Magnetic field adjusting mechanism, reaction chamber and plasma equipment

Abstract

The embodiment of the invention provides a magnetic field adjusting mechanism, a reaction chamber and plasma equipment. The magnetic field adjusting mechanism is applied to a reaction chamber of the plasma equipment, the reaction chamber is provided with a reaction cavity, the magnetic field adjusting mechanism comprises a magnetic assembly and a guide assembly, and the magnetic assembly is used for generating a first magnetic field in the reaction cavity; the magnetic assembly is movably connected to the guide assembly, and the magnetic assembly can move in the circumferential direction of the guide assembly and can move in the axial direction or / and the radial direction of the guide assembly so as to adjust the first magnetic field. According to the embodiment of the invention, the magnetic assembly is movably connected to the guide assembly, and the magnetic assembly can move in multiple directions on the guide assembly, so that the position and direction of the magnetic assembly can be flexibly adjusted, and the application of the first magnetic field to adjust the magnetic field distribution in the reaction chamber is enhanced; therefore, the distribution flexibility of the plasmas in the reaction chamber is adjusted.

Description

Technical Field

[0001] The present application relates to the semiconductor field, and in particular to a magnetic field adjustment mechanism, a reaction chamber and a plasma device. Background Art

[0002] In a plasma device that generates plasma by excitation of a spiral coil, due to the influence of the earth's magnetic field (or other magnetic field sources), the relatively uniform area of ​​the plasma may not completely overlap with the area required by the process, which is the so-called plasma deflection problem. The methods used in the prior art have little effect on adjusting the plasma deflection problem, low adjustment efficiency, and poor application flexibility. Summary of the invention

[0003] The embodiment of the present application provides a magnetic field adjustment mechanism, a reaction chamber and a plasma device. The magnetic field adjustment mechanism of the embodiment of the present application can flexibly adjust the magnetic field distribution of the magnetic field generating mechanism, thereby adjusting the distribution of the plasma in the reaction chamber, achieving uniform distribution of the plasma in the required area, and is easy to operate and has high adjustment efficiency.

[0004] In a first aspect, an embodiment of the present application provides a magnetic field adjustment mechanism. The magnetic field adjustment mechanism is applied to a reaction chamber of a plasma device, the reaction chamber is provided with a reaction chamber, and the magnetic field adjustment mechanism comprises: a magnetic component, the magnetic component is used to generate a first magnetic field in the reaction chamber; a guide component, the magnetic component is movably connected to the guide component, the magnetic component can move along the circumferential direction of the guide component, and can move along the axial direction or / and radial direction of the guide component to adjust the first magnetic field.

[0005] In the embodiment of the present application, the magnetic component is movably connected to the guide component and can move in multiple directions on the guide component. Therefore, the position and direction of the first magnetic field generated by the magnetic component can be flexibly adjusted, thereby enhancing the flexibility of applying the first magnetic field.

[0006] In a possible implementation, the magnetic component can move along the circumferential direction and axial direction of the guide component, the guide component includes a first guide and a second guide, the second guide is movably disposed on the first guide, the second guide can move along the circumferential direction on the first guide, the magnetic component is movably disposed on the second guide, and the magnetic component can move along the axial direction on the second guide;

[0007] Or, the magnetic component can move circumferentially and radially along the guide component, the guide component includes a first guide member and a third guide member, the third guide member is movably arranged on the first guide member, the third guide member can move circumferentially on the first guide member, the magnetic component is movably arranged on the third guide member, and the magnetic component can move radially on the third guide member.

[0008] Since the guide assembly of the magnetic field regulating mechanism includes a first guide member and a second guide member, or the guide assembly includes a first guide member and a third guide member, the second guide member or the third guide member can move circumferentially on the first guide member, and at the same time the magnetic assembly can move axially on the second guide member or radially on the third guide member, the magnetic assembly can move flexibly in multiple directions, thereby enhancing the flexibility and accuracy of the magnetic field regulation.

[0009] In one possible embodiment, the magnetic component can move circumferentially and axially along the guide component, the guide component includes a first guide member and a second guide member, the magnetic component is movably disposed on the first guide member, the magnetic component can move circumferentially on the first guide member, the magnetic component is movably disposed on the second guide member, and the magnetic component can move axially on the second guide member.

[0010] Since the magnetic component can move in different directions on the first guide member and the second guide member respectively, the magnetic field adjustment mechanism has the ability to adjust in multiple directions and flexibly control the magnetic field, thereby achieving the technical effect of enhancing the magnetic field adjustment range, improving the adjustment accuracy and adapting to various application scenarios.

[0011] In a possible implementation, the magnetic component can move in the circumferential, axial and radial directions of the guide component, and the guide component includes a first guide member, a second guide member and a third guide member;

[0012] The second guide is movably disposed on the first guide, and the second guide can move on the first guide along the circumferential direction; the third guide is movably disposed on the second guide, and the third guide can move on the second guide along the axial direction; the magnetic component is movably disposed on the third guide, and the magnetic component can move on the third guide along the radial direction;

[0013] Or, the third guide is movably arranged on the first guide and the second guide, the third guide can move circumferentially on the first guide, the third guide can move axially on the second guide, the magnetic component is movably arranged on the third guide, and the magnetic component can move radially on the third guide.

[0014] By setting up a guide assembly including a first guide member, a second guide member and a third guide member, the magnetic assembly can not only move circumferentially and axially on the first guide member and the second guide member respectively, but also move radially on the third guide member. This arrangement enables the magnetic assembly to move in three-dimensional space, significantly enhancing the magnetic field adjustment range and magnetic field adjustment accuracy.

[0015] In a possible implementation manner, the third guide member is rotatably disposed on the first guide member or the second guide member, and the magnetic component can rotate around a preset direction following the third guide member.

[0016] By setting up a guide component including a first guide member, a second guide member and a third guide member, and the third guide member can be rotatably set on the first guide member or the second guide member, and the magnetic component is fixedly or movably set on the third guide member, such a setting enables the magnetic component to move not only in the circumferential, axial and radial directions, but also to rotate in the fourth direction, thereby enhancing the multi-dimensional adjustment ability and flexibility of the magnetic field adjustment mechanism, thereby achieving more precise magnetic field control, a wider adjustment range and adaptability to more complex magnetic field environments. Technical effects.

[0017] In a possible implementation, the magnetic field adjustment mechanism has a plurality of magnetic components, wherein the plurality of magnetic components are distributed in a circumferential direction, or / and the plurality of magnetic components are distributed in an axial direction, or / and the plurality of magnetic components are distributed in a radial direction.

[0018] In the embodiment of the present application, multiple magnetic components are distributed in different directions (circumferential, axial and / or radial), so that the magnetic field adjustment mechanism can adjust the magnetic field independently or simultaneously in different directions to meet various complex application scenarios.

[0019] In a possible implementation, the magnetic assembly can move along the circumferential, axial and radial directions of the guide assembly, and the circumferential, axial and radial directions are perpendicular to each other.

[0020] In the embodiment of the present application, the circumferential, axial, and radial directions are perpendicular to each other, forming a three-dimensional rectangular coordinate system. The magnetic field adjustment mechanism can accurately adjust the magnetic field in any direction within this three-dimensional space. This arrangement makes the magnetic field control more three-dimensional and comprehensive, and improves the flexibility and efficiency of the magnetic field adjustment.

[0021] In a possible implementation, the magnetic component is provided with a movable part, the guide component is provided with a guide part, and the movable part is movably connected to the guide part. By arranging the movable part of the magnetic component to be movably connected to the guide part of the guide component, the magnetic component can be flexibly moved under the guidance of the guide component, which can ensure that the magnetic component maintains stable guidance during movement, reduce deviation and shaking, and improve the stability of the movement of the magnetic component.

[0022] In a possible implementation, the movable part is a slider, and the guide part is a guide rail, and the slider slides in the guide rail to achieve the movement of the magnetic component relative to the guide component. Since the guide rail can provide stable support for the magnetic component, the magnetic component can easily move on the guide component, reducing the impact of external interference on the magnetic field regulation and improving the stability of the magnetic field regulation.

[0023] In a possible implementation, at least one locking member is provided between the magnetic component and the guide component. When the at least one locking member is in a first state, the at least one locking member fixes the magnetic component and the guide component. When the at least one locking member is in a second state, the magnetic component can move relative to the guide component.

[0024] In the embodiment of the present application, when the locking piece is in the first state, the locking piece can firmly fix the magnetic component and the guide component together, ensuring that the magnetic field adjustment mechanism remains stable when it does not need to be moved, helping to prevent the position of the magnetic component from changing due to external interference or vibration, thereby maintaining the stability of the magnetic field; when the locking piece is in the second state, the magnetic component can move flexibly relative to the guide component, so the position of the magnetic component can be easily adjusted, thereby changing the distribution and intensity of the magnetic field in the reaction chamber, thereby improving the flexibility of the magnetic field adjustment mechanism.

[0025] In a possible implementation, the guide assembly includes at least one locking position. When the magnetic assembly is in the at least one locking position, the magnetic assembly is fixed to the guide assembly. When the magnetic assembly is not in the at least one locking position, the magnetic assembly can move relative to the guide assembly.

[0026] In an embodiment of the present application, when the magnetic component is in a locking position on the guide component, the magnetic component is fixed to the guide component, so that when a stable magnetic field is required, the magnetic component can be firmly fixed in a specific position and will not move due to external interference or vibration, which helps to maintain the stability of the magnetic field; when the magnetic component is not in a locking position, the magnetic component can move relative to the guide component, so that the user or the driving device for driving the magnetic component to move can easily adjust the position of the magnetic component, thereby changing the distribution and strength of the magnetic field. Since the locking position setting provides a clear moving path and positioning point, the magnetic field adjustment is more precise and controllable.

[0027] In a possible implementation, the magnetic assembly includes a mounting frame and at least one magnet, the mounting frame is connected to the guide assembly, and the at least one magnet is disposed in the mounting frame.

[0028] By providing a mounting frame movably connected to the guide assembly, and the magnet is arranged in the mounting frame, while flexible installation and stable fixation of the magnetic assembly are achieved, the magnet can also move on the guide assembly with the mounting frame, which not only achieves flexible installation and stable fixation of the magnetic assembly, but also significantly enhances the flexibility and accuracy of magnetic field regulation.

[0029] In a possible implementation, at least one magnet is movably disposed in the mounting frame, and the first magnetic field is adjusted by changing the position of the at least one magnet. The magnet is movably disposed in the mounting frame, which means that the position of the magnetic component can be changed by changing the position of the mounting frame, thereby improving the flexibility of adjusting the first magnetic field and facilitating the technical effect of accurately controlling the magnetic field strength and distribution.

[0030] In a possible implementation, the magnetic assembly further includes at least one filling piece. After the at least one magnet is disposed on the mounting frame, the mounting frame has a receiving space, and the at least one filling piece is filled in the receiving space. Since the filling piece can fill the gap between the magnet and the mounting frame, the shaking or instability of the magnetic field adjustment mechanism caused by the existence of the gap is reduced, thereby improving the overall stability of the magnetic field adjustment mechanism.

[0031] In a possible implementation, at least one filler is movably disposed in the mounting frame, and the first magnetic field is adjusted by changing the relative position of at least one magnet and at least one filler. By arranging the filler to be movably disposed in the mounting frame, the first magnetic field can be flexibly adjusted by adjusting the relative position of the filler and the magnet, which is conducive to achieving the technical effect of accurately controlling the intensity and distribution of the magnetic field.

[0032] In the second aspect, an embodiment of the present application provides a reaction chamber. The reaction chamber includes a reaction chamber, a magnetic field generating mechanism, and a magnetic field regulating mechanism as in any of the aforementioned embodiments, the magnetic field generating mechanism is used to generate a second magnetic field in the reaction chamber, and the magnetic field regulating mechanism uses the first magnetic field to regulate the second magnetic field. By setting the reaction chamber to include a magnetic field generating mechanism and a magnetic field regulating mechanism, the reaction chamber can not only generate a magnetic field through the magnetic field generating mechanism when needed, but also can accurately adjust the magnetic field through the magnetic field regulating mechanism according to actual needs, thereby realizing flexible and precise control of the magnetic field in the reaction chamber, and improving the flexibility and practicality of the reaction chamber.

[0033] In a possible implementation, the magnetic field adjustment mechanism is located outside the magnetic field generating mechanism, a cover is provided between the magnetic field adjustment mechanism and the magnetic field generating mechanism, and the magnetic field adjustment mechanism is fixedly arranged on the cover. By setting the magnetic field adjustment mechanism fixedly arranged on the cover, the magnetic field adjustment mechanism is prevented from moving or shaking due to external force during operation, the stability and consistency of the magnetic field are maintained, and the structural stability of the reaction chamber is enhanced.

[0034] In a third aspect, an embodiment of the present application provides a plasma device. The plasma device includes the aforementioned reaction chamber. The reaction chamber includes a magnetic field generating mechanism and a magnetic field regulating mechanism, so that the intensity and distribution of the magnetic field can be accurately controlled during the processing, which significantly improves the control ability of the processing equipment over the magnetic field environment, thereby improving the processing quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The following is an introduction to the drawings used in the embodiments of the present application.

[0036] Figure 1 It is a structural schematic diagram of a plasma device provided in an embodiment of the present application;

[0037] Figure 2It is a schematic diagram of the distribution of plasma in a reaction chamber in the prior art;

[0038] Figure 3 is a schematic diagram of plasma distribution in a reaction chamber provided in an embodiment of the present application;

[0039] Figure 4 yes Figure 1 The reaction chamber shown is a partial structural schematic diagram in some embodiments;

[0040] Figure 5 yes Figure 4 The schematic diagram of the cross-sectional structure of a part of the reaction chamber shown is at AA;

[0041] Figure 6 yes Figure 4 The schematic diagram of the cross-sectional structure of a part of the reaction chamber shown is at BB;

[0042] Figure 7 yes Figure 4 A schematic diagram of the top view of the reaction chamber shown;

[0043] Figure 8 yes Figure 4 A schematic diagram of a portion of the structure of the magnetic assembly shown;

[0044] Fig. 9 yes Figure 4 A schematic structural diagram of the second guide member shown;

[0045] Fig.10 yes Figure 4 A schematic structural diagram of the third guide member shown;

[0046] Fig.11 yes Figure 1 The partial structure schematic diagram of the reaction chamber shown in some other embodiments;

[0047] Fig.12 yes Figure 1 The partial structure schematic diagram of the reaction chamber shown in some other embodiments;

[0048] Fig.13 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber shown;

[0049] Fig.14 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber shown;

[0050] Fig.15 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber shown;

[0051] Fig.16 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber is shown.

[0052] Description of reference numerals:

[0053] 1- Plasma equipment;

[0054] 100-magnetic field generating mechanism;

[0055] 1000-reaction chamber, 1001-coil winding;

[0056] 200-reaction chamber;

[0057] 2001-air intake;

[0058] 300-hood body;

[0059] 41-magnetic component, 42-guide component, 43-stopper;

[0060] 400-magnetic field adjustment mechanism, 411-mounting frame, 412-magnet, 413-filling member, 414-movable portion, 421-guiding portion, 422-first guide member, 423-second guide member, 424-third guide member, 425-positioning;

[0061] 4111-accommodating space, 4141-slider, 4211-guide rail, 4221-first slide rail, 4231-first connecting block, 4232-second slide rail, 4233-first connecting rod, 4241-second connecting block, 4243-second connecting rod, 4251-first clamping position, 4252-second clamping position, 4253-third clamping position;

[0062] O1-the uniform plasma area required by the process in the prior art; O2-the uniform plasma area in actual production in the reaction chamber in the prior art; O3-the area where plasma is distributed in the reaction chamber in the prior art; O1'-the uniform plasma area required by the process in the present application; O2'-the uniform plasma area in actual production in the reaction chamber provided in the present application; O3'-the area where plasma is distributed in the reaction chamber provided in the present application; X1-axial; X2-circumferential; X3-radial, F1-the direction of the geomagnetic field. DETAILED DESCRIPTION

[0063] The following embodiments of the present application are described below in conjunction with the drawings in the embodiments of the present application.

[0064] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, "connection" can be a detachable connection or a non-detachable connection; it can be a direct connection or an indirect connection through an intermediate medium. The directional terms mentioned in the embodiments of the present application, such as "up", "down", "left", "right", "inside", "outside", etc., are only references to the directions of the accompanying drawings. Therefore, the directional terms used are for better and clearer explanation and understanding of the embodiments of the present application, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present application.

[0065] The terms "first", "second", "third", etc. are used for descriptive purposes only and should not be understood to imply or suggest relative importance or implicitly specify the number of technical features. Thus, a feature defined as "first", "second", "third" may explicitly or implicitly include one or more of the features.

[0066] See also Figure 1 , Figure 1 1 is a schematic diagram of the structure of a plasma device 1 provided in an embodiment of the present application. The plasma device 1 may be an inductively coupled plasma generating device, etc. The plasma device 1 may include a reaction chamber 1000, and the reaction chamber 1000 may include a magnetic field generating mechanism 100 and a reaction chamber 200. The magnetic field generating mechanism 100 is used to generate a second magnetic field in the reaction chamber 200. In some embodiments, the magnetic field generating mechanism 100 may be a coil winding or a magnet, or other device capable of generating a magnetic field. The magnetic field generating mechanism 100 is a coil winding 1001 (as described in the following). Figure 5 Taking the example of the embodiment shown in FIG. 1 , the coil winding 1001 can be arranged outside the reaction chamber 200 along the axial direction of the reaction chamber 200, or can be arranged outside the reaction chamber 200 along the radial direction of the reaction chamber 200, or can be arranged on the upper side or the lower side of the reaction chamber 200. It is only necessary that the magnetic field generated by the coil winding passes through the reaction chamber 200 along the axial direction of the reaction chamber 200, and no limitation is made here.

[0067] For example, the reaction chamber 200 may be provided with an air inlet 2001. After the gas enters the reaction chamber 200 from the air inlet 2001, the magnetic field generating mechanism 100 may generate a second magnetic field after being powered on, and the second magnetic field may be coupled to the inside of the reaction chamber 200 to generate gas discharge and excite plasma. Part of the reaction chamber 200 may also extend into the magnetic field generating mechanism 100.

[0068] Exemplarily, the plasma device 1 may further include a cover body 300 . The cover body 300 and the reaction chamber 200 may be arranged along the axial direction of the reaction chamber 1000 , and the magnetic field generating mechanism 100 may be located inside the cover body 300 .

[0069] The cover 300 may be a hollow structure for accommodating the magnetic field generating mechanism 100, so as to isolate the second magnetic field generated by the magnetic field generating mechanism 100 from the magnetic field radiation outside the cover 300, and to a certain extent isolate the influence of the earth's magnetic field on the second magnetic field generated by the magnetic field generating mechanism 100. Exemplarily, the cover 300 may be made of a magnetic conductive material, for example, the cover 300 may be made of alloy materials such as iron silicon aluminum alloy or silicon steel; or, the cover 300 may also be made of a metal material such as aluminum, and the outer surface of the cover 300 may be covered with a magnetic conductive material.

[0070] In the embodiment of the present application, the cover body 300 is taken as a hollow cylinder for introduction. In other embodiments, the cover body 300 can also be other shapes such as a hollow elliptical cylinder, a hollow square cylinder, a hollow rhombus, etc., and the embodiment of the present application is not limited to this.

[0071] Figure 1 The positions, shapes and sizes of the cover 300, magnetic field generating mechanism 100, reaction chamber 200 and air inlet 2001 are only schematic representations and can be adjusted as needed. Figure 1 The schematic diagram only schematically shows the structure of a plasma device 1 , and the embodiment of the present application does not limit the structure of the plasma device 1 .

[0072] Please refer to Figure 1 and Figure 2 , Figure 2 Schematic diagram of plasma distribution in a reaction chamber 200 in the prior art. Figure 2 O1 in the figure can represent the plasma uniform area required by the process in the prior art. Figure 2 O2 may represent a uniform plasma region in the actual production in the reaction chamber 200 in the prior art. Figure 2 O3 in the figure may represent a region in the prior art where plasma is distributed in the reaction chamber 200. In some embodiments, when etching or deposition is performed on a wafer, the plasma uniform region required by the process may be a region on the wafer to be processed. Figure 2 The concentration of plasma in the region indicated by O2 is relatively uniform. Figure 2 In the prior art, the plasma region O3 and Figure 2 The concentration of plasma in the area between the plasma uniform area O2 in the reaction chamber 200 in the prior art is less than Figure 2The concentration of plasma in the area shown by the plasma uniform area O2 in actual production in the reaction chamber 200 in the prior art.

[0073] It is understandable that in the process of the magnetic field generating mechanism 100 being powered on to generate plasma, due to the influence of the earth's magnetic field (or other magnetic field sources), the area O2 where the plasma is evenly distributed in the reaction chamber 200 in the prior art during actual production does not completely overlap with the plasma even area O1 required by the process in the prior art, that is, there is a plasma deviation problem, so that some places (such as Figure 2 When the plasma uniform region O1 required by the process in the prior art overlaps with the plasma uniform region O2 in the actual production in the reaction chamber 200 in the prior art, the concentration of plasma is relatively large, and when applied to etching the wafer, it can play an effective etching role, while some places (such as Figure 2 When the plasma concentration is relatively low in the area O3 where plasma is distributed in the reaction chamber 200 in the prior art, when it is applied to etching the wafer, there will be a problem of insufficient etching, which cannot meet the process manufacturing requirements.

[0074] Please refer to Figures 1 to 3 , Figure 3 Schematic diagram of plasma distribution in a reaction chamber 200 provided in an embodiment of the present application. Figure 3 O1' in the figure can represent the plasma uniform area required by the process in this application. Figure 3 O2' may represent the plasma uniform area in the actual production in the reaction chamber 200 provided by the present application. Figure 3 O3' in the figure may represent a region where plasma is distributed in the reaction chamber 200 provided in the present application.

[0075] The reaction chamber 1000 may further include a magnetic field adjustment mechanism 400, which may be used to generate a first magnetic field, so as to adjust the distribution of the second magnetic field of the magnetic field generating mechanism 100 by using the first magnetic field, and thus adjust the distribution of the plasma in the reaction chamber 200. Combining the magnetic field generating mechanism 100 with the magnetic field adjustment mechanism 400, the reaction chamber 1000 can not only generate the second magnetic field through the magnetic field generating mechanism 100 when needed, but also accurately adjust the second magnetic field through the magnetic field adjustment mechanism 400 according to actual needs, so that the intensity and distribution of the magnetic field in the reaction chamber 200 can be accurately controlled during the processing, thereby improving the flexibility and practicality of the reaction chamber 200, significantly improving the control capability of the processing equipment over the magnetic field environment, and thus improving the processing quality. In addition, the magnetic field adjustment mechanism 400 can compensate for the influence of the earth's magnetic field (or other magnetic field sources) on the plasma distribution position, and adjust the distribution of the plasma in the reaction chamber 200, so that the plasma uniform area O2' in the actual production in the reaction chamber 200 provided by the present application can overlap with the plasma uniform area O1' required by the process in the present application, so as to achieve the uniformity of the plasma concentration in the plasma uniform area O1' required by the process in the present application, and improve the accuracy and uniformity of the plasma when etching or otherwise processing other structural parts such as wafers. Figure 2 Wherein F1 is the direction of the geomagnetic field, which can schematically represent the direction of the geomagnetic field (or other magnetic field sources) in the embodiment of the present application. In other embodiments, the magnetic field direction of the geomagnetic field (or other magnetic field sources) can also be other directions, which is not limited in the embodiment of the present application.

[0076] Exemplarily, the magnetic field regulating mechanism 400 may be located outside the magnetic field generating mechanism 100, the cover body 300 may be located between the magnetic field regulating mechanism 400 and the magnetic field generating mechanism 100, and the magnetic field regulating mechanism 400 may be fixedly arranged on the cover body 300, so as to prevent the magnetic field regulating mechanism 400 from moving or shaking due to external force during operation, thereby maintaining the stability and consistency of the first magnetic field and enhancing the structural stability of the reaction chamber 1000. In addition, the cover body 300 may realize geomagnetic field shielding, shielding and filtering complex magnetic fields. In the embodiment of the present application, the magnetic field regulating mechanism 400 may be provided to realize fine adjustment to compensate for the influence of magnetic field sources such as geomagnetic field on plasma distribution in different application scenarios. In the embodiment of the present application, the geomagnetic field shielding and the adjustment of the magnetic field regulating mechanism 400 may be combined to realize better elimination and compensation effect of geomagnetic field.

[0077] The cover 300 is an isolation structure located between the magnetic field regulating mechanism 400 and the magnetic field generating mechanism 100, which can effectively separate the magnetic field regulating mechanism 400 from the magnetic field generating mechanism 100. The cover 300 can be cylindrical, box-shaped or other suitable shapes, and its material can be metal, plastic, ceramic, etc. The main function of the cover 300 is to isolate the magnetic field regulating mechanism 400 and the magnetic field generating mechanism 100 to prevent direct physical contact and electromagnetic interference between them. At the same time, the cover 300 can also protect the magnetic field regulating mechanism 400 from the adverse effects of heat, radiation, etc. that may be generated by the magnetic field generating mechanism 100. The cover 300 can also serve as a supporting structure for the magnetic field regulating mechanism 400. The magnetic field regulating mechanism 400 can be fixed on the cover 300 by bolting, welding, snapping, etc., so as to ensure its stability and reliability during operation.

[0078] The magnetic field regulating mechanism 400 is arranged on the outside of the magnetic field generating mechanism 100, which means that the magnetic field regulating mechanism 400 does not directly contact the magnetic field generating mechanism 100, but is located outside it. Such a design helps to reduce the interference of the magnetic field regulating mechanism 400 on the working state of the magnetic field generating mechanism 100, and at the same time facilitates independent adjustment and control of the magnetic field.

[0079] Please refer to Figures 4 to 7 , Figure 4 yes Figure 1 The reaction chamber 1000 shown is a schematic diagram of a portion of the structure in some embodiments. Figure 5 yes Figure 4 The schematic diagram of the cross-sectional structure of a part of the reaction chamber 1000 is shown at AA. Figure 6 yes Figure 4 The schematic cross-sectional structure diagram of a partial structure of the reaction chamber 1000 at point BB is shown. Figure 7 yes Figure 4 FIG. 1 is a schematic diagram of the top view of the reaction chamber 1000 .

[0080] The magnetic field adjustment mechanism 400 may include a magnetic component 41 and a guide component 42. The magnetic component 41 is used to generate a first magnetic field in the reaction chamber 200. The magnetic component 41 is movably connected to the guide component 42. The magnetic component 41 can move along the circumferential direction X2 of the guide component 42, and can move along the axial direction X1 or / and the radial direction X3 of the guide component 42 to adjust the first magnetic field. By setting the magnetic component 41 to be movably connected to the guide component 42, the magnetic component 41 can move in multiple directions on the guide component 42, so that the position and direction of the magnetic component 41 can be flexibly adjusted, thereby enhancing the flexibility of magnetic field application.

[0081] The magnetic component 41 is the core part of the magnetic field adjustment mechanism 400, and is used to generate a first magnetic field in the reaction chamber 200. The magnetic component 41 can be composed of one or more permanent magnets or electromagnets, and the specific number and arrangement are determined according to the required magnetic field shape and strength. The shape and size of the magnetic component 41 also need to be determined according to the reaction chamber 200 (such as Figure 1 The structure and process requirements of the device (as shown) are determined to ensure that a uniform and stable magnetic field can be generated.

[0082] The guide assembly 42 is a supporting and guiding part for the movement of the magnetic assembly 41, and is movably connected to the magnetic assembly 41, so that the magnetic assembly 41 can move in the circumferential direction X2, the axial direction X1, and / or the radial direction X3 under the guidance of the guide assembly 42. Specifically, the guide assembly 42 may include a circumferential guide rail, an axial guide rail, and / or a radial guide rail, as well as corresponding sliding blocks or rollers and other components, and these guide rails and sliding components need to have sufficient rigidity and wear resistance to ensure that stable guiding performance can be maintained during long-term use.

[0083] The circumferential direction X2, axial direction X1, and radial direction X3 of the guide assembly 42 are perpendicular to each other. That is, the axial direction X1 of the guide assembly 42 is perpendicular to the circumferential direction X2 of the guide assembly 42, the radial direction X3 of the guide assembly 42 is perpendicular to the axial direction X1, and the radial direction X3 of the guide assembly 42 is perpendicular to the circumferential direction X2 of the guide assembly 42. The perpendicularity of the radial direction X3 of the guide assembly 42 to the circumferential direction X2 of the guide assembly 42 can be understood as: when the radial direction X3 of the guide assembly 42 is perpendicular to the circumferential direction X2, it means that at any point of the guide assembly 42, the radial direction X3 forms an angle of 90 degrees with the tangent direction of the point. In addition, Figure 4 The radial direction X3 shown is only for illustration, and the radial direction X3 may change with the movement of the guide assembly 42 relative to the cover body 300, and the embodiment of the present application does not limit this. In the embodiment of the present application, the circumferential direction X2, axial direction X1, and radial direction X3 of the guide assembly 42 may constitute a three-dimensional rectangular coordinate system, so that the magnetic field adjustment mechanism 400 may accurately adjust the second magnetic field along any direction within this three-dimensional space. This arrangement makes the magnetic field control more three-dimensional and comprehensive, and improves the flexibility and efficiency of the magnetic field adjustment. Among them, when the magnetic field adjustment mechanism 400 is applied to the reaction chamber 1000 (such as Figure 1 As shown in the figure, the circumference of the reaction chamber 1000 is parallel to the circumferential direction X2 of the guide assembly 42, and the axial direction of the reaction chamber 1000 is parallel to the axial direction X1 of the guide assembly 42, that is, the magnetic field generating mechanism 100 can be arranged along the axial direction X1 of the guide assembly 42, and the cover body 300 and the reaction chamber 200 can be arranged along the axial direction X1 of the guide assembly 42.

[0084] When the magnetic field adjustment mechanism 400 is working, through the action of an external driving mechanism (such as a motor, a cylinder, etc.), the magnetic component 41 can move along the guide component 42 in the circumferential direction X2, the axial direction X1, or / and the radial direction X3, and this movement can change the position of the magnetic component 41 in the reaction chamber 200, thereby changing the distribution and intensity of the first magnetic field. Exemplarily, when it is necessary to adjust the circumferential X2 distribution of the first magnetic field, the magnetic component 41 can be moved along the circumferential guide rail by the driving mechanism; when it is necessary to adjust the axial X2 or / and radial X3 distribution of the first magnetic field, it can be achieved by moving the magnetic component 41 along the axial guide rail or / and the radial guide rail by the driving mechanism.

[0085] Please refer to Figure 4 , Figure 7 and Figure 8 , Figure 8 yes Figure 4 A partial structural diagram of the magnetic assembly 41 is shown. In some embodiments, the magnetic assembly 41 may include a mounting frame 411 and at least one magnet 412, wherein the mounting frame 411 is connected to the guide assembly 42, and the at least one magnet 412 is disposed in the mounting frame 411. Since the mounting frame 411 is movably connected to the guide assembly 42 and the magnet 412 is connected to the mounting frame 411, while the magnetic assembly 41 is flexibly mounted and stably fixed, the magnet 412 can also be moved on the guide assembly 42 along with the mounting frame 411, which not only realizes the flexible installation and stable fixation of the magnet 412, but also significantly enhances the flexibility and accuracy of the magnetic field adjustment.

[0086] The mounting frame 411 is used to carry and fix the magnet 412, and can be made of a strong and lightweight material, such as aluminum alloy, stainless steel, etc., to ensure its stability and durability during use. The mounting frame 411 and the guide assembly 42 can be connected by bolts, nuts, pins and other connectors, so that the magnetic assembly 41 can be firmly fixed on the guide assembly 42 when the first magnetic field does not need to be adjusted, and can move along the guide assembly 42 when the first magnetic field needs to be adjusted.

[0087] The magnet 412 can be a permanent magnet or an electromagnetic part, which is not limited in the embodiment of the present application. The number of magnets 412 can be determined according to the required magnetic field shape and strength. Specifically, the number of magnets 412 can be one, two, three or more. By setting the mounting frame 411, the multiple magnets 412 installed therein can move together, reducing the difficulty of moving the magnetic component 41 and making it convenient for users to use. The magnetic field strength of the magnetic component 41 can be changed by changing the number of magnets 412. For example, increasing the number of magnets 412 can increase the magnetic field strength of the magnetic component 41; reducing the number of magnets 412 can weaken the magnetic field strength of the magnetic component 41. In the embodiment of the present application, the number of magnets 412 can be five. In other embodiments, the number of magnets 412 can also be one, two, three, four, six or more, which is not limited in the embodiment of the present application.

[0088] The arrangement of the magnets 412 may also be determined according to the desired magnetic field shape and strength. For example, in the mounting frame 411 , the magnets 412 may be evenly distributed in the mounting frame 411 to ensure that the generated magnetic field has an even distribution in the reaction chamber 200 .

[0089] When the magnetic field adjustment mechanism 400 is working, the magnetic assembly 41 is connected to the guide assembly 42 through the mounting frame 411 and moves along the guide assembly 42 to change the position of the magnet 412 in the reaction chamber 200, thereby adjusting the distribution and strength of the first magnetic field.

[0090] Exemplarily, at least one magnet 412 is movably disposed in the mounting frame 411, and the first magnetic field is adjusted by changing the position of at least one magnet 412. It is understandable that the magnet 412 is movably disposed in the mounting frame 411, which means that the first magnetic field can be flexibly adjusted by changing the position of the magnet 412, which is conducive to achieving the technical effect of accurately controlling the magnetic field strength and distribution.

[0091] In some embodiments, the first magnetic field can be adjusted by changing the position of the magnet 412 in the mounting frame 411. Specifically, the position of the magnet 412 is adjusted manually or automatically through a sliding mechanism or an adjustment mechanism, thereby changing the direction, shape or strength of the magnetic field. Exemplarily, the magnet 412 can be connected to the mounting frame 411 through a slide rail, a slider or a similar sliding mechanism, so that the magnet 412 can slide along a predetermined path in the mounting frame 411; an adjustment screw, an adjustment rod or other adjustment mechanism can also be provided to adjust the position of the magnet 412 manually or automatically; elastic elements such as springs and elastic sheets can also be used to support and position the magnet 412, while allowing the magnet 412 to move within a certain range.

[0092] In other embodiments, the first magnetic field can also be adjusted by adjusting the relative positions between the magnets 412. Specifically, if the magnetic component 41 includes multiple magnets 412, the magnetic field can be adjusted by adjusting the relative positions between the magnets 412. Exemplarily, if the magnetic component 41 includes three magnets 412, the three magnets 412 are spaced apart, and their spacing is 5 cm. The magnetic field distribution generated is M1. Now two of the magnets 412 are brought close together so that the spacing between the two is 2 cm. The magnetic field at this time is M2, and M1 is not equal to M2.

[0093] In some examples, the mounting frame 411 may be approximately in the shape of a hollow column, and the mounting frame 411 may have a receiving space 4111 , and at least one magnet 412 may be located in the receiving space 4111 .

[0094] In some other embodiments, the mounting frame may also include a mounting groove, and the magnet 412 may be embedded in the mounting groove. The groove wall of the mounting groove may serve to accommodate the magnet 412 while preventing the magnet 412 from moving during the movement of the mounting frame, thereby limiting the position of the magnet 412 in the mounting frame.

[0095] Exemplarily, the magnetic assembly 41 further includes at least one filling piece 413. After at least one magnet 412 is disposed on the mounting frame 411, at least one filling piece 413 can be filled in the receiving space 4111. It is understandable that when the magnet 412 is located in part of the receiving space 4111, by disposing the filling piece 413, the filling piece 413 can fill the area in the receiving space 4111 where the magnet 412 is not disposed, fill the gap between the magnet 412 and the mounting frame 411, and avoid the magnet 412 from moving in the mounting frame 411 during the movement of the mounting frame 411, thereby reducing the shaking or instability of the mechanism caused by the existence of the gap, thereby improving the overall stability of the magnetic field adjustment mechanism 400. It is understandable that when the magnet 412 fills the receiving space 4111, the magnetic assembly 41 may not include the filling piece 413.

[0096] The filler 413 may be of any shape and size to accommodate different accommodation spaces 4111 in the mounting frame 411. Common shapes of the filler 413 include block, strip, sheet, etc. The material selection of the filler 413 depends on its intended function and the working environment of the magnetic field adjustment mechanism 400. For example, a non-magnetic material (such as plastic, rubber, ceramic, etc.) may be selected to avoid interference with the magnetic field, or a magnetic material (such as soft magnetic material, hard magnetic material, etc.) may be selected to assist in adjusting the magnetic field.

[0097] The filler 413 can be fixed in the mounting frame 411 by bonding, mechanical fixing, etc., and will not loosen or fall off due to the operation of the magnetic field adjustment mechanism 400. The bonding fixation is to use an adhesive (such as glue, epoxy resin, etc.) to bond the filler 413 to the inner wall of the mounting frame 411, and the mechanical fixation is to fix the filler 413 to the mounting frame 411 by mechanical connectors such as screws, bolts, and buckles.

[0098] The filler 413 plays multiple roles in the magnetic assembly 41. Specifically, the filler 413 can enhance the structural strength of the mounting frame 411 to prevent it from being deformed under the action of a magnetic field or an external force. The filler 413 can also enhance the structural strength of the mounting frame 411 to prevent it from being deformed under the action of a magnetic field or an external force. In addition, when a magnetic material is used as a filler, the magnetic field distribution can be fine-tuned by adjusting the position and number of the filler 413.

[0099] For example, it is assumed that the mounting frame 411 of the magnetic field adjustment mechanism 400 is cylindrical, and the magnet 412 is a cylindrical permanent magnet, and is arranged along the axial direction of the mounting frame 411. After the magnet 412 is installed, some annular or fan-shaped accommodation spaces 4111 are formed inside the mounting frame 411. At this time, the filling member 413 can be an annular or fan-shaped block that matches the shape of the accommodation space 4111, and is installed in the mounting frame 411 by bonding or mechanical fixing. This can not only enhance the structural strength of the mounting frame 411, but also prevent the magnetic field from being disturbed unnecessarily.

[0100] Exemplarily, at least one filler 413 is movably disposed in the mounting frame 411, and the first magnetic field is adjusted by changing the relative position of at least one magnet 412 and at least one filler 413. The filler 413 is movably disposed in the mounting frame 411, so that by adjusting the relative position of the filler 413 and the magnet 412, the first magnetic field can be flexibly adjusted, thereby achieving the technical effect of accurately controlling the magnetic field strength and distribution.

[0101] The movable arrangement of the filler 413 in the mounting frame 411 can be achieved in a variety of ways, including but not limited to a sliding mechanism, a rotating mechanism or an elastic connection mechanism. These mechanisms allow the filler to be flexibly moved or adjusted in the mounting frame 411 to adapt to different magnetic field adjustment requirements. The position of the filler 413 can be adjusted manually or automatically. For example, an adjustment screw, an adjustment rod or other adjustment mechanism can be designed so that the user can accurately adjust the position of the filler 413 as needed.

[0102] By changing the relative positions of the magnet 412 and the filler 413 in the mounting frame 411, the distribution and strength of the magnetic field can be changed. Exemplarily, it is assumed that the magnetic field adjustment mechanism 400 includes a mounting frame 411, two magnets 412 and a filler 413. Each magnet 412 is fixedly mounted at a predetermined position of the mounting frame 411, and each filler 413 is movably arranged in the mounting frame 411 through a sliding mechanism. The user can adjust the position of the filler 413 by adjusting the screw so that it forms a different relative position relationship with the magnet 412. In the initial state, the filler 413 is located on one side of the mounting frame 411, away from the magnet 412. At this time, the first magnetic field generated by the magnet 412 is relatively weak or unevenly distributed. Then, the user rotates the adjusting screw to push the filler 413 to move toward the magnet 412 along the sliding mechanism. As the distance between the filler 413 and the magnet 412 is shortened, the first magnetic field gradually increases and becomes more uniform. When the filling piece 413 reaches the predetermined position, the first magnetic field reaches the required intensity and distribution, and at this time, the magnetic field adjustment mechanism 400 has completed the precise adjustment of the first magnetic field.

[0103] The magnetic component 41 can be provided with a movable part 414, and the guide component 42 can be provided with a guide part 421. The movable part 414 is movably connected with the guide part 421, so that the magnetic component 41 can be flexibly moved under the guidance of the guide component 42, which can ensure that the magnetic component 41 maintains stable guidance during the movement, reduces deviation and shaking, and improves the stability of the movement of the magnetic component 41.

[0104] The movable portion 414 is a portion of the magnetic component 41 used to cooperate with the guide portion 421 of the guide component 42, and the movable portion 414 can move smoothly in the guide portion 421. The movable portion 414 can be a protruding slider, roller, guide rail, etc., and the specific shape and size are determined according to the overall structure of the magnetic field adjustment mechanism 400. The material of the movable portion 414 can be a metal material such as stainless steel, alloy steel, copper alloy, and a wear-resistant plastic material such as polytetrafluoroethylene and nylon.

[0105] The guide portion 421 is a portion of the guide assembly 42 used to guide and support the movable portion 414 of the magnetic assembly 41. Its shape and size must match the movable portion 414 to ensure that the magnetic assembly 41 can move smoothly along a predetermined path. The guide portion 421 can be a groove, a guide rail, a slideway, etc. The material of the guide portion 421 can be a metal material such as cast iron, steel, aluminum alloy, and an elastic material such as polyurethane and rubber, which is used to provide the necessary friction and shock absorption effect.

[0106] The movable connection between the movable part 414 and the guide part 421 can be connected in various ways such as sliding connection, rolling connection, magnetic attraction, etc. In order to ensure that the connection between the movable part 414 and the guide part 421 is stable and reliable, a locking mechanism can be provided, friction resistance can be increased, elastic elements can be used, etc. to prevent the magnetic component 41 from shaking or falling off during movement, thereby ensuring the stability and safety of the magnetic field adjustment mechanism.

[0107] Exemplarily, the movable portion 414 may be a slider 4141 , and the number of the sliders 4141 may be two. The two sliders 4141 may be disposed on opposite sides of the mounting frame 411 , so that the mounting frame 411 drives the magnet 412 to move relative to the guide assembly 42 via the sliders 4141 .

[0108] Exemplarily, the guide portion 421 may be a guide rail 4211, and the slider 4141 slides in the guide rail 4211 to achieve movement of the magnetic component 41 relative to the guide component 42. The design of the guide rail 4211 provides stable support for the magnetic component 41, so that the magnetic component 41 can easily move on the guide component 42, reducing the impact of external interference on the magnetic field regulation and improving the stability of the magnetic field regulation. The guide rail 4211 can be arranged in different parts of the guide component 42, and extend along the circumferential direction X2, axial direction X1 or radial direction X3 of the guide component 42 to achieve movement of the magnetic component 41 in the circumferential direction X2, axial direction X1 or radial direction X3 of the guide component 42, and the embodiment of the present application is not limited to this.

[0109] Please refer again Figures 4 to 7 In some embodiments, the magnetic assembly 41 can move along the circumferential direction X2, axial direction X1 and radial direction X3 of the guide assembly 42. The guide assembly 42 can include a first guide 422, a second guide 423 and a third guide 424. The second guide 423 can be movably arranged on the first guide 422, and the second guide 423 can move on the first guide 422 along the circumferential direction X2. The third guide 424 can be movably arranged on the second guide 423, and the third guide 424 can move on the second guide 423 along the axial direction X1. The magnetic assembly 41 is movably arranged on the third guide 424, and the magnetic assembly 41 can move on the third guide 424 along the radial direction X3. At this time, the guide rail 4211 is a part of the structure of the third guide 424, and the extension direction of the guide rail 4211 can be parallel to the radial direction X3. The magnetic assembly 41 can be movably connected to the guide rail 4211 through the slider 4141 to realize the movement of the magnetic assembly 41 along the radial direction X3. In the embodiment of the present application, the magnetic component 41 can not only move along the circumferential direction X2 and the axial direction X1 on the first guide member 422 and the second guide member 423 respectively, but also move along the radial direction X3 on the third guide member 424. This arrangement enables the magnetic component 41 to move in three-dimensional space, significantly enhancing the magnetic field adjustment range and magnetic field adjustment accuracy.

[0110] The first guide member 422 is used to support and guide the second guide member 423 to move circumferentially. The first guide member 422 may be annular, disc-shaped, or other shapes suitable for circumferential movement, and may be provided with a guide rail, a slide groove, or a similar guide structure. Figure 4 and Figure 5 Exemplarily, the first guide member 422 may include a first slide rail 4221, and the first slide rail 4221 may extend along the circumferential direction X2 of the guide assembly 42. The first slide rail 4221 is the circumferential guide rail of the guide assembly 42. In some examples, the number of the first slide rails 4221 may be two, and the two first slide rails 4221 are spaced apart along the axial direction X1 of the guide assembly 42, and the two first slide rails 4221 are both fixedly connected to the cover body 300, so that the magnetic field adjustment mechanism 400 is fixedly set on the cover body 300. In some other embodiments, the number of the first slide rails 4221 may also be one, three or more, and the first slide rails 4221 may also be movably set on the cover body 300, which is not limited in the embodiments of the present application.

[0111] The second guide member 423 is movably disposed on the first guide member 422, and the second guide member 423 can smoothly move along the circumferential direction of the first guide member 422. The second guide member 423 is also provided with a guide rail, a slide groove or a guide structure so as to subsequently cooperate with the third guide member 424. The second guide member 423 cooperates with the guide structure on the first guide member 422 through the movable part (such as a slider, a roller, etc.) thereon to achieve movement in the circumferential direction X2.

[0112] Combined with reference Figure 4 , Figure 5 and Fig. 9 , Fig. 9 yes Figure 4 The structural schematic diagram of the second guide member 423 is shown. The second guide member 423 is movably arranged between the two first slide rails 4221. By setting the second guide member 423 to be movably arranged on the first slide rail 4221, and the first slide rail 4221 extends along the circumferential direction X2 of the guide component 42, in the process of the second guide member 423 moving along the extension direction of the first slide rail 4221, that is, the circumferential direction X2 of the guide component 42, the second guide member 423 can drive the third guide member 424 connected thereto and the magnetic component 41 to move along the circumferential direction X2, so as to change the compensation direction of the magnet 412 to the magnetic field source such as the geomagnetic field, realize the compensation of the magnetic field source such as the geomagnetic field at different angles, expand the application scenario of the magnetic component 41, and improve the flexibility of the compensation process of the magnetic component 41.

[0113] Exemplarily, the second guide member 423 may include a first connection block 4231, and the first connection block 4231 may be slidably connected to the first slide rail 4221, so that the second guide member 423 is movably disposed on the first guide member 422. In some examples, the second guide member 423 may include at least two first connection blocks 4231, and the two first connection blocks 4231 may be respectively located on opposite sides of the second guide member 423 in the axial direction X1 of the guide assembly 42, and are respectively connected to the two first slide rails 4221.

[0114] Exemplarily, the second guide member 423 may be approximately frame-shaped, and the second guide member 423 may also include two second slide rails 4232 and two first connecting rods 4233, the two first connecting rods 4233 are respectively connected to the two ends of the second slide rail 4232, and the first connecting block 4231 may be connected to the first connecting rod 4233 and / or the second slide rail 4232 facing the corresponding first slide rail 4221. By setting the first connecting rod 4233, it is possible to ensure the synchronization and consistency of the two second slide rails 4232 during the movement of the second guide member 423 along the circumferential direction X2 of the guide assembly 42. Among them, the second slide rail 4232 can extend along the axial direction X1 of the guide assembly 42, and the second slide rail 4232 is the axial guide rail of the guide assembly 42, and the two second slide rails 4232 are arranged at intervals along the circumferential direction X2 of the guide assembly 42. In some other embodiments, the second guide member 423 may not include the first connecting rod 4233, or the number of the second slide rails 4232 may be one, three or more, which is not limited in the embodiments of the present application.

[0115] The third guide member 424 is movably arranged on the second guide member 423, and is used to support and guide the movement of the magnetic component 41 in the radial direction X3. The third guide member 424 can be a straight line, an arc or other shape suitable for radial movement X3, and is provided with a corresponding guide rail, a slide groove or a guide structure. The third guide member 424 cooperates with the guide structure on the second guide member 423 through the movable part thereon, so that the third guide member 424 can move smoothly along the axial direction X1 of the second guide member 423. The magnetic component 41 cooperates with the guide structure on the third guide member 424 through the movable part thereon (such as a slider, a guide rail, etc.) to achieve radial movement X3. The movement of the magnetic component 41 can also be achieved by manual adjustment, motor drive or other methods.

[0116] Combined with reference Figure 4 , Fig. 9 and Fig.10 , Fig.10 yes Figure 4The schematic diagram of the structure of the third guide member 424 is shown. Exemplarily, the third guide member 424 may include a second connection block 4241, and the second connection block 4241 may be slidably connected to the second slide rail 4232, so that the third guide member 424 drives the magnetic component 41 connected thereto to move on the second guide member 423 along the axial direction X1 of the guide component 42. In some examples, the third guide member 424 may include at least two second connection blocks 4241, and the two second connection blocks 4241 may be respectively located on opposite sides of the third guide member 424 in the circumferential direction X2 of the guide component 42.

[0117] In the embodiment of the present application, when the third guide member 424 moves on the second guide member 423 , the third guide member 424 can drive the magnetic component 41 connected thereto to move from the first position to the second position in the axial direction X1 .

[0118] The first position and the second position are two different positions, and the first position may be closer to or farther from the reaction chamber 200 than the second position (e.g. Figure 1 As shown). It can be understood that the magnetic component 41 can also be moved from the second position to the first position. The magnetic component 41 can be used to generate a magnetic field, which is used to adjust the magnetic field distribution of the magnetic field generating mechanism 100, and then adjust the plasma distribution in the reaction chamber 200. The closer the magnetic component 41 is to the reaction chamber 200, the greater the influence on the plasma distribution in the reaction chamber 200.

[0119] The embodiment of the present application can adjust the influence of the magnetic component 41 on the plasma distribution in the reaction chamber 200 by setting the movement of the magnetic component 41 between the first position and the second position, and compensate for the influence of magnetic field sources such as the geomagnetic field on the plasma distribution in different application scenarios, with high flexibility and convenient adjustment. Figure 6The coil windings 1001 are stacked along the axial direction X1, and the coil windings 1001 close to the reaction chamber 200 have a greater influence on the plasma distribution in the reaction chamber 200 than the coil windings 1001 far away from the reaction chamber 200. By moving the magnetic component 41 between the first position and the second position, the magnetic component 41 can correspond to different coil windings 1001 when different requirements are met, thereby achieving the influence on the plasma distribution in the reaction chamber 200. For example, in some scenarios, when the intensity of the geomagnetic field or other magnetic field sources is relatively small, the magnetic component 41 can be moved away from the reaction chamber 200, and the magnetic component 41 corresponds to the coil winding 1001 away from the reaction chamber 200, so as to weaken the influence of the magnetic component 41 on the reaction chamber 200 and compensate for the influence of the geomagnetic field on the plasma distribution. For another example, in some scenarios, when the intensity of the geomagnetic field or other magnetic field sources is relatively large, the magnetic component can be moved toward the reaction chamber 200, and the magnetic component corresponds to the coil winding 1001 close to the reaction chamber 200, so as to enhance the influence of the magnetic component on the reaction chamber 200 and compensate for the influence of the geomagnetic field on the plasma distribution.

[0120] Please refer to Figure 1 , Figure 5 and Figure 6 In some embodiments, the magnetic component 41 can be arranged corresponding to the coil winding 1001 of the magnetic field generating mechanism 100 close to the reaction chamber 200. At this time, the magnetic component 41 is closer to the reaction chamber 200. Compared with the coil winding 1001 far away from the reaction chamber 200, the coil winding 1001 close to the reaction chamber 200 has a greater impact on the plasma distribution in the reaction chamber 200. By arranging the magnetic component corresponding to the coil winding 1001 close to the reaction chamber 200, it is beneficial to fully utilize the magnetic field generated by the magnetic component 41, and the magnetic component 41 can achieve the best compensation effect, which is also beneficial to improve the energy coupling efficiency in the reaction chamber 1000. It can be understood that when the magnetic component 41 is arranged corresponding to the coil winding 1001 of the magnetic field generating mechanism 100 close to the reaction chamber 200, the magnetic component 41 can still slide along the axial direction X1.

[0121] Please refer again Figure 4 , Figure 5 and Fig.10, illustratively, the third guide member 424 may also be approximately frame-shaped, and the third guide member 424 may also include two third slide rails and two second connecting rods 4243, the two second connecting rods 4243 are respectively connected to the two ends of the third slide rail, and the second connecting block 4241 may be connected to the second connecting rod 4243 and / or the side of the third slide rail facing the corresponding second slide rail 4232. By setting the second connecting rod 4243, the synchronization and consistency of the two third slide rails during the axial movement X1 of the third guide member 424 along the guide assembly 42 can be ensured. Among them, the third slide rail extends along the radial direction X3 of the guide assembly 42, and the two third slide rails are arranged at intervals along the circumferential direction X2 of the guide assembly 42. In some other embodiments, the number of the third slide rails may be one, three or more, which is not limited in the embodiment of the present application.

[0122] The mounting frame 411 is located between the two third slide rails, and the two sliders 4141 at both ends of the mounting frame 411 can be slidably connected to the two third slide rails respectively to realize the movement of the magnetic component 41 on the guide component 42 along the radial direction X3. In other words, in the embodiment of the present application, the third slide rail is the guide rail 4211, which can also be called a radial guide rail. The movable connection between the slider 4141 and the third slide rail enables the magnetic component 41 to be flexibly moved in the radial direction X3 under the guidance of the third guide member 424, close to or away from the magnetic field generating mechanism 100, which can change the compensation of the magnetic component 41 for the influence of magnetic field sources such as the earth's magnetic field, which is conducive to expanding the compensation range of the magnetic component 41.

[0123] Exemplarily, it is assumed that the magnetic field adjustment mechanism 400 is used to accurately adjust the strength and direction of the magnetic field at a position or region in three-dimensional space. The magnetic component 41 includes a magnet 412 with adjustable strength, and the magnet 412 is arranged on the third guide 424, and can move in the radial direction X3 to change the effective distance of the magnetic field. The third guide 424 is arranged on the second guide 423, and can move in the axial direction X1 to change one dimension of the effective direction of the magnetic field. The second guide 423 is arranged on the first guide 422, and can move in the circumferential direction X2 to change another direction dimension of the magnetic field. Therefore, by designing a precise drive mechanism and control system, the user can accurately control the movement of the magnetic component 41 in three-dimensional space, thereby achieving the desired magnetic field adjustment effect.

[0124] Please refer to Figure 4 and Figure 6 , Figure 6The dotted box in the middle indicates the possible position of the third guide member 424. Exemplarily, the third guide member 424 can also be rotatably set on the second guide member 423, and the magnetic component 41 can follow the third guide member 424 to rotate around a preset direction. Since the guide component 42 includes the third guide member 424, and the third guide member 424 can be rotatably set on the second guide member 423, and the magnetic component 41 is movably set on the third guide member 424, such a setting enables the magnetic component 41 to move not only in the circumferential direction X2, the axial direction X1 and the radial direction X3, but also in the fourth direction (in addition to the circumferential direction X2, the axial direction X1 and the radial direction X3) Rotate), enhance the multi-dimensional adjustment ability and flexibility of the magnetic field adjustment mechanism 400, thereby achieving more precise magnetic field control, a wider adjustment range and the technical effect of adapting to more complex magnetic field environments.

[0125] Please refer to Figure 4 and Fig.11 , Fig.11 yes Figure 1 The partial structure of the reaction chamber 1000 shown is a schematic diagram of the partial structure in other embodiments.

[0126] Exemplarily, at least one stopper 43 is further provided between the magnetic component 41 and the guide component 42. When the at least one stopper 43 is in a first state, the at least one stopper 43 fixes the magnetic component 41 and the guide component 42. When the at least one stopper 43 is in a second state, the magnetic component 41 can move relative to the guide component 42. For example, the stopper 43 can be located between the guide rail 4211 and the slider 4141. When the stopper 43 is in a first state, it can firmly fix the magnetic component 41 and the guide rail 4211 together, ensuring that the magnetic field adjustment mechanism 400 remains stable when it does not need to move, which helps to prevent the position of the magnetic component 41 from changing due to external interference or vibration, thereby maintaining the stability of the magnetic field; when the stopper 43 is in a second state, the magnetic component 41 can move flexibly relative to the guide rail 4211, so that the position of the magnetic component 41 can be easily adjusted, thereby changing the distribution and intensity of the magnetic field, and improving the flexibility of the magnetic field adjustment mechanism 400. In some other embodiments, the locking member 43 can also be fixed to the internal structure of the guide assembly 42 (for example, between the first guide member 422, the second guide member 423 and / or the third guide member 424 described later), and can be set as needed, which will not be repeated in the embodiments of the present application.

[0127] It can be understood that when the locking member 43 is in the first state, the locking member 43 fixes the magnetic component 41 and the guide component 42, which means that the position of the magnetic component 41 in the extension direction of the guide rail 4211 does not change, and the magnetic component 41 can move relative to the guide component 42 in other directions (for example, when the third slide rail is the guide rail 4211, when the guide rail 4211 extends along the radial direction X3, the magnetic component 41 can move in the circumferential direction X2 and / or axial direction X1) by other means; when the locking member 43 is in the second state, the magnetic component 41 can slide along the guide rail 4211, which means that the magnetic component 41 slides relative to the guide component 42 in the extension direction of the guide rail 4211.

[0128] In some examples, the locking member 43 may be a nut, for example, a hexagonal nut. When the locking member 43 is in the first state, it can be understood that the nut between the guide rail 4211 and the slider 4141 is tightened, and the magnetic component 41 is fixed on the guide rail 4211. When the locking member 43 is in the second state, it can be understood that the nut is loosened, so that the magnetic component 41 can slide on the guide rail 4211, which is conducive to achieving the movement of the magnetic component 41 while allowing the magnetic component 41 to stay at the desired position for the reaction chamber 200 (such as Figure 1 By providing the stopper 43, the switching between the fixing or sliding of the magnetic component 41 relative to the guide component 42 in the extending direction of the guide rail 4211 is simple, easy and fast, and the process of fixing and moving the position of the magnetic component 41 in the extending direction of the guide rail 4211 can be simplified.

[0129] Please refer to Fig.11 and Fig.12 , Fig.12 yes Figure 1 The partial structure of the reaction chamber 1000 shown is a schematic diagram of the partial structure in other embodiments.

[0130] Exemplarily, the guide component 42 includes at least one locking position 425. When the magnetic component 41 is in at least one locking position 425, the magnetic component 41 is fixed to the guide component 42. When the magnetic component 41 is not in at least one locking position 425, the magnetic component 41 can move relative to the guide component 42. When the magnetic component 41 is in the locking position 425 on the guide component 42, the magnetic component 41 is fixed to the guide component 42. This arrangement ensures that when a stable magnetic field is required, the magnetic component 41 can be firmly fixed at a specific position and will not move due to external interference or vibration, which helps to maintain the stability of the magnetic field.

[0131] When the magnetic component 41 is not in the locking position 425, the magnetic component 41 can move relative to the guide component 42, wherein the magnetic component 41 can be pushed manually by the user or by mechanical means such as a driving device or other equipment. This setting enables the user or the driving device to easily adjust the position of the magnetic component 41, thereby changing the distribution and intensity of the magnetic field. Since the setting of the locking position 425 provides a clear moving path and positioning point, the magnetic field adjustment is more precise and controllable.

[0132] The magnetic component 41 is located in the locking position 425, and the slider 4141 of the magnetic component 41 may be located in the locking position 425, or other structures connected to the magnetic component 41 may be located in the locking position 425. For example, in the embodiment of the present application, the plurality of locking positions 425 may include a first locking position 4251, a second locking position 4252 and / or a third locking position 4253. The first locking position 4251 may be formed on the first guide member 422, and the plurality of first locking positions 4251 may be arranged along the extension direction (i.e., the circumferential direction X2) of the first slide rail 4221. When the second guide member 423 is located in the first locking position 4251 on the first guide member 422, the third guide member 424 connected to the second guide member 423 and the magnetic component 41 are both considered to be located in the first locking position 4251. In the circumferential direction X2 of the guide member 42, the magnetic component 41 is fixed to the guide member 42, and the magnetic component 41 may be arranged through other For example, the second clamping position 4252 can be formed on the second guide member 423, and the plurality of second clamping positions 4252 can be arranged along the extension direction (i.e., the axial direction X1) of the second slide rail 4232. When the third guide member 424 is located in the second clamping position 4252 on the second guide member 423, the magnetic component 41 connected to the third guide member 424 is also considered to be located in the second clamping position 4252. In the axial direction X1 of the guide member 42, the magnetic component 41 is fixed to the guide member 42, and the magnetic component 41 can be moved relative to the guide member 42 in the circumferential direction X2 and / or radial direction X3 by other means. For example, Fig.11 As shown, the third locking position 4253 can be formed on the third guide member 424, and multiple third locking positions 4253 can be arranged along the extension direction of the third slide rail. When the slider 4141 of the magnetic component 41 is located at the third locking position 4253, the magnetic component 41 is fixed to the guide component 42 in the radial direction X3, and the magnetic component 41 can be moved relative to the guide component 42 in the circumferential direction X2 and / or axial direction X1 by other means.

[0133] For example, the latch 425 may be a groove. When the magnetic component 41 is located in the groove, the positions of the magnetic component 41 and the guide component 42 in the arrangement direction of the multiple latches 425 are relatively fixed. When the magnetic component 41 is located between two grooves, the magnetic component 41 slides relative to the guide component 42. By setting multiple latches 425, multi-gear quantitative adjustment of the magnetic component 41 in the arrangement direction of the latches 425 can be achieved. Different gear positions can be selected to place the magnetic component 41 according to needs, which reduces the difficulty of installing the magnetic component 41 and is highly practical. Fig.11 In the embodiment, the number of the third positions 4253 can be five, when the slider 4141 of the magnetic component 41 is located in the groove, the positions of the magnetic component 41 and the guide rail 4211 in the radial direction X3 are relatively fixed, and when the slider 4141 is located between the two grooves, the magnetic component 41 slides relative to the guide rail 4211. In other embodiments, the number of the positions 425 can be two, three, four, six or more, which is not limited in the embodiment of the present application.

[0134] Please refer again Fig.11 and Fig.12 Exemplarily, the magnetic field adjustment mechanism 400 may have a plurality of magnetic components 41, and the plurality of magnetic components 41 may be distributed in the circumferential direction X2, or / and the plurality of magnetic components 41 are distributed in the axial direction X1, or / and the plurality of magnetic components 41 are distributed in the radial direction X3. The plurality of magnetic components 41 are distributed in different directions (circumferential direction X2, axial direction X1 and / or radial direction X3), so that the magnetic field adjustment mechanism 400 can adjust the magnetic field independently or simultaneously in different directions to meet various complex application scenarios.

[0135] Multiple magnetic components 41 can be distributed in the radial direction X3. It can be understood that in the embodiment of the present application, multiple magnetic components 41 can be installed on the same third guide member 424, and multiple magnetic components 41 are arranged along the radial direction X3, or multiple magnetic components 41 can also be installed on different third guide members 424, which is not limited in the embodiment of the present application.

[0136] By arranging multiple magnetic components 41 along the radial direction X3, the distances between the multiple magnetic components 41 and the magnetic field generating mechanism 100 are different, and the multiple magnetic components 41 can be adjusted independently. The positions of the multiple magnetic components 41 on the radial direction X3 and the magnetic field strength of each magnetic component 41 can be adjusted as needed. It has high flexibility and a wide adjustable range, and can effectively compensate for the influence of magnetic field sources such as the geomagnetic field on the plasma distribution in different application scenarios.

[0137] See also Fig.12, multiple magnetic components 41 are distributed in the axial direction X1, that is, the number of the third guide members 424 can be multiple, and the multiple third guide members 424 can be distributed in the axial direction X1. It can be understood that in the embodiment of the present application, the multiple third guide members 424 can be installed on the same second guide member 423, and the multiple third guide members 424 and the multiple magnetic components 41 are arranged along the axial direction X1, or the multiple magnetic components 41 can also be installed on different second guide members 423, and the embodiment of the present application is not limited to this.

[0138] By arranging multiple magnetic components 41 along the axial direction X1, the multiple magnetic components 41 have different positions and distances in the axial direction X1, and the multiple magnetic components 41 can be adjusted independently. The positions of the multiple magnetic components 41 in the axial direction X1 and the distance of each magnetic component 41 to the reaction chamber 200 (such as Figure 1 It can compensate for the influence of magnetic field sources such as the geomagnetic field on the plasma distribution in different application scenarios, with high flexibility and easy adjustment.

[0139] Multiple magnetic components 41 are distributed in the circumferential direction X2. That is, the number of second guide members 423 can also be multiple, and multiple second guide members 423 can be distributed in the circumferential direction X2. By setting multiple magnetic components 41 to be arranged along the circumferential direction X2, multiple magnetic components 41 can be adjusted independently, and the positions of multiple magnetic components 41 in the circumferential direction X2 and the magnetic field strength of each magnetic component 41 can be adjusted as needed. It has high flexibility and a wide adjustable range, and can effectively compensate for the influence of magnetic field sources such as the geomagnetic field on plasma distribution in different application scenarios.

[0140] Combined with reference Figure 4 For the implementation shown, see Fig.13 , Fig.13 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Fig.13 The magnetic field adjustment mechanism 400 shown is Figure 4 The difference of the magnetic field adjustment mechanism 400 shown is that Fig.13 The guide assembly 42 in the magnetic field adjustment mechanism 400 shown may also not include the third guide member 424 .

[0141] like Fig.13As shown, the magnetic component 41 can move along the circumferential direction X2 and the axial direction X1 of the guide component 42, the guide component 42 may include a first guide 422 and a second guide 423, the second guide 423 is movably disposed on the first guide 422, the second guide 423 can move along the circumferential direction X2 on the first guide 422, the magnetic component 41 is movably disposed on the second guide 423, and the magnetic component 41 can move along the axial direction X1 on the second guide 423. Since the guide component 42 of the magnetic field adjustment mechanism 400 includes the first guide 422 and the second guide 423, the second guide 423 can move along the circumferential direction X2 on the first guide 422 to drive the magnetic component 41 connected thereto to move relative to the guide component 42 along the circumferential direction X2, so that the magnetic component 41 can move flexibly in multiple directions, thereby enhancing the flexibility and accuracy of the magnetic field adjustment.

[0142] In the embodiment of the present application, the magnetic field adjustment mechanism 400 is mainly composed of a magnetic component 41, a first guide member 422 and a second guide member 423, wherein the second guide member 423 is movably disposed on the first guide member 422 and can move along the circumferential direction X2, and the magnetic component 41 is movably disposed on the second guide member 423 and can move along the axial direction X1.

[0143] Specifically, the second guide member 423 is movably arranged on the first guide member 422, and cooperates with the circumferential guide rail or slide groove on the first guide member 422 through the movable part (such as a slider, roller or guide rail, etc.) thereon to achieve circumferential movement X2. The second guide member 423 can move along the circumferential direction X2 on the first guide member 422 by manual adjustment, motor drive or other suitable driving methods. In order to ensure the smoothness and accuracy of the movement, an appropriate lubrication device or friction-reducing material can be provided between the first guide member 422 and the second guide member 423. Exemplarily, the second slide rail of the second guide member 423 can be a guide rail 4211, and the slider 4141 is slidably connected to the second slide rail of the second guide member 423. The slider 4141 slides in the second guide member 423 to achieve the movement of the magnetic component 41 relative to the guide component 42 along the axial direction X1.

[0144] The magnetic assembly 41 achieves axial movement by cooperating with the axial guide rail or slide groove on the second guide member 423 through its movable part (such as a slider, guide rail or roller, etc.). In order to enhance the stability and accuracy of movement, a locking mechanism or positioning device can be provided between the magnetic assembly 41 and the second guide member 423.

[0145] For example, it is assumed that the magnetic field adjustment mechanism 400 is used to adjust the magnetic field in a cylindrical region. The magnetic component 41 includes a permanent magnet, which is arranged on the second guide member 423 and can change the range or intensity of the magnetic field by moving in the axial direction X1. The second guide member 423 can move along the circumferential direction X2 of the first guide member 422, thereby changing the distribution of the magnetic field.

[0146] Combination Figure 4 For the implementation shown, see Fig.14 , Fig.14 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Fig.14 The magnetic field adjustment mechanism 400 shown is Figure 4 The difference of the magnetic field adjustment mechanism 400 shown is that Fig.14 The guide assembly 42 in the magnetic field adjustment mechanism 400 shown may also not include the second guide member 423 .

[0147] like Fig.14 As shown, the magnetic component 41 can move along the circumferential direction X2 and the radial direction X3 of the guide component 42, the guide component 42 includes a first guide 422 and a third guide 424, the third guide 424 is movably disposed on the first guide 422, the third guide 424 can move along the circumferential direction X2 on the first guide 422, the magnetic component 41 is movably disposed on the third guide 424, and the magnetic component 41 can move along the radial direction X3 on the third guide 424. Since the guide component 42 of the magnetic field adjustment mechanism 400 includes the first guide 422 and the third guide 424, the third guide 424 can move along the circumferential direction X2 on the first guide 422 to drive the magnetic component 41 connected thereto to move relative to the guide component 42 along the circumferential direction X2, so that the magnetic component 41 can move flexibly in multiple directions, thereby enhancing the flexibility and accuracy of the magnetic field adjustment.

[0148] Specifically, the first guide member 422 may have a circumferential guide rail or slide groove structure, which is used to guide the third guide member 424 to move smoothly and stably along the circumferential direction. The first guide member 422 may be annular, disc-shaped or other shapes suitable for circumferential movement.

[0149] The third guide member 424 is movably arranged on the first guide member 422, and the movable part (such as a slider, a roller or a guide rail, etc.) thereon cooperates with the circumferential guide rail or slide groove on the first guide member 422, so as to realize circumferential movement. In addition to the part that cooperates with the first guide member 422, the third guide member 424 is also provided with a radial guide rail or slide groove for supporting and guiding the radial movement of the magnetic component 41. The third guide member 424 can be moved along the circumferential direction X2 on the first guide member 422 by manual adjustment, motor drive (such as through a transmission device such as a gear, chain, belt, etc.) or other suitable driving methods. In order to ensure the smoothness and accuracy of the movement, a lubrication device or a friction-reducing material can be set between the first guide member 422 and the third guide member 424.

[0150] The magnetic component 41 can move along the radial direction X3 on the third guide member 424 to adjust the distance or strength of the magnetic field. The magnetic component 41 cooperates with the radial guide rail or slide groove on the third guide member 424 through the movable part (such as a slider, a guide rail, a roller or a threaded connection, etc.) on it to achieve radial movement, which can be controlled by manual adjustment, motor drive (such as through a transmission device such as a lead screw, a slide rail) or other driving methods. In order to enhance the stability and accuracy of movement, a locking mechanism or a positioning device can be set between the magnetic component 41 and the third guide member 424.

[0151] For example, it is assumed that the magnetic field adjustment mechanism 400 is used to accurately adjust the strength and direction of the magnetic field at a position or a region in a plane. The magnetic component 41 includes a magnet 412 with adjustable strength, which is arranged on the third guide member 424 and can change the effective distance of the magnetic field by moving in the radial direction X3. The third guide member 424 can move along the circumferential direction X2 of the first guide member 422, thereby changing the magnetic field distribution.

[0152] Combination Fig.13 For the implementation shown, see Fig.15 , Fig.15 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Fig.15 The magnetic field adjustment mechanism 400 shown is Fig.13 The difference of the magnetic field adjustment mechanism 400 shown is that Fig.13 The first guide member 422 in the magnetic field adjustment mechanism 400 is fixedly connected to the cover body 300, and the second guide member 423 is movably disposed on the first guide member 422. Fig.15 In the magnetic field adjustment mechanism 400 shown, the first guide member 422 and the second guide member 423 are both fixedly disposed on the cover body 300 , and the first guide member 422 is fixedly disposed relative to the second guide member 423 .

[0153] Specifically, the magnetic component 41 can move along the circumferential direction X2 and the axial direction X1 of the guide component 42. The guide component 42 includes a first guide member 422 and a second guide member 423. The magnetic component 41 is movably disposed on the first guide member 422. The magnetic component 41 can move along the circumferential direction X2 on the first guide member 422. The magnetic component 41 is movably disposed on the second guide member 423. The magnetic component 41 can move along the axial direction X1 on the second guide member 423.

[0154] The first slide rail of the first guide member 422 and the second slide rail of the second guide member 423 are both guide rails 4211. The magnetic component 41 can move along the circumferential direction X2 and the axial direction X1 of the guide component 42, so that the magnetic field adjustment mechanism 400 has the ability of multi-directional adjustment and flexible control of the magnetic field, thereby achieving the technical effect of enhancing the magnetic field adjustment range, improving the adjustment accuracy and adapting to various application scenarios.

[0155] The first guide 422 is a part of the magnetic field adjustment mechanism 400 used to guide the magnetic component 41 to move in the circumferential direction X2. It can be annular, arc-shaped or other shapes suitable for the circumferential movement of the magnetic component 41 in the X2 direction. The inner surface or outer surface of the first guide 422 is provided with a guide rail, a slide groove or a similar guide structure to cooperate with the corresponding part on the magnetic component 41 to achieve the movement in the circumferential direction X2. The magnetic component 41 cooperates with the guide structure on the first guide 422 through the movable part (such as a slider, a roller, etc.) on it, so that the magnetic component 41 can move smoothly along the circumferential direction X2 of the first guide 422.

[0156] The second guide 423 is a part of the magnetic field adjustment mechanism 400 for guiding the magnetic component 41 to move along the axial direction X1. It can be a straight line, an arc, or other shapes suitable for the movement of the magnetic component 41 along the axial direction X1. The second guide 423 is provided with a guide rail, a slide groove, or a similar guide structure to cooperate with the corresponding part on the magnetic component 41 to achieve the movement of the axial direction X1. The magnetic component 41 also cooperates with the guide structure on the second guide 423 through the movable part thereon, so that the magnetic component 41 can move smoothly along the axial direction X1 of the second guide 423.

[0157] In order to realize the movement of the magnetic component 41 on the guide component 42, the movement of the magnetic component 41 on the guide component 42 can be driven by a driving structure such as a motor, a manual knob, a pneumatic or hydraulic device. The driving mechanism can be connected to the magnetic component 41 through a transmission mechanism (such as a gear, a chain, a belt, etc.) to realize its movement along the circumferential direction X2 and the axial direction X1.

[0158] For example, it is assumed that the magnetic field adjustment mechanism 400 is used to adjust the magnetic field in a cylindrical region. The magnetic component 41 includes a permanent magnet, which can move along the circumferential direction X2 on the first guide 422 (an annular guide rail) to change the direction of the magnetic field. At the same time, the magnetic component 41 can also move along the axial direction X1 on the second guide 423 (a linear guide rail) to change the intensity or range of action of the magnetic field.

[0159] Combination Fig.15 For the implementation shown, see Fig.16 , Fig.16 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Fig.16 The magnetic field adjustment mechanism 400 shown is Fig.15 The difference of the magnetic field adjustment mechanism 400 shown is that Fig.16 The magnetic field adjustment mechanism 400 shown may further include a third guide member 424 .

[0160] The magnetic component 41 can move along the circumferential direction X2, axial direction X1 and radial direction X3 of the guide component 42. The guide component 42 includes a first guide 422, a second guide 423 and a third guide 424. The third guide 424 is movably arranged on the first guide 422 and the second guide 423. The third guide 424 can move on the first guide 422 along the circumferential direction X2. The third guide 424 can move on the second guide 423 along the axial direction X1. The magnetic component 41 is movably arranged on the third guide 424. The magnetic component 41 can move on the third guide 424 along the radial direction X3. Due to the addition of the third guide 424, the magnetic component 41 can not only move on the first guide 422 and the second guide 423 along the circumferential direction X2 and the axial direction X1 respectively, but also move on the third guide 424 along the radial direction X3. Such an arrangement enables the magnetic component 41 to move in a three-dimensional space, which significantly enhances the magnetic field adjustment range and magnetic field adjustment accuracy.

[0161] In the embodiment of the present application, the third guide member 424 has a unique dual movement capability, which can move along the circumferential direction X2 of the first guide member 422 and along the axial direction X1 of the second guide member 423, and the magnetic component 41 is arranged on the third guide member 424 and can move along the radial direction X3.

[0162] Specifically, the first guide 422 may be annular or disc-shaped, and may be provided with a circumferential guide rail or a slide groove so as to cooperate with the corresponding part on the third guide 424. The third guide 424 may cooperate with the circumferential guide rail or the slide groove on the first guide 422 through the movable part (such as a slider, a roller or a guide rail, etc.) thereon, so that the third guide 424 may move smoothly along the circumferential direction X2 of the first guide 422. The second guide 423 may be linear or arc-shaped, and may be provided with an axial guide rail or a slide groove so as to cooperate with the corresponding part on the third guide 424. The third guide 424 may also cooperate with the axial guide rail or the slide groove on the second guide 423 through the movable part thereon, so that the third guide 424 may move smoothly along the axial direction X1 of the second guide 423. In addition to the part that cooperates with the first guide 422 and the second guide 423, the third guide 424 may also be provided with a radial guide rail or a slide groove for supporting and guiding the radial movement of the magnetic assembly 41.

[0163] In order to achieve precise movement of the magnetic component 41 in three-dimensional space, a driving mechanism including multiple motors can be designed, which are responsible for controlling the circumferential X2 movement of the third guide 424 on the first guide 422, the axial X1 movement of the third guide 424 on the second guide 423, and the radial X3 movement of the magnetic component 41 on the third guide 424.

[0164] For example, assuming that the magnetic field adjustment mechanism 400 is used to accurately adjust the strength and direction of the magnetic field at a position or a region in a three-dimensional space, the magnetic component 41 includes a magnet 412 with adjustable strength, which is arranged on the third guide 424 and can change the effective distance of the magnetic field by moving in the radial direction X3. The third guide 424 can move along the circumferential direction X2 of the first guide 422 and the axial direction X1 of the second guide 423 at the same time, thereby changing the effective direction of the magnetic field.

[0165] See also Fig.16 , the third guide 424 can also be rotatably arranged on the first guide 422 and / or the second guide 423, and the magnetic component 41 can rotate around a preset direction following the third guide 424. Since the guide component 42 includes the third guide 424, and the third guide 424 can be rotatably arranged on the first guide 422 or the second guide 423, and the magnetic component 41 is fixedly or movably arranged on the third guide 424, such an arrangement enables the magnetic component 41 to move not only in the circumferential direction X2, the axial direction X1 and the radial direction X3, but also to rotate in other directions, thereby enhancing the multi-dimensional adjustment capability and flexibility of the magnetic field adjustment mechanism 400, thereby achieving more precise magnetic field control, a wider adjustment range and the technical effect of adapting to more complex magnetic field environments.

[0166] It is understood that the preset direction refers to the axis direction around which the third guide member 424 rotates, and is also the direction around which the magnetic component 41 rotates. This direction can be set according to actual needs, for example, it can be horizontal, vertical, clockwise, counterclockwise or any other direction.

[0167] The third guide member 424 can rotate relative to the first guide member 422 or the second guide member 423 through a transmission device such as a bearing, a rotating shaft, a gear, a chain, a belt, etc. Specifically, the third guide member 424 can be fixed on a rotating shaft, and the rotating shaft is connected to the first guide member 422 or the second guide member 423 through a supporting component such as a bearing, so that the third guide member 424 can rotate around the center line of the rotating shaft. The magnetic component 41 is connected to the third guide member 424, so that when the third guide member 424 rotates, the magnetic component 41 can rotate with it. The connection structure can be rigid, such as bolt connection, welding, etc., or it can be flexible, such as connected by a rope, chain, etc. When the third guide member 424 rotates around a preset direction, due to the connection relationship between the magnetic component 41 and the third guide member 424, the magnetic component 41 will also rotate with the third guide member 424.

[0168] For example, assuming that the magnetic field adjustment mechanism is used to accurately adjust the strength and direction of the magnetic field at a position or a region in a three-dimensional space, the magnetic component 41 is disposed on the third guide 424 and can change the effective distance of the magnetic field by moving in the radial direction X3. The third guide 424 can rotate around the axis of the first guide 422 or the second guide 423 to change the direction of the magnetic field.

[0169] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other, and any combination of features in different embodiments is also within the protection scope of the present application. In other words, the multiple embodiments described above can also be arbitrarily combined according to actual needs.

[0170] It should be noted that all the above drawings are illustrative illustrations of the present application and do not represent the actual size of the product. Moreover, the size ratio relationship between the components in the drawings is not intended to limit the actual product of the present application.

[0171] The above are only some embodiments and implementation methods of the present application, and the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the technical scope disclosed in the present application can easily think of changes or substitutions, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application shall be based on the protection scope of the claims.

Claims

1. A magnetic field adjustment mechanism, applied to a reaction chamber of a plasma device, wherein the reaction chamber is provided with a reaction chamber, characterized in that: include: A magnetic component, the magnetic component is used to generate a first magnetic field in the reaction chamber; The guide assembly, the magnetic assembly is movably connected to the guide assembly, the magnetic assembly can move along the circumferential direction of the guide assembly, and can move along the axial direction and / or radial direction of the guide assembly to adjust the first magnetic field.

2. The magnetic field adjustment mechanism according to claim 1, characterized in that: The magnetic assembly can move along the circumferential direction and axial direction of the guide assembly, the guide assembly includes a first guide and a second guide, the second guide is movably arranged on the first guide, the second guide can move on the first guide along the circumferential direction, the magnetic assembly is movably arranged on the second guide, and the magnetic assembly can move on the second guide along the axial direction; Or, the magnetic component can move circumferentially and radially along the guide component, the guide component includes a first guide member and a third guide member, the third guide member is movably arranged on the first guide member, the third guide member can move circumferentially on the first guide member, the magnetic component is movably arranged on the third guide member, and the magnetic component can move radially on the third guide member.

3. The magnetic field adjustment mechanism according to claim 1, characterized in that: The magnetic component can move along the circumferential and axial directions of the guide component. The guide component includes a first guide member and a second guide member. The magnetic component is movably disposed on the first guide member. The magnetic component can move on the first guide member along the circumferential direction. The magnetic component is movably disposed on the second guide member. The magnetic component can move on the second guide member along the axial direction.

4. The magnetic field adjustment mechanism according to claim 1, characterized in that: The magnetic assembly can move in the circumferential, axial and radial directions of the guide assembly, and the guide assembly includes a first guide member, a second guide member and a third guide member; The second guide is movably disposed on the first guide, and the second guide can move on the first guide along the circumferential direction; the third guide is movably disposed on the second guide, and the third guide can move on the second guide along the axial direction; the magnetic component is movably disposed on the third guide, and the magnetic component can move on the third guide along the radial direction; Or, the third guide member is movably arranged on the first guide member and the second guide member, the third guide member can move on the first guide member along the circumferential direction, the third guide member can move on the second guide member along the axial direction, and the magnetic component is movably arranged on the third guide member, and the magnetic component can move on the third guide member along the radial direction.

5. The magnetic field adjustment mechanism according to claim 4, characterized in that: The third guide member is rotatably disposed on the first guide member or the second guide member, and the magnetic component can rotate around a preset direction following the third guide member.

6. The magnetic field adjustment mechanism according to claim 4 or 5, characterized in that: The magnetic field adjustment mechanism has the multiple magnetic components, and the multiple magnetic components are distributed in the circumferential direction, or / and the multiple magnetic components are distributed in the axial direction, or / and the multiple magnetic components are distributed in the radial direction.

7. The magnetic field adjustment mechanism according to any one of claims 4 to 6, characterized in that: The magnetic assembly can move along the circumferential, axial and radial directions of the guide assembly, and the circumferential, axial and radial directions are perpendicular to each other.

8. The magnetic field adjustment mechanism according to any one of claims 1 to 7, characterized in that: The magnetic component is provided with a movable part, the guide component is provided with a guiding part, and the movable part is movably connected with the guiding part.

9. The magnetic field adjustment mechanism according to claim 8, characterized in that: The movable part is a slider, and the guiding part is a guide rail. The slider slides in the guide rail, so that the magnetic component moves relative to the guide component.

10. The magnetic field adjustment mechanism according to any one of claims 1 to 9, characterized in that: At least one locking member is also provided between the magnetic component and the guide component. When the at least one locking member is in a first state, the at least one locking member fixes the magnetic component and the guide component. When the at least one locking member is in a second state, the magnetic component can move relative to the guide component.

11. The magnetic field adjustment mechanism according to any one of claims 1 to 10, characterized in that: The guide component includes at least one locking position. When the magnetic component is in the at least one locking position, the magnetic component is fixed to the guide component. When the magnetic component is not in the at least one locking position, the magnetic component can move relative to the guide component.

12. The magnetic field adjustment mechanism according to any one of claims 1 to 11, characterized in that: The magnetic assembly includes a mounting frame and at least one magnet, the mounting frame is connected to the guide assembly, and the at least one magnet is arranged in the mounting frame.

13. The magnetic field adjustment mechanism according to claim 12, characterized in that: The at least one magnet is movably arranged in the mounting frame, and the first magnetic field is adjusted by changing the position of the at least one magnet.

14. The magnetic field adjustment mechanism according to claim 12 or 13, characterized in that: The magnetic assembly further includes at least one filling piece. After the at least one magnet is disposed on the mounting frame, the mounting frame has a receiving space, and the at least one filling piece is filled in the receiving space.

15. The magnetic field adjustment structure according to claim 14, characterized in that: The at least one filling piece is movably arranged in the mounting frame, and the first magnetic field is adjusted by changing the relative positions of the at least one magnet and the at least one filling piece.

16. A reaction chamber, characterized in that: include: a reaction chamber; A magnetic field generating mechanism, the magnetic field generating mechanism is used to generate a second magnetic field in the reaction chamber; The magnetic field adjustment mechanism according to any one of claims 1 to 15, wherein the magnetic field adjustment mechanism uses the first magnetic field to adjust the second magnetic field.

17. The reaction chamber according to claim 16, characterized in that The magnetic field regulating mechanism is located outside the magnetic field generating mechanism, a cover is provided between the magnetic field regulating mechanism and the magnetic field generating mechanism, and the magnetic field regulating mechanism is fixedly arranged on the cover.

18. A plasma device, characterized in that: include: A reaction chamber as claimed in claim 16 or 17.

Images