Fine grid coating equipment and coating method thereof

Abstract

The invention relates to fine grid coating equipment and a coating method thereof. The fine grid coating equipment comprises a base film winding mechanism, a mask transmission mechanism, a pressing mechanism and a deposition mechanism. The base film winding mechanism comprises a base film, a winding roller and an unwinding roller synchronously rotating with the winding roller, one end of the base film is wound on the winding roller, and the other end of the base film is wound on the unwinding roller; the mask transmission mechanism comprises a mask, a first roller and a second roller synchronously rotating with the first roller, one end of the mask is wound on the first roller, the other end of the mask is wound on the second roller, and the mask is provided with a hollow pattern; the pressing mechanism is used for extruding the base film and the mask so that part of the mask and part of the base film can be attached to form an attached section; and the deposition mechanism is used for depositing a to-be-deposited substance on the fitting section so as to form a grid line in the hollow pattern. According to the fine grid coating equipment, continuous production of the grid lines can be achieved, the production efficiency is greatly improved, and the fine grid coating equipment is suitable for large-scale batch production.

Description

Technical Field

[0001] The present application relates to the technical field of photovoltaic module manufacturing, and in particular to fine grid coating equipment and a coating method thereof. Background Art

[0002] Compared with thick grid lines, thin grid lines have a smaller shading area on the surface of the cell, which can allow more light to illuminate the effective power generation area of ​​the cell, increase the short-circuit current of the battery, and thus increase the photoelectric conversion efficiency. In addition, the thin and numerous grid lines combined with the welding ribbon can make the current collection on the surface of the cell more uniform. The welding ribbon can collect the current from each thin grid line more efficiently, avoid power loss caused by excessive local current, ensure uniform current transmission, and improve the overall performance of the battery.

[0003] In the related art, screen printing technology is usually used to print conductive paste on the surface of the battery cell to form fine grid lines. However, each printing requires actions such as scraping ink and returning ink, so the operation process is relatively cumbersome and inefficient. Summary of the invention

[0004] Based on this, it is necessary to provide a fine grid coating device and a coating method thereof to address the problem of low efficiency in forming fine grid lines on the surface of a cell using a screen printing process in the prior art.

[0005] A fine grid coating device, the fine grid coating device comprising:

[0006] A base film winding mechanism, comprising a base film, a winding roller and an unwinding roller rotating synchronously with the winding roller, one end of the base film being wound on the winding roller and the other end being wound on the unwinding roller;

[0007] The mask transmission mechanism comprises a mask, a first roller and a second roller rotating synchronously with the first roller, one end of the mask is wound around the first roller, and the other end is wound around the second roller, and a hollow pattern is opened on the mask;

[0008] a pressing mechanism, used for pressing the base film and the mask so that a part of the mask and a part of the base film are attached to each other to form an attached section; and

[0009] The deposition mechanism is used to deposit the material to be deposited in the bonding section to form grid lines in the hollow pattern.

[0010] In one embodiment, the deposition mechanism includes a cooler and a coating source;

[0011] The coating source is located on a side of the mask away from the base film, and the coating source is used to heat and evaporate the material to be deposited so that the material to be deposited moves toward the bonding section;

[0012] The cooler is used to cool the material to be deposited so as to be deposited on the bonding section.

[0013] In one embodiment, the cooler includes an arc-shaped shell and a refrigeration pipeline, and the refrigeration pipeline is arranged in the arc-shaped shell;

[0014] The pressing mechanism is the cooler, the base film and the mask are simultaneously wound outside the arc-shaped shell, the cooler is arranged on the side of the base film away from the mask, and the coating source is arranged on the side of the mask away from the base film.

[0015] In one embodiment, there are multiple deposition mechanisms, and the multiple deposition mechanisms are arranged in sequence along the extension direction of the base film.

[0016] In one of the embodiments, the fine grid coating device includes a tensioning roller, and at least one tensioning roller is provided between two adjacent coolers;

[0017] The tension roller is disposed on a side of the base film away from the cooler, and / or the tension roller is disposed on a side of the mask away from the cooler.

[0018] In one embodiment, at least a first tensioning roller and a second tensioning roller are arranged between two adjacent coolers, the first tensioning roller is located on the side of the base film away from the mask, the second tensioning roller is arranged on the side of the mask away from the base film, and the first tensioning roller is a tension measuring roller.

[0019] In one embodiment, the mask is connected end to end to form an annular structure, one end of the annular structure is wound around the first roller, and the other end of the annular structure is wound around the second roller.

[0020] A coating method for a fine grid coating device, the coating method comprising:

[0021] The base film winding mechanism drives the base film to be retracted and unreeled, and the mask transmission mechanism drives the mask to move;

[0022] The pressing mechanism presses the base film and the mask simultaneously, so that a part of the mask and a part of the base film are attached to form an attached section;

[0023] The deposition mechanism deposits the material to be deposited onto the bonding section;

[0024] The base film is separated from the mask to form a gate line on the base film.

[0025] In the above-mentioned fine grid coating equipment and coating method, the base film is wound on the base film reeling and unreeling mechanism, the mask is wound on the mask transmission mechanism, and the pressing mechanism is used to make the base film and the mask fit together at a specific position to form a fitting section at the specific position. The mask can protect the area outside the grid line area on the base film, so that after the deposition mechanism deposits the material to be deposited on the fitting section, the metal grid line can be directly obtained on the base film. That is, the fine grid coating equipment of the present application can realize the continuous production of grid lines, greatly improve the production efficiency, and is suitable for large-scale batch production. There is no requirement for the number of grid lines, and the batch production of a larger number of grid lines can be achieved by increasing the width of the base film and the mask. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 Schematic diagram of the structure of a fine grid coating device in one embodiment.

[0027] Figure 2 Schematic diagram of the structure of a base film plated with gate lines in one embodiment.

[0028] Attached to the drawing are reference numerals: 110, base film; 120, winding roller; 130, unwinding roller; 140, first tensioning roller; 150, pretreatment mechanism; 160, detection mechanism; 170, guide roller; 210, mask; 220, first roller; 230, second roller; 240, second tensioning roller; 250, cleaning mechanism; 310, pressing mechanism; 410, cooler; 420, coating source; 510, grid line. DETAILED DESCRIPTION

[0029] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0030] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0031] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0032] In this application, unless otherwise clearly specified and limited, if the terms "installed", "connected", "connected", "fixed" and the like appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0033] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0034] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0035] See also Figure 1 and Figure 2The fine grid coating device provided in one embodiment of the present application includes a base film winding mechanism, a mask transmission mechanism, a pressing mechanism 310 and a deposition mechanism. The base film winding mechanism includes a base film 110, a winding roller 120 and an unwinding roller 130 that rotates synchronously with the winding roller 120. One end of the base film 110 is wound on the winding roller 120, and the other end is wound on the unwinding roller 130. The mask transmission mechanism includes a mask 210, a first roller 220 and a second roller 230 that rotates synchronously with the winding roller 120. One end of the mask 210 is wound on the first roller 220, and the other end is wound on the second roller 230. The mask 210 is provided with a hollow pattern; the pressing mechanism 310 is used to squeeze the base film 110 and the mask 210 so that part of the mask 210 and part of the base film 110 are bonded to form a bonding section; the deposition mechanism is used to deposit the material to be deposited in the bonding section to form a grid line 510 in the hollow pattern.

[0036] In the present embodiment, the base film 110 is wound on the base film reeling and unwinding mechanism, the mask 210 is wound on the mask transmission mechanism, and the pressing mechanism 310 is used to make the base film 110 and the mask 210 fit together at a specific position to form a fitting section at the specific position, and the mask 210 can protect the area outside the grid line area on the base film 110, so that after the deposition mechanism deposits the material to be deposited on the fitting section, the deposited material located in the hollow pattern directly forms the metal grid line. That is, the fine grid coating equipment of the present application can realize the continuous production of the grid line 510, greatly improve the production efficiency, and is suitable for large-scale batch production, and there is no requirement for the number of the grid lines 510, and the batch production of a larger number of grid lines 510 can be realized by increasing the width of the base film 110 and the mask 210.

[0037] In some embodiments, the deposition mechanism includes a cooler 410 and a coating source 420. The coating source 420 is located on the side of the mask 210 away from the base film 110. The coating source 420 is used to heat and evaporate the material to be deposited and move the material to be deposited toward the bonding section. The cooler 410 is used to cool the material to be deposited so as to be deposited on the bonding section.

[0038] In this embodiment, the coating source 420 is an evaporation coating source. The pressing mechanism 310 is used to make part of the base film 110 and part of the mask 210 fit together, so that the mask 210 covers the area outside the grid line area on the base film 110, that is, to form a bonding section on the base film 110. During deposition, the coating source 420 heats the material to be deposited to evaporate or sublimate it. The evaporated material to be deposited has a certain kinetic energy and directionality, and will move along a specific path to the surface of the bonding section. Under the cooling effect of the cooler 410, the material to be deposited is deposited on the bonding section to form a thin film, wherein the thin film located in the hollow pattern serves as the grid line 510.

[0039] The coating source 420 may be a resistance coating source, an electron beam coating source, a magnetron sputtering source, or the like.

[0040] In other embodiments, the deposition mechanism may also be a sputtering deposition mechanism or an ion beam deposition mechanism.

[0041] Furthermore, the cooler 410 includes an arc-shaped shell and a refrigeration pipeline, and the refrigeration pipeline is arranged in the arc-shaped shell; the pressing mechanism 310 is the cooler 410, the base film 110 and the mask 210 are simultaneously wound outside the arc-shaped shell, the cooler 410 is arranged on the side of the base film 110 away from the mask 210, and the coating source 420 is arranged on the side of the mask 210 away from the base film 110.

[0042] In this embodiment, the cooler 410 and the coating source 420 are arranged opposite to each other, and the base film 110 and the mask 210 pass through the cooler 410 and the coating source 420. Since the cooler 410 has an arc-shaped shell, the arc-shaped shell protrudes outward, so that the base film 110 and the mask 210 can be partially stretched on the arc-shaped shell at the same time to form a fitting section. At this time, the coating source 420 is arranged on the side of the mask 210 away from the base film 110, that is, it can evaporate the material to be deposited on the side of the base film 110 close to the mask 210. When the material to be deposited moves to the fitting section, since the arc-shaped shell of the cooler 410 is in direct contact with the base film 110, the material to be deposited can be quickly cooled into a thin film. At this time, the thin film located in the gate line area forms a gate line 510.

[0043] Specifically, the cooler 410 further includes a rotating shaft, and the arc-shaped shell can rotate around the rotating shaft to reduce the friction between the arc-shaped shell and the base film 110 and avoid damaging the base film 110. The arc-shaped shell is provided with a cooling liquid inlet and a cooling liquid inlet, and the two ends of the refrigeration pipeline are respectively connected to the cooling liquid inlet and the cooling liquid inlet, so that the cooling liquid circulates in the cooling pipeline to quickly take away the heat in the arc-shaped shell.

[0044] The arc-shaped shell is made of metal materials with high thermal conductivity (such as copper, aluminum, etc.) to ensure good heat transfer performance. The surface of the drum is specially treated, such as polishing, to ensure its flatness and finish, so that the coating material is evenly distributed on its surface.

[0045] Of course, in other embodiments, the laminating mechanism 310 may also be a guide roller separately provided, and the number of the laminating mechanisms 310 is two, and the two laminating mechanisms 310 are respectively provided at the upstream and downstream of the deposition mechanism, that is, the base film 110 and the mask 210 located between the two laminating mechanisms 310 overlap to form a laminating section, so that the deposition mechanism can deposit the gate line 510 in the laminating section.

[0046] In some embodiments, there are multiple deposition mechanisms, and the multiple deposition mechanisms are sequentially arranged along the extension direction of the base film 110 .

[0047] A plurality of deposition mechanisms may be arranged according to a deposition rate, and the plurality of deposition mechanisms are arranged in sequence along the extension direction of the base film 110 to ensure the deposition quality of the gate line 510 .

[0048] In some embodiments, the fine grid coating equipment includes a tensioning roller, and at least one tensioning roller is arranged between two adjacent coolers 410; the tensioning roller is arranged on the side of the base film 110 away from the cooler 410, and / or the tensioning roller is arranged on the side of the mask 210 away from the cooler 410.

[0049] In one of the embodiments, a tensioning roller is arranged between two adjacent coolers 410. The tensioning roller is arranged on the side of the mask 210 away from the base film 110. The tensioning roller is used to make the base film 110 and the mask 210 between the two coolers 410 bulge toward the side away from the mask 210 at the same time, so that the base film 110 and the mask 210 can be stretched tight on the arc-shaped outer shell of each cooler 410 at the same time, ensuring the covering effect of the mask 210, that is, ensuring the deposition quality of the gate line 510.

[0050] In another embodiment, at least a first tensioning roller 140 and a second tensioning roller 240 are arranged between two adjacent coolers 410, the first tensioning roller 140 is located on the side of the base film 110 away from the mask 210, and the second tensioning roller 240 is arranged on the side of the mask 210 away from the base film 110, and the first tensioning roller 140 is a tension measuring roller.

[0051] In this embodiment, the first tensioning roller 140 is used to make the base film 110 bulge toward the side away from the mask 210, and is used to tension the base film 110 while measuring the tension of the base film 110. The second tensioning roller 240 is also used to make the base film 110 bulge toward the side away from the mask 210, and is used to tension the mask 210.

[0052] In some embodiments, the mask 210 is connected end to end to form a ring structure, one end of the ring structure is wound outside the first roller 220 , and the other end of the ring structure is wound outside the second roller 230 .

[0053] In this embodiment, the mask 210 is only used to shield and protect the base film 110, and thus can be reused, saving materials and reducing costs.

[0054] Of course, one end of the mask 210 may be wound around the first roller 220, and the other end may be wound around the second roller 230, the first roller 220 is a unwinding roller, and the second roller 230 is a winding roller.

[0055] In some embodiments, the fine grid coating equipment includes a cleaning mechanism 250 , which is disposed downstream of the deposition mechanism and is used to clean the material to be deposited on the mask 210 .

[0056] In some embodiments, the mask 210 is recycled, so after a section of the gate line 510 is deposited, the mask 210 may be cleaned to ensure that the mask 210 is clean.

[0057] Specifically, the cleaning mechanism 250 is arranged at the bottom of the deposition mechanism, and when the mask 210 moves to the bottom of the first tensioning roller 140 and the second tensioning roller 240, the cleaning device cleans the mask 210. The cleaning device can be a plasma cleaning device, for example, a plasma physical cleaning device, a plasma chemical cleaning device, or a plasma physical and chemical cleaning device. Among them, physical cleaning mainly utilizes the kinetic energy generated by the acceleration of high-energy ions in the plasma under the action of bias to perform pure physical impact on the contaminants on the surface of the workpiece, so that they are vaporized and peeled off from the workpiece. Chemical cleaning is to ionize reactive gases such as oxygen and hydrogen into plasma under a vacuum state, and these highly active plasmas react chemically with the contaminants on the surface of the workpiece. Physical and chemical cleaning combines the characteristics of physical cleaning and chemical cleaning, and utilizes both the physical impact of plasma and the chemical reaction of active groups. It can more thoroughly remove contaminants on the surface of the workpiece, and has a good cleaning effect on various types of contaminants.

[0058] In some embodiments, the base film 110 is a transparent conductive film.

[0059] In this embodiment, the base film 110 is a transparent conductive film. When in use, the gate line 510 with the transparent conductive film can be directly connected to the battery cell without removing the transparent conductive film. The transparent conductive film is also beneficial to improving the current collection efficiency.

[0060] Of course, in some other embodiments, the base film 110 may also be a polyester film, a polyimide film, a polyethylene naphthalate film, a polyethylene film, a polypropylene film or a flexible glass.

[0061] In some embodiments, the fine grid coating equipment further includes a pretreatment mechanism 150, which is disposed upstream of the pressing mechanism 310, and the pretreatment mechanism 150 is used to clean and / or plasma treat the base film 110. Among them, the substrate is cleaned to remove dust, oil, impurities, etc. on the surface to improve the adhesion and quality of the coating. The cleaning method generally includes steps such as degreasing and cleaning, and chemical reagents such as degreasing agents and cleaning agents can be used in conjunction with corresponding cleaning equipment, such as an ultrasonic cleaning machine. Plasma treatment is used to further clean the surface of the base film 110 and improve the adhesion of the film layer.

[0062] In some embodiments, the fine grid coating equipment further includes a detection mechanism 160 , which is disposed downstream of the pressing mechanism 310 , and is used for online monitoring of the thickness, uniformity, adhesion, hardness, optical properties, etc. of the base film 110 .

[0063] A plurality of guide rollers are further arranged between the winding roller 120 and the unwinding roller 130 , and the guide rollers are used to guide the base film 110 so as to change the transmission direction of the base film 110 .

[0064] In some embodiments, the base film is in the shape of a plane or a non-planar structure. For example, the base film has a plurality of grooves arranged in sequence along the width direction, wherein the shape of the grooves is a semicircular arc groove, a rectangular groove or a triangular groove. Similarly, the base film with grooves can also be wound on the base film winding mechanism. The mask is used to cover the plane area outside the grooves on the protective base film. The surface of the corresponding pressing mechanism is also provided with a plurality of grooves. When the pressing mechanism squeezes the base film and the coating to form a coating section, the deposition mechanism is used to deposit grid lines into the grooves, thereby obtaining semicircular grid lines, rectangular grid lines and triangular grid lines. Among them, the triangular grid lines can refract the light irradiated on the welding strip onto the photovoltaic panel, thereby improving the power conversion efficiency and having better welding performance.

[0065] In some embodiments, a mask can first be formed on the base film using a chemical mask method, and then the base film with the mask layer is wound on a unwinding mechanism. During deposition, a fine grid is directly deposited on the base film, and finally the mask layer on the base film is removed to obtain a fine grid on the base film.

[0066] In some embodiments, the fine grid coating equipment is arranged in a vacuum chamber, that is, the evaporation and deposition of the deposited material are carried out in a relatively closed space, which reduces the waste of materials. Moreover, due to the continuous coating, the materials are used more fully, which reduces the production cost.

[0067] An embodiment of the present application further provides a coating method for a fine grid coating device, the coating method comprising:

[0068] The base film winding mechanism drives the base film 110 to be retracted and unreeled, and the mask transmission mechanism drives the mask 210 to move;

[0069] The pressing mechanism 310 presses the base film 110 and the mask 210 simultaneously, so that a part of the mask 210 and a part of the base film 110 are attached to form an attached section;

[0070] The deposition mechanism deposits the material to be deposited onto the bonding section;

[0071] The base film 110 is separated from the mask 210 to form a gate line on the base film 110 .

[0072] In this embodiment, the base film 110 is wound on the base film 110 reeling and unwinding mechanism, the mask 210 is wound on the mask transmission mechanism, and the pressing mechanism 310 is used to make the base film 110 and the mask 210 fit together at a specific position to form a fitting section at the specific position. The mask 210 can protect the area outside the grid line area on the base film 110. When the deposition mechanism deposits the metal grid line on the fitting section, the metal grid line can be directly deposited on the base film 110. That is, the fine grid coating equipment of the present application can realize the continuous production of the grid line, greatly improve the production efficiency, and is suitable for large-scale batch production. There is no requirement for the number of grid lines, and the batch production of more grid lines can be achieved by increasing the width of the base film 110 and the mask 210.

[0073] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0074] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A fine grid coating device, characterized in that: The fine grid coating equipment comprises: A base film winding mechanism, comprising a base film, a winding roller and an unwinding roller rotating synchronously with the winding roller, one end of the base film being wound on the winding roller and the other end being wound on the unwinding roller; The mask transmission mechanism comprises a mask, a first roller and a second roller rotating synchronously with the first roller, one end of the mask is wound around the first roller, and the other end is wound around the second roller, and a hollow pattern is opened on the mask; a pressing mechanism, used for pressing the base film and the mask so that a part of the mask and a part of the base film are attached to each other to form an attached section; and The deposition mechanism is used to deposit the material to be deposited in the bonding section to form grid lines in the hollow pattern.

2. The fine grid coating device according to claim 1, characterized in that: The deposition mechanism includes a cooler and a coating source; The coating source is located on a side of the mask away from the base film, and the coating source is used to heat and evaporate the material to be deposited so that the material to be deposited moves toward the bonding section; The cooler is used to cool the material to be deposited so as to be deposited on the bonding section.

3. The fine grid coating device according to claim 2, characterized in that: The cooler comprises an arc-shaped shell and a refrigeration pipeline, wherein the refrigeration pipeline is arranged in the arc-shaped shell; The pressing mechanism is the cooler, the base film and the mask are simultaneously wound outside the arc-shaped shell, the cooler is arranged on the side of the base film away from the mask, and the coating source is arranged on the side of the mask away from the base film.

4. The fine grid coating device according to claim 3, characterized in that: There are multiple deposition mechanisms, and the multiple deposition mechanisms are arranged in sequence along the extension direction of the base film.

5. The fine grid coating device according to claim 4, characterized in that: The fine grid coating device comprises a tensioning roller, and at least one tensioning roller is arranged between two adjacent coolers; The tension roller is disposed on a side of the base film away from the cooler, and / or the tension roller is disposed on a side of the mask away from the cooler.

6. The fine grid coating device according to claim 5, characterized in that: At least a first tensioning roller and a second tensioning roller are arranged between two adjacent coolers, the first tensioning roller is located on the side of the base film away from the mask, the second tensioning roller is arranged on the side of the mask away from the base film, and the first tensioning roller is a tension measuring roller.

7. The fine grid coating device according to claim 1, characterized in that: The mask is connected end to end to form an annular structure, one end of the annular structure is wound outside the first roller, and the other end of the annular structure is wound outside the second roller.

8. The fine grid coating device according to claim 1, characterized in that: The fine grid coating equipment comprises a cleaning mechanism, which is arranged downstream of the deposition mechanism and is used for cleaning the material to be deposited on the mask.

9. The fine grid coating device according to claim 1, characterized in that: The base film is a transparent conductive film.

10. A coating method for a fine grid coating device according to any one of claims 1 to 9, characterized in that: The coating method comprises: The base film winding mechanism drives the base film to be retracted and unreeled, and the mask transmission mechanism drives the mask to move; The pressing mechanism presses the base film and the mask simultaneously, so that a part of the mask and a part of the base film are attached to form an attached section; The deposition mechanism deposits the material to be deposited onto the bonding section; The base film is separated from the mask to form a gate line on the base film.

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