Plasma processing apparatus, substrate processing system and fixture

Abstract

The present invention provides a technique for facilitating attachment and detachment between components of a plasma processing apparatus and a substrate processing system. A plasma processing apparatus including a chamber is provided. The device comprises a first part; a second member; and a fixing member configured so as to be able to fix the first member and the second member together so as to be detachable in the axial direction, the fixing member including a male member fixed to the first member and a female member fixed to the second member and configured so as to be able to receive the male member. The male member includes a shaft member that extends in the axial direction and expands in diameter at the front end. The male member includes: a housing member fixed to the second member; a holding member disposed in the housing member; and a spherical member held by the holding member. The spherical member is configured so as to be capable of moving radially inward by being guided by the tapered portion of the inner wall of the housing member when the holding member moves in the axial direction in a first direction that is a direction toward the opening.

Description

Technical Field

[0001] Illustrative embodiments of the present invention relate to a plasma processing apparatus, a substrate processing system, and a fixture. Background Art

[0002] Patent Document 1 discloses that an electrostatic chuck and an electrostatic chuck mounting plate are fastened together by a plurality of first fasteners, and a mounting table for mounting a substrate is fastened to a supporting member by a plurality of second fasteners.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent document 1: Japanese Patent Application Publication No. 2019-197830. Summary of the invention

[0006] Problem that the invention aims to solve

[0007] The present invention provides a technology for facilitating assembly and disassembly of components of a plasma processing apparatus or a substrate processing system.

[0008] Technical solutions to the problem

[0009] In an exemplary embodiment of the present invention, a plasma processing device having a chamber is provided, which includes: a first component; a second component; and a fixing member, which is configured to fix the first component and the second component together in a manner that is detachable along the axial direction, the fixing member includes: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component, the convex component includes an axial component extending in the axial direction and expanding in diameter at the front end, the concave component includes: a storage component fixed to the second component; a retaining component arranged in the storage component; and a spherical component retained by the retaining component, the storage component includes: an opening for receiving the axial component of the convex component; and a storage space for accommodating the retaining component and the spherical component, the inner wall of the storage component that defines the storage space includes a tapered portion that is reduced in diameter in the radial direction, the retaining component is configured to be able to retain the spherical component while moving axially in the storage space, and the spherical component is configured to be guided by the tapered portion of the inner wall and move radially inward when the retaining component moves in a first direction that is axial and toward the opening.

[0010] Effects of the Invention

[0011] According to an exemplary embodiment of the present invention, it is possible to provide a technology that facilitates the attachment and detachment of components of a plasma processing apparatus or a substrate processing system. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1It is a diagram for explaining a configuration example of a plasma processing system.

[0013] Figure 2 It is a diagram for explaining a configuration example of a capacitive coupling type plasma processing apparatus.

[0014] Figure 3 It is a diagram schematically showing an example of the fixing structure FS.

[0015] Figure 4A This is a diagram for explaining an example of the moving position of the spherical member.

[0016] Figure 4B This is a diagram for explaining an example of the moving position of the spherical member.

[0017] Figure 5 This is a diagram showing an example of how the fixing tool F is used.

[0018] Fig. 6A It is a diagram showing another example of the driving mechanism of the holding member.

[0019] Figure 6B It is a diagram showing another example of the driving mechanism of the holding member.

[0020] Figure 7 This is a diagram for explaining another example of the fixing tool F.

[0021] Figure 8 This is a diagram for explaining another example of the fixing tool F and its operation.

[0022] Fig. 9 This is a diagram for explaining another example of the fixing tool F and its operation.

[0023] Fig.10 It is a diagram for explaining a configuration example of a substrate processing system PS.

[0024] Fig.11 It is a diagram for explaining an application example of the fixing tool F. DETAILED DESCRIPTION

[0025] Hereinafter, each embodiment of the present invention will be described.

[0026] In an exemplary embodiment, a plasma processing device having a chamber is provided, comprising: a first component; a second component; and a fixing member, which is configured to fix the first component and the second component together in a manner that is detachable along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component, the convex component including an axial component extending in the axial direction and expanding in diameter at the front end, the concave component comprising: a storage component fixed to the second component; a retaining component arranged in the storage component; and a spherical component retained by the retaining component, the storage component comprising: an opening for receiving the axial component of the convex component; and a storage space for accommodating the retaining component and the spherical component, the inner wall of the storage component that defines the storage space includes a tapered portion that is reduced in diameter in the radial direction, the retaining component is configured to be able to retain the spherical component while moving axially in the storage space, and the spherical component is configured to be guided by the tapered portion of the inner wall and move radially inward when the retaining component moves in a first direction that is axial and in the direction toward the opening.

[0027] In an exemplary embodiment, the holding member is movable in the first direction under the action of an elastic member disposed in the storage space.

[0028] In an exemplary embodiment, the holding member is movable in the first direction under the action of the first fluid flowing into the accommodation space.

[0029] In an exemplary embodiment, the holding member is movable in a second direction opposite to the first direction under the action of the second fluid flowing into the accommodation space.

[0030] In an exemplary embodiment, the storage space includes a first space into which the first fluid can flow and a second space into which the second fluid can flow, and the first space and the second space are sealed by a sealing member.

[0031] In an exemplary embodiment, the second space is provided at a position closer to the opening than the first space, and a space between the second space and the opening is sealed by a sealing member.

[0032] In an exemplary embodiment, the holding member is configured to be able to receive a force in a first direction or a force in a second direction opposite to the first direction via an air cylinder or a motor.

[0033] In an exemplary embodiment, the holding member further includes a locking structure for restricting the spherical member from moving radially inward.

[0034] In an exemplary embodiment, at least one of the first component and the second component is a component disposed in the chamber.

[0035] In an exemplary embodiment, at least one of the first component and the second component is a component constituting the chamber or a component disposed outside the chamber.

[0036] In an exemplary embodiment, a sealing member is further included for sealing a space outside the chamber and the opening when the first member and the second member are fixed by the fixing member.

[0037] In an exemplary embodiment, at least one of the first component and the second component constitutes an electrode of a plasma processing device, and the fixing member is configured to provide a conductive path to the electrode by electrically connecting the male component and the female component to each other when the first component and the second component are fixed by the fixing member.

[0038] In an exemplary embodiment, a plasma processing device having a chamber is provided, comprising: a first component; a second component; and a fixing member configured to fix the first component and the second component together in a manner that is detachable along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component, the concave component comprising: a first movable body configured to be able to move axially between a clamping position and a non-clamping position; and a second movable body, which is held by the first movable body and configured to be able to move in the clamping position to a position that limits the axial movement of the convex component, and to move in the non-clamping position to a position that does not hinder the axial movement of the convex component.

[0039] In an exemplary embodiment, at least one of the first component and the second component constitutes an electrode of a plasma processing device, and the fixture is configured to provide a conductive path to the electrode by electrically connecting the male component and the female component to each other in a clamped position.

[0040] In an exemplary embodiment, a substrate processing system having one or more chambers includes: a first component; a second component; a fixing member, which is configured to fix the first component and the second component together in a manner that is detachable along the axial direction, the fixing member includes: a convex component fixed to the first component: and a concave component fixed to the second component and configured to receive the convex component, the convex component includes an axial component extending in the axial direction and expanding in diameter at the front end, the concave component includes: a storage component fixed to the second component; a retaining component arranged in the storage component; and a spherical component retained by the retaining component, the storage component includes: an opening for receiving the axial component of the convex component; and a storage space for accommodating the retaining component and the spherical component, the inner wall of the storage component that defines the storage space includes a tapered portion that is reduced in diameter in the radial direction, the retaining component is configured to be able to retain the spherical component while moving axially in the storage space, and the spherical component is configured to be guided by the tapered portion of the inner wall and move radially inward when the retaining component moves in a first direction that is axial and toward the opening.

[0041] In an exemplary embodiment, a substrate processing system includes: a conveying chamber, which includes a wall surface provided with an opening portion, the opening portion being connected to a chamber; and an opening and closing device, which includes a closing portion, the closing portion being configured to be movable inside the conveying chamber to close the opening portion, the wall surface of the conveying chamber constituting one of a first component and a second component, and the closing portion of the opening and closing device constituting the other of the first component and the second component.

[0042] In an exemplary embodiment, a fixing member of a substrate processing system is provided, comprising: a convex member including an axis member; and a concave member that fixes the axis member of the convex member in a detachable manner, the concave member comprising: a first movable body that is configured to be movable axially between a clamping position and an unclamping position; a second movable body that is held by the first movable body and is configured to be movable in the clamping position to a position that limits the axial movement of the axis member of the convex member, and in the unclamping position to a position that does not hinder the axial movement of the convex member; and a third movable body that is configured to push the axis member of the convex member in the unclamping position to move the axis member axially.

[0043] In an exemplary embodiment, a fixing member of a substrate processing system is provided, which includes a concave component and a convex component, the concave component including: an inner wall that defines a storage space; and a locking portion arranged on a portion of the inner wall, the convex component including: an axis component, which is configured to be able to move axially inside the storage space; and a movable body, which is configured to be able to move between a clamping position that is engaged with the locking portion of the concave component and a non-clamping position that is not engaged with the locking portion of the concave component along with the axial movement of the axis component, and the axis component is configured to be able to move axially to push the inner wall of the concave component when the locking portion is in the non-clamping position.

[0044] In an exemplary embodiment, a substrate processing system is provided, which includes: the above-mentioned fixing member; a conveying chamber, which includes a wall surface provided with an opening portion, the opening portion being connected to the chamber; and an opening and closing device, which includes a closing portion, the closing portion being configured to be movable inside the conveying chamber to close the opening portion, one of the convex component and the concave component being provided on the wall surface of the conveying chamber, and the other of the convex component and the concave component facing the closing portion of the opening and closing device.

[0045] Hereinafter, various embodiments of the present invention will be described in detail with reference to the accompanying drawings. In addition, in each of the drawings, the same reference numerals are used for the same or identical elements, and repeated descriptions are omitted. Unless otherwise specified, the positional relationships such as up, down, left, and right are described based on the positional relationships shown in the drawings. The dimensional ratios in the drawings do not represent actual ratios, and the actual ratios are not limited to the ratios shown in the drawings.

[0046] <Configuration Example of Plasma Processing System>

[0047] Figure 1 : is a diagram for illustrating a structural example of a plasma processing system. In one embodiment, the plasma processing system includes a plasma processing device 1 and a control unit 2. The plasma processing system is an example of a substrate processing system, and the plasma processing device 1 is an example of a substrate processing device. The plasma processing device 1 includes a plasma processing chamber 10, a substrate support portion 11, and a plasma generating portion 12. The plasma processing chamber 10 has a plasma processing space. In addition, the plasma processing chamber 10 has at least one gas supply port for supplying at least one processing gas to the plasma processing space and at least one gas exhaust port for exhausting gas from the plasma processing space. The gas supply port is connected to the gas supply portion 20 described later, and the gas exhaust port is connected to the exhaust system 40 described later. The substrate support portion 11 is arranged in the plasma processing space and has a substrate supporting surface for supporting a substrate.

[0048] The plasma generating unit 12 is configured to generate plasma from at least one processing gas supplied into the plasma processing space. The plasma formed in the plasma processing space may be a capacitively coupled plasma (CCP: Capacitively Coupled Plasma), an inductively coupled plasma (ICP: Inductively Coupled Plasma), an ECR plasma (Electron-Cyclotron-resonance plasma), a helicon wave excited plasma (HWP: Helicon Wave Plasma) or a surface wave plasma (SWP: Surface Wave Plasma), etc. In addition, various types of plasma generating units including an AC (Alternating Current: Alternating Current) plasma generating unit and a DC (Direct Current: Direct Current) plasma generating unit may also be used. In one embodiment, the AC signal (AC electric power) used in the AC plasma generating unit has a frequency in the range of 100kHz to 10GHz. Therefore, the AC signal includes an RF (Radio Frequency: High Frequency) signal and a microwave signal. In one embodiment, the RF signal has a frequency in the range of 100kHz to 150MHz.

[0049] The control unit 2 processes computer-executable commands that cause the plasma processing device 1 to perform the various steps described in the present disclosure. The control unit 2 is capable of controlling the various elements of the plasma processing device 1 so that the various steps described herein are performed. In one embodiment, a part or all of the control unit 2 may be included in the plasma processing device 1. The control unit 2 may include a processing unit 2a1, a storage unit 2a2, and a communication interface 2a3. The control unit 2 is implemented, for example, by a computer 2a. The processing unit 2a1 may be configured to perform various control operations by reading a program from the storage unit 2a2 and executing the read program. The program may be pre-stored in the storage unit 2a2, or may be acquired via a medium when necessary. The acquired program is stored in the storage unit 2a2, and is read and executed from the storage unit 2a2 by the processing unit 2a1. The medium may be various storage media readable by the computer 2a, or may be a communication line connected to the communication interface 2a3. The processing unit 2a1 may be a CPU (Central Processing Unit). The storage unit 2a2 may include a RAM (Random Access Memory), a ROM (Read Only Memory), a HDD (Hard Disk Drive), an SSD (Solid State Drive), or a combination thereof. The communication interface 2a3 may also communicate with the plasma processing device 1 via a communication line such as a LAN (Local Area Network).

[0050] Hereinafter, a configuration example of a capacitive coupling type plasma processing apparatus will be described as an example of the plasma processing apparatus 1 . Figure 2 It is a diagram for explaining a configuration example of a capacitive coupling type plasma processing apparatus.

[0051] A capacitively coupled plasma processing apparatus 1 includes a plasma processing chamber 10, a gas supply unit 20, a power supply 30, and an exhaust system 40. In addition, the plasma processing apparatus 1 includes a substrate support unit 11 and a gas introduction unit. The gas introduction unit is configured to be able to introduce at least one processing gas into the plasma processing chamber 10. The gas introduction unit includes a shower head 13. The substrate support unit 11 is disposed in the plasma processing chamber 10. The shower head 13 is disposed above the substrate support unit 11. In one embodiment, the shower head 13 constitutes at least a portion of the ceiling of the plasma processing chamber 10. The plasma processing chamber 10 has a plasma processing space 10s defined by the shower head 13, the side wall 10a of the plasma processing chamber 10, and the substrate support unit 11. The plasma processing chamber 10 is grounded. The shower head 13 and the substrate support unit 11 are electrically insulated from the shell of the plasma processing chamber 10.

[0052] The substrate support portion 11 includes a main body 111 and a ring assembly 112. The main body 111 has a central region 111a for supporting a substrate W and an annular region 111b for supporting the ring assembly 112. A wafer is an example of a substrate W. The annular region 111b of the main body 111 surrounds the central region 111a of the main body 111 when viewed from above. The substrate W is arranged on the central region 111a of the main body 111, and the ring assembly 112 is arranged on the annular region 111b of the main body 111 in a manner of surrounding the substrate W on the central region 111a of the main body 111. Therefore, the central region 111a is also referred to as a substrate support surface for supporting the substrate W, and the annular region 111b is also referred to as a ring support surface for supporting the ring assembly 112.

[0053] In one embodiment, the main body 111 includes a base 1110 and an electrostatic chuck 1111. The base 1110 includes a conductive component. The conductive component of the base 1110 can function as a lower electrode. The electrostatic chuck 1111 is arranged on the base 1110. The electrostatic chuck 1111 includes a ceramic component 1111a and an electrostatic electrode 1111b arranged in the ceramic component 1111a. The ceramic component 1111a has a central area 111a. In one embodiment, the ceramic component 1111a also has an annular area 111b. In addition, other components surrounding the electrostatic chuck 1111, such as an annular electrostatic chuck and an annular insulating component, may also have an annular area 111b. In this case, the ring assembly 112 may be arranged on the annular electrostatic chuck or the annular insulating component, or on both the electrostatic chuck 1111 and the annular insulating component. In addition, at least one RF / DC electrode coupled to the RF power supply 31 and / or DC power supply 32 described later may also be arranged in the ceramic component 1111a. In this case, at least one RF / DC electrode functions as a lower electrode. In the case where the bias RF signal and / or DC signal described later is supplied to at least one RF / DC electrode, the RF / DC electrode is also referred to as a bias electrode. In addition, the conductive component of the base 1110 and at least one RF / DC electrode may also function as multiple lower electrodes. In addition, the electrostatic electrode 1111b may also function as a lower electrode. Therefore, the substrate support portion 11 includes at least one lower electrode.

[0054] The ring assembly 112 includes one or more ring-shaped components. In one embodiment, the one or more ring-shaped components include one or more edge rings and at least one cover ring. The edge ring is formed of a conductive material or an insulating material, and the cover ring is formed of an insulating material.

[0055] In addition, the substrate support portion 11 may also include a temperature regulating module configured to adjust at least one of the electrostatic chuck 1111, the ring assembly 112 and the substrate to a target temperature. The temperature regulating module may include a heater, a heat conducting medium, a flow path 1110a or a combination thereof. A heat transfer fluid such as brine or gas flows in the flow path 1110a. In one embodiment, the flow path 1110a is formed in the base 1110, and one or more heaters are arranged in the ceramic part 1111a of the electrostatic chuck 1111. In addition, the substrate support portion 11 may also include a heat transfer gas supply portion configured to supply a heat transfer gas to the gap between the back side of the substrate W and the central area 111a.

[0056] The shower head 13 is configured to be able to introduce at least one processing gas from the gas supply unit 20 into the plasma processing space 10s. The shower head 13 has at least one gas supply port 13a, at least one gas diffusion chamber 13b and a plurality of gas introduction ports 13c. The processing gas supplied to the gas supply port 13a is introduced into the plasma processing space 10s from the plurality of gas introduction ports 13c through the gas diffusion chamber 13b. In addition, the shower head 13 includes at least one upper electrode. In addition, in addition to the shower head 13, the gas introduction unit may also include one or more side gas injection units (SGI: Side Gas Injector) installed in one or more openings formed on the side wall 10a.

[0057] The gas supply unit 20 may also include at least one gas source 21 and at least one flow controller 22. In one embodiment, the gas supply unit 20 is configured to supply at least one processing gas from the corresponding gas source 21 to the shower head 13 via the corresponding flow controller 22. Each flow controller 22 may also include, for example, a mass flow controller or a pressure-controlled flow controller. In addition, the gas supply unit 20 may also include at least one flow modulation device for modulating or pulsing the flow of at least one processing gas.

[0058] The power supply 30 includes an RF power supply 31 coupled to the plasma processing chamber 10 via at least one impedance matching circuit. The RF power supply 31 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. Thus, plasma is formed from at least one processing gas supplied to the plasma processing space 10s. Therefore, the RF power supply 31 can function as at least a part of the plasma generating unit 12. In addition, by supplying a bias RF signal to at least one lower electrode, a bias potential can be generated on the substrate W, and ion components in the formed plasma can be introduced into the substrate W.

[0059] In one embodiment, the RF power supply 31 includes a first RF generator 31a and a second RF generator 31b. The first RF generator 31a is coupled to at least one lower electrode and / or at least one upper electrode via at least one impedance matching circuit, and is configured to generate a generation source RF signal (generation source RF power) for plasma generation. In one embodiment, the generation source RF signal has a frequency in the range of 10 MHz to 150 MHz. In one embodiment, the first RF generator 31a may also be configured to generate a plurality of generation source RF signals having different frequencies. The generated one or more generation source RF signals are supplied to at least one lower electrode and / or at least one upper electrode.

[0060] The second RF generating unit 31b is coupled to at least one lower electrode via at least one impedance matching circuit, and is configured to generate a bias RF signal (bias RF power). The frequency of the bias RF signal may be the same as or different from the frequency of the generating source RF signal. In one embodiment, the bias RF signal has a frequency lower than the frequency of the generating source RF signal. In one embodiment, the bias RF signal has a frequency in the range of 100kHz to 60MHz. In one embodiment, the second RF generating unit 31b may also be configured to generate a plurality of bias RF signals having different frequencies. The generated one or more bias RF signals are supplied to at least one lower electrode. In addition, in various embodiments, at least one of the generating source RF signal and the bias RF signal may also be pulsed.

[0061] In addition, the power supply 30 may also include a DC power supply 32 coupled to the plasma processing chamber 10. The DC power supply 32 includes a first DC generating unit 32a and a second DC generating unit 32b. In one embodiment, the first DC generating unit 32a is connected to at least one lower electrode and is configured to generate a first DC signal. The generated first DC signal is applied to at least one lower electrode. In one embodiment, the second DC generating unit 32b is connected to at least one upper electrode and is configured to generate a second DC signal. The generated second DC signal is applied to at least one upper electrode.

[0062] In various embodiments, the first and second DC signals may also be pulsed. In this case, a sequence of voltage pulses is applied to at least one lower electrode and / or at least one upper electrode. The voltage pulse may have a pulse waveform of a rectangle, a trapezoid, a triangle, or a combination thereof. In one embodiment, a waveform generator for generating a sequence of voltage pulses according to a DC signal is connected between the first DC generator 32a and at least one lower electrode. Therefore, the first DC generator 32a and the waveform generator constitute a voltage pulse generator. In the case where the second DC generator 32b and the waveform generator constitute a voltage pulse generator, the voltage pulse generator is connected to at least one upper electrode. The voltage pulse may have a positive polarity or a negative polarity. In addition, the sequence of voltage pulses may also include one or more positive polarity voltage pulses and one or more negative polarity voltage pulses in one cycle. In addition, the first and second DC generators 32a, 32b may be further provided on the basis of the RF power supply 31, and the first DC generator 32a may also be provided instead of the second RF generator 31b.

[0063] The exhaust system 40 can be connected to the gas exhaust port 10e provided at the bottom of the plasma processing chamber 10, for example. The exhaust system 40 can also include a pressure regulating valve and a vacuum pump. The pressure in the plasma processing space 10s is regulated by the pressure regulating valve. The vacuum pump can include a turbomolecular pump, a dry pump, or a combination thereof.

[0064] <An example of a fixing member F>

[0065] Figure 3 FIG. 1 is a diagram schematically showing an example of a fixing tool F according to an embodiment. In one embodiment, the fixing tool F can be used to fix Figure 1 , Figure 2 The fixing member F is configured to fix the two components of the plasma processing device 1 in an axial direction ( Figure 3 The axial direction can be changed according to the configuration of the components fixed by the fixing member F. The axial direction can be perpendicular to the horizontal plane (the main surface of the substrate support part 11) of the plasma processing device 1. Figure 2 The up and down direction) can also be parallel to the direction ( Figure 2 The left and right directions can also be tilted directions.

[0066] like Figure 3 As shown, the fixing member F includes a male part F1 and a female part F2. The male part F1 is fixed to a first part CP1 (not shown) as a component of the plasma processing apparatus 1. The female part F2 is fixed to a second part CP2 (not shown) as a component of the plasma processing apparatus 1.

[0067] In one embodiment, at least one of the first component CP1 and the second component CP2 may be a component (e.g., an electrostatic chuck 1111, a susceptor 1110, etc.) disposed in a plasma processing chamber 10 (hereinafter also referred to as “chamber 10”). For example, the first component CP1 may be an electrostatic chuck 1111, and the second component CP2 may be a susceptor 1110. In addition, for example, the first component CP1 may also be a susceptor 1110, and the second component CP2 may also be an electrostatic chuck 1111. In one embodiment, the first component CP1 and / or the second component CP2 may constitute a lower electrode of the plasma processing device 1. In one embodiment, at least one of the first component CP1 and the second component CP2 may be a component constituting the chamber 10 (e.g., a showerhead 13, a sidewall 10a, etc.). For example, the first component CP1 may be a showerhead 13, and the second component CP2 may be a sidewall 10a. In addition, for example, the first component CP1 may also be a sidewall 10a, and the second component CP2 may also be a showerhead 13. In addition, for example, when the shower head 13 is composed of a plurality of components, the first component CP1 may be one component of the shower head 13 (in one example, a top plate facing the plasma processing space 10s), and the second component CP2 may be another component of the shower head 13 (for example, a support body supporting the top plate). In one embodiment, the first component CP1 and / or the second component CP2 may constitute an upper electrode of the plasma processing device 1. In one embodiment, at least one of the first component CP1 and the second component CP2 may be a component outside the chamber 10 (for example, a gas supply unit 20, an exhaust system 40, etc.).

[0068] In one embodiment, the first component CP1 and the second component CP2 may be composed of one or more components. In one embodiment, at least one of the first component CP1 and the second component CP2 may be a component that is replaced due to consumption, modification, etc.

[0069] like Figure 3 As shown, the convex part F1 includes a shaft part F10 extending in the axial direction (z direction). The shaft part F10 includes a head F102 with an expanded diameter at one end in the axial direction. The convex part F1 may include a support part F12 supporting the other end of the shaft part F10. In one embodiment, the convex part F1 may be fixed to the first part CP1 by fixing the support part F12 to the first part CP1 (not shown). In one embodiment, a first sealing part SL1 may be provided on the surface of the support part F12.

[0070] In one embodiment, the male member F1 may not include the support member F12. In this case, the other end of the shaft member F10 is fixed to the first member CP1, so that the male member F1 is fixed to the first member CP1.

[0071] like Figure 3 As shown, the female component F2 includes: a housing component F20; a holding component F22 disposed in the housing component F20; and a spherical component F24 held by the holding component F22.

[0072] The storage part F20 includes an outer wall W1 and an inner wall W2. In one embodiment, at least a portion of the outer wall W1 of the storage part F20 is fixed to the second part CP2 (not shown).

[0073] In addition, in one embodiment, a portion of the second component CP2 may also constitute a portion of the outer wall W1 and the inner wall W2 of the storage component F20. Figure 3 The upper end F200 of the storage component F20 may be a part of the second component CP2 or may be integrated with the second component CP2. In this case, a second sealing component SL2 may be provided to seal between the upper end F200 of the storage component F20 and the remaining portion.

[0074] The inner wall W2 of the storage component F20 defines the storage space SP and the opening OP. The storage space SP stores the holding component F22, the spherical component F24, etc. In one embodiment, the storage space SP can be divided into a plurality of spaces that are sealed from each other. Figure 3 In the example shown, the storage space SP is divided into a first space SP1, a second space SP2, and a third space SP3 from the distal side to the proximal side of the opening OP. The first space SP1 and the second space SP2 can be configured to receive the first fluid FL1 and the second fluid FL2 described later, respectively. In this case, the first space SP1 is connected to the opening through which the first fluid FL1 flows in and / or flows out. In addition, the second space SP2 is connected to the opening through which the second fluid FL2 flows in and / or flows out. The third space SP3 is a space in which the spherical component F24 is configured. In one embodiment, a third sealing component SL3 can be provided between the first space SP1 and the second space SP2. In one embodiment, a fourth sealing component SL4 can be provided between the second space SP2 and the third space SP3.

[0075] The opening OP is connected to the third space SP3. The opening OP has a larger diameter than the head F102 of the shaft member F10. Thus, the shaft member F10 can be inserted and removed from the storage space SP through the opening OP. In addition, a tapered portion TP is provided on the inner wall W2 defining the third space SP3. Figure 3 As shown, the tapered portion TP is axially oriented in a first direction ( Figure 3 The tapered portion TP is formed along the radial direction ( Figure 3The guide component of the spherical component F24 (in the Y-axis direction) functions.

[0076] The holding member F22 is configured to be able to move in the axial direction within the storage space SP while holding the spherical member F24. Specifically, the holding member F22 can move in the first direction toward the opening OP and in the second direction (ie, the direction opposite to the first direction) within the storage space SP. Figure 3 That is, the holding member F22 can reciprocate along the axial direction in the storage space SP. The holding member F22 is an example of a first moving body.

[0077] In one embodiment, the second fluid FL2 may flow into the second space SP2. The holding member F22 may be moved in the second direction by pressing the first surface F220 (the surface facing the first direction) of the holding member F22 with the second fluid FL2 flowing into the second space SP2.

[0078] In one embodiment, an elastic component F26 (e.g., a compression spring) may be disposed in the first space SP1. Furthermore, the movement of the retaining component F22 in the first direction may be performed by using the elastic component F26 to push the second surface F222 (the surface facing the second direction) of the retaining component F22. In one embodiment, a first fluid FL1 may flow into the first space SP1. Furthermore, the movement of the retaining component F22 in the first direction may be performed by using the first fluid FL1 flowing into the first space SP1 to push the second surface F222 of the retaining component F22. In one embodiment, the movement of the retaining component F22 in the first direction may be performed by using the elastic component F26 and the second fluid FL2 to push the second surface F222 of the retaining component F22.

[0079] In one embodiment, the retaining member F22 may include a member that limits the spherical member F24 from moving in the radial direction ( Figure 3 The locking structure can be, for example, Figure 3 Protrusion F224 as shown.

[0080] The spherical member F24 is held by the holding member F22. The spherical member F24 is moved in the axial direction ( Figure 3 When moving in the Z-axis direction), it is guided by the tapered portion TP of the inner wall W2 and also moves in the radial direction ( Figure 3 The spherical component F24 is an example of the second movable body. In one embodiment, two or more spherical components F24 are provided.

[0081] As described above, the first component CP1 and the second component CP2 may constitute a part of the electrode (upper electrode or lower electrode) of the plasma processing device 1. Including such a case, in one embodiment, the convex component F1 and the concave component F2 of the fixing member F may be configured to be electrically connected to each other. For example, the supporting component F12 of the convex component F1, the shaft component F10, the spherical component F24 of the concave component F2, the retaining component F22, the elastic component F26 and the upper end F200 of the storage component F20 may be composed of conductive components. As described later Figure 5 As shown in (c), in a state where the convex part F1 is fixed so as not to be able to move in the axial direction relative to the concave part F2, the shaft part F10 contacts the spherical part F24. Moreover, a conductive path for current is formed through the support part F12 of the convex part F1, the shaft part F10, the spherical part F24 of the concave part F2, the retaining part F22, the elastic part F26 and the upper end F200 of the storage part F20. As a result, the convex part F1 is electrically connected to the concave part F2. That is, the fixing part F can function as a conductive path between the first part CP1 and the second part CP2 when the first part CP1 and the second part CP2 are fixed. For example, when the first part CP1 and the second part CP2 are fixed, the current supplied to the first part CP1 can be supplied to the second part CP2 via the fixing part F. In addition, for example, when the first part CP1 and the second part CP2 are fixed, the current supplied to the second part CP2 can be supplied to the first part CP1 via the fixing part F.

[0082] Figure 4A and Figure 4B This is a diagram for explaining an example of the moving position of the spherical member. Figure 4A This is an example of a state in which the holding member F22 is moved maximally in the second direction of the opening OP (the direction away from the opening OP) (hereinafter, this position is also referred to as an “unclamping position”). Figure 4B This is an example of a state in which the holding member F22 is moved maximally in the first direction (the direction approaching the opening OP) (hereinafter, this position is also referred to as a “clamping position”).

[0083] like Figure 4A As shown, in the non-clamping position, the spherical part F24 abuts against the upper side (the far side relative to the opening OP) of the tapered portion TP. At this time, the radial distance between the spherical parts F24 is D1. D1 is larger than the maximum width of the head F102 of the shaft part F10. Figure 4B As shown, in the clamped position, the spherical member F24 abuts against the lower side (proximal side relative to the opening OP) of the tapered portion TP. At this time, the radial distance between the spherical members F24 is D2. D2 is smaller than the maximum width of the head F102 of the shaft member F10.

[0084] <Example of using the fixing member F>

[0085] Figure 5 This is a diagram showing an example of how the fixing tool F is used. Figure 5 This is an example of a method of fixing the male component F1 of the fixture F (and the first component CP1 fixed to the male component F1) to the female component F2 (and the second component CP2 fixed to the female component F2).

[0086] First, the convex part F1 of the fixing member F faces the concave part F2 in the second direction ( Figure 5 In addition, the concave part F2 may also move in the first direction toward the convex part F1. Then, the shaft part F10 of the convex part F1 is inserted into the third space SP3 through the opening OP of the storage part F20 (refer to Figure 5 At this time, the retaining part F22 of the concave part F2 is in the non-clamping position.

[0087] When the support member F12 of the male member F1 contacts the outer wall W1 of the receiving member F20 of the female member F2, the shaft member F10 of the male member F1 is disposed in the third space SP3 of the receiving member F20 (see Figure 5 (b)). Then, the second fluid FL2 flows out from the second space SP2. Then, the retaining member F22 of the concave member F2 is moved in the first direction ( Figure 5 At this time, in order to promote the movement in the first direction, the first fluid FL1 may also flow into the first space SP1.

[0088] When the male member holding member F22 moves to the clamping position, the radial distance between the spherical members F24 is narrowed, and the head F102 of the shaft member F10 is clamped between the spherical members F24 (see Figure 5 (c)). The movement of the spherical part F24 to the radial outside is restricted by the tapered portion TP of the inner wall W2. Therefore, the axial movement of the shaft part F10 is restricted. As a result, the convex part F1 is fixed relative to the concave part F2 in a manner that it cannot move in the axial direction. As a result, the first part CP1 is fixed relative to the second part CP2. In addition, when the convex part F1 of the fixing member F is removed from the concave part F2 (the first part CP1 is removed from the second part CP2), it can be performed in the reverse order to the above.

[0089] By using the fixture F, it is possible to perform assembly and disassembly of the components of the plasma processing device 1 by mechanically operating the fixture F without using fasteners (screws). Thus, it is possible to easily perform assembly and disassembly of the components in the plasma processing device 1. By using the fixture F, compared with the case of using fasteners, it is possible to reduce the number of working hours and working time in maintenance such as assembly of the plasma processing device, replacement of consumables, and modification.

[0090] <Another Example of Driving Mechanism for Holding Member>

[0091] Fig. 6A and Figure 6B is a diagram showing another example of a driving mechanism for a holding component. Fig. 6A As shown, the upper end of the retaining member F22 of the concave member F2 may be connected to the cylinder member F28. The cylinder member F28 may be configured to be able to reciprocate along the axial direction, thereby applying forces in the first direction and the second direction to the retaining member F22. In one embodiment, as Figure 6B As shown, the upper end of the holding member F22 of the concave member F2 can be connected to the rack of the rack and pinion system F29. The rack and pinion system F29 transmits the rotational motion of the motor to the rack via the gear. The rack reciprocates in the axial direction according to the rotation direction of the motor, thereby being able to apply forces in the first direction and the second direction to the holding member F22.

[0092] <Another example of the fixing member F>

[0093] Figure 7 FIG. 2 is a diagram for explaining another example of the fixing member F. Figure 7 In the example shown, the other end of the shaft member F10 of the convex member F1 is fixed in a manner of being embedded in the first member CP1. In addition, the concave member F2 is fixed in a manner of being embedded in the second member CP2 as a whole. In one embodiment, a first sealing member SL1 may be arranged on the opposing surfaces of the first member CP1 and the second member CP2. The first sealing member SL1 seals between the external space SPout (for example, the space outside the chamber 10) and the opening OP of the storage member F20.

[0094] In one embodiment, each structure of the fixing member F may be composed of multiple parts. Figure 7 As shown, the storage part F20 of the concave part F2 can be composed of a plurality of parts (F20A to F20C).

[0095] Figure 8 FIG. 2 is a diagram for explaining another example of the fixing member F and its operation. Figure 8In the example shown, the concave part F2 includes a pushing part F25 that pushes the shaft part F10 of the convex part F1. The pushing part F25 is arranged in the storage space SP of the storage part F20 and is configured to be movable in the axial direction. The pushing part F25 includes a head F250 and a shaft part F252 extending in the axial direction from the center of the head F250. The storage space SP includes a fourth space SP4 and a first space SP1 divided by the head F250. The front end of the shaft part F252 is arranged to penetrate the central part of the retaining part F22. The pushing part F25 is an example of a third moving body.

[0096] When the retaining member F22 is moved from the clamping position (refer to Figure 8 (a)) to the unclamped position (refer to Figure 8 When the spherical member F24 moves in the first direction (b), the engagement between the spherical member F24 and the head F102 of the shaft member F10 is released. In this state, the fourth fluid FL4 flows into the fourth space SP4. Then, the pressing member F25 moves in the first direction ( Figure 8 At this time, the first fluid FL1 may flow out of the first space SP1, or the first space SP1 may be sealed to prevent the first fluid FL1 from flowing out.

[0097] As the pressing member F25 moves in the first direction, the shaft portion F252 abuts against the head portion F102 of the shaft member F10, pushing the shaft member F10 out in the first direction (see Figure 8 (c)). As a result, the female component F2 (and the second component CP2) and the male component F1 (and the first component CP1) are separated from each other (hereinafter, this position is referred to as the "pushing position").

[0098] However, when the retaining member F22 is in the unclamped position ( Figure 8 In the state (b)), there is a case where the convex part F1 and the concave part F2 are fixed to each other, for example, at their boundary surface TH1. In such a case, the two cannot be separated unless the fixing is released. In addition, it is difficult to detect whether such fixing actually occurs in a non-contact manner.

[0099] In this regard, Figure 8 In the illustrated configuration, including in the non-clamped position ( Figure 8 (b)) The pressing member F25 of the shaft member F10 pushes the convex member F1. Therefore, even if the convex member F1 and the concave member F2 are fixed, the convex member F1 and the concave member F2 can be separated ( Figure 8 (c)).

[0100] In one embodiment, the clamping position can be changed from the non-clamping position ( Figure 8 (b)) to the push-out position ( Figure 8(c)) During the transfer process, the first space SP1 is sealed and the pressure in the first space SP1 is detected. In this way, it is possible to detect whether the pushing component F25 has actually reached the push-out position. For example, when the pressure of the first space SP1 rises to a given pressure after a certain period of time, it is determined that the pushing component F25 has moved to the push-out position. In addition, when the pressure of the first space SP1 has not reached the given pressure after a certain period of time, it is determined that the pushing component F25 has not moved to the push-out position (the convex component F1 and the concave component F2 are firmly fixed). In this way, it is possible to detect whether the convex component F1 and the concave component F2 are actually separated.

[0101] Fig. 9 FIG. 2 is a diagram for explaining another example of the fixing member F and its operation. Fig. 9 In the example shown, the fixing member F includes a female part F3 and a male part F4. The female part F3 includes an inner wall W3 defining the storage space SP5. A part of the inner wall W3 includes a tapered engagement portion EG that expands in diameter in the radial direction.

[0102] The male member F4 includes a support base F40, a shaft member F42, a spherical member F44, a holding member F46, and a storage member F48.

[0103] The support platform F40 is provided in the storage space of the storage component F48, and defines the sixth space SP6 and the seventh space SP7. The support platform F40 moves in a first direction (z1 direction) along the axial direction and a second direction (z2 direction) opposite to the first direction as the fluid flows into or out of the sixth space SP6 and the seventh space SP7 respectively. The shaft component F42 is fixed to the support platform F40, and moves in the first direction and the second direction inside the storage space SP5 as the support platform F40 moves. The shaft component F42 includes a neck F420 that is reduced in diameter along the axial direction.

[0104] The spherical member F44 moves between the clamping position and the unclamping position in a state where the concave member F3 and the convex member F4 are in contact with each other.

[0105] Specifically, when the fluid flows into the sixth space SP6 and the support platform F40 and the shaft component F42 move in the first direction (z1 direction), the spherical component F44 moves radially outward (at this time, the axial movement of the spherical component F44 is restricted by the retaining component F46). As a result, the spherical component F44 engages with the engaging portion EG of the concave component F3 (see Fig. 9 (a)). This position is a clamping position, and the female part F3 and the male part F4 are fixed in a manner that they cannot move axially relative to each other.

[0106] In addition, when the fluid flows into the seventh space SP7 and the support platform F40 and the shaft member F42 move in the second direction (z2 direction), the spherical member F44 moves radially inward along the neck F420 of the shaft member F42 (at this time, the axial movement of the spherical member F44 is restricted by the retaining member F46). As a result, the engagement between the spherical member F44 and the engagement portion EG of the concave member F3 is released (see FIG. Fig. 9 (b)). This position is a non-clamped position, and the female part F3 and the male part F4 are movable axially relative to each other.

[0107] In this state, the fluid can flow further into the seventh space SP7. Then, the support platform F40 and the shaft component F42 move further toward the second direction. At this time, the fluid can flow out of the sixth space SP6, and the sixth space SP6 can be sealed to prevent the fluid from flowing out. As the support platform F40 and the shaft component F42 move toward the second direction, the shaft component F42 pushes the inner wall W3 of the concave component F3 along the second direction (refer to Fig. 9 (c)). As a result, the concave part F3 and the convex part F4 are separated from each other (hereinafter, this position is referred to as "separated position").

[0108] However, even if the spherical member F44 is in the unclamping position ( Fig. 9 In (b)), there is also a case where the concave part F3 and the convex part F4 are fixed to each other, for example, at their boundary surface TH2. In such a case, the two cannot be separated unless the fixing is released. In addition, it is difficult to detect whether such fixing actually occurs in a non-contact manner.

[0109] In this regard, Fig. 9 In the structure shown in the figure, by moving the support platform F40 and the shaft member F42 from the non-clamping position ( Fig. 9 (b)) moves in the second direction, and can push the inner wall W3 ( Fig. 9 (c)). Thus, even when the concave part F3 and the convex part F4 are fixedly connected, the two can be separated. Fig. 9 (b)) to the separation position ( Fig. 9During the transfer of (c)), the sixth space SP6 can be sealed and the pressure of the sixth space SP6 can be detected. Moreover, when the pressure of the sixth space SP6 rises to a given pressure after a certain period of time, it is determined that the support platform F40 and the shaft component F42 have moved to the separation position. In addition, when the pressure of the sixth space SP6 does not reach the given pressure after a certain period of time, it is determined that the support platform F40 and the shaft component F42 have not moved to the separation position (the concave component F3 and the convex component F4 are firmly fixed). In this way, it is possible to detect whether the concave component F3 and the convex component F4 are actually separated.

[0110] <Application example to substrate processing system>

[0111] In one embodiment, the fixing member F may be used to fix components of a substrate processing system (hereinafter also referred to as "substrate processing system PS") including one or more chambers.

[0112] Fig.10 1 is a diagram for explaining a structural example of a substrate processing system PS. The substrate processing system PS includes substrate processing chambers PM1 to PM6 (hereinafter collectively referred to as "substrate processing modules PM"), a transport module TM, load lock modules LLM1 and LLM2 (hereinafter collectively referred to as "load lock modules LLM"), a loading module LM, and load ports LP1 to LP3 (hereinafter collectively referred to as "load ports LP"). The control unit CT controls each structure of the substrate processing system PS and performs a given process on the substrate W.

[0113] The substrate processing module PM has a chamber in which etching, trimming, film forming, annealing, doping, photolithography, cleaning, ashing, and other processes are performed on the substrate W. At least one of the substrate processing chambers PM1 to PM6 may be Figure 1 or Figure 2 The chamber 10 of the plasma processing apparatus 1 shown in FIG. 1 is a chamber 10 of the plasma processing apparatus 1 shown in FIG. 1. In addition, at least one of the substrate processing chambers PM1 to PM6 may be a part of a plasma processing apparatus using any plasma source such as inductively coupled plasma, microwave plasma, etc. At least one of the substrate processing chambers PM1 to PM6 may be a measurement module, for example, the film thickness of a film formed on the substrate W, the size of a pattern formed on the substrate W, etc. may be measured using an optical method.

[0114] The transport module TM has a transport device for transporting substrates W, and transports substrates W between substrate processing modules PM or between substrate processing module PM and load lock module LLM. The substrate processing module PM and load lock module LLM are arranged adjacent to the transport module TM. The transport module TM is spatially isolated or connected to the substrate processing module PM and load lock module LLM by a gate valve that can be opened and closed.

[0115] In one embodiment, the conveying device included in the conveying module TM conveys the substrate W from the conveying module TM to the plasma processing space 10s of the plasma processing device 1 as an example of the substrate processing module PM. The conveying device places the substrate W on the central area 111a of the substrate support part 11. The plasma processing device 1 may have an elevator, and the conveying device can place the substrate W on the elevator. The elevator is configured to be able to rise and fall inside a plurality of through holes provided in the substrate support part 11. When the elevator rises, the front end of the elevator protrudes from the central area 111a of the substrate support part 11, and the substrate W is held at this position. When the elevator descends, the front end of the elevator is stored in the substrate support part 11, and the substrate W is placed on the central area 111a of the substrate support part 11. As an example, the conveying device may be a transport device for conveying substrates such as silicon wafers.

[0116] The loading interlock modules LLM1 and LLM2 are arranged between the conveying module TM and the loading module LM. The loading interlock module LLM can switch the pressure inside it to atmospheric pressure or vacuum. "Atmospheric pressure" can be the pressure outside each module included in the substrate processing system PS. In addition, "vacuum" is a pressure lower than atmospheric pressure, for example, it can be a medium vacuum of 0.1Pa to 100Pa. The loading interlock module LLM conveys the substrate W from the loading module LM of atmospheric pressure to the conveying module TM of vacuum, and also conveys the substrate W from the conveying module TM of vacuum to the loading module LM of atmospheric pressure.

[0117] The loading module LM has a conveying device for conveying substrates W, and conveys substrates W between the load lock module LLM and the load port LP. A FOUP (Front Opening Unified Pod) that can accommodate, for example, 25 substrates W or an empty FOUP can be placed inside the load port LP. The loading module LM takes out substrates W from the FOUP in the load port LP and conveys them to the load lock module LLM. In addition, the loading module LM takes out substrates W from the load lock module LLM and conveys them to the FOUP in the load port LP.

[0118] The control unit CT controls each structure of the substrate processing system PS to perform a given process on the substrate W. The control unit CT stores a process plan that sets the process order, process conditions, conveying conditions, etc., and controls each structure of the substrate processing system PS according to the process plan to perform a given process on the substrate W. The control unit CT may have both Figure 1 The functions of part or all of the control unit 2 shown.

[0119] Fig.11 1 is a diagram for explaining an application example of the fixing member F in the above-mentioned substrate processing system PS. Fig.11 As shown, the transport module TM is provided with an opening TM100 in a part of the wall surface TM10 constituting the vacuum chamber. In one example, the opening TM100 communicates with the substrate processing module PM. In one example, the opening TM100 communicates with the load lock module LLM.

[0120] An opening and closing device M1 for opening and closing the opening TM100 is provided inside the conveying module TM. The opening and closing device M1 includes a closing portion M10 and a base M12. The opening and closing device M1 moves on the floor surface TM12 of the conveying module TM. The opening and closing device M1 moves toward the front of the opening TM100 to push the closing portion M10 toward the opening TM100, and the opening TM100 is closed. When the opening and closing device M1 moves to another position, the closing portion M10 of the opening TM100 is released.

[0121] In one embodiment, a plurality of coils may be arranged on the floor surface TM12 of the conveying module TM, and a permanent magnet may be provided on the floor surface M12 of the opening and closing device M1. In this case, when current is supplied to each coil of the floor surface TM12, a magnetic field is generated on the floor surface TM12, and the opening and closing device M1 moves on the floor surface TM12 in a magnetically suspended manner. By controlling the current value of each coil, the position, orientation, and floating amount of the opening and closing device M1 are controlled.

[0122] In one embodiment, the fixing member F can be used to fix the wall surface TM10 and the opening and closing device M1 of the conveying module TM. For example, the concave part F2 (F3) of the fixing member F can be set in the area TM102 of the opening part TM100 surrounding the wall surface TM10, and the convex part F1 (F4) can be set in the corresponding position of the closed part M10. In addition, for example, the convex part F1 (F4) of the fixing member F can be set in the area TM102, and the concave part F2 (F3) can be set in the corresponding position of the closed part M10. In addition, more than one fixing member F can be set.

[0123] By using the fixing member F, the closing portion M10 and the wall surface TM10 of the opening and closing device M1 can be fixed more firmly. Thus, even when the pressure difference between the communication destination of the opening portion TM100 and the conveying module TM is large, it is possible to suppress leakage of the fluid through the opening portion TM100. In addition, by using the fixing member F, the closing portion M10 and the wall surface TM10 are mechanically fixed together. Thus, for example, when the opening and closing device M1 is magnetically driven, the electric power required to fix the position of the opening and closing device M1 can be reduced.

[0124] The embodiments of the present invention also include the following aspects.

[0125] (Note 1)

[0126] A plasma processing apparatus having a chamber, comprising:

[0127] first component;

[0128] a second component; and

[0129] A fixing member configured to fix the first component and the second component together in a detachable manner along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component,

[0130] The convex component includes a shaft component extending in the axial direction and having a larger diameter at the front end.

[0131] The concave component includes: a storage component fixed to the second component; a holding component arranged in the storage component; and a spherical component held by the holding component,

[0132] The receiving component includes: an opening of the shaft component for receiving the convex component; and a receiving space for receiving the retaining component and the spherical component, wherein the inner wall of the receiving component defining the receiving space includes a tapered portion with a reduced diameter in the radial direction.

[0133] The holding member is configured to be movable in the axial direction within the housing space while holding the spherical member.

[0134] The spherical member is configured to be guided by the tapered portion of the inner wall and move inward in the radial direction when the holding member moves in the first direction which is the axial direction and the direction toward the opening.

[0135] (Note 2)

[0136] The plasma processing apparatus according to Supplementary Note 1, wherein the holding member is movable in the first direction by an elastic member disposed in the housing space.

[0137] (Note 3)

[0138] The plasma processing apparatus according to Supplementary Note 1 or Supplementary Note 2, wherein the holding member is movable in the first direction by a first fluid flowing into the housing space.

[0139] (Note 4)

[0140] The plasma processing apparatus according to any one of Supplementary Notes 1 to 3, wherein the holding member is movable in a second direction opposite to the first direction under the action of a second fluid flowing into the housing space.

[0141] (Note 5)

[0142] A plasma processing apparatus according to any one of Supplementary Notes 1 to 4, wherein the housing space includes a first space into which the first fluid can flow and a second space into which the second fluid can flow, and the first space and the second space are sealed by a sealing component.

[0143] (Note 6)

[0144] The plasma processing apparatus according to Supplementary Note 5, wherein the second space is provided closer to the opening than the first space, and a space between the second space and the opening is sealed by a sealing member.

[0145] (Note 7)

[0146] The plasma processing apparatus according to any one of Supplementary Notes 1 to 6, wherein the holding member is configured to be able to receive the force in the first direction or the force in a second direction opposite to the first direction via a cylinder or a motor.

[0147] (Note 8)

[0148] The plasma processing apparatus according to any one of Supplementary Notes 1 to 7, wherein the holding member further includes a locking structure for restricting movement of the spherical member toward the inner side in the radial direction.

[0149] (Note 9)

[0150] The plasma processing apparatus according to any one of Supplementary Notes 1 to 8, wherein at least one of the first component and the second component is a component disposed in the chamber.

[0151] (Note 10)

[0152] The plasma processing apparatus according to any one of Supplementary Notes 1 to 9, wherein at least one of the first component and the second component is a component constituting the chamber or a component disposed outside the chamber.

[0153] (Note 11)

[0154] The plasma processing apparatus according to any one of Supplementary Notes 1 to 10, further comprising a sealing member that seals a space outside the chamber and the opening when the first member and the second member are fixed by the fixing member.

[0155] (Note 12)

[0156] A plasma processing device according to any one of Notes 1 to 11, wherein at least one of the first component and the second component constitutes an electrode of the plasma processing device, and the fixing member is configured to provide a conductive path to the electrode by electrically connecting the convex component and the concave component to each other when the first component and the second component are fixed by the fixing member.

[0157] (Note 13)

[0158] A plasma processing apparatus having a chamber, comprising:

[0159] first component;

[0160] a second component; and

[0161] A fixing member configured to fix the first component and the second component together in a detachable manner along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component,

[0162] The concave component comprises:

[0163] A first movable body configured to be movable along the axial direction between a clamping position and an unclamping position; and

[0164] The second movable body is held by the first movable body and is configured to be movable to a position that restricts the axial movement of the male component at the clamping position and to a position that does not hinder the axial movement of the male component at the unclamping position.

[0165] (Note 14)

[0166] A plasma processing device according to Note 13, wherein at least one of the first component and the second component constitutes an electrode of the plasma processing device, and the fixing member is configured to provide a conductive path to the electrode by electrically connecting the convex component and the concave component to each other at the clamping position.

[0167] (Note 15)

[0168] A substrate processing system having one or more chambers, characterized in that it comprises:

[0169] first component;

[0170] The second component;

[0171] A fixing member configured to fix the first component and the second component together in a detachable manner along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component.

[0172] The convex component includes a shaft component extending in the axial direction and having a larger diameter at the front end.

[0173] The concave component includes: a storage component fixed to the second component; a holding component arranged in the storage component; and a spherical component held by the holding component,

[0174] The receiving component includes: an opening of the shaft component for receiving the convex component; and a receiving space for receiving the retaining component and the spherical component, wherein the inner wall of the receiving component defining the receiving space includes a tapered portion with a reduced diameter in the radial direction.

[0175] The holding member is configured to be movable in the axial direction within the housing space while holding the spherical member.

[0176] The spherical member is configured to be guided by the tapered portion of the inner wall and move inward in the radial direction when the holding member moves in the first direction which is the axial direction and the direction toward the opening.

[0177] (Note 16)

[0178] The substrate processing system according to Supplement 15, wherein:

[0179] The substrate processing system comprises:

[0180] a transport chamber including a wall surface provided with an opening, the opening communicating with the chamber; and

[0181] an opening and closing device including a closing portion configured to be movable inside the transport chamber to close the opening;

[0182] The wall surface of the transfer chamber constitutes one of the first member and the second member, and the closing portion of the opening and closing device constitutes the other of the first member and the second member.

[0183] (Note 17)

[0184] A fixing member of a substrate processing system, comprising:

[0185] a male member including a shaft member; and

[0186] a concave part that fixes the shaft part of the convex part in a detachable manner,

[0187] The concave component comprises:

[0188] A first movable body configured to be movable in the axial direction between a clamping position and an unclamping position;

[0189] a second movable body held by the first movable body and configured to be movable in the clamping position to a position that restricts the axial movement of the shaft member of the male member, and to be movable in the unclamping position to a position that does not hinder the axial movement of the male member; and

[0190] The third movable body is configured to be able to press the shaft member of the male member in the unclamping position to move the shaft member in the axial direction.

[0191] (Note 18)

[0192] A fixing member of a substrate processing system comprises a concave part and a convex part,

[0193] The concave component comprises:

[0194] Define the interior walls of the storage space; and

[0195] a locking portion provided on a portion of the inner wall,

[0196] The convex part comprises:

[0197] a shaft member configured to be movable in an axial direction within the storage space; and

[0198] The movable body is configured to be movable between a clamping position engaged with the engaging portion of the concave member and a non-clamping position not engaged with the engaging portion of the concave member along with the axial movement of the shaft member,

[0199] The shaft member is configured to be movable in the axial direction to press the inner wall of the concave member in a state where the engagement portion is located at the unclamping position.

[0200] (Note 19)

[0201] A substrate processing system, comprising:

[0202] The fixing member described in Supplement 17 or Supplement 18;

[0203] a transport chamber including a wall surface provided with an opening, the opening communicating with the chamber; and

[0204] an opening and closing device including a closing portion configured to be movable inside the transport chamber to close the opening;

[0205] One of the convex member and the concave member is provided on the wall surface of the transfer chamber, and the other of the convex member and the concave member faces the closing portion of the opening and closing device.

[0206] The above embodiments are described for the purpose of explanation and are not intended to limit the scope of the present invention. The above embodiments can be variously modified without departing from the scope and gist of the present invention. For example, a part of the constituent elements in a certain embodiment can be added to other embodiments. In addition, a part of the constituent elements in a certain embodiment can be replaced with corresponding constituent elements in other embodiments.

[0207] Description of Reference Numerals

[0208] 1... plasma processing device, 10... plasma processing chamber, CP1... first component, CP2... second component, F... fixing member, F1, F4... convex components, F10... shaft component, F2, F3... concave components, F20... storage component, F22... retaining component, F24... spherical component, OP... opening, SP... storage space, TP... tapered portion, W2, W3... inner wall.

Claims

1. A plasma processing device having a chamber, characterized in that: Include: first component; The second component; and A fixing member configured to fix the first component and the second component together in a detachable manner along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component, The convex component includes a shaft component extending in the axial direction and having a larger diameter at the front end. The concave component includes: a storage component fixed to the second component; a holding component arranged in the storage component; and a spherical component held by the holding component, The receiving component includes: an opening of the shaft component for receiving the convex component; and a receiving space for receiving the retaining component and the spherical component, wherein the inner wall of the receiving component defining the receiving space includes a tapered portion with a reduced diameter in the radial direction. The holding member is configured to be movable in the axial direction within the housing space while holding the spherical member. The spherical member is configured to be guided by the tapered portion of the inner wall and move inward in the radial direction when the holding member moves in the first direction which is the axial direction and the direction toward the opening.

2. The plasma processing device according to claim 1, wherein: The holding member is movable in the first direction under the action of an elastic member disposed in the housing space.

3. The plasma processing device according to claim 2, wherein: The holding member is movable in the first direction under the action of the first fluid flowing into the accommodation space.

4. The plasma processing device according to claim 3, wherein: The holding member is movable in a second direction opposite to the first direction by a second fluid flowing into the housing space.

5. The plasma processing device according to claim 4, characterized in that: The storage space includes a first space into which the first fluid can flow and a second space into which the second fluid can flow, and a sealing member is used to seal the first space and the second space.

6. The plasma processing apparatus according to claim 5, wherein: The second space is provided at a position closer to the opening than the first space, and a space between the second space and the opening is sealed by a sealing member.

7. The plasma processing apparatus according to claim 1, wherein: The holding member is configured to be able to receive a force in the first direction or a force in a second direction opposite to the first direction via an air cylinder or a motor.

8. The plasma processing device according to any one of claims 1 to 7, characterized in that: The holding member further includes a locking structure for restricting the spherical member from moving inward in the radial direction.

9. The plasma processing device according to any one of claims 1 to 7, characterized in that: At least one of the first component and the second component is a component disposed in the chamber.

10. The plasma processing device according to any one of claims 1 to 7, characterized in that: At least one of the first member and the second member is a member constituting the chamber or a member disposed outside the chamber.

11. The plasma processing apparatus according to claim 10, wherein: A sealing member is further included for sealing a space outside the chamber and the opening when the first member and the second member are fixed by the fixing member.

12. The plasma processing device according to any one of claims 1 to 7, characterized in that: At least one of the first component and the second component constitutes an electrode of the plasma processing device, and the fixing member is configured to provide a conductive path to the electrode by electrically connecting the convex component and the concave component to each other when the first component and the second component are fixed by the fixing member.

13. A plasma processing device having a chamber, characterized in that: Include: first component; The second component; and A fixing member configured to fix the first component and the second component together in a detachable manner along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component, The concave component comprises: A first movable body configured to be movable along the axial direction between a clamping position and an unclamping position; and The second movable body is held by the first movable body and is configured to be movable to a position that restricts the axial movement of the male component at the clamping position and to a position that does not hinder the axial movement of the male component at the unclamping position.

14. The plasma processing apparatus according to claim 13, wherein: At least one of the first component and the second component constitutes an electrode of the plasma processing device, and the fixing member is configured to provide a conductive path to the electrode by electrically connecting the male component and the female component to each other at the clamping position.

15. A substrate processing system having one or more chambers, characterized in that: Include: first component; The second component; A fixing member configured to fix the first component and the second component together in a detachable manner along the axial direction, the fixing member comprising: a convex component fixed to the first component; and a concave component fixed to the second component and configured to receive the convex component. The convex component includes a shaft component extending in the axial direction and having a larger diameter at the front end. The concave component includes: a storage component fixed to the second component; a holding component arranged in the storage component; and a spherical component held by the holding component, The receiving component includes: an opening of the shaft component for receiving the convex component; and a receiving space for receiving the retaining component and the spherical component, wherein the inner wall of the receiving component defining the receiving space includes a tapered portion with a reduced diameter in the radial direction. The holding member is configured to be movable in the axial direction within the housing space while holding the spherical member. The spherical member is configured to be guided by the tapered portion of the inner wall and move inward in the radial direction when the holding member moves in the first direction which is the axial direction and the direction toward the opening.

16. The substrate processing system according to claim 15, wherein: The substrate processing system comprises: a transport chamber including a wall surface provided with an opening, the opening communicating with the chamber; and an opening and closing device including a closing portion configured to be movable inside the transport chamber to close the opening; The wall surface of the transfer chamber constitutes one of the first member and the second member, and the closing portion of the opening and closing device constitutes the other of the first member and the second member.

17. A fixture for a substrate processing system, characterized in that: include: a male member including a shaft member; and a concave part that fixes the shaft part of the convex part in a detachable manner, The concave component comprises: A first movable body configured to be movable in the axial direction between a clamping position and an unclamping position; a second movable body held by the first movable body and configured to be movable in the clamping position to a position that restricts the axial movement of the shaft member of the male member, and to be movable in the unclamping position to a position that does not hinder the axial movement of the male member; and The third movable body is configured to be able to press the shaft member of the male member in the unclamping position to move the shaft member in the axial direction.

18. A fixing member for a substrate processing system, characterized in that: It includes concave and convex parts. The concave component comprises: Define the interior walls of the storage space; and a locking portion provided on a portion of the inner wall, The convex part comprises: a shaft member configured to be movable in an axial direction within the storage space; and The movable body is configured to be movable between a clamping position engaged with the engaging portion of the concave member and a non-clamping position not engaged with the engaging portion of the concave member along with the axial movement of the shaft member, The shaft member is configured to be movable in the axial direction to press the inner wall of the concave member in a state where the engagement portion is located at the unclamping position.

19. A substrate processing system, characterized in that: include: The fixing member according to claim 17 or 18; A transport chamber including a wall surface provided with an opening, wherein the opening is communicated with the chamber; and an opening and closing device including a closing portion configured to be movable inside the transport chamber to close the opening; One of the convex member and the concave member is provided on the wall surface of the transfer chamber, and the other of the convex member and the concave member faces the closing portion of the opening and closing device.

Images