Annular cylindrical workpiece, polishing platen, polishing equipment and polishing surface shape control method

Abstract

The present invention discloses an annular cylindrical workpiece, a polishing platen, a polishing device, and a method for controlling a polishing surface profile. The method comprises: an expansion chamber disposed between a support plate and a polishing plate; one end of the expansion chamber is connected to a pressure control source; the pressure control source varies an output load based on the axial length of an outer wall of the expansion chamber, the bending stiffness of the outer wall, the wall thickness of the outer wall, the elastic modulus of the outer wall, and the Poisson's ratio, thereby varying the deflection of the outer wall; the outer wall of the expansion chamber is configured to transmit a torque to the polishing plate when the deflection increases, thereby deforming the polishing surface profile of the polishing plate. The present invention achieves the technical effect of reducing the difficulty of controlling the polishing surface profile while improving the accuracy of controlling the polishing surface profile.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor polishing, and in particular to an annular cylindrical workpiece, a polishing platen, a polishing device and a polishing surface shape control method. Background Art

[0002] The polishing platen is used for polishing semiconductor materials. Since the surface of the semiconductor material has different surface shapes, and the surface shape of the semiconductor material may also change during the polishing process. Therefore, in order to make the polishing end face of the polishing platen fit better on the surface of the wafer, the polishing surface shape of the polishing end face should be adjustable. In the related art, the adjustment process of the polishing surface shape is generally to transfer external force to the polishing disk to cause the polishing disk to deform and thus change the polishing surface shape. For example, a rigid structure can be set on the upper edge of the polishing disk, and the edge of the polishing disk is pushed downward by the rigid structure to cause the deformation of the polishing disk. Although this type of structure can adjust the polishing surface shape, there are problems of high control difficulty and inaccurate adjustment of the polishing surface shape. Summary of the Invention

[0003] The main purpose of the present invention is to provide an annular cylindrical workpiece, a polishing platen, a polishing device and a polishing surface shape control method to solve the problem in the related art that the structural control of adjusting the polishing surface shape is difficult and it is difficult to accurately adjust the polishing surface shape to the target polishing surface shape.

[0004] In order to achieve the above object, the present invention provides an annular cylindrical workpiece, comprising:

[0005] An annular expansion chamber, one end of which is used to connect to a pressure control source, which changes the output load according to the axial length of the outer cavity wall of the expansion chamber, the bending stiffness of the outer cavity wall, the wall thickness of the outer cavity wall, the elastic modulus of the outer cavity wall and the Poisson's ratio to change the deflection of the outer cavity wall. The outer cavity wall of the expansion chamber is used to transmit torque to the polishing disk when the deflection increases, so that the polishing surface of the polishing disk is deformed.

[0006] Furthermore, both ends of the outer cavity wall are simply supported structures, and the corresponding relationship between the deflection of the outer cavity wall and the output load of the pressure control source is:

[0007] ;

[0008] in, is the deflection of the outer cavity wall, is the output load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the bending stiffness of the outer cavity wall, is the wall thickness of the outer cavity wall, , , E is the elastic modulus of the outer cavity wall, is the Poisson's ratio of the outer cavity wall.

[0009] According to another aspect of the present invention, a method for controlling a polishing surface profile is provided, which uses the above-mentioned annular cylindrical workpiece to control the polishing surface profile of a polishing disc, comprising:

[0010] Obtaining a mapping relationship between the output load and the polishing surface type, wherein the mapping relationship is determined based on a corresponding relationship between the output load and the outer cavity wall deflection and a corresponding relationship between the outer cavity wall deflection and the polishing surface type;

[0011] According to the mapping relationship, the output load of the pressure control source is adjusted to change the deflection of the outer cavity wall, thereby changing the polishing surface shape of the polishing end face to meet the target polishing surface shape.

[0012] Furthermore, the correspondence between the outer cavity wall deflection and the polishing surface shape is determined in the following manner:

[0013] Finite element simulation analysis is performed on the polishing plate to determine the corresponding relationship between the outer cavity wall deflection and the polishing surface shape.

[0014] Furthermore, the polishing surface shape control method also includes:

[0015] Obtaining the current output load of the pressure control source;

[0016] The current polishing surface type is determined according to the mapping relationship.

[0017] According to another aspect of the present invention, there is provided a polishing platen, which uses the above-mentioned polishing surface profile control method to control the polishing surface profile, and the polishing platen comprises:

[0018] Support plates, polishing plates and fulcrum parts;

[0019] The two ends of the fulcrum member are respectively connected to the support plate and the first end of the polishing plate; an expansion cavity is provided between the support plate and the second end of the polishing plate away from the polishing end surface, and the fulcrum member is located between the polishing end surface and the second end of the polishing plate;

[0020] By controlling the pressure in the expansion chamber, the outer chamber wall is deformed, the outer chamber wall transmits torque through the second end of the polishing disc, and the second end of the polishing disc transmits torque to the polishing end face of the polishing disc through the fulcrum member. Under the action of the torque, the polishing surface of the polishing disc is deformed.

[0021] Furthermore, the fulcrum member includes a first connecting plate, a second connecting plate and a fulcrum plate, wherein the first connecting plate and the second connecting plate are respectively connected to the first ends of the supporting plate and the polishing plate, and the fulcrum plate is connected between the first connecting plate and the second connecting plate;

[0022] When the outer cavity wall is deformed by controlling the pressure in the expansion cavity, the first connecting plate, the second connecting plate and the fulcrum plate are elastically deformed under the action of the torque to change the angle between the first connecting plate and the second connecting plate.

[0023] Furthermore, the polishing surface of the polishing disc is convex inside and concave outside when not deformed.

[0024] Furthermore, the polishing platen also includes a first annular member, which is arranged between the supporting plate and the second end of the polishing plate, and the expansion chamber is located between the first annular member and the supporting plate.

[0025] Furthermore, the first annular member includes a first sealing portion, a first thin-walled portion, and a second sealing portion connected in sequence, and the expansion chamber is provided between the first thin-walled portion and the supporting disk;

[0026] The first sealing portion and the second sealing portion are used to seal the expansion cavity.

[0027] Furthermore, the polishing platen further comprises a second annular member, wherein the second annular member is located between the first annular member and the supporting plate;

[0028] The expansion chamber is located between the inner ring side of the first annular member and the outer ring side of the second annular member.

[0029] Furthermore, the first annular member includes a third sealing portion, a second thin-walled portion, and a fourth sealing portion connected in sequence, and the expansion cavity is provided between the second thin-walled portion and the second annular member;

[0030] The third sealing portion and the fourth sealing portion are used to seal the expansion cavity.

[0031] Furthermore, the outer ring side of the second annular member has a protruding fifth sealing portion, and the third sealing portion and the fifth sealing portion are in contact with each other and sealed.

[0032] The outer ring side of the support disk has a first connecting protrusion, the fourth sealing portion is provided on the first connecting protrusion, and the fourth sealing portion is in contact with and sealed against the lower end surface of the second annular member.

[0033] Furthermore, a second connecting protrusion protruding toward the first annular member is provided on the inner ring side of the polishing disk, and the second connecting protrusion is in contact with the second thin-walled portion.

[0034] Furthermore, there is a distance between the upper end surface of the second connecting protrusion and the lower end surface of the third sealing portion, and between the lower end surface of the second connecting protrusion and the upper end surface of the first connecting protrusion, and the distance provides movement space for the second connecting protrusion.

[0035] According to another aspect of the present invention, there is provided a polishing device comprising the above-mentioned polishing platen.

[0036] On the one hand, the present invention adopts an annular cylindrical workpiece, which includes an annular expansion chamber, one end of which is used to connect to a pressure control source. The pressure control source changes the output load according to the axial length of the outer cavity wall of the expansion chamber, the bending stiffness of the outer cavity wall, the wall thickness of the outer cavity wall, the elastic modulus of the outer cavity wall and the Poisson's ratio to change the deflection of the outer cavity wall. The outer cavity wall of the expansion chamber is used to transmit torque to the polishing disk when the deflection increases, so that the polishing surface of the polishing disk is deformed, thereby achieving the goal of providing an annular outer cavity wall with an annular expansion chamber, and controlling the output The load can control the deflection of the outer cavity wall. When the deflection of the outer cavity wall increases, the torque can be evenly transmitted to the four sides of the polishing disk to change the polishing surface shape. The output load is adjusted according to the structural parameters of the outer cavity wall, and the deflection of the outer cavity wall can be accurately controlled to accurately control the polishing surface shape of the polishing disk, thereby achieving the technical effect of reducing the difficulty of controlling the polishing surface shape and improving the accuracy of controlling the polishing surface shape, thereby solving the problem in the related technology that the structural control of adjusting the polishing surface shape is difficult and it is difficult to accurately adjust the polishing surface shape to the target polishing surface shape.

[0037] On the other hand, the present invention establishes a complete mapping relationship between the output load and the polishing surface type in the polishing surface type control method, and this relationship is established based on the outer cavity wall of the expansion cavity, so that the established mapping relationship is more accurate and can accurately adjust the output load of the pressure control source according to the target polishing surface type to achieve the target polishing surface type.

[0038] On the other hand, in the process of adjusting the polishing surface shape, the polishing pressure plate provided by the present invention only needs to change the output load of the pressure control source to change the pressure in the expansion chamber to cause the deflection of the outer cavity wall to change, and the torque is transmitted from the outer cavity wall to the second end of the polishing plate. The second end of the polishing plate transmits the torque to the polishing end face through the fulcrum part to cause the polishing surface shape to deform. Compared with the related technology that requires the cooperation of the inner and outer ring adjustment devices, it is also simpler to control. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] The accompanying drawings, which constitute part of the present invention, are intended to provide a further understanding of the present invention and to make other features, objects, and advantages of the present invention more apparent. The accompanying drawings and descriptions of the exemplary embodiments of the present invention are intended to explain the present invention and do not constitute an undue limitation of the present invention. In the accompanying drawings:

[0040] Figure 1 is a schematic diagram showing that the polishing surface of the polishing platen according to an embodiment of the present invention is unchanged;

[0041] Figure 2 is a schematic diagram of a change in the polishing surface profile of a polishing platen according to an embodiment of the present invention;

[0042] Figure 3 is a schematic front view of the structure of a polishing platen according to an embodiment of the present invention;

[0043] Figure 4 yes Figure 3 Schematic diagram of the cross-sectional structure of AA;

[0044] Figure 5 yes Figure 4 A schematic diagram of the enlarged structure of part I in the middle;

[0045] Figure 6 is a schematic cross-sectional view of a polishing platen according to another embodiment of the present invention;

[0046] Figure 7 yes Figure 6 Schematic diagram of the enlarged structure of the part B in the middle;

[0047] Figure 8 is a schematic diagram of a polishing surface profile control method according to an embodiment of the present invention;

[0048] Figure 9 is a schematic diagram of an annular columnar space formed by an expansion cavity according to an embodiment of the present invention;

[0049] Figure 10 This is a finite element simulation analysis process of a polishing disk according to an embodiment of the present invention;

[0050] Figure 11 This is a finite element simulation analysis process of a polishing disk according to an embodiment of the present invention;

[0051] Among them, 1 supporting plate, 100 first connecting protrusion, 101 second limiting part, 102 mounting groove, 103 edge, 2 polishing plate, 200 second connecting protrusion, 201 third connecting protrusion, 3 fulcrum member, 30 first connecting plate, 31 fulcrum plate, 310 groove, 32 second connecting plate, 4 expansion chamber, 40 outer cavity wall, 5 pressure regulating channel, 6 anti-falling plate, 60 accommodating groove, 8 second annular member, 80 first limiting part, 81 fifth sealing part, 9 first annular member, 90 third sealing part, 91 fourth sealing part, 92 second thin-walled part, 93 first sealing part, 94 second sealing part, 95 first thin-walled part, 12 control chamber, 13 sealing ring. DETAILED DESCRIPTION

[0052] In order to enable those skilled in the art to better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0053] It should be noted that the terms "first," "second," and the like in the specification and claims of the present invention and the accompanying drawings are used to distinguish similar objects and are not necessarily used to describe a particular order or sequence. It should be understood that the terms used in this manner are interchangeable where appropriate to facilitate the description of the embodiments of the present invention.

[0054] In the present invention, the terms "upper," "lower," "inner," and the like indicate positions or locations based on those shown in the accompanying drawings. These terms are primarily intended to better describe the present invention and its embodiments and are not intended to limit the devices, elements, or components indicated to having a specific orientation, or to being constructed or operated in a specific orientation.

[0055] Furthermore, some of the above terms may be used to express other meanings besides indicating a position or location. For example, the term "on" may also be used to indicate a dependency or connection in certain circumstances. Those skilled in the art will understand the specific meanings of these terms in the present invention based on the specific circumstances.

[0056] Furthermore, the terms "disposed," "provided with," "connected," and "fixed" should be interpreted broadly. For example, "connected" can mean a fixed connection, a removable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be a direct connection, an indirect connection through an intermediary, or an internal communication between two devices, elements, or components. Those skilled in the art will understand the specific meanings of these terms in the present invention based on the specific circumstances.

[0057] Additionally, the term "plurality" shall mean two or more.

[0058] It should be noted that, in the absence of conflict, the embodiments and features of the embodiments of the present invention can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0059] To solve related technical problems, such as Figures 1 to 6 As shown, an embodiment of the present invention provides a polishing platen, comprising: a supporting plate 1, a polishing plate 2 and a fulcrum member 3; wherein,

[0060] The two ends of the fulcrum member 3 are respectively connected to the first end of the support plate 1 and the polishing plate 2; an expansion cavity 4 is provided between the support plate 1 and the second end of the polishing plate 2 away from the polishing end surface, and the fulcrum member 3 is located between the polishing end surface and the second end of the polishing plate 2;

[0061] By controlling the pressure in the expansion chamber 4, the outer cavity wall 40 is deformed, so that the outer cavity wall 40 transmits torque through the second end of the polishing disk 2, and the second end of the polishing disk 2 transmits torque to the polishing end face of the polishing disk 2 through the fulcrum member 3. Under the action of the torque, the polishing surface of the polishing disk 2 is deformed.

[0062] In this embodiment, the polishing platen primarily comprises a support plate 1, a polishing plate 2, and a fulcrum member 3, wherein the support plate 1 is a rigid structure. The lower surface of the polishing plate 2 serves as the polishing end surface. The polishing plate 2 is a deformable plate capable of deforming to a certain degree under the action of an external force. Specifically, under the action of an external force, the polishing end surface of the polishing plate 2 can be adjusted from a horizontal position to a concave or convex structure, or from a convex position to a horizontal or concave structure. During the polishing process, the polishing end surface can contact the surface of the workpiece to be polished (e.g., a wafer or glass sheet) for compression and polishing.

[0063] The polishing disc 2 is mounted on the lower portion of the support disc 1. Specifically, in this embodiment, a concave structure is formed in the middle portion of the polishing disc 2, and the lower portion of the support disc 1 extends into the concave structure. The polishing disc 2 and the support disc 1 are connected via a fulcrum member 3, and the fulcrum member 3 is located between the polishing end face of the polishing disc 2 and the second end of the polishing disc 2. When the second end of the polishing disc 2 is subjected to a torque, the fulcrum member 3 acts as a fulcrum, so that the torque of the second end of the polishing disc 2 can be transmitted to the polishing end face, causing the polishing end face to deform. In one embodiment, the fulcrum member 3 can be set as an annular structure and surround the outer ring of the support disc 1, and the upper and lower ends of the fulcrum member 3 are respectively connected to the support disc 1 and the polishing disc 2. In another embodiment, the fulcrum member 3 can also be set as a plurality of fulcrum members 3, and the plurality of fulcrum members 3 are distributed along the circumference of the outer ring of the support disc 1. The plurality of fulcrum members 3 can be arranged at intervals or can be closely fitted to each other.

[0064] Due to the provision of the fulcrum member 3, not only does the connection between the support plate and the polishing plate 2 not need to be via the expansion chamber 4, but the expansion chamber 4 can also be provided only between the second end of the polishing plate 2 and the support plate 1. The expansion chamber 4 has an outer cavity wall 40. When the pressure within the expansion chamber 4 increases, the outer cavity wall 40 of the expansion chamber 4 expands and bulges outward, thereby transmitting a torque to the second end of the polishing plate 2. After the second end of the polishing plate 2 is subjected to this torque, the presence of the fulcrum member 3 enables the second end of the polishing plate 2 to transmit the torque to the polishing end surface of the polishing plate 2, causing the polishing end surface to deform, thereby changing the polishing surface profile of the polishing end surface.

[0065] It can be seen from this that, on the one hand, after the present invention uses the fulcrum member 3 as a connecting member between the support plate 1 and the polishing plate 2, the expansion chamber 4 does not need to play the role of connecting the support plate 1 and the polishing plate 2, so that the arrangement position of the expansion chamber 4 is more flexible and the structural setting of the expansion chamber 4 is simpler.

[0066] At the same time, since the fulcrum member 3 is located between the polishing end surface and the second end of the polishing plate 2, the expansion chamber 4 can be arranged at a single position, for example, only at a position close to the outer ring on the polishing pressure plate. In the process of adjusting the polishing surface shape, it is only necessary to adjust the pressure in the expansion chamber 4 to deform the outer cavity wall 40 of the expansion chamber 4, and the torque is transmitted from the outer cavity wall 40 to the second end of the polishing plate 2. The second end of the polishing plate 2 transmits the torque to the polishing end surface through the fulcrum member 3, so that the polishing surface shape can be deformed. Compared with the related art that requires the cooperation of the inner and outer ring adjustment devices, the control is also simpler.

[0067] On the other hand, when the expansion chamber 4 does not need to serve as a connection between the support plate 1 and the polishing plate 2, the installation and disassembly of the expansion chamber 4 is also simpler. Moreover, since the adjustment process of the polishing surface type is essentially a process of controlling the expansion of the outer cavity wall 40 of the expansion chamber 4, after the expansion chamber 4 is easy to install and disassemble, it is easier to meet the adjustment requirements of different polishing surface types by replacing the expansion chamber 4.

[0068] In one embodiment, Figures 4 to 7 As shown, a certain distance is provided between the edge of the support plate 1 and the second end of the polishing plate 2, thereby forming a control chamber 12. The control chamber 12 includes the area between the outer annular side of the support plate 1 and the inner annular side of the second end of the polishing plate 2. A separate expansion chamber 4 is provided within the control chamber 12. In one embodiment, the expansion chamber 4 is an airbag provided within the control chamber 12, and the outer chamber wall 40 is the outer wall of the airbag.

[0069] In another embodiment, Figure 4 and Figure 5 As shown, two opposing annular members may be arranged in the control chamber 12, with the expansion chamber 4 being disposed between the two annular members. Figure 6 and Figure 7 As shown, an annular member can be arranged in the control chamber 12, and the expansion chamber 4 is arranged between the annular member and the support plate 1. In this embodiment, there is no limitation on the specific arrangement of the expansion chamber 4, as long as a separate and expandable cavity can be arranged in the control chamber 12.

[0070] Depending on the specific configuration of the expansion chamber 4, it may have one or more walls that can expand. Figure 1 As shown, in this embodiment, the outer wall 40 of the expansion chamber 4 corresponds to the second end of the polishing plate 2. When the pressure in the expansion chamber 4 increases, the outer wall 40 can expand, and when the pressure in the expansion chamber 4 decreases, the outer wall 40 can contract. The outer wall 40 of the expansion chamber 4 and the second end of the polishing plate 2 can fit together, or they can have a certain distance between them.

[0071] When the outer wall 40 of the expansion chamber 4 fits against the polishing disc 2, the expansion of the outer wall 40 can push the polishing disc 2 to deform outward. When the outer wall 40 contracts, additional force is required to drive the polishing disc 2 to deform inward. The force can come from the elastic force of the polishing disc 2 itself, or from the elastic fulcrum member 3, or through other structures with elastic restoring force to pull the polishing disc 2 inward.

[0072] When there is a certain distance between the outer wall 40 of the expansion chamber 4 and the polishing disk 2, the distance should be smaller than the maximum expansion degree that the outer wall 40 can achieve, so that the outer wall 40 can push the polishing disk 2 to deform before expanding to the maximum extent.

[0073] In this embodiment, the expansion and contraction of the outer wall 40 of the expansion chamber 4 is controlled by controlling the pressure in the expansion chamber 4. In one embodiment, a gas at a certain pressure can be introduced into the expansion chamber 4 to control the pressure in the expansion chamber 4. In another embodiment, a liquid at a certain pressure (such as high-pressure oil) can be introduced into the expansion chamber 4 to control the pressure in the expansion chamber 4. In both embodiments, an external pressure control source is required. For this purpose, Figure 4 and Figure 5 As shown, the polishing platen in this embodiment further includes a pressure regulating channel 5, which can be provided on the support plate 1. The first end of the pressure regulating channel 5 is connected to the expansion chamber 4, and the second end is used to connect to a pressure control source. The pressure in the expansion chamber 4 is controlled by the pressure control source, thereby controlling the expansion and contraction of the outer cavity wall 40 of the expansion chamber 4. In turn, the outer cavity wall 40 drives the deformation of the polishing end surface, ultimately adjusting the polishing surface shape of the polishing plate 2.

[0074] In this embodiment, the adjustment process of the polishing surface shape is that the pressure in the expansion chamber 4 increases, causing the outer chamber wall 40 to expand outward and push the second end of the polishing disc 2. Under the action of the fulcrum 3, the polishing end surface of the polishing disc 2 is deformed, and the center point of the deformation of the polishing end surface is the center of the circle of the polishing end surface. Therefore, in order to smoothly control the deformation of the polishing disc 2, as shown in FIG. Figure 5 As shown, the expansion chamber 4 can be positioned near the edge of the polishing plate 2, while the fulcrum member 3 is positioned relatively close to the center of the polishing end surface. In other words, in this embodiment, the vertical distance between the outer wall 40 of the expansion chamber 4 and the center of the polishing end surface is greater than the vertical distance between the fulcrum member 3 and the center of the polishing end surface.

[0075] In one embodiment, the present invention provides an annular cylindrical workpiece, comprising:

[0076] An annular expansion chamber 4 is provided between the support plate 1 and the polishing plate 2. One end of the expansion chamber 4 is connected to a pressure control source. The pressure control source changes the output load according to the axial length of the outer cavity wall 40 of the expansion chamber 4, the bending stiffness of the outer cavity wall 40, the wall thickness of the outer cavity wall 40, the elastic modulus of the outer cavity wall 40 and the Poisson's ratio to change the deflection of the outer cavity wall 40. The outer cavity wall 40 of the expansion chamber 4 is used to transmit torque to the polishing plate 2 when the deflection increases, so that the polishing surface of the polishing plate 2 is deformed.

[0077] Specifically, since the polishing disk 2 and the support disk 1 are annular structures, in order to enable the outer wall 40 of the expansion chamber 4 to uniformly transmit torque to the second end of the polishing disk 2, an annular cylindrical workpiece is used in this embodiment. The annular cylindrical workpiece can be arranged between the support disk 1 and the polishing disk 2 in the circumferential direction. In other words, the annular cylindrical workpiece can be arranged on the outer ring side of the support disk 1 and the inner ring side of the polishing disk 2. The annular cylindrical workpiece includes an annular expansion chamber 4. Similarly, the expansion chamber 4 is also located between the support disk 1 and the polishing disk 2 in the circumferential direction. That is, the expansion chamber 4 is arranged around the support disk 1 between the second end of the polishing disk 2 and the support disk 1. Since the expansion chamber 4 is connected to a pressure control source, when the output load of the pressure control source increases, the pressure in the expansion chamber 4 increases, and the deflection of the outer wall 40 of the expansion chamber 4 increases, thereby uniformly transmitting torque to the circumference of the second end of the polishing disk 2, so that the polishing end surface can be uniformly deformed.

[0078] The polishing surface profile is controlled by controlling the output load of the pressure control source to change the deflection of the outer cavity wall 40, thereby causing the polishing end surface of the polishing disk 2 to deform, thereby changing the polishing surface profile. Under the same output load, the outer cavity wall 40 with different structural parameters produces different deflection changes, resulting in different changes in the polishing surface profile. Therefore, in this embodiment, to achieve precise control of the polishing surface profile, the pressure control source changes the output load according to the structural parameters of the outer cavity wall 40 to change the deflection of the outer cavity wall 40. In this embodiment, the structural parameters include the position of the outer cavity wall 40 with the maximum deflection, the axial length of the outer cavity wall 40, the bending stiffness of the outer cavity wall 40, the wall thickness of the outer cavity wall 40, the elastic modulus of the outer cavity wall 40, and the Poisson's ratio.

[0079] This embodiment achieves the goal of providing an annular outer cavity wall 40 by the annular expansion cavity 4, and the deflection of the outer cavity wall 40 can be controlled by controlling the output load. When the deflection of the outer cavity wall 40 increases, the torque can be evenly transmitted to the four sides of the polishing disk 2 to change the polishing surface shape, and the output load is adjusted according to the structural parameters of the outer cavity wall 40, and the deflection of the outer cavity wall 40 can be accurately controlled to accurately control the polishing surface shape of the polishing disk 2, thereby achieving the technical effect of reducing the difficulty of controlling the polishing surface shape and improving the accuracy of controlling the polishing surface shape, thereby solving the problem in the related technology that the structural control of adjusting the polishing surface shape is difficult and it is difficult to accurately adjust the polishing surface shape to the target polishing surface shape.

[0080] In a specific embodiment, both ends of the outer cavity wall 40 are simply supported structures, and the corresponding relationship between the deflection of the outer cavity wall 40 and the output load of the pressure control source is:

[0081] ;

[0082] in, is the deflection of the outer cavity wall 40, is the output load, is the axial position of each point on the outer cavity wall 40, is the axial length of the outer cavity wall 40, is the bending stiffness of the outer cavity wall 40, is the wall thickness of the outer cavity wall 40, , , E is the elastic modulus of the outer cavity wall 40, is the Poisson's ratio of the outer cavity wall 40.

[0083] During the polishing process, the output load of the pressure control source can be controlled based on the relationship between the deflection of the outer cavity wall 40 and the output load, so that the outer cavity wall 40 produces corresponding deflection, and then the polishing disk 2 produces corresponding deformation to meet the target polishing surface.

[0084] Because the polishing plate 2 and the support plate 1 are connected by the fulcrum member 3, the pressure exerted on the support plate 1 during the polishing process must be transmitted to the polishing plate 2 through the fulcrum member 3. Therefore, the fulcrum member 3 must have a certain degree of rigidity. Furthermore, because the polishing plate 2 will deform during the polishing surface adjustment process, the fulcrum member 3 connected to the polishing plate 2 will also deform to a certain extent. Therefore, the fulcrum member 3 must also have a certain degree of elasticity.

[0085] In one embodiment, Figure 5 As shown, the fulcrum member 3 includes a first connecting plate 30, a second connecting plate 32 and a fulcrum plate 31. The first connecting plate 30 and the second connecting plate 32 are respectively connected to the first ends of the support plate 1 and the polishing plate 2. The fulcrum plate 31 is connected between the first connecting plate 30 and the second connecting plate 32. When the outer cavity wall 40 is deformed by controlling the pressure in the expansion chamber 4, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 are elastically deformed under the action of the torque to change the angle between the first connecting plate 30 and the second connecting plate 32.

[0086] Specifically, in this embodiment, the fulcrum member 3 not only serves to connect the polishing disk 2 and the support disk 1, but also serves to use its own elastic force to pull the polishing disk 2 inward to deform during the contraction of the outer cavity wall 40 of the expansion cavity 4. The first connecting plate 30 at the upper end of the fulcrum member 3 is fixedly connected to the support disk 1. The first connecting plate 30 is a roughly plate-shaped structure with a relatively large contact area, thereby improving the connection stability between the fulcrum member 3 and the support disk 1. Similarly, the second connecting plate 32 at the lower end of the fulcrum member 3 is fixedly connected to the first end of the polishing disk 2. The second connecting plate 32 is a roughly plate-shaped structure that can also improve the connection stability between the fulcrum member 3 and the polishing disk 2. The first connecting plate 30 and the support disk 1 can be fixed by welding or bolting, and the second connecting plate 32 and the polishing disk 2 can be fixed by welding or bolting.

[0087] The middle part of the fulcrum member 3 is a fulcrum plate 31, and the upper and lower ends of the fulcrum plate 31 are fixedly connected to the first connecting plate 30 and the second connecting plate 32 respectively. In a more specific embodiment, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 can be an integrally formed structure, thereby having higher structural strength. When the pressure in the expansion chamber 4 increases, the outer cavity wall 40 of the expansion chamber 4 expands and applies a torque to the second end of the polishing disk 2 (that is, a torque is applied to the area on the polishing disk 2 above the fulcrum member 3). Under the action of this torque, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 produce elastic deformation to bend outward, and the polishing end surface of the polishing disk 2 (that is, the area on the polishing disk 2 below the fulcrum member 3) is deformed synchronously to change the polishing surface shape. When the pressure in the expansion chamber 4 decreases, the outer cavity wall 40 of the expansion chamber 4 contracts. At this time, the torque applied by the expansion chamber 4 to the second end of the polishing disk 2 decreases, and the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 rebound under the action of their own elastic force. The polishing end surface of the polishing disk 2 is deformed synchronously and the polishing surface shape is changed in the opposite direction.

[0088] In one embodiment, the fulcrum members 3 may be provided in a plurality and distributed along the circumference. To ensure uniform force on the support plate 1 and the polishing plate 2, the fulcrum members 3 are preferably provided in an annular shape, that is, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 are all annular.

[0089] In a preferred embodiment, Figure 5 As shown, the connection shape of the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 is an I-beam shape, thereby being able to provide a relatively stable supporting connection effect.

[0090] In order to facilitate elastic bending of the fulcrum plate 31 , in this embodiment, grooves 310 are provided on both the inner and outer sides of the fulcrum plate 31 , and the grooves 310 may be arc-shaped grooves.

[0091] Since in the present invention, the change of the polishing surface type is achieved by controlling the pressure change in the expansion chamber 4, when the pressure in the expansion chamber 4 increases, the polishing end face of the polishing disc 2 is deformed outward by the action of the outer cavity wall 40 of the expansion chamber 4. When the pressure in the expansion chamber 4 decreases, the polishing end face of the polishing disc 2 needs to be deformed inward by its own elastic force or the elastic force of the fulcrum member 3. In other words, in the present invention, the outer cavity wall 40 of the expansion chamber 4 cannot actively drive the polishing end face to deform inward. Therefore, in order to increase the adjustment range of the polishing surface type, in this embodiment, when the pressure in the expansion chamber 4 is normal pressure, the polishing surface type of the polishing end face is convex inside and concave outside. On the basis of this polishing surface type, when the pressure in the expansion chamber 4 increases, the polishing surface type can change from convex inside and concave outside to flat shape, and then from flat shape to concave inside and convex outside.

[0092] In one embodiment of the polishing platen, Figure 6 and Figure 7 As shown, the polishing platen further includes a first annular member 9 , which is disposed between the supporting plate 1 and the second end of the polishing plate 2 , and the expansion chamber 4 is located between the first annular member 9 and the supporting plate 1 .

[0093] Specifically, in this embodiment, the first annular member 9 can be sleeved and fixed on the outer ring side of the support plate 1. A gap is defined between the inner ring side of the first annular member 9 and the outer ring side of the support plate 1. This gap serves as the expansion chamber 4, and the vertical sidewalls of the first annular member 9 serve as the outer chamber wall 40. The upper end of the first annular member 9 is sealed to the upper end of the support plate 1, and the lower end of the first annular member 9 is sealed to the lower end of the support plate 1. A pressure regulating channel 5 is provided on the support plate 1. The pressure regulating channel 5 is connected to the expansion chamber 4. An external pressure control source controls the pressure within the expansion chamber 4 through the pressure regulating channel 5, thereby controlling the expansion and contraction of the outer chamber wall 40.

[0094] In order to facilitate the sealed connection between the first annular member 9 and the support plate 1, and to produce elastic deformation of the outer cavity wall 40 on the first annular member 9, the first annular member 9 in this embodiment includes a first sealing portion 93, a first thin-walled portion 95 and a second sealing portion 94 connected in sequence, and the expansion cavity 4 is arranged between the first thin-walled portion 95 and the support plate 1; the first sealing portion 93 and the second sealing portion 94 are used to seal the expansion cavity 4.

[0095] Specifically, in this embodiment, the first sealing portion 93 comprises the flat surface at the upper end of the first annular member 9, and the second sealing portion 94 comprises the flat surface at the lower end of the first annular member 9. The support plate 1 is provided with corresponding edge surfaces corresponding to the first and second sealing portions 93, 94. After installation, the first sealing portion 93 aligns with the upper edge surface of the support plate 1, and the second sealing portion 94 aligns with the lower edge surface of the support plate 1, thereby achieving a seal. To further enhance sealing performance, a sealing ring 13 may be provided between the first sealing portion 93 and the support plate 1, and similarly, between the second sealing portion 94 and the support plate 1.

[0096] In the present invention, since the deformation of the polishing disc 2 is driven by the expansion of the vertical side wall of the first annular member 9, the vertical side wall on the first annular member 9 corresponding to the expansion cavity 4 needs to be easy to expand and contract. To this end, the first annular member 9 in this embodiment also includes a first thin-walled portion 95 located between the first sealing portion 93 and the second sealing portion 94. The expansion cavity 4 is located between the first thin-walled portion 95 and the outer ring side of the support disc 1. The first thin-walled portion 95 serves as the outer cavity wall 40 of the expansion cavity 4. The wall of the first thin-walled portion 95 is thinner, making it easier to deform when the pressure in the expansion cavity 4 changes. The first sealing portion 93 and the second sealing portion 94 serve as sealing components and will not deform during the expansion and contraction of the expansion cavity 4. Therefore, their thickness can be set to be thicker to ensure sufficient sealing performance.

[0097] Since the first annular member 9 is sleeved on the supporting plate 1, in order to achieve sealing by using the first sealing portion 93 and the second sealing portion 94, in this embodiment, the upper end of the first annular member 9 is folded outward to form the first sealing portion 93, and the lower end of the first annular member 9 is folded inward to form the second sealing portion 94; the upper edge of the supporting plate 1 has an outwardly protruding edge 103, and the first sealing portion 93 is sealed with the lower end surface of the edge 103; the lower edge of the supporting plate 1 has a mounting groove 102, and the second sealing portion 94 is arranged in the mounting groove 102 and sealed with the upper end surface of the mounting groove 102.

[0098] Specifically, in this embodiment, the edge 103 at the upper portion of the support plate 1 corresponds to and closely mates with the first sealing portion 93 to form a seal. The second sealing portion 94 is located within the mounting groove 102 at the lower portion of the support plate 1. The upper surface of the second sealing portion 94 corresponds to and closely mates with the upper end surface of the mounting groove 102 to form a seal. A sealing ring 13 may be disposed between the first sealing portion 93 and the lower end surface of the edge 103 to improve sealing performance, and a sealing ring 13 may be disposed between the second sealing portion 94 and the upper end surface of the mounting groove 102 to improve sealing performance.

[0099] On the basis of the above implementation mode, Figure 7As shown, in order to support the first annular member 9 , a portion of the second sealing portion 94 is arranged on the fulcrum member 3 , specifically on the first connecting plate 30 of the fulcrum member 3 , and the second sealing portion 94 is pressed and fixed in the mounting groove 102 through the first connecting plate 30 .

[0100] In the above embodiment, the expansion chamber 4 is located between the first annular member 9 and the support plate 1, and the structure of the expansion chamber 4 is limited by the structure of the support plate 1. Therefore, in order to make the expansion chamber 4 more flexible, in another embodiment, as shown in FIG. Figure 4 and Figure 5 As shown, the polishing platen also includes a second annular member 8, which is located between the first annular member 9 and the support plate 1; the expansion chamber 4 is located between the inner ring side of the first annular member 9 and the outer ring side of the second annular member 8.

[0101] Specifically, in this embodiment, the expansion chamber 4 is located between the first annular member 9 and the second annular member 8. The structural form of the expansion chamber 4 is only limited by the structure of the first annular member 9 and the second annular member 8. The first annular member 9 and the second annular member 8 are replaceable parts. The structure of the expansion chamber 4 can be adjusted by replacing different first annular members 9 or second annular members 8, making the setting of the expansion chamber 4 more flexible.

[0102] In this embodiment, the first annular member 9 and the second annular member 8 are connected in an outer-inner sleeve arrangement, with a gap defined between the vertical sidewalls of the first annular member 9 and the second annular member 8, which serves as the expansion chamber 4. Therefore, the vertical sidewalls of the first annular member 9 also serve as the outer chamber walls 40 of the expansion chamber 4. During the process of applying pressure to the expansion chamber 4, the second annular member 8 abuts against the support plate 1, and the vertical sidewalls of the first annular member 9, serving as the outer chamber walls 40, expand and apply torque to the second end of the polishing plate 2.

[0103] Similarly, in this embodiment, the expansion chamber 4 needs to be a sealed cavity. When the expansion chamber 4 is formed by the first annular member 9 and the second annular member 8, the first annular member 9 and the second annular member 8 should be sealed in the area outside the gap. Specifically, in this embodiment, a groove can be provided on the vertical sidewall of the first annular member 9 or the second annular member 8, and the areas outside the groove can be fitted together, thereby forming the expansion chamber 4 using the gap created by the groove. The other areas are tightly fitted to form a seal.

[0104] To achieve pressure control in the expansion chamber 4, in this embodiment, a pressure regulating channel 5 is provided on the second annular member 8. This channel connects the expansion chamber 4 and the pressure control source. Alternatively, the pressure regulating channel 5 can be provided on both the second annular member 8 and the support plate 1, with the two channels communicating, with the pressure regulating channel 5 on the second annular member 8 directly connected to the expansion chamber 4 and the pressure regulating channel 5 on the support plate 1 directly connected to the pressure control source. To avoid additional processing of the support plate 1, in this embodiment, the pressure regulating channel 5 is preferably provided only on the second annular member 8.

[0105] Similarly, in order to achieve the sealing of the upper and lower ends of the expansion chamber 4, as shown in FIG. Figure 6 As shown, in this embodiment, the first annular member 9 includes a third sealing portion 90, a second thin-walled portion 92 and a fourth sealing portion 91 connected in sequence, and the expansion cavity 4 is arranged between the second thin-walled portion 92 and the second annular member; the third sealing portion 90 and the fourth sealing portion 91 are used to seal the expansion cavity 4.

[0106] Specifically, in this embodiment, the third sealing portion 90 comprises the flat surface at the upper end of the first annular member 9, and the fourth sealing portion 91 comprises the flat surface at the lower end of the first annular member 9. The third sealing portion 90 is in close contact with the upper end of the second annular member 8, and the second sealing portion 94 is in close contact with the lower end of the second annular member 8, thereby achieving a seal. To further improve sealing performance, a sealing ring 13 may be disposed between the third sealing portion 90 and the upper end of the second annular member 8. Similarly, a sealing ring 13 may also be disposed between the fourth sealing portion 91 and the lower end of the second annular member 8.

[0107] In the present invention, since the deformation of the polishing disc 2 is driven by the expansion deformation of the first annular member 9, the vertical side wall on the first annular member 9 corresponding to the expansion cavity 4 needs to be easy to expand and contract. To this end, the first annular member 9 in this embodiment also includes a second thin-walled portion 92 located between the third sealing portion 90 and the fourth sealing portion 91. The second thin-walled portion 92 fits the inner ring side of the first annular member 9. The expansion cavity 4 is located between the second thin-walled portion 92 and the outer ring side of the second annular member 8. The first thin-walled portion 95 serves as the outer cavity wall 40 of the expansion cavity 4. The wall of the first thin-walled portion 95 is thinner, making it easier to deform when the pressure in the expansion cavity 4 changes. The third sealing portion 90 and the fourth sealing portion 91 serve as sealing components and will not deform during the expansion and contraction of the expansion cavity 4. Therefore, their thickness can be set to be thicker to ensure sufficient sealing performance.

[0108] In addition, since the wall of the second thin-walled portion 92 is relatively thin, in order to allow a gap to be provided between the second thin-walled portion 92 and the second annular member 8 to serve as the expansion chamber 4, in this embodiment, a groove corresponding to the second thin-walled portion 92 is preferably formed on the outer ring side of the second annular member 8, thereby forming a gap between the groove and the second thin-walled portion 92.

[0109] In the present invention, the first annular member 9 and the second annular member 8 are connected in a sleeve connection relationship. When installing, the first annular member 9 can be sleeved on the outside of the second annular member 8. On this basis, in order to achieve sealing by using the third sealing portion 90 and the fourth sealing portion 91, as shown in FIG. Figure 5 As shown, in this embodiment, the upper end of the first annular member 9 is folded outward to form a third sealing portion 90, and the lower end of the first annular member 9 is folded inward to form a fourth sealing portion 91. The outer ring side of the second annular member 8 has a protruding fifth sealing portion 81, and the third sealing portion 90 and the fifth sealing portion 81 are in contact and sealed connection. The outer ring side of the support plate 1 has a first connecting protrusion 100, and the fourth sealing portion 91 is provided on the first connecting protrusion 100. The fourth sealing portion 91 is in contact and sealed connection with the lower end surface of the second annular member 8.

[0110] Specifically, in this embodiment, the fifth sealing portion 81 corresponds to and fits tightly with the third sealing portion 90 to form a seal, and a sealing ring 13 can be provided between the fifth sealing portion 81 and the third sealing portion 90 to enhance the sealing performance. The lower end surface of the second annular member 8 corresponds to and fits tightly with the fourth sealing portion 91 to form a seal, and a sealing ring 13 can be provided between the lower end surface of the second annular member 8 and the fourth sealing portion 91 to enhance the sealing performance. At the same time, the lower surface of the fourth sealing portion 91 corresponds to and fits tightly with the first connecting protrusion 100, which serves as the support base of the first annular member 9.

[0111] Since the polishing disc 2 is located outside the first annular member 9, after the upper end of the first annular member 9 is folded outward to form the third sealing portion 90, in order to make the second thin-walled portion 92 on the first annular member 9 fit with the polishing disc 2, Figure 6 As shown, in this embodiment, a second connecting protrusion 200 is provided on the inner ring side of the polishing disc 2. The second connecting protrusion 200 protrudes toward the second thin-walled portion 92 and fits in contact with the second thin-walled portion 92. To increase the force-bearing area, the vertical dimension of the second connecting protrusion 200 is close to that of the second thin-walled portion 92.

[0112] In order to avoid interference during the deformation of the polishing disk 2, in this embodiment, there is a distance between the upper end surface of the second connecting protrusion 200 and the lower end surface of the third sealing part 90, and between the lower end surface of the second connecting protrusion 200 and the upper end surface of the first connecting protrusion 100, and the distance provides movement space for the second connecting protrusion 200.

[0113] In other words, in this embodiment, during the deformation of the polishing disk 2, the second connecting protrusion 200 will produce a certain angle of deflection. During the deflection of the second connecting protrusion 200, the upper end of the second connecting protrusion 200 does not contact the third sealing portion 90, and the lower end of the second connecting protrusion 200 does not contact the first connecting protrusion 100, thereby avoiding interference with the deflection of the second connecting protrusion 200, and further causing interference with the deformation of the polishing disk 2.

[0114] In order to facilitate the installation of the fulcrum member 3, a third connecting protrusion 201 is provided on the inner ring side of the polishing plate 2 in this embodiment. The third connecting protrusion 201 is located below the first connecting protrusion 100.

[0115] The upper end of the fulcrum member 3 is connected to the lower end surface of the first connecting protrusion 100 , and the lower end of the fulcrum member 3 is connected to the third connecting protrusion 201 .

[0116] Specifically, in this embodiment, the first connecting protrusion 100 corresponds to the third connecting protrusion 201, and the fulcrum member 3 is installed between the first connecting protrusion 100 and the third connecting protrusion 201. Specifically, the first connecting plate 30 of the fulcrum member 3 is fixedly connected to the first connecting protrusion 100, and the second connecting plate 32 of the fulcrum member 3 is fixedly connected to the second connecting protrusion 200. It will be understood that the structure of the third connecting protrusion 201 should also ensure that it does not interfere with the support plate 1 during the deformation process of the polishing plate 2.

[0117] like Figure 5 As shown, in order to facilitate the positioning of the first ring member 9, in this embodiment, a first limiting portion 80 is provided on the outer ring side of the support plate 1, and a second limiting portion 101 is provided on the inner ring side of the second ring member 8. The second limiting portion 101 is installed on the first limiting portion 80 so that the first limiting portion 80 limits the vertical direction of the second limiting portion 101.

[0118] Specifically, the second ring member 8 is sleeved on the support plate 1, and the first limiting portion 80 and the second limiting portion 101 are mutually opposed to each other to achieve vertical limitation of the second ring member 8. In one embodiment, the first limiting portion 80 includes a limiting groove 310, and the second limiting portion 101 includes a limiting protrusion, which overlaps the limiting groove 310. In this embodiment, the limiting groove 310 is an annular groove formed on the upper edge of the support plate 1, and the limiting protrusion is an annular protrusion formed on the inner ring side of the second ring member 8. When the second ring member 8 is sleeved on the support plate 1, the limiting protrusion is installed in the limiting groove 310, thereby limiting the vertical position of the second ring member 8.

[0119] To prevent the polishing disc 2 from falling off vertically, Figure 5As shown, the polishing platen in this embodiment further includes an anti-falling plate 6, which is connected to the polishing plate 2 via a connecting piece and vertically limits the polishing plate 2 via the connecting piece.

[0120] Specifically, in this embodiment, the anti-falling plate 6 is arranged on the upper end of the polishing plate 2, and the connecting piece can be a connecting bolt. After the anti-falling plate 6 is connected to the polishing plate 2 through the connecting piece, it can be deformed along with the polishing plate 2.

[0121] like Figure 5 As shown, when the polishing platen includes a first annular member 9 and a second annular member 8, in order to avoid interference with the deformation of the polishing plate 2, a receiving groove 60 is provided at the lower end of the anti-falling plate 6, and the upper part of the first annular member 9 is located in the receiving groove 60, and there is a gap between the upper part of the first annular member 9 and the receiving groove 60 in the horizontal and vertical directions, so that the anti-falling plate 6 does not interfere with the first annular member 9 when the polishing plate 2 is deformed.

[0122] According to another aspect of the present invention, there is provided a semiconductor polishing device comprising the above-mentioned polishing platen.

[0123] According to another aspect of the present invention, Figure 8 As shown, a method for controlling the polishing surface type of a polishing platen is provided. In this embodiment, the polishing surface type refers to the shape presented by the polishing end surface of the polishing plate 2. In the actual polishing process, the polishing surface type includes a polishing end surface that is a horizontal plane, a polishing end surface that is a concave curved surface, and a polishing end surface that is a convex curved surface. Among them, the polishing end surface that is a concave curved surface and the polishing end surface that is a convex curved surface belong to special polishing surface types. According to different polishing processes, the degree of concavity and convexity of the polishing end surface are different, so that there are still multiple polishing surface types on the basis of concavity and convexity. In addition, it should be noted that the polishing end surface that is a concave curved surface means that the middle part of the polishing end surface is concave inward, and the other parts are at a certain inclination angle with the horizontal plane. The polishing end surface that is a convex curved surface means that the middle part of the polishing end surface is convex outward, and the other parts are at a certain inclination angle with the horizontal plane.

[0124] The polishing surface profile adjustment process of the polishing platen can be summarized as adjusting the pressure within the expansion chamber 4 to cause the outer wall 40 of the expansion chamber 4 to expand and deform to varying degrees. During this expansion and deformation process, the outer wall 40 transmits torque through the polishing plate 2, thereby deforming the polishing end surface of the polishing plate 2 to change the polishing surface profile.

[0125] Specifically, to achieve precise control of the polishing surface shape, the polishing surface shape control method in this embodiment includes the following steps:

[0126] S10, obtaining a mapping relationship between the output load and the polishing surface type, wherein the mapping relationship is determined based on a corresponding relationship between the output load and the deflection of the outer cavity wall 40, and a corresponding relationship between the deflection of the outer cavity wall 40 and the polishing surface type;

[0127] From the perspective of the force transmission path, the output load of the pressure control source first acts within the expansion chamber 4 and directly on the outer wall 40 of the expansion chamber 4, causing the outer wall 40 to deflect. The magnitude of the output load determines the deflection of the outer wall 40. During the deflection of the outer wall 40, the outer wall 40 can transmit torque to the polishing plate 2, causing deformation of the polishing end surface and thus changing the polishing surface profile.

[0128] Therefore, it is first necessary to determine the corresponding relationship between the output load of the pressure control source and the deflection of the outer cavity wall 40. In one embodiment, the corresponding relationship between the output load and the deflection of the outer cavity wall 40 can be obtained by structural analysis and calculation of the polishing platen, which will not be described in detail here. In another embodiment, the corresponding relationship can be obtained through software simulation analysis.

[0129] As can be seen from the above, the deflection of the outer cavity wall 40 directly determines the degree of deformation of the polishing plate 2, that is, directly determines the polishing surface profile. Therefore, it is also necessary to determine the corresponding relationship between the deflection of the outer cavity wall 40 and the polishing surface profile of the polishing end face. In this embodiment, this corresponding relationship can also be obtained through structural analysis and calculation of the polishing platen, or through software simulation analysis.

[0130] Since the polishing surface profile is primarily altered by controlling the output load of the pressure control source, it is necessary to determine the relationship between the output load and the polishing surface profile. In this embodiment, once the corresponding relationship between the output load and the deflection of the outer cavity wall 40, and the corresponding relationship between the deflection of the outer cavity wall 40 and the polishing surface profile, is determined, a mapping relationship between the output load and the polishing surface profile can be logically derived. This mapping relationship can be used to represent the relationship between the output load of the pressure control source and the polishing surface profile of the polished end face.

[0131] S20 , adjusting the output load of the pressure control source according to the mapping relationship, changing the deflection of the outer cavity wall 40 , and further changing the inclination angle of the polishing end face to meet the target polishing surface shape.

[0132] Specifically, before adjusting the polishing surface type, it is necessary to determine the target polishing surface type. The target polishing surface type can be a manually set polishing surface type, or it can be the polishing surface type that the polishing platen needs to achieve during the polishing process according to preset conditions and rules. In terms of structural parameters, the inclination angle of the polishing end face can be used to represent the corresponding polishing surface type. Therefore, when determining the target polishing surface type, the inclination angle of the polishing end face under the target polishing surface type can be determined. According to the mapping relationship between the output load and the polishing surface type, the target output load can be determined after determining the target polishing surface type. At this time, the output load of the pressure control source can be adjusted to the target output load, so that the polishing end face is deformed to conform to the target polishing surface type, completing the adjustment of the polishing surface type.

[0133] In one embodiment, the expansion chamber 4 is connected to the pressure control source through a specific channel. The channel can be set on the support plate 1 or on the part forming the expansion chamber 4. The pressure control source can be a pneumatic control source or a hydraulic control source.

[0134] In one embodiment, the polishing surface control method of the present invention is applied to the polishing platen of the above embodiment. According to the structural description of the polishing platen, the expansion cavity 4 is essentially as follows: Figure 9 The annular cylindrical space shown, therefore, this embodiment provides a corresponding relationship between the output load of the pressure control source and the deflection of the outer cavity wall 40:

[0135] ;

[0136] in, is the deflection of the outer cavity wall, is the load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the bending stiffness of the outer cavity wall, is the wall thickness of the outer cavity wall, , , E is the elastic modulus of the outer cavity wall, is Poisson's ratio.

[0137] In one embodiment, the correspondence between the outer cavity wall deflection and the polishing surface shape is determined as follows:

[0138] like Figure 10 and Figure 11As shown, finite element simulation analysis is performed on the polishing platen to determine the corresponding relationship between the deflection of the outer cavity wall 40 at the point of maximum deflection and the polishing surface profile of the polishing platen 2. Due to the complex structure and connection relationships of the polishing platen 2, finite element simulation analysis can be used to obtain this relationship. Specifically, a simulation model of the polishing platen can be established. By controlling the deflection of the outer cavity wall 40 in the simulation software, the polishing end surface of the polishing platen 2 produces different inclination angles. After multiple simulations, the deflection change values ​​are correlated with the inclination angle values, ultimately obtaining a corresponding relationship between the deflection and the polishing surface profile.

[0139] In one embodiment, the polishing surface profile control method further includes:

[0140] Obtaining the current output load of the pressure control source;

[0141] The polishing surface type of the current polishing end face is determined according to the mapping relationship.

[0142] Specifically, in this embodiment, the output load can be obtained by a corresponding pressure sensor, which can be arranged at the output end of the pressure control source or within the expansion chamber 4. Since the mapping relationship between the output load and the inclination angle can be obtained according to the above embodiment, after obtaining the output load of the pressure control source, the inclination angle can be determined based on this mapping relationship, and then the polishing surface type can be determined. In actual control, based on the mapping relationship, the output load that the pressure control source should output can be obtained according to the target polishing surface type. At the same time, the output load currently output by the pressure control source can be obtained according to the current polishing surface type. The output load is increased or decreased according to the difference between the two, thereby obtaining the target polishing surface type.

[0143] The foregoing description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that various modifications and variations of the present invention are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. An annular cylindrical workpiece, characterized in that: include: An annular expansion chamber, one end of which is used to connect to a pressure control source, which changes the output load according to the axial length of the outer cavity wall of the expansion chamber, the bending stiffness of the outer cavity wall, the wall thickness of the outer cavity wall, the elastic modulus of the outer cavity wall and the Poisson's ratio to change the deflection of the outer cavity wall. The outer cavity wall of the expansion chamber is used to transmit torque to the polishing disk when the deflection increases, so that the polishing surface of the polishing disk is deformed.

2. The annular cylindrical workpiece according to claim 1, characterized in that: The two ends of the outer cavity wall are simply supported structures. The corresponding relationship between the deflection of the outer cavity wall and the output load of the pressure control source is: ； in, is the deflection of the outer cavity wall, is the output load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the bending stiffness of the outer cavity wall, is the wall thickness of the outer cavity wall, , , E is the elastic modulus of the outer cavity wall, is the Poisson's ratio of the outer cavity wall.

3. A polishing surface control method, characterized in that: The method of controlling the polishing surface of the polishing disc by using the annular cylindrical workpiece according to claim 1 or 2 comprises: Obtaining a mapping relationship between the output load and the polishing surface type, wherein the mapping relationship is determined based on a corresponding relationship between the output load and the deflection of the outer cavity wall and a corresponding relationship between the deflection of the outer cavity wall and the polishing surface type; According to the mapping relationship, the output load of the pressure control source is adjusted to change the deflection of the outer cavity wall, thereby changing the polishing surface shape to meet the target polishing surface shape.

4. The polishing surface profile control method according to claim 3, characterized in that: The correspondence between the outer cavity wall deflection and the polishing surface shape is determined in the following manner: Finite element simulation analysis is performed on the polishing plate to determine the corresponding relationship between the outer cavity wall deflection and the polishing surface shape.

5. The polishing surface profile control method according to claim 3, characterized in that: The polishing surface type control method further comprises: Obtaining the current output load of the pressure control source; The current polishing surface type is determined according to the mapping relationship.

6. A polishing platen, wherein the polishing surface profile control method according to any one of claims 3 to 5 is used for polishing surface profile control, the polishing platen comprising: Support plates, polishing plates and fulcrum parts; The two ends of the fulcrum member are respectively connected to the support plate and the first end of the polishing plate; an expansion cavity is provided between the support plate and the second end of the polishing plate away from the polishing end surface, and the fulcrum member is located between the polishing end surface and the second end of the polishing plate; By controlling the pressure in the expansion chamber, the outer chamber wall is deformed, the outer chamber wall transmits torque through the second end of the polishing disc, and the second end of the polishing disc transmits torque to the polishing end face of the polishing disc through the fulcrum member. Under the action of the torque, the polishing surface of the polishing disc is deformed.

7. The polishing platen according to claim 6, characterized in that: The fulcrum member includes a first connecting plate, a second connecting plate and a fulcrum plate, wherein the first connecting plate and the second connecting plate are respectively connected to the first ends of the supporting plate and the polishing plate, and the fulcrum plate is connected between the first connecting plate and the second connecting plate; When the outer cavity wall is deformed by controlling the pressure in the expansion cavity, the first connecting plate, the second connecting plate and the fulcrum plate are elastically deformed under the action of the torque to change the angle between the first connecting plate and the second connecting plate.

8. The polishing platen according to claim 6, characterized in that: The polishing surface of the polishing disc is convex inside and concave outside when it is not deformed.

9. The polishing platen according to claim 6, characterized in that: The polishing platen further comprises a first annular member, which is disposed between the supporting plate and the second end of the polishing plate, and the expansion chamber is located between the first annular member and the supporting plate.

10. The polishing platen according to claim 9, characterized in that: The first annular member includes a first sealing portion, a first thin-walled portion, and a second sealing portion connected in sequence, and the expansion chamber is provided between the first thin-walled portion and the support disk; The first sealing portion and the second sealing portion are used to seal the expansion cavity.

11. The polishing platen according to claim 9, characterized in that: The polishing platen further comprises a second annular member, the second annular member being located between the first annular member and the supporting plate; The expansion chamber is located between the inner ring side of the first annular member and the outer ring side of the second annular member.

12. The polishing platen according to claim 11, characterized in that: The first annular member includes a third sealing portion, a second thin-walled portion, and a fourth sealing portion connected in sequence, and the expansion chamber is provided between the second thin-walled portion and the second annular member; The third sealing portion and the fourth sealing portion are used to seal the expansion cavity.

13. The polishing platen according to claim 12, characterized in that: The outer ring side of the second annular member has a protruding fifth sealing portion, and the third sealing portion and the fifth sealing portion are in contact with each other and are sealed; The outer ring side of the support disk has a first connecting protrusion, the fourth sealing portion is provided on the first connecting protrusion, and the fourth sealing portion is in contact with and sealed against the lower end surface of the second annular member.

14. The polishing platen according to claim 13, characterized in that: The inner ring side of the polishing disc is provided with a second connecting protrusion protruding toward the first annular member, and the second connecting protrusion is in contact with the second thin-walled portion.

15. The polishing platen according to claim 14, characterized in that: There is a distance between the upper end surface of the second connecting protrusion and the lower end surface of the third sealing portion, and between the lower end surface of the second connecting protrusion and the upper end surface of the first connecting protrusion, and the distance provides movement space for the second connecting protrusion.

16. A polishing device, characterized in that: Comprising a polishing platen as described in any one of claims 6 to 15.

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