Process gas supply apparatus and substrate processing system having the same

Abstract

The present invention provides a process gas supply apparatus capable of stably controlling the temperature of a process gas to supply the process gas, and a substrate processing system including the apparatus. The process gas supply apparatus includes a gas center to which a process gas is supplied from a gas supply source, a plurality of gas lines branched from the gas center to convey the supplied process gas, and an integrated heating component provided to surround the plurality of gas lines and the gas center to simultaneously heat the gas center and the plurality of gas lines.

Description

Technical Field

[0001] The present disclosure relates to a process gas supply device and a substrate processing system including the process gas supply device, and more particularly, to a process gas supply device for supplying process gas by stably controlling the temperature of the process gas, and a substrate processing system including the process gas supply device. Background Art

[0002] In a substrate processing apparatus for manufacturing semiconductors, a process gas is sometimes heated before being supplied to a chamber for the purpose of stabilizing reactions and particle control.

[0003] In the prior art, a heating sleeve is used to surround each gas line supplying a process gas, and each gas line is heated individually. In this case, temperature variation in a specific portion causes limitations such as particles generated during the process. That is, when a single gas line is heated by installing a heating sleeve, a large amount of space is occupied due to space limitations, and not only is it difficult to control the heating area because the number of heating areas increases, but the temperature varies with different parts of the heating sleeve, causing limitations such as particles.

[0004] To address these limitations, it is necessary to maintain the temperature steadily throughout the gas line.

[0005] [Prior art literature]

[0006] [Patent Document]

[0007] Korean Patent No. 10-0990157 Summary of the invention

[0008] The present disclosure provides a process gas supply device that uniformly heats a plurality of gas pipelines through which process gas is supplied to stably maintain the temperature of the process gas, and a substrate processing system including the process gas supply device.

[0009] According to an exemplary embodiment, a process gas supply device includes: a gas center, to which process gas is supplied from a gas supply source; a plurality of gas pipelines branching from the gas center to transmit the supplied process gas; and an integrated heating component provided to surround the plurality of gas pipelines and the gas center, thereby simultaneously heating the gas center and the plurality of gas pipelines.

[0010] The integrated heating component may include: a heat conductive block configured to surround the plurality of gas pipelines and the gas center; and a heating element at least partially in contact with the heat conductive block to heat the heat conductive block.

[0011] The heat conduction block may include: a central mounting component configured to surround the center of the gas; and a gas pipeline mounting component configured to surround a plurality of gas pipelines.

[0012] Each of the multiple gas pipelines may include a horizontal line portion and a vertical line portion, the horizontal line portion extends from the gas center in a radial direction, and the vertical line portion extends in a direction perpendicular to the radial direction, wherein the gas pipeline installation component may include: a first pipeline installation component, configured to surround the horizontal line portion; and a second pipeline installation component, configured to surround the vertical line portion.

[0013] The first pipe mounting member and the second pipe mounting member may have shapes different from each other.

[0014] The gas center may be provided in plurality, stacked in a vertical direction, and the center mounting member may be configured to surround the plurality of gas centers together.

[0015] A plurality of gas pipelines may be connected to each gas center in the same number, respectively, and the gas pipeline mounting member may be provided in plural to surround the gas pipelines arranged in the same direction.

[0016] A plurality of gas supply lines may be respectively connected to the plurality of gas centers, the process gas may be supplied through the gas supply lines, and the process gas may include a plurality of gases supplied to gas centers different from each other.

[0017] A plurality of gas pipelines may be symmetrically arranged around the gas center to extend radially.

[0018] The thermally conductive block may comprise aluminum.

[0019] The heating element may include a cartridge heater.

[0020] The process gas supply device may further include a temperature measuring component configured to measure a temperature of the heat conductive block.

[0021] The integrated heating component may further include an insulating portion configured to surround the thermally conductive block.

[0022] The insulation may include fiberglass.

[0023] According to another exemplary embodiment, a substrate processing system includes: a process gas supply device according to an exemplary embodiment; a plurality of shower heads which are branched from a gas center and into which the process gas is supplied; and a plurality of substrate supports respectively provided to correspond to the plurality of shower heads.

[0024] The substrate processing system may further include a plurality of sub-chambers, wherein a plurality of shower heads and a plurality of substrate supports are respectively provided in pairs.

[0025] The plurality of shower heads may be arranged symmetrically to each other.

[0026] Each gas center can be supplied with any process gas.

[0027] Exemplary embodiments may be understood in more detail from the following description in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 is a schematic diagram of a process gas supply apparatus according to an exemplary embodiment;

[0029] Figure 2 is a diagram of a process gas supply apparatus including a plurality of gas centers according to an exemplary embodiment;

[0030] Figure 3 is a partial cross-sectional view of a first pipe mounting component and a second pipe mounting component according to an exemplary embodiment;

[0031] Figure 4 is a schematic diagram of a substrate processing system according to another exemplary embodiment; and

[0032] Figure 5 is a cross-sectional view of a plurality of sub-chambers according to another exemplary embodiment. DETAILED DESCRIPTION

[0033] Hereinafter, specific embodiments will be described in more detail with reference to the accompanying drawings. However, the present invention can be embodied in different forms and should not be construed as being limited to the embodiments described herein. On the contrary, these embodiments are provided to make the present disclosure comprehensive and complete and to fully convey the scope of the present invention to those skilled in the art. In the description, the same parts are represented by the same reference numerals. In the figures, the sizes of layers and regions are exaggerated for clarity. The same reference numerals refer to the same parts throughout the text.

[0034] Figure 1 is a schematic diagram of a process gas supply device according to an exemplary embodiment. Here, Figure 1 (a) is an exploded perspective view of a process gas supply device according to an exemplary embodiment, Figure 1 (b) is a coupled perspective view of the process gas supply device.

[0035] Reference Figure 1 According to an exemplary embodiment, a process gas supply device 100 may include: a gas center 110, to which a process gas is supplied from a gas supply source (not shown); a plurality of gas pipelines 120 branching from the gas center 110 to transmit the supplied process gas; and an integrated heating component 130 provided to surround the plurality of gas pipelines 120 and the gas center 110, thereby heating the gas center 110 and the plurality of gas pipelines 120 at the same time.

[0036] The gas center 110 may receive a process gas from a gas supply source (not shown) and may be connected to the gas supply line 21 so that the process gas is supplied from the gas supply source (not shown) through the gas supply line 21. Here, the gas center 110 may be first (or mainly) filled with the process gas, and after the process gas is completely (or thoroughly) filled and the internal pressure becomes uniform, the process gas may be branched from a plurality of gas lines 120 and then supplied to each gas line 120. For example, the gas center 110 may have the same number of subspaces as the number of branch gas lines 120, and each subspace may be interconnected so that the process gas supplied from one gas supply line 21 is completely filled and may be partially blocked by a partition or the like to be divided. Here, the process gas may first fill each subspace and then be supplied to each gas line 120 when (or after) the pressure of all subspaces is the same (or uniform).

[0037] A plurality of gas lines 120 may be branched from the gas center 110, and process gases branched from the gas center 110 may be supplied and flowed, and the supplied process gases may be transferred to the sub-chambers 215 and / or the shower heads 210. For example, the gas lines 120 branched from the gas center 110 may be connected to the sub-chambers 215 and / or the shower heads 210 different from each other, and then, a treatment process may be performed on the substrate 10 at the process station of each sub-chamber 215. Here, processes may be performed independently in the sub-chambers 215, the same process may be performed, or different processes may be performed.

[0038] The integrated heating part 130 may be provided to surround the plurality of gas lines 120 and the gas center 110. The integrated heating part 130 may heat the gas center 110 and the plurality of gas lines 120 at the same time, and may also uniformly heat the process gas within the gas center 110 and the plurality of gas lines 120. Therefore, the heating uniformity of the plurality of gas lines 120 may be improved, and the temperature of the process gas flowing within the gas center 110 and the plurality of gas lines 120 may be uniformly and stably maintained at all points within the gas center 110 and the plurality of gas lines 120. Therefore, particles generated during the process due to limitations such as a temperature variation of the process gas at a specific portion within the gas center 110 and the plurality of gas lines 120 may be prevented, and a stable reaction of the process gas may be achieved.

[0039] Here, the integrated heating component 130 includes heat conductive blocks 131 and 132 surrounding the plurality of gas pipelines 120 and the gas center 110, and a heating element 133 at least partially contacting the heat conductive blocks 131 and 132 to heat the heat conductive blocks 131 and 132. The heat conductive blocks 131 and 132 may surround the plurality of gas pipelines 120 and the gas center 110, and may be heated by the heating element 133 to transfer heat to the plurality of gas pipelines 120 and the gas center 110, thereby heating the gas center 110 and the process gas in the plurality of gas pipelines 120. For example, the heat conductive blocks 131 and 132 may surround the plurality of gas pipelines 120 and the gas center 110 at the same time to allow the gas center 110 and the plurality of gas pipelines 120 to be heated at the same time by heat conduction.

[0040] The heating element 133 may at least partially contact the heat-conducting blocks 131 and 132 to heat the heat-conducting blocks 131 and 132, and thus, heat may be transferred to the plurality of gas pipelines 120 and the gas center 110 through the heat-conducting blocks 131 and 132 to heat the plurality of gas pipelines 120 and the gas center 110. Here, the heating element 133 may be in close contact with the heat-conducting blocks 131 and 132, so that heat can be well conducted (or transferred) to the heat-conducting blocks 131 and 132. The heating element 133 may be attached to and detached from the heat-conducting blocks 131 and 132, and may be replaced by coupling and separating from the heat-conducting blocks 131 and 132.

[0041] Here, the heat conductive blocks 131 and 132 may include a central mounting part 131 surrounding the gas center 110, and a gas pipeline mounting part 132 surrounding the plurality of gas pipelines 120. The central mounting part 131 may surround the gas center 110 and cover the entire outer surface of the gas center 110, and may be in contact (or close contact) with the outer surface of the gas center 110 to transfer (conduct) the heat of the heating element 133, thereby heating the gas center 110 to heat the process gas.

[0042] The gas pipeline installation member 132 may be (integrally) coupled (or connected) to the central installation member 131, and may surround the plurality of gas pipelines 120, each of which may extend from the central installation member 131, and the extending direction is the direction in which each gas pipeline 120 branches from the gas center 110. For example, the gas pipeline installation member 132 may surround (or enclose) the central installation member 131, extend outward (toward the direction) from the outer surface (or peripheral surface) of the central installation member 131, thereby surrounding the plurality of gas pipelines 120 at one time, and may also contact the outer surface of the central installation member 131, extend along the branching direction of the gas pipeline 120, thereby surrounding the gas pipeline 120 along the (branching) direction (or the same direction). As a result, the gas pipeline installation member 132 may be in close contact (or contact) with the outer surface of each of the plurality of gas pipelines 120, so as to conduct (or transfer) the heat of the heating element 133 to all the plurality of gas pipelines 120. Therefore, the plurality of gas pipelines 120 can be heated and the process gas in the plurality of gas pipelines 120 can be heated. The gas pipeline installation member 132 can be composed of two blocks, each of which has a groove matching the shape of the gas pipeline 120 to form a shape surrounding the gas pipeline 120.

[0043] Here, the heat conductive blocks 131 and 132 may contain aluminum (Al) and may be made of an aluminum material that conducts heat quickly. When each block in the heat conductive blocks 131 and 132 is made of aluminum, due to the excellent thermal conductivity of aluminum, the heat of the heating element 133 can be quickly transferred to the gas center 110 and the plurality of gas pipelines 120, and the processability may also be excellent, and the processing (or design) may be easy. For example, the heat conductive blocks 131 and 132 may be configured (or designed) to surround the gas center 110 and the plurality of gas pipelines 120, processed into a shape surrounding the gas center 110 and the plurality of gas pipelines 120, so as to be assembled with the outside of the gas center 110 and the plurality of gas pipelines 120, providing the gas center 110 and the plurality of gas pipelines 120 (easy) to be configured in the heat conductive blocks 131 and 132, and made of aluminum to facilitate the design (configuration) of the heat conductive blocks 131 and 132.

[0044] In addition, the heating element 133 may include a cartridge heater. The cartridge heater may be arranged (or installed) to be at least partially inserted into the heat conductive blocks 131 and 132, so that it can contact with (the inner surface of) the heat conductive blocks 131 and 132 to heat the heat conductive blocks 131 and 132, and can also conduct (transfer) heat to (directly) the center 110 and the plurality of gas pipelines 120 through the heat conductive blocks 131 and 132. Here, the cartridge heater is replaceable, and the specifications of the cartridge heater installed (or installed) in the heat conductive blocks 131 and 132, such as capacity and quantity, can be determined according to (or suitable for) the size of each block in the heat conductive blocks 131 and 132 and the heating (target) temperature.

[0045] Figure 2 is a diagram of a process gas supply apparatus including a plurality of gas centers according to an exemplary embodiment, Figure 3 is a partial cross-sectional view of a first pipe mounting component and a second pipe mounting component according to an exemplary embodiment. Figure 3 (a) is a cross-sectional view of the first pipeline installation component, Figure 3 (b) is a cross-sectional view of the second pipe mounting component.

[0046] Reference Figure 2 and Figure 3 , each of the plurality of gas pipelines 120 may include a horizontal line portion 120a extending radially from the gas center 110 and a vertical line portion 120b extending perpendicularly to the radial direction from the horizontal line portion 120a. The horizontal line portion 120a may be connected to the gas center 110 to extend radially (or outwardly) from the gas center 110, and may also extend in a radial direction (e.g., in a horizontal direction) toward a corresponding shower head 210, and then be connected to the vertical line portion 120b, so that each of the plurality of gas pipelines 120 is connected to a corresponding shower head 210, respectively.

[0047] The vertical line portion 120b may be connected to the horizontal line portion 120a to extend from the horizontal line portion 120a in a direction perpendicular to the radial direction (eg, a vertical direction), and may extend toward the corresponding shower head 210 in the direction perpendicular to the radial direction to be connected to the corresponding shower head 210.

[0048] As a result, the process gas branched from the gas center 110 may flow through the plurality of gas lines 210 and then be supplied to each shower head 210 , and thus, a treatment process may be independently performed on the substrate 10 in the plurality of sub-chambers 215 respectively provided in the plurality of shower heads 210 .

[0049] Here, the gas pipeline installation member 132 may include a first pipeline installation member 132a surrounding the horizontal line portion 120a and a second pipeline installation member 132b surrounding the vertical line portion 120b. The first pipeline installation member 132a may surround the horizontal line portion 120a and may be connected to (or coupled to) the central installation member 131 to extend in a radial direction along the horizontal line portion 120a and transfer the heat of the heating element 133 to the horizontal line portion 120a.

[0050] The second pipe installation member 132b may surround the vertical line portion 120b and may be connected to the first pipe installation member 132a to extend along the vertical line portion 120b in a direction perpendicular to the radial direction and transfer the heat of the heating element 133 to the vertical line portion 120b.

[0051] Here, the first pipe mounting member 132a and the second pipe mounting member 132b may be provided to be integrated with each other, or may be integrally coupled to each other.

[0052] The gas center 110 may be provided in a plurality, and thus stacked in a vertical direction (or a direction perpendicular to the radial direction), and the central mounting member 131 may surround the plurality of gas centers 110 together. The gas center 110 may be provided in a plurality, and each of the plurality of gas centers 110 may be filled with a process gas (independently or individually). Here, each gas center 110 may be filled with the same gas or a different gas. Some groups of gas centers 110 may be filled with the same gas, and each of the remaining gas centers 110 may be filled with a gas different from (or different from) the gas filled in the group of gas centers 110. In addition, the plurality of gas centers 110 may be stacked in a vertical direction (e.g., an up-and-down direction), at least two or more gas pipelines 120 may be branched and connected from the gas center 110, respectively, and each gas center 110 connected to each gas center 110 may extend in a radial direction from each gas center 110. Therefore, there may be no interference between the plurality of gas pipelines 120, and the process gas may be stably supplied to each of the plurality of shower heads 210. Furthermore, when a plurality of gas centers 110 are stacked in a vertical direction, a plurality of gas pipelines 120 may be branched from each gas center 110 to extend in a horizontal direction, thereby uniformly flowing (supplied) to each of the gas pipelines 120 branched from the gas centers 110 , respectively.

[0053] Here, the center installation member 131 may extend in the stacking direction of the plurality of gas centers 110 to surround the plurality of gas centers 110 together (or at one time), and the plurality of gas centers 110 may be stacked to extend in a vertical direction along the stacking direction so as to surround the plurality of gas centers 110 at one time. Therefore, the plurality of gas centers 110 may be uniformly heated, the heating uniformity of the plurality of gas centers 110 may be improved, and the temperature of the process gas filled in each of the plurality of gas centers 110 may be uniformly and stably maintained in all the gas centers 110.

[0054] Here, the plurality of gas pipelines 120 may be connected to each gas center 110 in the same number, respectively, and the gas pipeline installation member 132 may be provided in plurality to surround the gas pipelines 120 arranged in the same direction. The plurality of gas pipelines 120 may be connected to each gas center 110 in the same number, respectively, and the number of the gas pipelines 120 connected to each gas center 110 may be the same as the number of the plurality of shower heads through which the process gas is injected into different substrates, and a treatment process may be performed while the process gas is supplied (or injected) into each substrate 10.

[0055] In addition, the gas pipelines 120 extending from each (different) gas center 110 and connected to the same shower head 210 may also be stacked in the vertical direction like a plurality of gas centers 110, and the gas pipeline installation member 132 may surround the vertically stacked gas pipelines 120 at once (or together) in the same direction, and be provided in plurality to surround the gas pipelines 120 in the same direction. The gas pipeline installation member 132 may extend in the vertical direction (or in the stacking direction of the gas pipelines in the same direction) to surround two or more gas pipelines 120 extending in the same direction together, and therefore, the plurality of gas pipelines 120 may be uniformly heated to improve the heating uniformity of the plurality of gas pipelines 120, and the temperature of the process gas filled in each of the plurality of gas pipelines 120 may be uniformly and stably maintained at all points of the plurality of gas pipelines 120.

[0056] When the gas pipelines 120 in the same direction are stacked in the vertical direction, the first pipeline installation member 132a and the second pipeline installation member 132b may have different shapes. For example, the first pipeline installation member 132a may have a (relatively) long length in the extending direction of the horizontal line portion 120a of the gas pipeline 120 arranged in the same direction as the vertical direction in which the horizontal line portions 120a of the gas pipelines 120 in the same direction are stacked, and may have a (relatively) narrow (small) width (or length) in the direction crossing the vertical direction and the extending direction, and the second pipeline installation member 132b may have a (relatively) long length in the vertical direction in which the vertical line portion 120b of the gas pipeline 120 in the same direction extends, and may have a (relatively) small (narrow) length (or width) in (two) crossing directions (e.g., the front-rear direction and the left-right direction) crossing the vertical direction. Additional one or more (eg, four) auxiliary blocks may be inserted into the space between the gas pipes 120 of the main block in the second pipe mounting part 132 b to improve heat transfer efficiency and also improve heat transfer of the heat conductive blocks 131 and 132 .

[0057] like Figure 2 and Figure 3 As shown, the first pipe installation member 132a may have a rectangular parallelepiped shape in which a rectangular shape that is long in the vertical direction and has a small (or narrow) width in a direction intersecting the vertical direction and the extension direction extends in the extension direction, and the second pipe installation member 132b may have a rectangular parallelepiped shape in which a square shape that has a width in (two) intersecting directions extends in the vertical direction, so that the vertical line portion 120b maintains a similar (or the same) distance from the center of each corresponding shower head 210. Here, the vertical line portions 120b of the gas pipes 120 in the same direction may be symmetrically arranged with respect to the center of each corresponding shower head 210, and may have the same distance from the center of the corresponding shower head 210, as shown in FIG. Figure 2As shown, the second pipe mounting member 132b may be provided to contact the surface of the first pipe mounting member 132a in a direction intersecting the vertical direction and the extending direction but not to contact the surface of the first pipe mounting member 132a in the extending direction.

[0058] As a result, even if the process gas includes a plurality of gases, all gases may be stably supplied to each corresponding shower head 210 to improve uniformity of each gas.

[0059] The horizontal line portion 120a may include a first horizontal line 121a, a second horizontal line 122a, a third horizontal line 123a, a fourth horizontal line 124a, a fifth horizontal line 125a, a sixth horizontal line 126a, a seventh horizontal line 127a and an eighth horizontal line 128a, and the first horizontal line 121a, the second horizontal line 122a, the third horizontal line 123a, the fourth horizontal line 124a, the fifth horizontal line 125a, the sixth horizontal line 126a, the seventh horizontal line 127a and the eighth horizontal line 128a may be stacked in a vertical direction and may be accommodated in the first pipe mounting component 132a.

[0060] In addition, the vertical line portion 120b may include a first vertical line 121b, a second vertical line 122b, a third vertical line 123b, a fourth vertical line 124b, a fifth vertical line 125b, a sixth vertical line 126b, a seventh vertical line 127b, and an eighth vertical line 128b, and the first vertical line 121b, the second vertical line 122b, the third vertical line 123b, the fourth vertical line 124b, the fifth vertical line 125b, the sixth vertical line 126b, and the seventh vertical line 121b may be configured to be spaced a similar distance from the center of the corresponding shower head 210 and accommodated in the second pipe mounting part 132b.

[0061] Here, a plurality of gas supply lines 21 supplying process gas may be connected to the plurality of gas centers 120, and the process gas may include a plurality of gases supplied to different gas centers 110. A plurality of gas supply lines 21 supplying process gas from a gas supply source (not shown) may be connected to the plurality of gas centers 120, respectively, and gas supply lines 21 different from each other may be connected to the gas centers 120, respectively, and thus, gas may be independently filled into each gas center 120.

[0062] Here, the process gas may include a plurality of gases supplied to different gas centers 110, and the plurality of gases may be the same as or different from the number of gas centers 110, but two or more gas centers are sufficient. For example, the plurality of gases may be different from each other, and at least one of the types or functions of the gases may be different from each other. When the number of gases and the number of gas centers 110 are the same, each gas center 110 may be filled with one gas through each gas supply line 21, and when the number of gas centers 110 is greater than the number of gases, some of the plurality of gases may be supplied to two or more gas centers 110, while each gas is supplied to at least one gas center 110. In this case, each gas may be supplied to each gas center 110 through each gas supply line 21.

[0063] In addition, the plurality of gas pipelines 120 may extend radially symmetrically with respect to the gas center 110, and the lengths (or extension lengths) from the gas center 110 to the corresponding shower heads 210 may be the same. The plurality of shower heads 210 may also be symmetrically arranged around the gas center 110, so that the lengths of the plurality of gas pipelines 120 from the gas center 110 to the corresponding shower heads 210 are the same, and thus (the same) process gas may be uniformly supplied to each shower head 210, thereby improving process uniformity (or treatment uniformity) between the plurality of sub-chambers 215 to which the plurality of shower heads 210 are respectively provided.

[0064] The process gas may include a source gas S, a reaction gas R reacting with the source gas, a source purge gas SP for purging the source gas, and a reactive purge gas RP for purging the reactive gas. For example, the source gas may include titanium tetrachloride (TiCl4) and dichlorosilane DCS (SiH2Cl2), and the reactive gas may include ammonia (NH3) and hydrogen (H2). In addition, each of the source purge gas and the reactive purge gas may be an inert gas, may include nitrogen (N2), hydrogen (H2), and argon (Ar), and may be the same type (or the same) of gas or different types (or different) of gas.

[0065] The process gas supply apparatus 100 according to one exemplary embodiment may further include a temperature measuring member (not shown) that measures the temperature of each of the heat conductive blocks 131 and 132 .

[0066] The temperature measuring part (not shown) may measure the temperature of each of the heat conductive blocks 131 and 132 and control the temperature of the heat conductive blocks 131 and 132 by measuring the temperature of the heat conductive blocks 131 and 132. Here, the temperature measuring part (not shown) may include a temperature sensor such as a thermocouple.

[0067] For example, the process gas supply device 100 according to an exemplary embodiment may further include a control part (not shown), which controls the heating element 133 to adjust the temperature of the heat-conducting blocks 131 and 132. The heat-conducting blocks 131 and 132 may be divided into a plurality of (e.g., nine) regions, each of which may be controlled to a target temperature (or a desired temperature) by a control part (not shown). Here, the control part (not shown) may read the temperature of each region by a temperature measuring component (not shown) to control the output (e.g., output energy or energy emission intensity) of the heating element 133, thereby achieving a control temperature (or a target temperature). Here, the temperature of the heat-conducting blocks 131 and 132 may be read using a thermocouple installed outside the heat-conducting blocks 131 and 132, and a control thermocouple and a monitoring thermocouple may be installed in each region. The control thermocouple may be used to control the temperature of the heat-conducting blocks 131 and 132, and the monitoring thermocouple may be used to detect abnormal temperature to operate an automatic locking device, such as an interlocking device. The plurality of regions may be heater regions or heating regions in which the heat-conducting elements 133 are arranged.

[0068] In addition, the control part (not shown) may include a heater temperature controller (HTC) that compares the current temperature with the control temperature of each zone and controls the target temperature by adjusting the operation time of a non-contact relay (circuit breaker) or the like, such as a solid state relay (SSR). The set temperature of the heating zone may be different for each zone, and may be determined to be from about 100°C to about 180°C, and two thermocouples may be installed in each heating zone. Here, the control thermocouple may be connected to the heater temperature controller and may be used to control the temperature of the heat conductive blocks 131 and 132, and the monitoring thermocouple may be connected to the process device controller (PDC) to operate the interlock relay when an abnormal temperature is detected.

[0069] For example, the central mounting part 131 may connect four cartridge heaters in series to define one heating area, and a K-type thermocouple may be assembled to the lower portion of each heat conductive block 131 and 132 to control the temperature of the central mounting part 131. In addition, the first pipe mounting part 132a may connect five cartridge heaters in series to define one heating area, and may also define multiple (e.g., four) heating areas in each direction, and a K-type thermocouple may be assembled to the outside of each heat conductive block 131 and 132 to control the temperature of the first pipe mounting part 132a. In addition, the second pipe mounting part 132b may connect four cartridge heaters in series to define one heating area, and may also define multiple (e.g., four) heating areas in each direction, and a K-type thermocouple may be assembled to the side surface of each heat conductive block 131 and 132 to control the temperature of the second pipe mounting part 132b.

[0070] In addition, the integrated heating member 130 may further include an insulating portion surrounding the heat conductive blocks 131 and 132. The insulating portion may surround the heat conductive blocks 131 and 132 and prevent heat from being lost from the outside of the heat conductive blocks 131 and 132.

[0071] The insulating portion may include glass fiber, and the heat conductive blocks 131 and 132 may be surrounded by an insulator made of glass fiber.

[0072] Figure 4 is a schematic diagram of a substrate processing system according to another exemplary embodiment, Figure 5 is a cross-sectional view of a plurality of sub-chambers according to another exemplary embodiment.

[0073] Reference Figures 4 to 5 A substrate processing system according to another exemplary embodiment is described. In describing a process gas supply apparatus according to another exemplary embodiment, descriptions repeated with the process gas supply apparatus according to one exemplary embodiment will be omitted.

[0074] A substrate processing system 200 according to another exemplary embodiment may include the process gas supply device 100 according to an exemplary embodiment, a plurality of shower heads 210 branched from a gas center 110 to have a process gas applied thereto, and a plurality of substrate supports 220 provided corresponding to the plurality of shower heads 210 .

[0075] The process gas supply apparatus 100 may be the process gas supply apparatus 100 according to an exemplary embodiment, and may supply a process gas having a uniform temperature to each of the plurality of shower heads 210 as described above in detail.

[0076] A plurality of shower heads 210 may be branched from the gas center 110 to supply process gas, may spray the process gas for substrate processing onto the substrate 10 , and may be respectively disposed in the sub-chambers 215 .

[0077] A plurality of substrate supports 220 may be provided to correspond to the plurality of shower heads 210 to support substrates 10 to be processed, respectively disposed in the sub-chambers 215 , and process gas may be sprayed onto the substrates supported on the substrate supports 220 to perform substrate processing such as deposition.

[0078] The substrate processing system 200 according to the exemplary embodiment may further include a plurality of sub-chambers 215 in which a plurality of shower heads 210 and a plurality of substrate supports 220 are provided in pairs, respectively.

[0079] The plurality of sub-chambers 215 may provide a plurality of shower heads 210 and a plurality of substrate supports 220 in pairs, respectively, and may perform processing on a plurality of substrates 10 (simultaneously). Each sub-chamber 215 may perform a processing process on each substrate 10. Here, the plurality of sub-chambers 215 may be spatially separated (or isolated) by a partition or the like to constitute a chamber module, and may be divided into a plurality of sub-chambers 215 (e.g., a first sub-chamber, a second sub-chamber, a third sub-chamber, and a fourth sub-chamber) in which processing is performed regionally and independently only within the chamber wall 230 to constitute the chamber module. For example, the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, and the fourth sub-chamber 215d provided in the chamber wall 230 of the chamber module may be regionally divided only within the chamber wall 230 to communicate with each other, but may not be spatially separated by a partition or the like.

[0080] Processes may be independently performed in the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, and the fourth sub-chamber 215d, may have the same configuration as the shower head 210 and the substrate support 200, and may be numbered according to positions (or areas).

[0081] For example, the first sub-chamber 215a may include a first substrate support 220a supporting a first substrate 10, and a first shower head 210a disposed on the first substrate support 220a, for spraying gas onto the first substrate 10 supported on the first substrate support 220a for substrate processing, and the second sub-chamber 215b may include a second substrate support 220b supporting a second substrate 10, and a second shower head 210b disposed on the second substrate support 220b, for spraying gas onto the second substrate 10 supported on the second substrate support 220b for substrate processing.

[0082] Each of the first shower head 210a and the second shower head 210b may be connected to the gas pipeline 120, and the first shower head 210a and the second shower head 210b may be provided to the first sub-chamber 215a and the second sub-chamber 215b, respectively, so that one of a plurality of gases may be selectively supplied, and the supplied process gas may be sprayed. Here, the same gas or different gases may be supplied to the first shower head 210a and the second shower head 210b.

[0083] In addition, first and second substrate supports 220a and 220b may be respectively disposed in the first and second sub-chambers 215a and 215b to respectively support the first and second substrates 10 and 10. Therefore, processing of a plurality of substrates 10 may be simultaneously performed in one chamber module, thereby improving process yield.

[0084] Here, the plurality of shower heads 210 may be arranged symmetrically relative to each other, and may also be arranged symmetrically around the gas center 110, so that the lengths of the plurality of gas pipelines 120 from the gas center 110 to the corresponding shower heads 210 are the same, and thus (the same) process gas may be uniformly supplied to each shower head 210, thereby improving process uniformity (or processing uniformity) between the plurality of shower heads 210 provided in the plurality of sub-chambers 215.

[0085] In addition, each gas center 110 may be supplied with any process gas. That is, only one gas may be supplied to the gas center 110, the supplied gas may not be changed, and multiple gases may react within the gas center 110, the gas pipeline 120 and / or the shower head 210 to prevent the generation of particles, etc. during the process.

[0086] A plurality of gases may be selectively supplied to the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, and the fourth sub-chamber 215d, and the plurality of gases may be respectively distributed and supplied to the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, and the fourth sub-chamber 215d. Generally, the same gas may be supplied to all of the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, and the fourth sub-chamber 215d, but the plurality of gases may be distributed so that different gases are respectively supplied to the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, and the fourth sub-chamber 215d, or a gas different from the gas supplied to the other sub-chambers is supplied to at least one of the first sub-chamber 215a, the second sub-chamber 215b, the third sub-chamber 215c, or the fourth sub-chamber 215d. Here, the number of the gas centers 110 may be the same as the number of the plurality of gases or the number of the sub-chambers 215 , and the number of the sub-chambers 215 and the number of the plurality of gases may also be the same.

[0087] Therefore, in the substrate processing system 200 according to the exemplary embodiment, the process gas supply device 100 according to the exemplary embodiment can be applied to a plurality of sub-chambers 215 provided (or constituted) by a plurality of shower heads 210 and a plurality of substrate supports 220, so that each of the plurality of gas pipelines 120 branched from the gas center 110 and connected to the plurality of shower heads 210 can be uniformly heated to supply process gas having a uniform temperature to the plurality of shower heads 210, respectively, thereby improving process uniformity between the plurality of sub-chambers 215 and performing high-quality substrate processing on a plurality of substrates at the same time.

[0088] As such, in the present disclosure, the gas center and the plurality of gas lines can be heated simultaneously by an integrated heating component, and the integrated heating component surrounds the plurality of gas lines and the gas center together to improve the heating uniformity of the plurality of gas lines, thereby maintaining the process gas uniformly and stably at all points. Therefore, particles generated during the process due to limitations such as temperature changes of the process gas in a specific portion can be prevented, and a stable reaction of the process gas can be achieved. In addition, when the process gas supply device is applied to a substrate processing system in which a plurality of shower heads and a plurality of substrate supports constitute a plurality of sub-chambers, each of the plurality of gas lines branching from the gas center and respectively connected to the plurality of shower heads can be uniformly heated to supply a process gas having a uniform temperature to the plurality of shower heads, thereby improving the process uniformity between the plurality of sub-chambers and performing high-quality substrate processing on a plurality of substrates at the same time.

[0089] The process gas supply device according to the exemplary embodiment can heat the gas center and the plurality of gas pipelines at the same time by an integrated heating component, and the integrated heating component surrounds the plurality of gas pipelines and the gas center together to improve the heating uniformity of the plurality of gas pipelines, thereby maintaining the process gas uniformly and stably at all points. Therefore, particles generated during the process due to limitations such as temperature variation of the process gas in a specific part can be prevented, and a stable reaction of the process gas can be achieved.

[0090] Furthermore, when the process gas supply device is applied to a substrate processing system in which a plurality of shower heads and a plurality of substrate supports constitute a plurality of sub-chambers, each of a plurality of gas pipelines branched from a gas center and respectively connected to the plurality of shower heads can be uniformly heated to supply process gas having a uniform temperature to the plurality of shower heads, thereby improving process uniformity among the plurality of sub-chambers and performing high-quality substrate processing on a plurality of substrates simultaneously.

[0091] Although the embodiments have been described with reference to a number of illustrative embodiments, these embodiments are not limited to the foregoing embodiments, and therefore, it should be understood that many other modifications and embodiments can be designed by those skilled in the art, and these modifications and embodiments will fall within the spirit and scope of the principles of the present disclosure. Therefore, the actual protection scope of the present invention should be determined by the technical scope of the appended claims.

Claims

1. A process gas supply device, characterized in that: include: a gas center to which a process gas is supplied from a gas supply source; a plurality of gas pipelines branching from the gas center to transmit the provided process gas; and An integrated heating component is arranged to surround the plurality of gas pipelines and the gas center to heat the gas center and the plurality of gas pipelines simultaneously.

2. The process gas supply device according to claim 1, characterized in that: The integrated heating component comprises: a heat conductive block configured to surround the plurality of gas pipelines and the gas center; and A heating element at least partially contacts the heat-conducting block to heat the heat-conducting block.

3. The process gas supply device according to claim 2, characterized in that: The heat conducting block comprises: a central mounting member configured to surround the gas center; and The gas pipeline mounting component is configured to surround the plurality of gas pipelines.

4. The process gas supply device according to claim 3, characterized in that: Each of the plurality of gas pipelines includes a horizontal line portion and a vertical line portion, wherein the horizontal line portion extends from the gas center in a radial direction, and the vertical line portion extends in a direction perpendicular to the radial direction. The gas pipeline installation components include: A first pipe installation member configured to surround the horizontal line portion; and The second pipe mounting member is configured to surround the vertical line portion.

5. The process gas supply device according to claim 4, characterized in that: The first pipe mounting member and the second pipe mounting member have shapes different from each other.

6. The process gas supply device according to claim 3, characterized in that: The gas center is provided in a plurality of forms, stacked in a vertical direction, and The central mounting members are configured to collectively surround the plurality of gas centers.

7. The process gas supply device according to claim 6, characterized in that: The plurality of gas pipelines are connected to each of the gas centers in equal numbers, respectively, and The gas pipeline mounting member is provided in a plurality of forms to surround the gas pipelines arranged in the same direction.

8. The process gas supply device according to claim 6, characterized in that: A plurality of gas supply pipelines are respectively connected to the plurality of gas centers, the process gas is supplied through the plurality of gas supply pipelines, and The process gas includes a plurality of gases supplied to the plurality of gas centers different from each other.

9. The process gas supply device according to claim 1, characterized in that: The multiple gas pipelines are symmetrically arranged around the gas center and extend radially.

10. The process gas supply device according to claim 2, characterized in that: The thermally conductive block comprises aluminum.

11. The process gas supply device according to claim 2, characterized in that: The heating element includes a cartridge heater.

12. The process gas supply device according to claim 2, characterized in that: Also included is a temperature measuring component configured to measure the temperature of the thermally conductive block.

13. The process gas supply device according to claim 2, characterized in that: The integrated heating component also includes an insulating portion configured to surround the thermally conductive block.

14. The process gas supply device according to claim 13, characterized in that: The insulating portion includes glass fibers.

15. A substrate processing system comprising: The process gas supply device according to claim 1; a plurality of shower heads which branch from the gas center and into which the process gas is supplied; as well as A plurality of substrate supports are provided corresponding to the plurality of shower heads respectively.

16. The substrate processing system according to claim 15, characterized in that: It also includes a plurality of sub-chambers, in which the plurality of shower heads and the plurality of substrate supports are respectively arranged in pairs.

17. The substrate processing system according to claim 15, characterized in that: The plurality of shower heads are arranged symmetrically to each other.

18. The substrate processing system according to claim 15, characterized in that Each of the gas centers is supplied with any one of the process gases.

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