Aerosol coating device, method and application

Abstract

The invention provides an aerosol coating device and method and application, and belongs to the technical field of aerosol coating. The device comprises an airtight stirring chamber and an airtight coating chamber, a first carrier gas channel penetrates through the stirring chamber to be communicated with the coating chamber, and the first carrier gas channel is provided with a powder inlet in the stirring chamber; a powder tank is arranged in the stirring chamber, a stirring device is arranged in the powder tank, and the stirring device comprises a stirring shaft and stirring rods installed on the periphery of the stirring shaft; a conveying device is arranged between the powder tank and the powder inlet; the stirring chamber is communicated with a second carrier gas channel; a deposition device is arranged in the coating chamber, and a nozzle of the deposition device is communicated with the first carrier gas channel; the coating chamber is communicated with a vacuum pump. Loose powder is obtained in a stirring mode, vibration is avoided in the powder feeding process, the factor of powder particle friction agglomeration caused by vibration is reduced, and the coating device has the advantages of being short in coating time, high in coating efficiency and good in film forming quality.

Description

Technical Field

[0001] The present invention belongs to the technical field of aerosol coating, and in particular relates to an aerosol coating device, method and application. Background Art

[0002] The information disclosed in this background technology section is only intended to enhance the understanding of the overall background of the invention, and should not necessarily be regarded as an admission or any form of suggestion that the information constitutes the prior art already known to a person skilled in the art.

[0003] The application of ceramic components in electronic components is gradually increasing. In order to adapt to the development direction of miniaturization / integration of electronic components, ceramic materials are usually added to electronic components in the form of coatings. Usually, the preparation of ceramic materials requires sintering at a temperature above 1000°C. However, many ceramic materials are difficult to form a dense structure at high temperatures, and layered ceramic films cannot be prepared. Aerosol Deposition Method (ADM) is a technology that fluidizes (sub) micron ceramic powder particle raw materials at room temperature, accelerates them to a speed of 100 to 600 m / s, and then impacts the substrate in a low vacuum environment to form a ceramic film. The fluidized ceramic powder particle raw materials will be sprayed in the form of aerosol, and after colliding with the substrate, they will be broken into nano-sized fragments. These fragments will recombine to form the desired ceramic film.

[0004] The prior art usually places ceramic powder in a vibration chamber, loosens it by applying vibration, and then passes a carrier gas through the loose powder to aerosolize the ceramic powder. However, submicron to micron-sized particles have a small size and a high specific surface area. Due to reasons such as surface electrostatic charge and van der Waals force interaction, they have a strong tendency to agglomerate and easily agglomerate to form agglomerates. Agglomerates can reduce deposition efficiency and film quality. When a mechanical vibration system is used to generate aerosols, this agglomeration can even be enhanced, which has an adverse effect on the performance of ceramic films. Summary of the invention

[0005] In view of the deficiencies in the prior art, the purpose of the present invention is to provide an aerosol coating device, method and application, so as to avoid obtaining aerosol in a vibration manner, thereby obtaining a dense ceramic film and achieving controllable coating thickness.

[0006] In order to achieve the above object, the technical solution of the present invention is:

[0007] In a first aspect, an aerosol coating device comprises an airtight stirring chamber and an airtight coating chamber, a first carrier gas channel passes through the stirring chamber and communicates with the coating chamber, and a powder inlet is arranged in the stirring chamber for the first carrier gas channel;

[0008] The stirring chamber is provided with a powder tank, and the powder tank is provided with a stirring device, and the stirring device includes a stirring shaft and a stirring rod installed on the periphery of the stirring shaft; a conveying device is provided between the powder tank and the powder inlet; the stirring chamber is connected with a second carrier gas channel;

[0009] A deposition device is arranged in the coating chamber, and a nozzle of the deposition device is connected to a first carrier gas channel; the coating chamber is connected to a vacuum pump.

[0010] In a second aspect, an aerosol coating method based on the above-mentioned aerosol coating device comprises the following steps:

[0011] S1. Filling the powder tank with raw material powder and installing the substrate in the deposition device;

[0012] S2, turning on the vacuum pump until the vacuum degree of the coating chamber reaches the set requirement, starting the stirring device and the conveying device, and conveying the carrier gas through the first carrier gas channel and the second carrier gas channel respectively;

[0013] S3. The stirred and loosened raw material powder is quantitatively allowed to enter the first carrier gas channel through the powder inlet, and is ejected from the nozzle of the deposition device in the form of aerosol to form a ceramic film on the substrate.

[0014] A third aspect is the application of the above-mentioned aerosol coating method in the preparation of electronic components.

[0015] The beneficial effects of the present invention are:

[0016] The present invention provides an aerosol coating device, which uses stirring to obtain loose powders, and the powder feeding process is vibration-free, thereby reducing the friction and agglomeration factors of powder particles caused by vibration; the powder and the carrier gas enter the first carrier gas channel to form an aerosol, and the aerosol is flushed at high speed by the carrier gas at the powder inlet, especially the contraction and expansion section of the venturi tube adjusts the airflow state, which can further solve the problem of powder particle agglomeration. The present invention quantitatively transports powder through a conveying device, which can ensure that the aerosol density is always uniform throughout the entire coating process, effectively control the coating state, and significantly reduce the amount of gas consumed in the aerosolization process. It has the advantages of low equipment and use costs, simple equipment structure, easy operation, short coating time, high coating efficiency, and good film quality, thereby being able to obtain electronic devices with better performance. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The accompanying drawings in the specification, which constitute a part of the present invention, are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute improper limitations on the present invention.

[0018] Figure 1 It is a schematic diagram of the structure of the aerosol coating device in Example 1 of the present invention.

[0019] Figure 2 It is a schematic diagram of the structure of the powder tank and the conveying device in Example 1 of the present invention.

[0020] Figure 3 These are microscopic photographs of the products prepared in Examples 2, 3 and 4 of the present invention, wherein (a) is a microscopic photograph of the ceramic film prepared in Example 2, (b) is a microscopic photograph of the ceramic film prepared in Example 3, and (c) is a microscopic photograph of the ceramic film prepared in Example 4.

[0021] Figure 4 1 is a graph showing the test results of the ceramic film prepared in Example 3 of the present invention, wherein (a) is a hysteresis loop graph, (b) is a leakage current test result, and (c) is a hysteresis loop graph.

[0022] Among them: 1. Conveying device; 2. Powder tank; 3. Stirring device; 4. Stirring driving device; 5. Motor; 6. Venturi tube; 7. Nozzle; 8. Three-dimensional motion table; 9. Coating chamber; 10. Vacuum pump; 11. Carrier gas source; 12. Flow meter; 13. First carrier gas channel; 14. Stirring chamber; 15. Second carrier gas channel; 21. Powder tank opening; 22. Raw material powder; 23. Stirring shaft. DETAILED DESCRIPTION

[0023] It should be noted that the following detailed descriptions are exemplary and are intended to provide further explanation of the present invention. Unless otherwise specified, all technical and scientific terms used herein have the same meanings as those commonly understood by those skilled in the art to which the present invention belongs.

[0024] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0025] An aerosol coating device comprises an airtight stirring chamber and an airtight coating chamber, a first carrier gas channel passes through the stirring chamber and communicates with the coating chamber, and a powder inlet is arranged in the stirring chamber for the first carrier gas channel;

[0026] The stirring chamber is provided with a powder tank, and the powder tank is provided with a stirring device, and the stirring device includes a stirring shaft and a stirring rod installed on the periphery of the stirring shaft; a conveying device is provided between the powder tank and the powder inlet; the stirring chamber is connected with a second carrier gas channel;

[0027] A deposition device is arranged in the coating chamber, and a nozzle of the deposition device is connected to a first carrier gas channel; the coating chamber is connected to a vacuum pump.

[0028] In the above device, the powder tank is used to store raw material powder; the stirring device is used to make the raw material powder reach an appropriate dispersed state, so that the conveying device can quantitatively control the powder feeding amount, and the conveying device can easily achieve quantitative transportation and ensure the continuity of powder supply by adjusting the running speed;

[0029] Optionally, the first carrier gas channel and the second carrier gas channel are connected to a carrier gas source, respectively. The first carrier gas channel is used to form aerosol from raw material powder and transport it to a coating chamber. The other end of the first carrier gas channel is connected to a nozzle. The powder is fluidized and carried to the coating chamber by the carrier gas. The powder is accelerated and ejected through the nozzle, broken and reorganized on the substrate to form a thin film. The second carrier gas channel is used to balance the air pressure in the stirring chamber. Based on the need to quantitatively control the carrier gas flow rate, flow meters are respectively provided on the first carrier gas channel and the second carrier gas channel.

[0030] Optionally, the opening position of the powder inlet is a bell-mouth, and the connecting device between the powder inlet and the first carrier gas channel is an ordinary three-head channel or a Venturi tube. The Venturi tube can be used to enhance powder deagglomeration, generate a uniformly dispersed aerosol, and better solve the problem of powder agglomeration and the resulting problem of loose and porous quality of the final film.

[0031] Optionally, a powder tank opening is provided at the bottom of the powder tank, and a conveying device is provided below the powder tank opening. The conveying device and the powder tank opening are separated by a set distance, so that the raw material powder can be leaked onto the conveying device in a quantitative manner; the end of the conveying device is located above the powder inlet, so that the raw material powder enters the first carrier gas channel under the action of gravity and carrier gas to form an aerosol.

[0032] Optionally, the stirring shaft is arranged at the central axis of the powder tank, and the stirring rod is used to level the powder raw material; since the stirring rod is parallel to the bottom surface of the powder tank, the powder raw material can reach the opening position of the powder tank with a set looseness.

[0033] Optionally, the conveying device is a conveying belt or a rotating wheel, and the conveying belt or the rotating wheel controls the movement or rotation speed through a motor, so that different operating speeds of the conveying devices can be used to meet different powder supply requirements.

[0034] Optionally, the deposition device includes a three-dimensional motion table, which is located on the opposite side of the nozzle. A substrate is placed on the three-dimensional motion table. The three-dimensional motion table can be programmed to move along the X / Y / Z axes to complete the deposition of the thin film and control the film shape of the thin film. A mask plate can be placed on the surface of the substrate to achieve patterned deposition.

[0035] Optionally, the nozzle is a knife-edge nozzle outlet or a round-mouth nozzle.

[0036] An aerosol coating method based on the above-mentioned aerosol coating device comprises the following steps:

[0037] S1. Filling the powder tank with raw material powder and installing the substrate in the deposition device;

[0038] S2, turning on the vacuum pump until the vacuum degree of the coating chamber reaches the set requirement, starting the stirring device and the conveying device, and conveying the carrier gas through the first carrier gas channel and the second carrier gas channel respectively;

[0039] S3. The stirred and loosened raw material powder is quantitatively allowed to enter the first carrier gas channel through the powder inlet, and is ejected from the nozzle of the deposition device in the form of aerosol to form a ceramic film on the substrate.

[0040] The above process does not involve vibration, and the raw material powder is subjected to the impact and shear of the carrier gas during the formation of aerosol, so the agglomeration of powder particles can be reduced, thereby obtaining a ceramic film with fewer internal defects, more density and easier to control thickness.

[0041] Optionally, in S1, the stirring chamber and the coating chamber are closed to make them airtight chambers.

[0042] Optionally, in S1, the particle size of the raw material powder is between 100 nm and 3 μm.

[0043] Optionally, in S2, the carrier gas includes one or more of nitrogen, argon, helium, oxygen, hydrogen and compressed air.

[0044] Optionally, in S3, the amount of raw material powder entering the first carrier gas channel is adjusted by adjusting the conveying speed of the conveying belt and the distance between the conveying belt and the opening of the powder tank; the larger the distance between the conveying belt and the opening of the powder tank, the more powder leaks onto the conveying belt; the greater the conveying speed of the conveying belt, the more powder is fed into the powder inlet.

[0045] Application of the above-mentioned aerosol coating device method in the preparation of electronic components.

[0046] Optionally, the raw material powder includes one or more of aluminum oxide, yttrium oxide, lead zirconate titanate and barium titanate.

[0047] Optionally, the substrate is an organic substrate, an inorganic non-metallic substrate or a metal substrate, including materials such as silicon, glass, nickel, copper, stainless steel and PVC.

[0048] Optionally, a mask plate is disposed on the substrate to achieve patterned deposition.

[0049] Optionally, the device is annealed after deposition.

[0050] Example 1

[0051] An aerosol coating device, such as Figure 1 As shown, it includes an airtight stirring chamber 14 and an airtight coating chamber 9, a first carrier gas channel 13 passes through the stirring chamber 14 and communicates with the coating chamber 9, and a powder inlet is set in the first carrier gas channel 13 in the stirring chamber 14;

[0052] The stirring chamber 14 is provided with a powder tank 2, and the powder tank 2 is provided with a stirring device 3, such as Figure 2 As shown, the stirring device 3 includes a stirring shaft 23 and a stirring rod installed on the periphery of the stirring shaft 23; a conveying device 1 is arranged between the powder tank 2 and the powder inlet; and the stirring chamber 14 is connected to a second carrier gas channel 15;

[0053] A deposition device is disposed in the coating chamber 9 , and a nozzle 7 of the deposition device is connected to a first carrier gas channel 13 ; the coating chamber is connected to a vacuum pump 10 .

[0054] The first carrier gas channel 13 and the second carrier gas channel 15 are connected to the carrier gas source 11 respectively. The first carrier gas channel 13 is used to form aerosol of the raw material powder 22 and transport it to the coating chamber 9. The other end of the first carrier gas channel 13 is connected to the nozzle 7. The powder is fluidized and carried to the coating chamber 9 by the carrier gas. The powder is accelerated and ejected through the nozzle 7, and is broken and reorganized on the substrate to form a thin film. The second carrier gas channel 15 is used to balance the air pressure in the stirring chamber 14. Based on the need to quantitatively control the carrier gas flow rate, flow meters 12 are respectively provided on the first carrier gas channel 13 and the second carrier gas channel 15.

[0055] The opening position of the powder inlet is a bell mouth, and the connecting device between the powder inlet and the first carrier gas channel 13 is a venturi tube 6. The venturi tube 6 can be used to strengthen the deagglomeration of the powder, generate a uniformly dispersed aerosol, and better solve the problem of powder agglomeration and the resulting loose and porous quality of the final film. The air pressure at the powder inlet is 0.3MPa, the minimum air flow rate can be less than 1L / min, and the minimum air flow rate in the first carrier gas channel 13 can be less than 3L / min.

[0056] like Figure 2 As shown, a powder tank opening 21 is provided at the bottom of the powder tank 2, and a conveying device 1 is provided below the powder tank opening 21. The conveying device 1 and the powder tank opening 21 are separated by a set distance, so that the raw material powder 22 can be quantitatively leaked onto the conveying device 1; Figure 1 As shown, the end of the conveying device 1 is located above the powder inlet, so that the raw material powder 22 enters the first carrier gas channel 13 under the action of gravity and carrier gas to form an aerosol.

[0057] like Figure 2As shown, the stirring shaft 23 is arranged on the central axis of the powder tank 2, the stirring rod is used to level the raw material powder 22, the stirring shaft 23 is connected to the stirring driving device 4, and the maximum rotation speed of the stirring shaft 23 is 50rpm; since the stirring rod is parallel to the bottom surface of the powder tank 2, the powder raw material can reach the position of the powder tank opening 21 with a set looseness.

[0058] The conveyor 1 is a conveyor crawler. The conveyor crawler controls the running speed through the motor 5 to meet the powder supply requirements at different crawler running speeds. The running speed of the conveyor crawler is finely controlled between 0.01mm / s-200mm / s, and the maximum powder delivery amount is 1cm 3 / min.

[0059] like Figure 1 As shown, the deposition device includes a three-dimensional motion table 8, which is located on the opposite side of the nozzle 7. A substrate is placed on the three-dimensional motion table 8. The three-dimensional motion table 8 can be controlled by programming to move along the X / Y / Z axes to complete the deposition of the thin film and control the film shape of the thin film. A mask plate can be placed on the surface of the substrate to achieve patterned deposition.

[0060] The nozzle 7 is designed based on the Laval expansion-contraction method and adopts two replaceable nozzles, including a knife-edge nozzle and a circular nozzle; the outlet size of the knife-edge nozzle is 0.4-205mm in length and 0.01-2mm in width; the outlet size of the circular nozzle is 0.1mm-18mm in diameter.

[0061] Example 2

[0062] A method for preparing an aerosol coating using the aerosol coating device in Example 1 (the raw material powder is alumina spherical and / or quasi-spherical powder with a particle size of less than 1 μm, and the substrate is made of glass) comprises the following steps:

[0063] S1. Fill the powder tank 2 with alumina powder, install a glass substrate on the three-dimensional motion table 8 of the deposition device, and then close the stirring chamber 14 and the coating chamber 9 to make it an airtight chamber.

[0064] S2, turn on the vacuum pump 10 to evacuate the chamber 14. Since the stirring chamber 14 is connected to the coating chamber 9, the vacuum degree of the two chambers is kept consistent at this time. When the vacuum degree of the coating chamber 9 reaches 5Pa, turn on the carrier gas source 11 to transport the carrier gas (nitrogen in this embodiment) through the first carrier gas channel 13 and the second carrier gas channel 15 respectively. The gas flow rate of the first carrier gas channel 13 is 8L / min, and the gas flow rate of the second carrier gas channel 15 is 2L / min to offset the negative pressure. Start the stirring device 3 at a speed of 60r / min and the conveyor belt at a running speed of 5mm / s, so that the powder delivery amount is 2mm. 3 ;

[0065] S3. The stirred loose raw material powder 22 is quantitatively allowed to enter the first carrier gas channel 13 through the powder inlet and is ejected from the nozzle 7 of the deposition device in the form of aerosol to form a ceramic thin film on the substrate, wherein the distance between the nozzle 7 and the substrate is 10 mm and the coating time is 5 minutes.

[0066] The obtained ceramic film is Figure 3 As shown in (a), it can be seen that the thickness of the Al2O3 film is about 1.2 μm, it is tightly bonded to the glass substrate, and the film cross-section is dense without obvious pores.

[0067] Example 3

[0068] A method for preparing an aerosol coating using the aerosol coating device in Example 1 (the raw material powder is a quasi-spherical lead zirconate titanate (PZT53 / 47) powder with an average particle size of 800 nm, and the substrate is made of silicon) comprises the following steps:

[0069] S1. Fill the powder tank 2 with lead zirconate titanate powder, install the silicon wafer substrate on the three-dimensional motion table 8 of the deposition device, and then close the stirring chamber 14 and the coating chamber 9 to make it an airtight chamber.

[0070] S2, turn on the vacuum pump 10 to evacuate the chamber. Since the stirring chamber 14 and the coating chamber 9 are connected, the vacuum degrees of the two chambers are kept consistent at this time. When the vacuum degree of the coating chamber 9 reaches 15Pa, turn on the carrier gas source 11 to transport the carrier gas (nitrogen in this embodiment) through the first carrier gas channel 13 and the second carrier gas channel 15 respectively. The gas flow rate of the first carrier gas channel 13 is 8L / min, and the gas flow rate of the second carrier gas channel 15 is 2L / min to offset the negative pressure. Start the stirring device 3 at a speed of 60r / min and the conveyor belt at a running speed of 5mm / s, so that the powder delivery amount is ~1.5mm 3 ;

[0071] S3. The stirred loose raw material powder 22 is quantitatively allowed to enter the first carrier gas channel 13 through the powder inlet and is ejected from the nozzle 7 of the deposition device in the form of aerosol to form a ceramic thin film on the substrate, wherein the distance between the nozzle 7 and the substrate is 10 mm and the coating time is 5 minutes.

[0072] The obtained ceramic film was annealed at 700°C to obtain a product such as Figure 3 As shown in (b), it can be seen that the thickness of the PZT film is about 1.6 μm, it fits tightly to the silicon substrate, and the film cross-section is dense without obvious pores.

[0073] The PZT film on the silicon wafer substrate was tested and the hysteresis loop was as follows: Figure 4 As shown in (a), the film has excellent ferroelectric properties; the leakage current is as follows Figure 4As shown in (b), the film has a small leakage current and excellent leakage performance. The dielectric properties are shown in Figure 4 As shown in (c), it shows that the film has excellent dielectric properties, corresponding to good ferroelectric properties.

[0074] Example 4

[0075] A method for preparing an aerosol coating using the aerosol coating device in Example 1 (the raw material powder is barium titanate (BTO) powder with a particle size of less than 1 μm, and the substrate is made of silicon) comprises the following steps:

[0076] S1. BTO powder is loaded into the powder tank 2, and a silicon wafer substrate is mounted on the three-dimensional motion table 8 of the deposition device, and then the stirring chamber 14 and the coating chamber 9 are closed to make it an airtight chamber.

[0077] S2, turn on the vacuum pump 10 to evacuate the chamber. Since the stirring chamber 14 and the coating chamber 9 are connected, the vacuum degrees of the two chambers are kept consistent at this time. When the vacuum degree of the coating chamber 9 reaches 15Pa, turn on the carrier gas source 11 to transport the carrier gas (nitrogen in this embodiment) through the first carrier gas channel 13 and the second carrier gas channel 15 respectively. The gas flow rate of the first carrier gas channel 13 is 8L / min, and the gas flow rate of the second carrier gas channel 15 is 2L / min to offset the negative pressure. Start the stirring device 3 at a speed of 60r / min and the conveyor belt at a running speed of 5mm / s, so that the powder delivery amount is ~1.5mm 3 ;

[0078] S3. The stirred loose raw material powder 22 is quantitatively allowed to enter the first carrier gas channel 13 through the powder inlet and is ejected from the nozzle 7 of the deposition device in the form of aerosol to form a ceramic thin film on the substrate, wherein the distance between the nozzle 7 and the substrate is 10 mm and the coating time is 5 minutes.

[0079] The obtained ceramic film was annealed at 600°C to obtain a product such as Figure 3 As shown in (c), it can be seen that the thickness of the BTO film is about 800nm, it fits tightly to the silicon substrate, and the film cross-section is dense without obvious pores.

[0080] The existing aerosol deposition coating technology, such as Japanese Patent Publication No. 2007-246937, uses gas to pass through a closed powder tank controlled by a shaker or a vibrating table to aerosolize the powder. In this process, the amount of powder aerosolization cannot be quantitatively controlled, such as: the generated aerosol has a high powder content at the initial stage, and the powder content of the generated aerosol decreases due to the reduction of powder in the tank in the later stage, so that the growth rate after the aerosol deposition film forming process changes significantly before and after, and the growth process and thickness of the film (coating) cannot be evaluated and regulated; in addition, in the process of powder aerosolization, due to the characteristics of submicron powders themselves that are easy to adsorb each other, superimposed on factors such as shaker vibration friction, it is very easy to cause serious agglomeration of powders, making the deposited film easy to become loose and porous or even fall off from the substrate surface; in the case of severe agglomeration, the powder cannot be aerosolized, resulting in the inability to carry out the film forming process.

[0081] In the technical solution of Example 1, the powder quantitative transport device transports the powder by a crawler belt, and the crawler belt is controlled and operated by a motor, and the fine quantitative control and transportation of the powder mass are completed by adjusting the motor speed; wherein the stirring device ensures the uniformity and continuity of the powder transported by the crawler belt; the aerosol generating device is composed of an air path system and an aerosol generating device, and the powder is collected through the upper funnel of the aerosol generating device by using the carrier gas of the air path system, and is fully mixed with the carrier gas flow to form an aerosol, and in this process, a high-pressure and high-speed carrier gas flow is generated by the three-way interface provided in the aerosol generating device, and the shearing effect of the gas flow on the powder is used to disperse part of the agglomerated powder; then, the air path system sends the aerosol into the aerosol deposition device, which consists of four parts: a vacuum chamber, a vacuum mechanical pump group, a nozzle and a three-dimensional motion platform; the aerosol in the air path system is accelerated by the nozzle to form a high-speed jet; then the jet impacts the substrate and forms a film; wherein the three-dimensional motion platform provides the function of substrate installation and movement to ensure the area and shape of the substrate deposited film. This method can achieve precise quantitative control of aerosol concentration, avoid powder agglomeration problems during the deposition process, improve film quality, and thereby obtain a more refined ceramic thin film structure as achieved in Examples 2 to 4.

[0082] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. An aerosol coating device, characterized in that: It comprises an airtight stirring chamber and an airtight coating chamber, wherein a first carrier gas channel passes through the stirring chamber and is connected to the coating chamber, and a powder inlet is arranged in the stirring chamber for the first carrier gas channel; The stirring chamber is provided with a powder tank, and the powder tank is provided with a stirring device, and the stirring device includes a stirring shaft and a stirring rod installed on the periphery of the stirring shaft; a conveying device is provided between the powder tank and the powder inlet; the stirring chamber is connected with a second carrier gas channel; A deposition device is arranged in the coating chamber, and a nozzle of the deposition device is connected to a first carrier gas channel; the coating chamber is connected to a vacuum pump.

2. The aerosol coating device according to claim 1, characterized in that: The first carrier gas channel and the second carrier gas channel are respectively connected to a carrier gas source.

3. The aerosol coating device according to claim 1, characterized in that: The powder inlet is a common three-way channel or a venturi tube; Optionally, a powder tank opening is provided at the bottom of the powder tank, a conveying device is provided below the powder tank opening, a terminal end of the conveying device is located above the powder inlet, and a set distance is provided between the conveying device and the powder tank opening.

4. The aerosol coating device according to claim 1, characterized in that: The stirring shaft is arranged on the central axis of the powder tank; Optionally, the conveying device is a conveying track or a rotating wheel.

5. The aerosol coating device according to claim 1, characterized in that: The deposition device includes a three-dimensional motion stage, which is located on the opposite side of the nozzle.

6. An aerosol coating method based on the aerosol coating device according to any one of claims 1 to 5, characterized in that: The following steps are involved: S1. Filling the powder tank with raw material powder and installing the substrate in the deposition device; S2, turning on the vacuum pump until the vacuum degree of the coating chamber reaches the set requirement, starting the stirring device and the conveying device, and conveying the carrier gas through the first carrier gas channel and the second carrier gas channel respectively; S3. The stirred and loosened raw material powder is quantitatively allowed to enter the first carrier gas channel through the powder inlet, and is ejected from the nozzle of the deposition device in the form of aerosol to form a ceramic film on the substrate.

7. The aerosol coating method according to claim 6, characterized in that: In S1, the stirring chamber and the coating chamber are closed to make them airtight chambers; Optionally, in S1, the particle size of the raw material powder is between 100 nm and 3 μm; Optionally, in S2, the carrier gas includes one or more of nitrogen, argon, helium, oxygen, hydrogen and compressed air.

8. The aerosol coating method according to claim 6, characterized in that: In S3, the amount of raw material powder entering the first carrier gas channel is adjusted by adjusting the conveying speed of the conveying crawler and the distance between the conveying aluminum belt and the opening of the powder tank.

9. Use of the aerosol coating method according to any one of claims 6 to 8 in the preparation of electronic components.

10. The use according to claim 9, characterized in that The raw material powder includes one or more of aluminum oxide, yttrium oxide, lead zirconate titanate and barium titanate; Optionally, the substrate is an organic substrate, an inorganic non-metallic substrate or a metal substrate.

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