Display panel, preparation method thereof and display device

Abstract

The embodiment of the invention provides a display panel, a preparation method thereof and a display device, relates to the technical field of display, and can reduce the thickness of the display device on the basis of reducing light reflection of an external environment. A display panel including a light emitting layer; a plurality of sub-pixels; the color filter layer comprises a plurality of color resistance units, and the orthographic projection of each color resistance unit on the light-emitting layer covers one of the sub-pixels; the thickness of each color resistance unit is gradually increased from the edge to the center; the first insulating layer comprises a plurality of first grooves, and the depth of each first groove is gradually increased from the edge to the center; the plurality of first grooves are in one-to-one correspondence with the plurality of color resistance units, and the surfaces, close to one side of the color filter layer, of the first grooves are in contact with the surfaces, close to one side of the first insulating layer, of the color resistance units corresponding to the first grooves; a touch structure layer; each black matrix is arranged between two adjacent color resistance units in the plurality of color resistance units; the orthographic projection of the touch structure layer on the light-emitting layer is located in the orthographic projection range of the black matrix on the light-emitting layer.

Description

[0001] This application is a divisional application of the Chinese patent application filed with the State Intellectual Property Office on May 9, 2018, with application number 201810438540.6, and invention name “A display device and its preparation method”, all contents of which are incorporated into this application by reference. Technical Field

[0002] The present invention relates to the field of display technology, and in particular to a display panel and a manufacturing method thereof, and a display device. Background Art

[0003] Organic Light-Emitting Device (OLED) displays have many advantages over liquid crystal display devices, such as self-luminescence, fast response, high brightness, high contrast, and light weight. They have gradually eroded the market share of liquid crystal display devices. In particular, they are bendable and flexible, and have become the first choice for flexible display devices.

[0004] However, since a large number of metal layers included in an OLED display have a high reflectivity to external ambient light, the reflected light will affect the display effect of the OLED display device.

[0005] The prior art uses a circular polarizer to reduce the reflected natural light on one side of the light emitting surface of the OLED display. However, the thickness of the circular polarizer is relatively large, generally about 100 μm, which is not conducive to the thin design of the OLED display. Summary of the invention

[0006] Embodiments of the present invention provide a display panel and a method for manufacturing the same, and a display device, which can reduce the thickness of the display device while reducing the reflection of ambient light.

[0007] To achieve the above object, the embodiments of the present invention adopt the following technical solutions:

[0008] On the one hand, a display panel is provided, comprising a substrate and a light-emitting layer arranged on the substrate, the light-emitting layer comprising a plurality of sub-pixels, and also comprising a color filter layer arranged on a side of the light-emitting layer close to a display surface, the color filter layer comprising a plurality of color-resistance units, the orthographic projection of each of the plurality of color-resistance units on the light-emitting layer covering one of the plurality of sub-pixels; wherein the thickness of each of the plurality of color-resistance units gradually increases from its edge to its center along a direction perpendicular to the surface where the substrate is located; wherein the plurality of first grooves correspond to the plurality of color-resistance units one by one, and the orthographic projection of each of the plurality of color-resistance units on the light-emitting layer is located at the first groove corresponding to it on the light-emitting layer In the orthographic projection, the surface of the first groove close to the color filter layer is in contact with the surface of the corresponding color resist unit close to the first insulating layer; a touch structure layer is arranged on the side of the first insulating layer away from the color filter layer; the touch structure layer includes a plurality of first touch electrodes and a plurality of second touch electrodes that are insulated from each other and cross-arranged; the plurality of first touch electrodes are electrically connected through a bridge in the area where they intersect with the plurality of second touch electrodes; the bridge is isolated from the plurality of second touch electrodes by a second insulating layer; a black matrix is ​​arranged between two adjacent ones of the plurality of color resist units; wherein the orthographic projection of the touch structure layer on the light-emitting layer is located within the orthographic projection range of the black matrix on the light-emitting layer.

[0009] Preferably, the second insulating layer includes a plurality of second grooves on a side close to the first insulating layer; wherein the plurality of second grooves correspond one-to-one to the plurality of first grooves, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer is located within the orthographic projection of the corresponding second groove on the light-emitting layer, and the surface of the second groove on the side close to the first insulating layer is in contact with the surface of the first insulating layer on the side close to the second insulating layer.

[0010] Preferably, an edge of an orthographic projection of each of the plurality of color-resist units on the light-emitting layer exceeds an edge of a sub-pixel covered by the orthographic projection of the color-resist unit on the light-emitting layer.

[0011] Preferably, the size of the edge of the orthographic projection of each of the plurality of color-resist units on the light-emitting layer beyond the edge of the sub-pixel covered by the orthographic projection of the color-resist unit on the light-emitting layer is in the range of 2 μm to 10 μm.

[0012] Further preferably, the multiple first touch electrodes and the multiple second touch electrodes are arranged on a side of the bridge close to the first insulating layer; the side of the second insulating layer close to the first insulating layer also includes a third groove, and the orthographic projection of the third groove on the light-emitting layer is located between the orthographic projections of the adjacent first touch electrode and the second touch electrode on the light-emitting layer.

[0013] Preferably, the first insulating layer comprises an organic material.

[0014] Preferably, the second insulating layer comprises an organic material.

[0015] Preferably, the thickness of the color filter layer ranges from 2 μm to 10 μm.

[0016] On the other hand, a method for preparing a display panel is provided, wherein a light-emitting layer is formed on a substrate, and a color filter layer is formed on a side of the light-emitting layer close to a display surface; the light-emitting layer includes a plurality of sub-pixels, and the color filter layer includes a plurality of color resist units, wherein the orthographic projection of each of the plurality of color resist units on the light-emitting layer covers one of the plurality of sub-pixels; wherein the thickness of each of the plurality of color resist units gradually increases from its edge to its center along a direction perpendicular to the surface of the substrate.

[0017] Preferably, before forming the color filter layer, the method further includes: forming a first insulating layer, wherein the first insulating layer includes a plurality of first grooves on a side close to the color filter layer, and the depth of each of the plurality of first grooves gradually increases from its edge to its center along a direction perpendicular to the surface of the substrate; wherein the plurality of first grooves correspond to the plurality of color resist units one by one, and the orthographic projection of each of the plurality of color resist units on the light-emitting layer is located within the orthographic projection of the corresponding first groove on the light-emitting layer, and the surface of the first groove close to the color filter layer is in contact with the surface of the corresponding color resist unit close to the first insulating layer.

[0018] Further preferably, forming the first insulating layer includes: forming a photosensitive film; exposing various parts of the photosensitive film to different energies using a grayscale mask method, and developing to form the first insulating layer.

[0019] Preferably, the method also includes: forming a black matrix between adjacent color resist units, and before forming the first insulating layer, forming a touch structure layer located on a side of the first insulating layer away from the color filter layer, the orthographic projection of the touch structure layer on the light-emitting layer being within the orthographic projection range of the black matrix on the light-emitting layer.

[0020] Among them, forming the touch structure layer includes: forming a second insulating layer, a bridge, and a plurality of first touch electrodes and a plurality of second touch electrodes that are insulated from each other and cross-arranged; the plurality of first touch electrodes are electrically connected through the bridge in the area intersecting with the plurality of second touch electrodes; the bridge is isolated from the plurality of second touch electrodes by the second insulating layer; the second insulating layer includes a plurality of second grooves on one side close to the first insulating layer; the plurality of second grooves correspond to the plurality of first grooves one by one, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer is located within the orthographic projection of the corresponding second groove on the light-emitting layer, and the surface of the second groove close to the first insulating layer is in contact with the surface of the first insulating layer close to the second insulating layer.

[0021] Further preferably, forming a second insulating layer, a bridge, and a plurality of first touch electrodes and a plurality of second touch electrodes that are insulated from each other and cross-arranged includes: forming the bridge, an insulating film, and the plurality of first touch electrodes and the plurality of second touch electrodes in sequence, the plurality of first touch electrodes being electrically connected through the bridge in an area intersecting the plurality of second touch electrodes; using the plurality of first touch electrodes and the plurality of second touch electrodes as a mask, etching the insulating film to form the second insulating layer, the second insulating layer further comprising a third groove on a side close to the first insulating layer, the orthographic projection of the third groove on the light-emitting layer being located between the orthographic projections of adjacent first touch electrodes and the second touch electrodes on the light-emitting layer.

[0022] In yet another aspect, a display device is provided, comprising a display panel as described in any one of the above embodiments.

[0023] The embodiment of the present invention provides a display panel and a preparation method thereof, and a display device. Since the thickness of the color filter layer is much smaller than the thickness of the circular polarizer, by arranging the color filter layer on the side of the light-emitting layer close to the display surface, not only the reflection of the external ambient light can be reduced, but also the thickness of the display device can be reduced, which is conducive to the thin design of the display device. On this basis, since the large-angle light emitted from any sub-pixel is always deflected toward the sub-pixel adjacent to the sub-pixel, the thickness of the color resistance unit closer to the edge is made smaller, which can reduce the distance that the large-angle light emitted from the sub-pixel actually travels in the color resistance unit. Furthermore, the difference in the distance that the light at each angle emitted from the sub-pixel actually travels in the color resistance unit is reduced, and the color purity difference of the light at each angle emitted from the color resistance unit is also reduced, thereby improving the problem of different color purity of pictures at different viewing angles in the related art. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0025] Figure 1 A schematic diagram of the structure of a display device provided for related technology;

[0026] Figure 2 A schematic diagram of a display device provided in an embodiment of the present invention Figure 1 ;

[0027] Figure 3 A schematic diagram of a display device provided in an embodiment of the present invention Figure 2 ;

[0028] Figure 4a A cross-sectional view of a color resist unit provided in an embodiment of the present invention Figure 1 ;

[0029] Figure 4b A cross-sectional view of a color resist unit provided in an embodiment of the present invention Figure 2 ;

[0030] Figure 5 A schematic diagram of a display device provided in an embodiment of the present invention Figure 3 ;

[0031] Figure 6 A fourth structural diagram of a display device provided by an embodiment of the present invention;

[0032] Figure 7 A schematic diagram of a display device provided in an embodiment of the present invention Figure 5 ;

[0033] Figure 8 A schematic diagram of a display device provided in an embodiment of the present invention Figure 6 ;

[0034] Fig. 9 A schematic diagram of a process for preparing a first insulating layer provided in an embodiment of the present invention;

[0035] Fig.10a A schematic diagram of a process for preparing a first insulating layer provided in an embodiment of the present invention Figure 1 ;

[0036] Fig.10b A schematic diagram of a process for preparing a first insulating layer provided in an embodiment of the present invention Figure 2 ;

[0037] Fig.11 A schematic diagram of a process for preparing a touch structure layer provided in an embodiment of the present invention Figure 1 ;

[0038] Fig.12a A schematic diagram of a process for preparing a touch structure layer provided in an embodiment of the present invention Figure 1 ;

[0039] Figure 12b A schematic diagram of a process for preparing a touch structure layer provided in an embodiment of the present invention Figure 2 ;

[0040] Fig.13 A schematic diagram of a process for preparing a touch structure layer provided in an embodiment of the present invention Figure 2 ;

[0041] Fig.14 A schematic diagram of a process for preparing a touch structure layer provided in an embodiment of the present invention Figure 3 ;

[0042] Fig.15 A schematic diagram of a process for preparing a touch structure layer provided by an embodiment of the present invention.

[0043] Reference numerals:

[0044] 11-light-emitting layer; 12-color filter layer; 20-substrate; 21-light-emitting layer; 211-sub-pixel; 22-first insulating layer; 221-photosensitive film; 23-color filter layer; 231-color resistance unit; 24-touch structure layer; 241-bridge; 242-first touch electrode; 243-second touch electrode; 244-second insulating layer; 2441-insulating film; 25-black matrix. DETAILED DESCRIPTION

[0045] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0046] like Figure 1As shown, by arranging a color filter layer 12 on the side of the light-emitting layer 11 close to the display surface, the reflection of the external ambient light can be reduced, and the color filter layer 12 can also improve the color purity of the light emitted from the light-emitting layer 11 through its filtering effect. However, since the light emitted from the light-emitting layer 11 has different emission angles, the actual distances traveled by the light with different emission angles in the color filter layer 12 are also different. The longer the actual distance traveled by the light in the color filter layer 12, the higher the color purity. Therefore, when displayed, the color purity of the pictures at different viewing angles is different.

[0047] An embodiment of the present invention provides a display device, such as Figure 2 and Figure 3 As shown, it includes a substrate 20 and a light-emitting layer 21 arranged on the substrate 20, the light-emitting layer 21 includes a plurality of sub-pixels 211, and also includes a color filter layer 23 arranged on the side of the light-emitting layer 21 close to the display surface, the color filter layer 23 includes a plurality of color resist units 231, and the orthographic projection of each color resist unit 231 in the plurality of color resist units 231 on the light-emitting layer 21 covers one sub-pixel 211 in the plurality of sub-pixels 211; wherein the thickness of each color resist unit 231 gradually increases from its edge to the center along a direction perpendicular to the surface where the substrate 20 is located.

[0048] Here, the substrate 20 may be a rigid substrate, the material of which may be glass or silicon, or a flexible substrate, the material of which may be an organic material. When the display device is used as a flexible display device, a flexible substrate is preferably used as the substrate 20 of the display device, and the substrate 20 of the display device may further include an inorganic film layer disposed on a side of the flexible substrate away from the light-emitting layer 21, and the inorganic film layer may play a role in fixing the flexible substrate.

[0049] It should be noted that, first, the display device can be a display panel or a display including a display panel, wherein the display panel can be an OLED display panel or a liquid crystal display panel (Liquid Crystal Display, LCD for short), and there is no limitation on this, as long as the display device can be used for display.

[0050] When the display panel is an OLED display panel, each “sub-pixel 211” in the “light-emitting layer 21 includes multiple sub-pixels 211” is defined by a pixel defining layer; when the display panel is an LCD display panel, each “sub-pixel 211” in the “light-emitting layer 21 includes multiple sub-pixels 211” is defined by a gate line and a data line.

[0051] Second, the color filter layer 23 can be disposed inside the display panel or outside the display panel, as long as the color filter layer 23 is located on the side of the light-emitting layer 21 close to the display surface.

[0052] When the color filter layer 23 is disposed in the display panel, the color filter layer 23 may be disposed on the array substrate of the display panel or on the cell-matching substrate of the display panel; when the color filter layer 23 is disposed on the array substrate of the display panel, the color filter layer 23 may be disposed on the side of the light-emitting layer 21 close to or away from the substrate 20 according to the different display surfaces of the display panel (i.e., the different light-emitting directions of the light-emitting layer 21). When the color filter layer 23 is disposed outside the display panel, the color filter layer 23 may be disposed on the side of the cell-matching substrate away from the array substrate or on the side of the array substrate away from the cell-matching substrate according to the different light-emitting directions of the light-emitting layer 21, and the color filter layer 23 may be covered with a cover plate to protect the color filter layer 23.

[0053] On this basis, when the color filter layer 23 is disposed on the array substrate, or disposed on the side of the array substrate away from the cell-matching substrate, the substrate used to dispose the color filter layer 23 can share a substrate 20 with the light-emitting layer 21 .

[0054] Third, the portion of the color filter layer 23 used for filtering the light emitted by a sub-pixel 211 is called a color resistance unit 231 .

[0055] Here, in order to make full use of the light emitted from the sub-pixel 211 for display, the orthographic projection of each color resist unit 231 on the light-emitting layer 21 usually completely covers a sub-pixel 211. Even if the orthographic projection of a color resist unit 231 on the light-emitting layer 21 does not completely cover a sub-pixel 211, due to the existence of the pixel defining layer and the signal routing, there will be no light leakage problem. Therefore, the area of ​​the uncovered part can be ignored relative to the area of ​​the covered part.

[0056] Among them, Figure 6 As shown, since a black matrix 25 is also arranged between adjacent color resist units 231, the light emitted from the sub-pixel 211 cannot pass through the black matrix 25 to illuminate the color filter layer 23. Therefore, the projection of the color filter layer 23 on the light-emitting layer 21, which overlaps with the projection of the black matrix 25 on the light-emitting layer 21, cannot be regarded as a part of the color resist unit 231.

[0057] Fourth, the thickness of each color resist unit 231 gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20, which means that the thicknesses of various parts in a color resist unit 231 are not the same, and for any two parts in the color resist unit 231 that are at different distances from the center of the color resist unit 231, the thickness of the part closer to the center of the color resist unit 231 is always not less than the thickness of the part closer to the edge of the color resist unit 231.

[0058] The surface where the substrate 20 is located is the surface of the substrate 20 for arranging the light-emitting layer 21 .

[0059] For example, Figure 4a As shown, for any two parts of the color resist unit 231 that are at different distances from the center of the color resist unit 231 , the thickness of the part closer to the center of the color resist unit 231 is always greater than the thickness of the part closer to the edge of the color resist unit 231 .

[0060] Or, if Figure 4b As shown, for any two parts of the color resist unit 231 that are not at the same distance from the center of the color resist unit 231, the thickness of the part closer to the center of the color resist unit 231 can be greater than the thickness of the part closer to the edge of the color resist unit 231, or can be equal to the thickness of the part closer to the edge of the color resist unit 231, as long as the overall thickness trend of a color resist unit 231 from the edge to the center only includes thickening.

[0061] Here, Figure 4a and Figure 4b This is a cross-sectional view of a color resist unit 231, which only shows the thickness change from two opposite edges to the center of the color resist unit 231. However, those skilled in the art should know that the edges of the color resist unit 231 should not be limited to two opposite edges, for example, they can also be two adjacent edges.

[0062] Fifth, the thickness of each part in the color resist unit 231 is not limited. The thickness of each part of a color resist unit 231 is related to the distance that light at various angles emitted by a sub-pixel 211 actually travels within the color resist unit 231. In the embodiment of the present invention, the thickness of each part of the color resist unit 231 is preferably: when the distance that light of all angles, whether the same or different, emitted from a sub-pixel 211 actually travels within a color resist unit 231 is equal, the thickness of each part of the corresponding color resist unit 231.

[0063] Sixth, on the basis of achieving light filtering, the thickness of the color filter layer 23 should be as thin as possible, for example, 2-10 μm.

[0064] The embodiment of the present invention provides a display device. Since the thickness of the color filter layer 23 is much smaller than that of the circular polarizer, by arranging the color filter layer 23 on the side of the light-emitting layer 21 close to the display surface, not only the reflection of the external ambient light can be reduced, but also the thickness of the display device can be reduced, which is conducive to the thin design of the display device. On this basis, since the large-angle light emitted from any sub-pixel 211 is always deflected toward the sub-pixel 211 adjacent to the sub-pixel 211, the thickness of the color resistance unit 231 closer to the edge is made smaller, so that the distance actually traveled by the large-angle light emitted from the sub-pixel 211 in the color resistance unit 231 can be reduced. Furthermore, the difference in the distance actually traveled by the light at each angle emitted from the sub-pixel 211 in the color resistance unit 231 is reduced, and the color purity difference of the light at each angle emitted from the color resistance unit 231 is also reduced, thereby improving the problem of the difference in the color purity of the picture at different viewing angles in the related art.

[0065] Preferably, Figure 3 As shown, the edge of the orthographic projection of the color-resist unit 231 on the light-emitting layer 21 exceeds the edge of the sub-pixel 211 covered by the orthographic projection of the color-resist unit 231 on the light-emitting layer 21 .

[0066] Here, the size of the edge of the orthographic projection of the color resist unit 231 on the light-emitting layer 21, which exceeds the edge portion of the sub-pixel 211 covered by the orthographic projection of the color resist unit 231, is related to the specific process and the specific structure of the display device and is not limited here. For example, the size of the edge of the orthographic projection of the color resist unit 231, which exceeds the edge portion of the sub-pixel 211 covered by the orthographic projection of the color resist unit 231, is 2-10μm.

[0067] In the embodiment of the present invention, since the emission angle of the large-angle light emitted from the sub-pixel 211 is relatively large, when the orthographic projection of a color resist unit 231 on the light-emitting layer 21 happens to overlap with a sub-pixel 211, part of the large-angle light emitted from the sub-pixel 211 cannot be emitted from the color resist unit 231 for display. Therefore, the embodiment of the present invention makes the edge of the orthographic projection of the color resist unit 231 on the light-emitting layer 21 exceed the edge of the sub-pixel 211 covered by it, thereby making full use of the large-angle light emitted from the sub-pixel 211, thereby improving the brightness of the display device under the same power consumption.

[0068] Preferably, Figure 2 and Figure 3As shown, the display device also includes a first insulating layer 22, and the side of the first insulating layer 22 close to the color filter layer 23 includes a plurality of first grooves, and the depth of each of the plurality of first grooves gradually increases from the edge to the center thereof, along a direction perpendicular to the surface where the substrate 10 is located; wherein the plurality of first grooves correspond to the plurality of color resist units 231 one by one, and the orthographic projection of each of the plurality of color resist units 231 on the light-emitting layer 21 is located within the orthographic projection of the corresponding first groove on the light-emitting layer 21, and the surface of the first groove close to the color filter layer 23 is in contact with the surface of the corresponding color resist unit 231 close to the first insulating layer 22.

[0069] It should be noted that the multiple first grooves correspond to the multiple color resist units 231 one by one, and the orthographic projection of each color resist unit 231 in the multiple color resist units 231 on the light-emitting layer 21 is located within the orthographic projection of the corresponding first groove on the light-emitting layer 21, and the surface of the first groove close to the color filter layer 23 is in contact with the surface of the corresponding color resist unit 2312 close to the first insulating layer 22, which means that the side of the color resist unit 231 close to the first insulating layer 22 is filled in the first groove, and for the one-to-one corresponding first grooves and color resist units 231, the surface of the first groove close to the color resist unit 231 is in direct contact with the surface of the color resist unit 231 close to the first groove. In this way, the thickness of each part in the color resist unit 231 corresponds to the depth of each part in the first groove, so that the thickness of each color resist unit 231 in the multiple color resist units 231 gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20.

[0070] Here, due to the material and the formation process, the surface of the color filter layer 23 on the side away from the first insulating layer 22 is closer to flatness than the surface on the side close to the first insulating layer 22, that is, the curvature of the surface of the color resist unit 231 on the side close to the first insulating layer 22 is greater than the curvature of the surface of the color resist unit 231 on the side away from the first insulating layer 22, that is, the height difference between the edge position and the center position of the surface of the color resist unit 231 on the side close to the first insulating layer 22 is greater than the height difference between the edge position and the center position of the surface of the color resist unit 231 on the side away from the first insulating layer 22, therefore, the thicknesses of the various parts of the color resist unit 231 filled in the first groove are different.

[0071] In the embodiment of the present invention, a pattern of the surface of the color resist unit 231 close to the first insulating layer 22 can be formed according to the pattern of the first groove in the first insulating layer 22, so that the thickness of each color resist unit 231 gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20. The preparation method is simple, and if the light-emitting layer 21 is in direct contact with the first insulating layer 22, the first insulating layer 22 can also protect the light-emitting layer 21.

[0072] Further preferably, Figure 5 As shown, the display device further includes a touch control structure layer 24 disposed on a side of the first insulating layer 22 away from the color filter layer 23 .

[0073] It should be noted that, first, the touch structure layer 24 includes a plurality of touch electrodes, and the material of the touch structure layer 24 is not limited. For example, the material of the touch structure layer 24 may be metal, or transparent conductive materials such as indium tin oxide (ITO).

[0074] Here, considering that the toughness of metal materials is greater than that of oxide conductive materials, when the display device is used as a flexible display device, metal materials are usually used as the material of the touch structure layer 24 in the flexible display device to avoid the touch structure layer 24 from breaking when the flexible display device is deformed.

[0075] However, due to the opacity of metal, in order not to affect the aperture ratio of the display device, such as Figure 6 As shown, the display device further includes a black matrix 25 disposed between adjacent color resist units 231 ; the orthographic projection of the touch structure layer 24 on the light emitting layer 21 is located within the orthographic projection range of the black matrix 25 on the light emitting layer 21 .

[0076] Second, the position of the touch structure layer 24 is not limited, and the orthographic projection of the structure layer 24 on the light-emitting layer 21 may overlap with the sub-pixel 211 or may be between adjacent sub-pixels 211 .

[0077] When the orthographic projection of the touch structure layer 24 on the light emitting layer 21 overlaps with the sub-pixel 211 , the material of the touch structure layer 24 is a transparent conductive material such as ITO.

[0078] Furthermore, since transparent conductive materials also have a certain transmittance, even if transparent conductive materials are used as the material of the touch structure layer 24, part of the light will still be blocked. Therefore, when the material of the touch structure layer 24 is a transparent conductive material such as ITO, the orthographic projection of the touch structure layer 24 on the light-emitting layer 21 can also be located within the orthographic projection range of the black matrix 25 on the light-emitting layer 21.

[0079] Third, the specific structure of the multiple touch electrodes in the touch structure layer 24 is not limited, and the multiple touch electrodes can be arranged in the same layer or in different layers.

[0080] In the embodiment of the present invention, since the touch structure layer 24 includes a conductive material, an insulating layer is often disposed on the touch structure layer 24. The embodiment of the present invention uses the insulating layer disposed on the touch structure layer 24 as the first insulating layer 22. On the one hand, it can protect the touch structure layer 24 and prevent the touch structure layer 24 from being conductively connected to the conductive structures of other layers; on the other hand, it can further reduce the thickness of the display device.

[0081] Further preferably, Figure 7 As shown, the touch structure layer 24 includes a plurality of first touch electrodes 242 and a plurality of second touch electrodes 243 that are insulated from each other and cross-arranged; the plurality of first touch electrodes 242 are electrically connected via a bridge 241 in the region where they intersect with the plurality of second touch electrodes 243; the bridge 241 is isolated from the plurality of second touch electrodes 243 by a second insulating layer 244; the second insulating layer 244 includes a plurality of second grooves on a side close to the first insulating layer 22; wherein the plurality of second grooves correspond to the plurality of first grooves one by one, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer 21 is located within the orthographic projection of the corresponding second groove on the light-emitting layer 21, and the surface of the second groove close to the first insulating layer is in contact with the surface of the first insulating layer 22 close to the second insulating layer 244.

[0082] The thickness of the bridge 241 , the first touch electrode 242 and the second touch electrode 243 is usually 0.2-0.5 μm, and the thickness of the second insulating layer 244 is usually 1.5-3.5 μm. Therefore, the height difference formed by the bridge 241 , or the first touch electrode 242 and the second touch electrode 243 and the second insulating layer 244 can be ignored.

[0083] It should be noted that, first, the bridge 241 can be as follows: Figure 7 The lower bridge shown may also be in the form of an upper bridge, which is not specifically limited in the embodiments of the present invention, and those skilled in the art may make specific settings according to actual needs.

[0084] Second, the plurality of second grooves correspond to the plurality of first grooves one by one, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer 21 is located within the orthographic projection of the corresponding second groove on the light-emitting layer 21, and the surface of the second groove close to the first insulating layer is in contact with the surface of the first insulating layer 22 close to the second insulating layer 244, which means that the first insulating layer 22 is filled in the second groove on the side close to the second insulating layer 244, and for the one-to-one corresponding first grooves and second grooves, the surface of the second groove close to the side of the first groove is in direct contact with the surface of the second groove close to the side of the first groove, so that the depth of each part of the second groove corresponds to the depth of each part of the first groove, so that the depth of each first groove in the plurality of first grooves gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20.

[0085] Here, due to the material and the formation process, the surface of the first insulating layer 22 on the side away from the second insulating layer 244 is closer to flatness than the surface on the side close to the second insulating layer 244, that is, the curvature of the surface of the first groove on the side close to the second insulating layer 244 is greater than the curvature of the surface of the first groove on the side away from the second insulating layer 244, that is, the height difference between the edge position and the center position of the surface of the first groove on the side close to the second insulating layer 244 is greater than the height difference between the edge position and the center position of the surface of the first groove on the side away from the second insulating layer 244. Furthermore, the color filter layer 23 also has a certain flattening effect during the formation process, and the curvature of the surface of the color resist unit 231 on the side close to the first insulating layer 22 is greater than the curvature of the surface of the color resist unit 231 on the side away from the first insulating layer 22. Therefore, the thicknesses of the various parts of the color resist unit 231 filled in the first groove are different.

[0086] Third, the specific shape of the second groove is not limited, as long as the depth of each first groove in the first insulating layer 22 arranged on the second insulating layer 244 can gradually increase from the edge to the center along the direction perpendicular to the surface of the substrate 20.

[0087] For example, Figure 7 As shown in FIG. 1 , the depth of each second groove gradually increases from its edge to the center along the direction perpendicular to the surface where the substrate 20 is located; or, as shown in FIG. Figure 8 As shown, the depth of each second groove from the edge to the center thereof along the direction perpendicular to the surface where the substrate 20 is located is substantially equal.

[0088] In the embodiment of the present invention, the first groove is formed by utilizing the pattern of the second groove in the second insulating layer 244 of the touch structure layer 24, so that the depth of the first groove gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20. The preparation method is simple and is conducive to reducing the thickness of the display device.

[0089] Further preferably, Figure 8 As shown, multiple first touch electrodes 242 and multiple second touch electrodes 243 are arranged on the side of the bridge 241 close to the first insulating layer 22; the side of the second insulating layer 244 close to the first insulating layer 22 also includes a third groove, and the orthographic projection of the third groove on the light-emitting layer 21 is located between the orthographic projections of the adjacent first touch electrodes 242 and second touch electrodes 243 on the light-emitting layer 21.

[0090] That is, the touch structure layer 24 in the embodiment of the present invention is a lower bridge structure. In the process of preparing the lower bridge structure, a bridge 241 is first formed, and then an insulating layer is formed on the bridge 241. Finally, a plurality of first touch electrodes 242 and a plurality of second touch electrodes 243 are formed on the insulating layer.

[0091] In the embodiment of the present invention, since the etching materials of the first touch electrode 242, the second touch electrode 243 and the second insulating layer 244 are different, when preparing the second insulating layer 244, the first touch electrode 242 and the second touch electrode 243 can be used as a mask to form a second insulating layer 244 having a second groove and a third groove by etching. In this way, a layer of mask can be omitted, which can save preparation costs.

[0092] On this basis, for any of the above embodiments, the thickness of the first touch electrode 242 and the second touch electrode 243 can be set to T1, and the maximum depth of the first groove can be set to T2. In this way, the thickness of the portion where the orthogonal projection of the touch structure layer 24 on the light-emitting layer 21 is located between the sub-pixels 211 and the thickness difference ΔH1=T1+T2 between the portion where the orthogonal projection of the touch structure layer 24 on the light-emitting layer 21 overlaps with the sub-pixel 211. The first insulating layer 22 is arranged on the side of the touch structure layer 24 close to the color filter layer 23. Due to the material and the formation process, the surface of the first insulating layer 22 on the side away from the second insulating layer 244 is closer to flatness than the surface on the side close to the second insulating layer 244. The thickness of the portion where the orthogonal projection of the touch structure layer 24 and the first insulating layer 22 on the light-emitting layer 21 is located between the sub-pixels 211 and the thickness of the portion where the orthogonal projection of the touch structure layer 24 on the light-emitting layer 21 overlaps with the sub-pixel 21. 4 and the thickness difference ΔH2<ΔH1 of the portion where the orthogonal projection of the first insulating layer 22 on the light emitting layer 21 overlaps with the sub-pixel 211; finally, a color filter layer 23 is provided on the side of the first insulating layer 22 away from the second insulating layer 244. Due to the material and the formation process, the surface of the color filter layer 23 on the side away from the first insulating layer 22 is closer to flatness than the surface on the side close to the first insulating layer 22. Therefore, the thickness difference ΔH3<ΔH2<ΔH1 of the portion where the orthogonal projection of the touch structure layer 24, the first insulating layer 22 and the color filter layer 23 on the light emitting layer 21 is located between the sub-pixels 211 and the thickness difference ΔH3<ΔH2<ΔH1 of the portion where the orthogonal projection of the touch structure layer 24, the first insulating layer 22 and the color filter layer 23 on the light emitting layer 21 overlaps with the sub-pixel 211. In this way, the surface of the color filter layer 23 on the side away from the first insulating layer 22 tends to be flat. Furthermore, in order to make the surface of the color filter layer 23 away from the first insulating layer 22 more flat, the thickness of the color filter layer 23 may be appropriately increased to improve the flatness of the color filter layer 23 and make ΔH3 negligible.

[0093] Of course, a planar layer may also be provided on the side of the color filter layer 23 away from the first insulating layer 22 .

[0094] Preferably, the first insulating layer 22 and the second insulating layer 244 include organic materials.

[0095] In the embodiment of the present invention, organic materials have greater toughness than inorganic materials. Therefore, when the display device is used as a flexible display device, using organic materials as the materials of the first insulating layer 22 and the second insulating layer 244 can prevent the first insulating layer 22 and the second insulating layer 244 from breaking when the flexible display device is deformed.

[0096] An embodiment of the present invention provides a method for manufacturing a display device, such as Figure 2 and Figure 3As shown, a light-emitting layer 21 is formed on a substrate 20, and a color filter layer 23 is formed on a side of the light-emitting layer 21 close to a display surface; the light-emitting layer 21 includes a plurality of sub-pixels 211, and the color filter layer 23 includes a plurality of color resist units 231, and the orthographic projection of each color resist unit 231 in the plurality of color resist units 231 on the light-emitting layer 21 covers one sub-pixel 211 in the plurality of sub-pixels 211; wherein, the thickness of each color resist unit 231 in the plurality of color resist units 231 gradually increases from its edge to its center, along a direction perpendicular to the surface where the substrate 20 is located.

[0097] It should be noted that, first, the display device can be a display panel or a display including a display panel, wherein the display panel can be an OLED display panel or an LCD display panel, and there is no limitation on this, as long as the display device can be used for display.

[0098] When the display panel is an OLED display panel, each “sub-pixel 211” in the “light-emitting layer 21 includes multiple sub-pixels 211” is defined by a pixel defining layer; when the display panel is an LCD display panel, each “sub-pixel 211” in the “light-emitting layer 21 includes multiple sub-pixels 211” is defined by a gate line and a data line.

[0099] Second, the color filter layer 23 can be located inside the display panel or outside the display panel, as long as the color filter layer 23 is located on the side of the light-emitting layer 21 close to the display surface.

[0100] When the color filter layer 23 is located inside the display panel, the color filter layer 23 may be located on the array substrate of the display panel or on the cell-matching substrate of the display panel; when the color filter layer 23 is located on the array substrate of the display panel, the color filter layer 23 may be located on the side of the light-emitting layer 21 close to or away from the substrate 20 according to the different light-emitting directions of the light-emitting layer 21. When the color filter layer 23 is disposed outside the display panel, the color filter layer 23 may be located on the side of the cell-matching substrate away from the array substrate or on the side of the array substrate away from the cell-matching substrate according to the different light-emitting directions of the light-emitting layer 21, and the color filter layer 23 may be covered with a cover plate to protect the color filter layer 23.

[0101] On this basis, when the color filter layer 23 is located on the array substrate, or located on the side of the array substrate away from the cell substrate, the substrate used to set the color filter layer 23 can be shared with the substrate 20 for setting the light emitting layer 21 .

[0102] Third, a light emitting layer 21 is formed on the substrate 20, and a color filter layer 23 is formed on a side of the light emitting layer 21 close to the display surface. The order of forming the light emitting layer 21 and the color filter layer 23 is related to the light emitting direction of the light emitting layer 21 and the position of the color filter layer 23. Specifically, it can be divided into the following situations:

[0103] The first case: assuming that the light emitted from the light-emitting layer 21 is emitted in the direction of the array substrate toward the box substrate, and the color filter layer 23 is located on the array substrate, the light-emitting layer 21 is first formed on the substrate 20, and then the color filter layer 23 is formed on the side of the light-emitting layer 21 away from the substrate 20.

[0104] The second case: assuming that the light emitted from the light-emitting layer 21 is emitted in the direction of the array substrate toward the matching box substrate, and the color filter layer 23 is located on the matching box substrate, the light-emitting layer 21 and the color filter layer 23 are not arranged on the same substrate. Therefore, the order of forming the light-emitting layer 21 and the color filter layer 23 is not limited.

[0105] In the third case, assuming that the light emitted from the light-emitting layer 21 is emitted in the direction of the array substrate toward the matching box substrate, and the color filter layer 23 is located outside the display panel (the matching box substrate is on the side away from the array substrate), the light-emitting layer 21 and the color filter layer 23 are not arranged on the same substrate. Therefore, the order of forming the light-emitting layer 21 and the color filter layer 23 is not limited.

[0106] The fourth case: assuming that the light emitted from the light-emitting layer 21 is emitted in the direction of the box substrate pointing to the array substrate, and the color filter layer 23 is located on the array substrate, the color filter layer 23 is first formed on the substrate 20, and then the light-emitting layer 21 is formed on the side of the color filter layer 23 away from the substrate 20.

[0107] The fifth case: assuming that the light emitted from the light-emitting layer 21 is emitted in the direction from the matching substrate to the array substrate, and the color filter layer 23 is located outside the display panel (the array substrate is on the side away from the matching substrate), the light-emitting layer 21 and the color filter layer 23 are not arranged on the same side of a substrate 20, or the light-emitting layer 21 and the color filter layer 23 are not arranged on the same substrate. Therefore, the order of forming the light-emitting layer 21 and the color filter layer 23 is not limited.

[0108] Fourthly, the portion of the color filter layer 23 used for filtering the light emitted by a sub-pixel 211 is called a color resistance unit 231 .

[0109] Here, in order to fully utilize the light emitted from the sub-pixel 211 for display, the orthographic projection of each color resist unit 231 on the light-emitting layer 21 usually completely covers one sub-pixel 211. Even if the orthographic projection of a color resist unit 231 on the light-emitting layer 21 does not completely cover one sub-pixel 211, the area of ​​the uncovered portion can be ignored relative to the area of ​​the covered portion.

[0110] Among them, Figure 6 As shown, since a black matrix 25 is provided between adjacent color resist units 231, light emitted from the sub-pixel 211 cannot pass through the black matrix 25 to illuminate the color filter layer 23. Therefore, the part where the orthographic projection of the color filter layer 23 on the light-emitting layer 21 overlaps with the projection of the black matrix 25 on the light-emitting layer 21 cannot be regarded as a part of the color resist unit 231.

[0111] Fifth, the thickness of each color resist unit 231 gradually increases from its edge to the center along a direction perpendicular to the surface of the substrate 20, which means that the thicknesses of various parts in a color resist unit 231 are not the same, and for any two parts in the color resist unit 231 that are at different distances from the center of the color resist unit 231, the thickness of the part closer to the center of the color resist unit 231 is always not less than the thickness of the part closer to the edge of the color resist unit 231.

[0112] The surface where the substrate 20 is located is the surface of the substrate 20 for arranging the light-emitting layer 21 .

[0113] For example, Figure 4a As shown, for any two parts of the color resist unit 231 that are at different distances from the center of the color resist unit 231 , the thickness of the part closer to the center of the color resist unit 231 is always greater than the thickness of the part closer to the edge of the color resist unit 231 .

[0114] Or, if Figure 4b As shown, for any two parts of the color resist unit 231 that are not at the same distance from the center of the color resist unit 231, the thickness of the part closer to the center of the color resist unit 231 can be greater than the thickness of the part closer to the edge of the color resist unit 231, or can be equal to the thickness of the part closer to the edge of the color resist unit 231, as long as the overall thickness trend of a color resist unit 231 from the edge to the center only includes thickening.

[0115] Here, Figure 4a and Figure 4b This is a cross-sectional view of a color resist unit 231, which only shows the thickness change from two opposite edges to the center of the color resist unit 231. However, those skilled in the art should know that the edges of the color resist unit 231 should not be limited to two opposite edges, for example, they can also be two adjacent edges.

[0116] Sixth, the thickness of each part in the color resist unit 231 is not limited. The thickness of each part of a color resist unit 231 is related to the distance that light at various angles emitted by a sub-pixel 211 actually travels within the color resist unit 231. In the embodiment of the present invention, the thickness of each part of the color resist unit 231 is preferably: when the distance that light of all angles, whether the same or different, emitted from a sub-pixel 211 actually travels within a color resist unit 231 is equal, the thickness of each part of the corresponding color resist unit 231.

[0117] Seventh, on the basis of achieving light filtering, the thickness of the color filter layer 23 should be as thin as possible, for example, 2-10 μm.

[0118] The embodiment of the present invention provides a method for preparing a display device. Since the thickness of the color filter layer 23 is much smaller than that of the circular polarizer, by forming the color filter layer 23 on the side of the light-emitting layer 21 close to the display surface, not only the reflection of the external ambient light can be reduced, but also the thickness of the display device can be reduced, which is conducive to the thin design of the display device. On this basis, since the large-angle light emitted from any sub-pixel 211 is always deflected toward the sub-pixel 211 adjacent to the sub-pixel 211, the thickness of the color resistance unit 231 closer to the edge is made smaller, so that the distance actually traveled by the large-angle light emitted from the sub-pixel 211 in the color resistance unit 231 can be reduced. Furthermore, the difference in the distance actually traveled by the light at each angle emitted from the sub-pixel 211 in the color resistance unit 231 is reduced, and the color purity difference of the light at each angle emitted from the color resistance unit 231 is also reduced, thereby improving the problem of the difference in the color purity of the picture at different viewing angles in the related art.

[0119] Preferably, Figure 3 As shown, the edge of the orthographic projection of the color-resist unit 231 on the light-emitting layer 21 exceeds the edge of the sub-pixel 211 covered by the orthographic projection of the color-resist unit 231 on the light-emitting layer 21 .

[0120] Here, the size of the edge of the orthographic projection of the color resist unit 231 on the light-emitting layer 21, which exceeds the edge portion of the sub-pixel 211 covered by the orthographic projection of the color resist unit 231, is related to the specific process and the specific structure of the display device and is not limited here. For example, the size of the edge of the orthographic projection of the color resist unit 231, which exceeds the edge portion of the sub-pixel 211 covered by the orthographic projection of the color resist unit 231, is 2-10μm.

[0121] In the embodiment of the present invention, since the emission angle of the large-angle light emitted from the sub-pixel 211 is relatively large, when the orthographic projection of a color resist unit 231 on the light-emitting layer 21 happens to overlap with a sub-pixel 211, part of the large-angle light emitted from the sub-pixel 211 cannot be emitted from the color resist unit 231 for display. Therefore, the embodiment of the present invention makes the edge of the orthographic projection of the color resist unit 231 on the light-emitting layer 21 exceed the edge of the sub-pixel 211 covered by it, thereby making full use of the large-angle light emitted from the sub-pixel 211, thereby improving the brightness of the display device under the same power consumption.

[0122] Preferably, Figure 2 and Figure 3 As shown, before forming the color filter layer 23, the method further includes:

[0123] A first insulating layer 22 is formed, and a side of the first insulating layer 22 close to the color filter layer 23 includes a plurality of first grooves, and the depth of each of the plurality of first grooves gradually increases from the edge to the center thereof along a direction perpendicular to the surface where the substrate 20 is located; wherein the plurality of first grooves correspond to the plurality of color resist units 231 one by one, and the orthographic projection of each of the plurality of color resist units 231 on the light-emitting layer 21 is located within the orthographic projection of the corresponding first groove on the light-emitting layer 21, and the surface of the first groove close to the color filter layer 23 is in contact with the surface of the corresponding color resist unit 231 close to the first insulating layer 22.

[0124] It should be noted that the multiple first grooves correspond to the multiple color resist units 231 one by one, and the orthographic projection of each color resist unit 231 in the multiple color resist units 231 on the light-emitting layer 21 is located within the orthographic projection of the corresponding first groove on the light-emitting layer 21, and the surface of the first groove close to the color filter layer 23 is in contact with the surface of the corresponding color resist unit 2312 close to the first insulating layer 22, which means that the side of the color resist unit 231 close to the first insulating layer 22 is filled in the first groove, and for the one-to-one corresponding first grooves and color resist units 231, the surface of the first groove close to the color resist unit 231 is in direct contact with the surface of the color resist unit 231 close to the first groove. In this way, the thickness of each part in the color resist unit 231 corresponds to the depth of each part in the first groove, so that the thickness of each color resist unit 231 in the multiple color resist units 231 gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20.

[0125] Here, due to the material and the formation process, the surface of the color filter layer 23 on the side away from the first insulating layer 22 is closer to flatness than the surface on the side close to the first insulating layer 22, that is, the curvature of the surface of the color resist unit 231 on the side close to the first insulating layer 22 is greater than the curvature of the surface of the color resist unit 231 on the side away from the first insulating layer 22, that is, the height difference between the edge position and the center position of the surface of the color resist unit 231 on the side close to the first insulating layer 22 is greater than the height difference between the edge position and the center position of the surface of the color resist unit 231 on the side away from the first insulating layer 22, therefore, the thicknesses of the various parts of the color resist unit 231 filled in the first groove are different.

[0126] In the embodiment of the present invention, a pattern of the surface of the color resist unit 231 close to the first insulating layer 22 can be formed according to the pattern of the first groove in the first insulating layer 22, so that the thickness of each color resist unit 231 gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20. The preparation method is simple, and if the light-emitting layer 21 is in direct contact with the first insulating layer 22, the first insulating layer 22 can also protect the light-emitting layer 21.

[0127] Further preferably, the first insulating layer 22 is formed, such as Fig. 9 As shown, this can be achieved through the following steps:

[0128] S10, such as Fig.10a As shown, a photosensitive film 221 is formed.

[0129] S20, such as Fig.10b As shown, a grayscale mask method is used to expose different portions of the photosensitive film 221 with different energies, and then developed to form the first insulating layer 22 .

[0130] Here, the exposure energy received by each part of the photosensitive film 221 is different, and after development, the thickness retained by each part is also different.

[0131] In the embodiment of the present invention, since the photosensitive material is also an insulating material, the first insulating layer 22 is prepared using the photosensitive material, which can save the etching process, thereby simplifying the preparation process and saving the preparation cost.

[0132] Preferably, Figure 7 As shown, the method also includes: forming a black matrix 25 between adjacent color resist units 231, and before forming the first insulating layer 22, forming a touch structure layer 24 located on a side of the first insulating layer 22 away from the color filter layer 23, and the orthographic projection of the touch structure layer 24 on the light-emitting layer 21 is located within the orthographic projection range of the black matrix 25 on the light-emitting layer 21.

[0133] Among them, the touch structure layer 24 is formed, including: forming a second insulating layer 244, a bridge 241, and a plurality of first touch electrodes 242 and a plurality of second touch electrodes 243 that are insulated from each other and cross-arranged; the plurality of first touch electrodes 242 are electrically connected through the bridge 241 in the area where they intersect with the plurality of second touch electrodes 243; the bridge 241 and the plurality of second touch electrodes 243 are isolated by the second insulating layer 244; the second insulating layer 244 includes a plurality of second grooves on one side close to the first insulating layer 22; the plurality of second grooves correspond to the plurality of first grooves one by one, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer 21 is located within the orthographic projection of the corresponding second groove on the light-emitting layer 21, and the surface of the second groove close to the first insulating layer 22 is in contact with the surface of the first insulating layer 22 close to the second insulating layer 244.

[0134] Here, since the thickness of the bridge 241, the first touch electrode 242 and the second touch electrode 243 is usually 0.2-0.5 μm, and the thickness of the second insulating layer 244 is usually 1.5-3.5 μm, the height difference formed by the bridge 241, or the first touch electrode 242 and the second touch electrode 243 and the second insulating layer 244 can be ignored.

[0135] It should be noted that, first, the touch structure layer 24 includes a plurality of touch electrodes, and the material of the touch structure layer 24 is not limited. For example, the material of the touch structure layer 24 may be metal, or a transparent conductive material such as ITO.

[0136] Here, considering that the toughness of metal materials is greater than that of oxide conductive materials, when the display device is used as a flexible display device, metal materials are usually used as the material of the touch structure layer 24 in the flexible display device to avoid the touch structure layer 24 from breaking when the flexible display device is deformed.

[0137] Second, bridge 241 can be as follows Figure 7 The lower bridge shown may also be in the form of an upper bridge, which is not specifically limited in the embodiments of the present invention, and those skilled in the art may make specific settings according to actual needs.

[0138] Third, a second insulating layer 244, a bridge 241, and a plurality of first touch electrodes 242 and a plurality of second touch electrodes 243 that are insulated from each other and cross-arranged may be formed by a patterning process. Specifically, the relative positions of the bridge 241 and the plurality of first touch electrodes 242 and the plurality of second touch electrodes 243 may be determined, and specifically include the following two situations:

[0139] The first case, such as Fig.11 As shown, this can be achieved through the following steps:

[0140] S111, such as Fig.12a As shown, a bridge 241, an insulating film 2441, a plurality of first touch electrodes 242, and a plurality of second touch electrodes 243 are sequentially formed, and the plurality of first touch electrodes 242 are electrically connected through the bridge 241 in the region where they intersect with the plurality of second touch electrodes 243. The plurality of first touch electrodes 242 are electrically connected through the bridge 241 in the region where they intersect with the plurality of second touch electrodes 243 via the via holes on the insulating film 2441.

[0141] Here, the plurality of first touch electrodes 242 and the plurality of second touch electrodes 243 are formed simultaneously.

[0142] S112, such as Figure 12b As shown, the insulating film 2441 is etched through exposure, development, and etching processes to form the second insulating layer 244.

[0143] The second case, such as Fig.13 As shown, this can be achieved through the following steps:

[0144] S121, sequentially forming a plurality of first touch electrodes 242 and a plurality of second touch electrodes 243, an insulating film 2441, and a bridge 241, wherein the plurality of first touch electrodes 242 are electrically connected to the plurality of second touch electrodes 243 via the bridge 241 in a region where the plurality of first touch electrodes 242 intersect with the plurality of second touch electrodes 243. The plurality of first touch electrodes 242 are electrically connected to the plurality of second touch electrodes 243 via the bridge 241 through via holes on the insulating film 2441.

[0145] Here, the plurality of first touch electrodes 242 and the plurality of second touch electrodes 243 are formed simultaneously.

[0146] S122 , etching the insulating film 2441 through exposure, development, and etching processes to form the second insulating layer 244 .

[0147] Fourth, the multiple second grooves correspond to the multiple first grooves one by one, and the orthographic projection of each of the multiple first grooves on the light-emitting layer 21 is located within the orthographic projection of the corresponding second groove on the light-emitting layer 21, and the surface of the second groove close to the first insulating layer is in contact with the surface of the first insulating layer 22 close to the second insulating layer 244, which means that the first insulating layer 22 is filled in the second groove on the side close to the second insulating layer 244, and for the one-to-one corresponding first grooves and second grooves, the surface of the second groove close to the side of the first groove is in direct contact with the surface of the second groove close to the side of the first groove, so that the depth of each part of the second groove corresponds to the depth of each part of the first groove, so that the depth of each first groove in the multiple first grooves gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20.

[0148] Here, due to the material and the formation process, the surface of the first insulating layer 22 on the side away from the second insulating layer 244 is closer to flatness than the surface on the side close to the second insulating layer 244, that is, the curvature of the surface of the first groove on the side close to the second insulating layer 244 is greater than the curvature of the surface of the first groove on the side away from the second insulating layer 244, that is, the height difference between the edge position and the center position of the surface of the first groove on the side close to the second insulating layer 244 is greater than the height difference between the edge position and the center position of the surface of the first groove on the side away from the second insulating layer 244. Furthermore, the color filter layer 23 also has a certain flattening effect during the formation process, and the curvature of the surface of the color resist unit 231 on the side close to the first insulating layer 22 is greater than the curvature of the surface of the color resist unit 231 on the side away from the first insulating layer 22. Therefore, the thicknesses of the various parts of the color resist unit 231 filled in the first groove are different.

[0149] Fifth, the specific shape of the second groove is not limited, as long as the depth of each first groove in the first insulating layer 22 disposed on the second insulating layer 244 can gradually increase from the edge to the center thereof along a direction perpendicular to the surface of the substrate 20 .

[0150] For example, Figure 7 As shown in FIG. 1 , the depth of each second groove gradually increases from its edge to the center along the direction perpendicular to the surface where the substrate 20 is located; or, as shown in FIG. Figure 8 As shown, each second groove has the same depth from the edge to the center thereof along a direction perpendicular to the surface where the substrate 20 is located.

[0151] In the embodiment of the present invention, since the touch structure layer 24 includes a conductive material, an insulating layer is often disposed on the touch structure layer 24. The embodiment of the present invention uses the insulating layer disposed on the touch structure layer 24 as the first insulating layer 22. On the one hand, it can protect the touch structure layer 24 and prevent the touch structure layer 24 from being conductively connected to the conductive structures of other layers; on the other hand, it can further reduce the thickness of the display device; on this basis, the first groove is formed by using the pattern of the second groove in the second insulating layer 244 of the touch structure layer 24, so that the depth of the first groove gradually increases from its edge to the center along the direction perpendicular to the surface of the substrate 20. The preparation method is simple and is conducive to reducing the thickness of the display device.

[0152] Further preferably, a second insulating layer 244, a bridge 241, and a plurality of first touch electrodes 242 and a plurality of second touch electrodes 243 that are insulated from each other and cross-arranged are formed. Fig.14 As shown, this can be achieved through the following steps:

[0153] S211, such as Fig.12aAs shown, a bridge 241, an insulating film 2441, a plurality of first touch electrodes 242, and a plurality of second touch electrodes 243 are sequentially formed, and the plurality of first touch electrodes 242 are electrically connected through the bridge 241 in the region where they intersect with the plurality of second touch electrodes 243. The plurality of first touch electrodes 242 are electrically connected through the bridge 241 in the region where they intersect with the plurality of second touch electrodes 243 via the via holes on the insulating film 2441.

[0154] Here, the plurality of first touch electrodes 242 and the plurality of second touch electrodes 243 are formed simultaneously.

[0155] S212, such as Fig.15 As shown, using multiple first touch electrodes 242 and multiple second touch electrodes 243 as masks, the insulating film 2441 is etched to form a second insulating layer 244. The second insulating layer 244 also includes a third groove on the side close to the first insulating layer 22. The orthographic projection of the third groove on the light-emitting layer 21 is located between the orthographic projections of the adjacent first touch electrodes 242 and second touch electrodes 244 on the light-emitting layer 21.

[0156] In the embodiment of the present invention, since the etching materials of the first touch electrode 242, the second touch electrode 243 and the second insulating layer 244 are different, when preparing the second insulating layer 244, the first touch electrode 242 and the second touch electrode 243 can be used as a mask to form a second insulating layer 244 having a second groove and a third groove by etching. In this way, a layer of mask can be omitted, which can save preparation costs.

[0157] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. A display panel; comprising a substrate and a light-emitting layer arranged on the substrate, wherein the light-emitting layer comprises a plurality of sub-pixels, characterized in that: It also includes a color filter layer disposed on a side of the light-emitting layer close to the display surface, the color filter layer includes a plurality of color resistance units, and the orthographic projection of each of the plurality of color resistance units on the light-emitting layer covers one of the plurality of sub-pixels; Wherein, the thickness of each color resist unit in the plurality of color resist units gradually increases from the edge to the center thereof along a direction perpendicular to the surface where the substrate is located; A first insulating layer, wherein a side of the first insulating layer close to the color filter layer comprises a plurality of first grooves, and a depth of each of the plurality of first grooves gradually increases from an edge to a center thereof along a direction perpendicular to a surface where the substrate is located; The plurality of first grooves correspond to the plurality of color-resistance units one by one, and the orthographic projection of each of the plurality of color-resistance units on the light-emitting layer is located within the orthographic projection of the first groove corresponding thereto on the light-emitting layer, and the surface of the first groove close to the color filter layer contacts the surface of the color-resistance unit close to the first insulating layer; A touch control structure layer disposed on a side of the first insulating layer away from the color filter layer; The touch structure layer includes a plurality of first touch electrodes and a plurality of second touch electrodes which are insulated from each other and arranged crosswise; the plurality of first touch electrodes are electrically connected via a bridge in a region where they intersect with the plurality of second touch electrodes; the bridge is isolated from the plurality of second touch electrodes by a second insulating layer; A black matrix disposed between two adjacent ones of the plurality of color-resistance units; The orthographic projection of the touch structure layer on the light-emitting layer is located within the orthographic projection range of the black matrix on the light-emitting layer.

2. The display panel according to claim 1, characterized in that: The second insulating layer includes a plurality of second grooves on a side close to the first insulating layer; wherein the plurality of second grooves correspond one-to-one to the plurality of first grooves, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer is located within the orthographic projection of the corresponding second groove on the light-emitting layer, and the surface of the second groove on a side close to the first insulating layer is in contact with the surface of the first insulating layer on a side close to the second insulating layer.

3. The display panel according to claim 1, characterized in that: An edge of an orthographic projection of each of the plurality of color-resist units on the light-emitting layer exceeds an edge of a sub-pixel covered by the orthographic projection of the color-resist unit on the light-emitting layer.

4. The display panel according to claim 3, characterized in that: The size of the edge of the orthographic projection of each of the plurality of color-resist units on the light-emitting layer beyond the edge of the sub-pixel covered by the orthographic projection of the color-resist unit on the light-emitting layer is in the range of 2 μm to 10 μm.

5. The display panel according to claim 1, characterized in that: The plurality of first touch electrodes and the plurality of second touch electrodes are arranged on a side of the bridge close to the first insulating layer; The second insulating layer further includes a third groove on a side close to the first insulating layer, and an orthographic projection of the third groove on the light-emitting layer is located between the orthographic projections of the adjacent first touch electrode and the second touch electrode on the light-emitting layer.

6. The display panel according to claim 1, characterized in that: The first insulating layer includes an organic material.

7. The display panel according to claim 1, characterized in that: The second insulating layer includes an organic material.

8. The display panel according to any one of claims 1 to 7, characterized in that: The thickness of the color filter layer ranges from 2 μm to 10 μm.

9. A method for preparing a display panel according to any one of claims 1 to 8, characterized in that: A light-emitting layer is formed on a substrate, and a color filter layer is formed on a side of the light-emitting layer close to a display surface; The light-emitting layer includes a plurality of sub-pixels, the color filter layer includes a plurality of color-resistance units, and the orthographic projection of each of the plurality of color-resistance units on the light-emitting layer covers one of the plurality of sub-pixels; Wherein, the thickness of each color resist unit in the plurality of color resist units gradually increases from the edge to the center thereof along a direction perpendicular to the surface where the substrate is located.

10. The preparation method according to claim 9, characterized in that: Before forming the color filter layer, the method further includes: forming a first insulating layer, wherein a side of the first insulating layer close to the color filter layer comprises a plurality of first grooves, and a depth of each of the plurality of first grooves gradually increases from an edge to a center thereof along a direction perpendicular to a surface where the substrate is located; Among them, the multiple first grooves correspond to the multiple color resist units one by one, and the orthographic projection of each of the multiple color resist units on the light-emitting layer is located within the orthographic projection of the corresponding first groove on the light-emitting layer, and the surface of the first groove close to the color filter layer is in contact with the surface of the corresponding color resist unit close to the first insulating layer.

11. The preparation method according to claim 10, characterized in that: Forming a first insulating layer, comprising: forming a photosensitive film; The grayscale mask method is used to expose different parts of the photosensitive film with different energies, and then the first insulating layer is formed by developing.

12. The preparation method according to claim 11, characterized in that: The method further comprises: A black matrix is ​​formed between two adjacent ones of the plurality of color-resistance units, and before forming the first insulating layer, a touch structure layer is formed on a side of the first insulating layer away from the color filter layer, wherein the orthographic projection of the touch structure layer on the light-emitting layer is within the orthographic projection range of the black matrix on the light-emitting layer; The step of forming the touch structure layer includes: A second insulating layer, a bridge, and a plurality of first touch electrodes and a plurality of second touch electrodes that are insulated from each other and arranged crosswise are formed; the plurality of first touch electrodes are electrically connected through the bridge in the area where they intersect with the plurality of second touch electrodes; the bridge is isolated from the plurality of second touch electrodes by the second insulating layer; The side of the second insulating layer close to the first insulating layer includes a plurality of second grooves; the plurality of second grooves correspond to the plurality of first grooves one by one, and the orthographic projection of each of the plurality of first grooves on the light-emitting layer is located within the orthographic projection of the corresponding second groove on the light-emitting layer, and the surface of the second groove close to the first insulating layer is in contact with the surface of the first insulating layer close to the second insulating layer.

13. The preparation method according to claim 12, characterized in that: The second insulating layer, the bridge, and the plurality of first touch electrodes and the plurality of second touch electrodes which are insulated from each other and cross-arranged are formed, including: The bridge, the insulating film, the plurality of first touch electrodes and the plurality of second touch electrodes are sequentially formed, wherein the plurality of first touch electrodes are electrically connected to the plurality of second touch electrodes through the bridge in the area where the plurality of first touch electrodes intersect with the plurality of second touch electrodes; Using the multiple first touch electrodes and the multiple second touch electrodes as mask templates, the insulating film is etched to form the second insulating layer, and the second insulating layer also includes a third groove on the side close to the first insulating layer, and the orthographic projection of the third groove on the light-emitting layer is located between the orthographic projections of the adjacent first touch electrodes and the second touch electrodes on the light-emitting layer.

14. A display device, characterized in that: The invention comprises the display panel according to any one of claims 1 to 8.

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