Gas distribution device and deposition equipment

Abstract

The invention provides a gas distribution device and deposition equipment, the gas distribution device comprises a shell, the interior of the shell is hollow and is provided with a first channel, an accommodating space and N second channels, the accommodating space is communicated with the first channel and the N second channels, the first channel is used for being connected with a remote plasma source, and the N second channels are used for being connected with a plasma source; the second channel is used for communicating with the spraying plate or communicating with the spraying plate through an air guide pipeline; the rotary valve body is rotatably arranged in the accommodating space, and the rotary valve body comprises an inlet corresponding to the first channel and N outlets communicated with the inlet; the driving part is in driving connection with the rotary valve body and used for driving the rotary valve body to rotate. Through driving of the driving part, the rotary valve body can be switched between the opening position and the closing position, so that on-off control over clean gas of the N second channels can be achieved through one rotary valve body, the structure of the whole gas distribution device is simplified, and the manufacturing cost of the device is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and in particular to a gas separation device and a deposition device. Background Art

[0002] In the deposition process, after the deposition and other process steps are performed in the process chamber, the process chamber needs to be cleaned to remove the process gas residues that may have formed on the chamber wall. For example, in the existing thin film deposition processes such as atomic layer deposition (ALD), chemical vapor deposition (CVD) or plasma enhanced chemical vapor deposition (PECVD), due to the diffusion characteristics of the process gas, a thin film is formed not only on the surface of the wafer, but also on the surface of the shower plate, the side wall of the reaction chamber, the bottom of the heating plate, and inside the exhaust system.

[0003] A common method is to use a remote plasma source (RPS) for chamber cleaning. The remote plasma source (RPS) excites the cleaning gas through radio frequency or microwaves to generate plasma. The free radicals (activated gas molecules) generated by the cleaning gas after being excited can play a cleaning role.

[0004] In deposition equipment, a remote plasma source is usually connected to a process gas pipeline, and the pipeline is also connected to a shower plate, which is arranged at the top of a process chamber. Cleaning gas is introduced into the pipeline through the remote plasma source to clean the pipeline, the shower plate and the process chamber. In the prior art, a valve is usually separately configured on each pipeline to separately control the on and off of the cleaning gas in each pipeline, resulting in a complex structure.

[0005] In view of this, it is necessary to provide a gas separation device and a deposition equipment to solve the above problems. Summary of the invention

[0006] The purpose of the present invention is to provide a gas separation device and a deposition device to improve the existing problem of a complex structure in which each pipeline is individually equipped with a valve.

[0007] The present invention provides a gas separation device, comprising: A shell, which is hollow inside and is provided with a first channel, an accommodating space and N second channels, wherein the accommodating space is respectively connected to the first channel and the N second channels, the first channel is used to be connected to a remote plasma source, and the second channel is used to be connected to a shower plate or to be connected to the shower plate through a gas guide pipe, and N is a positive integer; a rotary valve body rotatably disposed in the accommodating space, the rotary valve body comprising an inlet disposed corresponding to the first channel and N outlets communicating with the inlet, the outlets being disposed in one-to-one correspondence with the second channels; A driving member is drivingly connected to the rotary valve body and is used to drive the rotary valve body to rotate.

[0008] The beneficial effect of the gas separation device provided by the present invention is that the rotary valve body is driven to rotate by the driving member, so that the rotary valve body can be rotated to an open position to introduce clean gas into N second channels, or the rotary valve body can be rotated to a closed position to stop introducing clean gas into the N second channels, thereby realizing on-off control of the clean gas in N second channels by one rotary valve body, simplifying the structure of the entire gas separation device, reducing the manufacturing cost of the device, and making on-off control of the clean gas simpler.

[0009] In a possible embodiment, a gap is formed between the rotary valve body and the housing.

[0010] The beneficial effect is that: since there is a gap between the rotary valve body and the shell, during the rotation of the rotary valve body, no mechanical friction will be generated between the rotary valve body and the shell, and no particles will be generated. When the rotary valve body is in the closed position, the purge gas is introduced into the gap through the first channel to fill the gap, thereby preventing the process gas introduced into the second channel from leaking.

[0011] In a possible embodiment, at least one end of the rotary valve body is provided with a rotating shaft, the rotating shaft is rotatably provided on the shell, and a cleaning component is provided at the rotating shaft, and the cleaning component is used to clean contaminants at the rotating shaft.

[0012] The beneficial effect is that a cleaning component is arranged at the rotating shaft to clean the pollutants at the rotating shaft, thereby preventing the pollutants from entering the gap along the rotating shaft to cause pollution problems.

[0013] In a possible embodiment, the shaft partially extends out of the shell to form a protruding portion, a sealing cover is provided on the outer wall of the shell corresponding to the protruding portion, and the cleaning assembly is disposed in the sealing cover.

[0014] The beneficial effect is that the sealing cover is isolated from the external environment, thereby preventing pollutants from the external environment from contaminating the rotating shaft.

[0015] In a possible embodiment, the cleaning assembly includes an air intake member disposed on the shell and arranged around the protrusion, and an exhaust member disposed on a side of the air intake member away from the shell and arranged around the protrusion, an air intake chamber arranged around the protrusion is formed in the air intake member, and an exhaust chamber arranged around the protrusion is formed in the exhaust member, and the air intake chamber is connected to the gap and the exhaust chamber respectively.

[0016] In a possible embodiment, the cleaning component also includes an intake pipeline provided on the intake part and connected to the intake chamber and an exhaust pipeline provided on the exhaust part and connected to the exhaust chamber, the intake pipeline is connected to the cleaning gas supply component, the intake pipeline is connected to the cleaning gas supply component, and the exhaust pipeline is connected to the exhaust component.

[0017] The beneficial effect is that the purge gas supply component introduces purge gas into the intake chamber through the intake pipe to blow away the pollutants on the rotating shaft. At the same time, the exhaust component exhausts gas so that the pollutants are extracted together with the purge gas through the exhaust chamber and the exhaust pipe, thereby avoiding pollutants entering the gap along the rotating shaft and causing pollution problems.

[0018] In a possible embodiment, a sealing member is provided between a side of the exhaust member away from the air inlet member and the protruding portion.

[0019] In a possible embodiment, the protruding portion is rotatably disposed on the sealing cover via a bearing.

[0020] The beneficial effect is that the sealing member plays a sealing role between the side of the exhaust member away from the intake member and the protruding portion, and the shaft can rotate more smoothly through the bearing.

[0021] In a possible embodiment, in the case where rotating shafts are respectively provided at both ends of the rotary valve body, one of the rotating shafts is connected to the driving member; or, In the case where a rotating shaft is provided at one end of the rotary valve body, the rotating shaft is connected to the driving member.

[0022] The beneficial effect is that the rotating shaft is connected to the driving member, and the driving member drives the rotating shaft to rotate, thereby driving the rotary valve body to rotate.

[0023] In a possible embodiment, when N=1, the shell includes an inner tube arranged in the second channel, and an external air intake channel and an internal air intake channel are respectively provided on the shell near the rotary valve body, the external air intake channel is connected to the outer space between the shell and the inner tube, and the internal air intake channel is connected to the inner tube.

[0024] The beneficial effect is that the second channel and the inner tube form an inner and outer double-layer pipeline structure, and different process gases are transported to the outer tube portion and the inner tube through the outer air inlet channel and the inner air inlet channel respectively, so as to meet different process processing requirements. When the rotary valve body is in the open position, clean gas can be introduced into the outer space and the inner tube through the outlet of the rotary valve body.

[0025] In a possible embodiment, the shell also includes a first connecting part fixedly connected between the shell and the inner tube at the second channel and a second connecting part corresponding to the first connecting part and arranged in the inner tube, the second connecting part partially blocking the pipe opening of the inner tube, and the inner air intake channel passes through the shell at the second channel, the first connecting part, the inner tube and the second connecting part.

[0026] Its beneficial effect is that when the process gas enters the inner air inlet channel, it will flow along the path of the inner air inlet channel, pass through the shell located at the second channel, the first connecting part, the inner layer tube and the second connecting part, and enter the internal space of the inner layer tube, thereby achieving ventilation only inside the inner layer tube.

[0027] In a possible embodiment, when N>1, a third air intake channel is respectively provided on the shell at a position corresponding to each of the second channels, and the third air intake channel is disposed close to the rotary valve body and communicated with the second channel.

[0028] The beneficial effect thereof is that each of the second channels can be ventilated individually through the third air inlet channel of each of the second channels.

[0029] In a possible embodiment, the shell further includes a third connecting portion disposed in the second channel, the third connecting portion partially blocks the pipe opening of the second channel, and the third air inlet channel passes through the shell located at the second channel and the third connecting portion.

[0030] The beneficial effect is that when the process gas enters the third air inlet channel, it flows along the path of the third air inlet channel, passes through the shell located at the second channel and the third connecting portion, and enters the inner space of the second channel.

[0031] The present invention further provides a deposition device, comprising: a gas separation device as in any of the above embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 It is a schematic diagram of the gas separation device of the present invention when there is one second channel.

[0033] Figure 2 It is a schematic diagram of the rotary valve body, shell, and cleaning assembly in the gas distribution device of the present invention.

[0034] Figure 3 It is a schematic diagram of a rotary valve body with one outlet in a gas separation device of the present invention in one embodiment.

[0035] Figure 4 It is a schematic diagram of a rotary valve body with one outlet in the gas separation device of the present invention in another embodiment.

[0036] Figure 5 It is a partial cross-sectional view of the gas separation device of the present invention at a certain viewing angle.

[0037] Figure 6 It is a partial cross-sectional view of the gas separation device of the present invention at another viewing angle.

[0038] Figure 7 This is a schematic diagram of the gas separation device of the present invention when the number of the second channels is three.

[0039] Figure 8 It is a schematic diagram of a rotary valve body with three outlets in the gas separation device of the present invention.

[0040] Fig. 9 It is a partial stereoscopic diagram of the gas separation device of the present invention in one embodiment.

[0041] Fig.10 FIG. 1 is a cross-sectional view of a second channel of a gas separation device according to an embodiment of the present invention.

[0042] Explanation of reference numerals: 100, air distribution device; 110, shell; 111, first channel; 112, second channel; 113, accommodating space; 1131, gap; 1141, inner tube; 1142, first connecting portion; 1143, second connecting portion; 115, outer air intake channel; 116, inner air intake channel; 1161, first portion; 1162, second portion; 117, third air intake channel; 1171, first airway segment; 1172, second airway segment; 118, third connecting portion ;191, groove; 120, rotary valve body; 121, inlet; 122, outlet; 123, rotating shaft; 1231, protrusion; 1232, rotating end; 1233, limit member; 130, driving member; 140, cleaning assembly; 141, air intake member; 1411, air intake chamber; 142, exhaust member; 1421, exhaust chamber; 143, air intake pipeline; 144, exhaust pipeline; 150, sealing cover; 160, sealing member; 170, bearing; 200, remote plasma source. DETAILED DESCRIPTION

[0043] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0044] In view of the problems existing in the prior art, an embodiment of the present invention provides a gas separation device, see Figure 1 , Figure 4 , Figure 6 , Figure 7 as well as Figure 8 The gas separation device 100 includes: a housing 110, a rotary valve body 120 and a driving member 130. The housing 110 is hollow inside and is provided with a first channel 111, a receiving space 113 and N second channels 112. The receiving space 113 is respectively connected to the first channel 111 and the N second channels 112. The first channel 111 is used to connect to the remote plasma source 200, and the second channel 112 is used to communicate with the shower plate or communicate with the shower plate through a gas guide pipe. N is a positive integer. The rotary valve body 120 is rotatably arranged in the receiving space 113. The rotary valve body 120 includes an inlet 121 corresponding to the first channel 111 and N outlets 122 connected to the inlet 121. The outlets 122 are arranged one by one with the second channels 112. The rotary valve body 120 is hollow inside, and the inlet 121 and the outlet 122 are connected to the internal space of the rotary valve body 120. The driving member 130 is drivingly connected to the rotary valve body 120 and is used to drive the rotary valve body 120 to rotate. When the rotary valve body 120 rotates to an open position, the first channel 111 is aligned with and connected to the inlet 121, and the N outlets 122 are respectively aligned with and connected to the corresponding second channels 112, so as to introduce clean gas into the N second channels 112; when the rotary valve body 120 rotates to a closed position, the first channel 111 is staggered with the inlet 121, and the N outlets 122 are respectively staggered with the corresponding second channels 112, so as to stop introducing clean gas into the N second channels 112.

[0045] The rotary valve body 120 can be switched between an open position and a closed position by the driving member 130. When the rotary valve body 120 is in the open position, the first channel 111 is aligned with and connected to the inlet 121 of the rotary valve body 120, and the N outlets 122 of the rotary valve body 120 are also aligned with and connected to the corresponding second channels 112, respectively. The remote plasma source 200 delivers the excited cleaning gas to the first channel 111, and the cleaning gas enters the rotary valve body 120 from the inlet 121, and then flows into the N second channels 112 from the N outlets 122, respectively, and then flows through the shower plate (not shown in the figure) and the process chamber (not shown in the figure). When the rotary valve body 120 is in the closed position, the first channel 111 is staggered with the inlet 121, and the N outlets 122 are staggered with the corresponding second channels 112, respectively, and the cleaning gas is stopped from entering the second channel 112. Through a rotary valve body 120, the on-off control of the cleaning gas of N second channels 112 can be realized, the number of valves set is reduced, and the on-off control of the cleaning gas of each second channel 112 is also simpler. In addition, it is not necessary to connect each second channel 112 to the remote plasma source 200 separately. Through a first channel 111 connected to the remote plasma source 200, and then distributed to the N second channels 112, this solution greatly simplifies the structure of the entire gas distribution device 100 by simplifying the pipeline and reducing the number of valves, thereby reducing the manufacturing cost of the device.

[0046] In one embodiment, see Figure 1 and Figure 7 A gap 1131 is formed between the rotary valve body 120 and the housing 110. When the rotary valve body 120 is in the closed position, a purge gas is introduced into the gap 1131 through the first channel 111. The purge gas is a gas that does not participate in the reaction, for example, an inert gas such as argon.

[0047] Since there is a gap 1131 between the rotary valve body 120 and the housing 110, during the rotation of the rotary valve body 120, the rotary valve body 120 and the housing 110 will not contact each other, thereby avoiding mechanical friction, because mechanical friction will not only cause wear of the rotary valve body 120 and the housing 110, but also may produce tiny particles. If these particles enter the process gas, they will have an adverse effect on the quality of the product. Therefore, in this solution, the structural design of the gap 1131 can effectively ensure the quality of the product. Moreover, when the rotary valve body 120 is in the closed position, the purge gas is introduced into the gap 1131 through the first channel 111, and the purge gas fills the gap 1131 between the rotary valve body 120 and the housing 110, forming an air pressure barrier, that is, by adjusting the pressure above the second channel 112, the process gas introduced from the second channel 112 can be effectively blocked from leaking from the gap 1131, thereby ensuring the airtightness and safety of the device.

[0048] In one embodiment, see Figure 1 and Figure 3 A rotating shaft 123 is provided at one end of the rotary valve body 120, and the rotating shaft 123 is rotatably provided on the shell 110. A cleaning component 140 is provided at the rotating shaft 123, and the cleaning component 140 is used to clean the pollutants at the rotating shaft 123. The other end of the rotating shaft 123 is a rotating end 1232, and the rotating end 1232 is rotatably provided on the inner wall of the shell 110.

[0049] Furthermore, in the case where a rotating shaft 123 is disposed at one end of the rotary valve body 120 , the rotating shaft 123 is connected to the driving member 130 , and the rotating shaft 123 is driven to rotate by the driving member 130 , thereby driving the rotary valve body 120 to rotate.

[0050] For further information, see Figure 3 and Figure 6 In the case where the other end of the rotating shaft 123 is the rotating end 1232, the end surface of the rotating end 1232 is provided with a plurality of concentrically arranged and ring-shaped stoppers 1233, the stoppers 1233 are integrally formed with the rotating end 1232, the center of the stoppers 1233 is colinearly arranged with the center line of the rotating shaft 123, the inner wall of the housing 110 is provided with a plurality of grooves 191 adapted to the stoppers 1233, the grooves 191 are arranged one-to-one with the stoppers 1233, the stoppers 1233 are placed in the corresponding grooves 191, and when the driving member 130 drives the rotating shaft 123 to rotate, the stoppers 1233 can rotate in the corresponding grooves 191. The cooperation between the stoppers 1233 and the grooves 191 can prevent the rotary valve body 120 from shaking or deflecting during the rotation process, and ensure that the rotary valve body 120 can rotate more smoothly.

[0051] In another embodiment, see Figure 2 , Figure 4 , Figure 7 as well as Figure 8 A rotating shaft 123 is respectively disposed at both ends of the rotary valve body 120. The two rotating shafts 123 are rotatably disposed on the shell 110. Cleaning components 140 are respectively disposed at the two rotating shafts 123. The cleaning components 140 are used to clean pollutants at the rotating shafts 123 to prevent pollutants from entering the gap 1131 along the rotating shafts 123 and causing pollution problems.

[0052] For further information, see Figure 7 In the case where the rotating shafts 123 are respectively provided at both ends of the rotary valve body 120, one of the rotating shafts 123 is connected to the driving member 130, and the rotating shaft 123 is driven to rotate by the driving member 130, thereby driving the rotary valve body 120 to rotate.

[0053] Specifically, the driving member 130 may be a device such as a motor or a rotary cylinder that can drive the rotary valve body 120 to rotate. The specific type of the driving member 130 is not limited here and can be flexibly selected according to actual process requirements.

[0054] In one embodiment, see Figure 2 and Figure 7 The rotating shaft 123 partially extends out of the housing 110 to form a protruding portion 1231. A sealing cover 150 is provided on the outer wall of the housing 110 corresponding to the protruding portion 1231. The cleaning assembly 140 is disposed in the sealing cover 150. The design of the sealing cover 150 can prevent the protruding portion 1231 of the rotating shaft 123 from directly contacting the external environment, and prevent pollutants from the external environment from falling on the rotating shaft 123, thereby playing an isolating and protecting role for the protruding portion 1231.

[0055] The inside of the shell 110 is the vacuum side, and the sealing cover 150 is the atmosphere side. By setting a cleaning component 140 on the protruding portion 1231 of the rotating shaft 123 that partially extends out of the shell 110, pollutants on the protruding portion 1231 can be discharged to prevent pollutants from entering the gap 1131 along the rotating shaft 123 and polluting the vacuum side.

[0056] In a specific embodiment, see Figure 2 and Figure 7 The protruding portion 1231 extends out of the sealing cover 150 and is connected to the driving member 130 .

[0057] In one embodiment, see Figure 2 and Figure 7 The cleaning assembly 140 includes an air intake member 141 disposed on the shell 110 and arranged around the protruding portion 1231, and an exhaust member 142 disposed on a side of the air intake member 141 away from the shell 110 and arranged around the protruding portion 1231. An air intake chamber 1411 disposed around the protruding portion 1231 is formed in the air intake member 141, and an exhaust chamber 1421 disposed around the protruding portion 1231 is formed in the exhaust member 142. The air intake chamber 1411 is respectively connected to the gap 1131 and the exhaust chamber 1421.

[0058] In one embodiment, see Figure 2 and Figure 7 The cleaning component 140 also includes an intake pipe 143 disposed on the intake member 141 and connected to the intake chamber 1411, and an exhaust pipe 144 disposed on the exhaust member 142 and connected to the exhaust chamber 1421. The intake pipe 143 extends out of the sealing cover 150 and is connected to the cleaning gas supply component, and the exhaust pipe 144 extends out of the sealing cover 150 and is connected to the exhaust component. The cleaning gas is introduced into the intake chamber 1411 through the cleaning gas supply component. At the same time, the exhaust component extracts air to take away the pollutants at the rotating shaft 123.

[0059] The cleaning gas supply component introduces high-speed cleaning gas into the air inlet chamber 1411 through the air inlet pipe 143. Under the impact of the high-speed airflow, the pollutants on the rotating shaft 123 can be effectively blown away. At the same time, the exhaust component exhausts the gas containing pollutants through the exhaust chamber 1421 and the exhaust pipe 144 to prevent the pollutants from entering the gap 1131 along the rotating shaft 123 and causing pollution problems.

[0060] In one embodiment, see Figure 2 and Figure 7 The side of the exhaust member 142 away from the air inlet member 141 and the protruding portion 1231 are sealed by a sealing member 160, and the sealing member 160 is a sealing ring, etc. The number and type of the sealing member 160 are not limited here. For example, the sealing member 160 is arranged on the side of the exhaust member 142 away from the air inlet member 141 and is sleeved on the protruding portion 1231. When the rotating shaft 123 rotates, the rotating shaft 123 can rotate in the sealing member 160. At the same time, under the sealing effect of the sealing member 160, the protruding portion 1231 and the sealing member 160 can be effectively sealed.

[0061] In a specific embodiment, see Figure 2 and Figure 7 The seal 160 is provided with vacuum grease. Since the rotating shaft 123 needs to rotate in the seal 160, the vacuum grease on the seal 160 plays a lubricating role, which can reduce the friction between the seal 160 and the rotating shaft 123, so that the rotating shaft 123 rotates more smoothly. The vacuum grease on the protruding portion 1231 can be removed by the inflation of the cleaning gas supply assembly and the exhaust of the exhaust assembly in the above scheme.

[0062] In one embodiment, see Figure 2 and Figure 7 The protruding portion 1231 is rotatably disposed on the sealing cover 150 through the bearing 170, and the number of the bearings 170 is not limited here. The protruding portion 1231 and the sealing cover 150 are connected by the bearing 170, which can ensure that the rotating shaft 123 can rotate smoothly and steadily during the rotation process without generating excessive friction resistance or jamming.

[0063] In a specific embodiment, see Figure 2 and Figure 7 , vacuum grease is provided on the bearing 170. The vacuum grease plays a lubricating role and can significantly reduce the friction of the bearing 170 during the rotation process.

[0064] In one embodiment, see Figure 1 , Figure 5 as well as Figure 6When N=1, that is, there is one second channel 112, the shell 110 includes an inner tube 1141 arranged in the second channel 112, and an external air intake channel 115 and an internal air intake channel 116 are respectively provided on the shell 110 near the rotary valve body 120. The external air intake channel 115 is connected to the outer space between the shell 110 and the inner tube 1141, and the internal air intake channel 116 is connected to the inner tube 1141.

[0065] The second channel 112 and the inner tube 1141 form an inner and outer double-layer pipeline structure, which can meet different process processing requirements, such as atomic layer deposition (ALD) process, chemical vapor deposition (CVD) process, etc.

[0066] ALD process flow: Taking the example that the second channel is connected to the shower plate through an air guide line and the air guide line has an inner tube and an outer tube, the rotary valve body 120 is rotated to the closed position, and at the same time, a purge gas is introduced into the gap 1131 through the first channel 111 to achieve gas sealing. The precursor gas is introduced into the inner tube 1141 through the inner air inlet channel 116, and the precursor gas enters the process chamber through the inner tube of the air guide line and the shower plate. The precursor gas molecules will be adsorbed on the surface of the substrate, and then the purge gas (for example, inert gas) is introduced into the outer space and the inner tube 1141 through the outer air inlet channel 115 and the inner air inlet channel 116 respectively. The purge gas passes through the inner tube and outer tube of the air guide line and the shower plate, and then enters the process chamber. At the same time, the exhaust device is turned on to Expel the remaining gas; after the purge is completed, the reaction gas is introduced into the outer space through the outer air inlet channel 115, and the reaction gas molecules react chemically with the precursor molecules on the surface of the substrate to form a single-layer atomic film, and then the purge gas is introduced into the outer space and the inner tube 1141 through the outer air inlet channel 115 and the inner air inlet channel 116 respectively. The purge gas passes through the inner and outer tubes of the gas guide pipeline and the spray plate, and then enters the process chamber. At the same time, the exhaust device is turned on to exhaust the remaining gas. According to the above steps, the precursor gas and the reaction gas are introduced by circulation until the desired film is obtained. After the reaction is completed, the rotary valve body 120 is rotated to the open position, and the cleaning gas enters the first channel 111 after being excited by the remote plasma source 200. The cleaning gas enters the outer space and the inner tube 1141 through the rotary valve body 120, and then passes through the inner tube and outer tube of the gas guide pipeline, the spray plate, and then enters the process chamber. At the same time, the purge gas is introduced into the outer space and the inner tube 1141 through the external air inlet channel 115 and the internal air inlet channel 116 respectively, and the exhaust device is turned on at the same time to discharge the gas in the process chamber to clean the process chamber.

[0067] CVD process flow: Taking the second channel connected to the shower plate through the gas guide line and the gas guide line having an inner tube and an outer tube as an example, the rotary valve body 120 is rotated to the closed position, and the purge gas is introduced into the gap 1131 through the first channel 111 to achieve gas sealing. The precursor gas is introduced into the inner layer tube 1141 through the inner gas inlet channel 116, and the reaction gas is introduced into the outer layer space through the outer gas inlet channel 115. The precursor gas enters the shower plate through the inner tube of the gas guide line, and the reaction gas enters the shower plate through the outer tube of the gas guide line. The precursor gas and the reaction gas are mixed at the shower plate and then enter the reaction chamber to react and deposit on the substrate. After the reaction is completed, the rotary valve body 120 is rotated to the open position, and the cleaning gas enters the first channel 111 after being excited by the remote plasma source 200. The cleaning gas enters the outer space and the inner tube 1141 through the rotary valve body 120, and then passes through the inner tube and outer tube of the gas guide pipeline, the spray plate, and then enters the process chamber to clean the process chamber.

[0068] In a specific embodiment, see Figure 5 and Figure 6 The shell 110 also includes a first connecting portion 1142 fixedly connected between the shell 110 and the inner layer tube 1141 located at the second channel 112, and a second connecting portion 1143 corresponding to the first connecting portion 1142 and arranged in the inner layer tube 1141, the second connecting portion 1143 partially blocks the pipe opening of the inner layer tube 1141, the inner air intake channel 116 passes through the shell 110, the first connecting portion 1142, the inner layer tube 1141 and the second connecting portion 1143 located at the second channel 112, a first port of the inner air intake channel 116 is formed on the outer wall of the shell 110 located at the second channel 112, and a second port of the inner air intake channel 116 is formed on the second connecting portion 1143 to communicate with the inner layer tube 1141. A first connection portion 1142 is arranged between the shell 110 and the inner tube 1141 at the second channel 112, and a second connection portion 1143 is arranged in the inner tube 1141. The inner air intake channel 116 passes through the shell 110, the first connection portion 1142, the inner tube 1141 and the second connection portion 1143 at the second channel 112. The path of the inner air intake channel 116 extends from the outer wall of the shell 110 to the inner tube 1141, so that the gas can be passed into the inner tube 1141 separately.

[0069] The second connection portion 1143 partially blocks the tube opening of the inner tube 1141. It can be understood that the second connection portion 1143 does not block the flow path in the inner tube 1141, and the clean gas can still flow from the outside of the second connection portion 1143 (i.e., the unblocked portion). Figure 6 As shown, the second connection portion 1143 is located in the radial direction of the inner tube 1141, and both sides of the second connection portion 1143 are unblocked parts through which the clean gas can flow.

[0070] See also Figure 5 and Figure 6 The inner air inlet channel 116 includes a first portion 1161 and a second portion 1162 connected to the first portion 1161. The first portion 1161 passes through the housing 110, the first connection portion 1142, the inner tube 1141 and the second connection portion 1143 located at the second channel 112. The setting direction of the second portion 1162 is consistent with the pipeline direction of the inner tube 1141, that is, the inner air inlet channel 116 will bend in the second connection portion 1143 to adjust the airflow path, so that the process gas can flow more smoothly along the pipeline direction of the inner tube 1141 after flowing out from the second portion 1162, and will not impact the inner wall of the inner tube 1141 and cause a sudden change in the airflow direction, thereby avoiding the generation of eddy and turbulent problems. The second portion 1162 is located on the axis of the inner tube 1141, which can ensure that after the gas enters the inner tube 1141, it can be more evenly distributed within the entire inner tube 1141, thereby avoiding the generation of eddy and turbulent problems due to uneven airflow distribution.

[0071] In another embodiment, when N>1, the number of the second channels 112 is 2, 3, or 4, etc., which can be designed according to actual process requirements. Figure 7 and Figure 8 There are three second channels 112 , and the rotary valve body 120 also has three corresponding outlets 122 . A third air inlet channel 117 is provided on the shell 110 corresponding to each second channel 112 . The third air inlet channel 117 is arranged close to the rotary valve body 120 and is connected to the second channel 112 .

[0072] Multiple second channels 112 are respectively arranged corresponding to different areas of the shower plate. For example, when there are three second channels 112, the three second channels 112 are respectively arranged corresponding to the central area, middle area, and edge area of ​​the shower plate to ensure that the process gas can reach the surface of the substrate more evenly.

[0073] Plasma Enhanced Chemical Vapor Deposition (PECVD) process flow: Taking the second channel connected to the shower plate through the gas pipeline as an example, the rotary valve body 120 is rotated to the closed position, and the purge gas is introduced into the gap 1131 through the first channel 111 to achieve gas sealing. The process gas is introduced into the corresponding second channel 112 through each third air inlet channel 117, and the process gas in each second channel 112 reaches different areas of the shower plate, and then sprays to different areas on the surface of the substrate, and the substrate undergoes a coating reaction in a rotating state. After the reaction is completed, the rotary valve body 120 is rotated to the open position, and the cleaning gas enters the first channel 111 after being excited by the remote plasma source 200. The cleaning gas enters the rotary valve body 120 from the inlet 121, and is distributed by the rotary valve body 120. It enters the corresponding second channel 112 from each outlet 122 on the rotary valve body 120, and then reaches different areas of the spray plate through the gas guide pipe, and then enters the process chamber to clean the process chamber.

[0074] In a specific embodiment, see Fig. 9 and Fig.10 The shell 110 also includes a third connecting portion 118 arranged in the second channel 112, and the third connecting portion 118 partially blocks the pipe opening of the second channel 112. The third air inlet channel 117 passes through the shell 110 and the third connecting portion 118 located at the second channel 112. A first channel opening of the third air inlet channel 117 is formed on the outer wall of the shell 110 located at the second channel 112, and a second channel opening of the third air inlet channel 117 is formed on the third connecting portion 118 to communicate with the second channel 112.

[0075] The third connection portion 118 partially blocks the opening of the second channel 112. It can be understood that the third connection portion 118 does not block the flow path in the second channel 112, and the clean gas can also flow from the outside of the third connection portion 118 (i.e., the unblocked portion). Fig.10 As shown, the third connection portion 118 is located in the radial direction of the second channel 112, and both sides of the third connection portion 118 are unblocked parts through which the clean gas can flow.

[0076] See also Fig. 9 and Fig.10 A third connection portion 118 is disposed in the second channel 112 , and the third gas inlet channel 117 passes through the housing 110 located at the second channel 112 and the third connection portion 118 , so that the process gas can be introduced into the second channel 112 .

[0077] See also Fig. 9 and Fig.10The third air inlet channel 117 includes a first air channel section 1171 and a second air channel section 1172 that are connected. The first air channel section 1171 passes through the housing 110 and the third connecting portion 118 located at the second channel 112. The setting direction of the second air channel section 1172 is consistent with the pipeline direction of the second channel 112, that is, the second air channel section 1172 will be bent in the third connecting portion 118 to adjust the air flow path, so that the process gas can flow more smoothly along the direction of the second channel 112 after flowing out from the second air channel section 1172, and will not impact the inner wall of the second channel 112 and cause a sudden change in the air flow direction, thereby avoiding the generation of eddy and turbulent problems. The second air channel section 1172 is located on the axis of the second channel 112, which can ensure that the gas can be more evenly distributed in the entire second channel 112 after entering the second channel 112, thereby avoiding the generation of eddy and turbulent problems due to uneven air flow distribution.

[0078] The present invention further provides a deposition device, including: a gas separation device 100 as in any of the above embodiments, wherein the deposition device is an atomic layer deposition device, a chemical vapor deposition device, or a plasma enhanced chemical vapor deposition device.

[0079] In the description of the present invention, it should be understood that the terms "including" and "having" and any variations thereof used herein are intended to cover non-exclusive inclusions. For example, a process, method, system, product or apparatus comprising a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to these processes, methods, products or apparatuses.

[0080] It should be understood that the orientation or position relationship indicated by terms such as "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0081] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

[0082] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by those with ordinary skills in the field to which the present invention belongs.

Claims

1. A gas separation device, characterized in that: include: A shell, which is hollow inside and is provided with a first channel, an accommodating space and N second channels, wherein the accommodating space is respectively connected to the first channel and the N second channels, the first channel is used to be connected to a remote plasma source, and the second channel is used to be connected to a shower plate or to be connected to the shower plate through a gas guide pipe, and N is a positive integer; a rotary valve body rotatably disposed in the accommodating space, the rotary valve body comprising an inlet disposed corresponding to the first channel and N outlets communicating with the inlet, the outlets being disposed in one-to-one correspondence with the second channels; A driving member is drivingly connected to the rotary valve body and is used to drive the rotary valve body to rotate.

2. The gas separation device according to claim 1, characterized in that: A gap is formed between the rotary valve body and the housing.

3. The gas separation device according to claim 2, characterized in that: At least one end of the rotary valve body is provided with a rotating shaft, the rotating shaft is rotatably arranged on the shell, and a cleaning component is provided at the rotating shaft, and the cleaning component is used to clean the pollutants at the rotating shaft.

4. The gas separation device according to claim 3, characterized in that: The rotating shaft part extends out of the shell to form a protruding portion, a sealing cover is provided on the outer wall of the shell corresponding to the protruding portion, and the cleaning component is arranged in the sealing cover.

5. The gas separation device according to claim 4, characterized in that: The cleaning assembly includes an air intake member disposed on the shell and arranged around the protruding portion, and an exhaust member disposed on a side of the air intake member away from the shell and arranged around the protruding portion, an air intake chamber arranged around the protruding portion is formed in the air intake member, and an exhaust chamber arranged around the protruding portion is formed in the exhaust member, and the air intake chamber is communicated with the gap and the exhaust chamber respectively.

6. The gas separation device according to claim 5, characterized in that: The cleaning component also includes an intake pipeline provided on the intake member and connected to the intake chamber and an exhaust pipeline provided on the exhaust member and connected to the exhaust chamber, the intake pipeline is connected to the cleaning gas supply component, and the exhaust pipeline is connected to the exhaust component.

7. The gas separation device according to claim 5, characterized in that: A sealing member is provided between the side of the exhaust member away from the intake member and the protruding portion.

8. The gas separation device according to claim 4, characterized in that: The protruding portion is rotatably arranged on the sealing cover via a bearing.

9. The gas separation device according to claim 3, characterized in that: In the case where rotating shafts are respectively provided at both ends of the rotary valve body, one of the rotating shafts is connected to the driving member; or, In the case where a rotating shaft is provided at one end of the rotary valve body, the rotating shaft is connected to the driving member.

10. The gas separation device according to any one of claims 1 to 9, characterized in that: When N=1, the shell includes an inner tube arranged in the second channel, and an external air intake channel and an internal air intake channel are respectively provided on the shell near the rotary valve body, the external air intake channel is connected to the outer space between the shell and the inner tube, and the internal air intake channel is connected to the inner tube.

11. The gas separation device according to any one of claims 1 to 9, characterized in that: When N>1, a third air inlet channel is respectively provided on the housing at a position corresponding to each of the second channels, and the third air inlet channel is arranged close to the rotary valve body and communicated with the second channel.

12. The gas separation device according to claim 11, characterized in that: The shell further includes a third connection portion disposed in the second channel, the third connection portion partially shielding the pipe opening of the second channel, and the third air inlet channel passes through the shell located at the second channel and the third connection portion.

13. A deposition device, characterized in that: include: A gas separation device as claimed in any one of claims 1 to 12.

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