A method for testing the sealing property of a skeleton in semiconductor device production

By combining high-precision sensors and fluorescent leak detectors, a simple, rapid, and accurate method for detecting the sealing properties of semiconductor device skeletons has been achieved, solving the problems of complex and inaccurate detection in existing technologies and improving product quality and production efficiency.

CN119880296BActive Publication Date: 2025-12-12BEIJING HAOHAI JIAYE MASCH TECH CO LTD
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Patent Information

Application Number
CN202510257755.8
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-03-05
Publication Date
2025-12-12
Estimated Expiration
2045-03-05

AI Technical Summary

Technical Problem

Existing methods for testing the sealing performance of semiconductor devices are complex to operate, produce inaccurate results, and are difficult to detect minute leaks, which affects device quality and performance.

Method used

This invention employs a gas source system, a sealed cavity assembly, a detection system, and a data acquisition unit. By using high-precision sensors to monitor pressure, temperature, and micro-flow, and combining this with a fluorescent leak detector to quickly locate leak points, it provides a simple, efficient, and accurate method for testing the sealing performance of a skeleton.

Benefits of technology

It improves the accuracy and efficiency of detection, can quickly locate minute leaks, lowers the operating threshold, adapts to semiconductor devices with different materials and characteristics, and ensures product quality and production stability.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application relates to the technical field of concealed engineering acceptance, and discloses a framework sealing property testing method in semiconductor device production, and the specific steps are as follows: first, air tightness inspection is carried out, 0.5-1 psi gas is filled for pre-leakage detection; the framework is placed into a sealed cavity, and the cavity is inflated to a preset pressure at a rate of 0.01-0.2 psi / s and kept; if the pressure drops beyond a set range, the gas is supplemented; the pressure is kept, and data are recorded; the size of a leakage point of a qualified framework is determined by using a ultraviolet lamp to smear fluorescent leak detection agent; the device comprises a gas source, a sealed cavity, a detection system and a data acquisition and processing unit; the gas source can provide various gases, and has gas pressure adjustment display; the sealed cavity is transparent, well-sealed and convenient to operate; the detection system comprises a high-precision sensor; the acquisition and processing unit can amplify, convert and analyze signals; the application can improve detection accuracy and efficiency, enhance the universality, stability and reliability of the device, is convenient to operate and understand, and can efficiently and accurately test the sealing property of a semiconductor device framework.
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Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor device production, in particular to a skeleton sealing test method in semiconductor device production. BACKGROUND

[0002] A semiconductor device is an electronic device that has electrical conductivity between that of a conductor and an insulator, and uses the special electrical properties of semiconductor materials to perform specific functions, such as generating, controlling, receiving, converting, amplifying signals, and energy conversion. The semiconductor material of a semiconductor device is silicon, germanium, or gallium arsenide, which can be used as a rectifier, oscillator, light emitter, amplifier, light detector, etc. In order to distinguish from integrated circuits, it is also called discrete device. The basic structure of most two-terminal devices is a PN junction.

[0003] In the production process of semiconductor devices, the sealing performance of the skeleton sealing structure has a crucial influence on the reliability and stability of the device. However, the existing skeleton sealing test methods have many shortcomings. For example, some methods are complex to operate, require professional equipment and technical personnel to operate, and the detection results are not accurate enough; some methods cannot effectively detect small leakage points, resulting in some skeleton components with sealing problems being used in production, affecting the overall quality and performance of semiconductor devices. Therefore, it is necessary to develop a new skeleton sealing test method to improve the accuracy and efficiency of detection. SUMMARY

[0004] In view of the shortcomings of the prior art, the present application provides a skeleton sealing test method in semiconductor device production, which solves the problems of complex operation, inaccurate detection results and difficulty in detecting small leakage points in the existing skeleton sealing test methods in semiconductor device production, and provides a simple, efficient and accurate skeleton sealing test method.

[0005] The above technical purpose of the present application is achieved by the following technical scheme:

[0006] A skeleton sealing test method in semiconductor device production, comprising: a gas source system, a sealed cavity assembly, a detection system, a data acquisition unit, a processing unit and the specific steps are as follows:

[0007] S1.1: the gas source system is used to fill the selected gas into the sealed cavity;

[0008] S1.2: the sealed cavity assembly is used to install and seal the skeleton;

[0009] S1.3: the detection system is used to detect the pressure, temperature and micro-flow in the sealed cavity;

[0010] S1.4: the data acquisition and processing unit is configured to acquire and analyze data of the detection system;

[0011] S2: the skeleton to be tested is installed in the fixing clamp of the sealed cavity to ensure stability of the skeleton during the test;

[0012] S3: the sealed cavity is inflated and pressurized by the gas source system, the inflation rate is gradually increased to a preset test pressure value at a rate of 0.05-0.15 psi / s according to the type of the skeleton, and the pressure and temperature sensors are monitored to ensure that the pressure is stable within ±0.005 psi and the reading of the micro-flow sensor is below 0.002 sccm at each pressure gradient for 5-20 minutes;

[0013] S4: when the preset test pressure is reached, the gas source and pressure regulating valve are closed, and the pressure holding test is started, the pressure holding time is 30-60 minutes, and the pressure and micro-flow sensor data are recorded every 5 minutes during the pressure holding process; if the leakage rate detected by the micro-flow sensor exceeds the set standard value, the skeleton is determined to be unqualified for sealing; if the pressure drop exceeds 0.05 psi, the sealing of the test system and the installation of the skeleton are rechecked;

[0014] S5: for the skeleton that passes the pressure holding test, the gas supply in the test system is closed, the gas in the cavity is slowly discharged to normal pressure, then the skeleton surface is evenly coated with a fluorescent leak detection agent, and the possible leakage sites are highlighted, after waiting for 10-15 minutes, the skeleton is irradiated with a UV lamp, and whether there are fluorescent bright spots to determine the location of the leakage point is observed, and the size of the leakage point is estimated in combination with the leakage rate data detected by the micro-flow sensor during the pressure holding stage.

[0015] Preferably, the gas source system comprises a gas source, a gas pressure regulating valve, a gas pressure gauge and a gas supply pipeline; the gas source is selected from at least one of nitrogen and helium;

[0016] When helium is used, the inflation rate is automatically switched to 0.02-0.1 psi / s.

[0017] Preferably, the sealed cavity assembly comprises a cavity body made of transparent material, a detachable skeleton fixing clamp, a cavity cover and a sealing gasket; the cavity cover is provided with a quick mounting and dismounting structure.

[0018] Preferably, the detection system comprises a high-precision pressure sensor, a temperature sensor and a micro-flow sensor; the high-precision pressure sensor and the temperature sensor are used to monitor the pressure and temperature changes in the sealed cavity; the micro-flow sensor is used to detect the gas leakage rate in the sealed cavity.

[0019] Preferably, the data acquisition and processing unit comprises a signal amplifier, an analog-to-digital converter, a data processing chip and a display device; the signal amplifier is used to amplify the weak electrical signal output by the detection system; the analog-to-digital converter is used to convert the amplified analog signal into a digital signal; the data processing chip is used to store, analyze and process the digital signal; and the display device is used to display the test data of the pressure, temperature and micro-flow rate and the related information of the leakage point in real time.

[0020] Preferably, before the inflation and pressurization, the entire test system needs to be subjected to airtightness inspection, and 0.5-1 psi of test gas is filled into the gas source system for pre-leakage detection, so as to ensure that the reading of the micro-flow rate sensor is less than 0.001 sccm.

[0021] Preferably, during the pressure maintenance detection, if the pressure drop amplitude exceeds a set threshold value, the gas source system is used to supplement gas into the sealed cavity again to the preset test pressure value.

[0022] Preferably, the fluorescent leak detection agent is an ultraviolet fluorescent leak detection agent which emits fluorescence under ultraviolet irradiation.

[0023] Preferably, the micro-flow rate sensor is a helium mass spectrometer leak detector or a hydrogen leak detector.

[0024] In summary, the present application has the following beneficial effects:

[0025] I. By using high-precision pressure sensors, temperature sensors and micro-flow rate sensors, the pressure, temperature and gas micro-flow rate changes in the sealed cavity can be monitored in real time and accurately; compared with the traditional method of relying only on naked eye observation or simple pressure gauge detection, the present test method can more accurately judge the sealing performance of the semiconductor device skeleton, effectively avoid misjudgment caused by inaccurate detection, and improve the accuracy of product quality control; during the pressure maintenance detection, the data is recorded every 5 minutes, and the leakage point size is estimated in combination with the leakage rate data detected by the micro-flow rate sensor during the pressure maintenance stage, so that the sealing condition of the device can be more comprehensively mastered, and the accuracy of the detection result is further ensured; during the inflation and pressurization, the preset test pressure value is gradually increased at a rate of 0.01-0.2 psi / s according to the type of the skeleton, and is maintained for 5-20 minutes at each pressure gradient, so that the detection efficiency can be improved under the premise of ensuring the detection effect; compared with the traditional method of one-time inflation to the specified pressure and long-time waiting for stabilization, the detection condition can be reached faster, and the overall detection time is reduced; for the skeleton that passes the pressure maintenance, the skeleton coated with the fluorescent leak detection agent is irradiated by an ultraviolet lamp to quickly determine the position of the leakage point, without the need for tedious disassembly and inspection of the entire device, so that the time for positioning the leakage point is greatly saved, and the efficiency of the entire test process is improved.

[0026] II. The gas source system can select at least one of nitrogen and helium as the test gas, which enables the test device to adapt to the test requirements of semiconductor device skeletons of different materials and different characteristics; because different types of semiconductor devices may have different requirements for the test gas, for example, some oxygen-sensitive devices may need to be tested using inert gas, and the device can meet these diverse needs, enhancing its versatility in different application scenarios; the sealed cavity assembly is made of a cavity body made of transparent material, equipped with removable skeleton fixing clamps, a cavity cover and a sealing gasket, and the cavity cover is provided with a quick mounting and dismounting structure; this design facilitates the installation and fixation of semiconductor device skeletons of different sizes and shapes, and also facilitates the quick removal or replacement of the skeleton after testing, further improving the adaptability of the device to different products and expanding its application range; the entire test system is checked for air tightness before being inflated and pressurized, and 0.5-1 psi of test gas is filled into the gas source system for pre-leakage detection to ensure that the micro-flow sensor reading is less than 0.001 sccm; this step can detect potential leakage problems in the test system itself in advance, avoiding misjudgment of the semiconductor device skeleton tightness test results due to test system leakage, thereby ensuring the stability and reliability of the test device; the signal amplifier in the data acquisition and processing unit is used to amplify the weak electrical signal output by the detection system, the analog-to-digital converter is used to convert the amplified analog signal into a digital signal, the data processing chip is used to store, analyze and process the digital signal, and the display device is used to display the test data and related information of the leakage point in real time; this series of rigorous signal processing and data analysis process can effectively avoid inaccurate or lost data due to weak signals or interference, ensuring the stability and reliability of the entire test process and providing a strong guarantee for accurate evaluation of the tightness of the semiconductor device skeleton.

[0027] III. The various components of the test device are designed reasonably, such as the functions of the components in the gas source system are clear and easy to operate; the sealed cavity assembly is made of transparent material, which facilitates observation of the state of the skeleton inside the cavity; the layout of the sensors in the detection system is reasonable, which can accurately collect relevant data; the data acquisition and processing unit can display various test data and related information in real time; the operation process of the entire test process is clear and easy to understand and apply for the operator, and it is also convenient for technical personnel to analyze and judge the test results; even non-professionals can quickly get started after simple training, reducing the operation threshold and improving work efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0028] Figure 1 is the step flow chart of the semiconductor device skeleton tightness test method of the present application. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of the present application.

[0030] Embodiment one

[0031] Reference Figure 1 A skeleton leak test method in semiconductor device production, comprising:

[0032] Gas source system, sealed cavity assembly, detection system, data acquisition unit, processing unit:

[0033] Gas source system: including a high-precision gas supply source, which can provide pure and pressure-stable inert gas (such as nitrogen or helium), equipped with a precision pressure regulating valve and a gas pressure gauge, for accurately controlling the gas pressure entering the test system, and the gas pressure regulating accuracy can reach ±0.01 psi.

[0034] Sealed cavity assembly: made of high-transparency and high-strength engineering plastic or glass material, which is convenient for observing the state of the skeleton during the test process; the cavity is designed with customized skeleton fixing clamps, which can be adjusted according to skeletons of different shapes and sizes, to ensure that the skeleton is in the correct installation position and good sealing state during the test. High-precision pressure sensors and temperature sensors are arranged on the cavity, which are used to monitor the pressure change and temperature fluctuation in the cavity in real time, the measurement accuracy of the pressure sensor reaches ±0.001 psi, and the accuracy of the temperature sensor is ±0.1℃.

[0035] Detection system: adopts an advanced micro-flow sensor and a leakage detection liquid combination method; the micro-flow sensor can detect extremely small gas leakage, a helium mass spectrometer (standard milliliter per minute) with a resolution of 0.01 sccm is used, and is connected with a data processing system, which can record and analyze leakage data in real time; the leakage detection liquid is a special fluorescent leak detection agent, which is uniformly applied on the surface of the skeleton or injected into possible leakage gaps, when leakage occurs, the fluorescent leak detection agent will emit obvious fluorescent signals under ultraviolet irradiation, which is convenient for naked eye observation and preliminary positioning of the leakage point, and the ultraviolet irradiation is 365nm wavelength, 50mW / cm 2 intensity.

[0036] Data acquisition and processing unit: contains high-speed data acquisition card and professional data analysis software; data acquisition card can quickly collect the signals of pressure sensor, temperature sensor and micro-flow sensor, with a sampling frequency not less than 1000Hz; data analysis software can accurately judge whether the skeleton is qualified in sealing performance through real-time processing and analysis based on the collected data by pre-established algorithm model, and automatically generate detailed test report, including test time, gas pressure, temperature change, leakage rate and other key parameters.

[0037] The test steps include:

[0038] Preparation: according to the specifications and models of the skeleton to be tested, select the appropriate fixing clamp to install in the sealed cavity, and adjust the position and angle of the clamp to ensure that the skeleton can be accurately and firmly installed;

[0039] Put the skeleton into the sealed cavity and fix it with the clamp, pay attention to avoid damaging the skeleton; then, connect the gas source system, pressure sensor, temperature sensor, micro-flow sensor and data acquisition and processing unit, ensure that the connection between each part is tight and has no leakage;

[0040] Check the air tightness of the whole test system, fill a certain pressure (such as 0.5 psi) of gas into the sealed cavity, observe the reading of the micro-flow sensor, if the reading exceeds the set threshold (such as 0.005 sccm), it indicates that the test system has leakage, which needs to be checked and repaired until the system has good air tightness.

[0041] Inflation and pressure stage: open the high-precision gas supply source of the gas source system, slowly fill the selected inert gas into the sealed cavity through the precise pressure regulating valve, and closely observe the reading of the pressure gauge, so that the gas pressure in the cavity gradually rises according to a certain gradient; for example, first increase the pressure to 0.5 psi at a rate of 0.1 psi / s, maintain stable for 5 minutes, then continue to increase to 1 psi at a rate of 0.05 psi / s, maintain for 10 minutes, and so on, until the preset test pressure value (such as 5 psi) is reached; during the inflation process, continuously monitor the data of pressure sensor and temperature sensor to ensure that the changes of pressure and temperature are within the normal range.

[0042] Pressure holding detection phase: when the gas pressure in the sealed cavity reaches the preset test pressure, close the gas source and pressure regulating valve, and start the pressure holding timing; the pressure holding time is determined according to the type and accuracy requirement of the skeleton, and is generally set to 30-60 minutes; during the pressure holding process, the data acquisition and processing unit collects the data of the pressure sensor and the micro-flow sensor at a frequency of once per second, and displays the change curves of the pressure and the leakage rate in real time; if the leakage rate detected by the micro-flow sensor exceeds the set standard value (such as 0.05 sccm), it is determined that the sealing performance of the skeleton is unqualified; if the pressure drop amplitude exceeds 0.05 psi, the sealing performance of the test system and the installation condition of the skeleton also need to be rechecked.

[0043] Leak point accurate positioning phase: for the skeleton qualified in the pressure holding, close the gas supply in the test system, and slowly discharge the gas in the cavity to normal pressure; then, evenly apply the fluorescent leak detection agent on the surface of the skeleton, and focus on applying it to the possible leakage positions, such as the welding position, the surrounding of the sealing gasket, etc.; after the application is completed, wait for 10-15 minutes to allow the leak detection agent to fully penetrate into the possible leakage gap;

[0044] Use the ultraviolet lamp to irradiate the skeleton comprehensively, and carefully observe whether there is a fluorescent bright spot on the surface of the skeleton; if there is a fluorescent bright spot, it indicates that there is a leakage point at this position; in order to further determine the position and size of the leakage point, a magnifying glass or a microscope can be used to carefully observe and analyze the fluorescent bright spot; at the same time, combined with the leakage rate data detected by the micro-flow sensor in the pressure holding phase, the size of the leakage point can be estimated.

[0045] Example two

[0046] Test device preparation: install and debug each part of the test device, ensure that the connection between the gas source system, the sealed cavity assembly, the detection system and the data acquisition and processing unit is correct and reliable; fill high-purity nitrogen into the gas source system, and adjust the gas pressure to 0.8 psi.

[0047] Put the simple structure skeleton to be tested into the fixed clamp of the sealed cavity, adjust the clamp to make it in a suitable position and posture; evenly apply a layer of fluorescent leak detection agent on the surface of the skeleton, and pay special attention to the sealing interface and connection position of the skeleton.

[0048] Inflation and pressurization: slowly fill nitrogen into the sealed cavity at a rate of 0.05 psi / s, and observe the reading of the pressure gauge and the state of the skeleton at the same time; when the gas pressure reaches 0.8 psi, stop inflating, and keep the pressure stable for 10 minutes; during this period, monitor the data of the pressure sensor and the micro-flow sensor through the data acquisition and processing unit, ensure that the pressure is stable within ±0.005 psi, and the reading of the micro-flow sensor is kept below 0.002 sccm.

[0049] Pressure holding detection: start the pressure holding timer and begin the 30-minute pressure holding process; during the pressure holding period, record the pressure and micro-flow sensor data every 5 minutes; after 30 minutes, the pressure has dropped by 0.02 psi, which is within the allowable range, but the micro-flow sensor reading has increased to 0.003 sccm.

[0050] The leak detection rate of the micro-flow sensor alone is 18%, which decreases to 2% after being used together.

[0051] Accurate leak point positioning: after the pressure holding is completed, the nitrogen gas in the sealed cavity is discharged, the skeleton is taken out of the cavity and placed under the ultraviolet lamp for observation; it is found that there is a weak fluorescent bright spot at a corner of the skeleton, which is preliminarily judged as a leak point; using a magnifying glass to further observe the part, it is found that there is a very fine crack; combined with the data of the micro-flow sensor, it is estimated that the leakage rate of the leak point is about 0.001 sccm, which exceeds the qualified standard, but the crack is very small and can be repaired by simple repair process.

[0052] Example Three

[0053] Test device preparation: for the skeleton with complex structure, the fixed clamp is specially designed and adjusted to ensure the stability and accuracy of the skeleton during the test; high-purity helium gas is selected as the test gas, and its gas pressure is accurately adjusted to 1.2 psi; after the skeleton is evenly coated with fluorescent leak detection agent at all sealed interfaces and potential leak points, it is installed into the sealed cavity;

[0054] The test system is strictly checked for air tightness, and 0.5 psi of helium gas is filled for pre-leak detection, and after ensuring that the reading of the micro-flow sensor is less than 0.001 sccm, the formal test is started.

[0055] Inflation and pressurization: helium gas is filled into the sealed cavity at a rate of 0.02 psi / s, and when the gas pressure reaches 1.2 psi, the inflation is stopped and the pressure is kept stable for 20 minutes; during this stage, the pressure and leakage are monitored in real time by high-precision pressure sensor and micro-flow sensor, and the data acquisition and processing unit collects data at a higher frequency (10 times per second); the pressure is stable within ±0.003 psi, and the reading of the micro-flow sensor fluctuates between 0.001-0.002 sccm.

[0056] Pressure holding detection: 60 minutes of pressure holding test is conducted; during the pressure holding process, data is recorded every 10 minutes, and the change trend of pressure and micro-flow sensor is closely observed; after 60 minutes, the pressure has dropped by 0.03 psi, and the final reading of the micro-flow sensor is 0.0025 sccm.

[0057] In the pressure maintaining detection stage, the micro-flow sensor is used to monitor the gas leakage rate in the sealed cavity in real time; if the leakage rate detected by the micro-flow sensor exceeds the set standard value (such as 0.05 sccm), it is determined that the sealing of the skeleton is unqualified; for the skeleton qualified in the pressure maintaining test, the gas supply in the test system is closed, the gas in the cavity is slowly discharged to the normal pressure, and then the fluorescent leak detection agent is evenly applied on the surface of the skeleton, focusing on the possible leakage positions. After waiting for 10-15 minutes, the skeleton is irradiated with ultraviolet light, and whether there is a fluorescent bright spot to determine the position of the leakage point is observed. Combined with the leakage rate data detected by the micro-flow sensor in the pressure maintaining stage, the size of the leakage point can be estimated.

[0058] Precise positioning of the leakage point: after the pressure maintaining is completed, the helium is slowly discharged, and the skeleton is taken out and placed under the ultraviolet lamp; under the irradiation of the ultraviolet light, it is found that multiple positions of the skeleton appear fluorescent bright spots, among which two bright spots are more obvious; using a microscope, these positions are carefully observed and analyzed, and two main leakage points are determined: one is a small gap at the sealing gasket, and the other is a pinhole size hole at the skeleton welding position; combined with the data of the micro-flow sensor, the leakage rates of the two leakage points are estimated to be 0.0012 sccm and 0.0013 sccm respectively.

[0059] According to the calculation formula of ultraviolet disinfection, the disinfection dose (J / m 2 ) = ultraviolet intensity (W / m 2 ) x irradiation time (s) ÷ distance square (m 2 ); by measuring the intensity of the ultraviolet lamp and the known irradiation time, the optimal irradiation distance can be calculated; at the same time, through experimental verification of the intensity and clarity of the fluorescent bright spot under different distances, the selection of the irradiation distance can be further optimized; different power and wavelength ultraviolet lamps have different disinfection effects; in practical application, appropriate ultraviolet lamps should be selected according to specific disinfection needs; for example, the ultraviolet light in the UVC band (200-280 nm) has a high killing effect on bacteria, viruses and other microorganisms.

[0060] According to the position and size of the leakage point, a corresponding repair scheme is developed: for the gap at the sealing gasket, a higher quality sealing gasket is replaced; for the hole at the welding position, repair welding is performed. After repair, the sealing test is performed again, and the test result shows that the leakage rate is reduced to below 0.0005 sccm, meeting the sealing requirements of high-precision skeletons.

[0061] Example Four

[0062] The test system is inflated at 0.5 psi and 1 psi pre-leak pressure respectively; high-precision pressure sensors and flow meters are used to monitor pressure changes and gas flow; ensure good air tightness of the test system before and after inflation to avoid interference from external air; record the pressure value P1 and time T1 after inflation; record the pressure value every certain time interval (such as every minute) until the pressure stabilizes or drops close to ambient pressure; record the change of gas flow at the same time for subsequent data analysis; calculate the pressure change rate in each time interval according to the recorded data; if the pressure change rate exceeds the set leakage rate standard (such as 0.13 KPa / min), it is judged as unqualified; through repeated experiments, the average leakage rate and maximum leakage rate under 0.5 psi and 1 psi pre-leak pressure are obtained.

[0063] Comparing the average leakage rate and maximum leakage rate under 0.5 psi and 1 psi can evaluate the sealing performance of the test system under different pressure conditions;

[0064] If the leakage rate under 1 psi is significantly higher than that under 0.5 psi, it may indicate that there are larger leakage points in some parts of the test system, which need to be further checked and repaired.

[0065] Micro-flow sensors can monitor the gas leakage rate in the sealed cavity in real time; during the pressure maintenance detection phase, if the leakage rate detected by the micro-flow sensor exceeds the set standard value (such as 0.05 sccm), it is judged that the sealing of the skeleton is unqualified; micro-flow sensors have high sensitivity and can detect small gas leaks; for example, the sensitivity of Micro-Flow sensor can reach 5·10 -4 mbar·l / s, which makes it accurate to capture small leaks; fluorescence leak detection technology uses the characteristic that fluorescent agents emit light at leakage points to realize visual detection. This method is not only intuitive, but also can accurately locate the position of the leakage point; by measuring the intensity or number of fluorescent bright spots, the size or leakage rate of the leakage point can be quantitatively analyzed. This is very important for evaluating the severity of the leak and developing a repair plan; micro-flow sensors provide real-time, quantitative leakage rate monitoring, while fluorescence leak detection technology accurately locates the leakage point through visual means; the combination of the two realizes comprehensive detection from qualitative to quantitative.

[0066] Micro-flow sensors can quickly screen out possible leakage points in the early stage, while fluorescence leak detection technology further verifies these points and accurately locates them; this synergy greatly improves the detection efficiency.

[0067] By combining the advantages of both techniques, the sealing performance of the skeleton can be more accurately judged; the high sensitivity of the micro-flow sensor ensures the detection of small leakage points, while the visual characteristics of the fluorescent leak detection technology provide more intuitive evidence.

[0068] Case One: Wafer packaging yield improvement of a well-known IDM manufacturer A

[0069] In 2024, a well-known IDM manufacturer A adopted this method, and its wafer packaging yield was significantly improved from 98.7% to 99.5%. This breakthrough not only greatly improved production efficiency, but also brought significant economic benefits to the manufacturer;

[0070] A well-known IDM manufacturer A has many years of experience and technical accumulation in the field of semiconductor manufacturing. However, with the intensification of market competition and the continuous improvement of customer demand, the manufacturer faces the challenge of improving wafer packaging yield;

[0071] The manufacturer decided to adopt this method to achieve more efficient production processes through design process co-optimization (DTCO);

[0072] In specific implementation, the manufacturer established close cooperation with manufacturing enterprises to jointly develop a complete set of processes and methods suitable for their own products;

[0073] By introducing high-precision micro-flow sensors, real-time monitoring of gas leakage rate in the sealed cavity is ensured to control the quality of the production process;

[0074] Combined with fluorescent leak detection technology, precise positioning and quantitative analysis of small leakage points are achieved, further improving the accuracy and efficiency of detection;

[0075] After a period of operation, the wafer packaging yield of the manufacturer has been significantly improved;

[0076] Customer complaint rate has dropped significantly, market feedback is good, further consolidating its leading position in the industry;

[0077] The successful application of this method has brought significant economic benefits and market competitiveness to the manufacturer.

[0078] At the same time, it also proves the practical value and prospects of the DTCO concept in the field of semiconductor manufacturing.

[0079] Although embodiments of the present application have been shown and described, it will be understood by those of ordinary skill in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A method of testing the sealing property of a skeleton in the production of a semiconductor device, characterized by, The method comprises the following steps: S1.1: the gas source system is used to fill the selected gas into the sealed cavity; S1.2: the sealed cavity assembly is used to install and seal the skeleton; S1.3: the detection system is used to detect the pressure, temperature and micro-flow rate in the sealed cavity; S1.4: the data acquisition and processing unit is used to collect and analyze the data of the detection system; S2: the skeleton to be tested is installed in the fixed clamp of the sealed cavity to ensure the stability of the skeleton during the test; Before the inflation and pressurization, the entire test system needs to be checked for air tightness, and 0.5-1 psi of test gas is filled into the gas source system for pre-leakage detection to ensure that the reading of the micro-flow sensor is less than 0.001 sccm; S3: the gas source system is used to inflate and pressurize the sealed cavity, and the inflation rate is gradually increased to the preset test pressure value at a rate of 0.05-0.15 psi / s according to the type of the skeleton, and the pressure sensor and the temperature sensor are monitored at each pressure gradient to ensure that the pressure is stable within ±0.005 psi, and the reading of the micro-flow sensor is kept below 0.002 sccm; The gas source system comprises a gas source, a gas pressure regulating valve, a gas pressure gauge and a gas supply pipeline; The gas source is selected from at least one of nitrogen and helium; When helium is used, the inflation rate is automatically switched to 0.02-0.1 psi / s; The data acquisition and processing unit collects data at a frequency of 10 times per second; S4: when the preset test pressure is reached, the gas source and the pressure regulating valve are closed, and the pressure holding test is started, the pressure holding time is 30-60 minutes, and the pressure and micro-flow rate are recorded every 5 minutes during the pressure holding process, and the data of the temperature sensor is recorded; if the leakage rate detected by the micro-flow sensor exceeds the set standard value, it is determined that the sealing performance of the skeleton is unqualified, and if the pressure drop exceeds 0.05 psi, the sealing performance of the test system and the installation of the skeleton are rechecked; S5: for the skeleton that passes the pressure holding test, the gas supply in the test system is closed, the gas in the cavity is slowly discharged to normal pressure, then the skeleton surface is evenly coated with a fluorescent leak detection agent, the possible leakage positions are highlighted, after waiting for 10-15 minutes, the skeleton is irradiated with a UV lamp, and whether there is a fluorescent bright spot to determine the position of the leakage point is observed, and the size of the leakage point is estimated according to the leakage rate data detected by the micro-flow sensor during the pressure holding stage. The sealed cavity assembly comprises a cavity body made of transparent material, a detachable skeleton fixing clamp, a cavity cover and a sealing gasket; 2. The method for testing the sealing property of a skeleton in the production of a semiconductor device according to claim 1, wherein The cavity cover is provided with a quick mounting and dismounting structure.

3. The skeleton sealing performance test method in the production of a semiconductor device according to claim 2, characterized in that The detection system comprises a high-precision pressure sensor, a temperature sensor and a micro-flow sensor; The high-precision pressure sensor and the temperature sensor are used to monitor the pressure and temperature changes in the sealed cavity; ​ The micro-flow sensor is used for detecting a gas leakage rate in the sealed cavity.

4. The method according to claim 3, wherein The data acquisition and processing unit comprises a signal amplifier, an analog-to-digital converter, a data processing chip and a display device. The signal amplifier is used for amplifying a weak electric signal output by the detection system. The analog-to-digital converter is used for converting the amplified analog signal into a digital signal. The data processing chip is used for storing, analyzing and processing the digital signal. The display device is used for displaying test data of the pressure, temperature and micro-flow and related information of a leakage point in real time.

5. The method for testing the sealing property of a skeleton in the production of a semiconductor device according to Claim 1, wherein In the pressure maintaining detection process, if the pressure drop amplitude exceeds a set threshold value, the gas source system is used to supplement gas into the sealed cavity to a preset test pressure value again.

6. The method for testing the sealing property of a skeleton in the production of a semiconductor device according to Claim 1, wherein The fluorescent leak detection agent is an ultraviolet fluorescent leak detection agent which emits fluorescence under ultraviolet irradiation.

7. The method for testing the sealing property of a skeleton in the production of a semiconductor device according to Claim 3, wherein The micro-flow sensor is a helium mass spectrometer leak detector or a hydrogen leak detector.

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