Space angle resolution infrared band emissivity direct measurement device and method
By designing a direct measurement device for spatial angle-resolved infrared band emissivity including adjusting parts, heating parts, magnetic field generators, optical path adjustment parts and spectrometers, the problem of measuring spatial angle-resolved infrared band emissivity in magnetic field environments is solved, and the measurement of infrared full-angle resolution spectrum and direct measurement of sample emissivity is realized.
Patent Information
- Application Number
- CN202411930657.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-26
- Publication Date
- 2025-04-29
AI Technical Summary
The prior art is difficult to directly measure the spatial angle resolution of infrared band emissivity in magnetic field environments, and lacks clear methods and standards.
A direct measurement device for spatial angle resolution infrared band emissivity is designed, including a adjusting member, a heating member, a magnetic field generator, an optical path adjustment member and a spectrometer. The spatial angle resolution of the thermal radiation signal of the sample to be tested is achieved through the setting of the optical path adjustment member, and the emissivity of the sample is directly measured through conventional reference bold.
The measurement of infrared full-angle resolution spectrum was achieved, and the emissivity of the sample was directly measured, and the emissivity and absorption rate were obtained during thermal equilibrium were obtained, providing a clear solution and standard for the direct measurement experiment of non-reciprocal thermal emissivity induced by magnetic field.
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Figure CN119901678A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of measuring infrared band emissivity with spatial angle resolution under magnetic field environment, in particular to a device and method for directly measuring infrared band emissivity with spatial angle resolution. Background Art
[0002] The spectral thermal emissivity of a material is an important physical parameter that describes the thermal radiation characteristics of an object. Direct measurement of the thermal emissivity of a material is the basis for studying thermal radiation heat transfer and has important scientific significance and application value in the energy field.
[0003] In recent years, with the development of non-reciprocal photonics and the deepening of research on the high-order dielectric constant characteristics of semiconductor materials, the phenomenon of non-reciprocal thermal radiation has been revealed by researchers. This phenomenon breaks the constraints of Kirchhoff's law in thermal radiation heat transfer. Specifically, the spectral directional emissivity and spectral directional absorptivity of an object can be unequal under the action of an external magnetic field, which breaks the original spatial angle symmetry of the emissivity and decouples the directional absorptivity from the directional emissivity. However, there is still no clear method and standard for directly measuring the spatial angle emissivity of this phenomenon. Summary of the invention
[0004] The purpose of this section is to summarize some aspects of embodiments of the present invention and briefly introduce some preferred embodiments. Some simplifications or omissions may be made in this section and the specification abstract and the invention title of this application to avoid blurring the purpose of this section, the specification abstract and the invention title, and such simplifications or omissions cannot be used to limit the scope of the present invention.
[0005] In view of the above existing problems, the present invention is proposed.
[0006] Therefore, the present invention provides a device and method for directly measuring infrared band emissivity with spatial angle resolution, which can solve the problems mentioned in the background technology.
[0007] In order to solve the above technical problems, the present invention provides the following technical solutions:
[0008] The present invention provides a device for directly measuring infrared band emissivity with spatial angle resolution, comprising an operating component, including an adjusting component, a heating component arranged inside the adjusting component, a magnetic field generator arranged at the bottom of the adjusting component, a placement rack arranged at one side of the magnetic field generator, a water cooler arranged at the bottom of the placement rack, and an optical path adjusting component and a spectrometer arranged at the top of the placement rack.
[0009] As a preferred solution of the spatial angle resolved infrared band emissivity direct measurement device of the present invention, the adjusting member includes a rotating table, a one-dimensional displacement table is connected to the bottom end of one side of the rotating table, a pitch adjustment displacement table is arranged in the middle of the one-dimensional displacement table, and a rotating displacement table is arranged on one side of the one-dimensional displacement table.
[0010] As a preferred solution of the spatial angle resolved infrared band emissivity direct measurement device of the present invention, wherein: the one-dimensional displacement stage comprises an x-direction one-dimensional displacement stage, a y-direction one-dimensional displacement stage and a z-direction displacement stage, and the x-direction one-dimensional displacement stage, the y-direction one-dimensional displacement stage and the z-direction displacement stage are horizontally arranged from left to right in sequence;
[0011] A pitch adjustment displacement stage is arranged between the one-dimensional displacement stage in the y direction and the one-dimensional displacement stage in the z direction, and a rotation displacement stage is arranged on one side of the one-dimensional displacement stage in the z direction.
[0012] As a preferred solution of the spatial angle resolved infrared band emissivity direct measurement device of the present invention, wherein: the heating element comprises a heating stage arranged inside the rotating stage, a sample stage is arranged on one side of the heating stage, a platinum resistance thermometer and a heater are arranged on the top of the heating stage respectively, a thermal radiation shielding sheet is symmetrically arranged on the outer side of the heating stage, a sample stage support rod is arranged on one side of the sample stage, and the heating stage is electrically connected to a temperature meter;
[0013] The platinum resistance thermometer is arranged close to the sample stage, and the heater is arranged close to the temperature meter.
[0014] As a preferred solution of the device for directly measuring the emissivity in the infrared band with spatial angle resolution of the present invention, the optical path adjustment component includes a first reflector, a first parabolic mirror, an aperture, a second parabolic mirror, and a second reflector.
[0015] As a preferred solution of the device for directly measuring the emissivity in the infrared band with spatial angle resolution of the present invention, the aperture is arranged in the middle position between the first parabolic mirror and the second parabolic mirror.
[0016] In order to solve the above technical problems, the present invention also provides the following technical solutions: a method for directly measuring the emissivity of infrared bands with spatial angle resolution, comprising:
[0017] Inspect the target device using inspection standards;
[0018] The background noise is measured by the target device, and the target sample is obtained Signal spectrum data at time ;
[0019] By calculating and correcting the target sample The signal spectrum data of the sample to be tested is obtained at The emissivity at .
[0020] As a preferred solution of the method for directly measuring the emissivity in the infrared band with spatial angle resolution of the present invention, the target device includes a rotating table, a heating table, a magnetic field generator, an optical path adjustment component, and a spectrometer.
[0021] As a preferred solution of the method for directly measuring the emissivity in the infrared band with spatial angle resolution of the present invention, the inspection standard inspects the target device, including:
[0022] Ensure the normal operation of the FTIR spectrometer and control computer;
[0023] Check whether the external optical path maintains good collimation characteristics;
[0024] Check whether the connection between the magnetic field generator and the DC power supply, the power connection of the DC power supply, and the power connection of the motion control module and the signal serial port are connected;
[0025] Make sure the sample heating stage is in the center of the magnetic field generator, relatively level with the ground, and in the center of the light outlet.
[0026] As a preferred embodiment of the method for directly measuring the emissivity of the infrared band with spatial angle resolution of the present invention, the target sample is The signal spectrum data at this time includes the signal spectrum data of the reference black body and the signal spectrum data of the sample to be tested.
[0027] Compared with the prior art, the present invention has the following beneficial effects: through the setting of the optical path adjustment component, the spatial angle resolution of the thermal radiation signal of the sample to be measured can be achieved, and the measurement of the infrared full-angle resolution spectrum can be achieved. At the same time, through the conventional reference black body, the emissivity of the sample can be directly measured, and the conclusion that the emissivity is equal to the absorptivity in thermal equilibrium is obtained, which provides a clear plan and standard for the direct measurement experiment of non-reciprocal thermal emissivity induced by the magnetic field. BRIEF DESCRIPTION OF THE DRAWINGS
[0028] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. Among them:
[0029] Figure 1 Schematic diagram of the overall structure of the device for direct measurement of emissivity in the infrared band with spatial angle resolution.
[0030] Figure 2 This is a schematic diagram of the overall structure of the adjustment parts of the device for directly measuring the emissivity in the infrared band with spatial angle resolution.
[0031] Figure 3 This is a schematic diagram of the overall structure of the heating element of the device for directly measuring the emissivity in the infrared band with spatial angle resolution.
[0032] Figure 4 This is a schematic diagram of the overall structure of the optical path adjustment component of the direct measurement device for spatial angle-resolved infrared band emissivity.
[0033] Figure 5 This is a flowchart of the direct measurement method of the spatial angle-resolved infrared band emissivity. DETAILED DESCRIPTION
[0034] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are described in detail below in conjunction with the accompanying drawings.
[0035] In the following description, many specific details are set forth to facilitate a full understanding of the present invention, but the present invention may also be implemented in other ways different from those described herein, and those skilled in the art may make similar generalizations without violating the connotation of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.
[0036] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The term "in one embodiment" that appears in different places in this specification does not necessarily refer to the same embodiment, nor is it a separate or selective embodiment that is mutually exclusive with other embodiments.
[0037] Example 1
[0038] Reference Figure 1 , which is the first embodiment of the present invention, and provides a device for directly measuring the emissivity in the infrared band with spatial angle resolution,
[0039] Among them, it includes an operating component 100, including an adjusting member 101. Through the setting of the adjusting member 101, the spatial angle of the thermal radiation emission of the sample to be tested can be adjusted according to the actual situation, and the heated sample to be tested can be controlled to be located at the center of the magnetic field, ensuring that the reflectivity measured by the sample to be tested is more accurate. The heating member 102 arranged inside the adjusting member 101 can effectively control the working temperature range to 50-300°C through the setting of the heating member 102, thereby providing an effective measurement temperature for the sample to be tested. The magnetic field generator 103 is arranged at the bottom of the adjusting member 101. The magnetic field of the magnetic field generator 103 is generated by the coil guided by the DC power supply 6. The coil is located on the upper and lower sides of the system. The magnetic field strength is measured by a Gauss meter placed in the center of the magnetic field, which is used to feedback and adjust the size of the DC power supply, thereby adjusting the size of the magnetic field strength. Most of the magnetic field is localized in the center of the device, and the magnetic field strength ranges from 0 to 3 Tesla. Further increasing the current or reducing the spacing between the poles can increase the maximum magnetic field strength. The direction of the magnetic field can be changed by the current direction of the DC power supply. The placement rack 104 disposed on one side of the magnetic field generator 103, through the setting of the placement rack 104, the water cooler 105 disposed at the bottom of the placement rack 104, through the setting of the water cooler 105, can effectively cool the coil and the DC power supply on the magnetic field generator 103, ensuring that the magnetic field generator 103 can work stably for a long time, and the optical path adjustment member 106 and the spectrometer 107 disposed on the top of the placement rack 104, through the cooperation between the optical path adjustment member 106 and the spectrometer 107, the heating signal of the sample to be tested under the magnetic field passes through the optical path adjustment member 106 and is introduced into the spectrometer 107 for analysis, thereby obtaining the radiation signal spectrum of the sample to be tested under the magnetic field environment. By comparing with the radiation signal spectrum of the reference black body under the same environment, the emissivity value of the corresponding sample can be obtained.
[0040] When in use, firstly, according to the actual operating conditions, the spatial angle of the thermal radiation emission of the sample to be tested is adjusted by the adjusting member 101 to ensure that the reflectivity of the sample to be tested is more accurate. Secondly, the temperature range on the heating platform is controlled within 50-300°C by the heating member 102 to provide an effective measurement temperature for the sample to be tested. Then, by adjusting the magnetic field generator 103, it is ensured that the sample to be tested on the heating platform is in the center of the magnetic field. Finally, an optical system of two 90-degree off-axis parabolic mirrors and an aperture is used to achieve spatial angle resolution of the thermal radiation signal of the sample to be tested, thereby achieving measurement of the infrared full-angle resolution spectrum.
[0041] In summary, through the setting of optical path adjustment parts, the spatial angle resolution of the thermal radiation signal of the sample to be tested can be achieved, and the measurement of the infrared full-angle resolution spectrum can be realized. At the same time, the emissivity of the sample can be directly measured through a conventional reference black body, and the conclusion is obtained that the emissivity is equal to the absorptivity in thermal equilibrium, which provides a clear plan and standard for the direct measurement experiment of non-reciprocal thermal emissivity induced by the magnetic field.
[0042] Example 2
[0043] Reference Figure 2 to Figure 4 , which is the second embodiment of the present invention, and this embodiment provides a method for directly measuring infrared band emissivity with spatial angle resolution, which includes: the adjustment member 101 includes a rotating table 101a, and through the setting of the rotating table 101a, the heated sample stage can be controlled to rotate around the y-axis to change the spatial angle of thermal radiation emission of the sample to be measured, and its effective angle range is ±90 degrees; a one-dimensional displacement table 101b is connected to the bottom end of one side of the rotating table 101a, and through the setting of the one-dimensional displacement table 101b, the sample to be measured can be controlled to be located at the center of the magnetic field; a pitch adjustment displacement table 101c is arranged in the middle of the one-dimensional displacement table 101b, which can be adjusted around the x-axis by ±20 degrees; a rotation displacement table 101d is arranged on one side of the one-dimensional displacement table 101b, and the rotation displacement table 101d can be rotated 360 degrees around the z direction for adjustment; through the cooperation between the pitch adjustment displacement table 101c and the rotation displacement table 101d, the sample stage support rod 102f can be controlled to remain relatively horizontal with the ground.
[0044] Preferably, the one-dimensional translation stage 101b comprises an x-direction one-dimensional translation stage 101b-1, a y-direction one-dimensional translation stage 101b-2 and a z-direction translation stage 101b-3, the x-direction one-dimensional translation stage 101b-1, the y-direction one-dimensional translation stage 101b-2 and the z-direction translation stage 101b-3 are horizontally arranged from left to right in sequence, and the x- and y-direction motion control strokes of the three one-dimensional motion translation stages in the x, y and z directions are 25 mm, and the z-direction motion control stroke is 10 mm;
[0045] It is worth noting that a pitch adjustment platform 101c is arranged between the one-dimensional translation platform 101b-2 in the y direction and the one-dimensional translation platform 101b-3 in the z direction, and a rotation translation platform 101d is arranged on one side of the one-dimensional translation platform 101b-3 in the z direction.
[0046] Further, the heating element 102 includes a heating table 102a arranged inside the rotating table 101a. Through the setting of the heating table 102a, the sample to be tested can be effectively heated. The working temperature range of the sample table 102a when heated is 50-300°C. A sample table 102b is arranged on one side of the heating table 102a, which is convenient for placing the sample to be tested. A platinum resistance thermometer 102c and a heater 102d are respectively arranged on the top of the heating table 102a, which can display the heating temperature in real time, which is convenient for the staff to check. A thermal radiation shielding sheet 102e is symmetrically arranged on the outer side of the heating table 102a. Through the setting of the thermal radiation shielding sheet 102e, the interference of environmental thermal radiation on the sample to be tested can be effectively reduced. A sample table support rod 102f is arranged on one side of the sample table 102b. Through the setting of the sample table support rod 102f, it can be effectively connected to the adjustment member 101. The heating table 102a is electrically connected to a thermometer 102g;
[0047] It is worth noting that the platinum resistance thermometer 102c is arranged close to the sample stage 102b, and the heater 102d is arranged close to the temperature meter 102g.
[0048] Furthermore, the optical path adjustment member 106 includes a first reflector 106a, a first parabolic mirror 106b, an aperture 106c, a second parabolic mirror 106d, and a second reflector 106e. The first reflector 106a and the second reflector 106e are plane reflectors that can change the direction of the light beam, which is very useful for adjusting the layout of the optical system. The first parabolic mirror 106b and the second parabolic mirror 106d are 90-degree off-axis parabolic mirrors that can accurately focus the incident parallel light to a point, or reflect the light of a point light source into a parallel light beam, so that the light beam can better enter the spectrometer 107. The aperture 106 c is set at the midpoint of the first parabola 106b and the second parabola 106d. The first reflector 106a guides the signal of the sample to be tested from the sample heating platform 102a to the 90-degree first parabola 106b, and then transmits it to the second parabola 106d through the aperture 106c. The two off-axis parabolic mirrors are placed at a distance of twice the reflection focal length (the reflection focal length is 101.6mm). The aperture 106c is placed between the two off-axis parabolic mirrors. The opening and closing size of the aperture 106c can be used to control the ability of spatial angle resolution. The signal after angle resolution collimation is introduced into the FTIR spectrometer 107 through the second reflector 106e.
[0049] When in use, firstly, the sample to be tested is controlled to be located at the center of the magnetic field through the one-dimensional displacement stage 101b-1 in the x direction, the one-dimensional displacement stage 101b-2 in the y direction, and the displacement stage 101b-3 in the z direction. Secondly, the sample stage support rod 102f can be controlled to remain relatively horizontal with the ground through the coordination between the pitch adjustment displacement stage 101c and the rotation displacement stage 101d. Then, under the magnetic field, the first reflector 106a guides the signal of the sample to be tested from the sample heating stage 102a to the 90-degree first parabolic mirror 106b, and then transmits it to the second parabolic mirror 106d after passing through the aperture 106c. The signal after angle resolution collimation is introduced into the FTIR spectrometer 107 through the second reflector 106e for analysis, thereby obtaining the radiation signal spectrum of the heated sample in the magnetic field environment. By comparing with the radiation signal spectrum of the reference black body under the same environment, the emissivity value of the corresponding sample can be obtained.
[0050] Example 3
[0051] Reference Figure 5 , which is the third embodiment of the present invention, provides a method for directly measuring the emissivity in the infrared band with spatial angle resolution, which comprises:
[0052] Inspect the target device using inspection standards;
[0053] Furthermore, the target device includes a rotating stage 101 a , a heating stage 102 a , a magnetic field generator 103 , an optical path adjustment member 106 , and a spectrometer 107 .
[0054] Furthermore, the inspection standards check the target device, including ensuring that the FTIR spectrometer and control computer are functioning properly;
[0055] Check whether the external optical path maintains good collimation characteristics;
[0056] Check whether the connection between the magnetic field generator and the DC power supply, the power connection of the DC power supply, and the power connection of the motion control module and the signal serial port are connected;
[0057] Make sure the sample heating stage is in the center of the magnetic field generator, relatively level with the ground, and in the center of the light outlet.
[0058] It should be noted that when checking the external optical path, a small laser is used to keep the plane reflector horizontal with the optical platform at the center of the light outlet of the magnetic field generator to observe whether the light spot at the outlet of the plane reflector presents a well-shaped circle.
[0059] Furthermore, the background noise is measured by the target device to obtain the target sample Signal spectrum data at time ;
[0060] It should be noted that the sample heating signal under the magnetic field is introduced into the spectrometer 107 for analysis after passing through the optical path adjustment component 106, thereby obtaining the radiation signal spectrum of the heated sample under the magnetic field environment.
[0061] Furthermore, the target sample The signal spectrum data at this time includes the signal spectrum data of the reference black body and the signal spectrum data of the sample to be tested.
[0062] It should be noted that the background noise S of the target device is measured. b (T 1 ,θ,G), at room temperature T 1 ℃, turn on the water cooling unit and constant current power supply, change the size of the constant current power supply to keep the magnetic field at the intensity of GT, adjust the space electric rotating stage to the angle θ, and record the background signal spectrum S of the FTIR detector b (T 1 ,θ,G);
[0063] Measure the reference black body at T 2 Signal spectrum S at ℃ 1 (T 2 ,θ,G), clamp the reference blackbody in the sample heating module and heat it to T 2℃, when the temperature of the temperature control equipment is stable, use the data acquisition instrument and K-type thermocouple to touch the surface of the black body to observe whether the surface temperature is close to T 2 ℃. Keep the magnetic field size G and the spatial angle θ unchanged and record the measured reference black body at T 2 ℃Signal spectrum S 1 (T 2 ,θ,G);
[0064] Measure the sample under test at T 2 Signal spectrum S at ℃ 2 (T 2 ,θ,G), repeat the operation, and record and measure the sample under test at T while keeping the magnetic field size G and the spatial angle θ unchanged. 2 ℃Signal spectrum S 2 (T 2 ,θ,G).
[0065] By calculating and correcting the target sample The signal spectrum data at ℃ is obtained to obtain the sample to be tested at Emissivity at ℃.
[0066] It should be noted that the calculation of the sample to be tested at T 2 Emissivity ε at ℃ 2 (T 2 ,θ,G). The emissivity is calculated as follows:
[0067] ε 2 (T 2 ,θ,G)=(S 2 (T 2 ,θ,G)-S b (T 1 ,θ,G)) / (S 1 (T 2 ,θ,G)-S b (T 1 ,θ,G))*ε b .
[0068] Since the reference blackbody emissivity is not perfectly 1, it is necessary to introduce ε b The reference blackbody correction parameters are used to correct the calculated emissivity of the sample to be tested.
[0069] Among them, ε 2 (T 2 ,θ,G) is the emissivity of the sample to be tested at temperature T2, angle θ and magnetic field intensity G;
[0070] (S 2 (T 2 ,θ,G) is the signal spectrum of the sample to be tested at temperature T2, angle θ and magnetic field intensity G;
[0071] S b (T 1 ,θ,G) is the background signal spectrum, usually measured at room temperature T1, angle θ and magnetic field strength G;
[0072] (S 1 (T 2 ,θ,G): signal spectrum of the reference black body at temperature T2, angle θ and magnetic field intensity G;
[0073] ε b is the known emissivity of the reference black body, which is used to correct the calculation results.
[0074] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should all be included in the scope of the claims of the present invention.
Claims
1. A spatial angle-resolved infrared band emissivity direct measurement device, characterized in that: include, An operating assembly (100) comprises an adjusting member (101), a heating member (102) arranged inside the adjusting member (101), a magnetic field generator (103) arranged at the bottom of the adjusting member (101), a placement rack (104) arranged at one side of the magnetic field generator (103), a water cooler (105) arranged at the bottom of the placement rack (104), and an optical path adjusting member (106) and a spectrometer (107) arranged at the top of the placement rack (104).
2. The device for directly measuring the spatial angle-resolved infrared band emissivity according to claim 1, characterized in that: The adjustment member (101) comprises a rotating platform (101a), a one-dimensional displacement platform (101b) is connected to the bottom end of one side of the rotating platform (101a), a pitch adjustment displacement platform (101c) is arranged in the middle of the one-dimensional displacement platform (101b), and a rotating displacement platform (101d) is arranged on one side of the one-dimensional displacement platform (101b).
3. The device for directly measuring the emissivity in the infrared band with spatial angle resolution as claimed in claim 2, characterized in that: The one-dimensional translation stage (101b) comprises an x-direction one-dimensional translation stage (101b-1), a y-direction one-dimensional translation stage (101b-2) and a z-direction translation stage (101b-3), wherein the x-direction one-dimensional translation stage (101b-1), the y-direction one-dimensional translation stage (101b-2) and the z-direction translation stage (101b-3) are horizontally arranged in sequence from left to right; A pitch adjustment displacement stage (101c) is arranged between the one-dimensional displacement stage (101b-2) in the y direction and the one-dimensional displacement stage (101b-3) in the z direction, and a rotation displacement stage (101d) is arranged on one side of the one-dimensional displacement stage (101b-3) in the z direction.
4. The device for directly measuring the emissivity in the infrared band with spatial angle resolution as claimed in claim 3, characterized in that: The heating element (102) comprises a heating platform (102a) arranged inside the rotating platform (101a), a sample platform (102b) is arranged on one side of the heating platform (102a), a platinum resistance thermometer (102c) and a heater (102d) are arranged on the top of the heating platform (102a), a heat radiation shielding sheet (102e) is symmetrically arranged on the outer side of the heating platform (102a), a sample platform support rod (102f) is arranged on one side of the sample platform (102b), and the heating platform (102a) is electrically connected to a temperature meter (102g); The platinum resistance thermometer (102c) is disposed close to the sample stage (102b), and the heater (102d) is disposed close to the temperature meter (102g).
5. The device for directly measuring the spatial angle-resolved infrared band emissivity according to claim 4, characterized in that: The optical path adjustment member (106) comprises a first reflecting mirror (106a), a first parabolic mirror (106b), an aperture (106c), a second parabolic mirror (106d), and a second reflecting mirror (106e).
6. The device for directly measuring the spatial angle-resolved infrared band emissivity according to claim 5, characterized in that: The aperture (106c) is arranged at the midpoint of the first parabolic mirror (106b) and the second parabolic mirror (106d).
7. A method for directly measuring infrared band emissivity with spatial angle resolution, applied to the device for directly measuring infrared band emissivity with spatial angle resolution as claimed in any one of claims 1 to 6, characterized in that: include, Inspect the target device using inspection standards; The background noise is measured by the target device, and the target sample is obtained Signal spectrum data at time ; By calculating and correcting the target sample The signal spectrum data of the sample to be tested is obtained at The emissivity at .
8. The method for direct measurement of spatial angle resolved infrared band emissivity according to claim 7, characterized in that: The target device comprises a rotating stage (101a), a heating stage (102a), a magnetic field generator (103), an optical path adjustment component (106), and a spectrometer (107).
9. The method for direct measurement of spatial angle resolved infrared band emissivity according to claim 8, characterized in that: The inspection standard inspects the target device, including Ensure the normal operation of the FTIR spectrometer and control computer; Check whether the external optical path maintains good collimation characteristics; Check whether the connection between the magnetic field generator and the DC power supply, the power connection of the DC power supply, and the power connection of the motion control module and the signal serial port are connected; Make sure the sample heating stage is in the center of the magnetic field generator, relatively level with the ground, and in the center of the light outlet.
10. The method for directly measuring the spatial angle resolved infrared band emissivity according to any one of claims 8 or 9, characterized in that: The target sample is The signal spectrum data at this time includes the signal spectrum data of the reference black body and the signal spectrum data of the sample to be tested.