DBD powder uniform treatment device and method based on resonance dispersion

Abstract

The invention provides a DBD powder uniform treatment device and method based on resonance dispersion, the DBD powder uniform treatment device is used for inorganic material powder and organic material powder, the DBD powder uniform treatment device comprises nanometer magnesium oxide or crosslinked polyethylene powder, a plurality of tungsten rod fixing holes are formed in the inner wall of a quartz reactor, an upper seat circular ring cover is arranged above the quartz reactor, and a lower seat circular ring cover is arranged below the quartz reactor. Tungsten rods are exposed out of the two sides of the quartz reactor, an outgoing wire is connected with an excitation power source and a ground electrode, working gas and reactor media enter the quartz reactor through a gas inlet, a lower fixing pressing piece is tightly connected with the upper surface of an upper base circular ring cover, and the lower surface of a pressing device base is tightly connected with the upper surface of a vibration exciter. The upper surface is tightly connected with the lower seat circular ring cover. The powder treatment effect is better. The characteristic that low-temperature plasma is free of pollution during treatment is utilized, a vertical vibration structure is adopted, vertical vibration is achieved, acoustic resonance is utilized, powder treatment is more uniform, overall treatment is more airtight, and the problem of powder leakage is solved.

Description

Technical Field

[0001] The invention belongs to the field of uniform powder processing and relates to a DBD powder uniform processing device and method based on resonance dispersion. Background Art

[0002] Nanoparticles have shown great application potential in many fields due to their unique physical and chemical properties. Evenly dispersing nanoparticles into the base material can significantly improve the performance of the material, thereby achieving innovation and breakthroughs in many fields such as engineering, environment, and energy. For example, nanoparticles can be used in coatings and structural materials to improve the heat resistance and corrosion resistance of the material, thereby extending the service life of the material.

[0003] At the same time, in order to meet various demands for nanoparticles, it is crucial to uniformly treat the surface of nanoparticles. Uniform dispersion can maximize the efficiency and effect of surface treatment of nanoparticles, thereby improving the mechanical properties, thermal stability, and chemical stability of powder particles during use. In addition, uniform dispersion treatment can also avoid the problem of uneven material properties caused by aggregation of nanoparticles, ensuring the reliability and durability of the material. However, the use of traditional powder surface treatment methods often results in poor powder surface modification effects, agglomeration due to uneven powder during treatment, too long treatment time, overly complicated methods, or a large amount of waste liquid generated. Therefore, it is necessary to improve the method of powder modification treatment to achieve the purpose of uniform powder treatment, high powder surface treatment efficiency, and less environmental harm.

[0004] Traditional methods for powder surface treatment include chemical methods such as sol-gel method and atomic layer deposition method, and physical methods such as vibration dispersion treatment method. The sol-gel method is to synthesize a low-viscosity medium, i.e., sol, through hydrolysis reaction or catalyst, and then put the powder into the sol and stir it evenly. After drying, a layer of gel film will be coated on the surface of the particles, but the coating process is not easy to control, which will lead to poor conformality of the coating film during coating treatment and waste liquid pollution. The atomic layer deposition method is a chemical method in which the precursor and reactant are sequentially pulsed into the chamber and then reacted on the surface of the substrate. Although this method can control the growth thickness of the film, the film growth on the coated nanoparticles is slow and the specific operation methods are complex and strict, which affects the production efficiency. The chemical treatment of the first two methods has the problems of environmental pollution and complex operation, while the physical method is relatively simple. Its main method is the vibration dispersion treatment method, which adds material particles to the target solution and disperses them using vibration to improve the dispersibility of the material particles in the target solution, followed by drying and molding. This method can utilize the cavitation effect of vibration-generated sound waves to effectively disperse material particles. However, since it is a physical method, there is a risk of interface incompatibility when the properties of the treated particles and the modifier are too different, resulting in poor bonding strength of the nanoparticles coated with this method and easy detachment of the film. Summary of the invention

[0005] 1. Technical problems to be solved: How to improve the powder modification method to achieve uniform powder treatment, high powder surface treatment efficiency and less environmental harm.

[0006] 2. Technical solution: In order to solve the above problems, the present invention provides a DBD powder uniform processing device based on resonance dispersion, which is used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, and includes a quartz reactor. The quartz reactor shell is provided with a plurality of tungsten rod fixing holes for fixing tungsten rods. The quartz reactor is provided with an upper seat circular ring cover above and a lower seat circular ring cover below. The tungsten rod is exposed from both sides of the quartz reactor, and is connected to an excitation power supply and a ground electrode through the upper seat circular ring cover hole in the upper seat circular ring cover and the lower seat circular ring cover hole in the lower seat circular ring cover. The upper circular ring cover is provided with an air outlet and an air inlet, and the working gas and the reactor medium enter into the quartz reactor through the air inlet. The compressor comprises a fixed compression plate, a compression vertical rod and a compression base. The compression vertical rod is connected to a fixed threaded plate at the top and to the compression base at the bottom. A threaded hole is provided on the fixed threaded plate, and the screw head of the fixing screw passes through the threaded hole and is connected to the fixed compression plate located below the fixed threaded plate. The fixed compression plate is tightly connected to the upper surface of the upper circular ring cover, the lower surface of the compression base is tightly connected to the upper surface of the vibrator, and the upper surface is tightly connected to the lower circular ring cover.

[0007] The upper ring cover includes an upper ring cover boss, an upper ring groove, an upper ring outer cone and an upper ring middle cone. The upper ring cover boss is equal to the inner diameter of the inner circle of the inner wall of the quartz reactor. The upper ring groove leaves a space distance for the exposed tungsten rod. The upper ring outer cone, the upper ring middle cone and the base of the quartz reactor are in contact to complete a hard connection.

[0008] The lower seat circular ring cover includes a lower seat circular ring cover boss, a lower seat circular ring outer cone, a lower seat circular ring groove and a lower seat circular ring middle cone. The lower seat circular ring cover boss and the inner circle diameter of the inner wall of the quartz reactor are the same. The lower seat circular ring groove leaves a space distance for the exposed tungsten rod. The lower seat circular ring outer cone, the lower seat circular ring middle cone and the base of the quartz reactor are in contact to complete a hard connection.

[0009] The length of the tungsten rod fixing hole is smaller than the length of the quartz reactor.

[0010] It also includes a current coil, a high-voltage probe and an oscilloscope. The oscilloscope is used to collect voltage and current waveforms during the experiment. When measuring high-voltage signals, the high-voltage probe can directly measure the high-voltage signals. The current coil is used for current blocking, tuning and frequency selection.

[0011] The excitation power supply is a nanosecond pulse power supply.

[0012] The present invention also provides a method for uniformly processing DBD powder based on resonance dispersion, using the DBD powder uniformly processing device based on resonance dispersion, comprising the following steps: Step S01: tightly connect the clamp base and the vibration instrument, insert multiple tungsten rods into the tungsten rod mounting holes of the quartz reactor respectively, and pass the exposed parts of the tungsten rods through the upper ring cover hole in the upper ring cover and the lower ring cover hole in the lower ring cover through two lead wires to connect the excitation power supply and the ground electrode.

[0013] Step S02: Connect the lower ring cover and the quartz reactor correspondingly, add the nano powder to be processed into the quartz reactor, cover the upper ring cover, place the quartz reactor bottle on the pressing device base, wait for the pressing device to be pressed, and complete the installation of the quartz reactor bottle; Step S03: Enter the gas supply phase.

[0014] Step S04: Pressing the clamp: Tighten the fixing screws to tightly connect the fixed clamping piece and the upper ring cover. Step S05: Turn on the vibration instrument, adjust the vibration parameters of the vibration instrument, and the powder in the reactor vibrates along with the vibration instrument; Step S06: While ensuring that the gas concentration in the device is high, enter the power debugging stage, turn on the power and adjust the power parameters. When a stable discharge plasma is generated, keep the power parameters unchanged and stabilize the discharge to treat the nanopowder.

[0015] Step S07: After the processing is completed, the vibration exciter is turned off, the power is turned off, the reaction is ended, and then the air intake is stopped, and the entire reaction process is ended.

[0016] Flexible airtight tape is wrapped around the connection between the upper circular ring cover and the quartz reactor and between the lower circular ring cover and the quartz reactor.

[0017] The specific method of step S03 is: the working gas is argon, helium or nitrogen, and the gas flow is detected in real time by a flow meter. After ventilation for a period of time, when the corresponding ventilated Ar gas in the quartz reactor reaches the set concentration, the entire device is then connected, and then the high-pressure gas cylinder is opened, and the Ar and the reaction medium generated by the bubbling device can be introduced into the quartz reactor together.

[0018] The voltage adjustment range of the nanosecond pulse power supply is 500 V-30 kV, the frequency adjustment range is 500Hz-20 kHz, the pre-ventilation flow rate adjustment range is 10 mL / min-1 L / min, the pre-ventilation time is 1 min-5 min, the particle powder processing diameter range is between 10 nm-200 μm, the vibration frequency range of the exciter is between 58Hz-62 Hz, and the excitation force can be adjusted according to the actual weight of the overall device, and the excitation force range is between 20 N-800 N.

[0019] 3. Beneficial effects: In order to solve the problem of insufficiently tight interface bonding during traditional physical treatment, the present invention utilizes plasma to excite active groups on the powder surface, thereby achieving better powder treatment effects. In order to solve the problem of large amounts of waste liquid and environmental pollution during chemical treatment, the pollution-free characteristics of low-temperature plasma treatment are utilized to make the entire treatment process more environmentally friendly. At the same time, the device structure adopts a vertical vibration structure. In order to solve the problem of uneven treatment effects of the traditional coaxial DBD part when treating powder, a vibration table is added to vibrate up and down, and acoustic resonance is used to make the treated powder more uniform and the overall treatment more closed, solving the problem of powder leakage. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a schematic diagram of the overall structure of a DBD powder uniform processing device based on resonance dispersion.

[0021] Figure 2 It is a schematic diagram of plasma vibration processing of nano powder materials.

[0022] Figure 3 It is a partial schematic diagram of the reactor of the plasma device involved in the present invention.

[0023] Figure 4 It is a schematic diagram of the electrode part of the device.

[0024] Figure 5 It is a schematic diagram of the upper ring cover device.

[0025] Figure 6 It is a schematic diagram of the lower seat ring cover device.

[0026] Figure 7 Schematic diagram of the clamping device.

[0027] Figure 8 It is a schematic flow chart of the DBD method for treating nanopowders.

[0028] Explanation of reference numerals: 1. high-pressure gas cylinder; 2. bubbling device; 3. one-way valve; 4. flow meter; 5. gas mixing chamber; 6. exciter; 7. upper ring cover; 701. gas inlet; 702. gas outlet; 703. upper ring cover boss; 704. upper ring groove; 705. upper ring outer cone; 706. upper ring cover hole; 707. upper ring middle cone; 8. lower ring cover; 801. lower ring cover boss; 802. lower ring outer cone; 803. lower ring groove; 804. lower ring middle cone; 805. lower ring cover hole; 9. fixing screw; 10. fixing threaded sheet; 11. fixing pressing sheet; 12. pressing device vertical rod; 13. tungsten rod; 14. quartz reactor; 1401. Inner wall of quartz reactor; 1402. Tungsten rod fixing hole; 1403. Quartz reactor shell; 15. Compressor base; 16. Current coil; 17. Excitation power supply; 18. High voltage probe; 19. Oscilloscope. DETAILED DESCRIPTION

[0029] The present invention is described in detail below with reference to the accompanying drawings and embodiments.

[0030] like Figure 2 As shown, a DBD powder uniform processing device based on resonance dispersion is used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, and includes a quartz reactor 14.

[0031] The quartz reactor 14 is made of quartz glass. The main advantage of quartz glass is that it can effectively prevent surface barrier discharge from converting into arc discharge.

[0032] The quartz reactor housing 1403 is provided with a plurality of tungsten rod fixing holes 1402 for fixing the tungsten rod 13 . The quartz reactor 14 is provided with an upper circular ring cover 7 on the top and a lower circular ring cover 8 on the bottom.

[0033] The electrode is made of tungsten. During the experiment, the electrode is required to have strong electron emission ability, no melting at high temperature, high strength, low loss, long service life, and easy use under working conditions. The metal tungsten rod has the advantages of high melting point of 3410℃, high boiling point of 5900℃, high strength of 850~1100MPa, low thermal conductivity and low high temperature volatility. The tungsten pole can be heated to a very high temperature when high voltage is passed, thereby generating a large amount of electron emission and a very high current density, so tungsten rod is selected as the electrode.

[0034] In one embodiment, Figure 4 As shown, the tungsten rod 13 has a length of 101.1 mm and a diameter of 10 mm.

[0035] The tungsten rod 133 is exposed from both sides of the quartz reactor 14, and is connected to the excitation power supply 17 and the ground electrode through the upper ring cover hole 706 in the upper ring cover 7 and the lower ring cover hole 805 in the lower ring cover 8. The upper ring cover 7 has an air outlet 702 and an air inlet 701, and the working gas and the reactor medium enter the quartz reactor 14 through the air inlet 701.

[0036] like Figure 7 As shown, the clamp includes a fixed clamping plate 11, a clamping vertical rod 12 and a clamping base 15. The clamping vertical rod 12 is connected to the fixed threaded plate 10 at the top and to the clamping base 15 at the bottom. The fixed threaded plate 10 is provided with a threaded hole. The screw head of the fixing screw 9 passes through the threaded hole and is connected to the fixed clamping plate 11 located below the fixed threaded plate 10. The fixed clamping plate 11 is tightly connected to the upper surface of the upper seat ring cover 7. The lower surface of the clamping base 15 is tightly connected to the upper surface of the vibrator 6, and the upper surface is tightly connected to the lower seat ring cover 8.

[0037] In one embodiment, the length of the vertical rod 12 of the compressor is 180 mm and the diameter is 10 mm. In addition, the diameter of the compressor base 15 is 156 mm. The space formed by this is convenient for the disassembly and placement of the plasma reactor part. The fixing screw 9, the fixed threaded piece 10 and the fixed compression piece 11 cooperate with each other. The fixed compression piece 11 and the fixing screw 9 are both movable, and the fixed threaded piece 10 is fixed on the top of the vertical rod 12 of the compressor. The three cooperate with each other to complete the fixation of the plasma reactor. The diameter and height of the fixed threaded piece 10 and the fixed compression piece 11 are the same, which are 156 mm and 10 mm respectively. The threaded hole diameter left by the fixed threaded piece 10 is 10 mm, which coincides with the screw head part of the fixing screw 9 for easy installation and completion of the compression operation.

[0038] The DBD powder uniform processing device based on resonance dispersion provided by the present invention, when the device is working, firstly connect the compactor base 15 and the vibrator 6 closely to facilitate the conduction of the excitation force when the vibrator 6 vibrates. Then connect the lower seat ring cover 8 and the plasma tube shell 14, and put the powder to be processed, then cover the upper seat ring cover 7, insert the fixed compactor plate 11 into the compactor vertical rod 12, adjust the appropriate position, and then precisely connect the fixed threaded plate 10 and the top of the compactor vertical rod 12, insert the fixing screw 9, and tighten it. Prepare to start working, the tungsten rod 13 is used as the high-voltage electrode and the low-voltage electrode respectively, and after connecting to the excitation power supply, surface discharge will occur on the inner wall of the quartz reactor 14 to generate plasma to process the nano powder. During the reaction process, the vibrator 6 will vibrate to distribute the powder on the inner wall of the quartz reactor 14. The whole device of the whole process is tightly connected together, which is convenient for the conduction of the excitation force.

[0039] The present invention generates acoustic mixed resonance at a certain frequency by means of the rapid up and down vibration of the exciter 6, which rapidly vibrates the powder in the device. This treatment can rapidly disperse the powder in the plasma device and achieve a uniform treatment effect.

[0040] In one embodiment, Figure 3 As shown, the quartz reactor 14 includes a quartz reactor inner wall 1401 , a tungsten rod fixing hole 1402 and a quartz reactor outer wall 1403 .

[0041] In one embodiment, the diameter of the quartz reactor inner wall 1401 is 63.5 mm.

[0042] In one embodiment, the tungsten rod fixing hole 1402 is a staggered hole punched on the reactor wall near the inner wall, which is used to install and fix the tungsten rod 13 as an electrode. The length of the hole is 96.1 mm, and the length of the entire reactor is 101.1 mm, leaving a 5 mm margin. The advantage of this is that if the length of the hole is made 101.1 mm, the entire inner wall of the reactor will be in the plasma area, which may cause damage to the bosses of the upper ring cover 7 and the lower ring cover 8. Second, space is left for the tungsten rod 13 to protrude, so as to facilitate external wires. After this design, plasma will be generated in an area with a length of about 90 mm, which is a large area and has high energy utilization efficiency. Third, the target mixing volume ratio of a good vibration mixer is 0.8 to 1, so it is appropriate to design the device with a slightly smaller bottom area and a slightly larger length. At the same time, considering the size of the vibration instrument, the overall circular base diameter should be between 50mm-65mm, so 63.5mm is the ideal size. At the same time, the overall reactor height is 101.1mm, of which the effective height is about 90mm, which meets the ideal ratio of 0.8:1 when vibrating and mixing during filling, leaving a certain amount of space surplus. In addition, there is part 1403, whose outer wall diameter is 100mm. This part is mainly responsible for the conduction of the exciting force, and contacts with the outer truncated cone and inner truncated cone of the upper ring cover 7 and the lower ring cover 8, accepts the conduction of the exciting force, and causes the whole to vibrate.

[0043] In one embodiment, Figure 5 As shown, the upper ring cover 7 includes an upper ring cover boss 703, an upper ring groove 704, an upper ring outer truncated cone 705 and an upper ring middle truncated cone 707, and is also provided with an air outlet 702 and an air inlet 701, with corresponding diameters of 4 mm and 6 mm. The air outlet 702 and the air inlet 701 are placed on the same side, which ensures the integrity of the plasma discharge and prevents the leakage of powder when collecting powder, thereby ensuring the airtightness of the device.

[0044] In order to facilitate the insertion of the quartz reactor 14, the corresponding diameter of the upper ring cover boss 703 is 63.5mm, which corresponds to the inner diameter of the inner wall of the quartz reactor 14. The inner diameter of the upper ring groove 704 is 67.80mm, the outer diameter is 89mm, and the groove depth is 10mm. The purpose of this design is to leave space for the exposed tungsten rod 14 to facilitate connection with external wires. The purpose of the upper ring outer cone 705 and the upper ring middle cone 707 is to contact the base of the quartz reactor 14 to complete the hard connection and withstand a large vibration load. The inner diameters are 89mm and 63.5mm, and the outer diameters are 100mm and 67.8mm respectively. The main design purpose of the upper ring cover hole 706 is to facilitate the lead-out of the tungsten rod wire to facilitate connection with the high-voltage electrode.

[0045] In one embodiment, Figure 6 As shown, the lower seat circular ring cover 8 includes a lower seat circular ring cover boss 801 , a lower seat circular ring outer cone 802 , a lower seat circular ring groove 803 and a lower seat circular ring middle cone 804 .

[0046] The lower seat circular ring cover boss 801 is designed to facilitate insertion into the quartz reactor 14 , and its corresponding diameter is 63.5 mm, which corresponds to the inner diameter of the inner wall of the quartz reactor 14 .

[0047] The inner diameter of the lower seat annular groove 803 is 67.80 mm, the outer diameter is 89 mm, and the groove depth is 10 mm. The purpose of this design is to leave space for the exposed tungsten rod 14 to facilitate connection with external wires.

[0048] The outer cone 802 and the middle cone 804 of the lower ring are designed to contact the base of the quartz reactor 14 to complete the hard connection and withstand a large vibration load. The inner diameters are 89 mm and 63.5 mm, and the outer diameters are 100 mm and 67.8 mm, respectively.

[0049] The hole 805 of the lower ring cover is for the purpose of leading out the wire of the tungsten rod so as to facilitate the connection with the high voltage electrode. It can be found that the lower ring cover 8 is similar to the upper ring cover 7, the only difference being that there is no gas outlet and gas inlet, because as the vibration base of the entire plasma bottle, powder needs to be stored to prevent leakage and facilitate handling.

[0050] like Figure 1 As shown, it also includes a current coil 16, a high-voltage probe 18, and an oscilloscope 19. The oscilloscope 19 is used to collect voltage and current waveforms during the experiment to analyze the discharge characteristics. When measuring high-voltage signals, the high-voltage probe 18 has a certain isolation effect and can directly measure high-voltage signals. The current coil 16 mainly has two functions, namely, current blocking and tuning and frequency selection.

[0051] The DBD powder uniform processing device based on resonance dispersion proposed by the present invention uses atmospheric low-temperature plasma to process nanopowder materials. This method can make the surface of the processed nanomaterials in an excited state, so that the chemical bonds on the surface are destroyed or reorganized to form new chemical bonds and surface structures. This is more conducive to achieving an effective modification effect on nanopowder materials.

[0052] Compared with the traditional coaxial DBD, the method adopts vibration dispersion. At a certain frequency, acoustic resonance mixing occurs, so that a micro-mixing field is generated in the plasma device, the powder is evenly dispersed, and the effect of uniform powder processing is improved.

[0053] The present invention also provides a method for uniformly processing DBD powder based on resonance dispersion, using the DBD powder uniformly processing device based on resonance dispersion, such as Figure 8 The following steps are involved: Step S01: Tightly connect the clamp base 15 and the vibration exciter 6 to facilitate the conduction of the exciting force, insert 20 tungsten rods 13 into the corresponding holes of the quartz reactor 14 respectively, and connect the exposed parts of the tungsten rods 13 to the wire parts, and use two lead wires to pass through the upper seat circular ring cover 7 and the lower seat circular ring cover 8 corresponding to the upper seat circular ring cover hole 706 and the lower seat circular ring cover hole 805 to wait for the connection of the overall circuit.

[0054] Step S02, the lower ring cover 8 and the quartz reactor 14 are connected correspondingly, and the nano powder to be processed can be added into the quartz reactor 14 at this time, and then the upper ring cover 7 is covered, and the plasma reactor bottle is placed on the pressing device base 15. Wait for the pressing device to be pressed, and the installation of the plasma treatment reactor bottle is completed.

[0055] In one embodiment, flexible airtight tape may be wrapped around the connection points between the upper circular ring cover 7 and the quartz reactor 14 and the lower circular ring cover 8 and the quartz reactor 14 to increase the airtightness of the entire device.

[0056] Step S03, the gas supply link can be entered, in which the working gas uses high-purity Ar, and the gas flow rate is detected in real time by the flow meter 5. After a period of ventilation, the corresponding Ar gas concentration in the quartz reactor 14 should be ensured to be very high, and then the entire device is connected, and then the high-pressure gas cylinder 2 is opened, and Ar and the reaction medium can be introduced into the reaction device together.

[0057] Step S04: After a period of time, since the vibration mixing requires a closed operation, the fixing screws 9 need to be quickly tightened to tightly connect the fixed pressing plate 11 and the upper ring cover 7, and the installation part of the device is completed.

[0058] Step S05: Turn on the vibration exciter 6, adjust the vibration parameters of the vibration exciter, and the powder in the reactor vibrates along with the vibration exciter.

[0059] Step S06: While ensuring that the gas concentration in the device is high, enter the power debugging phase, first turn on the power and adjust the power parameters. When a large volume, high intensity, and stable discharge plasma is generated, keep the power parameters unchanged and stabilize the discharge to treat the nano powder.

[0060] Step S07: After the processing is completed, the vibration exciter is turned off, the power is turned off, the reaction is ended, and then the air intake is stopped, and the entire reaction process is ended.

[0061] In one embodiment, the high-pressure gas cylinder 1 and the bubbling device 2 are filled with working gas and reaction medium. The working gas can be selected according to specific needs. The reaction medium is mostly a solution, which can be flexibly selected according to the powder processing requirements. When the device is working, the gas cylinder is opened, and the gas blows the reaction gas into the reaction device along the gas pipe. The one-way valve 3 prevents the airflow from flowing back during operation. The flow meter 4 detects the airflow rate during the working state in real time. For the gaseous medium, it is directly mixed with the working gas through the mixing chamber 5 and then passed into the discharge area. For the liquid medium, it is brought into the discharge area by the working gas, and the ratio of the reaction medium and the working gas is adjusted by the flow meter 4.

[0062] In one embodiment, the device uses two power sources: a nanosecond pulse power source with adjustable parameters and an AC power source. The voltage adjustment range of the nanosecond pulse power source is 500 V-30 kV, preferably in the range of 5 kV-10 kV; frequency adjustment range is 500 Hz-20 kHz, preferably in the range of 1 kHz-5 kHz. The AC power supply output voltage and frequency are consistent with the nanosecond pulse power supply to ensure the same period.

[0063] In one embodiment, the plasma discharge gas introduced into the device can be argon, helium, nitrogen or other gases, and argon is preferred for this device.

[0064] In one embodiment, the ventilation flow rate adjustment range of the pre-installed device can be 10 mL / min-1 L / min, the preferred range is 100 mL / min-500 mL / min, pre-ventilation time can be 1 min-5 min, preferably 2 min.

[0065] In the implementation, this device can process various inorganic material powders and organic material powders, including but not limited to nano magnesium oxide and cross-linked polyethylene powder, among which the particle powder processing diameter range is 10 nm-200 The preferred diameter of the processed powder is 20 nm.

[0066] In one embodiment, the parameters of the vibration instrument also need to be adjusted, and the vibration frequency can be selected in the range of 58 Hz-62 Hz, preferably 60 Hz.

[0067] In one embodiment, the magnitude of the excitation force can be adjusted according to the actual weight of the entire device, and the optional excitation force magnitude range is 20 N-800 N, the preferred exciting force is 500 N.

[0068] The present invention utilizes atmospheric low-temperature plasma to treat nanopowder materials, which can make the surface of the treated nanomaterials in an excited state, thereby destroying or reorganizing the chemical bonds on the surface to form new chemical bonds and surface structures, which is more conducive to achieving an effective modification effect on the nanopowder materials.

Claims

1. A DBD powder uniform processing device based on resonance dispersion, used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, characterized in that: The invention comprises a quartz reactor (14), wherein a plurality of tungsten rod fixing holes (1402) for fixing a tungsten rod (13) are provided on a shell (1403) of the quartz reactor, an upper ring cover (7) is provided on the top of the quartz reactor (14), and a lower ring cover (8) is provided on the bottom of the quartz reactor (14), wherein the tungsten rod (13) is exposed from both sides of the quartz reactor (14), and is connected to an excitation power source (17) and a ground electrode through an upper ring cover hole (706) in the upper ring cover (7) and a lower ring cover hole (805) in the lower ring cover (8), respectively; the upper ring cover (7) has an air outlet (702) and an air inlet (701), and a working gas and a reactor medium are introduced into the reactor through the air inlet. (701) enters into the quartz reactor (14), the clamp includes a fixed clamping plate (11), a clamping vertical rod (12) and a clamping base (15), the clamping vertical rod (12) is connected to the fixed threaded plate (10) at the top, and is connected to the clamping base (15) at the bottom, the fixed threaded plate (10) is provided with a threaded hole, the screw head of the fixing screw (9) passes through the threaded hole and is connected to the fixed clamping plate (11) located below the fixed threaded plate (10), the fixed clamping plate (11) is tightly connected to the upper surface of the upper seat ring cover (7), the lower surface of the clamping base (15) is tightly connected to the upper surface of the exciter (6), and the upper surface is tightly connected to the lower seat ring cover (8).

2. The DBD powder uniform processing device based on resonance dispersion according to claim 1, characterized in that: The upper ring cover (7) comprises an upper ring cover boss (703), an upper ring groove (704), an upper ring outer cone (705) and an upper ring middle cone (707); the upper ring cover boss (703) has the same diameter as the inner circle of the inner wall of the quartz reactor (14); the upper ring groove (704) leaves a space for the exposed tungsten rod (14); the upper ring outer cone (705), the upper ring middle cone (707) and the base of the quartz reactor (14) are in contact to complete a hard connection.

3. The DBD powder uniform processing device based on resonance dispersion according to claim 1, characterized in that: The lower seat circular ring cover (8) comprises a lower seat circular ring cover boss (801), a lower seat circular ring outer cone (802), a lower seat circular ring groove (803) and a lower seat circular ring middle cone (804); the lower seat circular ring cover boss (801) and the inner diameter of the inner wall of the quartz reactor (14) are the same; the lower seat circular ring groove (803) leaves a space for the exposed tungsten rod (14); the lower seat circular ring outer cone (802), the lower seat circular ring middle cone (804) and the base of the quartz reactor (14) are in contact to complete a hard connection.

4. The DBD powder uniform processing device based on resonance dispersion according to any one of claims 1 to 3, characterized in that: The length of the tungsten rod fixing hole (1402) is smaller than the length of the quartz reactor (414).

5. The DBD powder uniform processing device based on resonance dispersion according to any one of claims 1 to 3, characterized in that: It also includes a current coil (16), a high-voltage probe (18) and an oscilloscope (19). The oscilloscope (19) is used to collect voltage and current waveforms during the experiment. When measuring a high-voltage signal, the high-voltage probe (18) can directly measure the high-voltage signal. The current coil (16) is used for current blocking, tuning and frequency selection.

6. The DBD powder uniform processing device based on resonance dispersion according to any one of claims 1 to 3, characterized in that: The excitation power supply (17) is a nanosecond pulse power supply.

7. A method for uniformly processing DBD powder based on resonance dispersion, using the DBD powder uniformly processing device based on resonance dispersion according to any one of claims 1 to 6, characterized in that: The following steps are involved: Step S01: tightly connect the pressing device base (15) and the vibration exciter (6), insert a plurality of tungsten rods (13) into the tungsten rod mounting holes (1402) of the quartz reactor (14), and pass the exposed portions of the tungsten rods (13) through the upper seat circular ring cover hole (706) in the upper seat circular ring cover (7) and the lower seat circular ring cover hole (805) in the lower seat circular ring cover (8) through two lead wires to connect the excitation power supply (17) and the ground electrode; Step S02: Connect the lower ring cover (8) and the quartz reactor (14) correspondingly, add the nano powder to be processed into the quartz reactor (14), cover the upper ring cover (7), place the quartz reactor (14) bottle on the pressing device base (15), wait for the pressing device to be pressed, and complete the installation of the quartz reactor (14) bottle; Step S03: Entering the gas supply phase; Step S04: Pressing the pressing device: tightening the fixing screw (9) to tightly connect the fixed pressing plate (11) and the upper seat ring cover (7); . Step S05: Turn on the vibration instrument (6), adjust the vibration parameters of the vibration instrument, and the powder in the reactor vibrates along with the vibration instrument; Step S06: while ensuring that the gas concentration in the device is high, enter the power debugging link, turn on the power and adjust the power parameters. When a stable discharge plasma is generated, keep the power parameters unchanged and stabilize the discharge to treat the nano powder; Step S07: After the processing is completed, the vibration exciter is turned off, the power is turned off, the reaction is ended, and then the air intake is stopped, and the entire reaction process is ended.

8. The method for uniformly treating DBD powder based on resonance dispersion according to claim 7, characterized in that: A flexible airtight tape is wrapped around the connection between the upper circular ring cover (7) and the quartz reactor (14) and the lower circular ring cover (8) and the quartz reactor (14).

9. The method for uniformly treating DBD powder based on resonance dispersion according to claim 7, characterized in that: The specific method of step S03 is as follows: the working gas is argon, helium or nitrogen, and the gas flow rate is detected in real time by a flow meter (4). After ventilation for a period of time, when the corresponding ventilated Ar gas in the quartz reactor (14) reaches a set concentration, the entire device is then connected, and then the high-pressure gas cylinder (1) is opened, and the working gas and the reaction medium generated by the bubbling device (2) are introduced into the quartz reactor (14) together.

10. The method for uniformly treating DBD powder based on resonance dispersion according to claim 7, characterized in that: The voltage adjustment range of the nanosecond pulse power supply is 500 V-30 kV, the frequency adjustment range is 500 Hz-20 kHz, the pre-ventilation flow rate adjustment range is 10 mL / min-1 L / min, the pre-ventilation time is 1 min-5 min, the particle powder processing diameter range is between 10 nm-200 μm, the vibration frequency range of the exciter is between 58 Hz-62 Hz, and the excitation force can be adjusted according to the actual weight of the overall device, and the excitation force range is between 20 N-800 N.

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