Polishing mechanism for electromechanical equipment machining

Abstract

The invention relates to the technical field of electromechanical machining, in particular to a polishing mechanism for electromechanical equipment machining, which comprises an operation table, a lifting table is fixedly mounted at the upper end of the operation table, a first air cylinder is fixedly mounted at the lower end of the output end of the lifting table, and a motor is fixedly mounted at the upper end of the lifting table. The output end of the motor penetrates through the lifting table to be fixedly connected with a first air cylinder, four electric push plates are distributed at the lower end of the first air cylinder in a circumferential array mode along the axis of the first air cylinder, the output end of the first air cylinder extends to the bottoms of the electric push plates, and an arc cover plate is fixedly installed at the output end of the first air cylinder. According to the pump shell polishing device, the rotating plate is driven to rotate through contraction of the second air cylinder, the four triangular polishing sponges are inclined and combined into a cone, and therefore the upper end of a pump shell is polished, meanwhile, the pump shell is switched between clamping and polishing through the clamping and polishing structure, and the polishing efficiency is improved. And internal and external polishing of the pump shell is integrated.

Description

Technical Field

[0001] The invention relates to the technical field of electromechanical processing, in particular to a polishing mechanism used for electromechanical equipment processing. Background Art

[0002] Polishing is an important part of modern processing technology. It is widely used in the production of metal and non-metal products, precision electromechanical products and daily necessities. The main purpose of polishing is to improve the surface quality of the product and make it meet higher requirements of smoothness and precision. In the processing of electromechanical equipment, the role of polishing mechanism is particularly critical, which directly affects the final quality and market competitiveness of the product.

[0003] When polishing electromechanical equipment, some electromechanical housings such as pump equipment and motors generally adopt a design with a rounded top or a semicircular top cover to ensure good heat dissipation and improve structural strength. When polishing the shell of this shape, workers often need to manually polish it due to the irregularity of the shell, which reduces production efficiency. At the same time, two different equipment are required to polish the inside and outside of the electromechanical shell, which increases production costs. Summary of the invention

[0004] The purpose of the invention is to provide a subject matter to solve the problems raised in the above background technology.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a polishing mechanism for electromechanical equipment processing, comprising an operating table, a lifting platform is fixedly installed on the upper end of the operating table, a cylinder is fixedly installed on the lower end of the output end of the lifting platform, a motor is fixedly installed on the upper end of the lifting platform, and the output end of the motor passes through the lifting platform and is fixedly connected to the cylinder, the lower end of the cylinder is arranged with four electric push plates along the circumference of the axis of the cylinder, and the output end of the cylinder extends to the bottom of the electric push plate, the output end of the cylinder is fixedly installed with an arc cover plate, each of which is The output ends of the electric push plates are fixedly installed with support plates, the lower ends of each support plate are rotatably connected with a rotating plate, a polishing sponge is fixedly installed on the side of each rotating plate close to the axis of the cylinder, a triangular polishing sponge is fixedly installed on the upper end of each polishing sponge, and the triangular polishing sponges are all fitted with the corresponding support plates, a support block 1 is fixedly installed on the outer wall of each support plate, two support blocks 2 are fixedly installed on the outer wall of each rotating plate, and a cylinder 2 is rotatably connected between the support blocks 1 and 2 at two corresponding positions; A clamping and polishing structure is installed at the upper end of the operating table, and a pump shell is sleeved on the upper end of the clamping and polishing structure. A liquid collecting structure is installed at the lower end of the rotating plate, and the liquid collecting structure can clamp the steering wheel.

[0006] Preferably, the clamping and polishing structure includes a fixed table, which is fixedly installed on the upper end of the operating table. A movable groove is opened in the cavity of the fixed table, and a bevel push block is slidably connected inside the movable groove. Cylinder three is fixedly installed on the lower end of the operating table, and the output end of cylinder three is fixedly connected to the bevel push block.

[0007] Preferably, a positioning column is fixedly installed on the upper end of the fixed platform, and the positioning column is in contact with the top of the inner cavity of the pump casing. Two symmetrically arranged beveled blocks are slidably connected to the outer wall of the fixed platform, and the beveled blocks are in contact with the side surfaces of the beveled push blocks. An arc plate is fixedly installed on the end of each beveled block away from the beveled push block, and two springs are fixedly installed between the arc plate and the fixed platform.

[0008] Preferably, a plurality of electric wheels are rotatably connected to the outer side wall of each of the arc plates, and a belt is commonly sleeved on the outer side wall of the electric wheels on each arc plate, and the belt can interfere with the inner side wall of the pump housing.

[0009] Preferably, two symmetrically arranged polishing blocks are slidably connected to the outer wall of the fixed table, and the polishing blocks do not contact the electric wheel. Two rotating rods are rotatably connected to both sides of each polishing block, and the end of the rotating rod away from the polishing block is rotatably connected to the arc plate corresponding to the position.

[0010] Preferably, the liquid collecting structure comprises a rubber strip, which is movably connected to the lower end of the rotating plate, screws are fixedly installed on both sides of the rubber strip, and the screws are fixedly connected to the rotating plate, and a water storage tank corresponding to the position of the polishing sponge is opened at the upper end of the rubber strip.

[0011] Preferably, a connecting rope is fixedly installed on the outer wall of each support block 1 away from the support plate, and a steering wheel is fixedly installed on one end of each support block 2 away from the rotating plate, and the connecting rope passes around the steering wheel and is fixedly connected to the rubber strip at the corresponding position.

[0012] Preferably, a liquid storage tank is provided at the upper end of the operating table, and a plurality of flow troughs are provided on the inner side wall of the liquid storage tank.

[0013] Compared with the prior art, the present invention has the following beneficial effects: 1. The polishing sponge is driven by the electric push plate to wrap the pump casing, and then the beveled push block is pushed upward by the cylinder 3. The beveled push block makes the electric wheel contact with the inner wall of the pump casing through the beveled friction. When the belt rotates, it will drive the electric wheel to move. The electric wheel then drives the pump casing to rotate through the friction with the pump casing, so that the pump casing rotates between the four polishing sponges to polish the outer surface of the pump casing. At the same time, the water storage tank can collect the waste liquid generated by the polishing sponge during polishing; 2. Then, the output end of cylinder 2 contracts, thereby driving the rotating plate to rotate in the direction away from the axis of cylinder 1, so that the polishing sponge also rotates with it. During the rotation of the polishing sponge, the triangular polishing sponge will rotate in the direction close to the axis of cylinder 1. When four triangular polishing sponges are attached together, a cone-like shape will be formed. At the same time, the arc cover plate descends to resist the triangular polishing sponge, so that the polishing sponge combined into a cone fits with the upper end surface of the pump housing, thereby realizing the polishing of the circular surface of the upper end of the pump housing; 3. The bevel push block is lowered to allow the spring to reset the arc plate. During the resetting of the arc plate, the polishing block is pushed toward the inner wall of the pump casing by the rotating rod, so that the polishing block fits the inner wall of the pump casing, and then expands outward through the output end of cylinder 2, so that during the rotation of the rotating plate, the connecting rope pulls one side of the rubber strip, so that the rubber strip becomes an arc-like shape, and then the electric push plate pushes the deformed rubber strip to clamp the outer wall of the pump casing, thereby expanding the clamping area of ​​the rubber strip on the pump casing, and then the motor drives the rubber strip to rotate, and the rubber strip drives the pump casing to rotate, so that the polishing block polishes the inner wall of the pump casing. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The present invention will be further explained below in conjunction with the accompanying drawings and embodiments: Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the partial structure of the rotating plate of the present invention; Figure 3 It is a schematic diagram of the partial structure of the polishing block of the present invention; Figure 4 A partial bottom view of the rubber strip of the present invention; Figure 5 It is a schematic cross-sectional structural diagram of the rotating plate of the present invention; Figure 6 It is a schematic cross-sectional structural diagram of the operating table of the present invention; Figure 7 For the present invention Figure 6 A partial enlarged view of point A in the middle.

[0015] Description of reference numerals: 1. Operating table; 2. Lifting table; 3. Cylinder 1; 4. Electric push plate; 5. Support plate; 6. Rotating plate; 7. Polishing sponge; 71. Triangular polishing sponge; 8. Arc cover plate; 9. Support block 1; 91. Support block 2; 10. Cylinder 2; 11. Rubber strip; 111. Water storage tank; 12. Connecting rope; 13. Steering wheel; 14. Screw; 15. Pump housing; 16. Liquid storage tank; 17. Fixed table; 171. Movable groove; 18. Positioning column; 19. Bevel block; 20. Arc plate; 21. Spring; 22. Electric wheel; 23. Belt; 24. Polishing block; 25. Rotating rod; 26. Cylinder 3; 27. Bevel push block; 28. Flow chute; 29. ​​Motor. DETAILED DESCRIPTION

[0016] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0017] See also Figure 1-Figure 7 The present invention provides a technical solution: a polishing mechanism for electromechanical equipment processing, comprising an operating table 1, a lifting platform 2 is fixedly installed on the upper end of the operating table 1, a cylinder 3 is fixedly installed on the lower end of the output end of the lifting platform 2, a motor 29 is fixedly installed on the upper end of the lifting platform 2, and the output end of the motor 29 passes through the lifting platform 2 and is fixedly connected to the cylinder 3, four electric push plates 4 are arranged in a row along the circumference of the axis of the cylinder 3 at the lower end of the cylinder 3, and the output end of the cylinder 3 extends to the bottom of the electric push plate 4, an arc cover plate 8 is fixedly installed on the output end of the cylinder 3, and a support plate 5 is fixedly installed on the output end of each electric push plate 4, and each support plate 5 The lower end is rotatably connected with a rotating plate 6, and a polishing sponge 7 is fixedly installed on one side of each rotating plate 6 close to the axis of the cylinder 3. A triangular polishing sponge 71 is fixedly installed on the upper end of each polishing sponge 7, and the triangular polishing sponge 71 is fitted with the corresponding support plate 5. A support block 9 is fixedly installed on the outer wall of each support plate 5, and two support blocks 2 91 are fixedly installed on the outer wall of each rotating plate 6. The support blocks 1 9 and the support blocks 2 91 at two positions corresponding to each other are rotatably connected with a cylinder 2 10, wherein the electric push plate 4 drives the sliding plate to slide through the output end of the internal electric push rod, thereby realizing the pushing of the support plate 5; A clamping and polishing structure is installed at the upper end of the operating table 1 , and a pump housing 15 is sleeved on the upper end of the clamping and polishing structure. A liquid collecting structure is installed at the lower end of the rotating plate 6 , and the liquid collecting structure can clamp the steering wheel 13 .

[0018] Specifically, the output end of the electric push plate 4 can drive the support plate 5 at the corresponding position to move in the direction away from the arc cover plate 8. When the pump casing 15 needs to be polished, the support plate 5 is first driven to expand outward by the electric push plate 4, and then the expanded support plate 5 is driven to descend by the lifting platform 2, so that the support plate 5 can wrap the pump casing 15, and then the support plate 5 is driven to retract by the electric push plate 4. The process of retracting the support plate 5 drives the rotating plate 6 to move in the direction of the pump casing 15, so that the polishing sponge 7 installed on the inner side wall of the rotating plate 6 comes into conflict with the side surface of the pump casing 15, and the polishing sponge 7 has the characteristics of flexibility. The polishing sponge 7 is deformed to wrap the side surface of the pump housing 15, and then the pump housing 15 is driven to rotate by the clamping polishing structure, so that the polishing sponge 7 can polish the outer wall of the pump housing 15. At the same time, when the rotating plate 6 is placed vertically, the state of the cylinder 2 10 is a distance away from the output end. When the output end of the cylinder 2 10 is retracted, the rotating plate 6 will be driven to rotate in the direction away from the axis of the cylinder 1 3. At the same time, there is a card groove on the outer wall of the steering wheel 13. During the rotation of the rotating plate 6, the connecting rope 12 will not be tightened, but will still be embedded in the outer wall of the steering wheel 13; refer to Figure 5 When the rotating plate 6 rotates around the lower end of the supporting plate 5 in the direction away from the axis of the cylinder 3, since the triangular polishing sponge 71 is installed on the upper end of the polishing sponge 7 and conflicts with the inner side wall of the supporting plate 5, the triangular polishing sponge 71 will be driven to rotate in the direction close to the axis of the cylinder 3 during the rotation of the rotating plate 6. At the same time, chamfers are provided on both sides of the polishing sponge 7 and the triangular polishing sponge 71. When the four triangular polishing sponges 71 rotate to the chamfers on the sides and conflict with each other, the rotating plate 6 will stop rotating. At the same time, the four triangular polishing sponges 71 form a conical structure with the cone head facing upward. At this time, if the pump housing 15 continues to be polished, the cylinder 3 will push the arc cover plate 8 down to conflict with the triangular polishing sponge 71, so that the triangular polishing sponge 71 can polish the arc shape of the upper end of the pump housing 15.

[0019] Among them, the clamping and polishing structure includes a fixed table 17, which is fixedly installed on the upper end of the operating table 1. A movable groove 171 is opened in the cavity of the fixed table 17. A bevel push block 27 is slidably connected inside the movable groove 171. A cylinder three 26 is fixedly installed on the lower end of the operating table 1, and the output end of the cylinder three 26 is fixedly connected to the bevel push block 27.

[0020] Among them, a positioning column 18 is fixedly installed on the upper end of the fixed platform 17, and the positioning column 18 is in contact with the inner cavity top of the pump casing 15. Two symmetrically arranged bevel blocks 19 are slidably connected to the outer wall of the fixed platform 17, and the bevel blocks 19 are in contact with the side surfaces of the bevel push blocks 27. An arc plate 20 is fixedly installed on the end of each bevel block 19 away from the bevel push block 27, and two springs 21 are fixedly installed between the arc plate 20 and the fixed platform 17.

[0021] Specifically, the contact surfaces of the bevel push block 27 and the bevel block 19 are both bevels, see Figure 7 At this time, the two bevel blocks 19 are not in complete contact. When the cylinder three 26 pushes the bevel push block 27 to slide upward, the distance between the two bevel blocks 19 will be further expanded due to the resistance of the bevel push block 27, and the arc plate 20 will be driven to slide toward the inside of the pump housing 15. At the same time, the spring 21 will be stretched and store elastic potential energy. When the bevel push block 27 descends, the spring 21 will pull the arc plate 20 to reset.

[0022] A plurality of electric wheels 22 are rotatably connected to the outer wall of each arc plate 20 , and a belt 23 is sleeved on the outer wall of the electric wheel 22 on each arc plate 20 , and the belt 23 can contact the inner wall of the pump housing 15 .

[0023] Among them, two symmetrically arranged polishing blocks 24 are slidably connected to the outer wall of the fixed table 17, and the polishing blocks 24 do not contact the electric wheel 22. Two rotating rods 25 are rotatably connected on both sides of each polishing block 24, and one end of the rotating rod 25 away from the polishing block 24 is rotatably connected to the arc plate 20 at the corresponding position.

[0024] Specifically, when the arc plate 20 is pushed by the bevel push block 27 toward the inner wall of the pump housing 15, the belt 23 will conflict with the inner wall of the pump housing 15, and then the belt 23 will slide through the rotation of the electric wheel 22. The belt 23 is made of rubber and will generate a large friction force when it contacts the inner wall of the pump housing 15. The belt 23 on each arc plate 20 can drive the pump housing 15 to rotate, thereby achieving the effect of self-rotation polishing of the pump housing 15. At the same time, when the bevel push block 27 slides downward, the elasticity of the spring 21 is restored and the arc plate 20 will be retracted. In the process of retracting the arc plate 20, Figure 3 As shown, when the distance between the two arc plates 20 is shortened, the polishing block 24 is pushed to slide toward the inner wall of the pump housing 15 through the rotating rod 25 , so that the polishing block 24 contacts the inner wall of the pump housing 15 .

[0025] Among them, the liquid collecting structure includes a rubber strip 11, which is movably connected to the lower end of the rotating plate 6. Screws 14 are fixedly installed on both sides of the rubber strip 11, and the screws 14 are fixedly connected to the rotating plate 6. A water storage tank 111 corresponding to the position of the polishing sponge 7 is opened at the upper end of the rubber strip 11.

[0026] Among them, a connecting rope 12 is fixedly installed on the outer wall of each support block 9 away from the support plate 5, and a steering wheel 13 is fixedly installed on the end of each support block 2 91 away from the rotating plate 6. The connecting rope 12 passes around the steering wheel 13 and is fixedly connected to the rubber strip 11 at the corresponding position.

[0027] A liquid storage tank 16 is provided at the upper end of the operating table 1 , and a plurality of flow slots 28 are provided on the inner side wall of the liquid storage tank 16 .

[0028] Specifically, when the polishing sponge 7 polishes the outer surface of the pump housing 15, excess polishing liquid will flow into the internal storage of the water tank 111 to prevent the polishing liquid from flowing into the clamping polishing structure and affecting the clamping effect. At the same time, when it is necessary to grind the arc structure at the upper end of the pump housing 15, the rotating plate 6 drives the rubber strip 11 to tilt during rotation, so that the polishing liquid in the water tank 111 can flow into the interior of the liquid reservoir 16. Then, when the output end of the cylinder 2 10 expands outward, the rotating plate 6 is pushed by the cylinder 2 10 and rotates in the direction close to the axis of the cylinder 1 3. During the rotation, the rubber strips 11 that were originally pushed away from each other by the electric push plate 4 will move closer to each other again, and the rubber strips 11 will move closer to each other again. The connecting rope 12 will be stretched straight and pull the rubber strip 11 at the same time. The rubber strip 11 is made of rubber material and will undergo certain deformation during the process of being pulled by the connecting rope 12, forming an arc-like shape. At the same time, the four deformed rubber strips 11 move closer to each other to form a circular shape. At this time, the support plate 5 is contracted by the electric push plate 4, which will cause the rubber strip 11 to clamp the outer surface of the pump casing 15. The arc formed by the rubber strip 11 will increase the contact area with the surface of the pump casing 15. At this time, the motor 29 drives the cylinder 3 to rotate, and the rotation of the cylinder 3 drives the rotating plate 6 to rotate, so that the pump casing 15 clamped by the rubber strip 11 starts to rotate. During the rotation of the pump casing 15, the polishing block 24 will polish the inner wall of the pump casing 15.

[0029] Working principle: First, the worker sets the pump casing 15 on the clamping polishing structure, and then drives the four support plates 5 to expand outward through the electric push plate 4, and then the lifting platform 2 drives the rotating plate 6 to descend, so that the polishing sponge 7 is set on the outer wall of the pump casing 15, and then the electric push plate 4 drives the rotating plate 6 to retract so that the polishing sponge 7 wraps the pump casing 15, and then the cylinder 3 26 pushes the bevel push block 27 to slide upward, and the bevel push block 27 makes the electric wheel 22 contact with the inner wall of the pump casing 15 through the bevel contact. When the belt 23 rotates, it will drive the electric wheel 22 to move, and the electric wheel 22 drives the pump casing 15 to rotate through the friction with the pump casing 15, so that the pump casing 15 rotates between the four polishing sponges 7 to polish and grind the outer surface of the pump casing 15. At the same time, the water storage tank 111 can collect the waste liquid generated by the polishing sponge 7 during polishing; Then, the output end of the cylinder 2 10 contracts, thereby driving the rotating plate 6 to rotate in a direction away from the axis of the cylinder 1 3, so that the polishing sponge 7 also rotates therewith. During the rotation of the polishing sponge 7, the triangular polishing sponge 71 rotates in a direction close to the axis of the cylinder 1 3. When the four triangular polishing sponges 71 are attached together, a cone is formed. At the same time, the arc cover plate 8 descends to resist the triangular polishing sponge 71, so that the triangular polishing sponge 71 combined into a cone is attached to the upper end surface of the pump housing 15, thereby realizing the polishing of the circular surface of the upper end of the pump housing 15; Finally, the beveled edge push block 27 is lowered so that the beveled edge block 19 is no longer resisted, and the arc plate 20 is reset by the spring 21. During the resetting of the arc plate 20, the polishing block 24 is pushed by the rotating rod 25 to move in the direction close to the inner wall of the pump casing 15, so that the polishing block 24 fits the inner wall of the pump casing 15, and then the output end of the cylinder 2 10 expands outward, so that the rotating plate 6 rotates in the direction close to the axis of the cylinder 1 3. During the rotation, the connecting rope 12 pulls one side of the rubber strip 11, so that the rubber strip 11 is deformed to form an arc-like shape, and then the deformed rubber strip 11 is pushed by the electric push plate 4 to clamp the outer wall of the pump casing 15, thereby expanding the clamping area of ​​the rubber strip 11 on the pump casing 15, and then the rubber strip 11 is driven to rotate by the motor 29, and the rubber strip 11 drives the pump casing 15 to rotate, so that the polishing block 24 polishes the inner wall of the pump casing 15.

[0030] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A polishing mechanism for electromechanical equipment processing, comprising an operating table (1), a lifting platform (2) fixedly mounted on the upper end of the operating table (1), a cylinder (3) fixedly mounted on the lower end of the output end of the lifting platform (2), a motor (29) fixedly mounted on the upper end of the lifting platform (2), and the output end of the motor (29) passes through the lifting platform (2) and is fixedly connected to the cylinder (3), characterized in that: The lower end of the cylinder (3) is provided with four electric push plates (4) arranged in a row along the circumference of the axis of the cylinder (3), and the output end of the cylinder (3) extends to the bottom of the electric push plate (4). The output end of the cylinder (3) is fixedly provided with an arc cover plate (8), and each output end of the electric push plate (4) is fixedly provided with a support plate (5), and the lower end of each support plate (5) is rotatably connected to a rotating plate (6), and each rotating plate (6) is fixedly provided with a side close to the axis of the cylinder (3). A polishing sponge (7) is installed, and a triangular polishing sponge (71) is fixedly installed on the upper end of each polishing sponge (7), and the triangular polishing sponge (71) is attached to the corresponding support plate (5), and a support block 1 (9) is fixedly installed on the outer wall of each support plate (5), and two support blocks 2 (91) are fixedly installed on the outer wall of each rotating plate (6), and a cylinder 2 (10) is rotatably connected between the support blocks 1 (9) and the support blocks 2 (91) at two corresponding positions; A clamping and polishing structure is installed at the upper end of the operating table (1), and a pump housing (15) is sleeved on the upper end of the clamping and polishing structure. A liquid collecting structure is installed at the lower end of the rotating plate (6), and the liquid collecting structure is capable of clamping the steering wheel (13).

2. A polishing mechanism for electromechanical equipment processing according to claim 1, characterized in that: The clamping and polishing structure comprises a fixed table (17), the fixed table (17) is fixedly mounted on the upper end of the operating table (1), a movable groove (171) is provided in the cavity of the fixed table (17), a bevel push block (27) is slidably connected inside the movable groove (171), a cylinder three (26) is fixedly mounted on the lower end of the operating table (1), and the output end of the cylinder three (26) is fixedly connected to the bevel push block (27).

3. A polishing mechanism for electromechanical equipment processing according to claim 2, characterized in that: A positioning column (18) is fixedly mounted on the upper end of the fixed platform (17), and the positioning column (18) contacts the top of the inner cavity of the pump housing (15). Two symmetrically arranged bevel blocks (19) are slidably connected to the outer wall of the fixed platform (17), and the bevel blocks (19) contact the side surfaces of the bevel push blocks (27). An arc plate (20) is fixedly mounted on one end of each bevel block (19) away from the bevel push block (27), and two springs (21) are fixedly mounted between the arc plate (20) and the fixed platform (17).

4. A polishing mechanism for electromechanical equipment processing according to claim 3, characterized in that: A plurality of electric wheels (22) are rotatably connected to the outer wall of each arc plate (20), and a belt (23) is sleeved on the outer wall of the electric wheel (22) on each arc plate (20), and the belt (23) can contact the inner wall of the pump housing (15).

5. The polishing mechanism for electromechanical equipment processing according to claim 2, characterized in that: Two symmetrically arranged polishing blocks (24) are slidably connected to the outer side wall of the fixed platform (17), and the polishing blocks (24) do not contact the electric wheel (22). Two sides of each polishing block (24) are rotatably connected to two rotating rods (25), and one end of the rotating rod (25) away from the polishing block (24) is rotatably connected to a circular arc plate (20) at a corresponding position.

6. The polishing mechanism for electromechanical equipment processing according to claim 1, characterized in that: The liquid collecting structure comprises a rubber strip (11), the rubber strip (11) being movably connected to the lower end of the rotating plate (6), screws (14) being fixedly mounted on both sides of the rubber strip (11), the screws (14) being fixedly connected to the rotating plate (6), and a water storage tank (111) corresponding to the position of the polishing sponge (7) being provided at the upper end of the rubber strip (11).

7. The polishing mechanism for electromechanical equipment processing according to claim 1, characterized in that: A connecting rope (12) is fixedly mounted on the outer wall of each supporting block 1 (9) away from the supporting plate (5), and a steering wheel (13) is fixedly mounted on one end of each supporting block 2 (91) away from the rotating plate (6), and the connecting rope (12) passes around the steering wheel (13) and is fixedly connected to a rubber strip (11) at a corresponding position.

8. The polishing mechanism for electromechanical equipment processing according to claim 1, characterized in that: A liquid storage tank (16) is provided at the upper end of the operating table (1), and a plurality of flow grooves (28) are provided on the inner side wall of the liquid storage tank (16).

Images