Container for supplying precursor substance

Abstract

A container (1), which vaporizes a precursor substance and delivers the vaporized precursor substance, comprises: a housing part (12) that forms a boundary of an internal space; and a plurality of sub-carrier trays (4) stacked on each other within the interior space as respective sub-carrier trays (4) forming a gas flow path, at least one of the plurality of sub-carrier trays (4) comprising: a sub-carrier holder (41) for storing the precursor substance; and a support cover (42) abutting the sub-support support (41), substantially comprising at least one pin (44) formed protruding downward toward the sub-support support (41) in such a way as to form a gas flow path (C) covering the entire area of the precursor substance.

Description

Technical Field

[0001] The invention relates to a precursor vapor delivery device for a coating device such as a (plasma enhanced) chemical vapor deposition device, a (plasma enhanced) atomic layer deposition device, a device for epitaxial layer growth, etc. The invention also relates to the structure of said container for generating a well-defined gas flow with a specific concentration of vaporized precursor substances. Background Art

[0002] The coating process of evaporating the coating substance onto the surface is a well-known technique in the corresponding technical field. In so-called chemical vapor deposition, atomic layer deposition or epitaxial growth, the substrate is exposed to at least one volatile precursor, which reacts chemically with a co-reactant in the deposition chamber and generates the desired thin film deposition on the substrate.

[0003] Precursor materials such as MOO2Cl2 are used in chemical vapor deposition processes or atomic layer evaporation processes. The precursor materials can be solid powders and / or granular materials provided in appropriate multiple containers. Such multiple containers include inlets and outlets for connecting to the process system. As required, a carrier gas can be heated and provided through the container to vaporize the solid precursor material by sublimation. The carrier gas is concentrated by the vaporized precursor material so as to provide a continuous gas flow through the preset concentration of the precursor material.

[0004] As shown in US 6,270,839 B1, a raw material supply device is known for supplying gas sublimated from a solid raw material to a thin film forming device using chemical vapor deposition. The device includes a plurality of auxiliary containers, each of which includes: an inlet for allowing gas to flow into each auxiliary container; an outlet for discharging the gas; a lower part, between which the solid raw material is distributed; and a wall connected to the lower part to form a gap so that the gas flowing in contacts the solid raw material and moves on the surface of the solid raw material distributed in the lower part. The device also includes: a raw material container for accommodating and storing the plurality of auxiliary containers; a heating device for heating the raw material container; and a device for allowing a carrier gas to flow into the raw material container.

[0005] US10,465,286B2 describes a steam transfer vessel for vaporizing and transferring vaporized raw materials, the vessel comprising: a peripheral vessel wall forming a boundary of an internal space; a gas inlet for supplying gas to the internal space; and a gas outlet arranged in a manner to achieve fluid communication with the internal space at least intermittently. In addition, the vessel comprises: a plurality of support surfaces formed by a plurality of brackets; and a porous steel material forming a flow path extending between the gas inlet and the gas outlet, located on an upper bracket among the plurality of brackets. The porous steel material is pressed on the upper bracket by a lid.

[0006] However, the proposed solution does not allow for uniform discharge of the precursor substance from the substance supply device. Furthermore, the existing container does not allow for the container to be emptied at a reasonable speed under stable gas discharge conditions.

[0007] It is therefore an object of the present invention to provide a precursor material container which provides a high discharge performance at a stable material concentration of the discharged vaporized precursor material. Summary of the invention

[0008] Technical issues

[0009] This problem is solved by a container for vaporizing a precursor substance and delivering the vaporized precursor substance as claimed in claim 1 and a method for operating the container as claimed in the additional independent claim.

[0010] Technical Solution

[0011] 1. A container 1 for vaporizing a precursor substance and transferring the vaporized precursor substance comprises: a receiving portion 12, forming a boundary of an internal space; and a plurality of sub-carrier trays 4, which are stacked on each other in the internal space and serve as individual sub-carrier trays 4 for forming a gas flow path, at least one of the plurality of sub-carrier trays 4 comprises: a sub-carrier holder 41 for storing the precursor substance; and a holder cover 42 for closing the sub-carrier holder 41, in essence, the holder cover comprises at least one pin 44, and the at least one pin 44 is formed to protrude downward toward the sub-carrier holder 41 in a manner of forming a gas flow path C covering the entire area of ​​the precursor substance.

[0012] 2. In item 1, the plurality of pins 44 form a spiral gas flow path C between the first tray opening 46 of the side wall 45 of the sub-carrier holder 41 and the holder cover 42 , in particular, the second tray opening 47 at the center of the holder cover 46 .

[0013] 3. In item 1, the plurality of pins 44 form a curved gas flow path C between a first tray opening 46 of a side wall 45 of the sub-carrier holder 41 and a second tray opening 47 of the holder cover 42 or other portion of the side wall 45 of the sub-carrier holder 41 .

[0014] 4. In item 2 or 3, the plurality of pins 44 form a gas flow path C between the first tray opening 46 and the second tray opening 47 , and the gas flow path C covers at least 90% of the surface of the sub-carrier tray 4 .

[0015] 5. In any one of items 1 to 4, the at least one pin 44 is formed to protrude substantially toward a lower portion of the sub-carrier support 41 .

[0016] 6. In any one of items 1 to 5, the sub-carrier holder 41 is filled with a precursor substance, so that the holder cover 42 , the surface of the precursor substance and the at least one pin form a gas flow path C through the sub-carrier tray 4 .

[0017] 7. In any one of items 1 to 6, the plurality of sub-carrier trays 4 allow the flow of carriers passing through the container 1 to be forced to pass through a plurality of gas flow paths in each of the sub-carrier trays 4 .

[0018] 8. In item 7, the shape of the bracket cover 42 substantially matches the shape of the internal cross-section of the receiving portion of the container 1.

[0019] 9. In item 7, the bracket cover 42 includes a side wall 45 that surrounds the sub-carrier bracket and extends along a portion of the circumference, the sub-carrier bracket 41 has a side wall that contacts a portion of the wall of the internal space, and the shape and extension of the side wall 45 of the bracket cover 42 and the side wall 45 of the sub-carrier bracket 41 together with a portion of the wall of the internal space form an additional gas flow path.

[0020] 10. In any one of items 1 to 9, a separation structure is formed at the lower portion of the plurality of sub-carrier trays 4, and carrier gas flow can be achieved along the lower portion of each of the sub-carrier trays 4 from a portion of an inner wall of the accommodating portion of the container 1 or to a portion of an inner wall of the accommodating portion of the container 1.

[0021] 11. In any one of items 1 to 10, the gas flow path C formed in the at least one sub-carrier tray 4 has a Reynolds value less than 2000, preferably, has a Reynolds value less than 5000.

[0022] 12. In any one of items 1 to 11, the sub-carrier support 41 is filled with a bulk precursor substance such as a substance in the form of powder, sintered powder or granules.

[0023] 13. In any one of items 1 to 12, a heating device 5 is attached to the container 1 and heats the container 1 at least to a vaporization temperature of the precursor substance.

[0024] 14. A method for delivering a vaporized precursor substance comprising the steps of: providing a precursor substance to a container 1 according to any one of items 1 to 13; supplying a carrier gas to the container; and receiving the carrier gas condensed into the vaporized precursor substance.

[0025] 15. The present invention provides a product produced by a vaporized precursor substance delivered according to the method of item 14.

[0026] 16. A method of delivering vaporized precursor material comprising the steps of: providing a precursor material to a container 1 according to any one of items 1 to 13; and receiving the vaporized precursor material by steam extraction.

[0027] 17. The present invention provides a product produced by a vaporized precursor substance delivered according to the method of item 16.

[0028] Other embodiments disclose dependencies.

[0029] According to a first embodiment, a container for vaporizing a precursor substance and transferring the vaporized precursor substance includes: a receiving portion forming a boundary of an internal space; and a plurality of sub-carrier trays stacked on each other in the internal space as individual sub-carrier trays forming a gas flow path, at least one of the plurality of sub-carrier trays including: a sub-carrier support for storing the precursor substance; and a support cover for closing / covering and / or sealing the sub-carrier support, in essence, the support cover includes at least one pin, which protrudes downward toward the sub-carrier support in a manner to form a gas flow path covering the entire area of ​​the precursor substance.

[0030] For bubbler-type containers of multiple solid precursor materials, there is a problem that the vaporization of the solid precursor material may become unstable or the amount of vaporization is more or less small. For powder / granular precursor materials, only the upper surface of the material and the preferential gas path formed in the material show good surface regeneration. Therefore, only the main gas path generated during the operation contributes to the vaporization of the precursor material. On the contrary, other areas of the material are substantially uncovered due to the carrier gas flow, so that the evaporated material will be reduced. As a result, only a part of the surface of the precursor material effectively contributes to condensing the vaporized precursor material into the carrier gas, so that the surface of the material becomes more uneven, which will have a more negative impact on the discharge process. In addition, the precursor material is not used until the discharge process of the container is completed, so as not to hinder the main flow path of the carrier gas.

[0031] Furthermore, in order to increase the vaporization rate, the precursor material needs to be heated. In particular, for the precursor material in the form of powder or particles, it is difficult to heat the material uniformly compared to heating a liquid material.

[0032] According to the container, at least one sub-carrier tray is arranged, the tray has a material support for storing a solid precursor material, the precursor material support is covered by a cover, and the cover has a pin structure protruding from the lower side of the cover (toward the inside of the material support) toward the precursor material stored in or on the material support. A gas flow path is formed between the lower surface of the cover and the surface of the material, in which the plurality of pins substantially cover the surface of the material. The gas flow path is not branched, and the size of the flow path cannot form a branched gas flow path in the sub-carrier tray.

[0033] In order to increase the discharge speed, a plurality of pins protrude toward the lower portion of the substance holder and have nearly closed passages for gas flow, so that the precursor substance is completely discharged from the container.

[0034] Furthermore, the plurality of pins may be arranged to form a spiral gas flow path between a first tray opening of a side wall of the sub-carrier holder and the holder cover, in particular, a second tray opening at a center of the holder cover.

[0035] Alternatively, the plurality of pins may be arranged to form a curved gas flow path between a first tray opening of the side wall of the sub-carrier holder and a second tray opening of the holder cover or other portion of the side wall of the sub-carrier holder.

[0036] The plurality of pins may form a gas flow path between the first tray port and the second tray port, and the gas flow path may cover at least 90% of a surface of the sub-carrier tray.

[0037] Essentially, the at least one pin may protrude toward a lower portion of the sub-carrier support.

[0038] Thus, the sub-carrier holder may be filled with a precursor substance, whereby the holder cover, the surface of the precursor substance and the at least one pin may form the gas flow path through the sub-carrier tray.

[0039] The plurality of sub-carrier trays may allow a flow of carrier gas passing through the container to be forced to pass through a gas flow path in each of the sub-carrier trays.

[0040] In essence, the shape of the support cover may be consistent with the shape of the inner cross-section of the receiving portion of the container.

[0041] Furthermore, the support cover includes a side wall surrounding the sub-carrier support and extending along a portion of the circumference, the sub-carrier support has a side wall partially in contact with the wall surface of the internal space, and the side wall of the support cover and the side wall of the sub-carrier support are configured and extended to form an additional gas flow path together with a portion of the wall surface of the internal space. Therefore, a spring device is inserted between the side wall of the support cover and the side wall of the sub-carrier support, and the spring device can be in contact with the wall surface of the internal space by increasing the force of heat transfer to the support cover of the sub-carrier support.

[0042] The partition structure is formed at the lower part of the plurality of sub-carrier trays, and the carrier gas can flow from or toward a part of the inner wall of the receiving portion of the container along the lower part of each sub-carrier tray.

[0043] The gas flow path formed in the at least one sub-carrier tray may have a Reynolds value less than 2000, preferably, less than 5000.

[0044] Each sub-carrier support may be filled with a bulk precursor material, such as a material in powder or particle form.

[0045] Furthermore, a heating device may be attached to the container to heat the container at least to a vaporization temperature of the precursor substance.

[0046] According to yet another embodiment, a method of delivering a vaporized precursor substance includes the steps of providing the container including the precursor substance; supplying a carrier gas to the container; and receiving the carrier gas condensed into the vaporized precursor substance.

[0047] According to another embodiment, a product produced by vaporized precursor material delivered according to the method is provided.

[0048] According to yet another embodiment, a method of delivering a vaporized precursor substance comprises the steps of: providing the container comprising the precursor substance; and receiving the vaporized precursor substance.

[0049] In this method, the steps can be performed simply by the vapor extraction function without a carrier gas.

[0050] According to yet another embodiment, a product produced by the vaporized precursor substance delivered according to the method is provided. BRIEF DESCRIPTION OF THE DRAWINGS

[0051] The embodiments are described in more detail with reference to the accompanying drawings.

[0052] Figure 1 is a cross-sectional view of a container for vaporizing a solid precursor material.

[0053] 2A to 2D are top views of the bottom surfaces of a plurality of lids that form a plurality of gas flow paths in a plurality of sub-carrier trays.

[0054] Figure 3 is a cross-sectional view of another embodiment of a container for vaporizing a solid precursor material.

[0055] FIG. 4A and FIG. 4B are Figure 3 A perspective view and a side view of a sub-carrier tray utilized in a container.

[0056] Figure 5 The lower plan view of a container having an elevated structure is shown.

[0057] Figure 6 A more detailed cross-sectional view of a sub-carrier tray having a spring device between the sub-carrier and the bracket cover. DETAILED DESCRIPTION

[0058] Figure 1 The cross-sectional view of a cylindrical container 1 is substantially used to store solid precursor materials used for chemical vapor deposition, atomic layer deposition or epitaxial layer growth. The solid powder can be all types of precursor materials that react and / or decompose in the chemical vapor deposition process for coating a thin film on a substrate surface. For example, the precursor materials can include MOO2CI2, WCI5, TMI, etc.

[0059] The precursor material may be in the form of powder, sintered powder or granules or pellets or other types of morphologies (free-flowing properties, reduced dust generation, etc.) of precursor materials that are widely used in industrial processing.

[0060] In this embodiment, the container 1 has a cylindrical space 11 with a circular cross section including a cup-shaped receiving portion 12 closed by a container cover 13. A gasket 14 can be used to accurately achieve a safe seal of the cylindrical space 11. Preferably, substantially, a first gas port 2 serving as a carrier gas inlet at the center of the lower portion 15 and a second gas port 3 serving as a gas outlet at the center of the container cover 13 are formed at the lower portion 15 of the receiving portion 12.

[0061] In the receiving portion 12, a plurality of substantially identical sub-carrier trays 4 are arranged on top of each other. The plurality of sub-carrier trays 4 respectively include a sub-carrier holder 41 having a cylindrical space with a substantially circular cross-section and a planar lower portion 43. In particular, the size of the plurality of sub-carrier holders 41 formed by the side wall 45 of the sub-carrier tray 4 can be adjusted according to the cross-sectional size of the inner cylindrical space 11 of the container 1, so that gas can flow between the inner wall and the outside of the container 1.

[0062] A flat support cover 42 is attached to the plurality of sub-carrier supports 41 to seal the inner space of each sub-carrier tray 4. Inside the sub-carrier support 41, the lower portion 43 is covered with the vaporized precursor material M. The vaporized precursor material M condenses the carrier gas, and the condensed carrier gas is transported to the outside of the container 1.

[0063] At least one passage forming pin 44 is formed from the support cover 42 to the inside of the sub-carrier tray 4, and these pins 44 pass through the inside of the internal space of the sub-carrier tray 4 along the surface of the precursor substance M stored in the sub-carrier tray 4 and form a gas flow path. In essence, the plurality of pins 44 protrude vertically from the lower surface L of the support cover 42 toward the lower portion 43 of the sub-carrier support 41. After the precursor substance is filled, the sub-carrier support 41 is closed by the support cover 42, and therefore, the plurality of pins 44 protrude from the support cover 42 by a predetermined length, so that the remote ends of the plurality of pins 44 are spaced apart from the lower portion 43 of the sub-carrier support 41 by a distance of about 0.5 mm to 2 mm. The substance between the lower portion 43 and the remote ends of the plurality of pins 44 does not hinder the closing of the sub-carrier tray 4, and therefore, when the sub-carrier support 41 is filled with the solid precursor substance M, the support cover 42 can be easily set on the sub-carrier support 41.

[0064] In each sub-carrier tray 4, a first tray opening 46 is formed in a side wall 45 of the sub-carrier tray 4 near the open end of the sub-carrier holder 41 covered by the holder cover 42. The first tray opening 46 allows the carrier gas to pass through the gas flow path formed by the plurality of pins 44 and enter the interior of each sub-carrier tray 4. The first tray opening 46 is provided at a position close to the holder cover 42 to prevent the gas flow to the sub-carrier tray 4 from being interrupted by the stored precursor material M.

[0065] The carrier gas is supplied from the first tray opening 46 located at the side wall 45 of the sub-carrier tray 4 to the second tray opening 47 provided at the holder cover 42 through the gas flow path formed by the plurality of pins 44 in the sub-carrier tray 4. The concentrated carrier gas is supplied to the sub-carrier tray 4 after being located at the upper portion through the second tray opening 47.

[0066] In order to guide the flow of the carrier gas, the shape of the support cover 42 of each sub-carrier tray 4 corresponds to the internal cross-sectional shape of the receiving portion 12, and the carrier gas flows in a circuitous manner through each sub-carrier tray 4, thereby preventing multiple sub-carrier trays 4 from being sealed with each other. In this way, as long as the carrier gas flows through the second tray opening 47, it will be forcibly transferred to the next sub-carrier tray 4 at the upper part.

[0067] The plurality of sub-carrier trays 4 have a partition structure 48 so that a flow path can be formed between an outer surface of a lower portion 43 of the sub-carrier holder 4 and an area where the sub-carrier tray 4 is set, such as an upper surface of a holder cover 42 of the sub-carrier tray 4 directly below or the lower portion 15 of the container.

[0068] An opening 49 is formed in the partition structure 48 or the side wall of the partition structure 48 so that the carrier gas can flow from the area below the sub-carrier tray 4 to the inner side wall of the container 1. The partition structure 48 may be an essential part of the sub-carrier holder 41, or may be a separate part on the outer surface of the holder cover 42.

[0069] The wall of the container 1 can heat the carrier gas to improve the vaporization of the precursor material M. For heating, the heating element 5 can be provided in the receiving portion 12 of the container 1. The gas flow to each sub-carrier tray 4 is formed by guiding the carrier gas toward the inner wall of the receiving portion 12 of the container 1 to the first tray opening 46 of the sub-carrier holder 41 and the partition structure 48 inside the sub-carrier tray 4.

[0070] In fact, the opening of the partition structure 48 and the opening of the side wall of the sub-carrier holder 41 can be set on opposite sides based on the cross-sectional shape of the sub-carrier tray 4. Therefore, the carrier gas flow is forced to detour the sub-carrier tray 4 along the inner wall of the container 1 and receive the heat applied to the container 1, so that the precursor material M in the plurality of sub-carrier trays 4 is heated by heat transfer, radiation and convection.

[0071] For example, the plurality of pins 44 form a spiral gas passage as shown in a top view on the lower side of the support cover 42 in FIG. 2A so as to form a gas flow path through each sub-carrier tray 4. Furthermore, the second tray port 47 does not need to be formed in the center of the support cover 42, so that, for example, as shown in FIG. 2B , a curved structure can be formed by the shape of the plurality of pins 44 through the inside of the sub-carrier tray 4. The plurality of pins 44 have a longitudinal shape arranged in a comb or the like, thereby forming a gas flow path covering the entire area of ​​the sub-carrier support 41. As shown in FIG. 2C and FIG. 2D , the plurality of pins 44 can be arranged in a manner of forming a gas flow path C. Basically, preferably, a plurality of pins are arranged to generate a gas flow path C covering the entire surface of the precursor material of the sub-carrier tray, and in particular, covering more than 90% of the surface.

[0072] The channel size is selected to provide a channel that is at least as close as possible to a laminar gas flow, so that multiple surface areas are not formed on the precursor material M, and the channel is at least not covered by the channel gas flow or is only affected by a reduced carrier gas flow. In particular, the gas channel may have a Reynolds value of less than 2000, in particular, a Reynolds value of less than 5000. The thickness of the plurality of pins is approximately 2mm or in the range of 0.5mm to 5mm or in the range of 5mm to 20mm. The height of the plurality of pins is related to the depth of the tray. The pin height is greater than the depth of the tray holding the precursor material so as not to hinder the bonding, for example, it can be smaller than 0.5mm to 2mm.

[0073] Preferably, only a single carrier gas flow path is formed to prevent the gas flow from being split into two non-uniform gas flows that become more non-uniform over time due to the non-uniform vaporization of the precursor material M. The width and cross-sectional area of ​​the gas flow path C are maintained small to avoid non-uniform flow distribution. In essence, the cross-sectional area of ​​the gas flow path C formed by the plurality of pins 44 is equal to or larger than the cross-sectional area of ​​the first gas port 2 or the second gas port 3 of the container 1.

[0074] The plurality of pins 44 maintain the regeneration (refreshment) of the upper surface of the precursor material during the period when the solid precursor material is consumed, so that the height of the precursor material decreases in the same manner as the carrier gas flow stream. The plurality of pins 44 are attached to the support cover 42, so that there is the following advantage, when the plurality of pins protrude upward from the lower part of the sub-carrier support, the seal that may be required does not need to be formed on the support cover 42. In the present invention, the lower seal between the remote ends of the plurality of pins 44 and the sub-carrier support 41 is achieved by the precursor material M. The plurality of pins 44 are attached to the support cover 42, so that spillover does not occur on the plurality of pins 44, so that separation can be prevented during the process of conveying the precursor material M.

[0075] Figure 3 Another embodiment of the container 1 is shown. The same reference numerals denote structural elements with the same or similar functions.

[0076] and Figure 1Unlike the embodiment of the present invention, the first gas port 2' is provided on the container cover 13 which functions as a carrier gas inlet. Like a pipe, the gas inlet 2' passes through the through hole of each sub-carrier tray 4 and is connected to the lower part of the container 1, that is, the inlet gas guide 16 of the area below the lowermost sub-carrier tray 4. In particular, the sub-carrier support 41 is provided with a central through hole so that the space between the outer wall of the inlet gas guide 16 and the inner wall of the through hole is maintained as small as possible in order to prevent / minimize the gas flow through the space between the through hole and the inlet gas guide 16, thereby accommodating the inlet gas guide 16. The through hole penetrating the sub-carrier support is formed by the inner side wall of the pipe shape.

[0077] Furthermore, the support cover 42' at least partially forms a cover side wall 50 of the sub-carrier tray 4 in contact with the inner wall of the cylindrical space of the container 1, surrounding a portion of the side wall of the sub-carrier support 42. In essence, the cover side wall 50 vertically protrudes from the main cover surface S toward the sub-carrier support 41.

[0078] like Figure 6 As shown in detail in FIG. 4 , radial force acts between the sub-carrier support 41 and the support cover 42'. Therefore, the spring device 57 is inserted between the inner side wall of the support cover 42' and the side wall of the sub-carrier support 41, and presses multiple outer side walls of the support cover 42' or contacts the wall surface of the internal space by increasing the force of heat transfer to the sub-carrier support 41 and the support cover 42'. The spring device 57 can be formed as a leg spring.

[0079] As shown in the perspective view and the side view of FIG. 4A and FIG. 4B , respectively, the gas flow guide G is formed obliquely between the cover side wall 50 of the holder cover 42 and the side wall 45 of the sub-carrier tray, so that, preferably, a flow path is formed along the inner side wall of the cylindrical space 11 from the lower edge position of each sub-carrier tray 4 to the upper position of the sub-carrier holder located at other peripheral positions on the opposite side of the sub-carrier tray 4. The side wall 45 of the sub-carrier tray 4 has an inclined structure along the circumferential direction forming the gas flow path C together with the side wall 50 of the holder cover 42. The extension of the gas flow path C receives gas from the lower edge of each sub-carrier tray 4 and guides the gas to other peripheral positions on the upper part of each sub-carrier tray 4, so that the gas flows along the inner side wall of the container 1 and is heated.

[0080] The lower side of the sub-carrier holder 41 has a support structure 52 for being supported by a surface 53 of a holder cover 42 of the sub-carrier tray 4 provided at the lower part. The support structure 52 is provided so that the gas flows from the second tray opening 47 at any position on the upper side of the holder cover 42 toward the edge portion of the inlet opening formed with the gas flow path C along the side wall of the container 1. Figure 51 shows the lower plane of the container 1 including a recessed structure 55 and an elevated structure 56 that form the gas flow path C from the center portion M of the side wall of the lowermost sub-carrier tray 4 to the edge portion corresponding to the lower opening of the gas flow path C. The lower elevated structure 56 supports the lowermost sub-carrier tray 4 in order to ensure stable directivity parallel to the radial direction of the cylindrical space 11 of the container 1.

[0081] Furthermore, a pressurizing structure is provided between the container cover 13 of the uppermost sub-carrier tray 4 and the bracket cover 42 , and when the container is closed, force is permanently applied to the stack of multiple sub-carrier trays 4 , so that multiple sub-carrier trays can be stably arranged in the container 1 .

[0082] Description of Reference Numerals

[0083] 1: Container

[0084] 11: Cylindrical Space

[0085] 12: Containment

[0086] 13: Container cover

[0087] 15: Lower part of the containment unit

[0088] 2: First gas port

[0089] 3: Second gas port

[0090] 4: Multiple sub-carrier trays

[0091] 41: Subcarrier bracket

[0092] 42: Bracket cover

[0093] 42': Bracket cover

[0094] 43: Lower part

[0095] 44: Multiple pins

[0096] 45: Side wall of the sub-carrier tray

[0097] 46: First pallet opening

[0098] 47: Second pallet opening

[0099] 48: Separation structure

[0100] 49: Opening

[0101] 50: Cover side wall

[0102] 51: Pressurized structure

[0103] 52: Support structure

[0104] 53: Surface

[0105] 55: Concave structure

[0106] 56: Elevated structure

[0107] 57: Spring devices

[0108] 5: Heating device

[0109] M:Precursor

[0110] C: Access

Claims

1. A container (1) for vaporizing a precursor substance and transferring the vaporized precursor substance, characterized in that: include: a receiving portion (12) forming a boundary of the internal space; and A plurality of sub-carrier trays (4) are stacked one on top of the other in the inner space. As each sub-carrier tray (4) forming a gas flow path, at least one of the plurality of sub-carrier trays (4) comprises: a sub-carrier support (41), used for storing the precursor substance; and a support cover (42), used for closing the sub-carrier support (41), In essence, the support cover comprises at least one pin (44), which is formed to protrude downward toward the sub-carrier support (41) in a manner to form a gas flow path (C) covering the entire area of ​​the precursor material. The support cover (42) includes a side wall (45) surrounding the sub-carrier support and extending along a portion of the circumference, and the sub-carrier support (41) has a side wall that contacts a portion of the wall surface of the internal space. The shape and extension of the side wall (45) of the support cover (42) and the side wall (45) of the sub-carrier support (41) together with a portion of the wall surface of the internal space form an additional gas flow path.

2. The container according to claim 1, characterized in that The plurality of pins (44) form a spiral gas flow path (C) between a first tray opening (46) of a side wall (45) of the sub-carrier support (41) and the support cover (42), in particular, a second tray opening (47) at the center of the support cover (46).

3. The container according to claim 1, characterized in that The plurality of pins (44) form a curved gas flow path (C) between a first tray opening (46) of a side wall (45) of the sub-carrier support (41) and a second tray opening (47) of the support cover (42) or other portions of the side wall (45) of the sub-carrier support (41).

4. The container according to claim 2 or 3, characterized in that: The plurality of pins (44) form a gas flow path (C) between the first tray opening (46) and the second tray opening (47), and the gas flow path (C) covers at least 90% of the surface of the sub-carrier tray (4).

5. The container according to any one of claims 1 to 4, characterized in that The at least one pin (44) is substantially formed to protrude toward a lower portion of the sub-carrier support (41).

6. The container according to any one of claims 1 to 5, characterized in that The support cover (42), the surface of the precursor material and the at least one pin form a gas flow path (C) through the sub-carrier tray (4).

7. The container according to any one of claims 1 to 6, characterized in that The partition structure is formed at the bottom of the plurality of sub-carrier trays (4), and can realize carrier gas flow from a portion of the inner wall of the receiving portion of the container (1) or to a portion of the inner wall of the receiving portion of the container (1) along the bottom of each sub-carrier tray (4).

8. The container according to any one of claims 1 to 7, characterized in that The gas flow path (C) formed in the at least one sub-carrier tray (4) has a Reynolds value less than 2000, preferably, less than 5000.

9. The container according to any one of claims 1 to 8, characterized in that A heating device (5) is attached to the container (1) and heats the container (1) at least to the evaporation temperature of the precursor substance.

10. A method of delivering a vaporized precursor substance, characterized in that: The steps include: Providing a precursor substance to a container (1) according to any one of claims 1 to 9; supplying a carrier gas to the container; and The carrier gas condensed into the vaporized precursor substance is received.

11. A method of delivering a vaporized precursor substance, characterized in that: The steps include: supplying a precursor substance to a container (1) according to any one of claims 1 to 10; and The vaporized precursor material is received by vapor extraction.

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