Polishing device for copper metal material machining

Abstract

The invention relates to the technical field of machining, in particular to a polishing device for copper metal material machining, which comprises polishing equipment mounted on a machine shell and a storage table slidably arranged on the machine shell, and a sliding seat extending into the machine shell is fixed on the lower surface of the storage table. A shielding plate for shielding the sliding groove and a collecting structure connected with the shielding plate are arranged in the machine shell, the side, away from the collecting structure, of the shielding plate extends into the sliding base, a pushing mechanism and a liquid discharging structure are further arranged in the machine shell, and the pushing mechanism is connected with the collecting structure and the sliding base. The collecting structure is slidably arranged on the side, away from the sliding base, of the shielding plate, and the collecting structure achieves collection and achieves lifting through output of the pushing mechanism. The material guiding and collecting device has the advantages of efficient impurity discharging and collecting, the material guiding and collecting efficiency is improved, pollution is reduced, meanwhile, equipment can be protected, operation convenience is improved, and safety is enhanced.

Description

Technical Field

[0001] The invention relates to the technical field of mechanical processing, in particular to a polishing device for processing copper metal materials. Background Art

[0002] Some metal materials are usually polished with a polishing device before use to perform surface polishing and other operations. Therefore, polishing equipment is used for processing copper metal materials; Chinese patent publication number CN215919936U discloses "an automatic and precisely positioned surface grinder, comprising: a base, a first motor is fixedly mounted on the top of the base by screws, a first screw is connected to a keyway at the output shaft of the first motor, a clamping mechanism is provided above the first screw, and a placement groove is provided on the upper surface of the base. This application enables the automatic positioning function through the cooperation between the first motor and the first screw, and does not require manual positioning by the user. The motor only needs to rotate to change the position between the base and the clamping mechanism, thereby achieving the effect of precise positioning."

[0003] However, the above patent still has the following defects: For example, the function of shielding the screw placement groove is lacking, and polishing materials such as abrasives and polishing liquid will splash out during the polishing process. The lack of shielding function cannot effectively prevent these splashes from entering the screw placement groove, causing the screw track to be easily damaged, and the subsequent cleaning is extremely inconvenient, which affects the service life of the screw guide rail.

[0004] Therefore, there is an urgent need to improve the polishing device to solve the above-mentioned problems. Summary of the invention

[0005] The purpose of the present invention is to provide a polishing device for copper metal material processing, which has the advantages of efficient impurity removal and collection, not only improving the material guiding and collection efficiency, but also reducing pollution, while being able to protect equipment, improve operational convenience and enhance safety.

[0006] In order to achieve the above-mentioned purpose, the main technical scheme adopted by the present invention includes: a polishing device installed on the housing and a storage table slidably arranged on the housing, a slide seat extending into the interior of the housing is fixed to the lower surface of the storage table, and a slide groove for moving the storage table is opened inside the housing; The housing is provided with a shielding plate for shielding the slide groove and a collecting structure connected to the shielding plate, the shielding plate extends to the inside of the slide seat at a side away from the collecting structure, and the housing is also provided with a pushing mechanism and a liquid discharge structure, the pushing mechanism is respectively connected to the collecting structure and the slide seat, and the collecting structure is slidably arranged on a side of the shielding plate away from the slide seat, wherein the collecting structure realizes collection and is lifted and lowered through the output of the pushing mechanism, and cooperates with the liquid discharge structure to realize the discharge of waste scraps and waste liquid; A first material guiding trough and a second material guiding trough for guiding materials are provided inside the shielding plate, and the first material guiding trough is communicated with the collecting structure.

[0007] Preferably, the first material inlet trough is arranged in an inclined shape, and the number of the second material inlet troughs is two, and the two second material inlet troughs are arranged on both sides of the first material inlet trough opposite to each other.

[0008] Preferably, the collecting structure comprises a collecting shell slidably mounted on a side of the shielding plate away from the sliding seat, a collecting groove and a first opening are provided inside the collecting shell, and the collecting groove and the first material guiding groove are connected through the first opening.

[0009] Preferably, two guide blocks are fixed to one side of the shielding plate close to the collecting shell, a guide groove matched with the guide blocks is provided on one side of the collecting shell close to the shielding plate, and a filtering structure is embedded in the collecting groove.

[0010] Preferably, the filter structure includes a filter frame that is detachably installed inside the collecting tank, a second opening that is compatible with the first opening is opened on one side of the filter frame, a plurality of filter holes are opened inside the filter frame, two handles are bolted to the outer surface of the filter frame, and an inspection plate for disassembling and assembling the filter structure is hinged on the upper surface of the casing.

[0011] Preferably, an abutment structure for use with a pushing mechanism is fixed to the side of the collecting shell away from the baffle plate, and the abutment structure includes a wheel frame, an abutment roller with a bearing installed on the inner side of the wheel frame, and a sleeve and a telescopic rod fixed to the side of the wheel frame away from the abutment roller. One end of the telescopic rod extends into the interior of the sleeve, and the other end of the telescopic rod is bolted to the outer surface of the wheel frame, a buffer spring is fixed inside the sleeve, and one end of the telescopic rod extending into the sleeve is connected and fixed to the buffer spring.

[0012] Preferably, the number of the abutment structures is two, and the pushing mechanism includes a mounting base slidably arranged inside the casing, a connecting shaft fixed to the upper surface of the mounting base, and a double-axis cylinder fixed inside the casing, one of the output ends of the double-axis cylinder is hinged to the outer surface of the connecting shaft, and a pushing arm is hinged between the outer surface of the connecting shaft and the lower surface of the collection shell, and the pushing arm is arranged in an inclined state.

[0013] Preferably, a connecting seat is fixed on the other output shaft of the double-axis cylinder, and the connecting seat is fixed to the lower surface of the slide seat by bolts. The slide seat is displaced by telescoping the other output shaft of the double-axis cylinder. The collecting shell is located on the mounting seat and is closer to the inner wall of the casing. The mounting seat is driven by the output of the double-axis cylinder, and the collecting shell is also displaced at the same time. The abutment structure on the collecting shell abuts against the inner wall of the casing. At this time, the collecting shell is lifted and lowered by the abutment roller and the pushing arm.

[0014] Preferably, two guide structures are fixed inside the casing, and the guide structures are distributed on both sides of the mounting seat to achieve limited guiding of the mounting seat. The drainage structure includes a valve tube and a valve shell fixed inside the casing, the valve shell is connected to the valve tube, a diaphragm is elastically installed inside the valve shell, and two check valves are elastically hinged inside the valve tube. The upper and lower ends of the valve tube are fixedly connected with connecting pipes, the connecting pipe at the top is fixed to the lower surface of the collecting shell, and the connecting pipe is connected to the collecting tank, and the connecting pipe at the bottom extends out of the casing.

[0015] Preferably, a connecting rod extending to the outside of the valve housing is fixed on one side of the diaphragm, and a contact block intermittently abuts against the mounting seat is threadedly installed on the other end of the connecting rod, a circular piece is fixed to the outer surface of the connecting rod, and a return spring surrounding the outside of the connecting rod is fixed between the circular piece and the valve housing, and a valve seat fixed to the inner bottom wall of the casing is welded to the outer surface of the valve housing.

[0016] The present invention has at least the following beneficial effects: 1. The polishing device for copper metal material processing can avoid pollution to the working area through the design of the baffle plate and the collecting structure. The baffle plate also plays a role in protecting the chute to prevent waste chips and waste liquid from entering the chute and causing blockage or damage, thereby ensuring the smooth operation of the polishing device. At the same time, through the design of the baffle plate, the first feed trough and the second feed trough, the waste chips and waste liquid can be effectively guided to the collecting structure, thereby avoiding pollution of the working environment. The setting of the filtering structure ensures that impurities in the waste liquid are removed, thereby improving the reuse value of the waste liquid or the environmental friendliness of the discharge.

[0017] 2. The polishing device for copper metal material processing realizes the lifting and lowering of the collection structure and the movement of the storage table through the use of a dual-axis cylinder, thereby improving the automation level of the polishing process. The design of the drainage structure realizes the intelligent discharge of waste liquid and reduces the difficulty of operation.

[0018] 3. The polishing device for copper metal material processing can ensure that waste chips and waste liquid flow smoothly into the collection structure under the action of gravity through the inclined setting of the first material guide trough. This design reduces the retention of waste chips and waste liquid in the working area and improves the collection efficiency.

[0019] 4. The polishing device for copper metal material processing has two second material guide grooves, which are relatively arranged on both sides of the first material guide groove, further expanding the material guide area so that waste chips and waste liquid can be more evenly distributed and collected, which helps prevent waste chips and waste liquid from accumulating on the baffle plate and keep the working area clean.

[0020] 5. The polishing device for copper metal material processing realizes solid-liquid separation of waste liquid and waste residue by embedding the filtering structure. The waste liquid flows into the bottom of the collection tank through the filter holes, while the waste residue is intercepted by the filter frame, which improves the collection efficiency of the waste residue and facilitates the subsequent separate treatment of the waste liquid and waste residue.

[0021] 6. The polishing device for copper metal material processing, through the design of the abutment structure, especially the use of the abutment roller, enables the collection shell to smoothly contact the inner wall of the casing during the lifting process, reducing friction and resistance, thereby ensuring the stability of the lifting. The combination of the telescopic rod and the buffer spring provides additional support and buffering for the abutment roller, further enhancing the stability during the lifting process.

[0022] 7. The polishing device used for copper metal material processing has a drainage structure designed to realize automatic discharge of waste liquid. When the dual-axis cylinder drives the mounting seat, it pushes the abutment block to move, so that the connecting rod drives the diaphragm to compress the space in the valve housing. The movement of the diaphragm opens the check valve in the valve pipe, and the waste liquid is discharged from the valve pipe through the connecting pipe. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings: Figure 1 It is a three-dimensional diagram of the overall structure of the present invention; Figure 2 is a structural cross-sectional view of the casing of the present invention; Figure 3 For the present invention Figure 2 A is a schematic diagram of the enlarged structure shown; Figure 4 It is a schematic diagram of the structure of the collection structure and the driving mechanism in the present invention; Figure 5 It is a structural schematic diagram of the driving mechanism in the present invention; Figure 6 It is a structural schematic diagram of the shielding plate in the present invention; Figure 7 It is a structural schematic diagram of the driving mechanism in the present invention; Figure 8 It is a structural schematic diagram of the collection structure in the present invention; Fig. 9 It is a structural schematic diagram of the filtering structure in the present invention; Fig.10 It is a structural schematic diagram of the abutment structure in the present invention; Fig.11 is a structural cross-sectional view of the liquid discharge structure in the present invention; Fig.12It is a structural front view of the liquid drainage structure in the present invention.

[0024] In the figure, 1, housing; 2, polishing equipment; 3, storage table; 31, slide seat; 4, slide slot; 5, shielding plate; 51, first material guide slot; 52, second material guide slot; 53, guide block; 6, collecting structure; 61, collecting shell; 62, collecting slot; 63, first opening; 64, abutting structure; 641, wheel frame; 642, abutting roller; 643, sleeve; 644, telescopic rod; 645, buffer spring; 65, filtering structure; 651, filtering frame; 652 , second port; 653, filter hole; 654, handle; 66, guide groove; 7, pushing mechanism; 71, mounting seat; 72, connecting shaft; 73, double-axis cylinder; 74, connecting seat; 75, pushing arm; 8, drainage structure; 81, valve pipe; 82, valve shell; 83, diaphragm; 84, check valve; 85, connecting pipe; 86, connecting rod; 87, abutment block; 88, circular piece; 89, reset spring; 810, valve seat; 9, inspection plate; 10, guide structure. DETAILED DESCRIPTION

[0025] The technical solution of the present invention is further described in detail below in conjunction with specific implementation methods.

[0026] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0027] like Figure 1 and Figure 2 As shown, the polishing device for copper metal material processing provided in this embodiment includes a polishing device 2 installed on a housing 1 and a storage table 3 slidably arranged on the housing 1, a slide seat 31 extending to the inside of the housing 1 is fixed on the lower surface of the storage table 3, and a slide groove 4 for moving the storage table 3 is provided inside the housing 1; wherein a storage groove is provided inside the slide seat 31. Two copper metal material fixing structures are symmetrically distributed on the upper surface of the storage table 3. The polishing device 2 is located above the storage table 3.

[0028] To improve the protection effect, Figure 1 - Fig.12As shown, the housing 1 is provided with a shielding plate 5 for shielding the slide 4 and a collecting structure 6 connected to the shielding plate 5. The side of the shielding plate 5 away from the collecting structure 6 extends to the inside of the slide 31, and the length of the storage slot is adapted to the adjustment distance of the shielding plate 5. The housing 1 is also provided with a pushing mechanism 7 and a liquid discharge structure 8. The pushing mechanism 7 is connected to the collecting structure 6 and the slide 31 respectively. The collecting structure 6 is slidably arranged on the side of the shielding plate 5 away from the slide 31. The collecting structure 6 realizes collection and lifting through the output of the pushing mechanism 7, and cooperates with the liquid discharge structure 8 to realize the discharge of waste chips and waste liquid; Figure 1 - Figure 6 As shown, a first material guide trough 51 and a second material guide trough 52 for guiding materials are provided inside the shielding plate 5, and the first material guide trough 51 is connected to the collection structure 6. It should be noted that the first material guide trough 51 is arranged in an inclined shape, which can ensure that waste chips and waste liquid flow smoothly into the collection structure 6 under the action of gravity. This design reduces the retention of waste chips and waste liquid in the working area and improves the collection efficiency. There are two second material guide troughs 52, and the two second material guide troughs 52 are relatively arranged on both sides of the first material guide trough 51, which further expands the material guiding area, so that waste chips and waste liquid can be more evenly distributed and collected. This helps to prevent waste chips and waste liquid from accumulating on the shielding plate 5 and keep the working area clean.

[0029] Specifically, through the design of the shielding plate 5 and the collection structure 6, waste chips and waste liquid are effectively guided to the collection area, avoiding their contamination of the working area. This helps to keep the device clean and extend its service life. The shielding plate 5 also plays a role in protecting the chute 4, preventing waste chips and waste liquid from entering the chute 4 and causing blockage or damage. This ensures the smooth operation of the polishing device.

[0030] like Figure 4 , Figure 6 , Figure 8 - Fig.10 As shown, the collecting structure 6 includes a collecting shell 61 slidably mounted on the side of the shielding plate 5 away from the sliding seat 31, and a collecting groove 62 and a first opening 63 are opened inside the collecting shell 61. The collecting groove 62 and the first material guide groove 51 are connected through the first opening 63. In order to ensure the stable lifting of the collecting shell 61, as shown in FIG. Figure 4 , Figure 6 and Figure 8As shown, two guide blocks 53 are fixed on the side of the baffle plate 5 close to the collection shell 61, and a guide groove 66 matched with the guide block 53 is provided on the side of the collection shell 61 close to the baffle plate 5. The collection shell 61 is matched with the guide block 53 on the baffle plate 5 through the guide groove 66, ensuring the stability of the collection shell 61 during the lifting process. This design prevents the collection shell 61 from offsetting or shaking during lifting, ensuring that waste chips and waste liquid can be accurately guided into the collection groove 62. It should be noted that a tooth slidably connected to the guide block 53 is fixed on the inner side of the guide groove 66, and the tooth and the guide block 53 are arranged in the XY axis, so as to facilitate the movement of the baffle plate 5 when the collection shell 61 is displaced. The lifting height of the collection shell 61 is matched with the output distance of the dual-axis cylinder 73.

[0031] In order to achieve solid-liquid separation and better collect waste residue, such as Figure 8 and Fig. 9 As shown, a filter structure 65 is embedded in the collection tank 62. The filter structure 65 includes a filter frame 651 that is detachably mounted inside the collection tank 62. A second opening 652 that matches the first opening 63 is provided on one side of the filter frame 651. A plurality of filter holes 653 are provided inside the filter frame 651. Two handles 654 are bolted to the outer surface of the filter frame 651. The embedding of the filter structure 65 realizes the solid-liquid separation of waste liquid and waste residue. The waste liquid flows into the bottom of the collection tank 62 through the filter holes 653, while the waste residue is intercepted by the filter frame 651. This design improves the collection efficiency of waste residue and facilitates the subsequent separate treatment of waste liquid and waste residue. In addition, the second opening 652 on the filter frame 651 matches the first opening 63, ensuring that waste scraps and waste liquid can smoothly enter the filter structure 65, further improving the collection efficiency. An inspection plate 9 for disassembling and assembling the filter structure 65 is hinged on the upper surface of the housing 1. The access panel 9 hinged on the upper surface of the housing 1 provides convenience for the disassembly and assembly of the filter structure 65. When the filter frame 651 needs to be cleaned or replaced, the filter structure 65 can be easily accessed by opening the access panel 9 without disassembling the entire collection structure 6.

[0032] To ensure stable lifting of the collecting shell 61, Figure 4 and Fig.10As shown, abutment structure 64 used in cooperation with the pushing mechanism 7 is fixed on the side of the collecting shell 61 away from the shielding plate 5, and the abutment structure 64 includes a wheel frame 641, an abutment roller 642 whose bearing is installed on the inner side of the wheel frame 641, and a sleeve 643 and a telescopic rod 644 fixed to the side of the wheel frame 641 away from the abutment roller 642. One end of the telescopic rod 644 extends into the sleeve 643, and the other end of the telescopic rod 644 is bolted to the outer surface of the wheel frame 641. A buffer spring 645 is fixed inside the sleeve 643, and one end of the telescopic rod 644 extends into the sleeve 643 and is connected and fixed to the buffer spring 645. The sleeve 643 is fixed to the outer surface of the collecting shell 61 by bolts. Through the design of the abutment structure 64, especially the use of the abutment roller 642, the collecting shell 61 can stably contact the inner wall of the casing 1 during the lifting process, reducing friction and resistance, thereby ensuring the stability of lifting. The combination of the telescopic rod 644 and the buffer spring 645 provides additional support and buffering for the abutment roller 642, further enhancing the stability during the lifting process. Specifically, the number of the abutment structures 64 is two. Figure 2 , Figure 4 - Figure 7 As shown, the pushing mechanism 7 includes a mounting seat 71 slidably arranged inside the housing 1, a connecting shaft 72 fixed to the upper surface of the mounting seat 71, and a double-axis cylinder 73 fixed inside the housing 1, one output end of the double-axis cylinder 73 is hinged to the outer surface of the connecting shaft 72, and a pushing arm 75 is hinged between the outer surface of the connecting shaft 72 and the lower surface of the collecting shell 61, and the pushing arm 75 is arranged in an inclined shape. There are two connecting shafts 72 and four pushing arms 75.

[0033] like Figure 5 and Figure 7 As shown, specifically, a connecting seat 74 is fixed on the other output shaft of the double-axis cylinder 73, and the connecting seat 74 is fixed to the lower surface of the slide 31 by bolts. The slide 31 is adjusted by the telescopic movement of the other output shaft of the double-axis cylinder 73. The collection shell 61 is located on the mounting seat 71 and is closer to the inner wall of the casing 1. The mounting seat 71 is driven by the output of the double-axis cylinder 73, and the collection shell 61 is displaced at the same time. The abutment structure 64 on the collection shell 61 abuts against the inner wall of the casing 1. At this time, the collection shell 61 is lifted and lowered by the abutment roller 642 and the push arm 75. It should be noted that the number of the collection structure 6, the shielding plate 5, the pushing mechanism 7, the drainage structure 8 and the inspection plate 9 are all two, and the two shielding plates 5, the two collection structures 6, the pushing mechanism 7, the drainage structure 8 and the inspection plate 9 are all arranged symmetrically.

[0034] To ensure stable movement of the mounting seat 71, Figure 2 and Figure 7As shown, two guide structures 10 are fixed inside the housing 1, and the guide structures 10 are distributed on both sides of the mounting seat 71 to achieve position limiting guidance for the mounting seat 71. The setting of the guide structure 10 provides position limiting guidance for the mounting seat 71, preventing it from deflecting or shaking during movement. This design improves the movement accuracy and stability of the mounting seat 71, thereby ensuring the lifting accuracy of the collection shell 61.

[0035] To achieve waste liquid discharge, such as Figure 1 , Figure 2 , Fig.11 and Fig.12 As shown, the drainage structure 8 includes a valve tube 81 and a valve shell 82 fixed inside the casing 1, the valve shell 82 is connected to the valve tube 81, a diaphragm 83 is elastically installed inside the valve shell 82, two check valves 84 are elastically hinged inside the valve tube 81, and the upper and lower ends of the valve tube 81 are fixedly connected with a connecting tube 85, the top connecting tube 85 is fixed to the lower surface of the collecting shell 61, and the connecting tube 85 is connected to the collecting tank 62, and the bottom connecting tube 85 extends out of the casing 1. Among them, a connecting rod 86 extending to the outside of the valve housing 82 is fixed on one side of the diaphragm 83, and a contact block 87 intermittently abutting against the mounting seat 71 is threadedly installed on the other end of the connecting rod 86. A circular sheet 88 is fixed on the outer surface of the connecting rod 86, and a reset spring 89 surrounding the outside of the connecting rod 86 is fixed between the circular sheet 88 and the valve housing 82. The combination of the reset spring 89 and the circular sheet 88 provides a reset force for the diaphragm 83 and the connecting rod 86, ensuring that the discharge structure 8 can return to the initial state after the waste liquid is discharged, and prepare for the next discharge. A valve seat 810 fixed to the inner bottom wall of the casing 1 is welded on the outer surface of the valve housing 82. When the dual-axis cylinder 73 drives the mounting seat 71, it will push the abutment block 87 to move, so that the connecting rod 86 drives the diaphragm 83 to compress the space in the valve housing 82, and the movement of the diaphragm 83 opens the check valve 84 in the valve pipe 81, and the waste liquid is discharged from the valve pipe 81 through the connecting pipe 85.

[0036] It is worth mentioning that the present application shields the slide 4 through the baffle plate 5, and utilizes the first feed trough 51 and the second feed trough 52 to discharge impurities, collects through the collecting shell 61, and simultaneously performs solid-liquid separation through the filtering structure 65. When slag discharge is required, firstly, the mounting seat 71 is driven to move back and forth by the short-distance extension and contraction of the double-axis cylinder 73. The mounting seat 71 reciprocates and intermittently fits with the abutment block 87, so that the connecting rod 86 drives the diaphragm 83 to compress the space in the valve shell 82, cooperates with the two check valves 84 to open and close, and drains the waste liquid in the collecting trough 62. After the waste liquid is drained, the output distance of the double-axis cylinder 73 is extended, and the collecting shell 61 is lifted up by the rotation of the pushing arm 75, and then the collecting shell 61 is pushed to the bottom of the inspection plate 9. The inspection plate 9 is opened, and the filter frame 651 can be picked up for cleaning.

[0037] like Figure 1 - Fig.12 As shown, the principle of the polishing device for copper metal material processing provided in this embodiment is as follows: First, the polishing device 2 polishes the copper metal material placed on the storage table 3. The waste chips and waste liquid generated during the polishing process fall on the shielding plate 5. The waste chips and waste liquid enter the collecting tank 62 of the collecting structure 6 through the first material guide groove 51 and the second material guide groove 52 on the shielding plate 5. The filtering structure 65 filters the waste liquid. The waste chips are left on the filtering frame 651, and the filtered waste liquid flows into the bottom of the collecting tank 62. The double-axis cylinder 73 works, one output shaft pushes the collection shell 61 up and down through the connecting shaft 72 and the pushing arm 75, and the other output shaft can drive the slide seat 31 and the storage table 3 to move through the connecting seat 74 to adjust the polishing position; When the dual-axis cylinder 73 drives the mounting seat 71, it pushes the abutment block 87 to move, so that the connecting rod 86 drives the diaphragm 83 to compress the space in the valve housing 82. The movement of the diaphragm 83 opens the check valve 84 in the valve pipe 81, and the waste liquid is discharged from the valve pipe 81 through the connecting pipe 85. When it is necessary to discharge the granular waste, the double-axis cylinder 73 drives the mounting seat 71 again, and the mounting seat 71 drives the collection shell 61 to move through the push arm 75. At this time, the collection shell 61 first abuts against the inner wall of the casing 1. Under the continuous output of the double-axis cylinder 73, the push arm 75 hinged between the connecting shaft 72 and the collection shell 61 rotates, and then the collection shell 61 is lifted up and down. Then, the inspection plate 9 is opened, so that the filter structure 65 can be easily moved out of the collection shell 61 and the casing 1. In addition, when the collecting shell 61 abuts against the inner wall of the casing 1, the abutting roller 642 in the abutting structure 64 rolls on the inner wall of the casing 1 to reduce friction, and provides buffering through the buffer spring 645, while facilitating the pushing mechanism 7 to lift the collecting shell 61 for waste residue discharge.

[0038] For example, certain words are used in the specification and claims to refer to specific components. Those skilled in the art should understand that hardware manufacturers may use different terms to refer to the same component. This specification and claims do not use differences in names as a way to distinguish components, but use differences in the functions of components as the criteria for distinction. For example, "including" mentioned throughout the specification and claims is an open term, so it should be interpreted as "including but not limited to". "Approximately" means that within an acceptable error range, those skilled in the art can solve technical problems within a certain error range and basically achieve technical effects.

Claims

1. A polishing device for copper metal material processing, comprising a polishing device (2) mounted on a housing (1) and a storage table (3) slidably arranged on the housing (1), characterized in that: A slide seat (31) extending into the interior of the housing (1) is fixed to the lower surface of the storage table (3); a slide groove (4) for moving the storage table (3) is provided inside the housing (1); The housing (1) is provided with a shielding plate (5) for shielding the slide groove (4) and a collecting structure (6) connected to the shielding plate (5); the shielding plate (5) extends to the inside of the slide seat (31) on a side away from the collecting structure (6); a pushing mechanism (7) and a liquid discharge structure (8) are also provided inside the housing (1); the pushing mechanism (7) is connected to the collecting structure (6) and the slide seat (31) respectively; the collecting structure (6) is slidably arranged on a side of the shielding plate (5) away from the slide seat (31); wherein the collecting structure (6) realizes collection and lifting through the output of the pushing mechanism (7), and cooperates with the liquid discharge structure (8) to realize the discharge of waste chips and waste liquid; A first material guiding groove (51) and a second material guiding groove (52) for guiding materials are provided inside the shielding plate (5), and the first material guiding groove (51) is connected to the collecting structure (6).

2. The polishing device for copper metal material processing according to claim 1, characterized in that: The first material inlet groove (51) is arranged in an inclined shape, and the number of the second material inlet grooves (52) is two, and the two second material inlet grooves (52) are arranged opposite to each other on both sides of the first material inlet groove (51).

3. The polishing device for copper metal material processing according to claim 2, characterized in that: The collecting structure (6) comprises a collecting shell (61) slidably mounted on a side of the shielding plate (5) away from the sliding seat (31); a collecting groove (62) and a first opening (63) are provided inside the collecting shell (61); the collecting groove (62) and the first material guide groove (51) are connected via the first opening (63).

4. The polishing device for copper metal material processing according to claim 3, characterized in that: Two guide blocks (53) are fixed to one side of the shielding plate (5) close to the collecting shell (61); a guide groove (66) matching the guide blocks (53) is provided on one side of the collecting shell (61) close to the shielding plate (5); and a filtering structure (65) is embedded in the collecting groove (62).

5. The polishing device for copper metal material processing according to claim 4, characterized in that: The filter structure (65) comprises a filter frame (651) detachably mounted inside the collection tank (62); a second opening (652) matching the first opening (63) is provided on one side of the filter frame (651); a plurality of filter holes (653) are provided inside the filter frame (651); two handles (654) are bolted to the outer surface of the filter frame (651); and an inspection plate (9) for disassembling and assembling the filter structure (65) is hingedly connected to the upper surface of the housing (1).

6. The polishing device for copper metal material processing according to claim 5, characterized in that: An abutment structure (64) used in conjunction with the pushing mechanism (7) is fixed to the side of the collecting shell (61) away from the shielding plate (5), the abutment structure (64) comprising a wheel frame (641), an abutment roller (642) whose bearing is mounted on the inner side of the wheel frame (641), and a sleeve (643) and a telescopic rod (644) fixed to the side of the wheel frame (641) away from the abutment roller (642). One end of the telescopic rod (644) extends into the interior of the sleeve (643), and the other end of the telescopic rod (644) is bolted to the outer surface of the wheel frame (641). A buffer spring (645) is fixed to the interior of the sleeve (643), and one end of the telescopic rod (644) extending into the sleeve (643) is connected and fixed to the buffer spring (645).

7. The polishing device for copper metal material processing according to claim 6, characterized in that: The number of the abutment structures (64) is two, and the pushing mechanism (7) comprises a mounting seat (71) slidably arranged inside the housing (1), a connecting shaft (72) fixed to the upper surface of the mounting seat (71), and a double-axis cylinder (73) fixed to the inside of the housing (1), one of the output ends of the double-axis cylinder (73) is hinged to the outer surface of the connecting shaft (72), and a pushing arm (75) is hinged between the outer surface of the connecting shaft (72) and the lower surface of the collection shell (61), and the pushing arm (75) is arranged in an inclined state.

8. The polishing device for copper metal material processing according to claim 7, characterized in that: A connecting seat (74) is fixed on the other output shaft of the double-axis cylinder (73); the connecting seat (74) is fixed to the lower surface of the slide seat (31) by bolts; the slide seat (31) is adjusted in displacement by telescoping the other output shaft of the double-axis cylinder (73); the collecting shell (61) is located on the mounting seat (71) and is closer to the inner wall of the casing (1); the mounting seat (71) is driven by the output of the double-axis cylinder (73), and the collecting shell (61) is also driven to move; the abutting structure (64) on the collecting shell (61) abuts against the inner wall of the casing (1); at this time, the collecting shell (61) is lifted or lowered by the abutting roller (642) and the pushing arm (75).

9. The polishing device for copper metal material processing according to claim 8, characterized in that: Two guide structures (10) are fixed inside the casing (1), and the guide structures (10) are distributed on both sides of the mounting seat (71) to achieve position limiting guidance for the mounting seat (71). The liquid discharge structure (8) comprises a valve tube (81) and a valve shell (82) fixed inside the casing (1), the valve shell (82) being connected to the valve tube (81), a diaphragm (83) being elastically installed inside the valve shell (82), and two check valves (84) being elastically hinged inside the valve tube (81), and a connecting tube (85) being fixedly connected at both upper and lower ends of the valve tube (81), the connecting tube (85) being fixed at the top to the lower surface of the collecting shell (61), and being connected to the collecting tank (62), and the connecting tube (85) at the bottom extending out of the casing (1).

10. The polishing device for copper metal material processing according to claim 9, characterized in that: A connecting rod (86) extending to the outside of the valve housing (82) is fixed to one side of the diaphragm (83); an abutment block (87) intermittently abutting against the mounting seat (71) is threadedly mounted on the other end of the connecting rod (86); a circular sheet (88) is fixed to the outer surface of the connecting rod (86); a return spring (89) surrounding the outside of the connecting rod (86) is fixed between the circular sheet (88) and the valve housing (82); and a valve seat (810) fixed to the inner bottom wall of the housing (1) is welded to the outer surface of the valve housing (82).

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