Tungsten oxide film and preparation method thereof
Tungsten oxide films were prepared by the sol-gel spraying method, and functional regulation was achieved using partition spraying technology, which solved the problems of unstable film preparation complexity and performance in the prior art, and achieved efficient and stable film preparation and performance improvement.
Patent Information
- Application Number
- CN202510082236.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-20
- Publication Date
- 2025-05-06
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
The existing tungsten oxide thin film preparation methods require secondary processing, which increases complexity and cost, and the film performance is unstable, making it difficult to meet the needs of industrial production.
The tungsten oxide film was prepared by the sol-gel method. By pre-preparing sols containing and without molybdenum trioxide, the glass substrate was sprayed in partitions to achieve functional control in different areas.
The film preparation steps are simplified, material loss and time cost are reduced, performance stability and structural stability of the film are improved, and rapid and stable color changes are achieved.
Smart Images
Figure CN119926762A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of tungsten oxide thin films, and in particular to a tungsten oxide thin film and a preparation method thereof. Background Art
[0002] Tungsten oxide film is a compound film composed of tungsten and oxygen, which is commonly used in various electronic and optical applications. It has a wide range of applications in the semiconductor industry, including as a transparent conductive layer, gate insulator and sensor element; In the field of preparation and application of tungsten oxide thin films, we have always been committed to achieving better performance and more efficient preparation processes. Traditional methods of preparing local color-changing tungsten oxide thin films, such as photolithography, laser direct writing, and inkjet printing, all require secondary processing after the oxide film is prepared. This not only greatly increases the complexity of film preparation and prolongs the preparation cycle, but also in the secondary processing, the additional operations can easily cause physical or chemical damage to the formed film, which leads to the overall performance of the film being unstable and the uniformity of product quality cannot be guaranteed. In addition, the waste of materials in the secondary processing process is relatively serious, which undoubtedly increases production costs, reduces production efficiency, and is difficult to meet the needs of large-scale industrial production.
[0003] In terms of the structural stability and quality improvement of the film, the existing technology lacks effective means to regulate the adaptability of the coating. In the multi-layer coating process, the matching between the layers is poor, resulting in an unstable overall structure of the film, affecting its mechanical properties and service life. Moreover, when used in electrochromic devices, due to the poor synergy of the layers, the migration of ions between the layers is hindered, and rapid and stable color changes cannot be achieved, which greatly limits its performance in practical applications. Therefore, it is necessary to propose a tungsten oxide film and a preparation method.
[0004] Currently, no effective solution has been proposed for the problems in the related technologies. Summary of the invention
[0005] In view of the problems in the related art, the present invention provides a tungsten oxide film and a preparation method thereof to overcome the above technical problems existing in the existing related art.
[0006] To this end, the specific technical solution adopted by the present invention is as follows: A tungsten oxide film and a preparation method thereof, the method comprising the following steps: S1, select and clean the substrate, and prepare a precursor sol for preparing a tungsten oxide film, wherein the sol includes two parts, one containing doping and the other not containing doping; S2, setting spraying parameters, dividing the substrate color change area, blocking one area and spraying accordingly, and spraying another area after the spraying is completed; S3, placing the sprayed substrate in an oven for drying and curing; S4, taking out the substrate, detecting the characterization data of the first coating film, obtaining the characterization parameters of the next coating layer matching the first coating layer according to the characterization data, setting the spraying parameters according to the characterization parameters, using the spraying method and performing secondary coating; S5. Repeat steps S2-S4, perform multiple alternating coatings, and complete the film production.
[0007] Multiple spraying can evenly distribute the coating by stacking layers, thus obtaining a more uniform film.
[0008] As a preferred embodiment, the selected substrate is cleaned and a precursor sol for preparing a tungsten oxide thin film is prepared, wherein the sol comprises two parts, one containing doping and the other not containing doping, and comprises the following steps: S11, selecting glass as the substrate; S12, using ethanol to ultrasonically clean the surface of the substrate to remove oil and impurities on the surface of the substrate, and then using deionized water to clean and blow dry to ensure that the surface of the substrate is clean; S13. Prepare two precursor sols, one containing doping and the other not containing doping.
[0009] As a preferred embodiment, the preparation of two precursor sols, one containing doping and the other not containing doping, comprises the following steps: S131, dissolving tungstate in distilled water, adding nitric acid as a catalyst, adding ethanol as a co-solvent, and stirring sufficiently to make the mixture uniformly mixed to form a transparent sol, wherein the prepared transparent sol is a sol that does not contain doping; S132. Divide the transparent sol into two parts, add molybdenum trioxide powder to one of the parts, and ensure that the molybdenum trioxide is evenly dispersed in the solution by ultrasonic treatment to form a doped sol.
[0010] Ultrasonic treatment is used to ensure that molybdenum trioxide is evenly dispersed in the solution, which can prevent molybdenum trioxide from agglomerating and precipitating, and maintain good stability and fluidity of the solution.
[0011] As a preferred embodiment, the spraying parameters are set, the substrate color change area is divided, one area is blocked and sprayed accordingly, and another area is sprayed after the spraying is completed, including the following steps: S21, setting spraying parameters, the spraying parameters including spraying distance, spraying pressure, spraying speed and spraying flow rate; S22, dividing the surface of the substrate into an area where the doped sol needs to be sprayed and an area where the doped sol is not included; S23, using a baffle to shield the doped area, and spraying the non-doped area, after the spraying is completed, removing the baffle, and using the baffle to shield the sprayed area, and spraying the doped area; The prepared non-doped sol is used for spraying in the non-doped area, and the prepared doped sol is used for spraying in the doped area.
[0012] As a preferred embodiment, the specific steps of placing the sprayed substrate in an oven for drying and curing are as follows: S31, setting the parameters of the oven, including drying temperature, drying time and heating and cooling rate; S32, placing the substrate into an oven; S33. After drying is completed, the substrate is taken out and the coating surface is inspected.
[0013] The independent drying and curing of each layer can ensure that each layer of film achieves the best chemical reaction and structural stability, thereby improving the quality of the overall film.
[0014] As a preferred embodiment, the substrate is taken out, the characterization data of the first coating film is detected, the characterization parameters of the next coating layer matching the first coating layer are obtained according to the characterization data, the spraying parameters are set according to the characterization parameters, and the spraying method and secondary coating are performed, which includes the following steps: S41, detecting characterization data of the first coating layer, the characterization data including thickness and surface roughness; S42, calculating the characterization parameters of the next layer matching the current coating according to the measured characterization parameters, and obtaining the spraying parameters according to the obtained characterization parameters; S43, calculating the difference between the spraying parameters and the first layer spraying parameters, and using the difference to correct the spraying parameters; S44. Perform secondary spraying using the corrected parameters.
[0015] By testing characterization data such as the thickness and surface roughness of the first layer of coating, we can understand the spraying effect of the first layer of film and provide an accurate basis for subsequent operations.
[0016] As a preferred embodiment, the step of calculating the characterization parameters of the next layer matching the current coating layer according to the measured characterization parameters and obtaining the spraying parameters according to the obtained characterization parameters comprises the following steps: S431. Based on the obtained characterization parameters of the first coating layer, the characterization parameters of the next coating layer are calculated. The specific formula is: ; in, is the calculated thickness of the next coating layer, is the total thickness of the first coating and the next coating, is the thickness of the first coating; ; in, is the surface roughness of the next coating layer after calculation, is the surface roughness of the two layers, is the surface roughness of the first layer; According to the calculated data, the relationship between the setting parameters and the spraying parameters including spraying speed, spraying distance and spraying pressure is obtained. The specific formula is: ; ; in, is the spraying speed, is the spraying pressure, is the spraying distance, represents the proportionality constant of the model as a whole, which is used to adjust the magnitude of the model output. are index terms, which respectively represent the exponential influence of spraying speed on coating thickness, the exponential influence of spraying pressure on coating thickness, and the exponential influence of spraying distance on coating thickness. are index terms, which respectively represent the influence of spraying speed on surface roughness, the influence of spraying pressure on surface roughness, and the influence of spraying distance on surface roughness. , and constant term All of them are obtained by fitting experimental data; S432. Solve the equation group to obtain specific setting parameters.
[0017] A tungsten oxide film is prepared according to the above preparation method.
[0018] As a preferred embodiment, the raw materials for making the film include tungstate, distilled water, nitric acid, ethanol, molybdenum trioxide powder, and a substrate material, wherein the substrate material is made of glass, and the added amounts of the raw materials are 0.1-1 g of tungstate, 50-100 mL of distilled water, 1-5 mL of nitric acid, 10-30 mL of ethanol, and 0.01-0.1 g of molybdenum trioxide.
[0019] The beneficial effects of the present invention are: 1. The tungsten oxide film of the present invention is prepared by a spraying method in a sol-gel method. During the preparation process, two sols are prepared in advance, one is a sol containing molybdenum trioxide, and the other is a sol not containing molybdenum trioxide. By using these two sols to spray the glass substrate in different areas, different functional effects can be obtained on the same substrate, so as to achieve precise control of the performance of different areas of the film. The area containing the molybdenum trioxide sol spraying has an enhanced electrochromic effect due to the unique properties of molybdenum trioxide, and the area not containing the molybdenum trioxide sol spraying does not change color or becomes a light color, thereby not only achieving more efficient color switching, but also meeting diversified functional requirements; The existing preparation methods for locally discolored tungsten oxide films are usually based on photolithography technology, laser direct writing, inkjet printing and other methods. This method processes the tungsten oxide film after it is prepared. However, the preparation method of the present invention can directly prepare a tungsten oxide film with a local discoloration function, which not only simplifies the preparation steps of the film, but also effectively reduces the risk of damage to the film caused by secondary processing, ensuring the stability of the overall performance of the film. At the same time, this direct preparation method can reduce material loss and time cost in the preparation process and improve production efficiency.
[0020] 2. The present invention can obtain the characterization parameters of the next layer matching this layer of coating by detecting the characterization parameters of the first layer of spray coating, thereby improving the structural adaptability of the coating, and in the case of multi-layer coating, each layer can be tightly adapted, thereby improving the stability of the overall structure of the film. In addition, since the synergy of each layer is greatly improved, the quality of the film can also be effectively improved. When the tungsten oxide film is used in an electrochromic device, it can also ensure that ions migrate smoothly between the layers to achieve rapid and stable color changes; The present invention calculates the spraying parameters through the obtained characterization parameters, and uses the calculated spraying parameters to correct the first spraying parameters, and finally performs a second coating. It can not only quickly obtain the optimal spraying setting parameters so that the coating sprayed by the second spraying can match the first coating, but also can enhance the adhesion between the coatings according to the precise parameter settings, so that the prepared tungsten oxide film can better meet the expected standards. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0022] Figure 1 The figure is a flow chart of a method for preparing a tungsten oxide thin film according to an embodiment of the present invention. DETAILED DESCRIPTION
[0023] To further illustrate each embodiment, the present invention provides drawings, which are part of the disclosure of the present invention and are mainly used to illustrate the embodiments and can be used in conjunction with the relevant descriptions in the specification to explain the operating principles of the embodiments. With reference to these contents, ordinary technicians in the field should be able to understand other possible implementations and advantages of the present invention. The components in the figures are not drawn to scale, and similar component symbols are generally used to represent similar components.
[0024] According to an embodiment of the present invention, a tungsten oxide thin film and a preparation method thereof are provided.
[0025] The present invention is further described with reference to the accompanying drawings and specific embodiments. Figure 1 As shown, a method for preparing a tungsten oxide thin film according to an embodiment of the present invention comprises the following steps: S1, select and clean the substrate, and prepare a precursor sol for preparing a tungsten oxide film, wherein the sol includes two parts, one containing doping and the other not containing doping; Further, the substrate is selected and cleaned, and a precursor sol for preparing a tungsten oxide film is prepared, wherein the sol comprises two parts, one containing doping and the other not containing doping, and the following steps are included: S11, selecting glass as the substrate; S12, using ethanol to ultrasonically clean the surface of the substrate to remove oil and impurities on the surface of the substrate, and then using deionized water to clean and blow dry to ensure that the surface of the substrate is clean; It should be noted that oil and impurities will form an isolation layer on the surface of the substrate, hindering the close bonding between the tungsten oxide film and the substrate. When the substrate surface is clean, the tungsten oxide molecules can directly interact with the atoms or molecules on the substrate surface to form chemical bonds or strong physical adsorption. For glass substrates, a clean surface can make the oxygen atoms in the tungsten oxide film better bonded with the silicon-oxygen bonds (Si-O) on the glass surface, thereby greatly enhancing the adhesion of the film to the substrate.
[0026] S13, preparing two precursor sols, one containing doping and the other not containing doping; Further, S131, dissolving tungstate in distilled water, adding nitric acid as a catalyst, adding ethanol as a co-solvent, and stirring sufficiently to make them uniformly mixed to form a transparent sol, wherein the prepared transparent sol is a sol that does not contain doping; S132. Divide the transparent sol into two parts, add molybdenum trioxide powder to one of the parts, and ensure that the molybdenum trioxide is evenly dispersed in the solution by ultrasonic treatment to form a doped sol.
[0027] S2, setting spraying parameters, dividing the substrate color change area, blocking one area and spraying accordingly, and spraying another area after the spraying is completed; Further, setting the spraying parameters, dividing the substrate color change area, shielding one area and spraying accordingly, and spraying another area after the spraying is completed, includes the following steps: S21, setting spraying parameters, the spraying parameters including spraying distance, spraying pressure, spraying speed and spraying flow rate; S22, dividing the surface of the substrate into an area where the doped sol needs to be sprayed and an area where the doped sol is not included; S23, using a baffle to shield the doped area, and spraying the non-doped area, after the spraying is completed, removing the baffle, and using the baffle to shield the sprayed area, and spraying the doped area; S3, placing the sprayed substrate in an oven for drying and curing; Furthermore, the sprayed substrate is placed in an oven for drying and curing. The specific steps are as follows: S31, setting the parameters of the oven, including drying temperature, drying time and heating and cooling rate; S32, placing the substrate into an oven; S33. After drying is completed, the substrate is taken out and the coating surface is inspected.
[0028] It should be noted that when performing multi-layer spraying, each layer needs to be dried and cured. If the previous layer is not dried and cured, the spraying of the next layer may react with it, resulting in poor bonding between layers or defects. Therefore, only spraying after each layer is dried and cured can the film produced by spraying be more uniform.
[0029] S4, taking out the substrate, detecting the characterization data of the first coating film, obtaining the characterization parameters of the next coating layer matching the first coating layer according to the characterization data, setting the spraying parameters according to the characterization parameters, using the spraying method and performing secondary coating; It should be noted that by dividing the substrate into color-changing areas and performing targeted spraying respectively, the functional zoning of the film can be accurately controlled, so that tungsten oxide film areas with different performances can be prepared on the same substrate to meet the differentiated requirements for electrical, optical and other performances of different areas in specific scenarios. For example, in smart windows or electronic devices, some areas can have special light adjustment capabilities, while other areas maintain conventional characteristics.
[0030] Further, the substrate is taken out, the characterization data of the first coating film is detected, the characterization parameters of the next coating layer matching the first coating layer are obtained according to the characterization data, the spraying parameters are set according to the characterization parameters, and the spraying method is used to perform secondary coating, which includes the following steps: S41, detecting characterization data of the first coating layer, the characterization data including thickness and surface roughness; S42, calculating the characterization parameters of the next layer matching the current coating according to the measured characterization parameters, and obtaining the spraying parameters according to the obtained characterization parameters; S43, calculating the difference between the spraying parameters and the first layer spraying parameters, and using the difference to correct the spraying parameters; Further, calculating the characterization parameters of the next layer matching the current coating according to the measured characterization parameters, and obtaining the spraying parameters according to the obtained characterization parameters includes the following steps: S431. Based on the obtained characterization parameters of the first coating layer, the characterization parameters of the next coating layer are calculated. The specific formula is: ; in, is the calculated thickness of the next coating layer, is the total thickness of the first coating and the next coating, is the thickness of the first coating; ; in, is the surface roughness of the next coating layer after calculation, is the surface roughness of the two layers, is the surface roughness of the first layer; According to the calculated data, the relationship between the setting parameters and the spraying parameters including spraying speed, spraying distance and spraying pressure is obtained. The specific formula is: ; ; in, is the spraying speed, is the spraying pressure, is the spraying distance, represents the proportionality constant of the model as a whole, which is used to adjust the magnitude of the model output. are index terms, which respectively represent the exponential influence of spraying speed on coating thickness, the exponential influence of spraying pressure on coating thickness, and the exponential influence of spraying distance on coating thickness. are index terms, which respectively represent the influence of spraying speed on surface roughness, the influence of spraying pressure on surface roughness, and the influence of spraying distance on surface roughness. , and constant term All of them are obtained by fitting experimental data; The data obtained from the spraying experiment are shown in Table 1: Table 1: Spraying test data table According to the experimental data, the exponential term is finally obtained. , and constant term The numerical value of .
[0031] S432. Solve the equation group to obtain specific setting parameters.
[0032] It should be noted that, since the film has been sprayed in different areas during manufacture, it is necessary to measure the characterization parameters of different areas respectively, and obtain the setting parameters according to the characterization parameters of different areas, and finally correct the original parameters according to the calculated parameters, and spray again using the partition spraying method; It should be noted that the spraying method is a type of sol-gel method for preparing oxide thin films. This method is to evenly spray the prepared sol solution on the surface of the pretreated substrate to form a uniform and dense coating. This coating is the successfully prepared tungsten oxide thin film. The spraying method has extremely strong flexibility and can adapt to substrates of different shapes. By optimizing the spraying process parameters, high-quality tungsten oxide thin films can be prepared.
[0033] S44. Perform secondary spraying using the corrected parameters.
[0034] It should be noted that the characterization parameters of the next layer are calculated based on this to ensure good connection and reasonable structure between each coating. In addition, the spraying parameters are determined according to the characterization parameters, and the difference with the first layer spraying parameters is calculated for correction, which can effectively compensate for the parameter deviation and significantly improve the spraying accuracy. By using the corrected parameters for secondary spraying, the uniformity and bonding strength between the coatings of the tungsten oxide film can be greatly improved, ensuring the overall performance of the film is stable and excellent, and improving product quality and reliability. S5. Repeat steps S2-S4, perform multiple alternating coatings, and complete the film production.
[0035] A tungsten oxide film, which is prepared according to the above preparation method; Furthermore, a tungsten oxide film is provided, wherein the raw materials for making the film include tungstate, distilled water, nitric acid, ethanol, molybdenum trioxide powder, and a substrate material, wherein the substrate material is made of glass, and the added amounts of the raw materials are 0.1-1 g of tungstate, 50-100 mL of distilled water, 1-5 mL of nitric acid, 10-30 mL of ethanol, and 0.01-0.1 g of molybdenum trioxide.
[0036] It should be noted that molybdenum trioxide powder is an important inorganic compound with the chemical formula MoO3. It is usually in the form of white or light yellow powder with a unique crystal structure. In terms of improving the electrochromic effect, the addition of molybdenum trioxide powder plays a key role. On the one hand, molybdenum trioxide has good ion storage and transmission capabilities. When applied to the electrochromic system, it can provide more active sites for the embedding and extraction of ions, accelerate the migration process of ions, and thus significantly improve the response speed of electrochromic, achieving rapid color switching. On the other hand, when molybdenum trioxide works synergistically with other electrochromic materials, it can effectively adjust the energy band structure of the material and broaden the material's absorption range of light, which can not only enhance the contrast of color change, but also enrich the types of color change, making the electrochromic effect more obvious and diverse, meeting the needs of color change in different scenarios.
[0037] In summary, the tungsten oxide film of the present invention is prepared by the spraying method of the sol-gel method. During the preparation process, two sols are prepared in advance, one is a sol containing molybdenum trioxide, and the other is a sol not containing molybdenum trioxide. By using these two sols to spray the glass substrate in different areas, different functional effects can be obtained on the same substrate, so as to achieve precise control of the performance of different areas of the film. The area containing the molybdenum trioxide sol spraying has an enhanced electrochromic effect due to the unique properties of molybdenum trioxide, and the area not containing the molybdenum trioxide sol spraying remains unchanged or becomes a light color. Therefore, not only more efficient color switching can be achieved, but also diversified functional requirements can be met. The existing preparation method of the tungsten oxide film with local color change is usually based on photolithography technology, laser direct writing, inkjet printing and other methods. This method processes the tungsten oxide film after it is prepared. However, the preparation method of the present invention can directly prepare a tungsten oxide film with local color change function, which not only simplifies the preparation steps of the film, but also effectively reduces the secondary processing. The risk of damage to the film is reduced, and the stability of the overall performance of the film is ensured. At the same time, this direct preparation method can reduce material loss and time cost in the preparation process and improve production efficiency. The present invention can obtain the characterization parameters of the next layer that matches this layer of coating by detecting the characterization parameters of the first layer of sprayed coating, thereby improving the structural adaptability of the coating, and in the case of multi-layer coating, each layer can be tightly adapted, thereby improving the stability of the overall structure of the film. In addition, since the synergy of each layer is greatly improved, the quality of the film can also be effectively improved. When the tungsten oxide film is used in an electrochromic device, it can also ensure that ions migrate smoothly between layers to achieve rapid and stable color changes. The present invention calculates the spraying parameters through the obtained characterization parameters, and uses the calculated spraying parameters to correct the first spraying parameters, and finally performs a second coating. Not only can the optimal spray setting parameters be quickly obtained, so that the coating sprayed out of the second coating can match the first coating, but also the adhesion between the coatings can be enhanced according to the precise parameter settings, so that the prepared tungsten oxide film is more in line with the expected standards. The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims
1. A method for preparing a tungsten oxide thin film, characterized in that: The method comprises the following steps: S1, select and clean the substrate, and prepare a precursor sol for preparing a tungsten oxide film, wherein the sol includes two parts, one containing doping and the other not containing doping; S2, setting spraying parameters, dividing the substrate color change area, blocking one area and spraying accordingly, and spraying another area after the spraying is completed; S3, placing the sprayed substrate in an oven for drying and curing; S4, taking out the substrate, detecting the characterization data of the first coating film, obtaining the characterization parameters of the next coating layer matching the first coating layer according to the characterization data, setting the spraying parameters according to the characterization parameters, using the spraying method and performing secondary coating; S5. Repeat steps S2-S4, perform multiple alternating coatings, and complete the film production.
2. The method for preparing a tungsten oxide thin film according to claim 1, characterized in that: The selected substrate is cleaned and a precursor sol for preparing a tungsten oxide film is prepared. The sol includes two parts, one containing doping and the other not containing doping, and includes the following steps: S11, selecting glass as the substrate; S12, using ethanol to ultrasonically clean the surface of the substrate to remove oil and impurities on the surface of the substrate, and then using deionized water to clean and blow dry to ensure that the surface of the substrate is clean; S13. Prepare two precursor sols, one containing doping and the other not containing doping.
3. The method for preparing a tungsten oxide thin film according to claim 2, characterized in that: The preparation of two precursor sols, one containing doping and one not containing doping, comprises the following steps: S131, dissolving tungstate in distilled water, adding nitric acid as a catalyst, adding ethanol as a co-solvent, and stirring sufficiently to make the mixture uniformly mixed to form a transparent sol, wherein the prepared transparent sol is a sol that does not contain doping; S132. Divide the transparent sol into two parts, add molybdenum trioxide powder to one of the parts, and ensure that the molybdenum trioxide is evenly dispersed in the solution by ultrasonic treatment to form a doped sol.
4. The method for preparing a tungsten oxide thin film according to claim 1, characterized in that: The spraying parameters are set, the substrate color change area is divided, one area is blocked and sprayed accordingly, and another area is sprayed after the spraying is completed, which includes the following steps: S21, setting spraying parameters, the spraying parameters including spraying distance, spraying pressure, spraying speed and spraying flow rate; S22, dividing the surface of the substrate into an area where the doped sol needs to be sprayed and an area where the doped sol is not included; S23, using a baffle to shield the doped area, and spraying the non-doped area. After the spraying is completed, remove the baffle, and use the baffle to shield the sprayed area, and spray the doped area.
5. The method for preparing a tungsten oxide thin film according to claim 1, characterized in that: The specific steps of placing the sprayed substrate in an oven for drying and curing are as follows: S31, setting the parameters of the oven, including drying temperature, drying time and heating and cooling rate; S32, placing the substrate into an oven; S33. After drying is completed, the substrate is taken out and the coating surface is inspected.
6. The method for preparing a tungsten oxide thin film according to claim 1, characterized in that: The method of taking out the substrate, detecting the characterization data of the first coating film, obtaining the characterization parameters of the next coating layer matching the first coating layer according to the characterization data, setting the spraying parameters according to the characterization parameters, and performing secondary coating by spraying method comprises the following steps: S41, detecting characterization data of the first coating layer, the characterization data including thickness and surface roughness; S42, calculating the characterization parameters of the next layer matching the current coating according to the measured characterization parameters, and obtaining the spraying parameters according to the obtained characterization parameters; S43, calculating the difference between the spraying parameters and the first layer spraying parameters, and using the difference to correct the spraying parameters; S44. Perform secondary spraying using the corrected parameters.
7. The method for preparing a tungsten oxide thin film according to claim 6, characterized in that: The step of calculating the characterization parameters of the next layer matching the current coating layer according to the measured characterization parameters and obtaining the spraying parameters according to the obtained characterization parameters comprises the following steps: S431. Based on the obtained characterization parameters of the first coating layer, the characterization parameters of the next coating layer are calculated. The specific formula is: ； in, is the calculated thickness of the next coating layer, is the total thickness of the first coating and the next coating, is the thickness of the first coating; ； in, is the surface roughness of the next coating layer after calculation, is the surface roughness of the two layers, is the surface roughness of the first layer; According to the calculated data, the relationship between the setting parameters and the spraying parameters including spraying speed, spraying distance and spraying pressure is obtained. The specific formula is: ； ； in, is the spraying speed, is the spraying pressure, is the spraying distance, represents the proportionality constant of the model as a whole, which is used to adjust the magnitude of the model output. are index terms, which respectively represent the exponential influence of spraying speed on coating thickness, the exponential influence of spraying pressure on coating thickness, and the exponential influence of spraying distance on coating thickness. are index terms, which respectively represent the influence of spraying speed on surface roughness, the influence of spraying pressure on surface roughness, and the influence of spraying distance on surface roughness. , and constant term All of them are obtained by fitting experimental data; S432. Solve the equation group to obtain specific setting parameters.
8. A tungsten oxide thin film, characterized in that: The film is prepared according to any one of the preparation methods of claims 1-7.
9. The tungsten oxide thin film according to claim 8, characterized in that: The raw materials for making the film include tungstate, distilled water, nitric acid, ethanol, molybdenum trioxide powder, and a substrate material, wherein the substrate material is made of glass, and the added amounts of the raw materials are 0.1-1 g of tungstate, 50-100 mL of distilled water, 1-5 mL of nitric acid, 10-30 mL of ethanol, and 0.01-0.1 g of molybdenum trioxide.