Infrared heating system capable of realizing uniform temperature control

Abstract

The invention discloses an infrared heating system capable of realizing uniform temperature control, the infrared heating system is applied to magnetron sputtering coating equipment, and a heating cavity is fixedly connected with a cavity of the magnetron sputtering coating equipment and is positioned in a vacuum environment; the aviation plug assembly and the infrared lamp tube assembly are arranged on the two opposite sides of the heating cavity respectively, the aviation plug assembly is used for achieving atmosphere-vacuum power supply connection, and the cable part is arranged on the upper portion of the heating cavity and connected with the aviation plug assembly and the infrared lamp tube assembly respectively so as to achieve electric heating; the lifting assembly is arranged on the outer side of the magnetron sputtering coating equipment, the output end of the lifting assembly penetrates through a cavity of the magnetron sputtering coating equipment in a sealed mode and then is connected with the heating table assembly, the heating table assembly is used for bearing a substrate, and the lifting assembly drives the heating table assembly to ascend and descend so as to adjust the distance between the substrate and the infrared lamp tube assembly. The device has the characteristics of compact structure, high stability, high temperature control precision and the like, the surface temperature uniformity of the substrate is ensured, and the coating quality is improved.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor magnetron sputtering coating vacuum equipment, and in particular to an infrared heating system capable of realizing uniform temperature control. Background Art

[0002] Magnetron sputtering is a thin film deposition technology commonly used in semiconductor manufacturing. In order to ensure the quality of the deposited film, the substrate needs to be heated to a certain temperature before the coating process. However, traditional heating methods, such as convection heating or traditional electric heating plates, are often affected by problems such as uneven heating and large temperature differences, resulting in uneven temperature distribution on the substrate, thus affecting the quality and performance of the film layer. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide an infrared heating system which has a compact structure, stable operation, high control accuracy and can realize uniform temperature control in view of the deficiencies in the prior art.

[0004] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0005] An infrared heating system capable of achieving uniform temperature control, the infrared heating system is applied to a magnetron sputtering coating device, and comprises: an aviation plug assembly, a heating chamber, an infrared lamp tube assembly, a cable component, a lifting assembly and a heating table assembly; the heating chamber is connected and fixed to the cavity of the magnetron sputtering coating device and is located in a vacuum environment; the aviation plug assembly and the infrared lamp tube assembly are respectively arranged on opposite sides of the heating chamber, the aviation plug assembly is used to achieve an atmosphere-vacuum power connection, the cable component is arranged at the upper part of the heating chamber, and is respectively connected to the aviation plug assembly and the infrared lamp tube assembly to achieve power-on heating of the infrared lamp tube assembly; the lifting assembly is arranged outside the cavity of the magnetron sputtering coating device, and the output end of the lifting assembly is sealed and penetrates the cavity of the magnetron sputtering coating device and is connected to the heating table assembly, the heating table assembly is used to carry a substrate, and the lifting assembly is used to drive the heating table assembly to rise and fall to adjust the distance between the substrate and the infrared lamp tube assembly.

[0006] As a further improvement of the present invention, the cable component includes a conductive cable and a temperature measuring thermocouple, the conductive cable is used to connect the infrared lamp tube assembly and the aviation plug assembly; the temperature measuring thermocouple is installed on the top of the heating chamber to detect the heating temperature and feed the temperature back to the control system so that the control system can adjust the heating power in real time.

[0007] As a further improvement of the present invention, the heating chamber comprises a heating aluminum chamber and a sealing cover which are connected and fixed, and the aviation plug assembly and the temperature measuring thermocouple are both arranged through the middle of the sealing cover.

[0008] As a further improvement of the present invention, a cooling channel is provided inside the sealing cover, and a group of threaded sealing ferrule joints are provided on the sealing cover to enable the coolant to enter and exit the cooling channel.

[0009] As a further improvement of the present invention, the aviation plug assembly includes a plug mounting plate, a first sealing ring and an aviation plug; the bottom of the plug mounting plate is sealed with the sealing cover through the first sealing ring, and the aviation plug is installed in the center of the plug mounting plate for atmosphere-vacuum power connection.

[0010] As a further improvement of the present invention, an upper protective cover and a lower protective cover are provided in sequence between the heating chamber and the infrared lamp tube assembly. The upper protective cover is installed at the lower part of the heating aluminum chamber through a fastener passing through a fixed gasket ring. The upper protective cover and the lower protective cover are both used to reflect the heat of the infrared lamp tube assembly to the substrate.

[0011] As a further improvement of the present invention, the infrared lamp tube assembly includes a protective cover ceramic block, a heating lamp tube, a lamp tube wiring ceramic block, a lamp tube protective cover, a copper electrode and anti-fall ceramic; the lower protective cover is electrically isolated from the upper protective cover by the protective cover ceramic block and is fixed by the anti-fall ceramic thread; the external thread of the copper electrode is fastened to the internal thread of the anti-fall ceramic, the lamp tube wiring ceramic block is fastened to the internal thread at the bottom of the copper electrode by screws, and both ends of the heating lamp tube are fixed on the lamp tube wiring ceramic block, thereby realizing the overall fixation of the infrared lamp tube assembly; the copper electrode is connected to a conductive cable to supply power to the heating lamp tube.

[0012] As a further improvement of the present invention, the surface of the lower protective cover is a mirror surface, and a plurality of groups of infrared lamp tube assemblies are regularly arranged at the bottom of the lower protective cover.

[0013] As a further improvement of the present invention, the lifting assembly includes a bellows, a cylinder fixing plate, a cylinder fixing block and a driving cylinder;

[0014] The cylinder fixing plate is fixed to the bottom of the cavity of the magnetron sputtering coating equipment, and the driving cylinder is fixed to the cylinder fixing plate through the cylinder fixing block; the bottom of the connecting bellows is threadedly fixed to the driving cylinder, and the flange at the top of the connecting bellows is sealed and connected to the cavity of the magnetron sputtering coating equipment. The output shaft of the driving cylinder passes through the connecting bellows and extends into the cavity of the magnetron sputtering coating equipment, and is connected to the heating table assembly.

[0015] As a further improvement of the present invention, the heating table assembly includes a heating table and a supporting chassis, the bottom of the supporting chassis is nested in the end of the output shaft of the driving cylinder, and the heating table is arranged on the top of the supporting chassis to support the substrate; and insulating ceramics are provided between the heating table and the supporting chassis.

[0016] Compared with the prior art, the advantages of the present invention are:

[0017] The infrared heating system capable of realizing uniform temperature control of the present invention sets a heating chamber in a vacuum chamber of a magnetron sputtering coating device, and realizes the connection of an infrared lamp assembly in the heating chamber with an external power supply through an aviation plug assembly and a cable component, thereby realizing the heating of the infrared lamp assembly by powering on. At the same time, the heating table assembly for carrying the substrate is connected to a lifting assembly arranged outside the magnetron sputtering coating device. Under the drive of the lifting assembly, the spacing between the substrate and the infrared lamp assembly is flexibly adjusted, and the substrate is heated by infrared radiation, so that the substrate temperature can be quickly and accurately controlled, which is particularly suitable for heating large-size substrates, and can effectively improve the uniformity of heat distribution, and ensure the temperature consistency of the substrate during the heating process. Accurate temperature control is realized by the infrared heating system, which effectively avoids defects such as film layer defects, stress and inconsistent performance caused by excessive temperature differences. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the three-dimensional structure principle of an infrared heating system capable of achieving uniform temperature control in a specific embodiment of the present invention;

[0019] Figure 2 It is a schematic diagram of the three-dimensional structure principle of the heating chamber in a specific embodiment of the present invention;

[0020] Figure 3 It is a schematic diagram of the explosion structure principle of the heating chamber in a specific embodiment of the present invention;

[0021] Figure 4 A schematic diagram of the structural principle of the heating chamber from another perspective in a specific embodiment of the present invention;

[0022] Figure 5 Schematic diagram of the explosion structure principle of the infrared lamp assembly in a specific embodiment of the present invention

[0023] Figure 6 It is a schematic diagram of the three-dimensional structure principle of the lifting assembly and the heating platform assembly in a specific embodiment of the present invention;

[0024] Figure 7 It is a schematic diagram of the cross-sectional structure principle of the lifting assembly and the heating platform assembly in a specific embodiment of the present invention;

[0025] Legend: 1. Upper protective cover; 2. Lower protective cover; 3. Fixed gasket; 4. Aviation plug assembly; 41. Plug mounting plate; 42. First sealing ring; 43. Aviation plug; 5. Heating chamber; 51. Heating aluminum chamber; 52. Sealing cover; 53. Threaded sealing ferrule joint; 6. Infrared lamp assembly; 61. Protective cover ceramic block; 62. Heating lamp; 63. Lamp wiring ceramic block; 64. Lamp protective cover; 65. Copper electrode; 66. Anti-fall ceramic; 7. Cable component; 71. Conductive cable; 72. Temperature measuring thermocouple; 8. Lifting assembly; 81. Bellows; 82. Cylinder fixing plate; 83. Cylinder fixing block; 84. Bushing; 85. Driving cylinder; 86. Second sealing ring; 9. Heating table assembly; 91. Heating table; 92. Support chassis; 93. Insulating ceramic; 94. Positioning pin. DETAILED DESCRIPTION

[0026] The present invention is further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the protection scope of the present invention is not limited thereby.

[0027] In the description of the present invention, it should be understood that the terms "side", "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0028] In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "multiple" means two or more, unless otherwise clearly and specifically defined.

[0029] Example

[0030] like Figure 1 and Figure 2As shown, the infrared heating system of the present invention can realize uniform temperature control, and the infrared heating system is used in magnetron sputtering coating equipment, and includes: an aviation plug assembly 4, a heating chamber 5, an infrared lamp assembly 6, a cable component 7, a lifting assembly 8 and a heating table assembly 9. The heating chamber 5 is connected and fixed to the upper part of the chamber of the magnetron sputtering coating equipment and is located in a vacuum environment. The aviation plug assembly 4 and the infrared lamp assembly 6 are respectively arranged on opposite sides of the heating chamber 5, and the aviation plug assembly 4 is used to realize the atmosphere-vacuum power connection. The cable component 7 is arranged on the upper part of the heating chamber 5, and is respectively connected to the aviation plug assembly 4 and the infrared lamp assembly 6, so as to realize the power-on heating of the infrared lamp assembly 6. The lifting assembly 8 and the heating table assembly 9 are both located at the lower part of the cavity of the magnetron sputtering coating equipment. The lifting assembly 8 is arranged outside the cavity of the magnetron sputtering coating equipment, and the output end of the lifting assembly 8 is sealed and passes through the cavity of the magnetron sputtering coating equipment and then connected to the heating table assembly 9. The heating table assembly 9 is used to carry the substrate, and the lifting assembly 8 is used to drive the heating table assembly 9 to lift and lower to adjust the distance between the substrate and the infrared lamp tube assembly 6.

[0031] In this embodiment, the heating chamber 5 is arranged in the vacuum chamber of the magnetron sputtering coating device, and the infrared lamp assembly 6 in the heating chamber 5 is connected to the external power supply through the aviation plug assembly 4 and the cable component 7, so that the infrared lamp assembly 6 is powered on and heated. At the same time, the heating table assembly 9 for carrying the substrate is connected to the lifting assembly 8 arranged outside the magnetron sputtering coating device. Under the drive of the lifting assembly 8, the distance between the substrate and the infrared lamp assembly 6 is flexibly adjusted, and the substrate is heated by infrared radiation, which can quickly and accurately control the substrate temperature, is particularly suitable for heating large-sized substrates, and can effectively improve the uniformity of heat distribution and ensure the temperature consistency of the substrate during the heating process. Accurate temperature control is achieved through the infrared heating system, which effectively avoids defects such as film defects, stress and inconsistent performance caused by excessive temperature differences.

[0032] like Figure 2 and Figure 3 As shown, the cable component 7 includes a conductive cable 71 and a temperature measuring thermocouple 72. The conductive cable 71 is used to connect the infrared lamp assembly 6 and the aviation plug assembly 4. The temperature measuring thermocouple 72 is installed on the top of the heating chamber 5 to detect the heating temperature and feed the temperature back to the control system so that the control system can adjust the heating power in real time and control the heating temperature.

[0033] In this embodiment, the infrared heating system is combined with a temperature sensor and an intelligent control system to monitor the temperature change of the substrate in real time, and adjust the power of the infrared radiation source according to the feedback to maintain the stability and uniformity of the temperature. Intelligent temperature control technology can greatly improve the stability of the heating process and ensure the consistency of temperature control during the heating process.

[0034] like Figure 1and Figure 2 As shown, the heating chamber 5 includes a welded and fixed heating aluminum chamber 51 and a sealing cover 52. The aviation plug assembly 4 and the temperature measuring thermocouple 72 are both set through the middle position of the top of the sealing cover 52. The heating aluminum chamber 51 is connected and fixed to the vacuum chamber of the magnetron sputtering coating equipment through countersunk holes on all sides.

[0035] Furthermore, a cooling channel is provided inside the sealing cover 52, such as Figure 2 As shown, a set of threaded sealing ferrule joints 53 are provided on the sealing cover 52 to enable the coolant to enter and exit the cooling channel, thereby reducing the temperature of the heating chamber 5 during the heating process.

[0036] like Figure 2 and Figure 3 As shown, the aviation plug assembly 4 includes a plug mounting plate 41, a first sealing ring 42 and an aviation plug 43. The bottom of the plug mounting plate 41 is sealed and connected to the sealing cover 52 through a fastening screw and the first sealing ring 42 to achieve vacuum isolation, and the aviation plug 43 is installed in the center of the plug mounting plate 41 for atmosphere-vacuum power connection.

[0037] like Figure 3 As shown, an upper protective cover 1 and a lower protective cover 2 are provided between the heating cavity 5 and the infrared lamp tube assembly 6 in sequence. The upper protective cover 1 is installed at the lower part of the heating aluminum cavity 51 by screws passing through the fixing gasket 3. The upper protective cover 1 and the lower protective cover 2 are both used to reflect the heat of the infrared lamp tube assembly 6 to the substrate to increase thermal efficiency and reduce the temperature rise of the heating aluminum cavity 51.

[0038] like Figure 5 As shown, the infrared lamp assembly 6 includes a protective cover ceramic block 61, a heating lamp 62, a lamp connection ceramic block 63, a lamp protection cover 64, a copper electrode 65 and an anti-drop ceramic 66. The lower protective cover 2 is electrically isolated from the upper protective cover 1 by the protective cover ceramic block 61, and is fixed by the anti-drop ceramic 66; the outer thread of the copper electrode 65 is fastened to the inner thread of the anti-drop ceramic 66, the lamp connection ceramic block 63 is fastened to the inner thread at the bottom of the copper electrode 65 by screws, and the two ends of the heating lamp 62 are fixed to the lamp connection ceramic block 63, so as to realize the overall fixation of the infrared lamp assembly 6; the copper electrode 65 is connected to the conductive cable 71 to supply power to the heating lamp 62.

[0039] like Figure 3 and Figure 4As shown, the surface of the lower protective cover 2 is a mirror surface, which can well reflect the heat source generated by the heating lamp tube 62 to the position of the lower substrate. Six groups of infrared lamp tube assemblies 6 are regularly arranged at the bottom of the lower protective cover 2, and the heating range is 300mm×300mm. In modern semiconductor manufacturing, as the size of integrated circuits continues to increase, the size of substrates is also increasing. The infrared heating system of this embodiment can arrange the radiation source position according to the substrate size within the range of 300mm to meet the heating needs of large-sized substrates, ensure the uniformity of the substrate surface temperature, and improve the coating quality.

[0040] like Figure 6 As shown, the lifting assembly 8 includes a bellows 81, a cylinder fixing plate 82, a cylinder fixing block 83 and a driving cylinder 85. The cylinder fixing plate 82 is fixed to the bottom of the cavity of the magnetron sputtering coating equipment, and the driving cylinder 85 passes through the cylinder fixing block 83 and is fixed to the cylinder fixing plate 82. The bottom of the bellows 81 is threadedly fixed to the driving cylinder 85, and the welding flange at the top of the bellows 81 is connected to the cavity of the magnetron sputtering coating equipment, and a second sealing ring 86 is provided at the connection to ensure vacuum sealing isolation. The output shaft of the driving cylinder 85 passes through the bellows 81 and extends into the cavity of the magnetron sputtering coating equipment, and is connected to the heating table assembly 9. Driven by the driving cylinder 85, the heating table assembly 9 is reciprocated and lifted in the cavity of the magnetron sputtering coating equipment to flexibly adjust the distance between the substrate and the heating lamp 62 according to the heating demand.

[0041] like Figure 7 As shown, the heating stage assembly 9 includes a heating stage 91 and a supporting chassis 92. The bottom of the supporting chassis 92 is embedded in the end of the output shaft of the driving cylinder 85 by screws, and the heating stage 91 is fixed to the top of the supporting chassis 92 by positioning pins 94 to support the substrate. Furthermore, a heat insulating ceramic 93 is provided between the heating stage 91 and the supporting chassis 92 to achieve thermal isolation between the heating stage 91 and the lifting assembly 8 to prevent heat from being transferred to the lifting assembly 8.

[0042] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. An infrared heating system capable of achieving uniform temperature control, characterized in that: The infrared heating system is applied in a magnetron sputtering coating device, comprising: an aviation plug assembly (4), a heating chamber (5), an infrared lamp tube assembly (6), a cable component (7), a lifting assembly (8) and a heating platform assembly (9); the heating chamber (5) is connected and fixed to the chamber body of the magnetron sputtering coating device and is located in a vacuum environment; the aviation plug assembly (4) and the infrared lamp tube assembly (6) are respectively arranged on two opposite sides of the heating chamber (5); the aviation plug assembly (4) is used to realize an atmosphere-vacuum power supply connection; the cable component (7) is used to connect the atmosphere to the vacuum power supply; and the heating chamber (5) is used to connect the atmosphere to the vacuum power supply. 7) is arranged at the upper part of the heating chamber (5), and is respectively connected to the aviation plug assembly (4) and the infrared lamp tube assembly (6) to realize the heating of the infrared lamp tube assembly (6) by electricity; the lifting assembly (8) is arranged outside the cavity of the magnetron sputtering coating equipment, and the output end of the lifting assembly (8) is sealed and penetrates the cavity of the magnetron sputtering coating equipment and is connected to the heating table assembly (9), the heating table assembly (9) is used to carry the substrate, and the lifting assembly (8) is used to drive the heating table assembly (9) to rise and fall, so as to adjust the distance between the substrate and the infrared lamp tube assembly (6).

2. The infrared heating system capable of achieving uniform temperature control according to claim 1, characterized in that: The cable component (7) comprises a conductive cable (71) and a temperature measuring thermocouple (72), wherein the conductive cable (71) is used to connect the infrared lamp tube assembly (6) and the aviation plug assembly (4); the temperature measuring thermocouple (72) is installed on the top of the heating chamber (5) to detect the heating temperature and feed the temperature back to the control system so that the control system can adjust the heating power in real time.

3. The infrared heating system capable of achieving uniform temperature control according to claim 2, characterized in that: The heating chamber (5) comprises a heating aluminum chamber (51) and a sealing cover (52) which are connected and fixed, and the aviation plug assembly (4) and the temperature measuring thermocouple (72) are both arranged through the middle of the sealing cover (52).

4. The infrared heating system capable of achieving uniform temperature control according to claim 3, characterized in that: A cooling channel is provided inside the sealing cover (52), and a group of threaded sealing ferrule joints (53) are provided on the sealing cover (52) to enable coolant to enter and exit the cooling channel.

5. The infrared heating system capable of achieving uniform temperature control according to claim 3, characterized in that: The aviation plug assembly (4) comprises a plug mounting plate (41), a first sealing ring (42) and an aviation plug (43); the bottom of the plug mounting plate (41) is sealedly connected to a sealing cover (52) via the first sealing ring (42), and the aviation plug (43) is installed at the center of the plug mounting plate (41) for atmosphere-vacuum power connection.

6. The infrared heating system capable of achieving uniform temperature control according to claim 5, characterized in that: An upper protective cover (1) and a lower protective cover (2) are provided in sequence between the heating chamber (5) and the infrared lamp tube assembly (6); the upper protective cover (1) is installed on the lower part of the heating aluminum chamber (51) through a fastener passing through a fixing gasket (3); and the upper protective cover (1) and the lower protective cover (2) are both used to reflect the heat of the infrared lamp tube assembly (6) to the substrate.

7. The infrared heating system capable of achieving uniform temperature control according to claim 6, characterized in that: The infrared lamp tube assembly (6) comprises a protective cover ceramic block (61), a heating lamp tube (62), a lamp tube wiring ceramic block (63), a lamp tube protective cover (64), a copper electrode (65) and an anti-drop ceramic (66); the lower protective cover (2) is electrically isolated from the upper protective cover (1) by the protective cover ceramic block (61) and is screwed fixed by the anti-drop ceramic (66); the external thread of the copper electrode (65) is fastened to the internal thread of the anti-drop ceramic (66), the lamp tube wiring ceramic block (63) is fastened to the internal thread at the bottom of the copper electrode (65) by screws, and the two ends of the heating lamp tube (62) are fixed to the lamp tube wiring ceramic block (63), thereby realizing the overall fixation of the infrared lamp tube assembly (6); the copper electrode (65) is connected to a conductive cable (71) to supply power to the heating lamp tube (62).

8. The infrared heating system capable of achieving uniform temperature control according to claim 6, characterized in that: The surface of the lower protective cover (2) is a mirror surface, and a plurality of groups of infrared lamp tube assemblies (6) are regularly arranged at the bottom of the lower protective cover (2).

9. The infrared heating system capable of achieving uniform temperature control according to any one of claims 1 to 8, characterized in that: The lifting assembly (8) comprises a bellows (81), a cylinder fixing plate (82), a cylinder fixing block (83) and a driving cylinder (85); The cylinder fixing plate (82) is fixed to the bottom of the cavity of the magnetron sputtering coating equipment, and the driving cylinder (85) passes through the cylinder fixing block (83) and is fixed to the cylinder fixing plate (82); the bottom of the connecting bellows (81) is threadedly fixed to the driving cylinder (85), and the flange at the top of the connecting bellows (81) is sealedly connected to the cavity of the magnetron sputtering coating equipment. The output shaft of the driving cylinder (85) passes through the connecting bellows (81) and extends into the cavity of the magnetron sputtering coating equipment, and is connected to the heating table assembly (9).

10. The infrared heating system capable of achieving uniform temperature control according to claim 9, characterized in that: The heating platform assembly (9) comprises a heating platform (91) and a supporting chassis (92); the bottom of the supporting chassis (92) is nested in the end of the output shaft of the driving cylinder (85); the heating platform (91) is arranged on the top of the supporting chassis (92) to support the substrate; and a heat-insulating ceramic (93) is arranged between the heating platform (91) and the supporting chassis (92).

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