Fluid flow correction system and correction method
By regularly correcting the fluid flow rate in semiconductor process equipment and adjusting the valve size of the control valve, the problem of unstable fluid flow rate is solved, process efficiency is improved, the number of fluid replacements is reduced, and process cost is reduced.
Patent Information
- Application Number
- CN202311311958.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-10-11
- Publication Date
- 2025-04-11
AI Technical Summary
In semiconductor process equipment, unstable fluid flow rate leads to low process efficiency, and due to the high price of the fluid, it is difficult to replace frequently.
A fluid flow correction system is provided to adjust the valve size of the control valve by periodically correcting the fluid flow in the pipeline to achieve the target flow required by the process. The system includes control valves, metering instruments, flow correction equipment and control modules, and through signal connection and regulation, the precise adjustment of fluid flow is achieved.
By regularly correcting the fluid flow rate, the problem of unstable fluid flow in wet process equipment is reduced, the yield and yield of the overall process is improved, the number of times of replacement of high-priced fluids is reduced, and the process cost is reduced.
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Figure CN119806217A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to a flow rate correction system and correction method, and in particular to a fluid flow rate correction system and correction method. Background Art
[0002] Today's semiconductor industry is developing rapidly, and there are many different types of wet process equipment to meet the needs. Most process equipment will recycle the fluid when conveying fluids because the fluids required for the same process or process (such as etching solution or washing solution, etc.) are the same. However, bubbles or solid byproducts generated by process reactions in the fluid will increase or accumulate as the number of cycles increases, causing the fluid viscosity to increase, leading to flow instability. However, due to the high price of the above-mentioned fluids, they will not be completely replaced unless the properties of the fluids are no longer in compliance with the specifications, the product life has expired, or before annual refurbishment.
[0003] Therefore, the technical field of the present invention is in urgent need of a fluid flow correction system and method that can maintain the fluid flow rate through fluid flow correction and pipeline branching design before all fluids used in a process cycle are replaced. Summary of the invention
[0004] The fluid flow correction system and method provided by the present invention can adjust the valve size of the control valve by regularly correcting the fluid flow in the pipeline so that the fluid flow reaches the target flow required by the process. Thus, by regularly correcting the fluid flow value, the problem of fluid flow instability in semiconductor process equipment (such as wet process equipment) can be reduced, thereby improving the yield or production rate of the overall process (such as improving the cleaning yield after wafer etching), while reducing the number of times expensive fluids are replaced and reducing process costs.
[0005] In view of the above problems, in order to solve the problem that the conventional fluid flow rate is different from the target flow rate, the present invention provides a fluid flow correction system for correcting the fluid flow rate of the fluid flowing into the process equipment end through the pipeline, which includes: a control valve for controlling the size of the fluid flow rate; at least one metering instrument for monitoring the fluid flow rate; a flow correction device for measuring the liquid flow rate flowing into the flow correction device and correcting the fluid flow rate; and a control module, which is connected to the control valve, the flow correction device and the at least one metering instrument by signal, and is used to regulate the fluid flow rate through signals. The control module sets the target flow rate, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate. The control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device. When the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate. When the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end.
[0006] In a preferred embodiment, the control module sets the target flow, and the control module controls the control valve to adjust the fluid flow according to the target flow, further including: the control module transmits a target flow signal to the control valve to control the control valve to adjust the fluid flow according to the target flow; and the control valve adjusts the fluid flow according to the target flow signal, and sends back an adjustment feedback signal to the control module.
[0007] In a preferred embodiment, the fluid flow correction system further includes a process equipment end valve and a flow correction device end valve, wherein the process equipment end valve is arranged on the pipeline in front of the process equipment end, and the flow correction device end valve is arranged on the pipeline in front of the flow correction device. Before the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further includes: the control module closes the process equipment end valve to stop the fluid from flowing into the process equipment end; the control module opens the flow correction device end valve to allow the fluid to flow into the flow correction device; and the control module transmits a flow correction signal to the flow correction device to start the flow correction device and make it measure the fluid flow, and after the flow correction device measures the fluid flow, it transmits a correction feedback signal to the control module.
[0008] In a preferred embodiment, when the control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device, it further includes: the control module determines whether the fluid flow rate is the same as the target flow rate based on the adjustment feedback signal and the correction feedback signal.
[0009] In a preferred embodiment, when the difference between the fluid flow rate and the target flow rate is less than or equal to a predetermined allowable value, the control module determines that the fluid flow rate is the same as the target flow rate.
[0010] In a preferred embodiment, the at least one metering instrument is disposed on the pipeline and is located between the control valve and the process equipment end valve to monitor the fluid flow rate flowing through the process equipment end valve.
[0011] In a preferred embodiment, the at least one metering instrument is disposed on the pipeline and is located between the control valve and the valve at the end of the flow correction device to monitor the fluid flow passing through the valve at the end of the flow correction device.
[0012] The present invention also provides a fluid flow correction method for correcting the fluid flow of the fluid flowing into the process equipment end through the pipeline, comprising the following steps: setting a target flow through a control module, and the control module controls a control valve to adjust the fluid flow according to the target flow; the control module measures the liquid flow flowing into the flow correction device through a flow correction device to determine whether the fluid flow is the same as the target flow; when the fluid flow is different from the target flow, the control module controls the control valve to adjust the fluid flow to meet the target flow; when the fluid flow is the same as the target flow, the control module controls the fluid to flow into the process equipment end. The control module signal is connected to the control valve and the flow correction device, and regulates the fluid flow through the signal.
[0013] Compared to the prior art, the fluid flow correction system and correction method of the present invention can reduce the problem of unstable fluid flow in wet process equipment by only periodically calibrating the fluid flow value, thereby improving the yield of the overall process (for example, improving the cleaning yield after wafer etching), while reducing the number of times expensive fluids are replaced and reducing process costs. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.
[0015] Figure 1 A schematic diagram of a unit block of a fluid flow correction system provided by an embodiment of the present invention;
[0016] Figure 2A three-dimensional operation schematic diagram of a fluid flow correction system provided by an embodiment of the present invention;
[0017] Figure 3 A schematic flow chart of a fluid flow correction method provided by an embodiment of the present invention; and
[0018] Figure 4 A schematic flow chart of a fluid flow calibration method provided in another embodiment of the present invention. DETAILED DESCRIPTION
[0019] The following describes the preferred embodiments of the present invention with reference to the drawings of the specification to prove that the present invention can be implemented. The embodiments of the invention can fully introduce the present invention to those skilled in the art, making its technical content clearer and easier to understand. The present invention can be embodied through many different forms of invention embodiments, and the scope of protection of the present invention is not limited to the embodiments mentioned in the text. In the drawings, components with the same structure are represented by the same numerical labels, and components with similar structures or functions are represented by similar numerical labels. The size and thickness of each component shown in the drawings are arbitrarily shown, and the present invention does not limit the size and thickness of each component. In order to make the illustration clearer, the thickness of the components is appropriately exaggerated in some places in the drawings.
[0020] In addition, the following descriptions of the various embodiments of the invention are made with reference to the attached diagrams to illustrate specific embodiments of the invention that the present invention can be implemented with. The directional terms mentioned in the present invention, such as "upper", "lower", "front", "back", "left", "right", "inner", "outer", "side", etc., are only with reference to the directions of the attached drawings. Therefore, the directional terms used are for better and clearer description and understanding of the present invention, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are used for descriptive purposes only and cannot be understood as indicating or implying relative importance.
[0021] See also Figure 1 and Figure 2 As shown, Figure 1 A schematic block diagram of a fluid flow correction system provided by an embodiment of the present invention. Figure 2 The present invention provides a fluid flow correction system 1000, and the fluid flow correction system 1000 can correct the fluid flow of the fluid flowing into the process equipment end 600 through the pipeline P. In practical applications, the process equipment end 600 can be a chamber for wet process, a pickling module, a rinsing module, or other semiconductor process equipment applications, and the present invention is not limited thereto.
[0022] Specifically, the fluid flow correction system 1000 includes: a control valve 100, at least one metering instrument 200, a flow correction device 300 and a control module 500. The control valve 100 controls the flow rate of the fluid flowing through the pipeline P by controlling the opening and closing size of the valve it has. The control valve 100 can control the flow rate of the fluid through its valve opening, electromagnetic control or other quantitative methods, but the present invention is not limited to this. The at least one metering instrument 200 can monitor the fluid flow rate, and the at least one metering instrument 200 can be an instrument such as a flow meter or a flow meter, but the present invention is not limited to this. In actual application, the at least one metering instrument 200 can measure the fluid after it has flowed for a period of time or the flow rate is stable. The flow correction device 300 can measure the liquid flow flowing into the flow correction device 300 and correct the fluid flow rate. In one embodiment, the fluid flow correction system 1000 of the present invention further includes a load cell 400, which is connected to the flow correction device 300 by signal or electrical connection, and can measure the weight of the fluid passing through the flow correction device 300 per unit time, so that the flow correction device 300 can measure the fluid flow. The load cell 400 can be a scale, an electronic balance or other device or instrument for weighing, but the present invention is not limited thereto. The control module 500 is connected to the control valve 100, the flow correction device 300 (and / or the load cell 400) by signal, and the at least one measuring instrument 200, and the control module 500 can control the fluid flow by transmitting or receiving signals to the aforementioned components. The control module 500 may be a programmable logic controller (PLC), an industrial personal computer (IPC) or other control devices or equipment with computing and control functions, and the signal connection may be made in a wired or wireless manner, but the present invention is not limited thereto.
[0023] In one embodiment, the fluid flow correction system 1000 of the present invention corrects the fluid flow by performing the following actions. First, the control module 500 sets a target flow and controls the control valve 100 to adjust the fluid flow according to the target flow. The target flow can be the flow required by the process, and during the correction process, it can be set according to the initial flow, that is, according to the target flow that the fluid that has not entered the process equipment end 600 should have. Specifically, the control module 500 controls the control valve 100 to adjust the fluid flow according to the target flow signal by transmitting a target flow signal to the control valve 100, and the control valve 100 adjusts the fluid flow according to the target flow signal, and returns an adjustment feedback signal to the control module 500. That is, after receiving the adjustment feedback signal, the control module 500 confirms that the current fluid flow of the control valve 100 is set at the target flow.
[0024] Next, the control module 500 determines whether the fluid flow rate is the same as the target flow rate through the flow correction device 300. Figure 2 As shown, the pipeline P of the fluid flow correction system 1000 further includes a process equipment end valve V1 and a flow correction device end valve V2. The process equipment end valve V1 is arranged on the pipeline P before the process equipment end 600, and the flow correction device end valve V2 is arranged on the pipeline P before the flow correction device 300. That is to say, the pipeline P of the fluid flow correction system 1000 of the present invention is designed in a branching manner, and the inflow of the fluid is controlled by the process equipment end valve V1 and the flow correction device end valve V2 respectively. In this way, by opening and closing the process equipment end valve V1 and the flow correction device end valve V2, the fluid can be controlled to flow to the process equipment end 600 or to the flow correction device 300.
[0025] Specifically, in order to measure the current fluid flow rate of the fluid with the flow correction device 300, the control module 500 needs to control the fluid in the pipeline P of the fluid flow correction system 1000 to completely flow to the fluid flow correction device 300. In one embodiment, the control module 500 closes the process equipment end valve V1 to stop the fluid from flowing into the process equipment end 600, and the control module 500 opens the flow correction device end valve V2 to allow the fluid to flow into the flow correction device 300. Then, the control module 500 transmits a flow correction signal to the flow correction device 300 to start the flow correction device 300 and make it measure the fluid flow rate. After measuring the fluid flow rate, the flow correction device 300 transmits a correction feedback signal to the control module 500.
[0026] In one embodiment, the flow correction device 300 can measure the fluid flow rate by measuring the accumulated weight of the fluid flowing through the flow correction device 300 per unit time through the load cell 400. The flow correction device 300 then transmits the correction feedback signal to the control module 500 based on the measured fluid flow rate. In this way, the control module 500 can determine whether the fluid flow rate is the same as the set target flow rate based on the adjustment feedback signal and the correction feedback signal. In actual application, the control module 500 can make the above judgment based on comparing the above signals with each other or through other calculations, and the present invention is not limited to this. When the fluid flow rate is different from the target flow rate, the control module 500 controls the control valve 100 to adjust the fluid flow rate to meet the target flow rate, and when the fluid flow rate is the same as the target flow rate, the control module 500 controls the fluid to flow into the process equipment end 600.
[0027] It is worth mentioning that, in one embodiment, when the difference between the fluid flow rate and the target flow rate is less than or equal to a predetermined allowable value, the control module 500 can determine that the fluid flow rate is the same as the target flow rate. In practical applications, since the content of bubbles and byproducts contained in the fluid currently flowing through the pipeline P is not exactly the same, it may still be difficult to achieve the same degree of reciprocating control of the target flow rate and the fluid flow rate. Therefore, the predetermined allowable value can be preset in the control module 500 in advance. If the difference between the fluid flow rate and the target flow rate is less than or equal to the predetermined allowable value and does not affect the process, subsequent actions can be performed to achieve the purpose of correcting the fluid flow rate to optimize the process and reduce costs. For example, the predetermined allowable value can be in the range of 5% to 15%, preferably 10%, that is, when the difference between the fluid flow rate and the target flow rate is between ±10%, the control module 500 still determines that the fluid flow rate is the same as the target flow rate, but the present invention is not limited to this and can be adjusted according to actual needs.
[0028] When the control module 500 determines that the fluid flow rate is different from the target flow rate or the difference is not within the allowable value range, the control module 500 transmits a flow adjustment signal to the control valve 100, and the control valve 100 adjusts the size of its valve according to the flow adjustment signal to adjust the fluid flow rate to meet the target flow rate, and the control valve 100 transmits an adjustment feedback signal to the control module 500. The control module 500 can then transmit the flow correction signal to the flow correction device 300 to measure the fluid flow rate, and the flow correction device 300 also measures the fluid flow rate and transmits the correction feedback signal to the control module 500. The control module 500 can then determine whether the fluid flow rate is the same as the target flow rate based on the adjustment feedback signal and the correction feedback signal, and repeat this process until the control module 500 determines that the fluid flow rate is the same as the target flow rate or the difference is within the allowable value range. The control module 500 opens the process equipment end valve V1 to supply the fluid to flow into the process equipment end 600, and the control module 500 closes the flow correction equipment end valve V2 to stop the fluid from flowing into the flow correction device 300. It is worth mentioning that the present invention does not limit the order of closing and opening the aforementioned process equipment end valve V1 and the flow correction equipment end valve V2. In addition, the adjustment feedback signal and the correction feedback signal described in the present invention at least include the fluid flow rate measured by the component for the control module 500 to judge and compare.
[0029] In the embodiment of the present invention, the control module 500 can monitor the fluid flow through the pipeline P through the at least one metering instrument 200. The at least one metering instrument 200 of the fluid flow correction system 1000 is connected to the control module 500 by signal, and the at least one metering instrument 200 can be arranged between the control valve 100 and the process equipment end valve V1 to monitor the fluid flow through the process equipment end valve V1, or arranged between the control valve 100 and the flow correction equipment end valve V2 to monitor the fluid flow through the flow correction equipment end valve V2. In this way, the control module 500 can monitor the fluid flow in the pipeline P in real time to determine whether fluid flow correction is required or whether the previous correction is correct.
[0030] See also Figure 3 and Figure 4 As shown, Figure 3 A schematic diagram of a flow chart of a fluid flow correction method provided in an embodiment of the present invention. Figure 4FIG. 1 is a flow chart of a fluid flow correction method provided by another embodiment of the present invention. In another embodiment, the present invention provides a fluid flow correction method to correct the fluid flow of the fluid flowing into the process equipment end 600 through the pipeline P. Figure 3 and Figure 4 See also Figure 1 and Figure 2 As shown, the fluid flow correction method of the present invention achieves the fluid flow correction through the following steps:
[0031] Step S100: setting the target flow rate through the control module 500, and the control module 500 controls the control valve 100 to adjust the fluid flow rate according to the target flow rate;
[0032] Step S200: the control module 500 measures the flow rate of the liquid flowing into the flow rate correction device 300 through the flow rate correction device 300;
[0033] Step S300: the control module 500 determines whether the fluid flow rate is the same as the target flow rate. When the fluid flow rate is different from the target flow rate, step S400 is executed; when the fluid flow rate is the same as the target flow rate, step S500 is executed;
[0034] Step S400: the control module 500 controls the control valve 100 to adjust the fluid flow rate to meet the target flow rate; and
[0035] Step S500 : the control module 500 controls the fluid to flow into the process equipment end 600 .
[0036] In step S100, the control module 500 controls the control valve 100 to adjust the fluid flow rate according to the target flow rate by transmitting the target flow rate signal to the control valve 100, and the control valve 100 adjusts the fluid flow rate according to the target flow rate signal and transmits the adjustment feedback signal back to the control module 500. In step S300, the control module 500 determines whether the fluid flow rate is the same as the target flow rate according to the adjustment feedback signal and the correction feedback signal.
[0037] In another embodiment, before executing step S200, the following steps are further included:
[0038] Step S110: the control module 500 closes the process equipment end valve V1 to stop the fluid from flowing into the process equipment end 600; and
[0039] Step S120 : the control module 500 opens the flow correction device end valve V2 to allow the fluid to flow into the flow correction device 300 .
[0040] In step S110 and step S120, the control module 500 starts the flow correction device 300 and enables it to measure the fluid flow by transmitting the flow correction signal to the flow correction device 300. After the flow correction device 300 measures the fluid flow, the flow correction device 300 transmits the correction feedback signal to the control module 500.
[0041] The fluid flow correction method of the present invention can be applied to the fluid flow correction system 1000 of the present invention. The specific implementations of the fluid flow correction system 1000 have been described in detail in the aforementioned embodiments, so they will not be repeated here.
[0042] In summary, by regularly correcting the fluid flow in the pipeline, the fluid flow correction system 1000 and the correction method provided by the present invention help adjust the valve size of the control valve 100 so that the fluid flow reaches the target flow required by the process. In this way, the problem of unstable fluid flow in semiconductor process equipment (such as wet process equipment) can be reduced, thereby improving the yield or production rate of the overall process (such as improving the cleaning yield after wafer etching), while reducing the number of times expensive fluids are replaced and reducing process costs.
[0043] The above is a detailed introduction to a fluid flow correction system and correction method provided in an embodiment of the present invention. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the technical scheme and core idea of the present invention. Ordinary technicians in this field should understand that they can still modify the technical schemes recorded in the aforementioned embodiments, or replace some of the technical features therein with equivalents; and these modifications or replacements do not make the essence of the corresponding technical scheme deviate from the scope of the technical scheme of the embodiments of the present invention.
Claims
1. A fluid flow correction system for correcting the fluid flow of a fluid flowing into a process equipment end through a pipeline, characterized in that: The fluid flow correction system comprises: A control valve, used to control the flow rate of the fluid; at least one metering instrument for monitoring the flow rate of the fluid; A flow correction device for measuring the flow rate of the liquid flowing into the flow correction device and correcting the fluid flow rate; and A control module, signal-connected to the control valve, the flow correction device and the at least one metering instrument, for regulating the fluid flow through signals; Wherein, the control module sets a target flow rate, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate; Wherein, the control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device; When the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate; When the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end.
2. The fluid flow correction system according to claim 1, characterized in that: The control module sets the target flow rate, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate, further comprising: The control module transmits a target flow signal to the control valve to control the control valve to adjust the fluid flow according to the target flow; and The control valve adjusts the fluid flow rate according to the target flow rate signal and transmits an adjustment feedback signal back to the control module.
3. The fluid flow correction system according to claim 2, characterized in that: The fluid flow correction system further includes a process equipment end valve and a flow correction device end valve, wherein the process equipment end valve is arranged on the pipeline in front of the process equipment end, and the flow correction device end valve is arranged on the pipeline in front of the flow correction device, wherein before the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further includes: The control module closes the valve at the process equipment end to stop the fluid from flowing into the process equipment end; The control module opens the valve at the flow correction device end to allow the fluid to flow into the flow correction device; and The control module transmits a flow correction signal to the flow correction device to start the flow correction device and make it measure the fluid flow. After measuring the fluid flow, the flow correction device transmits a correction feedback signal to the control module.
4. The fluid flow correction system according to claim 3, characterized in that: When the control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device, the method further includes: The control module determines whether the fluid flow rate is the same as the target flow rate according to the adjustment feedback signal and the correction feedback signal.
5. The fluid flow correction system according to claim 4, characterized in that: When the difference between the fluid flow rate and the target flow rate is less than or equal to a predetermined allowable value, the control module determines that the fluid flow rate is the same as the target flow rate.
6. The fluid flow correction system according to claim 1, characterized in that: The at least one metering instrument is arranged on the pipeline and located between the control valve and the valve at the process equipment end, so as to monitor the flow rate of the fluid flowing through the valve at the process equipment end.
7. The fluid flow correction system according to claim 1, characterized in that: The at least one metering instrument is arranged on the pipeline and is located between the control valve and the valve at the end of the flow correction device, so as to monitor the flow of the fluid flowing through the valve at the end of the flow correction device.
8. A fluid flow correction method for correcting the fluid flow of a fluid flowing into a process equipment end through a pipeline, characterized in that: The fluid flow correction method comprises the following steps: The target flow rate is set by a control module, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate; The control module measures the flow rate of the liquid flowing into the flow correction device through the flow correction device to determine whether the fluid flow rate is the same as the target flow rate; When the fluid flow rate is different from the target flow rate, the control module controls the control valve to adjust the fluid flow rate to meet the target flow rate; When the fluid flow rate is the same as the target flow rate, the control module controls the fluid to flow into the process equipment end; Wherein, the control module signal is connected to the control valve and the flow correction device, and regulates the fluid flow through the signal.
9. The fluid flow calibration method according to claim 8, characterized in that: The control module sets the target flow rate, and the control module controls the control valve to adjust the fluid flow rate according to the target flow rate, further comprising: The control module transmits a target flow signal to the control valve to control the control valve to adjust the fluid flow according to the target flow; and The control valve adjusts the fluid flow rate according to the target flow rate signal and transmits an adjustment feedback signal back to the control module.
10. The fluid flow calibration method according to claim 9, characterized in that: The pipeline further has a process equipment end valve and a flow correction device end valve, the process equipment end valve is arranged on the pipeline in front of the process equipment end, and the flow correction device end valve is arranged on the pipeline in front of the flow correction device, wherein, before the control module determines whether the fluid flow is the same as the target flow through the flow correction device, it further includes: The control module closes the valve at the process equipment end to stop the fluid from flowing into the process equipment end; The control module opens the valve at the flow correction device end to allow the fluid to flow into the flow correction device; and The control module transmits a flow correction signal to the flow correction device to start the flow correction device and make it measure the fluid flow. After measuring the fluid flow, the flow correction device transmits a correction feedback signal to the control module.
11. The fluid flow calibration method according to claim 10, characterized in that: When the control module determines whether the fluid flow rate is the same as the target flow rate through the flow correction device, the method further includes: The control module determines whether the fluid flow rate is the same as the target flow rate according to the adjustment feedback signal and the correction feedback signal.
12. The fluid flow calibration method according to claim 11, characterized in that: When the difference between the fluid flow rate and the target flow rate is less than or equal to a predetermined allowable value, the control module determines that the fluid flow rate is the same as the target flow rate.
13. The fluid flow calibration method according to claim 8, characterized in that: The pipeline further has at least one metering instrument, whose signal is connected to the control module, and the at least one metering instrument is located between the control valve and the process equipment end valve to monitor the fluid flow passing through the process equipment end valve.
14. The fluid flow calibration method according to claim 8, characterized in that: The pipeline further has at least one metering instrument, whose signal is connected to the control module, and the at least one metering instrument is located between the control valve and the flow correction device end valve to monitor the fluid flow passing through the flow correction device end valve.