A drum-type vacuum plasma cleaning device

Abstract

A kind of roller type vacuum plasma cleaning device, including cleaning main body, cleaning main body is equipped with rack and roller device, the rack both sides are equipped with roller fixed part, roller device includes cylindrical vacuum cavity, and the fixed shaft of both sides is fixed in fixed part;Cavity is equipped with roller, and the bottom of roller is equipped with rotary connection structure, and the cylindrical bottom surface of vacuum cavity can be relatively rotatably fixed together with rotary connection structure;Fixed part of rotary connection structure is equipped with electrode mounting hole, vacuum hole and process gas hole that communicate with outside, and there is electrode stick on electrode mounting hole, and vacuum hole is connected with vacuum pump;Rotary part is connected with the frequency conversion motor of roller set outside vacuum cavity and is linked, drives roller rotation;The side below vacuum cavity is equipped with lifting mechanism;The number of single product material plasma cleaning processing is doubled by roller way in the present application, improves processing quality, and processing efficiency is improved.

Description

Technical Field

[0001] This invention relates to plasma technology, and more particularly to a drum-type vacuum plasma cleaning device. Background Technology

[0002] Vacuum plasma cleaning technology has a wide range of applications, including material surface modification, etching and cleaning, plasma chemical vapor deposition, and sputtering. It is also used in key processes for treating silicon, quartz, niobium-lithium compounds, and other special materials such as ceramics or glass. This vacuum plasma cleaning chamber is mainly used for surface treatment of plastics, new materials, and particulate matter.

[0003] Vacuum plasma cleaning is typically introduced at the following stages: material surface energy enhancement, before bonding and coating, and before screen printing. Products achieve better surface properties after plasma cleaning.

[0004] 1. Plasma cleaning of plastic parts surfaces can improve paint adhesion, remove inorganic matter from the material surface, improve the connection between ink and paint and the carrier, reduce peeling, and improve heat dissipation performance.

[0005] 2. It has wide applications in the new materials industry, such as surface treatment of granular materials, surface treatment of irregular materials, and powder materials.

[0006] 3. Application in the toy industry: Plasma treatment is used before coloring toys to prevent paint peeling and fading after coloring, and to improve the adhesion of paint and ink.

[0007] Currently, existing online vacuum plasma equipment mainly consists of a vacuum system, a control system, a plasma source, and a vacuum chamber. Vacuum plasma equipment is often used for layer-by-layer processing, which can only be placed between layers for each processing. The operation is cumbersome, requiring each layer to be placed onto the tray fixture one by one. After processing, the material needs to be collected separately. If you want to increase production, you need to order multiple units or increase the size of the chamber, which will lead to a significant increase in cost and also require more personnel. Summary of the Invention

[0008] The technical problem solved by this invention is to provide a drum-type vacuum plasma cleaning device, which doubles the number of products that can be plasma cleaned in a single batch by using a roller, thereby improving the quality and efficiency of the cleaning process.

[0009] The technical solution of this invention is:

[0010] A drum-type vacuum plasma cleaning device includes a control cabinet and a cleaning body. The control cabinet houses a control host and a power supply. The cleaning body includes a frame and a drum assembly. The frame is a vertical U-shaped frame with drum fixing parts on both upper sides. The drum assembly includes a horizontally placed cylindrical vacuum chamber with fixing shafts on both sides, which are rotatably fixed in the fixing parts. The front end of the vacuum chamber has a chamber door, which, when closed, forms a sealed space within the vacuum chamber. A drum coaxially arranged with the vacuum chamber is located within the chamber. The bottom of the drum has a rotating connection structure, which is rotatably fixed to the cylindrical bottom surface of the vacuum chamber.

[0011] The rotating connection structure includes a fixed part and a rotating part. The fixed part is provided with an electrode mounting hole, a vacuum hole, and a process gas hole that communicate with the outside. An electrode rod is sealed and inserted into the electrode mounting hole and is electrically connected to the power supply. The process gas hole is connected to a process gas source device, and the vacuum hole is connected to a vacuum pump. The rotating part is linked to a roller frequency converter motor located outside the vacuum chamber to drive the roller to rotate. A lifting mechanism is provided on one side below the vacuum chamber to push the vacuum chamber to rotate around the fixed axis. The control host is electrically connected to and controls the operation of the power supply, lifting mechanism, vacuum pump, process gas source device, and roller frequency converter motor.

[0012] As described above, the drum-type vacuum plasma cleaning device includes a drum rotation connecting mechanism on the drum fixing part. The drum rotation connecting mechanism includes a fixed shaft base and a fixed bearing assembly. The fixed shaft is fixedly fixed to the outer side of the fixed shaft base, and the other side of the fixed shaft base is fixed to an arc-shaped connecting seat. The inner side of the arc-shaped connecting seat is an arc surface that fits against the outer surface of the vacuum chamber. The arc-shaped connecting seat is fixed to the outer surface of the vacuum chamber. The fixed bearing assembly includes an Ω-shaped bearing sleeve, in which a rotating bearing is disposed. The fixed shaft is inserted into and fixed in the rotating bearing. A connecting plate is provided between the bottom of the bearing sleeve and the top of the frame.

[0013] As described above, in the drum-type vacuum plasma cleaning device, the drum rotation connecting mechanism is equipped with a positioning device. The positioning device includes a positioning point plate disposed on the fixed shaft base and a detection point plate disposed on the connecting seat plate. The positioning point plate is provided with at least three positioning pin holes at a specified distance away from the fixed shaft, along different angles around the fixed shaft. A positioning head is fixedly fixed to the positioning pin hole by protruding outward. The detection point plate is an L-shaped plate that is fixed to the connecting seat plate and bent upward. The vertical part of the plate has a number of detection holes equal to the number of positioning heads at a specified position. A detection sensor is installed on each detection hole. Each detection sensor is positioned facing the side of the positioning head. The positioning point plate rotates with the fixed shaft by a set angle range. Within this angle range, each positioning head will only coincide with the center of the corresponding detection sensor once.

[0014] As described above, in the drum-type vacuum plasma cleaning device, a rotating connection structure is provided between the bottom of the drum and the corresponding bottom surface of the vacuum chamber. The rotating connection structure includes a fixed portion of a central disc and a rotating portion of a bottom ring. The central disc is fixed to the inner side of the bottom surface of the vacuum chamber and is concentrically arranged with the bottom surface of the vacuum chamber. Rotating wheels are provided at fixed angular intervals on the outer peripheral surface of the central disc, and the rotating wheels protrude from the outer peripheral surface of the central disc. The bottom of the drum is a ring structure. The inner diameter of the ring matches the outer diameter of the central disk. The thickness of the central disk is greater than the thickness of the bottom ring. The bottom ring is fitted around the outer circumference of the central disk, and its inner surface is positioned to contact the rotating wheel. A rotary transmission track is provided on the side of the bottom ring facing the bottom surface of the vacuum chamber. The output end of a sealed coupling passes through the transmission hole on the bottom surface of the vacuum chamber and is linked to the rotary transmission track. The sealed coupling is fixed to the outside of the bottom surface of the vacuum chamber, and the roller frequency conversion motor is connected to the coupling.

[0015] In the drum-type vacuum plasma cleaning device described above, the rotating wheel is a metal bearing, which is installed in a roller groove opened in the periphery of the central disk. The roller groove has an opening on the outer circumferential surface of the central disk, and the outer periphery of the bearing protrudes from the opening and can roll into contact with the inner circumferential surface of the bottom ring of the drum. The roller groove has connecting locking screw holes on both sides, and a cover plate is provided on the roller groove and the locking screw holes. The cover plate is bolted to the screw holes of the locking screw holes, and the outer surface of the cover plate is flush with the surface of the central disk. The rotary transmission track is a groove with meshing teeth on its side. The output end of the sealing coupling has meshing teeth on its side that cooperate with the meshing teeth. The output end of the sealing coupling rotates to drive the bottom ring of the drum to rotate around the central disk.

[0016] In the drum-type vacuum plasma cleaning device described above, the electrode rod is mounted on the electrode mounting hole of the central disk. The electrode mounting hole is located at the center of the central disk, or, when the central disk is vertically arranged, at a position within the central disk that is upward and away from the center by a predetermined distance.

[0017] In the drum-type vacuum plasma cleaning device described above, the electrode rod is sealed through the electrode mounting hole and insulated from the electrode mounting hole. The inner end of its main body extends to a set distance inside the drum. Its outer end protrudes from the outer side of the bottom surface of the vacuum chamber and is electrically connected to one pole of the plasma radio frequency power supply. The other pole of the plasma radio frequency power supply is electrically connected to the drum. The electrode rod and the drum wall form two poles for discharging and ionizing the process gas.

[0018] As described above, in the drum-type vacuum plasma cleaning device, the electrode rod is provided with a cooling water channel, which includes an inlet channel and a drain channel. The inlet channel extends from the inlet at the outer end of the electrode rod to the inner end of the electrode rod. The drain channel is connected to the inlet channel at the inner end of the electrode rod and is arranged in parallel with the inlet channel, extending to the drain port at the outer end of the electrode rod. The inlet and drain ports are respectively connected to a chiller via a bundle of flexible hoses.

[0019] In the drum-type vacuum plasma cleaning device described above, the water inlet channel is located on the central axis of the electrode rod, and the drainage channel is an annular channel surrounding the water inlet channel; a shielding cover is provided on the outer side of the outer end of the electrode rod.

[0020] As described above, the drum-type vacuum plasma cleaning device includes a matching unit at the top of the vacuum chamber that connects the plasma radio frequency power supply and the electrode rod; a vacuum valve and a vacuum gauge are provided outside the vacuum vent; a vacuum breaking valve hole is provided on the central disc, and a vacuum breaking valve is sealed to the outside of the vacuum chamber; a support bar extending along the length of the drum is provided on the inner side of the drum, with inclined surfaces on both sides and a rounded chamfer at the top; a rotational support structure is provided on the inner side of the vacuum chamber to keep the drum axis coaxial with the vacuum chamber; a viewing window is provided on the chamber door; and a sensor is provided on the door lock of the chamber door.

[0021] It also includes a plasma cleaning step for the product materials:

[0022] Open the cavity door, and use the main unit to control the lifting mechanism to lift the opening end of the vacuum cavity, keeping the vacuum cavity in an upright position, and pour in the material to be cleaned; then control the lifting mechanism to return the vacuum cavity to a horizontal position and close the cavity door;

[0023] Start the vacuum pump and open the vacuum valve to evacuate the inside of the vacuum chamber; when the vacuum level reaches 50 Pa, start the roller frequency conversion motor to drive the roller to rotate at a speed of 8 rpm.

[0024] When the vacuum level in the vacuum chamber reaches 30 Pa, process gas is introduced. When the argon gas flow rate reaches 100 sccm, the plasma radio frequency power supply is activated to output energy between the electrode rod and the roller, generating and filling the vacuum chamber with plasma. The chiller is then activated, with the temperature set to 28℃ and the power set to 800 watts, to perform plasma cleaning on the material for 50 seconds.

[0025] Argon process gas was introduced at a flow rate of 80 sccm, and the drum was kept at a speed of 8 rpm for 50 seconds of plasma cleaning treatment.

[0026] Argon gas was introduced at a flow rate of 50 sccm, and the drum speed was maintained at 5 rpm. The material was then subjected to plasma cleaning for 200 seconds.

[0027] After repeating the above process of filling with gas and cleaning 5 times, the process is completed. Turn off the plasma radio frequency power supply, turn off the process gas source, turn off the vacuum pump and vacuum valve, open the rupture valve, and the pressure in the vacuum chamber returns to the standard atmospheric pressure value, completing the vacuum breaking action; open the chamber door, control the vacuum chamber opening to tilt downward, and pour out the cleaned product material.

[0028] Stop the drum rotation and process gas input, shut off the energy output of the electrode rod, and automatically activate the venting valve;

[0029] Open the cavity door and tilt the vacuum cavity opening downwards to pour out the processed material.

[0030] As can be seen from the above description, the present invention does indeed have the following advantages:

[0031] The drum-type vacuum plasma cleaning device of this invention completely changes the conventional cleaning method of placing products for spraying by cleverly utilizing the structure of the drum. It is particularly suitable for small products, and even products with complex, non-uniform surfaces, allowing for simultaneous, large-volume single-cycle cleaning. Without the need to hold the products in place, the drum's tumbling mechanism achieves comprehensive cleaning of the product's surface from all angles, not only doubling the number of products cleaned at one time but also achieving excellent cleaning results, significantly improving processing efficiency. Furthermore, the drum cleaning method changes the conventional loading and unloading methods, reducing the complexity and amount of manual operation, lowering the user's production costs for product cleaning and processing, and making it more competitive in the market for surface treatment of large batches of small materials. Attached Figure Description

[0032] Figure 1 This is a schematic diagram of the overall structure of a preferred embodiment of the present invention;

[0033] Figure 2 This is a schematic diagram of the rear structure of a preferred embodiment of the present invention;

[0034] Figure 3 This is a schematic diagram of the front structure of the vacuum cavity according to a preferred embodiment of the present invention;

[0035] Figure 4 This is a schematic diagram of the structure of the vacuum cavity according to a preferred embodiment of the present invention;

[0036] Figure 5 This is a schematic diagram of the structure of the drum rotation connection mechanism according to a preferred embodiment of the present invention;

[0037] Figure 6 This is a cross-sectional structural diagram of the vacuum cavity according to a preferred embodiment of the present invention;

[0038] Figure 7 This is a schematic diagram of the structure of the central disk in a preferred embodiment of the present invention. Detailed Implementation

[0039] To provide a clearer understanding of the technical features, objectives, and effects of the present invention, specific embodiments of the present invention will now be described with reference to the accompanying drawings.

[0040] The present invention proposes a drum-type vacuum plasma cleaning device, which ingeniously utilizes the drum-type design and combines high-energy excited plasma for immersion and tumbling cleaning, enabling large-volume single cleaning of product materials, especially small product materials, and achieving excellent cleaning results. The cleaning efficiency is 2-5 times higher than that of conventional static cleaning.

[0041] Please see Figure 1As shown, in a preferred embodiment of the present invention, the drum-type vacuum plasma cleaning device includes a control cabinet 1 and a cleaning body. The control cabinet 1 houses a control host and a power supply. The cleaning body includes a frame 8 and a drum assembly. The frame 8 is a vertical U-shaped frame with drum fixing parts on its upper sides. The drum assembly includes a horizontally placed cylindrical vacuum chamber 9 with fixing shafts 27 on both sides. The fixing shafts 27 are rotatably fixed in the fixing parts, thereby allowing the vacuum chamber 9 to rotate with the fixing shafts 27 as support, forming different openings such as upward, horizontal, or downward tilting. The vacuum chamber 9 is equipped with a chamber door 28 at its front end. When the chamber door 28 is closed, a sealed space is formed inside the vacuum chamber 9. A roller 29 is provided inside the vacuum chamber and is coaxially arranged with the vacuum chamber 9. The bottom of the roller 29 is provided with a rotating connection structure, which can be rotatably fixed to the bottom surface of the cylinder of the vacuum chamber 9. The roller 29 inside the vacuum chamber 9 can rotate, and the product material transferred inside the roller 29 will continuously tumble in the lower half of the roller, so that it can fully contact the plasma gas inside the vacuum chamber 9 to achieve a comprehensive cleaning effect.

[0042] The rotating connection structure includes a fixed part and a rotating part. The fixed part is provided with an electrode mounting hole 40, a vacuum vent, and a process gas vent that communicate with the outside. Preferably, these process gas vents are equipped with sealing and insulation structures. After the corresponding structures are installed, they can ensure the airtightness of the vacuum chamber. At the same time, they can also ensure the insulation state between them and the vacuum chamber when a conductive connection is not required. An electrode rod 26 is sealed and inserted into the electrode mounting hole 40. The electrode rod 26 is electrically connected to the power supply 2. Preferably, the power supply 2 is mainly a plasma radio frequency power supply. The process gas vent is connected to a process gas source device to provide the process gas required for exciting the plasma gas in the vacuum chamber 9. The vacuum vent is connected to a vacuum pump 12. Through the vacuum pump 12, a vacuum operation can be performed in the vacuum chamber 9 before cleaning to ensure the conditions for exciting the plasma cleaning gas. The rotating part is linked to a drum frequency conversion motor 15 located outside the vacuum chamber to drive the drum 29 to rotate. After the drum 29 rotates, it can drive the... The product material inside the drum 29 tumbles, allowing it to better contact and mix with the plasma gas, achieving a better cleaning effect. A lifting mechanism 13 is provided on one side below the vacuum chamber 9, which pushes the vacuum chamber to rotate around the fixed shaft 27. Driven by the lifting mechanism 13, the opening end of the vacuum chamber can be operated in different states: tilted upwards, horizontally, and tilted downwards. The control host is electrically connected to and controls the power supply, lifting mechanism, vacuum pump, process gas source device, and drum frequency conversion motor. All electrical components of this invention are electrically connected to the control system in the control host. Through the setting control of the control system, all parts are linked and arranged to realize the entire automatic cleaning process.

[0043] As described above, in a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention, please refer to... Figure 5 As shown, the roller fixing part is provided with a roller rotation connecting mechanism. The roller rotation connecting mechanism is provided with a fixed shaft base 31 and a fixed bearing assembly. The fixed shaft 27 is fixedly fixed to the outward side of the fixed shaft base 31, and the other side of the fixed shaft base 31 is fixed to an arc-shaped connecting seat. The inner side of the arc-shaped connecting seat 32 is an arc surface that fits against the outer surface of the vacuum chamber 9. The arc-shaped connecting seat 32 is fixed to the outer surface of the vacuum chamber 9. Preferably, it is installed in the middle position of the vertical direction on the side of the vacuum chamber 9 so that the vacuum chamber 9 can maintain horizontal balance. The fixed bearing assembly includes an Ω-shaped bearing sleeve 34. A rotating bearing is provided in the bearing sleeve 34, and the fixed shaft 27 is inserted into the rotating bearing for fixation. A connecting seat plate 35 is provided between the bottom of the bearing sleeve 34 and the top of the frame 8. Preferably, the protrusions on both sides of the bearing sleeve 34 are fixed to the frame by bolts. By fixing the bearing sleeve, the vacuum chamber can be stably hung on the frame.

[0044] In a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention as described above, the drum rotation connecting mechanism is provided with a positioning device. The positioning device includes a positioning point plate 33 disposed on the fixed shaft base 31 and a detection point plate 36 disposed on the connecting seat plate 35. The positioning point plate 33 is provided with at least three positioning pin holes at a specified distance away from the fixed shaft 27 and at different angles around the fixed shaft 27. A positioning head 37 is fixedly fixed to the positioning pin hole by protruding outward. The detection point plate 36 is an L-shaped plate that is bent upward on the connecting seat plate 35. The vertical portion of the plate has the same number of detection holes as the positioning heads 37 at a specified position. A detection sensor 38 is installed on each detection hole. Each detection sensor 38 is disposed on the side facing the positioning head 37. The positioning point plate 33 rotates within a set angle range as the fixed shaft 27 rotates. Within this angle range, each positioning head 37 will only coincide with the center of the corresponding detection sensor 38 once. Preferably, the size of the positioning head 37 corresponds exactly to the probe of the detection sensor 38. When the vacuum chamber swings up and down and rotates, the positioning plate 33 also rotates around the fixed axis. The movement trajectory of the positioning head 37 is an arc curve. Only one detection sensor 38 is set to appear on the arc curve trajectory of one positioning head. Of course, the radial distance between each positioning head 37 and the axis of the fixed axis 27 can be set to be different. In this case, within the range of rotation of the vacuum chamber 9, a positioning point is configured for each positioning head 37 and detection sensor 38. Then, the positioning point of each positioning head and detection sensor can be used as a positioning point to provide a positioning signal for locking the rotation of the roller 29. For example, the positioning signal of the positioning point can be used to control the action of the lifting mechanism 13, so that the vacuum chamber 9 can obtain three rotational positioning states: tilting upward, horizontal, and tilting downward. Furthermore, the positioning pin hole can be an elongated arc-shaped hole, which facilitates the adjustment of the fixed position of the positioning head 37, thereby adjusting more different positioning positions within the pitch range of the vacuum cavity and providing more operational variations.

[0045] As described above, in a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention, please refer to... Figures 6 to 7As shown, a rotating connection structure is provided between the bottom of the roller and the corresponding bottom surface of the vacuum chamber. The rotating connection structure includes a fixed part of the central disc 39 and a rotating part of the bottom ring 43. The central disc 39 is fixed to the inner side of the bottom surface of the vacuum chamber 9 and is concentrically arranged with the bottom surface of the vacuum chamber 9. Rotating wheels are provided on the outer peripheral side of the central disc 39 at fixed angular distances, and the rotating wheels protrude from the outer peripheral surface of the central disc 39. The bottom of the roller is a ring structure. The inner diameter of the bottom ring 43 matches the outer diameter of the central disc 39. The thickness of the central disc 39 is greater than the thickness of the bottom ring 43. The bottom ring 43 is sleeved on the outer periphery of the central disc 39, and its inner side is directly in contact with the rotating wheel. Preferably, the bottom ring 43 is tightly attached to the rotating wheel on the outer peripheral side of the central disc 39, so that the bottom ring 43 is rotated and fixed by being sleeved on the periphery of the central disc 39. A rotary transmission track 46 is provided on one side of the bottom ring 43 of the drum, facing the bottom surface of the vacuum chamber 9. The output end 45 of a sealed coupling passes through the transmission hole on the bottom surface of the vacuum chamber and is linked to the rotary transmission track 46. The sealed coupling is fixed to the outside of the bottom surface of the vacuum chamber, and the drum frequency conversion motor is connected to the coupling. Thus, driven by the drum frequency conversion motor, the bottom ring 43 rotates around the central disc 39, thereby driving the entire drum to rotate and realizing the function of tumbling product materials during drum cleaning.

[0046] In a preferred embodiment of the drum-type vacuum plasma cleaning device of the present invention as described above, the rotating wheel is a metal bearing 42. The rotating wheel is installed in a roller groove opened in the periphery of the central disk. The roller groove has an opening on the outer circumferential surface of the central disk. The outer periphery of the bearing protrudes from the opening and can roll into contact with the inner circumferential surface of the bottom ring 43. The roller groove has a connecting locking screw hole groove on both sides. The roller groove and the locking screw hole groove are covered with a groove cover plate 41. The groove cover plate 41 is locked to the screw hole of the locking screw hole groove by bolts. The outer side of the groove cover plate 41 is flush with the surface of the central disk 39. The rotary transmission track 46 is a groove with meshing teeth on the side of the track. The output end 45 of the sealing coupling has meshing teeth on the side that cooperate with the meshing teeth. The output end of the sealing coupling rotates to drive the bottom ring 43 to rotate around the central disk. This invention ingeniously designs a bearing as the support structure for rolling contact between the bottom ring and the cylinder, instead of using conventional iron ball supports or ordinary roller supports. In this way, a sufficiently dense number of bearing wheels are provided on the outer circumference of the central disk, which can ensure more accurate and stable coaxiality between the bottom ring and the central disk in the dynamic movement state, and avoid abnormal problems such as vibration or deformation of the roller due to the tilt of the center of gravity.

[0047] In a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention as described above, the electrode rod is mounted on the electrode mounting hole 40 of the central disk. The electrode mounting hole 40 is located at the center of the central disk 39, or, when the central disk 39 is vertically arranged, at a position within the central disk 39 that is upwards and away from the center by a predetermined distance. In a conventional embodiment, the electrode rod mounting hole is located at the center of the central disk. In a more preferred embodiment, the electrode rod mounting hole 40 is located slightly above the center of the central disk 39. This arrangement increases the distance between the electrode rod 26 and the lower surface of the drum when a large amount of product material is loaded, increasing the loading space for the product material and preventing the product material from easily impacting the electrode rod during tumbling.

[0048] As described above, in a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention, please refer to... Figure 6 As shown, the electrode rod passes through the electrode mounting hole 40 in a sealed manner and is insulated from the electrode mounting hole 40. The inner end of its main body extends to a set distance inside the drum 29; its outer end protrudes from the outer side of the bottom surface of the vacuum cavity 9 and is electrically connected to one pole of the plasma radio frequency power supply; the other pole of the plasma radio frequency power supply is electrically connected to the drum. The electrode rod 26 and the drum wall of the drum 29 form two poles for discharging and ionizing the process gas. The electrode rod 26 extends into the inside of the drum 29, forming two electrodes with the drum to excite the plasma gas. This design allows for a more comprehensive and complete filling of the plasma gas inside the drum 29.

[0049] As described above, in a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention, please refer to... Figure 6 As shown, the electrode rod is provided with a cooling water channel, which includes an inlet channel and a drain channel. The inlet channel extends from the inlet at the outer end of the electrode rod 26 to the inner end of the electrode rod 26. The drain channel communicates with the inlet channel at the inner end of the electrode rod 26, is arranged parallel to the inlet channel, and extends to the drain outlet at the outer end of the electrode rod. The inlet and drain outlets are respectively connected to a chiller 3 via a hose bundle. In a preferred embodiment, cooling water is injected into the cooling water channel by an external chiller 3, flows into the electrode rod 26, and then flows out, to cool the electrode rod and ensure that the electrode rod operates at an optimal temperature. In a general embodiment, the cooling water channel and the drain channel can be implemented as two parallel channels connected at the inner end of the electrode rod 26, i.e., the pipeline turns around, so that cooling water can enter from the outer end of the electrode rod and return to drain, forming a cooling water circulation.

[0050] In a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention as described above, the water inlet channel is located at the central axis of the electrode rod 26, and the drain channel is an annular channel surrounding the water inlet channel; a shield is provided on the outer side of the outer end of the electrode rod 26. Preferably, the water inlet channel inside the electrode rod is a channel located at the central axis of the electrode rod, while the drain channel is an annular channel that disperses after the water inlet channel reaches the inner end, returning to the outer end of the electrode rod 26 and discharging the heated cooling water outward; thereby, the low-temperature cooling water can enter the interior of the electrode rod as much as possible, and after entering the annular drain channel closer to the surface of the electrode rod, the thermally conductive contact area can be effectively expanded, resulting in better cooling of the electrode rod.

[0051] In a preferred embodiment of the drum-type vacuum plasma cleaning apparatus of the present invention as described above, please refer to... Figures 1 to 4 The vacuum chamber 9 has a matching device 10 at its top that connects the plasma radio frequency power supply and the electrode rod 26; a vacuum valve 16 and a vacuum gauge 19 are provided outside the vacuum vent; a vacuum breaking valve hole is provided on the central disk 39, and a vacuum breaking valve 20 is sealed to the outside of the vacuum chamber 9; a support bar 30 extending along the length of the roller 26 is provided on the inner side of the roller, the support bar 30 has inclined surfaces on both sides, and a rounded chamfer at its top; a rotational support structure is provided on the inner side of the vacuum chamber to keep the roller axis coaxial with the vacuum chamber 9; a viewing window is provided on the chamber door 28; and a sensor is provided on the door lock of the chamber door 28.

[0052] In this preferred embodiment, as shown in the figure, the control cabinet houses multiple functional devices, which are connected to the roller device via a rear wiring harness 18 to control the overall operation of the equipment. The power supply 2 is a plasma radio frequency power supply with a visual window for real-time monitoring of its operating status. The chiller 3 is connected to the electrodes inside the shielding cover 21 via the wiring harness 18 to cool the electrode rods. The touch-screen operation panel 4 controls the equipment through the control system, setting all operating steps and process parameters. The button operation area 5 includes a key switch, an emergency stop button, and three up / down position buttons (tilt up, horizontal, and tilt down), allowing manual operation of the equipment. The status indicator light 6 displays the real-time operating status of the equipment. The frame 8 houses the vacuum chamber, which is fixed above it. The cylindrical vacuum chamber 9 is controlled by a program button to allow the lifting mechanism 13 to swing up or down, for example, tilting up when loading and tilting down when unloading. Matching device 10: This part is fixed above the vacuum chamber and moves synchronously with the chamber. The vacuum chamber contains a moving mechanism. When plasma is generated, instability occurs due to movement. This matching device matches the load inside the vacuum chamber to achieve a stable plasma output. Receiving hopper 11: After material processing, the lifting mechanism 13 pushes the vacuum chamber downwards and opens the chamber door 26, allowing the material to be poured into the receiving box below, preventing damage from excessive height during pouring. Vacuum pump 12: Connected to the internal chamber of the vacuum chamber via a vacuum hose 22, it controls the required vacuum level within the chamber. Lifting mechanism 13: Lifts and moves the vacuum chamber via a lever mechanism. Visual observation window 14: Allows observation of the internal operation of the chamber. Integrated casters: Allows for easy relocation of the equipment. Vacuum valve 16: Opens when the control system sends a signal, allowing the vacuum chamber to be emptied and restored to standard atmospheric pressure. Shielding covers 17 and 21: Used to isolate 13.56MHz radio frequency electromagnetic waves. Wire harness 18: The conduit connecting the control cabinet to the vacuum chamber circuitry. Vacuum gauge 19: Detects the vacuum level within the vacuum chamber, controlled and displayed on the equipment's touchscreen panel by the control system; optimal display range is 1-103000 Pa. Hole-breaking valve 20: After each process step is completed, the valve opens via program control to break the vacuum and restore the vacuum chamber to standard atmospheric pressure. Vacuum hose 22: The conduit connecting the vacuum pump to the vacuum chamber, used to remove air from the chamber; the hose is made of flexible material and can deform with the vacuum chamber's movement. Cabinet exhaust fan 23: Multiple exhaust fans are installed on the cabinet to dissipate heat from the internal components. Equipment process board 24: Connects to the power supply, air supply, and external signals required for equipment operation. Cabinet rear door panel 25: Directly facing the built-in 13.56MHz RF power supply; the power supply is high-voltage output. This door panel is locked and requires screw removal to open, ensuring the safe and normal operation of the plasma RF power supply.Electrode rod 26: The plasma radio frequency power supply generates plasma within the cavity through this device. When heat is generated, it is cooled by a chiller 3. Vacuum cavity fixing shaft 27: This shaft is mounted on the frame and housed in bearings to allow for cavity movement. Cavity door 28: The door is manually opened and closed, and a sensor structure is installed on the door to provide feedback on its open or closed status. Roller 29: The roller's rotation is controlled by a roller frequency converter motor 15, and the rotation speed can be set via the operation panel. Roller support bar 30: This device prevents cavity deformation due to stress differences during roller rotation.

[0053] In a preferred embodiment of the present invention, the use of specified cleaning method steps can achieve better cleaning results, optimize cleaning time, reduce user production costs, and effectively improve product competitiveness. Preferably, the plasma cleaning steps for the product materials are as follows:

[0054] Open the cavity door, and use the main unit to control the lifting mechanism to lift the opening end of the vacuum cavity, keeping the vacuum cavity in an upright position, and pour in the material to be cleaned; then control the lifting mechanism to return the vacuum cavity to a horizontal position and close the cavity door;

[0055] Start the vacuum pump and open the vacuum valve to evacuate the inside of the vacuum chamber; when the vacuum level reaches 50 Pa, start the roller frequency conversion motor to drive the roller to rotate at a speed of 8 rpm.

[0056] When the vacuum level in the vacuum chamber reaches 30 Pa, process gas is introduced. When the argon gas flow rate reaches 100 sccm, the plasma radio frequency power supply is activated to output energy between the electrode rod and the roller, generating and filling the vacuum chamber with plasma. The chiller is then activated, with the temperature set to 28℃ and the power set to 800 watts, to perform plasma cleaning on the material for 50 seconds.

[0057] Argon process gas was introduced at a flow rate of 80 sccm, and the drum was kept at a speed of 8 rpm for 50 seconds of plasma cleaning treatment.

[0058] Argon gas was introduced at a flow rate of 50 sccm, and the drum speed was maintained at 5 rpm. The material was then subjected to plasma cleaning for 200 seconds.

[0059] After repeating the above process of filling with gas and cleaning 5 times, the process is completed. Turn off the plasma radio frequency power supply, turn off the process gas source, turn off the vacuum pump and vacuum valve, open the rupture valve, and the pressure in the vacuum chamber returns to the standard atmospheric pressure value, completing the vacuum breaking action; open the chamber door, control the vacuum chamber opening to tilt downward, and pour out the cleaned product material.

[0060] Stop the drum rotation and process gas input, shut off the energy output of the electrode rod, and automatically activate the venting valve;

[0061] Open the cavity door and tilt the vacuum cavity opening downwards to pour out the processed material.

[0062] The drum-type vacuum plasma cleaning device of the present invention, by adopting the above-mentioned preferred cleaning steps and methods, can achieve better cleaning results. It can not only achieve high-quality cleaning of large batches of small product materials, but also effectively reduce the user's cleaning time and cleaning costs.

[0063] The drum-type vacuum plasma cleaning device of this invention completely changes the conventional cleaning method of placing products for spraying by cleverly utilizing the structure of the drum. It is particularly suitable for small products, and even products with complex, non-uniform surfaces, allowing for simultaneous, large-volume single-cycle cleaning. Without the need to hold the products in place, the drum's tumbling mechanism achieves comprehensive cleaning of the product's surface from all angles, not only doubling the number of products cleaned at one time but also achieving excellent cleaning results, significantly improving processing efficiency. Furthermore, the drum cleaning method changes the conventional loading and unloading methods, reducing the complexity and amount of manual operation, lowering the user's production costs for product cleaning and processing, and making it more competitive in the market for surface treatment of large batches of small materials.

[0064] The above description is merely an illustrative embodiment of the present invention and is not intended to limit the scope of the invention. Any equivalent changes and modifications made by those skilled in the art without departing from the concept and principles of the present invention should fall within the scope of protection of the present invention.

Claims

1. A drum-type vacuum plasma cleaning apparatus, characterized by comprising: The application relates to a cleaning device, which comprises a control cabinet and a cleaning main body, the control cabinet is internally provided with a control host and a power supply, the cleaning main body is provided with a rack and a roller device, the rack is a vertical U-shaped rack, the upper parts of the two sides of the rack are provided with roller fixing parts, the roller device comprises a horizontally-arranged cylindrical vacuum cavity, the two sides of the vacuum cavity are provided with fixing shafts which can be rotatably fixed in the fixing parts; the front end of the vacuum cavity is provided with a cavity door, after the cavity door is closed, a sealed space is formed in the vacuum cavity; a roller coaxial with the vacuum cavity is arranged in the cavity, the bottom of the roller is provided with a rotating connection structure which can be rotatably fixed with the bottom surface of the cylindrical vacuum cavity; the rotating connection structure comprises a fixed part and a rotating part, the fixed part is provided with an electrode mounting hole, a vacuum hole and a process gas hole which are communicated with the outside, an electrode rod is sealingly inserted in the electrode mounting hole, the electrode rod is electrically connected with the power supply, the process gas hole is connected with a process gas source device, and the vacuum hole is connected with a vacuum pump; the rotating part is connected with a roller frequency conversion motor arranged outside the vacuum cavity and drives the roller to rotate; one side below the vacuum cavity is provided with a lifting mechanism which drives the vacuum cavity to rotate around the fixing shaft; the control host is electrically connected with and controls the power supply, the lifting mechanism, the vacuum pump, the process gas source device and the roller frequency conversion motor; the rotating connection structure between the bottom of the roller and the corresponding bottom surface of the vacuum cavity comprises a fixed part of a center disc and a rotating part of a bottom circular ring, the center disc is fixed to the inner side of the bottom surface of the vacuum cavity and is coaxially arranged with the bottom surface of the vacuum cavity, rotating wheels are fixed on the outer circumferential side of the center disc at intervals of a fixed angle, and the rotating wheels protrude from the outer circumferential surface of the center disc; the bottom of the roller is a circular ring, the inner diameter of the circular ring matches the outer diameter of the center disc, the thickness of the center disc is greater than that of the bottom circular ring, the bottom circular ring is sleeved on the outer periphery of the center disc, and the inner side of the bottom circular ring is arranged opposite to and contacts the rotating wheels; one side of the bottom circular ring opposite to the bottom surface of the vacuum cavity is provided with a rotary transmission track, the output end of a sealing shaft coupling passes through a transmission hole in the bottom surface of the vacuum cavity and is connected with the rotary transmission track in linkage, the sealing shaft coupling is fixed to the outer side of the bottom surface of the vacuum cavity, and the shaft coupling is connected with the roller frequency conversion motor; the electrode rod sealingly passes through the electrode mounting hole and is insulated from the electrode mounting hole, the inner end of the main body part of the electrode rod extends to a certain distance inside the roller, the outer end of the electrode rod protrudes from the outer side of the bottom surface of the vacuum cavity and is electrically connected with one pole of a plasma radio frequency power supply, the other pole of the plasma radio frequency power supply is electrically connected with the roller, and the electrode rod and the cylinder wall of the roller form two poles of a discharge ionization process gas.

2. The drum-type vacuum plasma cleaning apparatus as claimed in claim 1, wherein The drum fixed part is provided with a drum rotating connection mechanism, which is provided with a fixed shaft base and a fixed bearing assembly. The fixed shaft base is provided with the fixed shaft on the outward side. The other side of the fixed shaft base is fixed on an arc surface connecting seat. The inner side of the arc surface connecting seat is an arc surface that is attached to the outer side surface of the vacuum cavity. The arc surface connecting seat is fixed on the outer surface of the vacuum cavity. The fixed bearing assembly includes an Ω-shaped bearing seat. The bearing seat is provided with a rotating bearing. The fixed shaft is inserted into the rotating bearing. The bottom of the bearing seat and the top of the rack are provided with a connecting seat plate.

3. The roller vacuum plasma cleaning apparatus as set forth in claim 2, wherein The drum rotating connection mechanism is provided with a positioning device, which includes a positioning point plate arranged on the fixed shaft base and a detection point plate arranged on the connecting seat plate. The positioning point plate is provided with at least three positioning pin holes at a specified distance away from the fixed shaft and at different angles around the fixed shaft. The positioning pin holes are provided with positioning heads outwardly. The detection point plate is an L-shaped plate that is fixed on the connecting seat plate and is upwardly bent. The upward vertical part of the detection point plate is provided with detection holes at specified positions. The detection holes are provided with detection sensors. The detection sensors are arranged opposite to the positioning heads. The positioning point plate rotates by a specified angle range when the fixed shaft rotates. In the angle range, each positioning head is only coincident with the center of a corresponding detection sensor once.

4. The roller vacuum plasma cleaning apparatus as set forth in claim 3, wherein The rotating wheel is a metal bearing. The rotating wheel is installed in a roller groove arranged on the periphery of the center disc. The roller groove is provided with an opening on the outer periphery of the center disc. The outer periphery of the bearing protrudes from the opening and can rollably contact the inner periphery of the cylinder bottom ring. The two sides of the roller groove are provided with communicating locking screw hole grooves. The roller groove and the locking screw hole groove are covered with a groove cover plate. The groove cover plate is locked to the screw holes of the locking screw hole groove through bolts. The outer side of the groove cover plate is flush with the surface of the center disc. The rotating transmission track is a groove provided with meshing teeth on one side. The output end of the sealing coupling is provided with meshing teeth that match the meshing teeth. The output end of the sealing coupling rotates to drive the cylinder bottom ring to rotate around the center disc.

5. The roller vacuum plasma cleaning apparatus as defined in claim 4, wherein The electrode rod is installed on the electrode mounting hole of the center disc. The electrode mounting hole is arranged at the center of the center disc or at a position inside the center disc at a specified distance away from the center when the center disc is vertically arranged.

6. The roller vacuum plasma cleaning apparatus as set forth in claim 5, wherein, The electrode rod is provided with a cooling water channel. The cooling water channel includes a water inlet channel and a water outlet channel. The water inlet channel extends from the water inlet at the outer end of the electrode rod to the inner end of the electrode rod. The water outlet channel is in communication with the water inlet channel and is arranged parallel to the water inlet channel. The water outlet channel extends to the water outlet at the outer end of the electrode rod. The water inlet and the water outlet are connected to a cold water machine through a hose.

7. The roller vacuum plasma cleaning apparatus as set forth in claim 6, wherein The water inlet channel is arranged on the central axis of the electrode rod, and the water outlet channel is an annular channel arranged around the water inlet channel; a shielding cover is arranged outside the outer end of the electrode rod.

8. The roller-type vacuum plasma cleaning apparatus as claimed in claim 1 or 7, wherein A matcher connected to a plasma radio frequency power source and the electrode rod is arranged on the top of the vacuum cavity; a vacuum valve and a vacuum gauge are arranged outside the vacuum hole, a vacuum breaking valve hole is arranged on the center disc, and a vacuum breaking valve is sealingly connected to the vacuum breaking valve hole outside the vacuum cavity; a support strip extending along the length direction of the roller is arranged on the inner side of the roller, and a slope is arranged on both sides of the support strip, and a circular arc chamfer is arranged on the top of the support strip; a rotating support structure for keeping the axis of the roller coaxial with the vacuum cavity is arranged on the inner side of the vacuum cavity; a viewing window is arranged on the cavity door; and a sensor is arranged on the door lock of the cavity door; The method further comprises a step of plasma cleaning of the product material: The cavity door is opened, the lifting mechanism is controlled by the main machine to lift the open end of the vacuum cavity, the vacuum cavity is kept in an upward state, and the product material to be cleaned is poured in; the lifting mechanism is controlled to return the vacuum cavity to a horizontal state, and the cavity door is closed; The vacuum pump is started, the vacuum valve is opened, and the vacuum pump is started to pump the inside of the vacuum cavity; when the vacuum degree reaches 50 Pa, the frequency conversion motor of the roller is started to drive the rotation of the roller, and the rotation speed of the roller is 8 rpm; When the vacuum degree in the vacuum cavity reaches 30 Pa, process gas is filled, when the flow rate of the filled argon gas reaches 100 sccm, the plasma radio frequency power source is started to output energy between the electrode rod and the roller, and plasma is generated and filled in the vacuum cavity; The water chiller is started, the temperature is set to 28 DEG C, the power is 800 W, and the plasma cleaning treatment of the material is performed for 50 seconds; Process gas argon is filled at a flow rate of 80 sccm, and the roller is kept at a rotation speed of 8 rpm for plasma cleaning treatment of the material for 50 seconds; Process gas argon is filled at a flow rate of 50 sccm, and the roller is kept at a rotation speed of 5 rpm for plasma cleaning treatment of the material for 200 seconds; After the above gas filling and cleaning process is repeated 5 times, the treatment is completed, the plasma radio frequency power source is turned off, the process gas source is turned off, the vacuum pump and the vacuum valve are turned off, the vacuum breaking valve is opened, the pressure in the vacuum cavity is returned to the standard atmospheric pressure value, the vacuum breaking operation is completed, the cavity door is opened, the opening of the vacuum cavity is controlled to be inclined downward, and the cleaned product material is poured out; The rotation of the roller and the input of the process gas are stopped, the energy output of the electrode rod is turned off, and the vacuum breaking valve is automatically started; The cavity door is opened, the opening of the vacuum cavity is controlled to be inclined downward, and the treated material is poured out.

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