Overlay error monitoring method, device, equipment and medium

Abstract

The invention relates to the field of overlay processes, in particular to an overlay error monitoring method, device and equipment and a medium. Determining a data category corresponding to the measurement program operation parameter; determining a corresponding statistical target range in a pre-stored standard operation database according to the data category; judging whether the measurement program operation parameters exceed the statistical target range or not; and when the measurement program operation parameters exceed the statistical target range, determining that the program is abnormal. The statistical target range corresponding to each data category is summarized according to the overlay qualified historical record to serve as a basis for judging whether the measurement program works normally or not, when the measurement program operation parameters which do not conform to the corresponding statistical target range appear in the overlay process, it is judged that the program is abnormal in time, corresponding processing is carried out subsequently, and the accuracy of the overlay process is improved. Therefore, the overlay error is further reduced, the output of waste sheets is reduced, the production cost is saved, and the yield of finished products and the production efficiency are improved.

Description

Technical Field

[0001] The present invention relates to the field of overlay technology, and in particular to an overlay error monitoring method, device, equipment and medium. Background Art

[0002] In today's semiconductor production process, overlay is an indispensable step in the production of various semiconductor wafers. Once a large overlay error occurs, the upper and lower layers of the wafer will not be aligned, causing damage to the function of the entire device, that is, a bad chip, which greatly increases the production cost of semiconductor devices.

[0003] Currently, each wafer fab in the industry monitors the measurement value and its related statistical value for overlay error. When the overlay error measurement value is abnormal, the relevant problem is handled in accordance with the exception handling instructions. However, relevant practitioners have found that no matter how the adjustment and correction are made, the overlay error seems to have a minimum value and cannot be further reduced. This poses new challenges to the pre-production of wafer overlay.

[0004] Therefore, how to further reduce the overlay error, improve the yield rate and reduce the production cost has become an urgent problem to be solved by technical personnel in this field. Summary of the invention

[0005] The purpose of the present invention is to provide an overlay error monitoring method, device, equipment and medium to solve the problems of large overlay error, low yield and high cost in the prior art.

[0006] In order to solve the above technical problems, the present invention provides an overlay error monitoring method, comprising:

[0007] Obtaining measurement program running parameters; the measurement program running parameters are parameters generated during the running of the overlay program;

[0008] Determining the data category corresponding to the measurement program operation parameter;

[0009] Determining a corresponding statistical target range in a pre-stored standard operation database according to the data category;

[0010] Determining whether the measurement program operation parameters exceed the statistical target range;

[0011] When the measured program running parameters exceed the statistical target range, it is determined that the program is abnormal.

[0012] As a preferred implementation, before determining the corresponding statistical target range in the pre-stored standard operation database according to the data category, it also includes:

[0013] Obtain process level information;

[0014] Accordingly, the determining of the corresponding statistical target range in the pre-stored standard operation database according to the data category includes:

[0015] Determine a corresponding target specification operation database according to the process level information;

[0016] A corresponding statistical target range is determined in the target specification operation database according to the data category.

[0017] As a preferred implementation, the process level information includes at least one of ambient temperature, current layer material information, previous layer material information, current layer graphic information and previous layer graphic information.

[0018] As a preferred implementation, before obtaining the measurement program running parameters, it also includes:

[0019] Get the process level information and the corresponding end category of the current level;

[0020] Accordingly, the steps from obtaining the measurement program running parameters to determining the data category include:

[0021] Sequentially acquiring a plurality of measurement program operation parameters, and determining a corresponding data category after acquiring each of the measurement program operation parameters, and after each determination of the data category, determining whether the data category is the current layer end category;

[0022] When the data category is the when-layer-end category, it is determined that the when-layer-overlay is ended.

[0023] As a preferred implementation, when the measured program operation parameter exceeds the statistical target range, determining that the program is abnormal includes:

[0024] When the measurement program operating parameters of multiple data categories exceed the corresponding statistical target range, the program is determined to be abnormal.

[0025] As a preferred implementation, when the measured program operation parameter exceeds the statistical target range, determining that the program is abnormal includes:

[0026] When the measurement program operation parameter exceeds the statistical target range, determining the corresponding range exceeding value and exceeding direction according to the measurement program operation parameter and the corresponding statistical target range;

[0027] The abnormality type and / or the corresponding processing scheme are determined according to the range exceeding value and the exceeding direction.

[0028] As a preferred implementation, after determining that the program is abnormal, the method further includes:

[0029] Send abnormal alerts to target terminals.

[0030] An overlay error monitoring device, comprising:

[0031] An acquisition module is used to acquire measurement program operation parameters; the measurement program operation parameters are parameters generated during the operation of the overlay program;

[0032] A category module, used to determine the data category corresponding to the measurement program operation parameter;

[0033] A target range module, for determining a corresponding statistical target range in a pre-stored standard operation database according to the data category;

[0034] A judgment module, used for judging whether the measurement program operation parameter exceeds the statistical target range;

[0035] The abnormality determination module is used to determine that the program is abnormal when the measured program running parameters exceed the statistical target range.

[0036] An overlay error monitoring device, comprising:

[0037] Memory for storing computer programs;

[0038] A processor is used to implement the steps of any of the above-mentioned overlay error monitoring methods when executing the computer program.

[0039] A computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of any of the above-mentioned overlay error monitoring methods are implemented.

[0040] The overlay error monitoring method provided by the present invention obtains the measurement program operation parameters; the measurement program operation parameters are the parameters generated during the operation of the overlay program; determines the data category corresponding to the measurement program operation parameters; determines the corresponding statistical target range in the pre-stored standard operation database according to the data category; determines whether the measurement program operation parameters exceed the statistical target range; when the measurement program operation parameters exceed the statistical target range, determines that the program is abnormal. The present invention finds that in the overlay process, not only the machine or the wafer itself will introduce errors, but also the measurement program in the overlay process will also introduce abnormalities that cause the final overlay error. Therefore, the present invention summarizes the statistical target ranges corresponding to each data category based on the overlay qualified historical records as a basis for whether the measurement program works normally. When the measurement program operation parameters that do not meet the corresponding statistical target range appear in the overlay process, it is timely judged that the program is abnormal, and corresponding processing is performed subsequently, thereby further reducing the overlay error, reducing the output of waste films, achieving production cost savings, and greatly improving the finished product yield. The present invention also provides an overlay error monitoring device, equipment and medium with the above-mentioned beneficial effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0042] Figure 1 A flowchart of a specific implementation of the overlay error monitoring method provided by the present invention;

[0043] Figure 2 A schematic flow chart of another specific implementation of the overlay error monitoring method provided by the present invention;

[0044] Figure 3 A schematic structural diagram of a specific implementation of the overlay error monitoring device provided by the present invention.

[0045] In the figure, it includes 100-acquisition module, 200-category module, 300-target range module, 400-judgment module, and 500-abnormal determination module. DETAILED DESCRIPTION

[0046] In order to enable those skilled in the art to better understand the scheme of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0047] The core of the present invention is to provide an overlay error monitoring method, a flow chart of a specific implementation method thereof is shown as follows: Figure 1 As shown, it is called specific implementation mode 1, including:

[0048] S101: Acquire measurement program running parameters; the measurement program running parameters are parameters generated during the running of the overlay program.

[0049] The measurement program running parameters refer to parameters generated during the overlay program running process, such as quality parameter (QM) or tool introduced error (TIS).

[0050] S102: Determine the data category corresponding to the measurement program running parameter.

[0051] In this step, the operation performed is to determine the data category corresponding to the running parameters of the measurement program. In other words, it is to determine what parameters are obtained. During actual operation, the program usually first determines what parameters to obtain (that is, the data category), and then obtains the corresponding parameters. Therefore, the order of this step can also be before step S101. There is no strict order between the two steps, as long as the actual value of the running parameters of the measurement program and the corresponding parameter category are finally obtained.

[0052] S103: Determine a corresponding statistical target range in a pre-stored standard operation database according to the data category.

[0053] The statistical target range in the standard operation database is the parameter range corresponding to each data category of the measurement program when the obtained overlay product is normal, determined based on the parameter history records left by the measurement program that is normally executed in the historical records. The standard operation database is a collection of the statistical target ranges.

[0054] S104: Determine whether the measurement program operation parameters exceed the statistical target range.

[0055] The “exceeding” in this step does not mean that the measurement program operating parameter is numerically larger than the statistical target range, but means that the measurement program operating parameter is not within the statistical target range.

[0056] S105: When the measured program running parameters exceed the statistical target range, determine that the program is abnormal.

[0057] In this step, it is determined that the measurement program itself is abnormal. In this case, the overlay can be stopped directly, or corresponding correction processing can be performed based on the collected information to compensate for the error of the measurement program itself.

[0058] Of course, after determining the program abnormality, it also includes:

[0059] Send abnormal alerts to target terminals.

[0060] The target terminal can be an alarm reminder device such as a broadcasting device or a screen display device for playing sound and light signals, or it can be a portable device or a fixed device of the target staff. The abnormal alarm can be a sound alarm, or at least one of a graphic alarm or a sound and light alarm.

[0061] As a preferred implementation, before determining the corresponding statistical target range in the pre-stored standard operation database according to the data category, it also includes:

[0062] A1: Obtain process level information.

[0063] The process level information may be obtained before or after the acquisition of the measurement program running parameters, and the present invention is not limited thereto.

[0064] The process level information includes at least one of the following: ambient temperature, current layer material information, previous layer material information, current layer graphic information, and previous layer graphic information. The process level information is various parameters of the current layer during the overlay process. Of course, some parameters of the previous layer will also affect the overlay of the current layer, so the process level information may also include some previous layer information.

[0065] Accordingly, the determining of the corresponding statistical target range in the pre-stored standard operation database according to the data category includes:

[0066] A2: Determine the corresponding target specification operation database according to the process level information.

[0067] Different process level information corresponds to different current layer overlay situations and different standard operation databases.

[0068] A3: Determine the corresponding statistical target range in the target specification operation database according to the data category.

[0069] In this preferred embodiment, different standard operation databases are set for different overlay situations (reflected in the process level information). In actual operation, different standard operation databases are matched according to different process level information, which can greatly improve the accuracy of judging whether the measurement program is abnormal.

[0070] Furthermore, before obtaining the measurement program running parameters, it also includes:

[0071] B1: Get the process level information and the corresponding end category of the current level.

[0072] The layer end category is a data category of the last operating parameter obtained during the program running process before completing a layer of overlay.

[0073] Accordingly, the steps from obtaining the measurement program running parameters to determining the data category include:

[0074] B2: sequentially obtain a plurality of measurement program operating parameters, and determine the corresponding data category after obtaining each of the measurement program operating parameters, and after determining the data category each time, determine whether the data category is the current layer end category.

[0075] B3: When the data category is the current layer end category, it is determined that the current layer overlay is ended.

[0076] Of course, whether the measurement program operation parameter exceeds the statistical target range still needs to be judged normally. After obtaining each data category corresponding to the measurement program operation parameter, it can be immediately judged whether the measurement program operation parameter exceeds the statistical target range. After determining all data categories of a whole layer, it can also be uniformly performed to judge each measurement program operation parameter and the corresponding statistical target range. This preferred implementation method can simplify the processing steps, greatly improve the program operation efficiency, and reduce the computing power usage.

[0077] Of course, in step B3, when it is determined that the overlay of the current layer is completed, if it is determined that there is no abnormality in the measurement program, it is necessary to start overlaying the next layer, and at this time it is necessary to obtain the process level information corresponding to the new layer.

[0078] Furthermore, when the measured program operation parameter exceeds the statistical target range, determining that the program is abnormal includes:

[0079] When the measurement program operating parameters of multiple data categories exceed the corresponding statistical target range, the program is determined to be abnormal.

[0080] In this preferred embodiment, when a single data category is abnormal, the program is not directly judged to be abnormal. Instead, the program is judged to be abnormal after the operating parameters of multiple data categories are abnormal. After the measurement program is abnormal, usually more than one operating parameter is abnormal. This preferred embodiment avoids the misjudgment caused by fluctuations in the operating parameters of a single data category, greatly improving the accuracy of judging program abnormalities.

[0081] The overlay error monitoring method provided by the present invention obtains the measurement program operation parameters; the measurement program operation parameters are the parameters generated during the operation of the overlay program; determines the data category corresponding to the measurement program operation parameters; determines the corresponding statistical target range in the pre-stored standard operation database according to the data category; determines whether the measurement program operation parameters exceed the statistical target range; when the measurement program operation parameters exceed the statistical target range, determines that the program is abnormal. The present invention finds that in the overlay process, not only the machine or the wafer itself will introduce errors, but the measurement program in the overlay process will also introduce abnormalities that cause the final overlay error. Therefore, the present invention summarizes the statistical target ranges corresponding to each data category based on the overlay qualified historical records as a basis for whether the measurement program is working normally. When the measurement program operation parameters that do not meet the corresponding statistical target range appear in the overlay process, it is timely judged that the program is abnormal, and corresponding processing is performed subsequently, thereby further reducing the overlay error, reducing the output of waste films, achieving production cost savings, and greatly improving the finished product yield.

[0082] On the basis of the first specific implementation mode, the processing after the program exception is further limited to obtain the second specific implementation mode, and its flow chart is as follows: Figure 2 As shown, including:

[0083] S201: Acquire measurement program running parameters; the measurement program running parameters are parameters generated during the running of the overlay program.

[0084] S202: Determine the data category corresponding to the measurement program running parameter.

[0085] S203: Determine a corresponding statistical target range in a pre-stored standard operation database according to the data category.

[0086] S204: Determine whether the measurement program running parameters exceed the statistical target range.

[0087] S205: When the measurement program running parameter exceeds the statistical target range, a corresponding range exceeding value and exceeding direction are determined according to the measurement program running parameter and the corresponding statistical target range.

[0088] S206: Determine the abnormality type and / or the corresponding processing solution according to the range exceeding value and the exceeding direction.

[0089] The difference between this preferred implementation and the above-mentioned specific implementation is that this preferred implementation not only determines the program exception, but also presets the corresponding processing method. The remaining steps are the same as the above-mentioned specific implementations and will not be elaborated here.

[0090] In this preferred embodiment, when the measurement program operation parameters exceed the statistical target range, the corresponding processing scheme is further determined according to the size and direction of the excess (i.e., whether it is larger or smaller than the normal working range), so as to avoid excessive overlay errors. For example, the corresponding steps, processes, and machines in the inspection / optimization program are checked.

[0091] This preferred implementation mode presets several processing schemes, which are selected by the program according to the range excess value and the excess direction. While improving the overlay success rate and the finished product yield, it also greatly improves the automation level of the equipment and reduces the cost.

[0092] Furthermore, the difference between the measurement program operation parameter and the median of the statistical target range can also be used to replace the range exceeding value and exceeding direction in the preferred embodiment. The difference can reflect the degree of deviation between the measurement program operation parameter and the statistical target range, and the positive and negative nature of the difference itself can represent the exceeding direction, which further reduces the computing power usage and improves the computing efficiency.

[0093] The following is an introduction to an overlay error monitoring device provided by an embodiment of the present invention. The overlay error monitoring device described below and the overlay error monitoring method described above can be referenced to each other.

[0094] Figure 3 The structural block diagram of the overlay error monitoring device provided by the embodiment of the present invention is referred to as the specific implementation mode three, and the Figure 3 The overlay error monitoring device may include:

[0095] The acquisition module 100 is used to acquire the measurement program running parameters; the measurement program running parameters are the parameters generated during the operation of the overlay program;

[0096] A category module 200, for determining a data category corresponding to the measurement program operation parameter;

[0097] A target range module 300 is used to determine a corresponding statistical target range in a pre-stored standard operation database according to the data category;

[0098] A determination module 400 is used to determine whether the measurement program operation parameter exceeds the statistical target range;

[0099] The abnormality determination module 500 is used to determine that the program is abnormal when the measured program running parameters exceed the statistical target range.

[0100] As a preferred implementation, the target range module 300 further includes:

[0101] A layer acquisition unit, used to acquire process layer information;

[0102] Accordingly, the target range module 300 includes:

[0103] A layer database unit, for determining a corresponding target specification operation database according to the process layer information;

[0104] A layer target range unit is used to determine a corresponding statistical target range in the target specification operation database according to the data category.

[0105] As a preferred implementation, the acquisition module 100 further includes:

[0106] The layer end acquisition unit is used to obtain the process level information and the corresponding current layer end category;

[0107] Accordingly, the acquisition module 100 and the classification module 200 include:

[0108] The intra-layer classification unit is used to sequentially obtain a plurality of measurement program operation parameters, and determine the corresponding data category after obtaining each of the measurement program operation parameters, and after each determination of the data category, determine whether the data category is the end category of the current layer;

[0109] The layer end unit is used to determine that the layer overlay is ended when the data category is the layer end category.

[0110] As a preferred implementation, the abnormality determination module 500 includes:

[0111] The multiple exception unit is used to determine program abnormality when the measurement program operation parameters of multiple data categories exceed the corresponding statistical target range.

[0112] As a preferred implementation, the abnormality determination module 500 includes:

[0113] an abnormality determination unit, for determining a corresponding range exceeding value and exceeding direction according to the measurement program operation parameter and the corresponding statistical target range when the measurement program operation parameter exceeds the statistical target range;

[0114] The exception handling unit is used to determine the exception type and / or the corresponding handling solution according to the range exceeding value and the exceeding direction.

[0115] As a preferred implementation, after the abnormality determination module 500, it further includes:

[0116] The alarm unit is used to send abnormal alarms to the target terminal.

[0117] The overlay error monitoring device provided by the present invention is used to obtain the measurement program running parameters through the acquisition module 100; the measurement program running parameters are parameters generated during the overlay program running process; the category module 200 is used to determine the data category corresponding to the measurement program running parameters; the target range module 300 is used to determine the corresponding statistical target range in the pre-stored standard operation database according to the data category; the judgment module 400 is used to judge whether the measurement program running parameters exceed the statistical target range; the abnormality determination module 500 is used to determine the program abnormality when the measurement program running parameters exceed the statistical target range. The present invention finds that in the overlay process, not only the machine or the wafer itself will introduce errors, but the measurement program in the overlay process will also introduce anomalies that cause the final overlay error. Therefore, the present invention summarizes the statistical target range corresponding to each data category based on the overlay qualified historical records as a basis for whether the measurement program is working normally. When the measurement program operating parameters that do not meet the corresponding statistical target range appear in the overlay process, it is timely judged that the program has an abnormality, and corresponding processing is performed subsequently, thereby further reducing the overlay error, reducing the output of waste wafers, achieving production cost savings, and greatly improving the yield of finished products.

[0118] The overlay error monitoring device of this embodiment is used to implement the aforementioned overlay error monitoring method. Therefore, the specific implementation method of the overlay error monitoring device can be seen in the embodiment part of the overlay error monitoring method in the previous text. For example, the acquisition module 100, the category module 200, the target range module 300, the judgment module 400, and the abnormality determination module 500 are respectively used to implement steps S101, S102, S103, S104 and S105 in the above-mentioned overlay error monitoring method. Therefore, its specific implementation method can refer to the description of the corresponding various partial embodiments and will not be repeated here.

[0119] The present invention also provides an overlay error monitoring device, comprising:

[0120] Memory for storing computer programs;

[0121] The processor is used to implement the steps of the overlay error monitoring method as described in any one of the above when executing the computer program. The overlay error monitoring method provided by the present invention obtains the measurement program operation parameters; the measurement program operation parameters are the parameters generated during the operation of the overlay program; determines the data category corresponding to the measurement program operation parameters; determines the corresponding statistical target range in the pre-stored standard operation database according to the data category; determines whether the measurement program operation parameters exceed the statistical target range; when the measurement program operation parameters exceed the statistical target range, determines that the program is abnormal. The present invention finds that in the overlay process, not only the machine or the wafer itself will introduce errors, but also the measurement program in the overlay process will also introduce abnormalities that cause the final overlay error. Therefore, the present invention summarizes the statistical target ranges corresponding to each data category based on the overlay qualified historical records as a basis for whether the measurement program works normally. When the measurement program operation parameters that do not meet the corresponding statistical target range appear in the overlay process, it is timely judged that the program is abnormal, and the corresponding processing is performed subsequently, thereby further reducing the overlay error, reducing the output of waste films, saving production costs, and greatly improving the yield of finished products.

[0122] The present invention also provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of the overlay error monitoring method as described above are implemented. The overlay error monitoring method provided by the present invention obtains measurement program operation parameters; the measurement program operation parameters are parameters generated during the operation of the overlay program; determines the data category corresponding to the measurement program operation parameters; determines the corresponding statistical target range in a pre-stored standard operation database according to the data category; determines whether the measurement program operation parameters exceed the statistical target range; and determines that the program is abnormal when the measurement program operation parameters exceed the statistical target range. The present invention finds that in the overlay process, not only the machine or the wafer itself will introduce errors, but the measurement program in the overlay process will also introduce anomalies that cause the final overlay error. Therefore, the present invention summarizes the statistical target range corresponding to each data category based on the overlay qualified historical records as a basis for whether the measurement program is working normally. When the measurement program operating parameters that do not meet the corresponding statistical target range appear in the overlay process, it is timely judged that the program has an abnormality, and corresponding processing is performed subsequently, thereby further reducing the overlay error, reducing the output of waste wafers, achieving production cost savings, and greatly improving the yield of finished products.

[0123] In this specification, each embodiment is described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the embodiments can be referred to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part.

[0124] It should be noted that, in this specification, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprise", "include" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the statement "comprises a ..." does not exclude the presence of other identical elements in the process, method, article or device including the element.

[0125] Professionals may further appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of the two. In order to clearly illustrate the interchangeability of hardware and software, the composition and steps of each example have been generally described in the above description according to function. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professionals and technicians may use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of the present invention.

[0126] The steps of the method or algorithm described in conjunction with the embodiments disclosed herein may be implemented directly using hardware, a software module executed by a processor, or a combination of the two. The software module may be placed in a random access memory (RAM), a memory, a read-only memory (ROM), an electrically programmable ROM, an electrically erasable programmable ROM, a register, a hard disk, a removable disk, a CD-ROM, or any other form of storage medium known in the art.

[0127] The above is a detailed introduction to the overlay error monitoring method, device, equipment and medium provided by the present invention. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, several improvements and modifications can be made to the present invention, and these improvements and modifications also fall within the scope of protection of the claims of the present invention.

Claims

1. A method for monitoring overlay error, characterized in that: include: Obtaining measurement program running parameters; the measurement program running parameters are parameters generated during the running of the overlay program; Determining the data category corresponding to the measurement program operation parameter; Determining a corresponding statistical target range in a pre-stored standard operation database according to the data category; Determining whether the measurement program operation parameters exceed the statistical target range; When the measured program running parameters exceed the statistical target range, it is determined that the program is abnormal.

2. The overlay error monitoring method according to claim 1, characterized in that: Before determining the corresponding statistical target range in the pre-stored standard operation database according to the data category, the method further includes: Obtain process level information; Accordingly, the determining of the corresponding statistical target range in the pre-stored standard operation database according to the data category includes: Determine a corresponding target specification operation database according to the process level information; A corresponding statistical target range is determined in the target specification operation database according to the data category.

3. The overlay error monitoring method according to claim 2, characterized in that: The process level information includes at least one of ambient temperature, current layer material information, previous layer material information, current layer graphic information and previous layer graphic information.

4. The overlay error monitoring method according to claim 2, characterized in that: Before obtaining the measurement program running parameters, it also includes: Get the process level information and the corresponding end category of the current level; Accordingly, the steps from obtaining the measurement program running parameters to determining the data category include: Sequentially acquiring a plurality of measurement program operation parameters, and determining a corresponding data category after acquiring each of the measurement program operation parameters, and after each determination of the data category, determining whether the data category is the current layer end category; When the data category is the when-layer-end category, it is determined that the when-layer-overlay is ended.

5. The overlay error monitoring method according to claim 4, characterized in that: When the measured program running parameter exceeds the statistical target range, determining that the program is abnormal includes: When the measurement program operating parameters of multiple data categories exceed the corresponding statistical target range, the program is determined to be abnormal.

6. The overlay error monitoring method according to claim 1, characterized in that: When the measured program running parameter exceeds the statistical target range, determining that the program is abnormal includes: When the measurement program operation parameter exceeds the statistical target range, determining the corresponding range exceeding value and exceeding direction according to the measurement program operation parameter and the corresponding statistical target range; The abnormality type and / or the corresponding processing scheme are determined according to the range exceeding value and the exceeding direction.

7. The overlay error monitoring method according to claim 1, characterized in that: After determining that the program is abnormal, the method further includes: Send abnormal alerts to target terminals.

8. An overlay error monitoring device, characterized in that: include: An acquisition module is used to acquire measurement program operation parameters; the measurement program operation parameters are parameters generated during the operation of the overlay program; A category module, used to determine the data category corresponding to the measurement program operation parameter; A target range module, for determining a corresponding statistical target range in a pre-stored standard operation database according to the data category; A judgment module, used for judging whether the measurement program operation parameter exceeds the statistical target range; The abnormality determination module is used to determine that the program is abnormal when the measured program running parameters exceed the statistical target range.

9. An overlay error monitoring device, characterized in that: include: Memory for storing computer programs; A processor, configured to implement the steps of the overlay error monitoring method as claimed in any one of claims 1 to 7 when executing the computer program.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the overlay error monitoring method according to any one of claims 1 to 7 are implemented.

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