Device and method for calibrating performance of pulse field probe

Abstract

The invention relates to the field of probe performance calibration, in particular to a device and a method for calibrating the performance of a pulse field probe, and aims to solve the problem that the calibration result of the pulse field probe is influenced due to the instability of the pulse field intensity amplitude in the calibration process. The device comprises a pulse source, a metal floor and a single cone, a to-be-calibrated probe is placed at a first preset position of a time-domain electromagnetic pulse radiation field formed between the metal floor and the single cone, the to-be-calibrated probe is connected with a voltage monitoring device, and a reference probe is further placed at a second preset position in the time-domain electromagnetic pulse radiation field. And the reference probe is connected with the voltage monitoring device. According to the invention, errors caused by unstable output of the pulse source can be significantly reduced, the precision and reliability in the calibration process are improved, and the calibration process is simplified.

Description

Technical Field

[0001] The invention relates to the field of probe performance calibration, and in particular to a device and method for calibrating pulse field probe performance. Background Art

[0002] The pulse field probe is used to test the time domain electromagnetic pulse field signal. In order to ensure the accuracy and reliability of the test results, the performance of the pulse field probe needs to be calibrated. The existing calibration device uses a single cone plus metal floor structure device, which is a deformed coaxial transmission line structure. The calibration system is mainly composed of an electromagnetic pulse source, a metal floor, a single cone structure, etc., where the single cone structure and the floor are both made of metal. When the system is working, the electromagnetic pulse source emits a pulse signal through the input port and injects it into the single cone structure, generating a time domain electromagnetic pulse radiation field between the single cone structure and the metal floor, and placing the electromagnetic pulse field probe at a point in the radiation field to achieve time domain calibration of the pulse field probe.

[0003] During the pulse field probe calibration process, the time domain electromagnetic pulse signal generated by the electromagnetic pulse source enters the single cone structure through the feeding port of the single cone structure, and then generates an electromagnetic pulse field signal between the single cone structure and the metal floor. The output of the electromagnetic pulse source depends on the discharge process of the internal devices of the equipment. The difference in each discharge process will lead to the instability of the pulse source output amplitude, which will lead to the instability of the pulse field strength amplitude during the calibration process, thus affecting the calibration results of the pulse field probe.

[0004] Therefore, it is necessary to provide a device and method for calibrating the performance of a pulsed field probe. Summary of the invention

[0005] The present specification provides a device and method for calibrating the performance of a pulse field probe, which is used to solve the problem that the pulse field intensity amplitude is unstable during the calibration process, thereby affecting the calibration result of the pulse field probe.

[0006] In a first aspect, the present invention proposes a device for calibrating the performance of a pulse field probe, comprising a pulse source, a metal floor and a single cone. The probe to be calibrated is placed at a first preset position in a time domain electromagnetic pulse radiation field formed between the metal floor and the single cone. The probe to be calibrated is connected to a voltage monitoring device. A reference probe is also placed at a second preset position in the time domain electromagnetic pulse radiation field. The reference probe is connected to the voltage monitoring device.

[0007] Furthermore, the second preset position is obtained by:

[0008] The projection position of the probe to be calibrated at the first preset position in the time domain electromagnetic pulse radiation field projected onto the metal floor is obtained, the central axis of the single cone is used as the symmetry axis, the projection position is symmetrically set, and the symmetrical position is used as the second preset position.

[0009] Furthermore, the voltage monitoring device is provided with two signal receiving channels, one of which is connected to the probe to be calibrated, and the other is connected to the reference probe.

[0010] Furthermore, the reference probe is a passive structure reference probe with known parameters, and the known parameters include an amplitude conversion coefficient.

[0011] Furthermore, the first preset position is a field point position of the time domain electromagnetic pulse radiation field.

[0012] Furthermore, the material of the single cone is metal material.

[0013] Furthermore, the voltage monitoring device is an oscilloscope.

[0014] A second aspect of the present invention provides a method for calibrating the performance of a pulsed field probe, based on an apparatus for calibrating the performance of a pulsed field probe, the method comprising:

[0015] A device for calibrating the performance of a pulse field probe is constructed, the probe to be calibrated is placed at a first preset position, and the reference probe is placed at a second preset position;

[0016] Feeding a pulse signal into the single cone based on a pulse source;

[0017] The field signal is received by the probe to be calibrated and input into a receiving channel of the voltage monitoring device to obtain the monitoring voltage U;

[0018] The field signal is received by the reference probe and input into another receiving channel of the voltage monitoring device to obtain the monitoring voltage U1;

[0019] The amplitude conversion coefficient of the probe to be calibrated is calculated based on the monitoring voltage U and the monitoring voltage U1 and the preset amplitude conversion coefficient of the reference probe.

[0020] Furthermore, the amplitude conversion coefficient k of the probe to be calibrated is calculated as follows:

[0021]

[0022] Among them, the amplitude conversion coefficient of the reference probe is k1.

[0023] Further, the probe to be calibrated is calibrated based on the amplitude conversion coefficient of the probe to be calibrated.

[0024] At least one of the above technical solutions adopted in the embodiments of this specification can achieve the following beneficial effects:

[0025] By introducing a reference probe with known characteristics and selecting the position of the reference probe using the axisymmetric characteristics of the single cone structure, the present invention can significantly reduce the error caused by the unstable output of the pulse source. This not only improves the accuracy and reliability of the calibration process, but also simplifies the calibration process because the calibration results can now be adjusted using the simultaneous measurement data of the two probes. In addition, this method can ensure that even if the pulse source discharge process is different each time, a relatively stable calibration result can be obtained, thereby enhancing the robustness of the calibration system. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:

[0027] Figure 1 The figure is a schematic diagram of the structure of a device for calibrating the performance of a pulse field probe according to the present invention. DETAILED DESCRIPTION

[0028] In order to make the purpose, technical solution and advantages of the present application clearer, the technical solution of the present application will be clearly and completely described below in combination with the specific embodiments of the present application and the corresponding drawings. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present application.

[0029] The technical solutions provided by various embodiments of the present application are described in detail below in conjunction with the accompanying drawings.

[0030] Figure 1 A structural schematic diagram of a device for calibrating the performance of a pulse field probe provided in an embodiment of the present specification, the device includes a pulse source 1, a metal floor 2 and a single cone 3, a probe 4 to be calibrated is placed at a first preset position in a time domain electromagnetic pulse radiation field formed between the metal floor 2 and the single cone 3, the probe 4 to be calibrated is connected to a voltage monitoring device 5, a reference probe 6 is also placed at a second preset position in the time domain electromagnetic pulse radiation field, and the reference probe 6 is connected to the voltage monitoring device 5.

[0031] The first preset position is the field point position of the time domain electromagnetic pulse radiation field, which should be selected according to specific test requirements. The second preset position is obtained by:

[0032] Obtain the projection position of the probe 4 to be calibrated at the first preset position in the time domain electromagnetic pulse radiation field projected onto the metal floor 2, take the central axis of the single cone 3 as the symmetry axis, set the projection position symmetrically, and use the symmetrical position as the second preset position, so as to ensure that the electromagnetic environment of the two probes is as consistent as possible and reduce the error caused by position difference.

[0033] In the present invention, pulse source 1: select a pulse source suitable for generating the required time-domain electromagnetic pulse signal, and ensure that it can stably emit pulses with sufficient intensity and appropriate waveform.

[0034] Metal floor 2 and single cone 3: Construct a deformed coaxial transmission line structure, in which the single cone is made of metal, and together with the metal floor, forms an open radiation environment. Ensure that the distance between the single cone 3 and the metal floor 2 and the angle of the single cone 3 meet the experimental requirements to generate the required electromagnetic pulse field.

[0035] Voltage monitoring device 5: Use a high-precision, wide-bandwidth oscilloscope or other suitable voltage monitoring equipment to accurately record the electrical signals from the probe to be calibrated 4 and the reference probe 6.

[0036] In order to ensure that the output signals of the probe to be calibrated 4 and the reference probe 6 can be accurately collected and compared at the same time, two independent signal receiving channels are set on the voltage monitoring device 5, one of which is connected to the probe to be calibrated 4, and the other is connected to the reference probe 6. According to the expected pulse signal characteristics such as amplitude, frequency, etc., the input impedance, sensitivity and vertical scale of each channel are appropriately adjusted to adapt to the output levels of different probes to ensure that the signal is displayed on the screen without distortion.

[0037] The reference probe 6 is a passive structure reference probe with known parameters, and the known parameters include an amplitude conversion coefficient.

[0038] In a second aspect of the present invention, a method for calibrating the performance of a pulsed field probe is provided. Based on a device for calibrating the performance of a pulsed field probe, the method comprises:

[0039] A device for calibrating the performance of a pulse field probe is constructed, wherein the probe to be calibrated 4 is placed at a first preset position, and the reference probe 6 is placed at a second preset position;

[0040] Feeding a pulse signal into the single cone 3 based on the pulse source 1;

[0041] The field signal is received by the probe 4 to be calibrated and input into a receiving channel of the voltage monitoring device 5 to obtain the monitoring voltage U;

[0042] The reference probe 6 is used to receive the field signal, and the signal is input into another receiving channel of the voltage monitoring device 5 to obtain the monitoring voltage U1;

[0043] The amplitude conversion coefficient of the probe to be calibrated 4 is calculated based on the monitoring voltage U and the monitoring voltage U1 and the preset amplitude conversion coefficient of the reference probe 6 .

[0044] In the present invention, the amplitude conversion coefficient k of the probe 4 to be calibrated is calculated as follows:

[0045]

[0046] The amplitude conversion coefficient of the reference probe 6 is k1.

[0047] The principle of this method is as follows:

[0048] According to the characteristics of the single cone calibration device, the field strength calculation formula 1 is as follows:

[0049] Formula 1:

[0050] Where: E is the electric field strength in the pulse field area within the single cone structure, V / m; U0 is the voltage value between the single cone and the metal floor, V; θ0 is the semi-cone angle of the single cone structure, °; r is the distance between the pulse field point and the feeding point of the single cone structure, m; θ is the angle of the line between the pulse field point and the feeding point of the single cone structure deviating from the central axis of the single cone, °.

[0051] The calibration parameters of the pulse field probe are mainly the amplitude conversion coefficient, which is calculated as follows:

[0052] Formula 2:

[0053] Where: k is the amplitude conversion coefficient of the pulse field probe, m -1 ; E is the electric field strength in the pulse field area within the single cone structure, V / m; U is the voltage value received by the pulse field probe, V.

[0054] When performing the calibration operation of the probe 4 to be calibrated, Figure 1As shown, the probe 4 to be calibrated is placed at the field point (r, θ), and the reference probe is placed at the field point (r1, θ1), where θ1 = 90°. The reference probe 6 is placed at the ground projection point of the field point of the probe 4 to be calibrated, based on the axisymmetric position of the central axis of the single cone 3, that is, r1sinθ1 = d = rsinθ. According to formula 1, the field intensity amplitudes of the calibrated pulse field probe field point and the reference probe field point are the same. The pulse source 1 generates a pulse signal and feeds it into the single cone 3, generating a pulse field between the single cone 3 and the metal floor 2. After receiving the field signal, the probe 4 to be calibrated enters one channel of the oscilloscope, and the monitoring voltage is measured as U. After receiving the field signal, the reference probe 6 enters another channel of the oscilloscope, and the monitoring voltage is measured as U1. The amplitude conversion coefficient of the reference probe 6 is set to k1. According to formula 2, the pulse field intensity amplitude at the position of the reference probe 6 is E = k1U1, that is, the pulse field intensity amplitude of the field point of the probe 4 to be calibrated is also E. According to formula 3: The amplitude conversion coefficient k of the probe 4 to be calibrated is obtained by calculation, and the probe 4 to be calibrated is calibrated based on the amplitude conversion coefficient of the probe 4 to be calibrated.

[0055] The calibration method of the present invention requires testing the calibrated probe and the reference probe at the same time, which is different from the existing method in which only the calibrated probe is tested;

[0056] The calibration method of the present invention utilizes the amplitude conversion coefficient of the reference probe and the received voltage signal, combined with the voltage signal received by the calibrated probe, to directly calculate the amplitude conversion coefficient of the calibrated probe, without the need to utilize the feed voltage amplitude as in the prior art method, thereby reducing the error introduced by the instability of the pulse source.

[0057] When calibrating the performance of the pulse field probe, the present invention adopts the reference probe method. According to the amplitude conversion coefficient calculation formula, after respectively obtaining the received voltage of the calibrated probe and the received voltage of the reference probe, the amplitude conversion coefficient of the calibrated probe can be directly calculated using the amplitude conversion coefficient of the reference probe. There is no need to consider the voltage value fed into the single cone 3 by the pulse source, and the error introduced by the instability of the output amplitude of the pulse source can be reduced.

[0058] In practical applications, the present invention can calibrate the performance of a pulse field probe used to measure time-domain electromagnetic pulse field signals, thereby achieving the purpose of accurately evaluating the performance of the field probe, thereby providing sufficient metrological guarantee for accurate measurement of the time-domain electromagnetic pulse field.

[0059] The above is only an embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the scope of the claims of the present application.

Claims

1. A device for calibrating the performance of a pulse field probe, comprising a pulse source (1), a metal floor (2) and a single cone (3), wherein a probe (4) to be calibrated is placed at a first preset position of a time domain electromagnetic pulse radiation field formed between the metal floor (2) and the single cone (3), and the probe (4) to be calibrated is connected to a voltage monitoring device (5), characterized in that: A reference probe (6) is also placed at a second preset position in the time-domain electromagnetic pulse radiation field, and the reference probe (6) is connected to the voltage monitoring device (5).

2. A device for calibrating pulse field probe performance according to claim 1, characterized in that: The second preset position is obtained by: The projection position of the probe (4) to be calibrated projected onto the metal floor (2) at a first preset position in the time-domain electromagnetic pulse radiation field is obtained, the projection position is symmetrically arranged with the central axis of the single cone (3) as the axis of symmetry, and the symmetrical position is used as the second preset position.

3. The device for calibrating the performance of a pulsed field probe according to claim 1, characterized in that: The voltage monitoring device (5) is provided with two signal receiving channels, one of which is connected to the probe to be calibrated (4), and the other is connected to the reference probe (6).

4. The device for calibrating the performance of a pulsed field probe according to claim 1, characterized in that: The reference probe (6) is a passive structure reference probe with known parameters, wherein the known parameters include an amplitude conversion coefficient.

5. The device for calibrating the performance of a pulsed field probe according to claim 1, characterized in that: The first preset position is a field point position of the time domain electromagnetic pulse radiation field.

6. The device for calibrating the performance of a pulsed field probe according to claim 1, characterized in that: The material of the single cone (3) is a metal material.

7. The device for calibrating the performance of a pulsed field probe according to claim 1, characterized in that: The voltage monitoring device (5) is an oscilloscope.

8. A method for calibrating the performance of a pulsed field probe, based on the device for calibrating the performance of a pulsed field probe according to any one of claims 1 to 7, characterized in that: The method includes: A device for calibrating the performance of a pulse field probe is constructed, wherein a probe to be calibrated (4) is placed at a first preset position, and a reference probe (6) is placed at a second preset position; Feeding a pulse signal into a single cone (3) based on a pulse source (1); Using the probe to be calibrated (4) to receive the field signal, inputting it into a receiving channel of a voltage monitoring device (5) to obtain a monitoring voltage U; Using a reference probe (6) to receive a field signal, the signal is input into another receiving channel of a voltage monitoring device (5) to obtain a monitoring voltage U1; The amplitude conversion coefficient of the probe (4) to be calibrated is calculated based on the monitoring voltage U and the monitoring voltage U1 and the preset amplitude conversion coefficient of the reference probe (6).

9. A method for calibrating pulse field probe performance according to claim 8, characterized in that: The amplitude conversion coefficient k of the probe to be calibrated (4) is calculated as follows: The amplitude conversion coefficient of the reference probe (6) is k1.

10. A method for calibrating pulse field probe performance according to claim 8, characterized in that: The probe to be calibrated (4) is calibrated based on the amplitude conversion coefficient of the probe to be calibrated (4).

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