Mask, spacer and display substrate

Abstract

The invention discloses a mask, a spacer and a display substrate. The mask comprises a shading area and a light-transmitting area; the light-transmitting area comprises a main body pattern which is in a polygonal shape. The light-transmitting area further comprises an externally-expanded pattern, and the externally-expanded pattern is arranged at one corner position of the main body pattern and expands outwards from the corner position to the direction away from the main body pattern. The light-transmitting area further comprises a compensation pattern, the compensation pattern is arranged in the area of one side, far away from the main body pattern, of the main body pattern, and the orthographic projection of the compensation pattern to the side falls between the two ends of the side; at least one corner of the main body graph is provided with an external expansion graph, and two sides corresponding to the corner are provided with the compensation graphs. According to the mask, exposure compensation is carried out on the corners of the spacer, passivation at the corners of the spacer is reduced, and the actual supporting area of the spacer is increased. And the actual supporting effect of the spacer is improved under the condition that the size of the spacer is not increased.

Description

Technical Field

[0001] The present invention relates to the field of display, and in particular to a mask plate, a spacer and a display substrate. Background Art

[0002] The LCD panel is mainly composed of an array substrate, a color filter substrate, and a liquid crystal cell between the two. In addition to providing a color filter layer, the color filter substrate is also provided with a columnar spacer to support the thickness of the liquid crystal cell. In order to make the film surface uniform after cell formation and reduce the risk of low-temperature bubbles and gravity mura, the columnar spacer is often set in two sections (main spacer (Main) / sub spacer (Sub)) or three sections (Main / Sub1 / Sub2).

[0003] The mask design of columnar spacers is mainly divided into conventional type and semi-transparent film type. The main spacer and auxiliary spacer of conventional columnar spacers both adopt fully transparent patterns, and the step difference is generally controlled by controlling the opening size of the fully transparent pattern. For semi-transparent film columnar spacers, the main spacer generally adopts a fully transparent pattern, and the auxiliary spacer adopts a semi-transparent pattern. The transmittance of the semi-transparent pattern is generally fixed, and the transmittance of the semi-transparent pattern is given according to the step difference requirement.

[0004] When a semi-transparent mask is used to make columnar spacers, when the semi-transparent pattern of the mask exceeds a certain opening value, the light intensity at the center of the semi-transparent pattern will be different from the light intensity at other positions, which may blunt the corners of the spacers and reduce the actual supporting area of ​​the spacers, thereby causing the risk of touch-pressure-related defects in the LCD panel. Summary of the invention

[0005] The purpose of the present application is to provide a mask plate, a spacer and a display substrate capable of achieving edge correction.

[0006] The present application discloses a mask, which comprises:

[0007] Shade area;

[0008] A light-transmitting area, the light-transmitting area comprising:

[0009] A main figure, wherein the main figure is in a polygonal shape;

[0010] An outward-expanding graphic, the outward-expanding graphic is arranged at a corner position of the main graphic, and the outward-expanding graphic expands outward from the corner position in a direction away from the main graphic;

[0011] A compensation pattern, wherein the compensation pattern is arranged in a region of one side of the main pattern away from a side of the main pattern, and the orthographic projection of the compensation pattern onto the side falls between two ends of the side;

[0012] The outward-expanding pattern is arranged at at least one corner position of the main pattern, and the compensation pattern is arranged at both sides corresponding to the corner position.

[0013] Optionally, the outward-expanding graphics are arranged at all corner positions of the main graphics; and the compensating graphics are arranged at all side positions of the main graphics.

[0014] Optionally, the number of the external expansion patterns is equal to the number of the compensation patterns.

[0015] Optionally, the main figure is a square, the outer-expanding figure is a square, and the compensation figure is a rectangle.

[0016] Optionally, the outward-expanding graphics are arranged at four corners of the main graphic; and the compensation graphics are arranged at all side positions of the main graphic.

[0017] Optionally, the centroid of the outward-expanding figure overlaps with a vertex of the main figure, and two vertices of the outward-expanding figure are respectively located on two adjacent sides of the main figure.

[0018] Optionally, one side of the compensation pattern is arranged parallel to a side of the main pattern close to the compensation pattern, and a portion of the shading area is arranged between the compensation pattern and the side of the main pattern close to the compensation pattern.

[0019] Optionally, a portion of the light-shielding area is provided between the compensation pattern and the outward-expanding pattern.

[0020] Optionally, the side length of the main figure is a, the side length of the extended figure is x, the distance between the compensation figure and a side of the main figure close to the compensation figure is b, the side length of the compensation figure parallel to the side of the main figure close to the compensation figure is w, and the side length of the compensation figure perpendicular to the side of the main figure close to the compensation figure is h;

[0021] 32μm≤a≤44μm, 2μm≤h≤4μm, 2μm≤b≤4μm, 6μm≤x≤8μm, and w=a-√2x.

[0022] Optionally, the side length of the main figure is a, the side length of the extended figure is x, the distance between the compensation figure and a side of the main figure close to the compensation figure is b, the side length of the compensation figure parallel to the side of the main figure close to the compensation figure is w, and the side length of the compensation figure perpendicular to the side of the main figure close to the compensation figure is h;

[0023] h=(4a) / 44, b=(3a) / 44, x=(7a) / 44, and w=a-√2x.

[0024] Optionally, the mask plate includes several light-transmitting areas; the several light-transmitting areas include fully light-transmitting areas and / or semi-light-transmitting areas; the fully light-transmitting areas are used to prepare main spacers on the display substrate, and the semi-light-transmitting areas are used to prepare secondary spacers on the display substrate.

[0025] The present application also provides a spacer, wherein the fillet radius at the corners of the spacer is R, the lateral dimension of the spacer is TX, and the longitudinal dimension of the spacer is TY; when the height of the spacer is compressed to 55% of the original height, R is greater than or equal to 1 / 6TX and less than or equal to 1 / 4TX or R is greater than or equal to 1 / 6TY and less than or equal to 1 / 4TY.

[0026] Optionally, the spacer is prepared using a mask, the side length of the mask opening pattern is a, and in a normal state:

[0027] R=0.0013a 3 -0.152a 2 +5.521a-56.236

[0028] TX=-0.0014a 3 +0.157a 2 -4.703a+69.741

[0029] TY=-0.0004a 3 +0.045a 2 -0.518a+17.759.

[0030] Optionally, the height of the middle area of ​​the top of the spacer is greater than or equal to the height of the corner area of ​​the top of the spacer.

[0031] Optionally, the angle between the side wall of the spacer and the horizontal plane is less than 30°.

[0032] Optionally, the elastic recovery rate of the spacer is greater than or equal to 90% and less than or equal to 95%.

[0033] The present application also provides a display substrate, which includes the above-mentioned spacer.

[0034] Compared with the related art, the mask of the present application reduces the passivation at the corners of the spacers by performing exposure compensation on the corners of the spacers, thereby increasing the actual support area of ​​the spacers. The actual support effect of the spacers is improved without increasing the size of the spacers; the size of the spacers can also be reduced without changing the actual support effect of the spacers, thereby reducing the width of the BM and improving the transmittance of the display panel.

[0035] It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present specification. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the specification and, together with the description, serve to explain the principles of the specification.

[0037] Figure 1 This is a data chart showing the relationship between the chamfer size of the mask and the fillet radius of the spacer for this application.

[0038] Figure 2 It is a schematic diagram of the structure of a mask in the related art.

[0039] Figure 3 This is a data comparison chart of the mask with and without compensation graphics for this application.

[0040] Figure 4 Schematic diagram of the structure of a mask in one embodiment of the present application.

[0041] Figure 5 It is a schematic structural diagram of a mask in another embodiment of the present application.

[0042] Figure 6 It is a schematic structural diagram of a mask in another embodiment of the present application.

[0043] Figure 7 It is a schematic structural diagram of a mask in another embodiment of the present application.

[0044] Figure 8 It is a schematic structural diagram of a mask in another embodiment of the present application.

[0045] Fig. 9 This is a data chart showing the relationship between the main graphic size of the mask and the fillet radius of the spacer for this application.

[0046] Fig.10 This is a data chart showing the relationship between the mask compensation pattern size and the spacer corner radius of this application.

[0047] Fig.11 This is a data chart showing the relationship between the mask compensation pattern size and the spacer corner radius of this application.

[0048] Fig.12 This is a data chart showing the relationship between the external expansion pattern size of the mask and the fillet radius of the spacer for this application.

[0049] Fig.13 This is a data chart showing the relationship between the spacer size and the mask size for this application.

[0050] Fig.14 This is a data comparison chart of the improved spacer in this application and the conventional spacer. DETAILED DESCRIPTION

[0051] Exemplary embodiments will be described in detail herein, examples of which are shown in the accompanying drawings. When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The implementations described in the following exemplary embodiments do not represent all implementations consistent with this specification. Instead, they are merely examples of devices and methods consistent with some aspects of this specification as detailed in the appended claims.

[0052] The terms used in this application are only for the purpose of describing specific embodiments and are not intended to limit the present disclosure. Unless otherwise defined, the technical terms or scientific terms used in this specification should be understood by people with ordinary skills in the field to which this application belongs. The words "first", "second" and similar words used in this specification and claims do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, words such as "one" or "one" do not indicate a quantitative limit, but indicate the existence of one. "Multiple" or "several" means two or more. Unless otherwise specified, words such as "front", "rear", "lower" and / or "upper" are only for the convenience of explanation and are not limited to one position or one spatial orientation. Words such as "include" or "comprise" mean that the elements or objects appearing in front of "include" or "comprise" include the elements or objects listed after "include" or "comprise" and their equivalents, and do not exclude other elements or objects. Words such as "connect" or "connected" are not limited to physical or mechanical connections, and can include electrical connections, whether direct or indirect.

[0053] The terms used in this specification are for the purpose of describing specific embodiments only and are not intended to limit the present disclosure. The singular forms of "a", "the" and "the" used in this specification and the appended claims are also intended to include plural forms unless the context clearly indicates otherwise. It should also be understood that the term "and / or" used herein refers to and includes any or all possible combinations of one or more associated listed items.

[0054] A photomask is a graphic master used in the field of photolithography, which transfers the pattern to the corresponding product carrier during the exposure process. Since the first generation of masks in 1993, large size, thin line width, and fewer processes have always been the ultimate optimization direction of masks. The columnar spacers (Photo Spacer) in thin-film transistor liquid crystal displays (TFT-LCD) are key structures for supporting the thickness of the box. Half-Tone Masks are often used to reduce the process. The main spacers (Main PS) are made using a full-tone pattern (Full-Tone Pattern), and the sub-spacers (Sub PS) are made using a half-tone pattern (Half-Tone Pattern) to form a step difference.

[0055] like Figure 1 As shown in the figure, the main design factors of PS Mask are TX (lateral size), TY (vertical size), C (four-corner chamfer size), and HT Tr (transmittance). When C increases, the difference between PS Profile and Mask shape gradually increases, transitioning from rectangular to circular. When using a proximity exposure machine to manufacture spacers, the actual exposure pattern is compared with the mask design pattern. The corner position is limited by diffraction, and the high-frequency part reflecting the corners in the intensity spectrum cannot be effectively projected to the carrier substrate, resulting in corner blunting. At this time, the side length of the circumscribed rectangle of the columnar spacer remains unchanged, and the pixel opening rate of the display panel remains unchanged. However, due to the blunting of the corners, the original polygonal effective support area is actually an inscribed circle / ellipse of the original polygon. The support area at the corner position is lost due to exposure, resulting in a significant reduction in the effective support area of ​​the actual spacer, resulting in a decrease in the product transmittance, and insufficient support strength in the box causes yield loss. In addition, the PS Profile and Mask sizes cannot be consistent. Even if C is reduced to 0, the Mask is rectangular, and the PS Profile only has four corner fillet radii R that are relatively reduced and cannot be reduced to 0. At this time, the PS effective support area is an inscribed rounded rectangle under the fixed TX / TY rectangle. Considering TX=TY=a, the larger the radius R of the four corners, the greater the loss of PS effective support area. When R increases to the limit a / 2, the minimum effective contact area appears - a circle with a radius of R, such as Figure 1 1-5 in the figure. At this time, the effective contact area of ​​PS can be calculated using the approximate formula:

[0056] S=a 2 +(π-4)R 2 , where S∈[πR 2 , a 2 ]

[0057] The thickness of the cell is supported by the Main PS. When subjected to external pressure and LC fluctuations, the thickness of the cell compresses the Sub PS and begins to contact the opposite substrate and support it, making the space inside the cell stable. When the Sub PS support density is insufficient, the space inside the cell is rapidly compressed, causing the Main PS to be compressed to plastic deformation or collapse. After the load is released, the space inside the cell cannot return to its initial state and a difference in transmittance occurs, resulting in a Gap defect.

[0058] Increasing the density of Sub PS can effectively improve Gap defects, but without other design optimizations, increasing Sub PS Size is the only strategy. However, when the panel has relative sliding on the T / C side, a large size can easily cause PS to scratch the alignment film on the opposite side, resulting in LC disorder and light leakage. Therefore, increasing the Sub PS Size requires matching a larger BM to block the potential light leakage area, which directly leads to low panel pixel opening rate / transmittance.

[0059] like Figure 2 and Figure 3 As shown, the figure provides a mask, which includes a main figure 21 and an expanded figure 22. The main figure 21 is a square, and the expanded figure 22 is also a square. The expanded figure 22 is set at the corner position of the main figure 21. Optionally, the four corners of the main figure 21 are all provided with expanded figures 22. The centroid of the expanded figure 22 overlaps with a vertex of the main figure 21, and the two vertices of the expanded figure 22 close to the main figure 21 are respectively located on the adjacent two sides of the main figure 21 close to the expanded figure 22. That is, one quarter of the area of ​​the expanded figure 22 overlaps with the main figure 21 (that is, Figure 2 At this time, due to the weak overall light intensity of Half-Tone, the spacer shrinks around and causes distortion, the 2D morphology is not effectively improved, and the four corners are severely distorted, which can easily cause peeling or damage deformation. At the same time, the spacer has a serious crater with a pit depth of 0.085μm. The PS Bottom Size has no compensation improvement, and the cross-sectional shape of Taper is consistent with Normal Half Tone, which is a uniform gradient. The spacer with this structure cannot provide effective support.

[0060] like Figure 4 and Figure 5 As shown, in order to solve the above problems, the present application provides a mask plate for making spacers on a display substrate, which includes:

[0061] Shade area 10;

[0062] A plurality of light-transmitting areas 20, wherein the light-transmitting areas 20 include:

[0063] A main body graphic 21, wherein the main body graphic 21 is polygonal;

[0064] An outwardly extending graphic 22, wherein the outwardly extending graphic 22 is disposed at a corner position of the main graphic 21, and the outwardly extending graphic 22 expands from the corner position in a direction away from the main graphic 21;

[0065] A compensation pattern 23, wherein the compensation pattern 23 is disposed on one side of the main pattern 21 away from the main pattern 21, and the orthographic projection of the compensation pattern 23 onto the side falls between the two ends of the side;

[0066] The outward-expanding pattern 22 is disposed at a corner of the main pattern 21 , and the compensating patterns 23 are disposed at both sides corresponding to the corner.

[0067] In order to solve the above technical problems, the present application further provides a spacer, which is manufactured using the above mask.

[0068] In order to solve the above technical problems, the present application further provides a display substrate, which includes the above-mentioned spacer.

[0069] This application reduces the passivation at the corners of the spacer by performing exposure compensation on the corners of the spacer, thereby increasing the actual support area of ​​the spacer. The actual support effect of the spacer is improved without increasing the size of the spacer. From the perspective of the support capacity in the box, without increasing TX / TY, the PS contact area is increased only by reducing the radius of the four corners. The maximum area is a rectangle and the minimum area is a circle. Consider TX=TY=a:

[0070] Theoretical improvement = (a 2 -πa 2 / 4) / (πa 2 / 4)=27.3%

[0071] It is also possible to reduce the size of the spacers and the width of the BM while maintaining the actual supporting effect of the spacers, thereby improving the transmittance of the display panel.

[0072] The following will describe in detail various embodiments of the present application that are consistent with the above-mentioned creative concepts.

[0073] like Figures 4 to 8As shown, the present application provides a mask, which includes a light-shielding area 10 and a plurality of light-transmitting areas 20. The light-transmitting area 20 is composed of a main figure 21, an expansion figure 22 and a compensation figure 23. The main figure 21 is a polygon. Optionally, the number of sides of the main figure 21 can be set according to actual conditions. The main figure 21 can be a triangle, a quadrilateral, a pentagon or other polygons. The main figure 21 can be a regular polygon or a non-regular polygon. The length of each side of the main figure 21 and the degree of each angle can be set according to actual needs. The expansion figure 22 is set at a corner position of the main figure 21, and the expansion figure 22 expands from the corner position to the direction away from the main figure 21. The shape of the expansion figure 22 can be set according to actual needs. The expansion figure 22 can be a regular shape, such as a circle, an ellipse, a polygon or a semicircle; the expansion figure 22 can also be an irregular shape; it is only necessary for the expansion figure 22 to satisfy the expansion from a corner position of the main figure 21 to the direction away from the main figure 21. The compensation pattern 23 is arranged on one side of the main pattern 21 away from the main pattern 21. The shape of the compensation pattern 23 can be set according to actual needs. The compensation pattern 23 can be a regular shape, such as a circle, an ellipse, a polygon or a semicircle, etc.; the compensation pattern 23 can also be an irregular shape; it is only necessary for the compensation pattern 23 to be arranged on one side of the main pattern 21 away from the main pattern 21. An outward expansion pattern 22 is arranged at a corner of the main pattern 21, and the compensation pattern 23 is arranged at both sides corresponding to the corner where the outward expansion pattern 22 is arranged.

[0074] In an optional embodiment, the mask includes a plurality of light-transmitting areas 20. The plurality of light-transmitting areas 20 are fully light-transmitting areas, which are used to prepare main spacers on the display substrate. The position distribution of the light-transmitting areas 20 on the mask is set according to the position setting of the main spacers on the display substrate.

[0075] In an optional embodiment, the mask includes a plurality of light-transmitting areas 20. The plurality of light-transmitting areas 20 are semi-transmitting areas, which are used to prepare auxiliary spacers on the display substrate. The position distribution of the light-transmitting areas 20 on the mask is set according to the position setting of the auxiliary spacers on the display substrate.

[0076] In an optional embodiment, the mask includes a plurality of light-transmitting areas 20. The plurality of light-transmitting areas 20 include a plurality of fully light-transmitting areas and a plurality of semi-light-transmitting areas. The fully light-transmitting areas are used to prepare the main spacers on the display substrate, and the semi-light-transmitting areas are used to prepare the sub-spacers on the display substrate. The position distribution of the light-transmitting areas 20 on the mask is set according to the position setting of the main spacers and the sub-spacers on the display substrate.

[0077] In an optional embodiment, an outward-expanding pattern 22 is provided at all corner positions of the main figure 21. A compensating pattern 23 is provided at all side positions of the main figure 21. The number of the outward-expanding patterns 22 is equal to the number of the compensating patterns 23. For example, if the main figure 21 is a triangle, then the three corner positions of the main figure 21 are provided with outward-expanding patterns 22 that expand outward in a direction away from the main figure 21, and the three sides of the main figure 21 that are away from the side of the main figure 21 are provided with compensating patterns 23. When the main figure 21 is a pentagon, the five corner positions of the main figure 21 are provided with outward-expanding patterns 22 that expand outward in a direction away from the main figure 21, and the five sides of the main figure 21 that are away from the side of the main figure 21 are provided with compensating patterns 23.

[0078] like Figures 4 to 6 As shown, in an optional embodiment, the main figure 21 is a square, the outer-expanded figure 22 is also a square, and the compensation figure 23 is a rectangle. Optionally, the centroid of the outer-expanded figure 22 overlaps with a vertex of the main figure 21, and the two vertices of the outer-expanded figure 22 close to the main figure 21 are respectively located on the adjacent two sides of the main figure 21 close to the outer-expanded figure 22. That is, one-quarter of the area of ​​the outer-expanded figure 22 overlaps with the main figure 21 (i.e. Figure 6 L area in the figure). Optionally, one side of the compensation pattern 23 is arranged parallel to the side of the main pattern 21 close to the compensation pattern 23, and a partial shading area 10 is arranged between the compensation pattern 23 and the side of the main pattern 21 close to the compensation pattern 23. For example, the compensation pattern 23 is a rectangle, and the long side of the compensation pattern 23 is arranged parallel to the side of the main pattern 21 close to the compensation pattern 23. There is a spacing area between the compensation pattern 23 and the main pattern 21, and the spacing area is filled with a partial shading area 10. There is no overlapping area between the outward-expanding pattern 22 and the compensation pattern 23, that is, there is a spacing area between the outward-expanding pattern 22 and the compensation pattern 23, and the spacing area is filled with a partial shading area 10. Optionally, the outward-expanding pattern 22 that expands outward in a direction away from the main pattern 21 is arranged at the four corner positions of the main pattern 21, and the compensation pattern 23 is arranged on the four sides of the main pattern 21 away from the side of the main pattern 21. That is, the four outward-expanding patterns 22 respectively expand from the four corners of the main pattern 21 in the direction away from the main pattern 21 , and the four compensation patterns 23 are respectively arranged on the four sides of the main pattern 21 away from the main pattern 21 .

[0079] Optionally, the side length of the main graphic is a. The side length of the extended graphic is x. The distance between the compensation graphic and the side of the main graphic close to the compensation graphic is b. The side length of the compensation graphic parallel to the side of the main graphic close to the compensation graphic is w. The side length of the compensation graphic perpendicular to the side of the main graphic close to the compensation graphic is h. The grid width h is a direct influencing factor of the projection luminous flux, which significantly affects the PS edge morphology formed after photocuring. Because the grid width limit depends on the process resolution of the mask supplier, and when the width is close to the 1μm resolution limit, the line width uniformity will also deteriorate, which is not conducive to improving the uniformity of large-size products. In this embodiment, the design is based on a width of h and w ≥ 2μm. Considering the PSSize design range under the actual resolution of the G10.5 generation TV product, the final size range is defined as 32μm≤a≤44μm, 2μm≤h≤4μm, 2μm≤b≤4μm, 6μm≤x≤8μm, Univariate analysis was performed within the defined size range.

[0080] like Figure 6 and Fig. 9 As shown, under the central exposure condition, the selected values ​​of a are 32μm, 36μm, 40μm and 44μm, and the other values ​​are not changed for simulation. When the value of a changes, the fillet radius R of conventional PS decreases as a increases. That is, when the aperture of exposure is narrower, the intensity of high-frequency components at the corners is weaker, which is manifested as a stronger diffraction effect, a more serious corner passivation effect, and a larger fillet radius R; when the aperture of exposure is wider, the intensity of high-frequency components at the corners is stronger, which is manifested as a weaker diffraction effect, a milder corner passivation effect, and a smaller fillet radius R. Under conventional design, the larger the opening, the closer it is to a rounded rectangle, and the smaller the opening, the closer it is to a circle. Compare the cross-sectional profiles under four openings of 32μm, 36μm, 40μm and 44μm. When the opening increases, the light wave interference at the opening boundary causes the light intensity at the opening center to weaken, and a concave "crater" shape appears on the top surface of the PS. The larger the opening is within the range of 32 to 44 μm, the deeper the crater is depressed, with the deepest depth reaching 0.04 μm. When the PS is supported in the box, the "crater" depression at the top can easily cause a sharp reduction in the PS support area, affecting the actual compressive performance of the product.

[0081] like Figure 6 and Fig.10As shown, under the central exposure condition, the selected values ​​of h are 2μm, 3μm and 4μm, respectively, and the other values ​​are not changed for simulation. When the value of h changes, the fillet radius R for the corrected PS is positively correlated with the size of h. That is, when h is larger, the more severe the edge blunting effect, and the larger the fillet radius R; when h is smaller, the slighter the edge blunting effect, and the smaller the fillet radius R. However, from the Image 2D / 3D observation, in fact, when the value of h is small, the PS morphology has already appeared four-corner distortion, resulting in a smaller measured fillet radius R, while the actual PS effective contact area has not increased. From the perspective of PS Bottom Taper, a large base appears at the bottom after PS optical correction, and the Bottom Size is improved compared to conventional designs, and the PS elastic recovery rate will be improved to a certain extent.

[0082] like Figure 6 and Fig.11 As shown, under the central exposure condition, the selected b values ​​are 2μm, 3μm and 4μm, respectively, and the other values ​​are not changed for simulation. When the b value changes, the fillet radius R for the correction PS is negatively correlated with the size of b. That is, when b is smaller, the more severe the corner blunting effect is, and the larger the fillet radius R is; when b is larger, the corner blunting effect is milder, and the fillet radius R is smaller. Compared with the Image 2D / 3D observation, there is a slight optimization when b is reduced, but the distortion effect of the four corners exists. When b increases, the PS Taper tends to be smooth, the PS Bottom Size is close to the conventional design, and the PS elastic recovery rate decreases to a certain extent.

[0083] like Figure 6 and Fig.12 As shown, under the central exposure condition, the selected x values ​​are 6μm, 7μm and 8μm, and the other values ​​are not changed for simulation. When the value of x changes, the fillet radius R for the correction PS is positively correlated with the size of x. That is, when x is larger, the more severe the corner blunting effect is, and the larger the fillet radius R is; when x is smaller, the corner blunting effect is milder, and the fillet radius R is smaller. However, when the value of x changes, the overall PS distortion is serious in Image 2D / 3D observation, and the fillet radius R does not actually improve the effective contact area of ​​PS.

[0084] According to the single factor variable test pattern exposure effect, the smaller the PS corner radius R after optical correction, the PS2D / 3D has no corner distortion, and the rectangle (rounded rectangle) is taken as the design goal. h=(4a) / 44,b=(3a) / 44,x=(7a) / 44, As the corner optical correction in this solution, the floating style ratio is optimized. When the value of a changes due to the actual product PS Size requirements, the values ​​of h, b, x, and w change accordingly.

[0085] like Figure 6 and Fig.13 As shown, the fillet radius at the corner of the spacer is R, the lateral size of the spacer is TX, and the longitudinal size of the spacer is TY. With Mask CD a as the independent variable, Corner Radius R, PS TX, and PS TY as the dependent variables, the optical correction effects under different exposure gaps are summarized and compared. Under the Center Recipe exposure condition, R / TX / TY is related to a. Its change trend conforms to the third-order formula of a:

[0086] R=0.0013a 3 -0.152a 2 +5.521a-56.236

[0087] TX=-0.0014a 3 +0.157a 2 -4.703a+69.741

[0088] TY=-0.0004a 3 +0.045a 2 -0.518a+17.759

[0089] Depending on the selected exposure process conditions, the optimized CornerRadius R, PS TX and PS TY can be calculated using the above empirical formula to correct the theoretical PS support area and the pressure resistance inside the box.

[0090] like Fig.14As shown, in an optional embodiment, when the Corner Radius R is reduced, the four corners of the PS can provide support, and the effective support area of ​​the unit area of ​​the PS increases. In this way, while maintaining the same compressive strength design, that is, while providing the same support per unit area of ​​the PS, the designed Mask CD a can be reduced. Furthermore, the width of the BM can be reduced, thereby improving the pixel aperture ratio and transmittance of the display panel. Based on the actual performance of the G10.5 TV product, after the corner correction of this solution is used, under the premise that the PS contact density is consistent after being compressed in the PS box, this solution can reduce PS TX / PS TY by about 3.2μm compared with the conventional design. When the height of the spacer is compressed to 55% of the original height, the Top Area is 1400μ㎡ at this time, and the improved Corner Radius R is greater than or equal to 1 / 6TX and less than or equal to 1 / 4TX or R is greater than or equal to 1 / 6TY and less than or equal to 1 / 4TY. For example, the improved Corner Radius R can be 1 / 6TX, 5 / 24TX, 3 / 16TX, 11 / 48TX or 1 / 4TX, etc. The improved Corner Radius R can also be 1 / 6TY, 5 / 24TY, 3 / 16TY, 11 / 48TY or 1 / 4TY, etc. In this embodiment, the improved Corner Radius R is reduced from 12.6μm to 8.1μm, which is about 1 / 5TX. The crater depth is reduced from 0.09μm to 0, and the PSBottom CD is increased by 7μm. Due to the improvement of the overall PS shape, the measured PS elastic recovery rate is increased from 88.9% to 93.3% (an increase of 5%), which further improves the pressure resistance inside the box.

[0091] In an optional embodiment, when PS TX / TY is reduced, in order to avoid the risk of red and blue spots, the outward-expanded BM can be narrowed accordingly. In small-sized and high-resolution products, the increase in product aperture ratio brought about by the inward shrinkage of BM will significantly affect the product transmittance.

[0092] The present application also provides a spacer, which is formed using the above-mentioned mask.

[0093] The fillet radius at the corner of the spacer is R, the lateral dimension of the spacer is TX, and the longitudinal dimension of the spacer is TY. When the height of the spacer is compressed to 55% of the original height, R is greater than or equal to 1 / 6TX and less than or equal to 1 / 4TX or R is greater than or equal to 1 / 6TY and less than or equal to 1 / 4TY. For example, R can be 1 / 6TX, 5 / 24TX, 3 / 16TX, 11 / 48TX or 1 / 4TX, etc. R can also be 1 / 6TY, 5 / 24TY, 3 / 16TY, 11 / 48TY or 1 / 4TY, etc.

[0094] The spacer is prepared using a mask. The side length of the mask opening pattern is a. In normal state:

[0095] R=0.0013a 3 -0.152a 2 +5.521a-56.236

[0096] TX=-0.0014a 3 +0.157a 2 -4.703a+69.741

[0097] TY=-0.0004a 3 +0.045a 2 -0.518a+17.759

[0098] The height of the middle area at the top of the spacer is greater than or equal to the height of the corner area. The angle between the side wall of the spacer and the horizontal plane is less than 30°, for example, the angle between the side wall of the spacer and the horizontal plane can be 15°, 18°, 20°, 25° or 29°, etc. The elastic recovery rate of the spacer is greater than or equal to 90% and less than or equal to 95%, for example, the elastic recovery rate of the spacer can be 90%, 91%, 92%, 93.3% or 95%, etc.

[0099] The present application also provides a display substrate, which includes the above-mentioned spacer.

[0100] This application uses a numerical simulation method to preliminarily simulate the light intensity distribution at the corners, and outputs the optimal pattern size ratio. It performs exposure tests based on the G10.5 generation line, calibrates the simulation results with measured values, and clarifies the influence of each corner design parameter on the PS morphology by fixing a single variable, and clarifies the optimal design scheme for corner compensation. The exposure loss of the corners is compensated by using a method that matches the external expansion pattern with the compensation pattern. The optimal PS corner optimization Mask standard style suitable for a proximity exposure machine (200-300μm) is obtained. And the PS morphology is transformed from a circle to a rectangle, the fillet radius is optimized by more than 30%, the support area in the PS box is increased by 10%, and the transmittance of the 8K product is increased by 2.8%. At the same time, this application provides a layout structure for other exposure methods to make spacers and an exposure theoretical model and data related to the layout structure.

[0101] Those skilled in the art will readily appreciate other embodiments of the specification after considering the specification and practicing the invention claimed herein. The specification is intended to cover any variations, uses or adaptations of the specification that follow the general principles of the specification and include common knowledge or customary techniques in the art that are not claimed in the specification. The specification and examples are to be considered exemplary only, and the true scope and spirit of the specification are indicated by the following claims.

[0102] It should be understood that the present description is not limited to the precise structures that have been described above and shown in the drawings, and that various modifications and changes may be made without departing from the scope thereof. The scope of the present description is limited only by the appended claims.

[0103] The above description is only a preferred embodiment of this specification and is not intended to limit this specification. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of this specification should be included in the scope of protection of this specification.

Claims

1. A mask plate for making spacers on a display substrate, characterized in that: include: Shade area; A light-transmitting area, the light-transmitting area comprising: A main figure, wherein the main figure is in a polygonal shape; An outward-expanding graphic, the outward-expanding graphic is arranged at a corner position of the main graphic, and the outward-expanding graphic expands outward from the corner position in a direction away from the main graphic; A compensation pattern, wherein the compensation pattern is arranged in a region of one side of the main pattern away from a side of the main pattern, and the orthographic projection of the compensation pattern onto the side falls between two ends of the side; The outward-expanding pattern is arranged at at least one corner position of the main pattern, and the compensation pattern is arranged at both sides corresponding to the corner position.

2. The mask according to claim 1, characterized in that: The outward-expanding graphics are arranged at all corner positions of the main graphics; and the compensating graphics are arranged at all side positions of the main graphics.

3. The mask according to claim 2, characterized in that: The number of the outward-expanding patterns is equal to the number of the compensating patterns.

4. The mask according to claim 1, characterized in that: The main figure is a square, the outer-expanding figure is a square, and the compensation figure is a rectangle.

5. The mask according to claim 4, characterized in that: The four corners of the main figure are provided with the outward-expanding figures; and the compensation figures are provided at all side positions of the main figure.

6. The mask according to claim 4, characterized in that: The centroid of the outward-expanding figure overlaps with a vertex of the main figure, and two vertices of the outward-expanding figure are respectively located on two adjacent sides of the main figure.

7. The mask according to claim 4, characterized in that: One side of the compensation pattern is arranged parallel to one side of the main pattern close to the compensation pattern, and a part of the shading area is arranged between the compensation pattern and one side of the main pattern close to the compensation pattern.

8. The mask according to claim 7, characterized in that: A portion of the light shielding area is disposed between the compensation pattern and the outward expansion pattern.

9. The mask according to any one of claims 4 to 8, characterized in that: The side length of the main figure is a, the side length of the extended figure is x, the distance between the compensation figure and the side of the main figure close to the compensation figure is b, the side length of the compensation figure parallel to the side of the main figure close to the compensation figure is w, and the side length of the compensation figure perpendicular to the side of the main figure close to the compensation figure is h; 32μm≤a≤44μm, 2μm≤h≤4μm, 2μm≤b≤4μm, 6μm≤x≤8μm, 10. The mask according to any one of claims 4 to 8, characterized in that: The side length of the main figure is a, the side length of the extended figure is x, the distance between the compensation figure and the side of the main figure close to the compensation figure is b, the side length of the compensation figure parallel to the side of the main figure close to the compensation figure is w, and the side length of the compensation figure perpendicular to the side of the main figure close to the compensation figure is h; h=(4a) / 44, b=(3a) / 44, x=(7a) / 44, 11. The mask according to claim 1, characterized in that: The mask plate includes several light-transmitting areas; the several light-transmitting areas include fully light-transmitting areas and / or semi-light-transmitting areas; the fully light-transmitting areas are used to prepare main spacers on the display substrate, and the semi-light-transmitting areas are used to prepare auxiliary spacers on the display substrate.

12. A spacer, characterized in that: The fillet radius at the corners of the spacer is R, the lateral dimension of the spacer is TX, and the longitudinal dimension of the spacer is TY; when the height of the spacer is compressed to 55% of the original height, R is greater than or equal to 1 / 6TX and less than or equal to 1 / 4TX or R is greater than or equal to 1 / 6TY and less than or equal to 1 / 4TY.

13. The spacer according to claim 12, characterized in that: The spacer is prepared using a mask plate, the side length of the mask plate opening pattern is a, and in normal state: R=0.0013a 3 -0.152a 2 +5.521a-56.236 TX=-0.0014a 3 +0.157a 2 -4.703a+69.741 TY=-0.0004a 3 +0.045a 2 -0.518a+17.759。 14. The spacer according to claim 12, characterized in that: The height of the middle area of ​​the top of the spacer is greater than or equal to the height of the corner area of ​​the top of the spacer.

15. The spacer according to claim 12, characterized in that: The angle between the side wall of the spacer and the horizontal plane is less than 30°.

16. The spacer according to claim 12, characterized in that: The elastic recovery rate of the spacer is greater than or equal to 90% and less than or equal to 95%.

17. A display substrate, characterized in that: The display substrate comprises the spacer according to any one of claims 12-16.

Images