equal to the width of the cathode 11 along the second direction Y, the first side of the cathode contact structure 31 is flush with the first side of the cathode 11, and the second side of the cathode contact structure 31 is flush with the second side of the cathode 11. When the width of the cathode contact structure 31 along the second direction Y is greater than the width of the cathode 11 along the second direction Y, the first side of the cathode contact structure 31 exceeds the first side of the cathode 11 (that is, the orthographic projection of the first side of the cathode contact structure 31 on the plane where the electrode is located is outside the cathode 11), and the second side of the cathode contact structure 31 is arranged flush with the second side of the cathode 11; or, the second side of the cathode contact structure 31 exceeds the second side of the cathode 11 (that is, the orthographic projection of the second side of the cathode contact structure 31 on the plane where the electrode is located is outside the cathode 11), and the first side of the cathode contact structure 31 is arranged flush with the first side of the cathode 11; or, the first side of the cathode contact structure 31 exceeds the first side of the cathode 11, and the second side of the cathode contact structure 31 exceeds the second side of the cathode 11.

[0050] When the first side and the second side of the cathode contact structure 31 extend beyond the first side and the second side of the cathode 11 respectively, the distance by which the first side of the cathode contact structure 31 extends beyond the first side of the cathode 11 (i.e., the distance between the first side of the cathode contact structure 31 and the first side of the cathode 11 in the second direction Y) and the distance by which the second side of the cathode contact structure 31 extends beyond the second side of the cathode 11 (i.e., the distance between the second side of the cathode contact structure 31 and the second side of the cathode 11 in the second direction Y) may be the same or different.

[0051] The width of the anode contact structure 32 along the second direction Y is greater than or equal to the width of the anode 12 along the second direction Y. In the case where the width of the anode contact structure 32 along the second direction Y is equal to the width of the anode 12 along the second direction Y, the first side of the anode contact structure 32 is arranged flush with the first side of the anode 12, and the second side of the anode contact structure 32 is arranged flush with the second side of the anode 12. In the case where the width of the anode contact structure 32 along the second direction Y is greater than the width of the anode 12 along the second direction Y, the first side of the anode contact structure 32 exceeds the first side of the anode 12 (that is, the orthographic projection of the first side of the anode contact structure 32 on the plane where the electrode is located is located outside the anode 12), and the second side of the anode contact structure 32 is arranged flush with the second side of the anode 12; or, the second side of the anode contact structure 32 exceeds the second side of the anode 12 (that is, the orthographic projection of the second side of the anode contact structure 32 on the plane where the electrode is located is located outside the anode 12), and the first side of the anode contact structure 32 is arranged flush with the first side of the anode 12; or, the first side of the anode contact structure 32 exceeds the first side of the anode 12, and the second side of the anode contact structure 32 exceeds the second side of the anode 12.

[0052] In the case where the first side and the second side of the anode contact structure 32 extend beyond the first side and the second side of the anode 12 respectively, the distance by which the first side of the anode contact structure 32 extends beyond the first side of the anode 12 (i.e., the distance between the first side of the anode contact structure 32 and the first side of the anode 12 in the second direction Y) and the distance by which the second side of the anode contact structure 32 extends beyond the second side of the anode 12 (i.e., the distance between the second side of the anode contact structure 32 and the second side of the anode 12 in the second direction Y) may be the same or different.

[0053] The cathode contact structure 31 in this embodiment completely covers the cathode 11 along the second direction Y to increase the contact area between the cathode contact structure 31 and the cathode 11, and the anode contact structure 32 completely covers the anode 12 along the second direction Y to increase the contact area between the anode contact structure 32 and the anode 12, thereby improving the current carrying capacity of the fuse structure.

[0054] In some embodiments, the distances between the two opposite sides of the contact structure along the second direction Y and the two corresponding sides of the corresponding electrode along the second direction Y in the second direction Y are equal.

[0055] The distance between the first side of the contact structure and the first side of the corresponding electrode in the second direction Y is the same as the distance between the second side of the contact structure and the second side of the corresponding electrode in the second direction Y.

[0056] For example, when the width of the cathode contact structure 31 along the second direction Y is greater than the width of the cathode 11 along the second direction Y, the distance that the first side of the cathode contact structure 31 extends beyond the first side of the cathode 11 is the same as the distance that the second side of the cathode contact structure 31 extends beyond the second side of the cathode 11.

[0057] When the width of the anode contact structure 32 along the second direction Y is greater than the width of the anode 12 along the second direction Y, the distance that the first side of the anode contact structure 32 extends beyond the first side of the anode 12 is the same as the distance that the second side of the anode contact structure 32 extends beyond the second side of the anode 12 .

[0058] In this embodiment, the spacing between the first side of the cathode contact structure 31 and the first side of the cathode 11 in the second direction Y is the same as the spacing between the second side of the cathode contact structure 31 and the second side of the cathode 11 in the second direction Y, and the spacing between the first side of the anode contact structure 32 and the first side of the anode 12 in the second direction Y is the same as the spacing between the second side of the anode contact structure 32 and the second side of the anode 12 in the second direction Y, which can reduce the process complexity of the fuse structure.

[0059] In some embodiments, the spacings between the two opposite sides of the contact structure along the second direction Y and the two opposite sides of the corresponding electrode along the second direction Y are 15-25 nm respectively.

[0060] The spacing between the first side of the contact structure and the first side of the corresponding electrode in the second direction is 15-25 nm, and the spacing between the second side of the contact structure and the second side of the corresponding electrode in the second direction is 15-25 nm.

[0061] For example, when the width of the cathode contact structure 31 along the second direction Y is greater than the width of the cathode 11 along the second direction Y, the distance that the first side of the cathode contact structure 31 exceeds the first side of the cathode 11 is a first distance, and the first distance may be 15-25 nm. The distance that the second side of the cathode contact structure 31 exceeds the second side of the cathode 11 is a second distance, and the second distance may be 15-25 nm. The first distance and the second distance may be the same or different.

[0062] In the case where the width of the anode contact structure 32 along the second direction Y is greater than the width of the anode 12 along the second direction Y, the distance by which the first side of the anode contact structure 32 exceeds the first side of the anode 12 is a third distance, and the third distance may be 15-25 nm. The distance by which the second side of the anode contact structure 32 exceeds the second side of the anode 12 is a fourth distance, and the fourth distance may be 15-25 nm. The third distance and the fourth distance may be the same or different. The third distance may be the same or different from the first distance. The fourth distance may be the same or different from the second distance.

[0063] In this embodiment, the first distance, the second distance, the third distance and the fourth distance can be set to 15-25nm respectively, which can provide a certain process margin for the fuse structure, reduce the risk of OVL (overlay) and CD (Critical Dimension) deviation, and improve the process accuracy and device performance of the fuse structure.

[0064] In some embodiments, the side of the contact structure facing away from the fuse 2 is flush with the side of the corresponding electrode facing away from the fuse 2 or exceeds the side of the corresponding electrode facing away from the fuse 2. The side of the contact structure close to the fuse 2 is flush with the side of the corresponding electrode close to the fuse 2 or is spaced from the fuse 2 along the first direction X.

[0065] The two opposite sides of the contact structure along the first direction X include a third side and a fourth side. The side of the contact structure away from the fuse 2 is the third side of the contact structure, and the side of the contact structure close to the fuse 2 is the fourth side of the contact structure. The two opposite sides of the electrode along the first direction X include a third side and a fourth side. The side of the electrode away from the fuse 2 is the third side of the electrode, that is, the third side of the contact structure and the third side of the electrode are located on the same side. The side of the electrode close to the fuse 2 is the fourth side of the electrode, that is, the fourth side of the contact structure and the fourth side of the electrode are located on the same side.

[0066] The third side of the contact structure may be arranged flush with the third side of the corresponding electrode, or the third side of the contact structure may extend beyond the third side of the corresponding electrode. The fourth side of the contact structure may be arranged flush with the fourth side of the corresponding electrode, or the fourth side of the contact structure may be arranged spaced apart from the fuse 2 along the first direction X, that is, the fourth side of the contact structure is arranged spaced apart from the fourth side of the corresponding electrode along the first direction X.

[0067] For example, the third side of the cathode contact structure 31 is arranged flush with the third side of the cathode 11, or the third side of the cathode contact structure 31 exceeds the third side of the cathode 11 (i.e., the orthographic projection of the third side of the cathode contact structure 31 on the plane where the electrode is located is located outside the cathode 11). The fourth side of the cathode contact structure 31 can be arranged flush with the fourth side of the cathode 11 (i.e., the orthographic projection of the fourth side of the cathode contact structure 31 on the plane where the electrode is located is in contact with the side of the fuse 2 close to the cathode 11), or the fourth side of the cathode contact structure 31 is arranged spaced from the fourth side of the cathode 11 (i.e., the orthographic projection of the fourth side of the cathode contact structure 31 on the plane where the electrode is located is located inside the cathode 11 and spaced from the fuse 2).

[0068] The third side of the anode contact structure 32 is arranged flush with the third side of the anode 12, or the third side of the anode contact structure 32 exceeds the third side of the anode 12 (i.e., the orthographic projection of the third side of the anode contact structure 32 on the plane where the electrode is located is located outside the anode 12). The fourth side of the anode contact structure 32 can be arranged flush with the fourth side of the anode 12 (i.e., the orthographic projection of the fourth side of the anode contact structure 32 on the plane where the electrode is located is in contact with the side of the fuse 2 close to the cathode 11), or the fourth side of the anode contact structure 32 is arranged at intervals from the fourth side of the anode 12 (i.e., the orthographic projection of the fourth side of the anode contact structure 32 on the plane where the electrode is located is located inside the cathode 11 and is arranged at intervals from the fuse 2).

[0069] In this embodiment, the area where the cathode contact structure 31 covers the cathode 11 in the first direction X is increased to increase the contact area between the cathode contact structure 31 and the cathode 11, and the area where the anode contact structure 32 covers the anode 12 in the first direction X is increased to increase the contact area between the anode contact structure 32 and the anode 12, thereby improving the current carrying capacity of the fuse structure.

[0070] In some embodiments, a distance in the first direction X between a side of the contact structure facing away from the fuse 2 and a side of the corresponding electrode facing away from the fuse 2 is 15-25 nm.

[0071] The distance between the third side of the contact structure and the third side of the corresponding electrode in the first direction X is 15-25 nm.

[0072] For example, the distance that the third side of the cathode contact structure 31 exceeds the third side of the cathode 11 is a fifth distance, and the fifth distance may be 15-25 nm. The distance that the third side of the anode contact structure 32 exceeds the third side of the anode 12 is a sixth distance, and the sixth distance may be 15-25 nm. The fifth distance and the sixth distance may be the same or different.

[0073] In this embodiment, the fifth distance and the sixth distance can be set to 15-25 nm respectively, which can provide a certain process margin for the fuse structure, reduce the risk of OVL and CD deviation, and improve the process accuracy and device performance of the fuse structure.

[0074] It should be noted that, when each of the two opposite sides of the contact structure along the second direction Y is arranged flush with the same side of the corresponding electrode, and the side of the contact structure away from the fuse 2 is arranged flush with the side of the corresponding electrode away from the fuse 2, the ratio of the surface area of ​​the contact structure close to the corresponding electrode to the contact area between the contact structure and the corresponding electrode is 100%, that is, the contact area between the contact structure and the corresponding electrode is equal to the surface area of ​​the contact structure close to the corresponding electrode; when any one of the two opposite sides of the contact structure along the second direction Y is arranged beyond the same side of the corresponding electrode, and / or the side of the contact structure away from the fuse 2 is arranged beyond the side of the corresponding electrode away from the fuse 2, the ratio of the surface area of ​​the contact structure close to the corresponding electrode to the contact area between the contact structure and the corresponding electrode is greater than 100%, that is, the contact area between the contact structure and the corresponding electrode is smaller than the surface area of ​​the contact structure close to the corresponding electrode.

[0075] In some embodiments, Figure 1 As shown, the contact structure includes at least one contact point 30 distributed along the first direction X, and each contact point 30 is in contact with a corresponding electrode.

[0076] The contact structure may include one contact point 30 or may include multiple contacts 30. When the contact structure includes multiple contacts 30, the multiple contacts 30 of the contact structure may be distributed along the first direction X at intervals or adjacent to each other.

[0077] The width of each contact 30 along the second direction Y may be greater than or equal to the width of the corresponding electrode in contact along the second direction Y. Each of the two opposite sides of each contact 30 along the second direction Y is flush with the same side of the corresponding electrode in contact or exceeds the same side of the corresponding electrode in contact. The spacing between the two opposite sides of each contact 30 along the second direction Y and the corresponding two sides of the corresponding electrode in contact along the second direction Y in the second direction Y may be the same or different. The spacing between the two opposite sides of each contact 30 along the second direction Y and the corresponding two sides of the corresponding electrode in contact along the second direction Y in the second direction Y may be 15-25 nm, respectively. In the case where the contact structure includes one contact 30, the side of the contact 30 facing away from the fuse 2 is flush with the side of the corresponding electrode facing away from the fuse 2, or the side of the contact 30 facing away from the fuse 2 exceeds the side of the corresponding electrode facing away from the fuse 2, and the distance of the excess may be 15-25 m. The side of the contact 30 close to the fuse 2 is arranged flush with the side of the corresponding electrode close to the fuse 2 , or the side of the contact 30 close to the fuse 2 is arranged spaced apart from the fuse 2 along the first direction X.

[0078] In the case where the contact structure includes multiple contacts 30, the side of the first contact 30 (i.e., the contact 30 farthest from the fuse 2) facing away from the fuse 2 is flush with the side of the corresponding electrode facing away from the fuse 2, or the side of the first contact facing away from the fuse 2 exceeds the side of the corresponding electrode facing away from the fuse 2, and the distance of the excess may be 15-25m. The side of the second contact 30 (i.e., the contact 30 closest to the fuse 2) close to the fuse 2 is flush with the side of the corresponding electrode close to the fuse 2, or the side of the second contact close to the fuse 2 is spaced from the fuse 2 along the first direction X.

[0079] The sizes of the multiple contacts 30 may be the same or different. The shapes of the multiple contacts 30 may be the same or different. For example Figure 1 As shown, each contact 30 is rectangular.

[0080] In some embodiments, the two electrodes include a cathode 11 and an anode 12 , the contact structure corresponding to the cathode 11 includes at least two contacts 30 , and the contact structure corresponding to the anode 12 includes at least one contact 30 .

[0081] For example, the cathode contact structure 31 corresponding to the cathode 11 may include 2-3 contacts 30. The ratio of the sum of the contact areas of the multiple contacts 30 of the cathode contact structure 31 and the cathode 11 to the upper surface area of ​​the cathode 11 is 80%-100%. The multiple contacts 30 of the cathode contact structure 31 may be spaced or adjacent along the first direction X. The anode contact structure 32 corresponding to the anode 12 may include one contact 30. The ratio of the contact area of ​​one contact 30 of the anode contact structure 32 and the anode 12 to the upper surface area of ​​the anode 12 is 80%-100%.

[0082] The upper surface area of ​​the cathode 11 is larger than the upper surface area of ​​the anode 12, and the number of contacts 30 of the cathode contact structure 31 can be larger than the number of contacts 30 of the anode contact structure 32. In this embodiment, by providing a suitable number of contacts 30 on the cathode 11 and the anode 12, the contact area between the cathode contact structure 31 and the cathode 11 and the contact area between the anode contact structure 32 and the anode 12 are increased, while preventing the cathode contact structure 31 and the anode contact structure 32 from occupying too much space.

[0083] In some embodiments, the center point of the orthographic projection of the contact 30 on the plane where the electrode is located, the center point of the electrode and the fuse 2 are located on the same straight line.

[0084] The center position of the cathode 11 and the center position of the anode 12 are located on the same straight line as the center position of the fuse 2, and the straight line is the first center line. The spacing between the two opposite sides of each contact 30 of the cathode contact structure 31 along the second direction Y and the corresponding two sides of the cathode 11 along the second direction Y in the second direction Y is equal, and the center point of the positive projection of each contact 30 of the cathode contact structure 31 on the plane where the electrode is located is located on the same straight line, and the straight line is the second center line. The spacing between the two opposite sides of each contact 30 of the anode contact structure 32 along the second direction Y and the corresponding two sides of the anode 12 along the second direction Y in the second direction Y is equal, and the center point of the positive projection of each contact 30 of the anode contact structure 32 on the plane where the electrode is located is located on the same straight line, and the straight line is the third center line. The first center line, the second center line and the third center line coincide with each other, so that the center point of the orthographic projection of each contact 30 of the cathode contact structure 31 on the plane where the electrode is located, the center point of the orthographic projection of each contact 30 of the anode contact structure 32 on the plane where the electrode is located, the center point of the cathode 11, the center point of the anode 12 and the fuse 2 are located on the same straight line, so as to improve the uniformity of the current density and further improve the current stability, thereby further improving the stability of the blowing time of the fuse 2, and then improving the reliability of the blowing.

[0085] In some embodiments, Figure 1 As shown, the fuse 2 includes a blown region 21, and a width W' of the blown region 21 of the fuse 2 is smaller than a body width W of the fuse 2. The body width W of the fuse 2 refers to a width of other regions of the fuse 2 except the blown region 21 along the second direction Y. The center position of the blown region 21 and the center position of other regions of the fuse 2 except the blown region 21 may be located on the same straight line.

[0086] When electromigration occurs in the fuse 2 of the fuse structure, the smaller the width of the fuse 2 along the second direction Y, the easier it is to blow. In the related art, the width of each position of the fuse is the same, so the position of the fuse blowing is relatively random. In the present embodiment, the fuse 2 has a blowing region 21, and the width W' of the blowing region 21 is smaller than the main body width W of the fuse 2, so that the blowing of the fuse 2 occurs in the blowing region 21, thereby improving the stability of the blowing position of the fuse 2.

[0087] In some embodiments, the distance between the fuse region 21 and the two electrodes is greater than or equal to one quarter of the length of the fuse 2 .

[0088] The spacing between the fuse zone 21 and the cathode 11 and the anode 12 is at least one quarter of the length of the fuse 2 along the first direction X, that is, the spacing between the fuse zone 21 and the cathode 11 is greater than or equal to one quarter of the length of the fuse 2 along the first direction X, and the spacing between the fuse zone 21 and the anode 12 is greater than or equal to one quarter of the length of the fuse 2 along the first direction X, so as to avoid affecting the cathode 11 and the anode 12 when the fuse zone 21 is blown, thereby ensuring the normal operation of the fuse structure.

[0089] In some embodiments, the length of the fuse 2 is L, the body width of the fuse 2 is W, the width of the fusing region 21 of the fuse 2 is 17W / 30-23W / 30, and the length of the fusing region 21 of the fuse 2 is L / 4-L / 2.

[0090] For example, the length L of the fuse 2 along the first direction X may be 0.48um, and the body width W of the fuse 2 along the second direction Y may be 0.06um. The width W' of the fuse region 21 along the second direction Y may be 0.034-0.046um, and the length L' of the fuse region 21 along the first direction X may be 0.12-0.24um.

[0091] In some embodiments, the two electrodes include a cathode 11 and an anode 12 , the widths of the cathode 11 and the anode 12 are 5W / 2-7W / 2 respectively, the length of the cathode 11 is 4W-5W, and the length of the anode 12 is 2W-3W.

[0092] The widths of the cathode 11 and the anode 12 along the second direction Y may be equal, for example, both may be 0.15-0.21 um. To improve the ability of the cathode 11 to emit electrons, the length of the cathode 11 along the first direction X is greater than the length of the anode 12 along the first direction X. For example, the length of the cathode 11 along the first direction X may be 0.24-0.3 um, and the length of the anode 12 along the first direction X may be 0.12-0.18 um. The shapes of the two electrodes may be the same or different, for example Figure 1 As shown, the cathode 11 and the anode 12 have the same shape, which is a rectangle.

[0093] In this embodiment, the width of the cathode 11 and the anode 12 along the second direction Y and the length along the first direction X are respectively set to be smaller, so that the area of ​​the cathode 11 and the anode 12 is smaller to improve the integration of the fuse structure.

[0094] In some embodiments, Figure 1As shown, the fuse structure also includes two virtual fuses 4, which are respectively located on opposite sides of the fuse 2 along the second direction Y. The two virtual fuses 4 are respectively spaced apart from the fuse 2 in the second direction Y, and the spacing between the virtual fuse 4 and the fuse 2 along the second direction Y can be determined according to actual needs, and no excessive restrictions are made here. The two virtual fuses 4 can be arranged in parallel with the fuse 2. The length of the two virtual fuses 4 along the first direction X can be less than the length of the fuse 2 along the first direction X. The width of the two virtual fuses 4 along the second direction Y can be determined according to actual needs, and no excessive restrictions are made here.

[0095] In this embodiment, by providing the virtual fuse 4 , the distribution of the fuses 2 in the fuse structure can be made more uniform, thereby improving the process feasibility of the fuse structure.

[0096] In summary, according to the fuse structure provided in the embodiment of the present application, the contact area between the cathode 11 and the cathode contact structure 31 is increased, so that the ratio of the contact area between the cathode 11 and the contact 30 of the cathode contact structure 31 to the upper surface area of ​​the cathode 11 is greater than or equal to 80%, and the contact area between the anode 11 and the anode contact structure 32 is increased, so that the ratio of the contact area between the anode 11 and the contact 30 of the anode contact structure 32 to the upper surface area of ​​the anode 11 is greater than or equal to 80%, so as to improve the current carrying capacity of the fuse structure and improve the stability of the current flowing through the fuse structure, thereby improving the stability of the blowing time of the fuse 2 in the fuse structure, and further improving the reliability of the blowing of the fuse structure; moreover, a blowing zone 21 is set on the fuse 2, so that the blowing of the fuse 2 occurs in the blowing zone 21, thereby improving the stability of the blowing position of the fuse 2, and further improving the reliability of the blowing of the fuse structure.

[0097] Correspondingly, an embodiment of the present application further provides an electronic device, which includes the fuse structure described in any one of the above embodiments, which will not be described in detail here.

[0098] The electronic device in this embodiment may include electronic products or equipment such as smart phones, tablet computers, laptop computers, televisions, audio and video CD players, digital video players, navigators, cameras, voice recorders, etc., and may also include some intermediate products including fuse structures, which are not limited here.

[0099] In summary, according to the electronic device provided in the embodiment of the present application, the contact area between the electrode and the corresponding contact structure is increased to improve the current carrying capacity of the fuse structure and the stability of the current, thereby improving the stability of the blowing time, and further improving the reliability of the blowing of the fuse structure; moreover, a blowing area 21 is set on the fuse 2, so that the blowing occurs in the blowing area 21, thereby improving the stability of the blowing position, further improving the reliability of the blowing of the fuse structure, and thus making the electronic device have better performance and stability.

[0100] The terms "first", "second", etc. in the specification and claims of this application are used to distinguish similar objects, and are not used to describe a specific order or sequence. It should be understood that the terms used in this way can be interchangeable under appropriate circumstances, so that the embodiments of the present application can be implemented in an order other than those illustrated or described herein, and the objects distinguished by "first", "second", etc. are generally of the same type, and the number of objects is not limited. For example, the first object can be one or more.

[0101] In the description of the present application, “plurality” means two or more.

[0102] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0103] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. A fuse structure, characterized in that: include: Two electrodes are spaced apart and distributed along a first direction; a fuse extending along the first direction and connected between the two electrodes; Two contact structures are located on one side of the electrode in the thickness direction and are in contact with the two electrodes respectively; Among them, the ratio of the contact area between the contact structure and the corresponding electrode to the first target surface area is greater than or equal to the target ratio, the first target surface area is the surface area of ​​the corresponding electrode close to the contact structure, the ratio of the second target surface area to the contact area between the contact structure and the corresponding electrode is greater than or equal to 100%, the second target surface area is the surface area of ​​the contact structure close to the corresponding electrode, and the thickness direction is perpendicular to the first direction.

2. The fuse structure according to claim 1, characterized in that: The width of the contact structure along the second direction is greater than or equal to the width of the corresponding electrode along the second direction; the second direction is perpendicular to the first direction and the thickness direction respectively; Each of two opposite sides of the contact structure along the second direction is arranged flush with or beyond the same side of the corresponding electrode.

3. The fuse structure according to claim 2, characterized in that: The distances between the two opposite sides of the contact structure along the second direction and the two corresponding sides of the corresponding electrode along the second direction are equal.

4. The fuse structure according to claim 1, characterized in that: A side of the contact structure facing away from the fuse is flush with a side of the corresponding electrode facing away from the fuse or exceeds a side of the corresponding electrode facing away from the fuse; The side of the contact structure close to the fuse is arranged flush with the side of the corresponding electrode close to the fuse or is arranged spaced apart from the fuse along the first direction.

5. The fuse structure according to claim 1, characterized in that: The contact structure comprises at least one contact point distributed along the first direction, each contact point being in contact with a corresponding electrode; The two electrodes include a cathode and an anode, the contact structure corresponding to the cathode includes at least two contact points, and the contact structure corresponding to the anode includes at least one contact point.

6. The fuse structure according to claim 5, characterized in that: The contact point is located on the same straight line as the center point of the orthographic projection of the plane where the electrode is located, the center point of the electrode and the fuse.

7. The fuse structure according to claim 1, wherein: The target ratio is greater than or equal to 80%.

8. The fuse structure according to any one of claims 1 to 7, characterized in that: The fuse includes a blowing region, and a width of the blowing region of the fuse is smaller than a body width of the fuse.

9. The fuse structure according to claim 8, characterized in that: The distance between the fusing area and the two electrodes is greater than or equal to one quarter of the length of the fuse.

10. The fuse structure according to claim 8, characterized in that: The length of the fuse is L, the width of the fuse body is W, the width of the fusing zone of the fuse is 17W / 30-23W / 30, and the length of the fusing zone of the fuse is L / 4-L / 2; The two electrodes include a cathode and an anode, the widths of the cathode and the anode are 5W / 2-7W / 2 respectively, the length of the cathode is 4W-5W, and the length of the anode is 2W-3W.