Radio frequency identification (RFID)-based read-write device of photoetching mask traceability system

Abstract

The invention relates to a semiconductor manufacturing technology, and discloses a read-write device of a photoetching mask traceability system based on RFID (Radio Frequency Identification Device), a photoetching mask read-write device body (1) comprises a photoetching mask read-write device box body (11) and a photoetching mask read-write device upper cover (12); the photoetching mask read-write device box body (11) and the photoetching mask read-write device upper cover (12) form a closed photoetching mask read-write device cavity; the photoetching mask read-write device upper cover (12) is connected with a mask unit (13) used for placing a mask, a bar code reading unit (14) used for reading a bar code of the mask, and an antenna rod (15) used for receiving an RFID signal; according to the read-write device of the photoetching mask traceability system, digital traceability of the whole life cycle from storage to use to maintenance is achieved through dual data binding of RFID and bar codes and physical state monitoring, and the reliability is remarkably improved.

Description

Technical Field

[0001] The invention relates to semiconductor manufacturing technology, and in particular to a reading and writing device of a photolithography mask tracing system based on RFID. Background Art

[0002] The photolithography mask is a graphic master used in the photolithography process commonly used in micro-nano processing technology. It is an indispensable step in the production of integrated circuits. An opaque light-shielding film forms a mask graphic structure on a transparent substrate, and then transfers the graphic information to the product substrate through the exposure process. For an IC chip, at least seven or eight photolithography masks are required, and at most dozens of them are required. For a wafer foundry FAB factory, there are many wafers of IC chips, so there are thousands or tens of thousands of masks in the FAB. Obviously, the use and management of photolithography masks is particularly important. At present, photolithography masks are mainly managed by manually recording process sheets or barcodes. Barcodes are easily blurred and cannot be read. Summary of the invention

[0003] Aiming at the problem that the process sheet is manually recorded or managed by barcode in the prior art, and the barcode is easily blurred, resulting in the inability to read, the present invention proposes a reading and writing device for a lithography mask traceability system based on RFID.

[0004] In order to solve the above technical problems, the present invention is solved by the following technical solutions:

[0005] The reading and writing device of the RFID-based photolithography mask traceability system includes a photolithography mask reading and writing device body; the photolithography mask reading and writing device body includes a photolithography mask reading and writing device box body and a photolithography mask reading and writing device upper cover; the photolithography mask reading and writing device box body and the photolithography mask reading and writing device upper cover form a closed photolithography mask reading and writing device cavity; the photolithography mask reading and writing device upper cover is connected with a mask unit for placing a mask, a barcode reading unit for reading a barcode of the mask, and an antenna rod for receiving RFID signals.

[0006] Preferably, a card slot unit is provided on the upper cover of the photolithography mask reading and writing device, and the card slot unit includes relatively arranged card slot baffles; a card slot is formed in the middle of the relatively arranged card slot baffles, and the photolithography mask reading and writing device box body passes through the card slot.

[0007] Preferably, an RFID reading and writing unit, an infrared sensing unit and a quality collection unit are provided in the cavity of the photolithography mask reading and writing device. The quality collection unit is used to collect the quality of the photolithography mask reading and writing device box; the infrared sensing unit is used to collect the position information of the photolithography mask reading and writing device box; the RFID reading and writing unit is used to read and write the RFID tag of the mask of the photolithography mask reading and writing device box of the RFID reading and writing unit. Preferably, two infrared sensing units are provided, which are located under the card slot baffles arranged oppositely; the infrared sensing unit includes an infrared transmitting circuit unit, an infrared receiving circuit unit, a micro control unit and an infrared monitoring unit; the micro control unit is used to control the infrared transmitting circuit unit to emit infrared light; the infrared receiving circuit unit is used to receive the infrared light emitted by the infrared transmitting circuit unit, and feed back the received signal to the micro control unit, the micro control unit processes the received signal, and sends a control signal to the infrared monitoring unit.

[0008] Preferably, the microcontroller unit comprises an infrared transmitting microcontroller unit and an infrared receiving microcontroller unit; the infrared transmitting microcontroller unit is used to control the infrared transmitting circuit unit; and the infrared receiving microcontroller unit is used to control the infrared receiving circuit unit.

[0009] Preferably, a display unit for displaying the reading and writing status is further provided on the box body of the photolithography mask reading and writing device; the display unit is an LED display screen for displaying the reading and writing status information of the photolithography mask.

[0010] Preferably, the infrared transmitting circuit unit includes an infrared transmitting amplifying circuit module, an infrared transmitting diode and a current regulating unit; the current regulating unit and the infrared transmitting diode are connected to the infrared transmitting amplifying circuit module, and the infrared transmitting amplifying circuit module is used to amplify the received signal and transmit the amplified signal to the infrared transmitting diode.

[0011] Preferably, the infrared emission amplification circuit module is an amplifying transistor Q2, the infrared emission diode is a 940nm infrared emission diode D4; the current adjustment unit is an adjustable resistor R31 and a resistor R9;

[0012] The first end of the amplifying transistor Q2 is connected to one end of the resistor R9, the third end of the amplifying transistor Q2 is connected to the infrared emitting diode D4, and the second end of the amplifying transistor Q2 is connected to the infrared emitting micro control unit via the resistor; the other end of the resistor R9 is connected to the digital potentiometer and the resistor R31; the other end of the resistor R31 is connected to the power supply end; the other end of the infrared emitting diode D4 is grounded.

[0013] The present invention has significant technical effects due to the adoption of the above technical solution:

[0014] The present invention aims to solve the problem that traditional photolithography mask management usually relies on manual recording or single label technology, which is prone to data omission or label damage. Through the dual data binding of RFID + barcode and combined with physical status monitoring, the digital traceability of the entire life cycle from warehousing, use to maintenance is realized, and the reliability is significantly improved.

[0015] The present invention integrates multiple functions such as mask placement, barcode reading, RFID reading and writing, position detection, quality monitoring and status display, and realizes all-round traceability and management of photolithography masks.

[0016] The present invention reduces the possibility of human operation errors by adding infrared sensors and quality sensors, makes the device more intelligent, and reduces the requirements for users on the production line. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a structural diagram of the device of the present invention.

[0018] Figure 2 It is an exploded view of the device of the present invention.

[0019] Figure 3 It is an exploded view of the present invention.

[0020] Figure 4 It is a structural diagram of the box body of the photolithography mask reading and writing device of the present invention.

[0021] Figure 5 The invention discloses a circuit diagram of an infrared transmitting circuit unit and an infrared receiving circuit unit.

[0022] Figure 6 It is a circuit diagram of a micro control unit of the present invention.

[0023] Figure 7 It is the circuit diagram of the infrared monitoring unit of the present invention.

[0024] Figure 8 It is a circuit diagram of a digital potentiometer regulator of the present invention.

[0025] Fig. 9 This is a circuit diagram of embodiment 4 of the present invention.

[0026] Among them, 1 is a photolithography mask reading and writing device body, 11 is a photolithography mask reading and writing device box, 12 is a photolithography mask reading and writing device upper cover, 13 is a mask unit, 14 is a barcode reading unit, 15 is an antenna rod, 16 is a supporting unit, 18 is an infrared sensing unit, 17 is a quality collection unit, 121 is a card slot unit, and 122 is a card slot baffle. DETAILED DESCRIPTION

[0027] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments.

[0028] Example 1

[0029] The reader / writer device of the RFID-based photolithography mask traceability system includes a photolithography mask reader / writer device body 1; the photolithography mask reader / writer device body 1 includes a photolithography mask reader / writer device box body 11 and a photolithography mask reader / writer device upper cover 12; the photolithography mask reader / writer device box body 11 and the photolithography mask reader / writer device upper cover 12 form a closed photolithography mask reader / writer device cavity; the photolithography mask reader / writer device upper cover 12 is connected to a mask unit 13 for placing a mask, a barcode reading unit 14 for reading a barcode of a mask, and an antenna rod 15 for receiving RFID signals.

[0030] The photolithography mask reading and writing device box body 11 and the photolithography mask reading and writing device upper cover 12 together form a closed photolithography mask reading and writing device cavity, which is used to protect the internal mask and related components and prevent them from being affected by the external environment. The photolithography mask reading and writing device box body 11 and the photolithography mask reading and writing device upper cover 12 can be connected by a hinge to realize the opening and closing of the upper cover, which is convenient for operators to operate the internal mask.

[0031] The barcode reading unit 14 can quickly and accurately read the barcode or two-dimensional code information on the mask by using a two-dimensional code scanner, thereby realizing the identity recognition and tracing of the mask.

[0032] 2. A card slot unit 121 is provided on the upper cover 12 of the photolithography mask reading and writing device, and the card slot unit 121 includes relatively arranged card slot baffles; they are respectively a first card slot baffle 122 and a second card slot baffle 123; a card slot is formed between the first card slot baffle 122 and the second card slot baffle 123, and the photolithography mask reading and writing device box body 11 passes through the card slot.

[0033] The mask unit 13 supports photolithography masks of various specifications, including but not limited to 6-inch and 8-inch masks. The antenna rod 15 is a high-frequency or ultra-high-frequency RFID antenna.

[0034] Example 2

[0035] Based on the first embodiment, the upper cover 12 of the photolithography mask reading and writing device of this embodiment is further connected with a support unit 16. The support unit 16 is used to support the entire device to keep it stable. The support unit can be designed to be adjustable in height to adapt to different working environments and operating requirements.

[0036] An RFID reading and writing unit, an infrared sensing unit 18 and a quality collection unit 17 are arranged in the cavity of the photolithography mask reading and writing device. The quality collection unit 17 is used to collect the quality of the photolithography mask reading and writing device box 11; the infrared sensing unit 18 is used to collect the position information of the photolithography mask reading and writing device box 11; the RFID reading and writing unit is used to read and write the RFID tag of the mask of the RFID reading and writing unit photolithography mask reading and writing device box 11. The RFID reading and writing unit cooperates with the antenna rod to realize efficient reading and writing of the RFID tag and ensure the accuracy and integrity of the data.

[0037] The quality acquisition unit 17 is used to collect the quality of the photolithography mask reading and writing device box body. The quality acquisition unit 17 uses a high-precision weighing sensor to monitor the quality changes of the box body in real time and provide data support for subsequent quality control and management.

[0038] There are two infrared sensing units 18 , which are located below the oppositely disposed card slot baffles 122 .

[0039] Example 3

[0040] On the basis of the above embodiment, the photolithography mask reading and writing device box body 11 is further provided with a display unit for displaying the reading and writing status; the display unit is an LED display screen, which is used to display the reading and writing status information of the photolithography mask. The photolithography mask reading and writing device box body is further provided with a display unit for displaying the reading and writing status. The display unit is an LED display screen, which can clearly display the reading and writing status information of the photolithography mask, such as reading and writing success, reading and writing failure, etc. The operator can timely understand the operation results by observing the information on the display screen, and ensure the accuracy and reliability of the operation.

[0041] Example 4

[0042] As in the prior art, the microcontroller uses the stm8l050 chip, and the PB6 pin of the stm8l050 chip generates a 1Khz square wave, which is sent to the amplifier circuit Q2 of the SFH4547 through the MMBT3904 switching transistor Q3, driving the amplifier circuit Q2 of the SFH4547 to emit infrared light with a wavelength of 940nm, which is blocked by the goods on the shelf or container and reflected to the PDB-C13F infrared receiving diode D1, thereby generating a current corresponding to the light intensity, which is transmitted to the PB3 pin of the microcontroller stm8l050 after passing through the coupling capacitor C14 and the negative feedback amplifier circuit, and is converted by the analog-to-digital conversion of the PB3 pin to determine whether the goods are placed in the shelf or container. Through the SCL and SDA pins of the microcontroller stm8l050, the size of the digital potentiometer MCP4017-100K is adjusted to determine the amplification factor of the negative feedback amplifier circuit to cope with the difference in reflection distance caused by different surface colors and roughness of the goods. Ensure that the distance at which goods in shelves or containers are sensed is within an appropriate range to reduce the probability of misjudgment.

[0043] Example 5

[0044] Based on the above embodiments, the infrared transmitting circuit unit of this embodiment includes an infrared transmitting amplifying circuit module, an infrared transmitting diode and a current regulating unit; the current regulating unit and the infrared transmitting diode are connected to the infrared transmitting amplifying circuit module, and the infrared transmitting amplifying circuit module is used to amplify the received signal and transmit the amplified signal to the infrared transmitting diode.

[0045] The infrared emission amplification circuit module is an amplifying transistor Q2, and the infrared emission diode is a 940nm infrared emission diode D4; the current adjustment unit is an adjustable resistor R31 and a resistor R9;

[0046] The first end of the amplifying transistor Q2 is connected to one end of the resistor R9, the third end of the amplifying transistor Q2 is connected to the infrared emitting diode D4, and the second end of the amplifying transistor Q2 is connected to the infrared emitting micro control unit via the resistor; the other end of the resistor R9 is connected to the digital potentiometer and the resistor R31; the other end of the resistor R31 is connected to the power supply end; the other end of the infrared emitting diode D4 is grounded.

[0047] The infrared monitoring unit includes a transistor Q3, a transistor Q1, a diode D2, a diode D3 and a power indicator diode D1; the second end of the transistor Q1 is connected to the infrared receiving micro control unit; the first end of the transistor Q1 is connected to the power supply; the third end of the transistor Q1 is connected to the second end of the transistor Q3 via a resistor R1; the first end of the transistor Q3 is grounded; the third end of the transistor Q3 is connected to the power supply via a resistor R5, the third end of the transistor Q3 is connected to one end of the diode D2 and the diode D3, and the other end of the diode D2 and the diode D3 is connected to the power supply via a resistor R6.

Claims

1. A reader / writer of a lithography mask traceability system based on RFID, comprising a lithography mask reader / writer body (1); characterized in that: The photolithography mask reading and writing device body (1) comprises a photolithography mask reading and writing device box body (11) and a photolithography mask reading and writing device upper cover (12); the photolithography mask reading and writing device box body (11) and the photolithography mask reading and writing device upper cover (12) form a closed photolithography mask reading and writing device cavity; the photolithography mask reading and writing device upper cover (12) is connected to a mask unit (13) for placing a mask, a barcode reading unit (14) for reading a barcode of the mask, and an antenna rod (15) for receiving RFID signals.

2. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 1 is characterized in that: A card slot unit (121) is provided on the upper cover (12) of the photolithography mask reading and writing device. The card slot unit (121) comprises card slot baffles (122) arranged opposite to each other. A card slot is formed in the middle of the card slot baffles (122) arranged opposite to each other, and the box body (11) of the photolithography mask reading and writing device passes through the card slot.

3. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 1 is characterized in that: An RFID reading and writing unit, an infrared sensing unit (18) and a quality collection unit (17) are arranged in the cavity of the photolithography mask reading and writing device. The quality collection unit (17) is used to collect the quality of the photolithography mask reading and writing device box (11); the infrared sensing unit (18) is used to collect the position information of the photolithography mask reading and writing device box (11); and the RFID reading and writing unit is used to read and write the RFID tag of the mask of the RFID reading and writing unit photolithography mask reading and writing device box (11).

4. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 1 is characterized in that: Two infrared sensing units (18) are provided and are located below the card slot baffles (122) that are arranged opposite to each other; the infrared sensing units (18) include an infrared transmitting circuit unit, an infrared receiving circuit unit, a micro control unit and an infrared monitoring unit; the micro control unit is used to control the infrared transmitting circuit unit to transmit infrared light; the infrared receiving circuit unit is used to receive the infrared light emitted by the infrared transmitting circuit unit and feed back the received signal to the micro control unit, the micro control unit processes the received signal and sends a control signal to the infrared monitoring unit.

5. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 1, characterized in that: The microcontrol unit comprises an infrared transmitting microcontrol unit and an infrared receiving microcontrol unit; the infrared transmitting microcontrol unit is used for controlling the infrared transmitting circuit unit; and the infrared receiving microcontrol unit is used for controlling the infrared receiving circuit unit.

6. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 1, characterized in that: The photolithography mask reading and writing device box body (11) is also provided with a display unit for displaying the reading and writing status; the display unit is an LED display screen for displaying the photolithography mask reading and writing status information.

7. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 6 is characterized in that: The infrared transmitting circuit unit includes an infrared transmitting amplifying circuit module, an infrared transmitting diode and a current regulating unit; the current regulating unit and the infrared transmitting diode are connected with the infrared transmitting amplifying circuit module, and the infrared transmitting amplifying circuit module is used to amplify the received signal and transmit the amplified signal to the infrared transmitting diode.

8. The reading and writing device of the RFID-based photolithography mask traceability system according to claim 7, characterized in that: The infrared emission amplification circuit module is an amplifying transistor Q2, and the infrared emission diode is a 940nm infrared emission diode D4; the current adjustment unit is an adjustable resistor R31 and a resistor R9; The first end of the amplifying transistor Q2 is connected to one end of the resistor R9, the third end of the amplifying transistor Q2 is connected to the infrared emitting diode D4, and the second end of the amplifying transistor Q2 is connected to the infrared emitting micro control unit via the resistor; the other end of the resistor R9 is connected to the digital potentiometer and the resistor R31; the other end of the resistor R31 is connected to the power supply end; the other end of the infrared emitting diode D4 is grounded.

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