Baffle plate, exposure device and substrate exposure method

Abstract

The invention provides a baffle, an exposure device and a substrate exposure method. The baffle is used for exposing a substrate, the substrate comprises a to-be-exposed area and a to-be-shielded area, the to-be-exposed area comprises at least one target exposure area, the to-be-shielded area at least partially surrounds the target exposure area, and the baffle comprises a light-transmitting area and a non-light-transmitting area; the orthographic projection of the light-transmitting area on the substrate at least partially covers the orthographic projection of the target exposure area on the substrate, and the orthographic projection of the non-light-transmitting area on the substrate covers the orthographic projection of the area to be shielded on the substrate. According to the baffle, the typesetting distance between panels can be greatly reduced, the utilization rate of the substrate is increased, and the bad risk of the edge of the substrate is reduced.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a baffle, an exposure device, and a substrate exposure method. Background Art

[0002] In the AMOLED (Active-matrix organic light-emitting diode) display manufacturing technology, the array substrate needs to be patterned on the substrate by using an exposure device. Due to the limitation of the effective exposure area of ​​the exposure machine, a splicing exposure method needs to be used for exposure.

[0003] However, the current splicing exposure scheme has the problems of low substrate utilization and high risk of substrate edge defects. Summary of the invention

[0004] In view of this, the purpose of the present application is to propose a baffle that can improve the utilization rate of substrates during splicing exposure and reduce the risk of substrate edge defects.

[0005] Based on the above purpose, the present application provides a baffle for exposing a substrate, wherein the substrate includes an area to be exposed and an area to be shielded, the area to be exposed includes at least one target exposure area, the area to be shielded at least partially surrounds the target exposure area, and the baffle includes:

[0006] Light-transmitting areas and non-light-transmitting areas;

[0007] When the substrate is exposed, the orthographic projection of the light-transmitting area on the substrate at least partially covers the orthographic projection of the target exposure area on the substrate, and the orthographic projection of the non-light-transmitting area on the substrate covers the orthographic projection of the to-be-shielded area on the substrate.

[0008] In one of the embodiments, when exposing the substrate, the minimum distance from any point on the edge of the orthographic projection of the light-transmitting area on the substrate to the target exposure area is greater than or equal to the sum of the gray area width of the exposure device and the precision error of the exposure device.

[0009] In one of the embodiments, when the substrate is exposed, the minimum distances from any two points on the edge of the orthographic projection of the light-transmitting area on the substrate to the target exposure area are equal.

[0010] In one embodiment, the substrate includes at least two stitching exposure areas, the two stitching exposure areas include a common area, and the orthographic projection of the area to be shielded on the substrate and the orthographic projection of the target exposure area on the substrate are located within the orthographic projection of the common area on the substrate.

[0011] In one of the embodiments, the area to be exposed further includes a panel area, and the orthographic projection of the panel area on the substrate does not overlap with the orthographic projection of the target exposure area on the substrate;

[0012] Preferably, the substrate includes a plurality of the areas to be exposed, and each of the areas to be exposed includes a plurality of the panel areas.

[0013] In one embodiment, the orthographic projections of the light-transmitting area and the non-light-transmitting area on the substrate are combined into a rectangle.

[0014] Preferably, the shape of the target exposure area includes at least one of a circle, a rectangle, a trapezoid, a concave shape, and a convex shape.

[0015] In one embodiment, the light-transmitting area is located at the edge of the non-light-transmitting area;

[0016] Preferably, the baffle includes a plurality of the non-light-transmitting areas, and the plurality of the non-light-transmitting areas are arranged along the length direction of the baffle;

[0017] Preferably, the light-transmitting area is provided at two opposite edges of the non-light-transmitting area extending along the length direction of the baffle.

[0018] In one embodiment, the target exposure area is used to form a marking point or a test point.

[0019] Based on the same inventive concept, the present application also discloses an exposure device, which includes:

[0020] An exposure light source, and a baffle as described in any one of the above.

[0021] Based on the same inventive concept, the present application also discloses a substrate exposure method, which comprises:

[0022] Providing a baffle, the baffle comprising a light-transmitting area and a non-light-transmitting area;

[0023] The baffle is placed at a target position between the mask and the exposure light source, and the substrate is placed on a side of the mask away from the exposure light source; wherein the substrate includes an area to be exposed and an area to be shielded, the area to be exposed includes at least one target exposure area, the area to be shielded at least partially surrounds the target exposure area, the orthographic projection of the light-transmitting area on the substrate at least partially covers the orthographic projection of the target exposure area on the substrate, and the orthographic projection of the non-light-transmitting area on the substrate covers the orthographic projection of the area to be shielded on the substrate;

[0024] The substrate is exposed using the exposure light source; wherein the light-transmitting area transmits the light directed toward the target exposure area, and the light-impermeable area blocks the light directed toward the area to be blocked.

[0025] Compared with the prior art, the baffle provided in the present application includes a light-transmitting area and a non-light-transmitting area. When the substrate is exposed, the orthographic projection of the light-transmitting area on the substrate at least partially covers the orthographic projection of the target exposure area on the substrate, and the orthographic projection of the non-light-transmitting area on the substrate covers the orthographic projection of the area to be shielded on the substrate, which is beneficial to significantly reduce the layout spacing between panels, improve the utilization rate of the substrate, and reduce the risk of substrate edge defects. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the present application or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0027] Figure 1 It is a schematic diagram of splicing exposure in the related art;

[0028] Figure 2 A schematic diagram of a splicing exposure area in splicing exposure in the related art;

[0029] Figure 3 for Figure 2 Schematic diagram of the local structure in;

[0030] Figure 4 A schematic diagram of the first exposure in the splicing exposure in the related art;

[0031] Figure 5 is a schematic diagram of the second exposure in the splicing exposure in the related art;

[0032] Figure 6 for Figure 4 A schematic diagram of the structure enlargement at the center A;

[0033] Figure 7 A schematic diagram of a baffle provided in one embodiment of the present application;

[0034] Figure 8 A schematic diagram of the first exposure in the splicing exposure provided by an embodiment of the present application;

[0035] Fig. 9 A schematic diagram of the second exposure in the splicing exposure provided by an embodiment of the present application;

[0036] Fig.10 for Figure 8A schematic diagram of the structure enlarged at B in the middle;

[0037] Fig.11 A schematic diagram of a baffle provided in another embodiment of the present application;

[0038] Fig.12 A schematic diagram of splicing exposure provided by an embodiment of the present application;

[0039] Fig.13 for Fig.12 A schematic diagram of the structure enlarged at C in the middle;

[0040] Fig.14 A schematic diagram of a baffle provided in another embodiment of the present application;

[0041] Fig.15 This is a flow chart of a substrate exposure method provided in another embodiment of the present application.

[0042] Marking Description:

[0043] 10. Substrate; 11. Splicing exposure area; 12. Common area; 13. Panel area; 14. Target exposure area; 21. Exposure light source; 22. Lens; 23. Photoresist; 30. Mask; 40. Baffle; 41. Transparent area; 42. Non-transparent area; 51. Line segment; 52. Arc. DETAILED DESCRIPTION

[0044] In order to make the objectives, technical solutions and advantages of the present application more clearly understood, the present application is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0045] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present application should be the usual meanings understood by people with ordinary skills in the field to which the present application belongs. The "first", "second" and similar words used in the embodiments of the present application do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0046] Reference Figure 1As shown, when exposing the substrate 10, an exposure device is required to provide an exposure light source 21. The light emitted by the exposure light source 21 passes through the mask 30 to pattern the substrate 10. Due to the limitation of the effective exposure area of ​​the exposure device, a splicing exposure method is required for exposure. Further, the exposure device also includes a lens 22, etc. The lens 22 is used to collimate the light emitted by the exposure light source 21. Further, a photoresist 23 is also provided on the substrate 10. When exposed, the pattern on the mask 30 is transferred to the photoresist 23.

[0047] Reference Figure 2-3 As shown, the substrate 10 includes a plurality of stitching exposure areas 11, each stitching exposure area 11 corresponds to an effective area exposed by an exposure device at one time, and there is a common area 12 between adjacent stitching exposure areas 11, and the common area 12 may simultaneously cover the panel area 13 in the adjacent stitching exposure area 11. Therefore, when exposing the current stitching exposure area 11, it is necessary to block the panel area 13 in the adjacent stitching exposure area 11 located in the common area 12 to avoid exposure of the panel area 13 in the adjacent stitching exposure area 11.

[0048] For ease of understanding, take the example of the splicing exposure area 11 including the first splicing exposure area and the second splicing exposure area. Figure 3 As shown, the width of the first splicing exposure area is D1, the width of the second splicing exposure area is D2, and the width of the overlapping area is D3.

[0049] Reference Figure 1 , 4 -6, currently, a common solution is to use a baffle 40 for shielding, and on the substrate 10, in addition to the panel area 13, there is usually a target exposure area 14, which can be used to form a marking point, thereby realizing functions such as alignment and / or cutting. When performing splicing exposure, the target exposure area 14 needs to be exposed, so the baffle 40 cannot shield the target exposure area 14.

[0050] Reference Figure 4 As shown, when the first splicing exposure area D1 is subjected to the first splicing exposure, the baffle 40 shields the panel area 13 in the public area 12 in the second splicing exposure area D2 to prevent the panel area 13 in the second splicing exposure area D2 from being exposed. Figure 5 As shown, when the second splicing exposure area D2 is subjected to the second splicing exposure, the baffle 40 blocks the panel area 13 in the public area 12 in the first splicing exposure area D1 to prevent the panel area 13 in the first splicing exposure area D1 from being exposed.

[0051] Reference Figure 4 and 5As shown, the current baffle 40 is usually rectangular. After long-term research by the inventor, it is found that due to the gray area and precision error of the exposure device, when the target splicing exposure area 11 is vertically exposed, the orthographic projection of the baffle 40 on the substrate 10 is required to extend out of the panel area 13 in the adjacent splicing exposure area. Figure 6 As shown, the extended distance is D4. At the same time, it is required that the baffle 40 maintains a target distance between the orthographic projection on the substrate 10 and the target exposure area 14, referring to Figure 6 As shown, the target distance is D5, and both D4 and D5 need to satisfy a value greater than or equal to the sum of the gray area width a of the exposure device and the precision error b of the exposure device, that is, D4≥a+b, D5≥a+b; wherein, a+b is usually greater than or equal to 0.8mm. Since the target exposure area 14 usually requires two exposures, a distance of D4+D5 needs to be reserved between both sides of the target exposure area 14 and the panel area 13. Therefore, in the common area 12, the gap (layout spacing) between the panel areas 13 in the adjacent splicing exposure areas 11 needs to satisfy 2D4+2D5+d≥4a+4b+d; wherein, d is the size of the target exposure area 14. As a result, the layout spacing between the panels at the splicing cannot be reduced, which reduces the utilization rate of the substrate and the production capacity. At the same time, the outermost panel on the substrate is closer to the edge of the substrate, increasing the risk of defective outermost panels. Based on this, the present application provides a splicing exposure solution, as described in the following embodiments.

[0052] Reference Figure 7-10 As shown, an embodiment of the present application provides a baffle 40 for exposing a substrate 10 , wherein the substrate 10 includes an area to be exposed and an area to be shielded, wherein the area to be exposed includes at least one target exposure area 14 , and the area to be shielded at least partially surrounds the target exposure area 14 .

[0053] Among them, the baffle 40 includes a light-transmitting area 41 and a non-light-transmitting area 42. When the substrate 10 is exposed, the orthographic projection of the light-transmitting area 41 on the substrate 10 at least partially covers the orthographic projection of the target exposure area 14 on the substrate 10, and the orthographic projection of the non-light-transmitting area 42 on the substrate 10 covers the orthographic projection of the area to be shielded on the substrate 10.

[0054] The baffle 40 provided in this embodiment can be used for splicing exposure, which is beneficial to significantly reduce the layout spacing between panels, improve the utilization rate of the substrate 10, and reduce the risk of defective edges of the substrate 10.

[0055] Specifically, by providing a light-transmitting area 41 on the baffle 40 and utilizing the light that passes through the light-transmitting area 41 toward the target exposure area 14, there is no need to consider the distance between the orthographic projection of the edge of the light-transmitting area 41 on the substrate 10 and the panel area 13, because the corner of the panel area 13 is usually arc-shaped. Therefore, the distance between the orthographic projection of the edge of the light-transmitting area 41 on the substrate 10 and the corner of the panel area 13 is relatively far, much greater than or equal to the sum of the gray area width a of the exposure device and the precision error b of the exposure device. Therefore, it is only necessary that the distance between the non-light-transmitting area 42 and the target exposure area 14 satisfy the requirement of being greater than or equal to the sum of the gray area width a of the exposure device and the precision error b of the exposure device, thereby greatly reducing the typesetting spacing between panels in the overlapping area D3.

[0056] In one embodiment, the target exposure area 14 is used to form a marking point. The marking point can realize functions such as alignment and / or cutting. In another embodiment, the target exposure area 14 is used to form a test point, and the test point can be used to test the panel.

[0057] Reference Figure 8 and 10 As shown, in one embodiment, the area to be exposed also includes a panel area 13, and the orthographic projection of the panel area 13 on the substrate 10 does not overlap with the orthographic projection of the target exposure area 14 on the substrate 10. When the area to be exposed is exposed, the panel area 13 and the target exposure area 14 are exposed at the same time.

[0058] Preferably, the substrate 10 includes a plurality of areas to be exposed, each of which includes a plurality of panel areas 13, so that the plurality of panel areas 13 can be exposed simultaneously. The plurality of areas to be exposed can be exposed by splicing exposure.

[0059] Reference Figure 8 and 10 As shown, in one embodiment, the substrate 10 includes at least two stitching exposure areas, the two stitching exposure areas include a common area 12, and the orthographic projection of the area to be shielded on the substrate 10 and the orthographic projection of the target exposure area 14 on the substrate 10 are located within the orthographic projection of the common area 12 on the substrate 10.

[0060] Specifically, taking the example that the splicing exposure area includes the first splicing exposure area and the second splicing exposure area, the width of the first splicing exposure area is D1, the width of the second splicing exposure area is D2, and the width of the common area is D3. When the first splicing exposure is performed on the first splicing exposure area D1, the baffle 40 shields the panel area 13 in the second splicing exposure area D2 located in the common area D3 to prevent the panel area 13 in the second splicing exposure area D2 from being exposed. Fig. 9As shown, when the second splicing exposure area D2 is subjected to the second splicing exposure, the baffle 40 blocks the panel area 13 in the public area D3 in the first splicing exposure area D1 to prevent the panel area 13 in the first splicing exposure area D1 from being exposed.

[0061] In a specific embodiment, the orthographic projection of the target exposure area 14 on the substrate 10 is entirely located inside the orthographic projection of the light-transmitting area 41 on the substrate 10. Figure 8-9 The orthographic projection of the target exposure area 14 on the substrate 10 is located inside the orthographic projection of the light-transmitting area 41 on the substrate 10, referring to Fig.10 and 12 ; Both can realize exposure of the target exposure area 14. Theoretically, when the orthographic projection of the target exposure area 14 on the substrate 10 is located inside the orthographic projection of the light-transmitting area 41 on the substrate 10, the layout spacing between the panels in the overlapping area D3 can be smaller.

[0062] In one of the embodiments, when exposing the substrate 10, the minimum distance from any point on the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 to the target exposure area 14 is greater than or equal to the sum of the gray area width of the exposure device and the precision error of the exposure device, thereby ensuring that when the substrate 10 is vertically exposed, the target exposure area 14 can be fully exposed, avoiding obstruction of the target exposure area 14 by the non-light-transmitting area 42.

[0063] Specifically, refer to Fig.10 As shown, the minimum distance D6 from any point on the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 to the target exposure area 14 is ≥a+b. At the same time, in order to meet the exposure requirements, the minimum distance D7 from the edge of the baffle 40 to the panel area 13 in the first splicing exposure area D1 is ≥a+b, and the distance D8 from the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 to the panel area 13 in the second splicing exposure area D2 is ≥a+b.

[0064] In one of the embodiments, when exposing the substrate 10, the minimum distances from any two points on the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 to the target exposure area 14 are equal. At this time, the light-transmitting area 41 can just meet the exposure requirements of the target exposure area 14, thereby preventing the light-transmitting area 41 from being too large, which would result in excessive typesetting spacing between panels in the common area 12.

[0065] Specifically, refer to Fig.10As shown, taking the target exposure area 14 as a square as an example, the minimum distance between any two points on the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 and the target exposure area 14 is D6, so that the edge of the light-transmitting area 41 is alternately connected by line segments 51 and arcs 52. The arc 52 is formed with the corner of the square as the center, because the point closest to the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 and the panel area 13 is located on the arc 52, therefore, the arc 52 can effectively increase the distance D8 between the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10 and the panel area 13, so that D8 ≥ a + b.

[0066] Please continue to refer to Fig.10 As shown, at this time, the target exposure area 14 is a square, and the orthographic projections of the target exposure area 14 on the substrate 10 are all located inside the orthographic projections of the light-transmitting area 41 on the substrate 10, and one side of the target exposure area 14 coincides with the edge of the orthographic projection of the light-transmitting area 41 on the substrate 10. At this time, the layout spacing between the panels is required to be D6+D7+d≥2a+2b+d; wherein d is the side length of the target exposure area 14.

[0067] Reference Figure 12-13 As shown, at this time, the target exposure area 14 is a square, and the orthographic projection of the target exposure area 14 on the substrate 10 is partially located inside the orthographic projection of the light-transmitting area 41 on the substrate 10. Taking the example that half of the orthographic projection of the target exposure area 14 on the substrate 10 is located inside the orthographic projection of the light-transmitting area 41 on the substrate 10, at this time, the layout spacing requirement between the panels is D7+D7≥2a+2b. Compared with the case where the orthographic projection of the target exposure area 14 on the substrate 10 is entirely located inside the orthographic projection of the light-transmitting area 41 on the substrate 10, the layout spacing between the panels in the overlapping area D3 is smaller.

[0068] In one embodiment, the orthographic projections of the light-transmitting area 41 and the non-light-transmitting area 42 on the substrate 10 are combined into a rectangle, that is, a groove is made on the basis of the existing baffle 40 to form the non-light-transmitting area 42, and the non-grooved area is the non-light-transmitting area 42, which has the advantages of simple structure and easy production.

[0069] Furthermore, the shape of the target exposure area 14 includes a circle, a rectangle, a trapezoid, a concave shape, a convex shape, etc. It can be understood that the rectangle includes the square in the above embodiment, wherein the shape of the target exposure area 14 is the shape of the pattern to be exposed, and the shape can be any shape as needed. The target exposure area 14 of any shape can be exposed using the baffle 40 in the present application, and the effect of reducing the typesetting spacing can be achieved. Different shapes of target exposure areas 14 can be exposed using different shapes of light-transmitting areas 41. For example, when the target exposure area 14 is circular, the light-transmitting area can be semicircular. Fig.13 shown.

[0070] In one embodiment, referring to Figure 7 and 14 As shown, the light-transmitting area 41 is located at the edge of the non-light-transmitting area 42. At this time, the orthographic projection of the non-light-transmitting area 42 on the substrate 10 is in a semi-enclosed state with respect to the target exposure area 14, that is, only the distance between the orthographic projection of the non-light-transmitting area 42 on the substrate 10 and the enclosed side of the target exposure area 14 needs to be considered, which satisfies the requirement of being greater than or equal to the sum of the gray area width a of the exposure device and the precision error b of the exposure device, and there is no need to consider the distance between the unenclosed side of the target exposure area 14 and the orthographic projection of the non-light-transmitting area 42 on the substrate 10, thereby achieving a reduction in the typesetting spacing.

[0071] Preferably, refer to Fig.11 As shown, the baffle 40 includes a plurality of non-light-transmitting areas 42, and the plurality of non-light-transmitting areas 42 are arranged along the length direction of the baffle 40, so that a plurality of target exposure areas 14 can be exposed at one time, and it is beneficial to increase the shielding area.

[0072] In one embodiment, two opposite edges of the baffle 40 extending in the length direction are both provided with non-light-transmitting areas 42. After the first splicing exposure, the baffle 40 can be directly offset to achieve the second splicing exposure. Figure 8 The baffle 40 in the embodiment can be directly flipped 180 degrees after the first splicing exposure, or can be rotated 180 degrees in the plane where the baffle 40 is located and translated, that is, the baffle 40 is completed from Figures 9 and 10 transformation.

[0073] Based on the same inventive concept, another embodiment of the present application discloses an exposure device, which includes an exposure light source 21 and a baffle 40 in the above embodiment. Figure 1 As shown, when exposing the substrate 10, an exposure device is required to provide an exposure light source 21, and the light emitted by the exposure light source 21 passes through the mask 30 to pattern the substrate 10. Further, the exposure device also includes a lens 22, etc., and the lens 22 is used to collimate the light emitted by the exposure light source 21.

[0074] The exposure device provided in this embodiment has a baffle 40 including a light-transmitting area 41 and a non-light-transmitting area 42. When exposing the substrate 10, the orthographic projection of the light-transmitting area 41 on the substrate 10 at least partially covers the orthographic projection of the target exposure area 14 on the substrate 10, and the orthographic projection of the non-light-transmitting area 42 on the substrate 10 covers the orthographic projection of the area to be shielded on the substrate 10, which is beneficial to significantly reduce the layout spacing between panels, improve the utilization rate of the substrate 10, and reduce the risk of edge defects of the substrate 10.

[0075] Reference Fig.15As shown, based on the same inventive concept, another embodiment of the present application discloses a substrate exposure method, which includes the following steps:

[0076] S10, providing a baffle 40, the baffle 40 includes a light-transmitting area 41 and a non-light-transmitting area 42; Figure 7-10 .

[0077] S20, placing the baffle 40 at the target position between the mask 30 and the exposure light source 21, and placing the substrate 10 on the side of the mask 30 away from the exposure light source 21; wherein the substrate 10 includes an area to be exposed and an area to be shielded, the area to be exposed includes at least one target exposure area 14, the area to be shielded at least partially surrounds the target exposure area 14, the orthographic projection of the light-transmitting area 41 on the substrate 10 at least partially covers the orthographic projection of the target exposure area 14 on the substrate 10, and the orthographic projection of the non-light-transmitting area on the substrate 10 covers the orthographic projection of the area to be shielded on the substrate 10.

[0078] S30, exposing the substrate 10 using the exposure light source 21; wherein the light-transmitting area 41 transmits the light directed to the target exposure area 14, and the light-impermeable area 42 blocks the light directed to the area to be blocked.

[0079] The substrate exposure method provided in this embodiment is conducive to significantly reducing the layout spacing between panels, improving the utilization rate of the substrate 10, and reducing the risk of defective edges of the substrate 10.

[0080] In one embodiment, the orthographic projection of the target exposure area 14 on the substrate 10 is entirely located inside the orthographic projection of the light-transmitting area 41 on the substrate 10. Figure 8-9 The orthographic projection of the target exposure area 14 on the substrate 10 is located inside the orthographic projection of the light-transmitting area 41 on the substrate 10, referring to Fig.10 and 12 ; Exposure of the target exposure area 14 can be achieved. When the orthographic projection of the target exposure area 14 on the substrate 10 is located inside the orthographic projection of the light-transmitting area 41 on the substrate 10, the layout spacing between the panels in the overlapping area D3 can be smaller.

[0081] Although the present application has been described in conjunction with specific embodiments thereof, many alternatives, modifications and variations of these embodiments will be apparent to those skilled in the art in light of the foregoing description.

[0082] It should be noted that the above describes some embodiments of the present application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in an order different from that in the above embodiments and still achieve the desired results. In addition, the processes depicted in the accompanying drawings do not necessarily require the specific order or continuous order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0083] The embodiments of the present application are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present application should be included in the scope of protection of the present application.

Claims

1. A baffle plate for exposing a substrate, wherein the substrate comprises an area to be exposed and an area to be shielded, the area to be exposed comprises at least one target exposure area, and the area to be shielded at least partially surrounds the target exposure area, characterized in that: The baffle comprises: Light-transmitting areas and non-light-transmitting areas; When the substrate is exposed, the orthographic projection of the light-transmitting area on the substrate at least partially covers the orthographic projection of the target exposure area on the substrate, and the orthographic projection of the non-light-transmitting area on the substrate covers the orthographic projection of the to-be-shielded area on the substrate.

2. The baffle according to claim 1, characterized in that: When exposing the substrate, the minimum distance from any point on the edge of the orthographic projection of the light-transmitting area on the substrate to the target exposure area is greater than or equal to the sum of the gray area width of the exposure device and the precision error of the exposure device.

3. The baffle according to claim 2, characterized in that: When the substrate is exposed, the minimum distances from any two points on the edge of the orthographic projection of the light-transmitting area on the substrate to the target exposure area are equal.

4. The baffle according to claim 1, characterized in that: The substrate includes at least two splicing exposure areas, the two splicing exposure areas include a common area, and the orthographic projection of the area to be shielded on the substrate and the orthographic projection of the target exposure area on the substrate are located within the orthographic projection of the common area on the substrate.

5. The baffle according to claim 1, characterized in that: The area to be exposed also includes a panel area, and the orthographic projection of the panel area on the substrate does not overlap with the orthographic projection of the target exposure area on the substrate; Preferably, the substrate includes a plurality of the areas to be exposed, and each of the areas to be exposed includes a plurality of the panel areas.

6. The baffle according to claim 1, characterized in that The orthographic projections of the light-transmitting area and the non-light-transmitting area on the substrate are combined into a rectangle; Preferably, the shape of the target exposure area includes at least one of a circle, a rectangle, a trapezoid, a concave shape, and a convex shape.

7. The baffle according to claim 1, characterized in that The light-transmitting area is located at the edge of the non-light-transmitting area; Preferably, the baffle includes a plurality of the non-light-transmitting areas, and the plurality of the non-light-transmitting areas are arranged along the length direction of the baffle; Preferably, the light-transmitting area is provided at two opposite edges of the non-light-transmitting area extending along the length direction of the baffle.

8. The baffle according to claim 1, characterized in that The target exposure area is used to form a marking point or a test point.

9. An exposure device, characterized in that: include: Exposure light source, and A baffle as claimed in any one of claims 1 to 8.

10. A substrate exposure method, characterized in that: include: Providing a baffle, the baffle comprising a light-transmitting area and a non-light-transmitting area; The baffle is placed at a target position between the mask and the exposure light source, and the substrate is placed on a side of the mask away from the exposure light source; wherein the substrate includes an area to be exposed and an area to be shielded, the area to be exposed includes at least one target exposure area, the area to be shielded at least partially surrounds the target exposure area, the orthographic projection of the light-transmitting area on the substrate at least partially covers the orthographic projection of the target exposure area on the substrate, and the orthographic projection of the non-light-transmitting area on the substrate covers the orthographic projection of the area to be shielded on the substrate; The substrate is exposed using the exposure light source; wherein the light-transmitting area transmits the light directed toward the target exposure area, and the light-impermeable area blocks the light directed toward the area to be blocked.

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