Cleaning device and cleaning method for tank wall of secondary sedimentation tank

Abstract

The invention provides a cleaning device for a secondary sedimentation tank wall and a cleaning method thereof, and aims to solve the problems of low efficiency and high risk of traditional manual cleaning. The cleaning device comprises a cleaning device support fixed to the bottom face of a sludge scraping and sucking machine support, two vertical electric push rods are arranged on the cleaning device support, and high-pressure water nozzles are arranged at the tail ends of the push rods and face the inner wall and the outer wall of a secondary sedimentation tank respectively. Through cooperative action of the vertical electric push rod and the horizontal electric push rod, the high-pressure water spray head can achieve all-dimensional and multi-layer automatic cleaning. In the cleaning process, the pressure and flow of high-pressure water flow provided by the high-pressure plunger pump are accurately adjusted through the electric control system, and the efficient cleaning effect is ensured. In addition, the design of the transparent cover plate allows the cleaning state to be monitored in real time and the operation parameters to be adjusted in real time. According to the secondary sedimentation tank wall cleaning device, automatic operation of secondary sedimentation tank wall cleaning is achieved, the cleaning efficiency and safety are remarkably improved, the labor cost is reduced, adaptability is high, the secondary sedimentation tank wall cleaning device is suitable for secondary sedimentation tanks of various specifications, and important application value and popularization prospects are achieved.

Description

Technical Field

[0001] The invention relates to the technical field of sewage treatment, and in particular to a cleaning device and a cleaning method for a secondary sedimentation tank wall. Background Art

[0002] As an indispensable part of the activated sludge system, the secondary sedimentation tank undertakes the key tasks of sludge separation, clarification of mixed liquor, concentration and return of activated sludge. Its operating efficiency is directly related to the effluent quality of the activated sludge system and the concentration of the return sludge. In actual operation, the effluent of the secondary sedimentation tank usually contains trace amounts of nitrogen and phosphorus. The presence of these nutrients, coupled with long-term operation conditions, can easily lead to the growth of a large amount of moss and floating algae on the inner wall of the secondary sedimentation tank port. In addition, the small amount of suspended particles contained in the effluent also tend to adhere to these biofilms, forming a dirt layer that is difficult to clean.

[0003] Traditional cleaning methods rely on manual cleaning, which is not only time-consuming and labor-intensive, but also poses a great safety risk, especially when dealing with large or deep secondary sedimentation tanks, where the difficulty and danger of the operation increase significantly. Inefficient manual cleaning may also lead to prolonged production interruptions and affect the normal operation of the entire sewage treatment system. Therefore, there is an urgent need for an efficient, automated and easy-to-operate solution to replace the traditional manual cleaning method to ensure the cleanliness of the secondary sedimentation tank and the stable operation of the system, and to improve the overall efficiency and safety of sewage treatment. Summary of the invention

[0004] The technical problem to be solved by the present invention is to provide a cleaning device and a cleaning method for the wall of a secondary sedimentation tank, aiming to achieve effective cleaning of the wall of the secondary sedimentation tank through an automated mechanical device, thereby solving the problems existing in the prior art.

[0005] In order to solve the above technical problems, the technical solution adopted by the present invention is: a cleaning device for the wall of a secondary sedimentation tank, comprising a cleaning device bracket, wherein the cleaning device bracket is fixedly arranged on the bottom surface of the scraper and suction sludge machine bracket, and two vertical electric push rods are arranged on the cleaning device bracket, the vertical electric push rods are arranged downward, and high-pressure water nozzles are arranged on the push rods of the vertical electric push rods, and the two groups of high-pressure water nozzles are respectively arranged towards the inner and outer walls of the secondary sedimentation tank.

[0006] In a preferred solution, the vertical electric push rod is passed through the cleaning device bracket, and a bearing is provided at the passing position.

[0007] In a preferred solution, a transparent cover is provided on the outer side of the top of the cleaning device bracket.

[0008] In a preferred solution, the upper end of the vertical electric push rod cylinder is fixedly connected to the vertical push rod connecting plate ear plate, and one end of the vertical push rod connecting plate ear plate extends toward the middle of the cleaning device bracket; A horizontal electric push rod is also provided on the top surface of the cleaning device bracket. The horizontal electric push rod is horizontally arranged and a column is provided at the end of the push rod. A strip hole is provided on the ear plate of the vertical push rod connecting plate. The upper and lower ends of the column are respectively located in the strip holes of the two vertical push rod connecting plate ear plates.

[0009] In the preferred solution, the high-pressure water nozzle is connected to the high-pressure plunger pump through a high-pressure water pipeline. The high-pressure water pipeline is laid along the bottom of the scraper and suction machine bracket, and a redundant amount is left at the water inlet end near the high-pressure water nozzle to meet the up and down movement requirements of the high-pressure water pipeline.

[0010] The cleaning method based on the cleaning device of the secondary sedimentation tank wall comprises the following steps: 1) According to the cleaning range of the high-pressure water column ejected by the high-pressure water nozzle, and considering the cross-coverage between the water column layers, the pool wall is divided into multiple areas from top to bottom for cleaning; 2) Control the extension and retraction of the vertical electric push rod to place the high-pressure nozzle in the lowest area and start the high-pressure plunger pump. The high-pressure water nozzle rotates with the scraper and suction machine bracket to clean the first layer of the pool wall; 3) The vertical electric push rod is extended by electric control to achieve partial cross-coverage of the first layer of water column cleaning range and the second layer of water column cleaning range; 4) Repeat step 3) to complete the cleaning of multiple subsequent areas.

[0011] In a preferred solution, in step 2), while cleaning, the horizontal electric push rod is electrically controlled to perform a reciprocating telescopic motion, causing the vertical electric push rod to perform an axial rotation motion, thereby driving the high-pressure water nozzle to swing.

[0012] In a preferred solution, after step 4) is completed, the reverse operation is performed to perform secondary cleaning on multiple areas.

[0013] In a preferred solution, the vertical electric push rod, the horizontal electric push rod and the high-pressure plunger pump are automatically controlled by a PLC control system; Among them, the high-pressure plunger pump is variable frequency, and through the control system and pressure sensor, the pressure and flow of the pump are adjusted according to the actual situation of the pool wall to achieve the regulation of the impact force of the water column.

[0014] In a preferred embodiment, during the cleaning process of step 1) to step 4), the cleaning area is observed through a transparent cover plate and the operating parameters of the vertical electric push rod, the horizontal electric push rod and the high-pressure plunger pump are adjusted at any time.

[0015] The device for measuring free silicon dioxide in dust provided by the present invention has the following beneficial effects by adopting the above structure: (1) Through the automated control system, combined with the coordinated action of the vertical and horizontal electric push rods, the high-pressure water nozzle can achieve all-round, multi-level cleaning of the inner and outer walls of the secondary sedimentation tank. Compared with the traditional manual cleaning method, it greatly improves the cleaning efficiency and reduces downtime for maintenance; (2) By using the high-pressure water flow provided by the high-pressure plunger pump and adjusting the pressure and flow through the electronic control system, different dirt layers can be accurately cleaned. At the same time, the swing design of the high-pressure water nozzle makes the water column cover a wider area, ensuring no dead angle coverage during the cleaning process and enhancing the overall cleaning effect; (3) The use of automated cleaning equipment avoids the risk of manual entry into the secondary sedimentation tank, especially when dealing with large or deep secondary sedimentation tanks, reducing the safety risks of operators. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The present invention will be further described below in conjunction with the accompanying drawings and embodiments: Figure 1 It is a schematic diagram of the overall structure of the present invention.

[0017] Figure 2 It is a structural schematic diagram of the connection state of the horizontal electric push rod and the two vertical push rod connecting plate ear plates of the present invention.

[0018] Figure 3 It is a schematic diagram of the cleaning partitions of the present invention.

[0019] In the figure: cleaning device bracket 1, transparent cover plate 1-1, vertical electric push rod 2, bearing 3, vertical push rod connecting plate ear plate 4, strip hole 4-1, pin 5, horizontal electric push rod 6, column 6-1, high-pressure water nozzle 7, scraper and suction mud machine bracket 8. DETAILED DESCRIPTION

[0020] Embodiment 1: like Figure 1 In the invention, a cleaning device for the wall of a secondary sedimentation tank is provided, comprising a cleaning device bracket 1, wherein the cleaning device bracket 1 is fixedly arranged on the bottom surface of a scraper and suction sludge machine bracket 8, and two vertical electric push rods 2 are arranged on the cleaning device bracket 1, and the vertical electric push rods 2 are arranged downward, and high-pressure water nozzles 7 are arranged on the push rods of the vertical electric push rods 2, and the two groups of high-pressure water nozzles 7 are respectively arranged toward the inner and outer walls of the secondary sedimentation tank.

[0021] In a preferred solution, the vertical electric push rod 2 is passed through the cleaning device bracket 1, and a bearing 3 is provided at the passing position.

[0022] In a preferred embodiment, a transparent cover plate 1 - 1 is provided on the outer side of the top of the cleaning device bracket 1 .

[0023] In a preferred embodiment, the upper end of the cylinder of the vertical electric push rod 2 is fixedly connected to the vertical push rod connecting plate ear plate 4, and one end of the vertical push rod connecting plate ear plate 4 extends toward the middle of the cleaning device bracket 1; A horizontal electric push rod 6 is also provided on the top surface of the cleaning device bracket 1. The horizontal electric push rod 6 is horizontally arranged and a column 6-1 is provided at the end of the push rod. A strip hole 4-1 is provided on the vertical push rod connecting plate ear plate 4. The upper and lower ends of the column 6-1 are respectively located in the strip holes 4-1 of the two vertical push rod connecting plate ear plates 4.

[0024] In the preferred solution, the high-pressure water nozzle 7 is connected to the high-pressure plunger pump through a high-pressure water pipeline. The high-pressure water pipeline is laid along the bottom of the scraper and suction machine bracket 8, and a redundant amount is left near the water inlet end of the high-pressure water nozzle 7 to meet the up and down movement requirements of the high-pressure water pipeline.

[0025] Embodiment 2: A cleaning method for a secondary sedimentation tank wall cleaning device based on Example 1 comprises the following steps: 1) According to the cleaning range of the high-pressure water column ejected by the high-pressure water nozzle 7 and considering the cross-coverage between the water column layers, the pool wall is divided into multiple areas from top to bottom for cleaning; 2) Control the vertical electric push rod to extend and retract 2 to place the high-pressure nozzle in the lowest area and start the high-pressure plunger pump. The high-pressure water nozzle 7 rotates with the scraper and suction machine bracket 8 to clean the first layer of the pool wall; 3) The vertical electric push rod 2 is extended by electric control to achieve partial cross-coverage of the cleaning range of the first layer of water column and the cleaning range of the second layer of water column; 4) Repeat step 3 to complete the cleaning of multiple subsequent areas.

[0026] In a preferred solution, in step 2), while cleaning, the horizontal electric push rod 6 is electrically controlled to perform a reciprocating telescopic motion, so that the vertical electric push rod 2 undergoes an axial rotation motion, driving the high-pressure water nozzle 7 to swing.

[0027] In a preferred solution, after step 4) is completed, the reverse operation is performed to perform secondary cleaning on multiple areas.

[0028] In a preferred solution, the vertical electric push rod 2, the horizontal electric push rod 6 and the high-pressure plunger pump are automatically controlled by a PLC control system; Among them, the high-pressure plunger pump is variable frequency, and through the control system and pressure sensor, the pressure and flow of the pump are adjusted according to the actual situation of the pool wall to achieve the regulation of the impact force of the water column.

[0029] In a preferred embodiment, during the cleaning process of step 1) to step 4), the cleaning area is observed through the transparent cover plate 1-1 and the operating parameters of the vertical electric push rod 2, the horizontal electric push rod 6 and the high-pressure plunger pump are adjusted at any time.

[0030] Embodiment 3: Based on Example 2, in step 1), the vertical electric push rod 2 is adjusted to the lowest position, the high-pressure plunger pump is started, and the initial pressure is set to 50 MPa and the flow rate is 45 L / min; The vertical electric push rod 2 moves downward at a speed of 50 mm / s, and the horizontal electric push rod 6 performs reciprocating motion according to the program setting (for example, once per second) to realize the swing of the high-pressure water nozzle 7; According to the cleaning effect observed by the transparent cover plate 1-1, the speed of the vertical electric push rod, the pressure and flow rate of the high-pressure plunger pump are adjusted in time. For example, when encountering more stubborn stains, the pressure can be increased to 80Mpa; After reaching the preset height, the vertical electric push rod 2 stops rising, completing the cleaning task of one layer, and repeating the above steps until all the predetermined areas are cleaned.

Claims

1. A cleaning device for a secondary sedimentation tank wall, characterized in that: The cleaning device comprises a cleaning device bracket (1), wherein the cleaning device bracket (1) is fixedly arranged on the bottom surface of a sludge scraper bracket (8), and two vertical electric push rods (2) are arranged on the cleaning device bracket (1), the vertical electric push rods (2) are arranged downward, and high-pressure water nozzles (7) are arranged on the push rods of the vertical electric push rods (2), and the two groups of high-pressure water nozzles (7) are arranged respectively toward the inner and outer wall surfaces of the secondary sedimentation tank.

2. The cleaning device for the wall of a secondary sedimentation tank according to claim 1, characterized in that: The vertical electric push rod (2) is inserted through the cleaning device bracket (1), and a bearing (3) is provided at the insertion position.

3. The cleaning device for the wall of a secondary sedimentation tank according to claim 1, characterized in that: A transparent cover plate (1-1) is provided on the outer side of the top of the cleaning device bracket (1).

4. The cleaning device for the wall of a secondary sedimentation tank according to claim 1, characterized in that: The upper end of the cylinder body of the vertical electric push rod (2) is fixedly connected to the vertical push rod connecting plate ear plate (4), and one end of the vertical push rod connecting plate ear plate (4) extends toward the middle of the cleaning device bracket (1); A horizontal electric push rod (6) is also provided on the top surface of the cleaning device bracket (1); the horizontal electric push rod (6) is arranged horizontally and a column (6-1) is provided at the end of the push rod; a strip hole (4-1) is provided on the vertical push rod connecting plate ear plate (4); and the upper and lower ends of the column (6-1) are respectively located in the strip holes (4-1) of the two vertical push rod connecting plate ear plates (4).

5. The cleaning device for the wall of a secondary sedimentation tank according to claim 1, characterized in that: The high-pressure water nozzle (7) is connected to the high-pressure plunger pump via a high-pressure water pipeline. The high-pressure water pipeline is laid along the bottom of the scraper and suction machine bracket (8), and a redundant volume is left at the water inlet end close to the high-pressure water nozzle (7) to meet the up and down movement requirements of the high-pressure water pipeline.

6. A cleaning method for a secondary sedimentation tank wall cleaning device according to any one of claims 1 to 5, characterized in that The following steps are involved: 1) Based on the cleaning range of the high-pressure water column ejected by the high-pressure water nozzle (7), and taking into account the cross-coverage between water column layers, the pool wall is divided from top to bottom into multiple areas for cleaning; 2) Control the extension and retraction of the vertical electric push rod (2) to place the high-pressure nozzle in the lowest area and start the high-pressure plunger pump. The high-pressure water nozzle (7) rotates along with the scraper and suction machine bracket (8) to clean the first layer of the pool wall; 3) The vertical electric push rod (2) is extended by electric control to achieve partial cross-coverage of the cleaning range of the first layer of water column and the cleaning range of the second layer of water column; 4) Repeat step 3) to complete the cleaning of multiple subsequent areas.

7. A method for cleaning the wall of a secondary sedimentation tank according to claim 6, characterized in that: In the step 2), while cleaning, the horizontal electric push rod (6) is electrically controlled to perform a reciprocating telescopic motion, causing the vertical electric push rod (2) to perform an axial rotation motion, thereby driving the high-pressure water spray head (7) to swing.

8. The method for cleaning the wall of a secondary sedimentation tank according to claim 6, characterized in that: After step 4) is completed, the reverse operation is performed to perform secondary cleaning on multiple areas.

9. The method for cleaning the wall of a secondary sedimentation tank according to claim 6, characterized in that: The vertical electric push rod (2), the horizontal electric push rod (6) and the high-pressure plunger pump are automatically controlled by a PLC control system; The high-pressure plunger pump is variable frequency, and the pressure and flow of the pump are adjusted according to the actual situation of the pool wall through the control system and the pressure sensor, so as to achieve the regulation of the impact force of the water column.

10. A method for cleaning the wall of a secondary sedimentation tank according to claim 9, characterized in that: During the cleaning process of step 1) to step 4), the cleaning area is observed through the transparent cover plate (1-1) and the operating parameters of the vertical electric push rod (2), the horizontal electric push rod (6) and the high-pressure plunger pump are adjusted at any time.

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