A high-security variable-temperature cycling temperature control system

Abstract

The present invention discloses a high - security variable - temperature cycling temperature control system, which adopts a regenerative closed - cycle structure design. The main pipelines of the cold source unit and the distribution unit are respectively placed in a valve box, and the inside of the valve box is evacuated to form a vacuum environment, reducing the convective heat transfer of the residual gas molecules inside the pipelines and reducing the heat leakage of the cryogenic working fluid, thereby reducing the pipeline temperature difference. Further, the system is equipped with an independent nitrogen gas makeup device and a nitrogen gas circuit for the target disk to return to temperature, realizing the automatic adjustment of the nitrogen gas working fluid in the system, ensuring the stable circulation of the nitrogen gas working fluid in the closed - loop system, maximizing the cold quantity recovery and energy - saving utilization, and thus ensuring the high - security operation of the system through multiple interlocking gas circuit controls.

Description

Technical Field

[0001] The present invention relates to the technical field of temperature control systems for semiconductor processing, and particularly to a variable-temperature cycle temperature control system with high safety. Background Art

[0002] The development and wide application of semiconductor technology have greatly promoted the progress of science and technology and the development of social economy, and have become an industry strongly supported by the state. With the continuous development of semiconductor manufacturing technology, a variable-temperature cycle temperature control system used for precisely controlling the temperature of the reaction chamber during semiconductor manufacturing is an essential key device in the semiconductor manufacturing process and is widely used in fields such as semiconductor manufacturing and testing. The variable-temperature cycle temperature control system is a self-balancing cycle device mainly composed of a heat exchanger, a circulation pump, a compressor, and a control system, and can continuously provide a low-temperature medium with controllable temperature. It ensures the process processing temperature in links such as etching, ion implantation, diffusion, thin-film deposition, and chemical mechanical polishing in semiconductor manufacturing.

[0003] Currently, the variable-temperature cycle temperature control systems in the market generally have problems such as a narrow temperature range, small cooling capacity, poor temperature control accuracy, short equipment service life, and high operation difficulty, which bring certain limitations to the variable-temperature cycle temperature control performance required in the semiconductor production process and have weak support capabilities in terms of applicability to high and low temperatures. Therefore, designing a variable-temperature cycle temperature control system with a wide temperature range, large cooling capacity, high temperature control accuracy, long life, and simple operation has great significance in the semiconductor manufacturing field.

[0004] Since the temperature control system usually includes a refrigeration unit and a distribution unit, the cold generated by the refrigerator needs to pass through the complex pipelines of the refrigeration unit and the distribution unit before reaching the target disk. Therefore, the pipeline temperature difference in different regions causes uneven pressure when the nitrogen working medium flows through the local pipeline. Low working medium pressure will lead to insufficient cold supply to the target disk. Excessive working medium pressure will cause equipment damage and even safety accidents. Summary of the Invention

[0005] To solve the technical problems in the background art, the present invention proposes a variable-temperature cycle temperature control system with high safety.

[0006] A variable-temperature cycle temperature control system with high safety proposed by the present invention includes: a low-temperature cold source unit and a low-temperature distribution unit;

[0007] The low-temperature distribution unit includes a distribution valve box and a second vacuum pump. A second vacuum gauge for detecting the internal vacuum degree is provided on the distribution valve box. The second vacuum pump is used to evacuate the distribution valve box according to the detection result of the second vacuum gauge. The distribution valve box is provided with a cold quantity outlet and a heat regeneration inlet connected to the target disk, a second cold quantity inlet and a second heat regeneration outlet connected to the low-temperature cold source unit, a nitrogen inlet and a nitrogen outlet. A nitrogen inlet pipeline, a nitrogen outlet pipeline, a low-temperature inlet pipeline and a low-temperature return pipeline are arranged in the distribution valve box. The two ends of the nitrogen inlet pipeline are respectively communicated with the nitrogen inlet and the cold quantity outlet. The two ends of the nitrogen outlet pipeline are respectively connected to the heat regeneration inlet and the nitrogen outlet. The two ends of the low-temperature inlet pipeline are respectively connected to the second cold quantity inlet and the cold quantity outlet. The two ends of the low-temperature return pipeline are respectively communicated with the heat regeneration inlet and the second heat regeneration outlet. An inlet heater is provided on the nitrogen inlet pipeline and an outlet heater is provided on the nitrogen outlet pipeline.

[0008] Preferably, the low-temperature cold source unit includes a cold source valve box, a refrigerator, a circulation pump, a first vacuum pump and a gas replenishing device. A first vacuum gauge for detecting the internal vacuum degree is provided on the cold source valve box. The first vacuum pump is used to evacuate the cold source valve box according to the detection result of the first vacuum gauge. The cold source valve box is also provided with a first heat regeneration outlet and a first cold quantity inlet respectively connected to the input end and the output end of the refrigerator. A regenerator, a first outlet switch valve V13 and a first inlet switch valve V14 are arranged in the cold source valve box. The first outlet switch valve V13 is connected to the first cold quantity inlet. The first heat regeneration outlet is sequentially connected to the high-temperature channel of the regenerator, the circulation pump, the low-temperature channel of the regenerator and the first inlet switch valve V14. The gas replenishing device is connected to the pipeline between the circulation pump and the low-temperature channel of the regenerator to replenish gas for the loop of the low-temperature cold source unit.

[0009] Preferably, the low-temperature cold source unit further includes a first buffer tank, and the first buffer tank is connected to the pipeline between the circulation pump and the low-temperature channel of the regenerator.

[0010] Preferably, a ninth pressure sensor is provided on the first buffer tank, and the gas replenishing device replenishes gas into the loop according to the detected pressure value of the ninth pressure sensor.

[0011] Preferably, the gas replenishing device includes a filter, a pressure reducing valve, a first diaphragm valve BV1 and a first check valve connected in series along the intake direction. The filter is used to remove moisture in the intake gas.

[0012] Preferably, the low-temperature cold source unit further includes a second buffer tank. The second buffer tank is arranged on the pipeline between the circulation pump and the high-temperature channel of the regenerator, and a ninth pressure relief valve SRV9 is provided on the second buffer tank.

[0013] Preferably, a low-temperature throttle valve TV is further arranged in the distribution valve box, and the low-temperature throttle valve is connected in series on the low-temperature inlet pipeline.

[0014] Preferably, a first pressure relief valve SRV1 is provided on the pipeline between the low-temperature throttle valve TV and the second cold quantity inlet, and a third pressure relief valve SRV3 is provided on the pipeline between the low-temperature throttle valve and the cold quantity outlet.

[0015] Preferably, a sixth pressure relief valve SRV6 is provided on the pipeline upstream of the inlet heater.

[0016] Preferably, a fourth pressure relief valve SRV4 is provided at the cold quantity outlet.

[0017] In the present invention, the proposed high-safety variable-temperature cycle temperature control system adopts a regenerative closed-cycle structure design. The main pipelines of the cold source unit and the distribution unit are respectively placed in the valve box, and the inside of the valve box is evacuated to form a vacuum environment, reducing the convective heat transfer of the residual gas molecules inside the pipeline, reducing the heat leakage of the low-temperature working medium, and thus reducing the pipeline temperature difference. Further, the system is equipped with an independent nitrogen gas replenishing device and a nitrogen gas circuit for the target disk to return to temperature, realizing automatic adjustment of the nitrogen gas working medium in the system, ensuring the stable circulation of the nitrogen gas working medium in the closed system, maximizing the recovery of cold quantity and energy conservation and utilization, and thus ensuring the high-safety operation of the system through multiple interlocking gas circuit controls. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic structural diagram of an embodiment of a high-safety variable-temperature cycle temperature control system proposed by the present invention.

[0019] Figure 2 It is a schematic structural diagram of another embodiment of a high-safety variable-temperature cycle temperature control system proposed by the present invention.

[0020] Figure 3 It is a schematic structural diagram of still another embodiment of a high-safety variable-temperature cycle temperature control system proposed by the present invention.

[0021] Figure 4 It is a schematic structural diagram of still another embodiment of a high-safety variable-temperature cycle temperature control system proposed by the present invention.

[0022] Reference Signs:

[0023] 1. Cold source valve box; 2. Refrigerator; 3. Circulation pump; 4. First vacuum pump; 5. Distribution valve box; 6. Second vacuum pump; 8. Inlet heater; 9. Outlet heater; 11. Primary precooling pipeline; 12. Secondary precooling pipeline; 13. Tertiary precooling pipeline; 14. First regenerator; 15. Second regenerator; 16. First buffer tank; 17. Second buffer tank; 18. First vacuum gauge; 19. Second vacuum gauge; 20. Cold source heater; 21. Low-temperature flow controller; 22. Normal-temperature flow controller; 23. Nitrogen gas inlet pipeline; 24. Nitrogen gas outlet pipeline; 25. Filter

[0024] 100, working target disk; 200, pre-cooling target disk. Specific embodiments

[0025] Referring to Figure 1 , a high-security variable-temperature cycle temperature control system proposed by the present invention includes: a low-temperature cold source unit and a low-temperature distribution unit;

[0026] The low-temperature cold source unit includes a cold source valve box 1, a refrigerating machine 2, a circulation pump 3, a first vacuum pump 4 and a gas supplementing device. A first vacuum gauge 18 for detecting the internal vacuum degree is provided on the cold source valve box 1. The first vacuum pump 4 is used to evacuate the cold source valve box 1 according to the detection result of the first vacuum gauge 18. A first heat regeneration outlet and a first cold quantity inlet respectively connected to the input end and the output end of the refrigerating machine 2 are further provided on the cold source valve box 1. A regenerator, a first outlet switch valve V13 and a first inlet switch valve V14 are provided in the cold source valve box 1. The first outlet switch valve V13 is connected to the first cold quantity inlet. The first heat regeneration outlet is sequentially connected to the high-temperature channel of the regenerator, the circulation pump 3, the low-temperature channel of the regenerator and the first inlet switch valve V14. The gas supplementing device is connected to the pipeline between the circulation pump 3 and the low-temperature channel of the regenerator for supplementing gas to the loop of the low-temperature cold source unit;

[0027] The low-temperature distribution unit includes a distribution valve box 5 and a second vacuum pump 6. A second vacuum gauge 19 for detecting the internal vacuum degree is provided on the distribution valve box 5. The second vacuum pump 6 is used to evacuate the distribution valve box 5 according to the detection result of the second vacuum gauge 19. A cold quantity outlet and a heat regeneration inlet connected to the target disk, a second cold quantity inlet and a second heat regeneration outlet connected to the cold source valve box 1, and a nitrogen inlet and a nitrogen outlet are provided on the distribution valve box 5. A nitrogen inlet pipeline 23, a nitrogen outlet pipeline 24, a low-temperature inlet pipeline and a low-temperature return pipeline are provided in the distribution valve box 5. Both ends of the nitrogen inlet pipeline 23 are respectively communicated with the nitrogen inlet and the cold quantity outlet. Both ends of the nitrogen outlet pipeline 24 are respectively connected to the heat regeneration inlet and the nitrogen outlet. Both ends of the low-temperature inlet pipeline are respectively connected to the second cold quantity as soon as possible and the cold quantity outlet. Both ends of the low-temperature return pipeline are respectively communicated with the heat regeneration inlet and the second heat regeneration outlet. An inlet heater 8 is provided on the nitrogen inlet pipeline 23 and an outlet heater 9 is provided on the nitrogen outlet pipeline 24.

[0028] In actual design, the first vacuum pump and the second vacuum pump can adopt dry pumps.

[0029] During the specific working process of the high - security variable - temperature cycle temperature control system of this embodiment, when providing cooling capacity for the target disk, under the action of the circulation pump, nitrogen gas as the working medium is cooled by the refrigerator and then enters the cold - source valve box through the first cooling - capacity inlet, and enters the distribution valve box from the cold - source valve box through the first outlet switch valve. In the distribution valve box, it is further cooled by decompression through the low - temperature throttle valve, and then flows out of the distribution valve box from the second cooling - capacity outlet and is provided to cool the target disk for semiconductor processing; the heated nitrogen gas returns to the distribution valve box through the second heat - regeneration inlet, returns to the cold - source valve box through the distribution valve box, and then passes through the low - temperature channel of the regenerator, the circulation pump, and the high - temperature channel of the regenerator in sequence, and then returns to the input end of the refrigerator through the first heat - regeneration outlet to complete the closed - loop cycle of the nitrogen - gas working medium.

[0030] The inside of the cold - source valve box is evacuated by the first vacuum pump to form a vacuum environment, which can reduce the convective heat transfer of the residual gas molecules inside, reduce the heat leakage of the low - temperature working medium, and ensure the low - temperature return temperature of the nitrogen gas. Similarly, the distribution valve box is evacuated by the second vacuum pump to ensure the circulation of nitrogen gas in the distribution unit.

[0031] During the working process, when the nitrogen gas pressure in the closed loop is insufficient, nitrogen gas is automatically supplemented into the pipeline through the gas - supplementing device. The gas - supplementing device is arranged on the intake side of the circulation pump, and the supplemented gas is pre - cooled by the regenerator under the action of the circulation pump and then enters the refrigerator for cooling, and is incorporated into the circulating working - medium flow path, so as to minimize the impact of the supplemented gas on the system.

[0032] When controlling the temperature of the target disk through the distribution unit, after the processing of the semiconductor workpiece on the low - temperature target disk is completed, normal - temperature gas is heated through a separate nitrogen - gas inlet pipeline and introduced into the target - disk gas - supply pipeline to warm up the target disk. The temperature control of the target disk can be realized by means of the existing pipeline, and there is no need to set a separate warming - up system for the target disk. Further, an outlet heater is arranged on the nitrogen - gas outlet pipeline, which can further heat the warming - up nitrogen gas that has become low - temperature after heat exchange with the target disk, prevent the low - temperature nitrogen gas discharged from causing frosting or even icing of the pipeline, and finally melt into water, affecting the operation of the equipment.

[0033] In this embodiment, the proposed high - security variable - temperature cycle temperature control system adopts a heat - regeneration closed - loop structure design. The main pipelines of the cold - source unit and the distribution unit are respectively placed in the valve box, and the inside of the valve box is evacuated to form a vacuum environment, reducing the convective heat transfer of the residual gas molecules inside the pipeline, reducing the heat leakage of the low - temperature working medium, and thus reducing the pipeline temperature difference; further, the system is equipped with an independent nitrogen - gas supplementing device and a nitrogen - gas circuit for warming up the target disk, realizing the automatic adjustment of the nitrogen - gas working medium in the system, ensuring the stable circulation of the nitrogen - gas working medium in the closed - loop system, maximizing the recovery of cooling capacity and energy - saving utilization, and thus ensuring the high - security operation of the system through multiple interlocking gas - path controls.

[0034] In a specific embodiment, referring to Figure 2 , the low-temperature cold source unit further includes a first buffer tank 16, and the first buffer tank 16 is connected to the pipeline between the circulation pump 3 and the low-temperature channel of the regenerator, ensuring the pressure stability of the pipeline system and reducing the pressure fluctuation of the pipeline system.

[0035] In a further specific embodiment, in the automatic air replenishment design, a ninth pressure sensor is provided on the first buffer tank 16, and the air replenishment device replenishes air into the loop according to the detected pressure value of the ninth pressure sensor. Whether air needs to be replenished in the loop is detected according to the pressure value in the buffer tank, avoiding abnormal detection indicators caused by local pressurization of the pipeline.

[0036] Furthermore, the air replenishment device includes a filter 25, a pressure reducing valve, a first diaphragm valve BV1, and a first check valve connected in series in the intake air direction. The filter 25 is used to remove moisture in the intake air. The function of the filter 25 is to remove moisture in the replenished nitrogen. Since the freezing point of water is 0 °C, if moisture enters the pipeline system, it will cause the pipeline to be blocked, the flow rate to decrease or even be zero; if moisture enters the refrigerator, low-temperature switch valve, or low-temperature regulating valve, it will cause damage to the refrigerator or valve. The function of the pressure reducing valve is to control the nitrogen pressure entering the pipeline system by adjusting the handle of the pressure reducing valve to prevent damage to the pipeline due to excessive pressure. The first diaphragm valve BV1 is mainly used for opening and closing during nitrogen replenishment. The first diaphragm valve is interlocked with the ninth pressure sensor. The ninth pressure sensor is used to monitor the nitrogen pressure value inside the pipeline system. When the pressure value is lower than the set value, the feedback signal is transmitted to the first diaphragm valve BV1, and the first diaphragm valve BV1 is started to start replenishing nitrogen into the pipeline system. When the pressure value reaches the set value, the first diaphragm valve BV1 is closed to complete the automatic replenishment of the working medium in the pipeline system. To prevent the nitrogen inside the pipeline system from overflowing outward in the reverse direction, a first check valve is provided at the outlet of the first diaphragm valve BV1. The first check valve allows the gas to flow only from the outside to the inside and cannot flow in the reverse direction, thus ensuring the outflow of the gas inside the pipeline. The highly automated operation of the system is realized, completely solving the problem of manual operation, liberating the hands of workers, and improving work efficiency.

[0037] In addition, since the inlet is at low temperature and the outlet is at high pressure after the circulation pump is started, the low-temperature cold source unit further includes a second buffer tank 17. The second buffer tank 17 is arranged on the pipeline between the circulation pump 3 and the high-temperature channel of the regenerator. A ninth pressure relief valve SRV9 is provided on the second buffer tank 17 to ensure that when the working medium pressure in the pipeline system is too high, it can be discharged from the pressure relief valve, avoiding equipment damage and ensuring the personal safety of operators at the same time.

[0038] In other specific embodiments, a low-temperature throttle valve TV is further provided in the distribution valve box 5. The low-temperature throttle valve TV is connected in series on the low-temperature intake pipeline, and effectively further reduces the temperature in the distribution valve box by means of pressure reduction, effectively expanding the temperature application range of the system.

[0039] In order to balance the temperature and pressure of the working medium in the upstream and downstream flow paths of the throttle valve, a first pressure relief valve SRV1 is provided on the pipeline between the low-temperature throttle valve TV and the second cold quantity inlet, and a third pressure relief valve SRV3 is provided on the pipeline between the low-temperature throttle valve TV and the cold quantity outlet.

[0040] In the initial stage of system operation, in order to ensure that the working medium in the pipeline can provide sufficient cold quantity, a pre-cooling pipeline can be set in the system to pre-cool the valve box and the pipeline. Specifically, a secondary pre-cooling pipeline 12 and a tertiary pre-cooling pipeline 13 are further provided in the distribution valve box 5. The two ends of the secondary pre-cooling pipeline 12 are respectively connected to the upstream pipeline of the low-temperature throttle valve TV and the low-temperature return pipeline, and the two ends of the tertiary pre-cooling pipeline 13 are respectively connected to the downstream pipeline of the low-temperature throttle valve and the low-temperature return pipeline. The first pressure relief valve SRV1 is provided on the pipeline between the secondary pre-cooling pipeline 12 and the second cold quantity inlet, and the third pressure relief valve SRV3 is provided on the pipeline between the tertiary pre-cooling pipeline 13 and the low-temperature throttle valve TV. The tertiary pre-cooling pipeline is mainly used to regulate the opening degree of the low-temperature regulating valve to complete the throttling and cooling of the low-temperature working medium. Setting the pressure relief valves upstream and downstream of the low-temperature throttle valve between the low-temperature regulating valve and the secondary and tertiary pre-cooling pipelines can effectively protect the low-temperature regulating valve during regulation and improve the regulation accuracy.

[0041] In addition, a sixth pressure relief valve SRV6 is provided on the pipeline upstream of the inlet heater 8. A fourth pressure relief valve SRV4 is provided at the cold quantity outlet.

[0042] The variable-temperature cycle temperature control system of this embodiment will be described in detail below through specific examples.

[0043] Refer to Figure 3 and 4 This embodiment provides a variable-temperature cycle temperature control system. The variable-temperature cycle temperature control system includes a low-temperature cold source unit and a low-temperature distribution unit. The low-temperature cold source unit and the low-temperature distribution unit are connected through a low-temperature double-layer pipe. The low-temperature cold source unit mainly provides a circulating fluid with a certain temperature and pressure for the target disk in semiconductor production, and forms a closed cycle to meet the low-temperature injection conditions required by the target disk. The low-temperature distribution unit is mainly used for the distribution and transportation of the low-temperature circulating medium of the working target disk and the pre-cooling target disk in semiconductor production. The variable-temperature cycle temperature control system of the present invention can provide functions such as a wide temperature range, large refrigerating capacity, and high-precision temperature control for semiconductor production processes.

[0044] The low-temperature cold source unit includes a cold source valve box, a refrigerator, a first buffer tank 16, a circulation pump, a second buffer tank 17, a low-temperature flow controller 21, a normal-temperature flow controller 22, and a refrigerator. Inside the cold source valve box, there are a low-temperature switch valve V14, a first regenerator 14, a second regenerator 15, a cold source heater, a low-temperature switch valve V13, and a low-temperature switch valve V15. The inside of the cold source valve box is evacuated by a first vacuum pump to form a vacuum environment, which can reduce the convective heat transfer of the residual gas molecules inside, reduce the heat leakage of the low-temperature working medium, and ensure the low-temperature return gas temperature of nitrogen.

[0045] The low-temperature cold source unit is connected to the low-temperature distribution unit through a low-temperature double-layer pipe. The first regenerator 14 and the second regenerator 15 are connected in series. The inlet and outlet of the series-connected heat exchanger are respectively provided with an eighth temperature sensor, a ninth temperature sensor, a tenth temperature sensor, an eleventh temperature sensor, an eighth pressure sensor, and an eleventh pressure sensor, which are used to monitor the temperature and pressure of the working medium at the inlet and outlet of the regenerator. The outlet of the first buffer tank 16 and the inlet of the second buffer tank 17 are connected by a single-layer pipe, and a circulation pump for driving the circulation of the working medium is provided therebetween. The first buffer tank 16 is provided with a ninth pressure sensor, and the second buffer tank 17 is provided with a tenth pressure sensor and a ninth pressure relief valve. A low-temperature flow controller 21 is connected between the outlet of the second buffer tank 17 and the inlet of the second regenerator 15 through a single-layer pipeline, which is used to transport and regulate the low-temperature gas into the second regenerator 15 for precooling. A normal-temperature flow controller 22 is connected between the outlet of the second buffer tank 17 and the outlet of the refrigerator through a single-layer pipeline, which is used to transport and regulate the high-temperature gas into the low-temperature distribution unit.

[0046] A cold source heater is provided at the outlet of the refrigerator, which is used to mix the high-temperature gas passing through the normal-temperature flow controller 22 and the low-temperature gas passing through the low-temperature flow controller 21, and regulate the temperature of the working medium at the outlet of the refrigerator by mixing. The outlet of the cold source heater and the inlet of the low-temperature switch valve V13 are connected by a pipeline. A first-stage low-temperature switch valve V15 is provided for the first-stage precooled closed cycle of the low-temperature cold source unit, and a twelfth temperature sensor is provided.

[0047] The cold source valve box is connected to the first vacuum pump through a pipeline, and a solenoid valve for controlling the start and stop of the evacuation of the cold source valve box interlayer is provided therebetween. The outside of the cold source valve box is connected to a first vacuum gauge 18, which is used to monitor the vacuum degree of the cold source valve box interlayer.

[0048] The inlet pipeline of the first buffer tank 16 is successively connected with a first check valve, a first diaphragm valve BV1, a pressure reducing valve, and a filter 25, which are used for the nitrogen replenishment of the pipeline system. The inlet pipeline of the first buffer tank 16 is connected with a second diaphragm valve BV2, which is used for the evacuation and replacement of the pipeline of the low-temperature cold source unit.

[0049] The low-temperature distribution unit includes a distribution valve box, a working target disk, and a pre-cooling target disk. The distribution valve box is connected to the second vacuum pump through a pipeline and is provided with a second solenoid valve for controlling the start and stop of the vacuum pumping of the interlayer of the cold source valve box. The outside of the low-temperature valve box is connected to a second vacuum gauge 19 for monitoring the vacuum degree of the interlayer of the distribution valve box.

[0050] The inlet of the second-stage low-temperature switching valve V16 is connected to the outlet of the low-temperature cold source unit, and its outlet is connected to the inlet of the low-temperature cold source unit, serving as the switching control of the second-stage pre-cooling pipeline. The outlet of the low-temperature cold source unit is provided with a first temperature sensor, a first pressure sensor, and a first pressure relief valve SRV1.

[0051] The pipeline system where the working target disk 100 is located is successively connected with a first low-temperature throttle valve TV1, a low-temperature switching valve V3, the working target disk 100, and a low-temperature switching valve V5. The inlet of the first low-temperature throttle valve TV1 is connected to the outlet of the low-temperature cold source unit, and the outlet of the low-temperature switching valve V5 is connected to the inlet of the low-temperature cold source unit. The low-temperature throttle valve TV1 is used to control the temperature of the working medium entering the working target disk. The outlet of the low-temperature switching valve V5 is provided with a seventh pressure sensor.

[0052] The inlet of the third-stage low-temperature switching valve V17 is connected to the outlet of the first low-temperature throttle valve TV1, and its outlet is connected to the inlet of the low-temperature cold source unit, serving as the switching control of the third-stage pre-cooling pipeline. The outlet of the first low-temperature throttle valve TV1 is provided with a third temperature sensor, a third pressure sensor, and a third pressure relief valve SRV3.

[0053] The pipeline between the inlet of the working target disk 100 and the outlet of the low-temperature switching valve V3 is provided with a fourth pressure sensor, a fourth pressure relief valve SRV4, and a low-temperature switching valve V11. The outlet of the working target disk is provided with a fourth pressure sensor.

[0054] The pipeline system where the pre-cooling target disk 200 is located is successively connected with a low-temperature throttle valve TV2, a low-temperature switching valve V4, the pre-cooling target disk 200, and a low-temperature switching valve V6. The inlet of the low-temperature throttle valve TV2 is connected to the outlet of the low-temperature cold source unit, and the outlet of the low-temperature switching valve V6 is connected to the inlet of the low-temperature cold source unit. The low-temperature throttle valve TV2 is used to control the temperature of the working medium entering the pre-cooling target disk. The inlet of the low-temperature switching valve V18 is connected to the outlet of the second low-temperature throttle valve TV2, and its outlet is connected to the inlet of the low-temperature cold source unit, serving as the switching control of the third-stage pre-cooling pipeline. Specifically, the outlet of the low-temperature throttle valve TV2 is provided with a second temperature sensor, a second pressure sensor, and a first pressure relief valve SRV2. The pipeline between the inlet of the pre-cooling target disk and the outlet of the low-temperature switching valve V4 is provided with a fifth pressure sensor, a fifth pressure relief valve SRV5, and a low-temperature switching valve V12. The outlet of the pre-cooling target disk is provided with a fifth pressure sensor.

[0055] The warming pipeline system where the working target disk is located is successively connected with a second one-way valve, a third diaphragm valve, a target disk inlet heater, a cryogenic on-off valve V7, a working target disk, a cryogenic on-off valve V9, a target disk outlet heater, and a third one-way valve. A sixth pressure sensor is provided at the inlet of the target disk inlet heater, and a sixth temperature transmitter is provided at the outlet. A seventh temperature sensor is provided at the outlet of the target disk outlet heater. The warming pipeline system where the pre-cooled target disk is located is successively connected with a second one-way valve, a third diaphragm valve, a target disk inlet heater, a cryogenic on-off valve V8, a working target disk, a cryogenic on-off valve V10, a target disk outlet heater, and a third one-way valve.

[0056] The first pressure relief valves SRV1, SRV2, the third pressure relief valve SRV3, the fourth pressure relief valve SRV4, the fifth pressure relief valve SRV5, the sixth pressure relief valve SRV6, and the seventh pressure relief valve SRV7 connected to the internal pipelines of the cryogenic valve box are aggregated and then connected to a first muffler and a second muffler. The nitrogen discharge pipeline of the warming pipeline is also aggregated with the pressure relief valve discharge pipeline and then discharged through the second muffler.

[0057] A first solenoid valve is provided between the cold source valve box and the first vacuum pump to control the opening and closing of the pumping port pipeline. The cold source valve box is connected with a first vacuum gauge 18 to monitor the vacuum degree of the internal interlayer of the cold source valve box. When the vacuum degree value is higher than the set value, the feedback signal is transmitted to the first solenoid valve and the first vacuum pump. According to the principle of starting the first vacuum pump first and then opening the first solenoid valve, it is prevented that external air enters the internal of the cold source valve box, resulting in instant frosting and dew condensation of the cold source valve box. When the vacuum degree value reaches the set value, according to the principle of closing the first solenoid valve first and then closing the first vacuum pump, the internal vacuum is maintained. With the design of interlocking feedback, by measuring the pressure value in the pipeline, the automatic air replenishment function can be realized, fully realizing the highly automated operation of the system, completely solving the problem of manual operation, liberating the hands of workers, and improving work efficiency.

[0058] There are two regenerators inside the cold source valve box, namely the first regenerator 14 and the second regenerator 15. The two regenerators are connected in series, ensuring sufficient heat exchanger area. The two regenerators exchange heat between the low-temperature return gas medium from the low-temperature distribution unit and the external normal-temperature gas, maximizing the utilization of the cold energy of the return gas at low temperature, realizing the recovery of cold energy and energy conservation, enabling the working medium entering the refrigerator to obtain a lower temperature, better exerting the cold capacity of the refrigerator, making the temperature of the output circulating working medium lower, having a higher cold quantity transmission efficiency and a larger cold quantity in the same temperature zone compared with other equipment. At the inlet of the return gas pipeline of the regenerator, there are an eighth temperature sensor and an eighth pressure sensor for monitoring the temperature and pressure of the return gas inlet; at the outlet of the return gas pipeline of the regenerator, there is a ninth temperature sensor, and on the first buffer tank 16, there is a ninth pressure sensor for monitoring the temperature of the return gas outlet; at the inlet of the inlet pipeline of the regenerator, there is a tenth temperature sensor, and on the second buffer tank 17, there is a tenth pressure sensor for monitoring the temperature and pressure of the inlet gas; at the outlet of the outlet pipeline of the regenerator, there are an eleventh temperature sensor and an eleventh pressure sensor for monitoring the temperature and pressure of the inlet gas outlet.

[0059] The power of the low-temperature cold source unit is provided by a circulating pump, and a scroll compressor is selected as the circulating power for driving the working medium. To ensure the pressure stability of the pipeline system and reduce the pressure fluctuation of the pipeline system, a first buffer tank 16 is provided at the inlet of the circulating pump, and a second buffer tank 17 is provided at the outlet of the circulating pump. The volume of the two buffer tanks is 250L. Since the inlet of the circulating pump is at low temperature and the outlet is at high pressure after the circulating pump is started, a ninth pressure relief valve is installed on the second buffer tank to ensure that when the working medium pressure in the pipeline system is too high, it can be discharged from the pressure relief valve to avoid equipment damage and ensure the personal safety of the operators.

[0060] An automatic air replenishing device is installed in the inlet pipeline of the first buffer tank 16, which successively includes a filter 25, a pressure reducing valve, a first diaphragm valve BV1, and a first check valve. The function of the filter 25 is to remove the moisture in the replenished nitrogen. Since the freezing point of water is 0°C, if moisture enters the pipeline system, it will cause the pipeline to be blocked, the flow rate to decrease or even be zero; if moisture enters the refrigerator, low-temperature switch valve, and low-temperature regulating valve, it will cause damage to the refrigerator or valve. The function of the pressure reducing valve is to control the nitrogen pressure entering the pipeline system by adjusting the handle of the pressure reducing valve to prevent damage to the pipeline due to excessive pressure. The first diaphragm valve BV1 is mainly used for opening and closing during nitrogen replenishment. The diaphragm valve is interlocked with the ninth pressure sensor, which is used to monitor the nitrogen pressure value inside the pipeline system. When the pressure value is lower than the set value, the feedback signal is transmitted to the first diaphragm valve BV1 to start the first diaphragm valve BV1 and start replenishing nitrogen into the pipeline system. When the pressure value reaches the set value, the first diaphragm valve BV1 is closed to complete the automatic replenishment of the working medium in the pipeline system. It realizes the highly automated operation of the system, completely solves the problem of manual operation, liberates the hands of workers, and improves work efficiency. To prevent the nitrogen inside the pipeline system from overflowing outward, a first check valve is provided at the outlet of the first diaphragm valve BV1. The first check valve allows the gas to flow only from the outside to the inside and cannot flow reversely, thus ensuring the outflow of the gas inside the pipeline.

[0061] Two working medium output pipelines are provided at the outlet of the second buffer tank 17. One passes through the low-temperature flow controller 21 and enters the intake inlet of the second regenerator 15 to exchange heat with the low-temperature return gas, making the gas entering the inlet of the refrigerator a low-temperature fluid. The refrigerator further cools the low-temperature fluid through the cold head and its own heat exchanger inside, so as to output a circulating working medium with a lower temperature, thereby reducing the cold loss inside the refrigerator. The other passes through the normal-temperature flow controller 22 and enters the outlet of the refrigerator. According to the value of the twelfth temperature sensor at the outlet of the refrigerator, the opening degrees of the low-temperature flow controller 21 and the normal-temperature flow controller 22 are adjusted to obtain the required output working medium temperature. Considering the need to output high-temperature working medium, a cold source heater is provided at the outlet of the refrigerator. When the equipment requires a higher temperature, the cold source heater is started. The heater uses a DC power supply to output power to heat the working medium, and by setting the required working medium temperature, the output power can be adaptively adjusted, thus realizing the output of high-temperature working medium, avoiding the temperature fluctuation caused by the impact after the mixing of high and low temperature two-phase working media, shortening the stable time of the system, and meeting the precise control of the continuous temperature range of low and high temperatures.

[0062] The circulation system is equipped with multiple - stage precooling pipelines, which is convenient for step - by - step detection and ensures the safety of the target disk. To improve production efficiency, two low - temperature injection pipelines are designed. They can work simultaneously to transfer cold energy to the working target disk and the precooling target disk. The precooling target disk is first precooled. After the precooling process is completed, the process continues to the working target disk to complete the final low - temperature injection. An independent rewarming pipeline is designed, which is used for the rapid rewarming of the target disk by...

[0063] First, operate the first - stage precooling. The working medium circulates along the first - stage precooling pipeline. The pipeline connections are in sequence: the return air port of the first regenerator 14, the return air port of the first regenerator 14 of the second regenerator 15, the first buffer tank 16, the circulation pump, the second buffer tank 17, the low - temperature flow controller 21, the intake port of the second regenerator 15, the intake port of the first regenerator 14, the refrigerator, and the low - temperature switch valve V15. This first - stage precooling is mainly used for the self - circulation start - up cooling of the low - temperature cold - source unit. The refrigerator starts up to reduce the working medium from room temperature to the lowest temperature of - 150 °C, and monitors the operation of the cold - source unit during the cooling process. After the first - stage precooling is completed, close the low - temperature switch valve V15 and start the second - stage precooling. The working medium circulates along the second - stage precooling pipeline. The pipeline connections are in sequence: the low - temperature switch valve V14, the return air port of the first regenerator 14, the return air port of the first regenerator 14 of the second regenerator 15, the first buffer tank 16, the circulation pump, the second buffer tank 17, the low - temperature flow controller 21, the intake port of the second regenerator 15, the intake port of the first regenerator 14, the refrigerator, the low - temperature switch valve V13, and the low - temperature switch valve V16. This second - stage precooling is mainly used for the self - circulation start - up cooling of the low - temperature cold - source unit and the low - temperature distribution unit. The low - temperature cold - source unit and the low - temperature distribution unit are connected by a low - temperature double - layer pipe. The - 150 °C low - temperature working medium generated by the start - up of the refrigerator is transported to the secondary pipeline of the low - temperature distribution valve box, and monitors the operation of the working medium during the process of being transported from the low - temperature cold - source unit to the low - temperature distribution unit.

[0064] After the secondary precooling is completed, close the cryogenic switch valve V16 and start the tertiary precooling. The tertiary precooling is in parallel with two paths, namely the tertiary precooling of the working target disk and the tertiary precooling of the precooling target disk. The working medium of the tertiary precooling of the working target disk circulates along the tertiary precooling pipeline. The pipeline connections are in sequence: cryogenic switch valve V14, the return gas port of the first recuperator 14, the return gas port of the first recuperator 14 of the second recuperator 15, the first buffer tank 16, the circulation pump, the second buffer tank 17, the cryogenic flow controller 21, the intake port of the second recuperator 15, the intake port of the first recuperator 14, the refrigerator, the cryogenic switch valve V13, the cryogenic throttle valve TV1, the cryogenic switch valve V17. The tertiary precooling of the working target disk is mainly used to regulate the opening degree of the cryogenic throttle valve TV1 to complete the throttling and cooling of the cryogenic working medium. By monitoring the third temperature sensor, the lowest temperature after throttling by the cryogenic throttle valve TV1 is obtained. The working medium of the tertiary precooling of the precooling target disk circulates along the tertiary precooling pipeline. The pipeline connections are in sequence: cryogenic switch valve V14, the return gas port of the first recuperator 14, the return gas port of the first recuperator 14 of the second recuperator 15, the first buffer tank 16, the circulation pump, the second buffer tank 17, the cryogenic flow controller 21, the intake port of the second recuperator 15, the intake port of the first recuperator 14, the refrigerator, the cryogenic switch valve V13, the cryogenic throttle valve TV2, the cryogenic switch valve V18. The tertiary precooling of the precooling target disk is mainly used to regulate the opening degree of the cryogenic throttle valve TV2 to complete the throttling and cooling of the cryogenic working medium. By monitoring the second temperature sensor, the lowest temperature after throttling by the cryogenic throttle valve TV2 is obtained. The lowest temperature of domestic similar equipment can only reach -120°C. This system has a wider application temperature range and adopts the throttling and decompression cooling technology. There is a cryogenic throttle valve to reduce the nitrogen temperature below -160°C by the decompression method.

[0065] After the tertiary precooling is completed, close the cryogenic switch valve V17 and the cryogenic switch valve V18, and start the working target disk circulation system and the precooling target disk circulation system. The working medium of the working target disk circulation system circulates along the pipeline of the working target disk circulation system. The pipeline connections are in sequence: cryogenic switch valve V14, the return gas port of the first recuperator 14, the return gas port of the first recuperator 14 of the second recuperator 15, the first buffer tank 16, the circulation pump, the second buffer tank 17, the cryogenic flow controller 21, the intake port of the second recuperator 15, the intake port of the first recuperator 14, the refrigerator, the cryogenic switch valve V13, the cryogenic throttle valve TV1, the cryogenic switch valve V3, the working target disk, the cryogenic switch valve V5. The cryogenic working medium is further throttled and cooled by the cryogenic throttle valve TV1 and then transported to the working target disk. The low-temperature working target disk is used for low-temperature injection.

[0066] The inlet of the working target disk is provided with a fourth pressure relief valve SRV4. When the working fluid pressure value in the pipeline entering the cryogenic target disk exceeds a certain value and reaches the discharge pressure of the fourth pressure relief valve SRV4, the working fluid is discharged from the pipeline to avoid damage to the working target disk caused by excessive pipeline pressure, so as to protect the working target disk. At the same time, a cryogenic shut-off valve V11 is provided for evacuating and replacing the pipeline of the working target disk circulation system. The working fluid of the pre-cooling target disk circulation system circulates along the pipeline of the pre-cooling target disk circulation system. The pipeline connections are in turn the cryogenic shut-off valve V14, the return gas port of the first regenerator 14, the first return gas port of the second regenerator 15 and the first regenerator 14, the first buffer tank 16, the circulation pump, the second buffer tank 17, the cryogenic flow controller 21, the inlet of the second regenerator 15, the inlet of the first regenerator 14, the refrigerator, the cryogenic shut-off valve V13, the cryogenic throttle valve TV2, the cryogenic shut-off valve V4, the pre-cooling target disk, and the cryogenic shut-off valve V6. The cryogenic working fluid is further throttled and cooled by the cryogenic throttle valve TV2 and then transported to the pre-cooling target disk. The cryogenic pre-cooling target disk is used for process pre-cooling. The inlet of the pre-cooling target disk is provided with a fifth pressure relief valve SRV5. When the working fluid pressure value in the pipeline entering the pre-cooling target disk exceeds a certain value and reaches the discharge pressure of the fifth pressure relief valve SRV5, the working fluid is discharged from the pipeline to avoid damage to the pre-cooling target disk caused by excessive pipeline pressure, so as to protect the pre-cooling target disk. The outlet of the cryogenic distribution unit aggregate is provided with a seventh pressure relief valve SRV7 for overpressure relief protection of the return gas pipeline. At the same time, a cryogenic shut-off valve V12 is provided for evacuating and replacing the pipeline of the pre-cooling target disk circulation system.

[0067] The cryogenic distribution unit is provided with an independent target disk rewarming pipeline, including a working target disk rewarming system and a pre-cooling target disk rewarming system. The connecting pipelines of the working target disk rewarming system are in turn: normal temperature nitrogen passes through the second one-way valve, the third diaphragm valve, the target disk inlet heater, the cryogenic shut-off valve V7, the working target disk, the cryogenic shut-off valve V9, the target disk outlet heater, and the third one-way valve. The third diaphragm valve is used to control the opening and closing of the pipeline entering the target disk rewarming system. The second one-way valve prevents the nitrogen in the pipeline from flowing back. At the same time, a sixth pressure relief valve SRV6 is provided for safe relief when the working target disk rewarming system is overpressurized to protect the working target disk. The target disk outlet heater can further heat the nitrogen that has become cryogenic after heat exchange with the working target disk, prevent the discharged cryogenic nitrogen from causing frosting or even icing of the pipeline, and finally melt into water, affecting the operation of the equipment. A third one-way valve is provided at the outlet to prevent external air from flowing back into the target disk, resulting in damage to the target disk due to the freezing of moisture in the air. The connecting pipelines of the pre-cooling target disk rewarming system are in turn: normal temperature nitrogen passes through the second one-way valve, the third diaphragm valve, the target disk inlet heater, the cryogenic shut-off valve V8, the pre-cooling target disk, the cryogenic shut-off valve V10, the target disk outlet heater, and the third one-way valve.

[0068] A second electromagnetic valve is provided between the distribution valve box and the second vacuum pump to control the opening and closing of the suction pipeline. The distribution valve box is connected with a second vacuum gauge 19 to monitor the vacuum degree inside the interlayer of the distribution valve box. When the vacuum degree value is higher than the set value, the feedback signal is transmitted to the second electromagnetic valve and the second vacuum pump. According to the principle of starting the second vacuum pump first and then opening the second electromagnetic valve, it can prevent external air from entering the low-temperature valve box, resulting in instantaneous frosting and dew condensation in the cold source valve box. When the vacuum degree value reaches the set value, the second electromagnetic valve is closed first and then the second vacuum pump is closed to maintain the internal vacuum.

[0069] Safety relief valves are provided in all closable pipelines in the system. When the working medium pressure in the pipeline is too high during the operation of the system, it can be discharged outward from the safety relief valve to avoid equipment damage caused by too high pipeline pressure and ensure the safety of personnel at the same time. In the distribution valve box of the low-temperature distribution unit, the internal pipelines are successively connected with a first pressure relief valve SRV1, a first pressure relief valve SRV2, a third pressure relief valve SRV3, a fourth pressure relief valve SRV4, a fifth pressure relief valve SRV5, a sixth pressure relief valve SRV6, and a seventh pressure relief valve SRV7. The setting of the pressure relief valves fully solves the problem of ultra-high nitrogen pressure discharge in the segmented pipelines, effectively protects the working target disk and the pre-cooled target disk, and is connected to a first muffler and a second muffler after aggregation for noise reduction treatment. At the same time, after the nitrogen returns to temperature and is discharged, it is also aggregated with the discharge pipe of the pressure relief valve and discharged through the second muffler.

[0070] This embodiment has the following advantages:

[0071] 1. The system selects nitrogen as the circulating working medium. Compared with other working media, it has the remarkable characteristics of low cost, easy availability, non-toxic, harmless, and pollution-free, and can meet the needs of long-cycle semiconductor production; the technical problem to be solved is to provide a variable-temperature cycle temperature control system with a wide temperature range, large cooling capacity, high temperature control accuracy, long service life, and simple operation, which has great significance in the field of semiconductor manufacturing. This system can be widely applied to fields such as semiconductor manufacturing and testing, is suitable for the equipment on the semiconductor production line, and can continuously provide a low-temperature medium with controllable temperature to ensure the process processing temperature required by the equipment chambers in processes such as etching, ion implantation, and diffusion in the semiconductor factory.

[0072] 2. Adopting the design of a regenerative closed-cycle structure can maximize the recovery of cooling capacity and energy conservation and utilization, can achieve large flow and large cooling capacity transportation. Compared with other equipment, the cooling capacity transportation efficiency is higher, and the cooling capacity in the same temperature zone is larger.

[0073] 3. Two methods, i.e., high and low temperature fluid mixing and thermal counteraction, are adopted to control the output temperature of the fluid. The working medium is completely heated by a heater to become gaseous, and then divided into two paths through a normal temperature flow controller 22 and a low temperature flow controller 21. The two are mixed at the outlet of the refrigerator, and finally the power of the heater at the outlet is adjusted to achieve precise control of the outlet temperature. At the same time, this method can avoid the temperature fluctuation caused by the impact after the mixing of high and low temperature two-phase working media, shorten the stable time of the system, and achieve precise temperature control of the fluid working medium.

[0074] 4. The throttling and pressure reducing cooling technology is adopted. A low temperature throttle valve is provided to reduce the temperature of nitrogen to below -160°C by means of pressure reduction. The lowest temperature of the same type of equipment in the country can only reach -120°C, and this system has a wider application temperature range.

[0075] 5. In terms of the system process, a multi-stage precooling design is carried out, which is convenient for step-by-step detection and ensures the safety of the target disk. In order to improve the low temperature injection efficiency in the semiconductor production process, two low temperature injection pipelines are designed, which can simultaneously transfer cold to the working target disk and the precooling target disk. The precooling target disk is first precooled, and after the precooling process is completed, the process continues to be transferred to the working target disk to complete the final low temperature injection.

[0076] 6. An independent rewarming pipeline system for the target disk is designed. The temperature of normal temperature nitrogen rises rapidly after passing through the heater and becomes hot nitrogen. The heated nitrogen is transported to the low temperature target disk, and the low temperature target disk is rewarmed by using the heat of nitrogen, which can realize the rapid rewarming of the low temperature target disk and greatly improve the working efficiency. At the same time, an outlet gas heater is further set at the outlet of the target disk to further heat the low temperature nitrogen after heat exchange with the low temperature target disk to prevent frosting or even icing of the pipeline caused by the discharge of low temperature nitrogen.

[0077] 7. Safety relief valves are provided on all closable pipelines in the system. When the pressure of the working medium in the pipeline is too high during the operation of the system, it can be discharged outward from the safety relief valve to avoid equipment damage caused by too high pipeline pressure and ensure the safety of personnel at the same time.

[0078] 8. The system adopts a chain feedback design. By measuring the pressure value in the pipeline, the automatic air replenishment function can be realized; by measuring the value of the interlayer vacuum degree, the automatic start of the pump for evacuation can be realized. This design fully realizes the highly automated operation of the system, completely solves the problem of manual operation, liberates the hands of workers, and improves the working efficiency.

[0079] The above is only the preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and inventive concept of the present invention, makes equivalent substitutions or changes, and all should be covered within the protection scope of the present invention.

Claims

1. A high-security variable-temperature cycle temperature control system, comprising: A low-temperature cold source unit and a low-temperature distribution unit, characterized in that, The low-temperature distribution unit includes a distribution valve box (5) and a second vacuum pump (6). A second vacuum gauge (19) for detecting the internal vacuum degree is provided on the distribution valve box (5). The second vacuum pump (6) is used to evacuate the distribution valve box (5) according to the detection result of the second vacuum gauge (19). A cold quantity outlet and a heat regeneration inlet connected to the target disk, a second cold quantity inlet and a second heat regeneration outlet connected to the low-temperature cold source unit, a nitrogen inlet and a nitrogen outlet are provided on the distribution valve box (5). A nitrogen inlet pipeline (23), a nitrogen outlet pipeline (24), a low-temperature inlet pipeline and a low-temperature return pipeline are provided in the distribution valve box (5). The two ends of the nitrogen inlet pipeline (23) are respectively communicated with the nitrogen inlet and the cold quantity outlet. The two ends of the nitrogen outlet pipeline (24) are respectively connected to the heat regeneration inlet and the nitrogen outlet. The two ends of the low-temperature inlet pipeline are respectively connected to the second cold quantity inlet and the cold quantity outlet. The two ends of the low-temperature return pipeline are respectively communicated with the heat regeneration inlet and the second heat regeneration outlet. An inlet heater (8) is provided on the nitrogen inlet pipeline (23) and an outlet heater (9) is provided on the nitrogen outlet pipeline (24); The low-temperature cold source unit includes a cold source valve box (1), a refrigerator (2), a circulation pump (3), a first vacuum pump (4) and a gas supplement device. A first vacuum gauge (18) for detecting the internal vacuum degree is provided on the cold source valve box (1). The first vacuum pump (4) is used to evacuate the cold source valve box (1) according to the detection result of the first vacuum gauge (18). A first heat regeneration outlet and a first cold quantity inlet respectively connected to the input end and the output end of the refrigerator (2) are further provided on the cold source valve box (1). A heat regenerator, a first outlet switch valve V13 and a first inlet switch valve V14 are provided in the cold source valve box (1). The first outlet switch valve V13 is connected to the first cold quantity inlet. The first heat regeneration outlet is sequentially connected to the high-temperature channel of the heat regenerator, the circulation pump (3), the low-temperature channel of the heat regenerator and the first inlet switch valve V14; The gas supplement device is connected to the pipeline between the circulation pump (3) and the low-temperature channel of the heat regenerator for supplementing gas to the loop of the low-temperature cold source unit; The low-temperature cold source unit further includes a first buffer tank (16), and the first buffer tank (16) is connected to the pipeline between the circulation pump (3) and the low-temperature channel of the heat regenerator; The low-temperature cold source unit further includes a second buffer tank (17), and the second buffer tank (17) is arranged on the pipeline between the circulation pump (3) and the high-temperature channel of the heat regenerator.

2. The high-security variable-temperature cycle temperature control system according to claim 1, characterized in that, A ninth pressure sensor is provided on the first buffer tank (16), and the gas supplement device supplements gas to the loop according to the detected pressure value of the ninth pressure sensor.

3. The high-security variable-temperature cycle temperature control system according to claim 2, wherein The gas supplement device includes a filter (25), a pressure reducing valve, a first diaphragm valve BV1 and a first one-way valve connected in series in the intake direction. The filter (25) is used to remove moisture in the intake air.

4. The high-security variable-temperature cycling temperature control system according to claim 1, characterized in that, A ninth pressure relief valve SRV9 is provided on the second buffer tank (17).

5. The high-security variable-temperature cycle temperature control system according to claim 1, characterized in that, A low-temperature throttle valve TV is further provided in the distribution valve box (5), and the low-temperature throttle valve TV is connected in series on the low-temperature inlet pipeline.

6. The high-security variable-temperature cycling temperature control system according to claim 5, characterized in that A first pressure relief valve SRV1 is provided on the pipeline between the low-temperature throttle valve TV and the second cold energy inlet, and a third pressure relief valve SRV3 is provided on the pipeline between the low-temperature throttle valve TV and the cold energy outlet.

7. The high-security variable-temperature cycle temperature control system according to claim 1, wherein A sixth pressure relief valve SRV6 is provided on the pipeline upstream of the inlet heater (8).

8. The high-security variable-temperature cycle temperature control system according to claim 1, characterized in that, A fourth pressure relief valve SRV4 is provided at the cold energy outlet.

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