Tail gas absorption treatment equipment and treatment method

Abstract

The tail gas absorption treatment equipment and treatment method provided by the embodiment of the application relate to the technical field of tail gas harmful component absorption treatment, and comprise a tail gas treatment device, which comprises a treatment device body, an annular overflow tank, a baffle and a spray head. The treatment device body has a treatment cavity, an air inlet end and an air outlet end. The air inlet end is arranged at the middle part of the treatment device body and is tangent to the inner wall of the treatment cavity, so that the fluid in the air inlet end enters the treatment cavity in a tangential direction. The air outlet end is located at the top of the treatment cavity. The annular overflow tank is connected with the cavity wall of the treatment cavity and is located between the air inlet end and the air outlet end. The middle part of the annular overflow tank is surrounded by a gap. The baffle is arranged directly below the gap. The spray head is installed on the baffle and located on the side of the baffle away from the air outlet end. In the embodiment of the application, the contact time of the tail gas with the annular water curtain and the spray can be increased, so that the harmful components in the tail gas can be fully reacted and absorbed, thereby improving the tail gas treatment effect.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of tail gas harmful component absorption treatment, and particularly relates to a tail gas absorption treatment equipment and a treatment method. BACKGROUND

[0002] In the semiconductor material production industry, complex mixed gas is often used for production operation, such as hydrogen as a reaction promoting gas, flammable gas as a raw material gas, and argon as an inert protective gas. The tail gas out of the production device is complex, for example, the tail gas contains flammable and explosive components, harmful components that can be absorbed by water, components that can react with water to generate dregs, and the like. At present, the tail gas is usually treated by using conventional box-type spraying and packing tower spraying, which has the disadvantages of large floor area, high investment cost, insufficient gas-liquid contact, and difficult dreg cleaning. SUMMARY

[0003] The present application aims to at least solve one of the technical problems existing in the prior art. To this end, the present application provides a tail gas absorption treatment equipment and a treatment method, which can make the tail gas fully contact with the liquid to improve the tail gas treatment effect.

[0004] Embodiments of one aspect of the present application provide a tail gas absorption treatment equipment, comprising:

[0005] The tail gas treatment device comprises a treatment device body, an annular overflow tank, a baffle and a spray head. The treatment device body has a treatment cavity, an air inlet end and an air outlet end. The air inlet end is arranged at the middle part of the treatment device body, and the air inlet end is tangent to the inner wall of the treatment cavity, so that the fluid in the air inlet end enters the treatment cavity in a tangential direction. The air outlet end is located at the top of the treatment cavity. The annular overflow tank is connected with the cavity wall of the treatment cavity, and the annular overflow tank is located between the air inlet end and the air outlet end. The middle part of the annular overflow tank is surrounded by a notch. The baffle is arranged directly below the notch, and the projection of the baffle in the vertical direction is located within the contour of the notch. The spray head is installed on the baffle and located on the side of the baffle away from the air outlet end.

[0006] Further, the annular overflow tank comprises an overflow tank body and an inclined plate. One side of the overflow tank body is connected with the inner wall of the treatment cavity. One side of the inclined plate is connected with the side of the overflow tank body close to the notch. The other side of the inclined plate is arranged downwardly inclined compared with the horizontal plane.

[0007] Further, the tail gas absorption treatment equipment further comprises an exhaust pipeline, a demister and an induced draft fan. One end of the exhaust pipeline is connected with the air outlet end. The demister is installed on the exhaust pipeline. The induced draft fan is connected with the other end of the exhaust pipeline.

[0008] Further, the exhaust pipeline is obliquely arranged to make the condensed water in the exhaust pipeline flow back to the processing cavity.

[0009] Further, the exhaust pipeline is obliquely arranged to make the condensed water in the exhaust pipeline flow back to the processing cavity.

[0010] Further, the pH adjusting device comprises a stirring device, a filter plate and a circulating assembly, the stirring device is arranged in the adjusting tank, the filter plate is arranged in the adjusting tank, wherein the filter plate and the wall of the adjusting tank enclose a filtering cavity, and the circulating assembly is used to deliver the liquid in the filtering cavity to the processing cavity.

[0011] Further, the pH adjusting device comprises a stirring device, a filter plate and a circulating assembly, the stirring device is arranged in the adjusting tank, the filter plate is arranged in the adjusting tank, wherein the filter plate and the wall of the adjusting tank enclose a filtering cavity, and the circulating assembly is used to deliver the liquid in the filtering cavity to the processing cavity.

[0012] Further, the adjusting tank is provided with a dross maintenance window, the filter plate is formed with a filter groove mounting position, the filter groove mounting position is used to place a filter groove, and the dross maintenance window is located above the filter groove.

[0013] Further, the adjusting tank is provided with a dross maintenance window, the filter plate is formed with a filter groove mounting position, the filter groove mounting position is used to place a filter groove, and the dross maintenance window is located above the filter groove.

[0014] Embodiments of the second aspect of the present application disclose a tail gas absorption processing method, applied to the tail gas absorption processing device as described above, and comprising the following steps:

[0015] Water is introduced into the annular overflow groove until the water in the annular overflow groove overflows and forms an annular water curtain;

[0016] The nozzle is opened;

[0017] Nitrogen is introduced from the gas inlet end to exhaust the air in the processing cavity;

[0018] Tail gas is introduced from the gas inlet end into the processing cavity. From the above technical solutions, it can be seen that the embodiments of the present application have at least the following beneficial effects:

[0019] In the tail gas absorption treatment device and treatment method provided by the embodiment of the application, the tail gas to be treated enters the processing cavity from the tangent direction of the processing cavity through the gas inlet end, and then rotates and rises to form a cyclone gas. In the process of spiral rising, the cyclone gas can fully contact the annular water curtain. In this process, some components in the cyclone gas react with the water curtain to produce dregs that float on the water surface, and the HCl gas in the cyclone gas is absorbed by water. After the cyclone gas passes through the annular water curtain, the cyclone gas enters the central area (i.e. the area below the baffle) and can continue to contact the water mist sprayed by the spray head. At this time, the harmful components that are easily soluble in water are further absorbed by water. After the cyclone gas rises to be blocked by the baffle, the cyclone gas passes through the annular water curtain near the baffle again, and then flows to the upper part of the processing cavity from the gap of the annular overflow groove, and is discharged from the gas outlet end. In the embodiment of the application, the tail gas enters the device main body in a tangent manner, forcing the tail gas to spiral upward, increasing the path travel of the tail gas, reducing the impact force of the tail gas, and prolonging the residence time of the tail gas in the device. The contact time of the tail gas with the annular water curtain and the spray can be increased, so that the harmful components in the tail gas are fully reacted and absorbed, thereby improving the tail gas treatment effect. At the same time, if the tail gas carries static electricity, it can also be washed and eliminated by the water curtain. Therefore, the risk of combustion and explosion of the tail gas can be greatly reduced. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the embodiments of the application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description only some embodiments of the application, and for those skilled in the art, other drawings can also be obtained without creative labor.

[0021] Figure 1 The structural schematic diagram of the tail gas absorption treatment device provided by an embodiment of the application is shown in the figure.

[0022] Figure 2 The planar schematic diagram of the tail gas absorption treatment device provided by an embodiment of the application is shown in the figure.

[0023] Figure 3 The Figure 1 The schematic diagram of the annular overflow groove and the water curtain.

[0024] Reference signs:

[0025] 1, water curtain; 2, gas flow;

[0026] 110, processing device body; 111, gas inlet end; 112, gas outlet end; 113, processing cavity; 114, upper cover plate window; 115, quick opening bolt; 120, annular overflow groove; 121, overflow groove body; 122, inclined plate; 123, flow guide part; 130, baffle; 140, spray head; 151, first pipeline; 152, second pipeline;

[0027] 210, conditioning tank; 211, drain interface; 220, communication pipe; 230, overflow pipe; 240, agitator; 250, filter plate; 251, filter tank; 260, scum inspection window; 271, third pipe; 272, fourth pipe; 281, pH meter; 282, liquid level switch; 290, circulation assembly; 291, circulation pump; 292, circulation pipe; 293, tap water on-off valve;

[0028] 310, exhaust pipe; 320, demister; 330, induced draft fan; 340, chimney. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0030] Referring to Figures 1 to 3 As shown in the drawings, the embodiments of the first aspect of the present application disclose a tail gas absorption treatment device, which comprises a tail gas treatment device, the tail gas treatment device comprising a treatment device body 110, an annular overflow tank 120, a baffle 130 and a spray head 140. The treatment device body 110 has a treatment cavity 113, an air inlet end 111 and an air outlet end 112. The air inlet end 111 is arranged at the middle part of the treatment device body 110, and the air inlet end 111 is tangent to the cavity wall of the treatment cavity 113, so that the fluid in the air inlet end 111 enters the treatment cavity 113 in a tangential direction. The air outlet end 112 is located at the top of the treatment cavity 113. The annular overflow tank 120 is connected with the inner wall of the treatment cavity 113, and the annular overflow tank 120 is located between the air inlet end 111 and the air outlet end 112. The middle part of the annular overflow tank 120 is surrounded by a notch. The baffle 130 is arranged directly below the notch, and the projection of the baffle 130 in the vertical direction is located within the profile of the notch. The spray head 140 is installed on the baffle 130 and located on the side of the baffle 130 away from the air outlet end 112.

[0031] It is worth understanding that the fluid enters the treatment cavity 113 in a tangential direction, which means that the fluid is tangent to the cavity wall of the treatment cavity 113 when it enters the treatment cavity 113. In this way, the fluid can form a cyclone gas flow 2 under the action of the cavity wall of the treatment cavity 113, thereby increasing the residence time of the gas flow 2 in the treatment cavity 113, which is beneficial to the full contact of each part of the fluid with the annular water curtain 1 or the spray.

[0032] It should be noted that the middle part of the processing device body 110 refers to any position between the bottom and the top of the processing device body 110. For example, the middle part of the processing device body 110 can be a middle position of the processing device body 110, or a position corresponding to one third of the height of the processing device body 110.

[0033] In the tail gas absorption treatment equipment provided in the embodiments of the present application, the tail gas to be treated enters the processing cavity 113 from the tangent direction of the processing cavity 113 through the gas inlet end 111, and then rotates upward to form a rotational flow gas. In the process of spiral upward movement, the rotational flow gas can fully contact the annular water curtain 1. In this process, some components in the rotational flow gas react with the water curtain 1 to produce dregs that float on the water surface, and the HCl gas in the rotational flow gas is absorbed by water. After passing through the annular water curtain 1, the rotational flow gas enters the central area (i.e. the area below the baffle 130) and can continue to contact the water mist sprayed by the spray head 140. At this time, the harmful components that are easily soluble in water are further absorbed by water. After the rotational flow gas rises to be blocked by the baffle 130, the rotational flow gas again passes through the annular water curtain 1 near the baffle 130, and then flows from the gap of the annular overflow tank 120 to the upper part of the processing cavity 113, and is discharged from the gas outlet end.

[0034] In the embodiments of the present application, the tail gas enters the device body in a tangent manner, forcing the tail gas to spiral upward, increasing the path travel of the tail gas, reducing the impact force of the tail gas, and prolonging the residence time of the tail gas in the device. This can increase the contact time of the tail gas with the annular water curtain 1 and the spray, so that the harmful components in the tail gas are fully reacted and absorbed, thereby improving the tail gas treatment effect. At the same time, if the tail gas carries static electricity, it can also be washed and eliminated by the water curtain 1. Therefore, the risk of combustion and explosion of the tail gas can be greatly reduced.

[0035] In some embodiments of the present application, referring to Figure 1 and Figure 3 , the annular overflow tank 120 includes an overflow tank body 121 and an inclined plate 122. One side of the overflow tank body 121 is connected with the inner wall of the processing cavity 113, and one side of the inclined plate 122 is connected with the side of the overflow tank body 121 close to the gap. The other side of the inclined plate 122 is arranged to be inclined downward compared with the horizontal plane. The overflow tank body 121 has an annular groove for containing water. When the water in the annular groove continuously overflows, the overflowed water can flow through the inclined plate 122 and form a stable annular water curtain 1 in the processing cavity 113.

[0036] It should be understood that, in the vertical direction, there is a gap between the projection profile of the inclined plate 122 and the profile of the baffle 130, so that the annular water curtain 1 is not blocked by the baffle 130, and the annular water curtain 1 can be prevented from being damaged by the baffle 130.

[0037] In the embodiments of the present application, referring to Figure 1 and Figure 3The annular overflow groove 120 comprises an overflow groove body 121, an inclined plate 122 and a flow guide part 123. The flow guide part 123 extends downward from the side of the overflow groove body 121 by a certain length and is intermittently formed with the baffle 130 to allow the tail gas to pass through. The upper part of the overflow groove body 121 is welded with a ring of the inclined plate 122. The angle between the inclined plate 122 and the horizontal line is set to a reasonable range to form a continuous water curtain 1 state.

[0038] For example, the angle between the inclined plate 122 and the horizontal line is set to 8°-10° to ensure the forming effect of the water curtain 1. The flow guide part 123 extends downward from the side of the overflow groove body 121 by a certain length. When there is water flow along the side, the flow guide part 123 can guide the water flow downward to prevent the water flow from flowing along the bottom of the overflow groove body 121 and affecting the forming effect of the water curtain 1.

[0039] Further, the processing device body 110 is provided with an upper cover window 114 which is located above the annular overflow groove 120. Thus, the water curtain 1 condition can be observed through the upper cover window 114, and the water supply size of the annular overflow groove 120 can be adjusted according to the water curtain 1 condition to adjust the size of the water curtain 1.

[0040] For example, the tail gas absorption treatment equipment comprises a circulating pump 291 and a circulating pipeline 292. The circulating pump 291 is used to deliver the liquid in the processing cavity 113 to the annular overflow groove 120 through the circulating pipeline 292. The size of the water curtain 1 can be adjusted by adjusting the operating frequency of the circulating pump 291.

[0041] In some embodiments of the present application, referring to Figure 1 The tail gas absorption treatment equipment comprises an exhaust pipeline 310 and an air induction fan 330. One end of the exhaust pipeline 310 is connected with the gas outlet end 112, and the air induction fan 330 is connected with the other end of the exhaust pipeline 310. Specifically, the air induction fan 330 is used to form a negative pressure in the exhaust pipeline 310 to drive the tail gas in the processing cavity 113 to flow upward and out of the gas outlet end 112. Under the joint action of the air induction fan 330 and the tail gas flowing into the processing cavity 113 in the tangential direction, the tail gas in the forming cavity can present a spiral upward airflow 2.

[0042] In a possible implementation, after the tail gas flows out of the gas outlet end 112 of the processing device body 110, it carries part of the water vapor. Since the acidic components in the tail gas are dissolved in water, the water vapor is acidic and can easily cause corrosion to the air induction fan 330 and subsequent equipment. Therefore, in the present embodiment, the tail gas absorption treatment equipment further comprises a demister 320 which is installed in the exhaust pipeline 310. The demister 320 can intercept and absorb the water vapor of the gas in the exhaust pipeline 310, so as to reduce the corrosion of the acid mist to the downstream air induction fan 330, detection instruments and the like.

[0043] Further, the exhaust pipeline 310 is arranged obliquely so that the condensed water in the exhaust pipeline 310 flows back to the processing cavity 113, which can further avoid the water bottom formed at the demister 320 from flowing to the induced draft fan 330 and the like, thereby reducing the probability of corrosion of the induced draft fan 330.

[0044] Since the exhaust gas contains combustible components, when the combustible exhaust gas directly contacts with air, there is a risk of explosion. In view of this, in some embodiments of the present application, referring to Figure 1 and Figure 2 , the exhaust gas absorption treatment device further comprises a first pipeline 151 and a second pipeline 152, the gas inlet end 111 is in fluid communication with the first pipeline 151, the first pipeline 151 is used for conveying the exhaust gas into the processing cavity 113, one end of the second pipeline 152 is connected with the first pipeline 151, the second pipeline 152 is used for conveying nitrogen into the first pipeline 151, and the second pipeline 152 is provided with a first on-off valve. Specifically, the first pipeline 151 is connected with the gas inlet end 111, when the first pipeline 151 is closed and the second pipeline 152 is opened, nitrogen can be conveyed into the processing cavity 113 through the first pipeline 151 to displace the air in the processing cavity 113, so as to achieve nitrogen sealing, and then the exhaust gas to be treated is introduced into the processing cavity 113, which can reduce the risk of explosion.

[0045] In actual application, when the exhaust gas in the first pipeline 151 contacts with the humid air in the pipeline, dregs are easily produced and adhered to the wall of the pipeline. In the embodiment, referring to Figure 1 and Figure 2 , one end of the second pipeline 152 is connected with the elbow of the first pipeline 151, so that nitrogen can be introduced into the first pipeline 151 through the second pipeline 152, and the dregs adhered to the wall of the first pipeline 151 can be flushed away by the nitrogen.

[0046] In some embodiments of the present application, referring to Figure 1 and Figure 2 , the exhaust gas absorption treatment device further comprises a pH adjusting device, the pH adjusting device comprises an adjusting tank 210, a communication pipe 220 and an overflow pipe 230, one end of the communication pipe 220 is in fluid communication with the bottom of the processing cavity 113, the other end of the communication pipe 220 is in fluid communication with the adjusting tank 210, and the overflow pipe 230 is obliquely connected with the processing cavity 113 and the adjusting tank 210, wherein the projection of the overflow pipe 230 in the vertical direction is tangent to the inner wall of the processing cavity 113, so that the dregs in the processing cavity 113 can flow into the overflow pipe 230 along the flow direction.

[0047] It should be pointed out that, referring to Figure 2, the extending direction of the projection of the overflow pipe 230 in the vertical direction is consistent with the liquid flow direction of the inlet end of the overflow pipe 230 (i.e. the joint between the overflow pipe 230 and the body 110 of the treatment device). Due to the formation of the cyclone in the treatment cavity 113, the liquid in the treatment cavity 113 can be driven to form a cyclone, and under the action of inertia, the dregs in the treatment cavity 113 can flow into the overflow pipe 230.

[0048] In the above embodiment, the position where the overflow pipe 230 communicates with the treatment cavity 113 is flush with the liquid level in the treatment cavity 113, and the liquid level is lower than the height of the air inlet end 111. In this way, the dregs floating on the liquid surface can flow into the overflow pipe 230.

[0049] Further, the height of the end of the overflow pipe 230 connected to the body 110 of the treatment device is higher than the height of the end of the overflow pipe 230 connected to the adjusting tank 210, that is, when the dregs in the treatment cavity 113 flow to the adjusting tank 210 through the overflow pipe 230, they will first contact the liquid in the adjusting tank 210. In the present embodiment, the downwardly inclined overflow pipe 230 is provided, and the outlet of the overflow pipe 230 is submerged below the liquid surface to achieve liquid sealing. In this way, it can prevent the tail gas from entering the adjusting tank 210 through the overflow pipe 230 and causing environmental accidents, and can also avoid the leakage of flammable tail gas into the adjusting tank 210 or other operating environments and cause the risk of explosion.

[0050] In the scheme of the inclined arrangement of the overflow pipe 230, the dregs in the treatment cavity 113 rotate with the large amount of liquid in the tank, and under the action of inertia, the dregs overcome the liquid seal and gradually float to the water surface of the adjusting tank 210.

[0051] In some embodiments of the present application, referring to Figure 1 and Figure 2 , the pH adjusting device comprises a stirrer 240, a filter plate 250 and a circulating assembly 290. The stirrer 240 is arranged in the adjusting tank 210, and the filter plate 250 is arranged in the adjusting tank 210, wherein the filter plate 250 and the wall surface of the adjusting tank 210 enclose a filter cavity, and the circulating assembly 290 is used to transport the liquid in the filter cavity to the treatment cavity 113. Specifically, the filter plate 250 at least separates the space in the adjusting tank 210 into a filter cavity, and the liquid flowing from the treatment cavity 113 into the adjusting tank 210 is filtered by the filter plate 250 and then flows to the filter cavity, and then is re-transported to the treatment cavity 113 by the circulating assembly 290.

[0052] In a possible implementation, referring to Figure 1 and Figure 2The circulating assembly 290 comprises a circulating pump 291 and a circulating pipeline 292, the circulating pump 291 transports the liquid in the filtering cavity into the processing cavity 113 of the processing device body 110 through the circulating pipeline 292, so as to save water. The filter plate 250 can prevent the floating sludge from being sucked into the circulating pump 291 and damaging the circulating pump 291.

[0053] Further, the end of the circulating pipeline 292 comprises a first water supply end and a second water supply end, the first water supply end is connected with the annular overflow groove 120 through a pipeline, and is used for supplying water to the annular overflow groove 120 to generate the water curtain 1, and the second water supply end is connected with the spray head 140 through a pipeline, and is used for supplying water to the spray head 140 to generate the spray.

[0054] Since the tail gas contains components that react with water to generate floating sludge, if the floating sludge is not removed, the accumulated floating sludge may block the overflow pipe 230 over time, causing the tail gas treatment system to malfunction. However, if personnel are arranged to remove the sludge at all times, the labor intensity is too large. Therefore, it is of great significance to design a set of automatic floating sludge collection facility.

[0055] In some embodiments of the present application, referring to Figure 1 and Figure 2 The adjusting tank 210 is provided with a floating sludge inspection window 260, the filter plate 250 is formed with a filter groove 251 installation position for placing the filter groove 251, and the floating sludge inspection window 260 is located above the filter groove 251. The filter groove 251 installation position is used to place the movable filter groove 251, and the upper part of the filter groove 251 is flush with the liquid level of the adjusting tank 210. In this way, the floating sludge in the adjusting tank 210 can pass over the filter plate 250 and be collected into the filter groove 251. During the operation of the tail gas absorption treatment equipment, the amount of internal floating sludge can be observed through the floating sludge inspection window 260, when it reaches a certain degree, the window can be opened and the filter groove 251 can be lifted to remove the floating sludge. The present embodiment is provided with an embedded filter groove 251, and the amount of floating sludge in the filter groove 251 can be observed through the visual inspection window. When the filter groove 251 is full, the filter groove 251 can be taken out by manually opening the quick-release bolt to remove the floating sludge.

[0056] In the above-mentioned embodiments, a filter partition plate is also arranged below the embedded filter groove 251 to filter the floating sludge and support the filter groove 251.

[0057] In some embodiments of the present application, the adjusting tank 210 is connected with a third pipeline 271 and a fourth pipeline 272, the third pipeline 271 is used to transport tap water into the adjusting tank 210, and the fourth pipeline 272 is used to transport alkaline liquid into the adjusting tank 210 to adjust the pH value of the liquid in the adjusting tank 210.

[0058] In a possible implementation, since the tail gas contains acidic gas which is absorbed by water, the pH of the spray liquid is continuously reduced, when the pH drops to 2-3, the liquid alkali valve in the fourth pipeline 272 is automatically opened, so that the alkali liquid flows into the adjusting tank 210 to adjust the pH of the wastewater, when the pH is 9-10, the liquid alkali valve is automatically closed.

[0059] In this embodiment, referring to Figure 1 and Figure 2 , the adjusting tank 210 further comprises a pH meter 281 and a liquid level switch 282, the pH meter 281 is used to detect the pH of the liquid in the adjusting tank 210, and the liquid level switch 282 is used to monitor the liquid level in the adjusting tank 210. It is to be understood that the adjusting tank 210 is in communication with the processing cavity 113, and the liquid levels of the two are the same.

[0060] In some embodiments of the present application, the processing device body 110 is provided with an upper cover window 114, which is connected to the processing device body 110 by quick-opening bolts 115. The upper cover window 114 is made of transparent PVC plate, which can facilitate the observation of the formation of the annular water curtain 1 inside the processing device body 110. The upper cover window 114 not only plays a sealing role, but also can be used to observe the annular water curtain 1, so as to facilitate the operator to adjust the operating frequency of the circulating pump 291 according to the condition of the water curtain 1, so as to adjust the water curtain 1.

[0061] Further, the upper cover window 114 is detachably installed on the processing device body 110. By disassembling the upper cover window 114, the spray head 140 can be conveniently replaced.

[0062] In some embodiments of the present application, after the tail gas enters the processing cavity 113, the humidity of the tail gas can be increased, thereby achieving the effect of removing static electricity.

[0063] In an embodiment, the tail gas absorption treatment device comprises a tail gas treatment device and a pH adjusting device, which can realize the effect of integrating the removal of dregs, the removal of static electricity and the pH adjustment.

[0064] In the embodiments of the present application, there is no rear spray tower, but the tail gas spraying and the pH adjusting tank 210 for wastewater after spraying are integrated into one whole device, which can reduce the floor area of the tail gas absorption treatment device. At the same time, by using the water curtain 1 combined with the water mist spraying treatment mode, the tail gas is fully contacted with the water curtain 1 and the water mist, and the pollutants in the exhaust gas can be absorbed and removed, and the dregs on the surface of the spray liquid can be removed at the same time in one device.

[0065] The embodiments of the second aspect of the present application disclose a tail gas absorption treatment method, which is applied to the tail gas absorption treatment device as described above, and comprises the following steps:

[0066] Water is introduced into the annular overflow tank 120 until the water in the annular overflow tank 120 overflows and forms the annular water curtain 1;

[0067] The spray head 140 is turned on;

[0068] The tail gas is introduced into the processing cavity 113 from the air inlet end 111.

[0069] In one embodiment, the tail gas absorption processing method comprises the following steps:

[0070] (1) The tap water valve in the third pipeline 271 is turned on, and when the liquid level reaches the set value of the liquid level switch 282, the tap water valve is automatically turned off. The first water supply end tap water switch valve 293 is opened, the circulating pump 291 is started, and the water in the tank 210 is adjusted to enter the annular overflow tank 120, and then overflow to the inclined plate 122 to form the annular water curtain 1; the second water supply end tap water switch valve 293 is opened to make the water flow to the spray head 140 and form a spray. The nitrogen valve in the second pipeline 152 is opened, and the nitrogen gas enters the processing cavity 113 of the processing device body 110 through the first pipeline 151 and the air inlet end 111.

[0071] (2) The induced draft fan 330 is turned on, and the tail gas to be treated enters the processing cavity 113 of the processing device body 110 from the tangent direction through the air inlet end 111, and then rotates upward to form a rotational flow gas, and the tail gas is in full contact with the annular water curtain 1 during the upward process. Specifically, one component in the tail gas reacts with the water curtain 1 to produce scum floating on the water surface, and the HCl gas in the tail gas is absorbed by the water. After the gas flow 2 passes through the annular water curtain 1, it enters the central area and continues to contact the water mist sprayed by the spray head 140, and the harmful components that are easily soluble in water are further absorbed by the water. After being blocked by the baffle 130, the tail gas passes through the annular water curtain 1 near the baffle 130 again, and comes out from the space between the inclined plate 122 and the baffle 130 to the upper part of the processing cavity 113.

[0072] (3) The tail gas comes out from the air outlet end 112 of the processing device body 110, passes through the demister 320 to remove the water mist entrained in the gas, enters the induced draft fan 330, and is discharged from the chimney 340 to meet the emission standard.

[0073] (4) The scum in the processing device body 110 enters the adjusting tank 210 in a tangent direction through the overflow pipe 230, and the floating scum overflows to the built-in filter groove 251 after passing through the top of the filter plate 250. The amount of scum accumulated in the filter groove 251 can be observed through the scum inspection window 260, and when it reaches a certain degree, the quick-opening bolt of the scum inspection window 260 can be opened to take out the filter groove 251 for cleaning the scum.

[0074] (5) Since the tail gas contains acid gas which is absorbed by water, the pH of the spray liquid in the treatment cavity 113 is continuously reduced, when the pH drops to 2-3, the liquid alkali valve in the fourth pipeline 272 is automatically opened to add alkali liquor to adjust the pH value of the wastewater, when the pH is 9-10, the liquid alkali valve is automatically closed.

[0075] In the description of the present application, it needs to be understood that the terms "center", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0076] The terms "first", "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, unless otherwise specified, the meaning of "a plurality of" is two or more.

[0077] In the description of the present application, it needs to be explained that, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be directly connected, or indirectly connected through an intermediate medium; it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0078] In the description of the present application, specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0079] It should be understood that although each step in the flowchart of the drawings is shown in sequence according to the direction of the arrow, these steps are not necessarily executed in sequence according to the direction of the arrow. Unless otherwise specified herein, the execution of these steps is not strictly limited in sequence, and they can be executed in other order. Moreover, at least part of the steps in the flowchart of the drawings can include multiple sub-steps or multiple stages, which are not necessarily executed at the same time, but can be executed at different times, and the execution sequence is not necessarily sequential, but can be executed in rotation or alternation with at least part of other steps or sub-steps or stages of other steps.

Claims

1. A tail gas absorption and treatment device, characterized in that, include: An exhaust gas treatment device includes a treatment device body, an annular overflow groove, a baffle, and a nozzle. The treatment device body has a treatment chamber, an air inlet, and an air outlet. The air inlet is located in the middle of the treatment device body and is tangential to the inner wall of the treatment chamber, so that the fluid in the air inlet enters the treatment chamber tangentially. The air outlet is located at the top of the treatment chamber. The annular overflow groove is connected to the wall of the treatment chamber and is located between the air inlet and the air outlet. A notch is enclosed in the middle of the annular overflow groove. The baffle is located directly below the notch, and the outline of the baffle's projection along the vertical direction is located within the outline of the notch. The nozzle is installed on the baffle and is located on the side of the baffle away from the air outlet. It also includes a first pipe and a second pipe, the air inlet end being in fluid communication with the first pipe, the first pipe being used to deliver exhaust gas into the processing chamber, and one end of the second pipe being connected to the first pipe, the second pipe being used to deliver nitrogen gas into the first pipe; It also includes a pH adjustment device, which includes an adjustment tank, a connecting pipe and an overflow pipe. One end of the connecting pipe is in fluid communication with the bottom of the processing chamber, and the other end of the connecting pipe is in fluid communication with the adjustment tank. The overflow pipe is obliquely connected to the processing chamber and the adjustment tank, wherein the vertical projection of the overflow pipe is tangent to the inner wall of the processing chamber. The pH adjustment device includes a stirrer, a filter plate, and a circulation assembly. The stirrer is located inside the adjustment tank, and the filter plate is located inside the adjustment tank. The filter plate and the wall of the adjustment tank enclose a filtration chamber. The circulation assembly is used to transport the liquid in the filtration chamber to the processing chamber.

2. The exhaust gas absorption and treatment equipment according to claim 1, characterized in that, The annular overflow trough includes an overflow trough body and an inclined plate. One side of the overflow trough body is connected to the inner wall of the processing chamber, and one side of the inclined plate is connected to the side of the overflow trough body near the notch. The other side of the inclined plate is inclined downward relative to the horizontal plane.

3. The exhaust gas absorption and treatment equipment according to claim 1, characterized in that, It also includes an exhaust pipe, a demister, and an induced draft fan. One end of the exhaust pipe is connected to the exhaust outlet, the demister is installed in the exhaust pipe, and the induced draft fan is connected to the other end of the exhaust pipe.

4. The exhaust gas absorption and treatment equipment according to claim 3, characterized in that, The exhaust pipe is inclined so that the condensate in the exhaust pipe flows back into the processing chamber.

5. The exhaust gas absorption and treatment equipment according to claim 1, characterized in that, The regulating tank is provided with a scum inspection window, the filter plate forms a filter tank mounting position for placing the filter tank, and the scum inspection window is located above the filter tank.

6. The exhaust gas absorption and treatment equipment according to claim 1, characterized in that, The regulating tank is connected to a third pipe and a fourth pipe. The third pipe is used to deliver tap water into the regulating tank, and the fourth pipe is used to deliver alkaline liquid into the regulating tank.

7. A method for treating exhaust gas by absorption, characterized in that, The device applied to the exhaust gas absorption and treatment apparatus as described in any one of claims 1 to 6 includes the following steps: Water is introduced into the annular overflow trough until the water overflows and forms an annular water curtain; Turn on the nozzle; Nitrogen gas is introduced from the air inlet to expel the air from the processing chamber; Exhaust gas is introduced into the processing chamber from the air inlet.

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